Mask plate, preparation method of convex lens, convex lens and display panel

Abstract

The application provides a mask plate, a preparation method of a convex lens, a convex lens and a display panel, relates to the technical field of display, and is used for solving the problem that the preparation process of the microlens is not mature. The mask plate comprises at least one pattern unit, the pattern unit comprises a plurality of light shielding parts, at least part of the light shielding parts are located at the center of the pattern unit, and the plurality of light shielding parts are arranged in a radial manner away from the center of the pattern unit; adjacent light shielding parts have a light transmission port, and the opening size of the light transmission port gradually increases in the direction away from the center of the pattern unit. The application facilitates the preparation of the convex lens in the display panel, and enriches the preparation process of the convex lens.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of display, in particular to a mask plate, a preparation method of convex lens, convex lens and display panel. BACKGROUND

[0002] Organic light-emitting diode (OLED) display technology has the advantages of low cost, wide viewing angle, low driving voltage, fast response speed, rich color of light emission, simple preparation process, and large-area display, and is one of the display technologies with development prospects.

[0003] Due to the layered structure of the conventional OLED display panel, the propagation of the light generated by the light-emitting layer is limited, and only about 20% of the light is emitted outside the OLED display panel. Common methods for improving light extraction efficiency include improvement of the internal structure of the OLED display panel, improvement of the light-emitting surface of the OLED display panel, and the like. Among them, the micro-lens (MicroLens) arranged in the OLED display panel is considered to be one of the technologies with development prospects.

[0004] However, in the OLED industry, the preparation process of the micro-lens is still immature, and a mask structure is urgently needed for preparing the micro-lens in the OLED display panel. SUMMARY

[0005] In order to solve at least one problem mentioned in the background art, the embodiments of the present application provide a mask plate, a preparation method of convex lens, convex lens and display panel, which facilitate the preparation of convex lens in the display panel and enrich the preparation process of convex lens.

[0006] In order to achieve the above-mentioned purpose, the embodiments of the present application provide the following technical solutions:

[0007] The first aspect of the embodiments of the present application provides a mask plate, which comprises at least one pattern unit, the pattern unit comprises a plurality of light shielding parts, part of the light shielding parts are located at the center of the pattern unit, and a plurality of the light shielding parts are arranged in a radial manner away from the center of the pattern unit; adjacent light shielding parts have a light transmission port, and the opening size of the light transmission port gradually increases in the direction away from the center of the pattern unit.

[0008] The mask plate provided by the embodiment of the present application can form a corresponding pattern on the photoresist through the pattern unit. The plurality of light shielding parts are arranged radially along the center of the pattern unit, and the opening size of the light transmission port between adjacent light shielding parts gradually increases away from the center of the pattern unit. In this way, when the light of the photoetching machine is irradiated on the mask plate, the light shielding part can shield light, and the opening size of the light transmission port between adjacent light shielding parts gradually increases away from the center of the pattern unit, so that the light intensity on the positive photoresist gradually decreases from the edge to the center, and the positive photoresist forms a convex lens pattern after development. The mask plate with the above structure facilitates the preparation of the convex lens in the display panel and enriches the preparation process of the convex lens.

[0009] In a possible implementation, one end of the light shielding part away from the center of the pattern unit and the center of the pattern unit have a distance R; the light shielding part has an extension line between the end close to the center of the pattern unit and the end away from the center of the pattern unit, and the extension lines of adjacent light shielding parts have a first included angle α; the light shielding part has a width B perpendicular to the extension direction of the light shielding part, and the numerical relationship between the R, the α and the B satisfies the following formula:

[0010]

[0011] wherein the L is a preset parameter, and the B is less than the L.

[0012] In this way, the corresponding photoresist at the light transmission port between adjacent light shielding parts can be prevented from being completely etched, so that the convex lens pattern can be formed.

[0013] In a possible implementation, the width of the light shielding part is equal everywhere in the extension direction of the light shielding part.

[0014] In this way, the structure of the light shielding part is simpler, and the difficulty of setting the pattern unit is reduced.

[0015] In a possible implementation, the light shielding part extends along a straight line in the plane where the mask plate is located.

[0016] Alternatively, the light shielding part extends along an arc in the plane where the mask plate is located.

[0017] In this way, the shape of the light shielding part can be enriched, so that the light intensity distribution on the photoresist can be changed.

[0018] In a possible implementation, the width of the light shielding part gradually increases in the direction close to the center of the pattern unit.

[0019] Specifically, the shape of the light shielding part is trapezoidal in the plane where the mask plate is located.

[0020] In this way, the photoresist near the center of the pattern unit can have a weaker light intensity, so that the convex lens thickness of this area is thicker.

