Glass coating equipment and planar cathode thereof

Abstract

The present application belongs to the field of glass coating technology, and particularly relates to a glass coating device and a planar cathode thereof, wherein the planar cathode comprises a cathode back plate and at least two planar targets, the cathode back plate has a mounting surface, each planar target is mounted on the mounting surface, each planar target is arranged at intervals, a gap groove is formed between two adjacent planar targets, and the end faces of the two adjacent planar targets facing each other are provided with a first protrusion and a second protrusion, and in a direction perpendicular to the mounting surface, the first protrusion and the second protrusion are arranged up and down, and the sum of the protrusion height of the first protrusion and the protrusion height of the second protrusion is greater than or equal to the groove width of the gap groove. When two adjacent planar targets of the planar cathode are spliced, no gap vertically penetrating from top to bottom will appear, so that the sputtering gas will not erode the cathode back plate through the vertical gap, and the problem of the cathode target back plate being eroded and damaged by long-term sputtering is also solved, which effectively prolongs the life of the planar cathode and improves the quality of the coating product.

Description

Technical Field

[0001] The present application belongs to the technical field of glass coating, and in particular relates to a glass coating device and a planar cathode thereof. Background Art

[0002] Since the 1980s, vacuum magnetron cathode sputtering coating technology has developed rapidly, and the flat cathodes and flat targets in coating equipment have been used more and more widely. When the traditional flat cathode targets are fixed on the cathode back plate and spliced ​​two by two, a splicing gap that runs vertically from top to bottom will appear between the two adjacent flat cathode targets. During the cathode sputtering process, the sputtering gas will directly sputter and erode the cathode back plate through the gap. At the same time, high-voltage discharge will occur during the erosion process. Especially when the target material is about to run out, the erosion discharge will be more serious. Over time, it will cause the cathode back plate to break or form holes, which will lead to vacuum leakage and inability to produce and cathode damage. Therefore, how to reduce the occurrence of this situation, thereby improving product quality and better protecting the cathode is an urgent problem that needs to be solved. Summary of the invention

[0003] The purpose of the present application is to provide a glass coating device and a planar cathode thereof, aiming to solve the technical problem that the cathode back plate in the planar cathode in the prior art is easily corroded and damaged.

[0004] To achieve the above-mentioned purpose, the technical solution adopted in the present application is: a planar cathode, comprising a cathode back plate and at least two planar targets, the cathode back plate having a mounting surface, each of the planar targets being mounted on the mounting surface, each of the planar targets being arranged at intervals, a gap groove being formed between two adjacent planar targets, a first protrusion and a second protrusion being arranged on the end faces opposite to each other of the two adjacent planar targets, the first protrusion and the second protrusion being arranged up and down in a direction perpendicular to the mounting surface, the sum of the protruding height of the first protrusion and the protruding height of the second protrusion being greater than or equal to the groove width of the gap groove.

[0005] Optionally, the first protrusion includes a first horizontal plane and a first inclined plane, the first horizontal plane extending horizontally from the top of the planar target toward the second protrusion; in the direction away from the mounting surface, the first inclined plane extends obliquely from the bottom of the planar target toward the second protrusion until it is connected to the first horizontal plane; the second protrusion includes a second horizontal plane and a second inclined plane, the second horizontal plane extending horizontally from the bottom of the planar target toward the first protrusion; in the direction toward the mounting surface, the second inclined plane extends obliquely from the top of the planar target toward the second protrusion until it is connected to the second horizontal plane.

[0006] Optionally, the first horizontal plane is flush with the top surface of the planar target, and the second horizontal plane is flush with the bottom surface of the planar target.

[0007] Optionally, the angle between the first horizontal plane and the first inclined plane is in the range of 30° to 60°; the angle between the second horizontal plane and the second inclined plane is in the range of 30° to 60°.

[0008] Optionally, the first inclined surface is arranged in parallel with the second inclined surface.

[0009] Optionally, an angle between the first horizontal plane and the first inclined plane is 45°; an angle between the second horizontal plane and the second inclined plane is 45°.

[0010] Optionally, the ends of two adjacent planar targets corresponding to each other are respectively provided with a first step for forming the first protrusion and a second step for forming the second protrusion.

