Control device, system, method, and program

Abstract

The present invention provides a control device, a system, a method, and a program, which can effectively utilize the axes of the goniometer of a diffractometer and can perform precise control of the incident angle of the axis even without a special axis structure. The control device controls the posture of a sample and includes: an input unit that receives an input of tilt information indicating the tilt of the sample with respect to the axis; an adjustment amount determination unit that uses the tilt information to determine adjustment amounts of ω values and χ values for correcting the deviation amount between the sample surface normal or the lattice plane normal and the scattering vector with respect to a changing value; and a drive instruction unit that, during X-ray diffraction measurement, drives the goniometer in accordance with the rotation of the axis of the sample based on the determined adjustment amounts of the ω values and the χ values. In this way, the adjustment angle for eliminating the tilt angle of the sample that is not affected by the rotation of the axis can be converted into adjustment amounts of ω values and χ values that are independent of the axis rotation.

Description

Technical Field

[0001] The present invention relates to a control device, system, method, and program for controlling the posture of a specimen. Background Art

[0002] Since a thin film is formed two-dimensionally and thinly on the surface of a substrate, there is generally anisotropy in the stacking direction and the in-plane direction. Therefore, the structure inside the thin film is often evaluated in two directions, the stacking direction and the in-plane direction. To evaluate the structure inside the thin film, there are various measurement methods depending on the direction of interest. For example, in the case of evaluating the in-plane direction, in-plane measurement and reciprocal space mapping measurement of an asymmetric plane are performed.

[0003] In the evaluation of a thin film using X-rays, high-precision control of the incident angle of X-rays is required. If the thickness of the specimen is thin, the diffraction signal intensity is weak. To detect such a weak signal, in in-plane measurement, it is necessary to irradiate the incident X-rays onto the effective surface. Specifically, the X-rays are incident grazing the surface of the specimen. In addition, in reciprocal space mapping measurement, in particular, for a material (epitaxial film) with very neat lattice planes, the X-rays are correctly incident with respect to the lattice plane.

[0004] In in-plane measurement and reciprocal space mapping measurement, in-plane rotation of the specimen, that is, rotation of the specimen around the axis is required. However, usually, the specimen is simply placed on an X-ray diffractometer, and generally, this rotation axis does not coincide with the crystal axis or the surface normal of the target specimen. Therefore, rotation around the axis causes a precession motion in the crystal axis and the surface normal of the target specimen. In this case, if the crystal axis or the surface normal in the target direction is aligned in advance with respect to the axis, it is easy to maintain a constant incident angle of the X-rays with respect to the specimen surface. To achieve this state, there is a tilt movement axis as an axis for adjusting the tilt of the specimen.

[0005] The tilt movement axis is provided, for example, like the tilt mechanism described in Patent Document 1, above the rotation axis, and adjusts the tilt of the specimen in two orthogonal axes x and y directions. Thus, by adjusting the tilt angle, the crystal axis or the surface normal of the specimen on the tilt movement axis can be made to coincide with the axis.

[0006] Figure 10A , 10B are schematic views of the specimen S0 before and after adjustment of the tilt movement axes (Rx axis, Ry axis), respectively. As Figure 10AAs shown, the surface normal n of the specimen S0 before adjustment is inclined from the axis. By rotating around the Rx axis and Ry axis before measurement, adjustment can be performed so that the surface normal n of the specimen S0 can be made to coincide with the Figure 10B axis as shown. If an X-ray is irradiated while rotating around the axis in this state, the incident direction of the X-ray with respect to the specimen surface can be maintained constant and the specimen S0 can be rotated. Technologies related to such an inclined movement axis have been disclosed.

[0007] For example, Patent Document 2 discloses the following device: It includes a mechanism for rotating a specimen around two rotation center lines that pass through the surface of the specimen and are orthogonal to each other (Ru, Rv rotation). This device also includes a mechanism for translating the specimen in two-dimensional directions (U, V directions) in a plane parallel to the surface, and a mechanism for rotating the specimen in-plane ( rotation).

[0008] In addition, Patent Document 3 discloses a specimen support device including a base and a mounting table disposed overlapping the base. And the base has an axis moving table for in-plane rotation of the specimen, and can mount an X-Y axis moving table (XY attachment) for in-plane sliding movement of the specimen or an Rx-Ry axis moving table (RxRy attachment) for adjusting the posture of the specimen.

[0009] Patent Document

[0010] Patent Document 1: Japanese Patent Laid-Open No. 11-287773

[0011] Patent Document 2: Japanese Patent Laid-Open No. 2004-294136

[0012] Patent Document 3: Japanese Patent Laid-Open No. 2007-017273 Summary of the Invention

[0013] In an X-ray diffractometer, the space around the specimen stage is limited. Therefore, in order to adopt such a special axis structure of the inclined movement axis, it is necessary to make efforts in the assembly method of the specimen stage. However, if a special axis structure is adopted, various limitations may occur. For example, the thickness of the specimen that can be measured in the device described in Patent Document 2 is limited. In addition, in the device described in Patent Document 3, the types of measurements are limited. On the other hand, in a device without such a special axis structure of the RxRy attachment, posture control of the specimen accompanying rotation around the axis cannot be performed.

[0014] ​The present invention has been made in view of this situation, and an object thereof is to provide a control device, a system, a method, and a program that can effectively utilize the axes of a goniometer of a diffractometer and can perform precise control of the incident angle accompanied by the rotation of the axis even if the axis has a special structure. Axis rotation of the precise control of the incident angle.

[0015] (1) To achieve the above object, the control device of the present invention is a control device that controls the posture of a sample, and includes: an input unit that receives an input of tilt information indicating the tilt of the sample with respect to the axis; an adjustment amount determination unit that uses the tilt information to determine adjustment amounts of ω values and χ values for correcting the deviation amount between the sample surface normal or lattice plane normal and the scattering vector with respect to a changing value; and a drive instruction unit that, during X-ray diffraction measurement, drives the goniometer in accordance with the determined adjustment amounts of the ω values and χ values and the axis rotation of the sample.

[0016] Thereby, it is possible to convert the adjustment angle for correcting the deviation amount between the sample surface normal or lattice plane normal and the scattering vector without being affected by the axis rotation into adjustment amounts of ω values and χ values independent of the axis rotation. As a result, it is possible to perform measurement accompanied by axis rotation without placing an RxRy attachment on the sample stage to adjust the tilt of the sample. In addition, it is also possible to perform high-precision adjustment of the tilt of the sample.

