Apparatus and method for optical characterization of textile samples

Abstract

An apparatus (100) for optically characterizing a textile sample (106) includes a display subsystem (102) including an observation window (108). A radiation subsystem (114) includes a radiation source (120) for directing first, ultraviolet radiation (122) and second, visible radiation (123) toward the sample (106) and causing the sample (106) to produce fluorescent radiation (124) and reflected radiation (125). A sensing subsystem (126) includes an imager (130) for capturing the fluorescent radiation (124) and reflected radiation (125) in an array of pixels (408). A control subsystem (132) includes a processor (136) for controlling the display subsystem (102), the radiation subsystem (114), and the sensing subsystem (126), and for generating a fluorescent and reflected radiation image (400) containing both spectral information and spatial information about the fluorescent radiation (124) and the reflected radiation (125).

Description

Technical Field

[0001] The present invention relates to the field of textile feature measurement. More specifically, the present invention relates to an apparatus and method for optically characterizing a textile sample. The present invention can be used in both online and offline applications. Background Art

[0002] Textiles are woven or knitted fabrics made from yarns, but they also include fibers (natural, artificial and blended), yarns or any other products made from these combinations. The visual perception of the final fabric is very important to the end user. Visual perception includes, but is not limited to, pattern, color and brightness. Brightness is generally defined as the property of visual perception in which a source appears to be radiating or reflecting light. For textiles, brightness is a function of reflected light and fluorescent emission. Fluorescent pigments are one way to increase the brightness of a fabric. Fluorescent materials are defined as materials that, after absorbing light or other electromagnetic radiation, emit optical radiation of a wavelength that is generally longer than the wavelength of the absorbed electromagnetic radiation. Therefore, fluorescent materials not only reflect the incident light, but also emit additional light of a longer wavelength. In particular, fluorescent materials appear brighter if the absorbed electromagnetic radiation is in the ultraviolet (UV) range and the emitted light is visible.

[0003] Fluorescent pigments fall into at least three main categories: inorganic fluorescent agents, optical brighteners, and daylight fluorescent agents. These differ primarily in their chemical composition and optical characteristics, and thus their applications. For example, inorganic fluorescent agents are typically activated by light radiation in the ultraviolet (UV) to visible (300-420 nm) range, while optical brighteners are activated in the near-UV (340-400 nm) range, and daylight fluorescent agents are activated and emit in the visible (400-700 nm) range.

[0004] Fluorescent properties can be imparted to textiles in a variety of ways, such as, but not limited to, (a) coating the fabric with a fluorescent material in a resin mixture, (b) incorporating the fluorescent material into the fibers during the spinning stage, (c) coating the fibers, and (d) textile finishing or home laundering with the fluorescent material.

[0005] The quality and application of fluorescent pigments are important parameters for maintaining, monitoring and controlling optimal topographical properties during textile processing. Although these methods have existed for many years, the formulation and quality control of fluorescent material applications have always been challenging, mainly due to the lack of appropriate measurement instrumentation and a lack of understanding of fluorescent materials.

[0006] US-2015 / 0131090A1 discloses a multi-angle spectral imaging measurement method and apparatus. It provides an illumination device that emits illumination light from two or more angular directions onto the sample surface to be measured, an imaging optical lens, and a monochromatic two-dimensional image sensor. This configuration provides a method and apparatus that captures a two-dimensional image of the sample surface to be measured at each measurement wavelength and accurately measures multi-angle and spectral information for each pixel in the two-dimensional image in a short period of time. In one embodiment, a fluorescent object is illuminated with monochromatic light and a spectral light receiver is used, thereby measuring the fluorescence color.

[0007] US-2016 / 0258881A1 discloses a method for marking industrially processed materials. The method comprises selectively incorporating a luminescent marker onto and / or into the industrially processed material in the presence of ambient light. The amount of the marker is insufficient to be optically detected in ambient light, but sufficient to allow non-destructive optical detection in and / or on the industrially processed material in situ or on-site. The material is illuminated with light of a specific wavelength. When the luminescent marker is present in the material, it emits cold light of a characteristic wavelength. The light emitted by the material is detected by a spectrometer, which may include a CCD chip as a photosensor. Summary of the Invention

[0008] It is an object of the present invention to more fully characterize textile samples with respect to their optical properties.

[0009] This and other objects are achieved by the apparatus and method defined in the independent claims.The dependent claims define preferred embodiments.

