Photoresist ejection system
By using a combination of stepper motor and lifting screw in the photoresist injection system, the problems of vibration and bubble generation during photoresist pumping are solved, and the system is achieved smooth, precise and efficient operation is ensured, ensuring the accurate control of the photoresist flow rate.
Patent Information
- Application Number
- CN202010263933.5
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Filing Date
- 2020-04-07
- Publication Date
- 2025-04-11
- Estimated Expiration
- 2040-04-07
AI Technical Summary
The existing photoresist ejection system is prone to vibration when pumping the photoresist liquid, causing bubbles to occur, affecting the accuracy of the flow rate and increasing costs.
The stepper motor is used to drive the lifting screw. By accurately controlling the rotation of the stepper motor, the smooth operation of the photoresist liquid spraying system is achieved, preventing bubbles, and improving the stability and efficiency of the system through the dual photoresist pump system.
The smooth, accurate and efficient operation of the photoresist spraying system is achieved, which avoids the generation of bubbles, ensures the accurate control of the photoresist flow rate, and reduces cost waste.
Smart Images

Figure CN111451094B_ABST
Abstract
Description
Technical Field
[0001] The invention relates to the field of semiconductor manufacturing, and in particular to a photoresist ejection system. Background Art
[0002] The photoresist coating process mainly uses a pump to suck the photoresist liquid placed in the storage tank into the delivery pipe, and the valves located at the upper and lower ends of the pump are used to control the volume of the photoresist liquid entering and leaving the pump. Finally, it is sent to the nozzle through the delivery pipe, and the nozzle sprays the photoresist liquid to the center of the chip surface. The chip sprayed with photoresist liquid is placed on a spin coater, which drives the chip to rotate, so that the photoresist liquid can be evenly coated on the chip surface by centrifugal force.
[0003] When using a pump to pump photoresist liquid, it is critical that the system is stable. If the system has slight or severe vibrations, it may cause bubbles in the photoresist liquid during the transportation process, especially inside the photoresist pump. If the photoresist pump is not stable in the process of extracting and pressing the photoresist liquid, bubbles will be generated, and the bubbles will accumulate. When the accumulation is larger and larger, it will affect the accurate pumping of the photoresist liquid flow.
[0004] Photoresist is an expensive raw material, and the amount of photoresist sprayed affects the chip production. If the flow rate is not well controlled, it will lead to poor chip production, further increasing the cost. Therefore, the spraying of photoresist requires a precise system to reduce errors and avoid cost waste. Summary of the invention
[0005] The problem solved by the present invention is to provide a light-resistance ejection system to better realize the transmission and interaction process of speech.
[0006] To solve the above problems, the present invention provides a photoresist ejection system, including: a stepper motor, the stepper motor having a motor shaft; an encoder, the encoder being arranged around the motor shaft; a driving wheel, the driving wheel being sleeved on the motor shaft; a first photoresist pump, the first photoresist pump having a first outer shell and a first inner diaphragm, the first outer shell having a first input port, a first output port and a first side opening, the first inner diaphragm being lined inside the first outer shell, and the first input port and the first output port being connected through the first inner diaphragm; a lifting screw, the first end of the lifting screw being used to push and release the first inner diaphragm through the first side opening; a driven wheel, the driven wheel being sleeved on the lifting screw; a transmission belt, the driving wheel drives the driven wheel through the transmission belt.
[0007] Optionally, a first blunt tube head is sleeved on the first end of the lifting screw, and the first blunt tube head is used to directly push and release the first inner diaphragm.
[0008] Optionally, the first end of the lifting screw is sleeved with a first piston head, the first piston head is inserted into a first piston barrel, the first piston barrel has a first liquid inside, and the barrel mouth of the first piston barrel is connected to the first side opening; the first liquid enters or flows out of the first shell through the lifting and lowering of the lifting screw.
[0009] Optionally, the first input port of the first photoresistance pump is connected to a first input tube, which is connected to a first pneumatic valve; the first output port of the first photoresistance pump is connected to a first output tube, which is connected to a second pneumatic valve.
