Display device

Abstract

A display device is provided. According to one embodiment of the present invention, the display device includes: a fingerprint sensor layer that receives light reflected from an external object; a substrate disposed on the fingerprint sensor layer; an optical pattern layer disposed on the substrate and including a light-blocking portion and a light-transmitting portion extending through the light-blocking portion in one direction; a first light-transmitting layer disposed on the light-blocking portion and having a first refractive index; a second light-transmitting layer disposed on the first light-transmitting layer and having a second refractive index different from the first refractive index; and a light-emitting element layer disposed on the second light-transmitting layer.

Description

Technical Field

[0001] The present invention relates to a display device and a method for manufacturing the display device, and more particularly to a display device including a fingerprint recognition sensor and a method for manufacturing the display device. Background Art

[0002] With the development of the information society, the demand for display devices for displaying images is increasing in various forms. For example, display devices are being used in a variety of electronic devices such as smartphones, digital cameras, laptops, navigation systems, and smart TVs. Display devices can be flat panel display devices such as liquid crystal display devices (LCDs), field emission display devices (FETDs), and organic light emitting display devices (OLEDDs).

[0003] Organic light-emitting diodes (OLEDs) display images using organic light-emitting diodes (OLEDs) that generate light through the recombination of electrons and holes. These devices offer advantages such as faster response times, greater brightness and viewing angles, and lower power consumption.

[0004] Recently, research and development are underway on technologies for integrating a fingerprint recognition sensor into a display panel, which occupies the largest area in a display device. Summary of the Invention

[0005] The technical problem to be solved by the present invention is to provide a display device with enhanced light transmittance and improved fingerprint recognition performance, and a method for manufacturing the display device.

[0006] The technical problems to be solved by the present invention are not limited to the technical problems mentioned above, and other technical problems not mentioned can be clearly understood by those skilled in the art through the following description.

[0007] A display device according to an embodiment of the present invention for solving the above-mentioned technical problems includes: a fingerprint sensor layer for receiving light reflected from an external object; a substrate arranged on the fingerprint sensor layer; an optical pattern layer arranged on the substrate and including a light-blocking portion and a light-transmitting portion extending through the light-blocking portion in one direction; a first light-transmitting layer arranged on the light-blocking portion and having a first refractive index; a second light-transmitting layer arranged on the first light-transmitting layer and having a second refractive index different from the first refractive index; and a light-emitting element layer arranged on the second light-transmitting layer.

[0008] The first light-transmitting layer may include an opening overlapping the light-transmitting portion, and the second light-transmitting layer may fill the opening of the first light-transmitting layer and the light-transmitting portion.

[0009] The first refractive index may be greater than the second refractive index.

[0010] The first light-transmitting layer may include at least one of an inorganic material layer and an organic material layer, wherein the inorganic material layer may include silicon nitride (SiN x ), silicon oxynitride (SiON), silicon oxide (SiO x ), titanium oxide (TiO x ) and aluminum oxide (AlO x ), and the organic substance layer includes inorganic particles composed of the above-mentioned inorganic material.

[0011] The second light-transmitting layer may include a transparent organic substance.

[0012] The refractive index ratio of the first light-transmitting layer and the second light-transmitting layer is less than or equal to 0.9775.

[0013] The light blocking portion may include at least one of an organic light blocking material and a metal light blocking material.

[0014] The display device may further include: a lens layer, arranged between the second light-transmitting layer and the light-emitting element layer, and having an inclined surface, wherein the inclined surface of the lens layer may overlap with the light-blocking portion along the one direction, and light reflected from the external object and incident on the inclined surface may be refracted toward the light-transmitting portion.

[0015] The display device may further include: a first lens layer, arranged between the substrate and the optical pattern layer, and having a first inclined surface, wherein the fingerprint sensor layer may include a plurality of light receiving elements including a light receiving layer, and the first inclined surface may overlap with an area between the light receiving layers included in the plurality of light receiving elements along the one direction, and light incident on the first inclined surface among the light passing through the light-transmitting portion is refracted toward the side of the light receiving layer included in at least one of the plurality of light receiving elements.

[0016] The display device may further include: a second lens layer, arranged between the second light-transmitting layer and the light-emitting element layer, and having a second inclined surface, wherein the second inclined surface of the second lens layer can overlap with the light-blocking portion along the one direction, and light reflected from the external object and incident on the second inclined surface is refracted toward the light-transmitting portion side.

[0017] A display device according to another embodiment for solving the above technical problem includes: a fingerprint sensor layer that receives light reflected from an external object; a substrate arranged on the fingerprint sensor layer; an optical pattern layer arranged on the substrate and including a light-blocking portion and a light-transmitting portion that penetrates the light-blocking portion in one direction; a light-emitting element layer arranged on the optical pattern layer; a first lens layer arranged at one of the positions between the optical pattern layer and the light-emitting element layer and between the optical pattern layer and the substrate, and having a first refractive index; and a planarization layer arranged on the first lens layer and having a second refractive index that is smaller than the first refractive index, wherein the first lens layer includes a first inclined surface.

[0018] The first lens layer may include an upper surface and a lower surface parallel to the upper surface, the first inclined surface may be located between the upper surface and the lower surface, and the angle formed by the first inclined surface and the lower surface may be an acute angle.

[0019] The first lens layer can be arranged on the upper part of the optical pattern layer, the first inclined surface of the first lens layer can overlap with the light-blocking portion along the one direction, and the light reflected from the external object and incident on the first inclined surface of the first lens layer can be refracted toward the light-transmitting portion side.

[0020] The first lens layer can be arranged at the bottom of the optical pattern layer, the fingerprint sensor layer can include a plurality of light receiving elements including a light receiving layer, the first inclined surface of the first lens layer can overlap with the area between the light receiving layers included in the plurality of light receiving elements along the one direction, and the light incident toward the first inclined surface among the light passing through the light-transmitting portion can be refracted toward the side of the light receiving layer included in at least one of the plurality of light receiving elements.

[0021] The display device may further include: a second lens layer, arranged between the optical pattern layer and the light-emitting element layer, and including a second inclined surface, wherein the second inclined surface of the second lens layer can overlap with the light-blocking portion along the one direction, and light reflected from the external object and incident toward the second inclined surface can be refracted toward the light-transmitting portion side.

[0022] According to an embodiment of the present invention, a method for manufacturing a display device for solving the above-mentioned technical problem includes the following steps: arranging an optical pattern layer, a first light-transmitting layer and a second light-transmitting layer on a substrate; arranging a display panel on the second light-transmitting layer; and arranging a fingerprint sensor layer on the lower part of the substrate, wherein the steps of arranging the optical pattern layer, the first light-transmitting layer and the second light-transmitting layer include the following steps: forming a light-blocking material layer on the substrate; forming the first light-transmitting layer on the light-blocking material layer; using the first light-transmitting layer as a mask and etching the light-blocking material layer to form a light-blocking portion and a light-transmitting portion; and forming the second light-transmitting layer on the substrate in a manner of filling the light-transmitting portion and covering the first light-transmitting layer.

[0023] The refractive index of the first light-transmitting layer may be greater than the refractive index of the second light-transmitting layer.

[0024] The first light-transmitting layer may include at least one of an inorganic material layer and an organic material layer, wherein the inorganic material layer may include silicon nitride (SiN x ), silicon oxynitride (SiON), silicon oxide (SiO x ), titanium oxide (TiO x ) and aluminum oxide (AlO x ), and the organic substance layer includes inorganic particles composed of the above-mentioned inorganic material.

[0025] The second light-transmitting layer may include a transparent organic substance.

[0026] The light blocking portion may include at least one of an organic light blocking material and a metal light blocking material.

[0027] Specific details of other embodiments are included in the detailed description and drawings.

[0028] In a display device and method for manufacturing the display device according to an embodiment of the present invention, a refractive pattern layer is formed on top of the optical pattern layer, thereby maintaining the same light and dark cutoff angles while increasing light transmittance toward the light-receiving element. This improves the fingerprint recognition performance of a display device including a fingerprint recognition sensor.

[0029] Furthermore, in the display device and method for manufacturing the display device according to embodiments of the present invention, a refractive pattern layer including a lens layer is formed above or below the optical pattern layer, thereby improving the light-receiving efficiency of the light-receiving element. This can further improve the fingerprint recognition performance of a display device including a fingerprint recognition sensor.

[0030] The effects according to the embodiment are not limited to the above-described examples, and more various effects are included in this specification. BRIEF DESCRIPTION OF THE DRAWINGS

[0031] Figure 1 is a plan view of a display device according to an embodiment.

[0032] Figure 2 is a cross-sectional view of a display device according to an embodiment.

[0033] Figure 3 is a perspective view illustrating a path of reflected light in a display device according to an embodiment.

[0034] Figure 4 FIG. 1 is a diagram illustrating a fingerprint pixel and a sensor pixel of a display device according to an embodiment.

[0035] Figure 5 FIG. 1 is a plan view showing an example of an optical pattern layer of a display device according to an embodiment.

[0036] Figure 6 FIG. 1 is a plan view showing another example of an optical pattern layer of a display device according to an embodiment.

[0037] Figure 7 FIG. 1 is a diagram illustrating a connection relationship between sub-pixels and lines of a display device according to an embodiment.

[0038] Figure 8 FIG. 1 is a diagram illustrating a connection relationship between a fingerprint sensor and lines of a display device according to an embodiment.

[0039] Figure 9 FIG. 1 is a diagram illustrating a connection relationship between switching transistors and lines of a display device according to an embodiment.

[0040] Figure 10 A block diagram schematically shows a display device according to an embodiment.

[0041] Figure 11 FIG. 4 is a cross-sectional view illustrating a fingerprint sensor layer of a display device according to an embodiment.

[0042] Figure 12 is a cross-sectional view showing in detail a display device according to an embodiment.

[0043] Figure 13 is a cross-sectional view of a display device according to an embodiment, and is a cross-sectional view showing in detail an optical pattern layer and a refractive pattern layer of the display device according to an embodiment.

[0044] Figure 14 is Figure 13 A modification of the structure shown.

[0045] Figure 15is a cross-sectional view of a display device according to another embodiment, and is a cross-sectional view showing in detail an optical pattern layer and a refractive pattern layer of the display device according to another embodiment.

[0046] Figure 16 is Figure 15 A modification of the structure shown.

[0047] Figure 17 is a cross-sectional view of a display device according to yet another embodiment, and in particular, is a cross-sectional view showing in detail an optical pattern layer and a refractive pattern layer of the display device according to yet another embodiment.

[0048] Figures 18 to 21 is a cross-sectional view of a display device according to various embodiments.

[0049] Figures 22 to 25 4 are cross-sectional views illustrating process steps of a method for manufacturing a display device according to an embodiment. DETAILED DESCRIPTION

[0050] If you refer to the attached Figure 1 The advantages, features, and methods for achieving the same will become apparent from the embodiments described in detail below. However, the present invention is not limited to the embodiments disclosed below and can be implemented in various different forms. The embodiments of the present invention are provided to complete the disclosure of the present invention and to fully inform those with ordinary knowledge in the technical field to which the present invention belongs. The present invention is limited only by the scope of the claims.

[0051] When an element or layer is described as being "on" another element or layer, it includes not only the situation where it is located immediately above another element or layer, but also the situation where other layers or other elements are interposed therebetween. Throughout the specification, the same reference numerals refer to the same constituent elements. The shapes, sizes, ratios, angles, quantities, etc. disclosed in the drawings used to illustrate the embodiments are exemplary and do not limit the present invention to the matters illustrated.

