Manifold for substrate container

Abstract

A substrate container includes a housing defining an interior space and a manifold having an inlet and a gas distribution surface. The housing includes a front opening, a bottom wall, and a back wall. The manifold is attached to the bottom wall and is closer to the front opening than the back wall. The gas distribution surface is configured to distribute purge gas into the interior space. A method of purging a substrate container includes supplying a first flow of purge gas to a manifold and supplying a second flow of purge gas to an interior space of the substrate container. The method also includes the manifold distributing the purge gas of the first flow within the interior space of the substrate container.

Description

[0001] CROSS-REFERENCE TO RELATED APPLICATIONS

[0002] This application claims the benefit of and priority to U.S. Provisional Application No. 62 / 986,142, filed March 6, 2020, the entirety of which is incorporated by reference herein for all purposes. TECHNICAL FIELD

[0003] The present disclosure relates generally to a substrate container having a front opening. More specifically, the present disclosure relates to supplying a purge gas to the interior of the container. BACKGROUND

[0004] Substrates in the form of wafers can be processed to form semiconductor devices. Wafer substrates (or simply substrates) undergo a series of process steps. Exemplary process steps can include, but are not limited to, deposition of material layers, doping, etching, or material chemical or physical reactions of the substrate. Substrate containers are used to store and transport wafers between process steps in a manufacturing facility. During some process steps, the substrates are handled by processing equipment in a dust-free environment, such as a clean room. The substrates can be transferred from the substrate containers through an equipment front end module (EFEM) to a processing tool. The EFEM generally includes a load port for receiving a substrate container, a transfer unit, a frame or “mini-environment,” and a fan filter unit for generating a gas flow within the EFEM.

[0005] In use, the substrate container is docked on the load port, and the door of the EFEM 18 is opened. The door is then disengaged from the substrate container to allow a transfer unit housed within the EFEM to access the substrate housed within the substrate container for processing. The gas flow introduced by the fan filter unit flows through the EFEM in a direction from the top of the EFEM to the bottom of the EFEM. When the front opening of the substrate container interfaces with the load port opening of the EFEM, some of the gas flowing through the EFEM and across the load port opening can be inadvertently directed into the interior of the container to potentially interfere with the purging capabilities of the substrate container by temporarily causing an increase in the relative humidity and / or oxygen content within the mini-environment of the substrate container, which is not desirable. SUMMARY

[0006] In an embodiment, a method of purging an open front substrate container includes supplying a first flow of a purge gas to an inlet of a manifold within the substrate container, the manifold distributing the purge gas within an interior space, and supplying a second flow of a purge gas to the interior space. The first flow is supplied via a front inlet port closer to the front opening than to a back wall of the substrate container. The second flow is supplied via a back inlet port closer to the back wall than to the front opening of the substrate container.

[0007] In an embodiment, a substrate container includes a housing and a manifold. The housing defines an interior space and includes a front opening, a first sidewall, a second sidewall, a back wall, and a bottom wall. The bottom wall has a front edge extending between the first sidewall and the second sidewall along the front opening of the housing. The manifold is attachable to any of the bottom wall, a top wall, or a sidewall, or some combination thereof. In one embodiment, the manifold is attached to the bottom wall and is closer to the front opening than the back wall. The manifold includes an inlet for receiving a purge gas and a gas distribution surface configured to distribute the purge gas within the interior space. The gas distribution surface includes a first gas distribution portion extending between the first sidewall and the second sidewall in one direction. In another embodiment, the manifold includes an outlet for exhausting purge gas. BRIEF DESCRIPTION OF DRAWINGS

[0008] The described and other features, aspects, and advantages of the substrate container and methods of purging a substrate container will be better understood from the following drawings, detailed description, and claims.

[0009] Figure 1 is a front perspective view of an embodiment of a substrate container.

[0010] Figure 2A is a front perspective view of a substrate container in Figure 1 according to an embodiment when open.

[0011] Figure 2B is a cross-sectional view of a substrate container in Figure 2A according to an embodiment when attached to a front end module of an apparatus.

[0012] Figure 3 is a bottom view of a substrate container in Figure 1 according to an embodiment.

[0013] Figure 4 is a front perspective view of an embodiment of a manifold of a substrate container.

[0014] Figure 5A is a front perspective view of an embodiment of a manifold of a substrate container.

[0015] Figure 5B is an exploded view of Figure 5A a manifold in

[0016] Figure 6A is a front perspective view of an embodiment of a substrate container.

[0017] Figure 6B is an exploded view of a manifold of a substrate container in Figure 6A according to an embodiment.

[0018] Figure 7A is a front perspective view of an embodiment of a substrate container.

[0019] Figure 7B is a front perspective view of a manifold of a substrate container according to an embodiment Figure 7A

[0020] Figure 8A is a front perspective view of an embodiment of a substrate container

[0021] Figure 8B is a front perspective view of a manifold of a substrate container according to an embodiment Figure 8A

[0022] Figure 9A is a front perspective view of an embodiment of a substrate container

[0023] Figure 9B is a bottom perspective view of a substrate container of Figure 9A

[0024] Figure 10 is a block diagram of an embodiment of a method of purifying a substrate container

[0025] While the disclosure is amenable to various modifications and alternative forms, specifics thereof have been shown by way of example in the drawings and will be described in detail. It should be understood, however, that the intention is not to limit aspects of the disclosure to the particular illustrative embodiments described. On the contrary, it is intended to cover all modifications, equivalents, and alternatives falling within the spirit and scope of the disclosure. DETAILED DESCRIPTION

[0026] As used in this specification and the appended claims, the singular forms "a," "an," and "the" include plural referents unless the content clearly dictates otherwise. As used in this specification and the appended claims, the term "or" is generally employed in its sense of meaning at least one of the pieced it joins.

[0027] The term "about" generally refers to a range of values that are considered equivalent to the recited value (e.g., have the same function or result). In many instances, the term "about" can include values rounded to the nearest significant figure.

[0028] The following detailed description should be read with reference to the drawings, in which like elements in different drawings are identically numbered. The detailed description and drawings, which are not necessarily to scale, depict illustrative embodiments and are not intended to limit the scope of the application. The illustrative embodiments depicted are merely exemplary. Selected features of any illustrative embodiment can be incorporated into an additional embodiment unless clearly stated otherwise.

[0029] ​​​The present disclosure relates generally to a front manifold for a substrate container having a front opening for accessing an interior space of the substrate container. The substrate container is used, for example, to carry substrates during semiconductor manufacturing. More specifically, the present disclosure relates to a manifold configured to distribute a purge gas within the interior space to prevent gas from entering the front opening of the substrate container when opened. In some embodiments, the manifold can be configured as an outlet to facilitate the evacuation of the purge gas from the substrate container when closed.

