projector

Abstract

This application discloses a projector including an illumination module, a reflective light valve, and a projection lens. The reflective light valve is configured in the transmission path of the illumination beam provided by the illumination module to convert the illumination beam into an image beam. The projection lens is configured in the transmission path of the image beam. The projection lens projects the image beam out of the projector to form an image. By adjusting the shape and angle of the multiple first microlenses of the first microlens array in the illumination module, the problem in existing projectors where reflected light enters the lens aperture when the upper part of the reflective light valve is not deflected, or where diffraction fringes from some of the reflective mirrors in a dark state enter the lens aperture, can be improved, thereby enhancing image contrast without excessively sacrificing image brightness.

Description

Technical Field

[0001] This application relates to the field of optical technology, and more particularly to a projector. Background Technology

[0002] In existing projectors, reflective light valves are a commonly used light modulation technology. A reflective light valve comprises multiple arrayed mirrors, each with three deflection states: on-state, flat-state, and off-state. Ideally, when the mirror is on-state, a portion of the incident illumination beam is reflected into the projection lens aperture as part of the image beam; when the mirror is flat-state or off-state, the incident illumination beam should not enter the projection aperture after reflection. However, due to limitations in existing reflective light valve technology, when at least some mirrors are flat-state, reflected light still enters the lens aperture, and when some mirrors are off-state, diffraction fringes occur near the aperture, allowing light to still enter, resulting in decreased contrast of the projected image.

[0003] Current methods for improving contrast involve using baffles or modifying the aperture shape to block light reflected from the mirror when it's not deflected, thus preventing it from entering the aperture or obscuring the points where diffraction fringes overlap with the aperture. However, blocking part of the lens aperture sacrifices the brightness of the projected image. This forces manufacturers to choose between improving brightness and contrast, making it impossible to effectively improve contrast simultaneously at high brightness levels.

[0004] Therefore, there is indeed a need to provide further improvements to the existing technology.

[0005] The "Background Art" paragraph is only used to help understand the content of this invention. Therefore, the content disclosed in the "Background Art" paragraph may include some known technologies that are not known to those skilled in the art. The content disclosed in the "Background Art" paragraph does not represent that the content or the problems to be solved by one or more embodiments of this invention were known or recognized by those skilled in the art prior to this application. Summary of the Invention

[0006] In view of the shortcomings of the prior art, the main objective of this invention is to provide a projector that, by changing the microlens array of the projector, alters the light beam without blocking the lens aperture, and can effectively improve contrast while maintaining high brightness.

[0007] Other objects and advantages of the present invention can be further understood from the technical features disclosed herein.

[0008] To achieve one or more of the above objectives or other objectives, one embodiment of the present invention includes a projector, the projector comprising an illumination module, a reflective light valve, and a projection lens. The illumination module provides an illumination beam and includes a light source device and a first microlens array. The light source device generates the beam, and the first microlens array includes a plurality of closely spaced first microlenses. Each of the plurality of first microlenses forms a first orthographic projection on a first reference plane, and the first orthographic projection has a first shape. The first microlens array is disposed in the transmission path of the beam, and the beam passes through the first microlens array sequentially, exiting the illumination module as the illumination beam. A reflective light valve is disposed in the transmission path of the illumination beam to convert the illumination beam into an image beam. The reflective light valve includes a plurality of micromirrors arranged in an array, forming an effective imaging area having a long side and a short side. Each of the plurality of micromirrors is adapted to be operated in a first state with a first deflection angle and a second state without a deflection angle. When each of the plurality of micromirrors is in the first state, the illumination beam is incident on the plurality of micromirrors, and the illumination beam is deflected by the plurality of micromirrors. A reflector reflects a first light beam, which enters the projection lens as an image beam. When each of the plurality of micromirrors is in the second state, the illumination beam is incident on the plurality of micromirrors and is reflected by the plurality of micromirrors to form a second light beam. The projection lens is disposed on the transmission path of the image beam to project the image beam out of the projector and form an image. The projection lens includes an aperture located on a second reference plane perpendicular to the optical axis of the projection lens. The first light beam forms a first illumination area on the second reference plane, and the second light beam forms a second illumination area on the second reference plane. The shapes of the first illumination area and the second illumination area correspond to the first shape, and the first illumination area overlaps with the aperture. The orthogonal projection of the first illumination area onto the reflective light valve has a major projection axis and a minor projection axis, which are perpendicular to each other. The angle between the major projection axis and the long side of the effective imaging area is greater than 0 degrees and less than or equal to 90 degrees.

[0009] With the above structure, it is possible to improve the contrast without having to use a lens aperture blocker to improve the problem that some mirrors in existing projectors reflect light into the lens aperture when they are not deflected, or that some mirrors produce diffraction fringes near the aperture when they are dark, so that light can still enter the aperture. Attached Figure Description

[0010] Figure 1This is a schematic diagram of the optical path structure of the projector of the present invention.

[0011] Figure 2 This is a schematic diagram of the optical path structure of another embodiment of the projector of the present invention.

[0012] Figure 3 This is a planar schematic diagram of the first microlens array of the present invention viewed along the first incident direction.

[0013] Figure 4 yes Figure 3 A magnified schematic diagram of the orthographic projection of a first microlens in the RA region onto the first reference plane.

[0014] Figure 5 This is a planar schematic diagram of the second type of first microlens array of the present invention viewed along the first incident direction.

[0015] Figure 6 yes Figure 5 A magnified schematic diagram of the orthographic projection of a first microlens array in the RB region onto the first reference plane.

[0016] Figure 7 This is a planar schematic diagram of the third type of first microlens array of the present invention viewed along the first incident direction.

[0017] Figure 8 yes Figure 7 A magnified schematic diagram of the orthographic projection of a first microlens in the RC region onto the first reference plane.

[0018] Figure 9 This is a planar schematic diagram of the fourth type of first microlens array of the present invention along the first incident direction.

