Dielectric filter dual-station debugging equipment and method

By designing the dielectric filter dual-station debugging equipment and using a combination of laser etching and polishing pens, the problem of low efficiency of existing equipment is solved, efficient automatic debugging is achieved, and the dust blowing and vacuuming components are cleaned to ensure the efficient operation of the equipment.

CN112072262BActive Publication Date: 2025-05-16WUHAN XINHAO INTELLIGENT TECH CO LTD
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Patent Information

Application Number
CN202010926249.0
Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
Filing Date
2020-09-07
Publication Date
2025-05-16
Estimated Expiration
2040-09-07

AI Technical Summary

Technical Problem

The existing dielectric filter debugging equipment is not efficient and it is difficult to meet the needs of 5G communication technology for efficient automated debugging.

Method used

A dielectric filter dual-station debugging device is designed, using a combination of laser etching and grinding components and a grinding pen. The dual-station workbench achieves the grinding and debugging of one filter or two filters at the same time, and is equipped with dust blowing and vacuuming components for cleaning.

Benefits of technology

The debugging efficiency of the dielectric filter is greatly improved, the process is simplified, and the ceramic medium after laser etching is restored to its original color, avoiding the secondary scattered silver layer gasifiers and dust.

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Abstract

The present invention relates to a dual-station debugging device for a dielectric filter, including a workbench, on which a filter fixing tool is provided; a filter delivery mechanism is also provided on the workbench, on which a material tray is placed, and the material tray is used to hold the filter; a first two-axis platform is also provided on the workbench, and the movement dimension of the first two-axis platform is left and right, up and down; a laser etching and polishing assembly is provided on the first two-axis platform, and the laser etching and polishing assembly is located above the filter fixing tool; a second two-axis platform is also provided on the workbench, and the movement dimension of the first two-axis platform is front and back, left and right; a polishing pen and a suction cup are provided on the first two-axis platform, and the polishing pen and the suction cup are connected to the first two-axis platform through a lifting module. The present invention can polish and debug a filter or two filters separately by setting a dual station, which greatly improves the debugging efficiency.
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Description

Technical Field

[0001] The present invention belongs to the technical field of 5G communication filters, and in particular relates to a dual-station debugging device and method for a dielectric filter. Background Art

[0002] Since the beginning of telecommunications, filters have played an important role in circuits and have made continuous progress with the development of communication technology. In the field of modern communication technology, there is almost no branch that is not affected by digital filtering technology. Source coding, channel coding, modulation, multiplexing, data compression, and adaptive channel equalization all widely use digital filters. Especially in applications such as digital communication, network communication, and image communication, it is almost impossible to move forward without filters.

[0003] With the advent of the 5G era, new communication systems require the development of a technology that can extract and detect signals within a specific frequency band. The development of this technology has further accelerated the research and development of filter technology, and new 5G filters are already in intensive production. A filter is a microwave device that limits the operating frequency band of a base station. It is divided into four types: low-pass, high-pass, band-pass, and band-stop filters according to the frequency band of the signal passing through. Each filter has a pre-set frequency range. The frequency selection function of the filter can be used to filter out interference noise or perform spectrum analysis.

[0004] Dielectric filters are designed and manufactured using the characteristics of dielectric ceramic materials such as low loss, high dielectric constant, small frequency temperature coefficient and thermal expansion coefficient, and high power tolerance. Dielectric filters are microwave filters that use dielectric resonant cavities through multi-stage coupling to achieve frequency selection. Dielectric filters have the advantages of miniaturization, low loss, and good temperature characteristics, so they have been widely used in mobile communications and microwave communications systems. They are characterized by low insertion loss, good power resistance, and narrow bandwidth. They are particularly suitable for level-coupled filtering of CT1, CT2, 900MHz, 1.8GHz, 2.4GHz, 5.8GHz, portable phones, car phones, wireless headphones, wireless microphones, radio stations, cordless phones, and integrated transceiver duplexers.

