An atomic force probe tip correction system
By combining probe deflection detection and force generation system with model analysis and correction control, the problem of the inability to correct probe tip attachments in existing technologies has been solved, and high-resolution imaging of atomic force microscopy has been achieved.
Patent Information
- Application Number
- CN202211112416.3
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Filing Date
- 2022-09-14
- Publication Date
- 2025-10-31
- Estimated Expiration
- 2042-09-14
AI Technical Summary
Existing technologies cannot effectively calculate the atomic stack morphology of the probe tip, cannot determine whether there are deposits on the tip, and cannot make corrections when there are deposits on the tip, making it difficult to achieve atomic resolution imaging.
The device employs a probe deflection detection device, a transverse and longitudinal force generation device, a needle tip model resolver, a probe correction controller, a pulse impact correction device, an atomic force correction device, a piezoelectric scanner, and a correction standard device. Through laser detection, force generation, and model resolution, the size and orientation of the needle tip attachment are determined, and the attachment is transferred to the correction standard device using pulse impact or atomic force correction.
This technology enables effective correction of the probe tip, improves the resolution of the atomic force microscope, ensures the sharpness and cleanliness of the tip, and achieves atomic resolution imaging.
Smart Images

Figure CN115407089B_ABST
Abstract
Description
Technical Field
[0001] This invention relates to the field of atomic force microscopy, and in particular to an atomic force probe tip correction system. Background Technology
[0002] Atomic force microscopy (AFM) is an important microscopy technique for achieving atomic resolution imaging, but achieving atomic resolution places very high demands on its probe. In terms of atomic resolution, the sharper the probe tip and the smaller its radius of curvature, the higher the resolution; ideally, the tip should contain only a single atom. However, current microfabrication processes (MEMS) cannot guarantee the sharpness of the probe tip during mass production, making it difficult to achieve atomic resolution imaging in practical AFM experiments. Current techniques cannot calculate the atomic stack morphology at the probe tip, determine the presence of tip deposits, or correct the tip when deposits are present. Summary of the Invention
[0003] The purpose of this invention is to provide an atomic force probe tip correction system that enables probe correction.
[0004] To achieve the above objectives, the present invention provides the following solution:
[0005] An atomic force probe tip correction system includes: a probe deflection detection device, a probe oscillation piezoelectric device, a transverse and longitudinal force generation device, a tip model resolver, a probe correction controller, a pulse impact correction device, an atomic force correction device, a piezoelectric scanner, and a correction standard device.
[0006] The probe deflection detection device, the transverse and longitudinal force generation device, the needle tip model resolver, and the probe correction controller are connected in sequence, and the transverse and longitudinal force generation device is connected to the probe correction controller.
[0007] The probe correction controller is connected to the pulse impact correction device and the atomic force correction device respectively. The pulse impact correction device and the atomic force correction device are both connected to the piezoelectric scanner. The correction standard device is set on the piezoelectric scanner. The probe to be corrected is set on the probe oscillation piezoelectric device.
[0008] The probe deflection detection device is used to emit laser light and generate lateral voltage offset signals and longitudinal voltage offset signals based on the laser light reflected by the probe to be corrected.
[0009] The transverse and longitudinal force generating device is used to generate a transverse force based on the transverse voltage offset signal and the first reference signal, and to generate a longitudinal force based on the longitudinal voltage offset signal and the second reference signal; the first reference signal and the second reference signal are both sinusoidal signals with the same resonance frequency as the probe to be corrected;
[0010] The needle tip model resolver is used to determine the size and orientation of the needle tip attachment based on the lateral force and the longitudinal force;
[0011] The probe correction controller is used for:
[0012] The correction method is determined based on the size and orientation of the needle tip attachment, and a start signal is generated; the correction method includes pulse impact correction method and atomic force correction method;
[0013] The longitudinal force is transmitted to the pulse impact correction device and the atomic force correction device;
[0014] The pulse impact correction device is used to control the movement of the piezoelectric scanner according to the start signal and the longitudinal force when the correction method is pulse impact correction, so that the correction standard device is below the probe to be corrected; when the probe starts to vibrate, the piezoelectric device generates a control pulse to adjust the electric field between the probe to be corrected and the correction standard device, so that the needle tip deposits are transferred from the probe to be corrected to the correction standard device, thereby realizing the needle tip correction of the probe to be corrected;
[0015] The atomic force correction device is used to control the piezoelectric scanner to generate a biased horizontal circular motion according to the start signal and the longitudinal force when the correction method is atomic force correction, and to control and adjust the vertical distance between the correction standard device and the probe to be corrected, so that the needle tip attachment is transferred from the probe to be corrected to the correction standard device, thereby realizing the needle tip correction of the probe to be corrected.
[0016] Optionally, the probe deflection detection device includes: a laser and a four-quadrant detector, a four-channel pre-converter, and a transverse and longitudinal signal solver connected in sequence;
[0017] The laser is used to emit laser light that illuminates the back of the cantilever of the probe to be corrected;
[0018] The four-quadrant detector is used to receive the reflected light spot reflected from the back of the cantilever to obtain a current signal;
[0019] The four-channel preamplifier is used to convert the current signal into a voltage signal;
[0020] The horizontal and vertical signal solvers are used to separate the voltage signal into the horizontal voltage offset signal and the vertical voltage offset signal.
