Vortex ring generator and liquid container

Abstract

The utility model provides a vortex ring generation device, which comprises a top wall, a vortex ring, a vortex ring, a vortex ring and a vortex ring, the side wall is arranged around one side of the top wall so as to form a gas cavity together with the top wall; a first air inlet is formed in the side wall, and the first air inlet is communicated with the first through hole through the air cavity; the siphon baffle is contained in the gas cavity, the siphon baffle is arranged around the first through hole to form an acceleration cavity, and the hole diameter of the acceleration cavity is increased along with the distance from the first through hole. The vortex ring generating device provided by the embodiment of the utility model is simple in structure and beneficial to reducing the pressure of an air source. The utility model further provides a liquid container comprising the vortex ring generating device.

Description

Technical Field

[0001] The present application relates to a vortex ring generating device and a liquid container applying the vortex ring generating device. Background Art

[0002] Current vortex ring generating devices all require the use of a powerful external source pressure, or use a structure such as a cylinder to quickly push the gas. After the gas passes through a small gap, due to the adhesion of the gas, the gas velocity near the gap wall is small and the velocity in the middle is large. As a result, a velocity difference is generated in the radial direction of the gas, leading to the formation of a rotational torque in the axial direction, and then forming a vortex ring bubble. However, this method has a high demand for the gas source pressure, resulting in a high overall cost and being prone to damage. Summary of the Utility Model

[0003] On the one hand, the present application provides a vortex ring generating device, including:

[0004] A top wall, with a first through hole opened on the top wall;

[0005] A side wall, which is disposed around one side of the top wall to jointly form a gas chamber with the top wall; a first air inlet is opened on the side wall, and the first air inlet and the first through hole are communicated through the gas chamber; and

[0006] A siphon baffle, which is accommodated in the gas chamber, and the siphon baffle is disposed around the first through hole to form an acceleration chamber, and the aperture of the acceleration chamber increases as it is farther away from the first through hole.

[0007] For the vortex ring generating device provided by the embodiment of the present application, by arranging a siphon baffle in the gas chamber and setting the aperture of the siphon baffle to increase as it is farther away from the first through hole, when the gas flows from the gas chamber into the siphon baffle and then continues to flow out towards the first through hole, it will be compressed as the aperture decreases, thereby increasing the gas pressure. As a result, when the gas flows out from the first through hole, the gas velocity is relatively fast, so that a vortex ring is more easily formed, thereby reducing the demand for the gas source pressure. The overall structure is simple and the cost is low.

[0008] In one embodiment, the side of the top wall away from the side wall includes a diffusion surface, the diffusion surface is recessed towards the side close to the gas chamber, and the first through hole is located at the bottom end of the depression of the diffusion surface.

[0009] In one embodiment, one end of the side wall away from the top wall includes a plurality of support portions, the support portions extend in a direction away from the top wall; an opening is formed between any two adjacent support portions, and the opening communicates the gas chamber with the outside of the side wall.

[0010] In one embodiment, at least one second through-hole is further formed in the top wall, and at least one second air inlet is further formed in the side wall; the vortex ring generating device further includes at least one connecting pipe, and each connecting pipe connects a second through-hole and a corresponding second air inlet, and the connecting pipe isolates the second through-hole and the second air inlet from the gas chamber.

[0011] In one embodiment, the vortex ring generating device further includes a first air pipe and at least one second air pipe. The first air pipe is arranged on the side of the side wall away from the gas chamber and is communicated with the first air inlet; the second air pipe is arranged on the side of the side wall away from the gas chamber and is communicated with a second air inlet.

[0012] In one embodiment, a support structure is further arranged around the top wall. The first air pipe and the second air pipe extend from the side wall to the position of the support structure and are connected to the support structure.

