Method, device, equipment and readable storage medium for switching beam in-situ marking

Abstract

The present invention discloses a method, device, equipment and readable storage medium for switching beam in-situ annotation. The method comprises: receiving a switching instruction for switching a first beam in-situ annotation in a building graphic to a second beam in-situ annotation; determining a target beam component to which the second beam in-situ annotation belongs from the building graphic according to the switching instruction and determining the annotation type of the second beam in-situ annotation; screening target attribute information corresponding to the annotation type of the second beam in-situ annotation from all attribute information of the target beam component to form the second beam in-situ annotation; determining a layout position according to the position information of the target beam component and the annotation type of the second beam in-situ annotation; arranging the second beam in-situ annotation at the layout position to replace the first beam in-situ annotation; the present invention can automatically switch the annotation type, annotation content and annotation position of the beam in-situ annotation according to user operation.

Description

Technical Field

[0001] The present invention relates to the technical field of computer-aided design, and in particular to a method, device, equipment and readable storage medium for switching in-situ marking of beams. Background Art

[0002] During the architectural design phase, it is necessary to use beam in-situ annotations in the drawings to characterize the detailed local information of the beams, such as cross-sectional dimensions, reinforcement, etc. However, beam in-situ annotations are divided into the following two types: beam surface in-situ annotations and beam bottom in-situ annotations. During the design process, designers often need to modify the beam in-situ annotations to better meet the design requirements. In the prior art, designers need to manually modify the beam in-situ annotations, for example, manually modify the annotation type of the original beam in-situ annotation to obtain a new beam in-situ annotation, or manually arrange the beam in-situ annotation from the original position to the new position. In the process of modifying the beam in-situ annotation, it is necessary to modify the annotation type, annotation content, and annotation position at the same time. Therefore, the designer's modification workload is large and the efficiency is low. It can be seen that how to efficiently and accurately switch the original beam in-situ annotation to the new beam in-situ annotation according to the designer's wishes has become a technical problem that technical personnel in this field urgently need to solve. Summary of the Invention

[0003] The object of the present invention is to provide a method, device, equipment and readable storage medium for switching in-situ beam marking, which can automatically switch the marking type, marking content and marking position of the in-situ beam marking according to user operations.

[0004] According to one aspect of the present invention, a method for switching in-situ marking of beams is provided, the method comprising:

[0005] receiving a switching instruction for switching the in-situ marking of a first beam in a building drawing to the in-situ marking of a second beam;

[0006] Determining, from the building drawing according to the switching instruction, a target beam component to which the second beam in-situ annotation belongs and determining a annotation type of the second beam in-situ annotation;

[0007] Filtering target attribute information corresponding to the annotation type of the second beam in-situ annotation from all attribute information of the target beam component to form the second beam in-situ annotation;

[0008] Determining a layout position according to the position information of the target beam component and the marking type of the in-situ marking of the second beam;

[0009] The second beam in-situ annotation is arranged at the arrangement position to replace the first beam in-situ annotation.

[0010] Optionally, the receiving a switching instruction for switching the first beam in-situ marking in the building graphic to the second beam in-situ marking includes:

[0011] When a preset drag operation for the in-situ marking of the first beam is detected, a switching instruction is triggered; or,

[0012] When a preset click operation for the in-situ marking of the first beam is detected, a second type of switching instruction is triggered.

[0013] Optionally, determining, from the building graphic according to the switching instruction, a target beam component to which the second beam in-situ annotation belongs, includes:

[0014] For the type of switching instruction, obtaining the end position of the preset drag operation from the building graphic, and setting the beam component closest to the end position in the building graphic as the target beam component; or

[0015] For the second type of switching instructions, the beam component to which the first beam in-situ annotation belongs in the building graphic is set as the target beam component.

[0016] Optionally, determining the annotation type of the in-situ annotation of the second beam includes:

[0017] For the type of switching instruction, determining whether the end position is located below a horizontally placed target beam component, or whether the end position is located to the right of a vertically placed target beam component;

[0018] If yes, set the annotation type of the second beam in-situ annotation to beam bottom;

[0019] If not, the outer bounding box of the in-situ marking of the first beam is expanded outward according to the preset size to form a virtual bounding box, and the overlapping area of ​​the virtual bounding box at the end position and each beam span area of ​​the target beam component is calculated respectively, and the annotation type of the in-situ marking of the second beam is set to the beginning of the beam span, the middle of the beam span or the end of the beam span according to the beam span area corresponding to the maximum overlapping area; wherein the beam span area includes: the beginning of the span area, the middle of the span area and the end of the span area.

[0020] Optionally, determining the annotation type of the in-situ annotation of the second beam includes:

[0021] For the second type of switching instructions, if the annotation type of the in-situ annotation of the first beam is the beginning of the beam span, the middle of the beam span, or the end of the beam span, the annotation type of the in-situ annotation of the second beam is set to the bottom of the beam;

[0022] If the annotation type of the in-situ annotation of the first beam is the bottom of the beam, the projection point of the center point of the in-situ annotation of the first beam to the target beam component is determined, and the annotation type of the in-situ annotation of the second beam is set to the beginning of the beam span, the middle of the beam span, or the end of the beam span according to the beam span area where the projection point is located.

