Methods for manufacturing the stage apparatus, exposure apparatus, and article.

Abstract

This invention relates to a stage apparatus, an exposure apparatus, and a method for manufacturing an article. A stage apparatus capable of measuring the position of a stage with high precision is provided. The stage apparatus of this invention is characterized by comprising: a stage having a first reflective surface perpendicular to a first direction and configured to be driven along the first direction; a first measuring unit that measures the position of the stage in the first direction by receiving the first measuring light reflected by the first reflective surface after emitting the first measuring light toward the first reflective surface; a second measuring unit that measures the wavelength of a second measuring light propagating in a first atmospheric region; and a control unit that corrects the measurement results of the first measuring unit based on the wavelength of the second measuring light, which varies with atmospheric fluctuations in the first atmospheric region generated when the stage is driven along the first direction.

Description

Technical Field

[0001] This invention relates to a stage device, an exposure device, and a method for manufacturing an article. Background Technology

[0002] Previously, a stage device was known, which included an interferometer that emitted measurement light toward a reflective surface disposed on the stage and then received the measurement light reflected by the reflective surface, thereby measuring the position of the stage.

[0003] If the refractive index of the atmosphere in the space through which the measuring light travels between the interferometer and the reflecting surface changes with the environment of that space, such as temperature, humidity, and air pressure, then the wavelength of the measuring light will change, resulting in an error in the position measurement of the stage.

[0004] Patent document 1 discloses a stage device that detects changes in the refractive index of the atmosphere in the space in which the measurement light of the interferometer travels, thereby correcting the wavelength of the measurement light and thus correcting the position measurement value of the stage.

[0005] Existing technical documents

[0006] Patent documents

[0007] Patent Document 1: Japanese Patent Application Publication No. 2003-65712 Summary of the Invention

[0008] The problem the invention aims to solve

[0009] For example, in order to achieve high productivity, the substrate stage of the exposure apparatus sometimes performs stepping and scanning drives in two mutually perpendicular directions simultaneously.

[0010] Therefore, atmospheric fluctuations in both directions are generated together in the space surrounding the substrate mounting stage.

[0011] On the other hand, in the stage device disclosed in Patent Document 1, it is possible to use a correction light traveling in space to measure the change in the refractive index of the atmosphere corresponding to changes in the environment including temperature, humidity and air pressure in the space and atmospheric fluctuations in a direction parallel to the direction of travel of the correction light.

[0012] Therefore, if the stage device is used to measure the position of such a substrate stage, atmospheric fluctuations in the space will also be generated in the direction perpendicular to the direction of the correction light, thus introducing errors into the variation of the refractive index of the measured atmosphere.

[0013] Furthermore, when the stage moves in two mutually perpendicular directions, if the change in the refractive index of the atmosphere in the space obtained by the correction light is directly used to correct the wavelength of the measurement light of the interferometer, then the position measurement value of the stage by the interferometer will also contain errors.

[0014] Therefore, the object of the present invention is to provide a stage device capable of measuring the position of the stage with high precision.

[0015] Solution for solving the problem

[0016] The stage apparatus of the present invention is characterized by comprising: a stage having a first reflective surface perpendicular to a first direction and configured to be driven along the first direction; a first measuring unit that measures the position of the stage in the first direction by receiving the first measuring light reflected by the first reflective surface after emitting the first measuring light toward the first reflective surface; a second measuring unit that measures the wavelength of a second measuring light propagating in a first atmospheric region; and a control unit that corrects the measurement result of the first measuring unit based on the wavelength of the second measuring light, which varies with atmospheric fluctuations in the first atmospheric region generated when the stage is driven along the first direction.

[0017] The effects of the invention

[0018] According to the present invention, a stage device capable of measuring the position of the stage with high precision can be provided. Attached Figure Description

[0019] Figure 1 This is a schematic XZ cross-sectional projection view of an exposure apparatus equipped with the stage device of this embodiment.

[0020] Figure 2 This is a schematic structural diagram of the stage device according to the first embodiment and a schematic diagram for illustrating the structure of the wavelength compensator.

[0021] Figure 3 It is a graph showing the time variation of the measured values ​​obtained by the wavelength compensator.

[0022] Figure 4 These are flowcharts illustrating the process of creating a table in the stage apparatus of the first embodiment, and flowcharts illustrating the process of calculating the movement amount of the stage.

[0023] Figure 5 This is a flowchart showing the process of creating a table in the stage apparatus of the second embodiment, and a flowchart showing the process of calculating the movement amount of the stage.

[0024] Figure 6 This is a schematic structural diagram of the mounting platform device according to the third embodiment.

[0025] Figure 7 This is a flowchart illustrating the exposure process in an exposure apparatus equipped with the stage device of the fourth embodiment.

[0026] Explanation of reference numerals in the attached figures

[0027] 33. Y-mirror (first reflecting surface); 34. Y-interferometer (first measuring unit); 35. Y-length measuring beam (first measuring beam); 39. Y-wavelength compensator (second measuring unit); 41. Y-stage (stage); 61. Signal processing unit (control unit); 81. Timing control unit (control unit); 82. Y-wavelength correction unit (control unit); 100. Stage device; 404. Atmospheric region (first atmospheric region). Detailed Implementation

[0028] The mounting platform device of this embodiment will be described in detail below based on the accompanying drawings. It should be noted that, in order to facilitate understanding of this embodiment, the drawings shown below are drawn at a different scale than the actual figures.

[0029] Furthermore, the embodiments described below are examples of implementation means of this embodiment, and should be appropriately modified or changed according to the structure of the device to which this embodiment is applied and various conditions.

[0030] In addition, in the following, the direction perpendicular to the substrate mounting surface of the substrate mounting stage is defined as the Z direction, and the two mutually orthogonal directions in the cross section (first cross section) parallel to the substrate mounting surface are defined as the X direction (second direction) and the Y direction (first direction).

[0031] [First Implementation Method]

[0032] Position measuring devices using interferometers are widely used in fields requiring high-precision positioning control.

[0033] In such a position determination device, the interferometer uses the wavelength of the laser as a reference to measure the position. However, when the refractive index of the atmosphere changes according to the temperature, humidity and air pressure of the position measurement space, and thus the wavelength of the laser beam changes, the position measurement value of the object will produce an error.

[0034] To reduce such errors, the position measurements need to be corrected based on changes in the laser wavelength.

[0035] As a method for correcting position measurements in an interferometer, there are methods such as the following.

[0036] That is, a sensor is set up to measure the environment of the location measurement space, namely, temperature, humidity and air pressure, and the change of the refractive index of the atmosphere in the location measurement space is calculated based on the detection value of the sensor.

[0037] Furthermore, it can correct position measurements based on the calculated changes in atmospheric refractive index.

[0038] In addition, by measuring the same object after the measuring beam travels through vacuum space and atmospheric space respectively, the wavelength of the measuring beam in vacuum space and atmospheric space can be calculated, thereby determining the change in the refractive index of the atmosphere in atmospheric space.

[0039] Furthermore, there are methods to correct the position measurements of the interferometer based on the calculated changes in the atmospheric refractive index.

[0040] A measuring device that calculates the change in the refractive index of the atmosphere in atmospheric space based on the different wavelengths of the measuring beam in vacuum and atmospheric space is called a wavelength compensator or wavelength tracker.

[0041] As described above, the wavelength of the measuring beam emitted from the interferometer and traveling in the position measurement space varies with time according to the variation of the refractive index of the atmosphere, which corresponds to the variation of the environment including the temperature, humidity and air pressure in the position measurement space and the atmospheric fluctuations caused by the movement of the measured object.

[0042] Furthermore, the wavelength compensator can measure the change in atmospheric refractive index corresponding to changes in the environment in the atmospheric space and the movement of the object being measured in a direction parallel to the direction of travel of the measuring beam.

[0043] On the other hand, for example, in order to achieve high productivity, the substrate stage provided in the exposure apparatus sometimes performs stepping drive and scanning drive in two mutually perpendicular directions.

[0044] Therefore, atmospheric fluctuations in both directions are generated together in the space surrounding the substrate mounting stage.

[0045] Therefore, if the substrate stage is driven in this way, atmospheric fluctuations in the atmospheric space within the wavelength compensator will also occur in a direction perpendicular to the direction of travel of the measuring beam, thereby introducing errors into the variation of the refractive index of the atmosphere in the measured atmospheric space.