[0011] Optionally, each of the planar targets is provided with a pressure strip, and each of the planar targets has a notch on its edge, and each of the pressure strips includes a fixing portion and a pressing portion connected to the fixing portion, the fixing portion is fixedly mounted on the cathode back plate, and the pressing portion is pressed against each of the notches.

[0012] Optionally, the end surfaces of two adjacent pressure strips that are opposite to each other are respectively a third inclined surface and a fourth inclined surface, and the third inclined surface and the fourth inclined surface are in contact with each other.

[0013] The above one or more technical solutions in the planar cathode provided in the present application have at least one of the following technical effects: the planar cathode, due to the gap groove formed between two adjacent planar targets, and the gap groove is provided with a first protrusion and a second protrusion arranged up and down, and the sum of the protrusion height of the first protrusion and the protrusion height of the second protrusion is greater than or equal to the groove width of the gap groove, that is, the first protrusion and the second protrusion are arranged alternately up and down, and through the shielding of the first protrusion and the second protrusion, no vertical gap running from top to bottom will appear when two adjacent planar targets are spliced, so that the sputtering gas will not corrode the cathode back plate through the vertical gap, and the problem of the cathode target back plate being corroded and damaged by long-term sputtering is solved, which effectively improves the life of the planar cathode, improves the quality of the coating product, improves the equipment operation stability, avoids the occurrence of cathode back plate erosion, discharge between targets and cathode failure, improves the service life of the planar target, and reduces maintenance costs.

[0014] Another technical solution adopted in the present application is: a glass coating device, comprising the above-mentioned planar cathode.

[0015] The glass coating equipment of the present application adopts the above-mentioned planar cathode, so that no vertical gap running from top to bottom will appear when two adjacent planar targets are spliced ​​together, so that the sputtering gas will not corrode the cathode back plate through the vertical gap, and the problem of the cathode target back plate being corroded and damaged by long-term sputtering is solved, which effectively improves the life of the planar cathode, improves the quality of the coating products, improves the operating stability of the equipment, avoids the occurrence of cathode back plate erosion, discharge between targets, and cathode failure, thereby improving the service life of the planar target and reducing maintenance costs. BRIEF DESCRIPTION OF THE DRAWINGS

[0016] In order to more clearly illustrate the technical solutions in the embodiments of the present application, the drawings required for use in the embodiments or the description of the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present application. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying creative labor.

[0017] Figure 1 This is a schematic diagram of the structure of the planar cathode provided in an embodiment of the present application.

[0018] Figure 2 For along Figure 1 Sectional view along line AA.

[0019] Figure 3 For along Figure 1 Sectional view along the midline BB.

[0020] Figure 4 for Figure 1 An exploded view of the planar cathode is shown.

[0021] Figure 5 A longitudinal cross-sectional view of a planar cathode provided in another embodiment of the present application.

[0022] Figure 6 for Figure 1 The distribution of sputtering erosion area on the cross section of the planar cathode is shown.

[0023] Among them, the reference numerals in the figure are:

[0024] 10—cathode back plate 11—mounting surface 20—planar target

[0025] 21 - first protrusion 22 - second protrusion 23 - notch

[0026] 24 - Sputtering erosion area 30 - Bead 31 - Fixing part

[0027] 32 - pressing portion 33 - third inclined surface 34 - fourth inclined surface

[0028] 35 - fastener 40 - gap 211 - first horizontal plane

[0029] 212 - first inclined surface 213 - first step 221 - second horizontal surface

[0030] 222 —second inclined surface 223 —second step 311 —fixing hole. DETAILED DESCRIPTION

[0031] Embodiments of the present application are described in detail below, and examples of the embodiments are shown in the accompanying drawings, wherein the same or similar reference numerals throughout represent the same or similar elements or elements having the same or similar functions. The embodiments described below with reference to the accompanying drawings are exemplary and are intended to be used to explain the present application, and should not be construed as limiting the present application.

[0032] In the description of the present application, it should be understood that the terms "length", "width", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside", etc., indicating the orientation or position relationship, are based on the orientation or position relationship shown in the accompanying drawings, and are only for the convenience of describing the present application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore should not be understood as a limitation on the present application.

