Touch sensor and image display device including the same

Abstract

The present invention relates to a touch sensor and an image display device including the touch sensor. The touch sensor includes: a first electrode layer, which includes a first main electrode and a first auxiliary electrode separated from the first main electrode; a second electrode layer, which includes a second main electrode and a second auxiliary electrode separated from the second main electrode; and an insulating layer, which is located between the first electrode layer and the second electrode layer and has a contact hole. In at least one of the first electrode layer and the second electrode layer, the line width of the electrode pattern area corresponding to the contact hole is larger than the contact hole.

Description

Technical Field

[0001] The present invention relates to a touch sensor and an image display device including the touch sensor. Background Art

[0002] Recently, with the development of information technology, various input devices are also being developed. Personal computers, portable transmission devices and other personal information processing devices use various input devices such as keyboards and mice to provide text and graphic processing.

[0003] However, with the rapid development of the information society, there is a problem that it is difficult to effectively drive products using only the keyboard and mouse as existing input devices. Therefore, there is an increasing demand for a device that is simple, has few erroneous operations, and that anyone can easily input information.

[0004] Furthermore, technologies related to input devices have moved beyond the level of satisfying general functions, with the focus shifting to high reliability, durability, innovation, design, and processing-related technologies. To achieve this, touch sensors have been developed as input devices that can easily input information such as text and graphics.

[0005] A touch sensor is an input device designed to be attached to or built into a display device (e.g., liquid crystal display (LCD), plasma display panel (PDP), organic light-emitting diode (OLED), active-matrix organic light-emitting diode (AMOLED)). It recognizes contact with the screen by an object, such as a finger or stylus, as an input signal. These touch sensors have recently become widely used in mobile devices such as mobile phones, portable multimedia players (PMPs), and smartphones. They are also being used in a wide range of industrial applications, including navigation devices, netbooks, notebooks, digital information devices (DIDs), desktop computers using operating systems that support touch input, Internet Protocol television (IPTV), cutting-edge fighter jets, tanks, and armored vehicles.

[0006] For example, as in Korean Patent Publication No. 10-2014-0092366, a touch screen panel in which a touch sensor is combined with various image display devices is being developed.

[0007] In addition, to detect user touch signals, a touch sensor can be implemented by arranging multiple electrodes made of conductive materials such as metal on a substrate. Existing touch sensors are manufactured by forming multiple drive electrodes and sense electrodes on the same layer, with one type of electrode directly connected and the other connected using a bridge electrode.

[0008] However, a touch sensor including a bridge electrode has a problem in which the bridge electrode is visually recognized by a user. To solve this problem, a touch sensor has been developed in which driving electrodes and sensing electrodes are formed on different layers to avoid using a bridge electrode.

[0009] Although touch sensors that do not use bridge electrodes can reduce the visibility caused by the bridge electrodes, since the drive electrodes and sense electrodes are formed on different layers, there is the problem of users being able to visually recognize the electrode patterns due to the difference in optical refractive index. There is also the problem of increased thickness of the insulating layer formed between the electrode layers to minimize parasitic capacitance noise. In addition, when overlay characteristics are poor due to factors such as inconsistent alignment, reliability issues may arise due to damage to the lower substrate or electrodes during processing.

[0010] Therefore, there is an increasing demand for an ultra-thin touch sensor that improves the visibility problem of the bridge electrode while having invisible electrode patterns, minimizing parasitic capacitance noise, improving device reliability, and minimizing the thickness of the insulating layer.

[0011] [Prior art literature]

[0012] [Patent Document]

[0013] (Patent Document 1) Korean Patent Publication No. 10-2014-0092366 Summary of the Invention

[0014] Technical issues

[0015] An object of the present invention is to provide a touch sensor with improved visibility of bridge electrodes.

[0016] Another object of the present invention is to provide a touch sensor with improved electrode pattern visibility.

[0017] Yet another object of the present invention is to provide a touch sensor with improved parasitic capacitance noise characteristics.

[0018] Yet another object of the present invention is to provide a touch sensor having improved electrode channel resistance characteristics.

[0019] Yet another object of the present invention is to provide a touch sensor with improved device reliability.

[0020] Another object of the present invention is to provide an ultra-thin touch sensor that minimizes the thickness of an insulating layer.

[0021] Another object of the present invention is to provide an image display device including the touch sensor.

[0022] Technical Solution

[0023] The present invention provides a touch sensor, comprising: a first electrode layer, which includes a first main electrode and a first auxiliary electrode separated from the first main electrode; a second electrode layer, which includes a second main electrode and a second auxiliary electrode separated from the second main electrode; and an insulating layer, which is located between the first electrode layer and the second electrode layer and has a contact hole, and in at least one of the first electrode layer and the second electrode layer, the line width of the electrode pattern area corresponding to the contact hole is larger than the contact hole.

[0024] According to the first aspect of the present invention, the line width of the electrode pattern region not corresponding to the contact hole may be smaller than or equal to the contact hole.

[0025] According to the second aspect of the present invention, the line width of the electrode pattern region corresponding to the contact hole may be 10 μm to 30 μm greater than that of the contact hole.

[0026] According to the third aspect of the present invention, the line width of the electrode pattern region corresponding to the contact hole may be 35 μm to 85 μm.

[0027] According to the fourth aspect of the present invention, the critical dimension of the contact hole may be 25 μm to 55 μm in the line width direction of the corresponding electrode pattern region.

[0028] According to the fifth aspect of the present invention, the contact hole can be used to electrically connect at least one of: the first main electrode and the second auxiliary electrode facing the first main electrode; and the second main electrode and the first auxiliary electrode facing the second main electrode.

[0029] According to the sixth aspect of the present invention, the first main electrode may include a first main electrode unit pattern connected as a whole by a first main electrode connecting portion, the first auxiliary electrode may include a first auxiliary electrode unit pattern connected as a whole by a first auxiliary electrode connecting portion, the second main electrode may include a second main electrode unit pattern connected as a whole by a second main electrode connecting portion, and the second auxiliary electrode may include a second auxiliary electrode unit pattern connected as a whole by a second auxiliary electrode connecting portion.

[0030] According to the seventh aspect of the present invention, the contact hole can be formed at at least one of the following points: the point where the first main electrode connection portion and the second auxiliary electrode connection portion facing the first main electrode connection portion intersect in the planar direction; and the point where the second main electrode connection portion and the first auxiliary electrode connection portion facing the second main electrode connection portion intersect in the planar direction.

[0031] According to the eighth aspect of the present invention, the first main electrode unit pattern can overlap with the second opening defined by multiple adjacent second auxiliary electrode unit patterns in the planar direction, the first auxiliary electrode unit pattern can overlap with the second hole defined by multiple adjacent second main electrode unit patterns in the planar direction, the second main electrode unit pattern can overlap with the first opening defined by multiple adjacent first auxiliary electrode unit patterns in the planar direction, and the second auxiliary electrode unit pattern can overlap with the first hole defined by multiple adjacent first main electrode unit patterns in the planar direction.

