Three-beam simultaneous irradiation device and method

Abstract

The present invention provides a three-beam simultaneous irradiation device and method thereof. The three-beam simultaneous irradiation device includes an ion source subsystem, a primary accelerator subsystem, a second-stage accelerator subsystem and a target chamber subsystem. The ion source subsystem, the primary accelerator subsystem and the second-stage accelerator subsystem are connected in sequence, and the target chamber subsystem is connected to the primary accelerator subsystem and the second-stage accelerator subsystem. The present invention uses a multi-charge state ECR ion source component to simultaneously generate protons (H), alpha (4He 2+ ) and heavy ions (such as 12C, or 56Fe, or 63Cu, and heavier ions), three or more ions are then accelerated from low to high in a step-by-step manner and irradiated onto the sample at the same time, achieving three or more beams of irradiation.

Description

Technical Field

[0001] The present invention relates to the technical field of ion sources and accelerators, and in particular to a three-beam simultaneous irradiation device and method thereof. Background Art

[0002] In the research of material radiation damage, space radiation simulation, ion implantation material modification and other fields, sometimes one ion beam irradiation is required, sometimes two ion beams are required to irradiate simultaneously, and sometimes three beams or even more ions are required to irradiate simultaneously.

[0003] Under the irradiation conditions of the existing accelerator system, there are four situations: the first is to use a tandem accelerator to carry out the acceleration and irradiation of single ions from hydrogen to uranium; the second is to use an ECR ion source to achieve hydrogen (H2 + ) and Alpha (4He 2+ ) simultaneous acceleration and irradiation of two ions; the third method uses a tandem accelerator and one (or two) monopole electrostatic accelerators to achieve three-beam irradiation of heavy ions, hydrogen and helium; the fourth method uses two tandem accelerators to achieve simultaneous acceleration and irradiation of two ions, hydrogen and helium, or hydrogen and heavy ions.

[0004] It is currently impossible to use one accelerator or one set of acceleration devices to achieve three or more ion beam irradiations. Summary of the Invention

[0005] The object of the present invention is to provide a stepped high-voltage electrostatic acceleration device and a three-beam irradiation method.

[0006] The present invention provides a three-beam simultaneous irradiation device, which includes an ion source subsystem, a primary accelerator subsystem, a second accelerator subsystem and a target chamber subsystem, wherein the ion source subsystem, the primary accelerator subsystem and the second accelerator subsystem are connected in sequence, and the target chamber subsystem includes a first target chamber and a second target chamber connected to the primary accelerator subsystem, and a third target chamber and a fourth target chamber connected to the second accelerator subsystem;

[0007] The ion source subsystem includes an ECR ion source component, which generates at least three multi-charged state ions and H + and H2 + Two single-charged ions; the primary accelerator subsystem includes a primary accelerator tube component connected to the ECR ion source component and a low-energy electrostatic analyzer or magnetic analyzer component connected to the primary accelerator tube component, the first target chamber and the second target chamber performing beam current measurement and irradiation on the low-energy ions passing through the low-energy electrostatic analyzer or magnetic analyzer component;

[0008] The second-stage accelerator subsystem includes a second-stage accelerating tube component connected to the low-energy electrostatic analyzer or magnetic analyzer component and a 90° magnetic analyzer component connected to the second-stage accelerating tube component. The third target chamber and the fourth target chamber perform beam current measurement and sample irradiation on high-energy ions passing through the 90° magnetic analyzer component.

[0009] Preferably, the primary accelerator subsystem further comprises a first beam pipe and a second beam pipe both connected to the low-energy electrostatic analyzer or magnetic analyzer component, the first beam pipe is connected to the first target chamber, and the second beam pipe is connected to the second target chamber.

[0010] Preferably, the second-stage accelerator system further comprises a third beam pipe and a fourth beam pipe both connected to the 90° magnetic analyzer component, the third beam pipe is connected to the third target chamber, and the fourth beam pipe is connected to the fourth target chamber.

[0011] Preferably, the second-stage accelerator subsystem further comprises a high-energy electrostatic analyzer or a magnetic analyzer installed between the third beam pipe and the fourth beam pipe.

[0012] Preferably, the primary accelerator subsystem further comprises a first high-voltage stage component enclosing the ECR ion source component.

[0013] Preferably, the second-stage accelerator subsystem further comprises a second high-voltage stage component enclosing the first high-voltage stage component, the preliminary acceleration tube component and the low-energy electrostatic analyzer or magnetic analyzer component.

