Display panel, manufacturing method thereof, and display device

Abstract

The embodiment of the present invention discloses a display panel, a preparation method thereof, and a display device. The display panel includes a display function layer, including a plurality of sub-pixels and a pixel definition structure surrounding the sub-pixels, an anti-reflection function layer, located on the light-emitting side of the display function layer, including a first refractive index pattern, the first refractive index pattern overlapping the pixel definition structure, a substrate layer, located between the anti-reflection function layer and the display function layer, including a uniform light structure, the uniform light structure including a first inclined sidewall, along the light-emitting direction of the sub-pixel, the first inclined sidewall is inclined in a direction away from the sub-pixel adjacent thereto, and the first refractive index pattern covers the uniform light structure. The embodiment of the present invention solves the problem that holes, undercuts, etc. are easily generated at the bottom of the low-fold layer after photolithography exposure and development, further increases the degree of solidification at the bottom of the first refractive index pattern, and enhances the anti-reflection effect of the display panel.

Description

[0001] This application is a divisional application based on the patent application with the application date of June 30, 2021, application number 202110739070.9, and invention name "A display panel, its preparation method, and display device". Technical Field

[0002] Embodiments of the present invention relate to the technical field of display panels, and in particular, to a display panel, a manufacturing method thereof, and a display device. Background Art

[0003] Photolithography technology forms exposed areas and unexposed areas by exposing a surface coated with photosensitive material in a certain pattern, while retaining the pattern of the exposed area or the pattern of the unexposed area. It is mainly used to manufacture semiconductor components, printed circuit boards, display panels, etc.

[0004] Existing display panel film layers usually include a display function layer and an anti-reflection function layer. The anti-reflection function layer is made using photolithography technology. During the exposure and development process of the photolithography process, holes and undercuts are easily generated at the bottom of the anti-reflection function layer, affecting the anti-reflection effect of the display panel. Summary of the Invention

[0005] The present invention provides a display panel and a manufacturing method thereof, and a display device, so as to avoid the undercutting phenomenon etc. generated at the bottom of the low-fold layer after photolithography exposure and development, and further improve the anti-reflection effect of the display panel.

[0006] In a first aspect, an embodiment of the present invention provides a display panel, including:

[0007] A display function layer including a plurality of sub-pixels and a pixel definition structure surrounding the sub-pixels;

[0008] an anti-reflection functional layer, located on the light-emitting side of the display functional layer, comprising a first refractive index pattern, wherein the first refractive index pattern overlaps with the pixel definition structure;

[0009] a substrate layer, located between the anti-reflection functional layer and the display functional layer, comprising a light homogenizing structure, wherein the light homogenizing structure comprises a first inclined sidewall, and along the light emitting direction of the sub-pixel, the first inclined sidewall is inclined in a direction away from the adjacent sub-pixel;

[0010] The first refractive index pattern covers the light uniforming structure.

[0011] In a second aspect, an embodiment of the present invention further provides a display device, which includes the display panel described in the first aspect.

[0012] In a third aspect, an embodiment of the present invention further provides a method for manufacturing a display panel, the method comprising:

[0013] forming a display function layer, the display function layer including a plurality of sub-pixels and a pixel definition structure surrounding the sub-pixels;

[0014] A substrate layer is formed on the light-emitting side of the display function layer, wherein the substrate layer includes a light-homogenizing structure, and the light-homogenizing structure includes a first inclined sidewall, and along the light-emitting direction of the sub-pixel, the first inclined sidewall is inclined in a direction away from the adjacent sub-pixel;

[0015] An anti-reflection functional layer is formed on the light-emitting side of the substrate layer. The anti-reflection functional layer includes a first refractive index pattern. The first refractive index pattern overlaps with the pixel definition structure and covers the light uniforming structure.

[0016] The display panel provided by an embodiment of the present invention includes a display function layer, including multiple sub-pixels and a pixel definition structure surrounding the sub-pixels, an anti-reflection function layer, located on the light-emitting side of the display function layer, including a first refractive index pattern, the first refractive index pattern overlapping with the pixel definition structure, a substrate layer, located between the anti-reflection function layer and the display function layer, including a uniform light structure, the uniform light structure including a first inclined side wall, along the light-emitting direction of the sub-pixel, the first inclined side wall is inclined in a direction away from the sub-pixel adjacent to it, and the first refractive index pattern covers the uniform light structure. The technical solution of the embodiment of the present invention is to arrange a substrate layer including a light-uniform structure between the display function layer and the anti-reflection function layer, so that the first refractive index pattern in the anti-reflection function layer covers the light-uniform structure, and the light-uniform structure and the light-emitting surface form a first inclined side wall, so that the exposure light incident on the first inclined side wall is scattered, so that the light incident on the photoresist is more sensitive to the bottom layer of the first refractive index pattern, thereby improving the curing degree of the first refractive index pattern in the anti-reflection function layer. When the sensitivity of the first refractive index pattern close to the bottom layer of the substrate layer becomes stronger, it can effectively avoid the occurrence of holes, undercuts, etc. at the bottom of the first refractive index pattern due to weak photosensitivity, thereby further improving the anti-reflection effect of the display panel. BRIEF DESCRIPTION OF THE DRAWINGS