[0046] Furthermore, when the stage moves along two mutually perpendicular directions, if the change in atmospheric refractive index obtained by the wavelength compensator is directly used to correct the time change of the wavelength of the measurement light in the interferometer, then the interferometer's position measurement of the stage will also contain errors.

[0047] In addition, in recent years, in order to further improve productivity, the substrate stage and the original stage in the exposure equipment are driven at high speed and high acceleration. As a result, atmospheric fluctuations in the position measurement space have also increased, and therefore the aforementioned errors have also increased.

[0048] Therefore, in this embodiment, the objective is to provide a platform device capable of accurately calibrating the position measurement values ​​of the platform.

[0049] Figure 1 A schematic XZ cross-sectional projection view of the exposure apparatus 1 equipped with the stage device of this embodiment.

[0050] like Figure 1 As shown, the exposure apparatus 1 is a projection type exposure apparatus that projects the pattern formed on the intermediate mask 20 (original) onto the wafer 40 (substrate) by a step-scan method, and is suitable for photolithography processes below submicron and quarter-micron.

[0051] The exposure apparatus 1 includes an illumination device 10, an intermediate mask stage 25, a projection optical system 30, a wafer stage 45, a control system 60, an alignment detection system 70, and a focus tilt detection system 150.

[0052] In addition, the exposure apparatus 1 also includes an interferometer system for detecting the positions of the intermediate mask stage 25 and the wafer stage 45 in the XY plane (see reference). Figure 2 ).

[0053] That is, the stage device of this embodiment includes an intermediate mask stage 25 or a wafer stage 45 and the interferometer system.

[0054] The lighting device 10 includes a light source 12 and an lighting optics system 14, which illuminates an intermediate mask 20 on which a pattern for transfer to the wafer 40 is formed.

[0055] The light source section 12 is configured to emit laser light, and for example, a KrF excimer laser with a wavelength of about 248 nm or an ArF excimer laser with a wavelength of about 193 nm can be used.

[0056] It should be noted that the light source used in the light source unit 12 is not limited to the excimer laser mentioned above, but may also be an F2 laser with a wavelength of about 157nm or a light source that emits EUV (Extreme Ultra Violet) light with a wavelength of less than 20nm.

[0057] The illumination optical system 14 is an optical system that guides the light beam emitted from the light source 12 to the intermediate mask 20. Specifically, it guides the light beam emitted from the light source 12 to the intermediate mask 20 after shaping it into a beam with a slit shape most suitable for exposure.

[0058] The illumination optical system 14 consists of lenses, mirrors, optical integrators, apertures, etc.

[0059] Specifically, the illumination optical system 14 includes, for example, a condenser lens, a fly-eye lens, an aperture stop, a condenser lens, a slit, and an imaging optical system arranged sequentially from the light source section 12 side to the intermediate mask stage 25 side.

[0060] The illumination optics system 14 can guide the light beam emitted from the light source 12 to the intermediate mask 20 independently of on-axis and off-axis beams.

[0061] In addition, the optical integrator used in the illumination optical system 14 includes an integrator formed by overlapping a fly-eye lens and two sets of cylindrical lens arrays (or cylindrical lens plates).

[0062] However, it is not limited to this; optical rods and diffractive elements can also be used as optical integrators.

[0063] The intermediate mask stage 25 is configured to hold the intermediate mask 20 via an intermediate mask chuck (not shown) and is connected to a moving mechanism consisting of a linear motor (not shown) or the like.

[0064] Therefore, by driving and controlling the intermediate mask stage 25 in the translational direction parallel to the X-axis, Y-axis and Z-axis, as well as in the rotational direction about the X-axis, Y-axis and Z-axis, the intermediate mask 20 and the intermediate mask chuck can be moved in the translational direction and the rotational direction.

[0065] The projection optics system 30 has the function of focusing the light beam from the object plane onto the image plane, that is, focusing the diffracted light that will be diffracted by the pattern formed on the intermediate mask 20 onto the wafer 40.

[0066] The wafer stage 45 is configured to hold the wafer 40 using a wafer chuck 46 and is connected to a moving mechanism consisting of a linear motor (not shown) or the like.

[0067] Therefore, by driving and controlling the wafer stage 45 in the translational direction parallel to the X-axis, Y-axis and Z-axis, as well as in the rotational direction about the X-axis, Y-axis and Z-axis, the wafer 40 and the wafer chuck 46 can be moved in the translational direction and the rotational direction.

[0068] It should be noted that the intermediate mask stage 25 and the wafer stage 45 are driven at a predetermined speed ratio to each other, and their respective positions are measured by an interferometer as described later.

[0069] Additionally, the intermediate mask stage 25 and the projection optics system 30 are, for example, disposed on a lens tube platform (not shown) supported by a damper on a base frame placed on a floor or the like.

[0070] Furthermore, the wafer stage 45 is, for example, disposed on a stage platform (not shown) supported on a floor or the like via a damper having a vibration damping function.

[0071] The focus tilt detection system 150 includes a light-projecting part 152 and a light-receiving part 154. The light beam emitted from the light-projecting part 152 is reflected by the wafer 40 and then received by the light-receiving part 154, thereby enabling the detection of the focus of the projection optical system 30 relative to the wafer 40 and the tilt of the wafer 40.

[0072] The control system 60 consists of a CPU, memory, etc., and is electrically connected to the illumination device 10, intermediate mask stage 25, wafer stage 45, alignment detection system 70 and focus tilt detection system 150, thereby uniformly controlling the overall operation of the exposure device 1.

[0073] The alignment detection system 70 is configured to detect the positional offset of the wafer 40 in directions parallel to the X and Y axes, and its optical axis is shifted in the XY plane from the optical axis of the projection optics system 30.

[0074] That is, the alignment detection system 70 is an optical system that uses non-exposed light in a so-called off-axis manner.

[0075] The intermediate mask 20 used in the exposure apparatus 1 is formed of, for example, quartz, and a circuit pattern to be transferred to the wafer 40 is formed on the intermediate mask 20.

[0076] Furthermore, the intermediate mask 20 is held by the intermediate mask stage 25 and is moved by being driven by the intermediate mask stage 25.

[0077] Wafer 40 is, for example, a workpiece coated with photoresist on a silicon substrate. Additionally, wafer 40 is also a workpiece for position detection by alignment detection system 70 and focus tilt detection system 150.

[0078] As described above, in the exposure apparatus 1, the exposure light emitted from the light source 12 is guided by the illumination optical system 14 to the intermediate mask 20.

[0079] Then, the diffracted light diffracted by the pattern formed on the intermediate mask 20 is guided onto the wafer 40 by the projection optics system 30, so that the pattern is projected (transferred) onto the wafer 40.

[0080] Here, in the exposure apparatus 1, the intermediate mask stage 25 and the wafer stage 45 are configured such that the intermediate mask 20 and the wafer 40 are optically conjugate to each other with respect to the projection optical system 30.

[0081] Then, the pattern formed on the intermediate mask 20 is transferred onto the wafer 40 by scanning the intermediate mask stage 25 and the wafer stage 45 at a speed ratio corresponding to the reduction ratio of the pattern.

[0082] It should be noted that, in the above description, the exposure apparatus 1 using the step scanning method was described, but the stage device of this embodiment shown in detail below can also be applied to the exposure apparatus using the step repeat method.

[0083] Next, the mounting platform device of this embodiment will be described.

[0084] Figure 2 (a) is a schematic structural diagram of the stage device 100 of this embodiment.

[0085] The stage device 100 of this embodiment includes a Y mirror 33, a Y interferometer 34 (first measuring unit), a Y light pickup 37, a Y detection unit 38, and a Y wavelength compensator 39 (second measuring unit).

[0086] Furthermore, the stage device 100 of this embodiment includes a Y stage 41 (stage, first stage), an X stage 42 (second stage), and a control unit. The control unit also includes a signal processing unit 61, a timing control unit 81, and a Y wavelength correction unit 82.

[0087] like Figure 2 As shown in (a), for example, the wafer stage 45 has a Y stage 41 and an X stage 42, specifically, the X stage 42 is disposed on the Y stage 41.

[0088] Furthermore, the Y-mounted stage 41 is configured to be driven along the Y direction, and the X-mounted stage 42 is configured to be driven along the X direction, thereby enabling the stage 45 to be driven within the XY section.