[0033] In addition, the terms "first" and "second" are used for descriptive purposes only and should not be understood as indicating or implying relative importance or implicitly indicating the number of the indicated technical features. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of the features. In the description of this application, the meaning of "plurality" is two or more, unless otherwise clearly and specifically defined.

[0034] In this application, unless otherwise clearly specified and limited, the terms "installed", "connected", "connected", "fixed" and the like should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection or an indirect connection through an intermediate medium, it can be the internal connection of two elements or the interaction relationship between two elements. For ordinary technicians in this field, the specific meanings of the above terms in this application can be understood according to specific circumstances.

[0035] like Figures 1 to 6As shown, in one embodiment of the present application, a planar cathode is provided, comprising a cathode back plate 10 and at least two planar targets 20, the cathode back plate 10 having a mounting surface 11, each planar target 20 being mounted on the mounting surface 11, each planar target 20 being arranged at intervals, wherein each planar target 20 is arranged at intervals along the length direction of the cathode back plate 10;

[0036] Further, a gap groove is formed between two adjacent planar targets 20, and the end surfaces of the two adjacent planar targets 20 facing each other are provided with a first protrusion 21 and a second protrusion 22, wherein the first protrusion 21 and the second protrusion 22 extend along the width direction of the planar target 20 and extend from one side of the planar target 20 to the other side, thereby completely blocking the sputtering gas generated by the planar target 20;

[0037] For further information, see Figure 2 and Figure 5 As shown, in the direction perpendicular to the mounting surface 11, the first protrusion 21 and the second protrusion 22 are arranged up and down, and the sum of the protruding height L1 of the first protrusion 21 and the protruding height L2 of the second protrusion 22 is greater than or equal to the groove width L of the gap groove.

[0038] Specifically, the planar cathode of the embodiment of the present application has a gap groove formed between two adjacent planar targets 20, and the gap groove is provided with a first protrusion 21 and a second protrusion 22 arranged up and down, and the sum of the protrusion height L1 of the first protrusion 21 and the protrusion height L2 of the second protrusion 22 is greater than or equal to the groove width L of the gap groove, that is, the first protrusion 21 and the second protrusion 22 are arranged alternately up and down. Through the shielding of the first protrusion 21 and the second protrusion 22, no vertical gap running from top to bottom will appear when two adjacent planar targets 20 are spliced. In this way, the sputtering gas will not corrode the cathode back plate 10 through the vertical gap, and the problem of the cathode target back plate being corroded and damaged by long-term sputtering is solved, which effectively improves the life of the planar cathode, improves the quality of the coating product, improves the stability of equipment operation, avoids the occurrence of erosion of the cathode back plate 10, discharge between targets, and cathode failure, thereby improving the service life of the planar target 20 and reducing maintenance costs.

[0039] Further, see Figure 1 and Figure 4 As shown, the first protrusions 21 can be provided at both ends of the planar target 20, and then the second protrusions 22 corresponding to the planar target 20 adjacent thereto are provided at both ends; or, the second protrusions 22 can be provided at both ends of the planar target 20, and then the first protrusions 21 corresponding to the planar target 20 adjacent thereto are provided at both ends; or, the first protrusions 21 and the second protrusions 22 are provided at both ends of the planar target 20, respectively, so that all the planar targets 20 have the same structure, which is convenient for processing and manufacturing.

[0040] Furthermore, the planar cathode of the embodiment of the present application can be applied to a planar target 20 of any material, has strong operability and applicability, and can be processed once and for all. Specifically, the planar target 20 can be any planar target 20 such as a silver target, a copper target, a nickel-cadmium target, a cadmium target, a graphite target, a niobium target, a gold target, a copper-silver alloy target, an AZO target, a TZO target, an aluminum target, a silicon target, a zirconium target, etc.

[0041] Further, the thickness of the planar target 20 ranges from 10 mm to 30 mm. Specifically, the thickness of the planar target 20 can be 10 mm, 12 mm, 14 mm, 16 mm, 18 mm, 20 mm, 22 mm, 24 mm, 26 mm, 28 mm or 30 mm. The planar target 20 within this thickness range has a good sputtering effect and good quality. If the thickness is set too small, the planar target 20 is consumed quickly and replaced frequently; if the thickness is set too thick, the planar target 20 is too large and inconvenient to replace.