[0005] The surface of the dielectric filter is covered with a silver-plated area with a zero tangential electric field. By polishing the silver-plated area on the filter surface, the filter debugging indicators can be qualified. The use of dielectric filters in 5G filters has become an industry trend. With the widespread use of 5G communication technology, dielectric filters will be mass-produced on a large scale. Faced with industry problems, dielectric filter debugging urgently needs to be automated.

[0006] In this context, our company took the lead in adopting a composite polishing method combining laser polishing and polishing pen polishing, and developed a "Method and Equipment for Composite Polishing and Debugging of Dielectric Filters" (CN111203764A), and also submitted a patent application. The equipment in this application includes a rack, on which are installed: a filter delivery mechanism for supplying dielectric filters to be debugged and storing debugged dielectric filters; a fixed tooling for positioning and fixing dielectric filters to be debugged; an XYZ three-axis platform, on which a filter suction cup is installed, for moving dielectric filters between the filter delivery mechanism and the fixed tooling; a polishing pen polishing mechanism is also installed on the XYZ three-axis platform, for polishing and debugging the side walls of the dielectric filter on the fixed tooling; an XZ two-axis platform, on which a laser polishing assembly is installed, and the laser polishing assembly is used to polish the bottom wall of the dielectric filter on the fixed tooling. The automation of dielectric filter debugging is realized by using a composite method of laser polishing and polishing pen polishing. Although the device has realized automated debugging, it still has the problem of insufficient efficiency, so there is an urgent need to develop a more efficient automated debugging device. Summary of the invention

[0007] The purpose of the present invention is to provide a double-station debugging device for a dielectric filter. By setting the double stations, one filter or two filters can be polished and debugged at the same time, thereby greatly improving the debugging efficiency.

[0008] To achieve the above object, the technical solution adopted by the present invention is:

[0009] A double-station debugging device for a dielectric filter, characterized in that it comprises a workbench 100,

[0010] The workbench 100 is provided with a filter fixing tool 200;

[0011] A filter delivery mechanism 300 is also provided on the front side of the filter fixing tool 200 on the workbench 100. The filter delivery mechanism 300 is used to place a material tray 700, and the material tray 700 is used to hold a filter 800.

[0012] A first two-axis platform 400 is also provided on the workbench 100 at the rear side of the filter fixing fixture 200, and the movement dimensions of the first two-axis platform 400 are left and right and up and down; a laser etching and polishing assembly 600 is provided on the first two-axis platform 400, and the laser etching and polishing assembly 600 is located above the filter fixing fixture 200;

[0013] The workbench 100 is also provided with a second two-axis platform 500 , and the movement dimensions of the first two-axis platform 400 are front, back, left and right; the first two-axis platform 400 is provided with a polishing pen 503 and a suction cup, and the polishing pen 503 and the suction cup are connected to the first two-axis platform 400 through a lifting module 502 .

[0014] Furthermore, the filter fixing tool 200 includes a tool support 210 , and two filter fixing mechanisms 220 are arranged on the tool support 210 .

[0015] Furthermore, the filter fixing mechanism 220 includes a positioning plate 221 installed on the tooling support 210, and the positioning plate 221 is provided with a groove matching the shape of the filter 800 for placing the filter 800; an articulated bracket 222 is installed on each of the front and rear sides of the positioning plate 221, and a first cylinder 224 is provided on the outer side of the articulated bracket 222; a pressing plate 223 is hinged on the articulated bracket 222, and the middle part of the pressing plate 223 is hinged to the articulated bracket 222 through a rotating shaft 225; one end of the pressing plate 223 is used to press the edge of the filter 800, and the other end is rotatably connected to the movable end of the first cylinder 224.

[0016] Furthermore, a dust blowing and suction mechanism matching the filter fixing mechanism 220 is installed on the tooling support 210, and the dust blowing and suction mechanism includes a dust blowing component 230 and a dust suction component 240; the dust blowing component 230 is used to blow air toward the filter 800 on the filter fixing mechanism 220, and the dust suction component 240 is used to suck air toward the filter 800 on the filter fixing mechanism 220.

