Method for plate making forming of fabric, electronic terminal and computer readable storage medium

Abstract

The application discloses a fabric plate-making forming method, an electronic terminal and a computer readable storage medium. The plate-making forming method comprises the following steps: obtaining process parameters of a fabric and corresponding multi-section pattern weave diagrams, generating a plurality of process contour diagrams of the fabric based on the process parameters, merging the plurality of process contour diagrams and the multi-section pattern weave diagrams to obtain a multi-section process pattern contour diagram, and receiving a modification operation on the multi-section process pattern contour diagram to correspondingly modify the process parameters of the fabric. According to the method, the process contour diagrams of the multi-section process are merged with the pattern weave diagrams, the parameters of the process contour diagrams are adjusted directly against the pattern weave diagrams, the process parameters of each section of the pattern weave can be independently adjusted, the integrity and the up-down continuity of the pattern weave after the process forming are ensured, the multi-section pattern contour diagrams do not affect each other, the independence of the multi-section pattern weave is ensured, and the efficiency and the accuracy of plate-making are improved.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of garment making, in particular to a fabric patterning method, an electronic terminal and a computer readable storage medium. BACKGROUND

[0002] Currently, the patterning forming process of a flat knitting machine is performed in a patterning software. After the patterning software generates a forming result picture according to input process parameters, the offset of a pattern stitch is calculated manually, and the pattern stitch and the process position are filled to generate a patterning pattern picture.

[0003] The defect of the prior art is that whether the process position is appropriate cannot be judged intuitively before patterning forming. In particular, when a plurality of pattern stitches are knitted, each pattern stitch is independent but related, the process position is prone to error, and the integrity and continuity of the pattern stitch during patterning cannot be guaranteed, which affects the accuracy of patterning. SUMMARY

[0004] The present application provides a fabric patterning method, an electronic terminal and a computer readable storage medium to solve the technical problem that whether the process position is appropriate cannot be judged intuitively in the prior art.

[0005] To solve the above problems, the present application provides a first technical solution: providing a fabric patterning method, comprising: obtaining process parameters of the fabric and corresponding multi-segment pattern stitch pictures, generating a plurality of process contour pictures of the fabric based on the process parameters; merging a plurality of the process contour pictures and a plurality of the pattern stitch pictures to obtain a multi-segment process pattern contour picture; receiving a modification operation on the multi-segment process pattern contour picture to correspondingly modify the process parameters of the fabric.

[0006] Among them, the process parameters are multi-segment process parameters, and the step of generating a plurality of process contour pictures based on the process parameters comprises: identifying a break mark of the process parameters, and splitting the multi-segment process parameters into parameters corresponding to each segment process; generating a plurality of process contour pictures according to the parameters corresponding to each segment process.

[0007] Among them, the process parameters include a plurality of process rows, and the break mark is arranged between adjacent two process rows in the multi-segment process.

[0008] Among them, the parameters of each process row include a height parameter and a width parameter, the height parameter of the process row including the break mark is equal to the height parameter of the previous process row, and the width parameter of the process row including the break mark is equal to the width parameter of the previous process row.

[0009] The process parameters include a plurality of process rows, and the step of generating a plurality of process contour maps based on the process parameters includes: acquiring a needle number parameter of each process row; selecting process rows with the same needle number parameter in the order of the process rows, and taking the process rows with the same needle number parameter as parameters corresponding to a process section; and generating a plurality of process contour maps based on the parameters corresponding to the process sections.

[0010] The process parameters include a needle reduction position parameter, and the step of receiving a modification operation on the plurality of pattern contour maps includes: receiving a marquee operation on a partial region of at least one pattern contour map, generating an adjustment interface based on a marquee region selected according to the marquee operation; and receiving a modification operation on the adjustment interface.

[0011] The step of receiving a modification operation on the adjustment interface further includes: acquiring the needle reduction position parameter after the modification operation; and updating the pattern contour map based on the needle reduction position parameter after the modification operation, so that the pattern stitch in the pattern stitch map is located within the needle reduction contour of the process contour map.

[0012] After the step of performing a modification operation on the plurality of pattern contour maps of the process sections to correspondingly modify the process parameters of the fabric, the plate-making and forming method further includes: generating a forming result map of the fabric based on the process parameters after the modification operation; calculating a shift rule based on the process parameters after the modification operation; and filling the pattern stitch in the pattern stitch map to the forming result map according to the shift rule to obtain a plate-making pattern map of the fabric.