[0013] On the other hand, the present application provides a liquid container, which includes:

[0014] the vortex ring generating device according to any of the above embodiments; and

[0015] a solution tank, at least including a bottom wall and a tank wall arranged around the bottom wall; the solution tank houses the vortex ring generating device and is used for housing liquid;

[0016] wherein, the side wall of the vortex ring generating device faces the bottom wall relative to the top wall.

[0017] The liquid container provided by the embodiment of the present application can generate vortex ring bubbles relatively easily by arranging the above-mentioned vortex ring generating device, has a simple structure, and is beneficial to reducing costs.

[0018] In one embodiment, the liquid container further includes an air inlet device for ventilating the first air inlet; the air inlet device includes an air valve and an air inlet pipe. The air inlet pipe is communicated with the first air inlet, and the air valve is communicated with the air inlet pipe.

[0019] In one embodiment, the air inlet device further includes an air tank for storing the gas to be transported, and the air valve is used for pumping out the gas from the air tank and transporting it to the vortex ring generating device.

[0020] In one embodiment, an air inlet through-hole is further formed in the side wall, and the air inlet pipe penetrates through the air inlet through-hole to be communicated with the vortex ring generating device. BRIEF DESCRIPTION OF THE DRAWINGS

[0021] Figure 1 It is a schematic structural diagram of the vortex ring generating device in the embodiment of the present application.

[0022] Figure 2 is Figure 1 the II-II sectional view of

[0023] Figure 3 is the structural schematic diagram of the vortex ring generating device in another embodiment of the present application.

[0024] Figure 4 is the schematic diagram of the principle of generating a vortex ring by the vortex ring generating device in the embodiment of the present application.

[0025] Figure 5 is the structural schematic diagram of the liquid container in an embodiment of the present application.

[0026] Figure 6 is the structural schematic diagram of the liquid container in another embodiment of the present application.

[0027] Description of main element symbols

[0028] Vortex ring generating device 100

[0029] Top wall 10

[0030] Diffusion surface 11

[0031] First through hole 12

[0032] Second through hole 14

[0033] Gas chamber 20

[0034] Side wall 30

[0035] Support portion 31

[0036] Opening 32

[0037] First air inlet 34

[0038] Second air inlet 36

[0039] Siphon baffle 50

[0040] Acceleration chamber 60

[0041] Connecting pipe 70

[0042] Support structure 90

[0043] First air pipe 91

[0044] Second air pipe 93

[0045] Liquid container 200

[0046] Solution tank 210

[0047] Bottom wall 211

[0048] Slot wall 213

[0049] Intake through-hole 2132

[0050] Intake device 230

[0051] Intake pipe 231

[0052] Air valve 233

[0053] Air tank 235

[0054] Flow meter 237

[0055] Liquid L

[0056] Gas G

[0057] Vortex ring bubble V

[0058] The following specific embodiments will further illustrate the present application in conjunction with the above-mentioned drawings. Specific embodiments

[0059] The technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the drawings in the embodiments of the present application. Obviously, the described embodiments are only a part of the embodiments of the present application, rather than all of the embodiments.

[0060] Unless otherwise defined, all technical and scientific terms used in the present application have the same meaning as commonly understood by those skilled in the technical field to which the present application belongs. The terms used in the specification of the present application are only for the purpose of describing specific embodiments, and are not intended to limit the present application.

[0061] In order to further elaborate on the technical means and effects adopted by the present application to achieve the predetermined purpose, the following detailed description of the present application is made in conjunction with the drawings and preferred embodiments.

[0062] Please refer to Figure 1 and Figure 2 , the vortex ring generating device 100 provided by the embodiment of the present application includes a top wall 10, a side wall 30, and a siphon baffle 50. The side wall 30 is disposed on one side of the top wall 10 and is disposed around the top wall 10. The top wall 10 and the side wall 30 together form a gas chamber 20. A first through-hole 12 is formed in the top wall 10, and a first air inlet 34 is formed in the side wall 30. The first air inlet 34 is communicated with the first through-hole 12 through the gas chamber 20. The siphon baffle 50 is accommodated in the gas chamber 20 and is disposed around the first through-hole 12 to form an acceleration chamber 60. The aperture of the acceleration chamber 60 increases as it is away from the first through-hole 12, and the acceleration chamber 60 is communicated with the gas chamber 20.

