UV single-rate projection exposure lithography lens structure

Abstract

The present invention discloses an ultraviolet single-magnification projection exposure lithography lens structure, comprising an observation lens barrel, a rotating member, a telescopic cylinder, and a transmission structure. The observation lens barrel is formed with a first cavity extending therethrough in a first direction. The rotating member is rotatably disposed on the observation lens barrel along an axis located in a second direction. The rotating member has a radially extending rotation drive portion. The telescopic cylinder extends in the first direction and is movably disposed in the first cavity. The telescopic cylinder is used to accommodate an observation camera module. The transmission structure transmits the rotation drive portion to the telescopic cylinder to convert the rotation of the rotating member into linear motion of the telescopic cylinder. Fine adjustment of the telescopic cylinder is achieved, thereby enabling the observation camera module mounted on the telescopic cylinder to obtain an optimal image plane position, ultimately displaying a clearer observation image.

Description

Technical Field

[0001] The present invention relates to the technical field of photolithography lenses, and in particular to an ultraviolet single-rate projection exposure photolithography lens structure. Background Art

[0002] The photolithography process transfers the geometric pattern on the mask to the photoresist on the wafer surface. First, a photoresist processing device spin-coats the photoresist onto the wafer surface. After repeated exposure and development steps, the desired pattern is formed on the wafer. Currently, mask-type lithography equipment monitoring systems typically use an observation system above the lithography objective lens to observe the workpiece image, or an imaging observation system located off-axis. Both methods use an observation camera to display the projected image. However, depending on the lithography wafer, the observation camera's image may be blurry. Summary of the Invention

[0003] The main purpose of the present invention is to propose a UV single-rate projection exposure lithography lens structure, which aims to solve the problem that the image plane position of the observation camera in the lithography equipment monitoring system cannot be fine-tuned, resulting in blurred imaging.

[0004] To achieve the above-mentioned purpose, the present invention proposes a UV single-rate projection exposure lithography lens structure comprising:

[0005] The observation lens barrel is formed with a first cavity extending through the first direction;

[0006] A rotating member is rotatably disposed on the observation lens barrel along an axis located in the second direction, and the rotating member has a rotating driving portion extending in a radial direction;

[0007] a telescopic cylinder extending along a first direction and movably disposed in the first cavity, and the telescopic cylinder is used for mounting an observation camera module; and

[0008] A transmission structure is configured to transmit and connect the rotary drive portion to the telescopic cylinder to convert the rotation of the rotary member into a linear motion of the telescopic cylinder.

[0009] Optionally, the second direction and the first direction are set to be the same direction;

[0010] The rotating member includes a rotating cylinder, the telescopic cylinder is adapted to be mounted on the rotating cylinder, and the transmission structure is configured as a threaded connection pair;

[0011] Wherein, the rotation driving part is arranged around the peripheral side wall of the rotating cylinder.

[0012] Optionally, the rotating cylinder includes a limiting cylinder section, and the limiting cylinder section is adapted to extend into the first cavity;

[0013] The ultraviolet single-rate projection exposure lithography lens structure further includes a first limiting component, which includes:

[0014] a limiting groove, arranged on the peripheral side wall of the limiting cylinder section; and

[0015] A first limiting pin is provided on the side wall of the observation lens barrel corresponding to the limiting groove, and the first limiting pin is adapted to extend into the limiting groove.

[0016] Optionally, the rotation drive unit is arranged opposite to the observation end of the observation lens barrel;

[0017] The ultraviolet single-rate projection exposure lithography lens structure also includes a positioning component, which includes a positioning pin. The positioning pin is movably arranged on the rotation drive part along the first direction. During the movable stroke of the positioning pin, the positioning pin can press against the observation end of the observation lens barrel.

[0018] Optionally, the telescopic cylinder includes a rotation-stopping cylinder section;

[0019] The ultraviolet single-rate projection exposure lithography lens structure further includes a rotation-stopping component, which includes:

[0020] a rotation-stop groove extending along a first direction and provided on a side wall of the rotation-stop cylinder section;

[0021] A stop pin is provided on the side wall of the observation lens barrel corresponding to the stop groove, and the stop pin is adapted to extend into the stop groove.

[0022] Optionally, a limiting protrusion is provided on the side wall of the telescopic cylinder at an interval relative to the bottom wall of the rotating cylinder.

