Display device

Abstract

A display device includes: a substrate including a light-emitting region and a light-shielding region, the light-shielding region including a spacer region; a color filter layer including color filters and dummy color patterns, wherein the color filters are disposed in the light-emitting region and the dummy color patterns are disposed in the spacer region; a light-transmitting layer disposed on the color filter layer and including a light-transmitting pattern and a light-transmitting dummy pattern, wherein the light-transmitting pattern is disposed on the color filters and the light-transmitting dummy pattern is disposed on the dummy color patterns; and a bank layer disposed on the dummy color patterns, wherein the bank layer includes a spacer portion disposed in the light-shielding region and a bank portion disposed in the light-shielding region, wherein the spacer portion overlaps with the spacer region, and wherein the bank portion has a height smaller than that of the spacer portion with respect to the substrate.

Description

[0001] Cross - reference to related applications

[0002] This application claims priority to Korean Patent Application No. 10 - 2020 - 0081934, filed on July 3, 2020, the disclosure of which is incorporated herein by reference in its entirety. Technical Field

[0003] The present disclosure relates to a display device, and more particularly, to a display device including a bank layer. Background Art

[0004] With the development of multimedia, display devices have been increasingly used, and various types of display devices such as liquid crystal display (LCD) devices or organic light - emitting diode (OLED) display devices have been used.

[0005] A self - emissive display device is a display device including a self - emissive element such as an OLED. A typical self - emissive element may include two electrodes facing each other and an emission layer interposed between the two electrodes. In the case where the self - emissive element is an OLED, electrons and holes from the two electrodes may recombine in the emission layer to generate excitons, and light may be emitted in response to the transition of excitons from an excited state to a ground state.

[0006] The self - emissive display device does not require a separate light source and can thus have low power consumption, and can provide a relatively thin and lightweight display device with high - quality characteristics such as a wide viewing angle, high brightness and contrast, and a fast response speed. Summary of the Invention

[0007] According to an embodiment of the present invention, a display device includes: a substrate including a light - emitting region and a light - shielding region, the light - shielding region including a spacer region; a color filter layer disposed on the substrate and including a color filter and a dummy color pattern, wherein the color filter is disposed in the light - emitting region, and the dummy color pattern is disposed in the spacer region; a light - transmissive layer disposed on the color filter layer and including a light - transmissive pattern and a light - transmissive dummy pattern, wherein the light - transmissive pattern is disposed on the color filter, and the light - transmissive dummy pattern is disposed on the dummy color pattern; and a bank layer disposed on the dummy color pattern, wherein the bank layer includes a spacer portion disposed in the light - shielding region and a bank portion disposed in the light - shielding region, wherein the spacer portion overlaps with the spacer region, wherein the bank portion has a height smaller than that of the spacer portion with respect to the substrate and does not overlap with the spacer region.

[0008] In an embodiment of the present invention, the color filter includes a first color filter, a second color filter, and a third color filter, wherein the first color filter selectively transmits light of a first color through the first color filter, wherein the second color filter selectively transmits light of a second color through the second color filter, and wherein the third color filter selectively transmits light of a third color through the third color filter.

[0009] In an embodiment of the present invention, the dummy color pattern includes the same material as at least one of the first color filter, the second color filter, and the third color filter.

[0010] In an embodiment of the present invention, the dummy color pattern includes a first dummy color pattern and a second dummy color pattern disposed on the first dummy color pattern. The first dummy color pattern includes the same material as the first color filter, and the second dummy color pattern includes the same material as the second color filter.

[0011] In an embodiment of the present invention, the display device further includes a wavelength conversion layer disposed on the color filter layer in the light emitting region, wherein a light transmissive pattern is disposed on the first color filter and the wavelength conversion layer includes a first wavelength conversion pattern and a second wavelength conversion pattern, wherein the first wavelength conversion pattern is disposed on the second color filter, and the second wavelength conversion pattern is disposed on the third color filter.

[0012] In an embodiment of the present invention, the first color is blue, the second color is green, and the third color is red.

[0013] In an embodiment of the present invention, the light transmissive dummy pattern overlaps with the dummy color pattern. The light transmissive dummy pattern and the dummy color pattern form a dummy pattern, and the spacer portion overlaps with the dummy pattern.

[0014] In an embodiment of the present invention, the spacer portion and the bank portion are integrally formed.

[0015] In an embodiment of the present invention, the bank layer at least partially covers the dummy pattern.

[0016] In an embodiment of the present invention, the bank layer is not disposed in the light emitting region.

[0017] In an embodiment of the present invention, the display device further includes a filling layer disposed between the display substrate and the color conversion substrate to couple the display substrate and the color conversion substrate to each other. Description of the Drawings

[0018] By describing in detail the embodiments of the present invention with reference to the accompanying drawings, the above and other features of the present invention will become more apparent. In the drawings:

[0019] Figure 1 is a perspective view of a display device according to an embodiment of the present invention;

[0020] Figure 2 is a cross-sectional view taken along line II-II’ of Figure 1 ;

[0021] Figure 3 is a layout diagram showing the arrangement of pixels of a Figure 1 display device;

[0022] Figure 4 is a cross-sectional view of a Figure 1 display device;

[0023] Figure 5 is a flowchart showing a method of manufacturing a color conversion substrate of a display device according to an embodiment of the present invention;

[0024] Figure 6 , Figure 7 , Figure 8 , Figure 9 , Figure 10 and Figure 11 are cross-sectional views showing steps of a method of manufacturing a display device according to an embodiment of the present invention;

[0025] Figure 12 is a cross-sectional view of a color conversion substrate of a display device according to an embodiment of the present invention;

[0026] Figure 13 and Figure 14 are cross-sectional views showing a method of manufacturing a color conversion substrate of a display device according to an embodiment of the present invention;

[0027] Figure 15 is an enlarged cross-sectional view of a spacer of a display device according to an embodiment of the present invention;

[0028] Figure 16 is an enlarged cross-sectional view of a spacer of a display device according to an embodiment of the present invention;

[0029] Figure 17 is an enlarged cross-sectional view of a spacer of a display device according to an embodiment of the present invention; and

[0030] Figure 18 is a cross-sectional view of a display device according to an embodiment of the present invention. DETAILED DESCRIPTION

[0031] The present invention will now be described more fully hereinafter with reference to the accompanying drawings. However, the present invention may be embodied in different forms and should not be construed as limited to the embodiments set forth herein.

[0032] It will also be understood that when a layer is referred to as being "on" another layer or substrate, it can be directly on the other layer or substrate, or an intermediate layer can be present. Throughout the specification, the same reference numerals may indicate the same components, and thus, repeated descriptions may be omitted.

[0033] It will be understood that although the terms "first", "second", etc. may be used herein to describe various elements, these elements should not be limited by these terms. These terms are only used to distinguish one element from another. For example, without departing from the spirit and scope of the present invention, the first element discussed below can be referred to as the second element. Similarly, the second element can also be referred to as the first element.

[0034] Hereinafter, embodiments of the present invention will be described with reference to the drawings.

[0035] Figure 1 is a perspective view of a display device according to an embodiment of the present invention. Figure 2 is along Figure 1 a cross-sectional view taken along line II-II'.

[0036] Referring to Figure 1 and Figure 2 , the display device 1 can refer to almost all types of electronic devices including a display screen. Examples of the display device 1 can include a television (TV), a laptop computer, a monitor, a billboard, a mobile phone, a smartphone, a tablet personal computer (PC), an electronic watch, a smart watch, a watch phone, a mobile communication terminal, an electronic notepad, an e-book, a portable multimedia player (PMP), a navigation device, a gaming machine, a digital camera, and an Internet of Things (IoT) device.

[0037] A first direction DR1, a second direction DR2, and a third direction DR3 are shown in the drawings. For example, the first direction DR1 and the second direction DR2 can be directions that are substantially perpendicular to each other in the same plane. The third direction DR3 can be a direction that is substantially perpendicular to the plane including the first direction DR1 and the second direction DR2. The third direction DR3 can be substantially perpendicular to each of the first direction DR1 and the second direction DR2. For example, the third direction DR3 refers to the thickness direction of the display device 1.

[0038] Unless otherwise specified, as used herein, the terms "above" and "top" refer to the third direction DR3 (or the display direction of the display device 1), and as used herein, the term "top surface" refers to the surface oriented in the third direction DR3. Additionally, unless otherwise specified, as used herein, the terms "below" and "bottom" refer to the direction opposite to the third direction DR3 (or the direction opposite to the display direction of the display device 1), and as used herein, the term "bottom surface" refers to the surface oriented in the direction opposite to the third direction DR3. For example, the "top surface" may be opposite to the "bottom surface" in the third direction DR3.

[0039] The display device 1 may have, for example, a rectangular shape in a plan view. For example, the display device 1 may have a rectangular shape in a plan view, the rectangular shape having a long side in the first direction DR1 and a short side in the second direction DR2. The corners where the long side of the display device 1 in the first direction DR1 and the short side of the display device 1 in the second direction DR2 meet may be right-angled or may be rounded to have a predetermined curvature. There is no particular limitation on the planar shape of the display device 1. For example, the display device 1 may have various other shapes such as a circular shape in a plan view.

