Compound, composition including the same, antireflection film and display device

Abstract

Provided are a compound represented by Chemical Formula 1, a composition including the same, an antireflection film including the same, and a display device including the antireflection film. In Chemical Formula 1, each substituent is as defined in the specification. [Chemical Formula 1].

Description

[0001] CROSS-REFERENCE TO RELATED APPLICATIONS

[0002] This application claims priority to and the benefits of Korean Patent Application No. 10-2021-0081130 filed in the Korean Intellectual Property Office on June 22, 2021, the entire contents of which are incorporated herein by reference. Technical Field

[0003] The present disclosure relates to a compound, a composition including the same, an anti-reflection film including the same, and a display device including the anti-reflection film. Background Art

[0004] In a typical liquid crystal display (LCD), light emitted from a white light source passes through an RGB color filter of each pixel to form a sub-pixel of each color, and colors within the RGB range can be generated by combining the sub-pixels.

[0005] In recent years, new displays using light emitters such as quantum dots and organic-inorganic phosphors that emit the color of each sub-pixel are being developed. A method using an ultraviolet (UV) light source and a method using a blue light source have been proposed as methods of exciting these blue, green, and red light sources.

[0006] When a UV light source is used, each color is generated and implemented by a blue light emitter, a green light emitter, and a red light emitter, but when a blue light source is used, green and red are colors each generated by the light emitter, and the blue pixel transmits the light source as it is.

[0007] In the case of a display material including quantum dots that has been recently commercialized or is being developed, light emission of green quantum dots and red quantum dots by a blue light source or a white light source is used. Display devices containing quantum dots are intended to improve color reproducibility and brightness by using quantum dot materials, and panels using quantum dot light emission using various types of light sources have been continuously developed. In addition, the viewing angle can be improved according to the position of the quantum dot material in the panel configuration. In order to improve the luminous efficiency of quantum dots, the next generation quantum dot display devices are being developed in terms of increasing the intensity of the light source or in terms of developing a light source with an extended blue region.

[0008] In quantum dot display devices, the spectrum of the light source reaching the quantum dot material has a very close impact on the efficiency of the quantum dots. Since the characteristics of each light source vary depending on the type of light source, efforts are continuing in various fields to introduce new ways to improve the efficiency of each light source.

[0009] On the other hand, in the case of a new display using a light emitter, it is necessary to reduce the reflectivity of external light or adjust the panel color caused by scattered reflection. To solve this problem, attempts have been made to use dyes in optical members constituting the panel. When quantum dots are used as light emitters, it is difficult to reduce the reflectivity of external light or adjust the panel color.

[0010] Therefore, in the case of new displays, antireflection films that improve brightness loss or color correction are being introduced, and recently, attempts are being made to additionally apply cyanine dyes or azo dyes as dyes capable of absorbing light of a specific wavelength to maximize the low reflection characteristics of the antireflection film.

[0011] However, the cyanine dye or the azo dye can absorb light in a short wavelength region, but has a problem of reducing the reliability of light resistance, and thus it is difficult to apply it to an antireflection film. Summary of the invention

[0012] The embodiment provides a compound capable of absorbing light in the blue long wavelength region and the green short wavelength region of a light source.

[0013] Another embodiment provides a composition comprising the compound.

[0014] Another embodiment provides an anti-reflection film including the compound.

[0015] Another embodiment provides a display device including the anti-reflection film.

[0016] The embodiment provides a compound represented by Chemical Formula 1.

[0017] [Chemical formula 1]

[0018]

[0019] In Chemical Formula 1,

[0020] R 1 and R 2 are each independently a substituted or unsubstituted C1 to C20 alkyl group,

[0021] R 3 To R 6 are each independently a hydrogen atom, a halogen, a cyano group, an ester group (*-C(=O)OR', wherein R' is a substituted or unsubstituted C1 to C15 alkyl group) or an amide group (*-C(=O)NR"R"', wherein R" and R"' are each independently a hydrogen atom or a substituted or unsubstituted C1 to C15 alkyl group),

[0022] R 7 To R 14each independently represents hydroxy, substituted or unsubstituted C1 to C20 alkyl, substituted or unsubstituted C3 to C20 cycloalkyl, substituted or unsubstituted C1 to C20 alkoxy, substituted or unsubstituted C6 to C20 aryl, or substituted or unsubstituted C2 to C20 heterocycloalkyl,

[0023] M is Zn, Ag, Ti, Pt, Co, Fe, Ni or Pd, and

[0024] n1 and n2 are each independently an integer of 1 to 5.

[0025] In Chemical Formula 1, R 1 and R 2 Each may independently be a C1 to C20 alkyl group substituted with halogen.

[0026] Chemical Formula 1 can be represented by Chemical Formula 1-1.

[0027] [Chemical formula 1-1]

[0028]

[0029] In Chemical Formula 1-1,

[0030] R 1 and R 2 are each independently a substituted or unsubstituted C1 to C20 alkyl group,

[0031] R 3 To R 6 are each independently a hydrogen atom, a halogen, a cyano group, an ester group (*-C(=O)OR', wherein R' is a substituted or unsubstituted C1 to C15 alkyl group) or an amide group (*-C(=O)NR"R"', wherein R" and R"' are each independently a hydrogen atom or a substituted or unsubstituted C1 to C15 alkyl group),

[0032] R 7 To R 14 are each independently hydroxy, substituted or unsubstituted C1 to C20 alkyl, substituted or unsubstituted C3 to C20 cycloalkyl, substituted or unsubstituted C1 to C20 alkoxy, substituted or unsubstituted C6 to C20 aryl, or substituted or unsubstituted C2 to C20 heterocycloalkyl, and

[0033] M is Zn, Ag, Ti, Pt, Co, Fe, Ni or Pd.

[0034] In Chemical Formula 1, R 3 To R 6They may each independently be halogen, cyano, ester (*—C(═O)OR′, wherein R′ is a substituted or unsubstituted C1 to C15 alkyl) or amide (*—C(═O)NR”R”′, wherein R” and R′” each independently are a hydrogen atom or a substituted or unsubstituted C1 to C15 alkyl).

[0035] In Chemical Formula 1, R 3 To R 6 Each may independently be a halogen.

[0036] In Chemical Formula 1, R 7 To R 14 Each independently may be a substituted or unsubstituted C1 to C20 alkyl group.

[0037] The compound may be represented by any one selected from Chemical Formula 1-1-1 to Chemical Formula 1-1-3.

[0038] [Chemical formula 1-1-1]

[0039]

[0040] [Chemical formula 1-1-2]

[0041]

[0042] [Chemical formula 1-1-3]

[0043]

[0044] The compound represented by Chemical Formula 1 may exhibit an absorption wavelength at 400 nm to 520 nm, and may have a maximum absorption wavelength at 480 nm to 520 nm of the absorption wavelength.

[0045] The compound may be a dye.

[0046] Another embodiment provides a composition including the compound represented by Chemical Formula 1.

[0047] Another embodiment provides an anti-reflection film including the compound represented by Chemical Formula 1.

[0048] The anti-reflection film includes an adhesive layer and an anti-reflection layer on the adhesive layer, and the compound represented by Chemical Formula 1 may be included in the adhesive layer.

[0049] The anti-reflection film includes an adhesive layer, a dye-containing layer, and an anti-reflection layer on the dye-containing layer, and the compound represented by Chemical Formula 1 may be included in the dye-containing layer.

[0050] Another embodiment provides a display device, comprising the anti-reflection film.

[0051] The display device may further include a quantum dot-containing layer.

[0052] The display device may further include a light source, a color filter, and a substrate.

[0053] In the display device, the quantum dot-containing layer may be disposed on the light source, the color filter may be disposed on the quantum dot-containing layer, the substrate may be disposed on the color filter, and the anti-reflection film may be disposed on the substrate.

[0054] The light source may be a white light source or a blue light source.

[0055] The substrate may include a glass substrate.

[0056] Other embodiments of the invention are included in the detailed description that follows.

[0057] By using a compound that has absorption in the blue long wavelength region and the green short wavelength region (400nm to 520nm) and has a maximum absorption wavelength of 480nm to 520nm, and more specifically 490nm to 510nm, solubility can be improved, fluorescence is absent, and light resistance reliability can be improved by reducing the reflectivity of the display device to external light, and brightness loss and color reproducibility can also be improved. BRIEF DESCRIPTION OF THE DRAWINGS

[0058] Figure 1 and Figure 2 are schematic diagrams each independently illustrating an antireflection film according to an embodiment.

[0059] Figure 3 and Figure 4 are schematic diagrams each independently illustrating a display device according to an embodiment.

[0060] Figure 5 It is a graph showing the change in absorbance of the compounds according to Synthesis Example 1, Comparative Synthesis Example 2 and Comparative Synthesis Example 3 depending on the wavelength.

