A multi-parameter tuned holographic printing lithography system

Abstract

The application discloses a kind of holographic printing lithography systems of multi-parameter tuning, comprising: illumination subsystem, for emitting light;Illumination subsystem is connected with display and imaging subsystem, for forming light spot;Display and imaging subsystem are connected with motion subsystem and control subsystem, for adjusting parameter;Combining the advantages of computer hologram printing technology and holographic stereogram printing technology, the production of complex wavefront modulation capability can be realized The holographic device can adjust the included angle of reference light and object light, can adjust the illumination mode of reference light, adapt to the application requirements of non-collimated complex illumination light field during reproduction.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of holographic functional devices, and in particular to a multi-parameter tuning holographic printing lithography system. BACKGROUND

[0002] Holographic functional devices have a wide range of applications in 3D display, augmented reality and virtual reality, transparent projection and other new display fields. Holographic functional devices are flexible in design, rich in function, small in size and light in weight, and are therefore highly favored. However, how to manufacture large-area and high-performance holographic functional devices is still a difficult problem in the field. Current manufacturing technologies include holographic exposure technology and holographic printing technology. The holographic exposure technology scheme is simple and easy to operate, but it can only produce simple holographic functional devices such as gratings and lenses, and it needs a stable optical platform and other laboratory environment to support, making it difficult to produce complex large-area functional devices. Holographic printing technology includes holographic stereogram printing technology, computer hologram printing technology and wavefront printing technology. Holographic stereogram printing technology, such as the systems disclosed in US6330088, US7505186, US7800803 and Chinese patent CN201711499714.1, can only record the direction and intensity information of light due to the principle limitation, and cannot produce holographic devices with complex wavefront information. Computer hologram printing technology, such as the system disclosed in Chinese patent application CN200710068553.0, can theoretically realize holographic devices with complex wavefront modulation, but this technology can only produce thin transmissive holographic devices and cannot realize the production of volume holographic devices. Moreover, the diffraction efficiency is limited. Wavefront printing technology, such as the system disclosed in Chinese patent application 202111480688.4, combines the advantages of computer hologram printing technology and holographic stereogram printing technology, and can realize the production of volume holographic devices with complex wavefront modulation. However, the existing wavefront printing technology system has fixed reference light and object light angles, which is difficult to modulate, and the reference light illumination mode is fixed, which cannot adapt to the application requirements of non-collimated complex illumination light field in reproduction. SUMMARY

[0003] In order to solve the problem of fixed reference light and object light angles in the printing technology system, which is difficult to modulate, and the fixed reference light illumination mode, which cannot adapt to the application requirements of non-collimated complex illumination light field in reproduction, the present application provides a multi-parameter tuning holographic printing lithography system, which can realize real-time modulation of any reference light illumination mode and any reference light angle of the holographic printing lithography system.

[0004] In order to achieve the above purpose, the present application provides the following technical scheme:

[0005] A kind of multi-parameter tuned holographic printing lithography system, comprising: illumination subsystem for emitting light;Illumination subsystem is connected with display and imaging subsystem, for forming light spot;Display and imaging subsystem is connected with motion subsystem and control subsystem, for adjusting parameter.Illumination subsystem includes laser light source, beam expander collimating device, light splitting device.Can realize the real-time modulation of any reference light illumination mode and any parameter of holographic printing lithography system Light angle.

[0006] As preferred, display and imaging subsystem includes: reference light forming optical path, reference light forming optical path includes optical 4f system;Object light forming optical path includes beam combining prism;Reference light forming optical path and object light forming optical path form a set of double-channel coaxial Fourier transform optical path through beam combining prism.Reference light forming optical path at least includes scanning galvanometer, scanning galvanometer is connected with scanning lens, scanning lens is connected with Fourier transform lens, scanning lens and Fourier transform lens constitute 4f system.Scanning galvanometer is located on the input face of scanning lens.Object light forming optical path at least includes beam combining prism, beam combining prism is connected with spatial light modulator, spatial light modulator is connected with Fourier transform lens.Spatial light modulator is located on the input face of Fourier transform lens.Reference light and object light path form a set of double-channel coaxial Fourier transform optical path through beam combining prism.Reference light and object light coincide on the output face of Fourier transform lens.

