Method and system for detecting impurities in flunarizine hydrochloride bulk drug
By combining empirical mode decomposition and baseline optimization in preprocessing, and integrating continuous wavelet transform and Gaussian-Logistic distribution function convolution model, the problems of chromatographic peak overlap and noise interference in the detection of trace impurities in flunarizine hydrochloride raw material were solved, and high-precision impurity quantification was achieved.
Patent Information
- Application Number
- CN202610585338.0
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2026-04-29
- Publication Date
- 2026-06-30
AI Technical Summary
Existing technologies for detecting trace impurities in flunarizine hydrochloride raw materials suffer from problems such as chromatographic peak overlap, noise interference, and baseline drift, leading to inaccurate quantification. Traditional methods cannot effectively constrain the degree of peak overlap and morphological differences, resulting in failure to quantify trace impurities.
Empirical mode decomposition is used to denoise the model, and a baseline optimization algorithm is used to generate a denoised chromatogram. The optimal analysis scale is determined by the signal-to-noise ratio metric. Continuous wavelet transform is used to identify the number of components. A convolution model of Gaussian function and modified Logistic distribution function is established, and a trust region reflection algorithm is used for nonlinear iterative fitting. A penalty regularization term is added to optimize the model parameters.
This method enables high-precision detection of trace impurities in flunarizine hydrochloride raw material, filters out complex noise, accurately identifies overlapping peaks, improves quantitative accuracy and reliability, and avoids non-physical analysis and errors of traditional methods.