[0010] According to the present invention, textile samples are illuminated with both ultraviolet (UV) and visible electromagnetic radiation. Both the fluorescent radiation emitted by the UV radiation and the reflected visible radiation are detected and combined to produce a "brightness" measurement. Furthermore, both the fluorescent and reflected radiation are detected by an imager comprising an array of pixels. Thus, the fluorescent radiation, the reflected radiation, and their combination carry embedded spatial information. In particular, the resulting brightness image has proven very useful for optically characterizing textile samples.

[0011] In this document, the term "brightness" refers to the intensity of both fluorescent and reflected radiation.It is generally accepted that the ultraviolet range of the electromagnetic spectrum contains wavelengths between 10 nm and 400 nm, while the visible range contains wavelengths between 400 nm and 700 nm.

[0012] An apparatus for optically characterizing a textile sample includes a display subsystem having an observation window. A radiation subsystem includes a radiation source for directing a desired first radiation in the ultraviolet range of the electromagnetic spectrum and a desired second radiation in the visible range of the electromagnetic spectrum through the observation window toward the sample, thereby causing the sample to emit fluorescent radiation and reflective radiation. A sensing subsystem includes an imager for capturing the fluorescent radiation and reflective radiation in an array of pixels, wherein each pixel records the intensity of both the fluorescent radiation and the reflective radiation at the pixel location. A control subsystem includes a processor for controlling the display subsystem, the radiation subsystem, and the sensing subsystem, and generating an image of the fluorescent and reflected radiation containing spectral and spatial information about the fluorescent and reflected radiation of the sample.

[0013] In some embodiments, the display subsystem further comprises a sample press for pressing the sample against the observation window.

[0014] In some embodiments, the display subsystem further comprises a calibration patch for generating fluorescent radiation and reflected radiation having known characteristics in response to radiation having known characteristics.

[0015] In some embodiments, the radiation subsystem further includes an optical device for shaping and / or filtering the first radiation and the second radiation from the radiation source to generate the first radiation and / or the second radiation.

[0016] In some embodiments, the radiation subsystem further comprises a detector for detecting a characteristic of the first radiation and / or the second radiation.

[0017] In some embodiments, the radiation source is configured to generate the first radiation and the second radiation with a desired intensity distribution.

[0018] In some embodiments, the radiation source is configured to generate the first radiation and the second radiation within discrete radiation ranges.

[0019] In some embodiments, the radiation source is configured to generate the first radiation and the second radiation having a time-varying intensity distribution.

[0020] In some embodiments, the radiation source is configured to generate the first radiation and the second radiation sequentially.

[0021] In some embodiments, the radiation source is configured to generate the first radiation and the second radiation simultaneously.

[0022] In some embodiments, the radiation source is configured to generate the first radiation and the second radiation in a temporally offset manner such that they partially overlap in time.

[0023] In some embodiments, the radiation source is configured to generate the first radiation and / or the second radiation periodically in time.

[0024] In some embodiments, the pixel array is a two-dimensional array of pixels.

[0025] In some embodiments, the sensing subsystem further includes a variable filter for selectively preventing a portion of the fluorescent radiation and / or reflected radiation from reaching the imager.

[0026] In some embodiments, the control subsystem also includes a machine interface for receiving commands from and sending information to another instrument.

[0027] In some embodiments, the control subsystem further includes a human-machine interface for receiving commands from a user and sending information to the user.

[0028] In some embodiments, the control subsystem is configured to classify the patterns in the fluorescent and / or reflected radiation image, including the percentage of the fluorescent and / or reflected radiation image represented by each of the patterns, respectively.

[0029] In some embodiments, the control subsystem is configured to classify patterns in the fluorescent and / or reflected radiation and the fluorescent image, including an orientation of each of the patterns, wherein the orientation is at least one of horizontal, vertical, and disordered.

[0030] According to another aspect of the present invention, a method for optically characterizing a textile sample is described. The method includes the steps of: displaying the sample on an observation window via a display subsystem; directing a desired first radiation in the ultraviolet range of the electromagnetic spectrum and a desired second radiation in the visible range of the electromagnetic spectrum from a radiation source through the observation window toward the sample, thereby causing the sample to generate fluorescent radiation and reflected radiation; capturing the fluorescent radiation and the reflected radiation with a sensing subsystem, the sensing subsystem including an imager in an array of pixels, wherein each pixel records the intensity of both the fluorescent radiation and the reflected radiation at the pixel location; and controlling the display subsystem, the radiation subsystem, and the sensing subsystem via a processor to generate an image of the fluorescent and reflected radiation containing both spectral information and spatial information about the fluorescent radiation and the reflected radiation of the sample.

