A device for preparing potassium fluosilicate using mixed acid
By introducing stirring equipment and gas purification and temperature control components into the potassium fluorosilicate preparation equipment, the problems of uneven mixing of silicon powder and acid solution and heat management were solved, achieving more efficient reaction and safer production.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- HENGYANG DONGFU NEW MATERIAL CO LTD
- Filing Date
- 2026-04-13
- Publication Date
- 2026-05-29
AI Technical Summary
In existing potassium fluorosilicate preparation equipment, hydrofluoric acid and other mixed acids are added directly to the reactor without mixing to react with silicon powder, resulting in low silicon powder reaction efficiency and easy accumulation of silicon powder on the surface of the acid solution, which reduces reaction efficiency.
A mixed acid preparation device was designed, which includes a stirring device, a sliding plate, and a disturbance plate. The sliding plate is driven by gears to move up and down, pressing the silicon powder floating on the surface of the acid liquid into the acid liquid. The disturbance plate generates turbulence to ensure that the silicon powder and acid liquid are mixed evenly. At the same time, a gas purification component and a temperature control component are set up to handle the acid gas and heat generated by the reaction, respectively, to ensure the safe and efficient operation of the equipment.
It improves the uniformity of mixing silicon powder and acid solution, enhances reaction efficiency, ensures equipment safety and production efficiency, and avoids the reduction in reaction efficiency caused by excessive heat.
Smart Images
Figure CN122098459A_ABST
Abstract
Description
Technical Field
[0001] This application relates to the field of potassium fluorosilicate preparation technology, and more specifically, to an apparatus for preparing potassium fluorosilicate using a mixed acid. Background Technology
[0002] Potassium fluorosilicate is mainly used in wood preservation, ceramic manufacturing, aluminum and magnesium smelting, agricultural pesticides, optical glass manufacturing, synthetic mica and porcelain enamel manufacturing, etc.
[0003] Currently, existing potassium fluorosilicate preparation equipment requires the addition of hydrofluoric acid and other mixed acids to the reaction vessel during the production of potassium fluorosilicate. However, in existing equipment, the hydrofluoric acid and other mixed acids are added directly to the reaction vessel without being mixed, which easily reduces the reaction efficiency of the silicon powder and thus reduces the production efficiency of the equipment. At the same time, when the acid solution and silicon powder are mixed, the silicon powder will accumulate and float on the surface of the acid solution immediately after being added, so that only a part of the silicon powder layer reacts with the acid solution, which reduces the reaction efficiency. Summary of the Invention
[0004] To address the shortcomings of existing technologies, this invention provides an apparatus for preparing potassium fluorosilicate using mixed acids, thus solving the problems mentioned in the background section.
[0005] To achieve the above objectives, this application provides an apparatus for preparing potassium fluorosilicate using mixed acids, including a fixed frame, a reaction vessel shell disposed on the inner side of the fixed frame, a liquid outlet disposed at the bottom of the reaction vessel shell, and a stirring device disposed inside the reaction vessel shell; Gear 1 is fixedly connected to the top of the stirring device. Rotary shaft 1 is movably connected to both sides of the top of the reactor shell. Gear 2 is fixedly connected to the top of rotary shaft 1 and meshes with gear 1. Reciprocating screw is fixedly connected to the bottom of rotary shaft 1. Slide plate is movably connected to the outer side of reciprocating screw. Slide rod is fixedly connected to the inner side of reactor shell. Slide plate is movably connected to the outer side of slide rod. Flow hole is opened on the surface of slide plate. Groove is opened on the outer surface of slide plate. Rotary shaft 2 is movably connected inside the groove. Disturbance plate is fixedly connected to the outer side of rotary shaft 2. Guide fin is fixedly connected to the bottom of disturbance plate. The system includes a slide plate and a disturbance plate. When the equipment is turned on, the silicon powder and mixed acid begin to react. A large amount of silicon powder floats on the surface of the acid solution. At this time, the stirring equipment starts, and the gears rotate, causing the slide plate to move up and down repeatedly. This allows the slide plate to quickly press the silicon powder floating on the surface of the acid solution into the acid solution. At the same time, the disturbance plate swings up and down with the slide plate, creating a large amount of turbulence inside the acid solution. This makes the silicon powder and acid solution mix more evenly, improves the reaction efficiency inside the equipment, and increases the production efficiency of the equipment.