[0007] As preferred, motion subsystem includes: motor, connected with reference light path, for emitting vibration;Translation stage, connected with display and imaging subsystem, for changing imaging position.Can adjust the angle parameter change of scanning galvanometer (theta, Phi) two dimensions, the position parameter change of two-dimensional precision translation stage (x, y) two dimensions.

[0008] As preferred, control subsystem is connected with illumination subsystem, display and imaging subsystem and motion subsystem respectively, including switch, connected to illumination subsystem, for controlling light source;Control module, connected with display and imaging subsystem, for outputting image information;Controller, connected with motion subsystem, for controlling motion subsystem to move.Can coordinate control the switch of laser light source, the image output of spatial light modulator and vibration motor, the movement of two-dimensional precision translation stage and other motion subsystem.

[0009] As preferred, display and imaging subsystem further includes microimaging optical path, microimaging optical path includes autofocusing optical path and real-time detection optical path.

[0010] As preferred, microimaging optical path includes micro-lens group, micro-lens group is connected with reference light forming optical path, object light forming optical path and motion subsystem.Can microimaging on the output face of Fourier transform lens.

[0011] As preferred, the automatic focusing light path comprises an automatic focusing system, the automatic focusing system is connected with the control subsystem, the automatic focusing system is connected with a dichroic mirror, the dichroic mirror is connected with the reference light forming light path and the object light forming light path. The image surface formed by the micro-lens group can be clearly focused on the receiving surface.

[0012] As preferred, the real-time detection light path comprises a real-time detection system, the real-time detection system is connected with the control subsystem and the automatic focusing system. The imaging result can be monitored in real time.

[0013] The present application has the following advantages:

[0014] The advantages of the printing technology of the computer hologram and the printing technology of the holographic stereogram are combined, the manufacture of the volume holographic device with the complex wavefront modulation capacity can be realized, the included angle of the reference light and the object light can be adjusted in real time, the illumination mode of the reference light can be adjusted, and the application requirement of the non-collimated complex illumination light field in the reproduction can be met. BRIEF DESCRIPTION OF DRAWINGS

[0015] In order to more clearly illustrate the technical solutions of the present application or the prior art, the following will briefly introduce the drawings needed to be used in the embodiments or the prior art description. Obviously, the drawings in the following description are only exemplary, and for those skilled in the art, other drawings can be obtained without creative labor on the basis of the provided drawings.

[0016] Figure 1 is the first embodiment schematic diagram of the present application.

[0017] Figure 2 is the second embodiment schematic diagram of the present application.

[0018] Figure 3 is the third embodiment schematic diagram of the present application.

[0019] Figure 4 is the fourth embodiment schematic diagram of the present application.

[0020] In the drawings:

[0021] 1-Nanosecond pulsed laser; 2-Beam expander; 3-Collimating lens; 4-Beam splitter; 5-Reflector; 6-Reference aperture; 7-MEMS galvanometer; 8-Scanning lens; 9-Beam combiner; 10-Pure phase spatial light modulator; 11-Fourier transform lens; 12-Two-dimensional translation stage; 13-Control system; 14-Galvanometer drive device; 15-Photosensitive material; 16-Reference light spot; 17-Object light spot; 18-Field stop; 19-Miniature lens group; 20-Picosecond pulsed laser; 21-First dichroic mirror; 22-Second dichroic mirror; 23-Autofocusing system; 24-Autofocusing system driver; 25-Real-time monitoring system; 26-Continuous laser; 27-Transmission amplitude-type spatial light modulator; 28-Reflective digital micromirror device spatial light modulator; 29-Galvanometer galvanometer; 30-Galvanometer drive device; 31-Femtosecond pulsed laser. Detailed Implementation

[0022] The following specific embodiments illustrate the implementation of the present invention. Those skilled in the art can easily understand other advantages and effects of the present invention from the content disclosed in this specification. Obviously, the described embodiments are only some, not all, of the embodiments of the present invention. All other embodiments obtained by those skilled in the art based on the embodiments of the present invention without creative effort are within the scope of protection of the present invention.