[0040] The display device 1 may include a display area DA for displaying an image and a non-display area NDA for not displaying an image. The display area DA may include a plurality of pixels PX. The non-display area NDA may be provided at the periphery of the display area DA and may at least partially surround the display area DA. For example, the non-display area NDA may completely surround the display area DA.

[0041] The display device 1 may include a display substrate 10 and a color conversion substrate 30 facing the display substrate 10. The display device 1 may further include: a sealing member 50 for coupling the display substrate 10 and the color conversion substrate 30 to each other; and a filling layer 70 for filling the gap between the display substrate 10 and the color conversion substrate 30.

[0042] Light having a specific peak wavelength may be emitted from a plurality of emission regions in the display area DA of the display substrate 10. The display substrate 10 may include elements and circuits for displaying an image. For example, the display substrate 10 may include a pixel circuit such as a switching element, a pixel defining film, and a self-luminous element. For example, the pixel defining film may define an emission region and a non-emission region in the display area DA. For example, each of the self-luminous elements may include at least one of an organic light-emitting diode (OLED), a quantum dot light-emitting diode (QLED), a micro light-emitting diode (micro LED) based on an inorganic material, and a nano light-emitting diode (nano LED) based on an inorganic material. Hereinafter, the self-luminous element will be described as an OLED, for example.

[0043] The color conversion substrate 30 may be disposed above the display substrate 10 and may face the display substrate 10. The color conversion substrate 30 may convert the peak wavelength of the light emitted from the display substrate 10 and may transmit the wavelength-converted light through the color conversion substrate 30, or may transmit the emitted light as it is while maintaining the peak wavelength of the light emitted from the display substrate 10.

[0044] The sealing member 50 may be disposed between the display substrate 10 and the color conversion substrate 30 in the non-display area NDA. The sealing member 50 may be disposed along the edges of each of the display substrate 10 and the color conversion substrate 30 in the non-display area NDA and may surround the display area DA in a plan view. The display substrate 10 and the color conversion substrate 30 may be coupled together by the sealing member 50.

[0045] The filling layer 70 may be disposed in the space between the display substrate 10 and the color conversion substrate 30 and may be surrounded by the sealing member 50. The filling layer 70 may fill the gap between the display substrate 10 and the color conversion substrate 30. The filling layer 70 may be formed of a material through which light can pass. The filling layer 70 may include an organic material. For example, the filling layer 70 may be formed of a silicon (Si)-based organic material or an epoxy-based organic material, but the present invention is not limited thereto.

[0046] Figure 3 is a layout diagram showing Figure 1 the arrangement of pixels of the display device.

[0047] Reference Figure 1 and Figure 3 , the display area DA of the display device 1 may include a plurality of pixels PX. The pixel PX may refer to the smallest repeating unit for displaying an image. Each of the pixels PX may include a plurality of sub-pixels. For example, each of the pixels PX may include a first sub-pixel PXS1 that emits light of a first color, a second sub-pixel PXS2 that emits light of a second color, and a third sub-pixel PXS3 that emits light of a third color, but the present invention is not limited thereto. The first color, the second color, and the third color may be blue, green, and red, respectively. One first sub-pixel PXS1, one second sub-pixel PXS2, and one third sub-pixel PXS3 may be provided in each of the pixels PX.

[0048] Each of the pixels PX may include a plurality of light-emitting regions TA and a light-shielding region BA surrounding the light-emitting regions TA. The light-emitting region TA may be a region that outputs the light emitted from the display substrate 10 to the outside of the display device 1 through the color conversion substrate 30, and the light-shielding region BA may be a region through which the light emitted from the display substrate 10 does not pass.

[0049] The light-emitting region TA (TA: TA1, TA2, TA3) may include a first light-emitting region TA1, a second light-emitting region TA2, and a third light-emitting region TA3. The first light-emitting region TA1, the second light-emitting region TA2, and the third light-emitting region TA3 may be the light-emitting regions of the first sub-pixel PXS1, the second sub-pixel PXS2, and the third sub-pixel PXS3, respectively.

[0050] For example, the first light-emitting region TA1, the second light-emitting region TA2, and the third light-emitting region TA3 may be arranged in a so-called "S stripe" pattern. For example, the second light-emitting region TA2 and the third light-emitting region TA3 may be arranged in each odd row to alternate with each other in the row direction. The first light-emitting region TA1 may be arranged in each even row to repeat one by one in the row direction.

[0051] The shape of the sub-pixels in each of the pixels PX may be similar to the shape of the light-emitting region TA of the sub-pixels in each of the pixels PX, but the present invention is not limited thereto. The planar shape and arrangement of the light-emitting region TA of the sub-pixels in each of the pixels PX are not limited to Figure 3 those shown in

[0052] In each of the pixels PX, a light-shielding region BA may be provided to surround a plurality of light-emitting regions TA. In each of the pixels PX, the light-emitting region TA of the sub-pixels may be divided by the light-shielding region BA. The light-shielding regions BA of a pair of adjacent pixels PX may be adjacent to each other. The light-shielding regions BA of a pair of adjacent pixels PX may be connected to each other. The light-shielding regions BA of all the pixels PX may be connected, but the present invention is not limited thereto.

[0053] The display device 1 may include one or more spacers CS. The spacers CS may be provided in the light-shielding region BA. The spacers CS may be provided in the light-shielding region BA and may not overlap with the light-emitting region TA. For example, each of the spacers CS may be provided across a pair of adjacent pixels PX. The diameter of the spacer CS may be larger than the minimum width of the light-shielding region BA. Figure 3 It is shown that each of the spacers CS is provided across two adjacent pixels PX, but the present invention is not limited thereto. In addition, a plurality of spacers CS may be provided in each of the pixels PX.

[0054] The spacer CS may maintain the cell gap between the display substrate 10 and the color conversion substrate 30. The spacer CS will be described in detail later.

[0055] Pixels PX may be alternately arranged in the row direction and the column direction. The shape and arrangement of sub-pixels in each of the pixels PX may be uniform, but the present invention is not limited thereto. Each pixel PX including a plurality of sub-pixels may have a polygonal shape such as a square shape, but the present invention is not limited thereto. Additionally, the pixel PX may have a rhombus shape, a rectangular shape, or the like.

[0056] Figure 4 is Figure 1 a cross-sectional view of a display device.

[0057] Referring Figure 4 to FIG. 1, the display substrate 10 may include a first substrate 110, a pixel defining layer PDL disposed on the surface of the first substrate 110, a plurality of light-emitting elements, and a thin film encapsulation structure 120 covering the light-emitting elements. The color conversion substrate 30 may include a second substrate 310, a color control structure (321, 330, 340, WCL, and TPL_1) disposed on the surface of the second substrate 310 facing the first substrate 110, and spacers CS.

[0058] The display substrate 10 will be described hereinafter.

[0059] The first substrate 110 may be an insulating substrate. The first substrate 110 may include, for example, a transparent material. For example, the first substrate 110 may include a transparent insulating material such as glass or quartz. For example, the first substrate 110 may be a rigid substrate. However, the present invention is not limited to this example. For example, the first substrate 110 may include a plastic such as polyimide (PI) and may have flexible characteristics such as bendability, foldability, or rollability.

[0060] A plurality of sub-pixel electrodes PXSE may be disposed on the surface of the first substrate 110. The sub-pixel electrodes PXSE may be respectively disposed in different sub-pixels. The sub-pixel electrodes PXSE may be separated from each other. A circuit layer for driving the sub-pixel electrodes PXSE may be disposed between the first substrate 110 and the sub-pixel electrodes PXSE. For example, the circuit layer may include a plurality of thin film transistors and capacitors.

[0061] The sub-pixel electrode PXSE can be the first electrode (e.g., an anode electrode) of a light-emitting element (or a light-emitting diode (LED)). The sub-pixel electrode PXSE can have a structure with a high work function material layer where indium tin oxide (ITO), indium zinc oxide (IZO), zinc oxide (ZnO), or indium oxide (In2O3) is stacked, and a reflective material layer of silver (Ag), magnesium (Mg), aluminum (Al), platinum (Pt), lead (Pb), gold (Au), nickel (Ni), neodymium (Nd), iridium (Ir), chromium (Cr), lithium (Li), calcium (Ca), or a mixture thereof. The high work function material layer can be disposed on the reflective material layer, close to the emission layer EML. The sub-pixel electrode PXSE can have a multi-layer structure such as ITO / Mg, ITO / MgF, ITO / Ag, or ITO / Ag / ITO, but the present invention is not limited thereto.

[0062] The pixel defining film PDL can be disposed on the surface of the first substrate 110 along the boundaries of the sub-pixels. The pixel defining film PDL can be disposed on the sub-pixel electrode PXSE and can include an opening exposing the sub-pixel electrode PXSE. The non-emission region NEM and the emission region EMA can be defined by the pixel defining film PDL and the opening in the pixel defining film PDL. The pixel defining film PDL can space the sub-pixel electrodes PXSE apart from each other and insulate them.

