Display device and manufacturing method, electronic equipment

By adjusting the distance and angle between the light emitting element and the color film layer in a silicon-based OLED display device, ensuring that the color bias angle is greater than the preset angle, solving the color bias and color mixing problems at a large viewing angle, and achieving high PPI and high brightness Display effect.

CN112714968BActive Publication Date: 2025-01-10BOE TECHNOLOGY GROUP CO LTD
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Patent Information

Application Number
CN201980001508.4
Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
Filing Date
2019-08-27
Publication Date
2025-01-10
Estimated Expiration
2040-05-11

AI Technical Summary

Technical Problem

Silicon-based OLED display devices are prone to color shifts and color mixing under large viewing angles, which affects the display quality. Under high PPI requirements, the small interval between adjacent pixels leads to serious color chain problems.

Method used

Design a display device, including a substrate, a light emitting element arranged in an array, and a color film layer. By adjusting the distance and angle between the light emitting element and the color film layer, ensure that the color bias angle is greater than the preset angle, thereby avoiding color bias. For color mixing, a multi-layer structure such as 2 series structure is adopted to improve brightness.

Benefits of technology

While high PPI, avoid color shift problems caused by large viewing angles, improve display quality, solve the color mixing problem at large viewing angles, and achieve high brightness and high resolution display.

✦ Generated by Eureka AI based on patent content.

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Abstract

A display device, an electronic device, and a method for preparing the display device. The display device includes a substrate; a plurality of light-emitting elements arranged in an array, the plurality of light-emitting elements including a first light-emitting element and a second light-emitting element; and a color filter layer; in a direction perpendicular to the substrate, a first distance is provided between the plurality of light-emitting elements and the color filter layer, and the display device has an anti-color deviation viewing angle on a reference plane determined by the first direction and a second direction perpendicular to the surface of the substrate; the anti-color deviation viewing angle is the angle between a line connecting the side of the first light-emitting element close to the second light-emitting element and the side of the color filter unit corresponding to the second light-emitting element close to the first light-emitting element in a cross section along the reference plane and a direction perpendicular to the substrate, and the first distance is configured so that the anti-color deviation viewing angle is greater than a preset angle. The display device can avoid the color deviation problem generated at a larger viewing angle while having a high PPI, thereby improving the display quality of the display device and the user experience.
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Description

Technical Field

[0001] Embodiments of the present disclosure relate to a display device, an electronic device, and a method for manufacturing the display device. Background Art

[0002] Micro-OLED (Micro Organic Light-Emitting Diode) display is a new type of OLED display with silicon substrate as substrate, also known as silicon-based organic light-emitting diode (silicon-based OLED) display. Silicon-based OLED display has the advantages of small size and high resolution. It is manufactured using mature CMOS integrated circuit technology, can realize active addressing of pixels, and can prepare various functional circuits including TCON (timing control) circuit, over current protection (OCP) circuit, etc. on silicon-based substrate, which can achieve lightweight. Summary of the invention

[0003] At least one embodiment of the present disclosure provides a display device, comprising: a substrate, a plurality of light-emitting elements arranged in an array, and a color filter layer. The substrate comprises a display area and a peripheral area surrounding the display area; a plurality of light-emitting elements arranged in an array are located on the substrate, the plurality of light-emitting elements comprising a first light-emitting element and a second light-emitting element adjacent to the first light-emitting element in a first direction parallel to the surface of the substrate; the color filter layer is located on the substrate, comprising a plurality of color filter units, wherein in the display area, the plurality of color filter units are arranged one-to-one with the plurality of light-emitting elements on a side of the plurality of light-emitting elements away from the substrate; in a direction perpendicular to the substrate, the plurality of light-emitting elements and the color filter layer have a first distance between them, and the display device has an anti-color deviation viewing angle on a reference plane determined by the first direction and a second direction perpendicular to the surface of the substrate; the anti-color deviation viewing angle is the angle between a line connecting the side of the first light-emitting element close to the second light-emitting element and the side of the color filter unit corresponding to the second light-emitting element close to the first light-emitting element in a cross section along the reference plane and a direction perpendicular to the substrate, and the first distance is configured so that the anti-color deviation viewing angle is greater than a preset angle.

[0004] For example, the display device provided by at least one embodiment of the present disclosure also includes an anti-color cast distance on a reference plane determined by the first direction and a second direction perpendicular to the surface of the substrate, and the anti-color cast distance is, in a cross-section along the reference plane, the minimum distance between an edge of a projection of a light-emitting area of ​​the first light-emitting element on the color film layer and a color film unit corresponding to the second light-emitting element.

[0005] For example, in the display device provided in at least one embodiment of the present disclosure, the anti-color shift distance is 0.1 micrometer to 15 micrometers.

[0006] For example, in the display device provided in at least one embodiment of the present disclosure, the first distance between the plurality of light-emitting elements and the color filter layer is 0.02 micrometers to 15 micrometers.

[0007] For example, in the display device provided in at least one embodiment of the present disclosure, the preset angle is 30° to 80°.

[0008] For example, in the display device provided in at least one embodiment of the present disclosure, the preset angle is 40° to 50°.

[0009] For example, in the display device provided in at least one embodiment of the present disclosure, the first distance between the plurality of light-emitting elements and the color filter layer, the anti-color shift viewing angle, and the anti-color shift distance satisfy the following relationship:

[0010] H=D / tanθ

[0011] Wherein, H represents the first distance, θ represents the anti-color cast viewing angle, and D represents the anti-color cast distance.

[0012] For example, in the display device provided by at least one embodiment of the present disclosure, each of the multiple light-emitting elements includes: a first electrode layer, arranged on the substrate; an organic light-emitting layer, arranged on a side of the first electrode layer away from the substrate; a second electrode layer, arranged on a side of the organic light-emitting layer away from the first electrode layer; a first distance between each of the multiple light-emitting elements and the color film layer is a distance between a surface of the second electrode layer away from the substrate and a surface of a color film unit of the corresponding color film layer facing the substrate; the anti-color bias angle is an angle between a line connecting a side of the second electrode layer of the first light-emitting element close to the second light-emitting element and a side of the color film unit corresponding to the second light-emitting element close to the first light-emitting element in a cross section along the reference plane and a direction perpendicular to the substrate.

[0013] For example, in the display device provided by at least one embodiment of the present disclosure, the plurality of light-emitting elements further include: a hole injection layer, a hole transport layer, an electron injection layer and an electron transport layer. The hole injection layer is arranged between the organic light-emitting layer and the first electrode layer; the hole transport layer is arranged between the hole injection layer and the organic light-emitting layer; the electron injection layer is arranged between the organic light-emitting layer and the second electrode layer; and the electron transport layer is arranged between the electron injection layer and the organic light-emitting layer.

[0014] For example, the display device provided by at least one embodiment of the present disclosure further includes a black matrix arranged between adjacent color film units.

[0015] For example, in the display device provided by at least one embodiment of the present disclosure, the anti-color shift distance is equal to the width of the black matrix in the first direction.

[0016] For example, in the display device provided by at least one embodiment of the present disclosure, the width of the black matrix in the first direction is equal to the distance between adjacent light-emitting elements in the first direction.

[0017] For example, in the display device provided by at least one embodiment of the present disclosure, any two adjacent color filter units partially overlap, and the black matrix is ​​the overlapping portion of any two adjacent color filter units.

[0018] For example, in the display device provided by at least one embodiment of the present disclosure, the projections of the plurality of color filter units on the plane where the substrate is located are continuous and non-overlapping in the first direction.

[0019] For example, in the display device provided by at least one embodiment of the present disclosure, the anti-color shift distance is equal to half of the distance between adjacent light-emitting elements in the first direction.

[0020] For example, in the display device provided in at least one embodiment of the present disclosure, the substrate is a silicon-based substrate, and the silicon-based substrate includes a pixel circuit connected to the first electrode layer of the light-emitting element through a tungsten material filled in a via located on the substrate, and the pixel circuit is configured to drive the first electrode layers of the multiple light-emitting elements respectively.

[0021] For example, in the display device provided in at least one embodiment of the present disclosure, the light-emitting element is configured to emit white light, and the light-emitting element includes a plurality of light-emitting layers stacked in sequence from the substrate, and each light-emitting layer emits light of a different primary color; or, the light-emitting element includes a light-emitting layer, and the light-emitting layer is doped with a plurality of dopants for emitting light of different primary colors.

[0022] For example, the display device provided by at least one embodiment of the present disclosure further includes: a first thin-film encapsulation layer, disposed between the plurality of light-emitting elements and the color filter layer, and the first distance includes a thickness of the first thin-film encapsulation layer.

[0023] For example, in the display device provided by at least one embodiment of the present disclosure, the first distance is equal to the thickness of the first thin-film encapsulation layer.

[0024] For example, the display device provided by at least one embodiment of the present disclosure further includes: a light coupling output layer, arranged between the first thin-film encapsulation layer and the plurality of light-emitting elements, and the first distance includes the thickness of the first thin-film encapsulation layer and the light coupling output layer.

[0025] For example, in the display device provided by at least one embodiment of the present disclosure, the first distance is equal to the thickness of the first thin-film encapsulation layer and the light coupling-out layer.

[0026] For example, the display device provided by at least one embodiment of the present disclosure further includes: a second thin-film encapsulation layer, which is disposed on a side of the color filter layer away from the substrate.

[0027] For example, in the display device provided in at least one embodiment of the present disclosure, the first thin-film encapsulation layer includes: a first inorganic encapsulation layer, on the side of the light-emitting element away from the substrate; a second inorganic encapsulation layer, on the side of the first inorganic encapsulation layer away from the substrate; a first organic encapsulation layer, on the side of the second inorganic encapsulation layer away from the substrate, the refractive index of the first inorganic encapsulation layer is greater than the refractive index of the second inorganic encapsulation layer, and the refractive index of the second inorganic encapsulation layer is

[0028] For example, in the display device provided by at least one embodiment of the present disclosure, the second thin-film encapsulation layer includes: a second organic encapsulation layer, on the side of the color filter layer away from the substrate; a third inorganic encapsulation layer, on the side of the second organic encapsulation layer away from the substrate, the refractive index of the first organic encapsulation layer and the refractive index of the second organic encapsulation layer are substantially the same, and the refractive index of the second organic encapsulation layer is greater than the refractive index of the third inorganic encapsulation layer.

[0029] For example, in the display device provided by at least one embodiment of the present disclosure, the array includes a plurality of rows and a plurality of columns, and the first direction is a row direction or a column direction.

[0030] At least one embodiment of the present disclosure further provides an electronic device, comprising the display device provided by any embodiment of the present disclosure.

[0031] For example, in the electronic device provided in any embodiment of the present disclosure, the display device is a virtual reality device or an augmented reality device.

[0032] At least one embodiment of the present disclosure also provides a method for preparing a display device, comprising: providing a substrate; forming a plurality of light-emitting elements arranged in an array on the substrate, wherein the plurality of light-emitting elements include a first light-emitting element and a second light-emitting element adjacent to the first light-emitting element in a first direction parallel to the surface of the substrate; forming a color film layer on a side of the plurality of light-emitting elements away from the substrate, wherein the color film layer includes a plurality of color film units corresponding to the plurality of light-emitting elements one by one; in a direction perpendicular to the substrate, a first distance is provided between the plurality of light-emitting elements and the color film layer, and the display device has an anti-color deviation viewing angle on a reference plane determined by the first direction and a second direction perpendicular to the surface of the substrate; the anti-color deviation viewing angle is an angle between a line connecting a side of the first light-emitting element close to the second light-emitting element and a side of a color film unit corresponding to the second light-emitting element close to the first light-emitting element in a cross section along the reference plane and a direction perpendicular to the substrate, and the first distance is configured so that the anti-color deviation viewing angle is greater than a preset angle.

[0033] For example, in the method for preparing a display device provided in at least one embodiment of the present disclosure, the display device also includes: an anti-color cast distance on a reference plane determined by the first direction and a second direction perpendicular to the surface of the substrate, the anti-color cast distance being, in a cross section along the reference plane, the minimum distance between an edge of a projection of a light-emitting area of ​​the first light-emitting element on the color film layer and a color film unit corresponding to the second light-emitting element.

[0034] For example, in the method for manufacturing a display device provided in at least one embodiment of the present disclosure, the anti-color shift distance is 0.1 micrometers to 15 micrometers.