[0089] Additionally, the Y-mirror 33 is disposed on the Y-stage 41 and has a reflecting surface (first reflecting surface) perpendicular to the Y direction. The Y-measurement beam 35 (first measurement beam) emitted from the Y-interferometer 34 is incident on the reflecting surface of the Y-mirror 33.

[0090] Furthermore, the Y-measured beam 35, reflected by the reflective surface of the Y-mirror 33, interferes with a reference beam (not shown) in the Y-interferometer 34, thereby generating a Y-interference beam 36. Alternatively, the Y-mirror 33 may be configured as an integral part of the Y-stage 41, which has a reflective surface perpendicular to the Y direction.

[0091] Next, the Y interference beam 36 emitted from the Y interferometer 34 is incident on the Y light pickup 37, thereby performing photoelectric conversion on the Y interference beam 36, and thus outputting an interference signal from the Y light pickup 37.

[0092] Furthermore, the Y-detection unit 38, located on a length measuring plate (not shown), detects the phase difference between the interference signal and the reference signal from the laser head located on the Y-interferometer 34.

[0093] Therefore, it is possible to output the position measurement value Δm corresponding to the distance Y0 in the Y direction between the Y interferometer 34 and the Y mirror 33, that is, the amount of movement ΔY in the Y direction of the Y stage 41. Y .

[0094] Here, the wavelength of the Y-measurement beam 35 emitted from the Y interferometer 34 varies according to the environment of the position measurement space, that is, the space between the Y interferometer 34 and the Y mirror 33, specifically, changes in temperature, humidity, and air pressure.

[0095] Therefore, the position measurement value Δm output from the Y detection unit 38 Y In this process, errors arise corresponding to the variation in the wavelength of the Y-measured beam 35.

[0096] Therefore, in the stage device 100 of this embodiment, in order to correct such a position measurement value Δm Y The wavelength of the Y-beam 35 is corrected by means of an error, and a Y-wavelength compensator 39 is provided.

[0097] Figure 2 (b) represents a schematic diagram illustrating the structure of the Y-wavelength compensator 39.

[0098] like Figure 2 As shown in (b), an interferometer 401 and a mirror 402 are provided inside the Y-wavelength compensator 39.

[0099] In addition, between the interferometer 401 and the mirror 402, the vacuum region 403 and the atmospheric region 404 (the first atmospheric region and the second atmospheric region) are arranged in a direction perpendicular to the direction of travel of the measuring beam.

[0100] Furthermore, in the Y-wavelength compensator 39, the measuring beam emitted from the interferometer 401 and reflected by the mirror 402 interferes with a reference beam (not shown), thereby determining the wavelength λ of the measuring beams in the vacuum region 403 and the atmospheric region 404 respectively. v and λ a .

[0101] At this time, the wavelength λ of the length measuring beams (the second measuring beam, the fourth measuring beam, and the fifth measuring beam) in the vacuum region 403 is... v With wavelength λ in atmospheric region 404 a The relationship can be expressed by the refractive index n of the atmosphere in atmospheric region 404 as shown in the following equation (1).

[0102] λ a =λ v / n…(1)

[0103] In other words, in the Y-wavelength compensator 39, the measurement results for the mirror 402 (a predetermined object) obtained based on the measuring beam propagating in the atmospheric region 404 are compared with the measurement results for the mirror 402 obtained based on the measuring beam propagating in the vacuum region 403.

[0104] Therefore, by obtaining the wavelength λ of the measuring beam in atmospheric region 404 a It can measure the refractive index n of the atmosphere in atmospheric region 404.

[0105] Furthermore, in the stage device 100 of this embodiment, the atmospheric refractive index n obtained by the Y wavelength compensator 39 can be used to correct for variations in the wavelength of the Y-length measuring beam 35 emitted from the Y interferometer 34 and the position measurement value Δm. Y The error.

[0106] Specifically, the wavelength correction amount ΔC corresponding to the change in the refractive index n of the atmosphere is input from the Y wavelength compensator 39 to the Y wavelength correction unit 82. This change in the refractive index n of the atmosphere is obtained when the Y stage 41 is moved in the Y direction in accordance with the driving conditions of the multiple stage respectively.

[0107] Then, the Y-wavelength correction unit 82 generates a table ΔC for each stage driving condition based on the wavelength correction amount ΔC input under various stage driving conditions. Y '(Table 1), and save it.'

[0108] That is, in the stage device 100 of this embodiment, the position measurement value Δm is obtained. Y The timing control unit 81 sends the driving conditions of the Y-mount stage 41 to the Y-wavelength correction unit 82.

[0109] Then, based on the received driving condition, the Y-wavelength correction unit 82 adjusts the corresponding table ΔC. Y Output to signal processing unit 61.

[0110] It should be noted that the stage driving conditions mentioned here include the setting conditions such as the type of drive, speed, magnitude of acceleration, and drive curve of the stepping drive, scanning drive, etc.

[0111] Therefore, the signal processing unit 61 uses the Y wavelength compensator 39 to measure the ΔC value. Y 'Position measurement value Δm of Y interferometer 34 Y After calibration, the movement ΔY of the Y-axis of the Y-mount stage 41 can be output.

[0112] It should be noted that the refractive index n of the atmosphere in the atmospheric region 404 of the Y wavelength compensator 39, i.e., the space between the Y interferometer 34 and the Y mirror 33, can be expressed by Edlen's experimental formula as shown in the following equation (2).

[0113] [Number 1]

[0114]

[0115] That is, if at least one of temperature T, humidity H, and air pressure P changes with time t in the space between the Y interferometer 34 and the Y mirror 33, then the refractive index n of the atmosphere in that space and the wavelength of the Y measuring beam 35 emitted from the Y interferometer 34 will change with time.

[0116] Next, regarding the stage apparatus 100 of this embodiment, the time change of the refractive index n of the atmosphere in the space between the Y interferometer 34 and the Y mirror 33 is compared with the position measurement value Δm. Y The method for correcting the impact is explained.

[0117] Specifically, the method is as follows: To measure the time-varying refractive index n of the atmosphere in the space between the Y interferometer 34 and the Y mirror 33 as the Y stage 41 moves in the Y direction, the position measurement value Δm is used. Y The influence is corrected, and the Y wavelength correction unit 82 is used to obtain the table ΔC. Y 'method'.

[0118] As described above, the refractive index n of the atmosphere in atmospheric region 404, as measured by the Y-wavelength compensator 39, varies with time according to equation (2) based on the time variations of the temperature T, humidity H, and air pressure P of the atmosphere in atmospheric region 404.

[0119] In addition, due to atmospheric fluctuations generated in atmospheric region 404 caused by the Y-mounted stage 41 being driven along the Y direction, the refractive index n of the atmosphere in atmospheric region 404 also changes with time.

[0120] Furthermore, the noise when the Y-wavelength compensator 39 measures the refractive index n of the atmosphere in atmospheric region 404 is also superimposed, and this noise also varies over time due to the busy and idle driving of the Y-stage 41, i.e., the movement of the Y-stage 41.

[0121] At this time, if the space equipped with the platform device 100 of this embodiment is air-conditioned, it can be considered that the temperature T and humidity H of the atmosphere in the atmospheric region 404 do not change for a sufficiently long time.

[0122] Therefore, the refractive index n of the atmosphere in atmospheric region 404, as measured by the Y-wavelength compensator 39, is considered to change over time according to the time variation of the air pressure P in atmospheric region 404, i.e., the atmospheric pressure, the atmospheric fluctuations caused by the drive of the Y-stage 41, and the noise that varies over time.

[0123] Figure 3 (a) represents the time variation 501 of the measured value corresponding to the refractive index n of the atmosphere in atmospheric region 404 as measured by the Y wavelength compensator 39 when the Y stage 41 is driven in a predetermined manner.

[0124] As mentioned above, in Figure 3 The time variation of the measured value shown in (a) 501 includes the time variation of atmospheric pressure in atmospheric region 404, atmospheric fluctuations caused by the drive of Y stage 41, and the component caused by time-varying noise.

[0125] At this point, it can be assumed that the atmospheric pressure in atmospheric region 404 varies with time at a sufficiently low frequency compared to the atmospheric fluctuations caused by the drive of the Y-mounted stage 41 and the time-varying noise.