[0017] Figure 1 This is a schematic structural diagram of a display panel in the prior art;

[0018] Figure 2 A schematic top view of the structure of a display panel provided by an embodiment of the present invention;

[0019] Figure 3 for Figure 2 A schematic cross-sectional view taken along the dotted line AA';

[0020] Figure 4 A schematic flow chart of a method for manufacturing a display panel provided in an embodiment of the present invention;

[0021] Figure 5 A schematic diagram of a process flow for manufacturing a display panel provided by an embodiment of the present invention;

[0022] Figure 6 A partial schematic diagram of exposure light incident on a light uniforming structure in a display panel provided by an embodiment of the present invention;

[0023] Figure 7 for Figure 3 An enlarged schematic diagram of the middle dotted box Bb;

[0024] Figure 8 A schematic structural diagram of a light uniformity structure in a display panel provided by an embodiment of the present invention;

[0025] Figure 9 A schematic structural diagram of another light uniforming structure in a display panel provided by an embodiment of the present invention;

[0026] Figure 10 A schematic structural diagram of a substrate layer in a display panel provided by an embodiment of the present invention;

[0027] Figure 11 A schematic structural diagram of a substrate layer in another display panel provided by an embodiment of the present invention;

[0028] Figure 12 A schematic diagram of the structure of a sub-pixel in a display panel provided by an embodiment of the present invention;

[0029] Figure 13 A schematic structural diagram of a display device provided by an embodiment of the present invention. DETAILED DESCRIPTION

[0030] The present invention will be further described in detail below with reference to the accompanying drawings and examples. It will be understood that the specific embodiments described herein are intended only to illustrate the present invention and are not intended to limit the present invention. It should also be noted that, for ease of description, the accompanying drawings only illustrate portions relevant to the present invention, not all structures.

[0031] It should also be noted that, for the convenience of description, the drawings only show the parts related to the present invention rather than all the contents.

[0032] An embodiment of the present invention provides a display panel, a preparation method thereof, and a display device. The display panel includes a display function layer, including multiple sub-pixels and a pixel definition structure surrounding the sub-pixels, an anti-reflection function layer located on the light-emitting side of the display function layer, including a first refractive index pattern, the first refractive index pattern overlapping with the pixel definition structure, a substrate layer located between the anti-reflection function layer and the display function layer, including a light-uniforming structure, the light-uniforming structure including a first inclined sidewall, along the light-emitting direction of the sub-pixel, the first inclined sidewall is inclined in a direction away from the sub-pixel adjacent to it, and the first refractive index pattern covers the light-uniforming structure.

[0033] The display panel provided by an embodiment of the present invention arranges a substrate layer including a light-uniforming structure between the display function layer and the anti-reflection function layer, so that the first refractive index pattern in the anti-reflection function layer covers the light-uniforming structure, and the light-uniforming structure and the light-emitting surface form a first inclined side wall, so that the exposure light incident on the first inclined side wall is scattered, so that the light incident on the photoresist is more sensitive to the bottom layer of the first refractive index pattern, thereby improving the curing degree of the bottom layer of the first refractive index pattern in the anti-reflection function layer. When the photosensitivity of the bottom layer of the first refractive index pattern becomes stronger, it can effectively avoid the occurrence of holes, undercuts, and the like at the bottom of the first refractive index pattern due to weak photosensitivity.

[0034] The above is the core concept of the present invention. The following will be combined with the accompanying drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without making any creative efforts shall fall within the scope of protection of the present invention.

[0035] Figure 1 FIG. 1 is a schematic diagram of the structure of a display panel in the prior art. Figure 1 As shown, the existing display panel film layer includes a display function layer 012 and an anti-reflection function layer 013. The anti-reflection function layer 013 is manufactured using photolithography technology. During the exposure and development process of the photolithography process, the exposure light source is incident vertically from top to bottom on the anti-reflection function layer 013. The light incident on the bottom of the anti-reflection function layer 013 is less sensitive. During the display panel manufacturing process, the anti-reflection function layer 013 is usually manufactured using a negative photoresist material. Such negative photoresist materials have a poor curing effect. When the photolithography technology is used for exposure and development, the bottom of the non-exposed area with a poor curing effect is also easily washed away, resulting in the appearance of the following at the bottom of the anti-reflection function layer 013: Figure 1 The undercut phenomenon shown (such as Figure 1 (as shown in the dotted box Cc).

[0036] Based on the above problems existing in the prior art, this embodiment provides a display panel that can effectively solve the undercutting, holes, pattern edge warping and other phenomena caused by the low sensitivity of the bottom of the anti-reflection functional layer, thereby further improving the anti-reflection effect of the display panel.

[0037] Figure 2 The diagram is a top view of a structure of a display panel provided by an embodiment of the present invention. Figure 3 for Figure 2 Schematic diagram of the cross section formed by cutting along the dotted line AA'. Figure 2 and Figure 3 The display panel 10 includes a display function layer 12, including multiple sub-pixels 120 and a pixel definition structure 122 surrounding the sub-pixels 120, an anti-reflection function layer 13, located on the light-emitting side of the display function layer 12, including a first refractive index pattern 131, the first refractive index pattern 131 overlaps with the pixel definition structure 122, a substrate layer 14, located between the anti-reflection function layer 13 and the display function layer 12, including a light uniforming structure 141, the light uniforming structure 141 includes a first inclined side wall Aa, along the light-emitting direction of the sub-pixel 120, the first inclined side wall Aa is inclined in a direction away from the sub-pixel 120 adjacent to it, and the first refractive index pattern 131 covers the light uniforming structure 141.