[0014] Preferably, it further comprises a third-order accelerator subsystem, a fourth-order accelerator subsystem, ... and an nth-order accelerator subsystem, where n ≥ 2, and each accelerator subsystem is connected to the target chamber subsystem. The present invention also provides a radiation method for a three-beam simultaneous irradiation device, comprising the following steps:

[0015] S1: ECR ion source components produce at least three multi-charged ions and H + and H2 + Two singly charged ions;

[0016] S2: The ions are accelerated by the primary accelerating tube component, and the accelerated ions are injected into the secondary accelerating tube component through the low-energy electrostatic analyzer or the magnetic analyzer component for further acceleration. Meanwhile, the low-energy electrostatic analyzer or the magnetic analyzer component selects low-energy ions to enter the first target chamber and the second target chamber for beam measurement and irradiation.

[0017] S3: The ions accelerated by the second-stage accelerating tube component enter the 90° magnetic analyzer component, which selects high-energy ions to enter the third target chamber and the fourth target chamber for beam measurement and irradiation.

[0018] Preferably, in S2, the first target chamber is used for low energy H + Beam current measurement and sample irradiation are performed, and the second target chamber is used for low energy H2 + With 4He 2+ Irradiation of two ions or H2 + 、4He2 + and heavy ion triple-beam irradiation.

[0019] Preferably, in S3, the third target chamber is used for H with higher energy. + Beam current measurement and sample irradiation are performed; the fourth target chamber is used for higher energy H2 + With 4He 2+ Two ions or H2 + 、4He 2+ and triple-beam irradiation of heavy ions.

[0020] The present invention adopts the multi-charge state ECR ion source component to simultaneously generate protons (H), alpha (4He 2+ ) and heavy ions (such as 12C, or 56Fe, or 63Cu, and heavier ions), three or more ions are then accelerated from low to high in a step-by-step manner and irradiated onto the sample at the same time, achieving three or more beams of irradiation. BRIEF DESCRIPTION OF THE DRAWINGS

[0021] Figure 1 This is a simplified structural diagram of the stepped high-voltage accelerator for simultaneous three-beam irradiation according to the present invention. DETAILED DESCRIPTION

[0022] In order to make the purpose, technical solutions and advantages of the present invention more clearly understood, the present invention will be further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are only used to explain the present invention and are not intended to limit the present invention.

[0023] The present invention discloses an accelerator three-beam irradiation device, which can simultaneously accelerate three different ions, namely protons, alpha ions and heavy ions, and realize three-beam irradiation.

[0024] like Figure 1 As shown, the accelerator three-beam irradiation device includes four subsystems, specifically the ion source subsystem, the primary accelerator subsystem, the second-order accelerator subsystem and the target chamber subsystem. The ion source subsystem, the primary accelerator subsystem and the second-order accelerator subsystem are connected in sequence, and the target chamber subsystems are connected to the primary accelerator subsystem and the second-order accelerator subsystem.

[0025] There may be multiple acceleration subsystems, such as a third-order acceleration subsystem, a fourth-order acceleration subsystem and an nth-order acceleration subsystem, where n≥2. This embodiment only illustrates a second-order acceleration subsystem, and each acceleration subsystem is connected to the target chamber subsystem.

[0026] The ion source subsystem can simultaneously generate at least three multi-charged positive ions (such as 12C, or 56Fe, or 63Cu, and heavier ions) and H + and H 2+ The two single-charged positive ions are then accelerated simultaneously by the primary accelerator system and the second-stage accelerator system in sequence, and the target chamber subsystem irradiates the positive ions accelerated by the primary accelerator system and the second-stage accelerator system onto the sample at the same time, realizing three or more beams of irradiation.

[0027] The ion source subsystem is used to generate high-current positive ions in multiple charge states and two single charge states. The ion source subsystem includes an ECR (electron cyclotron resonance) ion source component 10 that generates at least three multiple charge states and two single charge states. Multiple charge states refer to charge states in which the ion source has stripped away two or more electrons, or even all electrons. The stripped electrons include 2+, 3+, 4+, ..., and n+ (n is not less than 4).

[0028] The beam current drawn out by the ion source subsystem can be in the range of 10nA-10mA (ion beam current) and can be continuously adjusted. The microwave frequency of the ECR ion source component 10 is in the range of 5-50GHz.

