Detection attachment and detection device

Abstract

The utility model is suitable for the field of shearing force detection of a layered structure, and relates to a detection accessory and a detection device. Wherein the detection additional part comprises a first additional layer covering the layered structure and a second additional layer covering the side, away from the layered structure, of the first additional layer, and the length of the second additional layer in the shearing direction of the layered structure is smaller than that of the first additional layer; the adhesive force between the first additional layer and the layered structure and the adhesive force between the second additional layer and the first additional layer are both larger than Van der Waals force between the two-dimensional structural layers in the layered structure. The detection accessory and the detection device provided by the utility model can effectively improve the detection accuracy of the microscopic shear force of the layered structure.

Description

Technical Field

[0001] This application belongs to the field of shear force detection of layered structures, and particularly relates to a detection attachment and detection device. Background Technology

[0002] Van der Waals layered materials / layered structures have rapidly become a cutting-edge field internationally due to their excellent mechanical, thermal, and electrical properties, demonstrating enormous application potential in areas such as nanocomposites, flexible electronic devices, and microelectromechanical systems (MEMS). Mechanical property testing is essential for understanding the microstructure of materials, improving material quality, and maximizing their potential. Due to the typical in-plane strength and out-of-plane weakness characteristic of layered materials, the interface-dominated deformation mechanism and mechanical response are a major focus of layered material mechanics research. Accurately measuring the shear strength of materials is one of the important criteria for evaluating the growth quality and internal defects of layered materials, and has significant reference value for materials research and device design applications.

[0003] Current methods for testing the shear properties of layered materials face several challenges: Traditional shearing equipment, such as universal testing machines, is suitable for macroscopic bulk materials, but only a very limited number of two-dimensional materials can be grown to macroscopic dimensions, restricting material selection. Furthermore, once materials reach macroscopic scales, their internal structures become complex, containing multiple single crystal domains and grain boundaries. Macroscopic shear testing only reflects the overall mechanical properties of the material, making it difficult to understand its intrinsic properties and hindering guidance for the growth and application of layered materials. Existing methods for testing microscopic shear mechanical properties also have limitations. For example, Raman spectroscopy is only applicable to a very small number of layers, and AFM-based probes directly contact the material surface, leading to inaccurate shear strength readings due to inhomogeneous stress fields. Utility Model Content

[0004] The purpose of this application is to overcome the shortcomings of the prior art and provide a detection attachment and detection device, which aims to improve the accuracy of micro-shear force detection of layered structures.

[0005] This application provides a detection attachment for assisting in the detection of microscopic shear forces in a layered structure. It includes a first attachment layer covering the layered structure and a second attachment layer covering the side of the first attachment layer opposite to the layered structure. The length of the second attachment layer along the shear direction of the layered structure is less than that of the first attachment layer. The adhesion force between the first attachment layer and the layered structure, and the adhesion force between the second attachment layer and the first attachment layer, are both greater than the van der Waals forces between the two-dimensional structural layers within the layered structure.

[0006] Optionally, the first additional layer completely covers the upper surface of the layered structure.

[0007] Optionally, the first additional layer does not cover the sides of the layered structure, leaving the sides of the layered structure completely exposed.

[0008] Optionally, the first additional layer has the same length as the layered structure in the shear direction.

[0009] Optionally, the thickness of the second additional layer is 1.0-5.0 μm.

[0010] Optionally, the first additional layer and / or the second additional layer are metal films.

[0011] Optionally, the second additional layer and the first additional layer are made of different materials.

[0012] Optionally, the first additional layer is a titanium-aluminum film.

[0013] Optionally, the second additional layer is an aluminum film.

[0014] This application also provides a detection device, including:

[0015] A stage for placing a layered structure, on which the detection attachments described above are attached;

[0016] The detection assembly includes a probe and a force sensor, the probe being used to apply a shear force to the second additional layer, and the force sensor being used to detect the shear force;

[0017] An imaging component is used to observe and analyze the shear interface information of the layered structure.