[0063] The pixel defining film PDL can include an organic insulating material such as acrylic resin, epoxy resin, phenolic resin, polyamide resin, polyimide resin, unsaturated polyester resin, polyphenylene resin, polyphenylene sulfide resin, or benzocyclobutene (BCB). Additionally, the pixel defining film PDL can include an inorganic material.

[0064] The emission layer EML is disposed on the portion of the sub-pixel electrode PXSE exposed by the pixel defining film PDL. In the case where the display device 1 is an OLED display device, the emission layer EML can include an organic layer containing an organic material. The organic layer can include an organic light-emitting layer and can further include a hole injection / transport layer and / or an electron injection / transport layer as an auxiliary layer for assisting light emission. Additionally, in the case where the display device 1 is a micro-LED display device or a nano-LED display device, the emission layer EML can include an inorganic material such as an inorganic semiconductor.

[0065] In an embodiment of the present invention, each of the emission layers EML can have a tandem structure including a plurality of organic light-emitting layers arranged to overlap each other in the thickness direction and one or more charge generation layers disposed between the plurality of organic light-emitting layers. The plurality of organic light-emitting layers can emit light of the same wavelength or different wavelengths. At least some layers of each of the emission layers EML can be separated from each other in the region between adjacent sub-pixels.

[0066] Throughout the sub-pixels, the wavelengths of the light emitted by the emission layer EML can be substantially the same. For example, the emission layer EML can emit all blue light or ultraviolet light, and since there is a wavelength conversion layer WCL in the color control structures (321, 330, 340, WCL, and TPL_1), the display device 1 can display different colors in different sub-pixels.

[0067] In addition, the wavelengths of the light emitted by the emission layer EML can be different from one sub-pixel to another. For example, the emission layer EML of the first sub-pixel PXS1 can emit light of a first color, and the emission layer EML of the second sub-pixel PXS2 can emit light of a second color. In addition, the emission layer EML of the third sub-pixel PXS3 can emit light of a third color.

[0068] The common electrode CME can be disposed on the emission layer EML. The common electrode CME can not only be in contact with the emission layer EML, but also in contact with the top surface of the pixel defining film PDL.

[0069] All parts of the common electrode CME can be connected without considering the differences between the sub-pixels. For example, the common electrode CME can be a full-surface electrode disposed on the entire surface of the first substrate 110 without considering the differences between the sub-pixels. However, the present invention is not limited thereto, and for example, the common electrode CME can be divided. The common electrode CME can be the second electrode (e.g., the cathode electrode) of the LED.

[0070] The common electrode CME can include a low work function material layer such as Li, Ca, LiF, Al, Mg, Ag, Pt, Pd, Ni, AuNd, Ir, Cr, BaF, Ba, or a compound or mixture thereof (e.g., a mixture of Ag and Mg). The common electrode CME can further include a transparent metal oxide layer disposed on the low work function material layer.

[0071] The sub-pixel electrode PXSE, the emission layer EML, and the common electrode CME can form a light-emitting element (e.g., an OLED). The light emitted by the emission layer EML can be output in the display direction (e.g., in the third direction DR3) of the display device 1 via the common electrode CME.

[0072] The thin film encapsulation structure 120 may be disposed on the common electrode CME. The thin film encapsulation structure 120 may include one or more thin film encapsulation layers. For example, the thin film encapsulation layer may include a first inorganic film 121, an organic film 122, and a second inorganic film 123. The first inorganic film 121 and the second inorganic film 123 may include, for example, silicon nitride, silicon oxide, or silicon oxynitride. The organic film 122 may include an organic insulating material such as acrylic resin, epoxy resin, phenolic resin, polyamide resin, polyimide resin, unsaturated polyester resin, polystyrene resin, polyphenylene sulfide resin, or BCB.

[0073] The color conversion substrate 30 will be described below.

[0074] The color conversion substrate 30 may be disposed to face the thin film encapsulation structure 120 of the display substrate 10. For example, the color conversion substrate 30 may be disposed above the thin film encapsulation structure 120. Referring to the cross-sectional structure of the color conversion substrate 30 in the opposite direction of the third direction DR3 (i.e., in the downward direction), the second substrate 310 of the color conversion substrate 30 may include a transparent material. For example, the second substrate 310 may include a transparent insulating material such as glass or quartz. The second substrate 310 may be a rigid substrate. However, the present disclosure is not limited to this example. For example, the second substrate 310 may include a plastic such as PI and may have a flexible characteristic such as bendability, foldability, or rollability.

[0075] The second substrate 310 may be the same as or different from the first substrate 110 in terms of its material, thickness, and transmittance. For example, the second substrate 310 may have a higher transmittance than the first substrate 110. Since the second substrate 310 includes a material that enables light to pass through the second substrate 310, the second substrate 310 may allow the light emitted from the first light emitting region TA1, the second light emitting region TA2, and the third light emitting region TA3 to pass through the second substrate 310, and thus may provide the light to the outside of the display device 1. The second substrate 310 may be thicker or thinner than the first substrate 110.

[0076] The upper light absorption member UAB may be disposed on the surface of the second substrate 310 facing the first substrate 110 along the boundary of each of the sub-pixels. The upper light absorption member UAB may overlap with the pixel defining film PDL of the display substrate 10 and may be disposed in the light shielding region BA. The upper light absorption member UAB may include an opening that exposes a portion of the surface of the second substrate 310 overlapping with the emission region EMA. The upper light absorption member UAB may block the emission of light from the display device 1 and may suppress the reflection of external light. In a plan view, the upper light absorption member UAB may be formed in a lattice shape.

[0077] The overcoat light absorption member UAB may include an organic material. For example, the overcoat light absorption member UAB may include a light absorption material capable of absorbing visible light. For example, the overcoat light absorption member UAB may be formed of a material that can be used as a black matrix. The overcoat light absorption member UAB may be a light shielding member.

[0078] For example, the overcoat light absorption member UAB may absorb visible light in a specific wavelength range and may allow visible light in another specific wavelength range to pass through the overcoat light absorption member UAB. For example, the overcoat light absorption member UAB may include the same material as a color filter layer CFL. For example, the overcoat light absorption member UAB may be formed of the same material as the first color filter layer 320 which is a blue filter layer.

[0079] The color filter layer CFL may be disposed on the surface of the second substrate 310 where the overcoat light absorption member UAB is disposed. The color filter layer CFL may block the emission of light of colors other than the color of the sub-pixels. In addition, the color filter layer CFL may form a dummy pattern DP for forming a spacer CS to be described later and may control the height of the spacer CS.

[0080] The color filter layer CFL may be disposed in the light emitting region TA and in the spacer region SA in the light shielding region BA. The spacer region SA may be a region where the spacer CS is to be disposed.

[0081] The color filter layer CFL may be disposed in the light emitting region TA on at least a portion of the surface of the second substrate 310 that is exposed through the opening of the overcoat light absorption member UAB. In addition, the color filter layer CFL may be partially disposed on at least a portion of the overcoat light absorption member UAB that is close to the light emitting region TA. The color filter layer CFL may be disposed on the surface of the overcoat light absorption member UAB in the spacer region SA.

[0082] The color filter layer CFL may include a first color filter layer 320, a second color filter layer 330, and a third color filter layer 340. Each of the first color filter layer 320, the second color filter layer 330, and the third color filter layer 340 may transmit light of its specific color and may thus block or absorb light of a color different from the specific color.

[0083] The first color filter layer 320 may include a material capable of selectively allowing light of a first color (e.g., blue light) to pass through the first color filter layer 320 and capable of blocking or absorbing light of a third color (e.g., red light). For example, the first color filter layer 320 may be a blue filter layer and may include a blue colorant such as a blue dye or pigment.

[0084] The first color filter layer 320 may include a first color filter 321 disposed in the first light-emitting region TA1 of the first sub-pixel PXS1. The first color filter 321 may be disposed on the exposed portion of the surface of the second substrate 310 in the first light-emitting region TA1. The first color filter 321 may be partially disposed on at least a portion of the upper light absorption member UAB adjacent to the first light-emitting region TA1. The first color filter 321 may be, for example, a blue color filter.

[0085] The first color filter layer 320 may further include a first dummy color pattern 322 disposed in the spacer region SA. The first dummy color pattern 322 may include the same material as the first color filter 321 and may be formed by the same process as the first color filter 321. For example, the first color filter 321 and the first dummy color pattern 322 may be formed by forming the first color filter layer 320 to be patterned by a single process.

[0086] The first dummy color pattern 322 may be disposed on the upper light absorption member UAB in the spacer region SA. The first dummy color pattern 322 may not be disposed in a portion of the light-shielding region BA adjacent to the spacer region SA. The first dummy color pattern 322 may be disposed to be spaced apart from the first color filter 321.

[0087] The first dummy color pattern 322 may be disposed in the spacer region SA to form a dummy pattern DP.

[0088] The second color filter layer 330 may include a material capable of selectively transmitting light of a second color (e.g., green light) through the second color filter layer 330 and capable of blocking or absorbing light of a third color (e.g., red light). For example, the second color filter layer 330 may be a green color filter layer and may include a green colorant such as a green dye or pigment.