[0021] Optionally, the transverse and longitudinal force generation device includes: a transverse phase-locked loop, a transverse force spectrum solver, a longitudinal phase-locked loop, and a longitudinal force spectrum solver;
[0022] The probe deflection detection device, the transverse phase-locked loop, the transverse force spectrum solver, and the tip model resolver are connected in sequence;
[0023] The lateral phase-locked loop is used to obtain a lateral frequency offset signal based on the lateral voltage offset signal and the first reference signal;
[0024] The transverse force spectrum solver is used to obtain the transverse force based on the transverse frequency offset signal;
[0025] The probe deflection detection device, the longitudinal phase-locked loop, the longitudinal force spectrum solver, and the tip model resolver are connected in sequence, and the longitudinal phase-locked loop is connected to the probe correction controller;
[0026] The longitudinal phase-locked loop is used to obtain a longitudinal frequency offset signal based on the longitudinal voltage offset signal and the second reference signal, and then send the longitudinal force to the probe correction controller.
[0027] The longitudinal force spectrum solver is used to obtain the longitudinal force based on the longitudinal frequency offset signal.
[0028] Optionally, the atomic force probe tip correction system further includes: a piezoelectric drive device; both the pulse impact correction device and the atomic force correction device are connected to the piezoelectric scanner via the piezoelectric drive device;
[0029] The piezoelectric drive device is used for:
[0030] A first drive signal is generated based on the start signal and the longitudinal force to control the movement of the piezoelectric scanner, so that the correction standard device is positioned below the probe to be corrected;
[0031] A second drive signal is generated based on the start signal, the longitudinal force, the correction signal, and the bias voltage signal to control the piezoelectric scanner to generate a horizontal circular motion with bias, and to control and adjust the vertical distance between the correction standard device and the probe to be corrected; the correction signal is a sine wave signal.
[0032] Optionally, the pulse impulse correction device includes: a pulse impulse corrector, a pulse generator, and a first automatic gain controller;
[0033] The probe correction controller, the pulse impact corrector, the pulse generator, the first automatic gain controller, and the probe oscillation piezoelectric device are connected in sequence.
[0034] The pulse impulse corrector is used to send the start signal to the pulse generator;
[0035] The pulse generator is used to generate a first pulse according to the start signal;
[0036] The first automatic gain controller is used to generate the control pulse according to the first pulse, adjust the electric field between the probe to be corrected and the correction standard device, so that the tip deposits are transferred from the probe to be corrected to the correction standard device, thereby realizing the tip correction of the probe to be corrected.
[0037] Optionally, the atomic force correction device includes: an atomic force correction fast scan unit and a bias voltage generator;
[0038] The probe correction controller, the atomic force correction fast scanner, and the piezoelectric drive device are connected; the atomic force correction fast scanner, the bias voltage generator, and the piezoelectric drive device are connected in sequence.
[0039] The atomic force correction fast scan is used to send the start signal and the longitudinal force to the piezoelectric drive device, and to send the start signal to the bias voltage generator;
[0040] The bias voltage generator is used to generate the bias signal according to the start signal;
[0041] The piezoelectric drive device is used to generate the second drive signal based on the start signal, the longitudinal force, the correction signal, and the bias signal.
[0042] Optionally, the atomic force probe tip correction system further includes: a first sine generator; the first sine generator is connected to the transverse phase-locked loop and the piezoelectric drive device respectively;
[0043] The first sine generator is used to generate the first reference signal and the correction signal.
[0044] Optionally, the atomic force probe tip correction system also includes: a second sine generator and a second automatic gain controller;
[0045] The second sine generator is connected to the longitudinal phase-locked loop and the second automatic gain controller, respectively, and the second automatic gain controller is connected to the probe oscillation piezoelectric device;
[0046] The second sine generator is used to generate the second reference signal and the compensation signal; the compensation signal is the initial sine signal.
[0047] The second automatic gain controller is used to generate a first sine signal based on the compensation signal, so that the probe oscillation piezoelectric device oscillates.
[0048] Optionally, the atomic force correction device further includes: a first adder, a second adder, and a phase shifter;
[0049] The first sine generator, the bias voltage generator, and the piezoelectric drive device are all connected to the first adder. The phase shifter is connected to the first sine generator and the second adder, respectively. The bias voltage generator and the piezoelectric drive device are both connected to the second adder.
[0050] Optionally, the piezoelectric drive device includes an X-axis piezoelectric actuator, a Y-axis piezoelectric actuator, and a Z-axis piezoelectric actuator;
[0051] The X-axis piezoelectric actuator, the Y-axis piezoelectric actuator, and the Z-axis piezoelectric actuator are all connected to the pulse impact corrector; the X-axis piezoelectric actuator, the Y-axis piezoelectric actuator, and the Z-axis piezoelectric actuator are all connected to the atomic force correction fast scanner; the X-axis piezoelectric actuator, the Y-axis piezoelectric actuator, and the Z-axis piezoelectric actuator are all connected to the piezoelectric scanner; the longitudinal phase-locked loop is connected to the Z-axis piezoelectric actuator.
