A rotation angle monitoring system for ion implanter

Abstract

The invention discloses an ion implanter rotation angle monitoring system, comprising a high vacuum chamber part and an atmosphere part, wherein the atmosphere part is arranged at the lower end of the high vacuum chamber part, the high vacuum chamber part and the atmosphere part are connected by socket connection, and the lower end of the atmosphere part is arranged with an original machine flexible cable. The ion implanter rotation angle monitoring system of the invention uses a system combining software and hardware to detect the transmission gear of the last rotating suction cup and obtain data to transmit to a computer system, and the system uses SPC software to set different limits according to different rotation angles, and once the range is exceeded, the software will generate an alarm for a signal host station, and then the engineer will investigate and solve the problem according to the alarm, thereby solving the problem that the ROPLAT rotation angle in the ion implanter rotation angle monitoring cannot be monitored online in real time, and avoiding the problem of a large number of wafers being scrapped due to no real-time detection.

Description

Technical Field

[0001] The invention belongs to the technical field related to semiconductor wafer production, and in particular relates to a Roplat rotation angle monitoring system for an ion implanter (APPLY / VARIAN E220 / 500 series ion implanter). Background Art

[0002] Ion implanters are used in semiconductor wafer production and are key machines in wafer production. The ROPLAT component is the moving component responsible for four-quadrant injection, which is also a key process in the chip production process. After the wafer is transferred to the electrostatic chuck, the ROPLAT component drives the chuck to rotate to achieve four-quadrant angle injection.

[0003] The existing APPLY / VARIAN E220 / 500 series ion implanter Roplat rotation angle monitoring technology has the following problems: Since the ROPLAT component is located in the vacuum chamber and there are many precision components nearby, the rotation angle is required to be precise. However, since this position feedback is located at the motor end, and there are many connecting components between the motor and the final rotating suction cup, once any of these components has a problem, or the encoder is not equal, the actual rotation position of the suction cup will change and the machine will not detect it in real time, and no alarm will be issued. Summary of the invention

[0004] The object of the present invention is to provide an ion implanter rotation angle monitoring system to solve the problem that the ROPLAT rotation angle in the existing ion implanter rotation angle monitoring proposed in the above background technology cannot be monitored online in real time, thereby avoiding the problem of large numbers of wafers being scrapped due to the lack of real-time detection.

[0005] To achieve the above-mentioned purpose, the present invention provides the following technical solutions: an ion implanter rotation angle monitoring system, comprising a high vacuum chamber part and an atmosphere part, the atmosphere part is arranged at the lower end of the high vacuum chamber part, the high vacuum chamber part and the atmosphere part are connected by a socket, the original machine flexible cable is arranged at the lower end of the atmosphere part, the original machine flexible cable is arranged at the right end of the original machine flexible cable, the original machine controller is connected at the right end of the original machine controller, the newly added sensor connection line is arranged at the upper end of the newly added sensor connection line, and the upper end of the motor feedback control line is arranged at the control interface A controller is arranged at the upper end of the control interface, a function selection switch is arranged at the outer end of the left end of the controller, a power socket is arranged at the right end of the function selection switch, a communication plug is arranged at the lower end of the power socket, an industrial control host is arranged at the right end of the controller, the controller is electrically connected to the industrial control host, a mouse is arranged at the lower end of the industrial control host, the mouse is electrically connected to the industrial control host, a keyboard is arranged at the lower end of the industrial control host, a display is arranged at the upper end of the industrial control host, and the display is electrically connected to the industrial control host.

[0006] Preferably, the display is an 18.5-inch LCD screen with a resolution of 1366 by 768, and the size of the display is 44 centimeters in width and 34 centimeters in height.

[0007] Preferably, there are two newly added sensor lines, which are symmetrically arranged at the right end of the original controller of the connecting machine. The outer shells of the two newly added sensor lines are made of PP environmentally friendly material, and industrial high-flexible drag chain shielded signal lines are used.

[0008] Preferably, the controller is a rectangular structure, and the dimensions of the controller are 26 centimeters in length, 15 centimeters in width and 8 centimeters in height.

[0009] Preferably, the function selection switch is a toggle cylindrical structure, the size of the function selection switch is a maximum diameter of six millimeters, and the function selection switch is electrically connected to the power switch.

[0010] Preferably, the outer shell of the original machine flexible cable is made of PP environmentally friendly material, and there are three groups of the original machine flexible cables, and the cross-sectional diameter of the three groups of the original machine flexible cables is 40 mm.

[0011] Preferably, the keyboard is connected by wire, the keyboard is electrically connected to the industrial control host, and the keyboard is electrically connected to the display.