[0052] Although terms such as first and second are used to describe various components, these components are obviously not limited by these terms. The above terms are only used to distinguish one component from another component. Therefore, it is obvious that within the scope of the technical concept of the present invention, the first component mentioned below can also be the second component. As long as the different meanings are not clearly expressed in the context, the singular expression includes the plural expression. The same or similar reference numerals are used for the same components in the drawings.

[0053] Each feature of the multiple embodiments of the present invention can be combined or combined with each other partially or as a whole, and can achieve multiple technical linkages and drives. Moreover, the various embodiments can be implemented independently of each other, or can be implemented together in a related relationship.

[0054] Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings.

[0055] Figure 1 is a plan view of a display device according to an embodiment.

[0056] In this specification, "upper," "top," and "above" refer to the upper direction (i.e., the Z-axis direction) relative to the display device 10, and "lower," "bottom," and "below" refer to the lower direction (i.e., the direction opposite to the Z-axis direction) relative to the display device 10. Furthermore, "left," "right," "up," and "down" refer to directions when the display device 10 is viewed from a flat surface. For example, "left" refers to the direction opposite to the X-axis direction, "right" refers to the X-axis direction, "up" refers to the Y-axis direction, and "down" refers to the direction opposite to the Y-axis direction.

[0057] Reference Figure 1 The display device 10, as a device for displaying videos or static images, can be used not only as a display screen of portable electronic devices such as mobile phones, smart phones, tablet computers, smart watches, watch phones, mobile communication terminals, electronic notepads, electronic books, portable multimedia players (PMP: Portable Multimedia Player), navigators, and ultra-portable mobile personal computers (UMPC: Ultra Mobile PC), but can also be used as a display screen of various products such as televisions, notebook computers, monitors, billboards, and the Internet of Things (IOT: Internet of Things).

[0058] The display device 10 may include a first region DR1 and a second region DR2. The first region DR1 may be formed flat, and the second region DR2 may extend from the left and right sides of the first region DR1. For example, the second region DR2 may be formed flat or curved. If the second region DR is formed flat, the angle formed by the first region DR1 and the second region DR2 may be an obtuse angle. If the second region DR is formed as a curved surface, the second region DR2 may have a constant curvature or a varying curvature.

[0059] The second region DR2 may extend from both the left and right sides of the first region DR1, but is not limited thereto. For example, the second region DR2 may extend from only one of the left and right sides of the first region DR1. As another example, the second region DR2 may extend from not only the left and right sides of the first region DR1 but also at least one of the top and bottom sides.

[0060] The display device 10 includes a display panel 100 for displaying an image. The display panel 100 may include a display area DA and a non-display area NDA.

[0061] The display area DA, as an area for displaying images, may include multiple sub-pixels SP. Furthermore, the display area DA may be used as a detection component for detecting the external environment. For example, the display area DA may correspond to a fingerprint recognition area for identifying a user's fingerprint. Therefore, the display area DA may include multiple sub-pixels SP and multiple fingerprint sensors FPS. While displaying images, the display area DA may be used as an area for identifying a user's fingerprint. For example, the display panel 100 having multiple sub-pixels SP and the fingerprint sensor layer having multiple fingerprint sensors FPS may overlap along a third direction (the Z-axis direction).

[0062] The non-display area NDA may be defined as the remaining area of the display panel 100 except for the display area DA. For example, the non-display area NDA may include a scan driver for applying scan signals to scan lines, fan-out lines connecting data lines to the display driver, and pads connected to a circuit board.

[0063] For example, the non-display area NDA may be formed in an opaque form or as a decorative layer having a pattern visible to the user.

[0064] Figure 2 is a cross-sectional view of a display device according to an embodiment.

[0065] Reference Figure 2 , the display device 10 may include a first substrate SUB1, an optical pattern layer CML, a refraction pattern layer PTL, a display panel 100, a cover window CW, and a fingerprint sensor layer FPSL.

[0066] The first substrate SUB1 may be a base substrate and may be formed of an insulating material such as a polymer resin. For example, the first substrate SUB1 may be formed of polyethersulfone (PES), polyacrylate (PAC), polyarylate (PAR), polyetherimide (PEI), polyethylene naphthalate (PEN), polyethylene terephthalate (PET), polyphenylene sulfide (PPS), polyimide (PI), polycarbonate (PC), cellulose triacetate (CTA), cellulose acetate propionate (CAP), or a combination thereof.

[0067] For example, the first substrate SUB1 may be a flexible substrate capable of bending, folding, rolling, etc. When the first substrate SUB1 is a flexible substrate, it may be formed of polyimide (PI), but is not limited thereto.

[0068] An optical pattern layer CML can be disposed on the first substrate SUB1. The optical pattern layer CML can distinguish between light reflected from the ridges FR and light reflected from the valleys FV of the fingerprint of a user's finger F, and provide these light to separate light-receiving elements. To this end, the optical pattern layer CML can include a light-blocking portion BA and a plurality of light-transmitting portions TA extending through the light-blocking portion BA in one direction.

[0069] The light-blocking portion BA may include at least one of an organic light-blocking material and a metal light-blocking material. For example, the organic light-blocking material may include at least one of carbon black (CB) and titanium black (TiBK), but is not limited thereto. Furthermore, the metal light-blocking material may include at least one of chromium, chromium oxide, and chromium nitride, but is not limited thereto.

[0070] The plurality of light transmitting portions TA may be optical channels for second light L2 that travels toward the fingerprint sensor layer FPSL after first light L1 emitted from the light emitting element layer EML is reflected by the user's body.

[0071] The plurality of light-transmitting portions TA may not overlap with the plurality of thin-film transistors of the first thin-film transistor layer TFTL1, while the light-blocking portions BA may overlap with the plurality of thin-film transistors of the first thin-film transistor layer TFTL1. For example, the plurality of light-transmitting portions TA may be arranged along a first direction (X-axis direction) and a second direction (Y-axis direction). The size of each of the plurality of light-transmitting portions TA may be determined based on the path of the second light L2.

[0072] For detailed description of the light-blocking portion BA and the light-transmitting portion TA, please refer to Figures 3 to 6 And then describe it.

[0073] The refraction pattern layer PTL may be disposed on the optical pattern layer CML.

[0074] The refraction pattern layer (PTL) may be a layer that refracts at least a portion of the second light L2 traveling toward the fingerprint sensor layer FPSL to adjust the path of the second light L2. The refraction pattern layer (PTL) may include a first light-transmitting layer including a high-refractive-index material and a second light-transmitting layer including a low-refractive-index material.

[0075] The refractive pattern layer PTL can refract the second light L2 incident at an angle greater than a predetermined angle and cause it to travel toward the light-blocking portion BA. That is, the refractive pattern layer PTL can block the second light L2 incident at an angle greater than a predetermined angle from traveling toward the light-transmitting portion TA. The predetermined angle for blocking the travel toward the light-transmitting portion TA can vary depending on the height and refractive index ratio of the light-transmitting layer included in the refractive pattern layer PTL. For a detailed description of the refractive pattern layer PTL, please refer to Figure 13 And then describe it.

[0076] The display panel 100 may be disposed on the refraction pattern layer PTL.

[0077] The display panel 100 may include a backplane BP, a first thin film transistor layer TFTL1 , a light emitting element layer EML, a first thin film encapsulation layer TFEL1 , and a touch sensor layer TSL.

[0078] The back plate BP may be disposed on the refractive pattern layer PTL (or the optical pattern layer CML) to support the first thin film transistor layer TFTL1. For example, the back plate BP may be formed of an insulating material such as a polymer resin.

[0079] For example, the backplane BP may be a flexible substrate capable of bending, folding, rolling, etc. In the case where the backplane BP is a flexible substrate, it may be formed using polyimide (PI), but is not limited thereto.

[0080] The first thin film transistor layer TFTL1 may be disposed on the back panel BP and may include at least one thin film transistor for driving the plurality of sub-pixels SP, respectively.

[0081] The at least one thin film transistor of the sub-pixel SP may include a semiconductor layer, a gate electrode, a drain electrode, and a source electrode. For example, the first thin film transistor layer TFTL1 may further include a scan line connected to the at least one thin film transistor of the sub-pixel SP, a data line, a power line, a scan control line, and a routing line connecting the pad and the data line.

[0082] The light emitting element layer EML may be disposed on the first thin film transistor layer TFTL1. The light emitting element layer EML may include a light emitting element connected to at least one thin film transistor of the first thin film transistor layer TFTL.

[0083] The light-emitting element may include a first electrode, a light-emitting layer, and a second electrode. For example, the light-emitting layer may be an organic light-emitting layer formed using an organic substance, but the present invention is not limited thereto. In the case where the light-emitting layer corresponds to the organic light-emitting layer, if the thin film transistors of the first thin film transistor layer TFTL1 apply a predetermined voltage to the first electrode of the light-emitting element, and the second electrode of the light-emitting element receives a common voltage or a cathode voltage, holes and electrons may respectively move to the organic light-emitting layer through the hole transport layer and the electron transport layer, and the holes and electrons may combine with each other in the organic light-emitting layer to emit light.

[0084] The light emitting element layer EML may include a pixel definition film defining a plurality of sub-pixels SP. Adjacent light emitting layers 162 may be separated from each other by the pixel definition film 170 and may be insulated.

[0085] The first thin film encapsulation layer TFEL1 may be disposed on the light emitting element layer EML to cover the first thin film transistor layer TFTL1 and the light emitting element layer EML.

[0086] The first thin film encapsulation layer TFEL1 can prevent oxygen or moisture from penetrating into the light emitting element layer EML. To this end, the first thin film encapsulation layer TFEL1 may include at least one inorganic film. For example, the first thin film encapsulation layer TFEL1 may include a layer containing a silicon nitride (SiN x ), silicon oxynitride (SiON), silicon oxide (SiO x ), titanium oxide (TiO x ) or aluminum oxide (AlO x ) and other inorganic materials, but is not limited to these.

[0087] The first thin film encapsulation layer TFEL1 can protect the light emitting element layer EML from foreign matter such as dust. To this end, the first thin film encapsulation layer TFEL1 may include at least one organic film. The first thin film encapsulation layer TFEL1 may include an organic film such as acrylic resin, epoxy resin, phenolic resin, polyamide resin, or polyimide resin, but is not limited thereto.

[0088] The touch sensor layer TSL may be disposed on the upper portion of the first thin film encapsulation layer TFEL1. The touch sensor layer TSL is disposed directly on the upper portion of the first thin film encapsulation layer TFEL1, thereby reducing the thickness of the display device 10 compared to a case where a separate touch panel including the touch sensor layer TSL is attached to the first thin film encapsulation layer TFEL1.

[0089] The touch sensor layer TSL may include touch electrodes for sensing a user's touch and touch electrode lines connecting pads and the touch electrodes. The touch electrodes of the touch sensor layer TSL may be arranged in a touch sensing area overlapping the display area DA of the display panel 100.

[0090] A cover window CW may be disposed on the display panel 100 .

[0091] The cover window CW may be disposed on the touch sensor layer TSL of the display panel 100. For example, the cover window CW may be attached to the touch sensor layer TSL by a transparent adhesive member. The cover window CW may directly contact the user's finger F.

[0092] The fingerprint sensor layer FPSL may be disposed on the lower portion of the first substrate SUB1. The upper surface (or one side) of the first substrate SUB1 may face the optical pattern layer CML. The lower surface (or the other side) of the first substrate SUB1 may face the fingerprint sensor layer FPSL.

[0093] The top surface (or one side) of the fingerprint sensor layer FPSL can be attached to the bottom surface (or the other side) of the first substrate SUB1 by an adhesive member OCA. The adhesive member OCA can be an optical clear adhesive, but is not limited thereto.