[0126] Therefore, in the stage device 100 of this embodiment, the component caused by the time variation of atmospheric pressure is separated by inputting the time variation 501 of the acquired measurement value into a low-pass filter.

[0127] In other words, in the stage device 100 of this embodiment, by inputting the time change 501 of the measured value into a low-pass filter, the components (first component, fourth component, and sixth component) in the first frequency region corresponding to the low-frequency region in the time change 501 of the measured value are obtained.

[0128] Figure 3 (b) represents the time variation of the measurement values ​​obtained in this way, which is associated with the time variation of atmospheric pressure.

[0129] Furthermore, in the stage device 100 of this embodiment, by obtaining the difference between the time change 501 and the time change 601, the remaining component, namely the time change 701 of the measurement value associated with atmospheric fluctuations and time-varying noise caused by the drive of the Y stage 41, can be obtained.

[0130] Figure 3 (c) represents the time variation 701 of the measurements thus acquired, which are accompanied by atmospheric fluctuations and time-varying noise caused by the drive of the Y-stage 41.

[0131] Furthermore, it can be assumed that the noise superimposed in the measurement of the Y wavelength compensator 39 varies with time at a frequency that is sufficiently high compared to the atmospheric fluctuations caused by the drive of the Y stage 41.

[0132] Therefore, in the stage device 100 of this embodiment, the time variation 701 of the acquired measurement value is then input into a high-frequency cutoff filter to remove the component caused by noise that varies with time.

[0133] In other words, in the stage device 100 of this embodiment, by inputting the time variation 701 of the acquired measurement value to the high-frequency cutoff filter, the components of the second frequency region (second component, third component, and fifth component) corresponding to the high-frequency region in the time variation 701 of the measurement value are removed.

[0134] Thus, it is possible to obtain the time variation of the refractive index n of the atmosphere in atmospheric region 404, which is only associated with atmospheric fluctuations caused by the drive of the Y-stage 41.

[0135] In the stage apparatus 100 of this embodiment, the dependence of the atmospheric refractive index n on time t obtained in this way is created and stored as a table ΔC under predetermined driving conditions of the Y stage 41. Y '.

[0136] Figure 4 (a) represents the table ΔC generated by the Y-wavelength correction unit 82 under various stage driving conditions in the stage device 100 of this embodiment. Y The flowchart for processing '.

[0137] First, the environmental sensor 90 (third measurement unit) measures the temperature T, humidity H and air pressure P of the atmosphere in the space near the atmospheric region 404 of the Y-wavelength compensator 39, and the signal processing unit 61 stores the measured temperature T, humidity H and air pressure P (step S301).

[0138] Next, the signal processing unit 61 calculates the refractive index n of the atmosphere in the atmospheric region 404 by substituting the acquired temperature T, humidity H and air pressure P into equation (2).

[0139] Then, the signal processing unit 61 determines the calculated value as the initial value n0 of the refractive index of the atmosphere in the atmospheric region 404 of the Y wavelength compensator 39 (step S302).

[0140] Next, after the timing control unit 81, in order to generate the table ΔC under the predetermined stage drive conditions. Y ', and set the driving conditions for the platform (step S303).

[0141] Regarding the stage driving conditions set here, if the type, speed, magnitude of acceleration, and driving curve of the drive such as stepping drive or scanning drive are set, the influence of atmospheric fluctuations caused by the movement of the Y stage 41 in the Y direction is preferred.

[0142] Furthermore, while driving the Y stage 41 based on the stage driving conditions set in step S303, the timing control unit 81 uses the Y wavelength compensator 39 to measure the wavelength λ of the length measuring beam in the atmospheric region 404. a The time change (step S304).

[0143] Next, the Y-wavelength correction unit 82 inputs the time change of the measurement value obtained in step S304 into the low-pass filter to remove the component caused by the time variation of atmospheric pressure from the time change of the measurement value obtained in step S304 (step S305).

[0144] Next, the Y-wavelength correction unit 82 removes the component caused by time-varying noise by inputting the time change of the measured value, in step S305, which has removed the component caused by the time variation of atmospheric pressure, into the high-frequency cutoff filter.

[0145] Therefore, the Y wavelength correction unit 82 is able to produce a table ΔC. Y ', the table ΔC Y 'λ' represents the wavelength of the measuring beam associated with atmospheric fluctuations in atmospheric region 404 when the Y-stage 41 is driven under predetermined stage driving conditions. a That is, the time change of the refractive index n of the atmosphere (step S306).

[0146] Furthermore, the timing control unit 81 determines whether to generate table ΔC under other stage drive conditions. Y 'Determination (step S307).

[0147] If table ΔC is created under other stage driving conditions... Y If the condition is 'Yes' (Yes in step S307), then return to step S303.

[0148] On the other hand, when table ΔC was created under all stage drive conditions Y In the case of 'No' (step S307), the process ends.

[0149] Figure 4 (b) is a flowchart illustrating the process of calculating the movement amount ΔY of Y-stage 41 under predetermined stage driving conditions using the signal processing unit 61 in the stage device 100 of this embodiment.

[0150] First, when the Y-stage 41 is driven under the predetermined stage driving conditions by the timing control unit 81, the wavelength λ of the length measuring beam in the atmospheric region 404 is measured using the Y wavelength compensator 39. a The time change (step S308).

[0151] Next, the Y-wavelength correction unit 82 inputs the time change of the measurement value obtained in step S308 into the low-pass filter, thereby obtaining the component caused by the time change of atmospheric pressure based on the time change of the measurement value obtained in step S308.

[0152] Then, the signal processing unit 61 processes the table ΔC corresponding to the predetermined stage driving conditions. Y The wavelength λ of the Y-measurement beam 35 under the predetermined stage driving conditions is determined by adding the component obtained due to the time variation of atmospheric pressure. a The time change (step S309).

[0153] In addition, the signal processing unit 61 acquires the position measurement value Δm of the Y interferometer 34 when the Y stage 41 is driven under the predetermined stage driving conditions. Y .

[0154] Then, the signal processing unit 61 uses the wavelength λ of the measuring beam determined in step S309. a The time variation is used to correct the acquired position measurement value Δm Y Thus, the movement amount ΔY of the Y-mounted platform 41 is calculated (step S310).

[0155] Then, check the unit status of the interferometer 401 (step S311).

[0156] If the interferometer 401 is working normally (Yes in step S311), then the position measurement is repeated. That is, in order to continue the position measurement, return to step S308.

[0157] On the other hand, if a fault or other adverse condition occurs in the unit state of the interferometer 401 (No in step S311), the process ends.

[0158] As described above, in the mounting platform device 100 of this embodiment, table ΔC is prefabricated. Y ', the table ΔC Y 'λ' represents the wavelength of the measuring beam, which is associated with atmospheric fluctuations in the atmospheric region through which the measuring beam travels when the Y-stage 41 is driven under predetermined driving conditions. a That is, the time variation of the refractive index n of the atmosphere.

[0159] Then, using the created table ΔC YTo correct the position measurement value Δm of the Y interferometer 34 when the Y stage 41 is driven under the predetermined driving conditions. Y This allows for the accurate determination of the movement ΔY of the Y-mounted stage 41 in the Y direction.

[0160] In other words, the wavelength λ of the measuring beam varies based on atmospheric fluctuations in the atmospheric region generated when the Y-stage 41 is driven along the Y direction. a The position measurement value Δm of Y interferometer 34 Y Calibration is performed. This allows for high-precision measurement of the position of the Y-stage 41.

[0161] It should be noted that, in the above description, the driving of the Y-stage 41 constituting the wafer stage 45 in the Y direction is shown, but it is not limited thereto, and can also be applied to the driving of the X-stage 42 in the X direction.

[0162] In addition, it can be applied to the intermediate mask stage 25 for driving in the Y direction and driving in the X direction, not limited to the wafer stage 45.

[0163] In addition, while low-pass and high-frequency cutoff filters are used as filters in the above description, band-pass filters can also be used instead.

[0164] Furthermore, the stage device 100 of this embodiment is not limited to the exposure device 1 described above, and can also be used in pattern forming devices such as imprinting devices and drawing devices.

[0165] Here, an embossing apparatus refers to an apparatus that forms a pattern of a cured material with a molded pattern transferred by applying curing energy to the embossing material after bringing the embossing material and the molding material supplied to the substrate into contact.