[0023] Optionally, the telescopic cylinder has a mounting cylinder section extending out of the first cavity;

[0024] The ultraviolet single-rate projection exposure lithography lens structure further includes:

[0025] An observation camera module comprises a coupling sleeve and an observation camera, wherein the coupling sleeve is rotatably sleeved on the mounting barrel section along an axis in a first direction, and the observation camera is arranged on the coupling sleeve; and

[0026] The second limiting assembly includes a limiting hole and a second limiting pin. The limiting hole is arranged through the peripheral side wall of the mounting barrel section and is arranged in an elongated shape along the circumference of the mounting barrel section. The second limiting pin is arranged on the connecting sleeve and is adapted to extend into the limiting hole.

[0027] Optionally, the ultraviolet single-rate projection exposure lithography lens structure further includes:

[0028] A photolithography lens barrel is formed with a second cavity extending through the lens barrel in a third direction, the observation lens barrel is provided on a side wall of the photolithography lens barrel, and the first cavity and the second cavity are in communication with each other; and

[0029] The beam splitter prism is arranged in the second cavity, and the beam splitter prism is arranged opposite to the first cavity.

[0030] Optionally, the first cavity includes an observation lens mounting cavity;

[0031] The second cavity includes a plurality of photolithography lens mounting cavities arranged along the third direction, and at least one photolithography lens mounting cavity is provided on each side of the beam splitter prism;

[0032] The ultraviolet single-rate projection exposure lithography lens structure further includes:

[0033] A plurality of mounting group frames are respectively arranged in the observation lens mounting cavity and the plurality of photolithography lens mounting cavities;

[0034] An observation lens group is provided in the observation lens mounting cavity and mounted to the corresponding mounting group frame; and

[0035] A plurality of photolithography lens groups are respectively arranged in a plurality of the photolithography lens mounting cavities and mounted to the corresponding mounting group frames.

[0036] Optionally, within the second cavity, the plurality of mounting group frames include a reference group frame in the middle and a plurality of adjustment group frames on both sides of the reference group frame; the ultraviolet single-rate projection exposure lithography lens structure further includes a spacer assembly, the spacer assembly includes a plurality of adjustment spacers, and the plurality of adjustment spacers are correspondingly arranged between the plurality of adjustment group frames and the corresponding plurality of lithography lens mounting cavities to adjust the intervals between the plurality of adjustment group frames and the reference group frame; and / or,

[0037] The multiple mounting group frames include an adjustment group frame located in the observation lens mounting cavity, and the ultraviolet single-rate projection exposure lithography lens structure also includes a spacer assembly, and the spacer assembly includes an adjustment spacer. The adjustment spacer is arranged between the adjustment group frame and the observation lens mounting cavity to adjust the interval between the multiple adjustment group frames and the dichroic prism.

[0038] In the technical solution provided by the present invention, the rotary drive portion extends along the radial direction of the rotating part to obtain a larger driving radius. When the rotary drive portion is driven by an external force to rotate, the linear velocity of the outer edge of the rotary drive portion is allowed to be larger, while the angular velocity of the rotation converted to the rotating part is still smaller. The rotational motion of the rotating part is then converted into the linear motion of the telescopic cylinder through the transmission structure, thereby ensuring that the linear movement speed of the telescopic cylinder is much smaller than the linear velocity of the outer edge of the rotary drive portion, thereby achieving a deceleration effect, thereby realizing fine-tuning of the telescopic cylinder, and finally enabling the observation camera module installed on the telescopic cylinder to obtain a better image plane position, and finally display a clearer observation picture. BRIEF DESCRIPTION OF THE DRAWINGS

[0039] In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the following briefly introduces the drawings required for use in the embodiments or the description of the prior art. Obviously, the drawings described below are only some embodiments of the present invention. For ordinary technicians in this field, other drawings can be obtained based on the structures shown in these drawings without paying any creative work.

[0040] Figure 1 A schematic structural diagram of an embodiment of the ultraviolet single-rate projection exposure lithography lens structure provided by the present invention;

[0041] Figure 2 for Figure 1 A schematic planar cross-sectional view of a UV single-rate projection exposure lithography lens structure;

[0042] Figure 3 for Figure 2 An enlarged schematic diagram of the observation tube, rotating part, telescopic tube and transmission structure.