[0019] Figure 10 yes Figure 9 A magnified schematic diagram of the orthographic projection of a first microlens in the RD region onto the first reference plane.

[0020] Figure 11 This is a planar schematic diagram of the fifth type of first microlens array of the present invention viewed along the first incident direction.

[0021] Figure 12 yes Figure 11 A magnified schematic diagram of the orthographic projection of a first microlens in the RE region onto the first reference plane.

[0022] Figure 13 This is a planar schematic diagram of the first type of reflective light valve.

[0023] Figure 14 This is a planar schematic diagram of a micromirror in the first type of reflective light valve.

[0024] Figure 15 This is a schematic diagram of the different illumination areas formed on the second reference plane after the illumination beam is incident on the micromirror under different states of the first type of reflective light valve.

[0025] Figure 16 This is a schematic diagram of the orthographic projection of the first irradiation area onto the reflective light valve.

[0026] Figure 17 This is a planar schematic diagram of the second type of reflective light valve.

[0027] Figure 18 This is a planar schematic diagram of a micromirror in the second type of reflective light valve.

[0028] Figure 19 This is a schematic diagram showing the formation of different irradiation areas on the second reference plane after the illumination beam is incident on the micromirror under different states of the second type of reflective light valve.

[0029] Figure 20 This is a schematic diagram of the orthographic projection of the first irradiation area onto the reflective light valve.

[0030] Figure 21 This is a planar schematic diagram of the third type of reflective light valve.

[0031] Figure 22 This is a planar schematic diagram of a micromirror in the third type of reflective light valve.

[0032] Figure 23 This is a schematic diagram of the different illumination areas formed on the second reference plane after the illumination beam is incident on the micromirror under different states of the third type of reflective light valve.

[0033] Figure 24 This is a schematic diagram of the orthographic projection of the first irradiation area onto the reflective light valve.

[0034] Figure 25 It is based on Figure 3 A simulation diagram of the first irradiation area formed by the first microlens array.

[0035] Figure 26 It is based on Figure 5 A simulation diagram of the first irradiation area formed by the first microlens array.

[0036] Figure 27 This is a comparison chart of several simulation results under the first reflective light valve architecture.

[0037] Explanation of reference numerals in the attached figures:

[0038] 1: Projector

[0039] 10: Lighting Module

[0040] 11: Light source device

[0041] 12: Diffusion sheet

[0042] 13: First microlens array

[0043] 131: First microlens

[0044] P131: First Orthographic Projection

[0045] 14: First light source, upright mirror

[0046] 15: First reflecting mirror

[0047] 16: Second reflecting mirror

[0048] 17: First light source condenser lens

[0049] 18: Second microlens array

[0050] 19: Second light source upright mirror

[0051] 20: Third reflecting mirror

[0052] 21: Second light source condenser lens

[0053] 30: Optical modulation module

[0054] 31: Reflective light valve

[0055] 311: Micromirror

[0056] 40: Projection lens

[0057] 50: Prism

[0058] P1: First reference plane

[0059] P2: Second Reference Plane

[0060] d1: First incident direction

[0061] L: Microlens array element

[0062] A1: First Area

[0063] A2: Second Area

[0064] R: Reference line

[0065] L1: First axis

[0066] W1: Second Axis

[0067] L3: Long side

[0068] W3: Short side

[0069] Ax1: Rotation axis

[0070] Ax2: Pivot axis

[0071] θ, θ2: included angle

[0072] r0: Diffraction stripe

[0073] r1: First irradiation area

[0074] r2: Second irradiation area

[0075] r3: Third irradiation area

[0076] Pr1: Orthographic projection

[0077] AP: Aperture

[0078] PL1: Projection Long Axis

[0079] PW1: Projection Short Axis

[0080] S0: Beam

[0081] S: lighting beam

[0082] S1: Image beam

[0083] V: Effective imaging area

[0084] F: First projection optical axis

[0085] RA, RB, RC, RD: Regions Detailed Implementation

[0086] The technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this application, not all embodiments. Based on the embodiments of this application, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of this application.

[0087] The foregoing and other technical contents, features, and effects of the present invention will be clearly presented in the following detailed description of a preferred embodiment with reference to the accompanying drawings. The directional terms mentioned in the following embodiments, such as up, down, left, right, front, or back, are only for reference to the directions in the accompanying drawings. Therefore, the directional terms used are for illustrative purposes and not for limiting the present invention.

[0088] Figure 1 This is a schematic diagram of the optical path structure of the projector of the present invention. Figure 1As shown, the projector 1 includes an illumination module 10, a light modulation module 30, and a projection lens 40. The illumination module 10 provides an illumination beam S, and the light modulation module 30 is positioned along the transmission path of the illumination beam S. The light modulation module 30 converts the illumination beam S into an image beam S1. The projection lens 40 is positioned along the transmission path of the image beam S1. The projection lens 40 projects the image beam S1 out of the projector to form an image. The projection lens 40 may include, for example, a combination of one or more optical lenses with refractive power, such as various combinations of non-planar lenses including biconcave lenses, biconvex lenses, concave-convex lenses, convex-concave lenses, plano-convex lenses, and plano-concave lenses. In one embodiment, the projection lens 40 may further include a planar optical lens to reflect the image beam S1 from the light modulation module 30 onto the projection target. The present invention does not limit the type or form of the projection lens 40. In this embodiment, the light modulation module 30 includes a reflective light valve 31. The reflective light valve 31 is, for example, a digital micromirror device (DMD). At least one light source device 11 includes at least one light-emitting element. The light-emitting element may be comprised of at least one light-emitting diode or at least one laser diode package.

[0089] Please refer to the following: Figure 3 In one embodiment, the illumination module 10 includes at least one light source device 11 and a first microlens array 13. The light source device 11 is used to generate a light beam S0. The first microlens array 13 includes a plurality of closely arranged first microlenses 131. Each of the plurality of first microlenses 131 forms a first orthographic projection P131 on a first reference plane P1, and the first orthographic projection P131 has a first shape. The first microlens array 13 is disposed on the transmission path of the light beam S0. The light beam S0 leaves the illumination module 10 as an illumination beam S after passing through the first microlens array 13.