[0017] Furthermore, the dust blowing assembly 230 includes a flat nozzle 231 and a bamboo tube 232. The bamboo tube 232 is installed on the tooling support 210. Both ends of the bamboo tube 232 are respectively connected to the flat nozzle 231 and the blowing device.

[0018] Furthermore, the dust suction assembly 240 includes a flat-mouth dust suction pipe 241, one end of which faces the filter 800 on the filter fixing mechanism 220, and the other end is connected to the suction device through a pipeline.

[0019] The dust suction assembly 240 also includes a translation mechanism, which includes a slider 242 and a second cylinder 243, and the flat-mouth dust suction tube 241 is installed on the slider 242; the slider 242 is slidably connected to the tooling support 210 through a slide rail, and the sliding direction is left and right; the second cylinder 243 is fixedly installed on the tooling support 210, connected to the slider 242, and is used to drive the slider 242 to slide left and right.

[0020] Furthermore, two lifting modules 502 are arranged side by side on the left and right sides of the moving part 501 of the first two-axis platform 400, and the two lifting modules 502 are respectively provided with a grinding pen 503 and a suction cup.

[0021] Furthermore, three lifting modules 502 are arranged side by side on the moving part 501 of the first two-axis platform 400, a polishing pen 503 is arranged on the lifting module 502 in the middle, and a first suction cup 504 and a second suction cup 505 are respectively arranged on the lifting modules 502 on both sides.

[0022] A debugging method for a dielectric filter dual-station debugging device, characterized by comprising the following steps:

[0023] S1. Loading

[0024] The suction cup sucks the filter 800 on the material tray 700 through the second two-axis platform 500, and then places it on the filter fixing mechanism 220 for fixing;

[0025] S2. Polishing

[0026] The grinding pen 503 and the laser etching and grinding assembly 600 simultaneously grind and debug the side walls and bottom walls of different holes on a filter 800 until the grinding and debugging of the side walls and bottom walls of all holes on the filter 800 are completed, and then the next filter 800 is switched for grinding and debugging;

[0027] or

[0028] First, the grinding pen 503 performs grinding and debugging on the side walls of the holes on one filter 800, and the laser etching and grinding assembly 600 also performs grinding and debugging on the bottom walls of the holes on the other filter 800; then, the grinding pen 503 and the laser etching and grinding assembly 600 exchange positions to perform corresponding grinding and debugging, until the grinding and debugging of the side walls and bottom walls of all the holes on the above two filters 800 are completed, and then the next batch of two filters 800 are switched for grinding and debugging;

[0029] S2, unloading

[0030] The suction cup sucks the polished and debugged filter 800 on the filter fixing mechanism 220 through the second two-axis platform 500, and then puts it back into the material tray 700.

[0031] Furthermore, in step S2, the dust blowing assembly 230 blows high-speed gas toward the filter to blow away the silver layer vaporized products and grinding dust, while the dust suction assembly 240 extracts the silver layer vaporized products and grinding dust.

[0032] The beneficial effects of the present invention are:

[0033] 1. The present invention provides a method of debugging a 5G dielectric filter by combining laser etching debugging and grinding pen debugging; a double-station workbench is adopted, and the laser head and the grinding pen can debug the filters on two workbenches at the same time, and the two methods can be used for a filter at the same time; the debugging method can be switched left and right.

[0034] 2. The second two-axis platform is equipped with a suction cup for picking up and placing filters. The debugged filter can be taken out from the filter fixture and then immediately placed in the filter to be adjusted, thus simplifying the process.