[0032] According to a ninth aspect of the present invention, the first electrode layer and the second electrode layer may include a mesh pattern.

[0033] According to the tenth aspect of the present invention, the first main electrode may include a first connection portion connecting the first main electrode in a row direction, and the second main electrode may include a second connection portion connecting the second main electrode in a column direction.

[0034] According to an eleventh aspect of the present invention, the first electrode layer may include a first dummy electrode spaced apart from the first main electrode and the first auxiliary electrode, and the second electrode layer may include a second dummy electrode spaced apart from the second main electrode and the second auxiliary electrode.

[0035] According to a twelfth aspect of the present invention, the first dummy electrode may include a first dummy electrode unit pattern, and the second dummy electrode may include a second dummy electrode unit pattern.

[0036] According to the thirteenth aspect of the present invention, the first dummy electrode unit pattern can overlap with the second gaps defined by multiple adjacent second dummy electrode unit patterns in the planar direction, and the second dummy electrode unit pattern can overlap with the first gaps defined by multiple adjacent first dummy electrode unit patterns in the planar direction.

[0037] Furthermore, the present invention provides an image display device including a display panel and the above touch sensor stacked on the display panel.

[0038] Effects of the Invention

[0039] The touch sensor according to the present invention can eliminate the bridge electrode by forming the driving electrode and the sensing electrode on different layers, and thus can further improve the visibility characteristics caused by the bridge electrode compared to the existing touch sensor.

[0040] In addition, the touch sensor according to the present invention reduces the optical refractive index difference between electrodes by using a microelectrode pattern arranged at a spatial frequency using a high-frequency component, and thus can further improve the visibility of the electrode pattern compared to the existing touch sensor.

[0041] Furthermore, the touch sensor according to the present invention can further improve parasitic capacitance noise characteristics compared to existing touch sensors by minimizing overlap between electrodes and forming contact holes in an insulating layer.

[0042] Furthermore, the touch sensor according to the present invention can further improve electrode channel resistance characteristics compared to conventional touch sensors by forming contact holes in the insulating layer.

[0043] In addition, the touch sensor according to the present invention can further improve device reliability compared with existing touch sensors by providing a line width margin in the electrode pattern area corresponding to the area where the contact hole is formed and preventing damage to the lower substrate or electrodes due to misalignment and the like.

[0044] Furthermore, the touch sensor according to the present invention can realize an ultra-thin touch sensor by minimizing the thickness of the insulating layer compared to the conventional touch sensor. BRIEF DESCRIPTION OF THE DRAWINGS

[0045] Figures 1A to 1D FIG. 1 is a schematic plan view showing a first electrode layer according to an embodiment of the present invention.

[0046] Figures 2A to 2D FIG. 1 is a schematic plan view showing a second electrode layer according to an embodiment of the present invention.

[0047] Figure 3 FIG. 1 is a schematic plan view illustrating an insulating layer in which a contact hole is formed according to an embodiment of the present invention.

[0048] Figure 4 FIG. 1 is a schematic plan view showing a touch sensor according to an embodiment of the present invention.

[0049] Figure 5 yes Figure 4 Magnified view of area S1.

[0050] Figure 6 is a schematic plan view showing a touch sensor according to another embodiment of the present invention.

[0051] Figure 7 yes Figure 6 Magnified view of area S2.

[0052] Figure 8A and Figure 8B It is along Figure 5 and Figure 7 Schematic cross-sectional view taken along lines AA' and BB'.

[0053] Figure 9 is a schematic plan view showing a touch sensor according to a comparative example of the present invention.

[0054] Figure 10 yes Figure 9 Magnified view of area S3.

[0055] Figure 11 is a schematic plan view showing a touch sensor according to another comparative example of the present invention.

[0056] Figure 12 yes Figure 11 Magnified view of area S4.

[0057] Figure 13A and Figure 13B It is along Figure 10 and Figure 12 Schematic cross-sectional view taken along lines CC' and DD'.

[0058] [Explanation of Reference Numerals]

[0059] 10: Basal layer

[0060] 20: First main electrode unit pattern

[0061] 21: First hole

[0062] 22: First main electrode connection portion

[0063] 23: First connection

[0064] 30: First auxiliary electrode unit pattern

[0065] 31: First Bite

[0066] 32: First auxiliary electrode connection portion

[0067] 40: First dummy electrode unit pattern

[0068] 41: First Gap

[0069] 50: Insulation layer

[0070] 60: Second main electrode unit pattern

[0071] 61: Second hole

[0072] 62: Second main electrode connection portion

[0073] 63: Second connection

[0074] 70: Second auxiliary electrode unit pattern

[0075] 71: Second bite

[0076] 72: Second auxiliary electrode connection portion

[0077] 80: Second dummy electrode unit pattern

[0078] 81: The Second Gap

[0079] 90: Contact hole DETAILED DESCRIPTION

[0080] The present invention relates to a touch sensor and an image display device including the touch sensor. The touch sensor solves the visibility problem caused by a bridge electrode by forming a first electrode layer and a second electrode layer on different layers with an insulating layer interposed therebetween, improves parasitic capacitance noise and electrode channel resistance characteristics by forming contact holes in the insulating layer, and prevents device reliability degradation due to alignment misalignment and other reasons by providing a line width margin in the electrode pattern area corresponding to the area where the contact hole is formed. The invention also relates to a method for preventing device reliability degradation.

[0081] More specifically, the present invention provides a touch sensor comprising: a first electrode layer comprising a first main electrode and a first auxiliary electrode spaced apart from the first main electrode; a second electrode layer comprising a second main electrode and a second auxiliary electrode spaced apart from the second main electrode; and an insulating layer located between the first electrode layer and the second electrode layer and having a contact hole, wherein in at least one of the first electrode layer and the second electrode layer, the line width of the electrode pattern area corresponding to the contact hole is greater than the contact hole.

[0082] Hereinafter, embodiments of the present invention will be described in more detail with reference to the accompanying drawings. However, the following drawings attached to this specification illustrate preferred embodiments of the present invention and are used to help further understand the above content and technical concept of the present invention. Therefore, the present invention should not be interpreted as being limited to the contents recorded in these drawings.

[0083] The terms used in this specification are used to describe the embodiments and are not intended to limit the present invention. In this specification, a singular form encompasses a plural form unless otherwise specified in a sentence.

[0084] The terms "include" or "comprising" used in this specification do not exclude the presence or addition of at least one other component, step, operation and / or element other than the components, steps, operations and / or elements mentioned. The same reference numerals refer to the same components throughout the specification.