[0013] To solve the above problems, the present application provides a second technical solution: providing an electronic terminal, including a processor and a memory connected with the processor, wherein the memory stores program data, and the processor calls the program data stored in the memory to execute the plate-making and forming method as described above.

[0014] To solve the above problems, the present application provides a third technical solution: providing a computer readable storage medium, storing program instructions, the program instructions are executed to realize the plate-making and forming method as described above.

[0015] The application provides a fabric patterning forming method, an electronic terminal and a computer readable storage medium. The fabric patterning forming method comprises the following steps: obtaining process parameters of a fabric and corresponding multi-section pattern weave diagrams, generating a plurality of process contour diagrams of the fabric based on the process parameters, merging the plurality of process contour diagrams and the multi-section pattern weave diagrams to obtain a multi-section process pattern contour diagram, and receiving a modification operation on the multi-section process pattern contour diagram to correspondingly modify the process parameters of the fabric. According to the method, the process contour diagrams of the multi-section process are merged with the pattern weave diagrams, the parameters of the process contour diagrams are adjusted according to the pattern weave diagrams, the process parameters of each section of the pattern weave are independently adjusted, the integrity and the up-down continuity of the pattern weave after the process forming are ensured, the multi-section pattern contour diagrams do not affect each other, the independence of the multi-section pattern weave is ensured, and the efficiency and the accuracy of the patterning are improved. BRIEF DESCRIPTION OF DRAWINGS

[0016] In order to more clearly illustrate the technical solutions in the embodiments of the application, the following will briefly introduce the drawings needed to be used in the embodiments description. Obviously, the drawings in the following description are only some embodiments of the application, and for those skilled in the art, other drawings can also be obtained from these drawings without creative labor. Among them:

[0017] Figure 1 is a flowchart of an embodiment of the patterning forming method provided by the application;

[0018] Figure 2 is Figure 1 the pattern weave in Figure 1 the operation schematic diagram of the embodiment;

[0019] Figure 3 is Figure 1 the process contour in Figure 1 the operation schematic diagram of the embodiment;

[0020] Figure 4 is Figure 1 the pattern contour in Figure 1 the operation schematic diagram of the embodiment;

[0021] Figure 5 is a flowchart of another embodiment of the patterning forming method provided by the application;

[0022] Figure 6 is a flowchart of still another embodiment of the patterning forming method provided by the application;

[0023] Figure 7 is the operation schematic diagram of the forming result Figure 1 embodiment provided by the application;

[0024] Figure 8is a framework schematic diagram of an embodiment of the electronic terminal provided in the present application;

[0025] Figure 9 is a framework schematic diagram of an embodiment of the computer readable storage medium provided in the present application. DETAILED DESCRIPTION

[0026] The technical solutions in the embodiments of the present application will be clearly and completely described in conjunction with the drawings in the embodiments of the present application. Obviously, the described embodiments are only part of the embodiments of the present application, rather than all the embodiments. Based on the embodiments in the present application, all other embodiments obtained by those of ordinary skill in the art without creative efforts fall within the scope of protection of the present application.

[0027] It should be noted that if the embodiments of the present application involve directional indications (such as up, down, left, right, front, back, etc.), the directional indications are only used to explain the relative positional relationship, movement condition, etc. between components in a certain posture (as shown in the drawings), and if the certain posture changes, the directional indications also change accordingly.

[0028] In addition, if the embodiments of the present application involve descriptions such as "first", "second", etc., the descriptions of "first", "second", etc. are only for description purposes, and cannot be understood as indicating or implying the relative importance of the indicated technical features or implicitly indicating the number of the indicated technical features. Therefore, the features limited by "first", "second" can explicitly or implicitly include at least one of the features. In addition, the technical solutions of each embodiment can be combined with each other, but it must be based on the fact that a person of ordinary skill in the art can realize it, and when the combination of technical solutions contradicts each other or cannot be realized, it should be considered that the combination of technical solutions does not exist and is not within the scope of protection claimed by the present application.

[0029] The present application first proposes a fabric patterning forming method, which is applied to an electronic terminal, for example, the electronic terminal can be a flat knitting machine or an independent patterning terminal. Specifically, the electronic terminal is used to provide a patterning pattern for the flat knitting machine, that is, the patterning forming process of the flat knitting machine is placed in the electronic terminal; the flat knitting machine is used to realize knitting forming according to the process parameters of the fabric, wherein the fabric can be provided with multi-section pattern stitches, the flat knitting machine can be applied to the needle shrinking forming process of the fabric, or can be applied to other forming processes, which are not limited here.

