179 results about "Mask set" patented technology

The invention relates to a stacked cargo positioning method and device. The method comprises the steps of identifying acquired image data, constructing a dynamic grid based on a spatial distribution rule of an initial mask, and performing local fine segmentation on missing grids in the dynamic grid to obtain a total mask set; performing mask quality optimization and anomaly elimination on the total mask set based on the multi-dimensional matching degree of the dynamic grid to obtain a correct mask set; performing coordinate system reverse transformation on the correct mask set based on the original coordinate system of the image data to obtain a correct binary mask, and positioning the stacked goods; according to the method, the acquired image data is identified, a dynamic grid is constructed, and a mask quality optimization and anomaly elimination mechanism is combined, so that the problem of segmentation noise caused by factors such as non-uniform illumination and cargo shielding in a warehouse environment is effectively solved, high-precision positioning on low-computing-power equipment is realized, and the method is suitable for large-scale popularization and application. The problem that the positioning precision of stacked goods on low-computing-power equipment such as an embedded platform is insufficient is solved.

The invention relates to the technical field of multi-sensor fusion, in particular to an automatic calibration method and calibration device for laser radar-camera external parameters, and the method comprises the steps: synchronously collecting the point cloud data and image data of a road scene based on a vehicle-mounted laser radar and a camera; performing semantic segmentation on the image data to generate a semantic mask set of each image; based on the point cloud data, geometric attributes of a road scene are extracted from the vectorized map, a laser radar coordinate system of the vehicle-mounted laser radar and points in the vectorized map are projected into the image in combination with the semantic mask set, and a target consistency function is constructed; and adjusting the external parameter matrix based on the target consistency function until the target consistency function reaches a maximum value, and completing automatic calibration. Therefore, the problems that the calibration precision is insufficient and the high-precision perception requirement of automatic driving is difficult to meet due to the fact that related technologies depend on a large amount of labeled data or a specific environment, the generalization ability is poor, and a high-precision map and road prior information cannot be combined are solved.

The embodiment of the invention provides a mask plate group, a manufacturing method thereof, and a mask plate imaging deviation correction method and system. The mask plate group comprises a plurality of mask plates; in the process of performing optical imaging on the plurality of masks, the theoretical optimal focusing values of the mask patterns on the plurality of masks are the same; wherein the mask patterns on the plurality of mask plates comprise the same monitoring pattern; the monitoring pattern is used for carrying out optical imaging deviation correction on the mask pattern on the mask plate, so that the mask pattern on the mask plate is subjected to optical imaging in the process of carrying out optical imaging on the plurality of mask plates; and the offset of the actual optimal focusing value of the mask patterns on the plurality of masks relative to the theoretical optimal focusing value is within a specified numerical range of 7.0%-7.5% of the technological process node corresponding to the mask group. According to the embodiment of the invention, the offset of the actual optimal focusing value of the mask patterns on the plurality of masks relative to the theoretical optimal focusing value is reduced, and the optical imaging consistency of the plurality of masks in the same mask group is improved.

A method that including performance of source mask optimization (SMO) for a plurality of laser spectra. The method further includes generation of training data by determining, for each optimized source-mask-combination, performance metrics such as EPE, CDU, LER, LWR, DOF, NILS for the plurality of laser spectra and training of a machine learning (ML) model to determine an optimal laser spectrum based on the generated training data. The method may further including predicting optimal spectra for production design layouts using the trained ML model.

The invention relates to an impregnated paper production quality detection method and system based on deep learning, and the method comprises the following steps: S1, obtaining an industrial camera image flow, sensor and process parameters, and event and work order information, and constructing a synchronous data packet; s2, preprocessing the synchronous data packet to obtain preprocessed image data, process data and an ROI mask; s3, obtaining a detection frame set and a segmentation mask set based on multi-model AI detection and segmentation according to the preprocessed image data, the process data and the ROI mask; s4, segmenting the mask set according to the detection frame set, and performing track clustering along the paper feeding direction to form a defect event flow; s5, on the basis of the defect event stream, performing online quality prediction and root cause analysis, and obtaining future interval quality prediction and key factor sorting; and S6, according to future interval quality prediction and key factor sorting, adaptive process optimization is carried out, and an optimal control instruction is obtained. According to the invention, the detection accuracy and fineness are effectively improved, and intelligent identification and cross-frame tracking of defects are realized.

An apparatus for manufacturing a display apparatus includes: a chamber; a mask assembly disposed in the chamber on a first side of a display substrate; a deposition source disposed to face the mask assembly and supplying a deposition material that passes through the mask assembly; and a magnetic force portion including a plurality of magnets extending in a first direction parallel to the mask assembly and disposed on a side opposite to the first side of the display substrate. The magnetic force portion reciprocates in a direction intersecting the first direction.

