A pretreatment verification device and method for a silicon dioxide etching liquid filter element

Abstract

This invention discloses a pretreatment verification device and method for silica etching solution filter cartridges, including a silica etching solution cleaning line and an ultrapure water cleaning line. This invention can precisely control the quality of filter cartridges before they are put into production. Through real-time online monitoring by a metal ion detector and a nanoparticle detector, the cleanliness of the filter cartridges to be verified can be comprehensively quantified, ensuring that the metal ion content and particle size distribution strictly meet the production line specifications before the filter cartridges are put into production. This avoids problems such as production line contamination and product defects caused by substandard filter cartridges from the source, ensuring stable production line operation and qualified product quality. Simultaneously, through the seamless switching design of the dual cleaning lines, silica etching solution cleaning and ultrapure water rinsing can be completed sequentially within the same device, eliminating the time loss associated with filter cartridge disassembly and transportation, secondary contamination, and waiting for external testing reports. This allows for rapid completion of filter cartridge pretreatment and verification.

Description

Technical Field

[0001] This invention relates to a pretreatment verification device and method for silica etching solution filter cartridges. Background Technology

[0002] In high-end electronic manufacturing fields such as semiconductors, display panels, and photovoltaics, the purity of silica etching solution is a key factor affecting device performance, production yield, and product reliability. As a core component for removing impurities such as metal ions and nanoparticles from silica etching solution, the cleanliness of the filter element itself is directly related to the safety and stability of the production line. However, during the pore-opening and molding process of filter element production, contaminants such as pore-opening agents, substrate dust, and metal particles often remain. If these residual impurities are used directly without adequate treatment, they are easily dissolved or washed away by the silica etching solution, causing the purity of the silica etching solution to seriously exceed the standard in a short period of time, thereby leading to device defects and causing significant economic losses.

[0003] Therefore, before putting the filter element into use, its cleanliness must be specifically verified to ensure thorough removal of contaminants. To further eliminate residual impurities that are difficult to remove with water and may react with the silica etching solution, a specialized cleaning of the filter element using silica etching solution is also required. This step utilizes the selective dissolution and elution properties of the silica etching solution to remove potentially reactive impurities, thereby preventing them from reacting with the silica etching solution during filtration and generating new contaminants, ensuring the purity and safety of the process.

[0004] Currently, the industry lacks a systematic and reliable solution to address these needs, and has not established an integrated process for "silica etching solution-specific cleaning—cleanliness verification." This leaves filter elements at risk of contamination with high-purity silica etching solution after they are put into operation, making it difficult to meet the increasingly stringent process requirements of high-end electronics manufacturing. Summary of the Invention

[0005] The main objective of this invention is to provide a pretreatment verification device and method for silica etching solution filter cartridges to solve the problems mentioned in the background.

[0006] The objective of this invention can be achieved by adopting the following technical solution:

[0007] A pretreatment verification device for silica etching solution filter cartridges, comprising:

[0008] The silica etching solution storage tank includes a gas pressurization port and a liquid phase discharge port. The gas pressurization port is connected to an inert gas pipeline. The inert gas pipeline supplies inert gas to the silica etching solution storage tank to pressurize it, so that the silica etching solution flows out from the liquid phase discharge port.

[0009] A gas-liquid separator, comprising a separation inlet, a separation gas phase outlet, and a separation liquid phase outlet;

[0010] A filter housing, in which a filter element to be verified is detachably installed, and the filter housing is provided with a cleaning inlet and a cleaning outlet;

[0011] Metal ion detector and nanoparticle detector;

[0012] The liquid phase outlet is connected to the separation inlet via a pipeline, the separated liquid phase outlet is connected to the cleaning inlet via a pipeline, and the cleaning outlet is connected to a metal ion detector and a nanoparticle detector via different pipelines respectively.

[0013] After the silica etching solution flows sequentially through the gas-liquid separator, the filter shell, and the filter element to be verified, it flows into the metal ion detector and the nanoparticle detector, respectively, forming a silica etching solution cleaning line.

