Mask, display panel and display device

Abstract

The present application discloses a mask, a display panel and a display device, wherein the mask comprises: a pattern layer and a support layer, wherein the pattern layer is laid on the support layer, wherein at least one first opening is provided on the pattern layer, wherein the first opening corresponds to the light recognition area in the substrate, and the cathode selection layer is used to reduce the deposition of the cathode layer in the light recognition area. In the embodiment of the present application, by forming at least one opening on the pattern layer on the mask, when the pixel layer on the display panel is formed by using the mask, the opening on the mask corresponds to the position of the light recognition module in the display panel, so as to form a CPM layer at the position, so that when the cathode layer is formed, due to the selectivity of the CPM layer to the cathode layer, the cathode layer covers less of the light recognition area, thereby improving the light transmittance in the full display screen, ensuring the recognition accuracy, and improving the user experience.

Description

Technical Field

[0001] The present invention generally relates to the field of display technology, and in particular to a mask, a display panel and a display device. Background Art

[0002] With the development of display technology and the improvement of user requirements, the application demand for comprehensive display devices is getting higher and higher. In addition, in order to improve the convenience and security of display devices, face-scanning authentication methods, that is, authentication methods using Face ID, have been gradually developed.

[0003] In order to achieve full-screen display, the infrared light wave emission and response sensor of Face ID needs to be moved inside the display panel, which requires a higher transmittance to infrared light waves.

[0004] As for OLED screens, since their cathode has a great influence on the transmittance of infrared light waves, the recognition accuracy of Face ID is limited, affecting user usage. Summary of the invention

[0005] In view of the above-mentioned defects or deficiencies in the prior art, it is desired to provide a mask plate and a display panel, by opening an opening corresponding to the position of the light recognition area on at least the pattern layer of the mask plate to form a cathode selection material layer that reduces the adhesion of the cathode layer, thereby forming an identification area with a higher transmittance to light waves.

[0006] In a first aspect, an embodiment of the present application provides a mask plate, including:

[0007] A pattern layer and a support layer, wherein the pattern layer is laid on the support layer, and the pattern layer is used to form a pixel layer on a substrate. At least at least one first opening is opened on the pattern layer, and the first opening corresponds to a light recognition area in the substrate. The first opening is used to form a cathode selection layer on the substrate covering the light recognition area, and the cathode selection layer is used to reduce the deposition of the cathode layer on the light recognition area.

[0008] In some embodiments of the first aspect, a projection of the first opening on the substrate is larger than the light recognition area, and a definition ring is formed inside the first opening, and a projection of an inner edge of the definition ring coincides with an edge of the light recognition area.

[0009] In some embodiments of the first aspect, a second opening is provided on the support layer at a position corresponding to the position of the first opening.

[0010] In some embodiments of the first aspect, an edge of the second opening is located within a projection area of ​​the defined ring.

[0011] In some embodiments of the first aspect, an area of ​​the first opening is greater than an area of ​​the second opening.

[0012] In some embodiments of the first aspect, an area of ​​the first opening is smaller than an area of ​​the second opening.

[0013] In some embodiments of the first aspect, the support layer is configured as a solid film layer.

[0014] In some embodiments of the first aspect, the support layer is configured as a half-engraved structure.

[0015] In a second aspect, an embodiment of the present application provides a display panel, in which a pixel layer and a cathode selection layer are formed by the mask plate as described in the first aspect, and a light recognition device is provided in the display panel, and the cathode selection layer covers the light recognition device.

[0016] In a third aspect, an embodiment of the present application provides a display device, comprising the display panel as described in the second aspect.

[0017] In summary, the mask plate, display panel and display device provided in the embodiments of the present application form at least one opening on at least the pattern layer on the mask plate, and then when the mask plate is used to form a pixel layer on the display panel, the opening on the mask plate corresponds to the position of the infrared recognition module in the display panel to form a CPM layer at this position, so that when the cathode layer is formed, due to the selectivity of the CPM layer for the cathode layer, the cathode layer is less deposited on the CPM layer corresponding to the light recognition area, thereby improving the transmittance of light in the full display screen, ensuring recognition accuracy, and enhancing user experience. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] Other features, objects and advantages of the present application will become more apparent by reading the detailed description of non-limiting embodiments made with reference to the following drawings:

[0019] Figure 1 A schematic diagram of the structure of the mask provided in the embodiment of the present application;

[0020] Figure 2 A schematic diagram of the structure of a display panel provided in an embodiment of the present application;

[0021] Figure 3 A schematic diagram of the structure of a mask provided in some embodiments of the present application;

[0022] Figure 4 A schematic diagram of the structure of a mask provided in some embodiments of the present application;

[0023] Figure 5 A schematic diagram of the structure of a display panel provided in some embodiments of the present application;

[0024] Figure 6A schematic diagram of the structure of a mask provided in some embodiments of the present application;

[0025] Figure 7 A schematic diagram of the structure of a display panel provided in some embodiments of the present application;

[0026] Figure 8 A schematic diagram of the structure of a mask provided in some embodiments of the present application;

[0027] Fig. 9 A schematic diagram of the structure of a display panel provided in some embodiments of the present application.