[0166] In addition, a drawing device refers to a device that forms a pattern (latent image pattern) on a substrate by drawing a substrate with a charged particle beam (electron beam) or a laser beam.

[0167] [Second Implementation]

[0168] Figure 5 (a) represents the table ΔC generated under various stage driving conditions using the Y-wavelength correction unit 82 in the stage apparatus of the second embodiment. Y The flowchart for processing '.

[0169] It should be noted that the platform device in this embodiment has the same structure as the platform device 100 in the first embodiment, so the same reference numerals are used to mark the same components, and the description is omitted.

[0170] First, the environmental sensor 90 measures the temperature T, humidity H, and air pressure P of the atmosphere in the space near the atmospheric region 404 of the Y-wavelength compensator 39, and the signal processing unit 61 stores the measured temperature T, humidity H, and air pressure P (step S801).

[0171] Next, the signal processing unit 61 calculates the refractive index n of the atmosphere in the atmospheric region 404 by substituting the acquired temperature T, humidity H and air pressure P into equation (2).

[0172] Then, the signal processing unit 61 determines the calculated value as the initial value n0 of the refractive index of the atmosphere in the atmospheric region 404 of the Y wavelength compensator 39 (step S802).

[0173] Next, after the timing control unit 81, in order to generate the table ΔC under the predetermined stage drive conditions. Y Set the driving conditions for the stage (step S803).

[0174] Regarding the stage driving conditions set here, if the type, speed, magnitude of acceleration, and driving curve of the drive such as stepping drive and scanning drive are set, it is preferable to limit the influence of atmospheric fluctuations caused by the movement of the Y stage 41 in the Y direction.

[0175] Then, while the timing control unit 81 drives the Y stage 41 based on the stage driving conditions set in step S803, the Y wavelength compensator 39 measures the wavelength λ of the length measuring beam in the atmospheric region 404. a The time change (step S804).

[0176] Next, the Y-wavelength correction unit 82 inputs the time change of the measurement value obtained in step S804 into the low-pass filter, thereby removing the component caused by the time variation of atmospheric pressure from the time change of the measurement value obtained in step S804 (step S805).

[0177] Next, the Y-wavelength correction unit 82 inputs the time change of the measured value, from which the component caused by the time variation of atmospheric pressure was removed in step S805, to the high-frequency cutoff filter, thereby removing the component caused by time-varying noise.

[0178] Therefore, the Y wavelength correction unit 82 is able to produce a table ΔC. Y ', the table ΔC Y 'λ' represents the wavelength of the measuring beam associated with atmospheric fluctuations in atmospheric region 404 when the Y-stage 41 is driven under predetermined stage driving conditions. a That is, the time change of the refractive index n of the atmosphere (step S806).

[0179] Furthermore, in the stage device of this embodiment, the Y-wavelength correction unit 82 uses a function related to time t to adjust the value of the table ΔC obtained in step S806. Y The dependence of the atmospheric refractive index n on time t is fitted. Therefore, an approximate function n(t) is obtained and stored (step S807).

[0180] Then, the timing control unit 81 determines whether to generate table ΔC under other stage drive conditions. Y And determine the approximate function n(t) (step S808).

[0181] If table ΔC is created under other stage driving conditions... Y If the approximate function n(t) is found (Yes in step S808), then return to step S803.

[0182] On the other hand, when creating table ΔC under all stage drive conditions Y 'And if the approximate function n(t) is found (No in step S808), the process ends.'

[0183] Figure 5 (b) is a flowchart illustrating the process by which the signal processing unit 61 calculates the movement amount ΔY of the Y-stage 41 under predetermined stage driving conditions in the stage apparatus of this embodiment.

[0184] First, when the timing control unit 81 starts driving the Y stage 41 based on predetermined stage driving conditions, the Y wavelength compensator 39 measures the wavelength λ of the length measuring beam in the atmospheric region 404. a Time change (step S809).

[0185] Next, the Y-wavelength correction unit 82 inputs the time change of the measurement value obtained in step S809 into the low-pass filter, thereby obtaining the component caused by the time change of atmospheric pressure based on the time change of the measurement value obtained in step S809.

[0186] Then, the signal processing unit 61 determines the wavelength λ of the Y-measurement beam 35 under the predetermined stage driving condition by adding the approximate function n(t) corresponding to the predetermined stage driving condition to the acquired component caused by the time variation of atmospheric pressure. a Time change (step S810).

[0187] In addition, the signal processing unit 61 acquires the position measurement value Δm of the Y interferometer 34 when the Y stage 41 is driven under the predetermined stage driving conditions. Y .

[0188] Then, the signal processing unit 61 uses the wavelength λ of the measuring beam determined in step S810. a The time variation is used to correct the acquired position measurement value Δm Y Thus, the movement amount ΔY of the Y-mounted platform 41 is calculated (step S811).

[0189] Then, check the unit status of the interferometer 401 (step S812).

[0190] If the interferometer 401 is working normally (Yes in step S812), then return to step S809 in order to repeatedly perform position measurements.

[0191] On the other hand, if a fault or other adverse condition occurs in the unit state of the interferometer 401 (No in step S812), the process ends.

[0192] As described above, in the stage apparatus of this embodiment, an approximation function n(t) is prepared in advance. This approximation function n(t) represents the wavelength λ of the measuring beam that accompanies atmospheric fluctuations in the atmospheric region through which the measuring beam travels when the Y stage 41 is driven under predetermined driving conditions. a That is, the time variation of the refractive index n of the atmosphere.

[0193] Then, the position measurement value Δm of the Y interferometer 34 when the Y stage 41 is driven under the predetermined driving conditions is obtained by using the constructed approximation function n(t). Y By performing correction, the movement ΔY of the Y-mount stage 41 in the Y direction can be calculated with good accuracy.

[0194] Therefore, the position of the Y-stage 41 can be measured with high precision.

[0195] In the stage device of this embodiment, instead of directly using table ΔC Y ', and according to table ΔC Y Find an approximate function n(t) for use.

[0196] Therefore, even when the stage driving conditions change, such as the stage moving speed and the driving curve associated with the exposure layout, the wavelength λ of the Y-measurement beam 35 under the predetermined stage driving conditions can be determined without obtaining a new table. a The changes over time.

[0197] Specifically, for example, if the predetermined stage driving conditions only change the magnitude of the stage's moving speed compared to other stage driving conditions, the coefficient related to time t is changed in the approximate function n(t) obtained with the other stage driving conditions.

[0198] Therefore, it is possible to obtain an approximate function n(t) under the predetermined stage driving conditions.

[0199] In this way, in the stage device of this embodiment, the processing can be simplified by using the approximate function n(t), thereby improving the throughput.

[0200] [Third Implementation Method]

[0201] Figure 6 A schematic structural diagram showing the stage device 300 of the third embodiment.

[0202] The stage device 300 of this embodiment includes a Y mirror 33, a Y interferometer 34 (first measuring unit), a Y light pickup 37, a Y detection unit 38, and a Y wavelength compensator 39 (second measuring unit).

[0203] In addition, the stage device 300 of this embodiment includes an X-ray mirror 53, an X-ray interferometer 54 (fourth measuring unit), an X-ray pickup 57, an X-ray detection unit 58, and an X-ray wavelength compensator 59 (fifth measuring unit).

[0204] Furthermore, the stage device 300 of this embodiment includes a stage 45 and a control unit. The control unit also includes a signal processing unit 61, a timing control unit 81, a Y-wavelength correction unit 82, and an X-wavelength correction unit 83.

[0205] like Figure 6 As shown, for example, the wafer mounting stage 45 has a Y mounting stage and an X mounting stage (not shown), and specifically, the X mounting stage is mounted on the Y mounting stage.

[0206] Additionally, the Y-mirror 33 is disposed on the Y-stage and has a reflecting surface (first reflecting surface) perpendicular to the Y direction. The Y-measurement beam 35 (first measurement beam) emitted from the Y-interferometer 34 is incident on the reflecting surface of the Y-mirror 33.

[0207] Furthermore, the Y-measured beam 35, reflected by the reflective surface of the Y-mirror 33, interferes with a reference beam (not shown) in the Y-interferometer 34, thereby generating a Y-interference beam 36.