[0063] The vortex ring generating device 100 provided by the embodiment of the present application is used to be placed in a liquid, and gas is filled into the gas chamber 20 through the first air inlet 34, so that the gas in the gas chamber 20 flows out through the first through hole 12. After the gas passes through the first through hole 12, due to the adhesion of the gas, the gas velocity near the wall surface of the first through hole 12 is small, and the velocity in the middle is large. Furthermore, a velocity difference is generated in the radial direction of the gas, resulting in a rotational torque in the axial direction, and then a vortex ring bubble is formed.

[0064] One side of the top wall 10 away from the side wall 30 includes a diffusion surface 11. The diffusion surface 11 is recessed toward the side close to the gas chamber 20, and the first through hole 12 is located at the bottom of the recess of the diffusion surface 11. Specifically, the diffusion surface 11 is recessed in the direction of the first through hole 12 to form an approximate conical surface, so that one side of the top wall 10 away from the side wall 30 forms a trumpet-shaped opening relative to the first through hole 12. When the gas flows out of the gas chamber 20 through the first through hole 12, due to the adhesion of the gas, the gas flowing out of the first through hole 12 will adhere to the diffusion surface 11, and then diffuse around along the diffusion surface 11 after flowing out of the first through hole 12, thereby enhancing the diffusion of the vortex ring bubble.

[0065] The side wall 30 is a cylindrical structure, and the top wall 10 is arranged at one end of the side wall 30, so as to seal the side wall 30 from one side and form the gas chamber 20. The other end of the side wall 30 is open, so that the gas chamber 20 is communicated with the outside. The side wall 30 can be cylindrical, square cylindrical or other structures, and the present application does not limit this. As long as the gas chamber 20 can be formed, it is within the scope of the present application.

[0066] In this embodiment, the end of the side wall 30 away from the top wall 10 is relatively flat, and the gas chamber 20 is communicated with the outside through the opening at the end of the side wall 30 away from the top wall 10. In another embodiment, please refer to Figure 3 , the end of the side wall 30 away from the top wall 10 extends in the direction away from the top wall 10 to form a plurality of support portions 31, and an opening 32 is formed between any two adjacent support portions 31. The opening 32 is used to communicate both sides of the side wall 30. Specifically, in order to prevent the side wall 30 from contacting the bottom wall of the container for holding the liquid when the vortex ring generating device 100 is placed in the liquid, resulting in the gas chamber 20 being unable to communicate with the outside, the support portions 31 can be provided, so that the gas chamber 20 can communicate with the outside through the opening 32 between the support portions 31. In other embodiments, there can also be only one support portion 31, and the present application does not limit this. As long as it can ensure that the gas chamber 20 is connected to the outside at the end of the side wall 30 away from the top wall 10, it is within the scope of the present application.

[0067] Please refer to again Figure 1 and Figure 2, in this embodiment, a second through hole 14 is further formed in the top wall 10, and a second air inlet 36 is further formed in the side wall 30. The vortex ring generating device 100 further includes a connecting pipe 70 for connecting the second through hole 14 and the second air inlet 36 and isolating the second through hole 14 and the second air inlet 36 from the gas chamber 20. Specifically, the connecting pipe 70 is used to conduct the second through hole 14 and the second air inlet 36 while isolating them from the gas chamber 20, so that the air entering from the second air inlet 36 can flow out through the second through hole 14.

[0068] In other embodiments, a plurality of second through holes 14 may be formed in the top wall 10, and a plurality of second air inlets 36 may also be formed in the side wall 30. Each second air inlet 36 is connected to a corresponding second through hole 14 through a connecting pipe 70. The present application does not limit the number of the second through holes 14.