[0042] In another embodiment of the present application, Figure 2 As shown, the first protrusion 21 of the provided planar cathode includes a first horizontal plane 211 and a first inclined plane 212, the first horizontal plane 211 extends horizontally from the top of the planar target 20 toward the second protrusion 22; in the direction away from the mounting surface 11, the first inclined plane 212 extends obliquely from the bottom of the planar target 20 toward the second protrusion 22 until it is connected to the first horizontal plane 211; the second protrusion 22 includes a second horizontal plane 221 and a second inclined plane 222, the second horizontal plane 221 extends horizontally from the bottom of the planar target 20 toward the first protrusion 21; in the direction toward the mounting surface 11, the second inclined plane 222 extends obliquely from the top of the planar target 20 toward the second protrusion 22 until it is connected to the second horizontal plane 221.

[0043] Specifically, the first horizontal plane 211 and the second inclined plane 222 are arranged to form a first protrusion 21, and the second horizontal plane 221 and the second inclined plane 222 are arranged to form a second protrusion 22. This structure is simple and easy to manufacture. In addition, an inclined gap 40 is formed by the first inclined plane 212 and the second inclined plane 222 to prevent the formation of a vertical gap from top to bottom between two adjacent planar targets 20, thereby solving problems such as erosion of the cathode back plate 10, discharge between targets, and cathode failure.

[0044] In another embodiment of the present application, the first horizontal surface 211 of the planar cathode is flush with the top surface of the planar target 20, and the second horizontal surface 221 is flush with the bottom surface of the planar target 20. In this way, during the manufacturing process, the end surface of the planar target 20 can be directly cut into an inclined surface, which has a simpler structure and is more convenient to manufacture.

[0045] In another embodiment of the present application, Figure 2 As shown, the included angle α between the first horizontal plane 211 and the first inclined plane 212 of the planar cathode is in the range of 30° to 60°; the included angle β between the second horizontal plane 221 and the second inclined plane 222 is in the range of 30° to 60°.

[0046] Specifically, the angle α between the first inclined surface 212 and the first horizontal plane 211 can be 30°, 32°, 34°, 36°, 38°, 40°, 42°, 44°, 46°, 48°, 50°, 52°, 54°, 56°, 58° or 60°. The range of the angle α is set reasonably, so that the inclination angle of the gap 40 is reasonable, which can play a good role in blocking the sputtering gas and preventing the cathode back plate 10 from being eroded; at the same time, it can also ensure that the planar target 20 has good structural strength. If the angle α is set too small, the structural strength of the end of the planar target 20 is weak and easy to be damaged; if the angle α is set too large, the inclination angle of the first inclined surface 212 is small, and the sputtering gas can easily erode the back along the gap 40. plate; the angle β between the second inclined surface 222 and the second horizontal plane 221 can be 30°, 32°, 34°, 36°, 38°, 40°, 42°, 44°, 46°, 48°, 50°, 52°, 54°, 56°, 58° or 60°, and the range of the angle β is set reasonably, so that the inclination angle of the gap 40 is reasonable, which can play a good role in blocking the sputtering gas and avoiding the erosion of the cathode back plate 10; at the same time, it can also ensure that the planar target 20 has good structural strength. If the angle β is set too small, the structural strength at the end of the planar target 20 is weak and easy to be damaged; if the angle β is set too large, the inclination angle of the first inclined surface 212 is small, and the sputtering gas can easily erode the back plate along the gap 40.

[0047] In another embodiment of the present application, Figure 2 As shown, the first inclined surface 212 and the second inclined surface 222 of the planar cathode are provided in parallel. Figure 6 From the distribution diagram of the sputtering erosion area 24 on the cross section of the planar cathode shown, it can be seen that after the two adjacent planar targets 20 are installed and spliced, their two adjacent ends are in the form of adjacent angle complementary structures, so that even if the planar target 20 is used up, there will be no vertical gap running through from top to bottom, and the sputtering gas will not cause erosion of the cathode back plate 10 through the vertical gap, thereby improving the operating stability of the equipment and reducing the risk of failure and maintenance costs.