[0031] Some embodiments further comprise pressing the sample against the viewing window with a press.

[0032] Some embodiments further comprise shaping and / or filtering the first radiation and the second radiation from the radiation source with an optical device before the first radiation and / or the second radiation reach the sample.

[0033] Some embodiments further comprise detecting, with a detector, a feature of the first radiation and / or the second radiation.

[0034] Some embodiments further comprise generating the first radiation and / or the second radiation with a desired intensity distribution.

[0035] Some embodiments further include generating the first radiation and the second radiation within discrete radiation ranges.

[0036] Some embodiments further include generating the first radiation and the second radiation with a time-varying intensity distribution.

[0037] Some embodiments further include generating the first radiation and the second radiation sequentially.

[0038] Some embodiments further include generating the first radiation and the second radiation simultaneously.

[0039] Some embodiments further comprise generating the first radiation and the second radiation in a time-shifted manner such that they partially overlap in time.

[0040] Some embodiments further include generating the first radiation and / or the second radiation periodically in time.

[0041] Some embodiments further include selectively inhibiting fluorescent radiation and reflected radiation from reaching the imager, respectively.

[0042] Some embodiments further include classifying the patterns in the fluorescent and / or reflected radiation image, including the percentage of the fluorescent and / or reflected radiation image that is represented by each of the patterns alone.

[0043] Some embodiments further comprise classifying patterns in the fluorescent and / or reflected radiation images, including a direction of each of the patterns, wherein the direction is at least one of horizontal, vertical, and disordered. BRIEF DESCRIPTION OF THE DRAWINGS

[0044] Other advantages of the present invention will become apparent when considered in conjunction with the detailed description and the accompanying drawings, which are not to scale so as to more clearly show details, wherein like reference numerals represent like elements throughout the several views, and wherein:

[0045] Figure 1 is a functional block diagram of a measuring device according to one embodiment of the present invention.

[0046] Figures 2A to 2E FIG2 is a graph comparing radiation source wavelength and output level for selecting a radiation profile according to various embodiments of the present invention.

[0047] Figure 3A is a fluorescence graph showing radiation levels compared to fluorescence levels for three different materials according to one embodiment of the present invention.

[0048] Figure 3B is a fluorescence graph showing radiation levels compared to fluorescence levels for three different radiation wavelengths according to one embodiment of the present invention.

[0049] Figure 3C FIG. 4 is a fluorescence graph showing radiation levels compared to fluorescence levels for three different fluorescence wavelengths according to one embodiment of the present invention.

[0050] Figure 4 is an example of a fluorescent pattern according to one embodiment of the present invention. DETAILED DESCRIPTION

[0051] Now refer to Figure 1 , shows an apparatus 100 according to the present invention, which can be used for both offline and online measurements. The apparatus 100 includes a sample display subsystem 102, a radiation subsystem 114, a sensing subsystem 126, and a control subsystem 132, each of which will be explained in more detail below.

[0052] Figure 1 Other aspects of the apparatus 100 are also shown, including a sample material to be measured 106, a sample press 104, a sample or viewing window 108, a reference phosphor 109, a radiation source 120, radiation shaping and filtering optics 118, a radiation measuring radiometer 116, a variable optical filter 128, an imager 130, a signal processor 136, a user interface 138, and a machine interface 134, all of which are described in greater detail below in their respective subsystems.

[0053] Sample display subsystem

[0054] The sample display subsystem 102 displays a sample fluorescent material 106 to the apparatus 100. The sample 106 can be any textile, including, but not limited to, fibers, tampons, or fabrics. Some embodiments have two display objectives. One objective is to display as many samples 106 as possible to the apparatus 100, and the other objective is to display a consistent sample angle. One method for achieving these objectives is to use a sample press 104 to press the sample 106 onto the sample window 108 with constant pressure.