[0089] The second color filter layer 330 may include a second color filter 331 disposed in the second light-emitting region TA2 of the second sub-pixel PXS2. The second color filter 331 may be disposed on the exposed portion of the surface of the second substrate 310 in the second light-emitting region TA2. The second color filter 331 may be partially disposed on at least a portion of the upper light absorption member UAB adjacent to the second light-emitting region TA2. The second color filter 331 may be a green color filter.

[0090] The third color filter layer 340 may include a material capable of selectively transmitting light of a third color (e.g., red light) through the third color filter layer 340 and capable of blocking or absorbing light of colors different from the third color (e.g., light of a first color (e.g., blue light) and light of a second color (e.g., green light)). For example, the third color filter layer 340 may be a red filter layer and may include a red colorant such as a red dye or pigment.

[0091] The third color filter layer 340 may include a third color filter 341 disposed in the third light-emitting region TA3 of the third sub-pixel PXS3. The third color filter 341 may be disposed on an exposed portion of the surface of the second substrate 310 in the third light-emitting region TA3. The third color filter 341 may be partially disposed on at least a part of the upper light absorption member UAB adjacent to the third light-emitting region TA3. The third color filter 341 may be a red filter.

[0092] The first capping layer CPL1 may be disposed on the color filter layer CFL. The first capping layer CPL1 may prevent the color filter layer CFL from being damaged or contaminated by impurities such as moisture or air from the outside of the display device 1. The first capping layer CPL1 may prevent the colorant of the color filter layer CFL from diffusing to other components.

[0093] The first capping layer CPL1 may overlap with the color filter layer CFL. For example, the first capping layer CPL1 may be in direct contact with the surface (e.g., Figure 4 the bottom surface in) of the color filter layer CFL. The first capping layer CPL1 may overlap with the portion of the upper light absorption member UAB exposed by the color filter layer CFL. For example, the first capping layer CPL1 may be in direct contact with the portion of the surface of the upper light absorption member UAB exposed by the color filter layer CFL.

[0094] The first capping layer CPL1 may be formed of an inorganic material. For example, the first capping layer CPL1 may include silicon nitride, aluminum nitride, zirconium nitride, titanium nitride, hafnium nitride, tantalum nitride, silicon oxide, aluminum oxide, titanium oxide, tin oxide, and / or silicon oxynitride.

[0095] The light-transmitting layer TPL may be disposed on the first capping layer CPL1 to overlap with the first color filter layer 320. The light-transmitting layer TPL may be patterned to be disposed in the spacer region SA between the first light-emitting region TA1 and the light-blocking region BA.

[0096] The light-transmitting layer TPL may include a first base resin BRS1 and a first scatterer SCP1 dispersed in the first base resin BRS1.

[0097] The first base resin BRS1 may include a material having a relatively high light transmittance. The first base resin BRS1 may be formed of a transparent organic material. For example, the first base resin BRS1 may include at least one of an epoxy resin, an acrylic resin, a cardo resin, and an imide resin.

[0098] The first scatterer SCP1 may have a refractive index different from that of the first base resin BRS1 and may form an optical interface with the first base resin BRS1. The first scatterer SCP1 may include light-scattering particles that scatter at least some light. For example, the first scatterer SCP1 may include metal oxides such as titanium oxide (TiO2), zirconium oxide (ZrO2), aluminum oxide (Al2O3), indium oxide (In2O3), zinc oxide (ZnO), or tin oxide (SnO2) or organic particles such as particles of an acrylic resin or a urethane resin. The first scatterer SCP1 may scatter light in any direction regardless of the incident direction of the light without substantially changing the peak wavelength of the light.

[0099] The light-transmitting layer TPL may include a light-transmitting pattern TPL_1 provided in the first light-emitting region TA1 and a light-transmitting dummy pattern TPL_2 provided in the spacer region SA. The light-transmitting pattern TPL_1 may be provided on the first color filter 321 in the first light-emitting region TA1. The light-transmitting dummy pattern TPL_2 may be provided on the first dummy color pattern 322 in the spacer region SA of the light-shielding region BA. The light-transmitting pattern TPL_1 and the light-transmitting dummy pattern TPL_2 may be provided to be spaced apart from each other. For example, the light-transmitting pattern TPL_1 and the light-transmitting dummy pattern TPL_2 may include the same material and may be formed to be patterned by a single process. For example, the light-transmitting layer TPL may be formed by coating a photosensitive material and subjecting the photosensitive material to an exposure process and a development process. However, the present invention is not limited thereto.

[0100] The light-transmitting pattern TPL_1 may overlap with the first color filter 321 provided in the first light-emitting region TA1 in the third direction DR3. The light-transmitting pattern TPL_1 may allow the light incident on it from the display substrate 10 to pass through the light-transmitting pattern TPL_1 while maintaining the wavelength of the incident light. The first scatterer SCP1 of the light-transmitting pattern TPL_1 may control the emission angle of the light to be emitted from the light-transmitting pattern TPL_1 by scattering the light. For example, the first color light emitted from the first emission region EMA1 may be emitted from the display device 1 as the first color light through the light-transmitting pattern TPL_1 and the first color filter 321. Here, the first color light may be blue light.

[0101] The light-transmissive dummy pattern TPL_2 may overlap with the first dummy color pattern 322 disposed in the spacer region SA in the third direction DR3. For example, the sidewalls of the light-transmissive dummy pattern TPL_2 may be aligned with the sidewalls of the first dummy color pattern 322, but the present invention is not limited thereto. Additionally, the sidewalls of the light-transmissive dummy pattern TPL_2 may be disposed inside the sidewalls of the first dummy color pattern 322 to expose at least a portion of the surface of the first dummy color pattern 322.

[0102] The light-transmissive dummy pattern TPL_2 may form a dummy pattern DP together with the first dummy color pattern 322. The dummy pattern DP may protrude from the surface of the second substrate 310 (e.g., Figure 4 the bottom surface in). The dummy pattern DP may form a height difference with respect to the surface of the bank layer 370, and thus may contribute to the formation of the spacer CS and the control of the height of the spacer CS during the formation of the bank layer 370 in the light-shielding region BA.

[0103] The second capping layer CPL2 is disposed on the light-transmissive layer TPL. The second capping layer CPL2 may be formed of an inorganic material. The second capping layer CPL2 may include at least one of the materials that may be used to form the first capping layer CPL1 described above. For example, the second capping layer CPL2 may be formed of the same material as the first capping layer CPL1, but the present invention is not limited thereto.

[0104] The second capping layer CPL2 may cover the light-transmissive layer TPL. The second capping layer CPL2 may cover not only the bottom surfaces of each of the light-transmissive pattern TPL_1 and the light-transmissive dummy pattern TPL_2, but also the side surfaces. For example, the second capping layer CPL2 may be in contact with the first capping layer CPL1. For example, the second capping layer CPL2 may not be in contact with the first capping layer CPL1 in the first light-emitting region TA1 and the spacer region SA. As another example, when the second capping layer CPL2 contacts the light-transmissive dummy pattern TPL_2, the second capping layer CPL2 may not be in contact with the first capping layer CPL1. The second capping layer CPL2 may have a conformal shape with respect to the height difference formed by the light-transmissive pattern TPL_1 and the light-transmissive dummy pattern TPL_2. The gap between the light-transmissive pattern TPL_1 and the light-transmissive dummy pattern TPL_2 may not be completely filled with the second capping layer CPL2, but may have a predetermined depth.

[0105] The wavelength conversion layer WCL is disposed on the second capping layer CPL2. The wavelength conversion layer WCL may include a first wavelength conversion pattern WCL1 disposed in the second light-emitting region TA2 of the second sub-pixel PXS2 and a second wavelength conversion pattern WCL2 disposed in the third light-emitting region TA3 of the third sub-pixel PXS3.

[0106] The first wavelength conversion pattern WCL1 may include a second base resin BRS2 and a first wavelength conversion material WCP1 dispersed in the second base resin BRS2. The first wavelength conversion pattern WCL1 may further include a second scatterer SCP2 dispersed in the second base resin BRS2. The second wavelength conversion pattern WCL2 may include a third base resin BRS3 and a second wavelength conversion material WCP2 dispersed in the third base resin BRS3. The second wavelength conversion pattern WCL2 may further include a third scatterer SCP3 dispersed in the third base resin BRS3.

[0107] The second base resin BRS2 and the third base resin BRS3 may include materials having a relatively high light transmittance. The second base resin BRS2 and the third base resin BRS3 may be formed of a transparent organic material. For example, the second base resin BRS2 and the third base resin BRS3 may be formed of the same material as the first base resin BRS1, or may include at least one of the materials that can be used to form the first base resin BRS1 described above. The first base resin BRS1, the second base resin BRS2, and the third base resin BRS3 may include the same material, but the present invention is not limited thereto. For example, the first base resin BRS1, the second base resin BRS2, and the third base resin BRS3 may each be formed of different materials from each other.