[0023] Optionally, determining the layout position according to the position information of the target beam component and the marking type of the in-situ marking of the second beam includes:

[0024] For a horizontally placed target beam component, when the annotation type of the second beam in-situ annotation is beam bottom, a first layout position is determined on a straight line passing through the center point of the target beam component and perpendicular to the center line of the target beam component; wherein the first layout position is located below the target beam component and a first preset distance from the target beam component;

[0025] When the annotation type of the second beam in-situ annotation is the beam surface span head, a second layout position is determined on a straight line passing through the center point of the span head area and perpendicular to the center line of the target beam component; wherein the second layout position is located above the target beam component and a second preset distance away from the target beam component;

[0026] When the annotation type of the in-situ annotation of the second beam is mid-span of the beam surface, a third arrangement position is determined on a straight line passing through the center point of the mid-span area and perpendicular to the center line of the target beam component; wherein the third arrangement position is located above the target beam component and a second preset distance away from the target beam component;

[0027] When the annotation type of the in-situ annotation of the second beam is the span tail of the beam surface, a fourth layout position is determined on a straight line passing through the center point of the span tail area and perpendicular to the center line of the target beam component; wherein the fourth layout position is located above the target beam component and is a second preset distance away from the target beam component.

[0028] Optionally, determining the layout position according to the position information of the target beam component and the marking type of the in-situ marking of the second beam includes:

[0029] For a vertically placed target beam component, when the annotation type of the second beam in-situ annotation is beam bottom, a first layout position is determined on a straight line passing through the center point of the target beam component and perpendicular to the center line of the target beam component; wherein the first layout position is located to the right of the target beam component and a first preset distance away from the target beam component;

[0030] When the annotation type of the second beam in-situ annotation is the beam span head, a second layout position is determined on a straight line passing through the center point of the span head area and perpendicular to the center line of the target beam component; wherein the second layout position is located on the left side of the target beam component and is a second preset distance away from the target beam component;

[0031] When the annotation type of the in-situ annotation of the second beam is mid-span of the beam surface, a third arrangement position is determined on a straight line passing through the center point of the mid-span area and perpendicular to the center line of the target beam component; wherein the third arrangement position is located on the left side of the target beam component and is a second preset distance away from the target beam component;

[0032] When the annotation type of the in-situ annotation of the second beam is the span tail of the beam surface, a fourth layout position is determined on a straight line passing through the center point of the span tail area and perpendicular to the center line of the target beam component; wherein the fourth layout position is located on the left side of the target beam component and is a second preset distance away from the target beam component.

[0033] In order to achieve the above object, the present invention further provides a device for switching in-situ marking of beams, the device comprising:

[0034] A receiving module, configured to receive a switching instruction for switching the in-situ marking of a first beam in a building drawing to the in-situ marking of a second beam;

[0035] a determination module, configured to determine, from the building drawing according to the switching instruction, the target beam component to which the second beam in-situ annotation belongs and to determine the annotation type of the second beam in-situ annotation;

[0036] a screening module, configured to screen target attribute information corresponding to the annotation type of the second beam in-situ annotation from all attribute information of the target beam component to form the second beam in-situ annotation;

[0037] a processing module, configured to determine a layout position according to the position information of the target beam component and the marking type of the in-situ marking of the second beam;

[0038] A placement module is configured to place the second beam in-situ marking at the placement position to replace the first beam in-situ marking.

[0039] In order to achieve the above-mentioned purpose, the present invention also provides a computer device, which specifically includes: a memory, a processor, and a computer program stored in the memory and executable on the processor. When the processor executes the computer program, the steps of the method for switching beam in-situ marking introduced above are implemented.

[0040] In order to achieve the above-mentioned object, the present invention also provides a computer-readable storage medium having a computer program stored thereon, which, when executed by a processor, implements the steps of the above-mentioned method for switching in-situ marking of beams.

[0041] The method, device, equipment and readable storage medium for switching beam in-situ marking provided by the present invention can switch the original beam in-situ marking to a new beam in-situ marking according to the user's operation on the original beam in-situ marking, and automatically determine the marking type, marking content and marking position of the new beam in-situ marking according to the user's operation, so as to facilitate the automatic generation of beam in-situ marking in the beam reinforcement plan drawing according to the three-dimensional beam component in the later stage. The present invention generates beam in-situ marking in the two-dimensional beam reinforcement plan drawing for three-dimensional beam components, and effectively solves the problem of how to realize the automatic switching of beam surface in-situ marking and beam bottom in-situ marking according to user operation. The present invention improves the efficiency and accuracy of beam in-situ label switching, and also enhances the user interaction experience. BRIEF DESCRIPTION OF THE DRAWINGS

[0042] Various other advantages and benefits will become apparent to those skilled in the art upon reading the detailed description of the preferred embodiment below. The accompanying drawings are for illustration purposes only and are not to be considered as limiting the present invention. The same reference symbols are used throughout the drawings to represent the same components. In the drawings:

[0043] Figure 1 A schematic diagram of an optional flow chart of the method for switching beam in-situ marking provided in Example 1;

[0044] FIG2( a ) is a schematic diagram of in-situ marking of a beam surface of a horizontally placed beam member provided in Example 1;

[0045] FIG2( b ) is a schematic diagram of in-situ marking of a beam surface of a vertically placed beam member provided in Example 1;

[0046] FIG3( a ) is a schematic diagram of in-situ marking of the bottom of a horizontally placed beam member provided in Example 1;

[0047] FIG3( b ) is a schematic diagram of in-situ marking of the bottom of a vertically placed beam member provided in Example 1;

[0048] Figure 4 A schematic diagram of each beam span region of the beam component provided in Example 1;

[0049] FIG5( a ) is a schematic diagram of in-situ marking of a beam before switching provided in Example 1;

[0050] FIG5( b ) is a schematic diagram of in-situ marking of the beam after switching provided in Example 1;

[0051] FIG6( a ) is another schematic diagram of the in-situ marking of the front beam before switching provided in Example 1;

[0052] FIG6( b ) is another schematic diagram of the in-situ marking of the beam after switching provided in Example 1;

[0053] Figure 7 A schematic diagram of an optional structural component of the device for in-situ marking of a switching beam provided in Example 2;

[0054] Figure 8 This is a schematic diagram of an optional hardware architecture of the computer device provided in Example 3. DETAILED DESCRIPTION

[0055] In order to make the purpose, technical solutions and advantages of the present invention more clearly understood, the present invention is further described in detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are only used to explain the present invention and are not intended to limit the present invention. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without making creative work are within the scope of protection of the present invention.