[0055] Sample presentation subsystem 102 also includes a reference phosphor patch 109, whose reflected radiation and fluorescence characteristics are known. The purpose of reference phosphor patch 109 is to allow device 100 to self-calibrate to known reference reflected radiation and fluorescence levels. Furthermore, it serves as a self-test, allowing device 100 to automatically detect fault conditions due to, for example, component failure. While device 100 is measuring sample 106, reference phosphor patch 109 can be shielded from radiation 122, 123 so that they do not reflect / fluoresce, or the reflections / fluorescence they produce can be shielded from imager 130 in some manner so that they do not confound the fluorescence reading from sample 106.

[0056] Radiation subsystem

[0057] The radiation subsystem 114 is responsible for irradiating and exciting the fluorescent sample 106 with radiation 122, 123, which has a desired profile in terms of constituent wavelengths and their associated energies. In particular, its purpose is to control and ensure a known radiation 122, 123 profile on the sample 106. The desired radiation 122, 123 profile depends at least in part on the characteristics of the sample 106 and the properties of the sample 106 to be measured. The desired radiation 122, 123 profile is controlled as described below. Some parameters of the radiation 122, 123 include, but are not limited to, wavelength, power, beam uniformity, and beam angle 110, which is the angle between the radiation 122, 123 emitted by the radiation source 120 and the plane of the sample window 108. The beam angle 110 can be set to, for example, 45 degrees, as Figure 1 shown.

[0058] The radiation source 120 directs first radiation 122 in the ultraviolet range of the electromagnetic spectrum and second radiation 123 in the visible range of the electromagnetic spectrum through the sample window 108 toward the sample 106. The first radiation 122 and the second radiation 123 can be emitted sequentially, simultaneously, or in a temporally offset manner so that they partially overlap in time. The first radiation 122 and / or the second radiation 123 can be emitted periodically in time, that is, they can be periodically turned on and off. The sequential emission can be controlled by the processor 136. The first radiation 122 can cause the sample 106 to produce fluorescent radiation 124. The first radiation 122 and / or the second radiation 123 can cause the sample to produce reflected radiation 125.

[0059] The radiation subsystem 114 may include a plurality of radiation sources 120 arranged in different configurations. For example, in one embodiment, Figure 1 As shown, the configuration can incorporate two radiation sources 120 directed in opposite directions. In another embodiment, the configuration can incorporate four radiation sources 120, wherein the sample 106 is irradiated from four different directions. Each of the plurality of radiation sources 120 can be configured to emit both the first radiation 122 and the second radiation 123, as shown. Figure 1 Alternatively, one of the plurality of radiation sources 120 may be configured to emit only the first radiation 122 , while another of the plurality of radiation sources 120 may be configured to emit only the second radiation 123 .

[0060] In yet another embodiment, the radiation subsystem 114 may include only one radiation source 120. In this case, the radiation source 120 is configured to emit the first radiation 122 and the second radiation 123 sequentially or simultaneously.

[0061] In some embodiments, the radiation source 120 can be moved within the device 100. For example, in some embodiments, the source 120 can be moved to provide different angles of incidence of the radiation 122 on the sample window 108. In some embodiments, the source 120 can be moved so that they are at different proximity to the sample window 108, or at different radial angles.

[0062] Examples of radiation sources 120 may include, but are not limited to, one or more of light-emitting diodes (LEDs), halogen lamps, mercury vapor lamps, incandescent lamps, deuterium lamps, fluorescent lamps, and xenon lamps. Furthermore, each radiation source 120 may incorporate one or more of the aforementioned lamps. For example, one embodiment may include multiple groups of ultraviolet LEDs that emit the first radiation 122 and visible LEDs that emit the second radiation 123. In such an embodiment, each LED group may be controlled separately from the other groups by processor 136.

[0063] In one embodiment, the color of sample 106 is measured in the CIELAB color space using illumination with second visible radiation 123. The color image of sample 106 is processed in the same manner as described below for all other images.

[0064] The output level and spectral characteristics of radiation source 120 may be tailored for a given brightness application and measurement. Figure 2A-2D This customization is only illustrated for the first radiation 122. Graphs 200a-200d depict the wavelength of radiation 122 on the x-axis 204 and the output level of radiation 122 on the y-axis 202. In these examples, there are two sets of UV LEDs operating at 360 nm and 380 nm in various combinations and at various intensities.