[0014] The separation inlet is also connected to an ultrapure water pipeline. The ultrapure water flows sequentially through the ultrapure water pipeline, the gas-liquid separator, the filter housing, and the filter element to be verified, and then flows into the metal ion detector and the nanoparticle detector, forming an ultrapure water cleaning line.

[0015] Preferably, it also includes a waste liquid tank, wherein the filter housing, metal ion detector and nanoparticle detector are all connected to the waste liquid tank.

[0016] Preferably, the waste liquid tank is connected to a drain valve and a drain pump, a vibration damping hose is provided between the waste liquid tank and the drain pump, and a high liquid level sensor and a low liquid level sensor are provided on the waste liquid tank.

[0017] Preferably, the liquid phase outlet of the silica etching solution storage tank is provided with a liquid outlet pipe extending into the bottom of the tank.

[0018] Preferably, the inert gas pipeline is provided with an inert gas pneumatic shut-off valve, an inert gas manual shut-off valve, an inert gas pressure reducing valve, an inert gas safety valve, an inert gas filter, and an inert gas check valve in sequence; the ultrapure water pipeline is provided with an ultrapure water pneumatic shut-off valve, an ultrapure water manual shut-off valve, and an ultrapure water check valve; and the filter housing is provided with an upper switch valve, a lower discharge valve, and a balancing valve.

[0019] Preferably, a liquid phase outlet pressure transmitter is installed at the liquid phase outlet of the silica etching solution storage tank, an inert gas pressure transmitter is installed on the inert gas pipeline, and a filter housing pressure transmitter is installed on the filter housing.

[0020] Preferably, multiple filter housings are connected in series, and an isolation valve is provided between each pair of adjacent filter housings. The cleaning outlet of each filter housing is connected to a metal ion detector and a nanoparticle detector through different pipelines.

[0021] Preferably, a metal ion detection sampling valve is provided on the connection pipe between the cleaning outlet of each filter housing and the metal ion detector, and a nanoparticle detection sampling valve is provided on the connection pipe between the cleaning outlet of each filter housing and the nanoparticle detector.

[0022] A preprocessing verification method, comprising:

[0023] Step S1: In a clean environment, install the filter element to be validated, which has been cleaned with ultrapure water, into the filter housing;

[0024] Step S2: Pressurize the silica etching solution by introducing inert gas into the silica etching solution storage tank through the inert gas pipeline, so that the silica etching solution flows out from the liquid phase outlet to the gas-liquid separator.

[0025] Step S3: After the silica etching solution is separated into gas and liquid by the gas-liquid separator, it flows into the filter housing to clean the filter element to be verified. A portion of the cleaned silica etching solution flows into the metal ion detector and the nanoparticle detector to count metal ions and nanoparticles, respectively.

[0026] Step S4: Read the values ​​measured by the metal ion detector and the nanoparticle detector. After the detection results of metal ions and nanoparticles meet the standards, switch the cleaning line.

[0027] Step S5: Introduce ultrapure water into the gas-liquid separator through an ultrapure water pipeline;

[0028] Step S6: After gas-liquid separation, ultrapure water flows into the filter housing to clean the filter element to be verified. A portion of the cleaned ultrapure water flows into the metal ion detector and the nanoparticle detector to count metal ions and nanoparticles, respectively.

[0029] Step S7: Read the values ​​measured by the metal ion detector and the nanoparticle detector. After the detection results of metal ions and nanoparticles meet the standards, the pretreatment verification of the filter element is completed.

[0030] Preferably, in steps S3 and S6, when multiple filter housings and filter elements to be verified are connected in series in the device, the silica etching solution and ultrapure water flow sequentially through each filter housing and clean the filter element to be verified. After each filter housing, a portion of the liquid flows into the metal ion detector and the nanoparticle detector respectively for metal ion counting and nanoparticle counting.

[0031] Compared with the prior art, the beneficial technical effects of the present invention are:

[0032] 1. This invention can accurately control the quality of filter elements before they are put into use. Through real-time online monitoring by metal ion detectors and nanoparticle detectors, the cleanliness of the filter elements to be verified can be fully quantified, ensuring that the metal ion content and particle index of the filter elements strictly meet the production line specifications before they are put into use. This avoids problems such as production line contamination and product defects caused by substandard filter elements from the source, and ensures stable operation of the production line and qualified product quality.