[0090] In one embodiment, the illumination module 10 further includes a second microlens array 18, which is disposed on the transmission path of the light beam S0. The light beam S0 passes through the first microlens array 13 and the second microlens array 18 in sequence before leaving the illumination module 10 as an illumination beam S.

[0091] In one embodiment, the illumination module 10 further includes a diffuser 12, a first light source deflector 14, a first reflector 15, a second reflector 16, a first light source condenser 178, a second light source deflector 19, a third reflector 20, and a second light source condenser 21. The diffuser 12, the first microlens array 13, the first light source deflector 14, the first reflector 15, the second reflector 16, the first light source condenser 178, the second microlens array 18, the second light source deflector 19, the third reflector 20, and the second light source condenser 21 are sequentially arranged on the transmission path of the light beam S0 generated by the light source device 11, so that the light beam S0 after passing through forms an illumination beam S leaving the illumination module 10. In this embodiment, the light beam S0 leaves the illumination module 10 from the second light source condenser 21 to enter the light modulation module 30 as the illumination beam S.

[0092] In one embodiment, the projector 1 further includes a prism 50, and the reflective light valve 31 and the prism 50 are disposed on the transmission path of the illumination beam S. The prism 50 is used to adjust the angle at which the illumination beam S enters the reflective light valve 31. The illumination beam S passes through the prism 50 and enters the reflective light valve 31, and at least a portion of the illumination beam S is converted and reflected to form an image beam S1 entering the projection lens 40.

[0093] Furthermore, it is still like Figure 1 As shown, the first microlens array 13 is disposed along the first reference plane P1, while the light source device 11 and the diffuser 12 are disposed in front of the first reference plane P1, and the first light source rectifier 14 is disposed behind the first reference plane P1. Furthermore, the front and rear sides of the first reference plane P1 are opposite sides. The projection lens 40 includes an aperture AP, which can be an independent light-blocking element, or it can be the smallest aperture formed by the inner diameter structure of the lens barrel or the lens itself. The aperture AP of the projection lens 40 is located on a second reference plane P2 perpendicular to the optical axis of the projection lens. In some embodiments, the first reference plane P1 and the second reference plane P2 are parallel to each other, or may be further perpendicular to the bottom surface of the projector housing, but the present invention is not limited thereto. In this embodiment, the light beam S0 generated by the light source device 11 is incident on the first microlens array 13 along a first incident direction d1, and the first incident direction d1 is perpendicular to the first reference plane P1.

[0094] In the above embodiment, after the light source device 11 generates a light beam S0, the light beam S0 is diffused by the diffuser 12. Then, the diffused light beam S0 passes through the first microlens array 13. The first microlens array 13 shapes the diffused light beam S0. The shaped light beam S0 is collimated by the first light source condenser 14 and then sequentially transmitted to the first reflector 15 and the second reflector 16 to change the transmission direction of the light beam S0. The transmission direction of the light beam S0 after being reflected by the first reflector 15 and the second reflector 16 is, for example, parallel to and opposite to the first incident direction d1. Then, the light beam S0 reflected by the second reflector 16 enters the first light source condenser 17. The light beam S0 converged by the first light source condenser 17 is transmitted to the second microlens array 18 for beam shaping. The light beam shaped by the second microlens array 18 enters the second light source condenser 19, and after being collimated by the second light source condenser 19, it is reflected by the third reflector 20 and transmitted to the second light source condenser 21.

[0095] Figure 2 This is a schematic diagram of the optical path structure of another embodiment of the projector of the present invention. Figure 2 As shown, in this embodiment, the components are largely the same as in the above embodiments, except that the first microlens array 13 and the second microlens array 18 can be integrated into a single microlens array element L. The microlens array element L is disposed along a first reference plane P1. Furthermore, the microlens array element L has a first region A1 and a second region A2, and the first region A1 and the second region A2 are respectively disposed parallel to each other along the first reference plane P1. The first microlens array 13 is disposed in the first region A1, and the second microlens array 18 is disposed in the second region A2. The first microlens array 13 and the second microlens array 18 are, for example, a single, integrally formed element (microlens array element L).

[0096] In detail, the first microlens array 13 of the present invention can have the shape of each first microlens and the arrangement angle of the multiple first microlenses adjusted. The shape and angle changes of the first microlens array 13 of the present invention will be further described below.

[0097] Figure 3 This is a planar schematic diagram of the first microlens array 13 of the present invention viewed along the first direction d1. Figure 4 yes Figure 3 A magnified schematic diagram of the first orthographic projection P131 of a first microlens 131 in the RA region shown on the first reference plane P1. (See diagram below.) Figure 3 and Figure 4 As shown, the first shape of each first microlens 131 on the first reference plane P1 has a first axis L1 and a second axis W1. The length of the first axis L1 is greater than the length of the second axis W1, and the first axis L1 and the second axis W1 are the axes of symmetry of the first shape.

[0098] In this embodiment, the first shape is a hexagon, so the first axis L1 is the line connecting two opposite angles of the hexagon, and the second axis W1 is the line connecting the midpoints of two opposite sides of the hexagon.

[0099] Specifically, the first axis L1 of the first shape has an angle θ with respect to a reference line R located on the first reference plane P1 that is greater than 0 degrees and less than or equal to 90 degrees. In different embodiments, θ can be, for example, 15 degrees, 30 degrees, 45 degrees, 40 degrees, 75 degrees, or 90 degrees.

[0100] Furthermore, the lengths of the first axis L1 and the second axis W1 conform to the following formula (1):

[0101]

[0102] Where D1 is the length of the first axis L1, D2 is the length of the second axis W1, and A is the aspect ratio, which is a real number and 0.3≤A≤1. It can be understood that when A=1, the first shape of the first orthographic projection P131 is a regular hexagon.