[0017] (2) Further, the control device of the present invention is characterized in that the goniometer has three or more rotation axes that can be driven simultaneously, and the drive instruction unit drives the goniometer using the three or more rotation axes. By using three or more rotation axes of the goniometer that can be driven simultaneously, it is possible to perform measurement accompanied by axis rotation while adjusting the tilt of the sample using the goniometer.

[0018] (3) Further, the control device of the present invention is characterized in that the three or more rotation axes include the axis, the χ axis, and the ω axis. Thereby, it is possible to perform measurement accompanied by axis rotation while adjusting the tilt of the sample by χ values and ω values.

[0019] (4) Further, the control device of the present invention is characterized in that the ω axis is controlled by combining the θs axis and the θd axis as two drive axes, the θs axis is a rotation axis for controlling the incident angle of X-rays, and the θd axis is a rotation axis for controlling the light-receiving angle of X-rays. Thereby, by adjusting the rotation of the θs axis and the rotation of the θd axis, it is possible to perform adjustment of the ω value.

[0020] (5) In addition, the control device of the present invention is characterized in that it further includes a storage unit, and the storage unit stores the adjustment amount of the ω value and the χ value with respect to the changing value as a calculation formula for driving, and the drive instruction unit drives the goniometer based on the stored calculation formula for driving. In this way, by using the calculation formula, the goniometer can be flexibly driven according to individual conditions.

[0021] (6) In addition, the control device of the present invention is characterized in that it further includes a storage unit, and the storage unit stores, according to the tilt information, the correspondence relationship between the ω value and the χ value and the adjustment value of the changing value as a table, and the adjustment amount determination unit determines the adjustment values of the ω value and the χ value based on the stored correspondence relationship of the table. In this way, by using the table, the processing amount can be reduced, and simple and rapid response becomes possible.

[0022] (7) In addition, the control device of the present invention is characterized in that it further includes: an offset angle calculation unit that calculates the offset angle between the outer surface of the specimen and the lattice plane based on the adjustment amounts of the ω value and the χ value. Thus, for example, by comparing the adjustment amounts of the ω value and the χ value corresponding to the values of the Rx axis and the Ry axis, the offset angle of the substrate surface, the angular amount of the offset angle between the substrate and the orientation of the epitaxial growth film, and their deviation orientations can be analyzed.

[0023] (8) In addition, the control device of the present invention is characterized in that the X-ray diffraction measurement is an in-plane measurement, a pole measurement using an in-plane axis, a rocking curve measurement, or a reciprocal lattice map measurement. Especially in measurements accompanied by axis rotation represented by in-plane measurement, high-precision measurement can be performed without using an RxRy attachment device.

[0024] (9) In addition, the control device of the present invention is characterized in that the adjustment amount determination unit determines the adjustment amounts of the ω value and the χ value for each measurement position of the XY stage placed on the goniometer, and the drive instruction unit, for each measurement position of the XY stage, performs an instruction to drive the goniometer corresponding to the rotation of the axis based on the determined adjustment amounts. Thereby, the position adjustment of the specimen based on the XY stage can be performed in advance, and thus the measurement accompanied by axis rotation can be performed.

[0025] (10) Further, the system of the present invention is characterized by comprising: the control device according to any one of the above (1) to (9); an X-ray diffraction device that constitutes an optical system for making X-rays incident on the specimen and detecting diffracted X-rays generated from the specimen, the optical system having the goniometer, the goniometer having three or more rotation axes that can be driven simultaneously, and being driven by an instruction from the control device. Thus, it is possible to transform the adjustment angle for correcting the deviation amount between the specimen surface normal or lattice plane normal and the scattering vector without being affected by the rotation of the axis, into an adjustment amount independent of the ω value and χ value of the axis rotation.

[0026] (11) Further, the method of the present invention is a method for controlling the posture of a specimen, and is characterized by comprising: a step of receiving an input of tilt information indicating the tilt of the specimen with respect to the axis; a step of using the tilt information to determine the adjustment amounts of the ω value and χ value for correcting the deviation amount between the specimen surface normal or lattice plane normal and the scattering vector with respect to the changing value; and a step of driving the goniometer in accordance with the rotation of the axis of the specimen based on the determined adjustment amounts of the ω value and χ value during X-ray diffraction measurement. Thus, it is possible to transform the adjustment angle for correcting the deviation amount between the specimen surface normal or lattice plane normal and the scattering vector without being affected by the rotation of the axis, into an adjustment amount independent of the ω value and χ value of the axis rotation.

[0027] (12) Further, the program of the present invention is a program for controlling the posture of a specimen, and the program causes a computer to execute the following processing: a process of receiving an input of tilt information indicating the tilt of the specimen with respect to the axis; a process of using the tilt information to determine the adjustment amounts of the ω value and χ value for correcting the deviation amount between the specimen surface normal or lattice plane normal and the scattering vector with respect to the changing value; and a process of driving the goniometer in accordance with the rotation of the axis of the specimen based on the determined adjustment amounts of the ω value and χ value during X-ray diffraction measurement. Thus, it is possible to transform the adjustment angle for correcting the deviation amount between the specimen surface normal or lattice plane normal and the scattering vector without being affected by the rotation of the axis, into an adjustment amount independent of the ω value and χ value of the axis rotation.

[0028] According to the present invention, it is possible to effectively utilize the axes provided in the goniometer of the diffractometer, and even without a special axis structure, it is possible to perform operations accompanied by Precise control of the incident angle of the rotation of the shaft. BRIEF DESCRIPTION OF THE DRAWINGS

[0029] Figure 1A 、 Figure 1B are schematic diagrams of specimens representing 0° and 180° respectively based on the control of the present invention. and a schematic diagram of a specimen of 180°.

[0030] Figure 2 is a diagram showing an example of the structure of the X-ray diffraction measurement system of the present invention.

[0031] Figure 3 is a diagram showing an example of the hardware structure of the X-ray diffraction measurement system of the present invention.

[0032] Figure 4 is a block diagram showing the functional structure of the control device of the present invention.

[0033] Figure 5 is a flowchart showing the method of X-ray diffraction measurement of the present invention.

[0034] Figure 6A 、 Figure 6B are flowcharts showing examples of operations for pre-measurement and adjustment amount calculation respectively.

[0035] Figure 7 is a graph showing the adjustment amounts of ω value and χ value with respect to value.

[0036] Figure 8 is a table showing the adjustment amounts Δω and Δχ with respect to value and the drive control values ω and χ.

[0037] Figure 9 is a schematic diagram showing the specific structure used in the examples.

[0038] Figure 10A 、 Figure 10B are schematic diagrams of specimens before and after adjustment of the RxRy accessory respectively.