[0023] like Figure 1 As shown, in a preferred embodiment, the present invention discloses a multi-parameter tuned holographic printing lithography system, including an illumination subsystem, a display and imaging subsystem, a motion subsystem, and a control subsystem. The illumination subsystem includes a laser source connected to a beam expander and collimator, which in turn is connected to a beam splitter. The display and imaging subsystem includes a reference light forming optical path and an object light forming optical path. The reference light forming optical path includes at least a scanning galvanometer connected to a scanning lens, which in turn is connected to a Fourier transform lens, forming a 4f system. The scanning galvanometer is located on the input surface of the scanning lens. The object light forming optical path includes at least a beam combiner prism connected to a spatial light modulator, which in turn is connected to a Fourier transform lens. The spatial light modulator is located on the input surface of the Fourier transform lens. The reference light and object light optical paths form a dual-channel coaxial Fourier transform optical path through the beam combiner prism. The reference light and object light coincide on the output surface of the Fourier transform lens. The motion subsystem includes at least a motor that drives the scanning galvanometer to vibrate and a two-dimensional precision translation stage. The control subsystem is connected to the illumination subsystem, display subsystem, imaging subsystem, and motion subsystem, respectively, and coordinates the switching of the laser source, the image output of the spatial light modulator, and the movement of the vibration motor and the two-dimensional precision translation stage.

[0024] The optical path structure is as follows: a laser light source emits laser light, forms wide-beam parallel light after passing through a beam expander collimation device, forms first illumination light and second illumination light through a beam splitter, and the two lights enter a display and imaging subsystem. The first illumination light illuminates a reference light path, and the second illumination light illuminates an object light path. The first illumination light enters a scanning galvanometer, enters a scanning lens and a Fourier transform lens after being reflected by the scanning galvanometer, and forms a reference light spot on the output surface of the Fourier transform lens. The second illumination light illuminates a spatial light modulator through a beam combiner, and the transmitted or reflected light of the spatial light modulator enters the Fourier transform lens through the beam combiner, and forms an object light spot on the output surface of the Fourier transform lens. The reference light spot and the object light spot coincide.

[0025] The adjustable parameters at least include one or a combination of the following parameters: 1) refresh of the spatial light modulator on the object light path; 2) angle parameter change of the scanning galvanometer (θ, Φ) in two dimensions; 3) position parameter change of the two-dimensional precision translation stage (x, y) in two dimensions.

[0026] Real-time modulation of the included angle between any reference light and object light is achieved by modulating the two dimensions (θ, Φ) of the scanning galvanometer.

[0027] The implementation method of any reference light mode includes achieving by comprehensively modulating the two dimensions (θ, Φ) of the scanning galvanometer and the two dimensions (x, y) of the two-dimensional precision translation stage.

[0028] The implementation method of any reference light mode also includes achieving by comprehensively modulating the two dimensions (θ, Φ) of the scanning galvanometer, the two dimensions (x, y) of the two-dimensional precision translation stage, and the refresh of the spatial light modulator.

[0029] The display and imaging optical path further includes an optical path for micro-imaging the output surface of the Fourier transform lens. The micro-imaging optical path further includes an autofocus optical path and a real-time detection optical path. The display and imaging optical path further includes mirrors, wave plates, dichroic mirrors, etc.

[0030] The spatial light modulator is selected from a reflective pure phase type spatial light modulator, a transmissive pure phase type spatial light modulator, a reflective amplitude type spatial light modulator, and a transmissive amplitude type spatial light modulator.

[0031] The information displayed on the spatial light modulator is selected from phase type information, amplitude type information, and complex amplitude type information.

[0032] The scanning galvanometer includes a MEMS two-dimensional scanning mirror, a two-dimensional galvanometer mirror, a two-dimensional servo motor deflection mirror, and a two-dimensional voice coil motor deflection mirror.

[0033] The laser source is selected from continuous-wave lasers, nanosecond pulse lasers, picosecond pulse lasers, and femtosecond pulse lasers. The optical path structure of this invention during use is as follows: The laser source emits laser light, which, after passing through a beam expander and collimator, forms a wide-beam parallel beam. This wide-beam parallel beam passes through a beam splitter to form a first illumination beam and a second illumination beam. Both beams enter the display and imaging subsystem. The first illumination beam illuminates the reference beam path, and the second illumination beam illuminates the object beam path. The first illumination beam is incident on a scanning galvanometer, and after reflection by the scanning galvanometer, it enters a scanning lens and a Fourier transform lens, forming a reference beam on the output surface of the Fourier transform lens. The second illumination beam passes through a beam combiner prism to illuminate the spatial light modulator. The transmitted or reflected light from the spatial light modulator passes through the beam combiner prism and enters the Fourier transform lens, forming an object beam beam on the output surface of the Fourier transform lens. The reference beam beam and the object beam beam coincide.