[0208] Alternatively, the Y mirror 33 can also be configured as an integral part of the Y stage, which has a reflecting surface perpendicular to the Y direction.

[0209] Next, the Y interference beam 36 emitted from the Y interferometer 34 is incident on the Y light pickup 37, thereby performing photoelectric conversion on the Y interference beam 36, and thus outputting an interference signal from the Y light pickup 37.

[0210] Then, the Y-detection unit 38, located on the length measuring plate (not shown), detects the phase difference between the interference signal and the reference signal from the laser head located on the Y interferometer 34.

[0211] Therefore, it is possible to output the position measurement value Δm corresponding to the distance Y0 in the Y direction between the Y interferometer 34 and the Y mirror 33, that is, the amount of movement ΔY of the Y stage in the Y direction. Y .

[0212] Similarly, the X-mirror 53 is positioned on the X-stage and has a reflecting surface (second reflecting surface) perpendicular to the X direction. The X-measurement beam 55 (third measurement beam) emitted from the X-interferometer 54 is incident on the reflecting surface of the X-mirror 53.

[0213] Then, the X-ray beam 55, reflected by the reflective surface of the X-mirror 53, interferes with a reference beam (not shown) in the X-interferometer 54, thereby generating an X-interference beam 56.

[0214] Alternatively, the X-mirror 53 can also be configured as an integral part of the X-stage, which has a reflecting surface perpendicular to the X direction.

[0215] Next, the X-interference beam 56 emitted from the X-interferencer 54 is incident on the X-ray pickup 57, thereby performing photoelectric conversion on the X-interference beam 56, and thus outputting an interference signal from the X-ray pickup 57.

[0216] Then, the X-detection unit 58, located on the length measuring plate (not shown), detects the phase difference between the interference signal and the reference signal from the laser head located on the X-interferometer 54.

[0217] Therefore, it is possible to output the position measurement value Δm corresponding to the distance X0 in the X direction between the X interferometer 54 and the X mirror 53, that is, the amount of movement ΔX of the X stage in the X direction. X .

[0218] In addition, compared with the X wavelength compensator 59, the Y wavelength compensator 39 is closer to the optical path of the Y measuring beam 35 between the Y interferometer 34 and the Y mirror 33.

[0219] In addition, compared with the Y wavelength compensator 39, the X wavelength compensator 59 is closer to the optical path of the X measuring beam 55 between the X interferometer 54 and the X mirror 53.

[0220] Next, consider the position measurement value Δm based on the wavelength correction amount ΔC obtained from the Y wavelength compensator 39. Y The calibration is performed, and the position measurement Δm is adjusted based on the wavelength correction amount ΔC obtained from the X wavelength compensator 59. X The correction process is performed.

[0221] At this time, the stage driving conditions for obtaining the wavelength correction amount ΔC are not limited to the driving of the X stage along the X direction and the driving of the Y stage along the Y direction. It should be noted that sometimes both are performed together.

[0222] For example, in the Y-wavelength compensator 39, as shown in the stage device of the first and second embodiments, when the Y stage is driven along the Y direction, the atmospheric fluctuations caused by the drive affect the time variation of the measurement value corresponding to the refractive index n of the atmosphere.

[0223] However, as with the stage device 300 of this embodiment, when the X stage is driven along the X direction and the Y stage is driven along the Y direction simultaneously, turbulence is generated in the atmospheric region 404 of the Y wavelength compensator 39 due to atmospheric fluctuations caused by both drives.

[0224] Furthermore, if such turbulence occurs in atmospheric region 404, a large error will occur in the measurement value corresponding to the refractive index n of the atmosphere, i.e., the wavelength correction amount ΔC.

[0225] Therefore, if we want to obtain the wavelength correction amount ΔC based on the value measured in the Y wavelength compensator 39 and directly use the obtained wavelength correction amount ΔC to correct the position measurement value Δm Y If this happens, the calculated movement ΔY of the Y-mounted platform will have a large error.

[0226] The position measurement value Δm is corrected by directly using the wavelength correction amount ΔC obtained in the X wavelength compensator 59. X When calculating the movement ΔX of the X-mounted platform, the same large error is also caused.

[0227] Therefore, in the stage device 300 of this embodiment, similarly to the stage devices of the first and second embodiments, a table ΔC is pre-made to drive the Y stage along the Y direction. Y 'and the table ΔC when the X-stage is driven along the X direction X '.

[0228] Then, when the X-stage is driven along the X direction and the Y-stage is driven along the Y direction simultaneously, the table ΔC is used. Y 'and ΔC X 'Calculate the movement ΔY of platform Y and the movement ΔX of platform X.'

[0229] Specifically, according to steps S301 to S306, the X-wavelength compensator 59 and the Y-wavelength compensator 39 generate a table ΔC when the X-stage is driven in the X direction while the Y-stage is stationary (first driving condition). X (Table 1)

[0230] In addition, according to steps S301 to S306, the X-wavelength compensator 59 and the Y-wavelength compensator 39 are manufactured such that when the Y-stage is driven to step along the Y direction with the X-stage stationary, the ΔC is displayed. Y (1).

[0231] In addition, according to steps S301 to S306, the X-wavelength compensator 59 and the Y-wavelength compensator 39 are configured to generate a table ΔC when the Y-stage is scanned along the Y direction while the X-stage is stationary (second driving condition). Y (2)(Table 2).

[0232] Thus, under multiple stage driving conditions, the table ΔC obtained by the X-wavelength compensator 59 and the Y-wavelength compensator 39 respectively X ΔC Y (1) and ΔC Y (2) It is stored in the Y wavelength correction unit 82 and the X wavelength correction unit 83.

[0233] Then, for example, consider the stage driving condition where the X stage moves stepwise along the X direction and the Y stage moves scanwise along the Y direction.

[0234] In other words, consider the stage driving conditions (predetermined driving conditions) under which the stage 45 is driven in the XY section in a direction (the third direction) that is not parallel to the X and Y directions respectively.

[0235] In this case, firstly, when calculating the movement ΔY of the Y-stage, the wavelength λ of the Y-length measuring beam 35 in the atmospheric region 404 is measured using the Y-wavelength compensator 39. aY The wavelength correction amount ΔC is obtained by measuring the time change.

[0236] Next, the obtained wavelength correction amount ΔC is input into a high-frequency cutoff filter to remove time-varying noise from the obtained wavelength correction amount ΔC.

[0237] In other words, by inputting the obtained wavelength correction amount ΔC into the high-frequency cutoff filter, the component (third component) in the second frequency region corresponding to the high-frequency region in the wavelength correction amount ΔC is removed.

[0238] Then, for the wavelength correction amount ΔC after removing time-varying noise, the table ΔC obtained by the Y wavelength compensator 39 will be used when the X stage is driven in a stepping motion along the X direction. X Multiply by a predetermined coefficient and then take the difference.

[0239] Therefore, it is possible to obtain the table ΔC under the above-mentioned stage driving conditions. Y ', determine with table ΔC YCorrespondingly, the wavelength λ of the Y-measurement beam 35 emitted from the Y interferometer 34 aY The changes over time.

[0240] It should be noted that the predetermined coefficients used here are determined based on the degree of atmospheric fluctuations generated by the Y wavelength compensator 39 in atmospheric region 404 in conjunction with the stepping drive of the X stage along the X direction.

[0241] That is, for example, it is determined based on the driving conditions of the X-stage stepping drive along the X direction, including the speed, magnitude of acceleration, and driving curve of the X-stage.

[0242] Then, the position measurement value Δm of the Y interferometer 34 is obtained when the X stage and Y stage constituting the stage 45 are driven under the above-mentioned stage driving conditions. Y .

[0243] Then, by using the table ΔC obtained as described above. Y 'To correct the acquired position measurement value Δm Y It can calculate the movement ΔY of the Y-mounted platform.

[0244] Similarly, when calculating the movement ΔX of the X-stage, the wavelength λ of the X-measurement beam 55 in the atmospheric region 404 is measured using the X-wavelength compensator 59. aX The wavelength correction amount ΔC is obtained by measuring the time change.

[0245] Next, the obtained wavelength correction amount ΔC is input into a high-frequency cutoff filter to remove time-varying noise from the obtained wavelength correction amount ΔC.

[0246] In other words, by inputting the obtained wavelength correction amount ΔC into the high-frequency cutoff filter, the component (the fifth component) in the second frequency region corresponding to the high-frequency region in the wavelength correction amount ΔC is removed.

