Combined Electrochemical Deposition-Electrolytic Machining Method Based on Mask Electric Field Confinement

A combined processing and electrochemical technology, applied in the field of combined electrochemical deposition and electrolytic processing based on mask electric field constraints, can solve problems such as poor surface quality, and achieve the effect of protecting equipment, improving processing efficiency, and avoiding high-level corrosion.

CN112170994BActive Publication Date: 2021-12-28NANJING TECH UNIV
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
Publication Date
2021-12-28

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Abstract

The invention provides a combined electrochemical deposition-electrolytic processing method based on mask electric field constraints, the method includes making an array hole corresponding to the structure of the mask plate on the film on the surface of the workpiece; connecting the fixture with an external power supply to make the tool electrode as an anode , connect the transmission roller to an external power supply and use the workpiece as a cathode for microstructure electrochemical deposition; when the power deposition working time is over, connect the fixture to an external power supply to make the tool electrode as a cathode, and connect the transmission roller to an external power supply to make the workpiece as an anode for electrolytic finishing. Remove the redundant metal deposited on the surface of the workpiece; when the working time of the electrolysis of the power supply is over, take out the workpiece, place the workpiece in absolute ethanol, and use ultrasonic cleaning to clean the film on the surface of the workpiece. The invention combines electrochemical deposition and electrolytic finishing for processing, removes redundant metal layers on the surface after electrochemical deposition, ensures the processing accuracy of the electrodeposited microstructure, and meets the processing requirements of various tiny parts.
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Description

technical field

[0001] The invention relates to the technical field of special processing, in particular to a mask-based electric field-constrained electrochemical deposition-electrolysis combined processing method. Background technique

[0002] With the rapid development of science and technology, miniaturized and miniaturized equipment and tiny-sized parts are increasingly used in aerospace, national defense, advanced medical equipment and other fields. These tiny parts can reach micron-level feature scales, complex shapes and structures, High forming precision, small surface roughness, no micro-cracks and internal stress, and special surface properties are required in acid-base, high temperature, high pressure and other occasions, so traditional additive manufacturing methods are difficult to meet processing requirements.

[0003] In recent years, special processing methods for micro-sized parts have been greatly developed, such as EDM deposition, chemical vapor depositio...

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Embodiment Construction

[0046] In order to make the above objects, features and advantages of the present invention more comprehensible, the present invention will be further described in detail below in conjunction with the accompanying drawings and specific embodiments.

[0047] The embodiment of the present invention discloses a combined electrochemical deposition-electrolysis processing method based on mask electric field constraints. This method is applied to the surface of micro-sized parts of various miniaturized and miniaturized equipment in the fields of aerospace, national defense and military industry, and advanced medical equipment. Microstructure processing, the surface microstructure of such tiny parts has complex shape and structure, high forming precision, small surface roughness, no microcracks and internal stress, and special surface is required in acid-base, high temperature, high pressure and other occasions. Performance, traditional processing methods cannot meet this requirement,...