[0030] Substrates in the form of wafers can be processed to form semiconductor devices. A substrate container is a container used to carry substrates during processing. Substrates can be stored within the substrate container before and during different process steps. The substrate container is accessed through a front opening of the substrate container. The substrate container can be, for example, a front opening unified pod (FOUP).

[0031] Figures 1 to 3 A substrate container 1 according to embodiments of the present disclosure is shown. Figure 1 and 2A Each is a front perspective view of a substrate container 1. Figure 2B is a cross-sectional view of the substrate container 1 when attached to an equipment front end module 3. Figure 3 is a bottom view of the substrate container 1. Dashed lines are provided in the figure to indicate obscuring features (e.g., edges, openings, etc.). As Figure 1 shown in FIG. 1, the substrate container 1 includes a front door 4 and a housing 6. The front door 4 is received within a front opening 12 of the housing 6 and forms an enclosed interior space 8. The interior space 8 will be discussed in more detail below.

[0032] Figure 2A A substrate container 1 is illustrated with the front door 4 removed (e.g., opened). As Figure 2A shown in FIG. 1, the housing 6 defines the interior space 8 of the substrate container 1. Substrates (e.g., substrates 590 in FIG. 5) are stored in the interior space 8 of the substrate container 1. The housing 6 includes a front opening 12. The door 4 is received within the front opening 12 of the housing 6 to obstruct the front opening 12. The substrate container 1 can be accessed by moving (e.g., opening, removing) the door 4. For example, Figure 8A The door 4 in FIG. 1 is received in the housing 6 by inserting the door 4 into the housing 6. In embodiments, one or more of the door 4 and the housing 6 can include a locking mechanism (not shown in the figures) to prevent accidental removal of the door 4. Figure 1 As

[0033] Figure 2A ​As shown in the middle, the housing 6 includes a front opening 12, a first side wall 14, a second side wall 16, a back wall 18, and a top wall 20 and a bottom wall 22. The first side wall 14 is opposite the second side wall 16, and the top wall 20 is opposite the bottom wall 22. The first side wall 14 can be referred to as the left side, and the second side wall 16 can be referred to as the right side. The top wall 20 and the bottom wall 22 each extend between the first side wall 14 and the second side wall 16. The housing 6 includes a front edge extending between the opposite walls. The bottom wall 22 includes a front edge 24A extending along the front opening 12. The front edge 24A also extends between the first side wall 14 and the second side wall 16 of the housing 6. The first side wall 14 includes a front edge 24B extending along the front opening 12. The front edge 24B of the first side wall 14 also extends between the top wall 20 and the bottom wall 22 of the housing 6. As shown in the middle, the front edge 24A, 24B of the housing 6 is configured to allow a substrate container 1 to be inserted into the housing 6 through the front opening 12. For example, the front edge 24A, 24B of the housing 6 is configured to allow a substrate container 1 to be inserted into the housing 6 through the front opening 12 in a direction that is substantially parallel to the front edge 24A, 24B of the housing 6. For example, the front edge 24A, 24B of the housing 6 is configured to allow a substrate container 1 to be inserted into the housing 6 through the front opening 12 in a direction that is substantially perpendicular to the front edge 24A, 24B of the housing 6. Figure 2A As shown in the middle, in an embodiment, the front edges 24A, 24B are each directly adjacent to the front opening 12.

[0034] The substrate container 1 can include a device hook 26 on the top wall 20 of the housing 6. In an embodiment, the device hook 26 allows a standard robotic accessory (not shown in the figures) (such as, but not limited to, a robot arm) for moving the substrate container 1 to be connected to the substrate container 1. For example, a robot arm can be used to move the substrate container 1 between different processing devices. In an embodiment, the substrate container 1 can include one or more handles (not shown in the figures) that allow a user (such as a technician, etc.) to manually move the substrate container 1.

[0035] The substrate container 1 can include a plurality of shelves 28 for holding substrates (not shown in the figures) in the interior space 8. A portion of the shelves 28 on the second side wall 16 is obscured in the middle, which can have a configuration similar to a portion of the shelves 28 on the first side wall 14 (such as a slot in the substrate container of FIG. 1). Figure 2A Figure 7A The shelves 28 are sized to each hold a substrate (not shown in the figures) within the interior space 8. For example, in an embodiment, the shelves 28 are sized to hold a substrate of a particular size (such as a 150 mm wafer, a 200 mm wafer, etc.).

[0036] When the substrate container 1 is open, a purge gas can be supplied to the interior space 8 to reduce the entry of an external environment (such as gases, particles, moisture, etc.) into the substrate container 1 through the front opening 12. For example, the supplied purge gas is configured to flow out of the interior space 8 through the front opening 12, which helps to minimize any inward flow through the front opening 12 into the interior space 8. The purge gas can be a substantially inert gas. The purge gas can include one or more of nitrogen, clean dry air (CDA), and extra clean dry air (xCDA), for example, but not limited to.

[0037] ​In contrast, when the door 4 is received within the front opening 12 and the substrate container 1 is closed, a purge gas can continue to be supplied to the interior space 8 of the substrate container 1. The purge gas can be discharged through one or more manifolds to the exterior of the substrate container 1 (e.g., described herein according to various embodiments), which can function as both an inlet and an outlet or only as an outlet, depending on the configuration and desired application. The positive pressure of the purge gas within the interior space 8 creates a diffusion gradient to facilitate the flow of the purge gas from the interior space through the one or more outlets to the exterior of the substrate container. In some embodiments, the manifold(s) can include a check valve that allows air to be introduced into the interior space 8 and / or to be exhausted from the interior space, depending on the directional flow of the air.

[0038] The substrate container 1 includes a plurality of inlet ports 34A, 34B, 36A, 36B for supplying a purge gas into the interior space 8. For example, the substrate container 1 is configured to be supplied with a first flow fl of purge gas through a first inlet port 34A, a second flow f2 of purge gas through a second inlet port 34B. Another flow f3 of purge gas is supplied to a rear inlet port 36A. The substrate container 1 includes a front manifold 40 that distributes the first flow fl of purge gas into the interior space 8. Figure 2A The front manifold 40 in

[0039] Figure 2B is a cross-sectional view of the substrate container 1 when attached to the equipment front end module 3. When the substrate container 1 is attached to the equipment front end module 3, the front opening 12 is positioned along the interior of the equipment front end module. A gas flow f4 (e.g., xCDA or nitrogen) is continuously directed through the interior of the equipment front end module 3 to reduce contaminants within the equipment front end module 3. The gas flow f4 flows through the front opening 12 (e.g., along a direction Dl). The front manifold 40 is configured to distribute purge gas along the front opening 12 to resist turbulent flow of gas through the front opening 12 into the interior space 8. The entry of gas flowing through the equipment front end module can temporarily cause an increase in the relative humidity and / or oxygen content within the microenvironment of the substrate container, which is not desirable. The front manifold 40 will be discussed in more detail below.