[0030] Please refer to Figures 1-4 , Figure 1 is a flow schematic diagram of an embodiment of the patterning forming method provided in the present application, Figure 2 is Figure 1 pattern stitches in Figure 1Operation schematic diagram of the embodiment, Figure 3 is Figure 1 Process profile Figure 1 Operation schematic diagram of the embodiment, Figure 4 is Figure 1 Pattern profile Figure 1 Operation schematic diagram of the embodiment. As Figure 1 shown, the plate-making forming method of the embodiment includes the following steps:

[0031] Step S11: Obtain the process parameters of the fabric and the corresponding multi-section pattern organization diagram, and generate a plurality of process profile diagrams based on the process parameters.

[0032] When the fabric is knitted, the flat knitting machine is pre-set with the process parameters of the fabric, and the electronic terminal obtains the process parameters of the fabric and the corresponding pattern organization diagram according to the pattern organization of the fabric. The process parameters include a plurality of process rows, each process row representing the parameters of one operation of the flat knitting machine, and each process row further includes parameters such as revolutions, needles, times, height, width, and function. The number of revolutions represents the height of the knitting, the number of needles represents the width of the garment piece (number of needles) that is increased or decreased, the number of times represents the number of times the corresponding process is performed, the height represents the number of rows after the current process row is executed, the width represents the width after the current process row is executed, and the function represents the process type.

[0033] The pattern organization diagram represents the rules of the warp and weft yarns of the fabric interlacing or floating with each other, and the warp and weft yarns interlace with each other to form the pattern organization of the fabric. In this embodiment, the fabric has a plurality of independent pattern organizations, and each pattern organization needs to be plated during the plate-making forming process. As Figure 2 shown, the plurality of independent pattern organizations can be understood as the pattern of the fabric, and each pattern has different sizes and positions.

[0034] Specifically, the process type of the fabric includes the needle-increasing process, the needle-decreasing process, the needle-reducing process, etc. The process parameters of the fabric are related to the type of the current process of the fabric, for example, when the process type of the fabric is the needle-reducing process, the number of needles should be the width of the garment piece that is reduced, and the width is reduced after each needle-reducing process is executed; when the process type of the fabric is the needle-increasing process, the number of needles should be the width of the garment piece that is increased. As Figure 3 shown, since the process parameters of the fabric include the process position and the execution position, and the process parameters of the fabric correspond to the plurality of independent pattern organizations, the corresponding plurality of process profiles can be obtained according to the process parameters of the fabric to generate a plurality of process profile diagrams.

[0035] Step S12: Merge the plurality of process profile diagrams and the plurality of pattern organization diagrams to obtain a plurality of pattern profile diagrams of the process.

[0036] As Figure 4As shown, after generating the plurality of process profile maps, the plurality of process profile maps and the multi-segment pattern organization map are merged to obtain a pattern profile map of the multi-segment process. The user can intuitively correspond the process parameters in the process profile map to the pattern organizations in the pattern organization map through the pattern profile map, and the pattern profile map of each segment of the multi-segment process is independent of each other, or the pattern profile map of each segment of the multi-segment process is spliced to form the pattern profile map of the multi-segment process.

[0037] Step S13: receiving a modification operation on the multi-segment pattern profile map to correspondingly modify the process parameters of the fabric.

[0038] When the process parameters are not suitable, the user can perform a modification operation on the multi-segment pattern profile map, that is, the user directly performs a modification operation on the process profile map and / or the pattern organization map in the multi-segment pattern profile map, and the electronic terminal receives the modification operation on the multi-segment pattern profile map to modify the process parameters, thereby improving the efficiency of plate making. Specifically, the modification operation performed by the user on each segment of the pattern profile map is performed independently, and the multi-segment pattern profile map does not affect each other, thereby ensuring the independence of the multi-segment pattern organization.

[0039] Among them, according to the different process types, the corresponding modification operation can be performed. For example, when the process type is a needle shrinking process, the modification operation can be adjusting the position and the number of needles. Alternatively, the modification operation can set a modification mode related to the process type, so as to configure a corresponding modification interface according to the modification mode selected by the user, thereby improving the user experience.