[0021] In a possible implementation, the light-shielding part includes first light-shielding parts and second light-shielding parts arranged at intervals, the first light-shielding parts and the second light-shielding parts have a second included angle between the extension lines, and part of the first light-shielding parts and part of the second light-shielding parts overlap each other.

[0022] The side edge of the first light-shielding part near one side of the second light-shielding part has a protruding part, and the side edge of the second light-shielding part near one side of the first light-shielding part has a recessed part; the protruding part and the recessed part are adapted in shape and oppositely arranged.

[0023] In this way, the light intensity of the photoresist near the protruding part and the recessed part can be compensated for each other, so that the light intensity distribution on the same circumference of the photoresist is uniform.

[0024] In a possible implementation, one end of the light-shielding part is located at the center of the pattern unit, and the other end of the light-shielding part extends away from the center of the pattern unit.

[0025] Alternatively, the center of the light-shielding part in the extension direction coincides with the center of the pattern unit, and the opposite ends of the light-shielding part both extend away from the center of the pattern unit.

[0026] In this way, the light-shielding part has two setting modes, so that the pattern unit can have different setting modes, and the setting difficulty of the pattern unit is reduced.

[0027] A second aspect of the embodiment of the present application provides a method for manufacturing a convex lens by using the mask plate, comprising:

[0028] forming a photoresist on a substrate; the photoresist is a positive photoresist;

[0029] exposing the photoresist by using a mask plate; the mask plate includes at least one pattern unit, the pattern unit includes a plurality of light-shielding parts, part of the light-shielding parts are located at the center of the pattern unit, and the plurality of light-shielding parts are arranged radially along the center of the pattern unit; adjacent light-shielding parts have a light-transmitting opening therebetween, and the opening size of the light-transmitting opening gradually increases away from the center of the pattern unit.

[0030] developing the exposed photoresist to form a convex lens.

[0031] The preparation method of the convex lens, the convex lens and the display panel provided by the embodiments of the present application are characterized in that a plurality of light shielding parts are arranged along the center of the pattern unit in a radial manner, and the opening size of the light transmission opening between adjacent light shielding parts gradually increases in a direction away from the center of the pattern unit. In this way, when the light of the photoetching machine is irradiated on the mask plate, the light shielding parts can shield light, and the opening size of the light transmission opening between adjacent light shielding parts gradually increases in a direction away from the center of the pattern unit, so that the light intensity on the positive photoresist gradually decreases from the edge to the center, and the positive photoresist forms a convex lens pattern after development. This preparation method facilitates the preparation of the convex lens in the display panel, and enriches the preparation process of the convex lens and the setting mode of the convex lens in the display panel.

[0032] The third aspect of the embodiments of the present application provides a convex lens prepared by the preparation method of the convex lens.

[0033] The fourth aspect of the embodiments of the present application provides a display panel comprising the convex lens.

[0034] The convex lens and the display panel provided by the embodiments of the present application facilitate the preparation of the convex lens in the display panel, reduce the preparation difficulty of the convex lens, and enrich the preparation process of the convex lens and the setting mode of the convex lens in the display panel. On the other hand, the light incidence rate of the under-screen device can be improved, and the light transmission performance of the display panel can be improved.

[0035] The configuration of the present application and other application purposes and beneficial effects thereof will be more obvious and easy to understand through the description of the preferred embodiments in combination with the accompanying drawings. BRIEF DESCRIPTION OF DRAWINGS

[0036] In order to more clearly illustrate the technical solutions in the embodiments of the present application or the related technical solutions, the drawings needed in the embodiment or related technical solution description will be briefly introduced below. Obviously, the drawings in the following description are some embodiments of the present application, and other drawings can also be obtained by those skilled in the art without creative labor.

[0037] Figure 1 Light emission schematic diagram of a display panel without a convex lens;

[0038] Figure 2 Light emission schematic diagram of a display panel with a convex lens;

[0039] Figure 3 Light incidence schematic diagram of a display panel without a convex lens;

[0040] Figure 4 Light incidence schematic diagram of a display panel with a convex lens;

[0041] Figure 5 A structure diagram of a mask plate provided for an embodiment of the present application is shown in FIG. 1.

[0042] Figure 6A A structure diagram of a first pattern unit of a mask plate provided for an embodiment of the present application is shown in FIG. 2.

[0043] Figure 6B A structure diagram of a light-shielding part of the first pattern unit of the mask plate provided for an embodiment of the present application is shown in FIG. 3.

[0044] Figure 7 A light intensity distribution diagram of a photoresist at a pattern unit provided for an embodiment of the present application is shown in FIG. 4.