[0103] like Figure 4 The first orthographic projection P131 shown is A=1, and the included angle θ is approximately 60 degrees.

[0104] In order to better understand the shape and angle changes of the first microlens array 13 of the present invention, several different shape and angle change patterns will be described below.

[0105] Figure 5 This is a planar schematic diagram of the second type of first microlens array 13 of the present invention viewed along the first incident direction d1. Figure 6 yes Figure 5 A magnified schematic diagram of the first orthographic projection P131 of a first microlens 131 in the RB region shown on the first reference plane P1. (See diagram below.) Figure 5 and Figure 6 The first shape of the first orthographic projection P131 of each of the first microlenses 131 shown is A = 0.5 and the included angle θ is approximately 90 degrees.

[0106] Figure 7 This is a planar schematic diagram of the third type of first microlens array 13 of the present invention viewed along the first incident direction d1. Figure 8 yes Figure 7 A magnified schematic diagram of the first orthographic projection P131 of a first microlens 131 on the first reference plane P1 in the RC region shown. (See diagram below.) Figure 7 and Figure 8 The first shape of the first orthographic projection P131 of each of the first microlenses 131 shown is A=1 and the included angle θ is approximately 90 degrees.

[0107] In addition, in other embodiments, each of the first microlenses 131 of the first microlens array 13 can be any other shape, such as a rectangle that is also polygonal, or an ellipse.

[0108] Figure 9 This is a planar schematic diagram of the fourth type of first microlens array 13 of the present invention, viewed along the first direction d1. Figure 10 yes Figure 9 The diagram shows an enlarged view of the first orthographic projection P131 of a first microlens 131 on the first reference plane P1 in the RD region shown. In this embodiment, the first orthographic projection P131 of each first microlens 131 has a first shape of rectangle, so the first axis L1 is the line connecting the midpoints of the two more distant opposite sides of the rectangle, and the second axis W1 is the line connecting the midpoints of the two more near opposite sides of the rectangle.

[0109] Figure 11 This is a planar schematic diagram of the fifth type of first microlens array 13 of the present invention, viewed along the first direction d1. Figure 12 yes Figure 11 The diagram shows an enlarged view of the first orthographic projection P131 of a first microlens 131 on the first reference plane P1 in the RE region shown. In this embodiment, the first orthographic projection P131 of each first microlens 131 has an elliptical shape, so the first axis L1 is the major axis of the ellipse and the second axis W1 is the minor axis of the ellipse.

[0110] and Figures 3 to 8 The first microlens array 13 described similarly... Figures 9 to 12 The microlens 131 has a first shape whose first axis L1, the first projection P131 onto the first reference plane P1, has an angle θ with respect to the reference line R located on the first reference plane P1 that is greater than 0 degrees and less than or equal to 90 degrees. In different embodiments, θ can be, for example, 15 degrees, 30 degrees, 45 degrees, 40 degrees, 75 degrees, or 90 degrees. Furthermore, the length of the first axis L1 and the length of the second axis W1 also conform to formula (1).

[0111] It should be understood that when the light beam S0 sequentially passes through the first microlens array 13 and the second microlens array 18, and illuminates the reflective light valve 31 as an illumination beam S, after modulation by the reflective light valve 31, the shaping of the light beam S0 by the first microlens array 13 and the second microlens array 18 will cause the angular space of the modulated light beam to correspond to the shape of the first microlens 131 of the first microlens array 13 (the first shape of the first orthographic projection P131 of the first microlens 131 on the first reference plane P1). Furthermore, when the modulated light beam enters the projection lens 40 and is projected onto the second reference plane P2, the contour of the illumination area formed also corresponds to the shape of the first microlens 131. This correspondence refers, for example, to geometric similarity.

[0112] In other words, when the shape of the first microlens 131 is different according to the adjustment of the aspect ratio A and / or the angle is different according to the included angle θ, the outline of the irradiation area formed by the image beam S1 on the second reference plane P2 will also change accordingly.

[0113] The application of the present invention in three different reflective light valves 31 will be further described below.

[0114] Figure 13 This is a planar schematic diagram of the first type of reflective light valve 31. Figure 14 This is a planar schematic diagram of a micromirror 311 in the first type of reflective light valve 31. (See diagram below.) Figure 13 As shown, the reflective light valve 30 includes a plurality of micromirrors 311 arranged in an array, forming an effective imaging area V. The effective imaging area V has a long side L3 and a short side W3. Each of the plurality of micromirrors 311 has a rotation axis Ax1, and each of the plurality of micromirrors 311 can be operated in a first state with a first deflection angle, a second state without deflection angle, and a third state with a second deflection angle by rotation about the rotation axis Ax1. In one embodiment, the first state of each micromirror 311 is, for example, on-State, the second state is, for example, flat-State, and the third state is, for example, off-State. In the first type of reflective light valve 31, the rotation axis Ax1 is parallel to the short side W3 of the effective imaging area of ​​the light valve 31, and the illumination beam S is incident from the direction of the short side W3.

[0115] Figure 15 This is a schematic diagram showing the different irradiation areas formed on the second reference plane P2 after the illumination beam is incident on the micro-reflector 311 under different states of the first type of reflective light valve 31.

[0116] Please refer to the above. Figures 13 to 15As shown, in the first type of reflective light valve 31, when each of the plurality of micromirrors 311 is in the first state, the illumination beam S is incident on the plurality of micromirrors 311 and is reflected by the plurality of micromirrors 311 to form a first beam. The first beam enters the projection lens 40 as an image beam S1, and the first beam S1 forms a first illumination area r1 on the second reference plane P2. When each of the plurality of micromirrors 311 is in the second state, the illumination beam S is incident on the plurality of micromirrors 311 and is reflected by the plurality of micromirrors 311 to form a second beam, and the second beam forms a second illumination area r2 on the second reference plane P2. When each of the plurality of micromirrors 311 is in the third state, the illumination beam S is incident on the plurality of micromirrors 311 and is reflected by the plurality of micromirrors 311 to form a third beam, and the third beam forms a third illumination area r3 on the second reference plane P2. In addition, the third beam will also form a diffraction stripe ro on the second reference plane P2, centered on the third irradiation area r3.