[0061] [Explanation of Symbols]

[0062] 10: Blue light source

[0063] 20: Quantum dot layer

[0064] 30: Color Filters

[0065] 40: Substrate

[0066] 50: Adhesive layer

[0067] 60: Dye layer

[0068] 70: Anti-reflective layer

[0069] 80: Anti-reflective film

[0070] 100: Display device DETAILED DESCRIPTION

[0071] Embodiments of the present invention are described in detail below. However, these embodiments are exemplary, the present invention is not limited thereto, and the present invention is defined by the scope of the claims.

[0072] As used herein, when a specific definition is not otherwise provided, “alkyl” refers to a C1 to C20 alkyl group, “alkenyl” refers to a C2 to C20 alkenyl group, “cycloalkenyl” refers to a C3 to C20 cycloalkenyl group, “heterocycloalkenyl” refers to a C3 to C20 heterocycloalkenyl group, “aryl” refers to a C6 to C20 aryl group, “arylalkyl” refers to a C6 to C20 arylalkyl group, “alkylene” refers to a C1 to C20 alkylene group, “arylene” refers to a C6 to C20 arylene group, “alkylarylene” refers to a C6 to C20 alkylarylene group, “heteroarylene” refers to a C3 to C20 heteroarylene group, and “alkoxy” refers to a C1 to C20 alkoxy group.

[0073] As used herein, when a specific definition is not otherwise provided, “substituted” means that at least one hydrogen is replaced by a halogen atom (F, Cl, Br, I), a hydroxyl group, a C1 to C20 alkoxy group, a nitro group, a cyano group, an amino group, an imino group, an azido group, an amidino group, a hydrazine group, a hydrazone group, a carbonyl group, a carbamoyl group, a thiol group, an ester group, an ether group, a carboxyl group or a salt thereof, a sulfonic acid group or a salt thereof, a phosphoric acid or a salt thereof, a C1 to C20 alkyl group, a C2 to C20 alkenyl group, a C2 to C20 alkynyl group, a C6 to C20 aryl group, a C3 to C20 cycloalkyl group, a C3 to C20 cycloalkenyl group, a C3 to C20 cycloalkynyl group, a C2 to C20 heterocycloalkyl group, a C2 to C20 heterocycloalkenyl group, a C2 to C20 heterocycloalkynyl group, a C3 to C20 heteroaryl group, or a combination thereof.

[0074] As used herein, when a specific definition is not otherwise provided, "hetero" means including at least one hetero atom of N, O, S or P in a chemical formula.

[0075] As used herein, when a specific definition is not otherwise provided, “(meth)acrylate” refers to both “acrylate” and “methacrylate”, and “(meth)acrylic acid” refers to both “acrylic acid” and “methacrylic acid”.

[0076] As used herein, when a specific definition is not otherwise provided, the term "combination" means mixing or copolymerization.

[0077] As used herein, unless a specific definition is otherwise provided, when a chemical bond is not drawn where it should be given, a hydrogen atom is bonded to the indicated position.

[0078] When describing a numerical range in the present specification, “X to Y” means “greater than or equal to X and less than or equal to Y” (X≤ and ≤Y).

[0079] In descriptions other than numerical ranges in this specification, “X to Y” means “from X to Y”.

[0080] In this specification, the "maximum absorption wavelength (λ max )" refers to the wavelength at which the maximum absorbance occurs when the absorbance of a solution of a compound (dye) in cyclohexanone at a concentration of 10 parts per million (10 ppm) is measured. The maximum absorbance can be measured according to methods known to those skilled in the art.

[0081] The "light resistance reliability" used in this article is evaluated by the change in transmittance. The transmittance of the display device is measured in a xenon test chamber (Q-SUN) [light source: xenon lamp, irradiation intensity: 0.35 W / cm2 (W / cm 2 ), irradiation temperature: 63° C., irradiation time: 500 hours, and irradiation direction: irradiation from the antireflection film side] before and after irradiation at the maximum absorption wavelength of the dye.

[0082] In addition, as used herein, unless a specific definition is otherwise provided, "*" means moieties that are connected to the same or different atoms or chemical formulas.

[0083] According to an embodiment, a compound represented by Chemical Formula 1 is provided.

[0084] [Chemical formula 1]

[0085]

[0086] In Chemical Formula 1,

[0087] R 1 and R 2 are each independently a substituted or unsubstituted C1 to C20 alkyl group,

[0088] R 3 To R 6 are each independently a hydrogen atom, a halogen, a cyano group, an ester group (*-C(=O)OR', wherein R' is a substituted or unsubstituted C1 to C15 alkyl group) or an amide group (*-C(=O)NR"R"', wherein R" and R"' are each independently a hydrogen atom or a substituted or unsubstituted C1 to C15 alkyl group),

[0089] R 7 To R 14each independently represents hydroxy, substituted or unsubstituted C1 to C20 alkyl, substituted or unsubstituted C3 to C20 cycloalkyl, substituted or unsubstituted C1 to C20 alkoxy, substituted or unsubstituted C6 to C20 aryl, or substituted or unsubstituted C2 to C20 heterocycloalkyl,

[0090] M is Zn, Ag, Ti, Pt, Co, Fe, Ni or Pd, and

[0091] n1 and n2 are each independently an integer of 1 to 5.

[0092] Traditionally, although attempts have been made to improve the color purity of display devices by using specific compounds to absorb fluorescent colors to block specific wavelength regions of light sources, display devices including quantum dots have different purposes due to the use of scatterers. Display devices containing quantum dots can reduce reflectivity to improve the reflection of external light caused by scatterers, which helps to improve the black visibility of the device. In order to reduce reflectivity and minimize the reduction of the RGB color purity of the panel, it is effective to use an anti-reflection film that can absorb dyes of mixed colors (purple / cyan / fluorescent color / near infrared color (infrared ray, IR)). Specifically, absorbing external light of cyan with an absorption wavelength range of 480nm to 520nm and fluorescent color with an absorption wavelength range of 530nm to 670nm is effective in reducing reflectivity. However, in the case of using only dyes that absorb only cyan and fluorescent colors, it is difficult to implement neutral black in a display device. Therefore, purple with an absorption wavelength range of 350nm to 450nm and near infrared (red) color with an absorption wavelength range of 605nm to 790nm are used. By using a mixture of absorbing dyes, it is possible to achieve color correction of anti-reflection films and display devices. By using dyes that can absorb mixed colors (purple / cyan / fluorescent colors / near-infrared colors), reflectivity can be reduced, black visibility can be improved, and color reproducibility can be increased. In addition, the compound represented by Chemical Formula 1 can improve light resistance reliability, which is one of the shortcomings of traditional compounds (dyes) that absorb a specific wavelength range. That is, when the compound represented by Chemical Formula 1 according to the embodiment is applied to an anti-reflection film, the light resistance reliability of the film can be ensured. Specifically, in a display device using a quantum dot emitter, attempts to improve color reproducibility by absorbing mixed colors using specific compounds have not been known until now. For example, in the case of cyan, the absorption wavelength range is 480nm to 520nm, in the case of fluorescent colors, the absorption wavelength range is 530nm to 670nm, and in the case of near-infrared colors, the absorption wavelength range is 605nm to 790nm. However, since the compound represented by Chemical Formula 1 according to the embodiment exhibits an absorption wavelength at 400 nm to 520 nm, and may have a maximum absorption wavelength at 480 nm to 520 nm, specifically 490 nm to 520 nm, and more specifically 490 nm to 515 nm, and even more specifically 500 nm to 510 nm of the absorption wavelength, in the case of an anti-reflection film and a display device including the compound represented by Chemical Formula 1 as a dye, light resistance reliability may be easily ensured while minimizing degradation of blue brightness.

[0093] As will be described later, when considering the spectrum of the light source applied to the display device, it is necessary to effectively absorb the blue long wavelength region and the green short wavelength region (480nm to 520nm) of the light source so that the color reproducibility of the panel can be effectively improved. For example, when the maximum absorption wavelength of the compound applied to the anti-reflection film is shorter than 500nm or longer than 520nm and the full width at half maximum (FWHM) is wider than 100nm, and specifically wider than 50nm, the blue long wavelength region and the green short wavelength region cannot be effectively absorbed, so it is difficult to achieve the effect of improving the color reproducibility of the panel. Therefore, when the maximum absorption wavelength of the compound applied to the anti-reflection film appears between 480nm and 520nm, specifically between 490nm and 520nm, the blue long wavelength region and the green short wavelength region can be effectively absorbed. The compound represented by Chemical Formula 1 according to the embodiment has a maximum absorption wavelength at 480 nm to 520 nm, and more specifically, at 490 nm to 510 nm due to its structural specificity, and thus can effectively absorb the blue long wavelength region and the green short wavelength region, and can ensure light resistance reliability, and can effectively improve the color reproducibility of the panel.

[0094] In Chemical Formula 1, M is Zn, Ag, Ti, Pt, Co, Fe, Ni or Pd, and for example, M does not include a metal such as Cu. In Chemical Formula 1, when M is Cu, it is not preferred because the half-width is wide and it is difficult to control the spectral uniformity.