[0035] 3. During the laser etching debugging and the grinding pen grinding debugging, the present invention uses a dust blowing component to blow high-speed gas to the filter. When the laser etches the silver layer on the surface of the medium at high temperature, the silver layer will be vaporized, and the grinding pen will also produce dust during grinding. The high-speed gas will quickly blow the silver layer vaporized product and dust away from the filter, so that the silver layer vaporized product will not adhere to the filter surface after condensation to form black attachments. After adding air blowing cleaning, it can effectively ensure that the original color of the ceramic medium is restored after laser etching. While blowing, a dust suction component is added next to the tooling to remove the blown silver layer vaporized product and dust to avoid secondary scattering in the filter tooling and equipment. BRIEF DESCRIPTION OF THE DRAWINGS

[0036] Figure 1 It is the overall schematic diagram of the dual-station debugging equipment for dielectric filters.

[0037] Figure 2 yes Figure 1 A magnified schematic diagram of part A in FIG.

[0038] Figure 3 This is a three-dimensional diagram of the filter fixing tooling Figure 1 .

[0039] Figure 4 This is a three-dimensional diagram of the filter fixing tooling Figure 2 .

[0040] Figure 5 is a schematic diagram of the filter fixing mechanism.

[0041] In the figure: 100-workbench, 200-filter fixing tooling, 210-tooling support, 220-filter fixing mechanism, 221-positioning plate, 222-articulated bracket, 223-pressing plate, 224-first cylinder, 225-rotating shaft, 226-pin shaft, 227-waist-shaped hole, 230-dust blowing assembly, 231-flat nozzle, 232-bamboo tube, 240-dust suction assembly, 241-flat nozzle dust suction pipe, 242-slider, 243-second cylinder, 300-filter delivery mechanism, 400-first two-axis platform, 500-second two-axis platform, 501-moving part, 502-lifting module, 503-polishing pen, 504-first suction cup, 505-second suction cup, 600-laser etching and polishing assembly, 700-material tray, 800-filter. DETAILED DESCRIPTION

[0042] In order to better understand the present invention, the technical solution of the present invention is further described below in conjunction with embodiments.

[0043] Embodiment 1

[0044] like Figure 1 As shown, a dual-station debugging device for a dielectric filter includes a workbench 100.

[0045] like Figure 3 As shown, a filter fixing tool 200 is disposed on the workbench 100 , and the filter fixing tool 200 includes a tool support 210 , and two filter fixing mechanisms 220 are arranged on the left and right of the tool support 210 .

[0046] like Figure 3 , 4 As shown in Figure 5, the filter fixing mechanism 220 includes a positioning plate 221 installed on the tooling support 210, and the positioning plate 221 is provided with a groove matching the shape of the filter 800 for placing the filter 800; an articulated bracket 222 is installed on the front and rear sides of the positioning plate 221, and a first cylinder 224 is provided on the outer side of the articulated bracket 222; a pressing plate 223 is hinged on the articulated bracket 222, and the middle part of the pressing plate 223 is hinged to the articulated bracket 222 through a rotating shaft 225; one end of the pressing plate 223 is used to press the edge of the filter 800, and the other end is rotatably connected to the movable end of the first cylinder 224 (the other end is provided with a waist-shaped hole 227, and the movable end of the first cylinder 224 is provided with a pin 226, forming a rotating connection structure in which the pin 226 is inserted into the waist-shaped hole 227).

[0047] Two sets of blowing and dust suction mechanisms are installed on the tooling support 210, and the blowing and dust suction mechanisms include a dust blowing component 230 and a dust suction component 240; the dust blowing component 230 is used to blow air toward the filter 800 on the filter fixing mechanism 220, and the dust suction component 240 is used to suck air toward the filter 800 on the filter fixing mechanism 220.

[0048] The dust blowing assembly 230 includes a flat nozzle 231 and a bamboo tube 232. The bamboo tube 232 is installed on the tooling support 210. Both ends of the bamboo tube 232 are connected to the flat nozzle 231 and the blowing device respectively.