[0035] For example, in the method for manufacturing a display device provided in at least one embodiment of the present disclosure, a first distance between the plurality of light-emitting elements and the color filter layer is 0.02 micrometers to 15 micrometers.

[0036] For example, in the method for preparing a display device provided in at least one embodiment of the present disclosure, the anti-color shift viewing angle is 30° to 80°.

[0037] For example, in the method for manufacturing a display device provided in at least one embodiment of the present disclosure, the preset angle is 40° to 50°.

[0038] For example, in the method for manufacturing a display device provided in at least one embodiment of the present disclosure, the first distance between the plurality of light-emitting elements and the color filter layer, the anti-color shift viewing angle, and the anti-color shift distance satisfy the following relationship:

[0039] H=D / tanθ

[0040] Wherein, H represents the first distance, θ represents the anti-color cast viewing angle, and D represents the anti-color cast distance.

[0041] For example, in the preparation method of the display device provided in at least one embodiment of the present disclosure, a plurality of light-emitting elements arranged in an array are formed on the substrate, including: forming a first electrode layer on the substrate; forming a hole injection layer between the first electrode layer and the color filter layer; forming a hole transport layer between the hole injection layer and the color filter layer; forming an organic light-emitting layer between the hole injection layer and the color filter layer; forming an electron transport layer between the organic light-emitting layer and the color filter layer; forming an electron injection layer between the electron transport layer and the color filter layer; forming a second electrode layer between the electron injection layer and the color filter layer; a first distance between the plurality of light-emitting elements and the color filter layer is the distance between the surface of the second electrode layer away from the substrate and the surface of the color filter layer facing the substrate; the vertex of the anti-color bias viewing angle is on the surface of the second electrode layer away from the substrate.

[0042] For example, the method for preparing a display device provided in at least one embodiment of the present disclosure further includes: forming a black matrix between adjacent color film units; the anti-color deviation distance is equal to the width of the black matrix in the first direction, and the width of the black matrix in the first direction is equal to the distance between adjacent light-emitting elements in the first direction.

[0043] For example, in the method for preparing a display device provided in at least one embodiment of the present disclosure, the substrate is a silicon-based substrate, and the preparation method further includes: forming a pixel circuit in the silicon-based substrate, and the pixel circuit is configured to drive the multiple light-emitting elements respectively.

[0044] For example, the method for preparing a display device provided in at least one embodiment of the present disclosure further includes: forming a first thin film encapsulation layer between the multiple light-emitting elements and the color film layer; forming a light coupling output layer between the first thin film encapsulation layer and the multiple light-emitting elements; and forming a second thin film encapsulation layer on a side of the color film layer away from the substrate. BRIEF DESCRIPTION OF THE DRAWINGS

[0045] In order to more clearly illustrate the technical solutions of the embodiments of the present disclosure, the drawings of the embodiments will be briefly introduced below. Obviously, the drawings in the following description only relate to some embodiments of the present disclosure, but are not intended to limit the present disclosure.

[0046] Figure 1A A cross-sectional schematic diagram of a display device provided by at least one embodiment of the present disclosure;

[0047] Figure 1B A cross-sectional schematic diagram of another display device provided by at least one embodiment of the present disclosure;

[0048] Figure 1C A schematic plan view of a display device provided by at least one embodiment of the present disclosure;

[0049] Figure 1D A cross-sectional schematic diagram of another display device provided for at least one embodiment of the present disclosure;

[0050] Figure 2A A schematic diagram of a color mixing principle of an example of a display device provided in at least one embodiment of the present disclosure;

[0051] Figure 2B A schematic diagram of a color mixing principle of another example of a display device provided in at least one embodiment of the present disclosure;

[0052] Figure 3 A cross-sectional schematic diagram of another display device provided by at least one embodiment of the present disclosure;

[0053] Figure 4A A cross-sectional schematic diagram of another display device provided by at least one embodiment of the present disclosure;

[0054] Figure 4B A cross-sectional schematic diagram of another display device provided for at least one embodiment of the present disclosure;

[0055] Figure 4C A cross-sectional schematic diagram of another display device provided by at least one embodiment of the present disclosure;

[0056] Figure 5 A partial cross-sectional schematic diagram of a display device provided by at least one embodiment of the present disclosure;

[0057] Figure 6 A schematic diagram of a circuit principle of a display device provided by at least one embodiment of the present disclosure;

[0058] Figure 7 A circuit diagram of a specific implementation example of a voltage control circuit and a pixel circuit of a display device provided by at least one embodiment of the present disclosure;

[0059] Figure 8 A schematic diagram of an electronic device provided for at least one embodiment of the present disclosure; and

[0060] Fig. 9 A flowchart of a method for preparing a display device provided in at least one embodiment of the present disclosure. DETAILED DESCRIPTION

[0061] In order to make the purpose, technical solution and advantages of the embodiments of the present disclosure clearer, the technical solution of the embodiments of the present disclosure will be clearly and completely described below in conjunction with the drawings of the embodiments of the present disclosure. Obviously, the described embodiments are part of the embodiments of the present disclosure, not all of the embodiments. Based on the described embodiments of the present disclosure, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present disclosure.

[0062] Unless otherwise defined, the technical terms or scientific terms used in the present disclosure should be understood by people with ordinary skills in the field to which the present disclosure belongs. The "first", "second" and similar words used in the present disclosure do not indicate any order, quantity or importance, but are only used to distinguish different components. Similarly, similar words such as "one", "one" or "the" do not indicate quantity restrictions, but indicate that there is at least one. Similar words such as "include" or "comprise" mean that the elements or objects appearing before the word cover the elements or objects listed after the word and their equivalents, without excluding other elements or objects. Similar words such as "connect" or "connected" are not limited to physical or mechanical connections, but can include electrical connections, whether direct or indirect. "Up", "down", "left", "right" and the like are only used to indicate relative positional relationships. When the absolute position of the described object changes, the relative positional relationship may also change accordingly.

[0063] Since silicon-based OLED display devices have the advantages of small size, high resolution, ultra-high PPI (pixels per inch) display, and can be used in a relatively wide temperature range, they are widely used in near-eye display fields such as virtual reality (VR) or augmented reality (AR). However, due to the ultra-high PPI of silicon-based OLED display devices, color deviation and color mixing are prone to occur at large viewing angles, affecting display quality. Therefore, how to solve the color deviation or color mixing at large viewing angles has become the main problem currently faced.

[0064] The inventors also noticed in their research that when designing a high-brightness display device, a 2-tandem structure or a strong microcavity structure is an effective means to increase the brightness of a silicon-based OLED display device. However, due to the need to achieve ultra-high PPI display, the interval between adjacent pixels in a silicon-based OLED display device is very small, and a strong microcavity effect structure or a 2-tandem structure will produce relatively serious cross-color problems, which is an issue that urgently needs attention for silicon-based OLED displays.

[0065] In view of the above problems, at least one embodiment of the present disclosure provides a display device, which includes a substrate, a plurality of light-emitting elements arranged in an array, and a color filter layer. A substrate, comprising a display area and a peripheral area surrounding the display area; a plurality of light-emitting elements arranged in an array, located on the substrate, the plurality of light-emitting elements comprising a first light-emitting element and a second light-emitting element adjacent to the first light-emitting element in a first direction parallel to the surface of the substrate; a color film layer, located on the substrate, comprising a plurality of color film units, wherein in the display area, the plurality of color film units are arranged one-to-one with the plurality of light-emitting elements on a side of the plurality of light-emitting elements away from the substrate; in a direction perpendicular to the substrate, a first distance is provided between the plurality of light-emitting elements and the color film layer, and the display device has an anti-color deviation viewing angle on a reference plane determined by the first direction and a second direction perpendicular to the surface of the substrate; the anti-color deviation viewing angle is the angle between a line connecting a side of the first light-emitting element close to the second light-emitting element and a side of a color film unit corresponding to the second light-emitting element close to the first light-emitting element in a cross section along the reference plane and a direction perpendicular to the substrate, the anti-color deviation distance is the distance between a projection of the first light-emitting element on the color film layer and a color film unit corresponding to the second light-emitting element in a cross section along the reference plane, and the first distance is configured so that the anti-color deviation viewing angle is greater than a preset angle.

[0066] Some embodiments of the present disclosure also provide an electronic device corresponding to the above-mentioned display device and a method for preparing the display device.

[0067] The display device provided by the above-mentioned embodiments of the present disclosure can avoid the color shift problem generated at a larger viewing angle while having a high PPI, thereby improving the display quality of the display device.

[0068] The embodiments and examples of the present disclosure are described in detail below with reference to the accompanying drawings.

[0069] At least one embodiment of the present disclosure provides a display device. For example, the display device is a silicon-based OLED display device, which can be used in a virtual reality device or an augmented display device. Of course, it can also be other types of display devices, and the embodiments of the present disclosure are not limited to this.

[0070] Figure 1A is a cross-sectional schematic diagram of a display device provided by at least one embodiment of the present disclosure, Figure 2A A schematic diagram of the color mixing principle of a display device provided in at least one embodiment of the present disclosure. Figure 1A and Figure 2A A display device provided by at least one embodiment of the present disclosure is introduced in detail.

[0071] like Figure 1A and Figure 2A As shown, the display device 1 includes a substrate 11 , a plurality of light emitting elements 410 arranged in an array, and a color filter layer 17 .

[0072] For example, the substrate 11 is a silicon-based substrate substrate, such as a silicon-based substrate substrate (OLED silicon-based substrate substrate) for an organic light emitting diode (OELD) display device. For example, the substrate 11 plays a supporting and protective role, and the substrate 11 can be a single crystal silicon-based substrate substrate or a silicon-on-insulator (SOI) substrate substrate. For example, the substrate 11 may also include any applicable components such as a thin film encapsulation layer, a light extraction layer, and a cover plate disposed thereon to achieve a display function. For example, any applicable circuit components such as a gate drive circuit, a data drive circuit, and a pixel circuit (not shown in the figure) are integrated on the substrate 11. These circuit components are prepared, for example, by a silicon semiconductor process (such as a CMOS process), and the embodiments of the present disclosure are not limited to this. For example, the pixel circuit is connected to the light emitting element through a tungsten material filled in a via hole located on the substrate, and is configured to drive a plurality of light emitting elements to emit light respectively. For example, the pixel circuit is connected to the first electrode layer of the light emitting element and is configured to drive the first electrode layer of the light emitting element. For example, the pixel circuit may be a conventional 2T1C or 4T1C pixel circuit, or may be a pixel circuit having functions such as internal compensation or external compensation, and the embodiments of the present disclosure are not limited thereto. For example, the gate drive circuit (not shown in the figure) is used to generate a gate drive signal, and the data drive circuit (not shown in the figure) is used to generate a data signal. The gate drive circuit and the data drive circuit may adopt conventional circuit structures in the art, and the embodiments of the present disclosure are not limited thereto.

[0073] For example, Figure 1C As shown, the substrate 11 includes a display area 70 and a peripheral area 12 surrounding the display area 70 .

[0074] For example, Figure 1A As shown, a plurality of light emitting elements 410 arranged in an array are located on the substrate 11. For example, Figure 1A As shown, the plurality of light-emitting elements 410 include a first light-emitting element 411 and a second light-emitting element 412 adjacent to the first light-emitting element 411 in a first direction X parallel to the surface of the substrate. For example, the first direction X is a row direction or a column direction, or a diagonal direction, and the embodiments of the present disclosure are not limited to this, including the anti-color bias viewing angles θ in different reference planes with different first directions can be the same or different from each other. Considering that the display device is mostly used in the horizontal direction relative to the ground in the row direction, the present application is mainly described with the first direction X as the row direction.

[0075] For example, Figure 1A or Figure 2AAs shown, the color filter layer 17 includes a plurality of color filter units, for example, a red color filter unit R, a green color filter unit G, and a blue color filter unit B. For example, in the display area, the plurality of color filter units correspond to the plurality of light emitting elements 410 and are disposed on a side of the plurality of light emitting elements 410 away from the substrate 11 in a one-to-one correspondence.

[0076] For example, Figure 1A As shown, the display device further includes a first thin film encapsulation layer 16, and a color film layer 17 is disposed on the first thin film encapsulation layer 16 and corresponding to the organic light emitting layer 14, so as to realize a colored display of the emitted light. Of course, the embodiments of the present disclosure are not limited thereto, and the color film layer 17 may also include color film units of other colors, such as white, yellow, etc.