[0029] The primary accelerator subsystem is used to perform primary acceleration on the high-current positive ions extracted from the ECR ion source assembly 10, which are then injected into the secondary acceleration stage after passing through a low-energy electrostatic analyzer or a magnetic analyzer. The primary accelerator subsystem includes a primary accelerator tube assembly 21 connected to the ECR ion source assembly 10, a first high-voltage gantry assembly 22, a low-energy electrostatic analyzer 23 connected to the primary accelerator tube assembly 21, and a first beam conduit 24 and a second beam conduit 25, both connected to the low-energy electrostatic analyzer 23. The low-energy electrostatic analyzer 23 can also be a magnetic analyzer.

[0030] The second-stage accelerator system is used to perform a second-stage acceleration on the ions that have passed through the primary accelerator system, thereby achieving higher energies. The second-stage accelerator system includes a second-stage accelerating tube assembly 31 connected to the low-energy electrostatic analyzer 23 or magnetic analyzer assembly, a second high-voltage gantry assembly 32, a 90° magnetic analyzer assembly 33 connected to the second-stage accelerating tube assembly 31, a third beam pipe 34 and a fourth beam pipe 35, both connected to the 90° magnetic analyzer assembly 33, and a high-energy electrostatic analyzer or magnetic analyzer 36 installed between the third and fourth beam pipes 34 and 35.

[0031] The target chamber subsystem is used to accelerate the ions after they are accelerated by the primary accelerator system and the second accelerator system. 2+ The target chamber subsystem includes four irradiation target chambers, namely the first target chamber 41, the second target chamber 42, the third target chamber 43 and the fourth target chamber 44.

[0032] For the primary accelerator subsystem, the primary accelerating tube assembly 21 has an accelerating voltage in the range of 20kV to 500kV and is used to accelerate positive ions. The ECR ion source assembly 10 is enclosed by a first high-voltage gantry assembly 22, which insulates the ion source subsystem from the primary accelerator subsystem. A low-energy electrostatic analyzer 23 or magnetic analyzer assembly is used to select the energy uniformity or charge state of the ions. A first beam conduit 24 is connected to a first target chamber 41, and a second beam conduit 25 is connected to a second target chamber 42.

[0033] For the second-stage accelerator system, the acceleration voltage of the second-stage accelerator tube component 31 can be continuously adjusted between 100kV and 800kV; the second high-voltage gantry component 32 encloses the first high-voltage gantry component 22, the primary accelerator tube component 21 and the low-energy electrostatic analyzer 23 or the magnetic analyzer component, and the second high-voltage gantry component 32 insulates the primary accelerator system and the second-stage accelerator system; the 90° magnetic analyzer component 33 is used to select the charge state of the accelerated ions passing through the second-stage accelerator tube component 31, for example, to select 4He 2+ , 12C 6+ and 56Fe 14+ The third beam pipe 34 is connected to the third target chamber 43; the fourth beam pipe 35 is connected to the fourth target chamber 44 for irradiation of heavy ion beams. The fourth target chamber 44 can realize H2 + 、4He 2+ and heavy ions (such as 56Fe 14+ high energy electrostatic analyzer or magnetic analyzer 36 for the third target chamber 43 of H2 + and 4He 2+ Deflected to the fourth target chamber 44 .

[0034] Regarding the target chamber subsystem, the first target chamber 41 and the second target chamber 42 are used to measure and irradiate the low energy ions accelerated by the primary accelerator subsystem. + Beam measurement and sample irradiation are performed; the second target chamber 42 is used to irradiate low energy H2 + With 4He 2+ Irradiation of two ions or H2 + 、4He 2+The third target chamber 43 and the fourth target chamber 44 are used for beam measurement and sample irradiation of high energy ions accelerated by the primary accelerator system and the second accelerator system. The third target chamber 43 is used for high energy H + Beam measurement and sample irradiation are performed; the fourth target chamber 44 is used for high energy H2 + With 4He 2+ Two ions or H2 + 、4He 2+ and triple-beam irradiation of heavy ions.

[0035] The present invention also discloses a three-beam simultaneous irradiation method, comprising the following steps:

[0036] S1: The ECR ion source component 10 generates at least three multi-charged ions and H + and H2 + Two singly charged ions;

[0037] S2: The ions are accelerated by the primary accelerating tube component 21, and the accelerated ions are injected into the secondary accelerating tube component 31 through the low-energy electrostatic analyzer 23 or the magnetic analyzer component for acceleration. At the same time, the low-energy electrostatic analyzer 23 or the magnetic analyzer component selects low-energy ions to enter the first target chamber 41 and the second target chamber 42 for beam measurement and irradiation.

[0038] S3: The ions accelerated by the second-stage accelerating tube component 31 enter the 90° magnetic analyzer component 33. The 90° magnetic analyzer component 33 selects high-energy ions to enter the third target chamber 43 and the fourth target chamber 44 for beam measurement and irradiation.