[0065] exist Figure 2A In FIG. 200a , the 360 ​​nm LED group is operating at its full output level as shown in spectrum 212a. Figure 2B In FIG200b, the 360 ​​nm LED group is operating at 50% of its output level as shown in spectrum 212b. Figure 2A and Figure 2B In the example, the 380nm LED group is completely off. Figure 2C Example 200c is depicted where the 380 nm LED group is operating at its full output level, but the 360 ​​nm LED group is completely off. Figure 2D Yet another example 200d is shown where both LED groups are operated at 50% output level.Other combinations of wavelength and output level are also contemplated herein.

[0066] Figure 2EA graph 200e is shown having a spectrum 212e created by first radiation 122 and second radiation 123. A first peak of spectrum 212e at 360 nm (UV) is due to first radiation 122. A second peak at 530 nm (green) and a third peak at 650 nm (red) are due to second radiation 123. First radiation 122 is emitted by a first set of UV LEDs, while second radiation 123 is emitted by a second set of green LEDs and a third set of red LEDs, respectively.

[0067] One design goal is to maintain uniformity and stability of the radiation 122, 123 within the area of ​​the sample window 108 and / or within the area of ​​the sample 106. One approach is to use radiation 122, 123 shaping and filtering optics 118 to fine-tune the radiation 122, 123 to a desired wavelength range and to shape the radiation 122, 123 for uniformity, directionality, and coverage. In some embodiments, the radiation 122, 123 is monitored and controlled by closed-loop feedback control via a radiation 122, 123 detector 116.

[0068] Sensing subsystem

[0069] The sensing subsystem 126 is responsible for sensing and measuring the fluorescent radiation 124 and the reflected secondary radiation 125 produced by the sample 106 when illuminated.

[0070] One goal of sensing subsystem 126 can be to spectrally separate a portion of reflected radiation 125 having the same wavelength as first radiation 122 from emitted fluorescent signal 124. One way to achieve this is to use a variable optical filter 128. For example, in one embodiment, sample 106 includes an optical brightener, radiation source 120 is configured to emit first radiation 122 in the ultraviolet spectral range of 340-400 nm, and fluorescent emission 124 is in the spectral range of 420-470 nm. In this case, variable optical filter 128 rejects any spectral signal in the 340-400 nm range and passes only radiation in the 420-470 nm range to capture fluorescent radiation 124. Alternatively, for another application, variable optical filter 128 rejects one range and passes another, as indicated by the given application. One way to implement variable optical filter 128 is to combine a filter wheel with several bandpass filters, with processor 136 controlling the filter wheel and selecting the appropriate bandpass filter for a given application.

[0071] The actual sensing and measurement is performed by imager 130. Imager 130 measures not only the amount of fluorescent emission 124 and reflected radiation 125, but also the distribution and spatial characteristics of the fluorescent emission 124 and reflected radiation 125 within the field of view of imager 130. In one embodiment, imager 130 can be a focal plane two-dimensional array device sensitive in the desired spectral range of fluorescent emission 124 and reflected radiation 125. In another embodiment, imager 130 can be a line scan array that is scanned across the field of view to create a two-dimensional image. Scanning can be accomplished by mechanical movement of imager 130 or by mechanical movement of a mirror on a fixed imager 130. In yet another embodiment, imager 130 can be a hyperspectral imaging device. Regardless of the specific imaging method used, the measurement of a given sample 106 includes the level, spectral response, and spatial information of both fluorescent emission 124 and reflected radiation 125. For the remainder of this document, we will refer to this output of imager 130 as a brightness image.

[0072] Online sensing can be performed in static mode or dynamic mode. In static mode, the sample 106 is brought into the field of view of the imager 130 on the sample window 108 and stopped for measurement. In dynamic mode, the sample 106 is moved across the sample window 108, and the radiation subsystem 114 and the sensing subsystem 126 operate at a sufficiently fast speed related to the speed of the sample movement. In offline mode, the sample 106 can be manually placed on the sample 108 as needed.

[0073] Control subsystem

[0074] Control subsystem 132 is responsible for the control, processing, and interface functions of apparatus 100. This is accomplished under the control of processor 136. Control functions include, but are not limited to, controlling the operation of other subsystems in a manner generally described elsewhere herein. It also processes images using the selected measurement method. The results of the measurement method are transmitted to user interface 138 and / or machine interface 134. Machine interface 134 may include, but is not limited to, an electronic interface to a textile machine or information system.