[0045] Figure 8A A structure diagram of a second pattern unit of a mask plate provided for an embodiment of the present application is shown in FIG. 5.

[0046] Figure 8B A structure diagram of a light-shielding part of the second pattern unit of the mask plate provided for an embodiment of the present application is shown in FIG. 6.

[0047] Figure 9A A structure diagram of a third pattern unit of a mask plate provided for an embodiment of the present application is shown in FIG. 7.

[0048] Figure 9B A structure diagram of a light-shielding part of the third pattern unit of the mask plate provided for an embodiment of the present application is shown in FIG. 8.

[0049] Figure 10A A structure diagram of a fourth pattern unit of a mask plate provided for an embodiment of the present application is shown in FIG. 9.

[0050] Figure 10B A structure diagram of a light-shielding part of the fourth pattern unit of the mask plate provided for an embodiment of the present application is shown in FIG. 10.

[0051] Figure 11 A structure diagram of a fifth pattern unit of a mask plate provided for an embodiment of the present application is shown in FIG. 11.

[0052] Figure 12 A flow diagram of a preparation method of a convex lens provided for an embodiment of the present application is shown in FIG. 12.

[0053] Explanation of reference signs:

[0054] 100 - display panel

[0055] 110 - light-emitting device layer

[0056] 120 - light filter layer

[0057] 130 - lens layer

[0058] 131 - Convex lens;

[0059] 140 - Under-display devices;

[0060] 200 - Mask plate;

[0061] 210 - Pattern unit;

[0062] 210a - Center of pattern unit;

[0063] 211-Shading part;

[0064] 2111 - First shading section;

[0065] 2111a - Protrusion;

[0066] 2112 - Second shading section;

[0067] 2112a - Depression;

[0068] 212 - Light-transmitting opening;

[0069] 221 - First end;

[0070] 222 - Second end. Detailed Implementation

[0071] As described in the background section, conventional OLED display panels have low light extraction efficiency. To improve the light extraction efficiency of OLED display panels, the internal structure of the display panel is usually modified, such as by adding a light modulation layer. Furthermore, incorporating microlenses into OLED display panels is considered a promising technology.

[0072] Figure 1 This is a schematic diagram of light emission from a display panel without a convex lens. Figure 2 A schematic diagram of light emission from a display panel equipped with a convex lens. Figure 1 and Figure 2 The display panel 100 in each panel includes a light-emitting device layer 110 and a light-filtering layer 120, with the light-emitting layer 120 located on the side closer to the light-emitting surface of the light-emitting device layer 110. Through Figure 1 It is known that most of the light emitted from the light-emitting device layer 110 is refracted inside the display panel 100, resulting in less light emanating from the display panel 100. Figure 2 In this structure, a lens layer 130 is disposed between the filter layer 120 and the light-emitting device layer 110, and an array of convex lenses 131 are disposed on the lens layer 130. Figure 2 It can be seen that the light emitted from the light-emitting device layer 110, after being refracted and converged by the convex lens 131, can be mostly emitted from the display panel 100.

[0073] Figure 3This is a schematic diagram of light incident on a display panel without a convex lens. Figure 4 A schematic diagram of light incident on a display panel equipped with a convex lens. Figure 3 and Figure 4 An under-display device 140 is disposed on the backlight side of the display panel 100. This under-display device 140 can be an under-display fingerprint module, and it can receive light reflected from external objects (such as fingers). Figure 3 In this configuration, after external light enters the display panel 100, only a small portion of the light can reach the under-display device 140. Figure 4 In this process, after external light is refracted by the convex lens 131 in the lens layer 130, most of the light can be incident on the under-display device 140. It can be seen that the convex lens 131 can not only improve the light output of the OLED display panel 100, but also improve the incident rate of external light on the under-display device 140.

[0074] However, the fabrication of microlenses is still immature in the OLED industry, and there is an urgent need for a mask structure to fabricate microlenses in OLED display panels.

[0075] To address the aforementioned technical problems, this application provides a method for fabricating a photomask, a convex lens, the convex lens itself, and a display panel. By setting multiple light-shielding portions arranged radially away from the center of the pattern unit, and with the opening size of the light-transmitting apertures between adjacent light-shielding portions gradually increasing towards the center of the pattern unit, when light from the lithography machine shines on the photomask, the light-shielding portions effectively block the light, and the gradually increasing aperture size between adjacent light-shielding portions results in a gradual decrease in light intensity on the positive photoresist from the edge to the center. After development, the positive photoresist forms a convex lens pattern. This structure facilitates the fabrication of convex lenses in display panels, enriching the fabrication process and placement options for convex lenses within display panels. Furthermore, it can improve the light incident rate of under-display devices and enhance the light transmittance of the display panel.