[0077] For example, Figure 2A As shown, in the direction Y perpendicular to the substrate 11, a first distance H exists between the plurality of light-emitting elements 410 and the color filter layer 17. For example, the display device 1 has an anti-color shift viewing angle θ and an anti-color shift distance D on a reference plane determined by the first direction X and the second direction Y perpendicular to the surface of the substrate 11. For example, the anti-color shift viewing angle θ is a distance between a line L1 connecting the side of the first light-emitting element 411 close to the second light-emitting element 412 and the side of the color filter unit B corresponding to the second light-emitting element 412 close to the first light-emitting element 411 and the direction Y perpendicular to the substrate (i.e., Figure 2A For example, the anti-color shift distance D is the minimum distance between the edge of the projection of the light-emitting area of ​​the first light-emitting element 411 on the color filter layer (for example, the edge of the projection on the green color filter unit G) and the color filter unit B corresponding to the second light-emitting element 412 in the cross section along the reference plane.

[0078] For example, the first distance H is configured to make the anti-color shift viewing angle θ greater than a preset angle, so that the color shift problem generated at a larger viewing angle can be avoided while having a high PPI, thereby improving the display quality of the display device.

[0079] For example, the first distance H between the plurality of light-emitting elements 410 and the color film layer 17 is 0.02 microns to 15 microns, the anti-color deviation distance D is 0.1 microns to 15 microns, and the preset angle is 30° to 80°. For example, in some examples, the preset angle is 40° to 50°. For another example, the first distance H between the plurality of light-emitting elements 410 and the color film layer 17 is 0.5 microns to 5 microns, the anti-color deviation distance D is 0.3 microns to 1 micron, and the anti-color deviation viewing angle is 30.96° to 63.4°. For example, in some examples, when the anti-color deviation distance D is determined to be 0.1 microns according to the needs of the aperture ratio, etc., and the anti-color deviation viewing angle is increased to about 78° as needed, the first distance H can be reduced to 0.02 microns to ensure that the display device does not have mixed colors at the anti-color deviation viewing angle (for example, if the first distance H is higher than 0.02 microns, color mixing will occur), so that the above-mentioned anti-color deviation viewing angle can be achieved to solve the color mixing problem of the display device under large viewing angle applications. The embodiments of the present disclosure are not limited to this.

[0080] For example, in at least one embodiment of the present disclosure, Figure 2A As shown, the first distance between the plurality of light-emitting elements and the color filter layer, the anti-color shift viewing angle, and the anti-color shift distance satisfy the following relationship:

[0081] H=D / tanθ (1)

[0082] Wherein, H represents the first distance, θ represents the anti-color cast viewing angle, and D represents the anti-color cast distance.

[0083] For example, after determining the anti-color shift viewing angle θ and the anti-color shift distance D, the first distance H between the plurality of light-emitting elements and the color film layer can be determined by the above formula (1), so that at the first distance H, the light emitted by the first light-emitting element 411 will not pass through the color film unit B corresponding to the second light-emitting element 412 at a specific anti-color shift viewing angle, but only pass through the color film unit G corresponding to the first light-emitting element 411, that is, at this viewing angle, the display device 1, for example, only displays green, but not blue, thereby effectively solving the color shift problem, avoiding color mixing at this viewing angle, and improving the display quality of the display device. Moreover, under the condition of satisfying a certain aperture ratio, the anti-color shift viewing angle of the display device can be expanded, and the first distance H corresponding to the expanded anti-color shift viewing angle is determined by the above formula (1), which can solve the color shift problem that occurs at a specific anti-color shift viewing angle.

[0084] For example, in some examples, each of the plurality of light-emitting elements 410 includes a first electrode layer 13, an organic light-emitting layer 14, and a second electrode layer 15. For example, the first electrode layer 13 of the light-emitting element 410 is formed on the substrate 11, the organic light-emitting layer 14 is formed on a side of the first electrode layer 13 of the light-emitting element away from the substrate, and the second electrode layer 15 is formed on a side of the organic light-emitting layer 14 away from the first electrode layer 13. For example, in this example, the first distance H between the plurality of light-emitting elements 410 and the color filter layer 17 is the distance between the surface of the second electrode layer 15 away from the substrate 11 (i.e., the upper surface of the second electrode layer 15) and the surface of the color filter unit of the corresponding color filter layer 17 facing the substrate 11 (i.e., the lower surface of the color filter layer 17). For example, in this example, the anti-color deviation angle is the angle between the line connecting the side of the second electrode layer of the first light-emitting element 411 close to the second light-emitting element 412 and the side of the color filter unit corresponding to the second light-emitting element 412 close to the first light-emitting element 411 and the direction perpendicular to the substrate 11 in the cross section along the reference plane, and the vertex of the anti-color deviation angle is on the surface of the second electrode layer 15 away from the substrate 11 (i.e., the upper surface of the second electrode layer 15). That is, Figure 2A and Figure 2B The light emitting element 420 shown is the surface of the second electrode layer 15 away from the substrate 11 (ie, the upper surface of the second electrode layer 15). Figure 2A and Figure 2B The color filter layer 17 shown is the surface of the color filter unit of the color filter layer 17 facing the substrate 11 (ie, the lower surface of the color filter layer 17 ).

[0085] For example, the first electrode layer 13 of the light-emitting element is an anode layer, and the second electrode layer 15 of the light-emitting element is a cathode layer, for example, grounded. For example, the first electrode layer 13 of the light-emitting element can be made of a material including a transparent metal oxide such as indium tin oxide (ITO) or indium zinc oxide (IZO), which has a high light transmittance. For example, the material of the second electrode layer 15 of the light-emitting element is a metal, for example, the metal can be made of materials such as magnesium, magnesium alloy, aluminum or aluminum alloy.

[0086] For example, in some examples, the light-emitting element 410 further includes a multilayer structure composed of one or more film layers of a hole injection layer 21, an electron injection layer 23, a hole transport layer 22, an electron transport layer 24, an electron blocking layer (not shown in the figure), and a hole blocking layer (not shown in the figure). For example, the hole injection layer 21 is arranged between the organic light-emitting layer 14 and the first electrode layer 13; the hole transport layer 22 is arranged between the hole injection layer 21 and the organic light-emitting layer 14; the electron injection layer 23 is arranged between the organic light-emitting layer 14 and the second electrode layer 15; and the electron transport layer 24 is arranged between the electron injection layer 23 and the organic light-emitting layer 14.

[0087] For example, the light-emitting element is an OLED light-emitting element. For example, the multiple light-emitting elements 410 are configured to emit white light. For example, the light-emitting element 410 includes multiple light-emitting layers stacked in sequence from a substrate, each light-emitting layer emits light of a different primary color; or, the light-emitting element includes a light-emitting layer, and the light-emitting layer is doped with multiple dopants for emitting light of different primary colors. For example, the organic light-emitting layer 14 can be a single-layer or multi-layer structure. For example, in some examples, the organic light-emitting layer 14 can include multiple light-emitting layers, for example, the organic light-emitting layer 14 can emit white light by combining the light-emitting layers including multiple light-emitting layers. For example, as Figure 4A As shown, the light-emitting layer combination includes three light-emitting layers REML, GEML and BEML that emit red, green and blue light respectively, and the three light-emitting layers are stacked in sequence relative to the substrate 11, so as to emit white light as a whole, or the light-emitting layer combination includes a light-emitting layer that emits light of one color and a light-emitting layer that emits light of a complementary color to the color, and the two light-emitting layers are stacked in sequence relative to the substrate 11, so as to emit white light as a whole, and the two light-emitting layers include, for example, a light-emitting layer REML that emits red light and a light-emitting layer that emits light of a complementary color to red, and the embodiments of the present disclosure are not limited to this, as long as white light can be achieved. For example, the organic light-emitting layer 14 can be made of an organic material, and under the voltage drive of the first electrode layer 13 and the second electrode layer 15, the light-emitting characteristics of the organic material are used to emit light according to the required grayscale.

[0088] For example, in some examples, such as Figure 1A and Figure 2A As shown, the display device 1 further includes a black matrix BM disposed between adjacent color filter units. Figure 2A In the example shown, the anti-color deviation distance D is equal to the width of the black matrix BM in the first direction X. For example, in this example, the width of the black matrix BM in the first direction X is equal to the distance L between adjacent light-emitting elements in the first direction X, for example, the distance L between the first light-emitting element 411 and the second light-emitting element 412. That is, in this example, the widths of the light-emitting element 410 and the color film unit in the first direction X are equal, and the distances between the light-emitting elements are equal to the distances between the color film units, that is, the first distance D is equal to the distance L between the light-emitting elements. For example, the distance L between the light-emitting elements is determined according to the resolution of the display device and the size of the display panel. The specific determination method can refer to the method in the art, which will not be repeated here. For example, when the resolution is low, the distance L between the light-emitting elements is large, for example, 15 microns. When the resolution is high, the distance L between the light-emitting elements is small, for example, 0.1 microns. For example, the distance L between the light-emitting elements can be determined according to the resolution and the size of the display panel, and the embodiments of the present disclosure are not limited to this.

[0089] For example, in some examples, any two adjacent color filter units partially overlap, and the black matrix is ​​the overlapping portion of any two adjacent color filter units, for example, Figure 2A The figure shows the overlapping part of the red color filter unit R and the blue color filter unit B.

[0090] It should be noted that the width of the black matrix BM in the first direction X may not be equal to the distance L between adjacent light-emitting elements in the first direction X. For example, it may be greater than or less than the distance L between adjacent light-emitting elements in the first direction X. The embodiments of the present disclosure are not limited to this.

[0091] In some examples, the display device 1 may not include a black matrix BM disposed between adjacent color filter units. Since the spacing between the color filter units is greater than or equal to the anti-color shift distance D, a color-shift-free display effect can be achieved within the anti-color shift viewing angle range.

[0092] For example, in other examples, such as Figure 2B As shown, when the display device does not include a black matrix, and when the projections of multiple color film units on the plane where the substrate 11 is located are continuous and non-overlapping in the first direction, the anti-color shift distance D is equal to half of the distance L between adjacent light-emitting elements in the first direction X, that is, L / 2, to meet the anti-color shift viewing angle.

[0093] It should be noted that the anti-color deviation distance D may not be equal to half of the distance L between adjacent light-emitting elements in the first direction X, and may be greater than or less than half of the distance L between adjacent light-emitting elements in the first direction X. The specific distance may be determined according to the length and position of the light-emitting element, the anti-color deviation angle and other specific conditions, and the embodiments of the present disclosure are not limited to this.

[0094] For example, in some examples, such as Figure 1A As shown, the display device 1 further includes: a first thin film encapsulation layer 16 , a light coupling output layer CPU and a second thin film encapsulation layer 18 .

[0095] For example, Figure 1A As shown, the first thin film encapsulation layer 16 is disposed between the plurality of light emitting elements 410 and the color filter layer 17 to protect the light emitting elements and prevent water and oxygen in the outside air from invading. For example, when only the first thin film encapsulation layer 16 is included between the plurality of light emitting elements 410 and the color filter layer 17, the first distance H is the thickness of the first thin film encapsulation layer 16, and thus different first distances H can be achieved by forming the first thin film encapsulation layer 16 to have different thicknesses.

[0096] For example, Figure 4BAs shown, the light coupling output layer (coupling layer, CPL) 20 is disposed between the first thin film encapsulation layer 16 and the plurality of light emitting elements 410, that is, a transparent cathode is used in conjunction with the light coupling output layer to increase the light output. For example, when only the first thin film encapsulation layer 16 and the light coupling output layer 20 are included between the plurality of light emitting elements 410 and the color filter layer 17, the first distance H is the thickness of the first thin film encapsulation layer 16 and the light coupling output layer 20, and thus different first distances H can be achieved by forming the first thin film encapsulation layer 16 and the light coupling output layer 20 to have different thicknesses. The embodiments disclosed herein are not limited to the above-mentioned situations, and other intermediate layers may be formed in addition to the first thin film encapsulation layer 16 and / or the light coupling output layer 20 to achieve different first distances H as needed.

[0097] For example, the second thin film encapsulation layer 18 is disposed on a side of the color filter layer 17 away from the substrate 11 .