[0039] In S2, the first target chamber 41 is used to generate low energy H + Beam measurement and sample irradiation are performed; the second target chamber 42 is used to irradiate low energy H2 + With 4He 2+ Irradiation of two ions or H2 + 、4He 2+ and heavy ion triple-beam irradiation.

[0040] Among them, in S3, the third target chamber 43 is for higher energy H + Beam measurement and sample irradiation are performed; the fourth target chamber 44 is used for high energy H2 + With 4He 2+ Two ions or H2 + 、4He 2+ and triple-beam irradiation of heavy ions.

[0041] The present invention adopts the multi-charge state ECR ion source component to simultaneously generate protons (H), alpha (4He 2+) and heavy ions (such as 12C, or 56Fe, or 63Cu, and heavier ions), three or more ions are then accelerated and irradiated onto the sample at the same time, achieving three or more beams of irradiation.

[0042] In order to obtain higher ion energy, at least two high-voltage gantry components are stacked upward, and the ion is accelerated from low to high in a step-by-step manner. Each step uses an accelerating tube component for acceleration. For example, the high voltage of the first stage (i.e., the initial stage) acceleration can be in the range of 20kV-500kV, and the high voltage of the second stage acceleration can be in the range of 100kV-800kV: for 4He 2+ Ions can obtain an energy range of 40keV-1000keV after the first stage acceleration; an energy range of 240keV-2600keV after the first and second stages acceleration. If higher energy is required, the third stage or even higher stage acceleration can be used (the third stage or even higher stage acceleration will not be repeated in the present invention). The three-beam irradiation device of the accelerator of the present invention is also called a stepped high-voltage accelerator device.

[0043] The present invention has the following effects:

[0044] First, high beam intensity: Because the ion source subsystem can extract ions with multiple charge states, such as +1, +2, and +3, beam currents can reach a range of 100μA to 1mA, over 100 times higher than the beam current achieved by existing tandem accelerators' sputtering negative ion sources. For typical ion beams such as H, 4He, and 12C, the beam current can be continuously adjusted from 100 to 1000μA. For metal elements such as Ni, Fe, and Cu, the beam current can be continuously adjusted from 20 to 200μA.

[0045] Second, high overall efficiency: Both the ion source ionization efficiency and the transmission efficiency are far superior to those of tandem accelerators. For example, the transmission efficiency of the three-beam irradiation device of the accelerator of the present invention exceeds 95%, while the transmission efficiency of existing tandem accelerators is in the range of 15%-30%. The overall efficiency of the present invention is 10 to 100 times higher than that of existing tandem accelerators.

[0046] Third, the energy is high, the structure is simple, and one accelerator three-beam irradiation device can be better than two tandem accelerators: the energy after acceleration is proportional to the acceleration voltage and charge state. For example, for 56Fe ions, we can choose 16 + Charge state, after two stages of acceleration, 56Fe 16+ The energy of ions can reach over 20MeV. There is a 2x3MV tandem accelerator that accelerates 56Fe 3+ (When the gas is stripped, the 3+ charge state is the most efficient) The energy after acceleration is only 12MeV. Considering the protons (H), alpha (4He 2+) and heavy ion triple beam irradiation, the accelerator triple beam irradiation device of the present invention can be used to achieve it. If a tandem accelerator is used, it is impossible to achieve triple beam irradiation using two tandem accelerators.

[0047] Fourth, the range of types and energies of accelerated ions is wide: the types of ions range from hydrogen to all elements of uranium, and the energy of accelerated ions ranges from 10 0 keV to 10 5 The keV range can be chosen arbitrarily.

[0048] Fifth, it can not only carry out three-beam irradiation, but also realize single ion, two-ion beam irradiation, four (proton, alpha and heavy ion) ion and more ion beam irradiation, which can greatly improve the ability to simulate the research of ion damage and performance changes of materials.

[0049] In addition, the accelerator three-beam irradiation device for three-beam irradiation of the present invention also has the characteristics of low equipment investment, low operation and maintenance costs, etc.

[0050] The above description is merely a preferred embodiment of the present invention and does not constitute any form of limitation to the present invention. Although the present invention has been disclosed as a preferred embodiment as above, it is not intended to limit the present invention. Any technician familiar with the present profession can make some changes or modifications to equivalent embodiments of equivalent changes using the technical content disclosed above without departing from the scope of the technical solution of the present invention. However, any simple modifications, equivalent changes and modifications made to the above embodiments based on the technical essence of the present invention without departing from the content of the technical solution of the present invention are still within the scope of the technical solution of the present invention.