[0052] The X-axis piezoelectric actuator is used for:
[0053] When the correction method is the pulse impact correction, a first X-direction drive signal is generated according to the start signal;
[0054] When the correction method is the atomic force correction, a second X-direction driving signal is generated according to the start signal, the bias signal and the correction signal;
[0055] The Y-axis piezoelectric actuator is used for:
[0056] When the correction method is the pulse impact correction, a first Y-direction drive signal is generated according to the start signal;
[0057] When the correction method is the atomic force correction, a second Y-direction drive signal is generated according to the start signal, the bias signal and the correction signal;
[0058] The Z-axis piezoelectric actuator is used for:
[0059] When the correction method is the pulse impact correction, a first Z-axis drive signal is generated according to the start signal and the longitudinal force;
[0060] When the correction method is the atomic force correction, a second Z-axis driving signal is generated according to the start signal, the longitudinal frequency offset signal and the longitudinal force;
[0061] The first X-axis drive signal, the first Y-axis drive signal, and the first Z-axis drive signal constitute the first drive signal; the second X-axis drive signal, the second Y-axis drive signal, and the second Z-axis drive signal constitute the second drive signal.
[0062] According to specific embodiments provided by the present invention, the present invention discloses the following technical effects:
[0063] This invention discloses an atomic force probe tip correction system, comprising: a probe deflection detection device, a probe oscillation piezoelectric device, a transverse and longitudinal force generation device, a tip model resolver, a probe correction controller, a pulse impact correction device, an atomic force correction device, a piezoelectric scanner, and a correction standard device. The laser reflected from the probe to be corrected sequentially passes through the probe deflection detection device, the probe oscillation piezoelectric device, the transverse and longitudinal force generation device, and the tip model resolver to determine the size and orientation of the tip attachment. The probe correction controller generates a start signal based on the size and orientation of the tip attachment, and through the pulse impact correction device or the atomic force correction device, transfers the tip attachment from the probe to be corrected to the correction standard device, thereby achieving tip correction of the probe. This invention achieves probe correction. Attached Figure Description
[0064] To more clearly illustrate the technical solutions in the embodiments of the present invention or the prior art, the drawings used in the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present invention. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.
[0065] Figure 1 A structural diagram of an atomic force probe tip correction system provided in an embodiment of the present invention;
[0066] Figure 2 This is a diagram of the piezoelectric scanner drive signal for lateral force cyclic measurement provided in an embodiment of the present invention;
[0067] Figure 3 This is a schematic diagram illustrating the principle of determining the morphology and orientation of needle tip attachments according to an embodiment of the present invention.
[0068] Figure 4 Control loop diagram of the pulse impact needle tip correction system provided in the embodiments of the present invention;
[0069] Figure 5 A control loop diagram of an atomic force needle tip correction system provided in an embodiment of the present invention;
[0070] Figure 6 This is a frontal view of the needle tip attachment provided in an embodiment of the present invention;
[0071] Figure 7 This is a top view of the assumed orientation of the needle tip attachment provided in an embodiment of the present invention;
[0072] Figure 8 Based on Figure 6 A schematic diagram of the adjustment of the adsorption force of the needle tip by the atomic force needle tip correction method under the assumed orientation of the needle tip attachment.
[0073] Figure 9 A flowchart of a probe tip attachment determination system provided in an embodiment of the present invention.
[0074] Figure 10 This is a flowchart of a pulsed impact tip correction system for an atomic force probe tip correction system based on lateral force.
[0075] Figure 11 A flowchart of the atomic force scanning tip correction system provided in an embodiment of the present invention.
[0076] Figure descriptions: 1-Probe deflection detection device, 2-Probe oscillation piezoelectric device, 3-Tip model resolver, 4-Probe correction controller, 5-Piezoelectric scanner, 6-Correction standard device, 7-Probe to be corrected, 8-Tip attachment, 9-Laser, 10-Four-quadrant detector, 11-Four-channel pre-IV converter, 12-Longitudinal and transverse signal solvers, 13-Transverse phase-locked loop, 14-Transverse force spectrum solver, 15-Longitudinal phase-locked loop, 16-Longitudinal force spectrum solver, 17-Pulse impact corrector, 1 8-Pulse generator, 19-First automatic gain controller, 20-Atomic force correction fast scanner, 21-Bias voltage generator, 22-First sine generator, 23-Second sine generator, 24-Second automatic gain controller, 25-First adder, 26-Second adder, 27-Phase shifter, 28-X-direction piezoelectric actuator, 29-Y-direction piezoelectric actuator, 30-Z-direction piezoelectric actuator, 6-1 Atom stack, 6-2 Atom column, 6-3 Atom base, 7-1 Needle tip atom stack, 7-2 Cantilever. Detailed Implementation
[0077] The technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.
[0078] The purpose of this invention is to provide an atomic force probe tip correction system, which aims to achieve probe correction and can be applied to the field of atomic force microscopy.
[0079] To make the above-mentioned objects, features and advantages of the present invention more apparent and understandable, the present invention will be further described in detail below with reference to the accompanying drawings and specific embodiments.
[0080] Figure 1 This is a structural diagram of an atomic force probe tip correction system provided in an embodiment of the present invention. Figure 1-8 As shown, the atomic force probe tip correction system in this embodiment includes: a probe deflection detection device 1, a probe oscillation piezoelectric device 2, a transverse and longitudinal force generation device, a tip model resolver 3, a probe correction controller 4, a pulse impact correction device, an atomic force correction device, a piezoelectric scanner 5, and a correction standard device 6.