[0056] Example 1

[0057] The embodiment of the present invention provides a method for switching beam in-situ marking, such as Figure 1 As shown, the method specifically includes the following steps:

[0058] Step S101: receiving a switching instruction for switching a first beam in-situ marking in a building graphic to a second beam in-situ marking.

[0059] The building graphic includes beam components and column components, and also includes in-situ markings of beams; preferably, the building graphic is a three-dimensional BIM model diagram of a building, including a three-dimensional model of a beam.

[0060] Specifically, step S101 includes:

[0061] When a preset drag operation for the in-situ marking of the first beam is detected, a switching instruction is triggered; or,

[0062] When a preset click operation for the in-situ marking of the first beam is detected, a second type of switching instruction is triggered.

[0063] In this embodiment, two scenarios of switching beam in-situ annotation are involved. The first scenario is: when a user drags a first beam in-situ annotation in a building graphic to the end position with a mouse, a second beam in-situ annotation is generated at the end position to replace the first beam in-situ annotation. The second scenario is: when a user clicks (or double-clicks) a first beam in-situ annotation in a building graphic with a mouse, the first beam in-situ annotation is switched to a second beam in-situ annotation of a different annotation type from the first beam in-situ annotation.

[0064] It should also be noted that beam in-situ annotation includes the following two major annotation types: beam surface and beam bottom. As shown in Figure 2(a) and Figure 2(b), the beam surface in-situ annotation is located above the horizontally placed beam component, or on the left side of the vertically placed beam component. The beam surface in-situ annotation is used to represent the reinforcement and dimension information of the upper part of the beam component; as shown in Figure 3(a) and Figure 3(b), the beam bottom in-situ annotation is located below the horizontally placed beam component, or on the right side of the vertically placed beam component. The beam bottom in-situ annotation is used to represent the reinforcement and dimension information of the lower part of the beam component; in the first scenario above, since the annotation type of the second beam in-situ annotation is determined according to the end position of the drag operation, in the first scenario above, the annotation type of the second beam in-situ annotation after switching can be either the beam surface or the beam bottom; but in the second scenario above, if the annotation type of the first beam in-situ annotation is the beam surface, the annotation type of the second beam in-situ annotation is the beam bottom, and vice versa.

[0065] Step S102: determining the target beam component to which the second beam in-situ annotation belongs from the building graphic according to the switching instruction and determining the annotation type of the second beam in-situ annotation.

[0066] Specifically, determining the target beam component to which the second beam in-situ annotation belongs from the building graphic according to the switching instruction includes:

[0067] For the type of switching instruction, obtaining the end position of the preset drag operation from the building graphic, and setting the beam component closest to the end position in the building graphic as the target beam component; or

[0068] For the second type of switching instructions, the beam component to which the first beam in-situ annotation belongs in the building graphic is set as the target beam component.

[0069] In this embodiment, for the first scenario (i.e., for a type of switching instruction), since the first beam in-situ annotation before the switching and the second beam in-situ annotation after the switching may belong to different beam components, the beam component closest to the end position is set as the target beam component to which the second beam in-situ annotation belongs according to the nearest principle. Preferably, in actual application, setting the beam component closest to the end position in the building graphic as the target beam component specifically includes:

[0070] Step A1: Expanding the outer bounding box of the first beam marked in situ outward according to a preset size to form a virtual bounding box;

[0071] Wherein, the outer bounding box is a text box for marking content;

[0072] Step A2: determining all candidate beam components that overlap with the virtual bounding box at the end position from the building graphic, and sequentially calculating the overlapping area between the outline bounding box of each candidate beam component and the virtual bounding box;

[0073] Step A3: taking the candidate beam component corresponding to the maximum overlapping area as the target beam component.

[0074] In addition, in this embodiment, for the second scenario mentioned above (i.e., for the second type of switching instructions), the in-situ marking of the first beam before the switching and the in-situ marking of the second beam after the switching belong to the same beam component, only the marking type is switched, so the beam component to which the in-situ marking of the first beam belongs is set as the target beam component to which the in-situ marking of the second beam belongs.

[0075] Furthermore, determining the marking type of the in-situ marking of the second beam specifically includes:

[0076] For the type of switching instruction, determining whether the end position is located below a horizontally placed target beam component, or whether the end position is located to the right of a vertically placed target beam component;

[0077] If yes, set the annotation type of the second beam in-situ annotation to beam bottom;

[0078] If not, the outer bounding box of the in-situ marking of the first beam is expanded outward according to the preset size to form a virtual bounding box, and the overlapping area of ​​the virtual bounding box at the end position and each beam span area of ​​the target beam component is calculated respectively, and the annotation type of the in-situ marking of the second beam is set to the beginning of the beam span, the middle of the beam span or the end of the beam span according to the beam span area corresponding to the maximum overlapping area; wherein the beam span area includes: the beginning of the span area, the middle of the span area and the end of the span area.

