Resist composition, resist pattern forming method, compound, and acid diffusion control agent

Abstract

To provide a resist composition which achieves higher sensitivity and enhances lithographic characteristics such as resolution and dimensional uniformity in resist pattern formation, and to provide a compound useful as an acid diffusion control agent.SOLUTION: The resist composition generates an acid upon exposure, changes its solubility in a developer by the action of an acid, and contains: a base component which changes its solubility in a developer by the action of an acid; and a compound represented by formula (d0). In the formula (d0), Rd1 represents an alkyl group; k represents an integer of 2 or more; h represents an integer of 0 or more; Rd0 represents a substituent; and j represents an integer of 0 or more, provided that 5+2h≥j+k, k is an integer of 2 to 5 when h is 0, and k is 2 or 3 when h is an integer of 1 or more, m represents an integer of 1 or more, and Mm+ represents an m-valent organic cation.SELECTED DRAWING: None

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