[0043] Description of Figure Numbers:

[0044]

[0045]

[0046] The purpose, features and advantages of the present invention will be further described with reference to the accompanying drawings and in conjunction with the embodiments. DETAILED DESCRIPTION

[0047] The following will clearly and completely describe the technical solutions in the embodiments of the present invention in conjunction with the accompanying drawings. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. All other embodiments obtained by ordinary technicians in this field based on the embodiments of the present invention without making any creative efforts shall fall within the scope of protection of the present invention.

[0048] It should be noted that if a directional indication is involved in an embodiment of the present invention, the directional indication is only used to explain the relative position relationship, movement status, etc. between the components in a certain specific posture. If the specific posture changes, the directional indication will also change accordingly.

[0049] In addition, if there are descriptions involving "first", "second", etc. in the embodiments of the present invention, the descriptions of "first", "second", etc. are only for descriptive purposes and cannot be understood as indicating or implying their relative importance or implicitly indicating the number of the indicated technical features. Therefore, the features specified as "first" and "second" may explicitly or implicitly include at least one of such features. In addition, the technical solutions between the various embodiments can be combined with each other, but this must be based on the fact that ordinary technicians in this field can implement them. When the combination of technical solutions is contradictory or cannot be implemented, it should be deemed that such a combination of technical solutions does not exist and is not within the scope of protection required by the present invention.

[0050] The photolithography process transfers the geometric pattern on the mask to the photoresist on the wafer surface. First, a photoresist processing device spin-coats the photoresist onto the wafer surface. After repeated exposure and development steps, the desired pattern is formed on the wafer. Currently, mask-type lithography equipment monitoring systems typically use an observation system above the lithography objective lens to observe the workpiece image, or an imaging observation system located off-axis. Both methods use an observation camera to display the projected image. However, depending on the lithography wafer, the observation camera's image may be blurry.

[0051] In view of this, the present invention proposes a UV single-rate projection exposure lithography lens structure, which aims to solve the problem that the image plane position of the observation camera in the lithography equipment monitoring system cannot be fine-tuned, resulting in blurred imaging. Figures 1 to 3 A simplified structural diagram of an embodiment of the present invention is provided.

[0052] See also Figures 1 to 3 The ultraviolet single-rate projection exposure lithography lens structure 100 includes an observation lens barrel 1, a rotating member 2, a telescopic cylinder 3 and a transmission structure 4. The observation lens barrel 1 is formed with a first cavity 11 that is arranged through along a first direction. The rotating member 2 is rotatably arranged on the observation lens barrel 1 along an axis located along a second direction, and the rotating member 2 has a rotation drive portion 21 that is extended in the radial direction. The telescopic cylinder 3 extends along the first direction and is movably arranged in the first cavity 11. The telescopic cylinder 3 is used for installing an observation camera module 5. The transmission structure 4 transmits and connects the rotation drive portion 21 to the telescopic cylinder 3 to convert the rotation of the rotating member 2 into linear motion of the telescopic cylinder 3.

[0053] In the technical solution provided by the present invention, the rotation drive part 21 extends along the radial direction of the rotating part 2 to obtain a larger driving radius. When the external force drives the rotation drive part 21 to rotate, the linear velocity of the outer edge of the rotation drive part 21 is allowed to be larger, while the angular velocity of the rotation converted to the rotating part 2 is still smaller. The rotational motion of the rotating part 2 is then converted into the linear motion of the telescopic cylinder 3 through the transmission structure 4, thereby ensuring that the linear movement speed of the telescopic cylinder 3 is much smaller than the linear velocity of the outer edge of the rotation drive part 21, thereby achieving a deceleration effect, thereby realizing fine-tuning of the telescopic cylinder 3, and finally enabling the observation camera module 5 installed on the telescopic cylinder 3 to obtain a better image plane position, and finally display a clearer observation picture.

[0054] It should be noted that the second direction and the first direction can be the same direction or different directions, which depends on the form of the transmission structure 4. At the same time, the transmission structure 4 has various forms. In one embodiment, the transmission structure 4 includes a transmission gear and a transmission rack. The transmission gear is coaxially arranged with the rotating member 2, and the transmission rack is extended along the first direction and arranged on the side wall of the telescopic cylinder 3. Through the meshing transmission of the transmission gear and the transmission rack, the rotation of the rotating member 2 can be converted into the linear movement of the telescopic cylinder 3. Furthermore, the angular velocity transmitted by the rotating member 2 can be further reduced by setting a gear reduction mechanism, thereby improving the fine-tuning effect.