[0040] In the embodiment of the present application, the plate making forming method comprises: obtaining process parameters of a fabric and corresponding multi-segment pattern organization map, generating a plurality of process profile maps of the fabric based on the process parameters; merging the plurality of process profile maps and the multi-segment pattern organization map to obtain a pattern profile map of the multi-segment process; and receiving a modification operation on the multi-segment pattern profile map to correspondingly modify the process parameters of the fabric. Through the method of the embodiment, the process profile maps of the multi-segment process and the pattern organization map are merged, the parameters of the process profile map are adjusted intuitively against the pattern organization map, and the process parameters of each segment of the pattern organization can be adjusted independently to ensure the integrity and the up-down continuity of the pattern organization after the process forming. Moreover, the multi-segment pattern profile map does not affect each other, thereby ensuring the independence of the multi-segment pattern organization, improving the efficiency and accuracy of plate making.

[0041] Please refer to Figure 5 , Figure 5 is a flowchart of another embodiment of the plate making forming method provided by the present application. As Figure 5 shown, the process parameters are multi-segment process parameters, and the plate making forming method of the embodiment comprises the following steps:

[0042] Step S21: Obtain the process parameters of the fabric and the corresponding multi-segment pattern organization diagram, identify the breaking mark of the process parameters, and split the multi-segment process parameters into parameters corresponding to each segment of the process.

[0043] In this embodiment, the process parameters of the fabric are the process parameters corresponding to the entire pattern organization of the fabric, which can be understood as a collection of parameters corresponding to multi-segment pattern organizations. The breaking mark is arranged between the parameters of the multi-segment pattern organization, and is used to split the process parameters into parameters of single-segment pattern organizations.

[0044] The electronic terminal splits the multi-segment process parameters into parameters corresponding to each segment of the process by identifying the breaking mark of the process parameters. The way of splitting the multi-segment process parameters into parameters corresponding to each segment of the process can be writing the parameters corresponding to each segment of the process into a new parameter file, or splitting the collection of multi-segment process parameters into multiple subsets corresponding to each segment of the process, which is not limited here.

[0045] Step S22: Generate multiple process contour diagrams according to the parameters corresponding to each segment of the process.

[0046] After obtaining the parameters corresponding to each segment of the process according to the process parameters, multiple process contour diagrams are generated according to the parameters corresponding to each segment of the process.

[0047] Step S23: Merge the multiple process contour diagrams with the multi-segment pattern organization diagram to obtain a multi-segment process pattern contour diagram.

[0048] Step S24: Receive a modification operation on the multi-segment pattern contour diagram to make corresponding modifications to the process parameters of the fabric.

[0049] Steps S23-S24 are the same as steps S12-S13 described above, and will not be repeated here.

[0050] Optionally, in an embodiment, the breaking mark can be manually inserted into the process parameters by a user; in another embodiment, the breaking mark can be inserted into the process parameters by an electronic terminal, which identifies the common points of each segment of the process in the process parameters according to the associated characteristics of each segment of the pattern organization, and inserts the breaking mark into the process parameters, so that the electronic terminal can split the multi-segment process parameters into parameters corresponding to each segment of the process by identifying the breaking mark.

[0051] In the embodiment of the present application, the plate making forming method comprises: obtaining process parameters of a fabric and corresponding multi-segment pattern organization diagrams, identifying a break mark of the process parameters, and splitting the multi-segment process parameters into parameters corresponding to each segment of the process; generating a plurality of process contour diagrams according to the parameters corresponding to each segment of the process; merging the plurality of process contour diagrams with the multi-segment pattern organization diagrams to obtain pattern contour diagrams of the multi-segment process; and receiving a modification operation on the multi-segment pattern contour diagrams to correspondingly modify the process parameters of the fabric. Through the method of the embodiment, the parameters of the multi-segment process can be converted into a plurality of process contour diagrams by identifying the break mark in the process parameters, the process parameters of each segment of the pattern organization can be independently adjusted, the multi-segment pattern contour diagrams do not affect each other, and the efficiency and accuracy of plate making are improved.

[0052] Optionally, the process parameters comprise a plurality of process rows, and the break mark is arranged between adjacent two process rows in the multi-segment process.

[0053] Specifically, as shown in Table 1, Table 1 is a schematic table of process parameters of an embodiment, a user inputs process parameters into an electronic terminal, the process parameters comprise parameters of a multi-segment process, each segment of the process parameters comprises at least one process row, and each process row represents parameters of one operation of a flat knitting machine, wherein, in Table 1, "function" is only used for classifying the process parameters, so that the user can intuitively determine which segment of the process the process parameters belong to, and in actual application, the process parameters obtained by the terminal device do not set this parameter, so as to improve the identification efficiency. In order to distinguish each segment of the process parameters, a break mark is inserted between the process rows of each segment of the process parameters, as shown in Table 2.