[0018] The testing attachment and the testing device based on it provided in this application are suitable for shear strength testing of small-sized layered structures and are easy to operate. The testing attachment is applied to the layered structure. The second additional layer of the attachment bears the concentrated load applied by the probe, and then the concentrated load is distributed to the layered structure through the first additional layer. Compared to a square mask, the attachment increases the out-of-plane stiffness of the layered structure, improving its bending resistance. Simultaneously, the attachment transforms the concentrated load into a distributed load or even a uniformly distributed load, thereby adjusting the stress distribution and eliminating other mechanical behaviors that impair shear strength performance, such as crack propagation. The tested shear strength is independent of size, the measurement reflects the intrinsic mechanical properties of the material, and the test results are accurate and effective. Attached Figure Description

[0019] To more clearly illustrate the technical solutions in the embodiments of this application, the drawings used in the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0020] Figure 1 This is a schematic diagram of the shear force test of the layered structure in an embodiment of this application;

[0021] Figure 2 It is a graph showing the shear force versus displacement of a square mask sample;

[0022] Figure 3 yes Figure 2 Deformation image of the sample in the middle;

[0023] Figure 4 This is a comparison diagram of the shear strength and size relationship between the square mask sample and the L-shaped sample in this embodiment;

[0024] Figure 5 This is a comparison diagram of the finite element stress analysis of the square mask sample and the L-shaped sample in this embodiment;

[0025] Figure 6 This is a graph showing the relationship between sample size and shear strength calculated by finite element simulation for a square mask sample and an L-shaped sample in this embodiment;

[0026] Figure 7 This is a comparison diagram of the shear strength of various graphite samples in this embodiment;

[0027] Figure 8 This is a schematic diagram of the processing flow of the inspection attachment in the embodiments of this application.

[0028] Explanation of icon numbers:

[0029] 11. Stage; 21. Microscope; 31. Force sensor; 32. Probe; 41. Accessory; 42. Layered structure. Detailed Implementation

[0030] To make the objectives, technical solutions, and advantages of this application clearer, the following detailed description is provided in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative and not intended to limit the scope of this application.

[0031] Furthermore, in the description of this application, "multiple" means two or more, unless otherwise explicitly specified.

[0032] It should also be noted that the directional terms such as left, right, up, and down in the embodiments of this application are only relative concepts or are based on the normal use state of the product, and should not be considered as restrictive.

[0033] Example 1

[0034] Please refer to Figure 1 This embodiment provides a detection attachment 41 and a method for detecting microscopic shear force on a layered structure 42 based on the attachment 41.

[0035] In this embodiment, the layered structure 42 can be a layered structure 42 formed by stacking and growing two-dimensional materials such as graphene, boron nitride, molybdenum disulfide (MoS2), tungsten disulfide (WS2), molybdenum diselenide (MoSe2), and tungsten diselenide (WSe2). It can also be a layered structure 42 made of highly oriented pyrolytic graphite, natural graphite, etc.

[0036] The sample thickness required for the experimental measurements is very thin. In the experiment, a thick sample can be cleaved, and approximately 3-5 μm of the first layer structure can be torn off for processing and measurement. Of course, this first layer structure is composed of multiple two-dimensional structural layers. The microscopic shear force detection involved in this embodiment is the detection of the shear force required for the relative lateral movement between the two-dimensional structural layers.

[0037] If shear force is applied directly to the layered structure, this shear force is a concentrated load that acts directly on the material surface. On the one hand, the uneven stress field can easily lead to a low shear strength test result. On the other hand, the layered structure is prone to bending under stress, which further affects the accuracy of the test results.

[0038] Specifically, the shear failure process of the layered structure 42 usually involves two failure modes: Type I fracture mode "opening type" (normal direction) and Type II fracture mode "shear type" (transverse direction). Only when Type II fracture mode occurs is it a uniform shear failure, and only then can the shear strength be measured accurately.