[0039] -SYMBOL DESCRIPTION-

[0040] 5 System

[0041] 6 X-ray generating section

[0042] 7 Incident side optical unit

[0043] 7a Parabolic multilayer mirror

[0044] 7b Soller slit

[0045] 8 Five-axis goniometer

[0046] 9 Exit-side optical unit

[0047] 10 Detector

[0048] 12 Head

[0049] 14 Base

[0050] 15 χ carriage (χ-axis adjustment mechanism)

[0051] 18 Specimen holder

[0052] 21 θ s Rotation drive device

[0053] 22 θd rotation drive device

[0054] 23 2θ χ Rotation drive device

[0055] 26 χ rotation drive device

[0056] 27 Rotation drive device

[0057] 28 CPU

[0058] 29 Memory

[0059] 30 X-ray diffractometer

[0060] 32 Keyboard

[0061] 33 X-ray intensity calculation circuit

[0062] 34 Display

[0063] 40 Control device

[0064] 41 Input section

[0065] 43 Adjustment amount determination section

[0066] 45 Storage section

[0067] 46 Deviation angle calculation section

[0068] 47 Drive instruction section

[0069] F X-ray source

[0070] S0 Specimen

[0071] n Plane normal

[0072] Δχ Adjustment amount

[0073] Δω Adjustment amount. Detailed implementation mode

[0074] Next, embodiments of the present invention will be described with reference to the accompanying drawings. For ease of understanding, the same reference numerals are given to the same structural elements in each drawing, and repeated descriptions are omitted.

[0075] [Principle]

[0076] In the present invention, the incident angle (ω) of X-rays and the tilt angle (χ) of the specimen are moved in linkage with the movement of the specimen rotation axis ( axis), and the state where the specimen normal is always adjusted is ensured in advance, in the same manner as when the specimen surface normal is aligned with the axis. In addition, the axis refers to the axis centerline of the specimen support member itself, the ω axis is an axis extending in the horizontal direction, and the χ axis is an axis extending in the horizontal direction and perpendicular to the ω axis.

[0077] Figure 1A and Figure 1B are schematic diagrams of the specimen S0 representing 0° and 180° respectively based on the control of the present invention. As shown in and Figure 1A , although the surface normal n of the specimen S0 is not aligned with the Figure 1B axis, the incident angle of X-rays with respect to the specimen surface is maintained constant at any of 0° and 180°. In addition, the object for which the incident angle of X-rays is maintained constant is not limited to the specimen surface, but also includes lattice planes. axis, but at any of 0° and 180°, the incident angle of X-rays with respect to the specimen surface is maintained constant. In addition, the object for which the incident angle of X-rays is maintained constant is not limited to the specimen surface, but also includes lattice planes.

[0078] This measurement is achieved by previously confirming the tilt information of the specimen surface or lattice plane and adjusting the ω value and χ value corresponding to the rotation of the axis. That is, when adjusting longitudinally along the axis, ω scans are performed at the 90° and 180° positions to calculate the deviation amount of the axis, and during measurement, the two axes of ω and χ are moved in linkage with the movement of the axis to ensure the adjusted state. The measurement data obtained in this way can be processed equivalently to the case where RxRy axis adjustment has been performed in advance by the RxRy attachment device. In addition, the tilt information is equivalent to the information of RxRy, and is equivalent to the tilt angle α and azimuth β of the specimen from the axis.

[0079] Since measurement data is obtained in the same manner as in the case of using the RxRy attachment device, the method of the present invention can also be referred to as "virtual RxRy axis". In addition, the above-described control is particularly effective in techniques related to specimen orientation maintenance in measurements such as epitaxial thin films, in-plane measurements, pole measurements using in-plane axes, rocking curve measurements, or reciprocal lattice map measurements.

[0080] [Structure of the system]

[0081] Figure 2 This is a diagram showing an example of the structure of the X-ray diffraction measurement system 5. In addition, Figure 3 This is a diagram showing an example of the hardware structure of the X-ray diffraction measurement system. The system 5 includes an X-ray diffraction device 30 and a control device 40. The X-ray diffraction device 30 constitutes an optical system that makes X-rays incident on a sample and detects the diffracted X-rays generated from the sample. The optical system includes a goniometer. Additionally, Figure 2 The structure shown is an example, and various other structures can be adopted. The control device 40 is, for example, a PC, which is a device equipped with a CPU and a memory.

[0082] The X-ray diffraction device 30 is configured to include an X-ray generation unit 6 that generates X-rays from the X-ray focus, i.e., the X-ray source F, an incident-side optical unit 7, and a five-axis goniometer 8 that measures the angles of the sample S0 and the detector 10 for the point region.

[0083] The X-ray source F can include, for example, a filament that emits thermoelectrons and a target disposed opposite to the filament. In this case, the thermoelectrons emitted from the filament strike the target at a high speed, and X-rays are radiated from the target.

[0084] Inside the incident-side optical unit 7, along the traveling path of the X-rays R emitted from the X-ray source F and diverging, a parabolic multilayer mirror 7a and a Soller slit 7b that restricts the divergence of the X-rays in the transverse direction are arranged. Such a structure of the optical elements is an example suitable for in-plane diffraction measurement, and various structures can actually be adopted.

[0085] The sample stage includes a base 14, a head 12, and a sample plate 18. The χ carriage (χ-axis adjustment mechanism) is integrated with the base 14, and the entire sample stage can be rocked along the carriage. The base 14 has a Z-axis adjustment mechanism and an axis rotation mechanism. The Z-axis adjustment mechanism adjusts the height of the sample S0. The axis rotation mechanism rotates the sample S0. The head 12 can be removed and replaced according to the measurement purpose. The RxRy attachment is a type of the head 12. Additionally, an XY attachment that can perform a movement parallel to the table surface can be provided on the head 12 as an XY worktable. The head 12 is configured to mount the sample plate 18 on its upper part. On the sample plate 18, components for setting samples S0 of different sizes from 4 to 8 inches, an adsorption table based on air suction, etc. are prepared. The sample S0 is mounted on the sample plate 18 by adhesion based on an adhesive, adsorption based on air suction, and various other methods as required.

[0086] Figure 2The five-axis goniometer 8 shown has an incident-side arm and an exit-side arm. The incident-side arm supports the X-ray generating section 6 and the incident-side optical unit 7, and the exit-side arm supports the exit-side optical unit 9 and the detector 10. Further, an ω(θs) rotation system that rotates in the vertical direction (arrow ω direction) of the specimen surface is connected to the incident-side arm. In addition, a 2θ(θd) rotation system that rotates with respect to the specimen surface and the vertical direction (arrow 2θ direction) and a 2θχ rotation system that rotates with respect to the specimen surface and the horizontal direction (arrow 2θχ direction) are connected to the exit-side arm. In this specification, the rotation axis of the arm connected to the 2θχ rotation system is referred to as the in-plane axis.