[0040] As shown in Figure 3 The bottom wall 22 includes inlet ports 34A, 34B, 36A, 36B. The housing 6 has an outer surface 30. For example, the bottom wall 22 forms part of the outer surface 30. The inlet ports 34A, 34B, 36A, 36B are each from the interior space 8 (as shown in Figure 2A(As shown in the figure) Extends through the bottom wall 22 to the outer surface 30 of the housing 6. The substrate container 1 includes four inlet ports 34A, 34B, 36A, and 36B. However, in embodiments, the substrate container 1 may include a different number of inlet ports 34A, 34B, 36A, and 36B. In embodiments, the substrate container 1 may include one or more inlet ports 34A, 34B, 36A, and 36B. In embodiments, the substrate container 1 may include one or more front inlet ports 34A and 34B and one or more rear inlet ports 36A and 36B. In embodiments, the substrate container 1 may include a distribution structure (not shown) for each of the rear inlet ports 36A and 36B. In embodiments, one of the front ports 34A and 34B may be an outlet port for releasing gas from the internal space 8 to the outside of the substrate container 1.

[0041] like Figure 2A As shown, the front manifold 40 includes a first inlet 42A, a second inlet 42B, a frame 44, and a gas distribution surface 46. The first inlet 42A of the manifold 40 is attached to a first inlet port 34A. The second inlet 42B of the manifold 40 is attached to a second inlet port 34B. Figure 2A In the present embodiment, the front manifold 40 is connected to two inlet ports 34A and 34B. However, in some embodiments, the front manifold 40 may be connected to one or more inlet ports 34A. In one embodiment, the front manifold 40 may be connected to a single inlet port 34A. In this embodiment, the front manifold 40 may have a single inlet 42A connected to the single inlet port 34A.

[0042] exist Figure 2A In this configuration, a gas distribution surface 46 surrounds a frame 44. As shown in Figure 2, the frame 44 has a generally cylindrical shape. The frame 44 has a plurality of openings 45 disposed along a length L1 of the gas distribution surface 46. For example, the openings 45 are disposed in the transverse surface of the generally cylindrical frame. The purified airflow within the frame 44 exits the frame through the openings 45, flows through portions of the distribution surface 46 covering the openings 45, and is distributed into the interior space 8.

[0043] In this embodiment, the gas distribution surface 46 is made of a porous material. A porous material is a material containing channels formed by tiny openings. The porous material may include (e.g., but not limited to) nonwoven polymers, sintered polymer materials, and polymer films. For example, sintered polymer materials are formed by at least sintering polymer particles together. The polymer is a polymer suitable for handling semiconductor wafers, such as (but not limited to) polytetrafluoroethylene (PTFE), unsaturated polyethylene (UPE), and polyethylene.

[0044] Purified gas flowing into manifold 40 is distributed by gas distribution surface 46. Gas distribution surface 46 is configured to distribute purified gas flowing into manifold 40 (e.g., a first stream f1 of purified gas, a second stream f2 of purified gas) into interior space 8. In an embodiment, gas distribution surface 46 is configured to distribute a portion of the purified gas into interior space 8 along direction D2 toward front opening 12. In an embodiment, manifold 40 may include a flow guide (not shown) for guiding the purified gas flow along direction D2 from gas distribution surface 46. In this embodiment, the flow guide may be a snap-fit ​​on a flow guide attached to frame 44.

[0045] like Figure 2A As shown, the gas distribution surface 46 has a direction D S A first gas distribution portion 48A extends between the first sidewall 14 and the second sidewall 16 of the housing 6. The first gas distribution portion 48A also extends along the front edge 24A of the bottom wall 22 of the housing 6. The first gas distribution portion 48A has a length L1 extending along most of the distance d1 between the first sidewall 14 and the second sidewall 16.

[0046] like Figure 2B As shown, the first gas distribution portion 48A of the gas distribution surface 46 distributes a portion of the purified gas into the internal space 8 along a direction D2 at an angle α relative to the bottom wall 22 of the housing 6. Figure 2B The angle α is 30° relative to the bottom wall 22. In an embodiment, the first gas distribution section 48A distributes gas from 1 liter per minute (LPM) to 50 LPM at an angle α (0 ≤ α ≤ 180) relative to the bottom wall 22, ranging from 0° to 180°. In an embodiment, the first gas distribution section distributes purified gas at an angle α (0 < α ≤ 90) relative to the bottom wall 22, which is 90° or less than 90° but greater than 0°. In an embodiment, the first surface distribution surface section 48A is configured to distribute purified gas from 3 LPM to 300 LPM. In an embodiment, the first distribution surface is configured to distribute purified gas from 3 LPM to 300 LPM along direction D2.

[0047] Figure 4 This is a front perspective view of a front manifold 140 according to another embodiment of the present disclosure. Except as described below, the manifold 140 is attached to the interior space of the substrate container in a manner similar to that of the front manifold 40 of FIG2. The manifold 140 is configured to disperse purge gas into the interior space along the front opening of its substrate container, as discussed similarly to manifold 40 in FIG2.

[0048] Manifold 140 includes an inlet 142, a frame 144, and a distribution surface 146. Inlet 142 is attached to a front inlet port (e.g., front inlet port 34A, front inlet port 34B) in a bottom wall of a housing of a substrate container. Inlet 142 is configured to receive a flow of purge gas (e.g., first flow of purge gas fl, second flow of purge gas f2) through the front inlet port. In Figure 4 In some embodiments, manifold 140 includes a single inlet 142. However, in embodiments, manifold 140 can include multiple inlets 142. For example, in embodiments, manifold 140 can include two inlets similar to manifold 40 in FIG. 2.

[0049] Distribution surface 146 can include a first gas distribution portion 148A, a second gas distribution portion 148B, a third gas distribution portion 148C, and a fourth gas distribution portion 148D. Each of surface distribution portions 148A-D is positioned adjacent to, and in some cases attached to, a different wall (e.g., first side wall 14, second side wall 16, top wall 20, bottom wall 22) of an interior space of a substrate container adjacent to a front opening. First gas distribution portion 148A has a position similar to first gas distribution portion 48A in Figure 2A Second gas distribution portion 148B is configured to extend along a second side wall (e.g., first side wall 14 of housing 6) of a housing of a substrate container.

[0050] Second gas distribution portion 148B extends between a top wall and a bottom wall of a housing (e.g., between top wall 20 and bottom wall 22 of housing 6). Second gas distribution portion 148B also extends along a front edge of a first side wall of the housing (e.g., along front edge 24B of first side wall 14 of housing 6). Second gas distribution portion 148B has a length L2 that extends along a majority of a distance between the top wall and the bottom wall of the housing (e.g., a majority of a distance between top wall 20 and bottom wall 22 of housing 6).

