Display device and method of forming the same

Abstract

The present disclosure provides a display device, comprising a panel and an optical film disposed on the panel. The panel comprises a first substrate, a second substrate disposed corresponding to the first substrate, and a plurality of display units disposed on the first substrate. A defect point is located between the first substrate and the second substrate or on the second substrate. In the top view direction of the display device, the optical film has a first processing area corresponding to the defect point, and the first processing area at least partially overlaps with at least two display units.

Description

Technical Field

[0001] This disclosure relates to a display device, and more particularly to a display device comprising an optical film and a method for forming the same. Background Technology

[0002] Display devices are widely used in electronic devices such as mobile phones, televisions, monitors, tablet computers, automotive displays, wearable devices, and desktop computers. With the rapid development of electronic products, the requirements for display quality are becoming increasingly stringent.

[0003] However, during the manufacturing process of display devices, if foreign objects fall onto the active array substrate, color filter substrate, or adhere to the layers of films between the active array substrate and the color filter substrate, forming defects, these defects will cause bright spots, dark spots, or other issues in the display device, thereby affecting the display quality.

[0004] Therefore, developing manufacturing processes that improve the display quality of display devices without increasing costs remains a challenging task. Summary of the Invention

[0005] This disclosure provides a display device including an optical film and a method for forming the same, which can improve the display quality of the display device.

[0006] According to embodiments of this disclosure, a display device is provided, including a panel and an optical film disposed on the panel. The panel includes a first substrate, a second substrate corresponding to the first substrate, and a plurality of display units disposed on the first substrate. Defects are located between the first substrate and the second substrate or on the second substrate. The optical film has a first processing area corresponding to the defect. The first processing area at least partially overlaps with at least two of the plurality of display units, and the light emitted by the at least two display units has the same or different colors.

[0007] According to embodiments of the present disclosure, a method for forming a display device is provided, comprising: providing a panel; forming an optical film on the panel; confirming whether there are defects in and on the panel, and locating the defect locations; and forming a first processing area in the optical film corresponding to the defect locations. Attached Figure Description

[0008] To make the above-mentioned objects, features and advantages of the present invention more apparent and understandable, the specific embodiments of the present invention will be described in detail below with reference to the accompanying drawings, wherein:

[0009] Figure 1 An exploded view of a display device according to an embodiment of the present disclosure is shown.

[0010] Figure 2A top view of a display device according to an embodiment of the present disclosure is shown.

[0011] Figure 3 A cross-sectional schematic diagram of a display device according to an embodiment of the present disclosure is shown.

[0012] Figure 4 This diagram shows an enlarged cross-sectional view of an optical film according to an embodiment of the present disclosure.

[0013] Figure 5 A top view of a display device according to another embodiment of the present disclosure is shown.

[0014] Figure 6 Show Figure 5 A cross-sectional schematic diagram of an embodiment of the display device shown.

[0015] Figure 7 Show Figure 5 A cross-sectional schematic diagram of another embodiment of the display device shown.

[0016] Figure 8 Show Figure 5 A cross-sectional schematic diagram of another embodiment of the display device shown.

[0017] Figure 9 An enlarged cross-sectional schematic diagram of an additional optical film according to an embodiment of the present disclosure is shown.

[0018] Figure 10 A top view of a display device according to yet another embodiment of the present disclosure is shown.

[0019] Figure 11 Show Figure 10 A cross-sectional schematic diagram of an embodiment of the display device shown.

[0020] Figure 12 Show Figure 10 A cross-sectional schematic diagram of an embodiment of the display device shown.

[0021] Figure 13 A flowchart illustrating a method for forming a display device according to an embodiment of the present disclosure is shown.

[0022] Figures 14 to 17 It corresponds Figure 13 A cross-sectional schematic diagram of each step in the method for forming the display device shown.

[0023] Explanation of reference numerals in the attached figures

[0024] 10, 20, 30: Display devices

[0025] 100, 300, 500, 700: Panel

[0026] 110, 310, 510, 710: First substrate

[0027] 111, 311, 511: Data cable

[0028] 113,313,513: Scan lines

[0029] 120, 320, 520, 720: Second substrate

[0030] 130, 330, 530: Thin-film transistors

[0031] 140, 340, 540: Insulation layer

[0032] 150, 350, 550: Electrode layers

[0033] 160, 360, 560: Filter layers

[0034] 170, 370, 570: Display media layer

[0035] 180-1, 180-2, 380-1, 380-2, 580-1, 580-2: Orientation layers

[0036] 200, 400, 600: Optical films

[0037] 210, 410, 610: First substrate

[0038] 230,430,630:Polarizing film

[0039] 250, 450, 650: Second substrate

[0040] 651: Transparent Waterproof Base Layer

[0041] 653: Polymer layer

[0042] 655: Anti-glare layer

[0043] 270, 470, 670: Protective layer

[0044] 40: Formation Method

[0045] P: Defects

[0046] PA1, PA2, PA3: Treatment areas

[0047] NDA: Non-display area

[0048] DA: Display area

[0049] PX, PXG, PXR, PXB: Display Unit

[0050] W1, W2, W3, W5: Width

[0051] S401~S407: Steps Detailed Implementation

[0052] The following disclosure provides many different embodiments or examples to implement the various features of this application. The following disclosure describes specific examples of the various components and their arrangements to simplify the explanation. Of course, these specific examples are not intended to be limiting. For example, if this disclosure describes a first feature formed on or above a second feature, it indicates that it may include embodiments where the first and second features are in direct contact, or embodiments where an additional feature is formed between the first and second features, so that the first and second features may not be in direct contact.