[0033] 2. This invention, through a seamless switching design of dual cleaning lines, allows for the sequential completion of silica etching solution cleaning and ultrapure water rinsing within the same device. This eliminates the time lost due to filter element disassembly and transportation, secondary contamination, and waiting for external testing reports, enabling rapid filter element pretreatment and verification. Furthermore, the multi-filter housing series design supports batch verification, significantly shortening the online verification cycle after filter element replacement, reducing production line waiting time, and effectively improving overall production line efficiency.

[0034] 3. This invention employs an inert gas pressurized liquid supply method, which avoids direct contact between the pump body and the silica etching liquid, thereby reducing the introduction of metal ions and particulate contamination. It also prevents the entry of external air, moisture, and particulate matter, ensuring the stability of the silica etching liquid purity. Furthermore, the overall structure is simple and reliable, with stable liquid supply pressure and controllable flow rate, meeting the stability requirements of filter element pretreatment. In conjunction with a gas-liquid separator, it can pre-separate gases and bubbles entrained in the pipeline, preventing bubbles from entering the filter element and testing instruments to ensure accurate and stable test data. At the same time, it prevents the gas-liquid two-phase flow from causing impact, air blockage, and flow fluctuations on the filter element, improving the consistency of pretreatment and verification. Its gas phase outlet can promptly exhaust gas, effectively reducing system air resistance and further improving the smoothness of liquid delivery, providing strong support for the accuracy and stability of filter element pretreatment and verification. Attached Figure Description

[0035] Figure 1 This is a circuit diagram of a device according to an embodiment of the present invention;

[0036] Figure 2 A schematic diagram of the valves in an inert gas pipeline according to an embodiment of the present invention;

[0037] Figure 3 This is a schematic diagram of the valves in an ultrapure water pipeline according to an embodiment of the present invention.

[0038] In the diagram: 1. Silica etching solution storage tank; 2. Gas pressurization port; 3. Liquid phase outlet; 4. Inert gas pipeline; 5. Gas-liquid separator; 6. Separation inlet; 7. Separated gas phase outlet; 8. Separated liquid phase outlet; 9. Filter housing; 10. Filter element; 11. Cleaning inlet; 12. Cleaning outlet; 13. Metal ion detector; 14. Nanoparticle detector; 15. Ultrapure water pipeline; 16. Waste liquid tank; 17. Drain valve; 18. Drain pump; 19. Vibration damping hose; 20. High liquid level sensor; 21. Low liquid level sensor; 22. Discharge pipe; 23. Inert gas... 24. Pneumatic gas shut-off valve; 25. Manual inert gas shut-off valve; 26. Inert gas pressure reducing valve; 27. Inert gas safety valve; 28. Inert gas filter; 29. ​​Inert gas check valve; 30. Pneumatic shut-off valve for ultrapure water; 31. Manual inert water shut-off valve; 32. Ultrapure water check valve; 33. Upper on / off valve; 34. Lower discharge valve; 35. Maintenance valve; 36. Liquid phase discharge outlet pressure transmitter; 37. Inert gas pressure transmitter; 38. Filter housing pressure transmitter; 39. Isolation valve; 40. Metal ion detection sampling valve; 51. Nanoparticle detection sampling valve. Detailed Implementation

[0039] The technical solutions of the present invention will be clearly and completely described below with reference to the accompanying drawings of the embodiments of the present invention. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments.

[0040] Please see Figures 1-3 An embodiment of the pretreatment verification device and method for silica etching liquid filter cartridges provided by the present invention:

[0041] A pretreatment verification device for silica etching solution filter cartridges, comprising:

[0042] The silica etching solution storage tank 1 includes a gas pressurization port 2 and a liquid phase discharge port 3. The gas pressurization port 2 is connected to an inert gas pipeline 4. The inert gas pipeline 4 introduces inert gas into the silica etching solution storage tank 1 to pressurize it, so that the silica etching solution flows out from the liquid phase discharge port 3.