[0039] When a concentrated load is applied to the tip, the stress needs to be transferred to the graphite below through the interface. If the stress is not uniformly distributed in the horizontal direction, it will cause the interface to bend and deform, resulting in a type I fracture mode called "opening type", which makes the measurement results inaccurate.

[0040] To improve the bending resistance of layered structures, those skilled in the art can cover the outer layer of the layered structure with a mask, which is a thin film layer with a square cross-section (hereinafter referred to as a square mask for ease of description). This arrangement effectively improves the bending resistance of the layered structure.

[0041] Please refer to Figure 2 , Figure 2It is a shear test based on a square mask design, that is, a square mask is attached to the layered structure / sample, and the probe 32 pushes the square mask to perform a micro-shear test on the sample. Figure 2 In the figure, the horizontal axis represents the real-time moving distance of the probe 32, and the vertical axis represents the real-time shear force detected on the sample. The BC stage is the loading stage, during which the sample undergoes shear elastic deformation. In the CD stage, the sample interface fails and cracks within a short time. Then, in the DE stage, the sample continues to fail, with the cracks continuously propagating along the normal direction (Type I fracture mode) and the transverse direction (Type II shear mode).

[0042] Figure 3 This is an image of a square mask sample after a shearing test. Figure 3 The crack in the middle corresponds to Figure 2 The crack shape in the DE stage shows that the sample exhibits both Type I fracture mode and Type II shear mode during the test.

[0043] Experiments have shown that when measuring the shear strength of a sample with a square mask attached, the measurement result is related to its size. In other words, the size of the square mask / sample affects the shear strength result.

[0044] Please refer to Figure 4 The x-axis represents the lateral dimension of the sample, and the y-axis represents the shear strength. For square mask samples, we fabricated samples with mask thicknesses of 200 nm (square-200), 500 nm (square-500), and 1000 nm (square-1000). Experiments showed that the shear strength of the sample decreased with increasing sample / square mask size; therefore, the measured shear strength is not an intrinsic property of the material.

[0045] Through in-depth research and numerous experiments, it was discovered that changing the square mask to an L-shaped or inverted T-shaped mask resulted in a measured shear strength that did not change with the sample size. In other words, the measured shear strength was the inherent shear strength of the material, representing its intrinsic property. Further theoretical analysis and quantitative testing led to the optimized design of the mask structure, resulting in the detection attachment 41 to be protected by this invention, and a method for detecting the microscopic shear force of the layered structure 42 based on this attachment 41.

[0046] Please refer to Figure 1 The detection attachment (hereinafter referred to as attachment 41 for simplicity) includes a first attachment layer covering the upper surface of the layered structure 42, and a second attachment layer covering the side of the first attachment layer away from the layered structure 42, wherein the length of the second attachment layer along the shear direction of the layered structure 42 is less than that of the first attachment layer.

[0047] The attachment 41 is applied to the layered structure 42. During testing, the probe 32 applies a shear force to the second attachment layer until lateral movement occurs between the two-dimensional structural layers of the layered structure 42. The shear strength of the layered structure 42 is calculated by measuring and reading the magnitude of the reaction force (force sensor 31) acting on the probe 32.

[0048] In this embodiment, the attachment 41 has a double-layer structure (a first attachment layer and a second attachment layer). The lower layer / first attachment layer covers the layered structure 42 to be tested, and the upper layer / second attachment layer protrudes to provide the point of application of shear force. Taking the layered structure 42 to be tested as a cuboid as an example, the attachment 41 covers the upper surface of the layered structure 42, and its cross-section along the length direction is L-shaped or inverted T-shaped, forming a right angle between the upper surface of the first attachment layer and the side surface of the second attachment layer. The probe 32 acts on the vertical side of the right angle, that is, the side surface of the second attachment layer. Figure 1 In the structure shown, the attachment 41 is L-shaped.

