222 results about "Mask set" patented technology

The invention relates to a stacked cargo positioning method and device. The method comprises the steps of identifying acquired image data, constructing a dynamic grid based on a spatial distribution rule of an initial mask, and performing local fine segmentation on missing grids in the dynamic grid to obtain a total mask set; performing mask quality optimization and anomaly elimination on the total mask set based on the multi-dimensional matching degree of the dynamic grid to obtain a correct mask set; performing coordinate system reverse transformation on the correct mask set based on the original coordinate system of the image data to obtain a correct binary mask, and positioning the stacked goods; according to the method, the acquired image data is identified, a dynamic grid is constructed, and a mask quality optimization and anomaly elimination mechanism is combined, so that the problem of segmentation noise caused by factors such as non-uniform illumination and cargo shielding in a warehouse environment is effectively solved, high-precision positioning on low-computing-power equipment is realized, and the method is suitable for large-scale popularization and application. The problem that the positioning precision of stacked goods on low-computing-power equipment such as an embedded platform is insufficient is solved.

The invention relates to the technical field of multi-sensor fusion, in particular to an automatic calibration method and calibration device for laser radar-camera external parameters, and the method comprises the steps: synchronously collecting the point cloud data and image data of a road scene based on a vehicle-mounted laser radar and a camera; performing semantic segmentation on the image data to generate a semantic mask set of each image; based on the point cloud data, geometric attributes of a road scene are extracted from the vectorized map, a laser radar coordinate system of the vehicle-mounted laser radar and points in the vectorized map are projected into the image in combination with the semantic mask set, and a target consistency function is constructed; and adjusting the external parameter matrix based on the target consistency function until the target consistency function reaches a maximum value, and completing automatic calibration. Therefore, the problems that the calibration precision is insufficient and the high-precision perception requirement of automatic driving is difficult to meet due to the fact that related technologies depend on a large amount of labeled data or a specific environment, the generalization ability is poor, and a high-precision map and road prior information cannot be combined are solved.

The invention discloses a building construction progress intelligent monitoring method and device and electronic equipment, and belongs to the technical field of intelligent monitoring, and the method comprises the steps: comparing a label of a building construction image with a building information model library, and obtaining a two-dimensional visual angle image data set; performing semantic segmentation on a bounding box of the building construction image to obtain a segmentation mask set; calculating the cosine similarity of the two-dimensional visual angle image data set and the segmentation mask set according to the feature vector cosine similarity, and determining the angle corresponding to the maximum value of the cosine similarity as the best matching angle; based on the optimal matching angle, a two-dimensional optimal matching view angle image and an optimal matching mask are determined, and the construction progress of the building construction image is determined; semantic segmentation is carried out on the bounding box, and parts related to the building are extracted in a targeted mode; and by calculating the cosine similarity between the two-dimensional visual angle image data set and the segmentation mask set, similarity matching is carried out on the building construction image and the building information model library, so that the monitoring accuracy is further ensured.

The embodiment of the invention provides a mask plate group, a manufacturing method thereof, and a mask plate imaging deviation correction method and system. The mask plate group comprises a plurality of mask plates; in the process of performing optical imaging on the plurality of masks, the theoretical optimal focusing values of the mask patterns on the plurality of masks are the same; wherein the mask patterns on the plurality of mask plates comprise the same monitoring pattern; the monitoring pattern is used for carrying out optical imaging deviation correction on the mask pattern on the mask plate, so that the mask pattern on the mask plate is subjected to optical imaging in the process of carrying out optical imaging on the plurality of mask plates; and the offset of the actual optimal focusing value of the mask patterns on the plurality of masks relative to the theoretical optimal focusing value is within a specified numerical range of 7.0%-7.5% of the technological process node corresponding to the mask group. According to the embodiment of the invention, the offset of the actual optimal focusing value of the mask patterns on the plurality of masks relative to the theoretical optimal focusing value is reduced, and the optical imaging consistency of the plurality of masks in the same mask group is improved.

The invention discloses a remote sensing image zero-watermarking method based on depth features, relates to the field of digital watermarking, and aims to solve the problem of insufficient robustness during active feature design. The remote sensing image zero-watermarking method comprises the following steps: reading a remote sensing image, converting the remote sensing image into a gray scale, and normalizing the gray scale image; detecting feature points of the normalized image by using an SIFT algorithm, screening out feature points in a certain intensity interval, and constructing a Delaunay triangulation network according to a rule; calculating inscribed circles of triangles in the triangulation network one by one, constructing an inscribed circle mask set Masks, multiplying the mask set by the remote sensing image, and performing scale normalization processing on a result in order to facilitate feature extraction of the neural network; and inputting the feature domain into a trained U-Net neural network, and extracting robust features in the feature domain. According to the method, on the basis of good global stability and empty circle characteristics of the Delaunay triangulation network, each feature domain of the image exists independently, and good uniqueness of the watermark algorithm is guaranteed.