[0098] For example, in some examples, such as Figure 1A As shown, the display device 1 further includes a cover plate 19, and the cover plate 19 covers the second thin film encapsulation layer 18. For example, the cover plate 19 is arranged opposite to the substrate 10, and the cover plate 19 is, for example, attached to the second thin film encapsulation layer 18 to protect and improve the strength. For example, the cover plate 19 and the substrate 10 are parallel to each other. For example, the material of the cover plate 19 is a transparent material, and the transparent material can be an inorganic material such as glass or an organic material such as polyimide.

[0099] For example, in some examples, the cover plate 19 may be made of plain glass with high transmittance, which is not limited in the embodiments of the present disclosure.

[0100] For example, Figure 1A As shown, the second thin film encapsulation layer 18 and the cover plate 19 are sequentially arranged on the color filter layer 17, which can realize the function of protecting the color filter layer 17. For example, the first thin film encapsulation layer 16 and the second thin film encapsulation layer 18 are made of one or more organic materials or inorganic materials with good sealing properties, so as to achieve a good sealing effect and protect the light-emitting element 410. For example, either the first thin film encapsulation layer 16 or the second thin film encapsulation layer 18 can be a composite film layer, including one or more organic sub-film layers or inorganic sub-film layers.

[0101] For example, Figure 1BAs shown, in some examples, the first thin film encapsulation layer 16 includes: a first inorganic encapsulation layer 161, on the side of the light emitting device 410 away from the silicon substrate 11; a second inorganic encapsulation layer 162, on the side of the first inorganic encapsulation layer 161 away from the silicon substrate 11; and a first organic encapsulation layer 163, on the side of the second inorganic encapsulation layer 162 away from the silicon substrate 11. For example, the second thin film encapsulation layer 18 includes: a second organic encapsulation layer 181, on the side of the color filter layer 17 away from the silicon substrate 11; and a third inorganic encapsulation layer 182, on the side of the second organic encapsulation layer 181 away from the silicon substrate 11, the refractive index of the first inorganic encapsulation layer 161 is greater than the refractive index of the second inorganic encapsulation layer 162, the refractive index of the second inorganic encapsulation layer 162, the refractive index of the first organic encapsulation layer 163, and the refractive index of the second organic encapsulation layer 181 are substantially the same, and the refractive index of the second organic encapsulation layer 181 is greater than the refractive index of the third inorganic encapsulation layer 182.

[0102] The refractive index of the first inorganic encapsulation layer 161 is greater than the refractive index of the second inorganic encapsulation layer 162, the refractive index of the second inorganic encapsulation layer 162, the refractive index of the first organic encapsulation layer 163 and the refractive index of the second organic encapsulation layer 181 are substantially the same, and the refractive index of the second organic encapsulation layer 181 is greater than the refractive index of the third inorganic encapsulation layer 182.

[0103] For example, the absolute value of the refractive index difference between the first inorganic encapsulation layer 161 and the second inorganic encapsulation layer 162 or the first organic encapsulation layer 163 may be greater than the absolute value of the refractive index difference between the second organic encapsulation layer 181 and the third inorganic encapsulation layer 182. For example, the first inorganic encapsulation layer 161 may be formed of silicon nitride (SiNx) having a refractive index of about 1.85, the second inorganic encapsulation layer 162 may be formed of aluminum oxide having a refractive index of about 1.6, the first organic encapsulation layer 163 and the second organic encapsulation layer 181 may both be formed of polyparaxylene having a refractive index of about 1.6, and the third inorganic encapsulation layer 182 may be formed of silicon oxide having a refractive index of about 1.5, and therefore, the absolute value of the refractive index difference between the first inorganic encapsulation layer 161 and the second inorganic encapsulation layer 162 or the first organic encapsulation layer 163 is 0.25, which is greater than the absolute value of the refractive index difference between the second organic encapsulation layer 181 and the third inorganic encapsulation layer 182, which is 0.1.

[0104] For example, the first inorganic encapsulation layer 161 may include silicon nitride, the second inorganic encapsulation layer 162 may include aluminum oxide, the first organic encapsulation layer 163 and the second organic encapsulation layer 181 each include at least one layer of polyparaxylene molecules, and the third inorganic encapsulation layer 182 includes silicon oxide, however it should be understood that the embodiments of the present disclosure are not limited to this.

[0105] For example, the thickness of the first inorganic encapsulation layer 161 in the plane direction perpendicular to the silicon substrate 11 may be greater than the thickness of the second inorganic encapsulation layer 162 in the plane direction perpendicular to the silicon substrate 11. The thickness of the first organic encapsulation layer 163 in the plane direction perpendicular to the silicon substrate 11 is greater than the thickness of the first inorganic encapsulation layer 161 in the plane direction perpendicular to the silicon substrate 11. The first organic encapsulation layer 163 and the second organic encapsulation layer 181 have substantially the same thickness in the plane direction perpendicular to the silicon substrate 11. The thickness of the second organic encapsulation layer 181 in the plane direction perpendicular to the silicon substrate 11 is greater than the thickness of the third inorganic encapsulation layer 182 in the plane direction perpendicular to the silicon substrate 11. The thickness of the third inorganic encapsulation layer 182 in the plane direction perpendicular to the silicon substrate 11 is greater than the thickness of the second inorganic encapsulation layer 162 in the plane direction perpendicular to the silicon substrate 11 and less than the thickness of the first inorganic encapsulation layer 161 in the plane direction perpendicular to the silicon substrate 11.

[0106] In some examples, the first inorganic encapsulation layer 161 may be formed of silicon nitride (SiNx) having a refractive index of about 1.85 to have a thickness of about 2500 angstroms in a direction perpendicular to the plane of the silicon substrate 11. -3500 Angstrom The second inorganic encapsulation layer 162 may be formed of aluminum oxide having a refractive index of about 1.6 and having a thickness of about 100 angstroms in a direction perpendicular to the plane of the silicon substrate 11. -800 Angstroms The first organic encapsulation layer 163 and the second organic encapsulation layer 181 can be formed of polyparaxylene having a refractive index of 1.6 and having a thickness of about 4000 angstroms in a direction perpendicular to the plane of the silicon substrate 11. -8000 Angstrom The third inorganic encapsulation layer 182 may be formed of silicon oxide having a refractive index of 1.5 to have a thickness of about 900 angstroms in a direction perpendicular to the plane of the silicon substrate 11. -1500 Angstrom For example, the first inorganic encapsulation layer 161 may be formed of silicon nitride (SiNx) having a refractive index of about 1.85 to have a thickness of about 3000 angstroms in a direction perpendicular to the plane of the silicon substrate 11. The second inorganic encapsulation layer 162 may be formed of aluminum oxide having a refractive index of about 1.6 and having a thickness of about 500 angstroms in a direction perpendicular to the plane of the silicon substrate 11. The first organic encapsulation layer 163 and the second organic encapsulation layer 181 can be formed of polyparaxylene having a refractive index of 1.6 and having a thickness of about 5000 angstroms in a direction perpendicular to the plane of the silicon substrate 11. The third inorganic encapsulation layer 182 may be formed of silicon oxide having a refractive index of 1.5 to have a thickness of about 1000 angstroms in a direction perpendicular to the plane of the silicon substrate 11. Thickness.

[0107] The second organic encapsulation layer 181 may be formed by a polymer material, which may be, for example, one of the following: polyparaxylene, acrylic resin, methacrylic resin, polyisoprene, vinyl resin, epoxy resin, urethane resin, cellulose resin, and perylene resin. The thickness of the second organic encapsulation layer 181 may be precisely controlled by adopting the MLD method. The second organic encapsulation layer 181 may include at least one layer of polymer molecules, wherein the polymer is any of the above polymers. For example, when the first organic encapsulation layer 163 is formed by polyparaxylene, the second organic encapsulation layer 181 may include a single layer of polyparaxylene molecules, two layers of polyparaxylene molecules, three layers of polyparaxylene molecules, five layers of polyparaxylene molecules, ten layers of polyparaxylene molecules, and the like. It should be understood that the polymer molecules forming the second organic encapsulation layer 181 may be the same as or different from the polymer molecules forming the first organic encapsulation layer 163, and the embodiments of the present disclosure are not limited thereto. For example, the first organic encapsulation layer 163 formed of polyparaxylene molecules may have a thickness of 100 angstroms. 500 Angstroms 1000 Angstroms 5000 Angstroms Equal thickness.

[0108] Through the MLD method, the thickness of the second organic encapsulation layer 181 can be precisely controlled to achieve The thickness is controlled by the level, thereby reducing the thickness of the encapsulation layer and thus reducing the total device thickness of the display device 1, thereby increasing the viewing angle of the display device 1, compared to other methods such as inkjet printing that usually forms a film layer several microns thick.

[0109] The third inorganic encapsulation layer 182 may be formed by an inorganic material, which may be, for example, at least one of the following: aluminum nitride, silicon nitride (SiNx), silicon oxynitride, silicon oxide, aluminum oxide, diamond-like carbon, etc. The third inorganic encapsulation layer 182 may be formed on the side of the second organic encapsulation layer 181 away from the color filter layer 17 by methods such as chemical vapor deposition (CVD) (such as plasma enhanced chemical vapor deposition (PECVD)), ion plating, atomic layer deposition (ALD), etc. The third inorganic encapsulation layer 182 may have a better effect of preventing oxygen and moisture penetration than the second organic encapsulation layer 181. It should be understood that the polymer molecules forming the third inorganic encapsulation layer 182 may be the same as or different from the polymer molecules forming the first sub-encapsulation layer 103, and the embodiments of the present disclosure are not limited to this. For example, the third inorganic encapsulation layer 182 may be formed of silicon oxide and may have a thickness of 1000 angstroms. Thickness.

[0110] In some embodiments, the refractive index of the second organic encapsulating layer 181 may be greater than that of the third inorganic encapsulating layer 182. For example, the second organic encapsulating layer 181 may be formed of polyparaxylene having a refractive index of 1.6, and the third inorganic encapsulating layer 182 may be formed of silicon oxide having a refractive index of 1.5.

[0111] The color filter layer 17 may include a red sub-color filter unit R, a green sub-color filter unit G, and a blue sub-color filter unit B arranged in an array, however, it should be understood that the embodiments of the present disclosure are not limited to this. For example, the color filter layer 17 is sandwiched between the second thin film encapsulation layer 18 and the first thin film encapsulation layer 16 to release the stress of the second thin film encapsulation layer 18 and the first thin film encapsulation layer 16.

[0112] In some embodiments, the refractive index of the first thin film encapsulation layer 16 can be made greater than the refractive index of the second thin film encapsulation layer 18, so that the refractive index difference between the second thin film encapsulation layer 18 close to the air and the refractive index of the air is small, thereby improving the light emission rate. In an exemplary embodiment, the absolute value of the refractive index difference between the first inorganic encapsulation layer 161 and the first organic encapsulation layer 163 is greater than the absolute value of the refractive index difference between the second organic encapsulation layer 181 and the third inorganic encapsulation layer 182. For example, the first inorganic encapsulation layer 161 may be formed of silicon nitride (SiNx) having a refractive index of 1.85, the first organic encapsulation layer 163 may be formed of polyparaxylene having a refractive index of 1.6, the second organic encapsulation layer 181 may be formed of polyparaxylene having a refractive index of 1.6, and the third inorganic encapsulation layer 182 may be formed of silicon oxide having a refractive index of 1.5, and therefore, the absolute value of the refractive index difference between the first inorganic encapsulation layer 161 and the first organic encapsulation layer 163 is 0.25, which is greater than the absolute value of the refractive index difference between the second organic encapsulation layer 181 and the third inorganic encapsulation layer 182, which is 0.1.

[0113] Figure 4C FIG. 1 is a cross-sectional schematic diagram of a display device provided by another embodiment of the present disclosure. Figure 4C As shown, the display device 1 includes a plurality of hole injection layers 21, hole transport layers 22, electron injection layers 23, electron transport layers 24, and a series layer CGL connecting them in series. For example, between the red light emitting layer REML and the green light emitting layer GEML, the electron transport layer 24, the series layer CGL, the hole injection layer 21, and the hole transport layer 22 are sequentially stacked, so as to form a 2-tandem structure. For example, in the display device, by Figure 2A or Figure 2B The color mixing principle shown in FIG. 1 determines the first distance (i.e. Figure 4CThe thickness of the first thin film encapsulation layer 16 shown in ) can avoid color mixing under a certain anti-color bias viewing angle, so that the display device 1 can not only achieve high-brightness display, but also avoid the color mixing problem caused by the structure.