Described herein are photonic communication platforms that can overcome the memory bottleneck problem, thereby enabling scaling of memory capacity and bandwidth well beyond what is possible with conventional computing systems. Some embodiments provide photonic communication platforms that involve use of photonic modules. Each photonic module includes programmable photonic circuits for placing the module in optical communication with other modules based on the needs of a particular application. The architecture developed by the inventors relies on the use of common photomask sets (or at least one common photomask) to fabricate multiple photonic modules in a single wafer. Photonic modules in multiple wafers can be linked together into a communication platform using optical or electronic means.

An apparatus for manufacturing a display apparatus and a method of manufacturing a display apparatus are disclosed. The apparatus for manufacturing the display apparatus includes: a chamber; a mask assembly disposed inside the chamber to face the display substrate; a holder portion disposed inside the chamber, the holder portion including a cooling channel through which a cooling material flows; and a deposition source disposed inside the chamber and configured to supply a deposition material such that the deposition material passes through the mask assembly and is deposited on the display substrate. At least one of the holder portion and the mask assembly is movable between a first position where the holder portion supports the display substrate and a second position where the holder portion is in contact with the mask assembly.

A mask including: a deposition pattern portion including a plurality of deposition holes that are configured to have deposition material pass therethrough; and a dummy pattern portion outside the deposition pattern portion, wherein the dummy pattern portion includes an auxetic structure having a negative Poisson's ratio.

The mask assembly includes: a mask frame including an open region; at least one mask sheet covering the opening region of the mask frame; and a support bar disposed between the mask frame and the at least one mask sheet, the support bar extending in a first direction to traverse the opening region, and having both ends fixed to the mask frame. The at least one mask sheet includes: a plurality of sub-masks disposed side by side in a second direction crossing the first direction in which the support bars extend; and a connecting rod disposed between the sub-masks and connecting two adjacent sub-masks among the sub-masks. And the connecting rod is overlapped with the supporting rod in a plane graph.

A mask assembly includes a frame opening, and a mask sheet. The mask sheet includes a first mask including a first body part having at least one first deposition opening, first coupling portions, each of which protrudes from at least one first side of the first body part, and a second mask including a second body part having at least one second deposition opening, second coupling portions, each of which protrudes from at least one first side of the second body part, The at least one first side of the first mask and the at least one first side of the second mask face each other. The first coupling portions overlap the second coupling portions, respectively.

This invention discloses a method for fabricating a metasurface lens and a metasurface lens, relating to the field of metasurface lens technology. The method includes: acquiring a metasurface lens image; dividing the metasurface lens image according to a preset size to obtain at least two sub-images and a mask set corresponding to each sub-image; performing image transfer on a first wafer using the at least two sub-images and the mask set corresponding to each sub-image to obtain a second wafer carrying the metasurface lens image; and performing lens fabrication processing on the second wafer to obtain the metasurface lens. Through this method, this invention can improve efficiency and reduce costs while meeting optical performance requirements.

A pixel arrangement structure, a display panel, a display apparatus and a mask group are provided. The pixel arrangement structure includes basic pixel units in first and / or second directions. Each basic pixel unit includes five sub-pixels, first to third sub-pixels are of different colors, and third to fifth sub-pixels are of a same color; the first sub-pixel includes opposite first and second sides in the first direction, and opposite third and fourth sides in the second direction; and the second sub-pixel is on and separated from the third side of the first sub-pixel, the third sub-pixel is on and separated from the first side of the first sub-pixel, fourth and fifth sub-pixels are both on the fourth side of the first sub-pixel and are separated from the fourth side of the first sub-pixel, and are separated from each other in the first direction.

An apparatus for manufacturing a display device includes: a mask assembly; and a magnetic force portion facing the mask assembly, where the magnetic force portion applies a magnetic force toward the mask assembly. The mask assembly includes: a mask frame having a plurality of first openings defined therethrough and a second opening defined in a first surface thereof, where the second opening is arranged between two adjacent first openings of the plurality of first openings; a mask film disposed on a second surface of the mask frame opposite to the first surface and overlapping with at least one of the plurality of first openings; and a support member on the first surface of the mask frame and including a magnetic body, in which the support member is disposed on a surface of the mask frame defining the first opening or a surface of the mask frame defining the second opening.

The utility model provides a grating structure manufacturing system comprising a light source assembly used for emitting a first light beam and a second light beam which are propagated along different light paths; the mask assembly is of an integrated structure and comprises a first grating phase mask and a second grating phase mask, the grating period of the first grating phase mask is different from that of the second grating phase mask, the first grating phase mask is located on the propagation light path of the first light beam, and the second grating phase mask is located on the propagation light path of the second light beam. The diffraction module is used for diffracting the first light beam to form a first exposure light beam; the second grating phase mask is positioned on a propagation path of the second light beam and is used for diffracting the second light beam to form a second exposure light beam; the exposure substrate is used for bearing an exposure material, and the first exposure light beam and the second exposure light beam are respectively incident to different positions of the exposure substrate, so that grating structures with different periods are formed at different positions of the exposure material when the exposure material is placed on the exposure substrate.