[0079] It should be noted that the beam surface can be further divided into the beginning of the beam surface span, the middle of the beam surface span and the end of the beam surface span, so in this embodiment, the annotation types include the following four types: the beginning of the beam surface span, the middle of the beam surface span, the end of the beam surface span and the beam surface; Figure 4 As shown, the beam component can be divided into three beam span areas: the span head area, the span middle area and the span tail area. The beam span area is divided according to the starting point and the end point of the beam component, for example: the 1 / 8 area on the starting point side is the span head area, the 1 / 8 area on the end point side is the span tail area, and the remaining middle 3 / 4 area is the span middle area; of course, in actual applications, the beam component can also be divided into the span head area, the span middle area and the span tail area according to other division markings, which are not limited here. Based on the above method, when the beam span area corresponding to the maximum overlap area is the span head area, the marking type of the second beam in-situ marking is set to the beam face span head; when the beam span area corresponding to the maximum overlap area is the span middle area, the marking type of the second beam in-situ marking is set to the beam face span middle; when the beam span area corresponding to the maximum overlap area is the span tail area, the marking type of the second beam in-situ marking is set to the beam face span tail. It should also be noted that in Figure 4 In the figure, the judgment point of each beam span area is the center point of each beam span area.

[0080] In addition to the above-described method of setting the annotation type of the in-situ annotation of the second beam according to the overlapping area between the virtual bounding box and each beam span region, this embodiment also provides another method of determining the annotation type of the in-situ annotation of the second beam:

[0081] When the target beam component is in a horizontal placement state in the building drawing, if the end position is below the target beam component, the annotation type of the second beam in-situ annotation is set to the beam bottom; if the end position is above the target beam component and the projection point of the end position to the target beam component is located in the span beginning area of ​​the target beam component, the annotation type of the second beam in-situ annotation is set to the beam face span beginning; if the end position is above the target beam component and the projection point of the end position to the target beam component is located in the mid-span area of ​​the target beam component, the annotation type of the second beam in-situ annotation is set to the beam face mid-span; if the end position is above the target beam component and the projection point of the end position to the target beam component is located in the span end area of ​​the target beam component, the annotation type of the second beam in-situ annotation is set to the beam face span end;

[0082] When the target beam component is in a vertical placement state in the building drawing, if the end position is located on the right side of the target beam component, the annotation type of the in-situ annotation of the second beam is set to the bottom of the beam; if the end position is located on the left side of the target beam component and the projection point of the end position to the target beam component is located in the span beginning area of ​​the target beam component, the annotation type of the in-situ annotation of the second beam is set to the span beginning of the beam surface; if the end position is located on the left side of the target beam component and the projection point of the end position to the target beam component is located in the mid-span area of ​​the target beam component, the annotation type of the in-situ annotation of the second beam is set to the mid-span of the beam surface; if the end position is located on the left side of the target beam component and the projection point of the end position to the target beam component is located in the span end area of ​​the target beam component, the annotation type of the in-situ annotation of the second beam is set to the span end of the beam surface.

[0083] Furthermore, determining the marking type of the in-situ marking of the second beam further includes:

[0084] For the second type of switching instructions, if the annotation type of the in-situ annotation of the first beam is the beginning of the beam span, the middle of the beam span, or the end of the beam span, the annotation type of the in-situ annotation of the second beam is set to the bottom of the beam;

[0085] If the annotation type of the in-situ annotation of the first beam is the beam bottom, the projection point of the center point of the in-situ annotation of the first beam to the target beam component is determined, and the annotation type of the in-situ annotation of the second beam is set to the beginning of the span, the middle of the span, or the end of the span according to the beam span area where the projection point is located; wherein the beam span area includes: the beginning of the span area, the middle of the span area, and the end of the span area.

[0086] For example, as shown in Figures 5(a) and 5(b), if the annotation type of the in-situ annotation of the first beam before switching is the beginning of the beam span, then the annotation type of the in-situ annotation of the second beam after switching is the bottom of the beam; for another example, as shown in Figures 6(a) and 6(b), if the annotation type of the in-situ annotation of the first beam before switching is the bottom of the beam, then the annotation type of the in-situ annotation of the second beam after switching is the mid-span of the beam.

[0087] Step S103: Filtering target attribute information corresponding to the annotation type of the second beam in-situ annotation from all attribute information of the target beam component to form the second beam in-situ annotation.

[0088] Specifically, step S103 includes:

[0089] When the in-situ marking type of the second beam is the beam surface span head, the reinforcement information of the span head area of ​​the target beam component is filtered out;

[0090] When the annotation type of the in-situ annotation of the second beam is the mid-span of the beam surface, the reinforcement information of the mid-span area of ​​the target beam component is filtered out;

[0091] When the annotation type of the in-situ annotation of the second beam is the span end of the beam surface, the reinforcement information of the span end area of ​​the target beam component is filtered out;

[0092] When the annotation type of the in-situ annotation of the second beam is beam bottom, at least one of the following is filtered out from all attribute information of the target beam component: cross-section information, bottom reinforcement information, stirrup information, waist reinforcement information, and beam top offset information.

[0093] In this embodiment, target attribute information is filtered out from all attribute information of the target beam component according to the standard type of the in-situ marking of the second beam to form the marking content of the in-situ marking of the second beam; for example, when the marking type of the in-situ marking of the second beam is the beam surface, the surface reinforcement information of the corresponding beam span (i.e., the first span surface reinforcement, the middle span surface reinforcement, and the last span surface reinforcement) can be obtained according to the end position of the dragging operation to form the marking content.

[0094] Step S104: determining a layout position according to the position information of the target beam component and the marking type of the in-situ marking of the second beam.

[0095] It should be noted that the arrangement position is the marked position of the second beam in situ.