[0114] For example, Figure 1D FIG. 1 is a partial cross-sectional schematic diagram of a display device provided by an embodiment of the present disclosure. Figure 1D As shown, the display device 1 includes: a first electrode pattern 103, located in the display area 70 of the display substrate, and including a plurality of first electrodes 1030 (for example, anodes 13) spaced apart from each other; a connecting electrode pattern 103a, located in the connecting electrode area 12a of the display device, and including a plurality of connecting electrodes 103a0; and a first dummy electrode pattern de1, located in the first dummy area 121 of the display device, and including a plurality of first dummy electrodes de10.

[0115] like Figure 1C As shown in FIG. 14 , the connection electrode region 12a surrounds the display region 70, and the first dummy region 121 is located between the connection electrode region 12a and the display region 70. The connection electrode pattern 103a surrounds the first electrode pattern 103, and the first dummy electrode pattern de1 surrounds the first electrode pattern 103. The first dummy electrode pattern de1 is located between the connection electrode pattern 103a and the first electrode pattern 103.

[0116] For example, Figure 1D As shown, the display substrate provided by an embodiment of the present disclosure also includes a second electrode 106 (for example, a cathode 15), and the second electrode 106 is connected to the connecting electrode 103a0; the peripheral area 12 of the display device surrounds the display area 70, and the peripheral area 12 includes a connecting electrode area 12a and a first dummy area 121; the second electrode 106 is located in the display area 70 and the peripheral area 12, and the second electrode 106 and the first electrode pattern 103 are spaced apart from each other.

[0117] For example, in the connection electrode region 12a of the display substrate, the projection of the color filter layer on the base substrate (not shown) completely covers the projection of the plurality of connection electrodes 103a0 on the base substrate.

[0118] For example, the orthographic projections of the first electrode pattern 103 and the second electrode 106 on the substrate 11 are located within the orthographic projection of the color filter layer (not shown) on the substrate 11 .

[0119] For example, the pattern density of the first electrode pattern 103, the pattern density of the connecting electrode pattern 103a and the pattern density of the first dummy electrode pattern de1 are the same, and the pattern shape of the first electrode pattern 103, the pattern shape of the connecting electrode pattern 103a and the pattern shape of the first dummy electrode pattern de1 are the same, which makes it easy to make the consumption rate of the etching solution or the developing solution in each area roughly the same during etching or development, so as to ensure the uniformity of the process.

[0120] For example, Figure 1D As shown, the display device further includes a sensor electrode pattern 103b, which is located in the sensor region R1 of the display substrate and includes a plurality of sensor electrodes 103b0. For example, the pattern density of the sensor electrode pattern 103b is the same as the pattern density of the first electrode pattern 103, and the pattern shape of the sensor electrode 103b0 is the same as the pattern shape of the first electrode pattern 103.

[0121] It should be noted that the pixel structure of the sensor area R1 is the same as the pixel structure of the display area 70. In the sensor area R1, the sensor electrode 103b0 is electrically connected to the pixel circuit through the tungsten via V3 and the via V31. The pixel structure of the sensor area R1 is different from the pixel structures of the first dummy sub-area 1211, the second dummy sub-area 1212, and the second dummy area 122. The first dummy electrode pattern de1 of the first dummy sub-area 1211, the first dummy electrode de10 of the second dummy sub-area 1212, and the second dummy electrode pattern de2 of the second dummy area 122 are not connected to other circuits through vias.

[0122] For example, the pixel structure of the sensor region R1 is used to sense the voltage of the first electrode 1030 of the display region 70 and to implement circuit compensation. For example, a compensation transistor can be connected to a temperature sensor to sense the voltage of the first electrode 1030 of the display region 70.

[0123] For example, Figure 1D As shown, the second dummy sub-region 1212 in the first dummy region 121 is used to isolate the sensor region R1 from the display region 70. The first dummy sub-region 1211 in the first dummy region 121 is used for transition so that the second electrode 106 and the connection electrode 103a0 in the connection electrode region 12a are better overlapped.

[0124] For example, Figure 1DAs shown, the display substrate further includes a second dummy electrode pattern de2, which is located in the second dummy area 122 of the display substrate and includes a plurality of second dummy electrodes de20; the second dummy area 122 is located on a side of the connecting electrode area 12a away from the display area 70. For example, the pattern density of the second dummy electrode pattern de2 is the same as the pattern density of the first electrode pattern 103, and the second dummy electrode pattern de2 and the first electrode pattern 103 are separated by the pixel defining layer.

[0125] For example, the first dummy sub-area 1211 of the first dummy area 121 and the second dummy area 122 each have two rows of dummy pixels, for example, two rows on the side in the row direction and two columns on the side in the column direction.

[0126] For example, Figure 1D As shown, the second dummy sub-region 1212 is located between the sensor region R1 and the display area 70; the portion of the first dummy region 121 located between the sensor region R1 and the connecting electrode region 12a is the first dummy sub-region 1211; a first filling layer 104a is formed in the first dummy sub-region 1211, the first filling layer 104a includes a plurality of first dummy electrodes de10 and an insulating wrapping layer 104c, the first electrode pattern 103 includes an edge first electrode 103e adjacent to the connecting electrode 103a0, and the insulating wrapping layer 104c is in contact with the connecting electrode 103a0 and the edge first electrode 103e, respectively, for example, the insulating wrapping layer 104c and the pixel defining layer are made of the same material.

[0127] For example, Figure 1D As shown, the second electrode 106 is in contact with the insulating wrap layer 104c.

[0128] For example, Figure 1D As shown, a first thin film encapsulation layer 16 is further provided on the side of the second electrode 106 away from the substrate 11 . The first thin film encapsulation layer 16 can prevent water and oxygen from entering the light-emitting functional layer 105 .

[0129] For example, Figure 1D As shown, the edge first electrode 103e and the plurality of first dummy electrodes de10 are insulated from each other.

[0130] For example, Figure 1D As shown, the display substrate further includes a pixel definition layer 104 , and the pixel definition layer 104 includes a plurality of pixel definition portions 1040 . Each of the plurality of pixel definition portions 1040 is located between adjacent first electrodes 1030 .

[0131] For example, Figure 1D As shown, the insulating wrapping layer 104c and the pixel definition layer 104 are located in the same layer and can be formed by the same film layer using the same patterning process to save manufacturing processes.

[0132] For example, Figure 1D As shown, the first electrode pattern 103 and the connecting electrode pattern 103a are located in the same layer and can be formed by the same film layer using the same patterning process to save manufacturing processes.

[0133] For example, Figure 1D As shown, the display device further includes a second filling layer 104b, the second filling layer 104b includes at least one second filling portion 104b0, and the second filling portion 104b0 is located between adjacent connecting electrodes 103a0. For example, the second filling layer 104b is an insulating layer. Figure 1D As shown, the second filling portions 104b0 are in contact with adjacent connection electrodes 103a0 respectively.

[0134] For example, Figure 1D As shown, the second filling layer 104b and the first filling layer 104a are located in the same layer and can be formed by the same film layer using the same patterning process to save manufacturing processes.

[0135] For example, Figure 1D As shown, the display device further includes a third filling layer 1043, the third filling layer 1043 includes a plurality of third filling portions 10430, and the third filling portions 10430 are located between adjacent sensor electrodes 103b0, adjacent sensor electrodes 103b0 and at least one of the first dummy electrodes. Figure 1D The following description will be given by taking the case where the third filling portion 10430 is located between adjacent sensor electrodes 103b0 as an example.

[0136] For example, Figure 1D As shown, the third filling layer 1043 and the pixel definition layer 104 are located in the same layer and can be formed by the same film layer using the same patterning process to save manufacturing processes.

[0137] For example, Figure 1D As shown, the display device further includes a light-emitting functional layer 105, the light-emitting functional layer 105 is located between the first electrode pattern 103 and the second electrode 106, and the light-emitting functional layer 105 is in contact with the first filling layer 104a. For example, the light-emitting functional layer 105 is in contact with a portion of the first filling layer 104a. For example, in the display area, the color filter layer (not shown) covers the light-emitting functional layer 105. For example, the light-emitting functional layer 105 includes the above-mentioned organic light-emitting layer and a hole injection layer, an electron injection layer, a hole transport layer, and an electron transport layer.

[0138] For example, Figure 1D As shown, the light emitting functional layer 105 contacts the sensor electrode pattern 103 b and the light emitting functional layer 105 contacts the first dummy electrode located in the second dummy sub-region 1212 .

[0139] like Figure 1DAs shown, an insulating layer IS is also provided on the substrate 11, and a conductive pattern 109 is provided on the insulating layer IS. The conductive pattern 109 includes a first conductive portion 1091, a second conductive portion 1092, and a third conductive portion 1093. The insulating layer IS includes a via hole V11, a via hole V21, and a via hole V31. The via hole V11, the via hole V21, and the via hole V31 are respectively filled with conductive materials to form a connector. The first electrode 1030 is connected to the connector in the via hole V21 through the first conductive portion 1091. The connecting electrode 103a0 is connected to the connector in the via hole V11 through the second conductive portion 1092. The sensor electrode 103b0 is connected to the connector in the via hole V31 through the third conductive portion 1093.

[0140] For example, a portion of the first insulating layer 102 overlapping the plurality of first dummy electrodes de10 in a direction perpendicular to the base substrate 101 is not provided with a via hole.

[0141] For example, a portion of the first insulating layer 102 overlapping the plurality of second dummy electrodes de20 in a direction perpendicular to the base substrate 101 is not provided with a via hole.

[0142] For example, a portion of the first insulating layer 102 overlapping the plurality of connection electrodes 103 a 0 in a direction perpendicular to the base substrate 101 is provided with a via hole V1 .

[0143] For example, a portion of the first insulating layer 102 overlapping the plurality of first electrodes 1030 in a direction perpendicular to the base substrate 101 is provided with a via hole V2 .

[0144] For example, a portion of the first insulating layer 102 overlapping the plurality of sensor electrodes 1030 in a direction perpendicular to the base substrate 101 is provided with a via hole V3 .

[0145] For example, Figure 1D The color filter layer (not shown) extending to the peripheral area 12 is also included. The overlapping portion of adjacent color filter units in the color filter layer can form a frame or peripheral area 12 of the display device. For example, the above formula (1) is applicable to the display area.

[0146] Figure 5 FIG. 1 is a partial cross-sectional schematic diagram of a display device provided in some embodiments of the present disclosure. In addition to showing the structure of the display device 1 in more detail and showing a plurality of sub-pixels, the display device 1 of this embodiment is Figure 1A It should be understood that the display device 1 in this embodiment can be used in conjunction with Figure 1A The display device 1 shown is identical or substantially identical and is not shown in FIG. Figure 1A The detailed structure of the display device 1 is shown in FIG. Of course, the display device 1 in this embodiment can also be used with Figure 1AThe display device 1 shown is different, as long as it can achieve the corresponding function. It should be understood that Figure 1A The display device 1 shown also includes a plurality of sub-pixels, which are not shown in the figure for the sake of simplicity. Figure 1A Sub-pixels are shown in FIG.

[0147] In this embodiment, if Figure 5 As shown, the display device 1 includes a substrate 11 and a light emitting element 410 (i.e., a light emitting element). For example, the substrate 11 includes a pixel circuit 110, and a light reflecting layer 440 and an insulating layer 450 are sequentially stacked between the substrate 11 and the light emitting element 410. The light emitting element 410 includes an anode layer 13 (i.e., a first electrode layer of the light emitting element), an organic light emitting layer 14, and a cathode layer 15 (i.e., a second electrode layer of the light emitting element) sequentially stacked on the insulating layer 450. The anode layer 13 is a transparent electrode layer. For example, the insulating layer 450 is light-transmissive so that the light emitted by the organic light emitting layer 14 penetrates therethrough and reaches the light reflecting layer 440 to be reflected by the light reflecting layer 440.