[0051] Third gas distribution portion 148C is positioned along a second side wall of a housing (e.g., second side wall 16 of housing 6) in a manner similar to that discussed above with respect to second gas distribution portion 148B and the first side wall of the housing. Fourth gas distribution portion 148D is positioned along a top wall of a housing (e.g., top wall 20 of housing 6) in a manner similar to that discussed above with respect to second gas distribution portion 148B and the first side wall of the housing.

[0052] In some embodiments, as Figure 4As depicted in FIG. 1, the gas distribution surface 146 encircles the frame 144 in a manner similar to that discussed above with respect to the gas distribution surface 46 and the frame 44 in FIG. 2. The frame 144 includes opening(s) 145 similar to the opening 45 in FIG. 2. The opening(s) 145 are positioned along the length of each portion of the gas distribution surface 146. For example, the frame 144 includes opening(s) 145 along each of the surface distribution portions 148A-D. In other embodiments, the surface distribution portions 148A-D can be configured similar to the surface distribution portions 148A-D described below with respect to Figure 6A and 6B The gas distribution portions shown and described can be configured and can include a thin film or porous material surrounded by a frame.

[0053] In embodiments, one or more of the surface distribution portions 148A-D are configured to distribute a portion of the purge gas into the interior space in a direction D3 toward a front opening of the enclosure, such as the front opening 12 of the enclosure 6. In embodiments, each of the surface distribution portions 148A-D are configured to distribute a portion of the purge gas into the interior space in a direction D3 toward a front opening of the enclosure.

[0054] Figure 5A and 5B A front manifold 240 according to another embodiment of the disclosure is shown. Figure 5A is a front perspective view of the front manifold 240. Figure 5B is an exploded view of the front manifold 240. Except as will be described below, the manifold 240 is attached within an interior space of a substrate container in a manner similar to the front manifold 40 of Figure 2A The manifold 240 is configured to disperse purge gas along a front opening of its substrate container into the interior space, as similarly discussed above with respect to the manifold 40 in Figure 2A

[0055] The manifold 240 includes two inlets 242A, 242B, a frame 244, and a thin film 247. The thin film 247 includes a gas distribution surface 246. The inlets 242A, 242B are attached to first and second front inlet ports in a bottom wall of a housing of a substrate container, such as the first and second front inlet ports 34A, 34B. The inlets 242A, 242B are each configured to receive a respective flow of purge gas through its respective front inlet port, such as the first flow of purge gas fl and the second flow of purge gas f2. Figure 5A and 5B The manifold 240 in FIG. 1 includes two inlets 242A, 242B. However, in embodiments, the manifold 240 can include a different number of inlets 242A, 242B. For example, in embodiments, the manifold 240 can include a single inlet 242A, 242B similar to the manifold 140 in Figure 4 FIG. 1.​

[0056] The gas distribution surface 246 includes a first gas distribution portion 248A, a second gas distribution portion 248B, a third gas distribution portion 248C, and a fourth gas distribution portion 248D. Each of the surface distribution portions 248A-248D extends along a different wall (e.g., the first side wall 14, the second side wall 16, the top wall 20, the bottom wall 22) of the interior space of the substrate container adjacent to the front opening. For example, the first gas distribution portion 248A has a position similar to the first gas distribution portion 48A in FIG. 2. For example, the second gas distribution portion 248B, the third gas distribution portion 248C, and the fourth gas distribution portion 248D each have a position similar to the positions discussed above for the second gas distribution portion 148B, the third gas distribution portion 148C, and the fourth gas distribution portion 148D of the manifold 140 in FIG. 1. Figure 4

[0057] Figure 5B The film 247 is illustrated separate from the frame 244. In embodiments, the film 247 can be attached to the frame 244. The film 247 can be attached to the frame 244 by, for example, but not limited to, thermal bonding. In embodiments, the film 247 can be a die-cut film or a film sheet. The film is an example of a porous material. In embodiments, the porous material can be one of a non-woven polymer, a sintered polymer material, and a polymer film, such as the film 247. The film 247 includes one or more polymers. The polymer(s) of the film 247 are polymers suitable for handling semiconductor wafers, such as, but not limited to, polytetrafluoroethylene (PTFE), unsaturated polyethylene (UPE), and polyethylene. In embodiments, a sintered material or a non-woven polymer can be used in place of the film 247.

[0058] The frame 244 includes a channel 249. The film 247 is positioned along the channel 249. Purge gas from the inlets 242A, 242B flows through the channel 249 and then through the film 247 to exit the manifold 240. The film 247 distributes the purge gas into the interior space. More specifically, the distribution surface 246 of the film 247 distributes the purge gas into the interior space.

[0059] The front manifold 240 is configured such that the gas distribution surface 246 distributes at least a portion of the purge gas in a direction D4 toward the front opening (e.g., the front opening 12) of the housing of the substrate container. In embodiments, the frame 244 can be configured to angle the direction D4 in which the gas distribution surface 246 distributes the purge gas.

[0060] In Figure 5A and 5B ​In some embodiments, the manifold 240 is configured to extend along the entire periphery of the front opening of the substrate container. However, in embodiments, the manifold 240 can be configured to extend along one or more walls of the substrate container. For example, in embodiments, the manifold 240 can extend along only the bottom wall of the substrate container, similar to the manifold 40 in FIG. 2.

[0061] Figure 6A is a front perspective view of an embodiment of a substrate container 300. Figure 6A The front door of the substrate container 300 is removed (e.g., the substrate container 300 is opened) in Figure 1 The front door of the substrate container 300 is removed (e.g., the substrate container 300 is opened) in Figures 1 to 3 The substrate container 300 includes a housing 306 and a front manifold 340. Except with respect to the front manifold 340, the substrate container 300 can have a structure and configuration similar to that of the substrate container 1 in Figures 1 to 3 The substrate container 300 includes an interior space 308, a front opening 312, a first side wall 314 and a second side wall 316, a bottom wall 322 having a front edge 324A, and ports 334A, 334B, 336A, 336B in the bottom wall 322 of the housing 306, similar to the substrate container 1 in Figures 1 to 3 In embodiments, the substrate container 300 and its housing 306 can have features (e.g., additional inlets, a single back inlet, slots, etc.) discussed similarly above with respect to the substrate container 1 in

[0062] As shown in Figure 6A A first flow of purge gas flmay be supplied to the substrate container 300 through a first inlet port 334A in the bottom wall 322 of the housing 306, as shown in

[0063] The gas distribution surface 346 includes a first gas distribution portion 348A extending along the front edge 324A of the bottom wall 322 of the housing 306 between the first side wall 314 and the second side wall 316 of the housing 306. For example, the first gas distribution portion 348A can have a configuration (e.g., length, position relative to the front opening 312, relative position in or along the interior space, etc.) similar to that of the first gas distribution portion 48A discussed above with respect to the substrate container 1 in Figure 2A

[0064] Figure 6B ​is an exploded view of the manifold 340. The manifold 340 includes an inlet 342A, a frame 344, a membrane 347, a channel 349, and a cover 350. The inlet 342A is attached to the first front port 334A in the bottom wall 322 of the housing 306. The membrane 347 is held in place between the cover 350 and the frame 344. In various embodiments, the membrane 347 can be attached to the frame 344 in a different manner than the cover 350. For example, in embodiments, the membrane 347 can be attached to the frame 344 by ultrasonic welding, mechanically captured in a serpentine path (e.g., using the cover 350), or by laser welding.