A method that including performance of source mask optimization (SMO) for a plurality of laser spectra. The method further includes generation of training data by determining, for each optimized source-mask-combination, performance metrics such as EPE, CDU, LER, LWR, DOF, NILS for the plurality of laser spectra and training of a machine learning (ML) model to determine an optimal laser spectrum based on the generated training data. The method may further including predicting optimal spectra for production design layouts using the trained ML model.

The invention relates to an impregnated paper production quality detection method and system based on deep learning, and the method comprises the following steps: S1, obtaining an industrial camera image flow, sensor and process parameters, and event and work order information, and constructing a synchronous data packet; s2, preprocessing the synchronous data packet to obtain preprocessed image data, process data and an ROI mask; s3, obtaining a detection frame set and a segmentation mask set based on multi-model AI detection and segmentation according to the preprocessed image data, the process data and the ROI mask; s4, segmenting the mask set according to the detection frame set, and performing track clustering along the paper feeding direction to form a defect event flow; s5, on the basis of the defect event stream, performing online quality prediction and root cause analysis, and obtaining future interval quality prediction and key factor sorting; and S6, according to future interval quality prediction and key factor sorting, adaptive process optimization is carried out, and an optimal control instruction is obtained. According to the invention, the detection accuracy and fineness are effectively improved, and intelligent identification and cross-frame tracking of defects are realized.

And photoetching. Source mask optimized SMO for a plurality of laser spectra is performed. Training data is generated by determining performance metrics, such as EPE, CDU, LER, LWR, DOF, NILS, for different laser spectra for each optimized source mask combination. A machine learning ML model is trained to determine an optimal laser spectrum based on the generated training data. The trained ML model is used to predict an optimal spectrum for the production design layout.

An apparatus for manufacturing a display apparatus includes: a chamber; a mask assembly disposed in the chamber on a first side of a display substrate; a deposition source disposed to face the mask assembly and supplying a deposition material that passes through the mask assembly; and a magnetic force portion including a plurality of magnets extending in a first direction parallel to the mask assembly and disposed on a side opposite to the first side of the display substrate. The magnetic force portion reciprocates in a direction intersecting the first direction.

A three-dimensional printer for printing three-dimensional objects includes a tank sidewall as a component of a tank for containing resin, a mask assembly for filtering light, a door with a movable barrier for temporarily sealing an opening of the three-dimensional printer, a resin cartridge handle for the user to hold the resin cartridge and an inclined control panel is for controlling the operation of the three-dimensional printer. The portions indicated by the solid lines includes the door of the 3D printer.

Described herein are photonic communication platforms that can overcome the memory bottleneck problem, thereby enabling scaling of memory capacity and bandwidth well beyond what is possible with conventional computing systems. Some embodiments provide photonic communication platforms that involve use of photonic modules. Each photonic module includes programmable photonic circuits for placing the module in optical communication with other modules based on the needs of a particular application. The architecture developed by the inventors relies on the use of common photomask sets (or at least one common photomask) to fabricate multiple photonic modules in a single wafer. Photonic modules in multiple wafers can be linked together into a communication platform using optical or electronic means.

An apparatus for manufacturing a display apparatus and a method of manufacturing a display apparatus are disclosed. The apparatus for manufacturing the display apparatus includes: a chamber; a mask assembly disposed inside the chamber to face the display substrate; a holder portion disposed inside the chamber, the holder portion including a cooling channel through which a cooling material flows; and a deposition source disposed inside the chamber and configured to supply a deposition material such that the deposition material passes through the mask assembly and is deposited on the display substrate. At least one of the holder portion and the mask assembly is movable between a first position where the holder portion supports the display substrate and a second position where the holder portion is in contact with the mask assembly.

A mask including: a deposition pattern portion including a plurality of deposition holes that are configured to have deposition material pass therethrough; and a dummy pattern portion outside the deposition pattern portion, wherein the dummy pattern portion includes an auxetic structure having a negative Poisson's ratio.

A mask assembly includes: a mask frame having a frame opening defined therein; and a mask disposed on an upper surface of the mask frame, and clamping grooves defined in the mask on at least one of two sides opposite to each other in the first direction. The mask includes: a cell region having a deposition portion and a dummy portion extending in a first direction from the deposition portion toward the clamp groove; and a peripheral region surrounding the unit region and having a clamping groove defined therein. An inner surface of the peripheral region defining the clamping groove has a shape corresponding to an outer surface of the dummy portion.