[0038] The pixel definition structure 122 is used to define the luminous area, which helps to improve color mixing. In this embodiment, the anti-reflection layer 13 is used to improve light transmittance and enhance display efficiency. The first refractive index pattern 131 in the anti-reflection layer 13 is formed by exposure and development through a photolithography process. Because the exposure light source is incident on the display panel from top to bottom, the light sensitivity at the surface of the first refractive index pattern 131 in the anti-reflection layer is stronger, while the light sensitivity at the bottom is weaker. Therefore, the bottom of the first refractive index pattern 131 obtained after photolithography has a lower degree of curing. This lower degree of curing can further lead to undercuts or holes at the bottom of the first refractive index pattern 131 in the anti-reflection layer 13 near the substrate layer 14. To avoid such problems, in this embodiment of the present invention, multiple light homogenization structures 141 are designed on the substrate layer 14 designed between the anti-reflection layer 13 and the display layer 12. Each light homogenization structure 141 is arranged near the bottom of each first refractive index pattern 131 in the display layer 12, and each light homogenization structure 141 is covered by each first refractive index pattern 131. The principle of how the light homogenizing structure 141 improves the solidification degree of the bottom of the first refractive index pattern 131 is explained in detail below.

[0039] First, since the first refractive index pattern 131 is made by photolithography technology after exposure and development, it is a convex structure in the anti-reflection functional layer 13. When each first refractive index pattern 131 covers each light uniforming structure 141, this type of light uniforming structure 141 is also a convex structure on the substrate layer. Figure 3As shown in the cross-sectional view, the first refractive index pattern 131 formed after exposure and development using photolithography techniques has a regular trapezoidal structure with a narrow upper surface and a wider lower surface. Each light homogenizing structure 141 is enclosed within the corresponding first refractive index pattern 131 and also has a regular trapezoidal structure with a narrow upper surface and a wider lower surface. In other embodiments, the shape of the first refractive index pattern 131 can also be other, determined by those skilled in the art in the art in the pattern design before photolithography, and is not limited here.

[0040] Reference Figure 3 As shown in the cross-sectional view, each light homogenizing structure 141 is an upwardly protruding regular trapezoidal structure on the substrate layer 14. Therefore, a first inclined sidewall Aa forms an angle of less than 90° with the surface of the substrate layer 14 facing away from the display function layer 12. In this embodiment, when exposure and development are performed using photolithography technology, each light homogenizing structure 141 in the substrate layer 14 is located in the exposure area. Therefore, when exposure light strikes the first inclined sidewall Aa of the light homogenizing structure 141, a large amount of exposure light is scattered on the first inclined sidewall Aa, causing the incident light of the photoresist to be more sensitive to the bottom layer of the first refractive index pattern 131, thereby improving the degree of curing of the bottom layer of the first refractive index pattern 131 in the anti-reflection functional layer 13. When the first refractive index pattern 131 is more sensitive to the bottom layer near the substrate layer 14, the formation of holes, undercuts, and other phenomena at the bottom of the first refractive index pattern 131 caused by weaker sensitivity can be effectively avoided.

[0041] After describing the structure of the display panel provided by this embodiment, the specific process of manufacturing the display panel of this embodiment is explained next.

[0042] Figure 4 A schematic diagram of a method for manufacturing a display panel according to an embodiment of the present invention is provided. Figure 4 As shown, the method specifically includes the following steps:

[0043] S110 , forming a display function layer, where the display function layer includes a plurality of sub-pixels and a pixel definition structure surrounding the sub-pixels.

[0044] S120 , forming a substrate layer on the light-emitting side of the display functional layer, wherein the substrate layer includes a light-uniform structure, and the light-uniform structure includes a first inclined sidewall, which is inclined in a direction away from an adjacent sub-pixel along the light-emitting direction of the sub-pixel.

[0045] S130 , forming an anti-reflection functional layer on the light-emitting side of the substrate layer, wherein the anti-reflection functional layer includes a first refractive index pattern, the first refractive index pattern overlaps with the pixel definition structure, and the first refractive index pattern covers the light uniforming structure.

[0046] The following describes in detail the method for manufacturing the display panel provided in this embodiment from the perspective of process manufacturing.

[0047] Figure 5 A schematic diagram of a process flow for preparing a display panel according to an embodiment of the present invention. Figure 4 , the process preparation method specifically includes the following steps:

[0048] Reference Figure 5 In FIG. a), an array substrate 11 is provided.

[0049] Reference Figure 5 In FIG b), a display function layer 12 is formed on the array substrate 11 , and the display function layer 12 includes a plurality of sub-pixels 120 and a pixel definition structure 122 surrounding the sub-pixels 120 .

[0050] The method for forming the display function layer 12 on the array substrate 11 may adopt common technical means used by those skilled in the art, which is not limited here.