The utility model discloses a parallel correction device of an exposure machine. The parallel correction device comprises a mask assembly, a correction assembly arranged on the mask assembly and a moving assembly, the correction assembly comprises an air cylinder, a correction plate arranged on the air cylinder and a plurality of correction balls arranged on the correction plate; the air cylinder controls the correction plate to enter and exit between the moving assembly and the mask assembly, one end of the correction ball abuts against the side, close to the correction plate, of the mask assembly, and the moving assembly drives a film source to move in the direction close to the mask assembly through torsion control. Therefore, the film source abuts against the plurality of correction balls. According to the utility model, the moving assembly drives the film source to move towards the correction balls, and the torsion-controlled moving assembly ensures that the uniformly distributed correction balls respectively abut against the photomask and the film source, so that the photomask and the film source are arranged in parallel, the alignment time is shortened, the productivity is improved, the exposure effect of the film source is improved, and the rework rate of products is reduced.

A method is provided. The method includes: generating light by a plasma of a light source of a semiconductor processing tool; generating patterned light by a mask assembly, the patterned light including the light reflected by a pattern of the mask assembly; during generating the patterned light, protecting the mask assembly by a pellicle assembly including a pellicle membrane, the pellicle membrane including a nanotube-based scaffold structure having nanotubes bound together by a capping layer; and performing a semiconductor process on a semiconductor wafer by the patterned light.

The invention relates to a perception identification method for verification and evaluation of a space autonomous capture full task chain, and the method comprises the steps: shooting a space region containing a target through a fixed binocular camera, and reconstructing a three-dimensional point cloud model of the space region where the target is located; a mask set of a target to be grabbed is screened out through a deep learning image segmentation algorithm and target feature comparison, a target three-dimensional point cloud is obtained through mapping, geometric centroid calculation and coordinate system conversion are carried out on the point cloud, and a three-dimensional center coordinate of the target under a base coordinate system of the space robot is obtained; a monocular camera carried at the tail end of the space robot is used for shooting multi-view images of a target, and a high-precision target three-dimensional point cloud model with a continuous surface is generated; carrying out fusion registration on the high-precision target three-dimensional point cloud model and the three-dimensional point cloud model of the space region where the target is located to obtain a target complete geometric model with accurate scale and pose; and the optimal grabbing pose and path are calculated. And the problem of autonomous perception and recognition of the robot in the autonomous grabbing process in the space environment is solved.

The utility model relates to a frame module used in a mask assembly for depositing a thin film of a flat panel display device. More specifically, the present invention relates to a CNT fiber stretching device which is stretched from a very thin CNT fiber having a nano-sized diameter, excellent mechanical rigidity and tensile force, and excellent chemical stability, electrical conductivity, and thermal expansibility, and which is disposed in the form of a strip on the upper part of a frame which fixes and supports a plurality of unit masks. The mask assembly and the frame module for depositing a thin film of a flat panel display device can suppress sagging due to gravity of a substrate and deformation of a plurality of unit masks in a thin film deposition process.

The utility model provides a pixel arrangement structure, a display panel, a display device and a mask group. The pixel arrangement structure comprises a plurality of basic pixel units which are arranged in an array mode, each basic pixel unit comprises a first sub-pixel, a second sub-pixel, a third sub-pixel and a fourth sub-pixel, and the first sub-pixel, the second sub-pixel and the third sub-pixel are sub-pixels of different colors. The third sub-pixel and the fourth sub-pixel are sub-pixels with the same color; one of the third sub-pixel and the fourth sub-pixel comprises a single light-emitting layer, the other one of the third sub-pixel and the fourth sub-pixel comprises at least two sub-light-emitting layers which are arranged in a laminated mode, and a charge generation layer is arranged between every two adjacent sub-light-emitting layers. According to the pixel arrangement structure, the problem of color cast of a white picture under low brightness after a reliability test is solved, and meanwhile, the problem of a dark field caused by extinguishment of some pixels can be eliminated, so that the display effect of the display panel is improved, and the yield and the product competitiveness of the display panel are improved.

Disclosed is a hard mask polymer for semiconductor applications including a polymer of specific monomeric components, achieving improved etch resistance, solubility, and mechanical properties. The hard mask polymer is an organic polymer including a structure represented by Formula 1:wherein R1 is a hydrocarbon including one or more benzene ring structures and n is an integer from 1 to 10000. Also disclosed are a hard mask composition for semiconductor applications including the organic polymer and a patterning method using the hard mask composition.