[0087] Figure 2 A specimen horizontal type goniometer is exemplified, but if the structure of a goniometer capable of performing equivalent axis scanning, the axis names, the scanning direction of the axis, and the rotation direction can also be changed. For example, even a horizontal type goniometer in which 2θ scanning is set in the specimen horizontal direction, a goniometer configured as a semiconductor inspection device, etc., can be controlled by the control device of the present invention.

[0088] Preferably, the five-axis goniometer 8 has three or more rotation axes that can be driven simultaneously and is driven by an instruction from the control device. Thus, without an RxRy attachment device, it is possible to adjust the tilt of the specimen and perform measurements accompanied by axis rotation. The five-axis goniometer 8 is configured to be able to perform scanning of five axes (ω, χ, 2θ, and 2θχ axes), for example, as measurement axes.

[0089] In addition, preferably, three or more rotation axes that can be driven simultaneously include axis, χ axis, and ω axis. Thus, it is possible to adjust the tilt of the specimen by the χ value and the ω value and perform measurements accompanied by axis rotation. The ω axis, χ axis, and axis are three axes that are respectively in an orthogonal relationship.

[0090] The

[0091] axis is the in-plane rotation axis (axis perpendicular to the surface) of the surface of the workbench on which the specimen is placed. The ω axis is the axis for controlling the angle of the X-ray incident on the specimen surface by controlling the posture of the specimen or the X-ray source. The χ axis is the axis for controlling the inclination (= skew) of the specimen reference plane in the direction perpendicular to the direction in which the X-ray travels when the ω value is 0°. In addition, the above-mentioned "specimen reference plane" refers to either the surface of the outer shape of the specimen to be measured or an arbitrary lattice plane of the crystal contained in the specimen, depending on the purpose of the measurement.

[0091] When the five-axis goniometer 8 is of the specimen horizontal type, it is further preferable to include, as four rotation axes, The ω-axis, χ-axis, θs-axis, and θd-axis. In this case, the ω-axis and 2θ-axis are controlled by combining the two drive axes, namely the θs-axis and θd-axis, based on the sample horizontal axis. Additionally, the θs-axis is the rotation axis for controlling the incident angle of the X-ray, and the θd-axis is the rotation axis for controlling the light-receiving angle of the X-ray. When only the ω-axis is controlled, the drive control value for rotating the θs-axis by the ω value is set. At the same time, the θd-axis is rotated by the same amount in the same direction. Furthermore, when the ω-axis and 2θ-axis are controlled simultaneously, the ω value, 2θ value, θs value, and θd value are controlled to ensure the relationship ω = θs and 2θ = θs + θd.

[0092] In this way, in the five-axis goniometer 8, it is further preferable to prepare the θs-axis and θd-axis as the control axes for ω and 2θ. Thereby, not only for the object configuration (2θ / θ), but also for various measurements accompanying asymmetric configurations (in-plane measurement, using 2θ / ω, ω scan, pole measurement of the in-plane axis, etc.) can be suitable.

[0093] In the five-axis goniometer 8, there are axes for moving the sample, axes for measurement, axes for rotating the workbench in the plane, and axes for blowing the sample, and they can be controlled simultaneously respectively. Additionally, particularly in the case of measuring a single crystal, adjustment of its orientation is required before measurement. In the measurement of a single crystal, high precision is pursued through angle control, so adjustment using a goniometer with a larger rotation radius and higher precision compared to the RxRy attachment is more suitable.

[0094] The exit-side optical unit 9 and the detector 10 arranged behind it constitute the exit-side arm, and are rotatably supported by a 2θ rotation system or a 2θχ rotation system. Inside the exit-side optical unit 9, a Soller slit, a light-receiving slit, etc. for restricting the lateral divergence of the X-ray are stored.

[0095] The above-mentioned respective axes are driven by respective rotation drive devices. The relationship between the rotation of each axis and the drive device is as follows. That is, the rotation of the ω-axis is driven by the θs rotation drive device 21. The rotation of the 2θ-axis is driven by the θs rotation drive device 21 and the θd rotation drive device 22. The rotation of the 2θχ-axis is driven by the 2θχ rotation drive device 23. The rotation of the χ-axis is driven by the χ rotation drive device 26. The rotation of the axis is driven by the rotation drive device 27. Additionally, a Z-axis drive device, an X-axis Y-axis drive device, etc. are appropriately prepared, and the sample can be translated parallel to each axis.

[0096] The θs rotation drive device 21, the θd rotation drive device 22, the 2θχ rotation drive device 23, the χ rotation drive device 26, The rotation drive device 27, the Z-axis drive device, and the X-axis and Y-axis drive devices can all be constituted by drive sources such as electric motors and transmission devices such as worms and worm wheels.

[0097] Moreover, these drive devices, as Figure 3 shown, have their operations controlled by a control device 40 that includes a CPU 28 and a memory 29. The memory 29 includes internal memories such as ROM (Read Only Memory) and RAM (Random Access Memory), as well as external memories such as hard disks. The program software for implementing a series of operations used in the X-ray diffraction analysis method performed by the X-ray diffractometer 30 is stored, for example, in the ROM within the memory 29.

[0098] At the input port of the control device 40, a keyboard 32, which is an input device operated by an operator, and an X-ray intensity calculation circuit 33 connected to the output terminal of the detector 10 (refer to Figure 2 ) are connected. The X-ray intensity calculation circuit 33 calculates the X-ray intensity based on the output signal of the detector 10. The calculated X-ray intensity is transmitted to the CPU 28 in the form of a signal and provided for arithmetic processing based on this CPU 28. And, as needed, the calculated X-ray intensity is displayed as an image in the form of a graph or the like on the display 34.

[0099] The X-ray diffractometer 30 is constituted as described above. When using this device to perform X-ray diffraction measurement, for example, in-plane diffraction measurement, a specimen S0 is installed at a specified position on the specimen plate 18 shown in Figure 2 . The X-ray incident angle δ with respect to this specimen S0 is set to a small angle grazing the specimen surface, and the angle 2θ of the detector 10 with respect to the specimen S0 is set to a specified value corresponding to the X-ray incident angle δ.

