A gas hydrate generation device based on double-electrode electrostatic spray method

Abstract

The present invention discloses a gas hydrate generation device based on a dual-electrode electrostatic spray method. The device includes: a high-voltage electrostatic generator, a circulation pump, a reactor, a metal capillary, an atomizing nozzle, an annular electrode, a metal grid electrode plate, a first fluid pipeline for realizing the circulation of an aqueous solution in the reactor, and a second fluid pipeline for introducing gas into the reactor; the high-voltage electrostatic generator supplies power to the metal capillary and the annular electrode; the metal capillary is inserted into the reactor from the upper wall of the reactor; the atomizing nozzle is connected to the lower end of the metal capillary, and the inner surface is insulated; the annular electrode is located below the atomizing nozzle, and the surface of the annular electrode is insulated; the metal grid electrode plate is located below the annular electrode and is grounded; the metal grid electrode plate is insulated from the reactor and the aqueous solution in the reactor. The droplets generated by atomization of the present invention have smaller particle size and better directionality, and the distribution of the fog group is more uniform, which increases the gas hydration rate.

Description

Technical Field

[0001] The invention relates to the field of hydrate production, and in particular to a gas hydrate generating device based on a double-electrode electrostatic spraying method. Background Art

[0002] Hydrate technology can be applied to natural gas storage and transportation, sewage treatment, seawater desalination, mixed gas separation, aqueous solution concentration, and hydrate cold storage. The key to the successful application of this technology lies in how to enhance the rapid generation of hydrates. Seeking efficient gas hydrate preparation processes and strengthening measures, increasing the binding rate of gas molecules and water molecules, and improving their generation rate are the keys to achieving widespread industrial application of hydrate technology, which is of great significance to the development of hydrate technology.

[0003] Traditional technologies to promote gas-liquid contact include stirring, bubbling, and spraying. The stirring method has mechanical reliability problems caused by high-pressure stirring and increased liquid viscosity in the later stage of hydrate formation, which affects the efficiency of mechanical stirring. Since the bubbling method uses a very small orifice plate, it is easy for hydrates to form on the orifice plate, causing blockage, further affecting the hydrate intake and the continuation of the entire reaction. In the traditional spray method, the hydrates generated on the nozzle surface during the injection process are easy to block the nozzle. Moreover, the speed and atomization effect of hydrate production by the traditional spray method are not very ideal. Summary of the invention

[0004] The purpose of the present invention is to provide a gas hydrate generation device based on a dual-electrode electrostatic spray method, which can significantly improve the production rate of gas hydrates.

[0005] To achieve the above object, the present invention provides the following solutions:

[0006] A gas hydrate generation device based on a double-electrode electrostatic spray method, comprising: a high-voltage electrostatic generator, a first fluid pipeline, a second fluid pipeline, a circulation pump, a reaction kettle, a metal capillary, an atomizing nozzle, a ring electrode and a metal grid electrode plate;

[0007] The high-voltage electrostatic generator supplies power to the metal capillary, the annular electrode and the metal grid electrode plate respectively;

[0008] The metal capillary is inserted into the reactor from the upper wall of the reactor;

[0009] The atomizing nozzle is connected to the lower end of the metal capillary tube, and the inner surface thereof is insulated;

[0010] The annular electrode is located below the atomizing nozzle, and its surface is insulated;

[0011] The metal grid electrode plate is located below the annular electrode and is grounded; the metal grid electrode plate is insulated from the reactor and the aqueous solution in the reactor;

[0012] The first fluid pipeline includes a first liquid pipeline and a second liquid pipeline, one end of the first liquid pipeline is connected to the liquid flow port opened on the wall of the reactor, the other end of the first liquid pipeline is connected to the inlet of the circulation pump, one end of the second liquid pipeline is connected to the outlet of the circulation pump, and the other end of the second liquid pipeline is connected to the upper end of the metal capillary;

[0013] One end of the second fluid pipeline is connected to the gas supply device, and the other end is inserted into the reactor.

[0014] Optionally, the device further comprises a third fluid pipeline, one end of which is connected to the gas supply device, and the other end of which is connected to the first liquid pipeline via a first valve.

[0015] Optionally, the device further comprises an injector for adding a hydrate promoter into the reactor, and a liquid outlet of the injector is close to a surface of the aqueous solution in the reactor.