[0051] Reference Figure 5 In Figure c), a substrate layer 14 is formed on the light-emitting side of the display functional layer 12, and the substrate layer 14 includes a light-uniform structure 141. The light-uniform structure 141 includes a first inclined sidewall. Along the light-emitting direction of the sub-pixel 120, the first inclined sidewall is inclined in a direction away from the adjacent sub-pixel 120.

[0052] For example, in this embodiment, a layer of material can be deposited on the light-emitting layer of the display functional layer using a deposition method to form a substrate layer. The light-homogenizing structure on the substrate layer can be designed as an integral molding, or after the substrate layer is deposited, a structure made of the same material as the substrate layer can be patterned on the substrate layer using photolithography technology to form the light-homogenizing structure.

[0053] It should be noted that those skilled in the art may also use other graphic processes such as nanoimprinting to pattern the photoresist, which is not limited in this embodiment.

[0054] It should also be noted that if the second insulating layer and the second electrode layer in the touch function layer are directly reused as the substrate layer as provided in the above embodiment, the process of separately preparing the substrate layer can be omitted.

[0055] Reference Figure 5 d), an anti-reflection functional layer 13 is formed on the light-emitting side of the substrate layer 14, and the anti-reflection functional layer 13 includes a low-fold layer 130 close to the substrate layer.

[0056] Similarly, referring to the above process steps for forming the substrate layer, a low-fold layer 130 is formed on the substrate layer 12 to improve light transmittance.

[0057] Next, refer to Figure 5 Figure e) is exposed using a photolithography process.

[0058] Specifically, in this embodiment, the film layer where the low-fold layer 130 is located is used as a negative photoresist, and the thickness of the photoresist can be adjusted by spin coating or spray coating. Next, the low-fold layer 130 is exposed using photolithography technology, wherein the exposure light source is incident on the opening area of ​​the mask 15.

[0059] Reference Figure 5 In FIG. f), a wet etching process may be used for pattern transfer to clean the low-fold layer 130 with the photoresist mask to obtain a first refractive index pattern 131 periodically arranged in the low-fold layer 1311.

[0060] It should be noted that the photoresist used in this embodiment is a negative photoresist, typically a light-sensitive liquid mixture composed of three main components: a photosensitive resin, a sensitizer, and a solvent. When the photosensitive resin is exposed to light, a photocuring reaction rapidly occurs in the exposed areas, significantly changing the material's physical properties. After treatment with an appropriate solvent, the soluble portion is dissolved to produce the desired pattern, i.e., the first refractive index pattern obtained in this embodiment. Negative photoresist materials have a poor curing effect. During exposure and development using photolithographic techniques, the bottom portion of the non-exposed areas, where the curing effect is poor, is easily washed away.

[0061] Optionally, continue with reference to Figure 3 , the included angle γ between the first inclined side wall Aa and the light emitting surface is ≥45°.

[0062] As described above, the first inclined sidewall Aa can be understood as forming an angle less than 90° with the surface of the substrate layer 14 facing away from the display function layer 12. This angle, represented by γ, is the angle between the first inclined sidewall Aa and the light-emitting surface. To solidify the bottom layer of the first refractive index pattern 131, incident light is reflected by the first inclined sidewall Aa, and the direction of the reflected light must be maintained to illuminate the bottom of the first refractive index pattern 131 as much as possible. Figure 6 This is a partial schematic diagram of the exposure light incident on the uniform light structure in a display panel provided by an embodiment of the present invention. Figure 6 After light is incident on the first inclined sidewall Aa, the light path reflected to the bottom of the first refractive index pattern 131 is shown by the arrows. 2θ ≥ 90°, that is, θ ≥ 45°. On this basis, setting the included angle γ between the first inclined sidewall Aa and the light-emitting surface to ≥ 45° effectively prevents undercutting at the bottom of the first refractive index pattern within a controllable range.

[0063] Optionally, continue with reference to Figure 6 In the light emitting direction, the height H of the light homogenizing structure 141 is ≥ 0.5 μm.

[0064] Reference Figure 3Since the light homogenizing structure 141 is enclosed within the first refractive index pattern 131, it is mainly used to scatter the exposure light when it is incident, thereby increasing the photosensitivity of the bottom of the first refractive index pattern 131. If the height of the light homogenizing structure 141 is less than 0.5μm, the light adhesion area of ​​the first inclined side wall Aa of the light homogenizing structure 141 is reduced. When the light is incident on the first inclined side wall Aa, the exposure light is less scattered, and the problem of weak photosensitivity at the bottom of the first refractive index pattern 131 cannot be improved. Based on the angle γ between the first inclined side wall Aa and the light output surface in the above embodiment being ≥45°, when the height H of the light homogenizing structure 141 is determined to be greater than or equal to 0.5μm, the light adhesion area on the first inclined side wall Aa of the light homogenizing structure 141 is too large, and the number of exposure lights scattered on the first inclined side wall Aa increases, thereby increasing the photosensitivity intensity reflected to the bottom of the first refractive index pattern 131 and increasing the degree of curing of the bottom of the first refractive index pattern 131.

