A method, apparatus, device, storage medium and program product for overlay mark screening

By evaluating the manufacturability, matching, detectability, and accuracy of overlay marks using computational lithography and metrology models, the problem of unreasonable overlay mark selection in existing technologies is solved, and a more reasonable and efficient overlay mark selection method is realized.

CN114563927BActive Publication Date: 2026-07-03DONGFANG JINGYUAN ELECTRON LTD
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
DONGFANG JINGYUAN ELECTRON LTD
Filing Date
2022-01-25
Publication Date
2026-07-03

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Abstract

This invention relates to the field of photolithography, and particularly to a method for screening overlay marks. The method involves inputting marking parameters for multiple sets of overlay marks; a computational model calculates one or more of the following information for each set of overlay marks: manufacturability information, matching information, detectability information, and accuracy information; comparing one or more of these information with preset standards to obtain and output overlay marks that match the standards. This invention solves the technical problem that current overlay mark screening methods are not sufficiently reasonable and practical in real-world applications.
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