[0096] Specifically, step S104 includes:

[0097] For a horizontally placed target beam component, when the annotation type of the second beam in-situ annotation is beam bottom, a first layout position is determined on a straight line passing through the center point of the target beam component and perpendicular to the center line of the target beam component; wherein the first layout position is located below the target beam component and a first preset distance from the target beam component;

[0098] When the annotation type of the second beam in-situ annotation is the beam surface span head, a second layout position is determined on a straight line passing through the center point of the span head area and perpendicular to the center line of the target beam component; wherein the second layout position is located above the target beam component and a second preset distance away from the target beam component;

[0099] When the annotation type of the in-situ annotation of the second beam is mid-span of the beam surface, a third arrangement position is determined on a straight line passing through the center point of the mid-span area and perpendicular to the center line of the target beam component; wherein the third arrangement position is located above the target beam component and a second preset distance away from the target beam component;

[0100] When the annotation type of the in-situ annotation of the second beam is the span tail of the beam surface, a fourth layout position is determined on a straight line passing through the center point of the span tail area and perpendicular to the center line of the target beam component; wherein the fourth layout position is located above the target beam component and is a second preset distance away from the target beam component.

[0101] Furthermore, step S104 further includes:

[0102] For a vertically placed target beam component, when the annotation type of the second beam in-situ annotation is beam bottom, a first layout position is determined on a straight line passing through the center point of the target beam component and perpendicular to the center line of the target beam component; wherein the first layout position is located to the right of the target beam component and a first preset distance away from the target beam component;

[0103] When the annotation type of the second beam in-situ annotation is the beam span head, a second layout position is determined on a straight line passing through the center point of the span head area and perpendicular to the center line of the target beam component; wherein the second layout position is located on the left side of the target beam component and is a second preset distance away from the target beam component;

[0104] When the annotation type of the in-situ annotation of the second beam is mid-span of the beam surface, a third arrangement position is determined on a straight line passing through the center point of the mid-span area and perpendicular to the center line of the target beam component; wherein the third arrangement position is located on the left side of the target beam component and is a second preset distance away from the target beam component;

[0105] When the annotation type of the in-situ annotation of the second beam is the span tail of the beam surface, a fourth layout position is determined on a straight line passing through the center point of the span tail area and perpendicular to the center line of the target beam component; wherein the fourth layout position is located on the left side of the target beam component and is a second preset distance away from the target beam component.

[0106] Step S105: arranging the second beam in-situ marking at the arrangement position to replace the first beam in-situ marking.

[0107] In this embodiment, for the first scenario described above, the label type, label content, and label position of the switched beam in-situ label can be automatically determined the moment the user completes the dragging operation, thereby efficiently, accurately, and automatically completing the switching and updating of the beam in-situ label, eliminating the need for the user to manually switch and update. In this embodiment, the annotation type and annotation content can be switched in conjunction with the change in the position of the beam in-situ label, thereby achieving seamless switching between the beam surface in-situ annotation and the beam bottom in-situ annotation. For the second scenario described above, the standard type and annotation position of the second beam in-situ annotation can be determined based on the annotation type and annotation position of the first beam in-situ annotation, and the standard content of the second beam in-situ annotation can be determined in conjunction with the dragging operation, thereby achieving seamless switching between the beam surface in-situ annotation and the beam bottom in-situ annotation when the user completes the clicking operation.

[0108] Furthermore, after step S105, the method further includes:

[0109] A beam reinforcement plan diagram is formed based on all beam components and all beam in-situ markings in the building drawing.

[0110] In this embodiment, since the method of steps S101 to S105 can generate in-situ beam annotations that meet design requirements in the architectural drawing according to the designer's wishes, the beam reinforcement plan can be efficiently and accurately generated based on the in-situ beam annotations in the architectural drawing in the later stage.

[0111] This embodiment can switch the original beam in-situ marking to a new beam in-situ marking based on the user's operation on the original beam in-situ marking, and automatically determine the marking type, marking content and marking position of the new beam in-situ marking based on the user's operation, so as to facilitate the automatic generation of the beam in-situ marking in the beam reinforcement plan diagram based on the beam three-dimensional component in the later stage. This embodiment generates the beam in-situ marking in the two-dimensional beam reinforcement plan diagram for the three-dimensional beam component, and effectively solves the problem of how to realize the automatic switching between the beam surface in-situ marking and the beam bottom in-situ marking based on the user's operation. This embodiment improves the efficiency and accuracy of the switching of the beam in-situ label, and also enhances the user's interactive experience.

[0112] Example 2

[0113] The embodiment of the present invention provides a device for switching beam in-situ marking, such as Figure 7 As shown, the device specifically includes the following components:

[0114] The receiving module 701 is configured to receive a switching instruction for switching the in-situ marking of a first beam in a building graphic to the in-situ marking of a second beam;

[0115] A determination module 702 is configured to determine, from the building drawing according to the switching instruction, the target beam component to which the second beam in-situ annotation belongs and determine the annotation type of the second beam in-situ annotation;

[0116] A screening module 703 is configured to screen target attribute information corresponding to the annotation type of the second beam in-situ annotation from all attribute information of the target beam component to form the second beam in-situ annotation;

[0117] A processing module 704 is configured to determine a layout position according to the position information of the target beam component and the marking type of the in-situ marking of the second beam;

[0118] The arrangement module 705 is configured to arrange the second beam in-situ marking at the arrangement position to replace the first beam in-situ marking.

[0119] Specifically, the receiving module 701 is used to:

[0120] When a preset drag operation for the in-situ marking of the first beam is detected, a switching instruction is triggered; or,

[0121] When a preset click operation for the in-situ marking of the first beam is detected, a second type of switching instruction is triggered.