[0081] The probe deflection detection device 1, the transverse and longitudinal force generation device, the needle tip model resolver 3, and the probe correction controller 4 are connected in sequence, with the transverse and longitudinal force generation device connected to the probe correction controller 4.
[0082] The probe correction controller 4 is connected to both the pulse impact correction device and the atomic force correction device. Both the pulse impact correction device and the atomic force correction device are connected to the piezoelectric scanner 5. The piezoelectric scanner 5 is equipped with a correction standard device 6, and the probe to be corrected 7 is mounted on the probe oscillation piezoelectric device 2. Specifically, the probe oscillation piezoelectric device 2 and the probe to be corrected 7 are electrically isolated by an insulating layer.
[0083] The probe deflection detection device 1 is used to emit laser light and generate lateral voltage offset signal and longitudinal voltage offset signal based on the laser light reflected by the probe 7 to be corrected.
[0084] The transverse and longitudinal force generating device is used to generate transverse force based on the transverse voltage offset signal and the first reference signal, and to generate longitudinal force based on the longitudinal voltage offset signal and the second reference signal; both the first reference signal and the second reference signal are sinusoidal signals with the same resonant frequency as the probe to be corrected.
[0085] The needle tip model resolver 3 is used to determine the size and orientation of the needle tip attachment 8 based on the lateral and longitudinal forces.
[0086] Probe correction controller 4 is used for:
[0087] The correction method is determined based on the size and orientation of the needle tip attachment 8, and a start signal is generated; the correction methods include pulse impact correction method and atomic force correction method;
[0088] The longitudinal force is sent to the pulse impact correction device and the atomic force correction device.
[0089] The probe correction controller 4 is used to generate a start signal or activation signal based on the size and orientation of the needle tip attachment 8, and to send the longitudinal force to the pulse impact correction device and the atomic force correction device.
[0090] The pulse impact correction device is used to control the movement of the piezoelectric scanner 5 according to the start signal and longitudinal force when the correction method is pulse impact correction, so that the correction standard device 6 is below the probe 7 to be corrected; when the probe oscillation piezoelectric device 2 starts to oscillate, a control pulse is generated to adjust the electric field between the probe to be corrected and the correction standard device 6, so that the needle tip deposit 8 is transferred from the probe to be corrected to the correction standard device 6, thereby realizing the needle tip correction of the probe to be corrected.
[0091] The atomic force correction device is used to control the piezoelectric scanner 5 to generate a biased horizontal circular motion according to the start signal and longitudinal force when the correction method is atomic force correction. It controls and adjusts the vertical distance between the correction standard device 6 and the probe to be corrected 7, so that the needle tip attachment 8 is transferred from the probe to be corrected to the correction standard device 6, thereby realizing the needle tip correction of the probe to be corrected 7.
[0092] As an optional implementation, the probe deflection detection device 1 includes: a laser 9 and a four-quadrant detector 10, a four-channel pre-converter (the four-channel pre-IV converter 11 in the figure) and a horizontal / vertical signal solver (the horizontal / vertical signal solver 12 in the figure) connected in sequence.
[0093] Laser 9 is used to emit a laser beam that illuminates the back of the cantilever 7-2 of the probe 7 to be corrected.
[0094] The four-quadrant detector 10 is used to receive the reflected light spot from the back of the cantilever 7-2 to obtain the current signal.
[0095] A four-channel preamplifier (the four-channel preamplifier IV converter 11 in the figure) is used to convert current signals into voltage signals.
[0096] The horizontal and vertical signal resolvers (the horizontal / vertical signal resolver 12 in the figure) are used to separate the voltage signal into a horizontal voltage offset signal and a vertical voltage offset signal.
[0097] Specifically, the probe to be corrected 7 consists of a tip atom stack 7-1, a cantilever 7-2, and a tip attachment 8. The correction standard device 6 can be set according to actual needs, such as a nanoring; the nanoring consists of an atom stack, an atom column 6-2, and an atom base 6-3.
[0098] As an optional implementation, the transverse and longitudinal force generation device includes: a transverse phase-locked loop 13, a transverse force spectrum solver 14, a longitudinal phase-locked loop 15, and a longitudinal force spectrum solver 16.
[0099] The probe deflection detection device 1, the transverse phase-locked loop 13, the transverse force spectrum solver 14, and the needle tip model resolver 3 are connected in sequence.
[0100] The lateral phase-locked loop 13 is used to obtain the lateral frequency offset signal based on the lateral voltage offset signal and the first reference signal.
[0101] The transverse force spectrum solver 14 is used to obtain the transverse force based on the transverse frequency offset signal.
[0102] The probe deflection detection device 1, the longitudinal phase-locked loop 15, the longitudinal force spectrum solver 16 and the tip model resolver 3 are connected in sequence, and the longitudinal phase-locked loop 15 is connected to the probe correction controller 4.
[0103] The longitudinal phase-locked loop 15 is used to obtain the longitudinal frequency offset signal based on the longitudinal voltage offset signal and the second reference signal, and send the longitudinal force to the probe correction controller 4.
[0104] The longitudinal force spectrum solver 16 is used to obtain the longitudinal force based on the longitudinal frequency offset signal.