[0148] For example, the insulating layer 450 includes a via 452 filled with a metal member 451, and the light reflecting layer 440 is electrically connected to the anode layer 13 through the metal member 451. In this way, by forming a conductive path between the light reflecting layer 440 and the anode layer 13 in the insulating layer 450, it is beneficial to transmit the electrical signal provided by the pixel circuit 110 in the substrate 11 to the anode layer 13 through the light reflecting layer 440. In this way, it is not only beneficial to realize the control of the light emitting element 410 by the pixel circuit 110, but also to make the structure of the silicon-based organic light-emitting display panel more compact, which is beneficial to the miniaturization of the device. Further, for example, the metal member 451 is made of a metal material, such as tungsten metal, and the via filled with tungsten metal is also called a tungsten via (W-via). For example, in the case where the thickness of the insulating layer 450 is large, forming a tungsten via in the insulating layer 450 can ensure the stability of the conductive path, and since the process of making the tungsten via is mature, the surface flatness of the obtained insulating layer 450 is good, which is beneficial to reduce the contact resistance between the insulating layer 450 and the anode layer 13. It can be understood that the tungsten via is not only suitable for realizing the electrical connection between the insulating layer 450 and the anode layer 13, but also suitable for the electrical connection between the light reflecting layer 440 and the pixel circuit 110, and other wiring layers, such as the electrical connection between the layers where the electrodes and signal lines of the driving transistor, switching transistor and capacitor in the pixel circuit are located.

[0149] For example, the substrate 11 includes a pixel circuit 110, the pixel circuit 110 is electrically connected to the light reflecting layer 440, and the pixel circuit 110 is used to drive the light emitting element 410 to emit light. The pixel circuit 110 includes at least a driving transistor M0 and a switching transistor (not shown in the figure), and the driving transistor M0 is electrically connected to the light reflecting layer 440. Thus, the electrical signal driving the light emitting element 410 can be transmitted to the anode layer 13 through the light reflecting layer 440, thereby controlling the light emitting element 410 to emit light. For example, the driving transistor M0 includes a gate electrode G, a source electrode S, and a drain electrode D. The source electrode S of the driving transistor M0 is electrically connected to the light reflecting layer 440. When the driving transistor M0 is in an on state and in a saturated state, under the control of the data voltage applied by the gate, the driving current provided by the power line can be transmitted to the anode layer 13 through the source electrode S of the driving transistor M0 and the light reflecting layer 440. Due to the voltage difference between the anode layer 13 and the cathode layer 15, an electric field is formed between the two, and holes and electrons are respectively injected into the organic light-emitting layer 14 and recombine, so that the organic light-emitting layer 14 emits light under the action of the electric field. It can be understood that in the driving transistor M0, the positions of the source electrode S and the drain electrode D can be interchanged, so one of the source electrode S and the drain electrode D and the light reflection layer 440 can be electrically connected to each other.

[0150] For example, the display device 1 includes a plurality of sub-pixels (or pixel units). Figure 5 exemplarily shows three sub-pixels, namely, a red sub-pixel SP1, a green sub-pixel SP2 and a blue sub-pixel SP3. Each sub-pixel corresponds to a sub-pixel region of the display device 1. That is, each sub-pixel is provided with an independent light emitting element 410 and a driving transistor M0.

[0151] For example, the insulating layers 450 in the three sub-pixels are formed as one piece to facilitate manufacturing. Figure 5 As shown, the insulating layer 450 also includes an opening 454 exposing the pad 453. The opening 454 is provided to facilitate electrical connection and signal communication between the pad 453 and an external circuit. For example, the opening 454 exposing the pad 453 is located in the peripheral area 140. The color of the sub-pixel in the display device 1 is only illustrative, and may also include other colors such as yellow, white, etc.

[0152] For example, Figure 5The display device 1 shown also includes a first thin film encapsulation layer 16, a color filter layer 17, and a second thin film encapsulation layer 18 sequentially arranged on the cathode layer 15. The display device 1 also includes a cover plate 19, which is arranged on the second thin film encapsulation layer 18. For example, the first thin film encapsulation layer 16 is located on the side of the cathode layer 15 away from the substrate 11. The color filter layer 17 is located on the side of the first thin film encapsulation layer 16 away from the substrate 11, and includes a red color filter unit R, a green color filter unit G, and a blue color filter unit B. The second thin film encapsulation layer 18 and the cover plate 19 are located on the side of the color filter layer 17 away from the substrate 11. The specific materials of the first thin film encapsulation layer 16, the color filter layer 17, the second thin film encapsulation layer 18, and the cover plate 19 can be conventional materials in the art, which will not be described in detail here.

[0153] For example, in the display device 1 provided in the embodiment of the present disclosure, the light-emitting element 410 including the anode layer 13, the organic light-emitting layer 14 and the cathode layer 15, as well as the first thin-film encapsulation layer 16, the color film layer 17, the second thin-film encapsulation layer 18 and the cover plate 19 can all be manufactured on a separately prepared substrate 11. In addition, in the same process, the insulating layer 450 above the pad 453 can also be etched to expose the pad 453 and enable it to be bound to a flexible printed circuit board (FPC) or wired. Therefore, in the embodiment of the present disclosure, for example, a substrate 11 including a light-reflecting layer 440 and an insulating layer 450 and suitable for forming a light-emitting element 430 can be manufactured by a wafer factory, and then a structure on the substrate 11 is prepared in a display panel factory, which not only reduces the manufacturing difficulty of the light-reflecting layer 440, but also facilitates the subsequent process of the display panel factory.

[0154] Figure 6 A schematic diagram of a circuit principle of a display device provided in some embodiments of the present disclosure. The display device 1 includes a Figure 5The display area 130 (AA area) shown in FIG. 1 shows a plurality of light-emitting elements LE and a pixel circuit 110 coupled to each light-emitting element LE in a one-to-one correspondence, wherein the pixel circuit 110 includes a driving transistor. In addition, the display device 1 may further include a plurality of voltage control circuits 120 located in a peripheral area 140 outside the display area 130 of the display device 1. For example, at least two pixel circuits 110 in a row share a voltage control circuit 120, and the first electrode of the driving transistor in a row of pixel circuits 110 is coupled to the shared voltage control circuit 120, and the second electrode of each driving transistor is coupled to the corresponding light-emitting element LE. The voltage control circuit 120 is configured to output an initialization signal Vinit to the first electrode of the driving transistor in response to a reset control signal RE to control the corresponding light-emitting element LE to reset; and to output a first power supply signal VDD to the first electrode of the driving transistor in response to a light-emitting control signal EM to drive the light-emitting element LE to emit light. By sharing the voltage control circuit 120, the structure of each pixel circuit in the display area 130 can be simplified, and the occupied area of ​​the pixel circuit in the display area 130 can be reduced, so that more pixel circuits and light-emitting elements can be set in the display area 130, and a high PPI organic light-emitting display panel can be realized. In addition, under the control of the reset control signal RE, the voltage control circuit 120 outputs the initialization signal Vinit to the first electrode of the driving transistor to control the corresponding light-emitting element to reset, so as to avoid the influence of the voltage loaded on the light-emitting element when the previous frame is emitted on the light-emitting of the next frame, thereby improving the afterimage phenomenon.

[0155] For example, the display device 1 may also include a plurality of pixel units PX located in the display area 130, each pixel unit PX includes a plurality of sub-pixels; each sub-pixel includes a light emitting element LE and a pixel circuit 110. Further, the pixel unit PX may include three sub-pixels of different colors. The three sub-pixels may be a red sub-pixel, a green sub-pixel, and a blue sub-pixel. Of course, the pixel unit PX may also include four, five or more sub-pixels, which needs to be designed and determined according to the actual application environment and is not limited here.

[0156] For example, the pixel circuits 110 in at least two adjacent sub-pixels in the same row may share a voltage control circuit 120. Figure 6 As shown, all pixel circuits 110 in the same row can share a voltage control circuit 120. Alternatively, in other examples, pixel circuits 110 in two, three or more adjacent sub-pixels in the same row can also share a voltage control circuit 120, which is not limited here. In this way, the occupied area of ​​the pixel circuits in the display area 130 can be reduced by sharing the voltage control circuit 120.

[0157] Figure 7A circuit diagram of a specific implementation example of a voltage control circuit and a pixel circuit of a display device 1 provided for some embodiments of the present disclosure. For example, the driving transistor M0 in the pixel circuit 110 may be an N-type transistor. In addition, the light-emitting element LE may include an OLED. In this way, the positive electrode of the OLED is electrically connected to the second terminal D of the driving transistor M0, and the negative electrode of the OLED is electrically connected to the second power supply terminal VSS. The voltage of the second power supply terminal VSS is generally a negative voltage or a ground voltage VGND (generally 0V), and the voltage of the initialization signal Vinit may also be set to the ground voltage VGND, which is not limited here. For example, the OLED may be set to a Micro-OLED or a Mini-OLED, which is further conducive to realizing an organic light-emitting display panel with a high PPI.

[0158] For example, taking two pixel circuits 110 included in a row as an example, the voltage control circuit 120 may include a first switch transistor M1 and a second switch transistor M2. The gate of the first switch transistor M1 is used to receive the reset control signal RE, the first electrode of the first switch transistor M1 is used to receive the initialization signal Vinit, and the second electrode of the first switch transistor M1 is coupled to the first electrode S of the corresponding drive transistor M0. The gate of the second switch transistor M2 is used to receive the light emitting control signal EM, the first electrode of the second switch transistor M2 is used to receive the first power supply signal VDD, and the second electrode of the second switch transistor M2 is coupled to the first electrode S of the corresponding drive transistor M0.

[0159] For example, the first switch transistor M1 and the second switch transistor M2 may be of different types. For example, the first switch transistor M1 is an N-type transistor, and the second switch transistor M2 is a P-type transistor. Alternatively, the first switch transistor M1 is a P-type transistor, and the second switch transistor M2 is an N-type transistor. Of course, the first switch transistor M1 and the second switch transistor M2 may be of the same type. In practical applications, the types of the first switch transistor M1 and the second switch transistor M2 need to be designed according to the actual application environment, which is not limited here.

[0160] For example, the pixel circuit 110 may further include a third switch transistor M3 and a storage capacitor Cst. For example, the gate of the third switch transistor M3 is used to receive the first gate scan signal S1, the first electrode of the third switch transistor M3 is used to receive the data signal DA, and the second electrode of the third switch transistor M3 is coupled to the gate G of the driving transistor M0. The first end of the storage capacitor Cst is coupled to the gate G of the driving transistor M0, and the second end of the storage capacitor Cst is coupled to the ground terminal GND.

[0161] For example, the pixel circuit 110 may further include a fourth switch transistor M4. For example, the gate of the fourth switch transistor M4 is used to receive the second gate scan signal S2, the first electrode of the fourth switch transistor M4 is used to receive the data signal DA, and the second electrode of the fourth switch transistor M4 is coupled to the gate G of the driving transistor M0. In addition, the fourth switch transistor M4 is of a different type from the third switch transistor M3. For example, the third switch transistor M3 is an N-type transistor, and the fourth switch transistor M4 is a P-type transistor; or, the third switch transistor M3 is a P-type transistor, and the fourth switch transistor M4 is an N-type transistor.

[0162] It should be noted that when the voltage of the data signal DA is a voltage corresponding to a high gray scale, the voltage of the data signal DA can be prevented from being affected by the threshold voltage of the third N-type switch transistor M3, for example, by turning on the fourth P-type switch transistor M4 to transmit the data signal DA to the gate G of the drive transistor M0. When the voltage of the data signal DA is a voltage corresponding to a low gray scale, the voltage of the data signal DA can be prevented from being affected by the threshold voltage of the fourth P-type switch transistor M4, for example, by turning on the third N-type switch transistor M3 to transmit the data signal DA to the gate G of the drive transistor M0. In this way, the voltage range input to the gate G of the drive transistor M0 can be increased.

[0163] The driving transistor M0 , the first switch transistor M1 , the second switch transistor M2 , the third switch transistor M3 , and the fourth switch transistor M4 are MOS transistors fabricated in a silicon substrate.

[0164] It should be noted that, for the sake of clarity and simplicity, the embodiments of the present disclosure do not provide all the components of the display device. To achieve the basic functions of the display device, those skilled in the art may provide and set other structures not shown according to specific needs, and the embodiments of the present disclosure do not limit this.

[0165] In at least one embodiment of the present disclosure, the display device can avoid the color shift problem generated under a larger viewing angle application while having a high PPI, thereby improving the display quality of the display device and thus improving the user experience. In other embodiments, when the anti-color shift viewing angle of the display device is expanded, the first distance H can be correspondingly reduced by the above formula (1) to avoid the color shift problem at the expanded anti-color shift viewing angle, thereby solving the color mixing problem of the display device under a large viewing angle application.

