13 results about "Heavy ion" patented technology

The application discloses a preparation method of a heavy ion microporous composite filtration membrane and application thereof, and relates to the technical field of membrane separation preparation, wherein the preparation method comprises the following steps: step one, compounding a nuclear pore membrane on the upper side of a first base material; step two, preparing a casting solution, and then casting the casting solution on a second base material to form a nascent membrane after scraping; step three, performing a blowing operation on the nascent membrane to obtain a pre-phase separation membrane; step four, immersing the pre-phase separation membrane in a coagulation bath to perform a solidification operation, and obtaining a solidified membrane; step five, performing an area stretching operation on the solidified membrane, and then performing a cleaning operation in pure water, and then performing a drying operation after the cleaning operation to obtain a microfiltration membrane; and step six, compounding the microfiltration membrane on the upper side of the nuclear pore membrane to obtain a composite filtration membrane. The preparation method of the heavy ion microporous composite filtration membrane improves the liquid stopping effect, filtration flux and flux stability of the filtration membrane by compounding the first base material, the nuclear pore membrane and the microfiltration membrane.

This invention provides a quadruple ion-coupled erosion-protected concrete and its preparation method, relating to the field of special concrete materials technology. The concrete comprises basic components and functional admixtures. The basic components include cementitious materials, aggregates, and water. The functional admixtures include a coupling ion locking agent, a dual-interface film-forming aid, and a salt-expansion-resistant crack-resistant agent. The coupling ion locking agent includes calcined calcium aluminum hydrotalcite and diethylenetriamine pentacarboxylate; the dual-interface film-forming aid includes isobutyltriethoxysilane and lithium silicate; and the salt-expansion-resistant crack-resistant agent includes calcium sulfoaluminate expansion agent and lightly calcined magnesium oxide. The three admixtures work synergistically from three dimensions: active ion solidification, in-situ interface shielding, and full-cycle volume compensation, achieving simultaneous solidification of the four erosion ions, continuous blocking of penetration channels, and effective offsetting of salt crystallization expansion stress. This ensures the long-term safe service of the concrete under extreme conditions of high water pressure, high humidity, alternating wet and dry conditions, and multi-ion coupling erosion.

An arylboron compound, its preparation method, applications, and pharmaceutical compositions are disclosed for tumor imaging. The compound of formula (I) exhibits high fluorescence quantum efficiency through intramolecular charge transfer. The compound of formula (I) synthesized in this invention can be linked to different antibodies via Q3 at certain concentrations, allowing for precise targeting of corresponding tumors based on the antibody. This type of boron drug formulation can be used in boron neutron capture therapy to kill tumor cells. It exhibits better killing effects; the compound of formula (I) targets tumor cells through antigen-antibody interaction. After the boron-10-containing drug accumulates at the tumor site, neutron radiation triggers a nuclear reaction releasing alpha particles and... 7 Lithium particles kill cells; the range of these two particles is approximately 10 μm. High-energy-density heavy ions disrupt the DNA double helix structure in tumor cells, causing irreparable cell death. Simultaneously, the 10 μm distance avoids damage to normal cells and tissues.

Systems, components, methods, and algorithms encoded as executable instructions for processing a sample using focused ion beams are described. A method includes processing a sample 125 by extracting a beam of ions 310 from a mixture of a first gas and a second gas. The beam can include a composition of relatively heavy ions and relatively light ions. The method can include deflecting 330 the beam of ions in accordance with a deflection pattern and directing the beam through an electromagnetic field 305 that is oblique relative to an axis of the beam. The electromagnetic field can be configured to at least partially disperse 315 the beam in space such that the deflection pattern causes the beam of ions to process a first portion of a sample surface by the relatively light ions and a second portion of the sample surface by the relatively heavy ions.

The application belongs to the technical field of semiconductors, and provides a silicon carbide power device single-particle leakage current degradation data analysis method, system and readable medium, which comprises the following steps: collecting leakage current data of a silicon carbide power device in a heavy ion irradiation process; calculating a first-order differential absolute value of the leakage current data, and dividing the leakage current data into several fragmented flat regions according to the first-order differential absolute value; processing the several fragmented flat regions through a mean value comparison method to determine whether a real single-particle leakage step occurs; inputting the leakage current data in which the real single-particle leakage step occurs into a kernel density estimation algorithm to obtain a silicon carbide power device single-particle leakage current degradation data analysis result. The application effectively solves the interference of test noise on the identification of a small leakage step, and can accurately extract a leakage jump of a nano-ampere level.

This invention discloses a matching method and related equipment for achieving beam dosimetric equivalence between multiple treatment chamber units, belonging to the field of proton and heavy ion radiotherapy technology. The method includes: acquiring beam physical characteristic parameters of each treatment chamber unit under multiple single-energy beam conditions covering the clinical treatment energy range; defining a reference benchmark; and determining a matching parameter set for the treatment unit to be matched, using the beam physical characteristic parameters of the reference benchmark as the target, so that its beam characteristics are adjusted to be overall equivalent to the reference benchmark in the multi-dimensional characteristic space; the matching parameter set includes physical additional module parameters and dose correction parameters. Through a hierarchical method of matching single-energy beams one by one, multi-energy comprehensive iterative optimization, and unified matching parameter output, dosimetrically equivalent treatment can be performed between multiple treatment chamber units without re-planning the treatment. This improves the cross-device versatility, treatment efficiency, and safety of multi-source multi-chamber proton radiotherapy systems, making proton therapy readily accessible.