[0065] The membrane 347 can be, for example, a porous material. In embodiments, the porous material can be one of a non-woven polymer, a sintered polymer material, or a polymer membrane. The membrane 347 includes one or more polymers. The polymer(s) of the membrane 347 are polymers suitable for handling semiconductor wafers, such as, but not limited to, polytetrafluoroethylene (PTFE), unsaturated polyethylene (UPE), and polyethylene. In embodiments, a sintered material or a non-woven polymer can be used in place of the membrane 347.

[0066] The channel 349 is fluidly connected to the first inlet 342A and is disposed below the membrane 347. Purified gas that enters through the first inlet 342A flows into the channel 349 and then exits the manifold 340, through the membrane 347, and then flows through the gas distribution surface 346 of the membrane 347.

[0067] The frame 344 is attached to the bottom wall 322 of the housing 306 within the substrate container 300. For example, the frame 344 can be at least partially disposed in the bottom wall 322 of the housing 306, as Figure 6A shown. In embodiments, the frame 344 can be integrally formed with the housing 306. In such embodiments, the frame 344 can be formed as an integral part of the bottom wall 322 of the housing 306 (e.g., the housing 306 is molded to include the frame 344).

[0068] The substrate container 300 includes a second front port 334B disposed in the bottom wall 322 of the housing 306. A second inlet 342B of the manifold 340 is attached to the second front port 334B. As Figure 6AAs shown, the second front port 334B is disposed in the bottom wall 322 of the housing 306 between the inlet 342A and the second side wall 316. In an embodiment, the second front port 334B is configured as an outlet port for venting gas from the interior space 308. In this embodiment, the purified gas circulates through the enclosed interior space 308 (e.g., when the front door 4 is closed) by supplying purified gas via one or more rear ports 336A, 336B and venting purified gas from the enclosed interior space 308 via manifold 340 and the second front port 334B. In some cases, the rear ports 336A, 336B may cooperate with a purified gas manifold or purification tower (e.g., as shown in Figure 7) to facilitate the supply of purified gas into the interior space 308.

[0069] In some cases, a valve (e.g., a check valve) may be incorporated into the second front port 334B, which will open after a positive pressure is applied from within the interior space 308 of the substrate container to facilitate the discharge of purge gas through the second front port 334B. In other embodiments, each of the first front port 334A and the second front port 334B may be configured such that it can operate as both an inlet port and / or an outlet port, depending on the application. In one example, each of the first front port 334A and / or the second front port 334B may include a valve (e.g., an umbrella valve) that opens in a first direction or a second direction depending on the direction of airflow through the valve.

[0070] In various embodiments, Figures 1 to 3 The second front port 34B in the substrate container 1 can be similarly configured as an outlet port.

[0071] Figure 7A This is a front perspective view of an embodiment of substrate container 400. The front door of substrate container 400 is removed in Figure 7 (e.g., substrate container 400 is open). Substrate container 400 is constructed from materials similar to... Figure 1 The front door of the fourth door in the middle is closed.

[0072] The substrate container 400 includes a housing 406 and a front manifold 440. Except for its relation to the front manifold 440, the substrate container 400 may have similar features to... Figures 1 to 3 The structure and configuration of the substrate container 1 are described. For example, the substrate container 400 includes an internal space 408, a front opening 412, a bottom wall 422, and ports 434A, 434B, 436A, and 436B in the bottom wall 422 of the housing 406, similar to... Figures 1 to 3 The substrate container 1 in the middle. In an embodiment, the housing 406 may have the above-described relative to the substrate container 1. Figures 1 to 3 Features similar to those discussed in substrate container 1 (e.g., additional inlet, single rear inlet, slot, etc.). Figure 7AAs shown in the middle, the back ports 436A, 436B can each have a gas distribution manifold 438A, 438B that helps increase distribution of the purge gas supplied to the respective back ports 436A, 436B along the height of the interior space 408.

[0073] The manifold 440 includes a frame 444 and a membrane 447. The membrane 447 includes a gas distribution surface 446. In a manner similar to that discussed above with respect to the first distribution surface portion 348A in the substrate container 300 in FIG. 3, the gas distribution surface 446 extends along the front opening 412. Figure 6A In a manner similar to that discussed above with respect to the flow of purge gas to the substrate container 300 in FIG. 3, a flow of purge gas is supplied to the substrate container 400 through the first front port 434A and distributed into the interior space 408 by the gas distribution surface 446 of the manifold 440. The purge gas flows through the membrane 447 and is distributed into the interior space 408 from the gas distribution surface 446. The gas distribution surface 446 includes a first distribution surface portion 448A that extends along the front opening 412 in a manner similar to that discussed above with respect to the first distribution surface portion 348A in the substrate container 300 in FIG. 3. Figure 6A

[0074] The substrate container 400 includes a second front port 434B in the bottom wall 422 of the housing 406. The second front port 434B is for venting gas (e.g., purge gas) from the interior space 408, as similarly discussed above with respect to the second front port 334B in the substrate container 300 in FIG. 3. The frame 444 includes a flange 452 that supports a lip 435 of the second front port 434B. The manifold 440 does not cover the second front port 434B. For example, gas in the interior space 408 can flow into and through the second front port 434B without passing through the membrane 447 or the gas distribution surface 446. Figure 6A

[0075] Figure 7B A front perspective view of the front manifold 440 is shown. The manifold includes an inlet 442, a frame 444, and a membrane 447. The inlet 442 is attached to the first front port 434A in the housing 406. The flange 452 includes an opening 454. When installed into the substrate container 400, the lip 435 of the second front port 434B fits into the opening formed by the flange 452, which secures the frame 444 in place and helps prevent the front manifold 440 from being accidentally detached or moved. In embodiments, the membrane 447 can be attached to the frame 444 by one of ultrasonic welding, mechanical capture in a tortuous path (e.g., using the lid 350), or laser welding.

[0076] ​​Thin film 447 is an example of a porous material. In embodiments, the porous material can be one of a non-woven polymer, a sintered polymer material, and a polymer thin film, such as thin film 447. Thin film 447 includes one or more polymers. The polymer(s) of thin film 447 are polymers suitable for handling semiconductor wafers, such as, but not limited to, polytetrafluoroethylene (PTFE), unsaturated polyethylene (UPE), and polyethylene. In embodiments, a sintered material or a non-woven polymer can be used in place of thin film 447.