[0048] Preferably, the angle α between the first inclined surface 212 and the first horizontal plane 211 and the angle β between the second inclined surface 222 and the second horizontal plane 221 are both 45°; in this way, the structures at both ends of the two adjacent planar targets 20 are similar, which is convenient for achieving mass production needs; on the other hand, after the two adjacent planar targets 20 are installed and spliced, their adjacent two ends are in a 45° adjacent angle complementary structure, and the structural materials at both ends of the planar targets 20 are stacked the same, so that the planar targets 20 can be fully utilized, thereby improving the service life of the planar targets 20; in addition, the two adjacent ends of the two planar targets 20 are in a 45° adjacent angle complementary structure, so that even if the planar targets 20 are used up, there will be no vertical gaps running through from top to bottom, and the sputtered sputtering gas will not erode the cathode back plate 10 through the vertical gaps, thereby improving the equipment operation stability and reducing the risk of failure and maintenance costs.

[0049] In another embodiment of the present application, Figure 5 As shown, the ends of two adjacent planar targets 20 of the provided planar cathode corresponding to each other are respectively provided with a first step 213 for forming a first protrusion 21 and a second step 223 for forming a second protrusion 22. The first protrusion 21 and the second protrusion 22 are in a stepped shape, so that the sputtering gas needs to cross the first step 213 and the second step 223 to contact the cathode back plate 10, thereby increasing the difficulty of contact between the sputtering gas and the cathode back plate 10, and further, avoiding the sputtering gas from eroding the cathode back plate 10.

[0050] Furthermore, the first step 213 and the second step 223 are arranged relative to each other and form a step gap 40, so as to prevent the sputtering gas from corroding the cathode back plate 10. In addition, the number of steps of the first step 213 and the number of steps of the second step 223 can be one, two or more than three. The more the number of steps, the more complex the bending of the gap 40 is, and the more difficult it is for the sputtering gas to corrode the cathode back plate 10. Other specific numbers can be selected according to actual needs and are not limited here.

[0051] In another embodiment of the present application, Figure 1 , Figure 3 and Figure 4As shown, each planar target 20 of the provided planar cathode is provided with a pressure strip 30, and each planar target 20 has a notch 23 at its edge. Each pressure strip 30 includes a fixing portion 31 and a pressing portion 32 connected to the fixing portion 31. The fixing portion 31 is fixedly mounted on the cathode back plate 10, and the pressing portion 32 is pressed against each notch 23. Specifically, the planar target 20 is placed on the mounting surface 11, and then the pressing portion 32 of the pressure strip 30 is placed in the notch 23. Finally, the fixing portion 31 of the pressure strip 30 is fixedly mounted on the cathode back plate 10, so that the pressing portion 32 presses the planar target 20 against the mounting surface 11, thereby achieving fixed installation of the planar target 20. In this way, there is no need to set a fixed installation component on the planar target 20, and the structure is simple, the installation is convenient, and the planar target 20 can be used to the maximum extent.

[0052] In another embodiment of the present application, Figure 3 As shown, the end faces of the two adjacent beading strips 30 of the provided planar cathode are respectively the third inclined surface 33 and the fourth inclined surface 34, and the third inclined surface 33 and the fourth inclined surface 34 are fitted together. By fitting the third inclined surface 33 and the fourth inclined surface 34 together, there is no gap between the two adjacent beading strips 30, thereby reducing the generation of discharge between the gaps 40 and improving the quality of the coating product; in addition, the third inclined surface 33 and the fourth inclined surface 34 are fitted together, so that the two adjacent beading strips 30 also present an adjacent angle complementary structure, and the adjacent installation and splicing method is the same as that of the planar target 20, which can improve the fixing stability of the planar target 20.

[0053] Furthermore, notches 23 are provided on opposite sides of the planar target 20, and the notches 23 extend along the length direction of the planar target 20, and the two pressure strips 30 are respectively pressed on opposite sides of the planar target 20, thereby achieving fixed locking of the planar target 20, so that the fixation of the planar target 20 is more stable and reliable.

