Apparatus for manufacturing mask

Abstract

An apparatus for manufacturing a mask is provided. The apparatus includes: a stage body portion inclined with respect to a direction of gravity and configured to accommodate a mask frame having an opening therein; a contact portion protruding from one surface of the stage body portion toward the mask frame; and a moving portion configured to move the contact portion. The apparatus may manufacture a mask using a mask assembly with reduced deformation.

Description

[0001] This application claims priority to and the benefit of Korean Patent Application No. 10-2023-0082892 filed in the Korean Intellectual Property Office on June 27, 2023, the disclosure of which is incorporated herein in its entirety by reference. Technical Field

[0002] Aspects of embodiments of the present disclosure relate to an apparatus and method for manufacturing a mask. Background Art

[0003] The display device visually displays data. The display device can display images by using light emitting diodes. The purpose and structure of the display device have been diversified, and a structure that can be bent from a flat state to have a preset angle has also been developed.

[0004] The display device may include a plurality of pixels for displaying an image. In this case, the intermediate layer including the emission layer may be arranged in the plurality of pixels having a pattern shape. The pattern shape should be set on the substrate according to the type of the intermediate layer. Utility Model Content

[0005] When an intermediate layer having a pattern shape is disposed on a substrate, the quality of an image displayed by a display device is determined by how accurately the intermediate layer is disposed. For this purpose, when forming the intermediate layer, deformation of a mask component for forming the intermediate layer having (or in) a pattern shape is an important issue. The utility model aims to provide an apparatus for manufacturing a mask using a mask component with reduced deformation and a method for manufacturing a mask using a mask component with reduced deformation.

[0006] Additional aspects and features of the disclosure will be set forth in part in the description which follows and, in part, will be apparent from the description, or may be learned by practice of the described embodiments of the disclosure.

[0007] According to an embodiment of the present disclosure, an apparatus for manufacturing a mask includes: a stage main body portion inclined relative to a gravity direction and configured to accommodate a mask frame having an opening therein; a contact portion protruding from one surface of the stage main body portion toward the mask frame; and a moving portion configured to move the contact portion.

[0008] At least a portion of the contact portion may overlap the mask frame.

[0009] The contact portion may be arranged to correspond to an edge of the mask frame.

[0010] The contact portion may include a magnet.

[0011] The magnet of the contact portion may be configured not to exhibit magnetism when current flows therethrough.

[0012] The moving portion may be between the contact portion and the stage main body portion.

[0013] The moving part may comprise a translating element.

[0014] The moving part may include an elastic body corresponding to at least one of the moving directions of the contact part, and may be configured to exhibit elastic force to the contact part. The contact part may have a plurality of surfaces, the elastic body may be provided in plurality, and each surface of the contact part may be connected to at least one elastic body corresponding thereto.

[0015] The number of elastic bodies connected to one of the plurality of surfaces may be different from the number of elastic bodies connected to another of the plurality of surfaces.

[0016] The apparatus may further include a second support member protruding from one surface of the stage body portion and configured to support one surface of the mask frame.

[0017] According to another embodiment of the present disclosure, a method for manufacturing a mask includes the following steps: arranging a mask frame having an opening on a mask stage tilted relative to a gravity direction; and attaching a mask sheet to the mask frame. The mask stage includes: a stage body portion; a contact portion protruding from one surface of the stage body portion toward the mask frame; and a moving portion configured to move the contact portion.

[0018] The method may further include seating the mask frame on a second support protruding from one surface of the mask stage.

[0019] The method may further include bringing the mask frame into close contact with the contact portion by using a magnet provided to the contact portion.

[0020] The magnet of the contact portion may be configured not to exhibit magnetism when current flows therethrough.

[0021] The method may further include stretching the mask frame.

[0022] The moving portion may include an elastic body configured to apply an elastic force and corresponding to at least one of the moving directions of the contact portion.

[0023] The contact portion may be arranged to correspond to an edge of the mask frame.

[0024] At least a portion of the contact portion may overlap the mask frame.

[0025] The method may further include moving the mask frame relative to the mask stage.

[0026] By using the apparatus for manufacturing a mask in the present invention, when deposition is performed with the mask assembly tilted relative to the lower surface of the chamber, a deposition material can be deposited on a display substrate in a precise pattern. BRIEF DESCRIPTION OF THE DRAWINGS

[0027] The above and other aspects and features of the present disclosure will become more apparent through the following description in conjunction with the accompanying drawings, in which:

[0028] Figure 1 is a schematic cross-sectional view of a portion of an apparatus for manufacturing a display device according to an embodiment;

[0029] Figure 2 is a schematic perspective view of a portion of an apparatus for manufacturing a mask according to an embodiment;

[0030] Figure 3 is a schematic front view of a portion of an apparatus for manufacturing a mask according to an embodiment;

[0031] Figure 4A and Figure 4B is a schematic cross-sectional view of a portion of an apparatus for manufacturing a mask according to an embodiment;

[0032] Figure 5 is an enlarged cross-sectional view of a portion of an apparatus for manufacturing a mask according to an embodiment;

[0033] Fig. 6A and Figure 6B is an enlarged front view of a portion of an apparatus for manufacturing a mask according to an embodiment;

[0034] Fig. 7A and Figure 7B is a schematic cross-sectional view showing a state of an operation process of an apparatus for manufacturing a mask according to an embodiment;

[0035] FIG. 8A to FIG. 8C is a schematic front view showing steps of a method for manufacturing a mask according to an embodiment;

[0036] Fig. 9 is a schematic plan view of a display device according to an embodiment; and

[0037] Fig.10 It is along Fig. 9 A cross-sectional view taken along line XX'. DETAILED DESCRIPTION

[0038] Now will be referred to in detail embodiments, examples of which are shown in the accompanying drawings. In this regard, the described embodiments may have different forms, and the present disclosure should not be construed as being limited to the description (or embodiments) set forth herein. Therefore, embodiments of the present disclosure are described below only by reference to the accompanying drawings to explain aspects and features of this specification.

[0039] Because the present disclosure allows various changes and many embodiments, some embodiments will be shown in the drawings and described in the written description. The aspects and features of the present disclosure and the methods for achieving these aspects and features will become apparent with reference to the embodiments described in detail below with reference to the drawings. However, the present disclosure is not limited to the following embodiments and can be implemented in various forms.

[0040] Hereinafter, embodiments will be described with reference to the accompanying drawings, in which like reference numerals denote like elements throughout and repeated descriptions thereof will be omitted.

[0041] Although terms such as "first" and "second" may be used to describe various elements, the elements are not limited to these terms. These terms are used to distinguish one element from another.

[0042] As used herein, the singular forms "a", "an" and "the" are intended to include the plural forms as well, unless the context clearly indicates otherwise.

[0043] It will be understood that the terms “comprises” and variations thereof, “comprising” and variations thereof as used herein specify the presence of stated features or components, but do not preclude the addition of one or more other features or components.

[0044] It will also be understood that when a layer, region or element is referred to as being “on” another layer, region or element, it can be directly or indirectly on the other layer, region or element. That is, for example, intervening layers, regions or elements may be present.

[0045] For convenience of explanation, the size of the elements in the drawings may be exaggerated or reduced. As an example, for convenience of description, the size and thickness of each element shown in the drawings are arbitrarily represented, and thus the present disclosure is not necessarily limited thereto.

[0046] In the case where certain embodiments may be implemented differently, a specific process sequence may be performed in a different order than described. As an example, two processes described in succession may be performed simultaneously (or in parallel) or in a reverse order.