[0034] In specific embodiments, such as Figure 1 As shown, the illumination subsystem includes a nanosecond pulsed laser 1; the nanosecond laser pulsed laser is connected to a beam expander 2, the beam expander is connected to a collimating lens 3, the collimating lens is connected to a beam splitter 4, the beam splitter is connected to a reflector 5, the reflector is connected to a reference light aperture 6, the reference light aperture is connected to a MEMS galvanometer 7, a galvanometer drive device 14 is connected to the other side of the MEMS galvanometer corresponding to the reference light aperture 6, a scanning lens 8 is connected to the same side of the MEMS galvanometer and the reference light aperture 6, a beam combiner 9 is connected to the scanning lens 8, a pure phase spatial light modulator 10 is connected to the beam combiner 9, and 9 is also connected to a Fourier transform lens 11, a photosensitive material 15 is connected to the Fourier transform lens, and a two-dimensional translation stage 12 is connected to the side of the photosensitive material 15 away from 11. The nanosecond pulsed laser 1, the pure phase spatial light modulator 10, the galvanometer drive device 14, and the two-dimensional translation stage 12 are all connected to a control system 13.

[0035] The laser emitted by the nanosecond pulsed laser 1 is expanded into a wide-beam parallel beam by the beam expander 2 and collimator 3. The parallel beam is incident on the beam splitter 4, forming a first illumination beam and a second illumination beam. The first illumination beam is reflected by the reflector 5 and the reference aperture 6 to form a narrow parallel beam, which is then incident on the MEMS galvanometer 7. The MEMS galvanometer reflects the narrow parallel beam at a certain angle and is incident on the scanning lens 8. The incident angle is continuously modulated by the galvanometer driving device 14, which controls the two-dimensional parameters (θ, Φ) of the galvanometer in real time. The narrow beam passes through the scanning lens 8 and the beam combiner prism 9 in sequence and enters the Fourier transform lens 11, forming a reference spot 16 on the output surface of the Fourier transform lens. The reference spot 16 is located on the surface of the photosensitive material 15. The second illumination beam passes through the beam splitter and enters the beam combiner prism 9, then illuminates the pure phase spatial light modulator 10. The illumination beam is modulated and reflected by the spatial light modulator and then reflected by the beam combiner prism 9 into the Fourier transform lens 11, forming an object beam spot 17 on the output surface of the Fourier transform lens 11. The object light spot 17 and the reference light spot 16 overlap on the surface of the photosensitive material. The photosensitive material 15 is fixed on the two-dimensional translation stage 12 and can move with the two-dimensional translation stage. The control system 13 connects the two-dimensional translation stage 12, the spatial light modulator 10, the galvanometer drive device 14, and the laser source 1. The control system coordinates the switching of the laser source, the refreshing of the spatial light modulator, and the movement of the MEMS galvanometer and the two-dimensional translation stage, so that each component operates according to the set timing sequence.

[0036] like Figure 2 As shown, in the second embodiment, the illumination subsystem includes a picosecond pulse laser 20; a miniature lens group 19 is connected between the Fourier transform lens 11 and the photosensitive material 15, and a field stop 18 is connected between the Fourier transform lens 11 and the miniature lens group 19. The laser emitted by the picosecond pulse laser 20 is expanded into a wide beam of parallel light by the beam expander 2 and the collimator 3. The parallel light is incident on the beam splitter 4 to form a first illumination light and a second illumination light. The first illumination light is reflected by the reflector 5 and the reference light stop 6 to form a thin parallel beam that is incident on the MEMS galvanometer 7. The MEMS galvanometer reflects the thin parallel beam at a certain angle and the thin parallel beam is incident on the scanning lens 8. The incident angle is continuously modulated by the galvanometer driving device 14, which controls the two-dimensional parameters (θ, Φ) of the galvanometer in real time. The thin beam passes through the scanning lens 8 and the beam combiner prism 9 in sequence and enters the Fourier transform lens 11, forming a reference spot 16 on the output surface of the Fourier transform lens. The reference spot 16 is located in the plane where the field stop 18 is located. The field stop is used to limit the size and shape of the reference spot.