[0065] The display panel provided in this embodiment includes a display function layer, including multiple sub-pixels and a pixel definition structure surrounding the sub-pixels, an anti-reflection function layer, located on the light-emitting side of the display function layer, including a first refractive index pattern, the first refractive index pattern overlapping with the pixel definition structure, a substrate layer, located between the anti-reflection function layer and the display function layer, including a uniform light structure, the uniform light structure including a first inclined side wall, along the light-emitting direction of the sub-pixel, the first inclined side wall is inclined in a direction away from the sub-pixel adjacent to it, and the first refractive index pattern covers the uniform light structure. The technical solution of this embodiment is to arrange a substrate layer including a light-uniform structure between the display function layer and the anti-reflection function layer, so that the first refractive index pattern in the anti-reflection function layer covers the light-uniform structure, and the light-uniform structure and the light-emitting surface form a first inclined side wall, so that the exposure light incident on the first inclined side wall is scattered, so that the light incident on the photoresist is more sensitive to the bottom layer of the first refractive index pattern, thereby improving the curing degree of the bottom layer of the first refractive index pattern in the anti-reflection function layer. When the photosensitivity of the bottom layer of the first refractive index pattern close to the substrate layer becomes stronger, it can effectively avoid the occurrence of holes, undercuts, and the like at the bottom of the first refractive index pattern due to weak photosensitivity.

[0066] Optionally, the light uniformity structure may be arranged around the sub-pixel, or may be discretely arranged around the sub-pixel.

[0067] Optionally, the material of the first refractive index pattern is a negative photoresist material.

[0068] Negative photoresist is an organic solution containing a photosensitive compound and a cyclized rubber resin. Exposure to light produces a bridging reaction, which, after overlaying and hardening, becomes insoluble in a developer. This difference in solubility between the exposed and unexposed areas can be exploited to create a pattern. When exposed and developed using photolithography, negative photoresist exhibits high chemical stability, sensitivity, and resistance to wet etching.

[0069] In this embodiment, when exposure and development are performed using photolithography technology, there are exposed areas and non-exposed areas. By utilizing the excellent properties of the negative photoresist material as described above, a first refractive index pattern can be easily obtained after pattern design and exposure and development, and the formation and size of the first refractive index pattern can be easily controlled.

[0070] Continue to refer to Figure 3 The first refractive index pattern 131 includes a second inclined sidewall Ab, and along the light emitting direction of the sub-pixel 120 , the second inclined sidewall Ab is inclined in a direction away from the adjacent sub-pixel 120 .

[0071] As described above, the first refractive index pattern 131 is a raised trapezoidal structure, which covers the light-uniform structure 141. Therefore, the second inclined side wall Ab of the first refractive index pattern 131 and the first inclined side wall Aa of the light-uniform structure 141 are oriented in the same direction, both of which are inclined away from the adjacent sub-pixel 120, so as to facilitate scattering of exposure light incident on the side wall.

[0072] It should be noted that the included angle between the second inclined side wall Ab in this embodiment and the light emitting surface is different from that between the first inclined side wall Aa in the above embodiment.

[0073] In this embodiment, referring to Figure 3The angle between the second inclined side wall Ab of the first refractive index pattern 131 and the light emitting surface is represented by δ. The larger the angle γ between the first inclined side wall Aa of the light uniforming structure 141 and the light emitting surface, the larger the angle δ between the second inclined side wall Ab of the first refractive index pattern 131 and the light emitting surface. For example, when manufacturing the display panel in this embodiment, when the angle γ between the first inclined side wall Aa and the light emitting surface is set to 45°, the angle δ between the second inclined side wall Ab and the light emitting surface is 70°; when the angle γ between the first inclined side wall Aa and the light emitting surface is set to 50°, the angle δ between the second inclined side wall Ab and the light emitting surface is 73°; when the angle γ between the first inclined side wall Aa and the light emitting surface is set to 55°, the angle δ between the second inclined side wall Ab and the light emitting surface is 75°; when the angle γ between the first inclined side wall Aa and the light emitting surface is set to 60°, the angle δ between the second inclined side wall Ab and the light emitting surface is 78°. By setting different angles, the length of the scattering path of the exposure light after it is incident on the inclined side wall can be effectively controlled, thereby enhancing the photosensitivity of the light incident on the photoresist at the bottom layer of the first refractive index pattern 131, and further improving the degree of curing of the bottom layer of the first refractive index pattern 131 in the anti-reflection functional layer 13 and the surface of the substrate layer 14 away from the display functional layer 12.

[0074] Figure 7 for Figure 3 The enlarged schematic diagram of the dotted box Bb in the figure. Figure 7 As shown, in the direction parallel to the light emitting surface, in the first inclined side wall Aa and the second inclined side wall Ab adjacent to the same sub-pixel 120, the distance between the first inclined side wall Aa and the first sub-pixel 120 is a first distance L1, and the distance between the second inclined side wall Ab and the sub-pixel 120 is a second distance L2, and the difference between the first distance L2 and the second distance L1 is 2-3 μm.

[0075] The first refractive index pattern 131 overlaps with the pixel definition structure 122 , and one sub-pixel 120 is located in the opening of the pixel definition structure 122 , which can effectively avoid the color mixing phenomenon.

