A placement stage for a mask

Abstract

The utility model relates to mask manufacturing technical field discloses a kind of placing platform for mask, including main body frame and bearing assembly, main body frame includes multiple identical adjusting assembly, adjusting assembly is slidable along the length direction of itself by sliding mechanism, and multiple adjusting assembly is enclosed to form rectangular frame structure, bearing assembly includes multiple bearing body for bearing mask, bearing body is respectively connected in the diagonal of rectangular frame structure, wherein, the adjacent two sides of bearing body are respectively connected with the sliding mechanism in the diagonal of rectangular frame structure, synchronous sliding with sliding mechanism, so that the length of mask can be adjusted according to size different, compatible with the placing and use demand of multiple sizes mask, avoid the risk of scrap in use process.

Description

Technical Field

[0001] This utility model relates to the field of photomask manufacturing technology, specifically to a platform for placing photomasks. Background Technology

[0002] In precision fields such as flat panel displays and semiconductor manufacturing, as advanced wafer manufacturing processes move towards larger sizes, traditional stages need to be compatible with ultra-large photomasks of 12 inches and above. However, traditional stages are incompatible due to their fixed structure and design standards limited to small and medium-sized scenarios. This necessitates forced modifications to the stage structure or cutting the edges of the photomasks, which is cumbersome and prone to scratches and chipping due to size mismatch during installation and adjustment. Large photomasks are also prone to shaking and friction during transport or processing due to insufficient fixing points, resulting in high scrap costs. Downstream manufacturers' use of temporary fixing solutions for calibration will exacerbate stress concentration at the edges of the photomasks, causing debris to form on the glass substrate edges and scratches to the photolithography pattern layer due to friction from hard objects on the surface. Furthermore, when photomasks larger than 12 inches come into contact with incompatible stages, the accumulated static electricity can easily break down the chromium film pattern or organic coating. Although commercially available protective films attempt to solve the protection problem, they are prone to new problems such as poor adhesion, high static electricity values, and impurity interference due to the need for cutting for different sizes, and still cannot avoid the risk of scrap. Utility Model Content

[0003] The purpose of this utility model is to provide a platform for placing photomasks. Its main frame is a rectangular frame formed by multiple adjustable components that can slide along the length direction and are connected by a sliding mechanism. The supporting body of the supporting component is connected to the diagonal of the frame and slides synchronously with the sliding mechanism. Its length can be adjusted according to different photomask sizes, which is compatible with the placement and use requirements of various ultra-large photomasks and avoids the risk of scrapping during use.

[0004] This utility model is achieved through the following technical solution:

[0005] A stage for placing photomasks, comprising:

[0006] The main frame includes multiple identical adjustment components, which can slide along their own length direction via a sliding mechanism, and the multiple adjustment components enclose a rectangular frame structure.

[0007] The carrier assembly includes multiple carrier bodies for carrying the mask, each carrier body being connected to a diagonal of the rectangular frame structure. The adjacent sides of each carrier body are connected to a sliding mechanism at a diagonal of the rectangular frame structure and slide synchronously with the sliding mechanism.

[0008] In this solution, the main frame is formed by multiple identical adjustment components sliding along its length via a sliding mechanism to create a rectangular frame structure. The length and width of the frame can be flexibly adjusted according to the size of the photomask, thus adapting to photomasks of 12 inches and larger. The support body of the support component is connected to the diagonal of the rectangular frame, and the adjacent sides are connected to the sliding mechanism at the diagonal. It can slide synchronously with the sliding mechanism, allowing the support body to be positioned under the photomask to provide support. In this way, the problem of traditional stages being unable to accommodate multiple sizes of photomasks is solved, and the synchronous adaptation between the support component and the photomask is achieved through sliding adjustment. This ensures stable support of the photomask during placement and use, avoiding the risk of scrapping due to collisions, friction, etc. caused by size mismatch.

[0009] As a further technical solution for placing the stage, the supporting body is provided with supporting grooves. All the supporting grooves are evenly distributed on the diagonal of the rectangular frame structure, and all the supporting grooves form a stage for supporting the mask. This keeps the mask suspended from the detection platform when it is placed, which not only avoids direct contact between the mask and the hard objects on the platform, thus preventing scratches from debris, but also ensures the position of the mask in the supporting groove by utilizing the symmetry of the diagonal distribution. This achieves stable fixation of the mask during the detection or calibration process, thereby improving the reliability and protection effect of the stage for supporting masks of different sizes.

[0010] As a further technical solution for placing the platform, a protective pad is provided on the bottom wall of the bearing groove. The protective pad can serve as a buffer medium to prevent the mask with sharp corners after cutting from directly contacting the hard bottom wall of the bearing groove, thereby reducing the risk of glass edges generating debris due to collision, and at the same time reducing the probability of scratches caused by friction between the mask surface and the groove wall.