[0076] To make the objectives, technical solutions, and advantages of this application clearer, the technical solutions in the embodiments of this application will be described in more detail below with reference to the accompanying drawings. In the drawings, the same or similar reference numerals denote the same or similar components or components having the same or similar functions throughout. The described embodiments are some, but not all, embodiments of this application. The embodiments described below with reference to the accompanying drawings are exemplary and intended to explain this application, and should not be construed as limiting this application. All other embodiments obtained by those skilled in the art based on the embodiments of this application without creative effort are within the scope of protection of this application. The embodiments of this application will be described in detail below with reference to the accompanying drawings.

[0077] In the description of the embodiments of the present application, it should be noted that unless specifically defined and limited, the terms "mounting", "connecting", "connecting" should be understood in a broad sense, for example, it can be fixedly connected, or indirectly connected through an intermediate medium, or the internal communication of two elements or the interaction relationship between two elements. For those skilled in the art, the specific meaning of the above terms in the present application can be understood according to the specific circumstances.

[0078] Figure 5 The structure schematic diagram of the mask plate provided by the embodiment of the present application is shown. Figure 6A The structure schematic diagram of the first pattern unit of the mask plate provided by the embodiment of the present application is shown. Figure 6B The structure schematic diagram of the light shielding part of the first pattern unit of the mask plate provided by the embodiment of the present application is shown. Figure 7 The light intensity distribution schematic diagram of the photoresist at the corresponding position of the pattern unit provided by the embodiment of the present application is shown. Figure 8A The structure schematic diagram of the second pattern unit of the mask plate provided by the embodiment of the present application is shown. Figure 8B The structure schematic diagram of the light shielding part of the second pattern unit of the mask plate provided by the embodiment of the present application is shown. Figure 9A The structure schematic diagram of the third pattern unit of the mask plate provided by the embodiment of the present application is shown. Figure 9B The structure schematic diagram of the light shielding part of the third pattern unit of the mask plate provided by the embodiment of the present application is shown. Figure 10A The structure schematic diagram of the fourth pattern unit of the mask plate provided by the embodiment of the present application is shown. Figure 10B The structure schematic diagram of the light shielding part of the fourth pattern unit of the mask plate provided by the embodiment of the present application is shown. Figure 11 The structure schematic diagram of the fifth pattern unit of the mask plate provided by the embodiment of the present application is shown. Figures 5-11 The first aspect of the embodiment of the present application provides a mask plate.

[0079] As Figure 5 , Figure 6A and Figure 6BAs shown, the mask plate 200 includes a plurality of pattern units 210, and each pattern unit 210 includes a plurality of light shielding portions 211. A part of the light shielding portions 211 is located at a pattern unit center 210a, and the plurality of light shielding portions 211 are arranged radially away from the pattern unit center 210a. Adjacent light shielding portions 211 are provided with a light transmission opening 212, and the opening size of the light transmission opening 212 gradually increases away from the pattern unit center 210a. The opening size of the light transmission opening 212 refers to the arc length corresponding to the light transmission opening 212 in the circumferential direction of the pattern unit 210 with the pattern unit center 210a as the center. The light transmission opening 212 can increase the transmission amount of the light of the photoetching machine, and the opening size of the light transmission opening 212 gradually increases from the pattern unit center 210a to the edge, so that the light intensity distribution on the photoresist can be adjusted.

[0080] In the embodiment of the present application, the mask plate 200 is used in the preparation process of the array substrate, and is used to form a convex lens pattern on the array substrate by using a positive photoresist. It can be understood that the exposed part of the positive photoresist will undergo a photochemical reaction and be dissolved in the developing solution, while the unexposed part will not be dissolved in the developing solution and will remain on the substrate. The positive photoresist will copy the same pattern on the mask plate 200 to the substrate.

[0081] It should be noted that the pattern unit 210 is provided, and the corresponding pattern can be formed on the photoresist by the pattern unit 210. The plurality of light shielding portions 211 are arranged radially away from the pattern unit center 210a, and the light transmission opening 212 between adjacent light shielding portions 211 gradually increases away from the pattern unit center 210a. In this way, when the light of the photoetching machine is incident on the mask plate 200, the light shielding portions 211 can shield the light, and the light transmission opening 212 between the light shielding portions 211 can transmit the light. Therefore, the light intensity on the positive photoresist gradually decreases from the edge to the center, and the light intensity distribution is as shown in Figure 7 As shown, the positive photoresist after development has a relatively thick thickness in the area with weak light intensity and a relatively thin thickness in the area with strong light intensity, thereby forming a convex lens pattern. This structure facilitates the preparation of the convex lens in the display panel and reduces the difficulty of the preparation of the convex lens. Specifically, the convex lens can be prepared on the array substrate of the display panel by using the positive photoresist, thereby enriching the preparation process of the convex lens.