[0247] Then, for the wavelength correction amount ΔC after removing time-varying noise, the table ΔC will be obtained by the X wavelength compensator 59 when the Y stage is scanned along the Y direction. Y (2) Multiply by a predetermined coefficient and then take the difference.

[0248] Therefore, it is possible to obtain the table ΔC under the above-mentioned stage driving conditions. X ', determine with table ΔC X Correspondingly, the wavelength λ of the X-ray measuring beam 55 emitted from the X-interferometer 54 aX The changes over time.

[0249] It should be noted that the predetermined coefficients used here are determined based on the degree of atmospheric fluctuations generated by the X wavelength compensator 59 in atmospheric region 404 in conjunction with the scanning drive of the Y stage along the Y direction.

[0250] That is, for example, it is determined based on the driving conditions of the Y-stage scanning drive along the Y-direction, including the speed, magnitude of acceleration, and driving curve of the Y-stage along the Y-direction.

[0251] Then, the position measurement value Δm of the X interferometer 54 is obtained when the X stage and Y stage constituting the stage 45 are driven under the above-described stage driving conditions. X .

[0252] Then, by using the table ΔC obtained as described above. X 'To obtain the position measurement value Δm X By performing corrections, the movement ΔX of the X-mounted stage can be calculated.

[0253] As described above, in the stage apparatus 300 of this embodiment, the wavelength λ of the measuring beam, which represents atmospheric fluctuations in the atmospheric region along which the measuring beam travels when the stage 45 is driven under predetermined driving conditions, is prepared in advance. a A table showing the time variation of the atmospheric refractive index n.

[0254] Then, by using the prepared table to correct the position measurement values ​​of the interferometer when the stage is driven under the predetermined driving conditions, the amount of movement of the stage 45 can be determined with good accuracy.

[0255] In other words, the wavelength λ of the measuring beam varies based on atmospheric fluctuations in the atmospheric region accompanying the driving stage 45. a The position measurement values ​​of the interferometer acquired when the stage 45 is driven are corrected. This allows for high-precision measurement of the position of the stage 45.

[0256] Specifically, the table ΔC is obtained when the Y-stage is driven along the Y direction while the X-stage is stationary. Y And the expression ΔC when the X stage is driven along the X direction while the Y stage is stationary. X .

[0257] Then, when the X-stage is driven along the X direction and the Y-stage is driven along the Y direction simultaneously, table ΔC is used. Y and ΔC X The error contained in the wavelength correction ΔC is removed, thereby calculating the movement ΔY of the Y stage and the movement ΔX of the X stage.

[0258] Therefore, even when the X-stage is driven along the X direction and the Y-stage is driven along the Y direction simultaneously, the positions of the X-stage and Y-stage constituting the stage 45 can be measured with high precision.

[0259] [Fourth Implementation Method]

[0260] Figure 7 This is a flowchart illustrating the processing of the exposure apparatus 1 when performing exposure using the stage apparatus of the fourth embodiment.

[0261] It should be noted that the platform device in this embodiment has the same structure as the platform device in any of the first to third embodiments, therefore the same reference numerals are used to label the same components and the description is omitted.

[0262] In a typical production line, multiple wafers 40, each coated with resist and constituting a predetermined batch, are sequentially fed into an exposure unit 1 using a linear conveyor device (not shown). The exposure unit 1 then performs wafer exposure processing of the same process on a batch-by-batch basis.

[0263] like Figure 7 As shown, in the exposure apparatus 1 equipped with the stage apparatus of this embodiment, when a predetermined wafer 40 is fed onto the wafer stage 45 (step S1001), it is determined whether the fed wafer 40 is the first wafer of the predetermined batch (step S1002).

[0264] If the wafer 40 delivered is the first wafer of a predetermined batch (Yes in step S1002), then a calibration process including alignment bias and focus bias is performed on the wafer 40.

[0265] It should be noted that in recent years, in the calibration process of the first wafer 40 of a batch, in order to achieve high overlap accuracy and exposure focusing accuracy for all wafers 40 constituting the batch, there has been a tendency to measure the full illumination area of ​​wafer 40.

[0266] In addition, during the calibration process described above, similar to the stage apparatus in any of the first to third embodiments, a table of measurements for correcting the interferometer is created based on the stage driving conditions when the wafers 40 constituting the batch are exposed.

[0267] Then, the created table is stored (step S1003), and the process proceeds to step S1004.

[0268] On the other hand, if the wafer 40 delivered is not the first wafer of the predetermined batch (No in step S1002), step S1003 is not performed and the process proceeds to step S1004.

[0269] Next, the exposure position is adjusted (corrected) with high precision by performing alignment measurements on the fed wafer 40 (step S1004).

[0270] At this time, similar to the stage device in any of the first to third embodiments, the interferometer's measurement value is corrected by using the table and wavelength compensator measurement value made in step S1003, thereby calculating the movement of the X stage and Y stage with high accuracy.

[0271] Then, while synchronizing the wafer 40 after the alignment process with the intermediate mask 20, scanning is performed separately to expose each irradiation area, thereby transferring the circuit pattern formed on the intermediate mask 20 to the wafer 40 (step S1005).

[0272] At this point, the interferometer's measurements are corrected using a table and wavelength compensator measurements that correspond to the stage driving conditions, including the location of the irradiation area to be exposed and the stage driving curve during exposure.

[0273] Then, after exposing all the irradiation areas within the wafer 40, the wafer 40 is sent out of the exposure apparatus 1 (step S1006).

[0274] Here, the exposed wafer 40 is typically transported to the developing apparatus using a linear transport device.

[0275] Next, it is determined whether all wafers 40 in this batch have been exposed (step S1007).

[0276] If all wafers 40 in this batch have been exposed (Yes in step S1007), then the process ends.

[0277] On the other hand, if not all wafers 40 in the batch are exposed (No in step S1007), return to step S1001 and expose the remaining wafers 40 in the batch sequentially.

[0278] As described above, in the stage apparatus of this embodiment, the wavelength λ of the measuring beam, which corresponds to atmospheric fluctuations in the atmospheric region through which the measuring beam travels when the stage is driven under predetermined driving conditions, is prepared in advance. a A table showing the time variation of the atmospheric refractive index n.

[0279] Then, by using the prepared table to correct the position measurement values ​​of the interferometer when the stage is driven under the predetermined driving conditions, the amount of movement of the stage can be determined with good accuracy.

[0280] This allows for high-precision measurement of the stage position.

[0281] Furthermore, the stage apparatus of this embodiment is configured to perform the fabrication table processing and the alignment bias and focus bias calibration processing for the first wafer 40 of the batch in the exposure apparatus 1 simultaneously.

[0282] This improves the throughput when performing exposure processing on each wafer 40 in a batch.

[0283] [How to make the item]

[0284] Next, the method for manufacturing the article according to this embodiment will be described.

[0285] The method for manufacturing articles such as semiconductor IC components, liquid crystal display components, and MEMS includes a process of exposing a substrate such as a wafer or glass substrate coated with a photosensitive agent using an exposure apparatus 1 equipped with a stage device according to any one of the first to fourth embodiments.

[0286] In addition, the above method includes a process of developing the exposed substrate (photosensitive agent) and other known processes of processing the developed substrate.

[0287] It should be noted that the other known processes mentioned herein include etching, photosensitive stripping, cutting, bonding, and encapsulation.

[0288] According to the article manufacturing method of this embodiment, it is possible to manufacture articles of higher quality than in the past.

[0289] The preferred embodiments have been described above, but the embodiments are not limited to these embodiments, and various modifications and changes can be made within the scope of their essence.

Claims

1. A platform device, characterized in that, have: A stage having a first reflective surface configured perpendicularly to a first direction and capable of being driven along the first direction; The first measuring unit receives a first measuring light reflected by the first reflecting surface to measure the position of the stage in the first direction; The second measurement unit measures the wavelength of the second measurement light propagating in the first atmospheric region; as well as The control unit corrects the measurement results of the first measurement unit based on information about the time variation of the wavelength of the second measurement light, which is associated with atmospheric fluctuations in the first atmospheric region generated when the stage is driven along the first direction under predetermined driving conditions.