[0006] Preferably, a plunger metering pump is fixedly connected to the top right side of the reactor shell, a silicon powder adding port is fixedly connected to the top of the plunger metering pump, a static mixer is fixedly connected to the top left side of the reactor shell, a plunger metering pump is fixedly connected to the top of the static mixer, a gas purification component is movably connected to the inside of the reactor shell, and a temperature control component is movably connected to the outside of the reactor shell.
[0007] Preferably, pressure sensors are fixedly connected inside the plunger metering pump one and the plunger metering pump two, and flow feedback devices are fixedly connected to the outside of the plunger metering pump one and the plunger metering pump two.
[0008] Preferably, the bottom horizontal height of the reciprocating screw is higher than the liquid level, and the outer surface of the disturbance plate does not contact the inner surface of the reactor shell.
[0009] Preferably, the gas purification assembly includes a belt head 1, a guide plate, a belt head 2, an acid and alkali resistant belt, a rotating shaft 3, a fixed platform, an exhaust fan blade, an exhaust pipe, a filter, and an outlet pipe. The belt head 1 is fixedly connected to the outer side of the reciprocating screw. The rotating shaft 3 is movably connected to the inner side of the reactor shell via the fixed platform. The belt head 2 is fixedly connected to the bottom of the rotating shaft 3. The belt head 1 is movably connected to the belt head 2 via the acid and alkali resistant belt. The guide plate is fixedly connected to the outer side of the slide rod. The exhaust fan blade is fixedly connected to the outer side of the rotating shaft 3. The exhaust pipe is fixedly connected to the top of the reactor shell. The filter is fixedly connected to the top of the exhaust pipe. The outlet pipe is fixedly connected to the outer side of the filter. The equipment is equipped with a gas purification component. During the reaction process, the equipment releases heat, which causes some of the acid liquid to produce acid gas. However, the pressure resistance of the reaction vessel is limited, and the acid gas mixture cannot be directly discharged into the environment. At this time, the filter is activated, causing the belt head to rotate with the reciprocating screw, which in turn rotates the exhaust fan blades. This allows the acid gas and the mixture produced by the reaction to enter the filter from the exhaust pipe, where the filter absorbs the harmful gases before discharging them, making the equipment safer to use.
[0010] Preferably, the bottom of the rotating shaft is at a height higher than the liquid level, and the outer side of the exhaust fan blade does not contact the inner surface of the exhaust pipe.
[0011] Preferably, the outer surface of the acid and alkali resistant belt is fixedly connected with an industrial anti-corrosion coating, and the spacing between the guide plates is consistent with the width of the acid and alkali resistant belt.
[0012] Preferably, the temperature control component includes a heat-conducting rod, a heat-conducting ring, a side mounting port, a mounting joint, a fixing hole, a liquid inlet pipe, a liquid outlet pipe, a water pump, and a chiller unit. The side mounting port is fixedly connected to the outer side of the reactor shell. A mounting joint is fixedly connected to the top of the side mounting port. A fixing hole is formed on the surface of the mounting joint. A heat-conducting rod is fixedly connected to the bottom of the mounting joint. Multiple heat-conducting rings are fixedly connected to the outer side of the heat-conducting rod. A liquid inlet pipe and a liquid outlet pipe are fixedly connected to the top of the mounting joint. A chiller unit is fixedly connected to the top of the outer side of the mounting frame. A water pump is fixedly connected to the outer side of the liquid inlet pipe. By setting up the temperature control component, when the equipment generates a large amount of heat during the reaction process, and excessive heat reduces the reaction efficiency of silicon powder and hydrofluoric acid, the chiller unit is activated. This allows the heat-conducting rod to absorb the heat from the solution. The chiller unit controls the overall temperature in the reactor, thereby maintaining a high efficiency of the reaction inside the equipment and improving the equipment's production efficiency.
[0013] Preferably, the heat-conducting rod has a circulating water channel inside, and an anti-corrosion sleeve is fixedly connected to the outside of the heat-conducting rod.