[0049] Undoubtedly, the adhesion between the first additional layer and the layered structure 42, as well as the adhesion between the second additional layer and the first additional layer, are greater than the van der Waals forces between the two-dimensional structural layers within the layered structure 42. This results in relative lateral movement between the two-dimensional structural layers when the probe 32 applies a shear force to the second additional layer, while no relative movement occurs between the first additional layer, the second additional layer, and the uppermost layer of the layered structure 42.

[0050] Please refer to Figure 4 Taking an L-shaped mask as an example, an L-shaped mask was placed on the layered structure 42 / sample, and shear force was measured. It was found that the shear strength of the samples covered with the L-shaped mask remained stable at around 62 MPa, with sample sizes ranging from 0 to 6 μm. This shows that the shear strength of the L-shaped mask samples does not change with the sample size, indicating that the measured shear strength is the inherent shear strength.

[0051] Please refer to Figure 5 Finite element models were established based on square mask samples and L-shaped samples. (i) shows the stress analysis of the square mask sample, where the circle indicates the location where the needle tip applies lateral force, and the varying shades of color within the surface represent stress concentration at the interface. (ii) shows the stress analysis of the L-shaped sample, where the stress distribution at the interface is more uniform compared to the square sample. It can be seen that the add-on 41 provided in this embodiment has stronger resistance to bending deformation compared to the square mask design. Furthermore, the location where concentrated loads are applied is farther from the failure interface, resulting in a more uniform stress distribution at locations where stress is transmitted further.

[0052] Please refer to Figure 6Based on the correlation between sample size and shear strength calculated using finite element analysis, it can be observed that the shear strength of the square sample gradually increases as the sample size decreases, indicating that the test results of this mask sample exhibit a size effect and are not an intrinsic property of the sample. In contrast, the theoretically calculated shear strength of the L-shaped sample does not show a size effect. In other words, this shear strength is an intrinsic mechanical property of the sample. Therefore, using the add-on 41 provided in this embodiment for microscopic shear force testing, the test structure can reflect the intrinsic mechanical properties of layered materials, and can be used to detect and evaluate the growth quality of single-crystal materials.

[0053] Please refer to Figure 7 Using this structural design, we compared the single-crystal quality of highly oriented pyrolytic graphite, natural graphite, and high-quality single-crystal graphite grown in our laboratory. The experiment revealed that the high-quality single-crystal graphite exhibited the highest and most stable shear strength, indicating the highest growth quality. The results for highly oriented pyrolytic graphite and natural graphite were lower, which is consistent with the fact that these two materials, due to the presence of polycrystalline domains, are not perfect single-crystal materials. Therefore, this experiment confirms that using the add-on 41 provided in this embodiment for microscopic shear force testing, and evaluating the quality of the grown material from a mechanical perspective, yields high accuracy.

[0054] As described above, the attachment 41 and the method for detecting microscopic shear force on the layered structure 42 based on the attachment 41 provided in this embodiment involve covering the layered structure 42 with a first additional layer, followed by a second additional layer. The length of the second additional layer along the shear direction of the layered structure 42 is less than that of the first additional layer. The second additional layer bears the concentrated load applied by the probe 32, and then the concentrated load is distributed to the layered structure 42 through the first additional layer. Compared with a square mask, the attachment 41 improves the out-of-plane stiffness of the material of the layered structure 42, thereby improving its bending resistance. At the same time, the attachment 41 transforms the concentrated load into a distributed load or even a uniformly distributed load, thereby adjusting the stress distribution and eliminating other mechanical behaviors that impair shear strength performance, such as crack propagation. The tested shear strength is independent of size, and the measured value represents the intrinsic properties of the material, making the test results accurate and effective.