2. The platform device according to claim 1, characterized in that, The control unit drives the stage along the first direction under the predetermined driving conditions, while the second measurement unit measures the time change of the wavelength of the second measurement light. The first component in the first frequency region is obtained by inputting the measured time change of the wavelength of the second measurement light into a low-pass filter. Based on the acquired first component and the first table, the time variation of the wavelength of the first measurement light under the predetermined driving conditions is determined. The first table represents the time variation of the wavelength of the second measurement light associated with atmospheric fluctuations in the first atmospheric region generated when the stage is driven along the first direction under the predetermined driving conditions. The measurement results of the first measuring unit are corrected based on the time variation of the wavelength of the determined first measuring light.

3. The platform device according to claim 2, characterized in that, The control unit determines the time variation of the wavelength of the first measured light by adding the acquired first component to the first table.

4. The platform device according to claim 2, characterized in that, The control unit determines the time variation of the wavelength of the first measured light by adding the acquired first component to an approximate function obtained from the first table.

5. The platform device according to claim 2, characterized in that, have: The third measuring unit measures the temperature, humidity, and air pressure of the space where the platform device is located. The control unit Based on the measurement results of the third measuring unit, an initial value for the refractive index of the atmosphere in the first atmospheric region is determined. While driving the stage along the first direction under the predetermined driving conditions, the second measuring unit measures the time change of the wavelength of the second measuring light. By inputting the measured time change of the wavelength of the second measurement light into a low-pass filter and a high-frequency cutoff filter, respectively, the first component in the first frequency region and the second component in the second frequency region are obtained. The first table is created by removing the first and second components from the time variation of the wavelength of the measured second light.

6. The platform device according to claim 4, characterized in that, The control unit obtains the approximate function by fitting the first table that has been created.

7. The platform device according to claim 1, characterized in that, The first measuring unit is an interferometer that measures the distance between the first measuring unit and the first reflecting surface based on the interference between the first measuring light reflected by the first reflecting surface and the reference light.

8. The platform device according to claim 1, characterized in that, The second measuring unit is a wavelength compensator that measures the wavelength of the second measuring light by comparing a measurement result for a predetermined object obtained based on the second measuring light propagating in the first atmospheric region with a measurement result for the predetermined object obtained based on the fifth measuring light propagating in the vacuum region.

9. The platform device according to claim 1, characterized in that, The mounting stage includes: a first mounting stage driven along the first direction and a second mounting stage driven along a second direction perpendicular to the first direction.

10. A platform device, characterized in that, have: The stage has a first reflective surface arranged perpendicularly to a first direction and is capable of being driven within a first cross section that is parallel to the first direction and a second direction perpendicular to the first direction; The first measuring unit receives a first measuring light reflected by the first reflecting surface to measure the position of the stage in the first direction; The second measurement unit measures the wavelength of the second measurement light propagating in the first atmospheric region; as well as The control unit corrects the measurement results of the first measuring unit acquired when the stage is driven within the first cross section along a third direction that is not parallel to the first and second directions, based on information about the time variation of the wavelength of the second measuring light that accompanies atmospheric fluctuations in the first atmospheric region generated when the stage is driven along the second direction.

11. The platform device according to claim 10, characterized in that, The control unit corrects the measurement results of the first measuring unit obtained when the stage is driven along the third direction under predetermined driving conditions based on the first table, which represents the time variation of the wavelength of the second measuring light associated with atmospheric fluctuations in the first atmospheric region generated when the stage is driven along the second direction under the first driving conditions.

12. The platform device according to claim 11, characterized in that, The control unit While driving the stage along the third direction under the predetermined driving conditions, the second measuring unit measures the time change of the wavelength of the second measuring light. The third component in the second frequency region is obtained by inputting the measured time change of the wavelength of the second measurement light into a high-frequency cutoff filter. For the measured time variation of the wavelength of the second measurement light, after removing the third component, the difference between this difference and the first table obtained by multiplying by a predetermined coefficient is taken, thereby determining the time variation of the wavelength of the first measurement light under the predetermined driving conditions. The measurement results of the first measuring unit are corrected based on the time variation of the wavelength of the determined first measuring light.

13. The platform device according to claim 12, characterized in that, have: The third measuring unit measures the temperature, humidity, and air pressure of the space where the platform device is located. The control unit The initial value of the refractive index of the atmosphere in the first atmospheric region is determined based on the measurement results of the third measuring unit. While driving the stage along the second direction under the first driving condition, the second measuring unit measures the time change of the wavelength of the second measuring light. By inputting the measured time variation of the wavelength of the second measurement light into a low-pass filter and a high-frequency cutoff filter, respectively, the fourth component in the first frequency region and the third component in the second frequency region are obtained. The first table is created by removing the third and fourth components from the time variation of the wavelength of the second measured light.

14. The platform device according to claim 11, characterized in that, The stage has a second reflective surface that is perpendicular to the second direction. The platform device includes: The fourth measuring unit receives the third measuring light reflected by the second reflecting surface to measure the position of the stage in the second direction; and The fifth measurement unit measures the wavelength of the fourth measurement light propagating in the second atmospheric region. The control unit corrects the measurement results of the fourth measuring unit acquired when the stage is driven along the third direction under the predetermined driving conditions based on the second table, which represents the time variation of the wavelength of the fourth measuring light associated with atmospheric fluctuations in the second atmospheric region generated when the stage is driven along the first direction under the second driving conditions.

15. The platform device according to claim 14, characterized in that, The control unit While driving the stage along the third direction under the predetermined driving conditions, the fifth measuring unit measures the time change of the wavelength of the fourth measuring light. The fifth component in the second frequency region is obtained by inputting the measured time change of the fourth measurement light into a high-frequency cutoff filter. For the measured time variation of the wavelength of the fourth measurement light, after removing the fifth component, the difference between this difference and the second table obtained by multiplying by a predetermined coefficient is taken, thereby determining the time variation of the wavelength of the third measurement light under the predetermined driving conditions. The measurement results of the fourth measuring unit are corrected based on the time variation of the wavelength of the determined third measuring light.

16. The platform device according to claim 15, characterized in that, have: The third measuring unit measures the temperature, humidity, and air pressure of the space where the platform device is located. The control unit The initial value of the refractive index of the atmosphere in the second atmospheric region is determined based on the measurement results of the third measuring unit. While driving the stage along the first direction under the second driving condition, the time change of the wavelength of the fourth measurement light is measured using the fifth measuring unit. The sixth component in the first frequency region and the fifth component in the second frequency region are obtained by inputting the measured time change of the wavelength of the fourth measurement light into a low-pass filter and a high-frequency cutoff filter, respectively. The second table is prepared by removing the fifth and sixth components from the time variation of the wavelength of the fourth measured light.

17. The platform device according to claim 14, characterized in that, The first atmospheric region is closer to the optical path of the first measuring light than the second atmospheric region. The second atmospheric region is closer to the optical path of the third measuring light than the first atmospheric region.

18. An exposure apparatus for exposing a substrate in a manner that transfers a pattern formed on a master plate onto the substrate, characterized in that, The device comprises: a stage apparatus according to any one of claims 1 to 17 that drives a substrate stage on which the substrate is mounted.

19. The exposure apparatus according to claim 18, characterized in that, When exposing the substrate, the substrate stage performs scanning movement in the first direction and stepping movement in the second direction perpendicular to the first direction.

20. The exposure apparatus according to claim 18, characterized in that, When the control unit performs calibration on the substrate placed on the substrate stage at the beginning of a predetermined batch, it generates a first table containing information on the time-varying wavelength of the second measured light.

21. A method for manufacturing an article, characterized in that, The process includes the following steps: The substrate is exposed using the exposure apparatus of claim 18; The exposed substrate is developed; and Articles are manufactured from the developed substrate.

22. A method for controlling the drive of a platform using a platform device, characterized in that, The stage device includes: a stage having a first reflective surface perpendicularly arranged relative to a first direction and capable of being driven along the first direction; a first measuring unit receiving first measuring light reflected by the first reflective surface to measure the position of the stage in the first direction; and a second measuring unit measuring the wavelength of a second measuring light propagating in a first atmospheric region. The method includes the following steps: correcting the measurement results of the first measuring unit based on information about the time variation of the wavelength of the second measuring light associated with atmospheric fluctuations in the first atmospheric region generated when the stage is driven along the first direction under predetermined driving conditions.

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