[0014] Preferably, a temperature sensor is fixedly connected inside the heat-conducting rod, and a leak-proof clamp is fixedly connected to the outside of the side mounting port.
[0015] The advantages of this application are: (1) When the equipment is turned on, the silicon powder and the mixed acid are mixed and reacted. A large amount of silicon powder floats on the surface of the acid. At this time, the stirring equipment is started, and the gear rotates to drive the slide plate to move up and down repeatedly. The slide plate quickly presses the silicon powder floating on the surface of the acid into the acid. At the same time, the disturbance plate follows the slide plate up and down, which generates a large amount of turbulence in the acid, making the silicon powder and acid more uniformly mixed, improving the reaction efficiency inside the equipment, and improving the production efficiency of the equipment.
[0016] (2) The equipment of this application will release heat during the reaction process, which will cause some acid liquid to produce acid gas. However, the pressure resistance of the reaction vessel is limited. At this time, the acid gas mixture cannot be directly discharged into the environment. At this time, the filter is started, and the belt round head rotates with the reciprocating screw, which makes the exhaust fan blade rotate, so that the acid gas and the mixture produced by the reaction enter the filter from the exhaust pipe, and the filter absorbs the harmful gas before discharge, making the equipment safer to use.
[0017] (3) The reaction process generates a large amount of heat, and excessive heat will reduce the reaction efficiency of silicon powder and hydrofluoric acid. At this time, the chiller is started, so that the heat transfer rod absorbs the heat in the solution. The overall temperature in the reactor is controlled by the chiller, so that the reaction inside the equipment is always kept at high efficiency, thereby improving the production efficiency of the equipment. Attached Figure Description
[0018] The accompanying drawings, which form part of this application, are used to provide a further understanding of the application and to make other features, objects, and advantages of the application more apparent. The illustrative embodiments and descriptions of this application are used to explain the application and do not constitute an undue limitation of the application. In the drawings: Figure 1 This is a schematic diagram of the overall structure of the present invention; Figure 2 This is a schematic diagram of the overall internal structure of the present invention; Figure 3 This is a schematic diagram of some components of the present invention; Figure 4 This is the present invention. Figure 3 Enlarged structural diagram at point A in the middle; Figure 5 This is a schematic diagram of the gas purification component structure of the present invention; Figure 6 This is the present invention. Figure 5 Enlarged structural diagram at point B; Figure 7 This is a schematic diagram of the temperature control component structure of the present invention; Figure 8 This is the present invention. Figure 7 Enlarged structural diagram at point C.
[0019] In the above image, 100. Fixture; 200. Reactor shell; 300. Liquid outlet; 400. Plunger metering pump one; 500. Silica powder addition port; 600. Plunger metering pump two; 700. Static mixer; 800. Stirring equipment; 901. Gear 1; 902. Shaft 1; 903. Gear 2; 904. Reciprocating lead screw; 905. Slide plate; 906. Flow hole; 907. Groove; 908. Shaft 2; 909. Disturbance plate; 910. Guide fin; 911. Slide rod; Gas purification components; 1001, belt round head one; 1002, guide plate; 1003, belt round head two; 1004, acid and alkali resistant belt; 1005, rotating shaft three; 1006, fixed platform; 1007, exhaust fan blade; 1008, exhaust pipe; 1009, filter; 1010, gas outlet pipe; 1100 Temperature control component; 1101 Heat-conducting rod; 1102 Heat-conducting ring; 1103 Side mounting port; 1104 Mounting connector; 1105 Fixing hole; 1106 Liquid inlet pipe; 1107 Liquid outlet pipe; 1108 Water pump; 1109 Chiller unit. Detailed Implementation
[0020] To enable those skilled in the art to better understand the present application, the technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are merely some, not all, of the embodiments of the present application. All other embodiments obtained by those skilled in the art based on the embodiments of the present application without creative effort should fall within the scope of protection of the present application.