[0016] Optionally, the metal capillary is connected to the second liquid pipeline via insulating rubber.

[0017] Optionally, the outside of the reactor is provided with a cooling layer jacket.

[0018] Optionally, the reactor is equipped with a pressure sensor for measuring the gas phase pressure in the reactor and a temperature sensor for measuring the temperature of the aqueous solution in the reactor and the inner wall of the reactor.

[0019] Optionally, a second valve is installed on the first liquid pipeline, and a flow valve is installed on the second liquid pipeline.

[0020] Optionally, the metal grid electrode plate is located inside the reactor, and the outer surface of the metal grid electrode plate and the portion of the reactor in contact with the metal grid electrode plate are both insulated.

[0021] Optionally, the device further comprises an electrode plate fixing structure installed at the outer bottom of the reactor, the metal grid electrode plate is fixed to the outer bottom of the reactor via the electrode plate fixing structure, and the metal grid electrode plate is insulated from the reactor.

[0022] Optionally, the electrode plate fixing structure is an insulating groove, the notch of the insulating groove is connected to the bottom of the reactor, and the metal grid electrode plate is arranged inside the insulating groove and does not contact the reactor. It should be noted that the electrode plate here can also be a non-grid electrode plate, such as a solid electrode plate of other materials.

[0023] According to the specific embodiments provided by the present invention, the present invention discloses the following technical effects: the gas hydrate generation device based on the dual-electrode electrostatic spray method provided by the present invention forms an electrostatic field between the metal capillary and the metal grid electrode plate. When the electrostatic force and gravity on the droplets sprayed from the atomizing nozzle exceed the restraint of the liquid surface tension, they will be further atomized. At the same time, the droplets are polarized under the action of the electric field, which enhances the degree of liquid atomization. When the droplets pass through the hollow part of the annular electrode, under the action of the annular electrode, the droplets disperse to the surroundings, reducing the collision between the droplets, increasing the contact area between the gas molecules and the water molecules, and improving the hydration rate. Compared with the traditional atomization method, the droplets produced by the atomization of the present invention have smaller particle size, better directionality, more uniform distribution of the fog group, and significantly improve the gas hydration rate. BRIEF DESCRIPTION OF THE DRAWINGS

[0024] In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings required for use in the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present invention. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying creative work.

[0025] Figure 1 A schematic structural diagram of a gas hydrate generation device based on a dual-electrode electrostatic spray method provided in Example 1 of the present invention;

[0026] Figure 2 This is a schematic diagram of the structure of a gas hydrate generation device based on a dual-electrode electrostatic spray method provided in Example 2 of the present invention. DETAILED DESCRIPTION

[0027] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0028] In order to make the above-mentioned objects, features and advantages of the present invention more obvious and easy to understand, the present invention is further described in detail below with reference to the accompanying drawings and specific embodiments.