[0108] The second scatterer SCP2 and the third scatterer SCP3 may be metal oxide particles or organic particles. The second scatterer SCP2 and the third scatterer SCP3 may include light scattering particles that scatter at least some light. For example, the second scatterer SCP2 and the third scatterer SCP3 may be formed of the same material as the first scatterer SCP1, or may include at least one of the materials that can be used to form the first scatterer SCP1 described above. For example, the first scatterer SCP1, the second scatterer SCP2, and the third scatterer SCP3 may each be formed of different materials from each other.

[0109] The first wavelength conversion material WCP1 may include a material that converts first color light into second color light, and the second wavelength conversion material WCP2 may include a material that converts first color light into third color light. For example, the first wavelength conversion material WCP1 may be a material that converts blue light into green light, and the second wavelength conversion material WCP2 may be a material that converts blue light into red light. For example, the first wavelength conversion material WCP1 and the second wavelength conversion material WCP2 may be quantum dots, quantum rods, or phosphors. The quantum dots may include group IV nanocrystals, II-VI group compound nanocrystals, III-V group compound nanocrystals, IV-VI group nanocrystals, or combinations thereof.

[0110] In a third direction DR3, the first wavelength conversion pattern WCL1 may overlap with a second color filter 331 provided in the second light-emitting region TA2. The first wavelength conversion pattern WCL1 may convert first color light incident thereon from the display substrate 10 into second color light. For example, the first color light emitted from the second emission region EMA2 may be emitted from the display device 1 as second color light through the first wavelength conversion pattern WCL1 and the second color filter 331. Here, the second color light may be green light.

[0111] In a third direction DR3, the second wavelength conversion pattern WCL2 may overlap with a third color filter 341 provided in the third light-emitting region TA3. The second wavelength conversion pattern WCL2 may convert first color light incident thereon from the display substrate 10 into third color light. For example, the first color light emitted from the third emission region EMA3 may be emitted from the display device 1 as third color light through the second wavelength conversion pattern WCL2 and the third color filter 341. Here, the third color light may be red light.

[0112] The light-transmitting patterns TPL_1 of the wavelength conversion layer WCL or the light-transmitting layer TPL may be set to be separated from each other based on their corresponding sub-pixels. The first wavelength conversion pattern WCL1, the second wavelength conversion pattern WCL2, the light-transmitting pattern TPL_1, and the light-transmitting dummy pattern TPL_2 may be provided in the same pixel PX and spaced apart from each other. The gaps between the first wavelength conversion pattern WCL1, the second wavelength conversion pattern WCL2, the light-transmitting pattern TPL_1, and the light-transmitting dummy pattern TPL_2 may generally overlap with the light-shielding region BA except for the spacer region SA. For example, the gaps between the first wavelength conversion pattern WCL1, the second wavelength conversion pattern WCL2, the light-transmitting pattern TPL_1, and the light-transmitting dummy pattern TPL_2 may form valleys.

[0113] The bank layer 370 may be provided on the second capping layer CPL2. The bank layer 370 may be provided in the light-shielding region BA along the boundary of each of the sub-pixels. The bank layer 370 may overlap with the upper light absorption member UAB and / or the pixel defining film PDL. For example, in a plan view, the bank layer 370 may be formed in a lattice shape.

[0114] The bank layer 370 may be formed of a material capable of blocking light from passing through the bank layer 370, and may prevent light from one sub-pixel from penetrating into other adjacent sub-pixels and causing color mixing. In the case where the wavelength conversion layer WCL is formed by, for example, inkjet printing, the bank layer 370 may serve as an obstacle to guide the ink composition to be stably ejected to each desired position during the formation of the wavelength conversion layer WCL.

[0115] The bank layer 370 may include a spacer portion 372 disposed in a spacer region SA of the light-shielding region BA and a bank portion 371 disposed in the entire light-shielding region BA except for the spacer region SA. The bank portion 371 may occupy a portion of the bank layer 370 disposed in a gap between the first wavelength conversion pattern WCL1, the second wavelength conversion pattern WCL2, the light-transmitting pattern TPL_1, and the light-transmitting dummy pattern TPL_2 that form valleys.

[0116] The bank layer 370 may have a height difference on its surface. For example, the height difference of the bank layer 370 may be attributed to the presence of an upper structure disposed on the bank layer 370. The surface shape of the bank layer 370 may conform to the upper structure. For example, due to the dummy pattern DP disposed on the bank layer 370 in the spacer region SA, the bank layer 370 may protrude downward from the second substrate 310 toward the display substrate 10.

[0117] The bank layer 370 may include a spacer portion 372 having a first height and a bank portion 371 having a second height less than the first height. The height of the bank layer 370 may be measured from a reference surface such as the surface (e.g., bottom surface) of the second substrate 310.

[0118] As already mentioned above, the spacer portion 372 may be disposed in the spacer region SA to overlap with the dummy pattern DP. The bank portion 371 may be disposed in the light-shielding region BA except for the spacer region SA and may not overlap with the dummy pattern DP. For example, the bank portion 371 may be disposed in the entire light-shielding region BA. Relative to the second substrate 310, the surface (e.g., Figure 4 bottom surface in) of the spacer portion 372 may have a greater height than the surface (e.g., Figure 4 bottom surface in) of the bank portion 371. The surface of the spacer portion 372 may protrude from the surface of the bank portion 371 by the thickness of the dummy pattern DP.

[0119] Due to the dummy pattern DP protruding from the surface of the second substrate 310, in the spacer region SA and a portion of the light-shielding region BA adjacent to the spacer region SA, the bank layer 370 may be divided into a bank portion 371 and a spacer portion 372 physically connected to the bank portion 371 and protruding downward from the bank portion 371. Since the bank portion 371 and the spacer portion 372 have different heights, the bank layer 370 may have a height difference in the spacer region SA and a portion of the light-shielding region BA adjacent to the spacer region SA. The spacer portion 372 protruding due to the dummy pattern DP including the first dummy color pattern 322 and the light-transmitting dummy pattern TPL_2 may form a spacer CS together with the dummy pattern DP.

[0120] The spacer CS can maintain a distance from the structure disposed above it. For example, the spacer CS can maintain the cell gap or distance between the display substrate 10 and the color conversion substrate 30. Thus, since the spacer CS is disposed between the display substrate 10 and the second substrate 310 of the color conversion substrate 30 to maintain the distance between the display substrate 10 and the color conversion substrate 30, it may not be necessary to design the viscosity and / or rigidity of the filling layer 70 to maintain the distance between the display substrate 10 and the color conversion substrate 30. Therefore, the amount of time spent manufacturing the display device 1 can be shortened, and the design of the filling layer 70 can be facilitated.

[0121] The bank portion 371 can be disposed between the light-transmitting pattern TPL_1 and the first wavelength conversion pattern WCL1, between the first wavelength conversion pattern WCL1 and the second wavelength conversion pattern WCL2, and between the second wavelength conversion pattern WCL2 and the light-transmitting pattern TPL_1. Additionally, the bank portion 371 can be disposed between the light-transmitting pattern TPL_1 and the light-transmitting dummy pattern TPL_2. The portion of the bank portion 371 close to the spacer region SA can be integrally formed with and physically connected to the spacer portion 372.

[0122] Near the light-transmitting pattern TPL_1, the portion of the bank portion 371 disposed between the light-transmitting pattern TPL_1 and the first wavelength conversion pattern WCL1 can overlap with a portion of the light-transmitting pattern TPL_1. One side surface and the bottom surface of this portion of the bank portion 371 near the light-transmitting pattern TPL_1 can be in direct contact with the portion of the second capping layer CPL_2 that covers the side surface of the light-transmitting pattern TPL_1. The other side surface of this portion of the bank portion 371 near the light-transmitting pattern TPL_1 can be in direct contact with the side surface of the first wavelength conversion pattern WCL1.

[0123] Both side surfaces of the portion of the bank portion 371 disposed between the first wavelength conversion pattern WCL1 and the second wavelength conversion pattern WCL2 can be disposed on the side surfaces of the first wavelength conversion pattern WCL1 and the second wavelength conversion pattern WCL2. For example, both side surfaces of the portion of the bank portion 371 disposed between the first wavelength conversion pattern WCL1 and the second wavelength conversion pattern WCL2 can be in direct contact with the side surfaces of the first wavelength conversion pattern WCL1 and the second wavelength conversion pattern WCL2. The bottom surface of the portion of the bank portion 371 disposed between the first wavelength conversion pattern WCL1 and the second wavelength conversion pattern WCL2 can be disposed on the second capping layer CPL2. For example, the bottom surface of the portion of the bank portion 371 disposed between the first wavelength conversion pattern WCL1 and the second wavelength conversion pattern WCL2 can be in direct contact with the second capping layer CPL2.

[0124] The side surface of the portion of the dike portion 371 disposed between the second wavelength conversion pattern WCL2 and the light transmissive pattern TPL_1 may be disposed on the side surface of the second wavelength conversion pattern WCL2. For example, the side surface of the portion of the dike portion 371 disposed between the second wavelength conversion pattern WCL2 and the light transmissive pattern TPL_1 may be in direct contact with the side surface of the second wavelength conversion pattern WCL2. Although not specifically shown, the bottom surface and the other side surface of the portion of the dike portion 371 disposed between the second wavelength conversion pattern WCL2 and the light transmissive pattern TPL_1 may be disposed on the portion of the second capping layer CPL2 that covers the side surface of the light transmissive pattern TPL_1. For example, the bottom surface and the other side surface of the portion of the dike portion 371 disposed between the second wavelength conversion pattern WCL2 and the light transmissive pattern TPL_1 may be in direct contact with the portion of the second capping layer CPL2 that covers the side surface of the light transmissive pattern TPL_1.