[0012] Compared with the prior art, the present invention provides an ion implanter rotation angle monitoring system, which has the following beneficial effects: the ion implanter rotation angle monitoring system of the present invention utilizes a system combining software and hardware to detect the transmission gear of the final rotating suction cup and obtain data to transmit to the computer system, the system utilizes SPC software to set different limits according to different rotation angles, once the range is exceeded, the software will generate an alarm to the signal host station, and then the engineer will investigate and solve the problem according to the alarm, thus solving the problem that the ROPLAT rotation angle in the existing ion implanter rotation angle monitoring cannot be monitored online in real time, and avoiding the problem of large-scale wafer scrapping due to the lack of real-time detection. BRIEF DESCRIPTION OF THE DRAWINGS

[0013] Figure 1 It is a schematic diagram of the rotation angle monitoring structure of the ion implanter of the present invention;

[0014] Figure 2 It is a schematic diagram of the working principle structure of the present invention;

[0015] Figure 3 It is a schematic diagram of the controller structure of the present invention;

[0016] Figure 4 It is a schematic diagram of the workflow of the present invention;

[0017] In the figure: 1. High vacuum chamber part; 2. Atmosphere part; 3. Original machine flexible cable; 4. Connect to the original controller of the machine; 5. New sensor connection line; 6. Motor feedback control line; 7. Control interface; 8. Function selection switch; 9. Controller; 10. Power socket; 11. Communication plug; 12. Keyboard; 13. Mouse; 14. Industrial control host; 15. Display. DETAILED DESCRIPTION

[0018] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0019] See also Figure 1-4The present invention provides a technical solution: an ion implanter rotation angle monitoring system, comprising a high vacuum chamber part 1 and an atmosphere part 2, the atmosphere part 2 is arranged at the lower end of the high vacuum chamber part 1, the high vacuum chamber part 1 and the atmosphere part 2 are connected by a socket connection, and the socket connection can improve the stability of the overall structure, the original machine flexible cable 3 is arranged at the lower end of the atmosphere part 2, the original machine flexible cable 3 is arranged at the right end of the original machine controller 4, the new sensor connection line 5 is arranged at the right end of the original machine controller 4, the motor feedback control line 6 is arranged at the upper end of the new sensor connection line 5, and the motor feedback control line 6 is arranged at the upper end of the motor feedback control line 6. Interface 7, a controller 9 is arranged at the upper end of the control interface 7, a function selection switch 8 is arranged at the outer end of the left end of the controller 9, a power socket 10 is arranged at the right end of the function selection switch 8, a communication plug 11 is arranged at the lower end of the power socket 10, an industrial control host 14 is arranged at the right end of the controller 9, the controller 9 is electrically connected to the industrial control host 14, a mouse 13 is arranged at the lower end of the industrial control host 14, the mouse 13 is electrically connected to the industrial control host 14, a keyboard 12 is arranged at the lower end of the industrial control host 14, a display 15 is arranged at the upper end of the industrial control host 14, and the display 15 is electrically connected to the industrial control host 14.

[0020] Furthermore, the display 15 is a liquid crystal screen, so that the displayed data can be clearer. The size of the display 15 is 44 cm in width and 34 cm in height.

[0021] Furthermore, there are two new sensor lines 5, which are symmetrically arranged at the right end of the original controller 4 of the connecting machine. The outer shells of the two new sensor lines 5 are made of PP environmentally friendly material, so that the new sensor lines 5 will not cause pollution.

[0022] Furthermore, the controller 9 is a rectangular structure, and the dimensions of the controller 9 are 26 centimeters in length, 15 centimeters in width, and 8 centimeters in height, so that the controller 9 can work better.

[0023] Furthermore, the function selection switch 8 is a toggle cylindrical structure, and the size of the function selection switch 8 is a maximum diameter of six millimeters, so that it feels more comfortable when pressed. The function selection switch 8 is electrically connected to the power switch.

[0024] Furthermore, the outer shell of the original machine flexible cable 3 is made of PP environmentally friendly material, so that the connection function can be better performed. There are three groups of original machine flexible cables 3, and the cross-sectional diameter of the three groups of original machine flexible cables 3 is 40 mm.

[0025] Furthermore, the keyboard 12 is connected by wire, the keyboard 12 is electrically connected to the industrial control host 14 , and the keyboard 12 is electrically connected to the display 15 , so that the keyboard 12 can better control the operation of the display 15 .