[0075] Measurement method

[0076] The measurement method is based on the processing of images of the fluorescent emission 124 and the reflected radiation 125, which can be one-dimensional or two-dimensional images, where each pixel 408 (a picture element, such as Figure 4 ) represents the brightness level at a specific location on the sample 106. Measurements can include, but are not limited to, two categories, namely (a) statistical analysis and (b) pattern analysis.

[0077] Statistical analysis

[0078] The first measurement category is based on statistical analysis, which provides a basic statistical assessment of brightness levels, which may include (a) average brightness level, (b) minimum brightness level and its location, (c) maximum brightness level and its location, (d) uniformity of brightness levels, and (e) a graph of brightness.

[0079] Thus, for a given luminance sample 106 irradiated with an appropriate irradiation subsystem 114, the luminance image can be represented as:

[0080]

[0081] in

[0082] a(λ j ) is the weighting factor of the fluorescence image of wavelength,

[0083] where λ min <λ j <λ max ,j=1,2,...,k,

[0084] b(λ j ) is the weighting factor of the intensity image of wavelength,

[0085] where λ min <λ j <λ max ,j=1,2,...,k,

[0086] BI(λ j ) is a brightness image of the sample 106 in one or more wavelength ranges, where

[0087] λ min <λ j <λ max ,j=1,2,...,k,

[0088] FI(λ j ) is a fluorescence image of the sample 106 in one or more wavelength ranges, where

[0089] λ min <λ j <λ max ,j=1,2,...,k,

[0090] LI(λ j ) is a luminance image of the sample 106 in one or more wavelength ranges, where

[0091] λ min <λ j <λ max ,j=1,2,...,k,

[0092] n is the number of spatial points of the image in the horizontal direction,

[0093] m is the number of spatial points in the image in the vertical direction, and

[0094] i xy is the x and y coordinate position of the sample at wavelength λ j energy level.

[0095] A statistical evaluation of the brightness level of sample 106 can be calculated as:

[0096]

[0097] in

[0098] Avg(λ j ) is the overall brightness level of the sample 106 in a single wavelength range or multiple wavelength ranges, where λ min <λ j <λ max ,j=1,2,...,n,

[0099] Min(λ j ) is the minimum brightness level of the sample 106 in a single wavelength range or multiple wavelength ranges, where λ min <λ j <λ max ,j=1,2,...,n,

[0100] Max(λ j ) is the maximum brightness level of the sample 106 in a single wavelength range or multiple wavelength ranges, where λ min <λ j <λ max ,j=1,2,...,n,

[0101] Unif(λ j ) is the uniformity of the brightness level of the sample 106 at a single wavelength or multiple wavelengths, where λ min <λ j <λ max ,j=1,2,...,n,

[0102] n is the number of spatial points of the image in the horizontal direction,

[0103] m is the number of spatial points in the image in the vertical direction, and

[0104] i xy is the x and y coordinate position of the sample 106 at wavelength λ j The combined incident radiation and fluorescence emission levels at .

[0105] We also define the term "fluorescence diagram," which presents the level of emitted fluorescence of the sample 106 for different parameters of the first radiation 122. The purpose of the fluorescence diagram is to enable easier and better characterization of the fluorescence of the sample 106. This may also be beneficial during the formulation of fluorescent pigments.

[0106] As previously described, the radiation subsystem 114 can be controlled by the processor 136 for different radiation 122, 123 levels and spectral characteristics. In addition, the sensing subsystem 126 can also be controlled by the processor 136 for spectral sensing of the emission signals 124, 125.

[0107] Figure 3A-3C Depicted are examples of how various samples 106a-106c respond to various levels of first radiation 122. This feature quantifies the optimal first radiation 122 level required for a given fluorescence application.

[0108] Figure 3A An example 300a is depicted in which three different fluorescent pigment samples 106a-106c are exposed to different levels of first radiation 122, and the fluorescence level of each sample 106a-106c is plotted on a y-axis 302 compared to the level of first radiation 122 on an x-axis 304. This enables quantitative comparison and selection of the best sample 106 of fluorescent pigment for a given application.

[0109] Figure 3B An example 300b is shown in which a sample 106 of fluorescent pigment is exposed to three different first radiations 122 having different spectral characteristics. This produces patterns 306, 308 and 310. Figure 3C Example 300c is shown where a sample 106 of fluorescent pigment is exposed to a first radiation 122 having different spectral characteristics and produces fluorescence at three wavelengths 312, 314, and 316. These graphs can help understand and select the optimal radiation source and emission output based on the application.