[0125] The dike portion 371 can prevent light from one sub-pixel from leaking into other adjacent sub-pixels, thereby causing color mixing.

[0126] The third capping layer CPL3 may be disposed on the wavelength conversion layer WCL, the light transmissive pattern TPL_1, and the dike layer 370. The third capping layer CPL3 may be disposed on the surface of the color conversion substrate 30 to cover the wavelength conversion layer WCL, the light transmissive pattern TPL_1, and the dike layer 370. For example, the third capping layer CPL3 may be disposed on the entire surface of the color conversion substrate 30. For example, the third capping layer CPL3 may seal the first wavelength conversion pattern WCL1, the second wavelength conversion pattern WCL2, the light transmissive pattern TPL_1, and the dike layer 370 to prevent damage or contamination of the first wavelength conversion pattern WCL1, the second wavelength conversion pattern WCL2, the light transmissive pattern TPL_1, and the dike layer 370.

[0127] The third capping layer CPL3 may be disposed on the second capping layer CPL2, the first wavelength conversion pattern WCL1, the second wavelength conversion pattern WCL2, and the dike layer 370. For example, the third capping layer CPL3 may be in direct contact with the second capping layer CPL2 in the first light emitting region TA1, and in direct contact with the surfaces of the first wavelength conversion pattern WCL1 and the second wavelength conversion pattern WCL2 (e.g., Figure 4 the bottom surface in) in the second light emitting region TA2 and the third light emitting region TA3, and in direct contact with the surface of the dike layer 370 (e.g., Figure 4 the bottom surface in) in the light shielding region BA. In addition, the third capping layer CPL3 may be disposed on the second inorganic film 123 of the thin film encapsulation structure 120 of the display substrate 10 in the spacer region SA. For example, the third capping layer CPL3 may be in contact with the second inorganic film 123 in the spacer region SA.

[0128] The third capping layer CPL3 may be formed of the same material as the first capping layer CPL1 or the second capping layer CPL2, or may include one of the materials described above that can be used to form the first capping layer CPL1 or the second capping layer CPL2.

[0129] The filling layer 70 may be disposed between the display substrate 10 and the color conversion substrate 30. The filling layer 70 may fill the gap between the display substrate 10 and the color conversion substrate 30 and may couple the display substrate 10 and the color conversion substrate 30 together. The filling layer 70 may be formed of, for example, a silicone-based organic material or an epoxy-based organic material, but the present invention is not limited thereto.

[0130] The filling layer 70 may be disposed between the thin film encapsulation structure 120 of the display substrate 10 and the third capping layer CPL3 of the color conversion substrate 30. The filling layer 70 may not be disposed in the region overlapping with the spacer region SA.

[0131] The distance between the display substrate 10 and the color conversion substrate 30 may be maintained by the spacer CS of the color conversion substrate 30 without separately designing the viscosity and / or rigidity of the filling layer 70. Therefore, compared to the case of using only the filling layer 70 to control the distance between the display substrate 10 and the color conversion substrate 30, the thickness of the display device 1 can be uniformly maintained. Therefore, any stains that may occur when the distance between the display substrate 10 and the color conversion substrate 30 is uneven can be reduced.

[0132] Figure 5 is a flowchart showing a method of manufacturing a color conversion substrate of a display device according to an embodiment of the present invention. Figures 6 to 11 is a cross-sectional view showing the steps of a method of manufacturing Figure 4 a display device.

[0133] Referring to Figure 5 , a method of manufacturing the color conversion substrate 30 of the display device 1 may include the following steps: forming an upper light absorption member UAB on the second substrate 310 (step S100); forming a color filter layer CFL (step S200); forming a light transmissive layer TPL (step S300); forming a bank layer 370 including a bank portion 371 and a spacer portion 372 (step S400); and forming a wavelength conversion layer WCL (step S500).

[0134] Form an upper light absorption member UAB on the second substrate 310 (step S100).

[0135] Referring to Figure 6, a patterned upper light absorption member UAB may be formed on the surface of the second substrate 310. The upper light absorption member UAB may be disposed in the light shielding region BA. The patterned upper light absorption member UAB may be formed by a coating process and / or an exposure process. For example, the patterned upper light absorption member UAB may include an organic light absorption material and may be formed by coating the organic light absorption material and subjecting the organic light absorption material to an exposure process.

[0136] Referring again to Figure 5 , thereafter, a color filter layer CFL is formed on the surface of the second substrate 310 where the upper light absorption member UAB is formed (step S200).

[0137] Refer to Figure 7 , a patterned color filter layer CFL is formed on the surface of the second substrate 310 and may overlap at least a portion of the upper light absorption member UAB. The color filter layer CFL may include a first color filter layer 320, a second color filter layer 330, and a third color filter layer 340. Each of the first color filter layer 320, the second color filter layer 330, and the third color filter layer 340 may be formed by coating a photosensitive organic material including a colorant of a predetermined color and subjecting the photosensitive organic material to an exposure process and a development process.

[0138] For example, the patterned first color filter layer 320 may be formed by coating a photosensitive organic material including a first color colorant and subjecting the photosensitive organic material to an exposure process and a development process. For example, the first color filter layer 320 may be formed by coating a photosensitive organic material including a blue colorant and subjecting the photosensitive organic material to an exposure process and a development process. The patterned first color filter layer 320 may include a first color filter 321 disposed in the first light emitting region TA1 and a first dummy color pattern 322 disposed in the spacer region SA.

[0139] Similarly, the patterned second color filter layer 330 may be formed by coating a photosensitive organic material including a second colorant and subjecting the photosensitive organic material to an exposure process and a development process. The patterned third color filter layer 340 may be formed by coating a photosensitive organic material including a third colorant and subjecting the photosensitive organic material to an exposure process and a development process. For example, the second color filter layer 330 may be formed by coating a photosensitive organic material including a green colorant and subjecting the photosensitive organic material to an exposure process and a development process. For example, the third color filter layer 340 may be formed by coating a photosensitive organic material including a red colorant and subjecting the photosensitive organic material to an exposure process and a development process. The patterned second color filter layer 330 may include a second color filter 331 disposed in the second light-emitting region TA2, and the patterned third color filter layer 340 may include a third color filter 341 disposed in the third light-emitting region TA3. Thereafter, a first capping layer CPL1 covering the color filter layer CFL and the upper light absorption member UAB is formed.

[0140] Referring again to Figure 5 , thereafter, a light-transmitting layer TPL is formed on the first color filter layer 320 (step S300).

[0141] Refer to Figure 8 , the patterned light-transmitting layer TPL is formed on the surface of the second substrate 310 and overlaps the color filter layer CFL. The light-transmitting layer TPL may be formed by coating a photosensitive material and subjecting the photosensitive material to an exposure process and a development process. For example, the light-transmitting layer TPL may be formed on the first color filter layer 320 by coating a photosensitive material and subjecting the photosensitive material to an exposure process and a development process. The patterned light-transmitting layer TPL may include a light-transmitting pattern TPL_1 disposed on the first color filter 321 and a light-transmitting dummy pattern TPL_2 disposed on the first dummy color pattern 322.

[0142] The first dummy color pattern 322 and the light-transmitting dummy pattern TPL_2 may form a dummy pattern DP, and the dummy pattern DP provides a height difference to form a spacer CS in the spacer region SA using the dam layer 370.

[0143] Since the light-transmitting layer TPL is formed by exposing and developing a photosensitive material before forming the wavelength conversion layer WCL, it may not be necessary to provide an inkjet nozzle or prepare ink to form the light-transmitting layer TPL during the inkjet printing process for forming the wavelength conversion layer WCL. Therefore, the amount of time and cost for forming the light-transmitting layer TPL can be reduced.

[0144] Referring again to Figure 5 , thereafter, a dam layer 370 including a dam portion 371 and a spacer portion 372 is formed (step S400).

[0145] Reference Figure 9 ,The second cover layer CPL2 can be formed on the surface of the second substrate 310 where the light-transmitting layer TPL is formed, and the patterned bank layer 370 can be formed on the second cover layer CPL2. The bank layer 370 can be disposed in the light-shielding region BA. For example, the patterned bank layer 370 can be formed by an exposure process. For example, the bank layer 370 can include an organic material, and the organic material can be a photosensitive organic material. In this example, the patterned bank layer 370 can be formed by coating an organic material layer for forming the bank layer 370 and subjecting the organic material layer to an exposure process and a development process. The organic material layer can be a layer of a negative photosensitive material that is cured by light irradiation, but the present invention is not limited thereto.