[0069] In the embodiment of the present application, by providing the second through hole 14 on the top wall 10, providing the second air inlet 36 on the side wall 30, and connecting the second through hole 14 and the second air inlet 36 through the connecting pipe 70, the second through hole 14 can be independently used to generate small bubbles in the liquid. That is, when the vortex ring generating device 100 releases vortex ring bubbles through the first through hole 12, it can also independently release small bubbles through the second air inlet 36, which is beneficial to enrich the usage scenarios of the vortex ring generating device 100.

[0070] In this embodiment, the vortex ring generating device 100 further includes a first air pipe 91 and a second air pipe 93. The first air pipe 91 is disposed on the side of the side wall 30 away from the gas chamber 20 and is connected to the first air inlet 34. The second air pipe 93 is disposed on the side of the side wall 30 away from the gas chamber 20 and is connected to the second air inlet 36. Specifically, the first air pipe 91 extends from the position of the first air inlet 34 on the side wall 30 in a direction away from the side wall 30 to form a tubular structure. The second air pipe 93 extends from the position of the second air inlet 36 on the side wall 30 in a direction away from the side wall 30 to form a tubular structure. The first air pipe 91 and the second air pipe 93 are respectively used to communicate with an external air delivery device (not shown in the figure) to deliver gas to the first air inlet 34 and the second air inlet 36 respectively. By providing the first air pipe 91 and the second air pipe 93, the positions of the first air pipe 91 and the second air pipe 93 can be adjusted to facilitate connection with the air delivery device, thereby improving the convenience of connection.

[0071] A support structure 90 is also provided around the top wall 10. The first air pipe 91 and the second air pipe 93 extend from the side wall 30 to the position of the support structure 90 and are thus connected to the support structure 90. Specifically, the support structure 90 is used to fix the positions of the first air pipe 91 and the second air pipe 93, thereby improving the stability of the overall structure of the vortex ring generating device 100. The support structure 90 can also be used to fix the position of the vortex ring generating device 100 when the vortex ring generating device 100 is placed in a liquid container.

[0072] Next, the specific structure of the vortex ring generating device 100 will be further described in conjunction with the specific process of generating vortex ring bubbles by the vortex ring generating device 100.

[0073] Please refer to Figure 4 , when the vortex ring generating device 100 is placed in the liquid L, due to the siphon principle, the liquid L flows into the gas chamber 20 and the acceleration chamber 60 through the side of the gas chamber 20 away from the top wall 10, and is communicated with the liquid L on the side of the top wall 10 away from the gas chamber 20 through the first through hole 12. At this time, if gas G is input into the gas chamber 20 through the first air inlet 34, the gas G will gather on the side of the gas chamber 20 close to the top wall 10 under the action of gravity, and the volume will increase with the injection of the gas G, thereby applying pressure to the liquid L in the gas chamber 20, causing the liquid level height in the gas chamber 20 to drop.

[0074] When the liquid level drops below the siphon baffle 50, due to the buoyancy potential energy of the gas G itself, the liquid L in the gas chamber 20 will press the gas G into the acceleration chamber 60, so that the gas G flows into the acceleration chamber 60, and the liquid L in the acceleration chamber 60 is discharged to the outside of the gas chamber 20 through the first through hole 12. At this time, the gas G in the gas chamber 20 also flows into the acceleration chamber 60. Since the aperture of the acceleration chamber 60 becomes smaller closer to the first through hole 12, the flow rate of the gas G flowing into the acceleration chamber 60 increases as it approaches the first through hole 12. Due to the adhesion of the gas, the gas flow rate near the siphon baffle 50 is slower, while the gas flow rate in the middle is faster. When passing through the first through hole 12, the gas G near the wall surface of the first through hole 12 has a small speed, and the speed in the middle is large, thereby generating a speed difference in the radial direction of the gas G, resulting in a rotational torque in the axial direction, and then forming a vortex ring bubble V after flowing out of the first through hole 12.