[0100] Moreover, the X-rays generated from the X-ray source F are monochromatized by the parabolic multilayer mirror 7a, for example, monochromatized into CuKα rays, and at the same time, the divergent X-ray beam is formed into a parallel X-ray beam. Further, the lateral divergence is restricted by the Soller slit 7b, and the parallel X-ray beam is incident on the specimen S0 at a small incident angle δ. In this state, by rotating around the 2θχ axis, the detector 10 is scanned and rotated around the specimen S0, and in-plane diffraction lines are detected by the detector 10 during this scan rotation.

[0101] [Structure of the control device]

[0102] Figure 4FIG. 0 is a block diagram showing the functional configuration of the control device 40. The control device 40 includes an input unit 41, an adjustment amount determination unit 43, a storage unit 45, and a drive instruction unit 47, and controls the posture of the sample during X-ray diffraction measurement. The control device 40 is, for example, a PC. Especially in measurements involving rotation about an axis, such as in-plane rotation, high-precision measurements can be performed without adjustment based on the RxRy accessory device. In measurements involving rotation about an axis, high-precision measurements can be performed without adjustment based on the RxRy accessory device.

[0103] The input unit 41 receives the input of tilt information indicating the tilt of the sample with respect to the axis. The tilt information is information indicating the direction of the sample surface normal with respect to a specific value on the axis or information equivalent thereto, and is also information equivalent to the prior adjustment amount of RxRy. As will be described later, it can be information on the peak positions of ω scans at respective angles of 90° and 180°. The information on the peak positions can be automatically input based on the data detected by the X-ray diffraction apparatus 30, or can be input by an operator. The adjustment amount determination unit 43 uses the tilt information to determine the adjustment amounts of the ω value and the χ value for correcting the deviation amount between the sample surface normal or the lattice plane normal and the scattering vector with respect to the changing

[0104] value. The storage unit 45 stores calculation formulas or tables for determining the adjustment amounts. The adjustment amount determination unit 43 can determine the adjustment amounts of the ω value and the χ value for each measurement position of the XY stage mounted on the goniometer 8. Thereby, it is possible to perform prior position adjustment of the sample based on the XY stage and perform measurements involving rotation about the axis, and it is also possible to perform in-plane mapping. In measurements involving rotation about an axis, high-precision measurements can be performed without adjustment based on the RxRy accessory device.

[0105] The adjustment amount determination unit 43 can determine the adjustment amounts of the ω value and the χ value for correcting the deviation amount between the sample surface normal or the lattice plane normal and the scattering vector based on the stored calculation formula and the tilt information. In this way, by using the calculation formula, the goniometer can be flexibly driven according to individual situations.

[0106] In addition, based on the tilt information, table selection for determining the correspondence relationship between the adjustment values of the ω value and the χ value with respect to the changing value is performed, and the adjustment values of the ω value and the χ value are determined using the correspondence relationship of the selected table. By using the table in this way, the processing amount can be reduced, and simple and quick response becomes possible.

[0107] The deviation angle calculation unit 46 calculates the deviation angle between the outer surface of the specimen and the lattice plane based on the ω value and the adjustment amount of the χ value. The calculated deviation angle is used for analysis and is displayed via a display or the like. Thus, for example, by comparing the adjustment amounts of the ω value and the χ value corresponding to the values of the Rx axis and the Ry axis, it is possible to analyze, for example, the deviation angle of the substrate surface, the angular amount of the deviation angle between the orientation of the substrate and the epitaxial growth film, and their deviation orientations. In addition, the deviation angle of the substrate surface is the deviation angle caused by the inconsistency between the substrate surface and the substrate lattice plane, and the deviation angle between the orientation of the substrate and the epitaxial growth film is the deviation angle caused by the inconsistency between the substrate crystal plane and the film crystal plane.

[0108] During X-ray diffraction measurement, the drive instruction unit 47 drives the goniometer based on the determined ω value and the adjustment amount of the χ value and according to the rotation of the specimen around the axis. Thereby, it is possible to convert the adjustment angle for correcting the deviation amount between the specimen surface normal or the lattice plane normal and the scattering vector from the axis rotation into the adjustment amounts of independent ω value and χ value so as not to be affected by the axis rotation. As a result, it is possible to perform measurement accompanied by axis rotation without placing an RxRy attachment on the specimen stage to adjust the tilt of the specimen. In addition, it is also possible to perform highly accurate adjustment of the tilt of the specimen.

[0109] In addition, on the specimen surface, making the specimen surface normal (specimen system) coincide with the scattering vector (apparatus system) under the total reflection condition is equivalent to correcting the deviation amount. Further, on the lattice plane, making the lattice plane normal (specimen system) coincide with the scattering vector (apparatus system) under the diffraction condition is equivalent to correcting the deviation amount.

[0110] As a result, it is possible to perform measurement accompanied by axis rotation without placing an RxRy attachment on the specimen plate to adjust the tilt of the specimen. In addition, it is also possible to combine with other attachments such as an XY stage, a temperature adjustment mechanism, or an XY stage with a temperature adjustment mechanism.

[0111] The drive instruction unit 47 gives an instruction to drive the XY stage placed on the goniometer. And for each measurement position of the XY stage, it gives an instruction to drive the goniometer based on the determined adjustment amount and according to the rotation of the specimen around the axis. It is possible to perform measurement by first adjusting the position of the specimen based on the XY stage, which is impossible in the case of adjusting the tilt of the specimen using an RxRy attachment.

[0112] Preferably, the drive indicator unit 47 drives the goniometer using three or more rotation axes that can be driven simultaneously. By using three or more rotation axes of the goniometer that can be driven simultaneously, the inclination of the specimen can be adjusted using the goniometer and measurements accompanied by axis rotation can be performed.

[0113] [Method of X-ray diffraction measurement]

[0114] Figure 5 is a flowchart showing the method of X-ray diffraction measurement of the present invention. As a preliminary preparation, the measurement method and measurement conditions of this measurement are set. At this time, the optical system of the measurement method is switched as needed to perform optical system adjustment. Through these operations, the initial values (ω0, χ0) before correction are determined.

[0115] As Figure 5 shown, first, for specimens such as epitaxial thin films and single crystals, the specimen S0 is set on the specimen plate 18 of the X-ray diffractometer 30 (step S1). And, the position of for ω scan, etc., and information for preliminary measurement are input (step S2). In order to obtain the inclination information of the specimen S0, preliminary measurement is performed (step S3). Specifically, as the inclination information, the inclination α and azimuth β of the specimen with respect to the axis are obtained. The details of the preliminary measurement will be described later.