This invention relates to a method for analyzing the energy spectrum of alpha particles in mixed radiation fields using a CR-39 track detector based on step-by-step etching and energy attenuation. The method first etches the CR-39 with a potassium hydroxide-ethanol-water (PEW) solution, utilizing the significant differences in the tracks revealed by protons, alpha particles, and heavy ions to effectively distinguish alpha particles. To address the problem of a narrow energy window for alpha particle track revealing, this invention proposes a novel etching and identification method. By placing a series of energy-degrading sheets of varying thicknesses in front of the CR-39, the wide-spectrum alpha particles are attenuated to the optimal detection range in the spatial dimension. Simultaneously, through multiple step-by-step etching sessions of varying durations, the measurement window is broadened in the temporal dimension, allowing for the acquisition of the alpha particle energy spectrum in a short time, ultimately achieving accurate reconstruction of the alpha particle energy spectrum. This invention achieves high-purity identification and accurate measurement of alpha particles across a wide energy spectrum in complex mixed radiation fields, offering advantages such as low cost, ease of operation, and reliable results.

The utility model relates to sewage treatment equipment technical field, concretely relates to a kind of high-efficiency heavy ion microporous membrane MABR subassembly device, including square pass frame, the inside fixed mounting of square pass frame has multiple groups of membrane curtain, the bottom end fixed mounting of square pass frame inside has membrane purging mechanism;The membrane purging mechanism includes the two groups of aeration box fixedly installed in the bottom end of square pass frame inside, the top of aeration box is equipped with multiple groups of gas outlet, the outside of multiple groups of gas outlet is all threadedly connected with aeration cap, the front and rear ends of aeration box are all equipped with box cover, the top of aeration box and between two groups of box cover Fixed installation has protective cover, the utility model is through the modularization design by design, aeration box and its outside each component can be independently disassembled replacement, without overall scrapping, to reduce maintenance cost, while heavy ion membrane tube both ends quick release design support replacement, without disassembling integral assembly, further improve the maintenance convenience and reduce maintenance cost.

This invention belongs to the field of materials preparation technology, specifically relating to the fabrication of micropits for single-molecule detection chip substrates and the single-molecule detection chip itself. The method provided by this invention mainly includes the following steps: first, heavy ions are accelerated using an accelerator; then, the accelerated heavy ions bombard the substrate. After the heavy ions damage the substrate, an etchant with added corrosion inhibitors is used to etch the substrate, obtaining micropits of specific diameter and depth. The etched sample is then cleaned and dried. This method of fabricating micropits by accelerating and bombarding the substrate with heavy ions overcomes the limitations of traditional photolithography. It directly defines the micropit pattern through heavy ion bombardment, eliminating the need for photomasks. This not only reduces material costs but also avoids production interruptions and additional costs caused by photomask damage. Furthermore, the processing is relatively simple, eliminating the need for multiple complex photolithography and etching steps, greatly improving production efficiency, shortening the production cycle, and reducing production costs.

This invention belongs to the field of semiconductor fabrication technology and relates to a radiation-resistant laser-induced PN converter device and its fabrication method. The device includes a substrate, a two-dimensional material heterojunction functional layer, and source / drain electrodes. The conductive channel of the two-dimensional material heterojunction functional layer is a sandwich heterojunction structure. The bottom layer of the sandwich heterojunction structure is a single-layer transition metal sulfide, the middle layer is a single-layer graphene, and the top layer is another single-layer transition metal sulfide, enabling reversible conversion of PN conductivity under laser irradiation. The two-dimensional material heterojunction functional layer is disposed on the substrate, and source / drain electrodes with a preset image are disposed on the top layer. The source / drain electrodes are connected to an external circuit. This invention suppresses the influence of irradiation defects on carrier transport through the high carrier mobility of graphene. Through the MoS2 / graphene / WS2 sandwich heterojunction structure, it achieves excellent resistance to heavy ion irradiation and maintains stable laser-induced PN conversion characteristics even after heavy ion irradiation.

The application discloses a semiconductor device based on asymmetric L-shaped Schottky contact and a preparation method thereof. The device comprises: a buried oxygen layer buried below the surface of a Si substrate, the Si substrate being divided into an N well and a P well, the N well being provided with an n-type active region, and the P well being provided with a p-type active region; a differential gate being arranged above the n-type active region and the p-type active region, and an asymmetric L-shaped isolation side wall being arranged on both sides of the differential gate; polycrystalline silicon of the differential gate and a gate metal forming a Schottky contact, the Schottky contact and a MOS region forming a Schottky-MOS hybrid structure; source-drain contacts being arranged at the source-drain ends of the n-type active region and the p-type active region; and a passivation layer being arranged on the upper surface of the entire device. The asymmetric L-shaped isolation side wall is constructed, so that the device has stronger resistance to the movement of charges when heavy ions are incident, lower transient current peak value and collected charges, better anti-single event effect capability and a larger voltage application range.