[0082] In the embodiment of the present application, as shown in Figure 5 The plurality of pattern units 210 are arranged in an array on the mask plate. It can be understood that the number and arrangement of the pattern units 210 of the mask plate 200 can be set according to actual conditions, and the number and arrangement of the pattern units 210 of the mask plate 200 are not limited in the embodiment of the present application.

[0083] It should be noted that the width of the light transmission port 212 between the adjacent light shielding portions 211 and the light shielding portion 211 should be less than a preset parameter, which can be the resolution of the photolithography machine, i.e., the resolution of the photolithography machine cooperating with the mask plate 200 in the photolithography process. In this way, the corresponding photoresist at the light transmission port 212 between the adjacent light shielding portions 211 can be prevented from being completely etched, so that a convex lens pattern can be formed. It can be understood that the resolution of the photolithography machine can be selected according to actual needs, and the resolution of the photolithography machine is not limited in the embodiments of the present application.

[0084] Specifically, as shown in Figure 6A and Figure 9A , the light shielding portion 211 has a distance R between the end away from the pattern unit center 210a and the pattern unit center 210a; the light shielding portion 211 includes a first end 221 and a second end 222, the first end 221 is the end of the light shielding portion 211 close to the pattern unit center 210a, and the second end 222 is the end of the light shielding portion 211 away from the pattern unit center 210a. The straight line connecting the first end 221 and the second end 222 is the extension line (not a real existing line), and the extension lines of the adjacent two light shielding portions 211 have an included angle α; perpendicular to the extension direction of the light shielding portion 211, the light shielding portion 211 has a width B, and the numerical relationship between R, α and B satisfies the following formula;

[0085]

[0086] Wherein, L is a preset parameter, i.e., the resolution of the photolithography machine, and B < L. The left half of the above formula represents the opening size of the light transmission port 212 between the adjacent light shielding portions 211. It can be understood that the opening size of the light transmission port 212 between the adjacent light shielding portions 211 is the largest at the edge of the pattern unit 210, so it only needs to ensure that the opening size of the light transmission port 212 at this position is less than or equal to the preset parameter, and correspondingly, R should be the distance between the light shielding portion 211 and the pattern unit center 210a at this position, and R can also be understood as the radius value of the light shielding portion 211 at this position.

[0087] As shown in Figure 6A , the extension line between the first end 221 and the second end 222 of the light shielding portion 211 is a straight line, the extension lines of the adjacent two light shielding portions 211 are c1 and c2 respectively, and the included angle between c1 and c2 is α. The extension direction of the length of the light shielding portion 211 is x, and the extension direction of the light shielding portion 211 is consistent with the extension trajectory of the length of the light shielding portion 211. Among them, the extension trajectory (x) can be consistent with the extension line (c1, c2). For example, when the light shielding portion 211 is approximately rectangular, the center line of the light shielding portion 211 can overlap with the extension line (c1, c2) and the extension trajectory (x) of the light shielding portion 211.

[0088] As shown in Figure 9AAs shown in FIG. 13, the extension line between the first end 221 and the second end 222 of the light shielding part 211 is a straight line, the extension lines of the two adjacent light shielding parts 211 are c3 and c4 respectively, and the included angle between c3 and c4 is α. The extension direction of the length of the light shielding part 211 is y, and the extension direction of the light shielding part 211 is consistent with the extension trajectory of the length of the light shielding part 211. Among them, the extension trajectory (y) of the light shielding part 211 can be inconsistent with the extension line (c3, c4). For example, when the light shielding part 211 is approximately arc-shaped, the extension trajectory (y) of the light shielding part 211 is arc-shaped, and the extension line (c3, c4) is a straight line.

[0089] It can be understood that in the setting of the pattern unit 210, the following two ways can be used:

[0090] In a first possible implementation, as shown in FIG. 14, the center of the light shielding part 211 is located at the pattern unit center 210a, and the opposite ends of the light shielding part 211 extend away from the pattern unit center 210a. The light shielding part 211 is arranged in a ring array with the pattern unit center 210a as the center, that is, the pattern unit 210 in FIG. 15 is obtained. Figure 6B Figure 6A In a second possible implementation, as shown in FIG. 16, one end of the light shielding part 211 is located at the pattern unit center 210a, and the other end of the light shielding part 211 extends away from the pattern unit center 210a. The light shielding part 211 is arranged in a ring array with the pattern unit center 210a as the center, that is, the pattern unit 210 in FIG. 17 is obtained.