[0055] Specifically, see Figure 2 and Figure 3 In this embodiment, the second direction is configured to be the same as the first direction. The rotating member 2 includes a rotating cylinder 22, the telescopic cylinder 3 is adapted to be mounted on the rotating cylinder 22, and the transmission structure 4 is configured as a threaded connection. The rotation drive unit 21 is disposed around the circumferential sidewall of the rotating cylinder 22. The threaded connection provides a simple and efficient connection, enabling continuous fine-tuning of the telescopic cylinder 3. To further reduce the amount of fine-tuning required for the telescopic cylinder, the threaded connection can be configured as a fine-pitch thread.

[0056] Since the rotating member 2 rotates relative to the observation lens barrel 1, in order to prevent the rotating member 2 from separating from the observation lens barrel 1 along the rotation axis, please refer to Figure 3In this embodiment, the rotating barrel 22 includes a limiting barrel section 221 adapted to extend into the first cavity 11. The ultraviolet single-rate projection exposure lithography lens structure 100 also includes a first limiting assembly 41, which includes a limiting groove 411 and a first limiting pin 412. The limiting groove 411 is annularly arranged on the circumferential sidewall of the limiting barrel section 221. The first limiting pin 412 is provided through the sidewall of the observation lens barrel 1 corresponding to the limiting groove 411 and adapted to extend into the limiting groove 411. The provision of the annular limiting groove 411 ensures that the first limiting pin 412 does not restrict the rotation of the rotating member 2 along the axis in the first direction. Instead, the abutment between the first limiting pin 412 and the sidewall of the limiting groove 411 restricts the movement of the rotating member 2 along the first direction, thereby simply and efficiently achieving a limiting effect on the rotating member 2.

[0057] When the rotating member 2 rotates and drives the telescopic cylinder 3 to move to a preferred imaging position, in order to keep the telescopic cylinder 3 at this imaging position, refer to Figure 3 In this embodiment, the rotary drive unit 21 is disposed opposite the observation end of the observation lens barrel 1. The UV single-rate projection exposure lithography lens structure 100 further includes a positioning assembly 42, which includes a positioning pin 421. The positioning pin 421 is movably disposed on the rotary drive unit 21 along the first direction. During the movable travel of the positioning pin 421, the positioning pin 421 can abut against the observation end of the observation lens barrel 1. By abutting against the observation end of the observation lens barrel 1, the positioning pin 421 restricts further rotation of the rotary barrel 22, thereby ensuring that the telescopic position of the telescopic barrel 3 is fixed.

[0058] It should be noted that the positioning pin 421 can be connected to the rotation driving part 21 through a threaded connection pair.

[0059] Specifically, in this embodiment, the positioning assembly 42 further includes a rubber sheet provided on the observation end surface of the observation lens barrel 1 . When the positioning pin 421 presses against the rubber sheet, the rubber sheet can provide greater friction resistance to prevent the positioning pin 421 from slipping.

[0060] Since the rotating cylinder and the telescopic cylinder 3 are connected by the threaded connection pair 4, during the rotation of the rotating cylinder 22, the telescopic cylinder 3 will be subjected to the friction force transmitted by the threaded connection pair 4 along the rotation circumferential direction. Therefore, the telescopic cylinder 3 has a tendency to rotate accordingly. In order to prevent the rotation of the telescopic cylinder 3, please refer to Figure 3In this embodiment, the telescopic cylinder 3 includes a rotation-stopping cylinder segment 31. The ultraviolet single-rate projection exposure lithography lens structure 100 also includes a rotation-stopping assembly 43. The rotation-stopping assembly 43 includes a rotation-stopping groove 431 and a rotation-stopping pin 432. The rotation-stopping groove 431 extends along a first direction and is disposed on the sidewall of the rotation-stopping cylinder segment 31. The rotation-stopping pin 432 is disposed on the sidewall of the observation lens barrel 1 and corresponds to the rotation-stopping groove 431. The rotation-stopping pin 432 fits into the rotation-stopping groove 431. The rotation-stopping pin 432 abuts against the sidewall of the rotation-stopping groove 431 to limit the rotation of the telescopic cylinder 3 with the rotating cylinder 22, thereby facilitating real-time observation and adjustment of the rotation drive unit 21 by an observer.