[0010] Optionally, the system also includes a second photoresistance pump, which has a second outer shell and a second inner diaphragm, the second outer shell has a second input port, a second output port and a second side opening, the second inner diaphragm is lined inside the second outer shell, and the second input port and the second output port are connected by the second inner diaphragm; the second end of the lifting screw is used to push and release the second inner diaphragm through the second side opening.
[0011] Optionally, the second end of the lifting screw is sleeved with a second blunt tube head, and the second blunt tube head is used to directly push and release the second inner diaphragm.
[0012] Optionally, the second end of the lifting screw is sleeved with a second piston head, the second piston head is inserted into a second piston barrel, the second piston barrel has a second liquid inside, and the barrel mouth of the second piston barrel is connected to the second side opening; the second liquid enters or flows out of the second outer shell through the lifting and lowering of the lifting screw.
[0013] Optionally, the second input port of the second photoresistance pump is connected to a second input pipe, which is connected to a third pneumatic valve; the second output port of the second photoresistance pump is connected to a second output pipe, which is connected to a fourth pneumatic valve.
[0014] Optionally, the driving wheel rotates at a fixed position, the driven wheel rotates at a fixed position, and the driving wheel and the driven wheel are fixed on the same horizontal plane.
[0015] Optionally, the radius of the driving wheel is 0.2 to 5 times the radius of the driven wheel.
[0016] In one aspect of the technical solution of the present invention, the corresponding photoresist spraying system uses a stepper motor to drive the lifting screw, the stepper motor rotates very smoothly, the number of rotations can be accurately controlled, and the rotation speed can be accurately controlled. Therefore, the operation of the entire system can be stable, accurate and high, so that the height and speed of the lifting screw can be accurately controlled, and finally the photoresist liquid spraying flow rate can be accurately controlled. In addition, since the system runs smoothly, it can better prevent the introduction of bubbles during the photoresist liquid spraying process.
[0017] Furthermore, after the first photoresist pump and the corresponding pipeline are provided, the second photoresist pump and the corresponding pipeline are provided at the same time, so that for the entire photoresist ejection system, one lifting screw can be used to provide power for two photoresist ejection pipelines at the same time, thereby achieving a more efficient work utilization rate. In addition, the lifting screw acts on the corresponding photoresist pump up and down at the same time, which can further improve the stability of the system, making the entire system more stable and having better practical performance. BRIEF DESCRIPTION OF THE DRAWINGS
[0018] Figure 1 is a schematic diagram of a photoresist ejection system provided by an embodiment of the present invention;
[0019] Figure 2 for Figure 1 Schematic diagram of the cross section of the structure shown along the AA dot-dash line
[0020] Figure 3 is a schematic diagram of another photoresist ejection system provided by another embodiment of the present invention;
[0021] Figure 4 is a schematic diagram of another photoresist ejection system provided by another embodiment of the present invention;
[0022] Figure 5 It is a schematic diagram of another photoresist ejection system provided by another embodiment of the present invention. DETAILED DESCRIPTION
[0023] The invention provides a photoresist ejection system with stable operation and high control accuracy.
[0024] For a clearer representation, the present invention is described in detail below with reference to the accompanying drawings.
[0025] The embodiment of the present invention provides a photoresist ejection system, please refer to Figure 1 and Figure 2 , Figure 1 This is the overall schematic diagram of the photoresist ejection system. Figure 2 for Figure 1 The structure shown is a schematic cross-sectional view obtained by cutting along the AA dot-dash line.
[0026] like Figure 1 and Figure 2 As shown, the photoresist ejection system includes:
[0027] A stepper motor 100, wherein the stepper motor 100 has a motor shaft 101;
[0028] An encoder 110, the encoder 110 is arranged around the motor shaft 101;
[0029] Drive wheel 160 (such as Figure 2 ), the driving wheel 160 is sleeved on the motor shaft 101;
[0030] A first photoresistance pump (not labeled), the first photoresistance pump comprises a first housing 121 and a first inner diaphragm 122, the first housing 121 comprises a first input port (not shown), a first output port (not shown) and a first side opening (not shown), the first inner diaphragm 122 is lined inside the first housing 121, and the first input port and the first output port are communicated through the first inner diaphragm 122;
[0031] A lifting screw 140, the first end of which is used to push and release the first inner diaphragm 122 through the first side opening (indirectly in this embodiment);
[0032] The driven wheel 170 (such as Figure 2 ), the driven wheel 170 is sleeved on the lifting screw 140;
[0033] The driving wheel 160 drives the driven wheel 170 through the driving belt 150 .