[0091] It can be understood that both of the above two ways can form the pattern unit 210, so that the light shielding part 211 has two setting ways, and the user can select according to the actual situation during the setting process, thereby reducing the difficulty of setting the pattern unit 210. Figure 8B Figure 8A In a possible implementation, as shown in FIG. 18 and FIG. 19, in the extension direction of the light shielding part 211, the width of the light shielding part 211 is equal everywhere. Among them, the extension direction of the light shielding part 211 refers to the length direction of the light shielding part 211. This setting makes the structure of the light shielding part 211 simpler, thereby reducing the difficulty of setting the pattern unit 210.

[0092] Specifically, in the plane where the mask plate 200 is located, the light shielding part 211 extends along a straight line, that is, the shape of the light shielding part 211 is rectangular. It should be noted that, as shown in FIG. 20 and FIG. 21, in the plane where the mask plate 200 is located, the light shielding part 211 extends along an arc, that is, the shape of the light shielding part 211 is arc-shaped.

[0093] In a possible implementation, as shown in FIG. 18 and FIG. 19, in the extension direction of the light shielding part 211, the width of the light shielding part 211 is equal everywhere. Among them, the extension direction of the light shielding part 211 refers to the length direction of the light shielding part 211. This setting makes the structure of the light shielding part 211 simpler, thereby reducing the difficulty of setting the pattern unit 210. Figure 6A 6B Specifically, in the plane where the mask plate 200 is located, the light shielding part 211 extends along a straight line, that is, the shape of the light shielding part 211 is rectangular. It should be noted that, as shown in FIG. 20 and FIG. 21, in the plane where the mask plate 200 is located, the light shielding part 211 extends along an arc, that is, the shape of the light shielding part 211 is arc-shaped.

[0094] Specifically, in the plane where the mask plate 200 is located, the light shielding part 211 extends along a straight line, that is, the shape of the light shielding part 211 is rectangular. It should be noted that, as shown in FIG. 20 and FIG. 21, in the plane where the mask plate 200 is located, the light shielding part 211 extends along an arc, that is, the shape of the light shielding part 211 is arc-shaped. Figure 9A 9B Specifically, in the plane where the mask plate 200 is located, the light shielding part 211 extends along a straight line, that is, the shape of the light shielding part 211 is rectangular. It should be noted that, as shown in FIG. 20 and FIG. 21, in the plane where the mask plate 200 is located, the light shielding part 211 extends along an arc, that is, the shape of the light shielding part 211 is arc-shaped. ​​​​

[0095] In a possible implementation, as shown in Figure 10A and Figure 10B shown, the width of the light shielding part 211 gradually increases in the direction close to the pattern unit center 210a. Specifically, in the plane where the mask plate 200 is located, the shape of the light shielding part 211 is trapezoidal. In this way, the light shielding effect at the pattern unit center 210a can be better, so that the light intensity of the photoresist close to the pattern unit center 210a is weaker, and the thickness of the convex lens in this area is thicker.

[0096] In a possible implementation, as shown in Figure 11 , the light shielding part 211 includes the first light shielding part 2111 and the second light shielding part 2112 arranged at intervals, and the extension lines of the first light shielding part 2111 and the second light shielding part 2112 have an included angle. The principle is similar to that of the included angle α, which will not be described again. And part of the first light shielding part 2111 and part of the second light shielding part 2112 overlap. The side edge of the first light shielding part 2111 close to the second light shielding part 2112 has a protruding part 2111a, and the side edge of the second light shielding part 2112 close to the first light shielding part 2111 has a recessed part 2112a. The shapes of the protruding part 2111a and the recessed part 2112a are matched and oppositely arranged. It can be understood that the shapes matched means that the outer contours of the protruding part 2111a and the recessed part 2112a are the same. In this way, the light intensity of the photoresist close to the protruding part 2111a and the recessed part 2112a can be mutually compensated, so that the light intensity distribution on the same circumference of the photoresist is uniform.

[0097] It can be understood that the number of the protruding part 2111a and the recessed part 2112a can also be multiple, and the number of the protruding part 2111a and the recessed part 2112a is not limited in the embodiments of the application. The user can select according to the actual situation.

[0098] Figure 12 The flowchart of the preparation method of the convex lens provided by the embodiments of the application is shown. Referring to Figure 12 , the second aspect of the embodiments of the application provides a preparation method of a convex lens.