[0037] The second illumination light passes through the beam splitter and enters the beam combiner prism 9, then illuminates the pure phase spatial light modulator 10. The normal direction of the display plane of the pure phase spatial light modulator 10 forms an angle α with the illumination beam. After being modulated and reflected by the spatial light modulator, the illumination light is reflected again through the beam combiner prism 9 and enters the Fourier transform lens 11, forming an object light spot 17 on the output surface of the Fourier transform lens 11. The angle α ensures that the positive or negative first-order diffracted light of the spatial light modulator is exactly located in the middle of the field stop 18.

[0038] The object light spot 17 and the reference light spot 16 coincide in the plane containing the field stop 18. The field stop simultaneously restricts the size and shape of the object light spot. The spot corresponding to the field stop is imaged onto the surface of the photosensitive material 15 through the miniature lens group 19.

[0039] like Figure 3 As shown, in the third embodiment, the illumination subsystem includes a continuous laser 26; a first dichroic mirror 21 and a second dichroic mirror 22 are provided between the miniature lens group 19 and the field stop 18; the miniature lens group 19 is connected to an autofocusing system 23 corresponding to the second dichroic mirror 22; the miniature lens group 19 is connected to an autofocusing system driver 24; the control system 13 and the first dichroic mirror 21 are both connected to a real-time monitoring system 25, which is located on the other side of the optical path of 21; the object light forming optical path includes a transmissive amplitude-type spatial light modulator 27.

[0040] The laser emitted by the continuous laser 26 is expanded into a wide-beam parallel beam by the beam expander 2 and collimator 3. This parallel beam is then incident on the beam splitter 4, forming a first illumination beam and a second illumination beam. The first illumination beam is reflected by the reflector 5 and the reference aperture 6 to form a narrow parallel beam, which is then incident on the MEMS galvanometer 7. The MEMS galvanometer reflects this narrow parallel beam at a specific angle. This beam then enters the scanning lens 8, and its incident angle is continuously modulated in real-time by the galvanometer drive device 14, which controls the two-dimensional parameters (θ, Φ) of the galvanometer. The narrow beam then passes sequentially through the scanning lens 8 and the beam combiner prism 9 before entering the Fourier transform lens 11, forming a reference spot 16 on the output surface of the Fourier transform lens. The reference spot 16 is located in the plane containing the field stop 18. The field stop is used to limit the size and shape of the reference spot.

[0041] The second illumination light passes through a beam splitter and illuminates a transmissive amplitude-type spatial light modulator 27, then enters a beam combiner prism 9. After being modulated by the spatial light modulator, the illumination light is reflected by the beam combiner prism 9 and enters a Fourier transform lens 11, forming an object light spot 17 on the output surface of the Fourier transform lens 11. The object light spot 17 and the reference light spot 16 coincide in the plane containing the field stop 18. The field stop simultaneously restricts the size and shape of the object light spot. The spot corresponding to the field stop is imaged onto the surface of the photosensitive material 15 by a first dichroic mirror 21, a second dichroic mirror 22, and a miniature lens group 19. An autofocus system 23 ensures that the image plane formed by the field stop through the miniature lens group is clearly focused on the surface of the photosensitive material 15.

[0042] like Figure 4 As shown, in the fourth embodiment, the illumination subsystem includes a femtosecond pulsed laser 31, the reference light forming optical path includes a galvanometer mirror 29, the galvanometer mirror 29 is connected to a mirror driving device 30, and the object light forming optical path includes a reflective digital micromirror device spatial light modulator 28.

[0043] The laser emitted by the femtosecond pulsed laser 31 is expanded into a wide-beam parallel beam by the beam expander 2 and collimator 3. This parallel beam is then incident on the beam splitter 4, forming a first illumination beam and a second illumination beam. The first illumination beam is then reflected by the reflector 5 and the reference aperture 6 to form a narrow parallel beam, which is incident on the galvanometer mirror 29. The galvanometer mirror reflects the narrow parallel beam at a specific angle. This narrow parallel beam is then incident on the scanning lens 8, and its incident angle is continuously modulated in real-time by the mirror drive device 30, which controls the two-dimensional parameters (θ, Φ) of the mirror. The narrow beam then passes sequentially through the scanning lens 8 and the beam combiner prism 9 into the Fourier transform lens 11, forming a reference spot 16 on the output surface of the Fourier transform lens. The reference spot 16 is located in the plane containing the field stop 18. The field stop is used to limit the size and shape of the reference spot.