[0094] The fingerprint sensor layer FPSL may include Figure 1 Multiple fingerprint sensor FPS shown.

[0095] The multiple fingerprint sensors FPS may be optical fingerprint sensors. For example, the multiple fingerprint sensors FPS may be formed using photodiodes, CMOS image sensors, CCD cameras, phototransistors, etc., but are not limited thereto.

[0096] The plurality of fingerprint sensors FPS may sense light reflected from the ridges FR and the valleys FV between the ridges FR of the fingerprint of the finger F to recognize the fingerprint.

[0097] For example, if a user's finger F touches the cover window CW, the first light L1 emitted by the light-emitting element layer EML is reflected by the ridges FR and valleys FV of the fingerprint of the finger F. The reflected second light L2 passes through the refraction pattern layer PTL and the light-transmitting portion TA of the optical pattern layer CML and reaches the fingerprint sensor layer FPSL disposed below the first substrate SUB1. The fingerprint sensor FPS of the fingerprint sensor layer FPSL can distinguish between the second light L2 reflected from the ridges FR of the fingerprint of the finger F and the second light L2 reflected from the valleys FV of the fingerprint of the finger F, thereby identifying the pattern of the user's fingerprint. Therefore, the light-transmitting portion TA of the optical pattern layer CML serves as a channel for the second light L2 reflected by the user's finger F.

[0098] In the display device 10, the fingerprint sensor layer FPSL can be arranged at the bottom of the display panel 100, so that the process can be simplified, and since the fingerprint sensor FPS is not arranged in the path of outputting the first light L1 (for example, above the light emitting element layer EML), the clarity can be prevented from being reduced.

[0099] The fingerprint sensor layer FPSL may include a second substrate SUB2 , a buffer layer 410 , a second thin film transistor layer TFTL2 , a light receiving element layer PDL, and a second thin film encapsulation layer TFEL2 .

[0100] The second substrate SUB2 can be a base substrate and can be formed of an insulating material such as a polymer resin. For example, the second substrate SUB2 can be a flexible substrate capable of bending, folding, and rolling. If the second substrate SUB2 is a flexible substrate, it can be formed of polyimide (PI), but is not limited to this.

[0101] The buffer layer 410 may be arranged on the second substrate SUB2. The buffer layer 410 may be formed using an inorganic film that can prevent air or moisture from penetrating. For example, the buffer layer 410 may be formed to include a material such as silicon nitride (SiN x ), silicon oxynitride (SiON), silicon oxide (SiOx ), titanium oxide (TiO x ) or aluminum oxide (AlO x ) etc., the inorganic films of inorganic materials are alternately stacked, but the invention is not limited thereto. According to the embodiment, the buffer layer 410 may also be omitted.

[0102] The second thin film transistor layer TFTL2 may be disposed on the second substrate SUB2 or the buffer layer 410. A lower surface of the second thin film transistor layer TFTL2 may face an upper surface of the buffer layer 410.

[0103] The second thin-film transistor layer TFTL2 may include at least one thin-film transistor that drives each of the multiple fingerprint sensors FPS. The at least one thin-film transistor of the fingerprint sensor FPS may include a semiconductor layer, a gate electrode, a drain electrode, and a source electrode. For example, the second thin-film transistor layer TFTL2 may also include a scan line, a lead line, and a common voltage line connected to the at least one thin-film transistor of the fingerprint sensor FPS.

[0104] The light receiving element layer PDL may be disposed on the second thin film transistor layer TFTL2 , and a lower surface of the light receiving element layer PDL may face an upper surface of the second thin film transistor layer TFTL2 .

[0105] The light-receiving element layer PDL may include a light-receiving element connected to at least one thin-film transistor of the second thin-film transistor layer TFTL2. The light-receiving element may include a first electrode, a light-receiving layer, and a second electrode. For example, the light-receiving layer may be an organic light-receiving layer formed using an organic material, but is not limited thereto. When the light-receiving layer corresponds to an organic light-receiving layer, the organic light-receiving layer may receive the second light L2 and combine holes and electrons, and may convert the energy of the second light L2 into an electrical signal (current or voltage) formed between the first electrode and the second electrode.

[0106] The light receiving element layer PDL may include a sensor definition film defining a plurality of fingerprint sensors FPS. The first electrode of the light receiving element and the light receiving layer may be separated and insulated from each other by the sensor definition film.

[0107] The second thin film encapsulation layer TFEL2 may be disposed on the light receiving element layer PDL, and a lower surface of the second thin film encapsulation layer TFEL2 may face an upper surface of the light receiving element layer PDL.

[0108] The second thin film encapsulation layer TFEL2 may cover the upper surface of the light receiving element layer PDL and may prevent oxygen or moisture from penetrating into the light receiving element layer PDL. For example, the second thin film encapsulation layer TFEL2 may include at least one inorganic film. The second thin film encapsulation layer TFEL2 may include a layer containing a silicon nitride (SiN x), silicon oxynitride (SiON), silicon oxide (SiO x ), titanium oxide (TiO x ) or aluminum oxide (AlO x ) and other inorganic materials, but is not limited thereto.

[0109] The second thin film encapsulation layer TFEL2 can protect the light receiving element layer PDL from foreign matter such as dust. To this end, the second thin film encapsulation layer TFEL2 may include at least one organic film. The second thin film encapsulation layer TFEL2 may include an organic film such as acrylic resin, epoxy resin, phenolic resin, polyamide resin, or polyimide resin, but is not limited thereto.

[0110] In addition, Figure 2 The second thin film encapsulation layer TFEL2 of the fingerprint sensor layer FPSL is arranged to face the third direction (Z-axis direction) as an example, but the present invention is not limited thereto. For example, the fingerprint sensor layer FPSL may be arranged so that the second substrate SUB2 faces the third direction (Z-axis direction).

[0111] Figure 3 is a perspective view illustrating a path of reflected light in a display device according to an embodiment.

[0112] Figure 4 FIG. 1 is a diagram illustrating a fingerprint pixel and a sensor pixel of a display device according to an embodiment.

[0113] Reference Figure 3 as well as Figure 4 The cover window CW may include a plurality of fingerprint pixels FPP and a sampling region SPR surrounding each of the plurality of fingerprint pixels FPP. The fingerprint sensor layer FPSL may include a plurality of fingerprint sensors FPS and a sensing region SSR surrounding each of the plurality of fingerprint sensors FPS.

[0114] One fingerprint pixel FPP on the cover window CW can correspond to at least one fingerprint sensor FPS of the fingerprint sensor layer FPSL. For example, one fingerprint pixel FPP can correspond to 20 to 30 fingerprint sensors FPS, but this is not limited to this. Each sampling region SRR on the cover window CW can correspond to a sensing region SSR of the fingerprint sensor layer FPSL.

[0115] Each of the plurality of fingerprint pixels FPP may correspond to a light-transmitting portion TA of the optical pattern layer CML. For example, if a user's finger F touches the cover window CW, each of the plurality of sampling regions SPR may reflect the first light L1 output by the display panel 100. Second light L2 reflected from each of the plurality of sampling regions SPR may pass through the light-transmitting portion TA of the optical pattern layer CML and reach the sensing area SSR of the fingerprint sensor layer FPSL.

[0116] The plurality of light-transmitting portions TA of the optical pattern layer CML can serve as channels for the second light L2 reflected by the user's finger F. Therefore, the plurality of fingerprint sensors FPS can sense the second light L2 reflected by the ridges FR and the valleys FV between the ridges FR of the fingerprint of the finger F contacting the sampling area SPR on the cover window CW.

[0117] The display device 10 can adjust the ratio of the fingerprint distance OD and the sensor distance ID so that light reflected by the user's finger F can be sensed by the fingerprint sensor FPS. Here, the fingerprint distance OD can be equivalent to the distance between the surface of the cover window CW, where the user's finger F directly contacts, and the center point of the light-transmitting portion TA of the optical pattern layer CML. The sensor distance ID can be equivalent to the distance between the center point of the light-transmitting portion TA of the optical pattern layer CML and the fingerprint sensor FPS of the fingerprint sensor layer FPSL. For example, light reflected from one end of a fingerprint pixel FPP on the cover window CW can pass through the center point of the light-transmitting portion TA to reach the other end of the fingerprint sensor FPS. Furthermore, light reflected from the other end of a fingerprint pixel FPP on the cover window CW can pass through the center point of the light-transmitting portion TA to reach one end of the fingerprint sensor FPS. Therefore, the shape of a fingerprint directly contacting the fingerprint pixel FPP and the image formed on the fingerprint sensor FPS can differ by 180 degrees.

[0118] In order to distinguish between light reflected from the ridges FR and light reflected from the valleys FV of the fingerprint of the user's finger F and provide them to the separate fingerprint sensors FPS, the light-transmitting portion TA can be formed to have a predetermined aspect ratio. In this case, the aspect ratio of the light-transmitting portion TA can be a value obtained by dividing the height Wb of the light-transmitting portion TA by the line width Wa of the light-transmitting portion TA. The line width Wa of the light-transmitting portion TA can represent the length of the light-transmitting portion TA in the first direction (X-axis direction) or the length in the second direction (Y-axis direction).

[0119] Figure 5 FIG. 1 is a plan view showing an example of an optical pattern layer of a display device according to an embodiment.

[0120] Reference Figure 5The optical pattern layer CML may include a plurality of light-transmitting portions TA. For example, the planar shape of the plurality of light-transmitting portions TA may be equivalent to a circle. The line width (or diameter) Wa of each of the plurality of light-transmitting portions TA may be 1 μm to 10 μm, but is not limited thereto.

[0121] The plurality of light-transmitting portions TA may be arranged with a first pitch P1 along the first direction (X-axis direction). For example, the first pitch P1 may be greater than or equal to 1.3 times the sensor distance ID, but is not limited thereto.

[0122] The plurality of light-transmitting portions TA may be arranged with a second pitch P2 along the second direction (Y-axis direction). For example, the second pitch P2 may be substantially the same as the first pitch P1. As another example, the second pitch P2 may be different from the first pitch P1.

[0123] For example, the plurality of light-transmitting portions TA may be arranged side by side along the first direction (X-axis direction) and the second direction (Y-axis direction). As another example, the plurality of light-transmitting portions TA may be arranged along the first pitch P1 and the second pitch P2, or may be arranged in a direction other than the first direction (X-axis direction) and the second direction (Y-axis direction).

[0124] For example, the first pitch P1 or the second pitch P2 can be proportional to the thickness of the first thin-film encapsulation layer TFEL1. If the thickness of the first thin-film encapsulation layer TFEL1 increases, the fingerprint distance OD can be increased, and the areas of the fingerprint pixels FPP and the sampling region SPR can also increase. Therefore, to adjust the ratio of the fingerprint distance OD to the sensor distance ID, the first pitch P1 or the second pitch P2 of the plurality of light-transmitting portions TA can be proportional to the thickness of the first thin-film encapsulation layer TFEL1.

[0125] For example, the first pitch P1 or the second pitch P2 may be proportional to the distance between the light-emitting elements of the light-emitting element layer EML or the distance between the sub-pixels SP. If the distance between the light-emitting elements increases, the distance between the second light L2 reflected by the finger F may also increase. Therefore, in order for the plurality of light-transmitting portions TA to function as channels for the second light L2, the first pitch P1 or the second pitch P2 may be proportional to the distance between the light-emitting elements or the distance between the sub-pixels SP.

[0126] Figure 6 FIG. 1 is a plan view showing another example of an optical pattern layer of a display device according to an embodiment. Figure 6 The shape of the light-transmitting portion TA is Figure 5 The light-transmitting portion TA is different, so the same structure as the above-mentioned structure will be briefly described or omitted.