[0028] Description of reference numerals:

[0029] 1-pattern layer, 2-support layer, 3-first opening, 4-light recognition area, 5-display screen, 6-positioning ring, 7-second opening. DETAILED DESCRIPTION

[0030] The present application is further described in detail below in conjunction with the accompanying drawings and embodiments. It is to be understood that the specific embodiments described herein are only used to explain the relevant invention, rather than to limit the invention. It is also necessary to explain that, for ease of description, only the parts related to the invention are shown in the accompanying drawings.

[0031] It should be noted that, in the absence of conflict, the embodiments and features in the embodiments of the present application can be combined with each other. The present application will be described in detail below with reference to the accompanying drawings and in combination with the embodiments.

[0032] It is understandable that with the continuous development of display technology, the full screen of the device is required while achieving convenient and safe identification for users.

[0033] For Face ID recognition technology, it is necessary to transmit and receive infrared light, that is, to set up an infrared light transmitting module and an infrared light receiving module on the display panel to detect and recognize facial features. Or, in other applications, it is necessary to receive and send light, such as video, and to recognize visible light. In addition, with the development of display technology, in order to reduce the size of the device and increase the display area, full-screen display is becoming more and more widely used.

[0034] It is understandable that in the full-screen technology, the infrared receiving module and sending module in the Face ID recognition technology, or the light sending module and receiving module in other application scenarios, such as the emission and reception of visible light, will be covered in the cathode layer of the display panel. However, the transmittance of the cathode layer to light waves is very low, such as for infrared light, usually less than 40%, which makes the recognition accuracy limited in the full-screen, restricting the development of the full-screen.

[0035] It can also be understood that the cathode patterning material (CPM) is a material that is selectively deposited only on the cathode material. In the place where there is CPM material, the cathode will be difficult to adhere to, thereby achieving the purpose of reducing cathode adhesion, thereby improving the infrared light transmittance in the full-screen scenario, and ultimately improving the light recognition accuracy of the light recognition area.

[0036] It can also be understood that in the process of forming a display panel, a fine metal mask (FMM) is usually used when forming a pixel layer on a substrate, and in order to increase the stability of the FMM, the FMM can be laid on a supporting layer, namely, an F-MASK, and the F-MASK is usually set to a rectangular mesh structure.

[0037] In the embodiment of the present application, in order to achieve full-screen display while ensuring the recognition accuracy of the light recognition area, taking into account the special performance of CPM (Cathode Patterning Material) in the selection of cathode materials, the CPM material layer is pre-deposited through a mask plate in the corresponding area where the light receiving module and the light emitting module need to be set, that is, the light recognition area. When the cathode layer is subsequently formed, due to the selective deposition performance of CPM on the cathode material, the cathode is rarely attached to the recognition area, thereby ensuring the recognition accuracy of the light recognition area while achieving full-screen display.

[0038] In order to better understand and illustrate the mask and display panel provided in the embodiments of the present application, Figures 1 to 9 Elaborate in detail.

[0039] Figure 1 A schematic diagram of the structure of the mask provided in the embodiment of the present application, such as Figure 1 As shown, the mask specifically includes:

[0040] A pattern layer 1 and a support layer 2, wherein the pattern layer is laid on the support layer, and the pattern layer is used to form a pixel layer on a substrate. At least one first opening 3 is provided on the pattern layer, and the first opening corresponds to a light recognition area 4 in the substrate. The first opening is used to form a cathode selection layer on the substrate covering the light recognition area, and the cathode selection layer is used to reduce the deposition of an upper cathode layer in the light recognition area.

[0041] Specifically, Figure 1 and Figure 2As shown, the mask provided in the example of the present application may include a two-layer structure, namely a supporting layer that plays a supporting role, and a pattern layer laid on the supporting layer, namely a fine metal mask (FMM). In order to achieve full-screen display and ensure the recognition accuracy of the middle light in the light recognition area, at least an opening may be opened on the pattern layer. When the mask is fixed on the substrate, the opening corresponds to the light recognition area of ​​the light recognition area of ​​the display panel, that is, the corresponding position of the light receiving module and the light transmitting module set on the substrate, so as to form a deposition area of ​​CPM on the substrate.