[0054] It can be understood that the break mark is a process row used for identifying this segment of the process, and the break mark is arranged between adjacent two process rows in the multi-segment process, so that the electronic terminal can split the process parameters when the break mark is identified when obtaining the process parameters.

[0055] Optionally, the parameters of each process row comprise a number of revolutions parameter, a number of needles parameter, a number of times parameter, a height parameter and a width parameter, and each segment of the pattern organization in the multi-segment process parameters has similar rules in parameters. For example, the number of needles parameters of each segment of the process parameters are equal.

[0056] In an embodiment, in order to improve the identification efficiency of the electronic terminal on the break mark, the break mark can be provided with a preset identification rule, for example, the number of needles parameter of the break mark is zero, the number of times parameter of the break mark is 1, the height parameter of the process row comprising the break mark is equal to the height parameter of the previous process row, and the width parameter of the process row comprising the break mark is equal to the width parameter of the previous process row. In other embodiments, the identification rule of the break mark can be set in other forms, which is not limited here.

[0057] Optionally, in the above embodiment, the process parameters corresponding to the plurality of pattern organizations are used to generate the plurality of process contour maps by adding the break mark in the original process parameters. In other embodiments, the plurality of process contour maps can also be generated directly by the process parameters.

[0058] Please refer to Figure 6 , Figure 6 is a flowchart of another embodiment of the patterning forming method provided by the present application. As shown in Figure 6 , in the present embodiment, the process parameters include a plurality of process rows, and step S11 further includes the following steps:

[0059] Step S31: Obtain the needle number parameter of each process row.

[0060] The needle number parameter indicates the width of the garment piece increased or decreased by the flat knitting machine when performing the row of operations.

[0061] Step S32: Select the process rows with the same needle number parameter according to the order of the process rows, and use the process rows with the same needle number parameter as the parameters corresponding to a segment of process.

[0062] Specifically, the order of the process rows is the execution order of the flat knitting machine, and the process rows with the same needle number parameter are selected according to the order of the process rows, i.e., the process rows with the same needle number parameter and continuous execution order are selected. As shown in Figure 2 , the width of each segment of pattern organization in the plurality of segment pattern organization diagrams is equal, so the selected process rows are used as the parameters corresponding to the segment of process. According to the method of the present step, the electronic terminal can obtain the parameters corresponding to the plurality of segments of process.

[0063] Step S33: Generate a plurality of process contour maps according to the parameters corresponding to the plurality of segments of process.

[0064] The parameters corresponding to the plurality of segments of process can be a plurality of data sets or a plurality of parameter files. The electronic terminal can identify the parameters corresponding to the plurality of segments of process to generate the corresponding plurality of process contour maps.

[0065] In the present embodiment, the step of generating a plurality of process contour maps based on the process parameters includes: obtaining the needle number parameter of each process row; selecting the process rows with the same needle number parameter according to the order of the process rows, and using the process rows with the same needle number parameter as the parameters corresponding to a segment of process; and generating a plurality of process contour maps according to the parameters corresponding to the plurality of segments of process. Through the method of the present embodiment, the process can be divided into the parameters corresponding to the single segment of process by identifying whether the needle number parameters are equal, so as to obtain the plurality of process contour maps. The plurality of segment pattern contour maps do not affect each other, and the efficiency and accuracy of the patterning are improved.

[0066] Optionally, the process parameters include a needle-in position parameter, and in the embodiment, the step of receiving the modification operation on the multi-segment pattern profile further includes: receiving a marquee operation on a partial region of the pattern profile of at least one segment, generating an adjustment interface according to the marquee region selected by the marquee operation; and receiving a modification operation on the adjustment interface.

[0067] Specifically, when using the electronic terminal, the user inputs the process parameters of the fabric, acquires the multi-segment pattern profile, and marquees a partial region or a whole region of at least one segment of the pattern profile. After receiving the marquee operation on the partial region of the pattern profile of at least one segment, the electronic terminal generates an adjustment interface according to the marquee region selected by the marquee operation, and receives a modification operation on the adjustment interface.

[0068] In an embodiment, the adjustment interface can be arranged on one side of the pattern profile; in another embodiment, the adjustment interface can also be arranged in the pattern profile; in other embodiments, a separate adjustment interface can also be generated through a pop-up window or the like. The pattern profile can be updated in real time according to the modification operation, so that the user can intuitively adjust the parameters of the process profile by comparing the pattern profile, the operation is simple, and the user experience is improved.