[0026] The working principle and use process of the present invention: After the present invention is installed, first check whether the machine can work normally and whether the plug and socket on the wire are connected. If abnormal noise occurs, the machine should be turned off immediately and wait for professional maintenance. When the semiconductor circle is to be produced, the controller 9 counts the pulse signal of the sensor first. The controller 9 is electrically connected to the power switch. The model of the controller 9 is HRTC-03A. Since there is no extra space to install additional sensors, the ROPLAT body is processed and modified to form a small space to install the original controller 4 of the connecting machine. The original controller 4 of the connecting machine is used to sense the number of teeth of the transmission gear. The connecting line including the high vacuum chamber part 1 and the atmosphere part 2 is connected to the controller 9. Each time a rotation is completed, a data value is generated and transmitted to the host. The system software uses a formula to convert it into an angle value record. The host system is composed of an SPC analysis software. The angle value of each rotation constitutes a data chain. The alarm rules such as setting upper and lower limits are used to generate an alarm, and the lower limit is set to 89 degrees and the upper limit is set to 91 degrees. If two samples in multiple samples exceed the set upper or lower limit range, the software will alarm. When the rotation angle exceeds the range abnormally for several consecutive times, the software will give a signal to the controller. The Do terminal of the acquisition module in the controller 9 is connected to the coil output of the relay. The software gives a low-level command to the Do relay to operate. The motor power circuit is connected to the normally closed contact of the relay, so that the motor power circuit is disconnected, and an alarm is generated on the host terminal.

[0027] Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that various changes, modifications, substitutions and variations may be made to the embodiments without departing from the principles and spirit of the present invention, and that the scope of the present invention is defined by the appended claims and their equivalents.

Claims

1. An ion implanter rotation angle monitoring system, comprising a high vacuum chamber part (1) and an atmosphere part (2), characterized in that: The lower end of the high vacuum chamber part (1) is provided with an atmosphere part (2), the high vacuum chamber part (1) and the atmosphere part (2) are connected by a socket connection, the lower end of the atmosphere part (2) is provided with an original machine flexible cable (3), the right end of the original machine flexible cable (3) is provided with an original machine controller (4), the right end of the original machine controller (4) is provided with a newly added sensor connection line (5), the upper end of the newly added sensor connection line (5) is provided with a motor feedback control line (6), the upper end of the motor feedback control line (6) is provided with a control interface (7), the upper end of the control interface (7) is provided with a main controller (9), and the outer end of the left end of the main controller (9) is provided with a function selection A function selection switch (8) is provided at the right end of the function selection switch (8), a power socket (10) is provided at the lower end of the power socket (10), an industrial control host (14) is provided at the right end of the main controller (9), the main controller (9) is electrically connected to the industrial control host (14), a mouse (13) is provided at the lower end of the industrial control host (14), the mouse (13) is electrically connected to the industrial control host (14), a keyboard (12) is provided at the lower end of the industrial control host (14), a display (15) is provided at the upper end of the industrial control host (14), the display (15) is electrically connected to the industrial control host (14), The display (15) is an 18.5-inch liquid crystal screen with a resolution of 1366 x 768. The size of the display (15) is 44 cm in width and 34 cm in height. The newly added sensor lines (5) are provided with three groups in total. The three groups of newly added sensor lines (5) are symmetrically arranged at the right end of the original controller (4) of the connecting machine. The outer shells of the two newly added sensor lines (5) are made of PP environmentally friendly material and industrial high-flexible drag chain shielded signal lines. The main controller (9) is a rectangular structure, and the dimensions of the main controller (9) are 26 cm in length, 15 cm in width, and 8 cm in height. The function selection switch (8) is a toggle cylindrical structure, the size of the function selection switch (8) is a maximum diameter of 6 mm, and the function selection switch (8) is electrically connected to the power switch. The outer shell of the original machine flexible cable (3) is made of PP environmentally friendly material. There are two original machine flexible cables (3) in total. The cross-sectional diameter of the two original machine flexible cables (3) is 40 mm. The keyboard (12) is connected by wire, the keyboard (12) is electrically connected to the industrial control host (14), and the keyboard (12) is electrically connected to the display (15). When semiconductor wafer production is to be carried out, the main controller (9) first counts the pulse signal of the sensor. The main controller (9) is electrically connected to the power switch. The model of the main controller (9) is HRTC-03A. The original controller (4) of the machine is connected to sense the number of teeth of the transmission gear. The connection line including the high vacuum chamber part and the atmosphere part is connected to the main controller (9). Each time a rotation is completed, a data value is generated and transmitted to the host. The host converts it into an angle value and records it. The host system is composed of an SPC analysis software. The angle values ​​of multiple rotations constitute a data chain. The alarm is generated by setting the upper and lower limit alarm rules. The lower limit is set to eighty-nine degrees and the upper limit is ninety-one degrees. If two samples in multiple samples exceed the upper or lower limit range, the software will alarm. When the rotation angle exceeds the range abnormally for several consecutive times, the host will generate an alarm.

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