[0061] In order to prevent the telescopic cylinder 3 from being separated from the rotating cylinder 22 due to excessive adjustment of the telescopic cylinder 3 , the anti-rotation groove 431 is configured not to penetrate the side wall of the telescopic cylinder 3 .

[0062] See also Figure 3 In another embodiment, a limiting protrusion 311 is provided on the side wall of the telescopic cylinder 3 at a distance from the bottom wall of the rotating cylinder 22. The limiting protrusion 311 abuts against the bottom wall of the rotating cylinder 22 to prevent excessive displacement of the telescopic cylinder 3. It should be noted that the bottom wall of the rotating cylinder 22 is oriented toward the first direction.

[0063] Since different observers have different observation habits, it may be necessary to adjust the angle of the final image observation screen. Based on this, please refer to Figures 1 to 3 In this embodiment, the telescopic cylinder 3 includes a mounting section 32 extending from the first cavity 11. The UV single-rate projection exposure lithography lens structure 100 also includes an observation camera module 5 and a second stopper assembly 44. The observation camera module 5 includes a coupling sleeve 52 and an observation camera 51. The coupling sleeve 52 is rotatably mounted on the mounting section 32 along an axis in a first direction, and the observation camera 51 is mounted on the coupling sleeve 52. The second stopper assembly 44 includes a stopper hole 442 and a second stopper pin 441. The stopper hole 442 extends through the circumferential sidewall of the mounting section 32 and is elongated along the circumference of the mounting section 32. The second stopper pin 441 is mounted on the coupling sleeve 52 and fits into the stopper hole 442. This arrangement allows the observation camera 51 to be adjusted to a suitable angle along the rotational direction of the coupling sleeve 52, facilitating viewing of the image.

[0064] Existing observation systems are usually set above the lithography objective lens or in a paraxial arrangement. These arrangements have the problem of large installation volume and high installation cost. Based on this, please refer to Figures 1 to 2In this embodiment, the UV single-rate projection exposure lithography lens structure 100 further includes a lithography lens barrel 6 and a beam splitter prism 7. The lithography lens barrel 6 is formed with a second cavity 61 extending through it in a third direction. The observation lens barrel 1 is disposed on the sidewall of the lithography lens barrel 6, with the first cavity 11 and the second cavity 61 communicating with each other. The beam splitter prism 7 is disposed in the second cavity 61, facing the first cavity 11. By integrating the observation lens barrel 1 with the lithography lens barrel 6, the beam splitter prism 7 refracts light reflected from the lithography wafer and transmits it into the first cavity 11, enabling observation of the lithography wafer. This configuration reduces the cost of the observation system and the overall installation volume.

[0065] It should be noted that the angle between the first cavity 11 and the second cavity 61 is determined according to the orientation of the splitting surface of the splitting prism 7. Specifically, in one embodiment, the splitting surface of the splitting prism 7 is inclined at a 45-degree angle to the third direction, and the first cavity 11 and the second cavity 61 are perpendicularly arranged.

[0066] Furthermore, in this embodiment, the first cavity 11 includes an observation lens mounting cavity 111; the second cavity 61 includes a plurality of photolithography lens mounting cavities 611 arranged along the third direction, and at least one photolithography lens mounting cavity 611 is provided on each side of the beam splitter prism 7; the ultraviolet single-rate projection exposure photolithography lens structure 100 also includes a plurality of mounting group frames 8, an observation lens group 12 and a plurality of photolithography lens groups 62, and the plurality of mounting group frames 8 are respectively arranged in the observation lens mounting cavity 111 and the plurality of photolithography lens mounting cavities 611; the observation lens group 12 is arranged in the observation lens mounting cavity 111 and is mounted to the corresponding mounting group frame 8; the plurality of photolithography lens groups 62 are respectively arranged in the plurality of photolithography lens mounting cavities 611 and are mounted to the corresponding mounting group frame 8.

[0067] The photolithography light passes through the plurality of photolithography lens groups 62 and the dichroic prism 7 from the object side and is incident on the photolithography wafer on the image side, and then is reflected to the dichroic prism 7. The light is reflected to the first cavity 11 by the glued dichroic surface of the dichroic prism 7, thereby obtaining the observation light to achieve the observation effect.

[0068] It should be noted that the plurality of mounting group frames 8 are all locked by means of a pressing ring.