[0055] In another embodiment of this application, please refer to Figure 1 The first additional layer completely covers the upper surface of the layered structure 42. This arrangement effectively ensures that the entire upper surface of the layered structure 42 is a stress-bearing surface, thereby maximizing the uniform distribution of stress.

[0056] In another embodiment of this application, please refer to Figure 1 The first additional layer does not cover the sides of the layered structure 42, leaving the sides of the layered structure 42 completely exposed.

[0057] The first additional layer does not cover the sides of the layered structure 42; in other words, there is no adhesion of the first additional layer to the sides. It is understood that when the first additional layer material is adhered to the sides, this adhesion increases the resistance to lateral movement between the layers of the two-dimensional structure, thus affecting the accuracy of the detection. In this embodiment, there is no first additional layer on the sides, thereby avoiding the above situation and ensuring the accuracy of the detection.

[0058] In another embodiment of this application, the first additional layer has the same length as the layered structure 42 in the shear direction.

[0059] Please refer to Figure 1 The first additional layer and the layered structure 42 are arranged with equal length in the shear direction to ensure that the first additional layer completely covers the upper surface of the layered structure 42 without exceeding the first additional layer, thereby avoiding the influence of excess first additional layer adhering to the sides on the detection. As will be discussed later, this structural feature is achieved by etching the layered structure 42 after the additional part 41 is applied, which is a simple, effective, and economical operation method.

[0060] In another embodiment of this application, the thickness of the second additional layer is 1.0-5.0 μm.

[0061] The layered structure 42 to be tested is very thin, approximately 3-5 μm thick. If the thickness of the second additional layer is too thin, it will hinder the contact and pushing operation of the probe 32; if it is too thick, it will hinder processing. After multiple experiments, a thickness of 1.0-5.0 μm for the second additional layer has been found to provide good processing and testing results. Those skilled in the art can specifically set the thickness of the second additional layer to 1 μm, 1.1 μm, 1.2 μm, 1.3 μm, 1.5 μm, 1.56 μm, 1.8 μm, 2 μm, 2.3 μm, 2.5 μm, 2.6 μm, 2.8 μm, 3.0 μm, 3.2 μm, 3.6 μm, 3.7 μm, 3.9 μm, 4.0 μm, 4.1 μm, 4.34 μm, 4.4 μm, 4.5 μm, 4.7 μm, 4.8 μm, 5.0 μm, etc., without making a single limitation here.

[0062] In another embodiment of this application, the first additional layer and / or the second additional layer is a metal film. Through multiple tests, the metal film exhibits high adhesion to the layered structure 42. For graphene, tests show good compatibility between the titanium-aluminum film and graphene; when the titanium-aluminum film is deposited on graphene using an electron beam, the adhesion between the two is much greater than the van der Waals forces between the two layers of the graphene two-dimensional structure. This satisfies the processing and testing requirements of the first additional component 41.

[0063] In another embodiment of this application, the second additional layer and the first additional layer are made of different materials. This ensures that the first and second additional layers can be independently etched and have different lengths and thicknesses. Preferably, the first additional layer is a titanium-aluminum film, and the second additional layer is an aluminum film.

[0064] Example 2

[0065] Please refer to Figure 1 This embodiment provides a detection device for detecting microscopic shear force on a layered structure 42, including a stage and a detection assembly. The detection assembly includes a probe 32 and a force sensor 31, which can measure the force on the probe 32.

[0066] The specific detection operation is as follows: Place the layered structure 42 covered with the attachment 41 on the stage, move the probe 32 to contact the second additional layer of the attachment 41 and apply a lateral force / shear force to the second additional layer. At this time, the force sensor 31 can read the reaction force of the probe 32 and thus detect the magnitude of the shear force.

[0067] It should be noted that during the testing process, the platform 11 can be moved to transfer the layered structure 42 to be tested from the loading station to the testing station. At the testing station, a lateral load is typically applied to the layered structure 42 / second additional layer by the lateral movement of the probe 32 (while the platform 11 remains stationary). In other embodiments, the probe 32 can be stationary while the platform 11 moves relative to the probe 32, achieving the same effect of applying a lateral load to the layered structure 42 / second additional layer.