[0047] In this specification, "A and / or B" refers to A or B or A and B. In this specification, "at least one of A and B" refers to A or B or A and B. When expressions such as "at least one of..." and "any one of..." are before (or after) a column of elements, the entire column of elements is modified without modifying the individual elements in the column. For example, the expression "at least one of a, b, and c" means only a, only b, only c, both a and b, both a and c, both b and c, all of a, b, and c, or variations thereof. As used herein, the term "use" and variations thereof may be considered to be synonymous with the term "utilize" and variations thereof, respectively. As used herein, the terms "substantially", "about", and similar terms are used as approximate terms rather than degree terms, and are intended to explain the inherent deviations of measured or calculated values ​​that will be recognized by those of ordinary skill in the art.

[0048] It will be understood that when a layer, region, or element is referred to as being "connected" to another layer, region, or element, the layer, region, or element may be "directly connected" to the other layer, region, or element, or may be "indirectly connected" to the other layer, region, or element with the other layer, region, or element interposed therebetween. For example, it will be understood that when a layer, region, or element is referred to as being "electrically connected" to another layer, region, or element, the region, layer, or element may be "directly electrically connected" to the other layer, region, or element, or may be "indirectly electrically connected" to the other layer, region, or element with the other layer, region, or element interposed therebetween.

[0049] The first direction, the second direction, and the third direction are not limited to directions corresponding to the three axes of the rectangular coordinate system, and can be interpreted in a broader sense. For example, the first direction, the second direction, and the third direction can be perpendicular to each other, or can represent different orientations that are not perpendicular to each other.

[0050] The x direction, y direction, and z direction are not limited to directions corresponding to the three axes of the rectangular coordinate system, and can be interpreted in a broader sense. For example, the x direction, y direction, and z direction can be perpendicular to each other, or can represent different orientations that are not perpendicular to each other. The ±x direction (or x direction) can include the +x direction and the -x direction, the ±y direction (or y direction) can include the +y direction and the -y direction, and the ±z direction (or z direction) can include the +z direction and the -z direction.

[0051] Figure 1 is a schematic cross-sectional view of a portion of an apparatus for manufacturing a display apparatus according to an embodiment.

[0052] Reference Figure 1 , the apparatus 100 for manufacturing a display device may be a deposition apparatus in which deposition is performed.

[0053] The apparatus 100 for manufacturing a display device may be configured to perform deposition on a display substrate D of the display device. The apparatus 100 for manufacturing a display device may include a chamber 110, a deposition source 120, a first support 130, a first support block 140, a mask assembly 150, and a pressure regulator 160.

[0054] The chamber 110 may have an open portion so that the display substrate D as an object to be processed is introduced into the chamber 110 or discharged to the outside of the chamber 110. An opening / closing portion 111 such as a gate valve may be provided in the open portion of the chamber 110. In such an embodiment, since the opening / closing portion 111 is selectively opened, the display substrate D as an object to be processed can be loaded into the chamber 110 or unloaded to the outside of the chamber 110.

[0055] The deposition source 120 may be configured to supply a deposition material toward the mask assembly 150. In such an embodiment, the deposition source 120 may include a deposition material supplying portion 121, a source portion 122, and a nozzle portion 123.

[0056] The deposition material supply part 121 may be configured to contain the deposition material and supply the deposition material to the source part 122. In such an embodiment, the deposition material supply part 121 may be disposed outside or inside the chamber 110. The deposition material supply part 121 may be configured to supply the deposition material to the source part 122 by (or including) a pump or the like. Hereinafter, for ease of description, an embodiment in which the deposition material supply part 121 is disposed outside the chamber 110 is mainly described in detail.

[0057] The source part 122 may be disposed inside the chamber 110 and connected to the deposition material supply part 121 to evaporate or sublime the deposition material. The source part 122 may include a crucible in which the deposition material is accommodated and a heater for heating the crucible.

[0058] The nozzle portion 123 may be connected to the source portion 122. In such an embodiment, the nozzle portion 123 may be connected to the source portion 122 by a tube or the like. At least one nozzle portion 123 may be included in the device 100 for manufacturing a display device. The nozzle portion 123 may be formed in a rectangular column shape. In such an embodiment, the long side portion of the nozzle portion 123 may be arranged obliquely relative to the third direction DR3. For example, the angle at which the nozzle portion 123 is inclined may be equal to or similar to the angle at which the mask assembly 150 is inclined. The nozzle portion 123 may include a jetting portion through which the deposition material is jetted. The jetting portion may have a circular hole shape. In another embodiment, the jetting portion may have a hole (or opening) having a long narrow slot shape. In another embodiment, the jetting portion may have a shape protruding from the outer surface of the nozzle portion 123.

[0059] The first support member 130 and the first support block 140 may support the mask assembly 150. In such an embodiment, the first support member 130 and the first support block 140 may support the mask assembly 150 in an inclined state relative to the lower surface (or ground) of the chamber 110. For example, the mask assembly 150 may be disposed inside the chamber 110 in an upright state, and the first support member 130 and the first support block 140 may maintain the mask assembly 150 in the upright state.

[0060] The first support member 130 may be formed as a window frame having an opening 131 at a central portion of the first support member 130. The opening 131 may have a shape through which a deposition material supplied from the deposition source 120 may pass. One surface of the first support member 130 (e.g., a surface facing the first support block 140) may have a flat shape. The first support member 130 may be connected to the chamber 110. In such an embodiment, the first support member 130 may be fixed to the lower surface of the chamber 110, or connected to the inner surface of the chamber 110 by a separate structure. Hereinafter, for ease of description, an embodiment in which the first support member 130 is fixed to the lower surface of the chamber 110 is mainly described.

[0061] The first support block 140 may be provided in plurality and disposed on the surface of the first support member 130. The plurality of first support blocks 140 may include a 1-1 support block 141 and a 1-2 support block 142. In such an embodiment, the 1-1 support block 141 and the 1-2 support block 142 may support another surface of the mask assembly 150 (e.g., another surface of the mask frame 151). As an example, the 1-1 support block 141 may support the rear surface of the mask assembly 150 (e.g., the rear surface of the mask frame 151). That is, the 1-1 support block 141 may support one surface of the mask assembly 150 facing the first support member 130. The 1-1 support block 141 may be provided in plurality. In such an embodiment, the plurality of 1-1 support blocks 141 may be spaced apart from each other along the outer surface of the first support member 130. Each of the 1-1 support blocks 141 may be provided between the first support member 130 and the mask assembly 150 to support the mask assembly 150. In other words, between the first support member 130 and the mask assembly 150 , there may be a space in which the 1-1 support blocks 141 are disposed and an empty space between the 1-1 support blocks 141 (eg, between adjacent ones of the 1-1 support blocks 141 ).

[0062] The 1-2 support block 142 may be provided on the first support member 130 to support the lower surface and / or side surface of the mask assembly 150 (e.g., the lower surface or side surface of the mask frame 151). As an example, the 1-2 support block 142 may support one surface of the mask assembly 150 that is not supported by the 1-1 support block 141. In some embodiments, the 1-2 support block 142 may be provided only at the lower portion of the first support member 130. In one embodiment, only one 1-2 support block 142 may be provided, and the one 1-2 support block 142 may be provided on the outer surface of the first support member 130, or in another embodiment, similar to the 1-1 support block 141, the 1-2 support block 142 may be provided in plurality and arranged to be spaced apart from each other along the outer surface of the first support member 130.