[0069] The needle-in position parameter can be understood as a parameter composed of the number of revolutions, the number of needles, the number of times, the height, the width, and the like of the process parameters described above. For example, the number of revolutions, the number of needles, the number of times, the height, and the width can be converted into a plurality of specific process profiles, and the needle-in position parameter is the position parameter of the process profile in the pattern profile.

[0070] Specifically, the adjustment interface includes an interface in which the needle-in position parameter can be customized. For example, in an embodiment, the needle-in position parameter can be represented by a coordinate point in the coordinate system of the pattern profile, and the adjustment interface changes the needle-in position by dragging the coordinate point to modify the needle-in position parameter. In another embodiment, the adjusted needle-in position parameter can also be obtained through an input box. In this regard, the adjustment interface and the modification method are not specifically limited.

[0071] Optionally, in the embodiment, the step of receiving the modification operation on the adjustment interface further includes: acquiring the needle-in position parameter after the modification operation; and updating the pattern profile based on the needle-in position parameter after the modification operation, so that the pattern stitch in the pattern profile is located within the needle-in profile of the process profile.

[0072] Specifically, based on the modified needle-in position parameter, the electronic terminal can generate a new process contour map, and the process contour map is formed with a needle-in contour. It can be understood that the needle-in contour is related to the needle-in position parameter, and when the needle-in position parameter changes, the position of the needle-in contour will change accordingly. After obtaining the updated process contour map, the updated pattern organization map and the process contour map are merged.

[0073] If the pattern organization in the pattern organization map is located within the needle-in contour, the modified needle-in position parameter is appropriate at this time, and the needle-in position parameter after the modification operation can be used for plate making; if the pattern organization in the pattern organization map is located outside the needle-in contour, the needle-in position parameter is still not appropriate at this time, and plate making according to the needle-in position parameter will lead to the incompleteness of the pattern organization and the discontinuity of the upper and lower parts during plate making, so the user should continue to perform the modification operation. It can be understood that the purpose of the user performing the modification operation is to make the needle-in contour correspond to the pattern organization, so as to ensure the completeness and continuity of the pattern organization in the knitting process.

[0074] Optionally, the modification operation in step S13 can be automatically performed by the electronic terminal. For example, the electronic terminal automatically judges whether the pattern organization in the pattern organization map is located within the needle-in contour or calculates the distance between the needle-in position and the pattern organization when identifying the needle-in position in the merged process contour map and pattern organization map, and calculates the adjusted needle-in position according to the distance between the needle-in position and the pattern organization, the shape of the pattern organization, etc., so that the pattern organization in the pattern organization map is located within the needle-in contour.

[0075] Optionally, step S12 further comprises the following steps: corresponding each process contour map to each process row of the pattern organization map, so as to merge the process contour map and the pattern organization map in the canvas to obtain a pattern contour map of multiple processes.

[0076] Specifically, since the pattern organization map includes warp organization points and weft organization points, the pattern organization map is provided with a coordinate axis for identifying the position of each organization point; the process parameter of the process contour map also identifies a specific needle-in identification row in the contour map to indicate the number of rows of the process performed. Therefore, when merging the process contour map and the pattern organization map, the process row of the same needle-in position in the process contour map needs to be corresponded to the process row of the pattern organization map, so as to merge the process contour map and the pattern organization map in the canvas.

[0077] Please refer to Figure 7 , Figure 7 is the forming result provided by the present application Figure 1The operation schematic diagram of the embodiment. After step S13, the plate making forming method further comprises the following steps: generating a forming result diagram of the fabric based on the process parameters after the modification operation; calculating a shift rule based on the process parameters after the modification operation; filling the pattern organization in the pattern organization diagram to the forming result diagram according to the shift rule to obtain a plate making pattern diagram of the fabric.

[0078] Specifically, the plate making pattern diagram of the fabric is a pattern diagram for knitting operation of the flat knitting machine. In order to ensure the knitting effect, the pattern organization of the plate making pattern diagram needs to be complete and continuous up and down. When the process parameters after the modification operation meet the appropriate conditions, the forming result diagram of the fabric is automatically generated based on the process parameters after the modification operation.

[0079] As shown in Figure 7 , the forming result diagram is a forming base diagram without filling the pattern organization. The forming result diagram is a diagram composed of a plurality of process rows 10. Specifically, in the plurality of process rows 10, a needle reduction row 11 with a different identifier from other process rows 10 is arranged. The needle reduction row 11 includes a needle reduction position 12, and the needle reduction position 12 is provided with a needle reduction color code. Through the plurality of process rows 10 and the related identifiers, the forming result diagram can represent the related process parameters, and the electronic terminal can perform the corresponding process operation by recognizing the forming result diagram. The position of the needle reduction color code represents the position of the loop overlap, and the number of the needle reduction color codes represents the number of the needle reduction.