[0077] Figure 8A is a front perspective view of an embodiment of a substrate container 500. Figure 8B is a cross-sectional view of a substrate container 500 according to an embodiment. Figure 8A and 8B the front door of substrate container 500 is removed (e.g., substrate container 500 is open). For example, substrate container 500 can be opened by a user similar to Figure 1 the front door 4 of substrate container 1 in

[0078] As shown in Figure 8A substrate container 500 includes a housing 506, a first front manifold 540A, and a second front manifold 540B. Substrate container 500 can generally have a structure and configuration similar to substrate container 1 in Figures 1 to 3 with respect to front manifolds 540A, 540B. For example, substrate container 500 includes an interior space 508, a front opening 512, a first wall 514, a second wall 516, a top 520 having a front edge 524B, a bottom wall 522 having a front edge 524A, and ports 534A, 536 in bottom wall 522 of housing 506, similar to substrate container 1 in Figures 1 to 3 In embodiments, housing 506 can have features discussed similarly above with respect to substrate container 1 in Figures 1 to 3 Figure 8A As shown in

[0079] As shown in Figure 8A first manifold 540A is attached to bottom wall 522 and second manifold 540B is attached to top wall 520. First manifold 540A and second manifold 540B each include a gas distribution surface 546A, 546B extending between first side wall 514 and second side wall 516 in direction D S Gas distribution surface 546A of first manifold 540A also extends along front edge 524A of bottom wall 522, and gas distribution surface 546B of second manifold 540B also extends along front edge 524B of top wall 520.

[0080] ​The gas distribution surface 546A of the first manifold 540A has a first gas distribution portion 548A with at least one slit for distributing purge gas. The slit 541 can extend along the length L3 of the first gas distribution portion 548A. The slit 541 is configured to expel a jet of purge gas at a high speed (e.g., air speed greater than 0.3 m / s) that can entrain and direct the flow of ambient air. In some embodiments, the first gas distribution portion 548A can include a plurality of slits 541 distributed along the length of the first gas distribution surface.

[0081] As shown in Figure 8B The substrate container 500 includes a plurality of inlet ports 534A, 536 for supplying purge gas into the interior space 508. For example, the substrate container 500 is configured to be supplied with a first flow f1 of purge gas through the first inlet port 534A. Another flow f3 of purge gas is also supplied to the rear inlet ports 536 (one rear inlet port is obscured in Figure 8A The substrate container 500 includes a plurality of inlet ports 534A, 536 for supplying purge gas into the interior space 508. For example, the substrate container 500 is configured to be supplied with a first flow f1 of purge gas through the first inlet port 534A. Another flow f3 of purge gas is also supplied to the rear inlet ports 536 (one rear inlet port is obscured in

[0082] The manifold 540A is configured to distribute the purge gas supplied through the first front inlet port 534A. The inlet 542A of the manifold 540A receives the purge gas via the first inlet port 534A and the distribution surface 546A of the manifold 540A distributes the purge gas into the interior space 508. A jet of the purge gas is expelled at a high speed (e.g., air speed greater than 0.3 m / s) from the slit 541 of the distribution surface 546A in the forward direction D6 into the interior space 508. For example, the purge gas can be dispersed from the first gas distribution portion 548A of the distribution surface 546A. In embodiments, the jet of the purge gas can be expelled at an angle.

[0083] In addition to being attached to the top wall 520 of the housing 506, the second manifold 540B can have a similar configuration as the first manifold 540A. In embodiments, the internal passage 580 in the housing 506 can supply a portion of the purge gas of the first flow f1 of purge gas to the inlet 542B of the second manifold 540B. Alternatively, a flow of purge gas can be supplied through an inlet port 534C in the top wall 520 of the housing 506.

[0084] Figure 9A and 9B Different views of a substrate container 600 according to yet another embodiment of the disclosure are shown. Figure 9A and 9B The front door of the substrate container 600 is removed (e.g., the substrate container 600 is open) in Figure 1 For example, the substrate container 600 can be closed by a front door (not shown in the figures) similar to the front door 4 in

[0085] As shown in Figure 9AAs shown, the substrate container 600 includes a housing 606, a first manifold 640A, and a second manifold 640B. Except for its relation to the first manifolds 640A and 640B, the substrate container 600 may have generally similar features to... Figures 1 to 3 The structure and configuration of the substrate container 1 in the example. For example, the substrate container 600 includes an internal space 608, a front opening 612, a first wall 614, a second wall 616, a top wall 620 with a front edge 624B, a bottom wall 622 with a front edge 624A, and ports 634A, 634B, 636A, and 636B in the bottom wall 622 of the housing 606, similar to... Figures 1 to 3 The substrate container 1 in the middle. In an embodiment, the housing 606 may have the above-described relative to the substrate container 1. Figures 1 to 3 Features similar to those discussed in substrate container 1 (e.g., additional inlet, single rear inlet, slot, etc.). Ports 634A, 634B, 636A, and 636B can be used to supply purge gas to the internal space 608 and, in some embodiments, to exhaust gas from the internal space 608. At least one of the rear ports 636A (e.g., Figure 9A (Best viewed) may have a gas distribution manifold 638 that facilitates the distribution of purified gas supplied to the rear port 636A.

[0086] like Figure 9A As shown, a first manifold 640A is attached to a bottom wall 622 and a second manifold 640B is attached to a top wall 620. Each of the first manifold 640A and the second manifold 640B includes gas distribution surfaces 646A and 646B extending in one direction between a first sidewall 614 and a second sidewall 616. The gas distribution surface 646A of the first manifold 640A also extends along the leading edge 624A of the bottom wall 622, and the gas distribution surface 646B of the second manifold 640B also extends along the leading edge 624B of the top wall 620.

[0087] The gas distribution surface 646A of the first manifold 640A has a gas distribution portion 648A with a plurality of slits 641 for distributing purified gas. The slits 641 are provided along the length of the first gas distribution portion 648A. Each slit 641 is configured to discharge a jet of purified gas at high speed, which can entrain and guide ambient air and direct the flow of ambient air. The gas distribution portion 648A of the manifold 640A receives purified gas via a first inlet port 634A, and the distribution surface 646A of the manifold 640A distributes the purified gas into the interior space 608. The jet of purified gas is discharged at high speed from the slits 641 of the distribution surface 646A into the interior space 608 in a forward direction D6. In one embodiment, the purified gas can be dispersed from the first gas distribution portion 648A of the gas distribution surface 646A. In another embodiment, the jet of purified gas can be discharged at an angle.

[0088] In an embodiment, manifold 640A may further include a gas diffusion section 650A configured to facilitate the discharge of purge gas from the interior 606 through manifold 640A and port 634B when the container is closed. Gas diffusion section 650A may include a porous gas diffusion surface 654A. For example, in one embodiment, gas diffusion surface 654A may comprise a porous thin film, such as those described herein. In another embodiment, gas diffusion surface 654A may comprise a porous ceramic or sintered porous material. Positive pressure within the interior 606 of the substrate container 600 creates a pressure gradient between the interior 606 and the exterior of the substrate container 600, causing purge gas to enter manifold 640A through diffusion surface 654A of diffusion section 650A and exit the container.