[0063] The first support member 130 and the first support block 140 may support the mask assembly 150 in an inclined state. In the inclined state, the upper portion of the mask assembly 150 is further inclined toward (e.g., close to) the deposition source 120 than the lower portion of the mask assembly 150. For example, the inclination angle of the mask assembly 150 may represent an angle between a line (e.g., a line segment extending in the third direction DR3) perpendicular to the lower surface (or the ground) of the chamber 110 and a flat surface of the mask assembly 150. That is, the inclination angle of the mask assembly 150 may represent (or may refer to) an angle at which the mask assembly 150 is inclined relative to the direction of gravity.

[0064] The mask assembly 150 may include a mask frame 151 and a mask sheet 152. The mask frame 151 may have an opening 151-op at the center thereof. For example, the mask frame 151 may be formed similarly to the first support member 130 (eg, have a shape and configuration similar to the first support member 130).

[0065] One surface of the mask frame 151 may be formed to be flat. As an example, one surface of the mask frame 151 contacting the mask sheet 152 may be flat.

[0066] The mask sheet 152 may be arranged to shield the opening 151-op in the mask frame 151 (e.g., overlap with or cover the opening 151-op in the mask frame 151). In such an embodiment, one mask sheet 152 may be provided. In such an embodiment, the mask sheet 152 may entirely shield the opening 151-op. In another embodiment, a plurality of mask sheets 152 may be provided. The plurality of mask sheets 152 may be arranged adjacent to each other and in one direction. As an example, the length direction of each mask sheet 152 may be a direction inclined at an angle (e.g., a preset or predetermined angle) relative to a straight line perpendicular to the lower surface of the chamber 110 (e.g., from Figure 1In addition, the direction along which the plurality of mask sheets 152 are arranged may be Figure 1 In such an embodiment, because a plurality of mask sheets 152 are arranged adjacent to each other, the mask sheets 152 may shield (e.g., may shield together) the opening 151-op in the mask frame 151. Hereinafter, for the convenience of description, an embodiment in which the mask sheet 152 is provided in plurality is mainly illustrated and described in detail.

[0067] The mask assembly 150 may further include a support member disposed in an opening in the mask frame 151 and supporting the mask sheet 152. In such an embodiment, the support member may have a shape in which a portion extending in the second direction DR2 intersects a portion extending in a direction inclined relative to the third direction DR3.

[0068] The pressure regulator 160 may be connected to the chamber 110 and configured to adjust the internal pressure of the chamber 110. The pressure regulator 160 may include a tube 161 connected to the chamber 110 and a pump 162 connected to the tube 161.

[0069] The display substrate D as an object to be processed in the apparatus 100 for manufacturing a display device may be in a form corresponding to any one of the following operations: Fig.10 The described substrate 21 (see e.g. Fig.10 ) to the pixel defining layer 29 (see e.g. Fig.10 As an example, the display substrate D may be in a form in which only the substrate 21 is provided, in a form in which the substrate 21 is provided up to the passivation layer 27, or in a form in which the substrate 21 is provided up to the pixel defining layer 29.

[0070] When the mask assembly 150 is arranged as described above, the deformation due to the weight of the mask assembly 150 may be small compared to when the mask assembly 150 is arranged completely flat relative to the lower surface (or ground) of the chamber 110. In addition, because the deformation of the mask assembly 150 is within a constant (or substantially constant) range, the deposition quality may be improved compared to when the mask assembly 150 is arranged vertically relative to the lower surface of the chamber 110. That is, when the mask assembly 150 is arranged horizontally relative to the lower surface of the chamber 110, the central portion of the mask sheet 152 may sag due to the weight of the elements of the mask assembly 150. In this case, the deposition material passing through the mask sheet 152 may not be deposited on the display substrate D in an accurate pattern. In addition, when the mask assembly 150 is arranged vertically relative to the lower surface (or ground) of the chamber 110, the upper end of the mask frame 151 may be warped, and thus may not support the mask sheet 152. Therefore, the deposition material may not be deposited on the display substrate D in an accurate pattern. However, when deposition is performed with the mask assembly 150 tilted with respect to the lower surface of the chamber 110 , the deposition material may be deposited on the display substrate D in a precise pattern because the above-mentioned problems are reduced.

[0071] Figure 2 is a schematic perspective view of a portion of an apparatus for manufacturing a mask according to an embodiment.

[0072] Figure 2 The first direction DR1, the second direction DR2 and the third direction DR3 shown in FIG. 5 may be the same as above. Figure 1 The apparatus 200 for manufacturing a mask may be tilted relative to the third direction DR3, and the length direction of the apparatus 200 for manufacturing a mask may be the x direction, the height direction thereof may be the z direction, and the thickness direction thereof may be the y direction.

[0073] Reference Figure 2 , an apparatus 200 for manufacturing a mask may include a stage main body portion 201 , a contact portion 210 , a moving portion 220 , and a second support member 230 .

[0074] The stage main body portion 201 may be used in manufacturing the mask assembly 150 (see, for example, Figure 1) during a process of manufacturing a mask frame 151. The stage body portion 201 may be disposed to be inclined relative to one direction (e.g., the third direction DR3 or the gravity direction), and may provide a base on which the mask frame 151 may be mounted. In an embodiment, the stage body portion 201 may extend in a direction inclined from the third direction DR3 (e.g., the z direction), and may have an approximately hexahedral shape having a thickness (e.g., a preset or predetermined thickness) and protruding toward a direction inclined relative to the first direction DR1 (e.g., the y direction).

[0075] The contact portion 210 may support one surface of the mask frame 151 in a direction (e.g., y direction) perpendicular to one direction (e.g., z direction) inclined relative to the third direction DR3 (or gravity direction). As an example, the contact portion 210 may support one surface of the mask frame 151 facing the stage main body portion 201. In this case, the contact portion 210 may be a portion that is in direct contact with the mask frame 151. The contact portion 210 may be in partial contact with the mask frame 151, or may be in full (or completely) contact with the mask frame 151. Hereinafter, for ease of description, an embodiment in which a portion of the contact portion 210 is in partial contact with the mask frame 151 is mainly described in detail.

[0076] The contact portion 210 may include a plurality of contact blocks of an island type (or an island arrangement). As an example, the contact portion 210 may include a first contact block 211, a second contact block 212, a third contact block 213, and a fourth contact block 214. The first contact block 211, the second contact block 212, the third contact block 213, and the fourth contact block 214 may be arranged to be spaced apart from each other in the z direction and / or the x direction (or the second direction DR2). Hereinafter, an embodiment in which the contact portion 210 includes four contact blocks is mainly described in detail.

[0077] The moving portion 220 may be disposed between the stage main body portion 201 and the contact portion 210. The moving portion 220 may be disposed between the stage main body portion 201 and the contact portion 210. Figure 1 ) process by moving the contact portion 210.

[0078] The moving part 220 may include a plurality of moving blocks. As an example, the moving part 220 may include a first moving block 221, a second moving block 222, a third moving block 223, and a fourth moving block 224 corresponding to the first contact block 211, the second contact block 212, the third contact block 213, and the fourth contact block 214, respectively. The first moving block 221, the second moving block 222, the third moving block 223, and the fourth moving block 224 may be arranged to be spaced apart from each other in the z direction and / or the x direction (or the second direction DR2). The first moving block 221, the second moving block 222, the third moving block 223, and the fourth moving block 224 may be arranged to overlap with the first contact block 211, the second contact block 212, the third contact block 213, and the fourth contact block 214, respectively. The first moving block 221, the second moving block 222, the third moving block 223, and the fourth moving block 224 may be respectively coupled to the first contact block 211, the second contact block 212, the third contact block 213, and the fourth contact block 214. The first moving block 221, the second moving block 222, the third moving block 223, and the fourth moving block 224 may move independently of each other.

