Stage plate for exposure apparatus and method for manufacturing the same

A stage plate with a silicone layer on a porous anodic oxide film addresses peelability and UV resistance issues, providing effective peeling and durability for semiconductor manufacturing.

JP2026111372APending Publication Date: 2026-07-03NIPPON LIGHT METAL CO LTD
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Patent Information

Application Number
JP2024226708
Authority / Receiving Office
JP · JP
Patent Type
Applications
Current Assignee / Owner
Filing Date
2024-12-23
Publication Date
2026-07-03

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Abstract

To provide a stage plate for exposure equipment for semiconductor package substrates and printed circuit boards, and a method for manufacturing the same, on which a coating film combining easy peeling and UV resistance is formed. [Solution] A stage plate for an exposure apparatus comprising an aluminum member having a porous type anodic oxide film formed on the surface of a substrate made of aluminum or an aluminum alloy, and a coating film having a silicone layer formed on the surface of the anodic oxide film and containing a silicone polymer (excluding silicone oil) that substantially does not contain functional groups having fluorine atoms, and a method for manufacturing a stage plate for an exposure apparatus comprising an anodic oxidation step of manufacturing the aluminum member by performing an anodic oxidation treatment to form the anodic oxide film on the surface of the substrate, and a film formation step of forming the coating film by performing a film formation treatment to form the silicone layer on the surface of the anodic oxide film.
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Citation Information

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