[0095] In Chemical Formula 1, R 1 and R 2 may be each independently a C1 to C20 alkyl group substituted with a halogen (fluoro, chloro, bromo or iodo). 1 and R 2 Each of R and R is independently a C1 to C20 alkyl group substituted with a fluorine group (eg, a trifluoro group). 1 and R 2 When the alkyl group is substituted with an electron withdrawing group (EWG) (eg, a fluorine group), it is easy to control the spectral consistency.

[0096] For example, Chemical Formula 1 may be represented by Chemical Formula 1-1, but is not necessarily limited thereto.

[0097] [Chemical formula 1-1]

[0098]

[0099] In Chemical Formula 1-1,

[0100] R1 and R 2 are each independently a substituted or unsubstituted C1 to C20 alkyl group,

[0101] R 3 To R 6 are each independently a hydrogen atom, a halogen, a cyano group, an ester group (*-C(=O)OR', wherein R' is a substituted or unsubstituted C1 to C15 alkyl group) or an amide group (*-C(=O)NR"R"', wherein R" and R"' are each independently a hydrogen atom or a substituted or unsubstituted C1 to C15 alkyl group),

[0102] R 7 To R 14 are each independently hydroxy, substituted or unsubstituted C1 to C20 alkyl, substituted or unsubstituted C3 to C20 cycloalkyl, substituted or unsubstituted C1 to C20 alkoxy, substituted or unsubstituted C6 to C20 aryl, or substituted or unsubstituted C2 to C20 heterocycloalkyl, and

[0103] M is Zn, Ag, Ti, Pt, Co, Fe, Ni or Pd.

[0104] On the other hand, by 1 and R 2 By limiting the type of compound, the spectral consistency of the compound can be easily controlled, and ultimately, the light transmittance of the display product can be controlled to improve color purity.

[0105] For example, in Chemical Formula 1, R 3 To R 6 They may each independently be halogen, cyano, ester group (*—C(═O)OR′, wherein R′ is a substituted or unsubstituted C1 to C15 alkyl group) or amide group (*—C(═O)NR”R”′, wherein R” and R′” each independently are a hydrogen atom or a substituted or unsubstituted C1 to C15 alkyl group).

[0106] In chemical formula 1, when R 3 To R 6 When it is not necessarily the above-mentioned substituent, it is difficult to ensure excellent solubility and light resistance reliability. Specifically, in the case of a display containing quantum dots, excellent solubility and light resistance reliability can be ensured only when an anti-reflection film containing the compound represented by Chemical Formula 1 is applied. Even if it is a compound for an anti-reflection film showing excellent light resistance in a conventional LCD, when it is applied to a display containing quantum dots as it is, the light resistance may be deteriorated.

[0107] For example, in Chemical Formula 1, R 3 To R 6can be halogen independently. 3 To R 6 When all are halogen, 3 To R 6 Compared with when any one or more of them are not halogens, the maximum absorption wavelength is slightly shifted to a longer wavelength and the half-width becomes slightly wider, but the light resistance reliability itself can be greatly improved.

[0108] For example, in Chemical Formula 1, R 7 To R 14 Each independently may be a substituted or unsubstituted C1 to C20 alkyl group.

[0109] For example, Chemical Formula 1 may be represented by any one selected from Chemical Formula 1-1-1 to Chemical Formula 1-1-3, but is not necessarily limited thereto.

[0110] [Chemical formula 1-1-1]

[0111]

[0112] [Chemical formula 1-1-2]

[0113]

[0114] [Chemical formula 1-1-3]

[0115]

[0116] The compound represented by Chemical Formula 1 may exhibit an absorption wavelength at 400 nm to 520 nm, and may have a maximum absorption wavelength at 480 nm to 520 nm, specifically 490 nm to 520 nm, and more specifically 490 nm to 515 nm among the absorption wavelengths. As described above, when the compound represented by Chemical Formula 1 has a maximum absorption wavelength in the above range, it can effectively absorb a blue long wavelength region and a green short wavelength region, thereby effectively improving light resistance reliability and color reproducibility of a panel.

[0117] For example, the compound represented by Chemical Formula 1 may be a dye.

[0118] Another embodiment provides a composition comprising the compound.

[0119] Another embodiment provides an anti-reflection film including the compound.

[0120] The anti-reflection film may include 0.01 wt % to 0.5 wt % of the compound represented by Chemical Formula 1 in terms of solid content. When the compound represented by Chemical Formula 1 is included within the range, neutral black is effectively improved by adjusting panel color of a display device to which the anti-reflection film is applied.

[0121] The anti-reflection film includes an adhesive layer and an anti-reflection layer formed on the adhesive layer, and the compound represented by Chemical Formula 1 may be included in the adhesive layer.

[0122] In addition, the anti-reflection film includes an adhesive layer, a dye-containing layer, and an anti-reflection layer formed on the dye-containing layer, and the compound represented by Chemical Formula 1 may be included in the dye-containing layer.

[0123] That is, in the stacked structure of the anti-reflection film according to the embodiment, the compound represented by Chemical Formula 1 may be included in the adhesive layer, or may be included in a separate dye-containing layer. (See Figure 1 and Figure 2 )

[0124] The anti-reflection layer may consist of only the low-refractive layer, or may include the low-refractive layer.

[0125] The low-refractive layer may reduce the reflectivity of the anti-reflective film due to a difference in refractive index between the substrate and / or a high-refractive layer described later.

[0126] The low refractive layer may include a curable binder resin, a fluorine-containing monomer, and fine particles (eg, hollow silica) having an average particle diameter of 5 nm to 300 nm, and may have a thickness of 0.01 μm to 0.15 μm. The refractive index of the low refractive layer may be 1.20 to 1.40.

[0127] By further forming a functional coating on one surface of the low refractive layer (i.e., on the upper surface of the low refractive layer), additional functions can be imparted to the anti-reflective film. The functional coating may include an anti-fingerprint layer, an antistatic layer, a hard coating, an anti-glare layer, a barrier layer, etc., but is not limited thereto.

[0128] The anti-reflection layer may further include a high refractive layer.

[0129] The high refractive layer is formed between the substrate and the low refractive layer described later, and has a refractive index between the substrate and the low refractive layer, thereby reducing the reflectivity of the anti-reflection layer. The high refractive layer is directly formed with the substrate and the low refractive layer respectively. "Directly formed" means that there is no other layer between the layers.

[0130] The high refractive layer has a thickness of 0.05 μm to 20 μm, a refractive index of 1.45 to 2, and a haze value specified in JIS-K7361 that is not different from the haze value of the base material or that differs from the haze value of the substrate by 10% or less, and has excellent transparency and excellent anti-reflection properties.

[0131] The hard coating layer increases the hardness of the anti-reflection layer so that even if the anti-reflection layer is used on the outermost surface of the display device, scratches will not be generated. The hard coating layer is not necessarily provided. If the target hardness is ensured in the high refractive layer or the low refractive layer, the hard coating layer can be omitted.

[0132] The hard coating layer may be formed between the substrate and the high-refractive layer or between the substrate and the low-refractive layer.

[0133] The hard coating layer may be a solidified layer formed by uniformly mixing ultrafine metal oxide particles having an average particle diameter of 1 nm to 30 nm and a particle size distribution range of less than or equal to ±5 nm in a solidified binder. The hard coating layer may have a thickness of 1 μm to 15 μm, and a refractive index of the hard coating layer may be greater than or equal to 1.54.

[0134] The anti-reflection layer may have a thickness of 50 μm to 500 μm, for example, 50 μm to 300 μm, for example, 50 μm to 150 μm. When the thickness of the anti-reflection layer is within the above range, it can be easily applied to a display device.

[0135] The adhesive layer may be formed on the lower surface of the anti-reflection layer to adhere an optical member such as a display to a panel or the like. As described above, the adhesive layer may include the compound represented by Chemical Formula 1 (dye).

[0136] The adhesive layer may have a glass transition temperature of -70° C. to 0° C., for example, -65° C. to -20° C. When the glass transition temperature of the adhesive layer is within the above range, adhesion to the panel may be improved.

[0137] The adhesive layer may be a thermosetting adhesive layer or a photocurable adhesive layer. Preferably, since the adhesive layer becomes a thermosetting adhesive layer, it is not necessary to consider the influence of ultraviolet rays caused by the absorption wavelength of the compound (dye) represented by Chemical Formula 1, which is conducive to manufacturing the adhesive layer. The "thermosetting adhesive layer" may include not only an adhesive layer cured by a predetermined heat treatment at 40°C to 100°C, but also an adhesive layer cured at room temperature (e.g., 20°C to 30°C).

[0138] The adhesive layer may be formed of a composition for an adhesive layer including an adhesive resin and a curing agent.

[0139] The type of the adhesive resin is not limited as long as it can ensure the glass transition temperature of the adhesive layer. For example, the adhesive resin may be a silicone resin, a urethane resin, a (meth) acrylic resin or the like, but preferably, a (meth) acrylic adhesive resin may be used.

[0140] The adhesive resin may have a glass transition temperature of -70° C. to 0° C., desirably -65° C. to -20° C. When the glass transition temperature of the adhesive resin has the above range, adhesion to the panel may be improved.