[0089] Except for the top wall 620 attached to the housing 606, the second manifold 640B may have a configuration similar to the first manifold 640A. In an embodiment, an internal passage 680 in the housing 606 may supply a portion of the first-stage purified gas to the inlet of the second manifold 640B. Alternatively, the purified gas flow may be supplied through an inlet port (not shown) in the top wall 620 of the housing 606.

[0090] Additionally, in embodiments, manifold 640B may also include a gas diffusion section 650B configured to facilitate the discharge of purge gas from the interior 606 through an outlet port in manifold 640B and top wall 620 when the container is closed. Gas diffusion section 650B may include a porous gas diffusion surface 654B. For example, in one embodiment, gas diffusion surface 654B may comprise a porous thin film, such as those described herein. In another embodiment, gas diffusion surface 654B may comprise a porous ceramic or sintered porous material. Positive pressure within the interior 606 of substrate container 600 creates a pressure gradient between the interior 606 and the exterior of substrate container 600, causing purge gas to enter manifold 640B and exit the container through diffusion surface 654B of diffusion section 650B.

[0091] Figure 10 It is a pre-cleaning open substrate container (e.g.) when opened. Figure 2A A block diagram of an embodiment of method 800 (of substrate container 1 or any of substrate containers 300, 400, 500 shown in the diagram). For example, the substrate container is opened when a front door (e.g., front door 4) has been removed from the front opening (e.g., front opening 12, 312, 412, 512) of the substrate container. The method begins at 810.

[0092] At 810, a first flow of purge gas (e.g., first flow of purge gas fl) is supplied to an inlet of a manifold (e.g., manifold 40, 140, 240, 340, 440, 540A, 540B) within a substrate container. The first flow of purge gas is supplied to the inlet (e.g., inlet 42A) of the manifold via a first inlet port (e.g., inlet port 34A, 34B) in a wall (e.g., bottom wall 22, top wall 520) of the substrate container. The manifold is disposed closer to a front opening of the substrate container than to a back wall (e.g., back wall 18) of the substrate container. Then, the method proceeds to 820.

[0093] At 820, the manifold distributes the first flow of purge gas within an interior space (e.g., interior space 108) of the substrate container. In an embodiment, 820 can include the manifold distributing a portion of the purge gas in a direction (e.g., direction D2) toward the front opening of the substrate container. Then, the method proceeds to 830.

[0094] At 830, a second flow of purge gas (e.g., second flow of purge gas f2) is supplied to the interior space of the substrate container via a second inlet port disposed in a wall (e.g., bottom wall 22) of the substrate container. The second inlet port is disposed closer to a back wall (e.g., back wall 18) of the substrate container than to the front opening of the substrate container. In an embodiment, the first inlet port and the second inlet port can be disposed in the same wall of the substrate container.

[0095] The method can optionally include 840 after 830, as shown in Figure 10 The flow rates of the first and second flows of purge gas can be adjusted such that the interior space has less than a predetermined humidity concentration. The interior space of the substrate container is desirably less than a predetermined amount of humidity. This predetermined amount can be based on, for example, the material of the substrate. The humidity within the interior space of the substrate container can not be what we desire.

[0096] In an embodiment, the method 800 can be modified based on one or more of the substrate containers and manifolds disclosed in Figures 1 to 8B and described above.

[0097] In embodiments where at least one of the manifolds is configured as an outlet for purging gas to be vented from a substrate container, the method can include introducing one or more flows of purging gas into an interior of the substrate container. The purging gas can be introduced into the substrate container by one or more manifolds including an inlet, a gas distribution surface. Alternatively or additionally, the purging gas can be introduced into the substrate container by a purging gas inlet or a purging gas tower. Then, the purging gas is vented from the interior of the substrate container via at least one manifold configured as an outlet manifold, as described herein according to various embodiments. In some embodiments, the manifold includes an outlet port connected to a port of the substrate container and a gas diffusion surface. When a door of the substrate container is used to seal the interior, the purging gas within the interior of the substrate container can achieve a positive pressure. When the positive pressure reaches a predetermined threshold, the purging gas diffuses through the gas diffusion surface of the manifold and is vented from the container via the outlet port connected to the port in the wall of the substrate container.

[0098] ASPECT

[0099] Any of aspects 1-15 can be combined with any of aspects 16 and 17.

[0100] Aspect 1. A substrate container comprising: a housing defining an interior space, the housing including a front opening, a first sidewall, a second sidewall, a back wall, and a bottom wall, the bottom wall including a front edge extending between the first sidewall and the second sidewall along the front opening of the housing; and a manifold attached to the bottom wall closer to the front opening of the housing than to the back wall, the manifold including: an inlet configured to receive a first flow of purge gas; and a gas distribution surface configured to distribute the first flow of purge gas into the interior space, the gas distribution surface including a first gas distribution portion extending between the first sidewall and the second sidewall in one direction along the front edge of the bottom wall.

[0101] Aspect 2. The substrate container of aspect 1, wherein the inlet of the manifold is attached to an inlet port in the bottom wall of the housing.

[0102] Aspect 3. The substrate container of any of aspects 1 or 2, wherein the first gas distribution portion has a length extending along a majority of a distance between the first sidewall and the second sidewall.

[0103] Aspect 4. The substrate container of any of aspects 1-3, wherein the first gas distribution portion is configured to distribute at least a portion of the purge gas in a direction toward the front opening of the housing.

[0104] Aspect 5. The substrate container of any of aspects 1-4, wherein the gas distribution surface comprises a porous material.

[0105] Aspect 6. The substrate container of any one of aspects 1-5, wherein the gas distribution surface includes a plurality of openings arranged along a length of the gas distribution surface between the first sidewall and the second sidewall.

[0106] Aspect 7. The substrate container of any one of aspects 1-6, further comprising a plurality of shelves for supporting a plurality of substrates, the plurality of shelves configured to hold substrates, the manifold being closer to the front opening than the shelves.

[0107] Aspect 8. The substrate container of any one of aspects 1-7, wherein the bottom wall has an inner surface facing the interior space, and the manifold is configured to distribute the purge gas from the gas distribution surface at an angle relative to the inner surface of the bottom wall.

[0108] Aspect 9. The substrate container of any one of aspects 1-8, wherein the gas distribution surface includes a second gas distribution portion extending along one of a front edge of the first sidewall or a front edge of the second sidewall.

[0109] Aspect 10. The substrate container of any one of aspects 1-9, wherein the gas distribution surface is disposed at least partially within the interior space.

[0110] Aspect 11. The substrate container of any one of aspects 1-10, wherein the manifold includes a frame supporting the gas distribution surface.

