Dust and gas masks
CN309470510SActive Publication Date: 2025-08-29孙亮芝
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Patent Information
- Application Number
- CN202430843992.9
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- Filing Date
- 2024-12-31
- Publication Date
- 2025-08-29
- Estimated Expiration
- 2039-12-31
Smart Images
Figure 000001_ABST
Abstract
1. The name of this design product: dust and toxic mask. 2. Purpose of this design product: This design product is intended to be worn by users to protect them from inhaling dust or other possible harmful substances in the air. 3. The key point of the design of this product lies in its shape. 4. The picture or photo that best illustrates the design points: three-dimensional picture.
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