[0043] Gas-liquid separator 5, which includes a separation inlet 6, a separation gas phase outlet 7, and a separation liquid phase outlet 8;

[0044] The filter housing 9 contains a filter element 10 to be verified that can be detachably installed inside it. The filter housing 9 is provided with a cleaning inlet 11 and a cleaning outlet 12.

[0045] Metal ion detector 13 and nanoparticle detector 14; the metal ion detector 13 adopts ICP-MS, and the nanoparticle detector 14 adopts a liquid particle counter, which can accurately detect the metal ion content and the number of nanoparticles in the outlet fluid of filter element 10, respectively.

[0046] The liquid phase outlet 3 is connected to the separation inlet 6 through a pipeline, the separated liquid phase outlet 8 is connected to the cleaning inlet 11 through a pipeline, and the cleaning outlet 12 is connected to the metal ion detector 13 and the nanoparticle detector 14 through different pipelines respectively.

[0047] After passing through the gas-liquid separator 5, the filter shell 9 and the filter element 10 to be verified in sequence, the silica etching solution flows into the metal ion detector 13 and the nanoparticle detector 14 respectively, forming a silica etching solution cleaning line.

[0048] The separation inlet 6 is also connected to an ultrapure water pipeline 15. The ultrapure water flows sequentially through the ultrapure water pipeline 15, the gas-liquid separator 5, the filter housing 9 and the filter element to be verified 10, and then flows into the metal ion detector 13 and the nanoparticle detector 14, forming an ultrapure water cleaning line.

[0049] The device adopts PLC automatic control and is equipped with the MONITOR monitoring system to monitor the operating status of each pipeline, valve and detection equipment in real time. It can intuitively observe the overall operating conditions and key parameter changes of the device. At the same time, it is equipped with an EMO emergency stop button, which can realize emergency stop in abnormal operating conditions, quickly shut off all pneumatic valves and operating equipment, and ensure the safe and reliable operation of the device.

[0050] Furthermore, it also includes a waste liquid tank 16, with the filter housing 9, metal ion detector 13, and nanoparticle detector 14 all connected to the waste liquid tank 16. This allows for the centralized collection of cleaning and testing waste liquids, avoiding pollution and safety risks caused by indiscriminate discharge, and ensuring a clean and safe production environment.

[0051] Furthermore, a drain valve 17 and a drain pump 18 are connected to the waste liquid tank 16. A vibration damping hose 19 is installed between the waste liquid tank 16 and the drain pump 18. A high liquid level sensor 20 and a low liquid level sensor 21 are installed on the waste liquid tank 16. The drain pump 18 can actively and quickly discharge waste liquid. The vibration damping hose 19 can effectively reduce the transmission of vibration of the drain pump 18, avoiding pipe loosening, leakage and particle shedding caused by vibration. The drain valve 17 works in conjunction with the drain pump 18 to achieve controllable start and stop, preventing siphon and backflow phenomena.

[0052] The high liquid level sensor 20 can prevent waste liquid from overflowing and equipment overload, ensuring safe use. The low liquid level sensor 21 can prevent the drain pump 18 from running dry and cavitation, protecting the pump body and the stable operation of the entire system. At the same time, it can realize automatic monitoring of the liquid level of the waste liquid tank 16, and can link alarms or automatically stop the pump, further improving the automation level and safety of the device.

[0053] Furthermore, the liquid phase outlet 3 of the silica etching solution storage tank 1 is equipped with a liquid outlet pipe 22 that extends into the bottom of the tank. This ensures that the silica etching solution at the bottom of the tank can also be fully discharged, reducing silica etching solution residue, improving the utilization rate of silica etching solution, ensuring the continuous and stable supply process, and providing a stable medium supply for the pretreatment verification of the filter element 10.

[0054] Furthermore, the inert gas pipeline 4 is sequentially equipped with an inert gas pneumatic shut-off valve 23 and an inert gas manual shut-off valve 24 to achieve dual safety shut-off through remote automatic control and manual isolation. An inert gas pressure reducing valve 25 is used to precisely adjust the gas source pressure to the value required by the process to ensure stable pressure supply. An inert gas safety valve 26 automatically releases pressure when overpressure occurs, providing passive safety protection. An inert gas filter 27 is used to filter out impurities in the gas source to prevent contamination of the silica corrosion liquid. An inert gas check valve 28 is used to prevent the silica corrosion liquid from flowing back into the gas pipeline system.