[0011] As a further technical solution for placing the platform, the support body is also equipped with a quick-clamp assembly. The pressure head of the quick-clamp assembly is directly facing the center of the support groove. When the mask is placed in the support groove, the operator can drive the linkage mechanism through the handle of the quick-clamp assembly to make the pressure head press down vertically and accurately position it to the center of the support groove, forming a centrally symmetrical clamping force on the mask, ensuring that the mask is firmly fixed in the support groove and avoiding displacement caused by vibration during the detection or calibration process.

[0012] As a further technical solution for placing the platform, a conductive sheet is provided at the bottom of the quick clamp assembly. When the pressure head contacts the mask, the conductive sheet is electrically connected to the mask, which can conduct the static electricity accumulated on the surface of the mask by the environment, human body and equipment to the grounding line of the platform body through the conductive sheet, so as to avoid the high voltage generated by the release when the static charge accumulates to the critical value and breaks down the mask pattern.

[0013] As a further technical solution for placing the platform, the sliding mechanism includes a first slide rail and a second slide rail;

[0014] The first slide rail has a second slide rail on one side, and a pair of second slide rail frames are matched in the second slide rail. The adjacent sides of the support body are respectively connected to the second slide rail frames at the diagonal of the rectangular frame structure. As the second slide rail frames move along the length of the second slide rail, the length or width of the frame can be flexibly adjusted along the direction of the second slide rail according to the size of the mask. At the same time, the support body moves synchronously with the sliding mechanism to ensure that the support groove always corresponds to the support position of the mask.

[0015] As a further technical solution for placing the platform, the sliding mechanism also includes a locking head, and the bottom wall surface of the second slide rail is provided with a locking groove that matches the second slide rail frame;

[0016] One end of the locking head passes through the locking groove and is threadedly connected to the second slide rail frame. The other end of the locking head abuts against the outer wall of the first slide rail frame. The threaded tightening force makes the second slide rail frame fit tightly against the bottom wall of the second slide rail, thereby fixing the second slide rail frame on the second slide rail and preventing it from shifting due to vibration, external force collision or other factors during the placement or testing of the mask.

[0017] As a further technical solution for placing the platform, the adjacent sides of the support body are respectively provided with sliding grooves that match the second slide rail frame, so as to realize the linkage connection between the support body and the second slide rail frame; when the second slide rail frame moves on the second slide rail to adjust the size of the main frame, the cooperation between the sliding groove and the second slide rail frame can guide the support body to move synchronously, ensuring that the support groove always corresponds to the support position of the mask plate, and avoiding the bearing deviation caused by asynchronous movement.

[0018] As a further technical solution for placing the platform, the sliding mechanism also includes a limiting block. The second slide rail frame is provided with a first slide rail corresponding to the slide groove. One end of the limiting block passes through the first slide rail and is connected to the bearing body. The other end of the limiting block is attached to the second slide rail frame, forming a mechanical limit on the sliding range of the bearing body, preventing it from detaching from the second slide rail frame due to excessive sliding. At the same time, during the sliding process of the limiting block in the first slide rail, it can limit the relative displacement between the first slide rail and the slide groove by attaching to the end face of the second slide rail frame, avoiding shaking or tilting of the bearing body during the adjustment process.

[0019] As a further technical solution for placing the platform, the radial cross section of the first slide rail is a frustum shape. By utilizing the geometric characteristics of the gradually changing diameter of the frustum cross section, when the limiting block passes through the first slide rail and connects with the bearing body, a radial constraint force can be formed through the side of the frustum, which can effectively prevent the bearing body from laterally shifting or detaching from the slide rail during the sliding process with the second slide rail frame.

[0020] Compared with the prior art, this utility model has the following advantages and beneficial effects:

[0021] 1. The main frame of this utility model can flexibly adjust the size of the rectangular frame along the length direction through the cooperation of the adjustment component and the sliding mechanism, covering mask specifications of 12 inches and above, solving the compatibility problem caused by the fixed size of the traditional stage, and avoiding collision scratches and frequent replacement costs caused by size mismatch.

[0022] 2. The bottom conductive sheet of the quick clamping assembly of this utility model is directly electrically connected to the mask, which discharges the accumulated static electricity on the surface to the grounding line in real time, thus avoiding electrostatic breakdown of the graphic structure. Attached Figure Description

[0023] The accompanying drawings, which are included to provide a further understanding of the embodiments of the present invention and form part of this application, do not constitute a limitation thereof. In the drawings:

[0024] Figure 1 This is a three-dimensional structural schematic diagram of the present invention;

[0025] Figure 2 This is a top view of the structure of this utility model;

[0026] Figure 3 This is a structural schematic diagram of the load-bearing component and the quick-clamping component;

[0027] Figure 4 A schematic diagram of the structure of the adjustment component;

[0028] Figure 5 This is a schematic diagram of the structure of this utility model without the first slide rail frame installed;

[0029] Figure 6 for Figure 2 A cross-sectional view of the structure marked AA.