[0042] It can be understood that during the preparation of the display panel, the opening setting can be utilized to deposit a CPM layer on the light recognition area, so that when the cathode layer is formed, due to the presence of the CPM material layer in the recognition area, the cathode in the recognition area is difficult to adhere. In this way, in the full-screen display scenario, the recognition module in the light recognition area is unlikely to be blocked by the cathode layer, thereby ensuring the recognition accuracy of the light recognition area.

[0043] Optionally, in other embodiments of the present application, in order to further improve the etching accuracy and reduce the process difficulty, a larger first opening is formed on the pattern layer of the mask plate at a position corresponding to the light recognition area of ​​the light recognition area, that is, an opening that completely covers the light recognition area and is larger than the accuracy of the light recognition area, and a definition ring 6 can be set at its edge.

[0044] For example, Figure 3 As shown, a larger first opening covering the entire light recognition area can be formed on the pattern layer of the mask plate, so that the area of ​​the first opening is larger than the area of ​​the light recognition area, and while forming the larger opening, a positioning ring can be formed at a corresponding position on the edge of the light recognition area of ​​the light recognition area through an etching process.

[0045] Optionally, in some embodiments of the present application, in order to improve recognition accuracy and reduce process difficulty, on the basis of opening the opening on the pattern layer, the support layer may be etched to form an opening at the same position on the support layer, namely, the second opening 7.

[0046] It is understandable that in actual FMM, the pattern layer on it is usually set as a very thin layer structure, and the bottom support layer is set as a thicker support frame. When etching to form an opening on the mask, the difficulty of forming the opening with different precision is also different due to the different layer thicknesses.

[0047] For example, for the pattern layer, since it is a thinner film layer, the opening precision formed is usually higher, and its error can be controlled within about 10 microns. However, the etching precision of the support layer is lower than that of the pattern layer, and can be controlled within about 100 microns.

[0048] In some embodiments of the present application, according to specific usage scenarios, such as the size of the light recognition area of ​​the light recognition area in the display screen, that is, different requirements on the accuracy of the deposition area corresponding to the light recognition area of ​​the light recognition area, when setting the openings on the pattern layer or on the supporting layer at the same time, the opening boundary, that is, the area boundary for depositing CPM, can be defined by exposing FMM or F-Mask at the edge of the opening, that is, the edge of the recognition area, so as to meet different process accuracies.

[0049] It can be understood that if the boundary of the light recognition area is defined by exposing the FMM at the edge of the opening, the corresponding accuracy is higher, that is, for scenes with high accuracy requirements, the FMM needs to be exposed to improve the boundary accuracy of the opening. On the contrary, the opening boundary can be defined by exposing the F-Mask at the edge of the opening to reduce the process difficulty.

[0050] For example, in some embodiments, in a scenario where the light recognition area is large, the opening boundary thereof, ie, the boundary of the area where the CPM is deposited, can be defined by exposing the F-Mask.

[0051] Specifically, while a first opening is opened at a position corresponding to the optical recognition area of ​​the optical recognition area of ​​the pattern layer, a second opening can also be opened on the supporting layer at the same position. In order to reduce the difficulty of the process, the diameter of the first opening on the pattern layer can be made larger than the diameter of the second opening on the supporting layer, so that the supporting layer is exposed at the boundary of the optical recognition area of ​​the optical recognition area, that is, the optical recognition area of ​​the optical recognition area is defined by the opening of the supporting layer.

[0052] like Figure 4 and Figure 5 As shown, the outer lines indicate the first opening area on the pattern layer, and the inner lines indicate the second opening area on the support layer.

[0053] For another example, in some other embodiments, in order to improve the recognition accuracy of the light recognition area, such as in a scenario where the light recognition area is small, the CPM deposition boundary may be defined by exposing the FMM.

[0054] Specifically, a first opening is opened at a position corresponding to the light recognition area of ​​the pattern layer, and a second opening is opened at the same position on the support layer. In addition, in order to improve the process accuracy, the diameter of the first opening on the pattern layer can be smaller than the diameter of the second opening on the support layer, so that the pattern layer is exposed at the boundary of the light recognition area, that is, the light recognition area is defined by the first opening of the pattern layer.

[0055] like Figure 6 and Figure 7As shown, the outer lines indicate the opening area on the support layer, and the inner lines indicate the opening area on the pattern layer.