[0055] The ultrapure water pipeline 15 is equipped with an ultrapure water pneumatic shut-off valve 29 and an ultrapure water manual shut-off valve 30 to achieve dual safety shut-off through remote automatic control and manual isolation. The ultrapure water check valve 31 prevents residual silica corrosion liquid from flowing back into the ultrapure water pipeline during the switching process, ensuring that the cleanliness of the ultrapure water system is not contaminated.

[0056] The filter housing 9 is equipped with an upper switch valve 32, a lower drain valve 33, and a maintenance valve 34. The upper switch valve 32 is used to turn the filter housing pressure transmitter 37 on and off. The lower drain valve 33 and the maintenance valve 34 are used to drain the liquid from the filter housing 9 and pipelines during abnormal equipment maintenance or pressure relief.

[0057] Furthermore, a liquid phase outlet pressure transmitter 35 is installed at the liquid phase outlet 3 of the silica etching solution storage tank 1, an inert gas pressure transmitter 36 is installed on the inert gas pipeline 4, and a filter housing pressure transmitter 37 is installed on the filter housing 9. This allows for real-time monitoring of the supply pressure, system pressure, and pressure difference across the filter element 10. It enables timely detection of problems such as filter element 10 blockage, leakage, and abnormal flow, providing early warnings and ensuring the reliability of the verification process. Simultaneously, pressure data can be recorded, making the verification process traceable and reproducible, meeting relevant quality control requirements.

[0058] Furthermore, multiple filter housings 9 are connected in series, with an isolation valve 38 installed between each adjacent filter housing 9. The cleaning outlet 12 of each filter housing 9 is connected to a metal ion detector 13 and a nanoparticle detector 14 via different pipelines. This allows for the simultaneous verification of multiple filter elements 10, effectively improving verification efficiency and meeting the quality control requirements of mass production. The isolation valve 38 can independently start and stop a single filter housing 9 without affecting the normal operation of other stations, facilitating the maintenance and replacement of the filter elements 10. Simultaneously, it enables multi-stage series pretreatment, simulating the working conditions of an actual multi-stage filtration system, making the verification results more realistic and valuable. Additionally, a pressure transmitter, along with matching on / off valves and maintenance valves, is added to the last filter housing 9 to check whether the final pressure value is normal.

[0059] Furthermore, each filter housing 9 has a metal ion detection sampling valve 39 installed on the connection pipe between its cleaning outlet 12 and the metal ion detector 13, and a nanoparticle detection sampling valve 40 installed on the connection pipe between its cleaning outlet 12 and the nanoparticle detector 14. This allows for independent sampling and testing of each outlet, enabling separate evaluation of the pretreatment effect of each filter element 10, supporting multi-point comparative testing, and facilitating the analysis of the consistency and batch stability of the filter elements 10.

[0060] A preprocessing verification method, comprising:

[0061] Step S1: In a clean environment, install the filter element 10 to be validated, which has been cleaned with ultrapure water, into the filter housing 9;

[0062] Step S2: Inert gas is introduced into the silica etching liquid storage tank 1 through the inert gas pipeline 4 to pressurize it, so that the silica etching liquid flows out from the liquid phase outlet 3 to the gas-liquid separator 5.

[0063] Step S3: After the silica etching solution is separated into gas and liquid by the gas-liquid separator 5, it flows into the filter shell 9 to clean the filter element 10 to be verified. A portion of the cleaned silica etching solution flows into the metal ion detector 13 and the nanoparticle detector 14 to count metal ions and nanoparticles, respectively.

[0064] Step S4: Read the values ​​measured by the metal ion detector 13 and the nanoparticle detector 14. After the detection results of metal ions and nanoparticles meet the standards, switch the cleaning line.