[0110] Pattern Analysis

[0111] The second measurement category is based on pattern analysis, which, once detected, provides pattern information. The main difference between statistical analysis and pattern analysis is the inclusion of spatial information. Pattern analysis considers the positions and relationships between all pixels in the image, while statistical analysis does not. Pattern analysis can be performed using fluorescence images, reflectance images, and / or brightness images. For simplicity, the following description only refers to brightness images, but it serves as a general approach.

[0112] Pattern analysis can include (a) the number of patterns found in the brightness image, (b) the total area of ​​all patterns in the brightness image, (c) the average size of all patterns, (d) the percentage of patterns with a horizontal orientation; (e) the percentage of patterns with a vertical orientation, and (f) the percentage of patterns with disordered or random orientation.

[0113] We define the pattern set:

[0114] P(λ j )={p1,p2,……,p l}, (6)

[0115] Where P(λ j ) is a set of fluorescent patterns p1 to p l , which exist in the brightness image FI(λ j ), where λ min <λ j <λ max ,j=1,2,...,k。

[0116] Each pattern p l A set of pixels i contained in a cluster with clustering requirements xy The clustering requirements may vary from application to application. An example is when all adjacent i xy When it has a value greater than a statically or dynamically calculated threshold.

[0117] exist Figure 4 An example of fluorescent patterns 402, 404, and 406 is shown in pattern diagram 400. In this example, there are three fluorescent patterns 402, 404, and 406, each of which has a different orientation and size as shown. For example, pattern 402 is a substantially horizontal pattern, while pattern 404 is a substantially vertical pattern. Pattern 406 is a disordered or random pattern.

[0118] In addition to classifying the orientation of patterns 402, 404, and 406, the size of each pattern 402, 404, and 406 is calculated. In the illustrated example 400, pattern 402 is approximately 5.2% of the total field of view, pattern 404 is approximately 2.1% of the total field of view, and pattern 406 is approximately 11.2% of the total field of view.

[0119] Thus, various embodiments of the apparatus and methods described herein provide for a more thorough analysis of textile fluorescence by providing fluorescence data under highly selectable radiation 122 profiles and providing the fluorescence data in a two-dimensional image of the sample 106, and also provide the other benefits described herein.

[0120] The foregoing description of the preferred embodiments of the present invention has been presented for purposes of illustration and description. It is not intended to be exhaustive or to limit the invention to the precise form disclosed. Obvious modifications or variations are possible in light of the foregoing teachings. The embodiments have been chosen and described to provide the best illustration of the principles of the invention and its practical application, thereby enabling one of ordinary skill in the art to use the invention in various embodiments, with various modifications as are appropriate to the particular use contemplated. All such modifications and variations are within the scope of the invention as determined by the appended claims when interpreted in accordance with the scope to which they are fairly, legally, and equitably entitled.

Claims

1. An apparatus (100) for optically characterizing a textile sample (106), the apparatus (100) comprising: a presentation subsystem (102) comprising a viewing window (108), a radiation subsystem (114) comprising a radiation source (120) for directing a desired first radiation (122) in the ultraviolet range of the electromagnetic spectrum and a desired second radiation (123) in the visible range of the electromagnetic spectrum through the observation window (108) toward the sample (106) and causing the sample (106) to produce fluorescent radiation (124) and reflected radiation (125), a sensing subsystem (126) comprising an imager (130) for capturing the fluorescent radiation (124) and the reflected radiation (125) in an array of pixels (408), wherein each pixel (408) records the intensity of both the fluorescent radiation (124) and the reflected radiation (125) at the pixel location, and a control subsystem (132) comprising a processor (136) for controlling the display subsystem (102), the radiation subsystem (114), and the sensing subsystem (126), and for generating a fluorescent and reflected radiation image (400) containing both spectral information and spatial information about the fluorescent radiation (124) and the reflected radiation (125) of the sample (106); in, The control subsystem (132) is adapted to perform pattern analysis using the fluorescent and reflected radiation images (400), The pattern analysis includes (a) the number of patterns found in the brightness image, (b) the total area of ​​all patterns in the brightness image, (c) the average size of all patterns, (d) the percentage of patterns with horizontal orientation, (e) the percentage of patterns with vertical orientation, and (f) the percentage of patterns with irregular or random orientation.

2. The apparatus according to claim 1, wherein the display subsystem (102) further comprises a sample press (104) for pressing the sample (106) onto the observation window (108).