[0053] The following describes some embodiments of this disclosure. Additional operations may be provided before, between, and / or after the steps described in these embodiments. Some of the described steps may be replaced or omitted in different embodiments. Furthermore, although some embodiments of this disclosure are described below with several steps in a specific order, these steps may also be performed in other reasonable orders.

[0054] Furthermore, when a component or membrane is referred to as being "on" or "connected" to another component or membrane, it can be directly on or directly connected to that other component or membrane, or there may be an interposed component or membrane between them (indirect cases). Conversely, when a component is referred to as being "directly" on or "directly connected" to another component or membrane, there may be no interposed component or membrane between them.

[0055] In this text, the terms "approximately" and "substantially" typically indicate that a given value or range is within 10%, 5%, 3%, 2%, 1%, or 0.5%. The given quantities are approximate; that is, even without specific mention of "approximately" or "substantially," their meaning is implied. The phrase "the range is between the first and second values" indicates that the range includes the first value, the second value, and other values ​​in between.

[0056] The display device disclosed herein may include, but is not limited to, display devices, antenna devices, sensing devices, touch displays, curved displays, or free-shape displays. The electronic device may be bendable or flexible. The antenna device may be, for example, a liquid crystal antenna, but is not limited to. The antenna device may include, for example, an antenna splicing device, but is not limited to. It should be noted that the electronic device may be any arrangement or combination of the foregoing, but is not limited to. Furthermore, the shape of the electronic device may be rectangular, circular, polygonal, with curved edges, or other suitable shapes. The electronic device may have peripheral systems such as a driving system, a control system, a light source system, a shelving system, etc., to support the display device, antenna device, or splicing device. The following description will use display devices as an example, but this disclosure is not limited thereto.

[0057] Figure 1 An exploded view of a display device 10 according to an embodiment of this disclosure is shown. Figure 1 As shown, the display device 10 includes a panel 100 and an optical film 200 disposed on the panel 100. The panel 100 includes a first substrate 110, scan lines 113 extending along a first direction (X direction), data lines 111 extending along a second direction (Y direction), and a second substrate 120 disposed on the scan lines 113 and data lines 111 corresponding to the first substrate 110. The first direction is perpendicular to the second direction. The first substrate 110 may be, for example, a thin film array substrate, and the second substrate 120 may be, for example, a color filter substrate. According to some embodiments, the second substrate may be, for example, a polymer substrate, but is not limited thereto. The materials of the first substrate 110 and the second substrate 120 may be the same or different, and the materials may include glass, quartz, sapphire, ceramic, polyimide (PI), polycarbonate (PC), polyethylene terephthalate (PET), polypropylene (PP), other suitable materials, or combinations thereof, but are not limited thereto.

[0058] Multiple display units are disposed on a first substrate 110. In this disclosure, the display units of a display device are sub-pixels or pixels used to display images to a viewer. Each display unit is a stacked structure that includes all associated film layers, associated components, or associated portions configured to emit light having brightness and color. For a liquid crystal display (LCD), the display unit is a sub-pixel, and each display unit may include associated portions of a liquid crystal layer, associated portions of a polarizer, associated portions of a backlight, and associated substrates, driving circuitry, and color filters. For self-emissive displays (e.g., light-emitting diode displays (LEDs) and organic light-emitting diode displays (OLEDs), the display unit is a sub-pixel or pixel, and each display unit may include associated self-emissive sources, associated light conversion layers, associated portions of polarizers, associated substrates, and associated driving circuitry. Furthermore, several display units may share film layers, shared components, or shared portions. The following description uses a liquid crystal display as an example.

[0059] Multiple data lines 111 are disposed on the first substrate 110 along a first direction, and multiple scan lines 113 are disposed on the first substrate 110 along a second direction. The multiple scan lines 113 and the multiple data lines 111 intersect to define multiple display units PX on the first substrate 110, such as... Figure 2 As shown. For ease of description, the display device 10 may omit components such as a cover glass or backlight module. The cover glass may be, for example, glass or acrylic, but is not limited thereto. The cover glass may selectively have touch functionality or not. The backlight module may include, for example, related optical materials (e.g., lamp panels, lamp strips, light guide plates, reflective sheets, brightness enhancement films, etc.), and the backlight module may be, for example, direct-lit or side-lit, but is not limited thereto.

[0060] Figure 2A top view of a display device 10 according to an embodiment of the present disclosure is shown. As shown in Figure 2, the panel 100 includes a display area DA and a non-display area NDA surrounding the display area DA. Display units PX defined by scan lines 113 and data lines 111 are located in the display area DA. The display units PX include at least one thin-film transistor (TFT) and may have the same or similar features. Based on the color of the emitted light, the display units PX can be divided into red display units PXR, green display units PXG, and blue display units PXB. It should be understood that, unless specifically stated otherwise, features described below for a particular display unit PX of the display device 10 may also be included in any other display unit PX of the display device 10. For example, features described below for green display unit PXG may also be included in red display unit PXR and / or blue display unit PXB. Furthermore, it should be understood that the display device 10 may have any appropriate number of display units PX depending on design requirements. In some embodiments, the red display unit PXR, the green display unit PXG, and the blue display unit PXB may be arranged in an alternating pattern. For example, the red display unit PXR, the green display unit PXG, and the blue display unit PXB may be arranged in an alternating pattern along a first direction, such as... Figure 2 As shown. In another embodiment, the red display unit PXR, the green display unit PXG, and the blue display unit PXB may be substantially staggered along the first direction, but are not limited thereto.