[0056] Optionally, for the above Figure 3 In the embodiment shown, a definition ring is formed on the pattern layer. Similarly, in order to ensure the process accuracy, as shown in FIG. Figure 8 and Fig. 9 As shown, a second opening can be formed on the support layer. Furthermore, the edge of the second opening of the support layer can be located within the projection area of ​​the defined ring, that is, the edge of the pattern layer is exposed to the light recognition area, so that the light recognition area is defined by the pattern layer.

[0057] Optionally, in some embodiments of the present application, in order to improve the stability of the pattern layer, the support layer may be set as a solid film layer.

[0058] It can be understood that after the support layer is set as a solid film layer, corresponding through holes corresponding to the pattern layer are opened thereon, such as openings corresponding to the pixel sub-units.

[0059] Furthermore, in some other embodiments of the present application, in order to reduce the overall mass of the mask and avoid wrinkles on the mask when the mesh is stretched, after the support layer is used as a solid film layer, the solid film layer can be half-engraved.

[0060] For example, the support layer on the back side of the entire mask plate may be half-etched to form an etched pattern that reduces weight.

[0061] Optionally, the opening in the embodiment of the present application can be set to a circular or square structure, and the embodiment of the present application is not limited to this.

[0062] It can be understood that the infrared receiving module and infrared transmitting module of Face ID in the full display screen are set at different positions of the display panel as exemplified in the embodiments of the present application, and correspondingly, two openings are formed on the mask. In other embodiments, the infrared receiving module and the infrared transmitting module can be integrated and set in the same area, and correspondingly, an opening can be opened in the corresponding area of ​​the infrared receiving module and the infrared transmitting module on the mask.

[0063] It can also be understood that the number and shape of the openings formed on the mask in practice can be determined according to the actual scenario, and the embodiments of the present application do not limit this.

[0064] On the other hand, the embodiment of the present application further provides a display panel, on which a Face ID recognition module is provided, and the display panel forms a pattern layer through the mask provided by the above embodiment. That is, the pixel layer is formed through the mask provided by the above embodiment, and the CPM layer is formed at the position of the light recognition area, so that there is no less cathode attached to the light recognition area.

[0065] On the other hand, an embodiment of the present application further provides a display device, which includes the display panel of the above embodiment.

[0066] In summary, the mask plate, display panel and display device provided in the embodiments of the present application form at least one opening on the pattern layer on the mask plate, or also include a supporting layer, so that when the mask plate is used to form a pixel layer on the display panel, the opening on the mask plate corresponds to the light recognition area in the display panel to form a CPM layer at this position, so that when the cathode layer is formed, due to the selectivity of the CPM layer to the cathode layer, it is difficult for the cathode layer to cover the light recognition area, thereby improving the transmittance of light in the full display screen, ensuring the recognition accuracy of the light recognition area, and improving the user experience.

[0067] The above description is only a preferred embodiment of the present application and an explanation of the technical principles used. Those skilled in the art should understand that the scope of the invention involved in the present application is not limited to the technical solution formed by a specific combination of the above technical features, but should also cover other technical solutions formed by any combination of the above technical features or their equivalent features without departing from the inventive concept. For example, the above features are replaced with (but not limited to) technical features with similar functions disclosed in the present application.

Claims

1. A mask, characterized in that: include: A pattern layer and a support layer, wherein the pattern layer is laid on the support layer, the pattern layer is used to form a pixel layer on a substrate, at least one first opening is provided on the pattern layer, the first opening corresponds to a light recognition area in the substrate, the first opening is used to form a cathode selection layer covering the light recognition area on the substrate, and the cathode selection layer is used to reduce the deposition of a cathode layer on the light recognition area; The projection of the first opening on the substrate is larger than the light recognition area, and a definition ring is formed inside the first opening, and the projection of the inner edge of the definition ring coincides with the edge of the light recognition area.

2. The mask according to claim 1, characterized in that: A second opening is provided on the support layer at a position corresponding to the position of the first opening.

3. The mask according to claim 2, characterized in that: The edge of the second opening is located within the projection area of ​​the definition ring.

4. The mask according to claim 2, characterized in that: An area of ​​the first opening is greater than an area of ​​the second opening.

5. The mask according to claim 2, characterized in that: An area of ​​the first opening is smaller than an area of ​​the second opening.

6. The mask according to any one of claims 2 to 5, characterized in that: The support layer is configured as a solid film layer.

7. The mask according to claim 6, characterized in that: The support layer is configured as a semi-engraved structure.

8. A display panel, characterized in that: The pixel layer and cathode selection material in the display panel are formed by the mask according to any one of claims 1 to 7. A light recognition device is provided in the display panel, and the cathode selection layer covers the light recognition device.

9. A display device, characterized in that: Comprising the display panel as claimed in claim 8.

Images