[0068] The detection device provided in this embodiment can be used to detect the shear force of a small-sized layered structure 42. During operation, it is only necessary to control the probe 32 and read the shear force obtained by the force sensor 31. The measurement method is simple.

[0069] In another embodiment, the detection device further includes an imaging component for observing and analyzing the shear interface information of the layered structure 42. Please refer to... Figure 1 The imaging components include a microscope 21. Figure 3 This is an image of a square mask sample under microscope 21. The image allows us to observe the deformation of the sample and analyze the shear interface information.

[0070] Example 3

[0071] Please refer to Figure 1 This embodiment provides a method for detecting shear force in a layered structure, including the following steps:

[0072] Prepare the layered structure to be tested 42.

[0073] Preparation of attachment 41: Attachment 41 is applied to the layered structure 42. For the specific structure of attachment 41, please refer to Example 1.

[0074] Detection: The layered structure 42 is placed on the stage 11, and a lateral force is applied to the second additional layer through the probe 32 with the force sensor 31, and shear force information is obtained from the force sensor 31.

[0075] The shear force detection method provided in this embodiment is based on a double-layer mask / attachment 41 covering the layered structure 42. During detection, the probe 32 acts on the uppermost layer / second additional layer of the mask. In this configuration, the second additional layer bears the concentrated load applied by the probe 32, and then the concentrated load is distributed to the layered structure 42 through the first additional layer. On the one hand, the attachment 41 increases the out-of-plane stiffness of the material of the layered structure 42, enhancing its resistance to deformation. On the other hand, the attachment 41 transforms the concentrated load into a distributed load or even a uniformly distributed load, thereby adjusting the stress distribution, effectively preventing cracks from forming in the layered structure 42, and improving the accuracy of microscopic shear force detection in the layered structure 42.

[0076] In another embodiment of this application, please refer to Figure 8 The preparation of the layered structure 42 to be tested includes: mechanically cleaving natural graphite to obtain a graphite thin layer, which is the layered structure 42 to be tested.

[0077] The solution provided in this embodiment is applicable to the detection of natural graphite. Natural graphite has a relatively thick dimension; it can be mechanically cleaved to remove the thinner first structural / single-crystal graphite layer for experimental use. It can be understood that the first structural / single-crystal graphite layer contains multiple single-layer graphite sheets / graphene.

[0078] Preferably, the surface / upper surface of the layered structure 42 to be coated is roughened before the attachment 41 is prepared. This setting can effectively improve the adhesion between the layered structure 42 and the attachment 41.

[0079] In this embodiment, the steps for preparing the attachment 41 are as follows: coating, exposing, and developing the layered structure 42 / graphite thin layer to obtain the L1 layer photolithography pattern, then depositing a metal film, and then peeling off the photoresist to obtain the desired first attachment layer; then coating, exposing, and developing the attachment to obtain the L2 layer photolithography pattern, and then depositing a metal film, and peeling off the photoresist to obtain the desired second attachment layer.

[0080] In another embodiment, there are multiple attachments 41. After the step of preparing attachments 41, etching is also included: etching the part of the layered structure 42 that does not cover the first additional layer to obtain multiple independent substructures; the detection step is: placing the substructure on the stage 11, applying a lateral force to the second additional layer of the substructure through the probe 32 with the force sensor 31, and obtaining shear force information from the force sensor 31.

[0081] Multiple attachments 41 are covered on the layered structure 42, and then the layered structure 42 is divided into multiple substructures with attachments 41 by etching. It can be understood that each substructure has one attachment 41, and the upper surface of each substructure is the same length as the first attachment layer on it. This arrangement allows for the simultaneous formation of multiple substructures for testing, improving efficiency. Furthermore, etching after the attachments 41 are prepared effectively ensures that the first attachment 41 and the upper surface of the substructure are of the same length, ensuring the cleanliness and flatness of the substructure's sides, without adhesion of the first attachment 41 or other materials, thus guaranteeing testing quality.