[0029] Example 1

[0030] Figure 1 The schematic diagram of the structure of the gas hydrate generation device based on the dual-electrode electrostatic spray method provided in Example 1 of the present invention is as follows: Figure 1 As shown, the gas hydrate generation device provided in this embodiment includes a high-voltage electrostatic generator 1, a first fluid pipeline, a second fluid pipeline 20, a circulation pump 8, a reactor 6, a metal capillary 12, an atomizing nozzle 3, an annular electrode 4 and a metal mesh electrode plate 5. Among them, the atomizing nozzle 3, the annular electrode 4 and the metal mesh electrode plate 5 are all arranged inside the reactor 6, the metal capillary 12 is inserted into the reactor 6 from the upper wall of the reactor 6, the lower end of the metal capillary 12 can be connected to the atomizing nozzle 3 by welding, the annular electrode 4 is arranged below the atomizing nozzle 3, and the metal mesh electrode plate 5 is arranged below the annular electrode 4. The high-voltage electrostatic generator 1 supplies power to the annular electrode 4, the metal capillary 12 and the metal mesh electrode plate in two ways, and the metal mesh electrode plate 5 is grounded. A high voltage is applied to the metal capillary. When the liquid flows out of the charged metal capillary at a certain flow rate, the droplets will eventually break into particles under the action of the electrostatic force and move under the action of the electric field force. The potential difference formed between the metal capillary 12 and the metal mesh electrode plate 5 causes the droplets sprayed from the atomizing nozzle 3 to further form water mist and spray to the reactor 6. At the same time, when the droplets sprayed from the atomizing nozzle 3 pass through the hollow part of the annular electrode 4, they will be further atomized under the action of the annular electrode 4 and dispersed to the surroundings. That is to say, under the action of the electrostatic field between the metal capillary 12 and the metal mesh electrode plate 5 and the annular electrode 4, the droplets sprayed from the atomizing nozzle 3 are further atomized to form droplets with a smaller particle size. Under the repulsive force between the charges, the degree of diffusion of the charged droplets is increased, the contact area between the droplets and the gas in the reactor 6 is increased, and the hydration rate of the gas molecules and the water molecules is increased. At the same time, under the action of the annular electrode 4, the droplets are dispersed to the surroundings, further increasing the contact area between the droplets and the gas in the reactor 6 and increasing the hydration rate of the gas molecules and the water molecules. The first fluid pipeline includes a first liquid pipeline 18 and a second liquid pipeline 19. One end of the first liquid pipeline 18 is connected to a liquid flow port opened on the wall of the reactor 6, and the other end of the first liquid pipeline 18 is connected to the inlet of the circulation pump 8. One end of the second liquid pipeline 19 is connected to the outlet of the circulation pump 8, and the other end of the second liquid pipeline 19 is connected to the upper end of the metal capillary 12. Under the action of the circulation pump 8, the liquid in the reactor 6 is circulated through the first fluid pipeline. One end of the second fluid pipeline 20 is connected to the gas supply device, and the other end is inserted into the reactor 6 to realize the gas supply device to ventilate the reactor 6, and the gas introduced into the reactor 6 is hydrated with the atomized droplets in the reactor 6 to form gas hydrates.

[0031] In this embodiment, Figure 1The metal grid electrode plate 5 shown is fixedly connected to the inner wall of the reactor and does not contact the aqueous solution. Of course, the metal grid electrode plate 5 can also contact the aqueous solution. In either case, the outer surface of the metal grid electrode plate and the contact portion of the reactor with the metal grid electrode plate need to be insulated to ensure safety.

[0032] In this embodiment, the voltage on the atomizing nozzle 3 and the annular electrode 4 is adjustable, the adjustable range of the high-voltage DC power supply of the high-voltage electrostatic generator 1 can be 0 to 100 kV, the power is 30 to 50 W, the voltage range of the atomizing nozzle 3 can be 0 to 20 kV, the voltage range of the annular electrode can be 0 to 20 kV, and the injection pressure range can be 170 to 4000 kPa.

[0033] In this embodiment, the vertical distance between the annular electrode 4 and the metal mesh electrode is adjustable. The atomizing nozzle 3 has an air flow channel, which can spray gas or liquid, and the spray cone angle of the atomizing nozzle 3 is 0-120 degrees. The length of the metal capillary 12 can be adjusted in the range of 13-25 mm.

[0034] In this embodiment, as an optional implementation, the atomizing nozzle 3 is also connected to a gas source, and gas is introduced into the atomizing nozzle 3, and the nozzle of the atomizing nozzle 3 is pressurized and purged regularly by gas to prevent hydrate blockage at the nozzle. Specifically: the device provided in this embodiment also includes a third fluid pipeline, one end of which is connected to the gas supply device, and the other end is connected to the first liquid pipeline 18 through the first valve 17. Close the second valve 16 on the first liquid pipeline 18, open the third valve 21 connected to the third fluid pipeline on the buffer tank 10 and the first valve 17 on the third fluid pipeline, and use the circulating pump 8 to regularly pressurize and purge the airflow passing through the nozzle to prevent hydrate blockage at the nozzle.

[0035] As an optional implementation, the gas supply device includes a high-pressure gas source and a buffer tank 10. The buffer tank 10 is placed between the high-pressure gas source and the reactor 6 to stabilize the pressure and flow.

[0036] In this embodiment, the atomizing nozzle 3 is connected to the lower end of the metal capillary 12, and the inner surface is insulated to prevent the metal capillary 12 from forming a current path with the nozzle of the atomizing nozzle 3. As an optional embodiment, the surface of the atomizing nozzle 3 is insulated by spraying polytetrafluoroethylene. The surface of the annular electrode 4 is insulated. As an optional embodiment, the surface of the annular electrode 4 is insulated by spraying polytetrafluoroethylene or using a platinum electrode or a titanium electrode.