[0079] The second support member 230 may protrude from the stage main body portion 201 in the y direction to support one surface of the mask frame 151. As an example, the second support member 230 may support one surface (e.g., the lower surface) of the mask frame 151 that is not supported by the contact portion 210. The second support member 230 may have a shape including one second support block extending in the x direction (or the second direction DR2), or may have a shape in which a plurality of second support blocks are spaced apart from each other and arranged in the x direction (or the second direction DR2). Hereinafter, for ease of description, an embodiment in which a plurality of second support blocks are spaced apart from each other and arranged in the x direction (or the second direction DR2) is mainly described in detail.

[0080] The second support member 230 may include a plurality of second support blocks. As an example, the second support member 230 may include a 2-1 support block 231, a 2-2 support block 232, a 2-3 support block 233, and a 2-4 support block 234. The 2-1 support block 231, the 2-2 support block 232, the 2-3 support block 233, and the 2-4 support block 234 may be disposed at the lower end of the stage body portion 201, and may protrude from the stage body portion 201 in the y direction. The 2-1 support block 231, the 2-2 support block 232, the 2-3 support block 233, and the 2-4 support block 234 may be arranged to be spaced apart from each other in the x direction (or the second direction DR2). The 2-1 support block 231, the 2-2 support block 232, the 2-3 support block 233, and the 2-4 support block 234 may support the lower surface of the mask frame 151. As an example, the 2-1 supporting block 231, the 2-2 supporting block 232, the 2-3 supporting block 233, and the 2-4 supporting block 234 may support the mask frame 151 in the +z direction.

[0081] and Figure 1 Similar to the first support member 130 and the first support block 140 shown in FIG. 1 , the stage main body portion 201 , the contact portion 210 , and the second support member 230 may support the mask frame 151 in a state of being inclined with respect to the third direction DR3 .

[0082] Figure 3 is a schematic front view of a portion of an apparatus for manufacturing a mask according to an embodiment.

[0083] In the following, the features of the apparatus 200 for manufacturing a mask have been referred to as Figure 2 The described features are not repeated, and other features are mainly described.

[0084] Reference Figure 3, a portion of the contact portion 210 may overlap with the mask frame 151. As an example, a portion of each of the first contact block 211, the second contact block 212, the third contact block 213, and the fourth contact block 214 may overlap with the mask frame 151. In such an embodiment, the first contact block 211, the second contact block 212, the third contact block 213, and the fourth contact block 214 may be completely hidden by the mask frame 151 and may only partially overlap with the mask frame 151. As an example, the width (e.g., the length in the x direction) of the first contact block 211, the second contact block 212, the third contact block 213, and the fourth contact block 214 may be smaller than the width of the mask frame 151. In another embodiment, the first contact block 211, the second contact block 212, the third contact block 213, and the fourth contact block 214 may not be completely hidden by the mask frame 151. As an example, the widths (eg, lengths in the x-direction) of the first to fourth contact blocks 211 , 212 , 213 , and 214 may be greater than the width of the mask frame 151 .

[0085] Although in Figure 3 2 shows an embodiment in which a portion of the contact portion 210 overlaps the mask frame 151, but the present disclosure is not limited thereto, and the contact portion 210 may completely overlap the mask frame 151. In such an embodiment, the contact portion 210 may be completely hidden by the mask frame 151 when viewed in one direction (e.g., the y direction).

[0086] The moving portion 220 may overlap the contact portion 210. As an example, the first moving block 221, the second moving block 222, the third moving block 223, and the fourth moving block 224 may overlap the first contact block 211, the second contact block 212, the third contact block 213, and the fourth contact block 214, respectively.

[0087] The size of each of the first moving block 221, the second moving block 222, the third moving block 223, and the fourth moving block 224 may be smaller than the size of each of the first contact block 211, the second contact block 212, the third contact block 213, and the fourth contact block 214. In such an embodiment, when viewed in one direction (e.g., the y direction), the first moving block 221, the second moving block 222, the third moving block 223, and the fourth moving block 224 may not be seen because they are hidden by the first contact block 211, the second contact block 212, the third contact block 213, and the fourth contact block 214.

[0088] In another embodiment, the size of each of the first moving block 221, the second moving block 222, the third moving block 223, and the fourth moving block 224 may be larger than the size of each of the first contact block 211, the second contact block 212, the third contact block 213, and the fourth contact block 214. In such an embodiment, when viewed in one direction (e.g., the y direction), the first moving block 221, the second moving block 222, the third moving block 223, and the fourth moving block 224 may be regarded as protruding beyond the outer sides of the first contact block 211, the second contact block 212, the third contact block 213, and the fourth contact block 214, respectively. Hereinafter, for the convenience of description, an embodiment in which the size of each of the first moving block 221, the second moving block 222, the third moving block 223, and the fourth moving block 224 is smaller than the size of each of the first contact block 211, the second contact block 212, the third contact block 213, and the fourth contact block 214 is shown and described in detail.

[0089] The second support member 230 may be disposed at the lower end of the contact portion 210 and the moving portion 220. As an example, the 2-1 support block 231, the 2-2 support block 232, the 2-3 support block 233, and the 2-4 support block 234 may be disposed in the -z direction relative to the third contact block 213, the third moving block 223, the fourth contact block 214, and the fourth moving block 224.

[0090] The 2-1 supporting blocks 231 , the 2-2 supporting blocks 232 , the 2-3 supporting blocks 233 , and the 2-4 supporting blocks 234 may be arranged at equal intervals or at different intervals in the x direction (eg, the second direction DR2 ).

[0091] Figure 4A and Figure 4B is a schematic cross-sectional view of a portion of an apparatus for manufacturing a mask according to an embodiment.

[0092] Reference Figure 4A The apparatus 200 for manufacturing a mask may include a stage body portion 201 tilted relative to one direction (eg, a third direction DR3 or a gravity direction). The first contact block 211 and the third contact block 213 may protrude in the y direction from a surface of the stage body portion 201 facing the y direction.

[0093] The first moving block 221 and the third moving block 223 may be respectively disposed between the first contact block 211 and the third contact block 213 and the stage main body portion 201. The 2-1 support block 231 may be disposed at the lower ends of the third contact block 213 and the third moving block 223. As an example, the 2-1 support block 231 may be disposed in the -z direction relative to the third contact block 213 and the third moving block 223.

[0094] The first contact block 211 and the first moving block 221 may be combined with each other to form one body. The third contact block 213 and the third moving block 223 may be combined with each other to form one body.

[0095] although Figure 4A , an embodiment in which the third contact block 213 is spaced apart from the 2-1 support block 231 is shown, but the third contact block 213 may be in contact with the 2-1 support block 231.

[0096] The lower surface of the 2-1 support block 231 may not coincide with the lower surface of the stage main body portion 201. As an example, one surface of the 2-1 support block 231 facing the -z direction and one surface of the stage main body portion 201 facing the -z direction may not be arranged on the same plane.

[0097] In another embodiment, referring to Figure 4B , the lower surface of the 2-1 support block 231 may coincide with the lower surface of the stage main body portion 201. As an example, one surface of the 2-1 support block 231 facing the -z direction and one surface of the stage main body portion 201 facing the -z direction may be arranged on the same plane.

[0098] Figure 5 is an enlarged cross-sectional view of a portion of an apparatus for manufacturing a mask according to an embodiment. Figure 5 Can be Figure 4A An enlarged cross-sectional view of area A in FIG.