[0069] Furthermore, in this embodiment, in the second cavity 61, the multiple installation group frames 8 include a reference group frame 81 in the middle position and a plurality of adjustment group frames 82 on both sides of the reference group frame 81. The ultraviolet single-rate projection exposure lithography lens structure 100 also includes a spacer assembly, and the spacer assembly includes a plurality of adjustment spacers 9. The plurality of adjustment spacers 9 are correspondingly arranged between the plurality of adjustment group frames 82 and the corresponding plurality of lithography lens installation cavities 611 to adjust the intervals between the plurality of adjustment group frames 82 and the reference group frame 81, thereby facilitating the installation and debugging of the positions of the plurality of lithography lens groups 62 and reducing installation errors.

[0070] In another embodiment, the plurality of mounting group frames 8 include an adjustment group frame 82 located in the observation lens mounting cavity 111, and the ultraviolet single-rate projection exposure lithography lens structure 100 further includes a spacer assembly, wherein the spacer assembly includes an adjustment spacer 9, and the adjustment spacer 9 is arranged between the adjustment group frame 82 and the observation lens mounting cavity 111, so as to adjust the interval between the plurality of adjustment group frames 82 and the dichroic prism 7, thereby facilitating the installation and debugging of the position of the observation lens group 12 and reducing installation errors.

[0071] It should be noted that the above two parallel technical solutions "in the second cavity 61, the plurality of mounting group frames 8 include a reference group frame 81 in the middle and a plurality of adjustment group frames 82 on both sides of the reference group frame 81, the ultraviolet single-rate projection exposure lithography lens structure 100 further includes a spacer assembly, the spacer assembly includes a plurality of adjustment spacers 9, and the plurality of adjustment spacers 9 are correspondingly arranged between the plurality of adjustment group frames 82 and the corresponding plurality of lithography lens mounting cavities 611 to adjust the plurality of adjustment group frames 82 The spacing between the reference group frame 81 and the plurality of mounting group frames 8 include an adjustment group frame 82 located in the observation lens mounting cavity 111, and the ultraviolet single-rate projection exposure lithography lens structure 100 also includes a spacer assembly, the spacer assembly includes an adjustment spacer 9, and the adjustment spacer 9 is arranged between the adjustment group frame 82 and the observation lens mounting cavity 111 to adjust the spacing between the plurality of adjustment group frames 82 and the dichroic prism 7. One or the other can be set selectively, or they can be set simultaneously. Obviously, setting them simultaneously has a better effect.

[0072] In this embodiment, the plurality of mounting group frames 8, the plurality of adjustment spacers 9, the observation lens barrel 1 and the photolithography lens barrel 6 are all designed to eliminate stray light; the plurality of lens groups are composed of i-line glass lenses with high ultraviolet transmittance of 365nm, high optical uniformity and excellent ultraviolet radiation resistance stability; the plurality of mounting group frames 8, the plurality of adjustment spacers 9, the rotating part 2, the telescopic part, the observation lens barrel 1 and the photolithography lens barrel 6 are all made of aluminum alloy 6061-T6 with high strength, high hardness, corrosion resistance, good processing performance and good oxidation effect.

[0073] The above description is only a preferred embodiment of the present invention and does not limit the patent scope of the present invention. Any equivalent structural transformation made by using the contents of the present invention specification and drawings under the concept of the present invention, or directly / indirectly applied in other related technical fields, is included in the patent protection scope of the present invention.

Claims

1. A UV single-rate projection exposure lithography lens structure, characterized in that: include: The observation lens barrel is formed with a first cavity extending through the first direction; A rotating member is rotatably disposed on the observation lens barrel along an axis located in the second direction, and the rotating member has a rotating driving portion extending in a radial direction; a telescopic cylinder extending along a first direction and movably disposed in the first cavity, and the telescopic cylinder is used for mounting the observation camera module; as well as, a transmission structure, transmission-connecting the rotary drive portion to the telescopic cylinder, so as to convert the rotation of the rotary member into linear motion of the telescopic cylinder; The ultraviolet single-rate projection exposure lithography lens structure further includes: A photolithography lens barrel is formed with a second cavity extending through the lens barrel in a third direction, the observation lens barrel is provided on a side wall of the photolithography lens barrel, and the first cavity and the second cavity are in communication with each other; and The beam splitter prism is arranged in the second cavity, and the beam splitter prism is arranged opposite to the first cavity.