[0021] It should be noted that the terms "first," "second," etc., in the specification, claims, and accompanying drawings of this application are used to distinguish similar objects and are not necessarily used to describe a specific order or sequence. It should be understood that such data can be used interchangeably where appropriate for the purposes of describing embodiments of this application herein. Furthermore, the terms "comprising" and "having," and any variations thereof, are intended to cover non-exclusive inclusion; for example, a process, method, system, product, or apparatus that comprises a series of steps or units is not necessarily limited to those steps or units explicitly listed, but may include other steps or units not explicitly listed or inherent to such processes, methods, products, or apparatus.
[0022] In this application, the terms "upper," "lower," "left," "right," "front," "rear," "top," "bottom," "inner," "outer," "middle," "vertical," "horizontal," "lateral," and "longitudinal" indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. These terms are primarily for the purpose of better describing this application and its embodiments, and are not intended to limit the indicated device, element, or component to having a specific orientation, or to be constructed and operated in a specific orientation.
[0023] Furthermore, in addition to indicating location or positional relationship, some of the aforementioned terms may also have other meanings. For example, the term "above" may also be used in some cases to indicate a certain dependency or connection relationship. Those skilled in the art can understand the specific meaning of these terms in this application based on the specific circumstances.
[0024] Furthermore, the terms "installation," "setup," "equipped with," "connection," "linking," and "socketing" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral structure; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium, or an internal connection between two devices, components, or parts. Those skilled in the art can understand the specific meaning of these terms in this application based on the specific circumstances.
[0025] It should be noted that, unless otherwise specified, the embodiments and features described in this application can be combined with each other. This application will now be described in detail with reference to the accompanying drawings and embodiments.
[0026] Example 1, see Figures 1-4 This embodiment provides an apparatus for preparing potassium fluorosilicate using mixed acid, including a fixed frame 100, a reaction vessel shell 200 disposed inside the fixed frame 100, a liquid outlet 300 disposed at the bottom of the reaction vessel shell 200, and a stirring device 800 disposed inside the reaction vessel shell 200. The stirring device 800 is provided to ensure that the silicon powder is mixed evenly with the acid solution during the reaction process. A gear 901 is fixedly connected to the top of the stirring device 800. A rotating shaft 902 is movably connected to both sides of the top of the reactor shell 200. A gear 903 is fixedly connected to the top of the rotating shaft 902, meshing with gear 901. A reciprocating screw 904 is fixedly connected to the bottom of the rotating shaft 902, causing the slide plate 905 to move up and down reciprocally. The slide plate 905 is movably connected to the outer side of the reciprocating screw 904. The reactor shell 200... A slide rod 911 is fixedly connected to the inner side, and a slide plate 905 is movably connected to the outer side of the slide rod 911. A flow hole 906 is opened on the surface of the slide plate 905, and a groove 907 is opened on the outer surface of the slide plate 905. A rotating shaft 908 is movably connected inside the groove 907, and a disturbance plate 909 is fixedly connected to the outer side of the rotating shaft 908. A guide fin 910 is fixedly connected to the bottom of the disturbance plate 909. The guide fin 910 is set so that the acid liquid is guided by the guide fin 910 to generate turbulence. A plunger metering pump 400 is fixedly connected to the top right side of the reactor shell 200. The plunger metering pump 400 is set to automatically add silicon powder in proportion. A silicon powder inlet 500 is fixedly connected to the top of the plunger metering pump 400. A static mixer 700 is fixedly connected to the top left side of the reactor shell 200. The static mixer 700 is set to ensure that the acid is uniformly mixed before entering the reactor shell 200 to avoid side reactions caused by excessive local concentration. A plunger metering pump 600 is fixedly connected to the top of the static mixer 700. The plunger metering pump 600 is set to automatically add hydrofluoric acid in proportion. A gas purification component 1000 is movably connected inside the reactor shell 200. A temperature control component 1100 is movably connected to the outside of the reactor shell 200. Pressure sensors are fixedly connected inside plunger metering pump 1 400 and plunger metering pump 2 600, and flow feedback devices are fixedly connected to the outside of plunger metering pump 1 400 and plunger metering pump 2 600. The bottom of the reciprocating screw 904 is at a height higher than the liquid level, and the outer surface of the disturbance plate 909 does not contact the inner surface of the reactor shell 200. The equipment is equipped with a slide plate 905 and a disturbance plate 909. When the equipment is turned on, the silicon powder and the mixed acid begin to react. A large amount of silicon powder floats on the surface of the acid solution. At this time, the stirring device 800 starts, causing the gear 901 to rotate and drive the slide plate 905 to move up and down reciprocally. The slide plate 905 quickly presses the silicon powder floating on the surface of the acid solution into the acid solution. At the same time, the disturbance plate 909 follows the slide plate 905 up and down, generating a large amount of turbulence inside the acid solution, making the silicon powder and acid solution mix more evenly, improving the reaction efficiency inside the equipment, and thus improving the production efficiency of the equipment.