[0049] The dust suction assembly 240 includes a flat-mouth dust suction pipe 241, one end of which faces the filter 800 on the filter fixing mechanism 220, and the other end is connected to the suction device through a pipeline. The dust suction assembly 240 also includes a translation mechanism, which includes a slider 242 and a second cylinder 243. The flat-mouth dust suction pipe 241 is installed on the slider 242; the slider 242 is slidably connected to the tooling support 210 through a slide rail, and the sliding direction is left and right sliding; the second cylinder 243 is fixedly installed on the tooling support 210, connected to the slider 242, and is used to drive the slider 242 to slide left and right.

[0050] like Figure 1 , 2 As shown, two sets of filter delivery mechanisms 300 (i.e., conveying platforms) are further provided on the front side of the filter fixing tool 200 on the workbench 100 . The filter delivery mechanisms 300 are used to place material trays 700 , and the material trays 700 are used to hold filters 800 .

[0051] like Figure 1 As shown, a first two-axis platform 400 (XZ two-axis platform) is also provided on the rear side of the filter fixing tool 200 on the workbench 100, and the movement dimensions of the first two-axis platform 400 are left and right, up and down (that is, within a vertical plane); a laser etching and polishing assembly 600 is provided on the first two-axis platform 400, and the laser etching and polishing assembly 600 is located above the filter fixing tool 200.

[0052] like Figure 1 As shown, the workbench 100 is further provided with a second two-axis platform 500 (XZ two-axis platform), and the movement dimension of the first two-axis platform 400 is front, back, left, and right (i.e., in the horizontal plane); the first two-axis platform 400 is provided with a grinding pen 503 and a suction cup, and the grinding pen 503 and the suction cup are connected to the first two-axis platform 400 through a lifting module 502. Two lifting modules 502 are arranged side by side on the moving part 501 of the first two-axis platform 400, and the two lifting modules 502 are respectively provided with a grinding pen 503 and a suction cup.

[0053] The debugging method of the dielectric filter double-station debugging device in this embodiment includes the following steps:

[0054] S1. Loading: The suction cup sucks the filter 800 on the material tray 700 through the second two-axis platform 500, and places it on two filter fixing mechanisms 220 in sequence for fixing.

[0055] S2. Polishing: The polishing pen 503 and the laser etching polishing assembly 600 polish and debug the side walls and bottom walls of different holes on a filter 800 at the same time, until the polishing and debugging of the side walls and bottom walls of all holes on the filter 800 are completed, and then the next filter 800 is switched for polishing and debugging.

[0056] or

[0057] First, the grinding pen 503 grinds and debugs the side walls of the holes on one filter 800, and at the same time, the laser etching and grinding component 600 grinds and debugs the bottom walls of the holes on another filter 800; then, the grinding pen 503 and the laser etching and grinding component 600 exchange positions to perform corresponding grinding and debugging, until the grinding and debugging of the side walls and bottom walls of all holes on the above two filters 800 are completed, and then the next batch of two filters 800 are switched for grinding and debugging.

[0058] During the polishing process, the dust blowing assembly 230 blows high-speed gas toward the filter to blow away the silver layer vaporization and polishing dust, while the dust suction assembly 240 sucks away the silver layer vaporization and polishing dust. The position of the flat-mouthed dust suction pipe 241 can also be adjusted by the translation mechanism so that the port of the flat-mouthed dust suction pipe 241 always maintains a certain distance from the polished hole on the filter 800 to ensure the dust suction effect. For example, when polishing the rightmost hole of the filter 800, the translation mechanism adjusts the port position of the flat-mouthed dust suction pipe 241 to the middle of the filter 800. When gradually polishing the holes on the left and right sides, the position of the flat-mouthed dust suction pipe 241 also moves to the left synchronously.

[0059] S2, unloading: After finishing the polishing and debugging, the suction cup sucks the polished and debugged filters 800 one by one on the two filter fixing mechanisms 220 through the second two-axis platform 500, and puts them back into the material tray 700.

[0060] Principles and beneficial effects:

[0061] (1) The present invention provides a method for debugging a 5G dielectric filter by combining laser etching debugging and grinding pen grinding debugging; a double-station workbench is used, and the laser head and the grinding pen can debug the filters on two workbenches at the same time, or a filter can be debugged by the two methods at the same time; the debugging method can be switched left and right.