[0141] The weight average molecular weight of the adhesive resin may be 500,000 g / mol to 2,000,000 g / mol, for example, 800,000 g / mol to 1,500,000 g / mol. When the weight average molecular weight of the adhesive resin has the above range, adhesion to the panel may be improved.

[0142] The adhesive resin may include a copolymer, preferably a random copolymer including at least one of the following: a (meth)acrylic monomer having an alkyl group; a (meth)acrylic monomer having a hydroxyl group; and a (meth)acrylic monomer having an aromatic group, a (meth)acrylic monomer having an alicyclic group, and a (meth)acrylic monomer having a heteroalicyclic group.

[0143] The (meth)acrylic monomer having an alkyl group may include a (meth)acrylic ester having an unsubstituted C1 to C10 alkyl group. Specifically, the (meth)acrylic monomer having an alkyl group may include one or more of methyl (meth)acrylate, ethyl (meth)acrylate, propyl (meth)acrylate, n-butyl (meth)acrylate, tert-butyl (meth)acrylate, isobutyl (meth)acrylate, pentyl (meth)acrylate, hexyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, heptyl (meth)acrylate, octyl (meth)acrylate, isooctyl (meth)acrylate, nonyl (meth)acrylate, and decyl (meth)acrylate, but is not limited thereto. These monomers may be included alone or in combination of two or more. The content of the (meth)acrylic monomer having an alkyl group may be 60% to 99.99% by weight of the monomer mixture, such as 60% to 90% by weight, such as 80% to 99.9% by weight.

[0144] The (meth) acrylic monomer having a hydroxyl group may include one or more of the following: a (meth) acrylic monomer having a C1 to C20 alkyl group having at least one hydroxyl group, a (meth) acrylic monomer having a C3 to C20 cycloalkyl group having at least one hydroxyl group, and a (meth) acrylic monomer having a C6 to C20 aromatic group having at least one hydroxyl group. Specifically, the (meth) acrylic monomer having a hydroxyl group may desirably include a (meth) acrylic monomer having a C1 to C20 alkyl group having at least one hydroxyl group, one or more of the following: 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, 2-hydroxybutyl (meth) acrylate, 4-hydroxybutyl (meth) acrylate, 6-hydroxyhexyl (meth) acrylate, 1-chloro-2-hydroxypropyl (meth) acrylate. These monomers may be included alone or in a combination of two or more. The content of the (meth) acrylic monomer having a hydroxyl group may be 0.01 wt % to 20 wt %, for example 0.1 wt % to 10 wt %, of the monomer mixture.

[0145] The (meth)acrylic monomer having an aromatic group may include a (meth)acrylic ester having a C6 to C20 aryl group or a C7 to C20 aryl alkyl group. Specifically, the (meth)acrylic monomer having an aromatic group may include, but is not limited to, phenyl (meth)acrylate, benzyl (meth)acrylate, and the like. The content of the (meth)acrylic monomer having an aromatic group may be 0 wt % to 50 wt %, for example 0 wt % to 20 wt %, of the monomer mixture.

[0146] In the present specification, when an alicyclic group and an alkyl group are mixed in a monomer, it is classified as a (meth)acrylic monomer having an alicyclic group.

[0147] The (meth)acrylic monomer having an alicyclic group may be a (meth)acrylic ester having a C5 to C20 monocyclic or heterocyclic alicyclic group, and may include at least one of cyclohexyl (meth)acrylate, isobornyl (meth)acrylate, dicyclopentyl (meth)acrylate, methylcyclohexyl (meth)acrylate, and dicyclopentenyl (meth)acrylate. The content of the (meth)acrylic monomer having an alicyclic group may be 0 to 50% by weight, such as 1 to 30% by weight, or 1 to 20% by weight of the monomer mixture.

[0148] The (meth)acrylic monomer having a heteroalicyclic group may include a (meth)acrylic ester having a C4 to C9 heteroalicyclic group, wherein the C4 to C9 heteroalicyclic group includes at least one of nitrogen, oxygen or sulfur. Specifically, the (meth)acrylic monomer having a heteroalicyclic group may include (meth)acryloylmorpholine, but is not limited thereto. The (meth)acrylic monomer having a heteroalicyclic group may be present in an amount of 0 wt % to 50 wt %, such as 0 wt % to 10 wt %, of the monomer mixture.

[0149] The adhesive resin may include a (meth) acrylic copolymer of a monomer mixture including 70 wt % to 99.99 wt %, such as 90 wt % to 99.5 wt % of a (meth) acrylic monomer having an alkyl group, and 0.01 wt % to 30 wt %, such as 0.5 wt % to 10 wt % of a (meth) acrylic monomer having a hydroxyl group. When each monomer constituting the adhesive resin has the above range, adhesive strength can be easily ensured.

[0150] The curing agent may include an isocyanate curing agent. The content of the curing agent may be 0.01 to 20 parts by weight, such as 0.01 to 10 parts by weight, such as 0.1 to 4 parts by weight, based on 100 parts by weight of the adhesive resin. When the curing agent has the above range, the composition can be cross-linked to form an adhesive layer, and the transparency and reliability are prevented from being reduced due to excessive use thereof.

[0151] The composition may further include conventional additives such as a silane coupling agent, an antioxidant, a tackifying resin, a plasticizer, an antistatic agent, a rework agent, and a curing catalyst. The content of the silane coupling agent may be 0.01 to 20 parts by weight, such as 0.01 to 10 parts by weight, such as 0.1 to 4 parts by weight, based on 100 parts by weight of the adhesive resin. When the silane coupling agent has the above range, adhesion can be controlled and reliability defects can be prevented.

[0152] The composition for the adhesive layer may be a solvent-free type, or may further include a conventional organic solvent to enhance coating properties.

[0153] The adhesive layer may have a thickness of 1 μm to 50 μm, for example, 5 μm to 25 μm. When the thickness of the adhesive layer is within the above range, it can be easily used in a display device.

[0154] According to another embodiment, a display device including an anti-reflection film is provided. For example, a display device including an anti-reflection film and a quantum dot layer may be provided.

[0155] For example, the display device may further include a light source, a color filter, and a substrate.

[0156] For example, the display device may have a stacked structure in which a quantum dot-containing layer may be disposed on a light source, a color filter may be disposed on the quantum dot-containing layer, a substrate may be disposed on the color filter, and an anti-reflection film may be disposed on the substrate. (See Figure 3 and Figure 4 )

[0157] For example, the light source may be a blue light source.

[0158] For example, the substrate may be a glass substrate.

[0159] Generally, when the light source is shifted or extended to a short wavelength, it is known that absorbance and fluorescence increase, and therefore, in order to increase the fluorescence efficiency of quantum dots, a method of shifting or extending the light source in a short wavelength is used. However, when a blue light source is used, color reproducibility may deteriorate, and in particular, a blue organic light emitting diode (OLED) light source has difficulties in shifting and the like.

[0160] However, the display device according to the embodiment uses the compound represented by Chemical Formula 1 to increase the light source in the blue region, and thus enhances the light having a wavelength absorbed by the quantum dot, and therefore, it can be expected to have an effect of increasing the luminous efficiency of the quantum dot. In addition, by absorbing (cutting) the light in the short wavelength region of the blue light source to improve the color reproducibility of the panel, the light source applied to the panel does not need to be changed, and in addition, the amount of quantum dots included in the display device can be reduced, and thus it has price competitiveness.

[0161] In addition, the display device according to the embodiment may maximize the increase in efficiency of quantum dots due to the anti-reflection film including the compound represented by Chemical Formula 1 by specifying the anti-reflection film including the compound represented by Chemical Formula 1 on the glass substrate.

[0162] The components constituting the quantum dot-containing layer may further include a binder resin, a reactive unsaturated compound, a photopolymerization initiator, a diffusing agent, and other additives in addition to the quantum dots, which will be described later.

[0163] The quantum dots may have a maximum fluorescence emission wavelength (fluorescence λ) in the range of 400 nm to 500 nm in the wavelength range of 350 nm to 550 nm. max ).

[0164] The quantum dot may have a half-width (FWHM) in the range of 20 nm to 100 nm, for example, 20 nm to 50 nm. When the quantum dot has a half-width (FWHM) in the range, the quantum dot has high color purity and thus has an effect of increasing color reproducibility when used as a color material in a color filter.

[0165] Quantum dots can be organic materials, inorganic materials, or a mixture of organic and inorganic materials.

[0166] The quantum dots may each independently include a core and a shell surrounding the core, and herein, the core and the shell may have, for example, a core, a core / shell, a core / first shell / second shell, an alloy, an alloy / shell and the like structures each independently comprising groups II-IV, III-V and the like, but are not limited thereto.

[0167] For example, the core may include at least one material selected from CdS, CdSe, CdTe, ZnS, ZnSe, ZnTe, HgS, HgSe, HgTe, GaN, GaP, GaAs, InP, InAs and alloys thereof, but is not necessarily limited thereto. The shell surrounding the core may include at least one material selected from CdSe, ZnSe, ZnS, ZnTe, CdTe, PbS, TiO, SrSe, HgSe and alloys thereof, but is not necessarily limited thereto.