[0027] When the above equipment is in use, plunger metering pump 400 and plunger metering pump 600 are started to add silicon powder and mixed acid into the reactor shell 200 in proportion. At this time, a large amount of silicon powder will float on the surface of the acid solution, causing the silicon powder and acid solution to react and reducing the overall reaction efficiency. At this time, the stirring device 800 is started, causing gear 901 to rotate, which in turn drives gear 903 to rotate, causing shaft 902 to rotate, causing reciprocating screw 904 to rotate, causing slide plate 905 to move up and down along slide rod 911, causing disturbance plate 909 to float up and down with the acid solution, generating a large amount of turbulence inside the acid solution, which makes the silicon powder and acid solution mix quickly, improves the working efficiency of stirring device 800, improves the internal reaction efficiency of the equipment, and improves the production efficiency of the equipment.
[0028] Example 2, see Figures 1-6 Based on Embodiment 1, the gas purification assembly 1000 includes a belt head 1001, a guide plate 1002, a belt head 2 1003, an acid and alkali resistant belt 1004, a rotating shaft 3 1005, a fixed platform 1006, an exhaust fan blade 1007, an exhaust pipe 1008, a filter 1009, and an outlet pipe 1010. The belt head 1001 is fixedly connected to the outer side of the reciprocating screw 904. The rotating shaft 3 1005 is movably connected to the inner side of the reactor shell 200 via the fixed platform 1006. The belt head 2 1003 is fixedly connected to the bottom of the rotating shaft 3 1005. The acid and alkali resistant belt 1004 is movably connected to the belt round head 1003. The guide plate 1002 is fixedly connected to the outside of the slide rod 911. The exhaust fan blade 1007 is fixedly connected to the outside of the rotating shaft 1005. The exhaust fan blade 1007 is set to accelerate the air circulation inside the reactor shell 200. The exhaust pipe 1008 is fixedly connected to the top of the reactor shell 200. The filter 1009 is fixedly connected to the top of the exhaust pipe 1008. The filter 1009 is set to absorb harmful gases in the exhaust gas, thereby protecting the environment. The exhaust pipe 1010 is fixedly connected to the outside of the filter 1009. The bottom of the rotating shaft 1005 is higher than the liquid level, and the outer side of the exhaust fan blade 1007 does not contact the inner surface of the exhaust pipe 1008. An industrial anti-corrosion coating is fixedly connected to the outer surface of the acid and alkali resistant belt 1004, and the spacing between the guide plates 1002 is consistent with the width of the acid and alkali resistant belt 1004. The gas purification component 1000 is installed. During the reaction process, the equipment releases heat, which causes some of the acid liquid to produce acid gas. However, the pressure resistance of the reaction vessel is limited, and the acid gas mixture cannot be directly discharged into the environment. At this time, the filter 1009 is activated, causing the belt head 1001 to rotate with the reciprocating screw 904, which in turn rotates the exhaust fan 1007. This allows the acid gas and the mixture produced by the reaction to enter the filter 1009 from the exhaust pipe 1008. The filter 1009 absorbs the harmful gases before discharging them, making the equipment safer to use.
[0029] When the above equipment is in use, the reaction between silicon powder and mixed acid generates heat, which in turn produces a large amount of acid gas, increasing the internal pressure of the reactor. At this time, belt head 1001 rotates with reciprocating screw 904, causing belt head 1001 to drive belt head 2 1003 to rotate through acid and alkali resistant belt 1004, which in turn causes shaft 3 1005 to rotate, and exhaust fan 1007 to rotate. At this time, filter 1009 is activated, allowing the acid gas and the mixed gas produced by the reaction to enter filter 1009 from exhaust pipe 1008. Filter 1009 absorbs the harmful gases before discharging them, making the equipment safer to use.