3. The apparatus of claim 1 , wherein the display subsystem ( 102 ) further comprises a calibration patch ( 109 ) for generating fluorescent radiation ( 124 ) and reflected radiation ( 125 ) having known characteristics in response to the radiation ( 122 ) having known characteristics.

4. The device according to claim 1, wherein the radiation subsystem (114) further includes an optical device (118) for shaping and / or filtering the first radiation (122) and the second radiation (123) from the radiation source (120) to generate the first radiation (122) and / or the second radiation (123).

5. The apparatus of claim 1, wherein the radiation subsystem (114) further comprises a detector (116) for detecting characteristics of the first radiation (122) and / or the second radiation (123).

6. The apparatus according to claim 1, wherein The radiation source (120) is configured to generate the first radiation (122) and the second radiation (123) having a time-varying intensity distribution.

7. The apparatus according to claim 1, wherein The radiation source (120) is configured to sequentially generate the first radiation (122) and the second radiation (123).

8. The apparatus according to claim 1, wherein The radiation source (120) is configured to generate the first radiation (122) and the second radiation (123) simultaneously.

9. The apparatus according to claim 1, wherein The radiation source (120) is configured to generate the first radiation (122) and the second radiation (123) in a temporally offset manner such that they partially overlap in time.

10. The apparatus according to claim 1, wherein The radiation source (120) is configured to generate the first radiation (122) and / or the second radiation (123) periodically in time.

11. The apparatus of claim 1, wherein the array of pixels (408) is a two-dimensional array of pixels (408).

12. The apparatus of claim 1, wherein the sensing subsystem (126) further comprises a variable filter (128) for selectively inhibiting a portion of the fluorescent radiation (124) and / or reflected radiation (125) from reaching the imager (130).

13. A method for optically characterizing a textile sample (106), the method comprising the steps of: The sample (106) is displayed on the observation window (108) by the display subsystem (102), directing a desired first radiation (122) in the ultraviolet range of the electromagnetic spectrum and a desired second radiation (123) in the visible range of the electromagnetic spectrum from a radiation subsystem (114) having a radiation source (120) through an observation window (108) toward a sample (106) to cause the sample (106) to produce fluorescent radiation (124) and reflected radiation (125), capturing the fluorescent radiation (124) and the reflected radiation (125) in an array of pixels (408) with a sensing subsystem (126) having an imager (130), wherein each pixel (408) records the intensity of both the fluorescent radiation (124) and the reflected radiation (125) at the pixel location, and using a processor (136), controlling the display subsystem (102), the radiation subsystem (114), and the sensing subsystem (126), and generating a fluorescent and reflected radiation image (400) containing both spectral information and spatial information related to the fluorescent radiation (124) and the reflected radiation (125) of the sample (106); and performing pattern analysis using the fluorescent and reflected radiation images (400) using the processor (136), The pattern analysis includes (a) the number of patterns found in the brightness image, (b) the total area of ​​all patterns in the brightness image, (c) the average size of all patterns, (d) the percentage of patterns with horizontal orientation, (e) the percentage of patterns with vertical orientation, and (f) the percentage of patterns with irregular or random orientation.

14. The method of claim 13, further comprising pressing the sample (106) against the viewing window (108) with a press (104).

15. The method of claim 13, further comprising aligning the radiation from the radiation source with an optical device (118) before the first radiation (122) and / or the second radiation reaches the sample (106). The first radiation (122) and the second radiation (123) of (120) are shaped and / or filtered.

16. The method of claim 13, further comprising detecting a characteristic of the first radiation (122) and / or the second radiation (123) with a detector (116).

17. The method of claim 13, further comprising generating the first radiation (122) and the second radiation (123) with a time-varying intensity distribution.

18. The method of claim 13, further comprising sequentially generating the first radiation (122) and the second radiation (123).

19. The method of claim 13, further comprising simultaneously generating the first radiation (122) and said second radiation (123).

20. The method of claim 13, further comprising generating the first radiation (122) and the second radiation (123) in a time-shifted manner such that they partially overlap in time.

21. The method of claim 13, further comprising generating the first radiation (122) and / or the second radiation (123) periodically in time.

22. The method of claim 13, further comprising selectively inhibiting the fluorescent radiation (124) and the reflected radiation (125), respectively, from reaching the imager (130).

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