[0105] Specifically, the probe micro-deflection detection uses a laser 9 to illuminate the back of the cantilever 7-2 of the probe 7 to be corrected (in the application of atomic force microscopy probes, the side with the probe tip is the front of the probe, and the opposite side is the back). The reflected light is reflected by the back of the cantilever 7-2 to a four-quadrant detector 10 to collect the reflected light spot (the four-quadrant detector 10 is a grid, with PD1, PD2, PD3, and PD4 clockwise). The photocurrent is converted into a voltage signal by a four-channel pre-converter (four-channel pre-converter IV converter 11 in the figure), and the horizontal and vertical signal solvers (horizontal / vertical signal solver 12 in the figure) separate the horizontal voltage offset signal (horizontal_AC) and the vertical voltage offset signal (vertical_AC signal), which are then input to the horizontal phase-locked loop and the vertical phase-locked loop, respectively. The transverse frequency offset signal (transverse Δf) and the longitudinal frequency offset signal (longitudinal Δf) are analyzed based on the first reference signal input by the first sine generator 22 and the second reference signal input by the second sine generator 23 (the first reference signal and the second reference signal are the same, which are both the resonant frequencies of the probe 7 to be corrected). Then, the transverse force and the longitudinal force are solved by the transverse force spectrum solver 14 and the longitudinal force spectrum solver 16, respectively. The longitudinal Δf is input to the Z-axis piezoelectric actuator 30 (the distance between the probe 7 to be corrected and the nanoring in the z-direction is obtained through the frequency offset signal Δf, and the distance between the two is detected by the frequency offset. In order to ensure a constant frequency offset, the probe oscillation piezoelectric actuator is controlled to adjust the position of the nanoring in the Z-axis direction).
[0106] As the probe 7 to be corrected oscillates, the quadrant detector 10 receives a signal. This signal is first converted into a current signal and then into the required voltage signal by a four-channel pre-converter. The signal is then processed by a horizontal / vertical signal resolver (horizontal / vertical signal resolver 12 in the figure) to obtain horizontal and vertical phase-locked signals respectively. Here, the vertical phase-locked signal Δf is obtained by vertical phase-locking and compared with the second reference signal (i.e., the oscillation frequency). After gain adjustment, the signal is input to the second automatic gain controller 24 to control the probe oscillation piezoelectric device 2 to adjust the feedback control of the probe oscillation frequency in real time.
[0107] As an optional implementation, the atomic force probe tip correction system further includes: a piezoelectric drive device; both the pulse impact correction device and the atomic force correction device are connected to the piezoelectric scanner 5 via the piezoelectric drive device.
[0108] Piezoelectric actuators are used for:
[0109] The first drive signal is generated based on the start signal and longitudinal force, which controls the piezoelectric scanner 5 to move so that the correction standard device 6 is positioned below the probe 7 to be corrected.
[0110] The second drive signal is generated based on the start signal, longitudinal force, correction signal and bias voltage signal, which controls the piezoelectric scanner 5 to generate a horizontal circular motion with bias, and controls the vertical distance between the correction standard device 6 and the probe 7 to be corrected; the correction signal is a sine wave signal.
[0111] As an optional implementation, the pulse impulse correction device includes: a pulse impulse corrector 17, a pulse generator 18, and a first automatic gain controller 19.
[0112] The probe correction controller 4, the pulse impact corrector 17, the pulse generator 18, the first automatic gain controller 19, and the probe oscillation piezoelectric device 2 are connected in sequence.
[0113] The pulse impulse corrector 17 is used to send a start signal to the pulse generator 18.
[0114] The pulse generator 18 is used to generate a first pulse based on the start signal.
[0115] The first automatic gain controller 19 is used to generate a control pulse according to the first pulse to adjust the electric field between the probe to be corrected and the correction standard device 6, so that the needle tip attachment 8 is transferred from the probe to be corrected to the correction standard device 6, thereby realizing the needle tip correction of the probe to be corrected.
[0116] As an optional implementation, the atomic force correction device includes an atomic force correction fast scanner 20 and a bias voltage generator 21.
[0117] The probe correction controller 4, the atomic force correction fast scanner 20, and the piezoelectric drive device are connected; the atomic force correction fast scanner 20, the bias voltage generator 21, and the piezoelectric drive device are connected in sequence.
[0118] The atomic force correction fast scanner 20 is used to send the start signal and longitudinal force to the piezoelectric drive device, and to send the start signal to the bias voltage generator 21.
[0119] The bias voltage generator 21 is used to generate a bias signal based on the start signal.
[0120] The piezoelectric drive device is used to generate a second drive signal based on the start signal, longitudinal force, correction signal and bias signal.
[0121] As an optional implementation, the atomic force probe tip correction system further includes: a first sine generator 22; the first sine generator 22 is connected to the transverse phase-locked loop 13 and the piezoelectric drive device respectively.
[0122] The first sine generator 22 is used to generate the first reference signal and the correction signal.
[0123] As an optional implementation, the atomic force probe tip correction system also includes a second sine generator 23 and a second automatic gain controller 24.
[0124] The second sine generator 23 is connected to the longitudinal phase-locked loop 15 and the second automatic gain controller 24, respectively. The second automatic gain controller 24 is connected to the probe oscillation piezoelectric device 2.