[0061] The defect P is located in or on the surface of panel 100, that is, the defect is located between the first substrate 110 and the second substrate 120, or the defect P is located on the second substrate 120, or more specifically, the defect P is located on the surface of the second substrate 120. In this disclosure, "defect P" refers to a component that should not be present in the display device 10 or a component that may affect the display quality of the display device 10, such as foreign objects, particles, contaminants, etc. During the manufacturing process of panel 100, if inspection reveals that defect P may cause bright spots, hot spots, or dark spots in the display device, thereby affecting the display quality of the display device 10, but this is not a limitation. Figure 2 An embodiment showing a defect P located in a green display unit PXG is illustrated as an example, but this disclosure is not limited thereto. For example, defect P may be caused by dust or particles falling into / on panel 100 from the process environment. Panel 100 may contain one, two, or more defect points P, wherein defect point P may be located individually or simultaneously in red display unit PXR, blue display unit PXB, between red display unit PXR and blue display unit PXB, or between green display unit PXG and blue display unit PXB, but is not limited thereto.

[0062] An optical film 200 is disposed above the panel 100. Specifically, the optical film 200 is disposed on the panel 100 in a third direction (Z direction, the normal direction of the first substrate 110) and overlaps the defect point P. The optical film 200 has a first processing area PA1. Figure 2 One embodiment showing the first processing area PA1 as a rectangle is provided as an example, but this disclosure is not limited thereto. The first processing area PA1 can have various shapes, including squares, rectangles, parallelograms, polygons, and irregular shapes. When the optical film 200 has multiple first processing areas PA1, each first processing area PA1 can independently have a different shape. The position of the first processing area PA1 corresponds to the position of the defect point P. In this disclosure, "corresponds" means that they at least partially overlap or completely overlap in a third direction (Z direction, the normal direction of the first substrate 110, also known as the top view direction of the display device). Specifically, in the third direction (Z direction), a portion of the first component overlaps with a portion of the second component, the first component overlaps with a portion of the second component, or the first component completely overlaps with the second component. That is, the first processing area PA1 at least partially overlaps with the defect point P in the third direction (Z direction). In some embodiments, the first processing area PA1 overlaps with the entire defect point P. In this embodiment, the projection of the defect point P relative to the first substrate 110 falls within the projection of the first processing area PA1 relative to the first substrate 110. In some embodiments, the size of the defect point P is less than or equal to 2 / 3 of the width of the first processing area PA1, meaning that when the projection of the defect point P relative to the first substrate 110 falls within 2 / 3 of the projection width of the first processing area PA1 relative to the first substrate 110, the processing area corresponds to the defect point. In this embodiment, one first processing area PA1 may correspond to multiple defect points P, but this disclosure is not limited thereto. In some embodiments, multiple first processing areas PA1 may correspond to multiple defect points P. In some embodiments, the width of the first processing area PA1 in the first direction is ≥ the width of at least one display unit in the first direction (i.e., the distance between two adjacent data lines 111). The first processing area PA1 corresponds to at least two display units in the display unit PX, and the colors of the at least two display units may be the same or different. For example, such as Figure 2 as well as Figure 3 As shown, the first processing area PA1 at least partially overlaps with the green display unit PXG and the blue display unit PXB, and the first width W1 of the first processing area PA1 is ≥ the second width W2 of the green display unit PXG. In some embodiments, the first processing area PA1 at least partially overlaps at least two of the plurality of display units PX, wherein the at least two display units may have the same color. The processing area may be set through an optical film, and the processing area corresponds to the defect point P, which can reduce the brightness of the bright spots caused by the defect point P in the display device, thereby improving the display quality.

[0063] Referring to the diagram, defect P is located on the second substrate 120 of panel 100, and optical film 200 is formed on panel 100 and overlaps defect P. Optical film 200 includes a first processing area PA1, and in the top view of display device 10, the first processing area PA1 corresponds to the defect P. Panel 100 includes a first substrate 110, a plurality of thin-film transistors 130 disposed on the first substrate 110, an insulating layer 140 disposed on the plurality of thin-film transistors 130, an electrode layer 150 disposed on the insulating layer 140, an alignment layer 180-1 disposed on the electrode layer 150, a display medium layer 170 disposed on the alignment layer 180-1, an alignment layer 180-2 disposed on the display medium layer 170, a filter layer 160 disposed on the alignment layer 180-2, and a second substrate 120 disposed on the filter layer 160. Although Figure 3 An embodiment showing the defect P located on the second substrate 120 is provided as an example, but this disclosure is not limited thereto. In some embodiments, the defect P may be located in the panel 100, including but not limited to the display dielectric layer 170, the electrode layer 150, and / or the insulating layer 140. Further, the electrode layer referred to in this disclosure may be, for example, a metal or a metal oxide, but is not limited thereto. The alignment layer may be, for example, polyimide (PI), but is not limited thereto. Additionally, the insulating layer may be, for example, an organic insulating layer or an inorganic insulating layer, but is not limited thereto.