[0099] Hereinafter, although detailed description is given based on the first contact block 211 and the first moving block 221 , the following features may be applied to the second to fourth contact blocks 212 to 214 and the second to fourth moving blocks 222 to 224 .

[0100] Reference Figure 5 , the first contact block 211 may include a socket S and a magnetic part MG.

[0101] The socket S may have an opening facing in one direction (eg, y direction), and at least a portion of the magnetic portion MG may be disposed in the opening in the socket S. The opening in the socket S may be a blind hole that does not pass through the socket S.

[0102] In other words, the socket S may surround a portion of the magnetic portion MG. In such an embodiment, the socket S may expose one surface of the magnetic portion MG. As an example, the socket S may expose a surface of the magnetic portion MG facing the y direction.

[0103] Although in Figure 5, an embodiment in which the magnetic part MG protrudes from one surface of the socket S in the y direction is shown, but the present disclosure is not limited thereto. In another embodiment, the surface of the magnetic part MG facing the y direction and the surface of the socket S facing the y direction may be arranged on the same plane.

[0104] The magnetic part MG may apply (or exert) a magnetic force. In an embodiment, the magnetic part MG may include an electropermanent magnet. In such an embodiment, the magnetic part MG may have (or exert) a magnetic force when a current does not flow therethrough, and may lose (or not have or not exert) a magnetic force when a current flows therethrough. In another embodiment, the magnetic part MG may include an electromagnet. In such an embodiment, the magnetic part MG may have a magnetic force when a current flows therethrough, and may lose (or not have) a magnetic force when a current does not flow therethrough.

[0105] A wiring through which current flows through the magnetic part MG may also be included. In an embodiment, the socket S may include a conductive material, and the wiring may be connected to the socket S. In such an embodiment, current may flow through the socket S to the magnetic part MG.

[0106] The first moving block 221 may include a first translation moving portion 221 - 1 and a first elastic body 221 - 2 .

[0107] The first translation movement part 221-1 may translate the first contact block 211 on one surface of the stage body part 201. As an example, the first translation movement part 221-1 may move the first contact block 211 in the x direction and / or z direction on the surface of the stage body part 201 facing the y direction.

[0108] The first translation moving part 221-1 may have various moving elements. Hereinafter, an embodiment in which a linear motion (LM) guide is provided as the first translation moving part 221-1 is shown and described in detail.

[0109] The first translationally moving portion 221 - 1 may include a rail R, an end plate EP, a block BL, and a connector CNT.

[0110] The track R may be provided on the stage main body portion 201. The track R may provide a path along which the first translational moving portion 221-1 may move. Therefore, the track R may be a substantially non-moving portion of the first translational moving portion 221-1. The track R may extend in a direction parallel to one surface of the stage main body portion 201. As an example, the track R may extend in the x-direction (e.g., the second direction DR2). The track R may extend in a direction (e.g., the z-direction) that is inclined by an angle at which the stage main body portion 201 is inclined relative to the third direction DR3.

[0111] The end plate EP may be disposed on the rail R. The end plate EP may have a shape surrounding a portion of the rail R.

[0112] Although in Figure 5 The middle rail R and the end plate EP are shown as approximately quadrilateral shapes, but the present disclosure is not limited thereto. In an embodiment, the rail R may have an I-shaped beam shape, and the end plate EP may have a shape that engages with the upper end of the I-shape of the rail R. A plurality of metal balls forming an annular rail may be provided between the end plate EP and the rail R. In such an embodiment, the metal balls may reduce the friction between the end plate EP and the rail R.

[0113] The block BL may be provided on the end plate EP. The block BL may serve as a body of the first translationally moving portion 221 - 1 , and may have a fastening groove or a threaded groove for connection to the contact portion 210 .

[0114] In an embodiment, the end plate EP and the block BL may be integrally formed. As an example, the first translation moving part 221-1 may include a T-shaped block BL directly coupled to the track R. In such an embodiment, similarly to the end plate EP described above, the lower end of the block BL may have a shape that engages with the upper end of the track R.

[0115] The connector CNT may be disposed between the block BL and the socket S. The connector CNT may include a coupling element connecting the block BL to the socket S.

[0116] In an embodiment, the connector CNT may be omitted, or the connector CNT may be formed integrally with the block BL or the socket S. As an example, the socket S may include a fastening rib and may be directly engaged to a fastening groove in the block BL. In another embodiment, the block BL may have a fastening rib and may be directly engaged to a fastening groove in the socket S.

[0117] The first elastic body 221-2 can be arranged to correspond to the translational movement direction of the first contact block 211 and can apply external force in a direction opposite to the relevant direction. As an example, the first elastic body 221-2 can be connected to the first contact block 211 to apply external force in the ±x direction and / or the ±z direction.

[0118] The first elastic body 221-2 may have structures of various shapes for applying (or configured to apply) external force. Hereinafter, for convenience of description, an embodiment in which a spring SP is included in the first elastic body 221-2 to apply an elastic force is shown and described in detail.

[0119] The first elastic body 221 - 2 may include a spring SP and a leg L. The spring SP and the leg L may each be provided in plural.

[0120] The spring SP may be connected to one surface of the socket S. As an example, one of the plurality of springs SP may be connected to one surface of the socket S facing the +z direction, and another spring SP may be connected to one surface of the socket S facing the -z direction.

[0121] The spring SP may be configured to apply an elastic force in a direction opposite to the moving direction of the first contact block 211. As an example, when the first contact block 211 moves in the +z direction, the spring SP connected to the surface of the socket S facing the +z direction is compressed and may apply an elastic force in the -z direction to the socket S. In such an embodiment, the spring SP connected to the surface of the socket S facing the -z direction may be stretched and may apply an elastic force in the +z direction to the socket S.

[0122] The springs SP may each be connected to a corresponding leg L. As an example, the leg L may be connected to the other end of the spring SP opposite to the end of the spring SP connected to the socket S.

[0123] One end of the leg L may be connected to the stage main body portion 201 .

[0124] The leg L connected and fixed to the stage body portion 201 may fix the spring SP so that the spring SP provides elastic force without moving along the first contact block 211 while the first contact block 211 moves.

[0125] In the embodiment, the other end of the leg L opposite to the one end of the leg L connected to the spring SP may be connected to the stage main body portion 201. In the embodiment, the leg L is connected to the spring SP at one end thereof and may extend in the -y direction, and may be in contact with and connected to the stage main body portion 201. However, the present disclosure is not limited thereto, and as long as the spring SP is fixed to the stage main body portion 201, the shape of the leg L is not particularly limited.

[0126] Fig. 6A and Figure 6B is an enlarged front view of a portion of an apparatus for manufacturing a mask according to an embodiment. Fig. 6A and Figure 6B Can be Figure 4A Magnified front view of area A in FIG.

[0127] Hereinafter, although detailed description is given based on the first contact block 211 , the following features may be applied to the second, third and fourth contact blocks 212 , 213 and 214 and the second, third and fourth moving blocks 222 , 223 and 224 .

[0128] Reference Fig. 6AIn an embodiment, the first contact block 211 may have an approximately quadrilateral shape (e.g., a square). In such an embodiment, the socket S and the magnetic part MG may have an approximately quadrilateral shape (e.g., a square). In another embodiment, the socket S may have a quadrilateral shape, and the magnetic part MG may have a circular shape.