[0117] As explained above, the contours of the illumination areas formed by the first, second, and third beams reflected by the reflective light valve 31 on the second reference plane P2 where the aperture AP of the projection lens 40 is located will correspond to the shape of the first microlens 131 of the first microlens array 13. Therefore, the shapes of the first illumination area r1, the second illumination area r2, and the third illumination area r3 correspond to the first shape of the first orthographic projection P131 of the first microlens 131 on the first reference plane P1. For example, as Figure 15 The shapes of the first irradiation region r1, the second irradiation region r2, and the third irradiation region r3 shown are as follows: Figure 5 and Figure 6 The first shape of the first microlens 131 of the second type of first microlens array 13 shown corresponds to the first orthographic projection P131 on the first reference plane P1.

[0118] The relationship between the first irradiation area r1, the first type of reflective light valve 31, and the illumination beam S will be further explained next. Figure 16 This is a schematic diagram of the orthographic projection Pr1 formed on the reflective light valve 31 by the first irradiation area r1.

[0119] Further reference Figure 5 , Figure 6 and Figure 16As shown, the orthographic projection Pr1 formed on the reflective light valve 31 by the first illumination area r1 has mutually perpendicular projection major axis PL1 and projection minor axis PW1. The projection major axis PL1 and projection minor axis PW1 correspond to the first axis L1 and second axis W1 of the first orthographic projection P131 of the first microlens 311 on the first reference plane P1, respectively. When the illumination beam S is incident on the reflective light valve 31, the orthographic projection Pr1 of the optical axis (principal ray) of the illumination beam S on the reflective light valve 31 is the first projection optical axis F, and the first projection optical axis F is parallel to the projection minor axis PW1 of the orthographic projection Pr1 of the first illumination area r1 on the reflective light valve 31. Thus, with the ratio of the projection major axis PL1 and the projection minor axis PW1 remaining unchanged, the parallelism of the first projection optical axis F and the projection minor axis PW1 ensures that the distance between the second illumination area r2 and the first illumination area r1 is maximized, thereby preventing the second beam generated by the micromirror 311 in the second state from entering the aperture AP.

[0120] Furthermore, since the projection major axis PL1 and projection minor axis PW1 correspond to the first axis L1 and the second axis W1 respectively, the lengths of the projection major axis PL1 and the projection minor axis PW1 conform to the following formula (2), which is similar to formula (1):

[0121]

[0122] Where D3 is the length of the projection major axis PL1, and D4 is the length of the projection minor axis PW1, and A is still the aspect ratio.

[0123] Furthermore, the projection long axis PL1 and the long side L3 of the effective imaging area V of the reflective light valve 31 have an angle θ2 greater than 0 degrees and less than or equal to 90 degrees.

[0124] In the first application architecture of the reflective light valve 31, since the first projection optical axis F is parallel to the long side L3 of the effective imaging area V, and the first projection optical axis F should be parallel to the projection minor axis PW1, the angle θ2 between the projection major axis PL1 and the long side L3 of the effective imaging area V is approximately 90 degrees.

[0125] Figure 17 This is a planar schematic diagram of the second type of reflective light valve 31. Figure 18 This is a planar schematic diagram of a micromirror 311 in the second type of reflective light valve 31.

[0126] like Figure 17 and Figure 18As shown, the second type of reflective light valve 31 has a similar component composition to the first type of reflective light valve 31. The difference is that the rotation axis Ax of each micromirror 311 is not parallel to the long side L3 and the short side W3 of the effective imaging area V of the light valve 31. Each micromirror 311 of the second type of reflective light valve 31 is also suitable for operation in a first state with a first deflection angle, a second state without a deflection angle, and a third state with a second deflection angle.

[0127] Figure 19 This is a schematic diagram showing the different irradiation areas formed on the second reference plane P2 after the illumination beam is incident on the micro-reflector 311 under different states of the second type of reflective light valve 31.

[0128] Please refer to the above. Figure 19 As shown, when each of the multiple micromirrors 311 is in the first state, the illumination beam S is reflected by the multiple micromirrors 311 to form a first beam as an image beam S1, and a first illumination area r1 is formed on the second reference plane P2; when each of the multiple micromirrors 311 is in the second state, the illumination beam S is reflected by the multiple micromirrors 311 to form a second beam, and a second illumination area r2 is formed on the second reference plane P2; when each of the multiple micromirrors 311 is in the third state, the illumination beam S is reflected by the multiple micromirrors 311 to form a third beam, and the third beam forms a third illumination area r3 and diffraction stripes r0 on the second reference plane P2.

[0129] In the second type of reflective light valve 31 application architecture, the illumination beam S is adapted to operate in a state in which the projection light axis F is not parallel to both the long side L3 and the short side W3.

[0130] Similar to the principle of the first type of reflective light valve 31, the outline of the illumination area formed by the first beam, the second beam and the third beam reflected by the reflective light valve 31 on the second reference plane P2 where the aperture AP of the projection lens is located will correspond to the shape of the first microlens 131 of the first microlens array 13. Therefore, the shapes of the first illumination area r1, the second illumination area r2 and the third illumination area r3 correspond to the first shape of the first orthographic projection P131 of the first microlens 131 on the first reference plane P1.

[0131] Next, we will further explain the relationship between the first illumination area r1, the reflective light valve 31, and the illumination beam S under the application architecture of the second type of reflective light valve 31. Figure 20 This is a schematic diagram of the orthographic projection Pr1 of the first irradiation area r1 onto the reflective light valve 31.