[0116] The inclination information of the specimen S0 obtained through the preliminary measurement is input to the control device 40. The control device 40 reads out the calculation formula from the storage unit 45 and uses the read calculation formula to calculate the adjustment amounts of the ω value and the χ value with respect to the value (step S4). Alternatively, instead of steps S2 to S4, the adjustment amount may be directly manually input. The details of the calculation of the adjustment amount will be described later. The obtained adjustment amount is saved as a table together with the calculation formula for driving or the drive control value calculated based on the adjustment amount (step S5). The details of the calculation of the drive control value will be described later. Then, the virtual RxRy or the inclination angle and the azimuth angle are displayed (step S6).

[0117] Next, if the preparation is completed, the operator inputs an instruction to start the measurement. The control device 40 receives the instruction to start the measurement (step S7), and reads out the calculation formula or table for driving saved in step S5 (step S8). Then, control such as irradiation of X-rays by the X-ray diffractometer 30 (step S9), simultaneous control of the drive shaft, and detection of X-rays is performed (step S10), and the measurement is ended after the drive shaft is driven within the desired range. At this time, the drive control value obtained in step S5 above is used for the simultaneous control of the drive shaft during the measurement. In the above example, the drive control is performed after the calculation, but the calculation and the drive control may be performed simultaneously in parallel. In addition, the irradiation of X-rays and the simultaneous control of the drive shaft in steps S9 and S10 may be exchanged. That is, when the present invention is applied during the sample position adjustment, if it is rotated to the peak position of interest before the X-ray irradiation, the X-ray irradiation is performed after the simultaneous control of the drive shaft to perform the measurement.

[0118] [Pre-measurement and calculation of adjustment amount]

[0119] Figure 6A , Figure 6B are flowcharts showing an example of the operation of calculating the pre-measurement and the adjustment amount, respectively. They respectively correspond to Figure 5 steps S2 and S5 of the flowchart, and return to the original flowchart by ending. As Figure 6A shown, in the pre-measurement, first, an ω scan is performed at to obtain the peak position ω = P1 (step S31). Next, an ω scan is performed at to obtain the peak position ω = P2 (step S32). Then, an ω scan is performed at to obtain the peak position ω = P3 (step S33). If the acquisition of each peak position is completed, the pre-measurement is ended.

[0120] In addition, at this time, depending on which deviation amount of the sample surface normal or the lattice plane normal is adjusted, the peak to be scanned is different. In the case of the sample surface normal, the total reflection condition is set. For example, for a high-density film, 2θ = 0.8° is set, and the peak position of the total reflection intensity is obtained. In addition, in the case of the lattice plane normal, the diffraction condition of the symmetry plane of the film and the substrate is set. For example, for a Si substrate, 2θ = 69.13° (Si004) is set, and the peak position of the diffraction intensity is obtained.

[0121] In addition, the position of where the ω scan is performed is not necessarily limited to 0°, 90°, and 180°, as long as the ω scan can be performed at three positions every 90°. For example, positions shifted by 10° may be used as a reference, and the ω scan may be performed at The positions are 10°, 100°, and 190°.

[0122] The data obtained as described above are used for calculating the adjustment amount. As Figure 6B shown, when calculating the adjustment amount, the offset values of ω and χ corresponding to the value are calculated. First, calculate the center of P1 and P3 as shown in the following calculation formula (1) (Step S41).

[0123] ω(φ) = ((P1 + P3) / 2)…(1)

[0124] Then, using the calculation formula (2), calculate the inclination α and azimuth β of the specimen with respect to the axis (Step S42).

[0125]

[0126] The obtained inclination α and azimuth β are input to the control device 40. The control device 40 reads out the calculation formula (3) stored in the storage unit 45, stores the adjustment amount calculation formula obtained by substituting the values of α and β calculated using the calculation formula (2) as the adjustment amount used in this measurement (Step S43), and ends the process of calculating the adjustment amount. In addition, when the inclination α and azimuth β are prepared in advance, steps S2 to S42 can be omitted, and the inclination α and azimuth β can be directly input to the control device 40 instead.

[0127] Δω = α·Cos(β - φ)

[0128] Δχ = α·Sin(β - φ)…(3)

[0129] Figure 7 is a graph showing the adjustment amounts of the ω value and the χ value with respect to the value. Figure 7 is a graph showing the results of the calculation formula (3) when α = 1 and β = 0°. Since ω and χ are in an orthogonal relationship, as Figure 7 shown, with respect to the change in the value, the adjustment amount Δχ lags behind the adjustment amount Δω by 90° in phase. For example, when the surface normal of the specimen is inclined with respect to the axis, the relationship between the rotation and the peak position of the rocking curve can be represented by a Sin curve.

[0130] In addition, in the above prior measurement, the positions of the where ω scanning is performed are set to three places, but ω scanning can also be performed at each arbitrary angle of the , and for each Obtain the peak at the position. Subtract the value used as a reference from the separately obtained peaks to calculate the adjustment amounts Δ respectively. ω For example, when 2θ = 0.5° and ω is scanned every 15°, the value used as a reference is ω = 2θ / 2 = 0.25°. The value obtained by subtracting 0.25° from all the obtained peaks is the adjustment amount (Δω). Set the Δω value of as Δχ, and apply the corresponding Δω to Δχ. It is also possible to use the table summarized in this way as the adjustment amount. If the prior measurement is completed, the table is automatically generated. In the case where a table in the same form is prepared in advance, steps S2 to S4 are omitted, and it is possible to directly input to the control device 40 instead.

[0131] The obtained adjustment amount is transformed into a drive control value based on the initial value before correction and saved. The control device 40 reads out the calculation formula (4) stored in the storage unit 45 and saves the calculation formula of the adjustment amount substituting the input ω0 and χ0 values as the drive control value used in this measurement. Based on the measurement method and measurement conditions of this measurement and the result of the optical system adjustment, determine the values of ω0 and χ0. For example, in the case of in-plane measurement as the measurement method and setting the incident angle ω = 0.5° for the measurement conditions, the calculation formula obtained by substituting 0.5 for the ω0 value in the calculation formula (4) becomes the drive control value. Figure 2 In the structure of the five-axis goniometer 8 shown in

[0132] ω = ω0 + Δω

[0133] χ = χ0 + Δχ…(4)

[0134] Next, repeatedly calculate ω and χ and perform the rotational drive. The calculation of ω and χ uses the calculation formula of the adjustment amount obtained by substituting the values of ω0 and χ0 into the calculation formula (4). For example, when setting the step at the time of measurement as 0.1° as the measurement condition, the rotation is performed in steps of 0.05°. The drive control value at the start of control is calculated as the drive start position of the rotation. After that, using the value increasing by 0.05° each time, calculate the values of ω and χ. For each For the steps, the calculation of the drive control value and the simultaneous control are repeatedly performed.