[0129] The spring SP and the leg L may be each provided in plural numbers and connected to each corresponding surface of the socket S. As an example, the spring SP and the leg L may each correspond to one surface of the socket S facing the +x direction, one surface of the socket S facing the -x direction, one surface of the socket S facing the +z direction, and one surface of the socket S facing the -z direction, and may be connected to one surface of the socket S facing the +x direction, one surface of the socket S facing the -x direction, one surface of the socket S facing the +z direction, and one surface of the socket S facing the -z direction.

[0130] The connection structure of the spring SP and the leg L can be the same as that of the above reference Figure 5 The connection structures described are similar or identical.

[0131] The number of springs SP connected to one of the surfaces of the socket S may be different from the number of springs SP connected to the other of the surfaces. As an example, the number of springs SP connected to one surface of the socket S facing the +z direction may be greater than the number of springs SP connected to one surface of the socket S facing the -z direction, +x direction, or -x direction. In an embodiment, corresponding springs SP may be connected one by one to one surface of the socket S facing the -z direction, +x direction, or -x direction, and two springs SP may be connected to one surface of the socket S facing the +z direction.

[0132] A plurality of springs SP connected to a surface of the socket S facing the +z direction can provide compensation for gravity. Since the first contact block 211 has mass, the first contact block 211 will move in the direction of gravity (eg, in the direction opposite to the third direction DR3, see Figure 5 ) is acted on by gravity. To compensate for this, an additional spring SP can be connected to a surface of the socket S facing the +z direction to apply a force in the +z direction approximately opposite to the direction of gravity. The additionally connected spring SP can use a magnetic force as described below to compensate for the weight of the mask frame connected to the first contact block 211.

[0133] In another embodiment, one spring SP may be connected to one surface of the socket S facing the +z direction, and the associated spring SP may have a larger elastic constant than the spring SP connected to one surface of the socket S facing the -z direction, -x direction, or +x direction. Similar to the embodiment in which a plurality of springs SP are connected to one surface of the socket S facing the +z direction, this embodiment can compensate for gravity.

[0134] Reference Figure 6B In an embodiment, the first contact block 211 may have an approximately circular shape. In such an embodiment, the socket S and the magnetic portion MG may have an approximately circular shape. In another embodiment, the socket S may have a circular shape, and the magnetic portion MG may have an approximately rhombus shape.

[0135] The spring SP and the leg L may be provided in plural numbers, attached to the socket S, and extending in one direction. As an example, a plurality of springs SP may be attached to the socket S, and may each extend in the +x direction, the -x direction, the +z direction, or the -z direction. The plurality of legs L may be connected to the plurality of springs SP corresponding thereto, respectively.

[0136] The spring SP extending in the +z direction may have a larger elastic constant than the spring SP extending in the +x direction, the -x direction, or the -z direction. In such an embodiment, the spring SP extending in the +z direction may compensate for gravity.

[0137] In another embodiment, Fig. 6A Similarly, the spring SP and the leg L extending in the +z direction can be provided in plural. As an example, two springs SP and two legs L can be attached to the upper end of the socket S (eg, in the approximate +z direction) and can extend in the +z direction.

[0138] Fig. 7A and Figure 7B 2 is a schematic cross-sectional view showing a state of an operation process of an apparatus for manufacturing a mask according to an embodiment.

[0139] Hereinafter, although the description is made based on the relationship between the first contact block 211 and the third contact block 213, the first moving block 221 and the third moving block 223, the 2-1 support block 231, and the mask frame 151, the following features may be applied to the second contact block 212 and the fourth contact block 214, the second moving block 222 and the fourth moving block 224, and the 2-2 support block 232, the 2-3 support block 233, and the 2-4 support block 234 (see, for example, Figure 3 ).

[0140] Reference Fig. 7A, the first contact block 211 and the third contact block 213 may be in a state where there is no (or no magnetic force is exhibited). As an example, the first contact block 211 and the third contact block 213 may include an electropermanent magnet, and when current flows therethrough, the first contact block 211 and the third contact block 213 may not apply a magnetic force to the mask frame 151.

[0141] The mask frame 151 may be seated on the stage main body portion 201. In this state, the 2-1 support block 231 may support the mask frame 151 in a direction (e.g., a third direction DR3) opposite to the gravity direction. A portion of each of the first contact block 211 and the third contact block 213 may be in contact with the mask frame 151. In this state, since a separate external force (e.g., a magnetic force) is not applied to the mask frame 151, the first contact block 211 and the third contact block 213 may not be in close contact with the mask frame 151.

[0142] Since the mask frame 151 has a characteristic of having a small thickness and has an opening, the mask frame 151 may be bent in shape by gravity in a direction opposite to the third direction DR3. As an example, bending due to gravity may occur at an upper portion of the mask frame 151 in the z direction. In an embodiment, the mask frame 151 may sag approximately in the -y direction.

[0143] In this state, when welding the mask sheet to manufacture the mask assembly, one surface of the mask frame 151 and one surface of the mask sheet are not parallel to each other, so welding may not be performed completely. In addition, even when welding is performed, the position accuracy of the mask sheet may be reduced due to the bending of the mask frame 151. This may cause the above reference to Figure 1 The accuracy of the deposited material pattern described is reduced. Therefore, the mask frame 151 should be planarized (or made flat) in one direction (eg, the y direction).

[0144] Reference Figure 7B , the first contact block 211 and the third contact block 213 may be in a state of applying magnetic force to the mask frame 151. As an example, the first contact block 211 and the third contact block 213 may include an electropermanent magnet, and the first contact block 211 and the third contact block 213 may apply magnetic force to the mask frame 151 without current flowing therethrough.

[0145] In this state, the mask frame 151 can be in close contact with the first contact block 211 and the third contact block 213. The mask frame 151 can be stretched in the z direction. Because the sagging of the mask frame 151 in the approximate -y direction can be removed, and other bends can also be removed, the mask frame 151 can be flat along one direction (e.g., the z direction).

[0146] A lower surface (or a surface facing the −z direction) of the mask frame 151 may be supported by a 2-1 support block 231 .

[0147] After the first contact block 211 and the third contact block 213 are in close contact with the mask frame 151 by applying magnetic force to the mask frame 151, the first moving block 221 and the third moving block 223 may move the first contact block 211 and the third contact block 213. In this state, the mask frame 151 may be additionally stretched, and the flatness may be further improved.

[0148] FIG. 8A to FIG. 8C : is a schematic front view showing a state corresponding to the steps of the method of manufacturing a mask according to the embodiment.

[0149] Reference Fig. 8A Before arranging the mask frame, the apparatus 200 for manufacturing a mask may be prepared. The apparatus 200 for manufacturing a mask may include a stage main body portion 201, a contact portion 210, a moving portion 220, and a second support member 230. The features of the apparatus 200 for manufacturing a mask may be the same as those described above with reference to Figure 2 and Figure 3 The characteristics described are the same.

[0150] Reference Figure 8B , the mask frame 151 may be mounted on the apparatus 200 for manufacturing a mask.

[0151] The contact portion 210 may include a first contact block 211, a second contact block 212, a third contact block 213, and a fourth contact block 214. The first contact block 211, the second contact block 212, the third contact block 213, and the fourth contact block 214 may be respectively arranged to correspond to the edge of the mask frame 151. A portion of each of the first contact block 211, the second contact block 212, the third contact block 213, and the fourth contact block 214 may overlap the mask frame 151.

[0152] The first contact block 211, the second contact block 212, the third contact block 213, and the fourth contact block 214 can be in close contact with the mask frame 151 by applying magnetic force to the mask frame 151. In this state, the mask frame 151 can be stretched to become flat, and the process can be the same as described above with reference to Fig. 7A and Figure 7B The process described is the same.