[0085] Spatially relative terms such as "lower," "lower surface," "lower side," "upper," "upper surface," and "upper side" may be used to facilitate describing the relative relationship between one element or component and another element or component as shown in the figures. Spatially relative terms should be understood to include terms that refer to opposite directions of the elements when in use or operation, in addition to the directions shown in the figures. For example, when the elements shown in the figures are turned over, an element described as "below" or "on the lower side" of another element may be located "above" the other element. Thus, the exemplary term "lower" may include both downward and upward directions. Elements may also be oriented in other directions, so spatially relative terms may be interpreted based on orientation.

[0086] The “planar direction” used in this specification may be interpreted as a direction orthogonal to the first electrode layer, the second electrode layer, and / or the insulating layer, that is, a direction viewed from the user's visual recognition side.

[0087] <Touch Sensor>

[0088] Figures 1A to 1D is a schematic plan view showing a first electrode layer according to an embodiment of the present invention, Figures 2A to 2D is a schematic plan view showing a second electrode layer according to an embodiment of the present invention, Figure 3 is a schematic plan view showing an insulating layer having contact holes formed therein according to an embodiment of the present invention, Figure 4 is a schematic plan view showing a touch sensor according to an embodiment of the present invention, Figure 5 yes Figure 4 Magnified view of the S1 region.

[0089] Figure 6 is a schematic plan view showing a touch sensor according to another embodiment of the present invention, Figure 7 yes Figure 6 Magnified view of area S2. Figure 8A and Figure 8B It is along Figure 5 and Figure 7 Schematic cross-sectional view taken along lines AA' and BB'.

[0090] Reference Figures 1A to 8B The touch sensor of the present invention may include a first electrode layer and a second electrode layer provided on a base layer 10. The first electrode layer and the second electrode layer may be spaced apart from each other in the thickness direction via an interlayer insulating layer 50. The first electrode layer and the second electrode layer may be electrically connected via a contact hole 90 formed in a portion of the insulating layer 50.

[0091] The base layer 10 is not particularly limited as long as it can be used to structurally support the electrode layer or the insulating layer 50, and may include a thin film substrate. In at least one embodiment, the base layer 10 includes: glass; a polymer such as cycloolefin polymer (COP), polyethylene terephthalate (PET), polyacrylate (PAR), polyetherimide (PEI), polyethylene naphthalate (PEN), polyphenylene sulfide (PPS), polyarylate, polyimide (PI), cellulose acetate propionate (CAP), polyethersulfone (PES), cellulose triacetate (TAC), polycarbonate (PC), cyclic olefin copolymer (COC), polymethyl methacrylate (PMMA); and / or an inorganic insulating material such as silicon oxide, silicon nitride, silicon oxynitride, or a metal oxide.

[0092] The layer or film member of the image display device may be provided as the base layer 10 of the touch sensor. In at least one embodiment, the base layer 10 may be provided as an encapsulation layer or a passivation layer included in the display panel.

[0093] The first electrode layer includes a first main electrode and a first auxiliary electrode. In one embodiment, the first electrode layer may include a first main electrode unit pattern 20 constituting the first main electrode and a first main electrode connecting portion 22 for connecting the first main electrode unit pattern 20, as well as a first auxiliary electrode unit pattern 30 constituting the first auxiliary electrode and a first auxiliary electrode connecting portion 32 for connecting the first auxiliary electrode unit pattern 30. In another embodiment, the first main electrode and the first auxiliary electrode may be formed to include a mesh pattern. The first electrode layer may be formed on the upper surface of the base layer 10. The construction and structure of the first electrode layer will be described in more detail below with reference to the following drawings.

[0094] The insulating layer 50 may be formed on the base layer 10 to cover the first electrode layer. The insulating layer 50 is not particularly limited as long as it serves to electrically insulate the first and second electrode layers. In at least one embodiment, the insulating layer 50 may comprise an organic insulating material such as an epoxy resin, an acrylic resin, a siloxane resin, or a polyimide resin, and / or an inorganic insulating material such as silicon oxide or silicon nitride.

[0095] The second electrode layer includes a second main electrode and a second auxiliary electrode. In one embodiment, the second electrode layer may include a second main electrode unit pattern 60 constituting the second main electrode and a second main electrode connecting portion 62 for connecting the second main electrode unit pattern 60, as well as a second auxiliary electrode unit pattern 70 constituting the second auxiliary electrode and a second auxiliary electrode connecting portion 72 for connecting the second auxiliary electrode unit pattern 70. In another embodiment, the second main electrode and the second auxiliary electrode may be formed to include a mesh pattern. The second electrode layer may be formed on the upper surface of the insulating layer 50. The construction and structure of the second electrode layer will be described in more detail below with reference to the following drawings.

[0096] A contact hole 90 may be formed in a portion of the insulating layer 50 to electrically connect the first electrode layer and the second electrode layer, specifically, to electrically connect the first main electrode and the second auxiliary electrode facing the first main electrode, and / or to electrically connect the second main electrode and the first auxiliary electrode facing the second main electrode. The configuration and structure of the contact hole will be described in more detail below with reference to the following drawings.

[0097] In one embodiment, the first electrode layer and the second electrode layer may be formed to include a transparent conductive oxide. The transparent conductive oxide may include, for example, at least one selected from the group consisting of indium tin oxide (ITO), indium zinc oxide (IZO), zinc oxide (ZnO), indium zinc tin oxide (IZTO), and cadmium tin oxide (CTO).

[0098] In some embodiments, the first electrode layer and the second electrode layer may be formed to include a metal. As the metal, for example, at least one selected from the group consisting of silver (Ag), gold (Au), copper (Cu), aluminum (Al), platinum (Pt), palladium (Pd), chromium (Cr), titanium (Ti), tungsten (W), niobium (Nb), tantalum (Ta), vanadium (V), iron (Fe), manganese (Mn), cobalt (Co), nickel (Ni), zinc (Zn), tin (Sn), molybdenum (Mo), calcium (Ca), and alloys thereof (e.g., silver-palladium-copper (APC)).

[0099] In some embodiments, the first electrode layer and the second electrode layer may include a stacked structure of a transparent conductive oxide layer and a metal layer. For example, the first electrode layer and the second electrode layer may each have a three-layer structure of a transparent conductive oxide layer, a metal layer, and a transparent conductive oxide layer. In this case, the metal layer can improve flexibility while reducing resistance to increase signal transmission speed, while the transparent conductive oxide layer can improve corrosion resistance and transparency.

[0100] In some embodiments, the first electrode layer and the second electrode layer can each be formed to include a mesh-shaped metal electrode pattern. When the first and second electrode layers are formed by including a mesh-shaped metal electrode pattern, the resistance between electrodes or between electrodes and wiring can be reduced to improve the conductivity and detection strength of the touch sensor, and the flexibility can be further improved.

[0101] A passivation layer covering the second electrode layer may be formed on the insulating layer 50. The passivation layer is not particularly limited as long as it can protect the electrode layer and the insulating film from external influences. In at least one embodiment, the passivation layer may include an organic insulating material such as epoxy resin, acrylic resin, siloxane resin, polyimide resin, or an inorganic insulating material such as silicon oxide or silicon nitride.