[0076] like Figure 7 As shown, the opening of the first refractive index pattern 131 is larger than the opening of the pixel definition structure 122. In other embodiments, the opening of the first refractive index pattern can be smaller than the opening of the pixel definition structure, that is, the first refractive index pattern and the sub-pixel have an overlapping portion.

[0077] Reference Figure 7The distance between the first inclined side wall Aa of the uniform light structure 141 and the extension direction of the sub-pixel 120 in the figure is L1, and the distance between the second inclined side wall Ab of the first refractive index pattern 131 and the extension direction of the sub-pixel 120 in the figure is L2. In order to effectively control the scattering of the exposure light after it is incident on the inclined side wall, the light hitting the first refractive index pattern 131 can effectively reach its bottom, so that the bottom of the first refractive index pattern 131 also has a strong sensitivity, thereby increasing the curing degree of the anti-reflection functional layer. When the difference between the first distance L1 and the second distance L2 is less than 2μm, the exposure light is reflected farther after being incident on the inclined side wall. When the difference between the first distance L1 and the second distance L2 is greater than 3μm, the light reflected after the exposure light is incident on the inclined side wall cannot reach the bottom due to the long distance, which will cause holes to easily appear in the bottom layer of the first refractive index pattern 131.

[0078] Optionally, continue with reference to Figure 3 The antireflection functional layer further includes a second refractive index layer 132 , which is located on a side of the first refractive index pattern 131 away from the display functional layer 12 , and has a refractive index greater than that of the first refractive index pattern 131 .

[0079] The anti-reflection functional layer 13 in this embodiment is used to increase the transmittance of light. On the basis of forming the first refractive index pattern 131 using photolithography technology, the addition of the second refractive index layer 132 is beneficial to further guide the emission of light, avoiding the light from being directly reflected and sealed in the film layer when it reaches the higher refractive index, thereby achieving the anti-reflection effect.

[0080] Figure 8 A schematic structural diagram of a light uniforming structure in a display panel provided by an embodiment of the present invention. Figure 9 This is a structural diagram of another light uniforming structure in a display panel provided by an embodiment of the present invention. Figure 8 The light uniforming structure is a first protruding structure 142, referring to Figure 9 The light uniforming structure is a concave structure 143 .

[0081] Reference Figure 8 The first protruding structure 142 is formed on the inner side of the edge of the exposure area 151. When the exposure light is incident, a sudden change of light occurs between the exposure area 151 and the non-exposure area 152. Therefore, it is necessary to form the first protruding structure 142 on the substrate layer 14 to scatter the light as much as possible, disperse the bottom light sensitivity, improve the light curing degree of the bottom of the first refractive index pattern 131, and avoid the occurrence of holes, undercuts, etc. at the bottom of the first refractive index pattern 131.

[0082] In this embodiment, the specific formation method of the first protrusion structure 142 can be referred to the formation method of the light-uniforming structure in the above-mentioned embodiment, which is a regular trapezoidal protrusion. When exposure light is incident, the light strikes the first protrusion structure 142 formed on the substrate layer 14. Due to the raised characteristics of the protrusion structure itself, the incident exposure light is scattered at multiple angles along the surface of the first protrusion structure 142. This disperses the scattered light at the bottom, increases the sensitivity at the bottom, and further improves the curing degree of the anti-reflection functional layer.

[0083] In addition, when the light uniforming structure is the first protruding structure 142, Figure 8 The arrow in the middle represents the light path diagram of the light, observe Figure 8 It can be found that part of the light that originally underwent total reflection can be emitted, further improving the lighting effect.

[0084] Reference Figure 9 The recessed structure 143 is also formed at the boundary of the exposure area 151. When the exposure light is incident, the exposure light reaches the recessed structure 143 formed on the substrate layer 14, causing the incident exposure light to be scattered at multiple angles along the surface of the recessed structure 143. This can also disperse the scattered light at the bottom, thereby increasing the sensitivity of the bottom and thereby increasing the curing degree of the anti-reflection functional layer.

[0085] Due to the scattering of exposure light, the incident light has a higher sensitivity at the bottom layer of the anti-reflection functional layer 13. Therefore, when the light uniforming structure is concave on the substrate layer 14, the degree of curing of the anti-reflection functional layer 13 on the substrate layer 14 can still be guaranteed, and the volume shrinkage will not affect the overall bottom of the anti-reflection functional layer and cause holes, undercuts, etc.

[0086] Optionally, the substrate layer includes a second convex structure, the second convex structure includes a portion overlapping with the sub-pixel, and the second convex structure includes a first inclined sidewall.

[0087] The second protrusion structure in this embodiment can refer to the protrusion-shaped light uniforming structure 141 in the above embodiment. The second protrusion structure is larger in volume than the first protrusion structure in the above embodiment. The second protrusion structure in this embodiment can refer to Figure 3 , I will not go into details here.

[0088] In addition, it should be noted that Figure 3 , when the substrate layer includes a second protruding structure in a protruding shape, Figure 3 The arrow in the middle represents the light path diagram of the light, observe Figure 3 It can be found that the vertically emitted light is emitted directly, and the light with a larger inclination angle is transmitted through the substrate layer 14, the first refractive index pattern 131 and the second refractive index layer 132 in sequence. Among them, the first refractive index pattern 131 and the second refractive index layer 132 are used to increase the transmittance of light, thereby achieving the effect of improving the light effect.