[0037] As an optional embodiment, an injector 9 is installed on the upper part of the reactor 6, and the outlet of the injector 9 is close to the water surface. The injector 9 injects a fluid hydrate promoter, including a liquid promoter, nanoparticles, etc.

[0038] As an optional implementation, the metal capillary 12 and the second liquid pipeline 19 are connected by insulating rubber to prevent the high voltage electricity from directly charging the water along the circulation pipe to form electrolyzed water.

[0039] As an optional implementation, a second valve 16 is installed on the first liquid pipeline 18 , and a flow valve 15 is installed on the second liquid pipeline 19 . The flow valve 15 is used to control the flow rate of circulating water entering the reactor 6 through the metal capillary 12 .

[0040] As an optional embodiment, the reactor 6 is externally provided with a cooling layer jacket 23, the cooling layer jacket 23 has a cooling liquid inlet 22 on one side of the upper portion and a cooling liquid outlet 24 on the other side of the lower portion, forming a cooling structure for maintaining the low temperature of the storage tank.

[0041] As an optional implementation, low-temperature protection treatment is performed on the circulation pump 8, wherein the circulation pump 8 can be a pneumatic pump.

[0042] As an optional embodiment, the reactor 6 is equipped with a pressure sensor 13, a first temperature sensor 14 and a second temperature sensor 25, which are respectively used to detect the gas phase pressure in the reactor 6 and the temperature of the inner wall of the reactor and the aqueous solution.

[0043] As an optional implementation, a temperature detector 2 is installed on the outer wall of the reactor 6 to detect the temperature of the coolant.

[0044] As an optional implementation, the circulation pump 8 is connected to an accumulator to achieve intermittent and continuous water supply.

[0045] Example 2

[0046] like Figure 2 As shown, the difference between this embodiment and embodiment 1 is that the metal grid electrode 5 is arranged at the bottom of the outer side of the reactor 6, and the electrode plate here can be a non-grid electrode plate. In this embodiment, the gas hydrate generation device also includes an electrode plate fixing structure installed at the bottom of the outer side of the reactor, and the electrode plate is fixed to the outer bottom of the reactor through the electrode plate fixing structure, and the electrode plate is insulated from the reactor. Specifically, it can be: the electrode plate fixing structure is an insulating groove 7, the notch of the insulating groove 7 is connected to the bottom of the reactor 6 to form a closed space, the electrode plate is arranged inside the insulating groove 7, and the electrode plate is not in contact with the metal wall of the reactor 6. In this case, there is no need to insulate the electrode plate. The insulating groove 7 is detachable. The rest is the same as embodiment 1.

[0047] In the gas hydrate generation device based on the dual-electrode electrostatic spray method provided by the present invention, the droplets sprayed from the atomizing nozzle pass through the hollow part of the annular electrode. Under the action of the annular electrode, the droplets carry the same charge and repel each other and disperse to the surroundings, which increases the contact area between the gas molecules and the water molecules and improves the hydration rate. At the same time, under the action of the electrostatic field between the metal capillary and the metal grid electrode plate and the annular electrode, the droplets sprayed from the atomizing nozzle are further atomized, and the particle size becomes smaller, which further increases the contact area between the gas molecules and the water molecules and improves the hydration rate. In addition, the droplets are polarized under the action of the electric field, which increases the hydration rate of the gas molecules and the water molecules. Compared with the traditional atomization method, the droplets produced by the atomization of the present invention have a smaller particle size, better directionality, and the fog group distribution is more uniform, which significantly improves the gas hydration rate.

[0048] The various embodiments in this specification are described in a progressive manner, and each embodiment focuses on the differences from other embodiments. The same or similar parts between the various embodiments can be referenced to each other.

[0049] The principles and implementation methods of the present invention are described in this article using specific examples. The description of the above embodiments is only used to help understand the method and core idea of ​​the present invention. At the same time, for those skilled in the art, according to the idea of ​​the present invention, there will be changes in the specific implementation methods and application scope. In summary, the content of this specification should not be understood as limiting the present invention.