The mask assembly includes: a mask frame including an open region; at least one mask sheet covering the opening region of the mask frame; and a support bar disposed between the mask frame and the at least one mask sheet, the support bar extending in a first direction to traverse the opening region, and having both ends fixed to the mask frame. The at least one mask sheet includes: a plurality of sub-masks disposed side by side in a second direction crossing the first direction in which the support bars extend; and a connecting rod disposed between the sub-masks and connecting two adjacent sub-masks among the sub-masks. And the connecting rod is overlapped with the supporting rod in a plane graph.

A mask assembly includes a frame opening, and a mask sheet. The mask sheet includes a first mask including a first body part having at least one first deposition opening, first coupling portions, each of which protrudes from at least one first side of the first body part, and a second mask including a second body part having at least one second deposition opening, second coupling portions, each of which protrudes from at least one first side of the second body part, The at least one first side of the first mask and the at least one first side of the second mask face each other. The first coupling portions overlap the second coupling portions, respectively.

This invention discloses a method for fabricating a metasurface lens and a metasurface lens, relating to the field of metasurface lens technology. The method includes: acquiring a metasurface lens image; dividing the metasurface lens image according to a preset size to obtain at least two sub-images and a mask set corresponding to each sub-image; performing image transfer on a first wafer using the at least two sub-images and the mask set corresponding to each sub-image to obtain a second wafer carrying the metasurface lens image; and performing lens fabrication processing on the second wafer to obtain the metasurface lens. Through this method, this invention can improve efficiency and reduce costs while meeting optical performance requirements.

Light emitting structures and methods of fabrication are described. In an embodiment, LED coupons are transferred to a carrier substrate and then patterned to LED mesa structures. Patterning may be performed on heterogeneous groups of LED coupons with a common mask set. The LED mesa structure are then transferred in bulk to a display substrate. In an embodiment, a light emitting structure includes an arrangement of LEDs with different thickness, and corresponding bottom contacts with different thicknesses bonded to a display substrate.

A pixel arrangement structure, a display panel, a display apparatus and a mask group are provided. The pixel arrangement structure includes basic pixel units in first and / or second directions. Each basic pixel unit includes five sub-pixels, first to third sub-pixels are of different colors, and third to fifth sub-pixels are of a same color; the first sub-pixel includes opposite first and second sides in the first direction, and opposite third and fourth sides in the second direction; and the second sub-pixel is on and separated from the third side of the first sub-pixel, the third sub-pixel is on and separated from the first side of the first sub-pixel, fourth and fifth sub-pixels are both on the fourth side of the first sub-pixel and are separated from the fourth side of the first sub-pixel, and are separated from each other in the first direction.

An apparatus for manufacturing a display device includes: a mask assembly; and a magnetic force portion facing the mask assembly, where the magnetic force portion applies a magnetic force toward the mask assembly. The mask assembly includes: a mask frame having a plurality of first openings defined therethrough and a second opening defined in a first surface thereof, where the second opening is arranged between two adjacent first openings of the plurality of first openings; a mask film disposed on a second surface of the mask frame opposite to the first surface and overlapping with at least one of the plurality of first openings; and a support member on the first surface of the mask frame and including a magnetic body, in which the support member is disposed on a surface of the mask frame defining the first opening or a surface of the mask frame defining the second opening.

The utility model provides a grating structure manufacturing system comprising a light source assembly used for emitting a first light beam and a second light beam which are propagated along different light paths; the mask assembly is of an integrated structure and comprises a first grating phase mask and a second grating phase mask, the grating period of the first grating phase mask is different from that of the second grating phase mask, the first grating phase mask is located on the propagation light path of the first light beam, and the second grating phase mask is located on the propagation light path of the second light beam. The diffraction module is used for diffracting the first light beam to form a first exposure light beam; the second grating phase mask is positioned on a propagation path of the second light beam and is used for diffracting the second light beam to form a second exposure light beam; the exposure substrate is used for bearing an exposure material, and the first exposure light beam and the second exposure light beam are respectively incident to different positions of the exposure substrate, so that grating structures with different periods are formed at different positions of the exposure material when the exposure material is placed on the exposure substrate.