[0153] The first moving block 221, the second moving block 222, the third moving block 223, and the fourth moving block 224 may be arranged to correspond to the first contact block 211, the second contact block 212, the third contact block 213, and the fourth contact block 214, respectively. The first moving block 221, the second moving block 222, the third moving block 223, and the fourth moving block 224 may overlap the first contact block 211, the second contact block 212, the third contact block 213, and the fourth contact block 214, respectively.

[0154] The first moving block 221 , the second moving block 222 , the third moving block 223 , and the fourth moving block 224 may additionally stretch the mask frame 151 by moving the first contact block 211 , the second contact block 212 , the third contact block 213 , and the fourth contact block 214 in the ±x direction and / or the ±z direction, respectively.

[0155] Through a process in which the mask frame 151 is in close contact with the first contact block 211, the second contact block 212, the third contact block 213 and the fourth contact block 214 and a process in which the mask frame 151 is additionally stretched by the first moving block 221, the second moving block 222, the third moving block 223 and the fourth moving block 224, the mask frame 151 can be flatly unfolded and maintain its flatness during the process of welding the mask sheet to be described below.

[0156] Reference Figure 8C , when stretched, a mask sheet 152 may be disposed on the mask frame 151 .

[0157] When the mask sheet 152 is formed as one (for example, when there is only one mask sheet 152), the mask sheet 152 may be formed into a quadrilateral. In the case where each side of the mask sheet 152 is stretched by using the clamping unit CP, the mask sheet 152 may be fixed to the mask frame 151 by performing welding on each wall of the mask sheet 152. In another embodiment, when the mask sheet 152 is provided in plurality, the mask sheet 152 may have a rectangular shape, and the mask sheet 152 may be stretched in its length direction (for example, the ±z direction) by clamping the end of the long side of the mask sheet 152 (for example, the end in the ±z direction) using the clamping unit CP. Then, the end of the mask sheet 152 may be fixed to the mask frame 151 by welding or the like. While being stretched, the mask sheet 152 may be fixed to the mask frame 151.

[0158] In this state, when the contact portion 210 in contact with the mask frame 151 is fixed to the stage main body portion 201, friction resistance may occur with the mask sheet 152. In an embodiment, since the mask sheet 152 is fixed to the mask frame 151 when stretched, a force to return to a state before stretching (e.g., a force that acts as a restoration in the ±z direction) may act on the mask frame 151. In this state, when the contact portion 210 is fixed to the stage main body portion 201, friction force may act on the mask sheet 152 and / or the mask frame 151. This may cause partial deformation of the mask sheet 152 and / or the mask frame 151, and may reduce the accuracy of the mask.

[0159] The moving part 220 can reduce frictional resistance. In an embodiment, the moving part 220 may include a translational mover that can translate the contact part 210. Therefore, the frictional resistance against the force applied by the mask sheet 152 to the mask frame 151 (for example, the force applied in the ±z direction) can be reduced. However, in this case, since the force can be applied in the ±z direction, the mask frame 151 may be deformed in the ±z direction (for example, it may be bent). In order to prevent this, the moving part 220 may include the above reference Figure 5 The elastic body described. The elastic body can offset (or resist) the force applied to the mask frame 151 by the mask sheet 152 by using elastic force. Therefore, the moving part 220 can be configured to reduce the friction resistance applied to the mask sheet 152 and the mask frame 151 while offsetting (or resisting) the force applied to the mask frame 151 by the mask sheet 152.

[0160] Through the above-described processes, when the mask sheet 152 is attached to the mask frame 151 , the flatness of the mask frame 151 may be maintained and deformation may be reduced, and thus the accuracy may be improved.

[0161] After the mask sheet 152 is attached to the mask frame 151, the end of the mask sheet 152 may be cut by using a separate cutting unit. As an example, after the mask sheet 152 is attached to the mask frame 151, the clamping unit CP may be removed and a portion of the mask sheet 152 may be cut so that one surface of the mask frame 151 (e.g., a surface facing the ±z directions) coincides with one surface of the mask sheet 152 (e.g., a surface facing the ±z directions).

[0162] When the end of the mask sheet 152 is cut, the mask assembly 150 may be completely formed. The mask assembly 150 may be arranged as described above with reference to Figure 1 The inside of the apparatus 100 for manufacturing a display device is described. Thus, the mask sheet 152 can be fixed to the mask frame 151 in an environment similar to the environment in which the mask assembly 150 is actually used.

[0163] Fig. 9 is a schematic plan view of a display device according to an embodiment. Fig.10 It is along Fig. 9 The line X-X' intercepts Fig. 9 A cross-sectional view of a display device shown in FIG.

[0164] Reference Fig. 9 and Fig.10 , the display device 20 may have a display area DA defined in the substrate 21 and a non-display area NDA outside the display area DA. The organic light emitting element 28 may be arranged in the display area DA. Power lines and the like may be arranged in the non-display area NDA. In addition, a pad (also called a "pad" or "pad") portion C may be arranged in the non-display area NDA.

[0165] The display device 20 may include a display substrate D, an intermediate layer 28-2 disposed on the display substrate D, and an opposing electrode 28-3 disposed on the intermediate layer 28-2. The display device 20 may include a thin film encapsulation layer E formed on the opposing electrode 28-3.

[0166] The display substrate D may include a substrate 21 , a buffer layer 22 , a thin film transistor TFT, a gate insulating layer 24 , an interlayer insulating layer 26 , a passivation layer 27 , and a sub-pixel electrode (eg, an anode electrode) 28 - 1 .

[0167] The substrate 21 may include a plastic material such as SUS or a metal material such as Ti. In addition, the substrate 21 may include a polymer such as polyimide (PI). Hereinafter, for ease of description, an embodiment in which the substrate 21 includes polyimide is mainly described in detail.

[0168] The thin film transistor TFT may be disposed on the substrate 21 , the passivation layer 27 may be disposed to cover the thin film transistor TFT, and the organic light emitting element 28 may be disposed on the passivation layer 27 .

[0169] The buffer layer 22 may be disposed on the upper surface of the substrate 21. The buffer layer 22 may include an organic compound and / or an inorganic compound. The buffer layer 22 may include silicon oxide (SiO x ), silicon nitride (SiN x ) or silicon oxynitride (SiON).

[0170] The active layer 23 is formed on the buffer layer 22 in a pattern (eg, a preset or predetermined pattern), and then, the active layer 23 may be covered by the gate insulating layer 24. The active layer 23 may have a source region 23-1 and a drain region 23-3 and a channel region 23-2 therebetween.

[0171] The active layer 23 may be formed to include various materials. As an example, the active layer 23 may include an inorganic semiconductor material such as amorphous silicon or crystalline silicon. As another example, the active layer 23 may include an oxide semiconductor. As another example, the active layer 23 may include an organic semiconductor material. Hereinafter, for ease of description, an embodiment in which the active layer 23 includes amorphous silicon is mainly described in detail.

[0172] The active layer 23 may be formed by forming an amorphous silicon layer on the buffer layer 22, crystallizing the amorphous silicon layer to form a polysilicon layer, and patterning the polysilicon layer. The source region 23-1 and the drain region 23-3 of the active layer 23 may be doped with impurities according to the type of thin film transistors such as driving thin film transistors and switching thin film transistors.

[0173] The gate electrode 25 and the interlayer insulating layer 26 may be disposed on the gate insulating layer 24. The gate electrode 25 corresponds to the active layer 23, and the interlayer insulating layer 26 covers the gate electrode 25. The gate electrode 25 may be disposed to overlap the channel region 23-2 of the active layer 23.