[0146] For example, in the light-shielding region BA, the bank layer 370 is formed along the boundary of each sub-pixel. The arrangement and shape of the patterned bank layer 370 have been described above. The portion of the bank layer 370 disposed in the spacer region SA (for example, the spacer portion 372) can be set to overlap with the dummy pattern DP. By forming the patterned bank layer 370, a protruding structure that protrudes in the spacer region SA with a height difference formed by the dummy pattern DP (for example, the spacer CS) can be formed.

[0147] Refer again to Figure 5 ,A wavelength conversion layer WCL is formed (step S500).

[0148] Reference Figure 10 ,The wavelength conversion layer WCL is formed on the second substrate 310 on which the patterned bank layer 370 is formed. The wavelength conversion layer WCL can include a first wavelength conversion pattern WCL1 disposed in the second light-emitting region TA2 and a second wavelength conversion pattern WCL2 disposed in the third light-emitting region TA3. For example, the first wavelength conversion pattern WCL1 and the second wavelength conversion pattern WCL2 can be formed by an inkjet printing process using an inkjet composition.

[0149] For example, the first wavelength conversion pattern WCL1 can be formed by ejecting a first ink IK1 including a material for forming the first wavelength conversion pattern WCL1 into the second light-emitting region TA2. The first ink IK1 can be ejected into the space provided by the bank portion 371 in the region overlapping the second light-emitting region TA2. For example, the bank portion 371 can serve as a guide for enabling the first ink IK1 to be stably placed at a desired position to form the first wavelength conversion pattern WCL1.

[0150] Similarly, the second wavelength conversion pattern WCL2 can be formed by ejecting a second ink IK2 including a material for forming the second wavelength conversion pattern WCL2 onto the third light-emitting region TA3. The second ink IK2 can be ejected into the space provided by the bank portion 371 in the region overlapping with the third light-emitting region TA3. For example, the bank portion 371 can serve as a guide for enabling the second ink IK2 to be stably placed at a desired position to form the second wavelength conversion pattern WCL2.

[0151] The ejection amounts of the first ink IK1 and the second ink IK2 can be determined in consideration of the surface tensions of the first ink IK1 and the second ink IK2 and the amounts of the volumes of the first ink IK1 and the second ink IK2 that decrease when the first ink IK1 and the second ink IK2 dry.

[0152] Reference Figure 11 , thereafter, the wavelength conversion layer WCL is cured, and the third capping layer CPL3 is formed. For example, as Figure 11 shown, in the case of forming the first wavelength conversion pattern WCL1 and the second wavelength conversion pattern WCL2 by ejecting ink via inkjet printing and curing the ink, the first ink IK1 provided in the second light-emitting region TA2 and the second ink IK2 provided in the third light-emitting region TA3 can shrink. The third capping layer CPL3 can be formed along the surface of the color conversion substrate 30. For example, the third capping layer CPL3 can be formed along the entire surface of the color conversion substrate 30.

[0153] During the formation of the patterned color filter layer CFL and the patterned light-transmitting layer TPL, a dummy pattern DP can be formed in the spacer region SA of the light-shielding region BA. The spacer CS can be formed in the process of forming the bank layer 370 by the dummy pattern DP protruding from the surface of the second substrate 310. Therefore, since an additional mask process for forming the spacer CS can be omitted, the process efficiency can be improved.

[0154] Hereinafter, embodiments of the present invention will be described mainly focusing on the differences from the above-described embodiments. Descriptions of elements that have been described will be omitted or simplified.

[0155] Figure 12 is a cross-sectional view of a color conversion substrate of a display device according to an embodiment of the present invention.

[0156] Reference Figure 5 and Figure 12, The color conversion substrate 30_1 is different from the color conversion substrate 30 in that, in step S500, the first wavelength conversion pattern WCL1 and the second wavelength conversion pattern WCL2 are each formed by coating a photosensitive material and subjecting the photosensitive material to an exposure process and a development process. For example, the first wavelength conversion pattern WCL1 can be formed on the second color filter 331 by coating a photosensitive material for forming the first wavelength conversion pattern WCL1 and subjecting the photosensitive material to an exposure process and a development process, and the second wavelength conversion pattern WCL2 can be formed on the third color filter 341 by coating a photosensitive material for forming the second wavelength conversion pattern WCL2 and subjecting the photosensitive material to an exposure process and a development process.

[0157] For example, the wavelength conversion layer WCL can be formed by forming a bank layer 370 in the light-shielding region BA and then subjecting the photosensitive material for forming the wavelength conversion pattern in each of the second light-emitting region TA2 and the third light-emitting region TA3 to an exposure process.

[0158] Figure 13 and Figure 14 are cross-sectional views showing a method of manufacturing a color conversion substrate of a display device according to an embodiment of the present invention.

[0159] Reference Figure 13 and Figure 14 , the color conversion substrate 30_2 is different from the Figure 4 color conversion substrate 30 in that the dummy pattern DP is not provided in the spacer region SA where the spacer portion 372 for forming the spacer CS is provided.

[0160] As already mentioned above, like the bank portion 371 of the bank layer 370, the spacer portion 372 may include an organic insulating material. For example, the bank portion 371 and the spacer portion 372 can be integrally formed of the same material by a single process. The bank portion 371 and the spacer portion 372 having different heights can be formed by a single process that coats an organic material layer for forming the bank layer 370 and uses a slit mask or a multi-tone mask (or a halftone mask) to expose and develop the organic material layer. The organic material layer may include a negative photosensitive material.

[0161] Reference Figure 13 , the bank layer 370 in the entire light-shielding region BA except for the spacer region SA and in the light-emitting region TA can be formed by a single mask process. For example, a photomask MK is placed on the surface of the second substrate 310. The photomask MK can be a multi-tone mask (or, for example, a slit mask or a halftone mask). The photomask MK can include: a first region MA1 that does not transmit light; a second region MA2 that transmits light in a halftone manner; and a third region MA3 that transmits light in a full-tone manner.

[0162] The photomask MK is arranged such that the first region MA1, the second region MA2, and the third region MA3 respectively correspond to the light-transmitting region TA, the entire light-shielding region BA except for the spacer region SA, and the spacer region SA.

[0163] Thereafter, when the organic material layer is exposed and developed using the photomask MK, the portion of the organic material layer corresponding to the first region MA1 can be completely removed to expose the second color filter 331 and the third color filter 341, and the portions of the organic material layer corresponding to the second region MA2 and the third region MA3 can be left unremoved. Here, since the exposure amount of the organic material layer in the second region MA2 is less than the exposure amount of the organic material layer in the third region MA3, the thickness of the organic material layer in the second region MA2 can be less than the thickness of the organic material layer in the third region MA3. Therefore, the portion of the bank layer 370 provided in the spacer region SA (e.g., the spacer portion 372) can be thicker than the portion of the bank layer 370 not provided in the spacer region SA (e.g., the bank portion 371). By forming the bank layer 370 in this way, the spacer CS protruding from the second substrate 310 can be formed in the spacer region SA.

[0164] Even when the dummy pattern DP is not formed in the spacer region SA using the color filter layer CFL and the light-transmitting layer TPL, the spacer CS can be formed by forming the bank layer 370 patterned to have different thicknesses in the spacer region SA and in the remaining light-shielding region BA using the photomask MK.

[0165] The bank layer 370 may include a negative photosensitive material, but the present invention is not limited thereto. Additionally, the bank layer 370 may include a positive photosensitive material, in which case, the first region MA1 and the third region MA3 of the photomask MK may be reversed.

[0166] Thereafter, the first wavelength conversion pattern WCL1 and the second wavelength conversion pattern WCL2 may be respectively formed in the second light-emitting region TA2 and the third light-emitting region TA3. The first wavelength conversion pattern WCL1 and the second wavelength conversion pattern WCL2 may be formed by an inkjet printing process using an inkjet composition, but the present invention is not limited thereto. Each of the first wavelength conversion pattern WCL1 and the second wavelength conversion pattern WCL2 may be formed by coating a photosensitive material and subjecting the photosensitive material to an exposure process and a development process.

[0167] Hereinafter, reference will be made to Figures 15 to 17 Describe the dummy pattern of the display device according to an embodiment of the present invention for forming a spacer in the spacer region. Figures 15 to 17 of the embodiment with Figure 14The embodiments are different in that the dummy pattern forming the spacer is formed by more than one color filter layer or a color filter layer other than the first color filter layer.

[0168] Figure 15 is an enlarged cross-sectional view of a spacer of a display device according to an embodiment of the present invention.

[0169] Referring to Figure 15 and further referring to Figure 4 , the second color filter layer 330 may include a second color filter 331 and a second dummy color pattern 332. The second color filter 331 may be disposed in the second light-emitting region TA2, and the second dummy color pattern 332 may be disposed in the spacer region SA of the light-shielding region BA. The second color filter 331 and the second dummy color pattern 332 may include the same material and may be formed and patterned by a single process. However, the present invention is not limited thereto. For example, the second color filter 331 and the second dummy color pattern 332 may include different materials from each other.