[0089] Optionally, Figure 10 This is a schematic structural diagram of a substrate layer in a display panel provided by an embodiment of the present invention. Figure 10 The substrate layer includes a touch function layer 17, which is located between the display function layer 12 and the anti-reflection function layer 13. The touch function layer 17 includes a first electrode layer 171, a first insulating layer 172, a second electrode layer 173 and a second insulating layer 174 stacked in sequence along the light output direction. The second insulating layer 174 is reused as the substrate layer.

[0090] Specifically, the first insulating layer 172 insulates the first electrode layer 171 from the second electrode layer 173 to prevent leakage. When the second insulating layer 174 is directly reused as the substrate layer, the original substrate layer preparation process is reduced, and the overall thickness of the display panel is reduced.

[0091] In addition, since the substrate layer is located between the display function layer 12 and the anti-reflection function layer 13, the metal electrode layer is used as a light uniforming structure, which can greatly improve the reflection of light. Figure 11 This is a schematic structural diagram of a substrate layer in another display panel provided by an embodiment of the present invention. Figure 11 The touch function layer 17 is also located between the display function layer 12 and the anti-reflection function layer 13, and includes a first electrode layer 171, a first insulating layer 172, and a second electrode layer 173 stacked in sequence along the light output direction. The second electrode layer 173 includes a second electrode 1731. The second electrode layer 173 is reused as the substrate layer 14 in the above embodiment, and the second electrode 1731 is reused as the light uniforming structure 141 in the above embodiment.

[0092] Similarly, in this embodiment, no additional substrate layer is required. Based on the original touch function layer 17 , the second electrode layer 173 is reused as the substrate layer, which also reduces the steps of manufacturing the substrate layer and further reduces the manufacturing cost.

[0093] Figure 12 Schematic diagram of the structure of a sub-pixel in a display panel provided by an embodiment of the present invention. Figure 12 As shown, the sub-pixel 120 includes a first sub-pixel 121 and a second sub-pixel 122. The first sub-pixel 121 and the second sub-pixel 122 have the same color. The first sub-pixel 121 and the second sub-pixel 122 are arranged alternately. The angle between the first inclined side wall Aa adjacent to the first sub-pixel 121 and the light-emitting surface is a first angle α1. The angle between the first inclined side wall Aa adjacent to the second sub-pixel 122 and the light-emitting surface is a second angle α2, and α2>α1.

[0094] For example, in this embodiment, the first sub-pixel 121 and the second sub-pixel 122 are red sub-pixels that emit red light, and are marked as the first red sub-pixel 121 and the second red sub-pixel 121 .

[0095] Optionally, refer to Figure 12 The sub-pixel 120 also includes a first color sub-pixel 1201 and a second color sub-pixel 1202. The colors of the first color sub-pixel 1201 and the second color sub-pixel 1202 are different. The first color sub-pixel 1201 includes a first sub-pixel 121 and a second sub-pixel 122. The angle between the first inclined side wall Aa adjacent to the second color sub-pixel 1202 and the light emitting surface is an angle β, α1<β≤α2.

[0096] For example, in this embodiment, description is made by taking the first color sub-pixel 1201 as a red sub-pixel emitting red light and the second color sub-pixel 1202 as a green sub-pixel emitting green light as an example.

[0097] In this embodiment, the first angle α1 = 70° and the second angle α2 = 75° are used as examples for illustration. During the manufacturing process of the display panel, there may be process errors when the sub-pixels 120 are formed, which causes the angle between the first inclined side wall Aa of the first red sub-pixel 121 and the light-emitting surface to deviate from the angle between the first inclined side wall Aa of the second red sub-pixel 122 and the light-emitting surface. This deviation will directly affect the light emission of the light-emitting element, and in severe cases, color deviation will occur. In this embodiment, by arranging alternating sub-pixels of the same color with different angles to the light-emitting surface, the color deviation caused by process errors of different light-emitting elements can be balanced, and the color deviation fluctuation can be further improved.

[0098] Figure 13 This is a schematic diagram of the structure of a display device provided by an embodiment of the present invention. Figure 13 The display device 100 includes the display panel 10 provided by any of the above embodiments.

[0099] Since the display device 100 provided in this embodiment includes the display panel 10 provided in any of the above embodiments, it has the same or corresponding beneficial effects as the display panel 10 and will not be described in detail here.

[0100] Optionally, after forming the display function layer and before forming the anti-reflection function layer, a touch function layer is formed on the light-emitting side of the display function layer. The touch function layer includes a first electrode layer, a first insulating layer, a second electrode layer and a second insulating layer stacked in sequence along the light-emitting direction, and the second insulating layer is reused as a substrate layer.

[0101] There is another situation in which a touch function layer is formed on the light-emitting side of the display function layer, where the touch function layer includes a first electrode layer, a first insulating layer, and a second electrode layer stacked in sequence along the light-emitting direction, the second electrode layer includes a second electrode, the second electrode layer is reused as the substrate layer, and the second electrode is reused as a uniform light structure.