[0102] Figure 1A FIG. 1 is a plan view showing a first main electrode separated from another embodiment of the present invention. Figure 1B FIG. 1 is a plan view showing a first auxiliary electrode separated from another embodiment of the present invention. Figure 1C FIG. 1 is a plan view showing a first dummy electrode separated from another embodiment of the present invention. Figure 1D It is shown at the same time Figures 1A to 1C Floor plan.

[0103] Reference Figure 1A , the first main electrode may be formed on the base layer 10 .

[0104] In one embodiment, the first main electrode may include a plurality of first main electrode unit patterns 20 having a polygonal pattern shape such as a rhombus and repeating regularly. In some embodiments, the first main electrode unit pattern 20 may have a shape similar to that of the second opening 71 (see Figure 2B ) are substantially the same or similar in shape.

[0105] In one embodiment, a plurality of first main electrode unit patterns 20 may be arranged along a row direction, and first main electrode unit patterns 20 adjacent to each other along the row direction may be physically and electrically connected to the first main electrode unit pattern 20 provided at the first connection portion 23 .

[0106] In one embodiment, the plurality of first main electrode unit patterns 20 may form a first main electrode unit pattern row connected as a whole by the first connection portion 23 to extend along the row direction. The plurality of first main electrode unit pattern rows may be arranged along the column direction.

[0107] The first main electrode unit pattern 20 may be physically and electrically connected to adjacent first main electrode unit patterns 20 through the first main electrode extension portion 22 , and the first main electrode extension portion 22 may be formed integrally with the first main electrode unit pattern 20 .

[0108] The first main electrode may be formed to include a first hole 21. The first hole 21 may be defined as a through hole formed by arranging a plurality of adjacent first main electrode unit patterns 20, and the upper surface of the base layer 10 may be exposed through the first hole 21.

[0109] In one embodiment, the first holes 21 may have a polygonal shape, such as a substantially rhombus shape, and may be regularly repeated. The first holes 21 may also be formed in the first connection portion 23 .

[0110] Reference Figure 1B , the first auxiliary electrode may be formed on the base layer 10 .

[0111] According to an embodiment, the first auxiliary electrode may be formed on a portion of the upper surface of the base layer 10 where the first main electrode is not formed when viewed from a planar direction. The first auxiliary electrode may be formed around the first main electrode and may be spaced apart from the first main electrode.

[0112] In one embodiment, the first auxiliary electrode may include a plurality of first auxiliary electrode unit patterns 30 having a polygonal pattern shape such as a rhombus and regularly repeating. In one embodiment, the first auxiliary electrode unit pattern 30 may have a shape corresponding to the second hole 61 (see FIG. Figure 2A ) are substantially the same or similar in shape.

[0113] The first auxiliary electrode unit pattern 30 may be physically and electrically connected to an adjacent first auxiliary electrode unit pattern 30 through the first auxiliary electrode extension 32 , and the first auxiliary electrode extension 32 may be formed integrally with the first auxiliary electrode unit pattern 30 .

[0114] The first auxiliary electrode may be formed to include a first opening 31. The first opening 31 may be defined as a through hole formed by arranging a plurality of adjacent first auxiliary electrode unit patterns 30, and the upper surface of the base layer 10 may be exposed through the first opening 31.

[0115] In one embodiment, the first openings 31 may have a polygonal shape, such as a substantially diamond shape, and may be regularly repeated.

[0116] Reference Figure 1C , the first dummy electrode may be formed on the base layer 10 .

[0117] According to one embodiment, the first dummy electrode may be formed on a portion of the upper surface of the base layer 10 where the first main electrode and the first auxiliary electrode are not formed when viewed from a planar direction. The first dummy electrode may be formed around the first main electrode and the first auxiliary electrode and may be spaced apart from the first main electrode and the first auxiliary electrode.

[0118] In one embodiment, the first dummy electrode may include a plurality of first dummy electrode unit patterns 40 having a polygonal pattern shape such as a rhombus and repeating regularly. In one embodiment, the first dummy electrode unit pattern 40 may have a first dummy electrode unit pattern 40 having ... Figure 2C ) are substantially the same or similar in shape.

[0119] The first dummy electrode unit patterns 40 may have separate floating patterns or island pattern shapes, but are not limited thereto, and each pattern may also be connected to form a whole.

[0120] The first dummy electrode may be formed to include a first gap 41. The first gap 41 may be defined as a through hole formed by arranging a plurality of adjacent first dummy electrode unit patterns 40, and the upper surface of the base layer 10 may be exposed through the first gap 41. In one embodiment, the first gap 41 may be a through hole formed by three adjacent first dummy electrode unit patterns 40 and an adjacent first main electrode unit pattern 20 or first auxiliary electrode unit pattern 30.

[0121] In one embodiment, the first gap 41 may have a basic rhombus shape with at least one vertex open and may be regularly repeated, but is not limited thereto, and the first dummy electrode unit pattern formed integrally may have a polygonal shape such as a basic rhombus and may be regularly repeated.

[0122] Reference Figure 1D As described above, the first electrode layer may be formed to include the first main electrode, the first auxiliary electrode, and the first dummy electrode disposed on the upper surface of the base layer 10 .

[0123] like Figure 1D As shown, the first auxiliary electrode may be arranged to be spaced apart from the first main electrode, and the first dummy electrode may be arranged in the space to be adjacent to the first main electrode and the first auxiliary electrode.

[0124] Therefore, on the upper surface of the base layer 10, the electrode patterns, holes, openings and gaps can be arranged in a regularly repeated structure as a whole, and due to the repeated structure as described above, the arrangement structure can be uniformed as a whole with a spatial frequency including high-frequency components.

[0125] Figure 2Ais a plan view showing a second main electrode separated from another embodiment of the present invention. Figure 2B FIG. 1 is a plan view showing a second auxiliary electrode separated from another electrode according to an embodiment of the present invention. Figure 2C FIG. 1 is a plan view showing a second dummy electrode separated from another embodiment of the present invention. Figure 2D It is shown at the same time Figures 2A to 2C Floor plan.

[0126] Reference Figure 2A , the second main electrode may be formed on the insulating layer 50 .

[0127] In one embodiment, the second main electrode may include a plurality of second main electrode unit patterns 60 having a polygonal pattern shape such as a rhombus and repeating regularly. In some embodiments, the second main electrode unit pattern 60 may have a shape similar to that of the first opening 31 (see Figure 1B ) are substantially the same or similar in shape.

[0128] In one embodiment, a plurality of second main electrode unit patterns 60 may be arranged along a column direction, and second main electrode unit patterns 60 adjacent to each other along the column direction may be physically and electrically connected to the second main electrode unit pattern 60 provided at the second connection portion 63 .