[0122] Specifically, the determination module 702 is used to:

[0123] For the type of switching instruction, obtaining the end position of the preset drag operation from the building graphic, and setting the beam component closest to the end position in the building graphic as the target beam component; or

[0124] For the second type of switching instructions, the beam component to which the first beam in-situ annotation belongs in the building graphic is set as the target beam component.

[0125] Furthermore, the determination module 702 is further configured to:

[0126] For the type of switching instruction, determining whether the end position is located below a horizontally placed target beam component, or whether the end position is located to the right of a vertically placed target beam component;

[0127] If yes, set the annotation type of the second beam in-situ annotation to beam bottom;

[0128] If not, the outer bounding box of the in-situ marking of the first beam is expanded outward according to the preset size to form a virtual bounding box, and the overlapping area of ​​the virtual bounding box at the end position and each beam span area of ​​the target beam component is calculated respectively, and the annotation type of the in-situ marking of the second beam is set to the beginning of the beam span, the middle of the beam span or the end of the beam span according to the beam span area corresponding to the maximum overlapping area; wherein the beam span area includes: the beginning of the span area, the middle of the span area and the end of the span area.

[0129] Furthermore, the determination module 702 is further configured to:

[0130] For the second type of switching instructions, if the annotation type of the in-situ annotation of the first beam is the beginning of the beam span, the middle of the beam span, or the end of the beam span, the annotation type of the in-situ annotation of the second beam is set to the bottom of the beam;

[0131] If the annotation type of the in-situ annotation of the first beam is the bottom of the beam, the projection point of the center point of the in-situ annotation of the first beam to the target beam component is determined, and the annotation type of the in-situ annotation of the second beam is set to the beginning of the beam span, the middle of the beam span, or the end of the beam span according to the beam span area where the projection point is located.

[0132] Specifically, the processing module 704 is configured to:

[0133] For a horizontally placed target beam component, when the annotation type of the second beam in-situ annotation is beam bottom, a first layout position is determined on a straight line passing through the center point of the target beam component and perpendicular to the center line of the target beam component; wherein the first layout position is located below the target beam component and a first preset distance from the target beam component;

[0134] When the annotation type of the second beam in-situ annotation is the beam surface span head, a second layout position is determined on a straight line passing through the center point of the span head area and perpendicular to the center line of the target beam component; wherein the second layout position is located above the target beam component and a second preset distance away from the target beam component;

[0135] When the annotation type of the in-situ annotation of the second beam is mid-span of the beam surface, a third arrangement position is determined on a straight line passing through the center point of the mid-span area and perpendicular to the center line of the target beam component; wherein the third arrangement position is located above the target beam component and a second preset distance away from the target beam component;

[0136] When the annotation type of the in-situ annotation of the second beam is the span tail of the beam surface, a fourth layout position is determined on a straight line passing through the center point of the span tail area and perpendicular to the center line of the target beam component; wherein the fourth layout position is located above the target beam component and is a second preset distance away from the target beam component.

[0137] Furthermore, the processing module 704 is further configured to:

[0138] For a vertically placed target beam component, when the annotation type of the second beam in-situ annotation is beam bottom, a first layout position is determined on a straight line passing through the center point of the target beam component and perpendicular to the center line of the target beam component; wherein the first layout position is located to the right of the target beam component and a first preset distance away from the target beam component;

[0139] When the annotation type of the second beam in-situ annotation is the beam span head, a second layout position is determined on a straight line passing through the center point of the span head area and perpendicular to the center line of the target beam component; wherein the second layout position is located on the left side of the target beam component and is a second preset distance away from the target beam component;

[0140] When the annotation type of the in-situ annotation of the second beam is mid-span of the beam surface, a third arrangement position is determined on a straight line passing through the center point of the mid-span area and perpendicular to the center line of the target beam component; wherein the third arrangement position is located on the left side of the target beam component and is a second preset distance away from the target beam component;

[0141] When the annotation type of the in-situ annotation of the second beam is the span tail of the beam surface, a fourth layout position is determined on a straight line passing through the center point of the span tail area and perpendicular to the center line of the target beam component; wherein the fourth layout position is located on the left side of the target beam component and is a second preset distance away from the target beam component.

[0142] Example 3

[0143] This embodiment also provides a computer device, such as a smart phone, tablet computer, laptop computer, desktop computer, rack server, blade server, tower server or cabinet server (including an independent server or a server cluster composed of multiple servers) that can execute programs. Figure 8 As shown, the computer device 80 of this embodiment includes at least but not limited to: a memory 801 and a processor 802 that can be interconnected via a system bus. It should be noted that Figure 8 Only computer device 80 is shown having components 801 - 802 , but it should be understood that implementing all of the illustrated components is not a requirement, and greater or fewer components may alternatively be implemented.

[0144] In this embodiment, memory 801 (i.e., a readable storage medium) includes flash memory, a hard disk, a multimedia card, a card-type memory (e.g., SD or DX memory), random access memory (RAM), static random access memory (SRAM), read-only memory (ROM), electrically erasable programmable read-only memory (EEPROM), programmable read-only memory (PROM), magnetic storage, a magnetic disk, an optical disk, etc. In some embodiments, memory 801 may be an internal storage unit of computer device 80, such as the hard disk or internal memory of computer device 80. In other embodiments, memory 801 may also be an external storage device of computer device 80, such as a plug-in hard disk equipped on computer device 80, a smart media card (SMC), a secure digital (SD) card, a flash card, etc. Of course, memory 801 may also include both internal storage units and external storage devices of computer device 80. In this embodiment, memory 801 is generally used to store the operating system and various application software installed on computer device 80. In addition, memory 801 may also be used to temporarily store various types of data that have been output or are about to be output.