[0102] The method for preparing the touch function layer is well known to those skilled in the art and will not be described in detail here.

[0103] Note that the above are only preferred embodiments of the present invention and the technical principles employed. Those skilled in the art will appreciate that the present invention is not limited to the specific embodiments described herein, and that various obvious changes, readjustments, combinations, and substitutions are possible for those skilled in the art without departing from the scope of the present invention. Therefore, although the present invention has been described in detail through the above embodiments, the present invention is not limited to the above embodiments and may include many other equivalent embodiments without departing from the scope of the present invention. The scope of the present invention is determined by the scope of the appended claims.

Claims

1. A display panel, characterized in that: include: A display function layer including a plurality of sub-pixels and a pixel definition structure surrounding the sub-pixels; an anti-reflection functional layer, located on the light-emitting side of the display functional layer, comprising a first refractive index pattern, the first refractive index pattern overlapping the pixel definition structure; a touch functional layer, located between the display functional layer and the anti-reflection functional layer, comprising a first electrode layer, a first insulating layer, a second electrode layer, and a second insulating layer stacked in sequence along the light-emitting direction, the second insulating layer comprising a light-uniforming structure; or A touch function layer is located between the display function layer and the antireflection function layer, and includes a first electrode layer, a first insulating layer, and a second electrode layer stacked in sequence along the light output direction, wherein the second electrode layer includes a second electrode, and the second electrode is multiplexed into a light uniforming structure; The light uniforming structure includes a first inclined sidewall, and along the light emitting direction of the sub-pixel, the first inclined sidewall is inclined in a direction away from the adjacent sub-pixel; The first refractive index pattern covers the light uniforming structure; The material of the first refractive index pattern is a negative photoresist material.

2. The display panel according to claim 1, wherein: The first refractive index pattern includes a second inclined sidewall, and along the light emitting direction of the sub-pixel, the second inclined sidewall is inclined in a direction away from the sub-pixel adjacent thereto.

3. The display panel according to claim 2, wherein: An included angle between the first inclined side wall and the light emitting surface is different from an included angle between the second inclined side wall and the light emitting surface.

4. The display panel according to claim 1, wherein: The anti-reflection functional layer further includes a second refractive index layer, which is located on a side of the first refractive index pattern away from the display functional layer, and has a refractive index greater than that of the first refractive index pattern.

5. The display panel according to claim 1, wherein: The light uniforming structure is a first convex structure or a concave structure.

6. The display panel according to claim 1, wherein: The sub-pixels include a first sub-pixel and a second sub-pixel, the first sub-pixel and the second sub-pixel have the same color, and the first sub-pixel and the second sub-pixel are alternately arranged; The included angle between the first inclined sidewall adjacent to the first subpixel and the light emitting surface is a first included angle α1, and the included angle between the first inclined sidewall adjacent to the second subpixel and the light emitting surface is a second included angle α2, where α2>α1.

7. The display panel according to claim 6, wherein: The sub-pixels further include a first color sub-pixel and a second color sub-pixel, the first color sub-pixel and the second color sub-pixel have different colors, and the first color sub-pixel includes the first sub-pixel and the second sub-pixel; An included angle between the first inclined sidewall adjacent to the second color sub-pixel and the light emitting surface is an included angle β, where α1<β≤α2.

8. The display panel according to claim 2, wherein: In the direction parallel to the light emitting surface, among the first inclined side wall and the second inclined side wall adjacent to the same sub-pixel, the distance between the first inclined side wall and the sub-pixel is a first distance L1, and the distance between the second inclined side wall and the sub-pixel is a second distance L2, and the difference between the first distance L2 and the second distance L1 is 2-3 μm.

9. The display panel according to claim 1, wherein: An included angle γ between the first inclined side wall and the light emitting surface is ≥45°.

10. The display panel according to claim 1, wherein In the light emitting direction, the height H of the light uniforming structure is ≥ 0.5 μm.

11. A display device, characterized in that: The display panel comprises the display panel according to any one of claims 1 to 10.

12. A method for preparing a display panel, characterized in that: include: forming a display function layer, the display function layer including a plurality of sub-pixels and a pixel definition structure surrounding the sub-pixels; A touch function layer is formed on the light-emitting side of the display function layer, wherein the touch function layer includes a first electrode layer, a first insulating layer, a second electrode layer, a second insulating layer, and a second insulating layer sequentially stacked along the light-emitting direction, wherein the second insulating layer includes a light-uniformity structure; Alternatively, a touch function layer is formed on the light-emitting side of the display function layer, the touch function layer comprising a first electrode layer, a first insulating layer, and a second electrode layer sequentially stacked along the light-emitting direction, the second electrode layer comprising a second electrode, and the second electrode is multiplexed into a light-uniform structure; The light uniforming structure includes a first inclined sidewall, and along the light emitting direction of the sub-pixel, the first inclined sidewall is inclined in a direction away from the adjacent sub-pixel; forming an anti-reflection functional layer on the touch functional layer, wherein the anti-reflection functional layer includes a first refractive index pattern, and the first refractive index pattern overlaps with the pixel definition structure; The first refractive index pattern covers the light uniforming structure; and the material of the first refractive index pattern is a negative photoresist material.

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