[0129] In one embodiment, the plurality of second main electrode unit patterns 60 may be connected together by the second connection portion 63 to form a second main electrode unit pattern column extending along the column direction. The plurality of second main electrode unit pattern columns may be arranged along the row direction.

[0130] The second main electrode unit pattern 60 may be physically and electrically connected to the adjacent second main electrode unit pattern 60 through the second main electrode connecting portion 62 , and the second main electrode connecting portion 62 may be integrally formed with the second main electrode unit pattern 60 .

[0131] The second main electrode may be formed to include a second hole 61. The second hole 61 may be defined as a through-hole formed by arranging a plurality of adjacent second main electrode unit patterns 60, and the upper surface of the insulating layer 50 may be exposed through the second hole 61.

[0132] In one embodiment, the second holes 61 may have a polygonal shape, such as a substantially rhombus shape, and may be regularly repeated. The second holes 61 may also be formed in the second connecting portion 63 .

[0133] Reference Figure 2B , the second auxiliary electrode may be formed on the insulating layer 50 .

[0134] According to an embodiment, the second auxiliary electrode may be formed on a portion of the upper surface of the insulating layer 50 where the second main electrode is not formed when viewed from a planar direction. The second auxiliary electrode may be formed around the second main electrode and may be spaced apart from the second main electrode.

[0135] In one embodiment, the second auxiliary electrode may include a plurality of second auxiliary electrode unit patterns 70 having a polygonal pattern shape such as a rhombus and being regularly repeated. In one embodiment, the second auxiliary electrode unit pattern 70 may have a shape similar to that of the first hole 21 (see FIG. 2 ). Figure 1A ) are substantially the same or similar in shape.

[0136] The second auxiliary electrode unit pattern 70 may be physically and electrically connected to adjacent second auxiliary electrode unit patterns 70 through the second auxiliary electrode connecting portion 72 , and the second auxiliary electrode connecting portion 72 may be integrally formed with the second auxiliary electrode unit pattern 70 .

[0137] The second auxiliary electrode may be formed to include a second opening 71. The second opening 71 may be defined as a through-hole formed by arranging a plurality of adjacent second auxiliary electrode unit patterns 70, and the upper surface of the insulating layer 50 may be exposed through the second opening 71.

[0138] In one embodiment, the second openings 71 may have a polygonal shape, such as a substantially diamond shape, and may be regularly repeated.

[0139] Reference Figure 2C , a second dummy electrode may be formed on the insulating layer 50 .

[0140] According to one embodiment, the second dummy electrode may be formed on a portion of the upper surface of the insulating layer 50 where the second main electrode and the second auxiliary electrode are not formed when viewed from a planar direction. The second dummy electrode may be formed around the second main electrode and the second auxiliary electrode and may be spaced apart from the second main electrode and the second auxiliary electrode.

[0141] In one embodiment, the second dummy electrode may include a plurality of second dummy electrode unit patterns 80 having a polygonal pattern shape such as a rhombus and repeating regularly. In one embodiment, the second dummy electrode unit pattern 80 may have a shape similar to that of the first gap 41 (see FIG. 1 ). Figure 1C ) are substantially the same or similar in shape.

[0142] The second dummy electrode unit patterns 80 may have respective separated floating patterns or island pattern shapes, but are not limited thereto, and each pattern may be connected to form a whole.

[0143] The second dummy electrode may be formed to include a second gap 81. The second gap 81 may be defined as a through hole formed by arranging a plurality of adjacent second dummy electrode unit patterns 80, and the upper surface of the insulating layer 50 may be exposed through the second gap 81. In one embodiment, the second gap 81 is a through hole formed by three adjacent second dummy electrode unit patterns 80 and an adjacent second main electrode unit pattern 60 or second auxiliary electrode unit pattern 70.

[0144] In one embodiment, the second gap 81 may have a basic rhombus shape with at least one vertex open and may be regularly repeated, but is not limited thereto. The second dummy electrode unit pattern may have a polygonal shape such as a basic rhombus and may be regularly repeated by forming an integral pattern.

[0145] Reference Figure 2D As described above, the second electrode layer may be formed to include the second main electrode, the second auxiliary electrode, and the second dummy electrode disposed on the upper surface of the insulating layer 50 .

[0146] like Figure 2D As shown, the second auxiliary electrode may be arranged to be spaced apart from the second main electrode, and the second dummy electrode may be arranged in the space to be adjacent to the second main electrode and the second auxiliary electrode.

[0147] Therefore, on the upper surface of the insulating layer 50, the electrode patterns, holes, openings and gaps can be arranged in a regularly repeated structure as a whole, and due to the repeated structure as described above, uniformity can be achieved in an arrangement structure that presents a spatial frequency including high-frequency components.

[0148] Reference Figure 3 Among the contact holes 90 , two pairs of contact holes 90 for electrically connecting the first main electrode and the second auxiliary electrode and two pairs of contact holes 90 for electrically connecting the second main electrode and the first auxiliary electrode can be formed at positions closest to the first connection portion 23 and the second connection portion 63 .

[0149] In some embodiments, a pair of contact holes 90 for electrically connecting the first main electrode and the second auxiliary electrode and a pair of contact holes 90 for electrically connecting the second main electrode and the first auxiliary electrode among the contact holes 90 can be formed at a position closest to the first connection portion 23 and the second connection portion 63, and in other embodiments can be formed to be spaced a predetermined distance apart from the first connection portion 23 and the second connection portion 63.

[0150] Except for Figure 3In addition to that shown, the contact hole 90 can also be formed in various forms on the insulating layer 50. As long as the parasitic capacitance and the channel resistance can be minimized by electrically connecting the first main electrode and the second auxiliary electrode and electrically connecting the second main electrode and the first auxiliary electrode, the formation form of the contact hole 90 is not particularly limited, and it is preferred to form at least one contact hole 90.

[0151] In consideration of process economy, conductivity, and detection strength of the touch sensor, it is preferred to form contact holes 90 ( Figure 4 ).

[0152] In one embodiment, the shape of the contact hole 90 may be a square having a size of 30 μm×30 μm, but is not particularly limited as long as the first electrode layer and the second electrode layer can be electrically connected.

[0153] The contact hole 90 electrically connects the first electrode layer and the second electrode layer, specifically, by electrically connecting the first main electrode and the second auxiliary electrode and electrically connecting the second main electrode and the first auxiliary electrode so that the first main electrode and the second auxiliary electrode form the same potential and the second main electrode and the first auxiliary electrode form the same potential, thereby increasing the resistance of the electrode channel while allowing the generation of parasitic capacitance to be suppressed.

[0154] Figure 4 Specifically, in the plane direction Figure 1D The first electrode layer shown, Figure 2D The second electrode layer and Figure 3 The insulating layer 50 is shown in a plan view projected together.