[0044] The second illumination light, after passing through the beam splitter and being reflected by the reflector 5, illuminates the spatial light modulator 28 of the reflective digital micromirror device. The illumination light is modulated and reflected by the spatial light modulator, then enters the beam combiner prism, and subsequently the Fourier transform lens 11, forming an object light spot 17 on the output surface of the Fourier transform lens 11. The object light spot 17 and the reference light spot 16 coincide on the plane of the field stop 18. The field stop simultaneously restricts the size and shape of the object light spot. The spot corresponding to the field stop is imaged onto the surface of the photosensitive material 15 by the dichroic mirrors 21 and 22 and the miniature lens group 19. The autofocus system 23 ensures that the image plane formed by the field stop through the miniature lens group is clearly focused on the surface of the photosensitive material 15.

[0045] Although the present application has been described in detail with general description and specific embodiments above, it is obvious to those skilled in the art that some modifications or improvements can be made on the basis of the present application. Therefore, these modifications or improvements made on the basis of not deviating from the spirit of the present application, all belong to the scope of protection claimed by the present application.

Claims

1. A multi-parameter tuned holographic printing lithography system, characterized by, The application relates to a display and imaging system, which comprises the following parts: An illumination subsystem for emitting light; the illumination subsystem is connected with a display and imaging subsystem for forming a light spot; The display and imaging subsystem is connected with a motion subsystem and a control subsystem for adjusting parameters; The display and imaging subsystem comprises a reference light forming light path and an object light forming light path; the reference light forming light path at least comprises a reflecting mirror and a scanning galvanometer, the reflecting mirror is connected with the scanning galvanometer, the scanning galvanometer is connected with a scanning lens, the scanning lens is connected with a Fourier transform lens through a beam combining prism, the reference light passes through the reflecting mirror, the scanning galvanometer and the beam combining prism, and a reference light spot is formed on the output surface of the Fourier transform lens; the object light forming light path at least comprises the beam combining prism, the beam combining prism is connected with a spatial light modulator, the spatial light modulator is connected with the Fourier transform lens, the object light passes through the beam combining prism and the spatial light modulator, and enters the Fourier transform lens to form an object light spot on the output surface of the Fourier transform lens; the reference light forming light path and the object light forming light path form a set of double-channel coaxial Fourier transform light paths through the beam combining prism, and the reference light spot and the object light spot are coincident; The motion subsystem comprises a motor and a translation stage for driving the scanning galvanometer to vibrate; the translation stage is connected with the display and imaging subsystem for changing the imaging position; The control subsystem coordinately controls the switching of the illumination subsystem, the refreshing of the spatial light modulator, the motion of the scanning galvanometer and the translation stage, so that each component operates according to the set time sequence; arbitrary reference light modes are realized by comprehensively modulating the two dimensions of the scanning galvanometer (theta, phi), the two dimensions of the translation stage (x, y) and the refreshing of the spatial light modulator; The display and imaging subsystem further comprises a micro-imaging light path, the micro-imaging light path comprises an automatic focusing light path and a real-time detection light path.

2. A multi-parameter tuned holographic printing lithography system according to claim 1, wherein, The motion subsystem comprises a motor connected with the reference light path for emitting vibration.

3. A multi-parameter tuned holographic printing lithography system as claimed in claim 2, wherein, The control subsystem is connected with the illumination subsystem, the display and imaging subsystem and the motion subsystem respectively, and comprises a switch connected with the illumination subsystem for controlling the light source; a control module connected with the display and imaging subsystem for outputting image information; A controller connected with the motion subsystem for controlling the motion of the motion subsystem.

4. A multi-parameter tuned holographic printing lithography system according to claim 3, wherein, The micro-imaging light path comprises a micro-lens group connected with the reference light forming light path, the object light forming light path and the motion subsystem.

5. A multi-parameter tuned holographic printing lithography system according to claim 1 or 4, wherein, The automatic focusing light path comprises an automatic focusing system connected with the control subsystem, the automatic focusing system is connected with a dichroic mirror connected with the reference light forming light path and the object light forming light path.

6. A multi-parameter tuned holographic printing lithography system according to claim 5, wherein, The real-time detection light path comprises a real-time detection system connected with the control subsystem and the automatic focusing system.

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