[0170] The light-transmissive dummy pattern TPL_2 may be disposed on the second dummy color pattern 332. The light-transmissive dummy pattern TPL_2 may overlap the second dummy color pattern 332 in the thickness direction. For example, the sidewalls of the light-transmissive dummy pattern TPL_2 may be aligned with the sidewalls of the second dummy color pattern 332, but the present invention is not limited thereto. Additionally, the sidewalls of the light-transmissive dummy pattern TPL_2 may be disposed inside the sidewalls of the second dummy color pattern 332 such that at least a part of the surface of the light-transmissive dummy pattern TPL_2 may be exposed.

[0171] The second dummy color pattern 332 and the light-transmissive dummy pattern TPL_2 may form a dummy pattern DP_1 disposed in the spacer region SA. The dummy pattern DP_1 may protrude from the surface of the second substrate 310. As already mentioned above, due to the presence of the dummy pattern DP_1 protruding from the surface of the second substrate 310, the bank layer 370 may include a bank portion 371 disposed in at least a part of the spacer region SA and the light-shielding region BA adjacent to the spacer region SA and a spacer portion 372 physically connected to the bank portion 371 and protruding from the bank portion 371. Since the bank portion 371 and the spacer portion 372 have different heights, the bank layer 370 may have a height difference on the surface of the second substrate 310. The spacer portion 372 protruding from the dummy pattern DP_1 including the second dummy color pattern 332 and the light-transmissive dummy pattern TPL_2 may form a spacer CS.

[0172] Figure 16 is an enlarged cross-sectional view of a spacer of a display device according to an embodiment of the present invention.

[0173] Referring to Figure 16And further referring to Figure 4 the first color filter layer 320 may include a first color filter 321 disposed in the first light-emitting region TA1 and a first dummy color pattern 322 disposed in a spacer region SA of the light-shielding region BA, and the second color filter layer 330 may include a second color filter 331 disposed in the second light-emitting region TA2 and a second dummy color pattern 332 disposed in the spacer region SA of the light-shielding region BA.

[0174] In the spacer region SA, the second dummy color pattern 332 may be disposed on the upper light absorption member UAB. The first dummy color pattern 322 may be disposed on the second dummy color pattern 332 in the spacer region SA. The first dummy color pattern 322 may overlap with the second dummy color pattern 332 in the thickness direction.

[0175] The transmissive dummy pattern TPL_2 may be disposed on the first dummy color pattern 322. The transmissive dummy pattern TPL_2 may overlap with the first dummy color pattern 322 and the second dummy color pattern 332 in the thickness direction. Sidewalls of the transmissive dummy pattern TPL_2, sidewalls of the first dummy color pattern 322, and sidewalls of the second dummy color pattern 332 may be aligned with each other, but the present invention is not limited thereto. Additionally, sidewalls of any one of the transmissive dummy pattern TPL_2, the first dummy color pattern 322, and the second dummy color pattern 332 may be disposed inside sidewalls of their respective lower layers.

[0176] The first dummy color pattern 322, the second dummy color pattern 332, and the transmissive dummy pattern TPL_2 may form a dummy pattern DP_2 disposed in the spacer region SA. The dummy pattern DP_2 may protrude from a surface of the second substrate 310. Since the dummy pattern DP_2 is formed of a plurality of color filter layers (e.g., the first color filter layer 320 and the second color filter layer 330), the height of the spacer CS may be controlled by controlling the height of the dummy pattern DP_2. For example, the height of the spacer CS from the surface of the second substrate 310 may be controlled by the number of color filter layers (e.g., the number of stacked dummy color patterns) disposed in the spacer region SA and the thickness of the dummy color pattern.

[0177] The first dummy color pattern 322 is shown disposed on the second dummy color pattern 332, but the present invention is not limited thereto. Additionally, the second dummy color pattern 332 may be disposed on the first dummy color pattern 322. The arrangement of the dummy color patterns in the dummy pattern DP_2 disposed in the spacer region SA may vary depending on the order of forming the first color filter layer 320, the second color filter layer 330, and the third color filter layer 340.

[0178] Figure 17It is an enlarged cross-sectional view of a spacer of a display device according to an embodiment of the present invention.

[0179] Reference Figure 17 And further reference Figure 4 The first color filter layer 320 may include a first color filter 321 disposed in the first light-emitting region TA1 and a first dummy color pattern 322 disposed in the spacer region SA of the light-shielding region BA. The second color filter layer 330 may include a second color filter 331 disposed in the second light-emitting region TA2 and a second dummy color pattern 332 disposed in the spacer region SA of the light-shielding region BA. The third color filter layer 340 may include a third color filter 341 disposed in the third light-emitting region TA3 and a third dummy color pattern 342 disposed in the spacer region SA of the light-shielding region BA.

[0180] The dummy pattern DP_3 may include a third dummy color pattern 342, a second dummy color pattern 332, a first dummy color pattern 322, and a light-transmitting dummy pattern TPL_2 disposed on the upper light absorption member UAB in the spacer region SA of the light-shielding region BA. The second dummy color pattern 332 may be disposed on the third dummy color pattern 342, the first dummy color pattern 322 may be disposed on the second dummy color pattern 332, and the light-transmitting dummy pattern TPL_2 may be disposed on the first dummy color pattern 322. The first dummy color pattern 322, the second dummy color pattern 332, and the third dummy color pattern 342 and the light-transmitting dummy pattern TPL_2 may overlap each other in the thickness direction. Since the dummy pattern DP_3 is formed by the first dummy color pattern 322, the second dummy color pattern 332, and the third dummy color pattern 342, the height of the spacer CS can be controlled by controlling the height of the dummy pattern DP_3.

[0181] Figure 18 It is a cross-sectional view of a display device according to an embodiment of the present invention.

[0182] Figure 18 The display device of Figure 4 is different from the display device 1 of

[0183] Reference Figure 18 The lower light absorption member BAB of the display substrate 10 may be disposed on the thin film encapsulation structure 120. The lower light absorption member BAB may be disposed to overlap with the pixel defining film PDL. The lower light absorption member BAB may prevent the light emitted from the emission layer EML from being mixed into the light-emitting regions of adjacent sub-pixels. Due to the presence of the lower light absorption member BAB, the mixing of colors between different sub-pixels can be further prevented.

[0184] The lower light absorption member BAB may include an organic material. For example, the lower light absorption member BAB may include a light absorption material capable of absorbing visible light. For example, the lower light absorption member BAB may be formed of a material that can be used as a black matrix. The lower light absorption member BAB may be a light shielding member. The lower light absorption member BAB may overlap with the upper light absorption member UAB in the thickness direction. The lower light absorption member BAB may be disposed in the light shielding region BA.

[0185] Although the present invention has been described with reference to embodiments of the present invention, those of ordinary skill in the art will understand that various changes may be made in form and detail without departing from the spirit and scope of the present invention.

Claims

1. A display device, comprising: a substrate including a light-emitting region and a light-shielding region, the light-shielding region including a spacer region; a color filter layer disposed on the substrate and including color filters and dummy color patterns, wherein the color filters are disposed in the light-emitting region, and the dummy color patterns are disposed in the spacer region; a light-transmitting layer disposed on the color filter layer and including a light-transmitting pattern and a light-transmitting dummy pattern, wherein the light-transmitting pattern is disposed on the color filters, and the light-transmitting dummy pattern is disposed on the dummy color patterns; and a bank layer disposed on the dummy color patterns, wherein the bank layer includes a spacer portion disposed in the light-shielding region and a bank portion disposed in the light-shielding region, wherein the spacer portion overlaps with the spacer region, wherein the bank portion has a height smaller than that of the spacer portion with respect to the substrate, and does not overlap with the spacer region.

2. The display device according to claim 1, wherein, The color filters include a first color filter, a second color filter, and a third color filter, wherein the first color filter selectively transmits light of a first color through the first color filter, wherein the second color filter selectively transmits light of a second color through the second color filter, and wherein the third color filter selectively transmits light of a third color through the third color filter.

3. The display device according to claim 2, wherein, The dummy color patterns include the same material as at least one of the first color filter, the second color filter, and the third color filter.

4. The display device according to claim 2, wherein, the dummy color patterns include a first dummy color pattern and a second dummy color pattern disposed on the first dummy color pattern, the first dummy color pattern includes the same material as the first color filter, and the second dummy color pattern includes the same material as the second color filter.

5. The display device according to any one of claims 2-4, further comprising a wavelength conversion layer disposed on the color filter layer in the light-emitting region, wherein, the light-transmitting pattern is disposed on the first color filter, and 6. The display device according to claim 5, wherein, the wavelength conversion layer includes a first wavelength conversion pattern and a second wavelength conversion pattern, wherein the first wavelength conversion pattern is disposed on the second color filter, and the second wavelength conversion pattern is disposed on the third color filter. The first color is blue, the second color is green, and the third color is red.

7. The display device according to any one of claims 1-4, wherein, the light-transmitting dummy pattern overlaps with the dummy color patterns, the light-transmitting dummy pattern and the dummy color patterns form a dummy pattern, and 8. The display device according to claim 7, wherein, the spacer portion overlaps with the dummy pattern.

9. The display device according to claim 7, wherein, The spacer portion and the bank portion are integrally formed.

10. The display device according to any one of claims 1-4, wherein, The bank layer at least partially covers the dummy pattern. The bank layer is not disposed in the light-emitting region.

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