The utility model discloses a parallel correction device of an exposure machine. The parallel correction device comprises a mask assembly, a correction assembly arranged on the mask assembly and a moving assembly, the correction assembly comprises an air cylinder, a correction plate arranged on the air cylinder and a plurality of correction balls arranged on the correction plate; the air cylinder controls the correction plate to enter and exit between the moving assembly and the mask assembly, one end of the correction ball abuts against the side, close to the correction plate, of the mask assembly, and the moving assembly drives a film source to move in the direction close to the mask assembly through torsion control. Therefore, the film source abuts against the plurality of correction balls. According to the utility model, the moving assembly drives the film source to move towards the correction balls, and the torsion-controlled moving assembly ensures that the uniformly distributed correction balls respectively abut against the photomask and the film source, so that the photomask and the film source are arranged in parallel, the alignment time is shortened, the productivity is improved, the exposure effect of the film source is improved, and the rework rate of products is reduced.

An apparatus for manufacturing a mask is provided. The apparatus includes: a stage body portion inclined with respect to a direction of gravity and configured to accommodate a mask frame having an opening therein; a contact portion protruding from one surface of the stage body portion toward the mask frame; and a moving portion configured to move the contact portion. The apparatus may manufacture a mask using a mask assembly with reduced deformation.

A method is provided. The method includes: generating light by a plasma of a light source of a semiconductor processing tool; generating patterned light by a mask assembly, the patterned light including the light reflected by a pattern of the mask assembly; during generating the patterned light, protecting the mask assembly by a pellicle assembly including a pellicle membrane, the pellicle membrane including a nanotube-based scaffold structure having nanotubes bound together by a capping layer; and performing a semiconductor process on a semiconductor wafer by the patterned light.

The invention relates to a perception identification method for verification and evaluation of a space autonomous capture full task chain, and the method comprises the steps: shooting a space region containing a target through a fixed binocular camera, and reconstructing a three-dimensional point cloud model of the space region where the target is located; a mask set of a target to be grabbed is screened out through a deep learning image segmentation algorithm and target feature comparison, a target three-dimensional point cloud is obtained through mapping, geometric centroid calculation and coordinate system conversion are carried out on the point cloud, and a three-dimensional center coordinate of the target under a base coordinate system of the space robot is obtained; a monocular camera carried at the tail end of the space robot is used for shooting multi-view images of a target, and a high-precision target three-dimensional point cloud model with a continuous surface is generated; carrying out fusion registration on the high-precision target three-dimensional point cloud model and the three-dimensional point cloud model of the space region where the target is located to obtain a target complete geometric model with accurate scale and pose; and the optimal grabbing pose and path are calculated. And the problem of autonomous perception and recognition of the robot in the autonomous grabbing process in the space environment is solved.

The utility model relates to a frame module used in a mask assembly for depositing a thin film of a flat panel display device. More specifically, the present invention relates to a CNT fiber stretching device which is stretched from a very thin CNT fiber having a nano-sized diameter, excellent mechanical rigidity and tensile force, and excellent chemical stability, electrical conductivity, and thermal expansibility, and which is disposed in the form of a strip on the upper part of a frame which fixes and supports a plurality of unit masks. The mask assembly and the frame module for depositing a thin film of a flat panel display device can suppress sagging due to gravity of a substrate and deformation of a plurality of unit masks in a thin film deposition process.

The utility model provides a pixel arrangement structure, a display panel, a display device and a mask group. The pixel arrangement structure comprises a plurality of basic pixel units which are arranged in an array mode, each basic pixel unit comprises a first sub-pixel, a second sub-pixel, a third sub-pixel and a fourth sub-pixel, and the first sub-pixel, the second sub-pixel and the third sub-pixel are sub-pixels of different colors. The third sub-pixel and the fourth sub-pixel are sub-pixels with the same color; one of the third sub-pixel and the fourth sub-pixel comprises a single light-emitting layer, the other one of the third sub-pixel and the fourth sub-pixel comprises at least two sub-light-emitting layers which are arranged in a laminated mode, and a charge generation layer is arranged between every two adjacent sub-light-emitting layers. According to the pixel arrangement structure, the problem of color cast of a white picture under low brightness after a reliability test is solved, and meanwhile, the problem of a dark field caused by extinguishment of some pixels can be eliminated, so that the display effect of the display panel is improved, and the yield and the product competitiveness of the display panel are improved.

Disclosed is a hard mask polymer for semiconductor applications including a polymer of specific monomeric components, achieving improved etch resistance, solubility, and mechanical properties. The hard mask polymer is an organic polymer including a structure represented by Formula 1:wherein R1 is a hydrocarbon including one or more benzene ring structures and n is an integer from 1 to 10000. Also disclosed are a hard mask composition for semiconductor applications including the organic polymer and a patterning method using the hard mask composition.

The invention provides a mask assembly and a method of manufacturing the same. The mask assembly includes: a frame including a frame opening; and an open mask including a cell opening overlapping the frame opening. The open mask further includes a support portion overlapping a remaining one of the cell openings other than the first cell opening.