[0132] Further reference Figure 3 , Figure 4 and Figure 20As shown, the orthographic projection Pr1 of the first illumination area r1 on the reflective light valve 31 has mutually perpendicular projection major axis PL1 and projection minor axis PW1. The projection major axis PL1 and projection minor axis PW1 correspond to the first axis L1 and the second axis W1 of the first orthographic projection P131 of the first microlens 311 on the first reference plane P1, respectively. When the illumination beam S is incident on the reflective light valve 31, the orthographic projection Pr1 of the optical axis of the illumination beam S on the reflective light valve 31 is the first projection optical axis F, and the first projection optical axis F is parallel to the projection minor axis PW1. Thus, with the ratio of the projection major axis PL1 and the projection minor axis PW1 remaining unchanged, the parallelism of the first projection optical axis F and the projection minor axis PW1 ensures that the distance between the second illumination area r2 and the first illumination area r1 is maximized, thereby preventing the second beam generated by the micromirror 311 in the second state from entering the aperture AP.

[0133] Since the projection major axis PL1 and projection minor axis PW1 correspond to the first axis L1 and the second axis W1 respectively, the length of the projection major axis PL1 and the length of the projection minor axis PW1 also conform to formula (2), which is similar to formula (1), and will not be repeated here.

[0134] In the second application architecture of the reflective light valve 31, since the first projection optical axis F is not parallel to the long side L3 and the short side W3 of the effective imaging area V, and the projection short axis PW1 should be parallel to the first projection optical axis F, the projection long axis PL1 is also not parallel to the long side L3 and the short side W3 of the effective imaging area V. In some embodiments, the angle θ2 between the projection long axis PL1 of the orthographic projection Pr1 and the long side L3 of the effective imaging area V is approximately 45 degrees.

[0135] Figure 21 This is a planar schematic diagram of the third type of reflective light valve 31. Figure 22 This is a planar schematic diagram of a micro-reflector 311 in the third type of reflective light valve 31.

[0136] like Figure 21 and Figure 22 As shown, the third type of reflective light valve 31 has a similar component composition to the first type of reflective light valve 31. The difference is that each micromirror 311 includes a rotation axis Ax and a pivot axis Ax2. The pivot axis Ax2 and the rotation axis Ax1 are, for example, arranged perpendicularly to each other, and the rotation axis Ax and the pivot axis Ax2 are not parallel to the long side L3 and the short side W3 of the effective imaging area V of the reflective light valve 31, respectively. Each micromirror 311 can rotate about the pivot axis Ax2 and / or the rotation axis Ax1. Each micromirror 311 of the third type of reflective light valve 31 is also suitable for operation in a first state with a first deflection angle, a second state without a deflection angle, and a third state with a second deflection angle.

[0137] Figure 23This is a schematic diagram showing the different irradiation areas formed on the second reference plane P2 after the illumination beam is incident on the micro-reflector 311 under different states and the third type of reflective light valve 31.

[0138] Please refer to the above. Figure 23 As shown, when each of the multiple micromirrors 311 is in the first state, the illumination beam S is reflected by the multiple micromirrors 311 to form a first beam as an image beam S1, and a first illumination area r1 is formed on the second reference plane P2; when each of the multiple micromirrors 311 is in the second state, the illumination beam S is reflected by the multiple micromirrors 311 to form a second beam, and a second illumination area r2 is formed on the second reference plane P2; when each of the multiple micromirrors 311 is in the third state, the illumination beam S is reflected by the multiple micromirrors 311 to form a third beam, and the third beam forms a third illumination area r3 and diffraction stripes r0 on the second reference plane P2.

[0139] In the application architecture of the third type of reflective light valve 31, the illumination beam S is adapted to operate in a state where the projection optical axis F is parallel to the long side L3, thereby producing a result such as Figure 23 The arrangement of the first irradiation area r1, the third irradiation area r3, and the third irradiation area r3 is shown.

[0140] Similar to the principles of the first and second reflective light valves 31, the contours of the illumination areas formed by the first, second, and third beams reflected by the reflective light valve 31 on the second reference plane P2 where the aperture AP of the projection lens is located will correspond to the shape of the first microlens 131 of the first microlens array 13. Therefore, the shapes of the first illumination area r1, the second illumination area r2, and the third illumination area r3 correspond to the first shape of the first orthographic projection P131 of the first microlens 131 on the first reference plane P1. For example, as... Figure 24 The shapes of the first irradiation region r1, the second irradiation region r2, and the third irradiation region r3 shown are as follows: Figure 5 and Figure 6 The first microlens 131 of the second type of first microlens array 13 shown corresponds to the first shape of the first orthographic projection P131 of the first reference plane P1.

[0141] Next, the relationship between the first illumination area r1 of the third type of reflective light valve 31, the reflective light valve 31, and the illumination beam S will be further explained. Figure 24 This is a schematic diagram of the orthographic projection Pr1 of the first irradiation area r1 onto the reflective light valve 31.

[0142] Please refer to this as well. Figure 5 , Figure 6 and Figure 24As shown, the orthographic projection Pr1 of the first illumination area r1 on the reflective light valve 31 has mutually perpendicular projection major axis PL1 and projection minor axis PW1. The projection major axis PL1 and projection minor axis PW1 correspond to the first axis L1 and second axis W1 of the first orthographic projection P131 of the first microlens 311 on the first reference plane P1, respectively. When the illumination beam S is incident on the reflective light valve 31, the orthographic projection Pr1 of the optical axis (principal ray) of the illumination beam S on the reflective light valve 31 is the first projection optical axis F, and the first projection optical axis F is parallel to the projection minor axis PW1. Thus, with the ratio of the projection major axis PL1 and the projection minor axis PW1 remaining unchanged, the parallelism of the first projection optical axis F and the projection minor axis PW1 ensures that the distance between the second illumination area r2 and the first illumination area r1 is maximized, thereby preventing the second beam generated by the micromirror 311 in the second state from entering the aperture AP.