[0082] Combined with appendix Figure 8 Taking natural graphite as an example, the preparation process of attachment 41 is described in detail below:

[0083] 1. Natural graphite is mechanically cleaved to obtain a graphite thin film / layer structure 42 with smooth areas of several hundred micrometers to millimeters without wrinkles. The graphite is released onto a smooth substrate such as silicon or quartz using heat-release tape and then adhered to the substrate by van der Waals forces.

[0084] 2. Place the graphite thin layer / layered structure 42 adhered to the substrate into the RIE etching machine and bombard it with oxygen ion plasma for 3 minutes to roughen the graphite surface.

[0085] 3. Apply photoresist, expose, and develop the graphite thin layer / layered structure 42 on the substrate to obtain the L1 layer photolithographic pattern.

[0086] 4. The desired L1 thin metal pattern, i.e. the first additional layer, is obtained by electron beam or magnetron deposition of a metal film and lift-off process to remove the photoresist; the metal film is preferably a titanium-aluminum film.

[0087] 5. Apply adhesive, expose, and develop the L1 thin metal pattern on the substrate to obtain the L2 photolithographic pattern.

[0088] 6. Using electron beam or magnetron deposition, the L2 metal film is deposited, and the photoresist is removed using a lift-off process to obtain the desired L2 thick metal pattern, i.e., the second additional layer; the L2 metal film is greater than 1 μm; the metal film is preferably an aluminum film.

[0089] 7. Place the graphite thin layer / layered structure 42 on the substrate into the RIE etching machine, and use the metal pattern / first additional layer of L1 layer as a hard mask to etch the graphite thin layer / additional part 41 into multiple substructures.

[0090] The above description is merely a preferred embodiment of this application and is not intended to limit this application. Any modifications, equivalent substitutions, or improvements made within the spirit and principles of this application should be included within the protection scope of this application.

Claims

1. A detection attachment for assisting in the detection of microscopic shear force in layered structures, characterized in that, The structure includes a first additional layer covering the layered structure and a second additional layer covering the side of the first additional layer away from the layered structure. The length of the second additional layer along the shear direction of the layered structure is less than that of the first additional layer. The adhesive force between the first additional layer and the layered structure, and the adhesive force between the second additional layer and the first additional layer are both greater than the van der Waals forces between the two-dimensional structural layers within the layered structure.

2. The detection attachment as described in claim 1, characterized in that, The first additional layer completely covers the upper surface of the layered structure.

3. The detection attachment as described in claim 2, characterized in that, The first additional layer does not cover the sides of the layered structure, leaving the sides of the layered structure completely exposed.

4. The detection attachment as described in claim 1, characterized in that, The first additional layer has the same length as the layered structure in the shear direction.

5. The detection attachment as described in claim 1, characterized in that, The thickness of the second additional layer is 1.0-5.0 μm.

6. The detection attachment as described in any one of claims 1 to 5, characterized in that, The first additional layer and / or the second additional layer are metal films.

7. The detection attachment as described in any one of claims 1 to 5, characterized in that, The second additional layer and the first additional layer are made of different materials.

8. The detection attachment as described in any one of claims 1 to 5, characterized in that, The first additional layer is a titanium-aluminum film.

9. The detection attachment as described in claim 8, characterized in that, The second additional layer is an aluminum film.

10. A detection device, characterized in that, include: A stage for placing a layered structure, the layered structure having a detection attachment as described in any one of claims 1 to 9; The detection assembly includes a probe and a force sensor, the probe being used to apply a shear force to the second additional layer, and the force sensor being used to detect the shear force; An imaging component is used to observe and analyze the shear interface information of the layered structure.

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