[0135] In the case of using a table stored in another form measured in advance, based on the adjustment amounts (Δω, Δχ) with respect to the control drive values (ω, χ) are calculated using the calculation formula (4), and the calculated values are transcribed and stored in the table. Figure 8 It is a table showing the adjustment amounts Δω and Δχ with respect to the value and the drive control values ω, χ. In the case of using a table, the value corresponding to the drive start position of the rotation and the ω value and χ value of the corresponding drive control value are used as the drive start values, and the control is performed by referring to the drive control values in the table. In addition, when the step of the drive is finer than the step of the table, the value obtained by linearly interpolating the values between two points can be calculated and used.

[0136] In addition, electricity can be transformed into a table form according to the adjustment amount calculation formula obtained by substituting the values of ω0 and χ0 into the adjustment amount calculation formula (4). In this case, the table transcribed with the control drive values calculated at any step is saved. By calculating all the control drive values in advance, the calculation cost during control is not wasted, so the throughput during control is improved.

[0137] [Example 1]

[0138] (Reciprocal space mapping measurement)

[0139] For a single crystal substrate or a single crystal thin film (epitaxial thin film) formed thereon, its lattice constant and strain state are evaluated. These evaluations are performed by the reciprocal lattice map of the lattice plane (asymmetric plane) inclined from the lattice plane (symmetric plane) close to the film thickness direction.

[0140] Before the measurement, it is necessary to pre-adjust the in-plane rotation and tilt of the lattice plane of the measurement object. When evaluating the degree of tilt from the symmetric plane, after adjusting the height of the sample by the general adjustment sequence, it is necessary to perform the adjustment in the order of adjusting the rotation direction of the asymmetric plane ( scanning), adjusting the tilt and skew with respect to the surface of the symmetric plane (ω scanning and χ scanning), and adjusting the tilt of the asymmetric plane with respect to the symmetric plane again (ω scanning). In addition, in order to perform reciprocal lattice map measurement for multiple asymmetric planes, this operation needs to be performed for each measurement plane. The implementation of the present invention can simplify these operations.

[0141] As an example, the sequence of reciprocal lattice mapping around GaN(11-24) of a GaN epitaxial film grown in the c-axis direction with respect to the film thickness direction will be described.

[0142] First, in order to perform reciprocal lattice mapping of the asymmetric plane in advance, the measurement configuration for GaN(11-24) (ω0: 89.09°, 2θ: 99.9) is set. Next, a GaN epitaxial film is set on the sample plate, and the height of the sample is adjusted (corresponding to step S1). Then, a preliminary measurement using the peak of the symmetric plane GaN(0002) is performed (corresponding to steps S2 and S3), and the tilt angle α and azimuth (azimuth angle) β of the c-axis of GaN with respect to the axis are obtained. After that, based on the obtained tilt angle α and azimuth (azimuth angle) β, the adjustment amounts of the ω value and χ value with respect to the value are calculated (corresponding to step S4).

[0143] Next, the control drive value obtained based on the reference incident angle ω0 in the measurement configuration of GaN(11-24) is saved (corresponding to step S5). At this time, the virtual RxRy or the tilt angle and azimuth angle can be displayed (corresponding to step S6). Then, an instruction to move to the measurement configuration of GaN(11-24) and perform adjustment is given (corresponding to step S7). Next, the saved calculation formula is read out (corresponding to step S8). Then, while the sample is rotated about the axis until the measurement configuration is reached, simultaneous control of the drive axis is performed. X-ray irradiation is performed and adjustment is made, and simultaneous control of the drive axis is performed during the adjustment of the rotation direction of the asymmetric plane ( scanning) (corresponding to steps S9 and S10). When the adjustment is completed, reciprocal lattice mapping around GaN(11-24) is started.

[0144] After that, in order to measure other asymmetric planes, only the measurement configuration of the measurement target asymmetric plane needs to be set, and the control drive value can be updated. At this time, if the position of GaN(11-24) determined as described above is used to relatively determine then the adjustment can also be omitted. For example, in order to perform the measurement of GaN(10-15) in the direction of a 30° in-plane rotation from GaN(11-24), the value obtained by relatively moving the of GaN(11-24) adjusted as described above by 30° is set as the measurement configuration of GaN(10-15) ( Adjustment values: +30°, ω0: 73.08°, 2θ: 105.01°). Since moving according to the updated control drive value enables movement to a position where the deviation is corrected, measurement can be started more simply compared to the general adjustment sequence.

[0145] In the above example, the present invention is applied to the adjustment of the reciprocal lattice map measurement of the asymmetric plane. However, it can also be similarly applied to the adjustment of the out-of-plane diffraction measurement (2θ / ω scan), rocking curve measurement (ω scan), and reciprocal lattice map measurement under the symmetric plane of the asymmetric plane.

[0146] [Example 2]

[0147] (Applicable to the rocking curve measurement of the in-plane axis)

[0148] In a goniometer equipped with an in-plane axis, by measuring the orientation of the lattice plane in the in-plane direction of the sample surface of a single crystal thin film, the shape of the sample and the in-plane crystallographic orientation with respect to the crystallographic orientation of the substrate can be evaluated. In the rocking curve measurement using the in-plane axis, by controlling the incident angle with respect to the sample surface, the penetration depth of the irradiated X-ray with respect to the sample can be controlled.

[0149] In the evaluation of the in-plane crystallographic orientation, in-plane rotation of the sample ( scanning) is performed. However, during the measurement, control of the incident angle of the X-ray on the sample and the tilt of the sample accompanying the movement can be carried out so that the incident angle does not change as in the case where the sample surface is tilted as Figure 1A such. The evaluation of the crystallographic orientation of c-axis grown GaN(1-100) based on the present invention can be carried out in the following order. Figure 1B First, to perform the rocking curve measurement of GaN(1-100) (

[0150] scanning), set the measurement configuration of GaN(1-100) (incident angle ω0: 0.5 deg, 2θχ: 32.5 deg). Next, set the GaN epitaxial thin film on the sample plate and adjust the height of the sample (corresponding to step S1). Then, perform a preliminary measurement using the total reflection of the incident X-ray on the GaN surface (corresponding to steps S2 and S3). Through this preliminary measurement, obtain the tilt angle α and azimuth (azimuth angle) β of the sample surface normal with respect to the axis. Based on the obtained tilt angle α and azimuth (azimuth angle) β, calculate the ω value and χ value with respect to the axis. The adjustment amount of the value (corresponding to step S4). Using the calculated adjustment amount, calculate and save the control drive value with respect to the incident angle ω0 (corresponding to step S5). At this time, the virtual RxRy or the tilt angle and the azimuth angle can be displayed (corresponding to step S6).