[0143] Since the projection major axis PL1 and projection minor axis PW1 correspond to the first axis L1 and the second axis W1 respectively, the length of the projection major axis PL1 and the length of the projection minor axis PW1 also conform to formula (2), which is similar to formula (1), and will not be repeated here.

[0144] In the third type of reflective light valve 31 application architecture, since the first projection optical axis F is parallel to the long side L3 of the effective imaging area V, and the first projection optical axis F should be parallel to the projection short axis PW1, the projection short axis PW1 is also parallel to the long side L3 of the effective imaging area V, while the projection long axis PL1 is perpendicular to the long side L3 of the effective imaging area V, that is, the included angle θ2 is approximately 90 degrees.

[0145] In summary, regardless of the type of reflective light valve 31 (first to third), by setting the shape and angle of the first microlens 131, the overlapping area of ​​the first illumination area r1 and the second illumination area r2 generated by the reflected light beam from the reflective light valve 31 can be reduced, the distance between them can be increased, and / or they can be completely non-overlapping. More preferably, the second illumination area r2 can be made completely non-overlapping with the aperture AP. In this way, the second light beam generated by the micromirror 311 of the reflective light valve 31 in the second state will not enter the aperture AP of the projection lens 40, allowing only the first light beam generated by the micromirror 311 of the light valve 31 in the first state to serve as the image beam S1 and enter the aperture AP to form a projected image, thus improving contrast without sacrificing brightness. Furthermore, because the distance between the first illumination area r1, the second illumination area r2, and the third illumination area r3 formed by the corresponding micromirror 311 in different states is relatively large, the diffraction stripe r0 generated by the third light beam can be moved away from the aperture AP, further enhancing contrast. Even better, the second illumination area r2 and the third illumination area r3 do not overlap with the aperture on the second reference plane P2, thereby improving the image quality.

[0146] It should be noted that in this case Figures 13 to 24 The illustration uses a hexagonal shape as an example of the first orthographic projection P131 of the first microlens array 13, but the invention is not limited thereto. (Similar to...) Figures 8 to 12 As shown, the first shape can also be a rectangle or an ellipse or other shapes, as long as the length ratio and shape of its first axis L1 and second axis W1 can meet the requirement that the distance between the first irradiation area r1 and the second irradiation area r2 generated by the reflective light valve 31 is greater and / or completely non-overlapping.

[0147] Please refer to the following: Figure 1 , Figure 3 and Figure 13 In some embodiments, the reference line R is parallel to the long side of the projection of the long side L3 of the effective imaging area V of the reflective light valve 31 onto the orthogonal projection of the first reference plane P1.

[0148] Figure 25 It is based on Figure 3 A simulation diagram of the first irradiation region r1 formed by the first microlens array 13 shown.

[0149] Figure 26 It is based on Figure 5 A simulation diagram of the first irradiation region r1 formed by the first microlens array 13 shown.

[0150] Depend on Figure 25 and Figure 26 It can be seen that the illumination area formed by the image beam S1 on the second reference plane P2 does indeed correspond to or resemble the first shape of the first orthographic projection P131 of the first microlens 131.

[0151] Figure 27 This is a comparison chart of several simulation results under the first reflective light valve 31 architecture. Please refer to it as well. Figures 3 to 8 Simulation 1 is a simulation with an aspect ratio A = 1 and an included angle θ of 0 degrees for the first orthographic projection P131 of the first microlens 131, which is a simulation that has not yet applied the technical means of the present invention; Simulation 2 is a simulation with an aspect ratio A = 1 and an included angle θ of approximately 90 degrees for the first orthographic projection P131 of the first microlens 131; Simulation 3 is a simulation with an aspect ratio A = 0.5 and an included angle θ of approximately 90 degrees for the first orthographic projection P131 of the first microlens 131.

[0152] As shown in the schematic diagrams of the first to third illumination areas in Simulations 1 to 3, the second illumination area r2 in Simulation 2 does not overlap with the first illumination area r1; the second illumination area r2 in Simulation 3 does not overlap with the first illumination area r1 and does not overlap with the aperture AP. Further, based on the simulation results, if the brightness and contrast of the first illumination area generated in Simulation 1 are taken as a baseline (100%), the brightness of the first illumination area generated in Simulation 2 decreases by 1.1% (-1.1%), and the contrast increases by 33.3% (+33.3%); the brightness of the first illumination area generated in Simulation 3 decreases by 0.4% (-0.4%), and the contrast increases by 161.1% (+161.1%). Therefore, it can be seen that the present invention, by changing the shape and angle of the first microlens 131, effectively achieves the purpose of significantly increasing contrast and reducing brightness loss. In addition, the present invention can also solve the problem of uneven red light in the image. Specifically, in the existing projector, the micro-reflective mirrors 311 of the reflective light valve 31 in the third state cause local uneven red light in the projected image due to the red light diffraction stripes. Through the design of the first microlens array of the present invention, the red light diffraction stripes entering the aperture in the above state are further reduced, thereby improving the problem of local uneven red light.

[0153] It should be noted that, in this document, the terms "comprising," "including," or any other variations thereof are intended to cover non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements includes not only those elements but also other elements not expressly listed, or elements inherent to such a process, method, article, or apparatus. Unless otherwise specified, an element defined by the phrase "comprising one..." does not exclude the presence of other identical elements in the process, method, article, or apparatus that includes that element.

[0154] The above description is merely a preferred embodiment of the present invention and should not be construed as limiting the scope of the invention. Any simple equivalent changes and modifications made in accordance with the claims and description of the invention are still within the scope of this patent. Furthermore, no embodiment or claim of the present invention needs to achieve all the objectives, advantages, or features disclosed in the invention. In addition, the abstract and title (invention title) are only used to assist in patent document retrieval and are not intended to limit the scope of the invention. Furthermore, the terms "first," "second," etc., mentioned in this specification or claims are only used to name elements or distinguish different embodiments or scopes, and are not used to limit the upper or lower limit of the number of elements.