[0125] The second sine generator 23 is used to generate a second reference signal and a compensation signal; the compensation signal is the initial sine signal.
[0126] The second automatic gain controller 24 is used to generate a first sine signal based on the compensation signal, so that the probe oscillating piezoelectric device 2 starts to oscillate.
[0127] As an optional implementation, the atomic force correction device further includes: a first adder 25, a second adder 26, and a phase shifter 27.
[0128] The first sine generator 22, the bias voltage generator 21, and the piezoelectric drive are all connected to the first adder 25. The phase shifter 27 is connected to the first sine generator 22 and the second adder 26 respectively. The bias voltage generator 21 and the piezoelectric drive are both connected to the second adder 26.
[0129] As an optional implementation, the piezoelectric drive device includes an X-axis piezoelectric actuator 28, a Y-axis piezoelectric actuator 29, and a Z-axis piezoelectric actuator 30.
[0130] The X-axis piezoelectric actuator 28, Y-axis piezoelectric actuator 29, and Z-axis piezoelectric actuator 30 are all connected to the pulse impact corrector 17. The X-axis piezoelectric actuator 28, Y-axis piezoelectric actuator 29, and Z-axis piezoelectric actuator 30 are all connected to the atomic force correction fast scanner 20. The X-axis piezoelectric actuator 28, Y-axis piezoelectric actuator 29, and Z-axis piezoelectric actuator 30 are all connected to the piezoelectric scanner 5. The longitudinal phase-locked loop 15 is connected to the Z-axis piezoelectric actuator 30.
[0131] X-axis piezoelectric actuator 28 is used for:
[0132] When the correction method is the pulse impact correction, a first X-direction drive signal is generated according to the start signal;
[0133] When the correction method is the atomic force correction, a second X-direction driving signal is generated based on the start signal, bias signal, and correction signal.
[0134] Y-axis piezoelectric actuator 29 is used for:
[0135] When the correction method is the pulse impact correction, a first Y-direction drive signal is generated according to the start signal;
[0136] When the correction method is the atomic force correction, a second Y-direction drive signal is generated based on the start signal, bias signal, and correction signal.
[0137] Z-axis piezoelectric actuator 30 is used for:
[0138] When the correction method is the pulse impact correction, a first Z-direction drive signal is generated according to the start signal and the longitudinal force;
[0139] When the correction method is the atomic force correction, a second Z-axis driving signal is generated based on the start signal, the longitudinal frequency offset signal, and the longitudinal force.
[0140] The first X-axis drive signal, the first Y-axis drive signal, and the first Z-axis drive signal constitute the first drive signal; the second X-axis drive signal, the second Y-axis drive signal, and the second Z-axis drive signal constitute the second drive signal.
[0141] Specifically, such as Figure 9-11 As shown, the probe model resolver fits the transverse and longitudinal forces input by the transverse force spectrum resolver 14 and the longitudinal force spectrum resolver 16 to obtain the contour shape of the probe 7 to be corrected, and obtains the shape of the tip atom stack 7-1 according to the X, Y, Z orientations corresponding to the piezoelectric scanner 5, and determines the size and orientation of the tip attachment 8. Then, the probe correction controller 4 controls the pulse impact corrector 17 or the atomic force correction fast scanner 20 to realize the probe tip correction function.
[0142] The pulse impact corrector 17 controls the Z-axis piezoelectric actuator 30, the X-axis piezoelectric actuator 28, and the Y-axis piezoelectric actuator 29 to position the tip atomic stack 7-1 of the probe 7 to be corrected above the atomic stack of the nanoring; the driving pulse generator 18, in conjunction with the automatic gain controller, realizes the discharge effect of the tip atomic stack 7-1 of the probe (by outputting a high voltage signal through the pulse generator 18 to realize the discharge effect), and regulates the electric field between the tip atomic stack 7-1 and the atomic stack on the nanoring, thereby removing the tip attachment 8 from the tip atomic stack 7-1 and realizing the probe tip correction effect.
[0143] The atomic force correction fast sweeper 20 controls the Z-axis piezoelectric actuator 30, the X-axis piezoelectric actuator 28, and the Y-axis piezoelectric actuator 29 respectively. While maintaining the circular motion of the X and Y-axis piezoelectric actuators 29 with the help of the sine generator and the phase shifter 27, the bias voltage generator 21 and the adder increase the bias on the X and Y-axis piezoelectric drive signals, control the circular motion that generates the bias, and gradually increase the frequency of the X and Y-axis piezoelectric drive sine signals to achieve fast sweep (the relative motion between the needle tip and the nanoring is achieved by controlling the piezoelectric actuators. If there is no deposit, the relative motion (circular motion) between the two will be maintained; if there is deposit on the needle tip, while increasing the frequency of the piezoelectric drive sine signal for fast sweep, the nanoring will come into contact with the needle tip deposit 8, causing a signal deflection feedback to the loop, thereby achieving needle tip correction step by step.
[0144] Taking the tip attachment 8 attached to the tip atom stack 7-1 in the negative X direction as an example, the bias voltage generator 21 adds a bias voltage to the sinusoidal drive signal in the X direction through an adder. The effect achieved in the XOY coordinate system is that the circular motion is offset in the negative X direction. At this time, the attractive force between the tip attachment 8 and the nanoring atom stack can be calculated according to the interatomic force relationship. The attraction is used to remove the tip attachment 8, thus achieving the probe tip correction effect.