[0030] Figure 7 for Figure 6 A magnified structural diagram of the structure marked A in the middle;

[0031] Figure 8 This is a schematic diagram of the first slide rail frame.

[0032] The attached diagram shows the markings and corresponding component names:

[0033] Supporting components: 11-Supporting body, 12-Supporting groove, 13-Slide groove; Quick clamping components: 21-Pressure head, 22-Linkage mechanism, 23-Handle; Platform; Adjusting components: 41-First slide rail frame, 42-Locking head, 43-Locking groove, 44-Second slide rail frame, 45-Limiting block, 46-First slide rail, 47-Second slide rail. Detailed Implementation

[0034] To make the objectives, technical solutions, and advantages of this utility model clearer, the present utility model will be further described in detail below with reference to the embodiments and accompanying drawings. The illustrative embodiments and descriptions of this utility model are only used to explain this utility model and are not intended to limit this utility model.

[0035] Example 1

[0036] This embodiment 1 provides a platform for placing photomasks, such as... Figures 1-3 As shown, it includes the main frame and load-bearing component 1.

[0037] Among them, such as Figure 1 and Figure 2 As shown, the main frame is formed by four identical adjustment components 4 enclosing a rectangular frame structure, and each adjustment component can slide along its own length direction through a sliding mechanism;

[0038] Specifically, please refer to Figure 4 , Figure 7 and Figure 8 As shown, each sliding mechanism includes a first slide rail frame 41, with a second slide rail 47 opened on one side along the length direction. A pair of second slide rail frames 44 are matched and installed in the second slide rail 47. The two slide rail frames 44 move along the length direction of the second slide rail 47 through sliding cooperation, thereby realizing flexible adjustment of the size of the main frame to adapt to different sizes of mask plates.

[0039] Meanwhile, the sliding mechanism also includes a locking head 42, one end of which passes through the locking groove 43 on the bottom wall of the second slide rail 47 and is threaded to the second slide rail frame 44, and the other end abuts against the outer wall of the first slide rail frame 41. When adjusted to a suitable size, the second slide rail frame 44 can be firmly fixed on the second slide rail 47 by tightening the locking head 42, preventing displacement due to vibration or external force during use and ensuring the stability of the entire platform structure.

[0040] Please refer to the following: Figures 1-3 As shown, the support assembly 1 includes four support bodies 11 for supporting the mask. These support bodies 11 are respectively connected to the diagonal of the rectangular frame structure. Specifically, the adjacent sides of the support body 11 are respectively connected to the second slide rail frame 44 at the diagonal of the rectangular frame structure. As the second slide rail frame 44 moves along the length direction of the second slide rail 47, the length or width of the frame can be flexibly adjusted along the direction of the second slide rail 47 according to the size of the mask. At the same time, the support body moves synchronously with the sliding mechanism to ensure that it always corresponds to the support position of the mask.

[0041] Furthermore, a support groove 12 is provided on the top surface of the support body 11. All support grooves 12 are evenly distributed along the diagonal of the rectangular frame structure, and all support grooves 12 together form a platform 3 for supporting the mask, so that the mask is suspended from the detection platform when placed, avoiding direct contact between the mask and the hard objects on the platform to prevent damage from debris. At the same time, a protective pad is also laid at the bottom of the groove. The protective pad can be silicone or antistatic material, which is used to buffer the impact force when the mask is placed and to prevent the mask from being damaged by direct contact with the support groove 12.

[0042] In this embodiment, a quick clamp assembly 2 is also installed on the carrier body 11. The quick clamp assembly 2 is a common horizontal quick clamp, and its pressure head 21 is precisely aligned with the center of the carrier groove 12. When the mask is placed in the carrier groove 12, the operator can drive the linkage mechanism 22 through the handle of the quick clamp assembly 2 to make the pressure head 21 press down vertically and accurately position it to the center of the carrier groove 12, forming a centrally symmetrical clamping force on the mask, ensuring that the mask is firmly fixed in the carrier groove 12.

[0043] To prevent the high voltage generated when the static charge accumulates to a critical value and breaks down the mask pattern, a conductive sheet is provided at the bottom of the quick clamp assembly 2. When the pressure head 21 contacts the mask, the conductive sheet is electrically connected to the mask, which can conduct the static electricity accumulated on the mask surface by the environment, human body and equipment to the grounding line of the platform body through the conductive sheet.