[0034] It should be noted that, although the first input port, the first output port and the first side opening of the first housing 121 are not shown, Figure 1 The structure of can be directly and unambiguously derived, this embodiment Figure 1 In the embodiment, the first housing 121 has a first input port on the left side, and the first input port is used to connect with the first input pipe 131, and the first ball valve 133 can be used to realize the connection between the first input port and the first input pipe 131; the first housing 121 has a first output port on the right side, and the first output port is used to connect with the first output pipe 132, and the second ball valve 134 can be used to realize the connection between the first output port and the first output pipe 132. The first side opening is used to access the corresponding pushing and releasing structure, which is the first blunt tube head 141 in this embodiment.
[0035] As can be seen from the above, the first input port of the first photoresist pump is connected to the first input pipe 131, and the first input pipe 131 is connected to the first ball valve 133. The first output port of the first photoresist pump is connected to the first output pipe 132, and the first output pipe 132 is connected to the second ball valve 134. In addition, in this embodiment, the front end of the first input pipe 131 is used to connect to the storage tank (not shown) filled with photoresist liquid, and the rear end of the first output pipe 132 is used to connect to the nozzle mechanism (not shown).
[0036] like Figure 1 As shown, the ball valve uses the internal ball to block the corresponding input port or output port. In this embodiment, the first ball valve 133 is used to control whether the photoresist liquid flows from the storage tank into the first photoresist pump, and the second ball valve 134 is used to control whether the photoresist liquid flows to the nozzle mechanism. In conjunction with the previous content, it can be known that when the first inner diaphragm 122 is pushed and causes contraction, the first ball valve 133 blocks the first input port to cut off the photoresist liquid from the storage tank to flow into the first photoresist pump, and the second ball valve 134 opens the first output port to enable the photoresist liquid to flow to the nozzle mechanism; when the first inner diaphragm 122 is released (pulled) and causes expansion, the first ball valve 133 opens the first input port to enable the photoresist liquid to flow from the storage tank into the first photoresist pump, and the second ball valve 134 blocks the first output port to cut off the photoresist liquid from flowing to the nozzle mechanism.
[0037] In this embodiment, the driving wheel 160 can be sleeved on the lower end of the motor shaft 101. This structure can be combined with Figure 1 and Figure 2 At the same time, this structure needs to ensure that when the motor shaft 101 rotates, the driving wheel 160 is driven to rotate. Therefore, the motor shaft 101 and the driving wheel 160 are usually fixedly connected.
[0038] It should be noted that, in this embodiment, the stepper motor 100 can be controlled by a controller (not shown), and the encoder 110, as a corresponding monitoring device, can provide information feedback to the controller to better achieve control. At this point, it can be seen that the encoder 110 and the controller (not shown) are in communication connection.
[0039] The first inner diaphragm 122 of this embodiment is a corresponding flexible membrane. When the first inner diaphragm 122 expands, the photoresist liquid can be sucked into the photoresist pump, that is, the first inner diaphragm 122 itself, and when the first inner diaphragm 122 contracts, the photoresist liquid can be pushed out to achieve the ejection of the photoresist liquid.
[0040] The first shell 121 and the first inner diaphragm 122 of this embodiment can be made of the same polymer material, and different size parameters and processes in the manufacturing process can be used to make the first shell 121 have corresponding rigid properties and the first inner diaphragm 122 have corresponding flexible properties.
[0041] In this embodiment, the first inner diaphragm 122 can be understood as being similar to the inner tube of a wheel, and the first outer shell 121 is similar to the outer tube of a wheel. However, the front and rear ports of the first inner diaphragm 122 are connected to the front and rear output ports of the first outer shell 121, which is equivalent to two tubes sleeved together, the inner tube is a flexible tube, and the outer tube is a rigid tube. Therefore, Figure 1 The first inner diaphragm 122 is indicated by a dotted line to show the corresponding space. In this way, a space of variable size is formed between the first inner diaphragm 122 and the first housing 121, providing conditions for the external force to push and release the first inner diaphragm 122.