[0062] (2) The present invention uses a dust blowing component to blow high-speed gas to the filter while debugging laser etching and debugging with a polishing pen. When the laser etches the silver layer on the surface of the medium at high temperature, the silver layer will be vaporized, and the polishing pen will also produce dust during polishing. The high-speed gas will quickly blow the silver layer vapor and dust away from the filter, so that the silver layer vapor will not adhere to the filter surface after condensation to form black attachments. After adding air blowing and cleaning, it can effectively ensure that the original color of the ceramic medium is restored after laser etching. While blowing, a dust suction component is added next to the tooling to remove the blown silver layer vapor and dust to avoid secondary scattering in the filter tooling and equipment. In the process of dust suction by the dust suction component, the slider and the second cylinder are used to drive the flat-mouthed dust suction tube to move horizontally, so that the flat-mouthed dust suction tube can move to the best dust suction position on the filter to ensure the dust suction effect.

[0063] Embodiment 2

[0064] This embodiment is a variation of the first embodiment. The main difference from the first embodiment is that three lifting modules 502 are arranged side by side on the moving part 501 of the first two-axis platform 400, a polishing pen 503 is arranged on the lifting module 502 in the middle, and a first suction cup 504 and a second suction cup 505 are respectively arranged on the lifting modules 502 on both sides.

[0065] The first suction cup 504 and the second suction cup 505 respectively complete the functions of taking and placing the filter 800. The first suction cup 504 can be used to take the debugged filter 800 from the filter fixing mechanism 220, and then the filter to be debugged 800 can be immediately placed in through the second suction cup 505; while the first suction cup 504 places the debugged filter 800 into the material tray 700, the second suction cup 505 will also suck a piece of polished filter 800 in the material tray 700 for standby use; through the above processes, the work flow can be simplified and the efficiency of the equipment can be improved.

[0066] The above description is only an application embodiment of the present invention, and certainly cannot be used to limit the scope of rights of the present invention. Therefore, equivalent changes made according to the scope of the patent application of the present invention still fall within the protection scope of the present invention.

Claims

1. A dual-station debugging device for dielectric filters, characterized in that: Includes workbench (100), The workbench (100) is provided with a filter fixing tool (200); A filter delivery mechanism (300) is also provided on the front side of the filter fixing tool (200) on the workbench (100); a material tray (700) is placed on the filter delivery mechanism (300); and the material tray (700) is used to hold filters (800); A first two-axis platform (400) is also provided on the workbench (100) at the rear side of the filter fixing tool (200), and the movement dimensions of the first two-axis platform (400) are left-right and up-down; a laser etching and polishing assembly (600) is provided on the first two-axis platform (400), and the laser etching and polishing assembly (600) is located above the filter fixing tool (200); The workbench (100) is also provided with a second two-axis platform (500), and the movement dimensions of the first two-axis platform (400) are front, back, left, and right; the first two-axis platform (400) is provided with a grinding pen (503) and a suction cup, and the grinding pen (503) and the suction cup are both connected to the first two-axis platform (400) via a lifting module (502); The debugging method of the debugging device comprises the following steps: S1. Loading The suction cup sucks the filter (800) on the material tray (700) through the second two-axis platform (500), and then places it on the filter fixing mechanism (220) for fixing; S2. Polishing The grinding pen (503) and the laser etching grinding assembly (600) simultaneously grind and debug the side walls and bottom walls of different holes on a filter (800) until the grinding and debugging of the side walls and bottom walls of all holes on the filter (800) are completed, and then the next filter (800) is switched for grinding and debugging; or First, the grinding pen (503) performs grinding and debugging on the side walls of the holes on one filter (800), and at the same time, the laser etching and grinding assembly (600) performs grinding and debugging on the bottom walls of the holes on the other filter (800); then, the grinding pen (503) and the laser etching and grinding assembly (600) are exchanged to perform corresponding grinding and debugging, until the grinding and debugging of the side walls and bottom walls of all the holes on the two filters (800) is completed, and then the next batch of two filters (800) are switched for grinding and debugging; S2, unloading The suction cup sucks the polished and debugged filter (800) on the filter fixing mechanism (220) through the second two-axis platform (500), and then puts it back into the material tray (700).