[0080] After generating the forming result diagram of the fabric based on the process parameters after the modification operation, the shift rule is calculated based on the process parameters after the modification operation according to the difference between the needle reduction position and the number of needles, and the pattern organization is filled in the position before the needle reduction row 11 and the position after the needle reduction row 11 according to the shift rule to obtain the plate making pattern diagram.

[0081] Specifically, the shift rule is related to the position of the needle reduction color code, the number of process needles, etc. Based on the process parameters after the modification operation, the shift rule of the pattern organization can be directly calculated, and the pattern organization is moved according to the calculated shift rule to fill the pattern organization to the forming result diagram to obtain a complete plate making pattern diagram. The flat knitting machine can perform the corresponding knitting operation according to the plate making pattern diagram, thereby improving the knitting efficiency.

[0082] Please refer to Figure 8 , Figure 8 is the framework schematic diagram of an embodiment of the electronic terminal provided by the present application. As shown in Figure 8 , the present application further provides an electronic terminal 100, which comprises a processor 101 and a memory 102 connected with the processor 101, wherein the memory 102 stores program data, and the processor 101 calls the program data stored in the memory 102 to execute the plate making forming method described above.

[0083] The processor 101 can also be referred to as a CPU (Central Processing Unit). The processor 101 can be an electronic chip with signal processing capability. The processor 101 can also be a general-purpose processor, a DSP (Digital Signal Processor), an ASIC (Application-Specific Integrated Circuit), an FPGA (Field Programmable Gate Array) or other programmable logic device, a discrete gate or transistor logic device, a discrete hardware component. The general-purpose processor can be a microprocessor or the processor can also be any conventional processor.

[0084] The memory 102 can be a memory stick, a TF card, etc. It can store all information in the electronic terminal 100, including input raw data, computer programs, intermediate running results and final running results. It stores and retrieves information according to the location specified by the processor 101. With the memory 102, the electronic terminal 100 has a memory function and can work normally. The memory 102 of the electronic terminal 100 can be divided into main memory (internal memory) and auxiliary memory (external memory) according to the purpose, and there is also a classification method of external memory and internal memory. The external memory is usually a magnetic medium or an optical disc, etc. which can store information for a long time. The internal memory refers to the storage component on the motherboard, which is used to store the data and programs currently being executed, but only for temporary storage of programs and data. When the power is off or disconnected, the data will be lost.

[0085] Please refer to Figure 9 , Figure 9 is a framework diagram of an embodiment of the computer readable storage medium provided by the present application. As shown in Figure 9 , the present application also provides a computer readable storage medium 110, which stores program instructions 111 capable of realizing all the methods described above.

[0086] The functional units integrated in the various embodiments of the present application can be stored in the computer readable storage medium 110 if they are realized in the form of software functional units and sold or used as independent products. Based on this understanding, the technical solutions of the present application or the whole or part of the technical solutions that essentially contribute to the prior art can be embodied in the form of a software product. The computer readable storage medium 110 includes a plurality of instructions in a program instruction 111 to make a computer device (which can be a personal computer, a system server, or a network device, etc.), an electronic device (such as MP3, MP4, etc., which can also be a mobile terminal such as a mobile phone, a tablet computer, a wearable device, etc., or a desktop computer, etc.) or a processor to execute all or part of the steps of the various embodiments of the present application.

[0087] Those skilled in the art will understand that embodiments of this application can be provided as methods, systems, or computer program products. Therefore, this application can take the form of a completely hardware embodiment, a completely software embodiment, or an embodiment combining software and hardware aspects. Furthermore, this application can take the form of a computer program product embodied on one or more computer-readable storage media 110 (including but not limited to disk storage, CD-ROM, optical storage, etc.) containing computer-usable program code.

[0088] This application is described with reference to flowchart illustrations and / or block diagrams of methods, apparatus (systems), and computer program products according to embodiments of this application. It will be understood that each block of the flowchart illustrations and / or block diagrams, and combinations of blocks in the flowchart illustrations and / or block diagrams, can be implemented by computer-readable storage medium 110. These computer-readable storage media 110 can be provided to a processor of a general-purpose computer, special-purpose computer, embedded processor, or other programmable data processing apparatus to produce a machine, such that program instructions 111, executable by the processor of the computer or other programmable data processing apparatus, generate instructions for implementing the flowchart illustrations and / or block diagrams. Figure 1 One or more processes and / or boxes Figure 1 A device that provides the functions specified in one or more boxes.