[0042] In this embodiment, the first input port and the first output port are connected via the first inner diaphragm 122 to ensure that the photoresist liquid will only flow through the cavity inside the first inner diaphragm 122, thereby ensuring the ejection effect of the first photoresist pump.
[0043] In this embodiment, in order to realize the expansion and contraction of the first inner diaphragm 122 , a corresponding external power is required, and this embodiment utilizes the pushing and releasing effect of the lifting screw 140 on the first inner diaphragm 122 .
[0044] It should be noted that the first end of the lifting screw 140 may be in direct contact with the first inner diaphragm 122 or may be in indirect contact with the first inner diaphragm 122. For example, in this embodiment, one end of the lifting screw 140 ( Figure 1 The upper end (as shown in FIG. 1 ) is sleeved with a first blunt tube head 141 , and the first blunt tube head 141 is used to directly push and release the first inner diaphragm 122 .
[0045] The first blunt tube head 141 is a tube body with a sealed end. In this embodiment, the first blunt tube head 141 is regarded as the head of the lifting screw 140, which is used to directly contact the first inner diaphragm 122. Therefore, the sealed end (i.e., the head) of the first blunt tube head 141 can be a chamfered and blunted shape, such as Figure 1 The dotted line in the figure shows its head structure. Meanwhile, the arrangement of the first blunt tube head 141 can also provide a better protection for the first inner diaphragm 122.
[0046] It should be noted that, in other embodiments, the first blunt tube head 141 may not be used, and the head of the lifting screw 140 may be directly made into a chamfered and blunted shape to directly act on the first inner diaphragm 122 .
[0047] In this embodiment, the first blunt tube head 141 can be bonded to the first inner diaphragm 122, and the first blunt tube head 141 and the lifting screw 140 are fixed together. At this time, when the lifting screw 140 moves downward to drive the first blunt tube head 141, the first blunt tube head 141 not only loosens the first inner diaphragm 122, but also performs a loosening (pulling down) operation. At this time, the lifting screw 140 indirectly loosens (loosens, pulls down) the first inner diaphragm 122.
[0048] It should be noted that, in this embodiment, the driving wheel 160 rotates at a fixed position, the driven wheel 170 rotates at a fixed position, and the driving wheel 160 and the driven wheel 170 are fixed on the same horizontal plane. For example, the driving wheel 160 and the driven wheel 170 can be fixed on the same workbench so that the two are kept on the same horizontal plane, and the positions do not change, but only rotate. The driving wheel 160 and the driven wheel 170 are fixed on the same horizontal plane, which helps the entire system to run more smoothly.
[0049] It should be noted that the driving wheel 160 and the driven wheel 170 fixed on a workbench can rotate, but it does not affect their connection with other structures. The specific design can be various and does not limit the present invention.
[0050] In the present invention, the radius of the driving wheel 160 can be 0.2 to 5 times the radius of the driven wheel 170. The larger the radius of the driving wheel 160 compared to the driven wheel 170, the faster the speed of the lifting screw 140 rising or falling during the rotation process, the higher the push-pull efficiency, but the less stable the system. On the contrary, if the driving wheel 160 has a smaller radius than the driven wheel 170, the slower the speed of the lifting screw 140 rising or falling during the rotation process, the lower the push-pull efficiency, but the more stable the system runs.
[0051] This embodiment uses the first inner diaphragm 122 as a mechanism for the photoresist liquid flow channel, and then uses the lifting screw 140 to make the first inner diaphragm 122 relax and expand to achieve the corresponding photoresist pumping effect. In addition, this structure of this embodiment can achieve a faster and more accurate pumping effect.
[0052] The photoresist ejection system provided in this embodiment has the following working principle:
[0053] The first photoresist pump utilizes the pushing and releasing operations on its first inner diaphragm 122 to realize the suction and ejection of the photoresist. In the specific process, the pushing and releasing operations on the first inner diaphragm 122 are realized by the lifting and lowering movement of the lifting screw 140, and the lifting and lowering movement of the lifting screw 140 is realized by the transmission belt 150, the driven wheel 170, the driving wheel 160 and the stepping motor 100.