[0064] The following is for reference Figure 4 Further explanation of the optical film of this disclosure. Figure 4 This diagram shows an enlarged cross-sectional view of an optical film 200 according to an embodiment of the present disclosure. Figure 4 As shown, the optical film 200 includes a first substrate 210, a polarizing film 230 formed on the first substrate 210, a second substrate 250 formed on the polarizing film 230, and a protective layer 270 formed on the second substrate 250, wherein the optical film 200 can be adhered to the second substrate 120 through the first substrate 210. In some embodiments, the protective layer 270 may be omitted. In some embodiments, the first substrate 210 may include one or more layers and the second substrate 250 may include one or more layers. For example, the first substrate 210 may include a transparent waterproof base layer, an optical compensation layer, and / or an adhesive layer, and the second substrate 250 may include a transparent waterproof base layer and a polymer (e.g., a View Angle Enhance, VAE layer, or an anti-glare layer). In some embodiments, the polymer layer may have a microstructure. Figure 4An embodiment showing the first processing region PA1 located on the second substrate 250 is shown as an example, but this disclosure is not limited thereto. The first processing region PA1 may be located in one or more layers above the polarizing film 230. The phrase "the first processing region PA1 is located above the polarizing film 230" means that, in a third direction, the vertical distance between the first processing region PA1 and the panel 100 is greater than the vertical distance between the polarizing film 230 and the panel 100. The optical film may, for example, comprise vinyl acetate-ethylene copolymer, polyethylene terephthalate, or other suitable materials, but is not limited thereto.

[0065] In some embodiments, the display device may further include a second processing area PA2 corresponding to the defect point P and overlapping the entire defect point P in a third-order upward direction, such as Figure 5 As shown. Figure 5 A top view of a display device 20 according to another embodiment of the present disclosure is shown. Figure 5 An embodiment showing that both the first processing area PA1 and the second processing area PA2 are rectangular is provided as an example, but this disclosure is not limited thereto. The first processing area PA1 and the second processing area PA2 can independently have various shapes, including squares, rectangles, parallelograms, polygons, and irregular shapes. Figure 5 In the illustrated embodiment, the first processing area PA1 and the second processing area PA2 correspond to the green display unit PXG and the blue display unit PXB, respectively, and partially overlap with the green display unit PXG and the blue display unit PXB in a third-order direction, but this disclosure is not limited thereto. In some embodiments, the second processing area PA2 may be located in a single display unit. Figure 5 In the illustrated embodiment, the first processing area PA1 overlaps with the entire second processing area PA2 in the third direction. The projection of the defect point P relative to the first substrate 310 falls within the projection of the second processing area PA2 relative to the first substrate 310, and the second processing area PA2 relative to the first substrate 310 (see...) Figures 6 to 8 The projection of the defect point P falls within the projection of the first processing area PA1 relative to the first substrate 310, but this disclosure is not limited thereto. In some embodiments, one second processing area PA2 may correspond to multiple defect points P, but this disclosure is not limited thereto. In some embodiments, multiple second processing areas PA2 may correspond to multiple defect points P, that is, when the projection of the defect point P relative to the first substrate 110 falls within 2 / 3 of the projection width of the second processing area PA2 relative to the first substrate 110, then the processing area corresponds to the defect point. In some embodiments, the first processing area PA1 corresponds to the second processing area PA2 and partially overlaps with the second processing area PA2 in a third direction. The second processing area PA2 may have a third width W3 in a first direction, and the first width W1 of the first processing area PA1 is greater than the third width W3 of the second processing area PA2, such as... Figures 6 to 8 As shown.

[0066] Figure 6 Show Figure 5 A cross-sectional schematic diagram of an embodiment of the display device 20 shown. (See diagram below.) Figure 6 As shown, the display device 20 includes a panel 300 and, as shown, a display device 20 including a panel 300 and, as shown, a display device 20 including a display ... Figure 4 The optical film 200 is shown. The panel 300 includes a first substrate 310, a plurality of thin-film transistors 330 disposed on the first substrate 310, an insulating layer 340 disposed on the plurality of thin-film transistors 330, an electrode layer 350 disposed on the insulating layer 340 and having a second processing region PA2 therein, an alignment layer 380-1 disposed on the electrode layer 350, a display medium layer 370 disposed on the alignment layer 380-1, an alignment layer 380-2 disposed on the display medium layer 370, a filter layer 360 disposed on the alignment layer 380-2, and a second substrate 320 disposed on the filter layer 360. The defect P is located in the display medium layer 370. The second processing region PA2 and... Figure 4 The first processing area PA1 in the second substrate 250 of the optical film 200 shown corresponds to the defect point P located in the display medium layer 370.

[0067] Figure 7 Show Figure 5 A cross-sectional schematic diagram of another embodiment of the display device 20 shown. (See diagram below.) Figure 7 As shown, the display device 20 includes a panel 300 and, as shown, a display device 20 including a panel 300 and, as shown, a display device 20 including a display ... Figure 4 The optical film 200 is shown. The panel 300 includes a first substrate 310, a plurality of thin-film transistors 330 disposed on the first substrate 310, an insulating layer 340 disposed on the plurality of thin-film transistors 330, an electrode layer 350 disposed on the insulating layer 340, an alignment layer 380-1 disposed on the electrode layer 350, a display medium layer 370 disposed on the alignment layer 380-1, an alignment layer 380-2 disposed on the display medium layer 370, a filter layer 360 disposed on the alignment layer 380-2 and having a second processing region PA2 therein, and a second substrate 320 on the filter layer 360. The defect P is located in the display medium layer 370. The second processing region PA2 and... Figure 4 The first processing area PA1 in the second substrate 250 of the optical film 200 shown corresponds to the defect point P located in the display medium layer 370.