[0127] Reference Figure 6, the planar shape of the multiple light-transmitting portions TA may be equivalent to a quadrilateral. Each of the multiple light-transmitting portions TA may have a first length Wa1 in the first direction (X-axis direction) and a second length Wa2 in the second direction (Y-axis direction). For example, the first length Wa1 of each of the multiple light-transmitting portions TA may be 1 μm to 10 μm, but is not limited thereto. For example, the second length Wa2 of each of the multiple light-transmitting portions TA may be the same as the first length Wa1. As another example, the second length Wa2 of each of the multiple light-transmitting portions TA may be different from the first length Wa1.

[0128] In addition, the shapes of the plurality of light-transmitting portions TA are not limited to Figure 5 as well as Figure 6 For example, the plurality of light-transmitting portions TA may be formed in various shapes such as an elliptical shape, a polygonal shape, etc. Furthermore, the plurality of light-transmitting portions TA may have different shapes within the optical pattern layer CML.

[0129] According to the above embodiment, the display device 10 can adjust the ratio of the fingerprint distance OD to the sensor distance ID and adjust the arrangement and shape of the light-transmitting portion TA of the optical pattern layer CML, thereby improving the sensitivity of the fingerprint sensor FPS.

[0130] Figure 7 FIG. 1 is a diagram illustrating a connection relationship between sub-pixels and lines of a display device according to an embodiment.

[0131] Reference Figure 7 , the display panel 100 may include a display area DA and a non-display area NDA.

[0132] The display area DA may include a plurality of sub-pixels SP, voltage supply lines VL connected to the sub-pixels SP, scan lines SL, light emission control lines EL, and data lines DL.

[0133] Each sub-pixel SP may be connected to at least one scan line SL, at least one data line DL, at least one light emitting control line EL, and at least one voltage supply line VL. Figure 7 In the embodiment, each sub-pixel SP is connected to two scanning lines SL, one data line DL, one emission control line EL, and one voltage supply line VL, but the present invention is not limited thereto. For example, each sub-pixel SP may be connected to three or more scanning lines SL.

[0134] Each sub-pixel SP may include a driving transistor, at least one switching transistor, a light emitting element, and a capacitor.

[0135] The driving transistor can emit light by supplying a driving current to the light emitting element according to a data voltage applied to the gate electrode. For example, the driving transistor and the at least one switching transistor can be a thin film transistor (TFT).

[0136] The light-emitting element can emit light with a predetermined brightness according to the magnitude of the driving current of the driving transistor. For example, the light-emitting element can be an organic light-emitting diode (OLED) including a first electrode, an organic light-emitting layer, and a second electrode. The capacitor can maintain a constant data voltage applied to the gate electrode of the driving transistor.

[0137] The sub-pixel SP may receive a driving voltage VDD through a voltage supply line VL. Here, the driving voltage VDD may be a high potential voltage for driving the light emitting element of the sub-pixel SP.

[0138] The plurality of voltage supply lines VL may be spaced apart from one another along a first direction (X-axis direction) and may extend along a second direction (Y-axis direction). For example, each of the plurality of voltage supply lines VL may be arranged along a column of sub-pixels SP arranged in the display area DA. Each of the plurality of voltage supply lines VL may be connected to the sub-pixels SP arranged in the same column and may supply a driving voltage VDD to the sub-pixels SP.

[0139] The scan lines SL and the emission control lines EL may extend in a first direction (X-axis direction) and may be spaced apart from each other in a second direction (Y-axis direction) intersecting the first direction (X-axis direction). The scan lines SL and the emission control lines EL may be formed side by side.

[0140] The data lines DL may be spaced apart from each other along a first direction (X-axis direction) and may extend along a second direction (Y-axis direction).The data lines DL may be formed side by side with the voltage supply lines VL.

[0141] The non-display area (NDA) may include a scan driver 300 for applying scan signals to the scan lines SL; fan-out lines FL connecting the data lines DL and the display driver 200; and pads DP connected to the circuit board. The pads DP may be located closer to one side edge of the display panel 100 than the display driver 200.

[0142] The display driving unit 200 may be connected to the pad DP to receive digital video data and timing signals, and may convert the digital video data into analog positive / negative polarity data voltages and supply the analog positive / negative polarity data voltages to the data lines DL through the fan-out lines FL.

[0143] The display driving part 200 may generate a scan control signal and supply the scan control signal to the scan driving part 300 through the scan control line SCL.

[0144] The scan driver 300 may be disposed on one side of the non-display area NDA. The scan driver 300 may include a plurality of thin film transistors for generating scan signals based on scan control signals. The scan driver 300 may supply scan signals to the subpixels SP based on the scan control signals, thereby selecting the subpixels SP to which the data voltages are to be supplied.

[0145] Figure 8 FIG. 1 is a diagram illustrating a connection relationship between a fingerprint sensor and lines of a display device according to an embodiment. Figure 9 FIG. 1 is a diagram illustrating a connection relationship between switching transistors and lines of a display device according to an embodiment.

[0146] Reference Figure 8 as well as Figure 9 , the fingerprint sensor layer FPSL may include a fingerprint recognition area FPA and a non-fingerprint recognition area NFPA.

[0147] The fingerprint recognition area FPA may include: multiple fingerprint sensors FPS; multiple scan lines SL connected to the fingerprint sensors FPS; multiple lead lines ROL; and multiple common voltage lines VCL. For example, the distance between each of the multiple fingerprint sensors FPS may be 5μm to 50μm, and one fingerprint pixel on the cover window CW may correspond to 20 to 30 fingerprint sensors FPS on the fingerprint sensor layer FPSL, but this is not limited to this.

[0148] Each of the multiple fingerprint sensors FPS can be connected to the scan driver SCU via a scan line SL and receive a scan signal from the scan driver SCU. The scan lines SL can extend along a first direction (X-axis direction) and can be spaced apart from each other along a second direction (Y-axis direction). The scan driver SCU can supply a scan signal to each of the multiple fingerprint sensors FPS, thereby selecting a fingerprint sensor FPS to sense changes in the output signal.

[0149] Each of the plurality of fingerprint sensors FPS may be connected to the sensor driving portion 500 through a lead line ROL and may supply a lead signal to the sensor driving portion 500. The lead lines ROL may be spaced apart from each other in a first direction (X-axis direction) and may extend in a second direction (Y-axis direction).

[0150] The non-fingerprint recognition area NFPA can be arranged outside the fingerprint recognition area FPA. The non-fingerprint recognition area NFPA can be defined as the remaining area excluding the fingerprint recognition area FPA. For example, the scan driver SCU can be arranged on one side of the non-fingerprint recognition area NFPA to connect to the scan lines SL extending to the fingerprint recognition area FPA.

[0151] The sensor driver 500 may be arranged perpendicular to one side of the non-fingerprint recognition area NFPA and connected to the lead-out lines ROL extending to the non-fingerprint recognition area NFPA. The sensor driver 500 may supply a sensing drive voltage to the plurality of fingerprint sensors FPS and receive lead-out signals based on the touch of a user's finger F to identify the user's fingerprint pattern.

[0152] For example, if a user's finger F touches the cover window CW, the extraction signal of the fingerprint sensor FPS receiving the scan signal may change. The extraction signal of the fingerprint sensor FPS receiving light reflected by the ridges FR of the fingerprint of the finger F may differ from the extraction signal of the fingerprint sensor FPS receiving light reflected by the valleys FV of the fingerprint of the finger F. The sensor driver 500 can distinguish these differences in the extraction signals to determine whether the fingerprint pixel of the cover window CW corresponding to the fingerprint sensor FPS is contacted by the ridges FR or the valleys FV of the fingerprint of the finger F. Therefore, the sensor driver 500 can recognize the pattern of the user's fingerprint based on the extraction signal.

[0153] The non-fingerprint recognition area NFPA may further include a fingerprint recognition pad FP disposed on one side edge of the fingerprint sensor layer FPSL. The fingerprint recognition pad FP may be connected to the sensor driving unit 500 to supply a signal applied from an external integrated circuit to the sensor driving unit 500.

[0154] exist Figure 9 In the embodiment, the fingerprint sensor FPS may include a switching transistor ST and a light receiving element PD.

[0155] The switching transistor ST can supply a sensing drive voltage to the light-receiving element PD based on a scan signal applied to its gate electrode. For example, the gate electrode of the switching transistor ST can be connected to the scan line SL, the first electrode can be connected to the lead line ROL, and the second electrode can be connected to the first electrode of the light-receiving element PD. The first electrode of the switching transistor ST can be a source electrode, and the second electrode can be a drain electrode. If the source-gate voltage of the switching transistor ST exceeds the threshold voltage of the switching transistor ST, a drive current can flow through the channel of the switching transistor ST.

[0156] The light-receiving element PD can recognize the pattern of the user's fingerprint based on the second light L2 reflected by the user's finger F. The first electrode of the light-receiving element PD can be connected to the second electrode of the switching transistor ST, and the second electrode can be connected to a common voltage line VCL. For example, the second electrodes of multiple light-receiving elements PD can be formed as a common electrode to be connected to the common voltage line VCL. The common voltage line VCL can supply a low potential voltage to the second electrodes of the light-receiving elements PD.

[0157] For example, when the user's body is not in contact with the cover window CW, the light receiving element PD may not receive light. If the light receiving element PD does not receive light, the driving current input to the first electrode may be output to the second electrode.

[0158] If a user's finger F touches the cover window CW, the light-receiving element PD can receive the second light L2 reflected by the ridges FR or valleys FV of the fingerprint of the finger F. The first light L1 output from the light-emitting element layer EML can be reflected by the ridges FR or valleys FV of the fingerprint of the finger F, and the reflected second light L2 can reach the light-receiving element PD of the fingerprint sensor layer FPSL. The light-receiving element PD can convert the energy of the second light L2 into an electrical signal (current or voltage) formed between the first and second electrodes. The converted electrical signal can be supplied to the sensor driver 500 as an extraction signal. For example, when a reverse bias is formed between the first and second electrodes of the light-receiving element PD, a driving current and a reverse current can flow in proportion to the amount of the second light L2. Therefore, when the light-receiving element PD receives the second light L2, the reverse current output from the light-receiving element PD can flow to the switching transistor ST and be applied to the sensor driver 500 as an extraction signal.

[0159] The sensor driving unit 500 distinguishes whether the extraction signal received from the fingerprint sensor FPS corresponds to the ridges FR or the valleys FV of the fingerprint of the finger F, thereby recognizing the pattern of the user's fingerprint.

[0160] For example, the light receiving element PD may be implemented as a phototransistor or a photodiode, but is not limited thereto. The light receiving element PD may correspond to a photosensor that converts light energy into electrical energy and utilizes a photovoltaic power generation effect in which the current flowing varies according to light intensity.

[0161] Figure 10 A block diagram schematically shows a display device according to an embodiment.

[0162] Reference Figure 10The display device 10 may include a display panel 100 , a display driving part 200 , a fingerprint sensor layer FPSL, and a sensor driving part 500 .

[0163] The display driver unit 200 can supply an image drive signal to the display panel 100, thereby controlling the image display operation of the display panel 100. The display driver unit 200 can generate the image drive signal based on digital video data and timing signals supplied from the outside. For example, the display driver unit 200 can receive digital video data and timing signals from a host (not shown), and the timing signals may include a vertical synchronization signal (Vertical Synchronization Signal), a horizontal synchronization signal (Horizontal Synchronization Signal), a clock signal (Clock Signal), etc. In addition, the image drive signal may include a scan signal, a light emitting control signal, and a data signal, etc.