[0145] In some embodiments, the processor 802 may be a central processing unit (CPU), a controller, a microcontroller, a microprocessor, or other chips. The processor 802 is generally used to control the overall operation of the computer device 80.

[0146] Specifically, in this embodiment, the processor 802 is configured to execute a program of a method for switching in-situ marking of beams stored in the memory 801. When the program of the method for switching in-situ marking of beams is executed, the following steps are implemented:

[0147] receiving a switching instruction for switching the in-situ marking of a first beam in a building drawing to the in-situ marking of a second beam;

[0148] Determining, from the building drawing according to the switching instruction, a target beam component to which the second beam in-situ annotation belongs and determining a annotation type of the second beam in-situ annotation;

[0149] Filtering target attribute information corresponding to the annotation type of the second beam in-situ annotation from all attribute information of the target beam component to form the second beam in-situ annotation;

[0150] Determining a layout position according to the position information of the target beam component and the marking type of the in-situ marking of the second beam;

[0151] The second beam in-situ annotation is arranged at the arrangement position to replace the first beam in-situ annotation.

[0152] The specific implementation process of the above method steps can be found in Example 1, and this embodiment will not be repeated here.

[0153] Example 4

[0154] This embodiment further provides a computer-readable storage medium, such as a flash memory, a hard disk, a multimedia card, a card-type memory (e.g., an SD or DX memory), a random access memory (RAM), a static random access memory (SRAM), a read-only memory (ROM), an electrically erasable programmable read-only memory (EEPROM), a programmable read-only memory (PROM), a magnetic memory, a magnetic disk, an optical disk, a server, an App store, etc., on which a computer program is stored. When the computer program is executed by a processor, the following method steps are implemented:

[0155] receiving a switching instruction for switching the in-situ marking of a first beam in a building drawing to the in-situ marking of a second beam;

[0156] Determining, from the building drawing according to the switching instruction, a target beam component to which the second beam in-situ annotation belongs and determining a annotation type of the second beam in-situ annotation;

[0157] Filtering target attribute information corresponding to the annotation type of the second beam in-situ annotation from all attribute information of the target beam component to form the second beam in-situ annotation;

[0158] Determining a layout position according to the position information of the target beam component and the marking type of the in-situ marking of the second beam;

[0159] The second beam in-situ annotation is arranged at the arrangement position to replace the first beam in-situ annotation.

[0160] The specific implementation process of the above method steps can be found in Example 1, and this embodiment will not be repeated here.

[0161] It should be noted that, in this document, the terms "comprises," "includes," or any other variations thereof are intended to encompass non-exclusive inclusion, such that a process, method, article, or apparatus comprising a series of elements includes not only those elements but also other elements not explicitly listed, or elements inherent to such process, method, article, or apparatus. In the absence of further limitations, an element defined by the phrase "comprising a ..." does not exclude the presence of other identical elements in the process, method, article, or apparatus comprising the element.

[0162] The serial numbers of the above embodiments of the present invention are for description only and do not represent the advantages or disadvantages of the embodiments.

[0163] Through the description of the above implementation methods, those skilled in the art can clearly understand that the above embodiment methods can be implemented by means of software plus the necessary general hardware platform, and of course can also be implemented by hardware, but in many cases the former is a better implementation method.

[0164] The above are only preferred embodiments of the present invention and are not intended to limit the patent scope of the present invention. Any equivalent structure or equivalent process transformation made using the contents of the present invention description and drawings, or directly or indirectly applied in other related technical fields, are also included in the patent protection scope of the present invention.

Claims

1. A method for switching beam in-situ marking, characterized in that: The method comprises: receiving a switching instruction for switching the in-situ marking of a first beam in a building drawing to the in-situ marking of a second beam; Determining, from the building drawing according to the switching instruction, a target beam component to which the second beam in-situ annotation belongs and determining a annotation type of the second beam in-situ annotation; Filtering target attribute information corresponding to the annotation type of the second beam in-situ annotation from all attribute information of the target beam component to form the second beam in-situ annotation; Determining a layout position according to the position information of the target beam component and the marking type of the in-situ marking of the second beam; Arranging the second beam in-situ marking at the arrangement position to replace the first beam in-situ marking; The receiving of the switching instruction for switching the first beam in-situ marking in the building graphic to the second beam in-situ marking includes: When a preset click operation on the in-situ marking of the first beam is detected, a second type of switching instruction is triggered; The step of determining, from the building drawing according to the switching instruction, a target beam component to which the second beam in-situ annotation belongs and determining a annotation type of the second beam in-situ annotation includes: For the second type of switching instructions, the beam component to which the first beam in-situ annotation belongs in the building graphic is set as the target beam component; If the annotation type of the in-situ annotation of the first beam is the beginning of the beam span, the middle of the beam span, or the end of the beam span, the annotation type of the in-situ annotation of the second beam is set to the bottom of the beam; If the annotation type of the in-situ annotation of the first beam is the bottom of the beam, the projection point of the center point of the in-situ annotation of the first beam to the target beam component is determined, and the annotation type of the in-situ annotation of the second beam is set to the beginning of the beam span, the middle of the beam span, or the end of the beam span according to the beam span area where the projection point is located.

2. The method for in-situ marking of a switching beam according to claim 1, characterized in that: The receiving of a switching instruction for switching the first beam in-situ marking in the building drawing to the second beam in-situ marking includes: When a preset drag operation for the in-situ marking of the first beam is detected, a type of switching instruction is triggered.