[0099] The preparation method of the convex lens includes:

[0100] S1: forming a photoresist on a substrate. The substrate can be glass or polyimide, and the photoresist is a positive photoresist.

[0101] S2: exposing the photoresist by using a mask plate. Referring to Figure 6AAs shown, the mask plate 200 includes at least one pattern unit 210, and the pattern unit 210 includes a plurality of light shielding portions 211, a part of each light shielding portion 211 is located at a pattern unit center 210a, and the plurality of light shielding portions 211 are arranged radially away from the pattern unit center 210a. Adjacent light shielding portions 211 have a light transmission opening 212 therebetween, and the opening size of the light transmission opening 212 gradually increases away from the pattern unit center 210a. The orthographic projection of the pattern unit 210 on the substrate overlaps the area of the convex lens to be formed on the substrate.

[0102] S3: Develop the exposed photoresist to form a convex lens. After the photoresist is exposed and developed by using the mask plate 200, the photoresist pattern with a convex lens shape formed is a convex lens pattern with gradually increasing thickness from the edge to the center.

[0103] It should be noted that the opening size of the light transmission opening 212 between adjacent light shielding portions 211 and the width of the light shielding portion 211 should be less than a preset parameter, which can be the resolution of the photolithography machine, i.e., the resolution of the photolithography machine cooperating with the mask plate 200 in the photolithography process. In this way, the corresponding photoresist at the light transmission opening 212 between adjacent light shielding portions 211 can not be completely etched, so that the convex lens pattern can be formed. It can be understood that the resolution of the photolithography machine can be selected according to actual needs, and the resolution of the photolithography machine is not limited in the embodiments of the present application.

[0104] The preparation method of the convex lens provided in the embodiments of the present application sets a plurality of light shielding portions 211, and the plurality of light shielding portions 211 are arranged radially away from the pattern unit center 210a, and the opening size of the light transmission opening 212 between adjacent light shielding portions 211 gradually increases away from the pattern unit center 210a. In this way, when the light of the photolithography machine is irradiated on the mask plate 200, the light shielding portion 211 can shield light, and the light transmission opening 212 between the light shielding portions 211 can transmit light, so that the light intensity on the positive photoresist gradually decreases from the edge to the center, and the positive photoresist forms a convex lens pattern after development. This preparation method of the convex lens can be used to prepare the convex lens on the array substrate of the display panel by using the positive photoresist, which enriches the preparation process of the convex lens and the setting mode of the convex lens in the display panel.

[0105] The third aspect of the embodiments of the present application provides a convex lens prepared by the above-mentioned preparation method of the convex lens.

[0106] The fourth aspect of the embodiments of the present application provides a display panel including the above-mentioned convex lens. The display panel includes an array substrate, and the array substrate is provided with a light emitting layer. The convex lens is located on the array substrate and on the side of the light emitting surface away from the light emitting layer. In addition, the display panel can be provided with an under-screen device, and the convex lens is used to improve the light incidence rate of the under-screen device.

[0107] The display panel can be an organic light-emitting diode (OLED) display panel, a liquid crystal display (LCD), a mini light-emitting diode (Mini LED) display panel, or a micro light-emitting diode (Micro LED) display panel.

[0108] The convex lens and the display panel provided by the embodiments of the present application can be used to facilitate the preparation of the convex lens in the display panel, and reduce the difficulty of preparation of the convex lens. Specifically, the convex lens can be prepared on the array substrate of the display panel by using a positive photoresist, thereby enriching the preparation process of the convex lens and the arrangement mode of the convex lens in the display panel. In addition, the light incidence rate of the under-screen device can be improved, thereby improving the light transmission performance of the display panel.

[0109] In the description of the embodiments of the present application, it should be understood that the terms "upper", "lower", "front", "back", "vertical", "horizontal", "top", "bottom", "inner", "outer" and the like indicate the orientation or positional relationship shown in the drawings, and are only used to facilitate the description of the present application and simplify the description, and do not indicate or imply that the device or element referred to must have a particular orientation, be constructed and operated in a particular orientation, and therefore cannot be understood as a limitation on the present application. In the description of the present application, the meaning of "a plurality of" is two or more, unless otherwise specified.

[0110] The terms "first", "second", "third", "fourth" and the like (if any) used in the description of the present application and the above drawings are used to distinguish similar objects, and do not necessarily indicate a specific order or sequence. It should be understood that the data thus used can be interchanged under appropriate circumstances, so that the embodiments of the present application described herein can be implemented in an order other than that illustrated or described herein. In addition, the terms "include" and "have" and any variations thereof are intended to cover non-exclusive inclusion, for example, a process, method, system, product or device including a series of steps or units does not necessarily have to include only those steps or units clearly listed, but can include other steps or units not clearly listed or inherent to the process, method, product or device.