[0168] In an embodiment, since the world's concern for the environment has greatly increased recently and regulations on toxic materials have also been strengthened, cadmium-free luminescent materials (InP / ZnS) with slightly lower quantum efficiency (quantum yield) but harmless to the environment are used to replace luminescent materials with cadmium-based cores, but are not necessarily limited to this.

[0169] The quantum dot having a core / shell structure may have an entire size (average particle diameter) including a shell of 1 nm to 15 nm, for example, 5 nm to 15 nm, but the structure thereof is not particularly limited.

[0170] For example, the quantum dots may be red quantum dots, green quantum dots, or a combination thereof. For example, the quantum dots may include both green quantum dots and red quantum dots. In this case, the content of green quantum dots may be greater than the content of red quantum dots. The red quantum dots may have an average particle diameter of 10 nm to 15 nm. The green quantum dots may have an average particle diameter of 5 nm to 8 nm.

[0171] At the same time, for the dispersion stability of quantum dots, a dispersant can be used together. Dispersants can help light conversion materials (e.g., quantum dots) to be uniformly dispersed in curable compositions, and include nonionic dispersants, anionic dispersants, or cationic dispersants. Specifically, the dispersant may include polyalkylene glycol or its ester, polyoxyalkylene, polyol ester alkylene oxide addition product, alcohol alkylene oxide addition product, sulfonic acid ester, sulfonate, carboxylate, carboxylate, alkylamide alkylene oxide addition product, alkylamine. The dispersant can be used alone or in the form of a mixture of two or more. Based on the solid content of light conversion materials (e.g., quantum dots), the dispersant can be used in an amount of 0.1% by weight to 100% by weight, such as 10% by weight to 20% by weight.

[0172] The content of quantum dots may be 1 to 40 parts by weight, for example 1 to 10 parts by weight, based on 100 parts by weight of the components constituting the quantum dot layer. When the quantum dots are included within the above range, the light conversion efficiency is improved, and the pattern characteristics and development characteristics are not damaged, so that excellent processability can be obtained.

[0173] The binder resin may include acrylic resin, epoxy resin, or a combination thereof.

[0174] The acrylic resin is a copolymer of a first ethylenically unsaturated monomer and a second ethylenically unsaturated monomer copolymerizable therewith, and is a resin including at least one acrylic acid repeating unit.

[0175] The first ethylenically unsaturated monomer is an ethylenically unsaturated monomer comprising at least one carboxyl group. Examples of the monomer include acrylic acid, methacrylic acid, maleic acid, itaconic acid, fumaric acid, or a combination thereof.

[0176] The first ethylenically unsaturated monomer may be included in an amount of 5 to 50 wt %, for example 10 to 40 wt %, based on the total amount of the acrylic resin.

[0177] The second ethylenically unsaturated monomer may be: an aromatic vinyl compound such as styrene, α-methylstyrene, vinyltoluene, vinylbenzyl methyl ether and the like; an unsaturated carboxylic acid ester compound such as methyl (meth)acrylate, ethyl (meth)acrylate, butyl (meth)acrylate, 2-hydroxyethyl (meth)acrylate, 2-hydroxybutyl (meth)acrylate, benzyl (meth)acrylate, cyclohexyl (meth)acrylate, phenyl (meth)acrylate and the like; an unsaturated carboxylic acid aminoalkyl ester compound such as 2-aminoethyl (meth)acrylate, 2-dimethylaminoethyl (meth)acrylate and the like; a carboxylic acid vinyl ester compound such as vinyl acetate, vinyl benzoate and the like; an unsaturated carboxylic acid glycidyl ester compound such as glycidyl (meth)acrylate and the like; a vinyl cyanide compound such as (meth)acrylonitrile and the like; an unsaturated amide compound such as (meth)acrylamide and the like; and the like. These compounds may be used alone or in the form of a mixture of two or more.

[0178] Specific examples of the acrylic resin may be polybenzyl methacrylate, (meth)acrylic acid / benzyl methacrylate copolymer, (meth)acrylic acid / benzyl methacrylate / styrene copolymer, (meth)acrylic acid / benzyl methacrylate / 2-hydroxyethyl methacrylate copolymer, (meth)acrylic acid / benzyl methacrylate / styrene / 2-hydroxyethyl methacrylate copolymer, and the like, but are not limited thereto. These acrylic resins may be used alone or in the form of a mixture of two or more thereof.

[0179] The acrylic resin may have a weight average molecular weight of about 1,000 to about 15,000 g / mol. When the weight average molecular weight of the acrylic resin is within the range, close contact properties with a substrate and physical and chemical formation are improved, and viscosity is appropriate.

[0180] The epoxy resin may be a thermally polymerizable monomer or oligomer, and may include a compound having a carbon-carbon unsaturated bond and a carbon-carbon cyclic bond.

[0181] The epoxy resin may further include bisphenol A epoxy resin, bisphenol F epoxy resin, phenol novolac epoxy resin, cyclic aliphatic epoxy resin and aliphatic polyglycidyl ether, but is not necessarily limited thereto.

[0182] Commercially available products of the compound may be YX4000, YX4000H, YL6121H, YL6640 or YL6677 of Yuka Shell Epoxy Co., Ltd.; EOCN-102, EOCN-103S, EOCN-104S, EOCN-1020, EOCN-1025 or EOCN-1027 of Nippon Kayaku Co., Ltd.; and epoxy resin (EPIKOTE) 180S75 of Yuka Shell Epoxy Co., Ltd.; bisphenol A epoxy resin, such as EPIKOTE 1001, 1002, 1003, 1004, 1007, 1009, 1010 and 828 of Yuka Shell Epoxy Co., Ltd.; bisphenol F epoxy resin, such as EPIKOTE 1010 of Yuka Shell Epoxy Co., Ltd. 807 and 834; phenolic epoxy resins, such as EPIKOTE 152, 154 or 157H65 of Uka Shell Epoxy Co., Ltd., and EPPN 201, 202 of Nippon Kayaku Co., Ltd.; cycloaliphatic epoxy resins, such as CY175, CY177 and CY179 of CIBA-GEIGY AG Corp., ERL-4234, ERL-4299, ERL-4221 and ERL-4206 of Union Carbide Corporation (UCC), Showdyne 509 of Showa Denko K.K., Araldite CY-182 of Ciba-Geigy, Dainippon Ink & Chemicals Co., Ltd. Inc.), EPICLON 200 and 400, EPIKOTE 871, 872 of Uka Shell Epoxy Company, and EP1032H60, ED-5661 and ED-5662 of Celanese Coating Corporation; the aliphatic polyglycidyl ether may be EPIKOTE 190P and 191P of Uka Shell Epoxy Company, EPOLITE 100MF of Kyoeisha Yushi Kagaku Kogyo Co., Ltd., EPIOL TMP of Nihon Yushi KK, and the like.

[0183] The binder resin may be included in an amount of 1 to 40 parts by weight, for example 5 to 20 parts by weight, based on 100 parts by weight of the components constituting the quantum dot layer. When the binder resin is included within the above range, excellent sensitivity, developability, resolution, and linearity of a pattern may be obtained.

[0184] The reactive unsaturated compound can be used by mixing a monomer or an oligomer generally used in a conventional photocurable composition and a thermosetting composition.

[0185] The reactive unsaturated compound may be an acrylate compound, for example, at least one of ethylene glycol diacrylate, triethylene glycol diacrylate, 1,4-butanediol diacrylate, 1,6-hexanediol diacrylate, neopentyl glycol diacrylate, pentaerythritol diacrylate, pentaerythritol triacrylate, dipentaerythritol diacrylate, dipentaerythritol triacrylate, dipentaerythritol pentaacrylate, pentaerythritol hexaacrylate, bisphenol A diacrylate, trimethylolpropane triacrylate, novolac epoxy acrylate, ethylene glycol dimethacrylate, diethylene glycol dimethacrylate, triethylene glycol dimethacrylate, propylene glycol dimethacrylate, 1,4-butanediol dimethacrylate, and 1,6-hexanediol dimethacrylate, or a mixture thereof.

[0186] The reactive unsaturated compound may be treated with anhydride to improve developability.

[0187] The content of the reactive unsaturated compound may be 1 to 10 parts by weight, for example 1 to 5 parts by weight, based on 100 parts by weight of the components constituting the quantum dot layer. When the reactive unsaturated compound is included within the above range, curing occurs sufficiently during exposure in a pattern forming process, resulting in excellent reliability, heat resistance, light resistance, chemical resistance, resolution, and close contact properties of the pattern.

[0188] The photopolymerization initiator may be an acetophenone-based compound, a benzophenone-based compound, a thioxanthone-based compound, a benzoin-based compound, an oxime-based compound, and the like.

[0189] Examples of the acetophenone-based compounds may be 2,2'-diethoxyacetophenone, 2,2'-dibutoxyacetophenone, 2-hydroxy-2-methylpropiophenone, p-tert-butyltrichloroacetophenone, p-tert-butyldichloroacetophenone, 4-chloroacetophenone, 2,2'-dichloro-4-phenoxyacetophenone, 2-methyl-1-(4-(methylthio)phenyl)-2-morpholinopropan-1-one, 2-benzyl-2-dimethylamino-1-(4-morpholinophenyl)-butan-1-one, and the like.