[0164] The sensor driver 500 controls the operation of the multiple fingerprint sensors FPS of the fingerprint sensor layer FPSL to identify the user's fingerprint. For example, the sensor driver 500 supplies a sensing drive voltage to the multiple fingerprint sensors FPS and receives an extraction signal from the touch of the finger F. The fingerprint sensor FPS supplies different extraction signals to the sensor driver 500 based on the light energy reflected from the ridges FR and valleys FV of the fingerprint of the finger F. The sensor driver 500 can identify the user's fingerprint based on the extraction signal corresponding to each of the multiple fingerprint pixels in the cover window CW.

[0165] Figure 11 FIG. 4 is a cross-sectional view illustrating a fingerprint sensor layer of a display device according to an embodiment.

[0166] Reference Figure 11 The fingerprint sensor layer FPSL may include a second substrate SUB2, a buffer layer 410, a second thin film transistor layer TFTL2, a light receiving element layer, and a second thin film encapsulation layer TFEL2.

[0167] The second substrate SUB2 can be a base substrate and can be formed of an insulating material such as a polymer resin. For example, the second substrate SUB2 can be a flexible substrate capable of bending, folding, and rolling. If the second substrate SUB2 is a flexible substrate, it can be formed of polyimide (PI), but is not limited to this.

[0168] The buffer layer 410 may include a first buffer layer 411 and a second buffer layer 412. The first buffer layer 411 may be provided on the second substrate SUB2. The first buffer layer 411 may be formed using an inorganic film that can prevent air or moisture from penetrating. The first buffer layer 411 may be formed using a material such as silicon nitride (SiN x ), silicon oxynitride (SiON), silicon oxide (SiO x ), titanium oxide (TiO x ) and aluminum oxide (AlO x ) etc., but is not limited thereto.

[0169] The second buffer layer 412 may be disposed on the first buffer layer 411 and may cover the light-blocking pattern 420 patterned on the first buffer layer 411. The second buffer layer 412 may be formed using an inorganic film capable of preventing air or moisture from penetrating.

[0170] The light-blocking pattern 420 may be arranged between the first buffer layer 411 and the second buffer layer 412 so as to overlap with the switching transistor ST. For example, the light-blocking pattern 420 may be formed by depositing a light-absorbing material or a light-blocking material on the first buffer layer 411 and then performing exposure patterning. The light-blocking pattern 420 may be formed of a metal such as molybdenum (Mo), aluminum (Al), chromium (Cr), or silver (Ag), or an alloy thereof, but is not limited thereto.

[0171] The second thin film transistor layer TFTL2 may be provided on the buffer layer 410. The second thin film transistor layer TFTL2 may include a switching transistor ST that drives each of the plurality of fingerprint sensors FPS. The second thin film transistor layer TFTL2 may also include a gate insulating film 440, an interlayer insulating film 450, a protective layer 460, and a planarization layer 470. The switching transistor ST of the fingerprint sensor FPS may include a semiconductor layer 431, a gate electrode 432, a source electrode 433, and a drain electrode 434.

[0172] The semiconductor layer 431 may be provided on the buffer layer 410. The semiconductor layer 431 may be arranged to overlap with the gate electrode 432, the source electrode 433, and the drain electrode 434. The semiconductor layer 431 may be in direct contact with the source electrode 433 and the drain electrode 434, and may face the gate electrode 432 with the gate insulating film 440 interposed therebetween.

[0173] The gate electrode 432 may be disposed on the gate insulating film 440. The gate electrode 432 may overlap the semiconductor layer 431 with the gate insulating film 440 interposed therebetween.

[0174] The source electrode 433 and the drain electrode 434 can be arranged spaced apart from each other on the interlayer insulating film 450. The source electrode 433 can contact one surface of the semiconductor layer 431 through a first contact hole provided in the gate insulating film 440 and the interlayer insulating film 450. The drain electrode 434 can contact the other surface of the semiconductor layer 431 through a second contact hole provided in the gate insulating film 440 and the interlayer insulating film 450. The drain electrode 434 can directly contact the first electrode 481 of the light receiving element PD through a third contact hole in the protective layer 460.

[0175] The gate insulating film 440 may be provided on the semiconductor layer 431. For example, the gate insulating film 440 may be disposed on the semiconductor layer 431 and the buffer layer 410, and may insulate the semiconductor layer 431 from the gate electrode 432. The gate insulating film 440 may include a first contact hole through which the source electrode 433 passes, and a second contact hole through which the drain electrode 434 passes.

[0176] The interlayer insulating film 450 may be disposed on the gate electrode 432. For example, the interlayer insulating film 450 may include a first contact hole through which the source electrode 433 passes, and a second contact hole through which the drain electrode 434 passes. Here, the first contact hole and the second contact hole of the interlayer insulating film 450 may be connected to the first contact hole or the second contact hole of the gate insulating film 440, respectively.

[0177] The protection layer 460 may be provided on the switching transistor ST to protect the switching transistor ST. For example, the protection layer 460 may include a third contact hole through which the first electrode 481 of the light receiving element PD passes.

[0178] A planarization layer 470 may be provided on the protective layer 460 to planarize the top surface of the switching transistor ST. The planarization layer 470 may include a third contact hole through which the first electrode 481 of the light-receiving element PD passes. The third contact hole of the protective layer 460 and the third contact hole of the planarization layer 470 may be connected to each other so that the first electrode 481 of the light-receiving element PD passes therethrough.

[0179] Light receiving element layer ( Figure 2 The light receiving element layer PDL may include: a light receiving element PD connected to the switch transistor ST of the second thin film transistor layer TFTL2; and a sensor definition film 490 surrounding the light receiving element PD.

[0180] The light receiving element PD may include a first electrode 481 , a light receiving layer 482 , and a second electrode 483 .

[0181] The first electrode 481 can be provided on the planarization layer 470. For example, the first electrode 481 can be arranged to overlap with the opening area of the light-receiving element layer PDL defined by the sensor definition film 490. Furthermore, the first electrode 481 can be connected to the drain electrode 434 of the switching transistor ST through a third contact hole provided in the planarization layer 470 and the protective layer 460. For example, the first electrode 481 can be formed of a transparent conductive material so that it can transmit the second light L2 reflected by the finger F and can function as the anode of the light-receiving element PD.

[0182] The light-receiving layer 482 may be provided on the first electrode 481. The light-receiving layer 482 may include a hole injection layer, a hole transport layer, a light-receiving layer, an electron blocking layer, an electron transport layer, an electron injection layer, and the like. For example, the light-receiving layer 482 may be an organic light-receiving layer formed of an organic substance, but is not limited thereto. When the light-receiving layer 482 corresponds to an organic light-receiving layer, the organic light-receiving layer may receive the second light L2 and combine holes and electrons, and may convert the energy of the second light L2 into an electrical signal (current or voltage) formed between the first electrode 481 and the second electrode 483.

[0183] The second electrode 483 can be provided on the light-receiving layer 482. For example, the second electrode 483 can be implemented as follows: it is not differentiated for each fingerprint sensor FPS, but is a common electrode for all fingerprint sensors FPS. If a driving voltage is applied to the first electrode 481 and a common voltage is applied to the second electrode 483, holes and electrons can move to the light-receiving layer 482 and combine with each other. The second electrode 483 can function as the cathode of the light-receiving element PD.

[0184] A sensor definition film 490 of the light-receiving element layer (PDL) may be provided on the planarization layer 470. The sensor definition film 490 may be provided between adjacent first electrodes 481 to divide the plurality of first electrodes 481. The sensor definition film 490 may electrically insulate the adjacent first electrodes 481 from the light-receiving layer 482, thereby defining an opening region of the light-receiving element layer (PDL).

[0185] The second thin film encapsulation layer TFEL2 may be provided on the light receiving element layer PDL. The second thin film encapsulation layer TFEL2 may cover the light receiving element layer PDL and may prevent oxygen or moisture from penetrating into the light receiving element layer PDL. For example, the second thin film encapsulation layer TFEL2 may include at least one inorganic film. The second thin film encapsulation layer TFEL2 may include a film containing a silicon nitride (SiN x ), silicon oxynitride (SiON), silicon oxide (SiO x ), titanium oxide (TiO x ) or aluminum oxide (AlOx ) etc., but is not limited thereto.

[0186] The second thin film encapsulation layer TFEL2 can protect the light receiving element layer PDL from foreign matter such as dust. For example, the second thin film encapsulation layer TFEL2 may include at least one organic film. The second thin film encapsulation layer TFEL2 may include an organic film such as acrylic resin, epoxy resin, phenolic resin, polyamide resin, or polyimide resin, but is not limited thereto.

[0187] Figure 12 is a cross-sectional view showing in detail a display device according to an embodiment. Figure 12 As shown in detail Figure 2 , and thus the same structure as the above-mentioned structure will be briefly described or omitted.

[0188] Reference Figure 2 as well as Figure 12 The display device 10 may include a first substrate SUB1, an optical pattern layer CML, a refractive pattern layer PTL, a display panel, a cover window CW, and a fingerprint sensor layer FPSL. Display panel ( Figure 2 The fingerprint sensor layer FPSL may include a second substrate SUB2, a buffer layer 410, a second thin film transistor layer TFTL2, a light receiving element layer ( Figure 2 PDL) and a second thin film encapsulation layer TFEL2.

[0189] The optical pattern layer CML may include a plurality of light-transmitting portions TA, which may be optical passages for second light L2 emitted from the light-emitting element layer EML and reflected from the user's body to travel toward the fingerprint sensor layer FPSL.

[0190] The refraction pattern layer PTL may be a layer that refracts at least a portion of the second light L2 traveling toward the fingerprint sensor layer FPSL to adjust the path of the second light L2. The refraction pattern layer PTL may include a first light-transmitting layer including a high-refractive-index material and a second light-transmitting layer including a low-refractive-index material.

[0191] For detailed description of the optical pattern layer CML and the refractive pattern layer PTL, please refer to Figure 13 as well as Figures 22 to 25 To be described later.

[0192] The first thin film transistor layer TFTL1 may be disposed on the back panel BP and may include at least one thin film transistor 110 for driving the plurality of sub-pixels SP, respectively.

[0193] The first thin film transistor layer TFTL1 may further include a gate insulating film 120, an interlayer insulating film 130, a protective layer 140, and a planarization layer 150. At least one thin film transistor 110 may include a semiconductor layer 111, a gate electrode 112, a source electrode 113, and a drain electrode 114.

[0194] The semiconductor layer 111 may be provided on the back plate BP. The semiconductor layer 111 may be arranged to overlap with the gate electrode 112, the source electrode 113, and the drain electrode 114. The semiconductor layer 111 may be in direct contact with the source electrode 113 and the drain electrode 114, and may face the gate electrode 112 with the gate insulating film 120 interposed therebetween.

[0195] The gate electrode 112 may be disposed on an upper portion of the gate insulating film 120. The gate electrode 112 may overlap the semiconductor layer 111 with the gate insulating film 120 interposed therebetween.

[0196] The source electrode 113 and the drain electrode 114 can be arranged spaced apart from each other on the interlayer insulating film 130. The source electrode 113 can contact one surface of the semiconductor layer 111 through contact holes provided in the gate insulating film 120 and the interlayer insulating film 130. The drain electrode 114 can contact the other surface of the semiconductor layer 111 through contact holes provided in the gate insulating film 120 and the interlayer insulating film 130. The drain electrode 114 can directly contact the first electrode 161 of the light-emitting element 160 through a contact hole in the protective layer 140.

[0197] The gate insulating film 120 may be provided on the semiconductor layer 111. For example, the gate insulating film 120 may be disposed on the semiconductor layer 111 and the upper portion of the back plate BP, and may insulate the semiconductor layer 111 from the gate electrode 112. The gate insulating film 120 may include a contact hole through which the source electrode 113 passes, and a contact hole through which the drain electrode 114 passes.