[0054] The specific operation process of the photoresist ejection system is as follows:
[0055] After receiving the control information, the stepper motor 100 starts to rotate. The motor shaft 101 of the stepper motor 100 drives the driving wheel 160 to rotate. The driving wheel 160 drives the driven wheel 170 to rotate through the transmission effect of the transmission belt 150. The interior of the driven wheel 170 is an internal thread structure. Therefore, when the driven wheel 170 rotates, the lifting screw 140 on which it is sleeved (set) will rise or fall. Whether the lifting screw 140 rises or falls depends on the rotation direction of the driven wheel 170 and the winding direction of the internal thread of the driven wheel 170. What is very critical is that the lifting screw 140 itself does not rotate. The lifting screw 140 can be fixedly connected to the first blunt tube head 141, and then the first blunt tube head 141 is matched with the side opening (for example, the first blunt tube head 141 and the side opening have a corresponding blocking structure in the vertical direction, not shown. Or the side opening can be made into a polygonal opening, and the cross-sectional shape of the first blunt tube head 141 is a corresponding polygon) to prevent the first blunt tube head 141 from rotating, thereby controlling the lifting screw 140 to go straight up and down without rotating.
[0056] From the control point of view, in this embodiment, the aforementioned controller can control the stepper motor 100, and then control the lifting screw 140, and then control the expansion of the first inner diaphragm 122, so as to adjust the flow rate of the output photoresist liquid and achieve good flow control, thereby blocking excess photoresist liquid from flowing into the nozzle, so as to achieve more precise flow control.
[0057] In the photoresist spraying system provided in this embodiment, since the stepper motor 100 rotates very smoothly, the number of rotations can be precisely controlled, and the rotation speed can be precisely controlled, the entire system can run smoothly, accurately, and highly, thereby enabling the height and speed of the lifting screw 140 to be precisely controlled, and ultimately the spraying flow rate of the photoresist liquid can be precisely controlled. In addition, since the system runs smoothly, it can better prevent the introduction of bubbles during the photoresist liquid spraying process.
[0058] Another embodiment of the present invention provides another photoresist ejection system, please refer to Figure 3 .
[0059] The photoresist ejection system of this embodiment also includes the various structures of the aforementioned embodiments, specifically including the stepping motor 100, the encoder 110, the driving wheel 160, the first photoresist pump (not marked), the lifting screw 140, the driven wheel 170 and the transmission belt 150. Among them, the first photoresist pump includes a first shell 121 and a first inner diaphragm 122, the first shell 121 has a first input port (not shown), a first output port (not shown) and a first side opening (not shown), the first inner diaphragm 122 is lined inside the first shell 121, and the first input port and the first output port are connected through the first inner diaphragm 122. The first input port is connected to the first input pipe 131, and the first output port is connected to the first output pipe 132.
[0060] The properties and advantages of the above structure can be referred to the corresponding contents of the aforementioned embodiments.
[0061] Different from the previous embodiment, in this embodiment, there is no corresponding blunt tube head. On the contrary, in this embodiment, the first end of the lifting screw 140 is sleeved with the first piston tube head 142, the first piston tube head 142 is inserted into the first piston tube tube 143, the first piston tube tube 143 has a first liquid (such as oil) inside, and the tube mouth of the first piston tube tube 143 is connected to the first side opening.
[0062] This embodiment does not use a blunt tube head, but a corresponding piston structure. Specifically, the first end of the lifting screw 140 is sleeved with a first piston tube head 142, the first piston tube head 142 is inserted into a first piston tube 143, the first piston tube 143 has a first liquid (such as oil) inside, and the tube mouth of the first piston tube 143 is connected to the first side opening.
[0063] With this piston structure, the first liquid can be injected into or extracted from the internal space between the first housing 121 and the first inner diaphragm 122 by lifting and lowering the lifting screw 140. When the first liquid is injected into the internal space, a push (squeezing effect) is formed on the first inner diaphragm 122; and when the first liquid is extracted from the internal space, a vacuum effect is generated to loosen and pull the first inner diaphragm 122. Therefore, the first photoresist pump can achieve the purpose of extracting and pressurizing the photoresist liquid.