[0089] These computer-readable storage media 110 may also be stored in a computer-readable memory that can direct a computer or other programmable data processing device to operate in a particular manner, such that program instructions 111 stored in the computer-readable storage medium 110 produce an article of manufacture including instruction means, which are implemented in a process Figure 1 One or more processes and / or boxes Figure 1 The function specified in one or more boxes.

[0090] These computer-readable storage media 110 may also be loaded onto a computer or other programmable data processing apparatus to cause a series of operational steps to be performed on the computer or other programmable apparatus to produce a computer-implemented process, thereby providing program instructions 111 that execute on the computer or other programmable apparatus for implementing the process. Figure 1 One or more processes and / or boxes Figure 1 Figure 1 The steps of the function specified in one or more boxes.

[0091] Table 1: Schematic diagram of process parameters for one embodiment

[0092]

[0093] Table 2: Schematic diagram of process parameters for another embodiment

[0094]

[0095] The above merely provides the implementation of the present application, and does not limit the patent scope of the present application, and any equivalent structure or equivalent process transformation made by using the content of the present application specification and drawings, or directly or indirectly applied in other related technical fields, are also included in the patent protection scope of the present application.

Claims

1. A method of pattern forming of a fabric, characterized by, The method comprises: obtaining process parameters of the fabric and corresponding multi-segment pattern organization diagrams, and generating a plurality of process contour diagrams of the fabric based on the process parameters; merging the plurality of process contour diagrams and the multi-segment pattern organization diagrams to obtain multi-segment process pattern contour diagrams; receiving modification operations on the multi-segment process pattern contour diagrams to correspondingly modify the process parameters of the fabric; the process parameters are multi-segment process parameters, and the step of generating a plurality of process contour diagrams of the fabric based on the process parameters comprises: identifying a break mark of the process parameters, and splitting the multi-segment process parameters into corresponding parameters of each segment process; generating a plurality of process contour diagrams according to the corresponding parameters of each segment process; wherein the process parameters comprise a plurality of process rows, and the break mark is arranged between adjacent two process rows in the multi-segment process; the process contour diagram comprises a plurality of process contours, the break mark is arranged with a preset mark rule, the needle number parameter of the break mark is 0, the number parameter of the break mark is 1, the mark rule comprises that the height parameter of the process row of the break mark is equal to the height parameter of the previous process row, and / or the width parameter of the process row of the break mark is equal to the width parameter of the previous process row.

2. The mold forming method according to claim 1, wherein the process parameters comprise a plurality of process rows, and the step of generating a plurality of process contour diagrams based on the process parameters comprises: obtaining the needle number parameter of each process row; selecting process rows with the same needle number parameter according to the order of the process rows, and taking the process rows with the same needle number parameter as the corresponding parameters of a segment process; generating a plurality of process contour diagrams according to the corresponding parameters of the multi-segment process.

3. The mold-forming method according to claim 1, wherein The process parameters include a needle reduction position parameter, and the step of receiving modification operations on the multi-segment process pattern contour diagrams comprises: receiving a marquee operation on a partial area of at least one segment of the process pattern contour diagram, generating an adjustment interface according to the marquee area selected by the marquee operation; receiving a modification operation on the adjustment interface.

4. The method according to claim 3, wherein The step of receiving a modification operation on the adjustment interface further comprises: obtaining the needle reduction position parameter after the modification operation; updating the process contour diagram based on the needle reduction position parameter after the modification operation, so that the pattern organization in the pattern organization diagram is located within the needle reduction contour of the process contour diagram.

5. The mold-forming method according to claim 1, wherein After the step of receiving modification operations on the multi-segment process pattern contour diagrams to correspondingly modify the process parameters of the fabric, the method further comprises: generating a forming result diagram of the fabric based on the process parameters after the modification operation; calculating a deviation rule based on the process parameters after the modification operation; filling the pattern organization in the pattern organization diagram to the forming result diagram according to the deviation rule to obtain a plate-making pattern diagram of the fabric.

6. An electronic terminal, characterized in that The method comprises a processor and a memory connected to the processor, wherein the memory stores program data, and the processor calls the program data stored in the memory to execute the plate-making forming method according to any one of claims 1-5.

7. A computer readable storage medium characterized by program instructions are executed to implement the method of claim 1-5.

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