[0044] Example 2

[0045] This embodiment 2 provides a platform for placing photomasks based on the technical solution of embodiment 1, such as... Figure 3 , Figures 5-7 As shown, slide grooves 13 are respectively opened on the adjacent sides of the support body 11. The slide grooves 13 are matched with the second slide rail 44. The cooperation between the slide grooves 13 and the second slide rail 44 can guide the support body 11 to move synchronously, ensuring that the support grooves 12 always correspond to the support position of the mask.

[0046] At the same time, please refer to Figures 5-7 As shown, the sliding mechanism also includes a limiting block 45. The second slide rail frame 44 is provided with a first slide rail 46 corresponding to the slide groove 13. One end of the limiting block 45 passes through the first slide rail 46 and is connected to the bearing body 11. The other end of the limiting block 45 is attached to the second slide rail frame 44 to form a mechanical limit on the sliding range of the bearing body 11, preventing it from slipping off the second slide rail frame due to excessive sliding.

[0047] To prevent the support body 11 from shaking or tilting during adjustment, in this embodiment, the radial cross section of the first slide rail 46 is frustum-shaped. Utilizing the geometric characteristics of the gradually changing diameter of the frustum-shaped cross section, when the limiting block 45 passes through the first slide rail 46 and connects with the support body 11, a radial constraint force can be formed through the side of the frustum, effectively preventing the support body 11 from laterally shifting or detaching from the slide rail during the sliding process with the second slide rail frame 44.

[0048] The specific embodiments described above further illustrate the purpose, technical solution, and beneficial effects of this utility model. It should be understood that the above description is only a specific embodiment of this utility model and is not intended to limit the scope of protection of this utility model. Any modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of this utility model should be included within the scope of protection of this utility model.

Claims

1. A stage for placing photomasks, characterized in that, include: The main frame includes multiple identical adjustment components (4), which can slide along their own length direction through a sliding mechanism, and the multiple adjustment components (4) enclose a rectangular frame structure. The carrier component (1) includes a plurality of carrier bodies (11) for carrying the mask. The carrier bodies (11) are respectively connected to the diagonal of the rectangular frame structure. The adjacent sides of the carrier bodies (11) are respectively connected to the sliding mechanism at the diagonal of the rectangular frame structure and slide synchronously with the sliding mechanism.

2. The photomask placement platform according to claim 1, characterized in that, The carrier body (11) is provided with carrier grooves (12), all of the carrier grooves (12) are evenly distributed on the diagonal of the rectangular frame structure, and all of the carrier grooves (12) form a carrier platform (3) for the mask plate.

3. A platform for placing photomasks according to claim 2, characterized in that, The bottom wall of the bearing groove (12) is provided with a protective pad.

4. A photomask placement platform according to claim 2, characterized in that, The support body (11) is also provided with a quick clamp assembly (2), and the pressure head (21) of the quick clamp assembly (2) is directly facing the center of the support groove (12).

5. A photomask placement platform according to claim 4, characterized in that, The bottom of the quick clamp assembly (2) is provided with a conductive sheet. When the pressure head (21) contacts the mask, the conductive sheet is electrically connected to the mask.

6. A photomask placement platform according to any one of claims 1-5, characterized in that, The sliding mechanism includes a first slide rail (41) and a second slide rail (44). The first slide rail (41) is provided with a second slide rail (47) on one side, and a pair of second slide rail frames (44) are provided in the second slide rail (47). The adjacent sides of the bearing body (11) are respectively connected to the second slide rail frames (44) at the diagonal of the rectangular frame structure, and move along the length direction of the second slide rail (47) with the second slide rail frame (44).

7. A photomask placement platform according to claim 6, characterized in that, The sliding mechanism also includes a locking head (42), and the bottom wall of the second slide rail (47) is provided with a locking groove (43) that matches the second slide rail frame (44). One end of the locking head (42) passes through the locking groove (43) and is threadedly connected to the second slide rail frame (44), while the other end of the locking head (42) abuts against the outer wall of the first slide rail frame (41).

8. A photomask placement platform according to claim 6, characterized in that, The adjacent sides of the bearing body (11) are respectively provided with slide grooves (13) that match the second slide rail frame (44).

9. A photomask placement platform according to claim 8, characterized in that, The sliding mechanism also includes a limiting block (45). The second slide rail frame (44) is provided with a first slide rail (46) corresponding to the slide groove (13). One end of the limiting block (45) passes through the first slide rail (46) and is connected to the bearing body (11). The other end of the limiting block (45) is attached to the second slide rail frame (44).

10. A photomask placement platform according to claim 9, characterized in that, The radial cross section of the first slide rail (46) is frustum-shaped.

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