[0155] Reference Figure 4 The second auxiliary electrode unit pattern 70 may overlap the first hole 21 formed inside the first main electrode in a planar direction. According to one embodiment, the second auxiliary electrode unit pattern 70 may be completely contained in the first hole 21 in a planar direction.

[0156] The second main electrode unit pattern 60 may overlap the first opening 31 formed inside the first auxiliary electrode in a planar direction. According to one embodiment, the second main electrode unit pattern 60 may be completely contained in the first opening 31 in a planar direction.

[0157] The first auxiliary electrode unit pattern 30 may overlap the second hole 61 formed inside the second main electrode in a planar direction. According to an embodiment, the first auxiliary electrode unit pattern 30 may be completely contained in the second hole 61 in a planar direction.

[0158] The first main electrode unit pattern 20 may overlap the second opening 71 formed inside the second auxiliary electrode in a planar direction. According to one embodiment, the first main electrode unit pattern 20 may be completely contained in the second opening 71 in a planar direction.

[0159] Furthermore, the first main electrode unit pattern 20 formed in the first connection portion 23 may overlap the second hole 61 formed inside the second connection portion 63 in a planar direction. According to one embodiment, the first main electrode unit pattern 20 may be completely contained in the second hole 61 in a planar direction.

[0160] The second main electrode unit pattern 60 formed in the second connection portion 63 may overlap the first hole 21 formed inside the first connection portion 23 in a planar direction. According to an embodiment, the second main electrode unit pattern 60 may be completely contained in the first hole 21 in a planar direction.

[0161] The first dummy electrode unit pattern 40 may overlap the second gap 81 formed inside the second dummy electrode in the planar direction. According to one embodiment, the first dummy electrode unit pattern 40 may be completely contained in the second gap 81 in the planar direction.

[0162] The second dummy electrode unit pattern 80 may overlap the first gap 41 formed inside the first dummy electrode in a planar direction. According to one embodiment, the second dummy electrode unit pattern 80 may be completely contained in the first gap 41 in a planar direction.

[0163] The contact holes 90 may be formed to include two pairs of contact holes 90 for electrically connecting the first main electrode and the second auxiliary electrode and two pairs of contact holes 90 for electrically connecting the second main electrode and the first auxiliary electrode.

[0164] Specifically, it may include: two pairs of contact holes 90 formed at the positions closest to the first connection portion 23 and the second connection portion 63 among the points where the first main electrode connection portion 22 for connecting multiple adjacent first main electrode unit patterns 20 along the column direction and the second auxiliary electrode connection portion 72 for connecting multiple adjacent second auxiliary electrode unit patterns 70 along the row direction intersect each other in the plane direction; and two pairs of contact holes 90 formed at the positions closest to the first connection portion 23 and the second connection portion 63 among the points where the second main electrode connection portion 62 for connecting multiple adjacent second main electrode unit patterns 60 along the row direction and the first auxiliary electrode connection portion 32 for connecting multiple adjacent first auxiliary electrode unit patterns 30 along the column direction intersect each other in the plane direction.

[0165] In one or more embodiments, the contact holes can be arranged at points where the connecting portions for connecting multiple adjacent first main electrode unit patterns along the row direction and the connecting portions for connecting multiple adjacent second auxiliary electrode unit patterns along the column direction intersect with each other in the planar direction; and / or at points where the connecting portions for connecting multiple adjacent second main electrode unit patterns along the column direction and the connecting portions for connecting multiple adjacent first auxiliary electrode unit patterns along the row direction intersect with each other in the planar direction, etc., but they do not have to be formed regularly, and there are no special restrictions as long as the parasitic capacitance and channel resistance can be minimized by electrically connecting the first main electrode and the second auxiliary electrode and electrically connecting the second main electrode and the first auxiliary electrode.

[0166] Reference Figure 6 , a touch sensor according to another embodiment of the present invention may include a first electrode layer and a second electrode layer including a mesh electrode pattern.

[0167] Each element included in the touch sensor according to another embodiment of the present invention may satisfy all of the aforementioned characteristics and may exhibit substantially the same characteristics.

[0168] Figure 9 is a schematic plan view showing a touch sensor according to a comparative example of the present invention, Figure 10 yes Figure 9 An enlarged view of region S3, Figure 11 is a schematic plan view showing a touch sensor according to another comparative example of the present invention, Figure 12 yes Figure 11 Magnified view of area S4. Figure 13A and Figure 13B It is along Figure 10 and Figure 12 Schematic cross-sectional view taken along lines CC' and DD'.

[0169] like Figures 9 to 13BAs shown, in a touch sensor according to a comparative example of the present invention, the line widths T5 and T6 of the electrode pattern region corresponding to the contact hole 90 may be the same as the critical dimensions (CD) T5 and T6 of the contact hole 90. In some comparative examples, the line width of the electrode pattern region corresponding to the contact hole may be smaller than the critical dimension (CD) of the contact hole.

[0170] If the line width of the electrode pattern area corresponding to the contact hole is smaller than the critical dimension (CD) of the contact hole, damage to the first electrode layer may occur during the patterning process of the second electrode layer, and device reliability may be degraded due to insufficient contact area. Figures 9 to 13B As shown, even when the line width of the electrode pattern region corresponding to the contact hole is the same as the critical dimension (CD) of the contact hole, the above-mentioned problem may occur due to misalignment.

[0171] Therefore, the technical feature of the present invention is that: in the first electrode layer and / or the second electrode layer, the line width of the electrode pattern region corresponding to the contact hole is larger than the critical dimension (CD) of the contact hole. Thus, by forming the line width of the electrode pattern region to be larger than the critical dimension (CD) of the contact hole, there is the advantage that even if there is some misalignment in alignment, the first electrode layer can be prevented from being damaged during the patterning process of the second electrode layer, and a sufficiently large contact area can be ensured, thereby maintaining device reliability.

[0172] Specifically, refer to Figure 5 、 Figure 7 、 Figure 8A and Figure 8B , the line widths T1 and T3 of the electrode pattern region corresponding to the contact hole 90 may be larger than the critical dimensions (CD) T2 and T4 of the contact hole 90 .

[0173] The electrode pattern region corresponding to the contact hole may be an electrode pattern region overlapping with the contact hole in a planar direction in the electrode pattern formed on the first electrode layer and / or the second electrode layer, and is preferably a connecting portion of the first electrode layer and / or the second electrode layer.

[0174] In one or more embodiments, the electrode pattern region corresponding to the contact hole may refer only to a portion of the connecting portion where the contact hole is formed that corresponds to the contact hole, or may refer to the connecting portion itself where the contact hole is formed.

[0175] For example, when referring only to a portion of the connecting portion where a contact hole is formed that corresponds to the contact hole, the portion of the connecting portion where the contact hole is formed that overlaps with the contact hole in the planar direction and the peripheral region can be formed to have a line width step difference. In this case, the electrode pattern region that does not correspond to the contact hole can refer to the aforementioned peripheral region.