[0030] Example 3, see Figures 1-8 Based on Embodiment 1, the temperature control component 1100 in this embodiment includes a heat-conducting rod 1101, a heat-conducting ring 1102, a side mounting port 1103, a mounting connector 1104, a fixing hole 1105, a liquid inlet pipe 1106, a liquid outlet pipe 1107, a water pump 1108, and a chiller unit 1109. The side mounting port 1103 is fixedly connected to the outer side of the reactor shell 200. The side mounting port 1103 facilitates equipment installation. A mounting connector 1104 is fixedly connected to the top of the side mounting port 1103. The surface of 1104 is provided with fixing holes 1105. A heat-conducting rod 1101 is fixedly connected to the bottom of the mounting joint 1104. Multiple heat-conducting rings 1102 are fixedly connected to the outside of the heat-conducting rod 1101. The heat-conducting rings 1102 are set to improve the heat exchange efficiency between the solution and the heat-conducting rod 1101. An inlet pipe 1106 and an outlet pipe 1107 are fixedly connected to the top of the mounting joint 1104. A chiller unit 1109 is fixedly connected to the top of the outside of the fixing frame 100. A water pump 1108 is fixedly connected to the outside of the inlet pipe 1106. The heat-conducting rod 1101 has a circulating water channel inside, and an anti-corrosion sleeve is fixedly connected to the outside of the heat-conducting rod 1101. A temperature sensor is fixedly connected inside the heat-conducting rod 1101, and a leak-proof clamp is fixedly connected to the outside of the side mounting port 1103. The temperature control component 1100 is set up so that when the equipment generates a lot of heat during the reaction process, the excessive heat will reduce the reaction efficiency of silicon powder and hydrofluoric acid. At this time, the chiller unit 1109 is started, so that the heat conduction rod 1101 absorbs the heat in the solution. The overall temperature in the reactor is controlled by the chiller unit 1109, so that the reaction inside the equipment is always kept at a high efficiency, thereby improving the production efficiency of the equipment.
[0031] When the above-mentioned equipment is in use, the reaction between silicon powder and mixed acid generates a large amount of heat. If the heat inside the reactor shell 200 is too high, the reaction efficiency will be reduced. At this time, the chiller unit 1109 is started, so that cold water enters the circulating water circuit inside the heat conduction rod 1101 through the water pump 1108. The heat conduction rod 1101 absorbs the heat in the solution and then dissipates the heat through the cold water. This makes the overall temperature of the solution inside the reactor shell 200 controllable, so that the reaction process of silicon powder and mixed acid always maintains high efficiency and improves the production efficiency of the equipment.
[0032] The above are merely preferred embodiments of the present invention, but the scope of protection of the present invention is not limited thereto. Any equivalent substitutions or modifications made by those skilled in the art within the scope of the technology disclosed in the present invention, based on the technical solution and inventive concept of the present invention, should be covered within the scope of protection of the present invention.
Claims
1. An apparatus for preparing potassium fluorosilicate using mixed acids, characterized in that, The device includes a fixing frame, an outer shell of a reaction vessel is provided on the inner side of the fixing frame, a liquid outlet is provided at the bottom of the outer shell of the reaction vessel, and a stirring device is provided inside the outer shell of the reaction vessel; Gear 1 is fixedly connected to the top of the stirring device. Rotary shaft 1 is movably connected to both sides of the top of the reactor shell. Gear 2 is fixedly connected to the top of rotary shaft 1 and meshes with gear 1. Reciprocating screw is fixedly connected to the bottom of rotary shaft 1. Slide plate is movably connected to the outer side of reciprocating screw. Slide rod is fixedly connected to the inner side of reactor shell. Slide plate is movably connected to the outer side of slide rod. Flow hole is opened on the surface of slide plate. Groove is opened on the outer surface of slide plate. Rotary shaft 2 is movably connected inside the groove. Disturbance plate is fixedly connected to the outer side of rotary shaft 2. Guide fin is fixedly connected to the bottom of disturbance plate.