[0166] At least one embodiment of the present disclosure further provides an electronic device. Figure 8 A schematic diagram of an electronic device provided according to at least one embodiment of the present disclosure.

[0167] like Figure 8As shown, the electronic device 100 includes a display device 1 provided by any embodiment of the present disclosure, for example, Figure 1A or Figure 5 The display device 1 shown in FIG. For example, the display device 1 may be a virtual reality device or an augmented reality device.

[0168] For example, the display device 1 may be a silicon-based OLED display device, which is not limited in the embodiments of the present disclosure.

[0169] It should be noted that, for the sake of clarity and simplicity, the embodiments of the present disclosure do not provide all the components of the electronic device 100. To implement the basic functions of the electronic device 100, those skilled in the art may provide and set other structures not shown according to specific needs, and the embodiments of the present disclosure are not limited thereto.

[0170] The technical effects of the electronic device 100 provided in the above embodiment may refer to the technical effects of the display device provided in the embodiment of the present disclosure, which will not be described in detail here.

[0171] At least one embodiment of the present disclosure further provides a method for preparing a display device. Fig. 9 The flowchart of a method for preparing a display device provided by at least one embodiment of the present disclosure is shown. For example, the method can be used to prepare a display device provided by any embodiment of the present disclosure. For example, the method can be used to prepare Figure 1A The display substrate shown in FIG. Fig. 9 As shown, the method for preparing the display device includes steps S110 to S130.

[0172] Step S110: providing a substrate.

[0173] Step S120: forming a plurality of light emitting elements arranged in an array on a substrate.

[0174] Step S130: forming a color filter layer on a side of the plurality of light-emitting elements away from the substrate.

[0175] For step S110, for example, the substrate 11 is a silicon-based substrate substrate, such as a silicon-based substrate substrate (OLED silicon-based substrate substrate) for an organic light emitting diode (OELD) display device. For example, the substrate 11 plays a supporting and protective role, and the substrate 11 can be a single crystal silicon-based substrate substrate or a silicon-on-insulator (SOI)-based substrate substrate. For example, the substrate 11 may also include any applicable components such as a thin film encapsulation layer, a light extraction layer, and a cover plate disposed thereon to achieve a display function. For example, any applicable circuit components such as a gate drive circuit, a data drive circuit, and a pixel circuit (not shown in the figure) are integrated on the substrate 11, and these circuit components are prepared, for example, by a silicon semiconductor process (such as a CMOS process), and the embodiments of the present disclosure are not limited to this. For example, the pixel circuit is configured to drive a plurality of light-emitting elements to emit light respectively. For example, the pixel circuit can be a conventional 2T1C, 4T1C pixel circuit, or it can be a pixel circuit with functions such as internal compensation or external compensation, and the embodiments of the present disclosure are not limited to this. For example, there is a gate driving circuit (not shown in the figure) for generating a gate driving signal, and a data driving circuit (not shown in the figure) for generating a data signal. The gate driving circuit and the data driving circuit can adopt conventional circuit structures in the field, and the embodiments of the present disclosure are not limited to this.

[0176] For step S120, for example, a plurality of light emitting elements 410 arranged in an array are located on the substrate 11. Figure 1A As shown, the plurality of light emitting elements 410 include a first light emitting element 411 and a second light emitting element 412 adjacent to the first light emitting element 411 in a first direction X parallel to the surface of the substrate. For example, the first direction X is a row direction or a column direction, which is not limited in the embodiments of the present disclosure.

[0177] For step S130, for example, Figure 1A or Figure 2A As shown, the color filter layer 17 includes a plurality of color filter units, for example, a red color filter unit R, a green color filter unit G and a blue color filter unit B, which are arranged one by one corresponding to the plurality of light emitting elements 410 on a side of the plurality of light emitting elements 410 away from the substrate 11 .

[0178] For example, Figure 1A As shown, the display device further includes a first thin film encapsulation layer 16, and a color film layer 17 is disposed on the first thin film encapsulation layer 16 and corresponding to the organic light emitting layer 14, so as to realize a colored display of the emitted light. Of course, the embodiments of the present disclosure are not limited thereto, and the color film layer 17 may also include color film units of other colors, such as white, yellow, etc.

[0179] For example, Figure 2AAs shown, in the direction Y perpendicular to the substrate 11, the plurality of light-emitting elements 410 and the color filter layer 17 have a first distance H. For example, the display device 1 has an anti-color shift viewing angle θ and an anti-color shift distance D on a reference plane determined by the first direction X and the second direction Y perpendicular to the surface of the substrate 11. For example, the anti-color shift viewing angle θ is the distance between the line L1 connecting the side of the first light-emitting element 411 close to the second light-emitting element 412 and the side of the color filter unit B corresponding to the second light-emitting element 412 close to the first light-emitting element 411 and the direction Y perpendicular to the substrate (i.e., Figure 2A For example, the anti-color shift distance D is the distance between the projection G of the first light-emitting element 411 on the color filter layer and the color filter unit B corresponding to the second light-emitting element 412 in the cross section along the reference plane. For example, the first distance H is configured to make the anti-color shift viewing angle θ greater than a preset angle, so that the color shift problem generated at a larger viewing angle can be avoided while having a high PPI, thereby improving the display quality of the display device.

[0180] For example, the first distance H between the multiple light-emitting elements 410 and the color film layer 17 is 0.02 microns to 15 microns, and the anti-color deviation distance D is 0.1 microns to 15 microns, for example, and the preset angle is 30° to 80°. For example, in some examples, the preset angle is 40° to 50°. For example, in some examples, when the anti-color deviation distance D is determined to be 0.1 microns according to the needs of the aperture ratio, etc., and the anti-color deviation viewing angle is increased to about 78° as needed, the first distance H can be reduced to 0.02 microns to ensure that the display device does not have color mixing at the anti-color deviation viewing angle (for example, if the first distance H is higher than 0.02 microns, color mixing will occur), so that the above-mentioned anti-color deviation viewing angle can be achieved, and the color mixing problem of the display device under wide viewing angle application can be solved. The embodiments of the present disclosure are not limited to this.

[0181] For example, in at least one embodiment of the present disclosure, the first distance between the plurality of light-emitting elements and the color filter layer, the anti-color shift viewing angle, and the anti-color shift distance satisfy the following relationship:

[0182] H=D / tanθ (1)

[0183] Wherein, H represents the first distance, θ represents the anti-color cast viewing angle, and D represents the anti-color cast distance.

[0184] For example, after determining the anti-color shift viewing angle θ and the anti-color shift distance D, the first distance H between the plurality of light-emitting elements and the color film layer can be determined by the above formula (1), so that at the first distance H, the light emitted by the first light-emitting element 411 will not pass through the color film unit B corresponding to the second light-emitting element 412 at a specific anti-color shift viewing angle, but only pass through the color film unit G corresponding to the first light-emitting element 411, that is, at the anti-color shift viewing angle, the display device 1 only displays green, but not blue, thereby effectively solving the color shift problem, avoiding color mixing at the viewing angle, and improving the display quality of the display device. Moreover, under the condition of satisfying a certain aperture ratio, the anti-color shift viewing angle of the display device can be expanded, and the first distance H corresponding to the expanded anti-color shift viewing angle can be determined by the above formula (1), so that the color shift problem occurring at a specific anti-color shift viewing angle can be solved.

[0185] For example, in some examples, such as Figure 3 As shown, the preparation method also includes: forming a first electrode layer 13 on the substrate 11 in sequence; forming a hole injection layer 21 between the first electrode layer 13 and the color filter layer 17; forming a hole transport layer 22 between the hole injection layer 21 and the color filter layer 17; forming an organic light-emitting layer 14 between the hole injection layer 21 and the color filter layer 17; forming an electron transport layer 24 between the organic light-emitting layer 14 and the color filter layer 17; forming an electron injection layer 23 between the electron transport layer 24 and the color filter layer 17; forming a second electrode layer 15 between the electron injection layer 23 and the color filter layer 17, and the specific introduction can refer to the previous Figure 3 The relevant description will not be repeated here.

[0186] For example, in this example, the first distance H between the plurality of light-emitting elements 410 and the color filter layer 17 is the distance between the surface of the second electrode layer 15 away from the substrate 11 (i.e., the upper surface of the second electrode layer 15) and the surface of the color filter unit of the corresponding color filter layer 17 facing the substrate 11 (i.e., the lower surface of the color filter layer 17). For example, in this example, the vertex of the anti-color bias viewing angle is on the surface of the second electrode layer 15 away from the substrate 11 (i.e., the upper surface of the second electrode layer 15). That is, Figure 2A and Figure 2B The light emitting element 420 shown is the surface of the second electrode layer 15 away from the substrate 11 (ie, the upper surface of the second electrode layer 15). Figure 2A and Figure 2B The color filter layer 17 shown is the surface of the color filter unit of the color filter layer 17 facing the substrate 11 (ie, the lower surface of the color filter layer 17 ).

[0187] For example, in some examples, the preparation method further includes forming a black matrix BM between adjacent color filter units. Figure 2AIn the example shown, the anti-color deviation distance D is equal to the width of the black matrix BM in the first direction X. For example, in this example, the width of the black matrix BM in the first direction X is equal to the distance L between adjacent light-emitting elements in the first direction X, for example, the distance L between the first light-emitting element 411 and the second light-emitting element 412. That is, in this example, the widths of the light-emitting element 410 and the color film unit in the first direction X are equal, and the distances between the light-emitting elements are equal to the distances between the color film units, that is, the first distance D is equal to the distance L between the light-emitting elements. For example, the distance L between the light-emitting elements is determined according to the resolution of the display device. The specific determination method can refer to the method in the art, which will not be repeated here.

[0188] It should be noted that the width of the black matrix BM in the first direction X may not be equal to the distance L between adjacent light-emitting elements in the first direction X. For example, it may be greater than or less than the distance L between adjacent light-emitting elements in the first direction X. The embodiments of the present disclosure are not limited to this.

[0189] For example, in some examples, such as Figure 4B As shown, the preparation method also includes: forming a first thin film encapsulation layer 16 between the multiple light-emitting elements 410 and the color filter layer 17; forming a light coupling output layer 20 between the first thin film encapsulation layer 16 and the multiple light-emitting elements 410; and forming a second thin film encapsulation layer 18 on the side of the color filter layer 17 away from the substrate 11.

[0190] For example, when only the first thin film encapsulation layer 16 is included between the plurality of light-emitting elements 410 and the color filter layer 17, the first distance H is the thickness of the first thin film encapsulation layer 16. For example, when only the first thin film encapsulation layer 16 is included between the plurality of light-emitting elements 410 and the color filter layer 17, the first distance H is the thickness of the first thin film encapsulation layer 16.

[0191] For example, in some examples, a cover plate 19 is further formed on the second thin film encapsulation layer. For example, the cover plate 19 is arranged opposite to the substrate 10, and the cover plate 19 is, for example, attached to the second thin film encapsulation layer 18 to protect and increase strength. For example, the cover plate 19 and the substrate 10 are parallel to each other. For example, the material of the cover plate 19 is a transparent material, and for example, the transparent material can be an inorganic material such as glass or an organic material such as polyimide. For example, in some examples, the cover plate 19 can be made of plain glass with high transmittance, and the embodiments of the present disclosure are not limited to this.

[0192] For example, Figure 1AAs shown, the second thin film encapsulation layer 18 and the cover plate 19 are sequentially arranged on the color filter layer 17, which can realize the function of protecting the color filter layer 17. For example, the first thin film encapsulation layer 16 and the second thin film encapsulation layer 18 are made of one or more organic materials or inorganic materials with good sealing properties, so as to achieve a good sealing effect and protect the light-emitting element 410. For example, either the first thin film encapsulation layer 16 or the second thin film encapsulation layer 18 can be a composite film layer, including one or more organic sub-film layers or inorganic sub-film layers.

[0193] It should be noted that in multiple embodiments of the present disclosure, the process of the method for preparing the display device may include more or fewer operations, and these operations may be performed sequentially or in parallel. Although the process of the preparation method described above includes multiple operations that appear in a specific order, it should be clearly understood that the order of the multiple operations is not limited. The preparation method described above can be performed once or multiple times according to predetermined conditions.

[0194] The technical effects of the method for preparing the display device provided in the above embodiment can be referred to the technical effects of the display device provided in the embodiment of the present disclosure, which will not be repeated here.