[0064] The first liquid enters or flows out of the first shell 121 , but the first shell 121 into which the first liquid enters is also the outside of the first inner diaphragm 122 , so the first liquid is only used to push (squeeze) and loosen the first inner diaphragm 122 .
[0065] By adopting the structure of this embodiment, the pushing (squeezing) and releasing (pulling) operations on the first inner diaphragm 122 can be made gentler and smoother, and the flow of the first liquid can be better controlled, further improving the accuracy of the photoresist liquid flow and improving the reliability of the system.
[0066] In this embodiment, the first input pipe 131 is connected to a first pneumatic valve 135. The first output pipe 132 is connected to a second pneumatic valve 136. By providing pneumatic valves before and after the first photoresist pump, the ejection amount of the photoresist liquid can be further accurately controlled. In this embodiment, the first pneumatic valve 135 and the second pneumatic valve 136 can be controlled by a corresponding controller (refer to the corresponding content of the above embodiment) to open and close them respectively.
[0067] In the photoresist ejection system provided in the present embodiment, when the first photoresist pump draws in the photoresist liquid, the first pneumatic valve 135 is opened and the second pneumatic valve 136 is closed, and the first inner diaphragm 122 of the first photoresist pump is operated to descend by the lifting screw 140, so that the corresponding liquid (oil) is drawn out from between the first inner diaphragm 122 and the first housing 121. At this time, the first inner diaphragm 122 is equivalent to being vacuumed from the outside, and therefore, is equivalent to being loosened (pulled) and expanded. Under this expansion effect, the photoresist liquid can be drawn from the storage tank by the first photoresist pump, that is, it flows from the storage tank into the first photoresist pump. Inside the first inner diaphragm 122; after the first photoresist pump extracts a sufficient photoresist liquid flow, the first pneumatic valve 135 is immediately blocked, the second pneumatic valve 136 is opened, and then the liquid (oil) is injected between the first inner diaphragm 122 and the first outer shell 121 through the rising operation of the lifting screw 140, thereby pushing the first inner diaphragm 122 to shrink the first inner diaphragm 122 to output the photoresist liquid through the second pneumatic valve 136, and further output it to the corresponding nozzle mechanism. When the corresponding spraying flow rate is reached, the second pneumatic valve 136 can be immediately closed.
[0068] In this embodiment, the first pneumatic valve 135 and the second pneumatic valve 136 are used as corresponding valves, which can not only prevent excess photoresist liquid from entering the first photoresist pump, but also prevent excessive photoresist liquid from being output to the corresponding nozzle mechanism, thereby achieving a more precise flow control effect and avoiding excess photoresist liquid from remaining in the nozzle, causing unnecessary cost waste.
[0069] Another embodiment of the present invention provides another photoresist ejection system, please refer to Figure 4 .
[0070] The photoresist ejection system of this embodiment also includes the various structures of the aforementioned embodiments, specifically including the stepping motor 100, the encoder 110, the driving wheel 160, the first photoresist pump (not marked), the lifting screw 140, the driven wheel 170 and the transmission belt 150. Among them, the first photoresist pump includes a first shell 121 and a first inner diaphragm 122, the first shell 121 has a first input port (not shown), a first output port (not shown) and a first side opening (not shown), the first inner diaphragm 122 is lined inside the first shell 121, and the first input port and the first output port are connected through the first inner diaphragm 122. The first input port is connected to the first input pipe 131, and the first output port is connected to the first output pipe 132.
[0071] The properties and advantages of the above structure can be referred to the corresponding contents of the aforementioned embodiments.
[0072] In this embodiment, the first end ( Figure 4 The upper end (as shown in FIG. 1 ) is sleeved with a first blunt tube head 141 , and the first blunt tube head 141 is used to directly push and release the first inner diaphragm 122 .
[0073] The photoresist ejection system provided in this embodiment also includes a second photoresist pump (not marked), the second photoresist pump has a second outer shell 181 and a second inner diaphragm 182, the second outer shell 181 has a second input port (not shown), a second output port (not shown) and a second side opening (not shown), the second inner diaphragm 182 is lined inside the second outer shell 181, and the second input port and the second output port are connected by the second inner diaphragm 182.