[0190] Examples of the benzophenone-based compound may be benzophenone, benzoyl benzoate, benzoyl methyl benzoate, 4-phenylbenzophenone, hydroxybenzophenone, acrylated benzophenone, 4,4'-bis(dimethylamino)benzophenone, 4,4'-bis(diethylamino)benzophenone, 4,4'-dimethylaminobenzophenone, 4,4'-dichlorobenzophenone, 3,3'-dimethyl-2-methoxybenzophenone, and the like.

[0191] Examples of the thioxanthone-based compound may be thioxanthone, 2-methylthioxanthone, isopropylthioxanthone, 2,4-diethylthioxanthone, 2,4-diisopropylthioxanthone, 2-chlorothioxanthone, and the like.

[0192] Examples of the benzoin-based compound may include benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin isobutyl ether, benzyl dimethyl ketal, and the like.

[0193] Examples of triazine compounds include 2,4,6-trichloro-s-triazine, 2-phenyl-4,6-bis(trichloromethyl)-s-triazine, 2-(3',4'-dimethoxyphenyl)-4,6-bis(trichloromethyl)-s-triazine, 2-(4'-methoxynaphthyl)-4,6-bis(trichloromethyl)-s-triazine, 2-(p-methoxyphenyl)-4,6-bis(trichloromethyl)-s-triazine, 2-(p-tolyl)-4,6-bis(trichloromethyl)-s-triazine, triazine, 2-biphenyl-4,6-bis(trichloromethyl)-s-triazine, bis(trichloromethyl)-6-phenylvinyl-s-triazine, 2-(naphthol-1-yl)-4,6-bis(trichloromethyl)-s-triazine, 2-(4-methoxynaphthol-1-yl)-4,6-bis(trichloromethyl)-s-triazine, 2-4-bis(trichloromethyl)-6-piperonyl-s-triazine, 2-4-bis(trichloromethyl)-6-(4-methoxyphenylvinyl)-s-triazine and the like.

[0194] Examples of oxime compounds may be O-acyl oxime compounds, 2-(O-benzoyl oxime)-1-[4-(phenylthio)phenyl]-1,2-octanedione, 1-(O-acetyl oxime)-1-[9-ethyl-6-(2-methylbenzoyl)-9H-carbazol-3-yl]ethanone, O-ethoxycarbonyl-α-oxyamino-1-phenylpropan-1-one and the like. Specific examples of O-acyl oxime compounds may be 1,2-octanedione, 2-dimethylamino-2-(4-methylbenzyl)-1-(4-morpholin-4-yl-phenyl)-butan-1-one, 1-(4-phenylsulfanylphenyl)-butane-1,2-dione-2-oxime-O-benzoate, 1-(4-phenylsulfanylphenyl)-octane-1,2-dione-2-oxime-O-benzoate, 1-(4-phenylsulfanylphenyl)-octane-1,2-dione-2-oxime-O-benzoate, 1-(4-phenylsulfanylphenyl)-octane-1-one oxime-O-acetate, 1-(4-phenylsulfanylphenyl)-butan-1-one oxime-O-acetate and the like.

[0195] The photopolymerization initiator may include a carbazole compound, a diketone compound, a sulfonium borate compound, a diazo compound, an imidazole compound, a biimidazole compound, a fluorene compound, and the like in addition to the above compounds.

[0196] The photopolymerization initiator may be used together with a photosensitizer capable of causing a chemical reaction by absorbing light and becoming excited and then transmitting its energy.

[0197] Examples of the photosensitizer may be tetraethylene glycol bis-3-mercaptopropionate, pentaerythritol tetrakis-3-mercaptopropionate, dipentaerythritol tetrakis-3-mercaptopropionate, and the like.

[0198] The photopolymerization initiator may be included in an amount of 0.1 to 10 parts by weight, for example, 0.1 to 5 parts by weight, based on 100 parts by weight of the components constituting the quantum dot layer. When the photopolymerization initiator is included within the above range, the balance between sensitivity and developability during exposure is improved, so that a pattern with excellent resolution without a residual film can be obtained.

[0199] The quantum-dot-containing layer may further contain a diffusing agent.

[0200] For example, the diffusing agent may include barium sulfate (BaSO 4 ), calcium carbonate (CaCO 3 ), titanium dioxide (TiO 2 ), zirconium oxide (ZrO 2 ), or a combination thereof.

[0201] The diffusing agent reflects light that is not absorbed by the aforementioned quantum dots so that the reflected light can be absorbed again in the quantum dots. In other words, the diffusing agent increases the amount of light absorbed in the quantum dots and thus increases the light conversion efficiency of the curable composition.

[0202] The average particle diameter of the diffusant (D 50 ) may be in the range of 150 nm to 250 nm, and specifically, in the range of 180 nm to 230 nm. When the diffusing agent has an average particle diameter within the range, a more excellent light scattering effect may be obtained, and light conversion efficiency may be increased.

[0203] The content of the diffusing agent may be 0.1 wt % to 20 wt %, for example 0.1 wt % to 5 wt %, based on 100 wt % of the solid content of the components constituting the quantum dot layer. When the content of the diffusing agent is less than 0.1 wt %, it is difficult to expect the effect of improving the light conversion efficiency by using the diffusing agent, and when the content of the diffusing agent is greater than 5 wt %, the pattern characteristics may be deteriorated.

[0204] To improve the stability and dispersibility of quantum dots, the quantum dot-containing layer may further include a thiol additive.

[0205] The thiol additive can replace the shell surface of the quantum dots, improve the dispersion stability of the quantum dots in the solvent, and stabilize the quantum dots.

[0206] The thiol-based additive may have one or more, for example, 2 to 10, for example, 2 to 4 thiol groups (—SH) at the terminal depending on its structure.

[0207] For example, the thiol-based additive may include at least two functional groups represented by Chemical Formula 2.

[0208] [Chemical formula 2]

[0209]

[0210] In chemical formula 2,

[0211] L 7 and L 8 Each is independently a single bond, a substituted or unsubstituted C1 to C20 alkylene group, a substituted or unsubstituted C3 to C20 cycloalkylene group, a substituted or unsubstituted C6 to C20 arylene group, or a substituted or unsubstituted C2 to C20 heteroarylene group.

[0212] For example, the thiol-based additive may be represented by Chemical Formula 3.

[0213] [Chemical formula 3]

[0214]

[0215] In chemical formula 3,

[0216] L 7 and L 8 are each independently a single bond, a substituted or unsubstituted C1 to C20 alkylene group, a substituted or unsubstituted C3 to C20 cycloalkylene group, a substituted or unsubstituted C6 to C20 arylene group, or a substituted or unsubstituted C2 to C20 heteroarylene group, and

[0217] u1 and u2 are each independently an integer of 0 or 1.

[0218] For example, in Chemical Formula 2 and Chemical Formula 3, L 7 and L 8 Each independently may be a single bond or a substituted or unsubstituted C1 to C20 alkylene group.

[0219] Specific examples of the thiol-based additive may be selected from pentaerythritol tetrakis(3-mercaptopropionate) represented by Chemical Formula 2a, trimethylolpropane tris(3-mercaptopropionate) represented by Chemical Formula 2b, pentaerythritol tetrakis(thioglycolate) represented by Chemical Formula 2c, trimethylolpropane tris(2-thioglycolate) represented by Chemical Formula 2d, diol di-3-mercaptopropionate represented by Chemical Formula 2e, and combinations thereof.

[0220] [Chemical formula 2a]

[0221]

[0222] [Chemical formula 2b]

[0223]

[0224] [Chemical formula 2c]

[0225]

[0226] [Chemical formula 2d]

[0227]

[0228] [Chemical formula 2e]

[0229]

[0230] The content of the thiol-based additive may be 0.1 to 10 parts by weight, for example 0.1 to 5 parts by weight, based on 100 parts by weight of the components constituting the quantum dot layer. When the thiol-based additive is included within the range, the stability of the photoconversion material such as quantum dots can be improved, and the thiol group in the component reacts with the acrylic group of the resin or monomer to form a covalent bond, and thus the heat resistance of the photoconversion material such as quantum dots can be improved.

[0231] The quantum dot-containing layer may further include a polymerization inhibitor, which includes a hydroquinone-based compound, a catechol-based compound, or a combination thereof. Since the quantum dot-containing layer further includes a hydroquinone-based compound, a catechol-based compound, or a combination thereof, after printing (coating) the composition containing quantum dots, crosslinking at room temperature can be prevented during exposure.