[0195] There are a few points to note:

[0196] (1) The drawings of the embodiments of the present disclosure only relate to the structures related to the embodiments of the present disclosure, and other structures may refer to the general design.

[0197] (2) In the absence of conflict, the embodiments of the present disclosure and the features therein may be combined with each other to obtain new embodiments.

[0198] The above description is merely an exemplary embodiment of the present disclosure and is not intended to limit the protection scope of the present disclosure. The protection scope of the present disclosure is determined by the appended claims.

Claims

1. A display device, comprising: A substrate, comprising a display area and a peripheral area surrounding the display area; a plurality of light-emitting elements arranged in an array, located on the substrate, wherein the plurality of light-emitting elements include a first light-emitting element and a second light-emitting element adjacent to the first light-emitting element in a first direction parallel to a surface of the substrate; and A color filter layer, located on the substrate, includes a plurality of color filter units, wherein in the display area, the plurality of color filter units are arranged one-to-one with the plurality of light-emitting elements on a side of the plurality of light-emitting elements away from the substrate; Wherein, in a second direction perpendicular to the surface of the substrate, there is a first distance between the plurality of light emitting elements and the color filter layer, The display device has an anti-color shift viewing angle on a reference plane determined by the first direction and a second direction perpendicular to the surface of the substrate; The anti-color bias angle is the angle between a line connecting the side of the first light-emitting element close to the second light-emitting element and the side of the color film unit corresponding to the second light-emitting element close to the first light-emitting element and a second direction perpendicular to the surface of the substrate in a cross section along the reference plane. Wherein, the first distance is configured so that the anti-color deviation viewing angle is greater than a preset angle; Wherein, the display device further comprises: a first thin film encapsulation layer, arranged between the plurality of light emitting elements and the color filter layer; wherein the first distance comprises the thickness of the first thin film encapsulation layer; The display device further includes: a second thin film encapsulation layer, which is arranged on a side of the color filter layer away from the substrate, wherein the first thin film encapsulation layer includes: A first inorganic encapsulation layer, on a side of the light-emitting element away from the substrate; a second inorganic encapsulation layer, on a side of the first inorganic encapsulation layer away from the substrate; a first organic encapsulation layer, on a side of the second inorganic encapsulation layer away from the substrate, wherein the refractive index of the first inorganic encapsulation layer is greater than the refractive index of the second inorganic encapsulation layer; The display device further comprises: an anti-color deviation distance on a reference plane determined by the first direction and a second direction perpendicular to the surface of the substrate, The anti-color shift distance is, in a cross section along the reference plane, a minimum distance between an edge of a projection of a light-emitting area of ​​the first light-emitting element on the color filter layer and a color filter unit corresponding to the second light-emitting element; Wherein, the anti-color deviation distance is 0.1 micrometer to 15 micrometers; Wherein, the first distance between the plurality of light emitting elements and the color filter layer is 0.02 micrometers to 15 micrometers, and the preset angle is 30° to 80°; The display device further includes: a black matrix between adjacent color film units, and the anti-color deviation distance is equal to the width of the black matrix in the first direction.

2. The display device according to claim 1, wherein: The preset angle is 40° to 50°.

3. The display device according to claim 1, wherein: The first distance between the plurality of light-emitting elements and the color filter layer, the anti-color shift viewing angle, and the anti-color shift distance satisfy the following relationship: H=D / tanθ Wherein, H represents the first distance, θ represents the anti-color cast viewing angle, and D represents the anti-color cast distance.

4. The display device according to claim 1, wherein: Each of the plurality of light emitting elements comprises: A first electrode layer is disposed on the substrate; An organic light-emitting layer is arranged on a side of the first electrode layer away from the substrate; A second electrode layer is arranged on a side of the organic light-emitting layer away from the first electrode layer; Wherein, the first distance between each of the plurality of light-emitting elements and the color filter layer is the distance between the surface of the second electrode layer away from the substrate and the surface of the color filter unit of the corresponding color filter layer facing the substrate; The anti-color bias angle is the angle between a line connecting the side of the second electrode layer of the first light-emitting element close to the second light-emitting element and the side of the color film unit corresponding to the second light-emitting element close to the first light-emitting element in a cross section along the reference plane and a direction perpendicular to the substrate.

5. The display device according to claim 4, wherein: The plurality of light emitting elements further comprises: A hole injection layer, disposed between the organic light-emitting layer and the first electrode layer; A hole transport layer, disposed between the hole injection layer and the organic light emitting layer; An electron injection layer, disposed between the organic light-emitting layer and the second electrode layer; The electron transport layer is disposed between the electron injection layer and the organic light emitting layer.

6. The display device according to claim 1, wherein: The width of the black matrix in the first direction is equal to the distance between adjacent light emitting elements in the first direction.

7. The display device according to claim 1, wherein: Any two adjacent color filter units partially overlap, and the black matrix is ​​the overlapping portion of any two adjacent color filter units.

8. The display device according to claim 1, wherein: The projections of the plurality of color filter units on the plane where the substrate is located are continuous and non-overlapping in the first direction.

9. The display device according to claim 8, wherein: The anti-color shift distance is equal to half of the distance between adjacent light emitting elements in the first direction.

10. The display device according to claim 1, wherein: The substrate is a silicon-based substrate, and the silicon-based substrate includes a pixel circuit, which is connected to the first electrode layer of the light-emitting element through a tungsten material filled in a via hole located on the substrate, and is configured to drive the first electrode layers of the multiple light-emitting elements respectively.

11. The display device according to claim 1, wherein: The light emitting element is configured to emit white light, The light-emitting element comprises a plurality of light-emitting layers stacked in sequence from the substrate, each light-emitting layer emitting light of a different primary color; or, the light-emitting element comprises a light-emitting layer doped with a plurality of dopants for emitting light of different primary colors.

12. The display device according to claim 1, wherein: The first distance is equal to the thickness of the first thin film encapsulation layer.

13. The display device according to claim 1, further comprising: A light coupling output layer, disposed between the first thin film encapsulation layer and the plurality of light emitting elements; The first distance includes the thickness of the first thin-film encapsulation layer and the light coupling output layer.

14. The display device according to claim 13, wherein: The first distance is equal to the thickness of the first thin-film encapsulation layer and the light out-coupling layer.

15. The display device according to claim 1, wherein: The second thin film encapsulation layer comprises: A second organic encapsulation layer, located on a side of the color filter layer away from the substrate; a third inorganic encapsulation layer, on a side of the second organic encapsulation layer away from the substrate, The refractive index of the first organic encapsulation layer and the refractive index of the second organic encapsulation layer are substantially the same, and the refractive index of the second organic encapsulation layer is greater than the refractive index of the third inorganic encapsulation layer.

16. The display device according to claim 1, wherein: The array includes multiple rows and multiple columns, and the first direction is a row direction or a column direction.

17. An electronic device comprising the display device according to any one of claims 1 to 16.

18. The electronic device according to claim 17, wherein: The display device is a virtual reality device or an augmented reality device.

19. A method for preparing a display device, comprising: providing a substrate; forming a plurality of light-emitting elements arranged in an array on the substrate, wherein the plurality of light-emitting elements include a first light-emitting element and a second light-emitting element adjacent to the first light-emitting element in a first direction parallel to a surface of the substrate; Forming a color filter layer on a side of the plurality of light-emitting elements away from the substrate, wherein the color filter layer includes a plurality of color filter units corresponding to the plurality of light-emitting elements one by one; Wherein, in a direction perpendicular to the substrate, there is a first distance between the plurality of light emitting elements and the color filter layer, The display device has an anti-color deviation viewing angle on a reference plane determined by the first direction and a second direction perpendicular to the surface of the substrate; The anti-color bias angle is the angle between a line connecting the side of the first light-emitting element close to the second light-emitting element and the side of the color film unit corresponding to the second light-emitting element close to the first light-emitting element and a direction perpendicular to the substrate in a cross section along the reference plane. Wherein, the first distance is configured so that the anti-color deviation viewing angle is greater than a preset angle; The manufacturing method further comprises: forming a first thin film encapsulation layer between the plurality of light emitting elements and the color filter layer; wherein the first distance comprises the thickness of the first thin film encapsulation layer; A second thin film encapsulation layer is formed on a side of the color filter layer away from the substrate, wherein the first thin film encapsulation layer includes: A first inorganic encapsulation layer, on a side of the light-emitting element away from the substrate; a second inorganic encapsulation layer, on a side of the first inorganic encapsulation layer away from the substrate; a first organic encapsulation layer, on a side of the second inorganic encapsulation layer away from the substrate, wherein the refractive index of the first inorganic encapsulation layer is greater than the refractive index of the second inorganic encapsulation layer; The display device further includes: an anti-color shift distance on a reference plane determined by the first direction and a second direction perpendicular to the surface of the substrate, The anti-color shift distance is, in a cross section along the reference plane, a minimum distance between an edge of a projection of a light-emitting area of ​​the first light-emitting element on the color filter layer and a color filter unit corresponding to the second light-emitting element; Wherein, the anti-color deviation distance is 0.1 micrometer to 15 micrometers; Wherein, the first distance between the plurality of light emitting elements and the color filter layer is 0.02 micrometers to 15 micrometers, and the preset angle is 30° to 80°; The display device further includes: a black matrix between adjacent color film units, and the anti-color deviation distance is equal to the width of the black matrix in the first direction.

20. The method for manufacturing a display device according to claim 19, wherein: The display device further includes: an anti-color shift distance on a reference plane determined by the first direction and a second direction perpendicular to the surface of the substrate, The anti-color shift distance is, in a cross section along the reference plane, a minimum distance between an edge of a projection of a light-emitting area of ​​the first light-emitting element on the color filter layer and a color filter unit corresponding to the second light-emitting element.

21. The method for manufacturing a display device according to claim 20, wherein: The anti-color shift distance is 0.1 micrometer to 15 micrometers.

22. The method for manufacturing a display device according to any one of claims 19 to 21, wherein: The first distance between the plurality of light emitting elements and the color filter layer is 0.02 micrometers to 15 micrometers.

23. The method for manufacturing a display device according to any one of claims 19 to 21, wherein: The anti-color shift viewing angle is 30° to 80°.

24. The method for manufacturing a display device according to claim 23, wherein: The preset angle is 40° to 50°.

25. The method for manufacturing a display device according to claim 20 or 21, wherein: The first distance between the plurality of light-emitting elements and the color filter layer, the anti-color shift viewing angle, and the anti-color shift distance satisfy the following relationship: H=D / tanθ Wherein, H represents the first distance, θ represents the anti-color cast viewing angle, and D represents the anti-color cast distance.

26. The method for manufacturing a display device according to any one of claims 19 to 21, wherein: A plurality of light-emitting elements arranged in an array are formed on the substrate, including: forming a first electrode layer on the substrate; forming a hole injection layer between the first electrode layer and the color filter layer; forming a hole transport layer between the hole injection layer and the color filter layer; forming an organic light-emitting layer between the hole injection layer and the color filter layer; forming an electron transport layer between the organic light-emitting layer and the color filter layer; forming an electron injection layer between the electron transport layer and the color filter layer; forming a second electrode layer between the electron injection layer and the color filter layer; Wherein, the first distance between the plurality of light-emitting elements and the color filter layer is the distance between the surface of the second electrode layer away from the substrate and the surface of the color filter layer facing the substrate; The vertex of the anti-color shift viewing angle is on a surface of the second electrode layer away from the substrate.

27. The method for manufacturing a display device according to any one of claims 19 to 21, further comprising: forming a black matrix between adjacent color film units; The anti-color deviation distance is equal to the width of the black matrix in the first direction, and the width of the black matrix in the first direction is equal to the distance between adjacent light-emitting elements in the first direction.

28. The method for preparing a display device according to any one of claims 19 to 21, wherein: The substrate is a silicon-based substrate, and the preparation method further comprises: A pixel circuit is formed in the silicon-based substrate, and the pixel circuit is configured to drive the plurality of light emitting elements respectively.

29. The method for manufacturing a display device according to any one of claims 19 to 21, further comprising: forming a first thin film encapsulation layer between the plurality of light emitting elements and the color filter layer; forming a light coupling-out layer between the first thin-film encapsulation layer and the plurality of light-emitting elements; A second thin film encapsulation layer is formed on a side of the color filter layer away from the substrate.

Citation Information

Patent Citations

  • Display base board, preparation method thereof, and display apparatus

    CN105957878A

  • A preparation method of a display panel

    CN109244260A