[0145] A first sine generator 22, in conjunction with a phase shifter 27, generates two signals with a 90° phase difference to drive the X-axis piezoelectric actuator 28 and the Y-axis piezoelectric actuator 29, respectively. The X and Y directions of the piezoelectric scanner 5 work together to achieve circular motion. Ideally, when the tip atom stack 7-1 has no tip attachment 8, the lateral force detected by the tip model resolver 3 during circular motion is always F. total =F ts (F total F represents the total lateral force detected. ts (This refers to the total interaction force between the probe to be corrected 7 and the correction standard device 6). However, when the tip atom stack 7-1 has tip attachment 8, during the circular motion, the detected lateral force F exists. total =F ts +F ad (Fad (The total interaction force between the probe 7 to be corrected and the correction standard device 6 when there is a needle tip attached to it) can be used to accurately locate the position of the attached object by using transverse phase locking, and the complex shape and position of the attached object can be calculated by combining it with longitudinal force.
[0146] The various embodiments in this specification are described in a progressive manner, with each embodiment focusing on the differences from other embodiments. The same or similar parts between the various embodiments can be referred to each other.
[0147] This document uses specific examples to illustrate the principles and implementation methods of the present invention. The descriptions of the above embodiments are only for the purpose of helping to understand the device and core ideas of the present invention. Furthermore, those skilled in the art will recognize that, based on the ideas of the present invention, there will be changes in the specific implementation methods and application scope. Therefore, the content of this specification should not be construed as a limitation of the present invention.
Claims
1. An atomic force probe tip correction system, characterized in that, include: Probe deflection detection device, probe vibration piezoelectric device, transverse and longitudinal force generation device, needle tip model resolver, probe correction controller, pulse impact correction device, atomic force correction device, piezoelectric scanner, and correction standard device; The probe deflection detection device, the transverse and longitudinal force generation device, the needle tip model resolver, and the probe correction controller are connected in sequence, and the transverse and longitudinal force generation device is connected to the probe correction controller. The probe correction controller is connected to the pulse impact correction device and the atomic force correction device respectively. Both the pulse impact correction device and the atomic force correction device are connected to the piezoelectric scanner. The piezoelectric scanner is equipped with a correction standard device, and the probe to be corrected is set on the probe oscillation piezoelectric device. The probe deflection detection device is used to emit laser light and generate lateral voltage offset signals and longitudinal voltage offset signals based on the laser light reflected by the probe to be corrected. The transverse and longitudinal force generating device is used to generate transverse force based on the transverse voltage offset signal and the first reference signal, and to generate longitudinal force based on the longitudinal voltage offset signal and the second reference signal; both the first reference signal and the second reference signal are sinusoidal signals with the same resonant frequency as the probe to be corrected. The needle tip model resolver is used to determine the size and orientation of the needle tip attachment based on lateral and longitudinal forces. The probe correction controller is used for: The correction method is determined based on the size and orientation of the needle tip attachment, and a start signal is generated; Correction methods include pulse shock correction and atomic force correction; The longitudinal force is transmitted to the pulse impact correction device and the atomic force correction device; The pulse impact correction device is used to control the movement of the piezoelectric scanner according to the start signal and longitudinal force when the correction method is pulse impact correction, so that the correction standard device is below the probe to be corrected; When the probe oscillation piezoelectric device starts oscillating, a control pulse is generated to adjust the electric field between the probe to be corrected and the correction standard device, so that the needle tip deposits are transferred from the probe to be corrected to the correction standard device, thereby realizing the needle tip correction of the probe to be corrected. The atomic force correction device is used to control the piezoelectric scanner to generate a biased horizontal circular motion according to the start signal and longitudinal force when the correction method is atomic force correction. It controls and adjusts the vertical distance between the correction standard device and the probe to be corrected, so that the needle tip deposits are transferred from the probe to be corrected to the correction standard device, thereby realizing the needle tip correction of the probe to be corrected.
2. The atomic force probe tip correction system according to claim 1, characterized in that, The probe deflection detection device includes: a laser and a four-quadrant detector, a four-channel pre-converter, and a transverse and longitudinal signal solver connected in sequence; The laser is used to emit laser light that illuminates the back of the cantilever of the probe to be corrected; The four-quadrant detector is used to receive the reflected light spot from the back of the cantilever and obtain the current signal; A four-channel preamplifier is used to convert current signals into voltage signals; The transverse and longitudinal signal resolvers are used to separate voltage signals into transverse voltage offset signals and longitudinal voltage offset signals.
3. The atomic force probe tip correction system according to claim 1, characterized in that, The transverse and longitudinal force generation device includes: a transverse phase-locked loop, a transverse force spectrum solver, a longitudinal phase-locked loop, and a longitudinal force spectrum solver; The probe deflection detection device, the transverse phase-locked loop, the transverse force spectrum solver, and the tip model resolver are connected in sequence. The lateral phase-locked loop is used to obtain the lateral frequency offset signal based on the lateral voltage offset signal and the first reference signal; The transverse force spectrum solver is used to obtain the transverse force based on the transverse frequency offset signal; The probe deflection detection device, longitudinal phase-locked loop, longitudinal force spectrum solver and tip model resolver are connected in sequence, and the longitudinal phase-locked loop is connected to the probe correction controller. The longitudinal phase-locked loop is used to obtain the longitudinal frequency offset signal based on the longitudinal voltage offset signal and the second reference signal, and then send the longitudinal force to the probe correction controller. The longitudinal force spectrum solver is used to obtain the longitudinal force based on the longitudinal frequency offset signal.