2. The ultraviolet single-rate projection exposure lithography lens structure according to claim 1, characterized in that: The second direction is set to be the same as the first direction; The rotating member includes a rotating cylinder, the telescopic cylinder is adapted to be mounted on the rotating cylinder, and the transmission structure is configured as a threaded connection pair; Wherein, the rotation driving part is arranged around the peripheral side wall of the rotating cylinder.

3. The ultraviolet single-rate projection exposure lithography lens structure according to claim 2, characterized in that: The rotating cylinder includes a limiting cylinder section, and the limiting cylinder section is adapted to extend into the first cavity; The ultraviolet single-rate projection exposure lithography lens structure further includes a first limiting component, which includes: a limiting groove, arranged on the peripheral side wall of the limiting cylinder section; and A first limiting pin is provided on the side wall of the observation lens barrel corresponding to the limiting groove, and the first limiting pin is adapted to extend into the limiting groove.

4. The ultraviolet single-rate projection exposure lithography lens structure according to claim 2, wherein: The rotation drive portion is arranged opposite to the observation end of the observation lens barrel; The ultraviolet single-rate projection exposure lithography lens structure also includes a positioning component, which includes a positioning pin. The positioning pin is movably arranged on the rotation drive part along the first direction. During the movable stroke of the positioning pin, the positioning pin can press against the observation end of the observation lens barrel.

5. The ultraviolet single-rate projection exposure lithography lens structure according to claim 2, wherein: The telescopic cylinder includes a rotation-stopping cylinder section; The ultraviolet single-rate projection exposure lithography lens structure further includes a rotation-stopping component, which includes: a rotation-stop groove extending along a first direction and provided on a side wall of the rotation-stop cylinder section; A stop pin is provided on the side wall of the observation lens barrel corresponding to the stop groove, and the stop pin is adapted to extend into the stop groove.

6. The ultraviolet single-rate projection exposure lithography lens structure according to claim 2, wherein: A limiting convex portion is provided on the side wall of the telescopic cylinder at an interval relative to the bottom wall of the rotating cylinder.

7. The ultraviolet single-rate projection exposure lithography lens structure according to claim 1, characterized in that: The telescopic cylinder has a mounting cylinder section extending out of the first cavity; The ultraviolet single-rate projection exposure lithography lens structure further includes: An observation camera module comprises a coupling sleeve and an observation camera, wherein the coupling sleeve is rotatably sleeved on the mounting barrel section along an axis in a first direction, and the observation camera is arranged on the coupling sleeve; and The second limiting assembly includes a limiting hole and a second limiting pin. The limiting hole is arranged through the peripheral side wall of the mounting barrel section and is arranged in an elongated shape along the circumference of the mounting barrel section. The second limiting pin is arranged on the connecting sleeve and is adapted to extend into the limiting hole.

8. The ultraviolet single-rate projection exposure lithography lens structure according to claim 1, characterized in that: The first cavity includes an observation lens mounting cavity; The second cavity includes a plurality of photolithography lens mounting cavities arranged along the third direction, and at least one photolithography lens mounting cavity is provided on each side of the beam splitter prism; The ultraviolet single-rate projection exposure lithography lens structure further includes: A plurality of mounting group frames are respectively arranged in the observation lens mounting cavity and the plurality of photolithography lens mounting cavities; An observation lens group is provided in the observation lens mounting cavity and mounted to the corresponding mounting group frame; and A plurality of photolithography lens groups are respectively arranged in a plurality of the photolithography lens mounting cavities and mounted to the corresponding mounting group frames.

9. The ultraviolet single-rate projection exposure lithography lens structure according to claim 8, characterized in that: In the second cavity, the plurality of mounting group frames include a reference group frame in the middle and a plurality of adjustment group frames on both sides of the reference group frame. The ultraviolet single-rate projection exposure lithography lens structure further includes a spacer assembly, the spacer assembly includes a plurality of adjustment spacers, and the plurality of adjustment spacers are correspondingly arranged between the plurality of adjustment group frames and the corresponding plurality of lithography lens mounting cavities to adjust the intervals between the plurality of adjustment group frames and the reference group frame; and / or, The multiple mounting group frames include an adjustment group frame located in the observation lens mounting cavity, and the ultraviolet single-rate projection exposure lithography lens structure also includes a spacer assembly, and the spacer assembly includes an adjustment spacer. The adjustment spacer is arranged between the adjustment group frame and the observation lens mounting cavity to adjust the interval between the multiple adjustment group frames and the dichroic prism.

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