[0068] Figure 8 Show Figure 5 A cross-sectional schematic diagram of another embodiment of the display device 20 shown. (See diagram below.) Figure 8 As shown, the display device 20 includes a panel 300 and, as shown, a display device 20 including a panel 300 and, as shown, a display device 20 including a display ... Figure 4The optical film 200 is shown. The panel 300 includes a first substrate 310, a plurality of thin-film transistors 330 disposed on the first substrate 310, an insulating layer 340 disposed on the plurality of thin-film transistors 330, an electrode layer 350 disposed on the insulating layer 340, an alignment layer 380-1 disposed on the electrode layer 350, a display medium layer 370 disposed on the alignment layer 380-1, an alignment layer 380-2 disposed on the display medium layer 370 and having a second processing region PA2 therein, a filter layer 360 disposed on the alignment layer 380-2, and a second substrate 320 disposed on the filter layer 360. The defect P is located in the display medium layer 370. The second processing region PA2 and... Figure 4 The first processing area PA1 in the second substrate 250 of the optical film 200 shown corresponds to the defect point P located in the display medium layer 370.

[0069] In some embodiments, the display device may further include an additional optical film 400. The additional optical film 400 may include a third processing area PA3 corresponding to the defect point P and overlapping the entire defect point P in a third-direction upward direction. Reference is made below. Figure 9 Further explanation of the additional optical film 400 of this disclosure. Figure 9 This diagram shows an enlarged cross-sectional view of an additional optical film 400 according to an embodiment of the present disclosure. Figure 9 As shown, the additional optical film 400 includes a first substrate 410, a polarizing film 430 formed on the first substrate 410, a second substrate 450 formed on the polarizing film 430, and a protective layer 470 formed on the second substrate 450, wherein the additional optical film 400 can be adhered to the first substrate of the panel through the first substrate 410. In some embodiments, the protective layer 470 may be omitted. In some embodiments, the first substrate 410 may include one or more layers and the second substrate 450 may include one or more layers. For example, the first substrate 410 may include a transparent waterproof base layer, an optical compensation layer, and / or an adhesive layer, and the second substrate 450 may include a transparent waterproof base layer, a polymer layer, and / or an anti-glare layer. Figure 9 An embodiment showing the third processing region PA3 located on the second substrate 450 is shown as an example, but this disclosure is not limited thereto. The third processing region PA3 may be located in one or more layers of the second substrate 450 above the polarizing film 430. The phrase "the third processing region PA3 is located above the polarizing film 430" means that, in a third direction, the vertical distance between the third processing region PA3 and the panel is greater than the vertical distance between the polarizing film 430 and the panel.

[0070] The structure and materials of each layer of the additional optical film 400 may be the same as or different from those of the optical film 200. For example, in one embodiment, the optical film 200 includes a first substrate 210, a polarizing film 230, a second substrate 250, and a protective layer 270, while the additional optical film 400 includes a first substrate 410, a polarizing film 430, and a second substrate 450.

[0071] Figure 10 A top view of a display device 30 including an additional optical film 400, according to another embodiment of the present disclosure, is shown. Figure 10 An embodiment showing that the first processing area PA1, the second processing area PA2, and the third processing area PA3 are all rectangular is provided as an example, but this disclosure is not limited thereto. The first processing area PA1, the second processing area PA2, and the third processing area PA3 can independently have various shapes, including squares, rectangles, parallelograms, polygons, and irregular shapes. Figure 10 In the illustrated embodiment, the first processing area PA1 and the second processing area PA2 correspond to the green display unit PXG and the blue display unit PXB, respectively, and partially overlap with the green display unit PXG and the blue display unit PXB in a third-direction upward direction. The third processing area PA3 corresponds to the green display unit PXG, and partially overlaps with the green display unit PXG in a third-direction upward direction. However, this disclosure is not limited thereto. In some embodiments, the second processing area PA2 may be located in one display unit, while the third processing area PA3 may correspond to two display units. Figure 10 In the illustrated embodiment, the first processing area PA1 overlaps with the entire second processing area PA2 in the third direction, and the second processing area PA2 overlaps with the entire third processing area PA3 in the third direction. The projection of the defect point P relative to the first substrate 510 falls within the projection of the third processing area PA3 relative to the first substrate 510, and the projection of the third processing area PA3 relative to the first substrate 510 falls within the projection of the second processing area PA2 relative to the first substrate 510. Furthermore, the second processing area PA2 relative to the first substrate 510 (see...) Figure 11 as well as Figure 12The projection of the first processing area PA1 falls within the projection of the first processing area PA1 relative to the first substrate 510, but this disclosure is not limited thereto. In some embodiments, one third processing area PA3 may correspond to multiple defect points P, but this disclosure is not limited thereto. In some embodiments, multiple third processing areas PA3 may correspond to multiple defect points P. That is, when the projection of the defect point P relative to the first substrate 110 falls within 2 / 3 of the projection width of the third processing area PA3 relative to the first substrate 110, the processing area corresponds to the defect point. In some embodiments, the first processing area PA1 may partially overlap with the second processing area PA2 in a third direction, the first processing area PA1 may partially overlap with the third processing area PA3 in a third direction, and / or the second processing area PA2 may partially overlap with the third processing area PA3 in a third direction. The third processing area PA3 may have a fifth width W5 in a first direction. In some embodiments, the first width W1 of the first processing area PA1 is greater than the third width W3 of the second processing area PA2, and the third width W3 of the second processing area PA2 is greater than the fifth width W5 of the third processing area PA3, such as Figure 11 as well as Figure 12 As shown, but this disclosure is not limited thereto. In some embodiments, the third width W3 of the second processing region PA2 is smaller than the fifth width W5 of the third processing region PA3.