4. The atomic force probe tip correction system according to claim 3, characterized in that, Also includes: Piezoelectric drive device; Both the pulse impact correction device and the atomic force correction device are connected to the piezoelectric scanner via a piezoelectric drive device; Piezoelectric actuators are used for: The first drive signal is generated based on the start signal and longitudinal force, which controls the movement of the piezoelectric scanner so that the correction standard device is positioned below the probe to be corrected. The second drive signal is generated based on the start signal, longitudinal force, correction signal and bias voltage signal, which controls the piezoelectric scanner to generate a horizontal circular motion with bias, and controls the adjustment of the vertical distance between the correction standard device and the probe to be corrected; the correction signal is a sine wave signal.
5. The atomic force probe tip correction system according to claim 4, characterized in that, The pulse impulse correction device includes: a pulse impulse corrector, a pulse generator, and a first automatic gain controller; The probe correction controller, pulse impact corrector, pulse generator, first automatic gain controller, and probe oscillation piezoelectric device are connected in sequence; The pulse impulse corrector is used to send a start signal to the pulse generator; The pulse generator is used to generate the first pulse based on the start signal; The first automatic gain controller is used to generate a control pulse according to the first pulse to adjust the electric field between the probe to be corrected and the correction standard device, so that the needle tip deposits are transferred from the probe to be corrected to the correction standard device, thereby realizing the needle tip correction of the probe to be corrected.
6. The atomic force probe tip correction system according to claim 5, characterized in that, The atomic force correction device includes: an atomic force correction fast scan unit and a bias voltage generator; The probe correction controller, atomic force correction fast scanner, and piezoelectric drive device are connected; the atomic force correction fast scanner, bias voltage generator, and piezoelectric drive device are connected in sequence. The atomic force correction fast scan is used to send the start signal and longitudinal force to the piezoelectric drive device, and the start signal to the bias voltage generator; The bias voltage generator is used to generate a bias signal based on the start signal; The piezoelectric drive device is used to generate a second drive signal based on the start signal, longitudinal force, correction signal and bias signal.
7. The atomic force probe tip correction system according to claim 6, characterized in that, Also includes: The first sine generator is connected to the transverse phase-locked loop and the piezoelectric drive device respectively. The first sine generator is used to generate the first reference signal and the correction signal.
8. The atomic force probe tip correction system according to claim 4, characterized in that, Also includes: Second sine generator and second automatic gain controller; The second sine generator is connected to the longitudinal phase-locked loop and the second automatic gain controller, and the second automatic gain controller is connected to the probe oscillation piezoelectric device. The second sine generator is used to generate the second reference signal and the compensation signal; the compensation signal is the initial sine signal. The second automatic gain controller is used to generate a first sine signal based on the compensation signal, so that the probe oscillating piezoelectric device starts to oscillate.
9. The atomic force probe tip correction system according to claim 7, characterized in that, The atomic force correction device also includes: a first adder, a second adder, and a phase shifter; The first sine generator, the bias voltage generator, and the piezoelectric drive are all connected to the first adder. The phase shifter is connected to the first sine generator and the second adder respectively. The bias voltage generator and the piezoelectric drive are both connected to the second adder.
10. The atomic force probe tip correction system according to claim 7, characterized in that, The piezoelectric drive device includes an X-axis piezoelectric actuator, a Y-axis piezoelectric actuator, and a Z-axis piezoelectric actuator; The X-axis piezoelectric actuator, Y-axis piezoelectric actuator, and Z-axis piezoelectric actuator are all connected to the pulse impact corrector; the X-axis piezoelectric actuator, Y-axis piezoelectric actuator, and Z-axis piezoelectric actuator are all connected to the atomic force correction fast scanner; the X-axis piezoelectric actuator, Y-axis piezoelectric actuator, and Z-axis piezoelectric actuator are all connected to the piezoelectric scanner; the longitudinal phase-locked loop is connected to the Z-axis piezoelectric actuator. X-axis piezoelectric actuators are used for: When the correction method is pulse impact correction, a first X-direction drive signal is generated according to the start signal; When the correction method is atomic force correction, a second X-direction drive signal is generated based on the start signal, bias signal and correction signal; Y-axis piezoelectric actuators are used for: When the correction method is pulse impact correction, a first Y-direction drive signal is generated according to the start signal; When the correction method is atomic force correction, a second Y-direction drive signal is generated based on the start signal, bias signal and correction signal; Z-axis piezoelectric actuators are used for: When the correction method is pulse impact correction, a first Z-axis drive signal is generated based on the start signal and longitudinal force; When the correction method is atomic force correction, a second Z-axis drive signal is generated based on the start signal, the longitudinal frequency offset signal, and the longitudinal force. The first X-axis drive signal, the first Y-axis drive signal, and the first Z-axis drive signal constitute the first drive signal; The second X-axis drive signal, the second Y-axis drive signal, and the second Z-axis drive signal constitute the second drive signal.
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