Claims

1. A gas hydrate generation device based on a dual-electrode electrostatic spray method, characterized in that: include: A high-voltage electrostatic generator, a first fluid pipeline, a second fluid pipeline, a circulation pump, a reaction kettle, a metal capillary, an atomizing nozzle, a ring electrode, a metal grid electrode plate and a third fluid pipeline; The high-voltage electrostatic generator supplies power to the metal capillary, the annular electrode and the metal grid electrode plate respectively; The metal capillary is inserted into the reactor from the upper wall of the reactor; The atomizing nozzle is connected to the lower end of the metal capillary tube, and the inner surface thereof is insulated; The annular electrode is located below the atomizing nozzle and its surface is insulated. The upper and lower distances between the annular electrode and the metal grid electrode are adjustable. The metal grid electrode plate is located below the annular electrode and is grounded; the metal grid electrode plate is insulated from the reactor and the aqueous solution in the reactor. When a high voltage is applied to the metal capillary, and the liquid flows out of the charged metal capillary at a certain flow rate, the liquid droplets are eventually broken into particles under the action of electrostatic force and move under the action of the electric field force. The potential difference formed between the metal capillary and the metal grid electrode plate causes the liquid droplets sprayed from the atomizing nozzle to further form water mist and spray to the reactor. At the same time, when the liquid droplets sprayed from the atomizing nozzle pass through the hollow part of the annular electrode, they are further atomized under the action of the annular electrode and dispersed to the surroundings at the same time. The first fluid pipeline includes a first liquid pipeline and a second liquid pipeline, one end of the first liquid pipeline is connected to the liquid flow port opened on the wall of the reactor, the other end of the first liquid pipeline is connected to the inlet of the circulation pump, one end of the second liquid pipeline is connected to the outlet of the circulation pump, and the other end of the second liquid pipeline is connected to the upper end of the metal capillary; The second fluid pipeline has one end connected to the gas supply device and the other end inserted into the reactor; One end of the third fluid pipeline is connected to the gas supply device, and the other end is connected to the first liquid pipeline through a first valve. By introducing gas into the atomizing nozzle, the nozzle of the atomizing nozzle is pressurized and purged regularly with gas to prevent hydrate blockage at the nozzle.

2. The gas hydrate generation device based on the dual-electrode electrostatic spray method according to claim 1, characterized in that: The device also includes an injector for adding a hydrate promoter into the reactor, and a liquid outlet of the injector is close to the surface of the aqueous solution in the reactor.

3. The gas hydrate generation device based on the dual-electrode electrostatic spray method according to claim 1, characterized in that: The metal capillary is connected to the second liquid pipeline via insulating rubber.

4. The gas hydrate generation device based on the dual-electrode electrostatic spray method according to claim 1, characterized in that: The outside of the reactor is provided with a cooling layer jacket.

5. The gas hydrate generation device based on the dual-electrode electrostatic spray method according to claim 1, characterized in that: The reactor is equipped with a pressure sensor for measuring the gas phase pressure in the reactor and a temperature sensor for measuring the temperature of the aqueous solution in the reactor and the inner wall of the reactor.

6. The gas hydrate generation device based on the dual-electrode electrostatic spray method according to claim 1, characterized in that: A second valve is installed on the first liquid pipeline, and a flow valve is installed on the second liquid pipeline.

7. The gas hydrate generation device based on the dual-electrode electrostatic spray method according to any one of claims 1 to 6, characterized in that: The metal grid electrode plate is located inside the reactor, and the outer surface of the metal grid electrode plate and the part of the reactor in contact with the metal grid electrode plate are both insulated.

8. The gas hydrate generation device based on the dual-electrode electrostatic spray method according to any one of claims 1 to 6, characterized in that: The device also includes an electrode plate fixing structure installed on the outer bottom of the reactor, the metal grid electrode plate is fixed to the outer bottom of the reactor through the electrode plate fixing structure, and the metal grid electrode plate is insulated from the reactor.

9. The gas hydrate generation device based on the dual-electrode electrostatic spray method according to claim 8, characterized in that: The electrode plate fixing structure is an insulating groove, the notch of which is connected to the bottom of the reactor, and the metal grid electrode plate is arranged inside the insulating groove and does not contact the reactor.

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