2. The dielectric filter double-station debugging equipment according to claim 1 is characterized in that: The filter fixing tool (200) comprises a tool support (210), and two filter fixing mechanisms (220) arranged on the left and right are provided on the tool support (210).

3. The dielectric filter double-station debugging equipment according to claim 2 is characterized in that: The filter fixing mechanism (220) comprises a positioning plate (221) mounted on a tooling support (210), the positioning plate (221) being provided with a groove matching the shape of the filter (800) for placing the filter (800); a hinged bracket (222) is respectively mounted on the front and rear sides of the positioning plate (221), and a first cylinder (224) is disposed on the outer side of the hinged bracket (222); a pressing plate (223) is hingedly connected to the hinged bracket (222), and the middle part of the pressing plate (223) is hingedly connected to the hinged bracket (222) via a rotating shaft (225); one end of the pressing plate (223) is used to press the edge of the filter (800), and the other end is rotatably connected to the movable end of the first cylinder (224).

4. The dielectric filter double-station debugging equipment according to claim 2 is characterized in that: A dust blowing and suction mechanism matching the filter fixing mechanism (220) is installed on the tooling support (210), the dust blowing and suction mechanism comprising a dust blowing component (230) and a dust suction component (240); the dust blowing component (230) is used to blow air toward the filter (800) on the filter fixing mechanism (220), and the dust suction component (240) is used to suck air toward the filter (800) on the filter fixing mechanism (220).

5. The dielectric filter double-station debugging equipment according to claim 4 is characterized in that: The dust blowing assembly (230) comprises a flat nozzle (231) and a bamboo tube (232); the bamboo tube (232) is mounted on a tooling support (210); and two ends of the bamboo tube (232) are respectively connected to the flat nozzle (231) and the air blowing device.

6. The dielectric filter double-station debugging device according to claim 4 or 5, characterized in that: The dust suction component (240) comprises a flat-mouth dust suction pipe (241), one end of which faces the filter (800) on the filter fixing mechanism (220), and the other end of which is connected to the suction device via a pipeline; the dust suction component (240) further comprises a translation mechanism, the translation mechanism comprising a slider (242) and a second cylinder (243), the flat-mouth dust suction pipe (241) being mounted on the slider (242); the slider (242) is slidably connected to the tooling support (210) via a slide rail, and the sliding direction is left-right sliding; the second cylinder (243) is fixedly mounted on the tooling support (210), connected to the slider (242), and used to drive the slider (242) to slide left-right.

7. The dielectric filter double-station debugging equipment according to claim 1 is characterized in that: Two lifting modules (502) are arranged side by side on the left and right sides of the moving part (501) of the first two-axis platform (400), and the two lifting modules (502) are respectively provided with a grinding pen (503) and a suction cup.

8. The dielectric filter double-station debugging equipment according to claim 1 is characterized in that: The moving part (501) of the first two-axis platform (400) is provided with three lifting modules (502) arranged side by side on the left and right sides, the lifting module (502) located in the middle is provided with a polishing pen (503), and the lifting modules (502) located on the sides are respectively provided with a first suction cup (504) and a second suction cup (505).

9. The dielectric filter double-station debugging equipment according to claim 1, characterized in that: In step S2, the dust blowing component (230) blows high-speed gas toward the filter to blow away the silver layer vaporized products and grinding dust, while the dust suction component (240) extracts the silver layer vaporized products and grinding dust.

Citation Information

Patent Citations

  • Dual-channel filter automatic debugging device

    CN110690540A

  • Dielectric filter composite grinding debugging method and equipment

    CN111203764A

  • Dielectric filter double-station debugging equipment

    CN212991285U