[0074] Similarly, the second shell 181 and the second inner diaphragm 182 are configured so that the photoresist liquid passing through this pipeline will only flow through the cavity pipeline inside the second inner diaphragm 182, and will not flow through the space between the second shell 181 and the second inner diaphragm 182 of the second photoresist pump.
[0075] Moreover, in this embodiment, the second end of the lifting screw 140 is used to push and release the second inner diaphragm 182 through the second side opening. The second end of the lifting screw 140 can also act on the second inner diaphragm 182 in a direct or indirect manner, which can be combined with the action of the first end of the lifting screw 140 on the first inner diaphragm 122. Specifically, the second end of the lifting screw 140 is sleeved with a second blunt tube head 144, and the second blunt tube head 144 is used to directly push and release the second inner diaphragm 182.
[0076] In this embodiment, after the first photoresist pump and the corresponding pipeline are provided, the second photoresist pump and the corresponding pipeline are provided at the same time, so that for the entire photoresist ejection system, one lifting screw 140 can be used to provide power for two photoresist ejection pipelines at the same time, thereby achieving a more efficient work utilization rate. In addition, the lifting screw 140 acts on the corresponding photoresist pump up and down at the same time, which can further improve the stability of the system, making the entire system more stable and having better practical performance.
[0077] Another embodiment of the present invention provides another photoresist ejection system, please refer to Figure 5 .
[0078] The photoresist ejection system of this embodiment also includes the various structures of the aforementioned embodiments, specifically including the stepping motor 100, the encoder 110, the driving wheel 160, the first photoresist pump (not marked), the lifting screw 140, the driven wheel 170 and the transmission belt 150. Among them, the first photoresist pump includes a first shell 121 and a first inner diaphragm 122, the first shell 121 has a first input port (not shown), a first output port (not shown) and a first side opening (not shown), the first inner diaphragm 122 is lined inside the first shell 121, and the first input port and the first output port are connected through the first inner diaphragm 122. The first input port is connected to the first input pipe 131, and the first output port is connected to the first output pipe 132.
[0079] In this embodiment, the first input pipe 131 is provided with a first ball valve 133 and a first pneumatic valve 135 , and the first input pipe 131 is provided with a second ball valve 134 and a second pneumatic valve 136 .
[0080] In this embodiment, there is also a second photoresistance pump (not marked), which has a second outer shell 181 and a second inner diaphragm 182. The second outer shell 181 has a second input port (not shown), a second output port (not shown) and a second side opening (not shown). The second inner diaphragm 182 is lined inside the second outer shell 181, and the second input port and the second output port are connected by the second inner diaphragm 182.
[0081] Furthermore, the second end of the lifting screw 140 of this embodiment is sleeved with a second piston head 145, the second piston head 145 is inserted into the second piston tube 146, the second piston tube 146 has a second liquid inside, and the tube mouth of the second piston tube 146 is connected to the second side opening.
[0082] The second liquid enters or flows out of the second shell 181 by lifting and lowering the lifting screw 140 .
[0083] The second input port of the second photoresistance pump is connected to the second input pipe 191, which is connected to the third pneumatic valve 195 and the third ball valve 193. The second output port of the second photoresistance pump is connected to the second output pipe 192, which is connected to the fourth pneumatic valve 196 and the fourth ball valve 194.
[0084] In the photoresist coating operation, the amount of photoresist liquid that needs to be coated on the chip is very small, only about 0.5 ml. Taking the second photoresist pump as an example, the second photoresist pump needs to control the flow rate very accurately when pumping out the photoresist liquid. Therefore, when the photoresist liquid needs to be taken out from the storage tank (refer to the corresponding content of the above embodiment), the controller (refer to the corresponding content of the above embodiment) can open the third pneumatic valve 195 and close the fourth pneumatic valve 196, and the second inner diaphragm 182 in the second photoresist pump is in a relaxed state to accommodate the photoresist liquid. After the photoresist liquid that passes through the third pneumatic valve 195 reaches the required volume and flows into the second photoresist pump, the controller will close the third pneumatic valve 195. Then, the controller opens the fourth pneumatic valve 196 and simultaneously pushes the second inner diaphragm 182 in the second photoresist pump, so that the photoresist liquid in the second photoresist pump expands and flows out of the second photoresist pump to the fourth pneumatic valve 196 through the delivery pipe. The fourth pneumatic valve 196 then performs the final flow control so that the photoresist liquid flowing to the nozzle can reach the most ideal coating amount, and finally the photoresist liquid is sprayed on the chip (not shown) to complete the coating operation. In the above process, the third ball valve 193 and the second ball valve 194 will automatically open and close at the corresponding time, and the corresponding content of the above embodiment can be referred to. The joint use of the third ball valve 193, the second ball valve 194, the third pneumatic valve 195 and the fourth pneumatic valve 196 further improves the precise control of the flow rate.