[0072] Figure 11 Show Figure 10 A cross-sectional schematic diagram of an embodiment of the display device 30 shown. Figure 11 As shown, the display device 30 includes, as Figure 4 The optical film 200 shown is as follows: Figure 10 The diagram shows an additional optical film 400 and a panel 500 disposed between the optical film 200 and the additional optical film 400. The panel 500 includes a first substrate 510, a plurality of thin-film transistors 530 disposed on the first substrate 510, an insulating layer 540 disposed on the plurality of thin-film transistors 530, an electrode layer 550 disposed on the insulating layer 540 and having a second processing region PA2 therein, an alignment layer 580-1 disposed on the electrode layer 550, a display medium layer 570 disposed on the alignment layer 580-1, an alignment layer 580-2 disposed on the display medium layer 570, a filter layer 560 disposed on the alignment layer 580-2, and a second substrate 520 disposed on the filter layer 560. A defect P is located in the display medium layer 570. The second processing region PA2 is located in the electrode layer 550 and is disposed in conjunction with... Figure 4 The first processing region PA1 in the second substrate 250 of the optical film 200 shown, such as Figure 9 The third processed area PA3 in the second substrate 450 of the additional optical film 400 shown corresponds to the defect point P.

[0073] Figure 12 Show Figure 10 A cross-sectional schematic diagram of an embodiment of the display device 30 shown. Figure 12 As shown, the display device 30 includes, as Figure 4 The optical film 200 shown is as follows: Figure 10 The diagram shows an additional optical film 400 and a panel 500 disposed between the optical film 200 and the additional optical film 400. The panel 500 includes a first substrate 510, a plurality of thin-film transistors 530 disposed on the first substrate 510, an insulating layer 540 disposed on the plurality of thin-film transistors 530, an electrode layer 550 disposed on the insulating layer 540, an alignment layer 580-1 disposed on the electrode layer 550, a display medium layer 570 disposed on the alignment layer 580-1, an alignment layer 580-2 disposed on the display medium layer 570, a filter layer 560 disposed on the alignment layer 580-2 and having a second processing region PA2 therein, and a second substrate 520 on the filter layer 560. A defect P is located in the display medium layer 570. The second processing region PA2 is located in the filter layer 560 and as shown... Figure 4 The first processing region PA1 in the second substrate 250 of the optical film 200 shown, such as Figure 9 The third processed area PA3 in the second substrate 450 of the additional optical film 400 shown corresponds to the defect point P.

[0074] This disclosure also provides a method for forming a display device. Figure 13 A flowchart illustrating a method 40 for forming a display device according to an embodiment of the present disclosure is shown. Figure 13 As shown, the display device forming method 40 of this disclosure includes a step of providing a panel, a step of forming an optical film on the panel, a step of confirming whether there are defects in and on the panel and locating the position of the defects, and a step of forming a first processing area in the optical film corresponding to the position of the defects, and a step of forming a first processing area in the optical film corresponding to the position of the defects, and a step of forming a first processing area in the optical film.

[0075] The following is for reference Figures 14 to 17 The method of forming the display device disclosed herein will be described. Figures 14 to 17 It corresponds Figure 13 A cross-sectional schematic diagram of each step in the method 40 for forming the display device shown.

[0076] First, in step S401, the following is provided: Figure 14 The panel 700 shown is a plurality of display units PX, which can be divided into red display units PXR, green display units PXG, and blue display units PXB according to the color of the light emitted. The panel 700 includes a first substrate 710 and a second substrate 720. Figure 14An example is shown where the first substrate 710 is a thin-film transistor substrate and the second substrate 720 is a filter layer substrate, with the defect point P located between the first substrate 710 and the second substrate 720. In this embodiment, the distance between the second substrate 720 and the defect point P is greater than the distance between the first substrate 710 and the defect point P, but this disclosure is not limited thereto. Although Figure 14 Only one defect point P is shown as an example, but this disclosure is not limited thereto. In some embodiments, the panel provided in step S401 may be a panel in which there is no defect point P. In some embodiments, the panel provided in step S401 may include multiple defects. The multiple defects may be located at various locations on the panel 700. For example, the defects may be formed on the surface of the first substrate 710 and / or the second substrate 720 of the panel 700, in each layer between the first substrate 710 and the second substrate 720, or between the layers.

[0077] Next, in step S403, an optical film 600 is formed on the light-emitting direction of the substrate 700, such as... Figure 15 As shown. In some embodiments, the optical film 600 may be formed on the substrate 700 by attachment. The optical film 600 may have a multilayer structure. For example, such as Figure 15 As shown, the optical film 600 may include a first substrate 610, a polarizing film 630 disposed on the first substrate 610, a second substrate 650 disposed on the polarizing film 630, and a protective layer 670 disposed on the second substrate 650, but this disclosure is not limited thereto. In some embodiments, the protective layer 670 may be omitted. The first substrate 610 and the second substrate 650 may each be a single-layer or multi-layer structure independently. In some embodiments, the first substrate 610 and the second substrate 650 may include a transparent substrate with waterproof properties to prevent the polarizing film from being damaged by external moisture. In some embodiments, the first substrate 610 may be a multi-layer structure including a transparent substrate and an adhesive layer. In this embodiment, the optical film 600 may be adhered to the substrate 700 through the adhesive layer. Figure 15 The illustration shows a second substrate 650 comprising a transparent waterproof base layer 651, an anti-glare layer 655, and a polymer layer 653 disposed between the transparent waterproof base layer 651 and the anti-glare layer 655, wherein the polymer layer 653 has a microstructure. However, this disclosure is not limited thereto. In some embodiments, the polymer layer 653 may not have a microstructure. In some embodiments, the anti-glare layer 655 may be omitted.