[0111] Finally, it should be noted that: the above embodiments are only used to illustrate the technical solutions of the present application, but not to limit them; although the present application has been described in detail with reference to the foregoing embodiments, those skilled in the art should understand that: it can still modify the technical solutions recorded in the foregoing embodiments, or make equivalent replacement to part or all of the technical features; and these modifications or replacements do not make the essence of the corresponding technical solutions deviate from the scope of the technical solutions of the embodiments of the present application.

Claims

1. A photomask, characterized in that, It includes at least one pattern unit, the pattern unit includes a plurality of light-shielding parts, some of the light-shielding parts are located at the center of the pattern unit, and the plurality of light-shielding parts are arranged radially in a direction away from the center of the pattern unit; There is a light-transmitting opening between adjacent light-blocking parts, and the opening size of the light-transmitting opening gradually increases in the direction away from the center of the pattern unit; The light-shielding portion has a distance R between the end of the light-shielding portion away from the center of the pattern unit and the center of the pattern unit; there is an extension line between the end of the light-shielding portion near the center of the pattern unit and the end away from the center of the pattern unit, and there is a first included angle α between the extension lines of adjacent light-shielding portions; perpendicular to the extension direction of the light-shielding portion, the light-shielding portion has a width B, and the numerical relationship between R, α and B conforms to the following formula, so as to avoid the photoresist corresponding to the light-transmitting opening between adjacent light-shielding portions being completely etched away, so as to form a convex lens pattern; Wherein, L is a preset parameter, and B is less than L; the preset parameter is the resolution of the lithography machine.

2. The mask plate according to claim 1, characterized in that, The width of the light-shielding portion is equal everywhere along its extending direction.

3. The mask plate according to claim 2, characterized in that, On the plane where the mask plate is located, the light-blocking portion extends in a straight line; Alternatively, on the plane where the mask plate is located, the light-blocking portion extends along an arc.

4. The mask plate according to claim 1, characterized in that, The width of the light-shielding portion gradually increases towards the center of the pattern unit.

5. The mask plate according to claim 4, characterized in that, On the plane where the mask plate is located, the shape of the light-blocking part is trapezoidal.

6. The mask plate according to claim 1, characterized in that, The light-shielding portion includes a first light-shielding portion and a second light-shielding portion that are spaced apart. The extension lines of the first light-shielding portion and the extension lines of the second light-shielding portion have a second included angle, and a portion of the first light-shielding portion and a portion of the second light-shielding portion overlap each other. The first light-shielding part has a protrusion on the side near the second light-shielding part, and the second light-shielding part has a recess on the side near the first light-shielding part; the protrusion and the recess are adapted in shape and are arranged opposite to each other.

7. The mask plate according to claim 1, characterized in that, One end of the light-shielding part is located at the center of the pattern unit, and the other end of the light-shielding part extends in a direction away from the center of the pattern unit; Alternatively, the center of the light-shielding portion in the extending direction coincides with the center of the pattern unit, and both ends of the light-shielding portion extend away from the center of the pattern unit.

8. A method for manufacturing a convex lens, characterized in that, include: Photoresist is formed on the substrate; The photoresist is a positive photoresist; The photoresist is exposed using a photomask; The photomask includes at least one pattern unit, which includes multiple light-shielding portions. A portion of the light-shielding portions is located at the center of the pattern unit, and the multiple light-shielding portions are arranged radially away from the center of the pattern unit. A light-transmitting opening is provided between adjacent light-shielding portions, and the opening size of the light-transmitting opening gradually increases in the direction away from the center of the pattern unit. A distance R exists between the end of the light-shielding portion away from the center of the pattern unit and the center of the pattern unit. An extension line exists between the end of the light-shielding portion near the center of the pattern unit and the end away from the center of the pattern unit, and a first included angle α exists between the extension lines of adjacent light-shielding portions. Perpendicular to the extension direction of the light-shielding portion, the light-shielding portion has a width B. The numerical relationship between R, α, and B conforms to the following formula to prevent the photoresist corresponding to the light-transmitting opening between adjacent light-shielding portions from being completely etched away, thereby forming a convex lens pattern. Wherein, L is a preset parameter, and B is less than L; the preset parameter is the resolution of the lithography machine; The exposed photoresist is developed to form a lens.

9. A convex lens, characterized in that, It is prepared using the convex lens preparation method as described in claim 8.

10. A display panel, characterized in that, Includes the convex lens as described in claim 9.

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