[0174] A contact hole (eg, contact opening) H1 is formed in the interlayer insulating layer 26 and the gate insulating layer 24 , and then, a source electrode 27 - 1 and a drain electrode 27 - 2 may be disposed on the interlayer insulating layer 26 to contact the source region 23 - 1 and the drain region 23 - 3 , respectively.

[0175] The passivation layer 27 may be disposed on the thin film transistor TFT, and the sub-pixel electrode 28-1 of the organic light emitting element 28 may be disposed on the passivation layer 27. The sub-pixel electrode 28-1 may contact the drain electrode 27-2 of the thin film transistor TFT through a via hole (e.g., a via opening) H2 formed in the passivation layer 27. The passivation layer 27 may include a single layer or multiple layers. The passivation layer 27 may include a planarization layer so that the upper surface of the passivation layer 27 is flat regardless of the curvature of the lower layer, or may be formed to be curved according to the curvature of the lower layer (corresponding to the curvature of the lower layer).

[0176] The pixel defining layer 29 may be disposed to cover the sub-pixel electrode 28-1 and the passivation layer 27. The pixel defining layer 29 may have an opening to expose a portion of the sub-pixel electrode 28-1.

[0177] The intermediate layer 28-2 and the counter electrode 28-3 may be disposed on the sub-pixel electrode 28-1. In another embodiment, the counter electrode 28-3 may be formed on the entire surface of the display substrate D. The counter electrode 28-3 may be formed on the intermediate layer 28-2 and the pixel defining layer 29. Hereinafter, for ease of description, an embodiment in which the counter electrode 28-3 is formed on the intermediate layer 28-2 and the pixel defining layer 29 is mainly described in detail.

[0178] The sub-pixel electrode 28-1 may serve as an anode electrode, and the counter electrode 28-3 may serve as a cathode electrode. However, the polarities of the sub-pixel electrode 28-1 and the counter electrode 28-3 may be opposite.

[0179] The intermediate layer 28-2 may include an organic emission layer. In an embodiment, the intermediate layer 28-2 may include an organic light emitting layer, and may further include at least one of a hole injection layer (HIL), a hole transport layer (HTL), an electron transport layer (ETL), and an electron injection layer (EIL). However, the present disclosure is not limited thereto, and the intermediate layer 28-2 may include an organic emission layer, and may further include other various functional layers.

[0180] The middle layer 28-2 can be referred to above Figure 1 The described apparatus 100 for manufacturing a display device is formed.

[0181] The intermediate layer 28-2 may be provided in plurality. The plurality of intermediate layers 28-2 may form (or define) the display area DA. In this case, the plurality of intermediate layers 28-2 may be arranged to be spaced apart from each other in the display area DA.

[0182] A unit pixel may include a plurality of sub-pixels. The plurality of sub-pixels may be configured to emit light of various colors. As an example, the plurality of sub-pixels may include sub-pixels configured to emit red light, green light, and blue light, respectively, or sub-pixels configured to emit red light, green light, blue light, and white light, respectively.

[0183] The sub-pixel may include one intermediate layer 28-2. In the case of forming one sub-pixel, the intermediate layer 28-2 may be formed by using an apparatus for manufacturing a display device.

[0184] The thin film encapsulation layer E may include a plurality of inorganic layers, or may include an inorganic layer and an organic layer.

[0185] The organic layer of the thin film encapsulation layer E may include a single layer or a stacked layer including a polymer. As an example, the organic layer of the thin film encapsulation layer E may be at least one of polyethylene terephthalate (PET), polyimide (PI), polycarbonate (PC), epoxy resin, polyethylene (PE), and polyacrylate (PA).

[0186] The inorganic layer of the thin film encapsulation layer E may include a single layer or a stacked layer including a metal oxide or a metal nitride. As an example, the inorganic layer of the thin film encapsulation layer E may include silicon nitride (SiN x ), aluminum oxide (e.g., Al 2 O 3 ), silicon oxide (e.g., SiO 2 ) and titanium oxide (e.g., TiO 2 )

[0187] The uppermost layer of the thin film encapsulation layer E exposed to the outside may include an inorganic layer to prevent moisture from being transferred to the organic light emitting element 28 .

[0188] The thin film encapsulation layer E may include at least one sandwich structure in which at least one organic layer is disposed between at least two inorganic layers. In another embodiment, the thin film encapsulation layer E may include at least one sandwich structure in which at least one inorganic layer is disposed between at least two organic layers. In another embodiment, the thin film encapsulation layer E may include a sandwich structure in which at least one organic layer is disposed between at least two inorganic layers and a sandwich structure in which at least one inorganic layer is disposed between at least two organic layers.

[0189] The thin film encapsulation layer E may include a first inorganic layer, a first organic layer, and a second inorganic layer sequentially from an upper portion of the organic light emitting element 28 .

[0190] In another embodiment, the thin film encapsulation layer E may include a first inorganic layer, a first organic layer, a second inorganic layer, a second organic layer, and a third inorganic layer sequentially from an upper portion of the organic light emitting element 28 .

[0191] In another embodiment, the thin film encapsulation layer E may include a first inorganic layer, a first organic layer, a second inorganic layer, a second organic layer, a third inorganic layer, a third organic layer, and a fourth inorganic layer sequentially from an upper portion of the organic light emitting element 28 .

[0192] According to an embodiment, an apparatus for manufacturing a mask can be provided, which improves the flatness of the mask by stretching the mask frame using a contact portion in contact with the mask frame during vertical stretch welding, and provides a moving portion configured to move the contact portion, thereby reducing the friction force applied when attaching the mask sheet. However, the scope of the present disclosure is not limited by these aspects and features.

[0193] It should be understood that the embodiments described herein should be considered in a descriptive sense and not for limiting purposes. The description of features or aspects within each embodiment should generally be considered applicable to other similar features or aspects in other embodiments. Although one or more embodiments have been described with reference to the accompanying drawings, it will be understood by those of ordinary skill in the art that various changes in form and detail may be made therein without departing from the spirit and scope as defined by the claims and their equivalents.

Claims

1. An apparatus for manufacturing a mask, characterized in that The device comprises: a stage main body portion inclined relative to the direction of gravity and configured to accommodate a mask frame having an opening therein; a contact portion protruding from one surface of the stage main body portion toward the mask frame; and The moving portion is configured to move the contact portion.

2. The device according to claim 1, characterized in that At least a portion of the contact portion overlaps the mask frame.

3. The device according to claim 1, characterized in that The contact portion is arranged to correspond to an edge of the mask frame.

4. The device according to claim 1, characterized in that The contact portion includes a magnet.

5. The device according to claim 4, characterized in that The magnet of the contact portion is configured not to exhibit magnetism when current flows therethrough.

6. The device according to claim 1, characterized in that The moving portion is between the contact portion and the stage main body portion.

7. The device according to claim 1, characterized in that The moving part includes a translation element.

8. The device according to claim 1, characterized in that The moving portion includes an elastic body corresponding to at least one of the moving directions of the contact portion, the elastic body being configured to apply an elastic force to the contact portion.

9. The device according to claim 8, characterized in that The contact portion has a plurality of surfaces, Wherein, the elastic body is provided in plurality, and Wherein, each surface of the contact portion is connected to at least one elastic body corresponding thereto.

10. The device according to claim 9, characterized in that The number of elastic bodies connected to one of the plurality of surfaces is different from the number of elastic bodies connected to another of the plurality of surfaces.

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