Claims

1. A projector characterized by comprising: The projector includes an illumination module, a reflective light valve, and a projection lens: The illumination module is used to provide an illumination beam. The illumination module includes a light source device and a first microlens array. The light source device generates a beam. The first microlens array includes a plurality of closely arranged first microlenses. Each of the plurality of first microlenses forms a first orthographic projection on a first reference plane. The first orthographic projection has a first shape. The first microlens array is disposed on the transmission path of the beam. The beam passes through the first microlens array sequentially and exits the illumination module as the illumination beam. The reflective light valve is disposed on the transmission path of the illumination beam to convert the illumination beam into an image beam. The reflective light valve includes a plurality of micromirrors arranged in an array, the plurality of micromirrors forming an effective imaging area having a long side and a short side. Each of the plurality of micromirrors is adapted to be operated in a first state having a first deflection angle and a second state without a deflection angle; wherein... When each of the plurality of micromirrors is in the first state, the illumination beam is incident on the plurality of micromirrors, and the illumination beam is reflected by the plurality of micromirrors to form a first beam, which enters the projection lens as an image beam; When each of the plurality of micromirrors is in the second state, the illumination beam is incident on the plurality of micromirrors, and the illumination beam is reflected by the plurality of micromirrors to form a second beam; The projection lens is positioned along the transmission path of the image beam to project the image beam out of the projector and form an image. The projection lens includes an aperture located on a second reference plane perpendicular to the optical axis of the projection lens. The first beam forms a first illumination area on the second reference plane, and the second beam forms a second illumination area on the second reference plane. The shapes of the first illumination area and the second illumination area correspond to the first shape, and the first illumination area overlaps with the aperture. The orthogonal projection of the first illumination area on the reflective light valve has a major projection axis and a minor projection axis, and the major projection axis is perpendicular to the minor projection axis. The angle between the major projection axis and the long side of the effective imaging area is greater than 0 degrees and less than or equal to 90 degrees.

2. The projector of claim 1, wherein, The second irradiation area does not overlap with the aperture at all.

3. The projector of claim 1, wherein, Each of the plurality of micromirrors is also adapted to be operated in a third state having a second deflection angle. When each of the plurality of micromirrors is in the third state, the illumination beam is incident on the plurality of micromirrors and the illumination beam is reflected by the plurality of micromirrors to form a third beam. The third beam forms a third illumination area on the second reference plane, wherein the first illumination area and the third illumination area do not overlap at all.

4. The projector as described in claim 1, characterized in that, When the illumination beam is incident on the reflective light valve, the orthogonal projection of the optical axis of the illumination beam onto the reflective light valve is the first projection optical axis; the first projection optical axis is parallel to the projection minor axis.

5. The projector as described in claim 4, characterized in that, The plurality of micromirrors of the reflective light valve form an effective imaging area, the effective imaging area having a long side and a short side, each of the plurality of micromirrors having a rotation axis, the rotation axis being non-parallel to the long side and the short side of the effective imaging area.

6. The projector as described in claim 4, characterized in that, The plurality of micromirrors of the reflective light valve form an effective imaging area, the effective imaging area having a long side and a short side, each of the plurality of micromirrors having a rotation axis, the rotation axis being parallel to the short side of the effective imaging area.

7. The projector as described in claim 4, characterized in that, The plurality of micromirrors of the reflective light valve form an effective imaging area, the effective imaging area having a long side and a short side, each of the plurality of micromirrors having a rotation axis and a pivot axis that are perpendicular to each other, and the rotation axis and the pivot axis are not parallel to the long side and the short side of the effective imaging area.

8. The projector as described in any one of claims 4 to 7, characterized in that, The length of the major axis of the projection conforms to the length of the minor axis of the projection: Where D1 is the length of the major axis of the projection, D2 is the length of the minor axis of the projection, and 0.3≤A≤1.

9. The projector as described in claim 4, characterized in that, The first microlens array is disposed along the first reference plane, and the light beam is incident on the first microlens array along the first incident direction, which is perpendicular to the first reference plane; the first shape has a first axis and a second axis, the length of the first axis is greater than the length of the second axis, and the projection major axis and projection minor axis of the orthographic projection of the first irradiation area on the reflective light valve correspond to the first axis and the second axis, respectively.

10. The projector as described in claim 9, characterized in that, The first axis and the second axis are the axes of symmetry of the first shape.

11. The projector as claimed in claim 10, characterized in that, The first shape is a quadrilateral, a hexagon, or an octagon.

12. The projector as claimed in claim 11, characterized in that, The first shape is a polygon, and the line connecting two opposite angles of the polygon forms the first axis, while the line connecting the midpoints of two opposite sides of the polygon forms the second axis. The first axis and the second axis are perpendicular.

13. The projector as claimed in claim 10, characterized in that, The first shape is an ellipse, the first axis is the major axis of the ellipse, and the second axis is the minor axis of the ellipse.

14. The projector as described in claim 9, characterized in that, The lengths of the first axis and the second axis are consistent: Where D3 is the length of the first axis, D4 is the length of the second axis D2, and A is a real number and 0.3≤A≤1.

15. The projector as described in claim 9, characterized in that, The first axis of the first shape has an angle greater than or equal to 0 degrees and less than or equal to 90 degrees relative to a reference line, the reference line being located on the first reference plane and parallel to a long side of the projected orthographic projection of the effective imaging area of ​​the reflective light valve onto the first reference plane.

16. The projector as claimed in claim 1, characterized in that, The illumination module includes a second microlens array, which is arranged in the transmission path of the light beam, and the light beam passes through the first microlens array and the second microlens array in sequence.

17. The projector as claimed in claim 16, characterized in that, The direction in which the light beam enters the first microlens array is parallel to and opposite to the direction in which the light beam enters the second microlens array.

18. The projector as claimed in claim 16, characterized in that, include: A light-transmitting element is disposed along the first reference plane and has a first region and a second region. The first microlens array is disposed in the first region and the second microlens array is disposed in the second region.

Images