[0198] Interlayer insulating film 130 may be disposed on gate electrode 112. For example, interlayer insulating film 130 may include a contact hole through which source electrode 113 passes and a contact hole through which drain electrode 114 passes. Here, the contact hole of interlayer insulating film 130 may be connected to the contact hole of gate insulating film 120.

[0199] The protective layer 140 may be provided on the thin film transistor 110 to protect the thin film transistor 110. For example, the protective layer 140 may include a contact hole through which the first electrode 161 of the light emitting element 160 passes.

[0200] A planarization layer 150 may be provided on the protective layer 140 to planarize the upper surface of the thin film transistor 110. For example, the planarization layer 150 may include a contact hole through which the first electrode 161 of the light-emitting element 160 passes. Here, the contact hole of the protective layer 140 and the contact hole of the planarization layer 150 may be connected to each other so that the first electrode 161 of the light-emitting element 160 passes therethrough.

[0201] The light emitting element layer EML may be provided on the first thin film transistor layer TFTL1. The light emitting element layer EML may include a light emitting element 160 connected to the thin film transistor 110 of the first thin film transistor layer TFTL1.

[0202] The light emitting element 160 may include a first electrode 161 , a light emitting layer 162 , and a second electrode 163 .

[0203] The first electrode 161 may be provided on the planarization layer 150. For example, the first electrode 161 may be arranged to overlap with an opening region of the light-emitting element layer EML defined by the pixel definition film 170. The first electrode 161 may contact the drain electrode 114 of the thin film transistor 110 through a contact hole provided in the planarization layer 150 and the protective layer 140. For example, the first electrode 161 may function as an anode of the light-emitting element 160.

[0204] The light-emitting layer 162 may be provided on the first electrode 161. The light-emitting layer 162 may include a hole injection layer, a hole transport layer, a light-emitting layer, an electron blocking layer, an electron transport layer, an electron injection layer, and the like. For example, the light-emitting layer 162 may be an organic light-emitting layer formed using an organic substance, but is not limited thereto. When the light-emitting layer 162 corresponds to an organic light-emitting layer, if the thin film transistor 110 of the first thin film transistor layer TFTL1 applies a predetermined voltage to the first electrode 161 of the light-emitting element 160, and the second electrode 163 of the light-emitting element 160 receives a common voltage or a cathode voltage, holes and electrons may respectively move through the hole transport layer and the electron transport layer to the light-emitting layer 162, and the holes and electrons may combine with each other in the light-emitting layer 162 to emit light.

[0205] The second electrode 163 may be provided on the light emitting layer 162. For example, the second electrode 163 may be implemented as an electrode form that is not differentiated for each sub-pixel SP but is a common electrode for all sub-pixels SP.

[0206] The light emitting element layer EML may include a pixel definition film 170 defining a plurality of sub-pixels SP. The first electrode 161 and the light emitting layer 162 of the light emitting element 160 may be separated and insulated from each other by the pixel definition film 170.

[0207] In addition, reference has been made Figure 2 as well as Figure 11 The first thin film encapsulation layer TFEL1 , the touch sensor layer TSL, the cover window CW, and the fingerprint sensor layer FPSL are explained, and thus repeated contents are omitted.

[0208] Figure 13 is a cross-sectional view of a display device according to an embodiment, and is a cross-sectional view showing in detail an optical pattern layer and a refractive pattern layer of the display device according to an embodiment. Figure 14 yes Figure 13 For ease of explanation, the following schematically illustrates only the second substrate SUB2, the plurality of light-receiving elements PD disposed on the second substrate SUB2, and the sensor definition film 490 in the configuration of the fingerprint sensor layer FPSL. However, other configurations for constituting the fingerprint sensor layer FPSL may also be included.

[0209] Reference Figure 13 An optical pattern layer CML and a refractive pattern layer PTL may be disposed on the first substrate SUB1.

[0210] As described above, the optical pattern layer CML may include a light-blocking portion BA and a plurality of light-transmitting portions TA extending through the light-blocking portion BA in a direction (e.g., a thickness direction). Some light incident on the optical pattern layer CML may pass through the light-transmitting portion TA and travel toward the light-receiving element PD, while another portion of the light may be blocked by the light-blocking portion BA.

[0211] Specifically, the optical pattern layer CML includes a light-blocking portion BA and a light-transmitting portion TA, thereby allowing only light incident within a predetermined angle to pass through and blocking all other light. The predetermined angle determined by the optical pattern layer CML can be defined as a cutoff angle θc or a blocking angle. The optical pattern layer CML allows the light-receiving element PD to distinguish and receive light reflected from the ridges of the user's fingerprint from light reflected from the valleys.

[0212] The cutoff angle θc of the optical pattern layer CML can be determined by the ratio of the line width Wa and height Wb of the light-transmitting portion TA (i.e., the aspect ratio of the light-transmitting portion TA). Furthermore, the sum of the line width Wa of the light-transmitting portion TA and the width Wc of the light-blocking portion BA can be constant. In other words, the distance between the light-transmitting portions TA can be constant, but this is not limiting.

[0213] The refraction pattern layer PTL may be disposed on the optical pattern layer CML. The refraction pattern layer PTL may include a first light-transmitting layer HRL and a second light-transmitting layer LRL having different refractive indices from each other.

[0214] Specifically, the refractive index of the first light-transmitting layer (HRL) may be greater than the refractive index of the second light-transmitting layer (LRL). In one embodiment, the refractive index ratio between the first light-transmitting layer (HRL) and the second light-transmitting layer (LRL) may be 0.9775 or less. Here, the refractive index ratio may be a value obtained by dividing the refractive index of the second light-transmitting layer (LRL) by the refractive index of the first light-transmitting layer (HRL).

[0215] The first light-transmitting layer HRL may be arranged to overlap the light-blocking portion BA of the optical pattern layer CML. According to an embodiment, the first light-transmitting layer HRL may completely overlap the light-blocking portion BA. In this case, the shape of the first light-transmitting layer HRL on a plane may be substantially the same as the shape of the light-blocking portion BA on a plane.

[0216] The first light-transmitting layer HRL may include a plurality of openings OP. The openings OP included in the first light-transmitting layer HRL may be formed at positions corresponding to the light-transmitting portions TA of the optical pattern layer CML.

[0217] The first light-transmitting layer HRL may be a high-refractive-index layer including a high-refractive-index material. For example, the first light-transmitting layer HRL may be formed to include a material such as silicon nitride (SiN x ), silicon oxynitride (SiON), silicon oxide (SiO x ), titanium oxide (TiO x ) or aluminum oxide (AlO x ) etc., but is not limited thereto, and may also be formed as an organic film including inorganic particles composed of the above-mentioned inorganic materials.

[0218] The second light-transmitting layer LRL may be formed on the first light-transmitting layer HRL and may be formed to fill the light-transmitting portion TA of the optical pattern layer CML. Specifically, the second light-transmitting layer LRL may fill the spaces between the light-blocking portions BA of the optical pattern layer CML. Furthermore, the second light-transmitting layer LRL may entirely cover the first light-transmitting layer HRL. The second light-transmitting layer LRL may be formed to fill the opening OP of the first light-transmitting layer HRL.

[0219] The upper surface of the second light-transmitting layer LRL can be substantially flat. Specifically, the second light-transmitting layer LRL can function as a planarization layer, compensating for any step differences in the structure disposed below. This allows light incident on the upper surface of the second light-transmitting layer LRL to uniformly travel toward the optical pattern layer CML.

[0220] The second light-transmitting layer LRL may be a low-refractive-index layer containing a low-refractive-index material. As described above, the refractive index of the second light-transmitting layer LRL may be lower than that of the first light-transmitting layer HRL. For example, the second light-transmitting layer LRL may be formed using an organic film including a transparent organic material such as polyacrylate resin, epoxy resin, phenolic resin, polyamide resin, polyimide resin, unsaturated polyester resin, polyphenyleneether resin, polyphenylenesulfide resin, or benzocyclobutene (BCB).

[0221] The arrangement and shape of the second light-transmitting layer LRL are not limited to the above. For example, Figure 14 As shown, the second light-transmitting layer LRL_1 may not be filled with the light-transmitting portion TA. In this case, the material filling the light-transmitting portion TA can be different from the material constituting the second light-transmitting layer LRL_1. As one example, the light-transmitting portion TA can be filled with a transparent organic material having a different refractive index than that of the second light-transmitting layer LRL_1. As another example, an air layer can be formed in at least a portion of the light-transmitting portion TA.

[0222] In the above-described embodiment, the cutoff angle θc of the optical pattern layer CML can be determined by the aspect ratio of the light-transmitting portion TA. As the line width Wa of the light-transmitting portion TA decreases and the height Wb of the light-transmitting portion TA increases, the aspect ratio of the light-transmitting portion TA can be increased, and the cutoff angle θc of the optical pattern layer CML can be reduced. Consequently, the optical pattern layer CML can more accurately distinguish between light reflected from the ridges and valleys of a fingerprint and supply the light to the light-receiving element PD. This improves the fingerprint detection capability of the display device 10.

[0223] However, as the aspect ratio of the light-transmitting portion TA increases, the amount of light blocked by the light-blocking portion BA of the optical pattern layer CML may increase, and the light transmittance of the optical pattern layer CML may decrease. When the light transmittance of the optical pattern layer CML decreases, the amount of light supplied to the light-receiving element PD may be insufficient, and the signal-to-noise ratio (SNR) of the optical pattern layer CML may deteriorate.

[0224] Accordingly, the display device 10 according to an embodiment of the present invention may include a refraction pattern layer PTL disposed on the optical pattern layer CML.

[0225] For example, the first reflected light L2 a and the second reflected light L2 b may be incident on the refraction pattern layer PTL.

[0226] The first reflected light L2a may be light incident at a first angle θa relative to a side surface BAS of the light-blocking portion BA. Here, the first reflected light L2a may be light incident at an angle within the bright / dark cutoff angle θc. The first reflected light L2a may not be refracted by the refractive pattern layer PRL (or the first light-transmitting layer HRL). The first reflected light L2a may pass through the refractive pattern layer PTL and the optical pattern layer CML and be incident on the light-receiving element PD disposed below.

[0227] In contrast, the second reflected light L2b may be light incident at a second angle θb relative to one side surface BAS of the light-blocking portion BA. Here, the second reflected light L2b may be light incident at an angle greater than the bright / dark cutoff angle θc. As described above, the refractive index of the first light-transmitting layer HRL may be greater than the refractive index of the second light-transmitting layer LRL. Accordingly, the second reflected light L2b traveling from the second light-transmitting layer LRL toward the first light-transmitting layer HRL may be refracted. Therefore, the second reflected light L2b may be refracted and directed toward the light-blocking portion BA as refracted light L2b'. This refracted light L2b' may be blocked or absorbed by the light-blocking portion BA and may not be directed toward the light-receiving element PD.

[0228] That is, the refractive pattern layer PTL may refract incident light due to the difference in refractive index between the first light-transmitting layer HRL and the second light-transmitting layer LRL, thereby adjusting the light-dark cutoff angle θc of the optical pattern layer CML.

[0229] As in this embodiment, when the refractive pattern layer PTL is disposed above the optical pattern layer CML, even if the line width Wa of the light-transmitting portion TA is increased to improve the light transmittance of the optical pattern layer CML, the light-dark cutoff angle θc of the optical pattern layer CML can be maintained at a predetermined level. For example, as the line width Wa of the light-transmitting portion TA increases, the height Wh of the first light-transmitting layer HRL can also be increased accordingly. In other words, while increasing the line width Wa of the light-transmitting portion TA improves the light transmittance of the optical pattern layer CML, the height Wh of the first light-transmitting layer HRL can be adjusted, thereby adjusting the light-dark cutoff angle θc of the optical pattern layer CML to a desired level.