3. The method for in-situ marking of a switching beam according to claim 2, characterized in that: The step of determining, from the building graphic according to the switching instruction, a target beam component to which the second beam in-situ annotation belongs includes: For the type of switching instruction, the end position of the preset drag operation is obtained from the building graphic, and the beam component closest to the end position in the building graphic is set as the target beam component.

4. The method for in-situ marking of a switching beam according to claim 3, characterized in that: The determining of the annotation type of the in-situ annotation of the second beam further includes: For the type of switching instruction, determining whether the end position is located below a horizontally placed target beam component, or whether the end position is located to the right of a vertically placed target beam component; If yes, set the annotation type of the second beam in-situ annotation to beam bottom; If not, the outer bounding box of the in-situ marking of the first beam is expanded outward according to the preset size to form a virtual bounding box, and the overlapping area of ​​the virtual bounding box at the end position and each beam span area of ​​the target beam component is calculated respectively, and the annotation type of the in-situ marking of the second beam is set to the beginning of the beam span, the middle of the beam span or the end of the beam span according to the beam span area corresponding to the maximum overlapping area; wherein the beam span area includes: the beginning of the span area, the middle of the span area and the end of the span area.

5. The method for in-situ marking of a switching beam according to claim 4, characterized in that: The determining of the layout position according to the position information of the target beam component and the marking type of the in-situ marking of the second beam includes: For a horizontally placed target beam component, when the annotation type of the second beam in-situ annotation is beam bottom, a first layout position is determined on a straight line passing through the center point of the target beam component and perpendicular to the center line of the target beam component; wherein the first layout position is located below the target beam component and a first preset distance from the target beam component; When the annotation type of the second beam in-situ annotation is the beam surface span head, a second layout position is determined on a straight line passing through the center point of the span head area and perpendicular to the center line of the target beam component; wherein the second layout position is located above the target beam component and a second preset distance away from the target beam component; When the annotation type of the in-situ annotation of the second beam is mid-span of the beam surface, a third arrangement position is determined on a straight line passing through the center point of the mid-span area and perpendicular to the center line of the target beam component; wherein the third arrangement position is located above the target beam component and a second preset distance away from the target beam component; When the annotation type of the in-situ annotation of the second beam is the span tail of the beam surface, a fourth layout position is determined on a straight line passing through the center point of the span tail area and perpendicular to the center line of the target beam component; wherein the fourth layout position is located above the target beam component and is a second preset distance away from the target beam component.

6. The method for in-situ marking of a switching beam according to claim 4, characterized in that: The determining of the layout position according to the position information of the target beam component and the marking type of the in-situ marking of the second beam includes: For a vertically placed target beam component, when the annotation type of the second beam in-situ annotation is beam bottom, a first layout position is determined on a straight line passing through the center point of the target beam component and perpendicular to the center line of the target beam component; wherein the first layout position is located to the right of the target beam component and a first preset distance away from the target beam component; When the annotation type of the second beam in-situ annotation is the beam span head, a second layout position is determined on a straight line passing through the center point of the span head area and perpendicular to the center line of the target beam component; wherein the second layout position is located on the left side of the target beam component and is a second preset distance away from the target beam component; When the annotation type of the in-situ annotation of the second beam is mid-span of the beam surface, a third arrangement position is determined on a straight line passing through the center point of the mid-span area and perpendicular to the center line of the target beam component; wherein the third arrangement position is located on the left side of the target beam component and is a second preset distance away from the target beam component; When the annotation type of the in-situ annotation of the second beam is the span tail of the beam surface, a fourth layout position is determined on a straight line passing through the center point of the span tail area and perpendicular to the center line of the target beam component; wherein the fourth layout position is located on the left side of the target beam component and is a second preset distance away from the target beam component.

7. A device for switching in-situ marking of beams, characterized in that: The device comprises: A receiving module, configured to receive a switching instruction for switching the in-situ marking of a first beam in a building drawing to the in-situ marking of a second beam; a determination module, configured to determine, from the building drawing according to the switching instruction, the target beam component to which the second beam in-situ annotation belongs and to determine the annotation type of the second beam in-situ annotation; a screening module, configured to screen target attribute information corresponding to the annotation type of the second beam in-situ annotation from all attribute information of the target beam component to form the second beam in-situ annotation; a processing module, configured to determine a layout position according to the position information of the target beam component and the marking type of the in-situ marking of the second beam; a placement module, configured to place the second beam in-situ marking at the placement position to replace the first beam in-situ marking; Wherein, the receiving module is used to: When a preset click operation on the in-situ marking of the first beam is detected, a second type of switching instruction is triggered; The determining module is configured to: For the second type of switching instructions, the beam component to which the first beam in-situ annotation belongs in the building graphic is set as the target beam component; If the annotation type of the in-situ annotation of the first beam is the beginning of the beam span, the middle of the beam span, or the end of the beam span, the annotation type of the in-situ annotation of the second beam is set to the bottom of the beam; If the annotation type of the in-situ annotation of the first beam is the bottom of the beam, the projection point of the center point of the in-situ annotation of the first beam to the target beam component is determined, and the annotation type of the in-situ annotation of the second beam is set to the beginning of the beam span, the middle of the beam span, or the end of the beam span according to the beam span area where the projection point is located.

8. A computer device, comprising: A memory, a processor, and a computer program stored in the memory and executable on the processor, wherein the processor implements the steps of the method according to any one of claims 1 to 6 when executing the computer program.

9. A computer-readable storage medium having a computer program stored thereon, characterized in that: When the computer program is executed by a processor, the steps of the method according to any one of claims 1 to 6 are implemented.

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