[0078] Next, in step S405, the structure obtained in step S403 is observed using an optical microscope (OM) and / or a scanning electron microscope (SEM) to locate defect points P. The location of defect point P is marked to pinpoint its location. The defect point P referred to here may be a defect that originally existed in the panel, or it may be a defect caused by dust or particles falling into / onto the panel from the manufacturing environment. For example, when defect point P exists between the various film layers of the display device, it will cause bright spots or glowing spots in the display device. That is, when the backlight module of the display device is lit, when observed through an optical microscope in the Z direction (the normal direction of the substrate), if the brightness of one area of ​​the display device is brighter than other areas (e.g., the brightness difference observed by the human eye or measured with a suitable instrument), then the corresponding stacked film layer of that area may have defect point P, thereby locating the defect point. However, the method of locating the defect point is not limited to this.

[0079] After locating the defect point, in step S407, a fogging process is performed on the area of ​​the optical film 600 corresponding to the defect point location to form the first processing area PA1, and the resulting structure is as follows. Figure 16 As shown. The atomization process includes irradiating an area of ​​the optical film 600 corresponding to the defect location using nanosecond laser technology, picosecond laser technology, femtosecond laser technology, or a combination thereof to form a first processing area PA1 corresponding to the defect P. For example, using picosecond laser or femtosecond laser technology for the atomization process can destroy and atomize the target area without damaging the upper structure. The laser technology described in this disclosure may, for example, use 355, 533, or 1064 nm laser light or a combination thereof, but is not limited thereto. See below for reference. Figure 16 The atomization process in step S407 is described in further detail. Figure 16An embodiment showing the formation of a first processing region PA1 in a microstructured polymer layer 653 is shown as an example, but this disclosure is not limited thereto. In some embodiments, the first processing region PA1 may be formed in a transparent waterproof substrate 651 / or an anti-glare layer 655, provided that, in a third direction, the vertical distance between the first processing region PA1 and the panel 700 is greater than the vertical distance between the polarizing film 630 and the panel 700. In this embodiment, the focal length of a laser (e.g., a picosecond / femtosecond laser pulse of 533nm, 1064nm, or a combination thereof) is adjusted to irradiate the region in the polymer layer 653 corresponding to the location of the defect, thereby destroying the microstructure of the region and atomizing the region to form the first processing region PA1. By disrupting the microstructure of the polymer layer 653, non-uniform scattering of light passing through the first processing area PA1 can be achieved. Furthermore, by atomizing the polymer layer 653, partial absorption of light passing through the first processing area PA1 can be achieved. In other words, the atomization process disrupts the continuous microstructure of the polymer layer 653 corresponding to the defect point P, thereby scattering the light reflected by the defect point P as it passes through the processing area PA1. Accordingly, by forming the first processing area PA1 corresponding to the defect point P, the brightness of the bright spot caused by the defect point P is reduced. The formed first processing area PA1 can independently have various shapes, including squares, rectangles, parallelograms, polygons, and irregular shapes. Generally, considering the direction of light travel and scattering characteristics, the width of the first processing area PA1 in the first direction (X direction) must be greater than or equal to the width of at least one display unit in the first direction to ensure sufficient coverage of the defect point P. In some embodiments, the size of the defect point P is less than or equal to 2 / 3 of the width of the first processing area PA1. Therefore, one first processing area PA1 can correspond to one or more defect points.

[0080] In some embodiments, the first processing area PA1 corresponds to two adjacent display units that emit light of different colors. In some embodiments, the first processing area PA1 at least partially overlaps with at least two display units, wherein the light emitted by the at least two display units has the same or different colors.

[0081] In some embodiments, the method 40 for forming a display device may further include a step S406, prior to step S407 of forming a first processing area, to form a second processing area PA2 in the panel corresponding to the location of the defect. The second processing area PA2 is formed through a carbonization process. The carbonization process includes irradiating the panel using nanosecond laser technology, picosecond laser technology, femtosecond laser technology, or a combination thereof to form the second processing area PA2. For example, using picosecond laser or femtosecond laser technology for the carbonization process can destroy and carbonize the target area without damaging the upper structure. See below for reference. Figure 17The carbonization process in step S406 is further described. Although Figure 17 An embodiment showing the second processing region PA2 formed in the first substrate 710 (the filter layer substrate in this embodiment) is shown as an example, but the disclosure is not limited thereto. In some embodiments, the second processing region PA2 may be formed in the second substrate 720, i.e., the thin-film transistor substrate in this embodiment. In this embodiment, after locating the defect point, the focal length of a laser (e.g., a picosecond / femtosecond laser pulse of 533nm, 1064nm, or a combination thereof) is adjusted to irradiate the area in the first substrate 710 corresponding to the defect point location, thereby carbonizing the area to form the second processing region PA2. In one embodiment, after forming the second processing region PA2, the focal length of the laser pulse used may be adjusted to further form a first processing region PA1 corresponding to the second processing region PA2 in step S407.

[0082] Similar to the first processing area PA1, the second processing area PA2 can independently have various shapes, including squares, rectangles, parallelograms, polygons, and irregular shapes. Generally, considering the direction of light travel and scattering characteristics, the width of the first processing area PA1, which is farther from the defect point P, in the first direction must be greater than or equal to the width of the second processing area PA2, which is closer to the defect point P, in the first direction to ensure sufficient coverage of the defect point P, thereby reducing the brightness of the bright spot caused by the defect point P, but this is not a limitation. Similar to the first processing area PA1, one second processing area PA2 can correspond to one or more defect points.