A method for manufacturing a display device is provided. [Solution] The method includes placing a substrate and a first mask assembly inside a chamber, passing a vapor-deposited material through the first mask assembly to form first counter electrodes in the first and second display areas of the substrate, varying the position of at least one of the substrate and the first mask assembly, passing a vapor-deposited material supplied from a vapor deposition source through the first mask assembly to form a second counter electrode superimposed on the first and second display areas, respectively, the first counter electrode and a second counter electrode, at least a portion of which is superimposed, after replacing the first mask assembly with the second mask assembly, supplying vapor-deposited material from the vapor deposition source to the substrate to form a third counter electrode and a fourth counter electrode in the second display area, and forming a main counter electrode in the third display area of ​​the substrate, wherein the third counter electrode connects the fourth counter electrode to one of the first or second counter electrodes, and the third and fourth counter electrodes have different areas on a plane.

A mask assembly and a deposition device including the same are disclosed. A mask assembly includes: a mask frame, a first mask bar connected to the mask frame and extending in a first direction, and a second mask bar connected to the mask frame and extending in a second direction. The first mask bar overlaps the second mask bar in an overlapping region, the second mask bar includes a non-overlapping region not overlapping the first mask bar, the second mask bar includes a first portion having a first thickness and a second portion having a second thickness that is less than the first thickness in the non-overlapping region, and the first portion is located along an edge of the second mask bar.

A mask assembly is provided. The mask assembly may include a frame, a mask sheet, and an auxiliary rod. The mask sheet may include a sheet frame and a protrusion protruding from the sheet frame. The sheet frame may have inner surfaces defining an opening of the sheet frame, and the protrusion may protrude toward the opening from one of the inner surfaces of the sheet frame extending in the first direction in a second direction intersecting the first direction. The mask sheet may include a shank recess extending from the sheet frame to the protrusion in the second direction. The auxiliary rod can be arranged in the rod seat groove. A plurality of auxiliary rods may be provided, and the plurality of auxiliary rods may be arranged such that the plurality of auxiliary rods are spaced apart from each other in the first direction.

There is provided a mask assembly, a method of manufacturing the mask assembly, and an electronic device manufactured using the mask assembly, the mask assembly including: a mask frame including a first opening portion and including a first portion doped with an N dopant; and a mask disposed on the mask frame and including a plurality of second opening portions overlapping the first opening portions.

A method includes: providing color images for a geological rock core sample, creating initial masks for a subset of the color images, dividing each color image into sets of image tiles, splitting the sets of image tiles into a training set and a validation set, augmenting the training and validation sets, including orienting each image tile in a same direction by sample depth, training a model with the augmented training validation sets, generating image masks from the trained model, corresponding to the color images, combining the sets of image tiles to regenerate each of the color images from their image tile sets, applying the generated image masks to the color images to generate greyscale masked images, stacking the greyscale masked images by sample depth, and applying colors to the stacked greyscale masked images to generate and display a stacked color image representing the entire sample length.

A display device includes a first sub-pixel having a quadrangular shape; a second sub-pixel arranged to face a side of the first sub-pixel, the second sub-pixel having a quadrangular shape; and a third sub-pixel arranged to face a side of the first sub-pixel and spaced apart from the second sub-pixel, the third sub-pixel having a quadrangular shape, wherein a distance from the second sub-pixel to the side of the first sub-pixel that the second sub-pixel faces and a distance from the third sub-pixel to the side of the first sub-pixel that the third sub-pixel faces are different from each other.

The present application provides an organic device, a mask set, a mask, and a method for manufacturing an organic device. The organic device can include a substrate, a first electrode on the substrate, an organic layer on the first electrode, and a second electrode on the organic layer. In a case where the substrate is observed in a direction of a normal line of the substrate, the organic device can include a first display region including the second electrode having a first occupancy ratio, and a second display region including the second electrode having a second occupancy ratio smaller than the first occupancy ratio. In the second display region, the organic layer can be arranged in a first direction and arranged in a second direction intersecting the first direction. In the second display region, the second electrode can include electrode lines arranged in the first direction. The electrode lines can include electrode segments arranged in the second direction and overlapping the organic layer. Two electrode segments adjacent in the second direction can be connected to each other. The electrode segments can include a first electrode segment having a first shape, and a second electrode segment having a second shape different from the first shape.

A mask assembly is provided. The mask assembly according to an embodiment includes a mask frame including a frame opening portion, and a split mask coupled to the mask frame including a plurality of deposition pattern portions overlapping the frame opening portion and extending in a first direction, wherein each of the plurality of deposition pattern portions includes a first opening area including a first opening portion having a first width, and a second opening area including a second opening portion having a second width smaller than the first width, wherein the split mask has a first thickness in the first opening area and a second thickness smaller than the first thickness in the second opening area, the second thickness being greater than a value of the first thickness multiplied by a ratio of the second width to the first width.