[0232] For example, the hydroquinone-based compound, the catechol-based compound or a combination thereof may include hydroquinone, methylhydroquinone, methoxyhydroquinone, tert-butylhydroquinone, 2,5-di-tert-butylhydroquinone, 2,5-bis(1,1-dimethylbutyl)hydroquinone, 2,5-bis(1,1,3,3-tetramethylbutyl)hydroquinone, catechol, tert-butylcatechol, 4-methoxyphenol, pyrogallol, 2,6-di-tert-butyl-4-methylphenol, 2-naphthol, tris(N-hydroxy-N-nitrosophenylamine-O,O')aluminum or a combination thereof, but are not necessarily limited thereto.

[0233] The hydroquinone compound, the catechol compound or a combination thereof can be used in the form of a dispersion, and the content of the polymerization inhibitor in the form of a dispersion can be 0.001 to 1 part by weight, for example 0.01 to 0.1 part by weight, based on 100 parts by weight of the components constituting the layer including quantum dots and fluorescent dyes or the quantum dot layer (excluding the fluorescent dye). When the stabilizer is included within the above range, the problem of aging at room temperature can be solved, and the reduction in sensitivity and surface peeling can be prevented.

[0234] In addition to the thiol additive and the polymerization inhibitor, the quantum dot-containing layer may include: malonic acid; 3-amino-1,2-propanediol; a silane coupling agent; a leveling agent; a fluorine-based surfactant; or a combination thereof.

[0235] In addition, the quantum dot-containing layer may further include a silane coupling agent having a reactive substituent such as a carboxyl group, a methacryloyl group, an isocyanate group, an epoxy group, and the like to improve the close contact property with the substrate.

[0236] Examples of the silane coupling agent may include trimethoxysilylbenzoic acid, γ-methacryloxypropyltrimethoxysilane, vinyltriacetoxysilane, vinyltrimethoxysilane, γ-isocyanatepropyltriethoxysilane, γ-glycidoxypropyltrimethoxysilane, β-(3,4-epoxycyclohexyl)ethyltrimethoxysilane, and the like. These silane coupling agents may be used alone or in the form of a mixture of two or more.

[0237] The silane coupling agent may be included in an amount of 0.01 to 10 parts by weight based on 100 parts by weight of the components constituting the quantum dot layer. When the silane coupling agent is included within the range, close contact properties, storage properties, and the like may be improved.

[0238] In addition, the quantum dot-containing layer may further contain a surfactant such as a fluorine-based surfactant to improve coating and prevent defects when necessary.

[0239] Examples of fluorine-based surfactants include BM Chemie Inc. and Dainippon Ink Kagaku Kogyo Co., Ltd.'s MEGAFACE F F F and F FULORAD by Sumitomo 3M Co., Ltd. Florard Florard Florard SURFLON from ASAHI Glass Co., Ltd. Saffron Saffron Saffron Saffron and Toray Silicone Co., Ltd. and and the like; F-482, F-484, F-478, F-554 and the like of DIC Co., Ltd.

[0240] The fluorine-based surfactant may be included in an amount of 0.001 to 5 parts by weight based on 100 parts by weight of the components constituting the quantum dot layer. When the fluorine-based surfactant is included within the range, excellent wettability on a glass substrate and coating uniformity may be ensured without generating stains.

[0241] In addition, a certain amount of other additives such as antioxidants and stabilizers may be added to the quantum dot-containing layer within a range that does not impair the physical properties.

[0242] The method of manufacturing each quantum dot-containing layer may include coating a curable composition including the above-mentioned components and the like on a substrate by an inkjet ejection method to form a pattern (S1); and curing the pattern (S2).

[0243] (S1) Pattern formation

[0244] The curable composition is coated on a substrate with a thickness of 0.5 μm to 10 μm by an inkjet dispersing method. According to the inkjet dispersing method, a pattern can be formed by repeatedly dispersing desired colors one by one or by dispersing desired colors simultaneously to simplify the process.

[0245] (S2) Solidification

[0246] By curing the obtained pattern, a cured resin film can be obtained. At this time, a thermal curing process is preferred as a curing method. The thermal curing process may be a process of first removing the solvent in the curable composition by heating at a temperature greater than or equal to 100° C. for 3 minutes, and then curing by heating at a temperature of 160° C. to 300° C. (and more preferably, heating at a temperature of 180° C. to 250° C.) for 30 minutes.

[0247] In addition, each quantum dot layer can be manufactured without inkjetting. The manufacturing method in this case includes: applying a curable composition containing the above components, for example, with a thickness of 0.5 μm to 10 μm, on a substrate subjected to a predetermined pretreatment using a suitable method (e.g., spin coating, roller coating, spray coating, etc.); and irradiating the resultant with light to form a pattern required for a color filter. As a light source for irradiation, UV, electron beam or X-ray (X-ray) can be used, and for example, UV in the range of 190 nm to 450 nm, specifically 200 nm to 400 nm, can be irradiated. In the irradiation process, a photoresist mask can be further used. After performing the irradiation process in this manner, the composition layer irradiated with the light source is treated with a developing solution. At this time, the unexposed portion of the composition layer is dissolved to form the pattern required for the color filter. By repeating this process according to the number of desired colors, a color filter with a desired pattern can be obtained. In addition, when the image pattern obtained by the development in the above process is heated again or cured by irradiation with actinic rays, crack resistance and solvent resistance can be improved.

[0248] The curable composition may further include a solvent.

[0249] The solvent may include the following compounds: alcohols such as methanol, ethanol and the like; glycol ethers such as ethylene glycol methyl ether, ethylene glycol ethyl ether, propylene glycol methyl ether and the like; cellosolve acetates such as methyl cellosolve acetate, ethyl cellosolve acetate, diethyl cellosolve acetate and the like; carbitols such as methyl ethyl carbitol, diethyl carbitol, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol dimethyl ether, diethylene glycol methyl ethyl ether, diethylene glycol diethyl ether and the like; propylene glycol alkyl ether acetates such as propylene glycol monomethyl ether acetate, propylene glycol propyl ether acetate, propylene glycol ... Acid esters and the like; ketones such as methyl ethyl ketone, cyclohexanone, 4-hydroxy-4-methyl-2-pentanone, methyl n-propyl ketone, methyl n-butyl ketone, methyl n-amyl ketone, 2-heptanone and the like; saturated aliphatic monocarboxylic acid alkyl esters such as ethyl acetate, n-butyl acetate, isobutyl acetate and the like; lactic acid alkyl esters such as methyl lactate, ethyl lactate and the like; glycolic acid alkyl esters such as methyl glycolate, ethyl glycolate, butyl glycolate and the like; acetate alkoxyalkyl esters such as methoxyacetic acid methyl, methoxyethyl acetate, methoxybutyl acetate, methyl ethoxyacetate, ethyl ethoxyacetate and the like; alkyl 3-hydroxypropionates such as methyl 3-hydroxypropionate, ethyl 3-hydroxypropionate and the like; alkyl 3-alkoxypropionates such as methyl 3-methoxypropionate, ethyl 3-methoxypropionate, ethyl 3-ethoxypropionate, methyl 3-ethoxypropionate and the like; alkyl 2-hydroxypropionates such as methyl 2-hydroxypropionate, ethyl 2-hydroxypropionate, propyl 2-hydroxypropionate and the like; alkyl 2-alkoxypropionates such as methyl 2-methoxypropionate, ethyl 2-methoxypropionate, ethyl 2-ethoxypropionate, methyl 3-ethoxypropionate and the like ethyl 2-ethoxypropionate, and the like; alkyl 2-hydroxy-2-methylpropionates, such as methyl 2-hydroxy-2-methylpropionate, ethyl 2-hydroxy-2-methylpropionate, and the like; alkyl 2-alkoxy-2-methylpropionates, such as methyl 2-methoxy-2-methylpropionate, ethyl 2-ethoxy-2-methylpropionate, and the like; esters, such as 2-hydroxyethyl propionate, 2-hydroxy-2-methylethyl propionate, hydroxyethyl acetate, 2-hydroxy-3-methylmethyl butyrate, and the like; or ketoesters, such as ethyl pyruvate, and the like. In addition, N-methylformamide, N,N-dimethylformamide, N-methylformanilide, N-methylacetamide, N,N-dimethylacetamide, N-methylpyrrolidone, dimethyl sulfoxide, benzyl ethyl ether, dihexyl ether, acetylacetone, isophorone, hexanoic acid, octanoic acid, 1-octanol, 1-nonanol, benzyl alcohol, benzyl acetate, ethyl benzoate, diethyl oxalate, diethyl maleate, γ-butyrolactone, ethylene carbonate, propylene carbonate, phenyl cellosolve acetate, and dimethyl oxalate may also be used, but are not limited thereto.

[0250] For example, the solvent may desirably be glycol ethers, such as ethylene glycol monoethyl ether, ethylene glycol methyl ethyl ether, and the like; ethylene glycol alkyl ether acetates, such as ethyl cellosolve acetate, and the like; esters, such as 2-hydroxyethyl propionate, and the like; carbitols, such as diethylene glycol monomethyl ether, and the like; propylene glycol alkyl ether acetates, such as propylene glycol monomethyl ether acetate, propylene glycol propyl ether acetate, and the like; alcohols, such as ethanol, and the like; or combinations thereof.