[0083] In some embodiments, the carbon content of the layer containing the first processing region PA1 (e.g., polymer layer 653) may be lower than the carbon content of the layer containing the second processing region PA2 (e.g., electrode layer in the first substrate 710 or filter layer or alignment layer in the second substrate 720). In some embodiments, when the optical film has the first processing region PA1, the upper surface of the optical film corresponding to the first processing region PA1 may have a protruding structure. That is, when the optical film has a protective layer 670, and the protective layer 670 is the outermost layer, since the optical film has the first processing region PA1, the upper surface of the protective layer 670 corresponding to the first processing region PA1 may have a protruding structure, but this is not a limitation. The term "outermost layer" as used in this disclosure refers to the position of the component furthest from the panel.

[0084] In some embodiments, prior to step S405 of locating the defect point, the display device formation method 40 may further include a step of forming an additional optical film on the panel, such that the panel 700 is disposed between the optical film 600 and the additional optical film. The additional optical film may have a structure similar to the optical film 600. In this embodiment, the additional optical film may include a polarizing film and a third processing region. The third processing region may be formed in the additional optical film after step S405 of locating the defect point, using the same steps as forming the first processing region PA1 described above. Therefore, the transmittance of the third processing region may be similar to the transmittance of the first processing region PA1 and greater than the transmittance of the second processing region PA2. The third processing region may be formed before the second processing region PA2 or after the first processing region PA1. Similar to the first processing region PA1, the vertical distance between the third processing region in the additional optical film and the panel 700 is greater than the vertical distance between the polarizing film in the additional optical film and the panel 700. By forming the third processing region, the brightness of the bright spot caused by the defect point P can be further reduced.

[0085] This disclosure provides a method for forming a display device that reduces the brightness of bright spots caused by defective points P. By reducing the brightness of bright spots caused by defective points P, a panel with defects can be repaired, thereby improving the display quality of the display device containing the panel with defects. In summary, the method provided by this disclosure can reduce the manufacturing cost of the display device by processing a panel containing defects.

[0086] The foregoing has outlined the features of several embodiments to enable those skilled in the art to better understand the various aspects of this disclosure. Those skilled in the art should understand and readily be able to design or modify other processes and structures based on this disclosure to achieve the same purpose and / or the same advantages as the embodiments described herein. Those skilled in the art should also understand that these multiple equivalent structures do not depart from the spirit and scope of this disclosure. Various changes, substitutions, or modifications can be made to the embodiments of this disclosure without departing from the spirit and scope of this disclosure. Features between embodiments can be freely combined and used as long as they do not violate the spirit of the invention or conflict with it. Furthermore, each claim of this disclosure may be an individual embodiment, and the scope of this disclosure includes each claim and the combination of each embodiment.

[0087] Although the present invention has been disclosed above with reference to preferred embodiments, it is not intended to limit the present invention. Any person skilled in the art can make some modifications and improvements without departing from the spirit and scope of the present invention. Therefore, the scope of protection of the present invention shall be defined by the claims.

Claims

1. A display device, comprising: A panel, the panel comprising: First substrate; A second substrate is disposed corresponding to the first substrate; and Multiple display units are disposed on the first substrate. A defect located between the first substrate and the second substrate or on the second substrate; and An optical film includes a first substrate, a protective layer on the first substrate, and a second substrate disposed between the first substrate and the protective layer. The first substrate is disposed on the panel. The second substrate includes a polymer layer, the polymer layer including a plurality of microstructures and a first treatment area in which some of the microstructures are damaged. In the top view of the display device, the first processing area corresponds to the defect point, and the first processing area at least partially overlaps with at least two of the plurality of display units, wherein the upper surface of the first processing area is lower than the upper surface of the second substrate.

2. The display device as described in claim 1, characterized in that, The first processing area has a first width in a first direction, and one of the at least two display units has a second width in the first direction, wherein the first width is greater than or equal to the second width.

3. The display device as described in claim 2, characterized in that, One of the at least two display units has a second processing area, which corresponds to the first processing area.

4. The display device as described in claim 3, characterized in that, The second processing area has a third width in the first direction, and the first width is greater than or equal to the third width.

5. The display device as described in claim 3, characterized in that, The panel further includes an electrode layer on the first substrate, and the second processing area is located in the electrode layer.

6. The display device as claimed in claim 3, characterized in that, The panel further includes a filter layer on the first substrate, and the second processing area is located in the filter layer.

7. The display device as claimed in claim 3, characterized in that, The panel further includes an alignment layer on the first substrate, and the second processing area is located in the alignment layer.

8. A method for forming a display device, comprising: Provide a panel; An optical film is provided on the panel, wherein the optical film includes a first substrate, a protective layer on the first substrate, and a second substrate disposed between the first substrate and the protective layer, the second substrate including a polymer layer, and the polymer layer including multiple microstructures; Confirm whether there is a defect in or on the panel, and locate the position of the defect; and A first processing area is formed by damaging a portion of the microstructure of the polymer layer at the location of the defect to form a first processing area. In the top view of the display device, the first processing area corresponds to the defect and at least partially overlaps with at least two of the plurality of display units. The upper surface of the first processing area is lower than the upper surface of the second substrate.

9. The method for forming a display device as described in claim 8, characterized in that, The optical film includes a polarizing film disposed between the first substrate and the second substrate, wherein the vertical distance between the first processing area and the panel is greater than the vertical distance between the polarizing film and the panel.

10. The method of forming a display device as claimed in claim 8, further comprising forming a second processing area in the panel corresponding to the location of the defect point before forming the first processing area.

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