[0075] When the gas G flows out of the first through hole 12, due to the adhesion of the gas, part of the gas will diffuse around along the diffusion surface 11 in a direction away from the first through hole 12, thereby increasing the radial size of the vortex ring bubble V, which is beneficial to the formation of the vortex ring bubble V.

[0076] After a part of the gas G flows out through the acceleration chamber 60 and forms a vortex ring bubble V, the liquid level in the gas chamber 20 rises, thereby isolating the acceleration chamber 60 from the gas chamber 20. At this time, no gas G flows out of the first through hole 12, thus completing the release of a vortex ring bubble V.

[0077] The vortex ring generating device 100 provided by the embodiment of the present application can form an acceleration chamber 60 by arranging a siphon baffle 50, so as to accelerate the gas G when the gas flows into the acceleration chamber 60, and further make the vortex ring bubble V easier to form, reducing the pressure requirement for the gas source. By arranging the second through hole 14, the second air inlet 36 and the connecting pipe 70, small bubbles can be independently generated while generating the vortex ring bubble V, which is beneficial to expanding the application scenarios of the vortex ring generating device 100.

[0078] Please refer to Figure 5 , the embodiment of the present application also provides a liquid container 200, which includes the vortex ring generating device 100, a solution tank 210 and an air inlet device 230 in the above embodiment. The vortex ring generating device 100 is placed in the solution tank 210, and the air inlet device 230 is connected to the vortex ring generating device 100. Specifically, the solution tank 210 includes a bottom wall 211 and a tank wall 213. The solution tank 210 is used to hold the liquid L. The vortex ring generating device 100 is immersed in the liquid L, and the side wall 30 of the vortex ring generating device 100 faces the bottom wall 211 of the solution tank 210 relative to the top wall 10.

[0079] Wherein, the support structure 90 of the vortex ring generating device 100 abuts against the tank wall 213 of the solution tank 210, so as to fix the relative position of the vortex ring generating device 100 and the solution tank 210.

[0080] The air inlet device 230 is respectively communicated with the first air inlet 34 and the second air inlet 36 of the vortex ring generating device 100 for respectively supplying air to the first air inlet 34 and the second air inlet 36. Specifically, the air inlet device 230 includes an air inlet pipe 231, an air valve 233, an air tank 235 and a flow meter 237. Two air inlet pipes 231 are respectively connected to the first air pipe 91 and the second air pipe 93 and finally communicated to the air tank 235. The air valve 233 and the flow meter 237 are sequentially arranged on the air inlet pipe 231. The air valve 233 is used to control the flow rate and on / off of the gas in the air inlet pipe 231, for example, it is an electromagnetic valve. The flow meter 237 is used to monitor the flow rate of the gas in the air inlet pipe 231. The air tank 235 is used to provide the gas G to be transported. The gas G in the air tank 235 can be air, pure carbon dioxide or other mixed gases, and the present application does not limit this.

[0081] In other embodiments, the air tank 235 can also be replaced with an air pump, a combined air supply of an air pump and an air tank 235 or other air supply devices according to actual usage requirements, and the present application does not limit this.

[0082] Please refer to Figure 6 Figure 6 , in another embodiment, an intake through-hole 2132 is further formed in the groove wall 213. The intake device 230 communicates with the solution tank 210 through the intake through-hole 2132 and is connected to the vortex ring generating device 100. That is, the intake pipe 231 penetrates through the intake through-hole 2132 and is connected to the vortex ring generating device 100 in the solution tank 210. By providing the intake through-hole 2132, it is possible to avoid the intake pipe 231 being too long due to the excessive height of the groove wall 213, which is beneficial to improving the aesthetic appearance of the liquid container 200.