[0230] When the line width Wa of the light-transmitting portion TA is increased to enhance the transmittance of the optical pattern layer CML, the signal-to-noise ratio (SNR) of the fingerprint sensor including the light-receiving element PD can be improved, and the fingerprint detection capability of the display device 10 can be enhanced.

[0231] Furthermore, because the height Wh of the first light-transmitting layer HRL can be adjusted to adjust the cutoff angle θc of the optical pattern layer CML, the optical pattern layer CML can more accurately distinguish between light reflected from the ridges and valleys of a fingerprint and provide the light to the light-receiving element PD. This improves the fingerprint detection capability of the display device 10.

[0232] In the following embodiments, the same components as those already described are denoted by the same reference numerals, and repeated descriptions are omitted or simplified.

[0233] Figure 15 is a cross-sectional view of a display device according to another embodiment, and is a cross-sectional view showing in detail an optical pattern layer and a refractive pattern layer of the display device according to another embodiment. Figure 16 is Figure 15 A modification of the structure shown.

[0234] Reference Figure 15 as well as Figure 16 , the display device 10_2 may include a refraction pattern layer PTL_2 disposed on an upper portion of the optical pattern layer CML. The refraction pattern layer PTL_2 may be a lens pattern layer that controls a path of light reflected from an external object.

[0235] The refraction pattern layer PTL_2 may include a first light-transmitting layer HRL_2 (or a lens layer) and a second light-transmitting layer LRL (or a protective layer).

[0236] The first light-transmitting layer HRL_2 may include an upper surface HRLa, a lower surface HRLb opposite the upper surface HRLa, and an inclined surface HRLc_2 located between the upper surface HRLa and the lower surface HRLb. The upper surface HRLa and the lower surface HRLb of the first light-transmitting layer HRL_2 may be substantially parallel, and the lower surface HRLb of the first light-transmitting layer HRL_2 may be in contact with the optical pattern layer CML. However, this is not limiting. A separate support member for supporting the refractive pattern layer PTL_2 may be disposed between the first light-transmitting layer HRL_2 and the optical pattern layer CML.

[0237] The area (or width) of the upper surface HRLa of the first light-transmitting layer HRL_2 can be smaller than the area (or width) of the lower surface HRLb. An inclined surface HRLc_2 can be provided between the upper surface HRLa and the lower surface HRLb of the first light-transmitting layer HRL_2. The inclined surface HRLc_2 of the first light-transmitting layer HRL_2 can form an acute angle θc' with the lower surface HRLb. At least a portion of the inclined surface HRLc_2 of the first light-transmitting layer HRL_2 can overlap with the light-blocking portion BA along a direction (e.g., the thickness direction).

[0238] The second light-transmitting layer LRL may be arranged to cover the first light-transmitting layer HRL_2. The upper surface of the second light-transmitting layer LRL may be substantially flat. That is, the second light-transmitting layer LRL may function as a planarization layer.

[0239] The refractive indexes of the first light-transmitting layer HRL_2 and the second light-transmitting layer LRL may be different from each other. Specifically, the refractive index of the first light-transmitting layer HRL_2 may be greater than the refractive index of the second light-transmitting layer LRL. Accordingly, light traveling from the second light-transmitting layer LRL toward the first light-transmitting layer HRL_2 may be refracted.

[0240] The refractive pattern layer PTL_2 may improve the light transmittance of the optical pattern layer CML.

[0241] For example, the first reflected light L2c and the second reflected light L2d may be incident on the refraction pattern layer PTL_2. The first reflected light L2c may pass through the upper surface HRLa and the lower surface HRLb of the first light-transmitting layer HRL_2 and be incident on the light-receiving element PD through the light-transmitting portion TA.

[0242] Conversely, the second reflected light L2d may be incident on the inclined surface HRLc_2 of the first light-transmitting layer HRL_2. Here, the second reflected light L2d may be light traveling toward the light-blocking portion BA. As the second reflected light L2d travels from the second light-transmitting layer LRL toward the first light-transmitting layer HRL_2, it may be refracted by the inclined surface HRLc_2 and travel toward the light-transmitting portion TA.

[0243] Specifically, the refractive pattern layer PTL_2 according to this embodiment can adjust the path of light reflected from external objects traveling toward the light-blocking portion BA and refract light traveling toward the light-blocking portion BA, directing it toward the light-transmitting portion TA. This improves the light transmittance of the optical pattern layer CML, increases the amount of light incident on the light-receiving element PD, and enhances the fingerprint recognition performance of the display device 10_2.

[0244] In addition, the shape of the first light-transmitting layer HRL_2 is not limited to the above, but may be various.

[0245] For example, Figure 16 As shown, the display device 10_3 may include a refraction pattern layer PTL_3 disposed on the optical pattern layer CML. The refraction pattern layer PTL_3 may include a plurality of first light-transmitting layers HRL_3 disposed spaced apart from each other.

[0246] The first light-transmitting layer HRL_3 may include an inclined surface HRLc_3. The inclined surface HRLc_3 of the first light-transmitting layer HRL_3 may form an acute angle θd with the lower surface HRLb. At least a portion of the inclined surface HRLc_3 of the first light-transmitting layer HRL_3 may overlap with the light-blocking portion BA along a direction (e.g., a thickness direction).

[0247] A second light-transmitting layer LRL may be disposed on the first light-transmitting layer HRL_3 , and may cover the first light-transmitting layer HRL_3 . According to an embodiment, the second light-transmitting layer LRL may fill at least a portion of the light-transmitting portion TA.

[0248] The first reflected light L2e and the second reflected light L2f can be incident on the refraction pattern layer PTL_3. The first reflected light L2e can pass through the upper surface HRLa and lower surface HRLb of the first light-transmitting layer HRL_3 and pass through the light-transmitting portion TA to be incident on the light-receiving element PD. Conversely, the second reflected light L2f can be incident on the inclined surface HRLc_3 of the first light-transmitting layer HRL_3. Here, the second reflected light L2f can be light traveling toward the light-blocking portion BA. As the second reflected light L2f travels from the second light-transmitting layer LRL toward the first light-transmitting layer HRL_3, it can be refracted by the inclined surface HRLc_3 and travel toward the light-transmitting portion TA.

[0249] If through Figure 15 As described above, the refractive pattern layer PTL_3 can improve the light transmittance of the optical pattern layer CML, increase the amount of light incident on the light receiving element PD, and improve the fingerprint recognition performance of the display device 10_3.

[0250] Figure 17 is a cross-sectional view of a display device according to yet another embodiment, and in particular, is a cross-sectional view showing in detail an optical pattern layer and a refractive pattern layer of the display device according to yet another embodiment.

[0251] Reference Figure 17 The display device 10_4 may include a refraction pattern layer PTL_4 disposed below the optical pattern layer CML. The refraction pattern layer PTL_4 may be a lens pattern layer that controls a path of light passing through the optical pattern layer CML.

[0252] The refraction pattern layer PTL_4 may include a first light-transmitting layer HRL_4 (or a lens layer) and a second light-transmitting layer LRL (or a protective layer).

[0253] The first light-transmitting layer HRL_4 may include an upper surface HRLa, a lower surface HRLb opposite the upper surface HRLa, and an inclined surface HRLc_4 located between the upper surface HRLa and the lower surface HRLb. The upper surface HRLa and the lower surface HRLb of the first light-transmitting layer HRL_4 may be substantially parallel, and the lower surface HRLb of the first light-transmitting layer HRL_4 may be in contact with the first substrate SUB1. However, this is not limiting. A separate support member for supporting the refractive pattern layer PTL_4 may be disposed between the first light-transmitting layer HRL_4 and the first substrate SUB1.

[0254] An inclined surface HRLc_4 may be provided between the upper surface HRLa and the lower surface HRLb of the first light-transmitting layer HRL_4 . The inclined surface HRLc_4 of the refraction pattern layer PTL_4 may form an inclined angle θe with the lower surface HRLb, and the inclined angle θe may be an acute angle.

[0255] A plurality of light receiving elements PD may be disposed below the first light transmitting layer HRL_4 . At least a portion of the inclined surface HRLc_4 of the first light transmitting layer HRL_4 may overlap with a region between the light receiving layers 482 including the plurality of light receiving elements PD along a direction (eg, thickness direction).

[0256] In addition, as the distance Wd between the light receiving layer 482 of the light receiving element PD increases, the distance Wt between the refraction pattern layer PTL_4 and the light receiving element PD may also increase accordingly.

[0257] The second light-transmitting layer LRL may be arranged to cover the first light-transmitting layer HRL_4. The upper surface of the second light-transmitting layer LRL may be substantially flat. That is, the second light-transmitting layer LRL may function as a planarization layer and may provide a space where the optical pattern layer CML is to be arranged.

[0258] The refractive indexes of the first light-transmitting layer HRL_4 and the second light-transmitting layer LRL may be different from each other. Specifically, the refractive index of the first light-transmitting layer HRL_4 may be greater than the refractive index of the second light-transmitting layer LRL. Accordingly, light traveling from the second light-transmitting layer LRL toward the first light-transmitting layer HRL_4 may be refracted.

[0259] The refractive pattern layer PTL_4 can improve the light receiving efficiency of the light receiving element PD.

[0260] For example, the first reflected light L2g and the second reflected light L2h passing through the optical pattern layer CML may be incident on the refraction pattern layer PTL_4. The first reflected light L2g may pass through the upper surface HRLa and the lower surface HRLb of the first light-transmitting layer HRL_4 and be incident on the light-receiving element PD.

[0261] Conversely, the second reflected light L2h may be incident on the inclined surface HRLc_4 of the first light-transmitting layer HRL_4. Here, the second reflected light L2h may be light traveling toward the region between the light-receiving elements PD. As the second reflected light L2h travels from the second light-transmitting layer LRL toward the first light-transmitting layer HRL_4, it may be refracted by the inclined surface HRLc_4 and travel toward the light-receiving elements PD.

[0262] Specifically, the refractive pattern layer PTL_4 according to this embodiment can adjust the path of light traveling toward the area between the light-receiving elements PD, thereby refracting the light toward the light-receiving elements PD. This improves the light-receiving efficiency of the light-receiving elements PD, increases the amount of light incident on the light-receiving elements PD, and enhances the fingerprint recognition performance of the display device 10_4.

[0263] Figures 18 to 21 is a cross-sectional view of a display device according to various embodiments. Figure 13 、 Figure 15 as well as Figure 17 The refractive pattern layers of the embodiment can be composed of composites. Figures 18 to 21 Such a composite structure is described in detail, but repeated descriptions will be omitted.

[0264] As an example, Figure 18 As shown, the display device 10_5 may include a refraction pattern layer PTL_5 disposed on the optical pattern layer CML. The refraction pattern layer PTL_5 may include a first refraction pattern layer PTL1_5 and a second refraction pattern layer PTL2_5 disposed on the first refraction pattern layer PTL1_5.

[0265] The first refraction pattern layer PTL1_5 may be Figure 13 The refraction pattern layer PTL described in the above is substantially the same, and the second refraction pattern layer PTL2_5 can be the same as Figure 15 The refraction pattern layer PTL_2 described in FIG. 1 is substantially the same as that in FIG. 2 , and thus repeated description thereof will be omitted.