2. The apparatus for preparing potassium fluorosilicate using mixed acids according to claim 1, characterized in that, A plunger metering pump is fixedly connected to the top right side of the reactor shell, and a silicon powder inlet is fixedly connected to the top of the plunger metering pump. A static mixer is fixedly connected to the top left side of the reactor shell, and a plunger metering pump is fixedly connected to the top of the static mixer. A gas purification assembly is movably connected inside the reactor shell, and a temperature control assembly is movably connected to the outside of the reactor shell.
3. The apparatus for preparing potassium fluorosilicate using mixed acids according to claim 1, characterized in that, Pressure sensors are fixedly connected inside the plunger metering pump 1 and plunger metering pump 2, and flow feedback devices are fixedly connected to the outside of the plunger metering pump 1 and plunger metering pump 2.
4. The apparatus for preparing potassium fluorosilicate using a mixed acid according to claim 1, characterized in that, The bottom of the reciprocating screw is at a height higher than the liquid level, and the outer surface of the disturbance plate does not contact the inner surface of the reactor shell.
5. The apparatus for preparing potassium fluorosilicate using a mixed acid according to claim 2, characterized in that, The gas purification assembly includes a belt head 1, a guide plate, a belt head 2, an acid and alkali resistant belt, a rotating shaft 3, a fixed platform, an exhaust fan blade, an exhaust pipe, a filter, and an outlet pipe. The belt head 1 is fixedly connected to the outer side of the reciprocating screw. The rotating shaft 3 is movably connected to the inner side of the reactor shell via the fixed platform. The belt head 2 is fixedly connected to the bottom of the rotating shaft 3. The belt head 1 is movably connected to the belt head 2 via the acid and alkali resistant belt. The guide plate is fixedly connected to the outer side of the slide rod. The exhaust fan blade is fixedly connected to the outer side of the rotating shaft 3. The exhaust pipe is fixedly connected to the top of the reactor shell. The filter is fixedly connected to the top of the exhaust pipe. The outlet pipe is fixedly connected to the outer side of the filter.
6. The apparatus for preparing potassium fluorosilicate using a mixed acid according to claim 5, characterized in that, The bottom of the rotating shaft is at a height higher than the liquid level, and the outer side of the exhaust fan blade does not contact the inner surface of the exhaust pipe.
7. The apparatus for preparing potassium fluorosilicate using a mixed acid according to claim 5, characterized in that, The outer surface of the acid and alkali resistant belt is fixedly connected with an industrial anti-corrosion coating, and the spacing between the guide plates is consistent with the width of the acid and alkali resistant belt.
8. The apparatus for preparing potassium fluorosilicate using a mixed acid according to claim 2, characterized in that, The temperature control assembly includes a heat-conducting rod, a heat-conducting ring, a side mounting port, a mounting connector, a fixing hole, a liquid inlet pipe, a liquid outlet pipe, a water pump, and a chiller unit. The side mounting port is fixedly connected to the outer side of the reactor shell. A mounting connector is fixedly connected to the top of the side mounting port. A fixing hole is opened on the surface of the mounting connector. A heat-conducting rod is fixedly connected to the bottom of the mounting connector. Multiple heat-conducting rings are fixedly connected to the outer side of the heat-conducting rod. A liquid inlet pipe and a liquid outlet pipe are fixedly connected to the top of the mounting connector. A chiller unit is fixedly connected to the top of the outer side of the mounting frame. A water pump is fixedly connected to the outer side of the liquid inlet pipe.
9. The apparatus for preparing potassium fluorosilicate using a mixed acid according to claim 8, characterized in that, The heat-conducting rod has a circulating water channel inside, and an anti-corrosion sleeve is fixedly connected to the outside of the heat-conducting rod.
10. The apparatus for preparing potassium fluorosilicate using a mixed acid according to claim 8, characterized in that, A temperature sensor is fixedly connected inside the heat-conducting rod, and a leak-proof clamp is fixedly connected to the outside of the side mounting port.