[0083] The liquid container 200 provided by the embodiment of the present application can be applied as an underwater viewing device, and the vortex ring bubbles V can enrich the viewing experience. The liquid container 200 can also be applied as a photobioreactor culture device for photosynthetic cells such as microalgae. The vortex ring bubbles V can fully stir the solution to reduce the adhesion of photosynthetic cells such as microalgae to the wall, thereby preventing the obstruction of the light source caused by adhesion and avoiding reducing the culture effect. The present application does not limit the specific usage scenarios of the liquid container 200.

[0084] The liquid container 200 provided by the embodiment of the present application can relatively easily generate vortex ring bubbles V by adopting the vortex ring generating device 100, and can also independently generate small bubbles. The structure is simple, which reduces the manufacturing difficulty and is also beneficial to enriching the usage scenarios.

[0085] Those of ordinary skill in the art in this technical field should recognize that the above embodiments are only used to illustrate the present application and are not used to limit the present application. As long as within the scope of the spirit of the present application, appropriate changes and variations made to the above embodiments fall within the scope claimed by the present application.

Claims

1. A vortex ring generating device, characterized in that: include: A top wall, wherein a first through hole is formed on the top wall; a side wall, the side wall being arranged around one side of the top wall to form a gas cavity together with the top wall; a first gas inlet is opened on the side wall, and the first gas inlet and the first through hole are connected through the gas cavity; and The siphon baffle is accommodated in the gas cavity. The siphon baffle is arranged around the first through hole to form an acceleration cavity. The aperture of the acceleration cavity increases as it moves away from the first through hole.

2. The vortex ring generating device according to claim 1, characterized in that: The side of the top wall away from the side wall comprises a diffusion surface, the diffusion surface is recessed toward the side close to the gas cavity, and the first through hole is located at the bottom end of the recess of the diffusion surface.

3. The vortex ring generating device according to claim 1, characterized in that: One end of the side wall away from the top wall includes a plurality of support portions, and the support portions extend in a direction away from the top wall; an opening is formed between any two adjacent support portions, and the opening communicates with both sides of the side wall.

4. The vortex ring generating device according to claim 1, characterized in that: At least one second through hole is also provided on the top wall, and at least one second air inlet is also provided on the side wall; the vortex ring generating device also includes at least one connecting tube, each of the connecting tubes connects a second through hole and a corresponding second air inlet, and the connecting tube isolates the second through hole and the second air inlet from the gas cavity.

5. The vortex ring generating device according to claim 4, characterized in that: It also includes a first air pipe and at least one second air pipe, wherein the first air pipe is arranged on a side of the side wall away from the gas cavity and is connected to the first air inlet; the second air pipe is arranged on a side of the side wall away from the gas cavity and is connected to one of the second air inlets.

6. The vortex ring generating device according to claim 5, characterized in that: A supporting structure is also provided around the top wall, and the first air pipe and the second air pipe extend from the side wall to the position of the supporting structure and are connected to the supporting structure.

7. A liquid container, characterized in that: include: The vortex ring generating device according to any one of claims 1 to 6; as well as A solution tank, comprising at least a bottom wall and a tank wall arranged around the bottom wall; The solution tank accommodates the vortex ring generating device and is used to contain liquid; Wherein, the side wall of the vortex ring generating device is arranged toward the bottom wall relative to the top wall.

8. The liquid container according to claim 7, characterized in that It also includes an air intake device, which is used to ventilate the first air inlet; the air intake device includes an air valve and an air intake pipe, the air intake pipe is connected to the first air inlet, and the air valve is connected to the air intake pipe.

9. The liquid container according to claim 8, characterized in that The air intake device also includes a gas tank, which is used to store the gas to be transported, and the gas valve is used to pump the gas out of the gas tank and transmit it to the vortex ring generating device.

10. The liquid container according to claim 8, characterized in that An air intake hole is also provided on the groove wall, and the air intake pipe passes through the air intake hole to be connected with the vortex ring generating device.

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