Claims

1. A three-beam simultaneous irradiation device, characterized in that: It includes an ion source subsystem, a primary accelerator subsystem, a secondary accelerator subsystem and a target chamber subsystem, wherein the ion source subsystem, the primary accelerator subsystem and the secondary accelerator subsystem are connected in sequence, and the target chamber subsystem includes a first target chamber and a second target chamber connected to the primary accelerator subsystem, and a third target chamber and a fourth target chamber connected to the secondary accelerator subsystem; The ion source subsystem includes an ECR ion source component, which generates at least three multi-charged state ions and H + and H2 + Two singly charged ions; The primary accelerator subsystem includes a primary accelerator tube component connected to the ECR ion source component and a low-energy electrostatic analyzer or magnetic analyzer component connected to the primary accelerator tube component, and the first target chamber and the second target chamber perform beam current measurement and irradiation on low-energy ions passing through the low-energy electrostatic analyzer or magnetic analyzer component; The second-stage accelerator subsystem includes a second-stage accelerating tube component connected to the low-energy electrostatic analyzer or magnetic analyzer component and a 90° magnetic analyzer component connected to the second-stage accelerating tube component. The third target chamber and the fourth target chamber perform beam current measurement and sample irradiation on high-energy ions passing through the 90° magnetic analyzer component.

2. The three-beam simultaneous irradiation device according to claim 1, characterized in that: The primary accelerator system further includes a first beam pipe and a second beam pipe both connected to the low-energy electrostatic analyzer or magnetic analyzer component, the first beam pipe is connected to the first target chamber, and the second beam pipe is connected to the second target chamber.

3. The three-beam simultaneous irradiation device according to claim 1, characterized in that: The second-stage accelerator system further includes a third beam pipe and a fourth beam pipe both connected to the 90° magnetic analyzer component, the third beam pipe is connected to the third target chamber, and the fourth beam pipe is connected to the fourth target chamber.

4. The three-beam simultaneous irradiation device according to claim 3, characterized in that: The second-stage accelerator subsystem further includes a high-energy electrostatic analyzer or a magnetic analyzer installed between the third beam pipe and the fourth beam pipe.

5. The three-beam simultaneous irradiation device according to claim 3, characterized in that: The primary accelerator subsystem further includes a first high voltage gantry component enclosing the ECR ion source component.

6. The three-beam simultaneous irradiation device according to claim 5, characterized in that: The second-stage accelerator subsystem further includes a second high-voltage stage component enclosing the first high-voltage stage component, the preliminary acceleration tube component, and the low-energy electrostatic analyzer or magnetic analyzer component.

7. The three-beam simultaneous irradiation device according to claim 1, characterized in that: It also includes a third-order acceleration subsystem, a fourth-order acceleration subsystem, ... and an n-th-order acceleration subsystem, wherein n≥2, and each acceleration subsystem is connected to the target room subsystem.

8. The irradiation method for the three-beam simultaneous irradiation device according to any one of claims 1 to 7, characterized in that: The steps include: S1: ECR ion source components produce at least three multi-charged ions and H + and H2 + Two singly charged ions; S2: The ions are accelerated by the primary accelerating tube component, and the accelerated ions are injected into the secondary accelerating tube component through the low-energy electrostatic analyzer or the magnetic analyzer component for further acceleration. Meanwhile, the low-energy electrostatic analyzer or the magnetic analyzer component selects low-energy ions to enter the first target chamber and the second target chamber for beam measurement and irradiation. S3: The ions accelerated by the second-stage accelerating tube component enter the 90° magnetic analyzer component, which selects high-energy ions to enter the third target chamber and the fourth target chamber for beam measurement and irradiation.

9. The irradiation method of the three-beam simultaneous irradiation device according to claim 8, characterized in that: In S2, the first target chamber is sensitive to low energy H + Beam current measurement and sample irradiation are performed, and the second target chamber is used for low energy H2 + With 4He 2+ Irradiation of two ions or H2 + 、4He 2+ and heavy ion triple-beam irradiation.

10. The irradiation method of the three-beam simultaneous irradiation device according to claim 8, characterized in that: in, In S3, the third target chamber is used for H with higher energy. + Beam current measurement and sample irradiation are performed; the fourth target chamber is used for higher energy H2 + With 4He 2+ Two ions or pairs 4He 2+ and triple-beam irradiation of heavy ions.

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