[0111] Aspect 12. The substrate container of any one of aspects 1-11, further comprising: an outlet port for venting gas from the interior space, the outlet port disposed in the bottom wall between the first inlet and the second sidewall, and the first gas distribution portion extending between the inlet and the outlet port.

[0112] Aspect 13. The substrate container of aspect 12, wherein the manifold includes a second inlet port attached to the outlet port.

[0113] Aspect 14. The substrate container of any one of aspects 1-13, wherein the housing includes a back wall opposite the front opening, and the bottom wall includes a back inlet port for introducing a second flow of purge gas into the interior space, the back inlet port disposed closer to the back wall than the front opening.

[0114] Aspect 15. The substrate container of any one of aspects 1-14, further comprising a door configured to be received within the front opening defined by the housing to enclose the interior space.

[0115] Aspect 16. A method of purging a substrate container when a front opening is open, comprising: supplying a first flow of purge gas to an inlet of a manifold disposed within the substrate container via a front inlet port disposed in a wall of the substrate container, the manifold disposed closer to the front opening than to a back wall of the substrate container; distributing the purge gas of the first flow within an interior space of the substrate container via the manifold; and supplying a second flow of purge gas to the interior space of the substrate container via a second inlet port in a wall of the substrate container, the second inlet port disposed closer to the back wall of the substrate container than to the front opening of the substrate container.

[0116] Aspect 17. The method of aspect 16, wherein distributing the purge gas within an interior space of the substrate container comprises the manifold directing a portion of the purge gas in a direction toward the front opening of the substrate container.

[0117] Thus, although several illustrative embodiments of the disclosure have been described, it should be readily apparent to those skilled in the art that many other embodiments can be made within the scope of the appended claims. Many advantages of the present disclosure have been set forth above in the description of the disclosure. It should be understood, however, that the disclosure is not limited to the embodiments described above, but encompasses any and all modifications made by those skilled in the art to the claimed disclosure that fall within the scope of the appended claims. Furthermore, the disclosure is not limited to the specific embodiments described herein, but can be practiced with modification and alteration, within the scope and spirit of the appended claims. Accordingly, the specification and drawings are to be regarded as illustrative only and any equivalents are intended to be encompassed by the following claims.

Claims

1. A substrate container comprising: a housing defining an interior space, the housing including a front opening, a first sidewall, a second sidewall, a back wall, a bottom wall, and a front edge extending between opposing walls along the front opening of the housing; and a manifold attached to the bottom wall, a top wall, the first sidewall, and / or the second sidewall closer to the front opening than the back wall of the housing, the manifold including: an inlet configured to receive a flow of purge gas; and a gas distribution portion including a gas distribution surface configured to distribute the flow of purge gas into the interior space, the gas distribution portion including the gas distribution surface extending in one direction between opposing walls along a front edge of the housing, wherein the gas distribution surface includes a plurality of openings arranged along a length of the gas distribution surface between the opposing walls, and wherein the gas distribution surface comprises a porous material.

2. The substrate container of claim 1, wherein the inlet of the manifold is attached to an inlet port in the bottom wall of the housing.

3. The substrate container of claim 1, wherein the gas distribution portion has a length extending along a majority of a distance between the first sidewall and the second sidewall.

4. The substrate container of claim 1, wherein the gas distribution surface is configured to distribute at least a portion of the purge gas through the plurality of openings in a direction toward the front opening of the housing.

5. The substrate container of claim 1, wherein the manifold includes an outlet configured to facilitate evacuation of the purge gas from the interior space of the substrate container.

6. The substrate container of claim 1, wherein each of the bottom wall, the top wall, the first sidewall, or the second sidewall has an inner surface facing the interior space, and the manifold is configured to distribute the purge gas from the gas distribution surface at an angle relative to the inner surface of the respective bottom wall, top wall, first sidewall, or second sidewall to which it is attached.

7. The substrate container of claim 1, wherein the manifold includes at least a first gas distribution portion having a gas distribution surface extending along the front edge of the first sidewall and a second gas distribution portion having a gas distribution surface extending along one of the front edges of the second sidewall of the housing, wherein the first sidewall and the second sidewall of the housing are opposite.

8. The substrate container of claim 1, wherein the manifold includes a frame supporting the gas distribution portion including the gas distribution surface.

9. The substrate container of claim 1, further comprising: an outlet port for venting gas from the interior space, wherein the gas distribution portion extends between the inlet and the outlet port.

10. The substrate container of claim 9, wherein the manifold includes an additional inlet attached to the outlet port.

11. The substrate container of claim 10, wherein the gas distribution portion containing the gas distribution surface is configured to allow purge gas to diffuse through the gas distribution surface under a positive pressure in the interior space of the container and be exhausted from the container via the outlet port.

12. The substrate container of claim 1, wherein the manifold further comprises a gas diffusion portion connected to an outlet port for venting gas from the interior space.

13. The substrate container of claim 1, further comprising an additional manifold attached to the top wall of the container.

14. The substrate container of claim 1, wherein the housing comprises a back wall opposite the front opening, and the bottom wall comprises a back inlet port for introducing an additional flow of purge gas into the interior space, the back inlet port disposed closer to the back wall than to the front opening.

15. The substrate container of claim 1, further comprising: a door configured to be received within the front opening defined by the housing to enclose the interior space.

16. A substrate container comprising: a housing defining an interior space, the housing comprising a front opening, a first side wall, a second side wall, a back wall, a top wall, a bottom wall, and comprising a front edge extending between opposing walls along the front opening of the housing and a port in the bottom wall and / or the top wall of the housing; and a manifold attached to the housing near the front opening, the manifold comprising: a gas diffusion portion comprising a gas diffusion surface configured to allow a flow of purge gas to diffuse from the interior space into the manifold, the gas diffusion portion comprising the gas diffusion surface extending between the first side wall and the second side wall of the housing in one direction, wherein the gas diffusion surface comprises a plurality of openings arranged along a length of the gas diffusion surface between the first side wall and the second side wall, and wherein the gas diffusion surface comprises a porous material; and an outlet coupled to at least one port in the housing, the outlet configured to exhaust the purge gas from the manifold to an exterior of the substrate container via the at least one port in the housing.

17. The substrate container of claim 16, wherein the manifold is attached to the port in the bottom wall or the top wall of the housing.

18. A method of purging a substrate container with an open front opening, comprising: supplying a first flow of purge gas to an inlet of a manifold disposed within the substrate container via a front inlet port disposed in a wall of the substrate container, the manifold disposed closer to the front opening than to a back wall of the substrate container, and the manifold comprising a porous material; distributing the purge gas of the first flow within an interior space of the substrate container via a plurality of openings on the manifold arranged to release gas in the same direction; and ​ ​ supply a second flow of purge gas to the interior space of the substrate container via a second inlet port in a wall of the substrate container, the second inlet port disposed closer to the back wall of the substrate container than to the front opening of the substrate container.

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