[0065] Step S5: Introduce ultrapure water into the gas-liquid separator 5 through the ultrapure water pipeline 15;

[0066] Step S6: After gas-liquid separation, ultrapure water flows into filter housing 9 to clean the filter element 10 to be verified. A portion of the cleaned ultrapure water flows into metal ion detector 13 and nanoparticle detector 14 for metal ion counting and nanoparticle counting, respectively.

[0067] Step S7: Read the values ​​measured by the metal ion detector 13 and the nanoparticle detector 14. After the detection results of metal ions and nanoparticles meet the standards, the pretreatment verification of filter element 10 is completed.

[0068] Furthermore, in steps S3 and S6, when multiple filter housings 9 and filter elements 10 to be verified are connected in series in the device, silica etching solution and ultrapure water flow through each filter housing 9 in sequence and clean the filter element 10 to be verified. After each filter housing 9 is passed through, a portion of the liquid flows into the metal ion detector 13 and the nanoparticle detector 14 respectively for metal ion counting and nanoparticle counting.

[0069] The device is installed inside the machine, which is equipped with a HEPA filter, enabling the internal environment of the machine to reach the CLASS100 cleanliness level. This provides a clean operating environment for the pretreatment and verification of filter element 10, preventing external particles from interfering with the test results.

[0070] During the pretreatment and validation of filter element 10, the cleanliness indicators for pretreatment cleaning and validation vary for different specifications of filter element 10 to be validated. The minimum standards that can be met are as follows: In the ultrapure water cleaning validation stage, the metal ion content at the outlet of filter element 10 must be controlled at <1ppt, and the number of particles with a diameter of 30nm must be controlled at <5 particles / ml; In the silica etching solution cleaning validation stage, the metal ion content at the outlet of filter element must be controlled at <10ppt, and the number of particles with a diameter of 30nm must be controlled at <20 particles / ml.

[0071] It will be apparent to those skilled in the art that the present invention is not limited to the details of the exemplary embodiments described above, and that the invention can be implemented in other specific forms without departing from the spirit or essential characteristics of the invention. Therefore, the embodiments should be considered in all respects as exemplary and non-limiting, and the scope of the invention is defined by the appended claims rather than the foregoing description. Thus, it is intended that all variations falling within the meaning and scope of equivalents of the claims be included within the present invention.

Claims

1. A pretreatment verification device for silica etching solution filter cartridges, characterized in that: include: The silica etching liquid storage tank (1) includes a gas pressurization port (2) and a liquid phase discharge port (3). The gas pressurization port (2) is connected to an inert gas pipeline (4). The inert gas pipeline (4) introduces inert gas into the silica etching liquid storage tank (1) to pressurize it, so that the silica etching liquid flows out from the liquid phase discharge port (3). A gas-liquid separator (5) includes a separation inlet (6), a separation gas phase outlet (7), and a separation liquid phase outlet (8). The filter housing (9) has a filter element (10) to be verified that can be detachably installed inside it. The filter housing (9) is provided with a cleaning inlet (11) and a cleaning outlet (12). Metal ion detector (13) and nanoparticle detector (14); The liquid phase outlet (3) is connected to the separation inlet (6) through a pipeline, the separation liquid phase outlet (8) is connected to the cleaning inlet (11) through a pipeline, and the cleaning outlet (12) is connected to the metal ion detector (13) and the nanoparticle detector (14) through different pipelines respectively. After the silica etching solution flows sequentially through the gas-liquid separator (5), the filter shell (9) and the filter element to be verified (10), it flows into the metal ion detector (13) and the nanoparticle detector (14) respectively, forming a silica etching solution cleaning line. The separation inlet (6) is also connected to an ultrapure water pipeline (15). The ultrapure water flows through the ultrapure water pipeline (15), gas-liquid separator (5), filter shell (9) and filter element (10) to be verified in sequence, and then flows into the metal ion detector (13) and nanoparticle detector (14) respectively, forming an ultrapure water cleaning line.

2. The pretreatment verification device for a silica etching solution filter element according to claim 1, characterized in that: It also includes a waste liquid tank (16), and the filter housing (9), metal ion detector (13) and nanoparticle detector (14) are all connected to the waste liquid tank (16).