[0176] For another example, when referring to a connecting portion where a contact hole is formed, the line width of the connecting portion where the contact hole is formed can be formed to be larger than the line width of other connecting portions where no contact hole is formed. In this case, the electrode pattern region not corresponding to the contact hole can refer to the other connecting portion.

[0177] However, the manner of forming the line width of the electrode pattern region to be larger than that of the contact hole is not limited thereto, and is not particularly limited as long as device reliability can be maintained by covering the entire contact hole even if there is some misalignment.

[0178] The critical dimension (CD) of the contact hole may refer to a maximum value among critical dimension (CD) values ​​measured in a line width direction of the electrode pattern.

[0179] For example, when the contact hole is square, the critical dimension (CD) may represent the square height; when the contact hole is rectangular, the critical dimension (CD) may represent the height in a direction parallel to the line width direction of the electrode pattern. When the contact hole is elliptical, the critical dimension (CD) may refer to the major axis diameter or minor axis diameter in a direction parallel to the line width direction of the electrode pattern.

[0180] The critical dimension (CD) of the contact hole is not particularly limited, but is preferably 25 μm to 55 μm in the line width direction of the electrode pattern area corresponding to the contact hole. In this case, not only can the parasitic capacitance generated by the electrical connection between the first electrode layer and the second electrode layer be reduced, but a sufficiently large contact area can also be ensured, thereby improving device reliability.

[0181] The line width of the electrode pattern region corresponding to the contact hole may refer to a maximum value among line width values ​​measured in a line width direction of the electrode pattern.

[0182] For example, in a connection portion where a contact hole is formed, when the partial area overlapping with the contact hole in the planar direction and the peripheral area are formed with a step difference in line width, the line width of the electrode pattern area corresponding to the contact hole refers to the maximum value of the values ​​measured along the line width direction of the partial area overlapping with the contact hole in the planar direction.

[0183] The line width of the electrode pattern area corresponding to the contact hole is preferably larger than the critical dimension (CD) of the contact hole, for example, preferably 35 μm to 85 μm. In this case, not only is the visibility of the electrode pattern not affected, but even if alignment misalignment occurs during the process, a sufficiently large contact area with the contact hole can be ensured, thereby preventing damage to the first electrode layer and improving device reliability.

[0184] In one embodiment, the line width of the electrode pattern region corresponding to the contact hole may be 10 μm to 30 μm larger than the line width of the contact hole. Specifically, the critical dimension (CD) of the contact hole along the line width direction subtracted from the line width of the electrode pattern region corresponding to the contact hole may be 10 μm to 30 μm. If the difference between the line width of the electrode pattern region corresponding to the contact hole and the critical dimension (CD) of the contact hole is less than 10 μm, it may become unstable due to dispersion during the process. If it exceeds 30 μm, it may be disadvantageous in terms of visibility.

[0185] Additionally, the electrode pattern region not corresponding to the contact hole may not be formed to have a line width greater than the contact hole, and in one or more embodiments may have a line width equal to or less than the critical dimension (CD) of the contact hole.

[0186] According to one embodiment of the present invention, a first electrode layer is formed on a base layer, an insulating layer including a contact hole is formed on the first electrode layer, and a second electrode layer is formed on the insulating layer, so that the first electrode layer and the second electrode layer are arranged on different layers with the insulating layer between them, and the first main electrode and the second auxiliary electrode are electrically connected, and the second main electrode and the first auxiliary electrode are electrically connected.

[0187] According to this embodiment of the present invention, the bridge electrode can be omitted, thereby improving the phenomenon that the bridge electrode is visible.

[0188] Furthermore, by arranging each electrode pattern and the hole, opening, or gap so as to overlap with each other in a planar direction, the phenomenon that the electrode is visible can be improved.

[0189] Specifically, the human visual perception characteristics represent the human's recognition (resolving) ability and contrast, which can be expressed as spatial frequency. Contrast refers to the intensity difference between the hue of one part of the image and the hue of another part. A strong contrast of an image means that the difference in light and dark levels of a particular image is greater than normal. In the visibility of the electrode pattern, as the contrast becomes larger, that is, the more obvious the intensity difference in hue, the resolution ability based on the human visual perception characteristics increases proportionally. That is, it can be seen that the contrast resolution ability based on the human visual perception characteristics cannot be expressed as a single function of spatial frequency, and the resolution ability decreases in the highest frequency region and the lowest frequency region of the spatial frequency.

[0190] By utilizing this characteristic, the present invention can improve the electrode visibility phenomenon by substantially removing pattern irregularities when the touch sensor is viewed in a planar direction and uniformizing the upper surface of the touch sensor using high-frequency components that cannot be visually recognized by the user.

[0191] Furthermore, by arranging each electrode pattern and the hole, opening, or gap so that they overlap, parasitic capacitance caused by the arrangement of the electrode layers in the thickness direction can be suppressed. Furthermore, by including contact holes in the insulating layer for electrically connecting the first and second electrode layers, parasitic capacitance and electrode channel resistance can be minimized compared to touch sensors that do not include contact holes, thereby enabling the realization of an ultra-thin touch sensor.

[0192] Furthermore, by forming the line width of the electrode pattern region corresponding to the region where the contact hole is formed to be larger than the contact hole, the occurrence rate of defects due to misalignment and the like that may occur during the process can be reduced.

[0193] In addition, although the shape of each electrode pattern, hole, opening, and gap is exemplified as a rhombus in this specification, it is not limited thereto and may be changed to another polygon such as a hexagon or a circle for use.

[0194] <Image Display Device>

[0195] The present invention provides an image display device including the touch sensor.

[0196] An image display device may include a display panel and the above-mentioned touch sensor coupled to the display panel.

[0197] The display panel may include a pixel electrode, a pixel defining film, a display layer, a counter electrode, an encapsulation layer, etc., which are arranged on a panel substrate.

[0198] A pixel circuit including a thin film transistor (TFT) may be formed on the panel substrate, and an insulating film may be formed to cover the pixel circuit. The pixel electrode may be electrically connected to the drain electrode of the TFT on the insulating film, for example.

[0199] A pixel definition film may be formed on the insulating film to expose the pixel electrode, thereby defining a pixel region. A display layer may be formed on the pixel electrode, and the display layer may include, for example, a liquid crystal layer or an organic light emitting layer.

[0200] A counter electrode may be provided on the pixel defining film and the display layer. The counter electrode may be, for example, a common electrode or cathode of the image display device. An encapsulation layer for protecting the display panel may be stacked on the counter electrode.

[0201] In some embodiments, the display panel and touch sensor can be coupled via an adhesive layer. For example, the adhesive layer can have a viscoelasticity of approximately 0.2 MPa or less at temperatures between -20°C and 80°C. This can shield noise from the display panel and reduce interfacial stress during bending, thereby preventing damage to the touch sensor. In one embodiment, the viscoelasticity can be approximately 0.01 MPa to 0.15 MPa.