[0085] Although the present invention is disclosed as above, the present invention is not limited thereto. Any person skilled in the art can make various changes and modifications without departing from the spirit and scope of the present invention. Therefore, the protection scope of the present invention shall be subject to the scope defined by the claims.
Claims
1. A photoresist ejection system, characterized in that: include: A stepper motor, wherein the stepper motor has a motor shaft; An encoder, the encoder is arranged around the motor shaft; A driving wheel, wherein the driving wheel is sleeved on the motor shaft; A first photoresistance pump, the first photoresistance pump comprises a first outer shell and a first inner diaphragm, the first outer shell comprises a first input port, a first output port and a first side opening, the first inner diaphragm is lined inside the first outer shell, and the first input port and the first output port are connected via the first inner diaphragm; A lifting screw, wherein the first end of the lifting screw is used to push and release the first inner diaphragm through the first side opening; A driven wheel, the driven wheel is sleeved on the lifting screw; A transmission belt, through which the driving wheel drives the driven wheel; The second photoresistance pump is provided with a second outer shell and a second inner diaphragm, the second outer shell has a second input port, a second output port and a second side opening, the second inner diaphragm is lined inside the second outer shell, and the second input port and the second output port are connected by the second inner diaphragm; The second end of the lifting screw is used to push and release the second inner diaphragm through the second side opening.
2. The photoresist ejection system according to claim 1, characterized in that: The first end of the lifting screw is sleeved with a first blunt tube head, and the first blunt tube head is used for directly pushing and releasing the first inner diaphragm.
3. The photoresist ejection system according to claim 1, wherein: The first end of the lifting screw is sleeved with a first piston head, the first piston head is inserted into a first piston tube, the first piston tube contains a first liquid, and the tube mouth of the first piston tube is connected to the first side opening; The first liquid enters or flows out of the first shell by lifting and lowering the lifting screw.
4. The photoresist ejection system according to claim 1, wherein: The first input port of the first photoresistance pump is connected to a first input tube, which is connected to a first pneumatic valve; the first output port of the first photoresistance pump is connected to a first output tube, which is connected to a second pneumatic valve.
5. The photoresist ejection system according to claim 1, wherein: The second end of the lifting screw is sleeved with a second blunt tube head, and the second blunt tube head is used for directly pushing and releasing the second inner diaphragm.
6. The photoresist ejection system according to claim 5, characterized in that: The second end of the lifting screw is sleeved with a second piston head, the second piston head is inserted into a second piston tube, the second piston tube contains a second liquid, and the tube mouth of the second piston tube is connected to the second side opening; The second liquid enters or flows out of the second shell by lifting and lowering the lifting screw.
7. The photoresist ejection system according to claim 5 or 6, characterized in that: The second input port of the second photoresistance pump is connected to a second input pipe, which is connected to a third pneumatic valve; the second output port of the second photoresistance pump is connected to a second output pipe, which is connected to a fourth pneumatic valve.
8. The photoresist ejection system according to claim 1, wherein: The driving wheel rotates at a fixed position, the driven wheel rotates at a fixed position, and the driving wheel and the driven wheel are fixed on the same horizontal plane.
9. The photoresist ejection system according to claim 1, wherein: The radius of the driving wheel is 0.2 to 5 times the radius of the driven wheel.
Citation Information
Patent Citations
Piston-type gas flow standard device
CN102175292A
Photoresist jetting system
CN212596833U
Fluid discharge device and fluid discharge method
JP2001246298A
Liquid draining method for use in preparing thin film and apparatus for preparing thin film
JP2008000718A