3. The pretreatment verification device for a silica etching solution filter element according to claim 2, characterized in that: The waste liquid tank (16) is connected to a drain valve (17) and a drain pump (18). A vibration damping hose (19) is provided between the waste liquid tank (16) and the drain pump (18). A high liquid level sensor (20) and a low liquid level sensor (21) are provided on the waste liquid tank (16).

4. The pretreatment verification device for a silica etching solution filter element according to claim 1, characterized in that: The silica etching solution storage tank (1) is provided with a liquid outlet (3) that extends into the bottom of the tank.

5. The pretreatment verification device for a silica etching solution filter element according to claim 1, characterized in that: The inert gas pipeline (4) is provided with an inert gas pneumatic shut-off valve (23), an inert gas manual shut-off valve (24), an inert gas pressure reducing valve (25), an inert gas safety valve (26), an inert gas filter (27), and an inert gas check valve (28) in sequence. The ultrapure water pipeline (15) is provided with an ultrapure water pneumatic shut-off valve (29), an ultrapure water manual shut-off valve (30), and an ultrapure water check valve (31). The filter housing (9) is provided with an upper switch valve (32), a lower discharge valve (33), and a maintenance valve (34).

6. The pretreatment verification device for a silica etching solution filter element according to claim 1, characterized in that: A liquid phase outlet pressure transmitter (35) is installed at the liquid phase outlet (3) of the silica corrosion liquid storage tank (1), an inert gas pressure transmitter (36) is installed on the inert gas pipeline (4), and a filter housing pressure transmitter (37) is installed on the filter housing (9).

7. The pretreatment verification device for a silica etching solution filter element according to claim 1, characterized in that: Multiple filter housings (9) are connected in series, and an isolation valve (38) is provided between two adjacent filter housings (9). The cleaning outlet (12) of each filter housing (9) is connected to the metal ion detector (13) and the nanoparticle detector (14) through different pipelines.

8. The pretreatment verification device for a silica etching solution filter element according to claim 7, characterized in that: A metal ion detection sampling valve (39) is provided on the connection pipe between the cleaning outlet (12) of each filter shell (9) and the metal ion detector (13), and a nanoparticle detection sampling valve (40) is provided on the connection pipe between the cleaning outlet (12) of each filter shell (9) and the nanoparticle detector (14).

9. A preprocessing verification method as described in any one of claims 1-8, characterized in that: include: Step S1: In a clean environment, install the filter element (10) to be validated, which has been cleaned with ultrapure water, into the filter housing (9); Step S2: Inert gas is introduced into the silica etching liquid storage tank (1) through the inert gas pipeline (4) to pressurize it, so that the silica etching liquid flows out from the liquid phase outlet (3) to the gas-liquid separator (5). Step S3: After the silica etching solution is separated into gas and liquid by the gas-liquid separator (5), it flows into the filter shell (9) to clean the filter element (10) to be verified. A portion of the cleaned silica etching solution flows into the metal ion detector (13) and the nanoparticle detector (14) respectively for metal ion counting and nanoparticle counting. Step S4: Read the values ​​measured by the metal ion detector (13) and the nanoparticle detector (14). After the detection results of metal ions and nanoparticles meet the standards, switch the cleaning line. Step S5: Introduce ultrapure water into the gas-liquid separator (5) through the ultrapure water pipeline (15); Step S6: After gas-liquid separation, ultrapure water flows into the filter housing (9) to clean the filter element (10) to be verified. A portion of the cleaned ultrapure water flows into the metal ion detector (13) and the nanoparticle detector (14) to count metal ions and nanoparticles respectively. Step S7: Read the values ​​measured by the metal ion detector (13) and the nanoparticle detector (14). After the detection results of metal ions and nanoparticles meet the standards, the pretreatment verification of the filter element (10) is completed.

10. The preprocessing verification method according to claim 9, characterized in that: In steps S3 and S6, when multiple filter shells (9) and filter elements (10) to be verified are connected in series in the device, silica etching solution and ultrapure water flow through each filter shell (9) in sequence and clean the filter element (10) to be verified. After each filter shell (9) is passed through, a portion of the liquid flows into the metal ion detector (13) and the nanoparticle detector (14) respectively for metal ion counting and nanoparticle counting.

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