[0202] The image display device can be inserted into or installed in an optical imaging device such as a VR device, and can essentially conceal the aforementioned pixel units and pixel circuits through a hole formed in the touch sensor. Therefore, only the desired image can be collected, edited, and converted through the optical imaging device.

[0203] Hereinafter, embodiments of the present invention will be described in detail. However, the present invention is not limited to the embodiments disclosed below, but can be implemented in a variety of different forms, and these embodiments are only intended to make the disclosure of the present invention more complete and help those skilled in the art to fully understand the scope of the present invention, and the present invention is limited only by the scope of the claims.

[0204] <Examples and Comparative Examples>

[0205] Example 1

[0206] Will include Figure 1D The first electrode layer of the same electrode pattern as shown is arranged on a PET substrate with a thickness of 40 μm. The minimum line width of the first electrode layer is designed to be 30 μm, and the line width of the electrode pattern area corresponding to the contact hole insulation film formation part is designed to be 40 μm. Then, an insulating layer with a thickness of 2 μm is applied to the PET substrate to cover the first electrode layer and to form a PET substrate with the same thickness as the first electrode layer. Figure 3 The same shape as shown is used to form a contact hole of 30 μm×30 μm. Next, a contact hole including Figure 2D A second electrode layer having the same electrode pattern as shown is formed. Then, a passivation layer covering the second electrode layer is formed on the insulating layer, thereby manufacturing the touch sensor of the first embodiment.

[0207] Comparative Example 1

[0208] like Figure 9 As shown, the touch sensor of Comparative Example 1 was manufactured using the same manufacturing method as that of Example 1, except that the line width of the electrode pattern region corresponding to the region where the contact hole is formed is the same as that of the contact hole.

[0209] <Experimental Example>

[0210] <Etching Evaluation and Electrical Characteristics Evaluation>

[0211] For the touch sensors of Example 1 and Comparative Example 1, after the second electrode layer was patterned, etching damage to the first electrode layer was evaluated. The evaluation results are shown in Table 1 below.

[0212] In addition, the resistance and capacitance characteristics of the touch sensors of Example 1 and Comparative Example 1 were evaluated using the Q3D simulator of Ansys. The evaluation results are shown in Table 1 below.

[0213] [Table 1]

[0214]

[0215] Referring to Table 1, it can be confirmed that: in the case of the touch sensor of Comparative Example 1, a defect rate of 70% was shown due to dispersion and misalignment of the pattern line width, but in the case of the touch sensor of Example 1, the defect rate during the process can be significantly improved by adjusting the line width of the electrode pattern area of ​​the contact hole formation portion.

[0216] In addition, it was confirmed that by only changing the line width of the electrode pattern area corresponding to the contact hole, there was no effect on the resistance and capacitance characteristics. Therefore, not only could the defect rate during the process be significantly improved, but the performance of the touch sensor could also be left unaffected.

Claims

1. A touch sensor comprising: a first electrode layer comprising a first main electrode and a first auxiliary electrode spaced apart from the first main electrode; a second electrode layer comprising a second main electrode and a second auxiliary electrode spaced apart from the second main electrode; as well as an insulating layer located between the first electrode layer and the second electrode layer and having a contact hole, wherein a critical dimension of the contact hole is 25 μm to 55 μm in a line width direction of a corresponding electrode pattern region, the critical dimension of the contact hole being a maximum value measured in a line width direction of the electrode pattern corresponding to the contact hole, and in at least one of the first electrode layer and the second electrode layer, a line width of the electrode pattern region corresponding to the contact hole is larger than the contact hole, The touch sensor does not include a bridging electrode. 2 . The touch sensor according to claim 1 , wherein a line width of an electrode pattern region not corresponding to the contact hole is smaller than or equal to that of the contact hole. 3 . The touch sensor according to claim 1 , wherein a line width of an electrode pattern region corresponding to the contact hole is larger than that of the contact hole by 10 μm to 30 μm. 4 . The touch sensor according to claim 1 , wherein a line width of an electrode pattern region corresponding to the contact hole is 35 μm to 85 μm.

5. The touch sensor according to claim 1 , wherein the contact hole is used to electrically connect at least one of the following: the first main electrode and the second auxiliary electrode facing the first main electrode; and the second main electrode and the first auxiliary electrode facing the second main electrode. The touch sensor according to claim 1 , wherein: The first main electrode includes first main electrode unit patterns connected into one by a first main electrode connecting portion. The first auxiliary electrode includes first auxiliary electrode unit patterns connected into one by a first auxiliary electrode connecting portion. The second main electrode includes second main electrode unit patterns connected into one by a second main electrode connecting portion, and The second auxiliary electrode includes second auxiliary electrode unit patterns connected as a whole by a second auxiliary electrode connecting portion.

7. The touch sensor according to claim 6, wherein the contact hole is formed at at least one of the following points: a point where the first main electrode connection portion and the second auxiliary electrode connection portion facing the first main electrode connection portion intersect in a planar direction; and A point where the second main electrode connection portion and the first auxiliary electrode connection portion facing the second main electrode connection portion intersect in a planar direction.

8. The touch sensor according to claim 6, wherein: The first main electrode unit pattern overlaps with a second opening defined by a plurality of adjacent second auxiliary electrode unit patterns in a planar direction; The first auxiliary electrode unit patterns respectively overlap with second holes defined by a plurality of adjacent second main electrode unit patterns in a planar direction; The second main electrode unit patterns overlap with first openings defined by a plurality of adjacent first auxiliary electrode unit patterns in a planar direction; The second auxiliary electrode unit patterns respectively overlap with first holes defined by a plurality of adjacent first main electrode unit patterns in a planar direction. 9 . The touch sensor of claim 1 , wherein the first electrode layer and the second electrode layer include a mesh pattern. 10 . The touch sensor according to claim 1 , wherein the first main electrode includes a first connection portion connecting the first main electrode in a row direction, and the second main electrode includes a second connection portion connecting the second main electrode in a column direction. 11 . The touch sensor according to claim 1 , wherein the first electrode layer includes a first dummy electrode spaced apart from the first main electrode and the first auxiliary electrode, and the second electrode layer includes a second dummy electrode spaced apart from the second main electrode and the second auxiliary electrode. 12 . The touch sensor of claim 11 , wherein the first dummy electrode comprises a first dummy electrode unit pattern, and the second dummy electrode comprises a second dummy electrode unit pattern.

13. The touch sensor according to claim 12, wherein the first dummy electrode unit patterns overlap with the second gaps defined by a plurality of adjacent second dummy electrode unit patterns in a planar direction, and the second dummy electrode unit patterns overlap with the first gaps defined by a plurality of adjacent first dummy electrode unit patterns in a planar direction.

14. An image display device comprising: Display panel; as well as The touch sensor according to any one of claims 1 to 13 is stacked on a display panel.

Images