[0266] For according to Figure 18 In the display device 10_5 of the embodiment, the second refractive pattern layer PTL2_5 can adjust the path of light reflected from external objects traveling toward the light-blocking portion BA and refract light traveling toward the light-blocking portion BA, directing it toward the light-transmitting portion TA. This improves the light transmittance of the optical pattern layer CML and enhances the fingerprint recognition performance of the display device 10_5. Furthermore, because the first refractive pattern layer PTL1_5 can adjust the cutoff angle of the optical pattern layer CML, the fingerprint detection capability of the display device 10_5 can be enhanced.

[0267] As another example, Figure 19 As shown, the display device 10_6 may include refraction pattern layers PTL_6 disposed above and below the optical pattern layer CML. The refraction pattern layer PTL_6 may include a first refraction pattern layer PTL1_6 disposed above the optical pattern layer CML and a second refraction pattern layer PTL2_6 disposed below the optical pattern layer CML.

[0268] The first refraction pattern layer PTL1_6 may be Figure 13 The refraction pattern layer PTL described in the embodiment is substantially the same, and the second refraction pattern layer PTL2_6 may be the same as Figure 17 The refraction pattern layer PTL_4 described in FIG. 1 is substantially the same as that in FIG. 2 , and thus repeated description thereof will be omitted.

[0269] For according to Figure 19 For the display device 10_6 of the embodiment, the second refractive pattern layer PTL2_6 refracts light in the following manner: it adjusts the path of light traveling toward the area between the light-receiving elements PD, thereby directing the light toward the light-receiving elements PD. This improves the light-receiving efficiency of the light-receiving elements PD and enhances the fingerprint recognition performance of the display device 10_6. Furthermore, because the first refractive pattern layer PTL1_6 can adjust the cutoff angle of the optical pattern layer CML, the fingerprint detection capability of the display device 10_6 can be enhanced.

[0270] As another example, Figure 20 As shown, the display device 10_7 may include a refraction pattern layer PTL_7 disposed above and below the optical pattern layer CML. The refraction pattern layer PTL_7 may include a first refraction pattern layer PTL1_7 and a second refraction pattern layer PTL2_7 disposed above the optical pattern layer CML, and a third refraction pattern layer PTL3_7 disposed below the optical pattern layer CML.

[0271] Since the first refraction pattern layer PTL1_7 is Figure 13 The refraction pattern layer PTL described in the above is substantially the same as the second refraction pattern layer PTL2_7. Figure 15 The refraction pattern layer PTL_2 described in the above is substantially the same as the third refraction pattern layer PTL3_7. Figure 17 The refraction pattern layer PTL_4 described in FIG. 1 is substantially the same as that in FIG. 2 , and thus repeated description thereof will be omitted.

[0272] according to Figure 20In the embodiment, the second refraction pattern layer (PTL2_7) can adjust the path of light reflected from external objects traveling toward the light-blocking portion BA, refracting the light traveling toward the light-blocking portion BA and directing it toward the light-transmitting portion TA. This improves the light transmittance of the optical pattern layer CML and the fingerprint recognition performance of the display device 10_7. Furthermore, the third refraction pattern layer (PTL3_7) can adjust the path of light traveling toward the area between the light-receiving elements PD, thereby refracting the light toward the light-receiving elements PD. This improves the light-receiving efficiency of the light-receiving elements PD and further enhances the fingerprint recognition performance of the display device 10_7. Furthermore, because the first refraction pattern layer (PTL1_7) can adjust the light cutoff angle of the optical pattern layer CML, the fingerprint detection capability of the display device 10_7 can be enhanced.

[0273] As another example, Figure 21 As shown, the display device 10_8 may include a refraction pattern layer PTL_8 disposed above and below the optical pattern layer CML. The refraction pattern layer PTL_8 may include a second refraction pattern layer PTL2_8 disposed above the optical pattern layer CML and a third refraction pattern layer PTL3_8 disposed below the optical pattern layer CML.

[0274] Since the second refraction pattern layer PTL2_8 is Figure 15 The refraction pattern layer PTL_2 described in the embodiment is substantially the same, and the third refraction pattern layer PTL3_8 is substantially the same as Figure 17 The refraction pattern layer PTL_4 described in FIG. 1 is substantially the same as that in FIG. 2 , and thus repeated description thereof will be omitted.

[0275] The display device 10_8 according to this embodiment is different from the aforementioned Figure 20 Compared with the embodiment of FIG. 1 , the difference is that the display device 10_8 according to this embodiment does not include the first refraction pattern layer ( Figure 20 's PTL1_7), and the rest of the configuration is substantially the same, so the specific description will be omitted.

[0276] Figures 22 to 25 1 is a cross-sectional view illustrating various steps of a method for manufacturing a display device according to an embodiment. Figures 22 to 25 As a description of the manufacturing Figures 1 to 13 A cross-sectional view of a method for displaying a device with Figures 1 to 13 Substantially the same components are denoted by the same reference numerals, and detailed reference numerals are omitted.

[0277] First, refer to Figure 22 , a light-blocking material layer BML is formed on the first substrate SUB1.

[0278] The light-blocking material layer BML can be formed using an organic light-blocking material or a metal light-blocking material. For example, the organic light-blocking material can include at least one of carbon black (CB) and titanium black (TiBK), but is not limited thereto. Furthermore, the metal light-blocking material can include at least one of chromium, chromium oxide, and chromium nitride, but is not limited thereto.

[0279] For example, the step of forming the light-blocking material layer BML can be performed by inkjet printing or spin coating using polyacrylate resin, epoxy resin, phenolic resin, polyamide resin, polyimide resin, unsaturated polyester resin, polyphenyleneether resin, polyphenylenesulfide resin or benzocyclobutene (BCB) including the above-mentioned light-blocking materials, but is not limited thereto.

[0280] Then, refer to Figure 23 as well as Figure 24 A first light-transmitting layer HRL is formed on the light-blocking material layer BML, and the light-blocking material layer BML is etched to form a light-blocking portion BA and a light-transmitting portion TA. In this case, the first light-transmitting layer HRL can be used as a hard mask HM for etching the light-blocking material layer BML. That is, the first light-transmitting layer HRL can be formed at a location that defines the light-transmitting portion TA.

[0281] For example, the step of forming the first light-transmitting layer HRL may be performed by plasma chemical vapor deposition (PECVD). The first light-transmitting layer HRL may be formed to include a material such as silicon nitride (SiN x ), silicon oxynitride (SiON), silicon oxide (SiO x ), titanium oxide (TiO x ) or aluminum oxide (AlO x ) etc., but is not limited thereto and may also be formed as an organic film containing inorganic particles.

[0282] Then, refer to Figure 25A second light-transmitting layer LRL is formed on the first light-transmitting layer HRL. The second light-transmitting layer LRL can be formed so that the light-transmitting portion TA of the optical pattern layer CML is filled and the first light-transmitting layer HRL is covered. The second light-transmitting layer LRL can completely fill the light-transmitting portion TA and contact the first substrate SUB1, but this is not limited to this. For example, an air layer can be formed at least partially between the second light-transmitting layer LRL and the first substrate SUB1.

[0283] The upper surface of the second light-transmitting layer LRL can be substantially flat. Specifically, the second light-transmitting layer LRL can function as a planarization layer, compensating for any step differences in the structure disposed below. This allows light incident on the upper surface of the second light-transmitting layer LRL to uniformly travel toward the optical pattern layer CML.

[0284] For example, the step of forming the second light-transmitting layer LRL can be performed by inkjet printing or spin coating using a transparent organic substance such as polyacrylate resin, epoxy resin, phenolic resin, polyamide resin, polyimide resin, unsaturated polyester resin, polyphenyleneether resin, polyphenylenesulfide resin or benzocyclobutene (BCB), but is not limited thereto.

[0285] Then, if Figure 2 As shown, a fingerprint sensor layer FPSL is formed on the lower portion of the first substrate SUB1, and a display panel is formed on the optical pattern layer CML, thereby completing the display device. As described above, the fingerprint sensor layer FPSL can be attached in a separate process after the optical pattern layer CML and the refractive pattern layer PTL are formed, but this is not limited to this. For example, the optical pattern layer CML and the refractive pattern layer PTL can also be formed directly on the fingerprint sensor layer FPSL.

[0286] According to the display device manufacturing method of this embodiment, the first light-transmitting layer HRL containing a high-refractive-index material can be used as a hard mask HM to etch the light-blocking material layer BML, eliminating the need for a separate process to remove the hard mask HM. This simplifies the display device manufacturing process. Consequently, the manufacturing time and cost of a display device including a refractive pattern layer PTL can be reduced.

[0287] Although the embodiments of the present invention have been described above with reference to the accompanying drawings, those skilled in the art with ordinary knowledge in the art will understand that the present invention can be implemented in other specific forms without changing the technical concept or essential features. Therefore, the embodiments described above should be understood in all aspects as illustrative rather than restrictive.

Claims

1. A display device, comprising: a fingerprint sensor layer that receives light reflected from external objects; a substrate, arranged on the fingerprint sensor layer; an optical pattern layer, arranged on the substrate, and comprising a light-blocking portion and a light-transmitting portion penetrating the light-blocking portion in one direction; a first light-transmitting layer, arranged on the light-blocking portion and having a first refractive index; a second light-transmitting layer, disposed on the first light-transmitting layer and having a second refractive index different from the first refractive index; as well as a light-emitting element layer, arranged on the second light-transmitting layer, The first light-transmitting layer is not arranged on the light-transmitting portion.

2. The display device according to claim 1, wherein The first light-transmitting layer includes an opening overlapping with the light-transmitting portion, The second light-transmitting layer fills the opening and the light-transmitting portion of the first light-transmitting layer.

3. The display device according to claim 1, wherein The first refractive index is greater than the second refractive index.

4. The display device according to claim 3, wherein: The first light-transmitting layer includes at least one of an inorganic material layer and an organic material layer, wherein the inorganic material layer includes at least one inorganic material selected from silicon nitride, silicon oxynitride, silicon oxide, titanium oxide and aluminum oxide, and the organic material layer includes inorganic particles formed using the above-mentioned inorganic materials.

5. The display device according to claim 3, wherein: The second light-transmitting layer includes a transparent organic substance. The display device according to claim 3 , wherein: The refractive index ratio of the first light-transmitting layer to the second light-transmitting layer expressed by the following mathematical formula is less than or equal to 0.9775: Refractive index ratio=second refractive index of the second light-transmitting layer / first refractive index of the first light-transmitting layer.

7. The display device according to claim 1, wherein: The light-blocking portion includes at least one of an organic light-blocking material and a metal light-blocking material.

8. The display device according to claim 1, further comprising: a lens layer, arranged between the second light-transmitting layer and the light-emitting element layer, and having an inclined surface, The inclined surface of the lens layer overlaps with the light-blocking portion along the one direction. Of the light reflected from the external object, the light incident on the inclined surface is refracted toward the light transmitting portion.

9. The display device according to claim 1, further comprising: The first lens layer is arranged between the substrate and the optical pattern layer and has a first inclined surface. The fingerprint sensor layer includes a plurality of light-receiving elements including a light-receiving layer. The first inclined surface overlaps with the region between the light receiving layers included in the plurality of light receiving elements along the one direction. Of the light transmitted through the light-transmitting portion, the light incident on the first inclined surface is refracted toward the light-receiving layer included in at least one of the plurality of light-receiving elements.

10. The display device according to claim 9, further comprising: The second lens layer is arranged between the second light-transmitting layer and the light-emitting element layer and has a second inclined surface. The second inclined surface of the second lens layer overlaps with the light-blocking portion along the one direction. Of the light reflected from the external object, the light incident on the second inclined surface is refracted toward the light transmitting portion.

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