[0151] Next, an instruction to move to the measurement configuration of GaN(1-100) and perform a rocking curve measurement is given (corresponding to step S7). In response to the instruction, the saved calculation formula is read out (corresponding to step S8). Then, X-ray irradiation is performed, and simultaneous control of the drive axis is performed during the scan (corresponding to steps S9 and S10). In this way, the orientation of GaN(1-100) with respect to the sample shape can be determined based on the obtained peak position.

[0152] In the above example, the invention is applied in the rocking curve measurement ( scan) during the in-plane diffraction measurement, but it can also be applied in the in-plane measurement ( scan) where 2θχ and are scanned simultaneously at a relative speed of 2:1, and in the pole measurement of the in-plane axis where the configuration of the goniometer is changed while performing scan.

Claims

1. A control device for controlling the posture of a specimen, characterized in that, When the φ value is the rotation angle of the specimen, the ω value is the incident angle of the X-ray, and the χ value is the tilt angle of the specimen, the following are provided: An input unit that receives the input of tilt information indicating the tilt of the specimen with respect to the φ axis; An adjustment amount determination unit that uses the tilt information to determine the adjustment amounts of the ω value and the χ value for correcting the deviation amount between the specimen surface normal or the lattice plane normal and the scattering vector with respect to the changing φ value; And A drive instruction unit that, during X-ray diffraction measurement, drives the goniometer in accordance with the rotation of the φ axis of the specimen based on the determined adjustment amounts of the ω value and the χ value, During the X-ray diffraction measurement, as the φ axis rotates, the X-ray diffraction apparatus is rotated about the ω axis and the χ axis based on the adjustment amounts of the ω value and the χ value, and is driven while making the specimen surface normal or the lattice plane normal coincide with the scattering vector, The φ axis is the axis center line of the specimen support member, the ω axis is an axis extending in the horizontal direction, and the χ axis is an axis extending in the horizontal direction and perpendicular to the ω axis.

2. The control device according to claim 1, wherein The goniometer has three or more rotation axes that can be driven simultaneously, The drive instruction unit drives the goniometer using the three or more rotation axes.

3. The control device according to claim 2, wherein The three or more rotation axes include the φ axis, the χ axis, and the ω axis.

4. The control device according to claim 3, wherein The ω axis is controlled by combining the θs axis and the θd axis as two drive axes, The θs axis is a rotation axis for controlling the incident angle of the X-ray, The θd axis is a rotation axis for controlling the light-receiving angle of the X-ray.

5. The control device according to any one of claims 1 to 4, wherein The control device further includes: a storage unit that stores the adjustment amounts of the ω value and the χ value with respect to the changing φ value as calculation formulas for use during driving, The drive instruction unit drives the goniometer based on the stored calculation formulas for use during driving.

6. The control device according to any one of claims 1 to 4, wherein The control device further includes: a storage unit that stores the correspondence relationship between the adjustment values of the ω value and the χ value with respect to the changing φ value as a table based on the tilt information, The adjustment amount determination unit determines the adjustment values of the ω value and the χ value based on the stored correspondence relationship of the table.

7. The control device according to any one of claims 1 to 4, wherein The control device further includes: an offset angle calculation unit that calculates the offset angle between the outer surface of the specimen and the lattice plane based on the adjustment amounts of the ω value and the χ value.

8. The control device according to any one of claims 1 to 4, wherein The X-ray diffraction measurement is in-plane measurement, in-plane pole measurement, rocking curve measurement, out-of-plane measurement, or reciprocal lattice mapping measurement.

9. The control device according to any one of claims 1 to 4, wherein The adjustment amount determination unit determines the adjustment amounts of the ω value and the χ value for each measurement position of the XY stage placed on the goniometer. The drive instruction unit gives an instruction to drive the goniometer based on the determined adjustment amounts for each measurement position of the XY stage and corresponding to the rotation of the φ axis of the specimen.

10. A system, characterized in that, Comprising: The control device according to any one of claims 1 to 4; and An X-ray diffractometer that constitutes an optical system for making X-rays incident on the specimen and detecting diffracted X-rays generated from the specimen, and having a goniometer in the optical system. The goniometer has three or more rotatable axes that can be driven simultaneously and is driven by an instruction from the control device.

11. A method for controlling the posture of a specimen, characterized in that, When the φ value is the specimen rotation angle, the ω value is the X-ray incident angle, and the χ value is the specimen tilt angle, it includes: A step of receiving an input of tilt information indicating the tilt of the specimen with respect to the φ axis; A step of using the tilt information to determine the adjustment amounts of the ω value and the χ value for correcting the deviation amount between the specimen surface normal or lattice plane normal and the scattering vector with respect to the changing φ value; and A step of driving the goniometer corresponding to the rotation of the φ axis of the specimen based on the determined adjustment amounts of the ω value and the χ value during X-ray diffraction measurement. During the X-ray diffraction measurement, as the φ axis rotates, the X-ray diffractometer is rotated about the ω axis and the χ axis based on the adjustment amounts of the ω value and the χ value, and is driven while making the specimen surface normal or lattice plane normal coincide with the scattering vector. The φ axis is the axis center line of the specimen support member, the ω axis is an axis extending in the horizontal direction, and the χ axis is an axis extending in the horizontal direction and perpendicular to the ω axis.

12. A recording medium, which is a computer-readable and non-transitory recording medium for recording a program, is characterized in that, The program is a program for controlling the posture of the specimen. When the φ value is the specimen rotation angle, the ω value is the X-ray incident angle, and the χ value is the specimen tilt angle, the program causes the computer to execute the following processing: A process of receiving an input of tilt information indicating the tilt of the specimen with respect to the φ axis; A process of using the tilt information to determine the adjustment amounts of the ω value and the χ value for correcting the deviation amount between the specimen surface normal or lattice plane normal and the scattering vector with respect to the changing φ value; And A process of driving the goniometer corresponding to the rotation of the φ axis of the specimen based on the determined adjustment amounts of the ω value and the χ value during X-ray diffraction measurement. During the X-ray diffraction measurement, as the φ axis rotates, the X-ray diffractometer is rotated about the ω axis and the χ axis based on the adjustment amounts of the ω value and the χ value, and is driven while making the specimen surface normal or lattice plane normal coincide with the scattering vector. The φ axis is the axis center line of the specimen support member, the ω axis is an axis extending in the horizontal direction, and the χ axis is an axis extending in the horizontal direction and perpendicular to the ω axis.

Images