[0054] Furthermore, a fixing hole 311 is provided on the fixing portion 31 of the pressure strip 30 , and the fastener 35 passes through the fixing hole 311 and is locked on the cathode back plate 10 , so that the entire planar cathode structure is firm.

[0055] Preferably, the fastener 35 may be a screw, a bolt or a screw.

[0056] In another embodiment of the present application, a glass coating device is provided, comprising the above-mentioned planar cathode.

[0057] Specifically, the glass coating equipment of the embodiment of the present application adopts the above-mentioned planar cathode, so that no vertical gap running from top to bottom will appear when two adjacent planar targets 20 are spliced, so that the sputtering gas will not corrode the cathode back plate 10 through the vertical gap, and the problem of the cathode target back plate being corroded and damaged by long-term sputtering is solved, which effectively improves the life of the planar cathode, improves the quality of the coating product, improves the operating stability of the equipment, avoids the occurrence of erosion of the cathode back plate 10, discharge between targets, and cathode failure, thereby improving the service life of the planar target 20 and reducing maintenance costs.

[0058] The above description is only a preferred embodiment of the present application and is not intended to limit the present application. Any modifications, equivalent substitutions and improvements made within the spirit and principles of the present application should be included in the protection scope of the present application.

Claims

1. A planar cathode, characterized in that: The invention comprises a cathode back plate and at least two planar targets, wherein the cathode back plate has a mounting surface, each of the planar targets is mounted on the mounting surface, each of the planar targets is arranged at intervals along the length direction of the cathode back plate, a gap groove is formed between two adjacent planar targets, and a first protrusion and a second protrusion are arranged on the end surfaces opposite to each other of the two adjacent planar targets, wherein the first protrusion and the second protrusion are arranged up and down in a direction perpendicular to the mounting surface, and the sum of the protruding height of the first protrusion and the protruding height of the second protrusion is greater than or equal to the groove width of the gap groove; Each of the planar targets is provided with a pressure strip, and each of the edges of the planar targets is provided with a notch, the pressure strip comprises a fixing portion and a pressing portion connected to the fixing portion, the fixing portion is fixedly mounted on the cathode back plate, and the pressing portion is pressed against each of the notches; The end surfaces of two adjacent pressure strips facing each other are respectively a third inclined surface and a fourth inclined surface, the third inclined surface and the fourth inclined surface are in contact with each other, and there is no gap between the two adjacent pressure strips.

2. The planar cathode according to claim 1, characterized in that: The first protrusion includes a first horizontal plane and a first inclined plane, the first horizontal plane horizontally extending from the top of the planar target toward the second protrusion; in a direction facing away from the mounting surface, the first inclined plane obliquely extends from the bottom of the planar target toward the second protrusion until it is connected to the first horizontal plane; The second protrusion includes a second horizontal plane and a second inclined plane, wherein the second horizontal plane extends horizontally from the bottom of the planar target toward the first protrusion; in the direction toward the mounting surface, the second inclined plane extends obliquely from the top of the planar target toward the second protrusion until it connects with the second horizontal plane.

3. The planar cathode according to claim 2, characterized in that: The first horizontal plane is flush with the top surface of the planar target, and the second horizontal plane is flush with the bottom surface of the planar target.

4. The planar cathode according to claim 2, characterized in that: The included angle between the first horizontal plane and the first inclined plane is in the range of 30° to 60°; the included angle between the second horizontal plane and the second inclined plane is in the range of 30° to 60°.

5. The planar cathode according to claim 2, characterized in that: The first inclined surface is arranged in parallel with the second inclined surface.

6. The planar cathode according to claim 2, characterized in that: The included angle between the first horizontal plane and the first inclined plane is 45°; the included angle between the second horizontal plane and the second inclined plane is 45°.

7. The planar cathode according to any one of claims 1 to 6, characterized in that: Ends of two adjacent planar targets corresponding to each other are respectively provided with a first step for forming the first protrusion and a second step for forming the second protrusion.

8. A glass coating device, characterized in that: The invention comprises the planar cathode as described in any one of claims 1 to 7.

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