[0251] For example, the solvent may include propylene glycol monomethyl ether acetate, dipropylene glycol methyl ether acetate, ethanol, ethylene glycol dimethyl ether, ethylene glycol methyl ethyl ether, diethylene glycol dimethyl ether, dimethylacetamide, 2-butoxyethanol, N-methylpyrrolidine, N-ethylpyrrolidine, propylene carbonate, γ-butyrolactone, dimethyl oxalate, or a combination thereof.

[0252] A balance of the solvent may be included based on the total amount of the curable composition.

[0253] Hereinafter, the present invention is illustrated in more detail with reference to examples. However, these examples should not be interpreted as limiting the scope of the present invention in any sense.

[0254] (Example)

[0255] (synthesis example)

[0256] Each compound was diluted to a concentration of 10 ppm by using a methylethylketone (MEK) solvent, and the maximum absorption wavelength was measured using an ultraviolet / visible (UV / VIS) spectrophotometer (Lambda 25, PerkinElmer, Inc.). In addition, the extinction coefficient was calculated according to Beer's law. In addition, the half-width (FWHM) (nm) at which the absorption at each maximum absorption wavelength was reduced to half was measured.

[0257] Synthesis Example 1: Synthesis of the compound represented by Chemical Formula 1-1-1

[0258] [Synthesis Example 1-1]

[0259]

[0260] 6 grams (63.1 mmol) of 2,4-dimethylpyrrole, 1.9 grams (7.88 mmol) of 3,5-bis(trifluoromethyl)benzaldehyde and 40 ml of dichloromethane (DCM) were placed in a 250L round-bottom flask and then stirred at room temperature for 30 minutes. 0.1 ml of trifluoroacetic acid was added dropwise thereto and then stirred at room temperature for 16 hours. Subsequently, a solution prepared by dissolving 4.4 grams (7.88 mmol) of 2,3-dichloro-5,6-dicyano-1,4-benzoquinone (DDQ) in 50 ml of toluene was added dropwise thereto and then stirred for 4 hours. After removing the solvent, the residue was purified by column chromatography with a mixed solution of ethyl acetate / hexane / TEA (20% / 80% / 0.2%) and dried. (Yield: 66%, 2 g)

[0261] [Synthesis Example 1-2]

[0262]

[0263] In a 1L flask, 2 grams (4.83mmol) of the product of Synthesis Example 1-1 were stirred in 240ml of chloroform. 0.43g (2.41mmol) of Co(OAc)2 was dissolved in 200ml of MeOH. Co(OAc)2 / MeOH solution was added thereto, and then stirred together. 40ml of triethylamine was added thereto, and then reacted by stirring at room temperature for 4 hours. After removing the solvent of the reactant, methanol was added thereto for recrystallization. A reddish powder was filtered out and dried, and a compound represented by Chemical Formula 1-1-1 was synthesized. (Yield: 50%, 1.1g)

[0264] [Chemical formula 1-1-1]

[0265]

[0266] [M+H] + =882m / z

[0267] Synthesis Example 2: Synthesis of the compound represented by Chemical Formula 1-1-2

[0268] The compound represented by Chemical Formula 1-1-2 was synthesized in the same manner as in Synthesis Example 1, except that Pd(OAc) 2 was used instead of Co(OAc) 2 .

[0269] [Chemical formula 1-1-2]

[0270]

[0271] [M+H] + =929m / z

[0272] Synthesis Example 3: Synthesis of the compound represented by Chemical Formula 1-1-3

[0273] [Synthesis Example 3-1]

[0274]

[0275] Under a nitrogen atmosphere, 1 g (1.08 mmol) of the material of Chemical Formula 1-1-1 was dissolved in 20 ml of dichloromethane. 0.81 g (4.52 mmol) of N-bromosuccinimide was added thereto, and then reacted at room temperature for 4 hours. The resultant was distilled and separated by a column method, and a compound represented by Chemical Formula 1-1-3 was synthesized.

[0276] [Chemical formula 1-1-3]

[0277]

[0278] [M+H] + =1245m / z

[0279] Comparative Synthesis Example 1: Synthesis of the Compound Represented by Chemical Formula C-1

[0280] [Comparative Synthesis Example 1-1]

[0281]

[0282] The same process as in Synthesis Example 1-1 was performed except that benzaldehyde was used instead of 3,5-bis(trifluoromethyl)-benzaldehyde.

[0283] [Comparative Synthesis Example 1-2]

[0284]

[0285] 2.5 g (5.9 mmol) of the intermediate synthesized in Comparative Synthesis Example 1-1, 1000 ml of toluene and 2.5 ml (17.8 mmol) of triethanolamine were added thereto in sequence, and then stirred. 3.7 ml (29.7 mmol) of BF3.Et2O was added thereto, and then stirred at 100°C for 4 hours. After removing the solvent therefrom, the residue was purified by column chromatography with a mixed solution of dichloromethane / hexane / TEA (79.9% / 19.9% / 0.2%), and dried.

[0286] 2.2 g (4.7 mmol) of dried compound and 100 ml of dichloromethane were added thereto, and then stirred. 1.6 g (11.8 mmol) of aluminum chloride was also added thereto, and then stirred for 5 minutes. Subsequently, a solution prepared by dissolving 2.1 g (18.8 mmol) of catechol in 10 ml of acetonitrile was added thereto, and then stirred at room temperature for 30 minutes and washed, and after removing the solvent therefrom, methanol was added thereto, and then stirred. The precipitated solid was filtered and dried to obtain a compound of formula C-1. (yield: 50%, 1.2 g)

[0287] [Chemical formula C-1]

[0288]

[0289] [M+H] + =395m / z

[0290] Comparative Synthesis Example 2: Synthesis of the Compound Represented by Chemical Formula C-2

[0291] The compound of Chemical Formula C-2 was synthesized in the same manner as in Synthesis Example 1, except that pyrrole was used instead of 2,4-dimethylpyrrole.

[0292] [Chemical formula C-2]

[0293]

[0294] [M+H] + =770m / z

[0295] Comparative Synthesis Example 3: Synthesis of the Compound Represented by Chemical Formula C-3

[0296] A compound represented by Chemical Formula C-3 was synthesized in the same manner as in Synthesis Example 1, except that Cu(OAc)2 was used instead of Co(OAc)2.

[0297] [Chemical formula C-3]

[0298]

[0299] [M+H] + =887m / z

[0300] (Assessment 1: Spectral consistency)

[0301] The maximum absorption wavelength and the half-width (FWHM) of the compounds according to Synthesis Examples 1 to 3 and Comparative Synthesis Examples 1 to 3 are shown in Table 1. Referring to Table 1, the compounds according to Synthesis Examples 1 to 3 and Comparative Synthesis Example 1 have a maximum absorption wavelength in the range of 490 nm to 515 nm and at the same time have a half-width (FWHM) of less than or equal to 50 nm, which indicates that unlike the compounds according to Comparative Synthesis Examples 2 and 3, the spectral consistency can be easily controlled.

[0302] [Table 1]

[0303] <![CDATA[λ max (nm)]]> Full width at half maximum (FWHM) (nm) Synthesis example 1 498 25 Synthesis example 2 490 26 Synthesis example 3 513 35 Comparative Synthesis Example 1 507 20 Comparative Synthesis Example 2 477 71 Comparative Synthesis Example 3 458,502 98

[0304] (Manufacturing of anti-reflection film)

[0305] Example 1

[0306] 100 parts by weight of a monomer mixture including 99 parts by weight of n-butyl acrylate and 1 part by weight of 2-hydroxyethyl acrylate and 150 parts by weight of ethyl acetate were placed in a 1L reactor equipped with a condenser to conveniently control the temperature, nitrogen was refluxed in the reactor, and while the flask was stirred, nitrogen was injected therein for 1 hour to replace the oxygen in the reactor with nitrogen, and then the reactor was maintained at 70°C. 0.06 parts by weight of 2,2'-azobisisobutyronitrile as an initiator was added thereto, and then reacted for 8 hours to prepare a solution containing a (meth)acrylic acid copolymer. The (meth)acrylic acid copolymer had a Tg of -46°C and a weight average molecular weight of 1,100,000 g / mol. Subsequently, ethyl acetate was added thereto, thereby preparing a 19.4% by weight (meth)acrylic acid copolymer solution. Based on 100 parts by weight of the solid content of the (meth) acrylic copolymer, 0.193 parts by weight of an XDI-based isocyanate crosslinking agent (solid content 75%, TD-75, Soken Chemical Co., Ltd.), 0.154 parts by weight of 3-glycidyloxypropyltrimethoxysilane (KBM-403, ShinEtsu Chemical Co.) as a silane coupling agent, and 0.06 parts by weight of the compound according to Synthesis Example 1 (represented by Chemical Formula 1-1-1) were mixed. Subsequently, 25 parts by weight of methyl ethyl ketone was added thereto to prepare an adhesive layer composition.

[0307] The adhesive layer composition was directly coated on the bottom surface of the PET film as the base film of the antireflection layer (the antireflection layer formed by sequentially stacking a hard coating layer, a high refractive layer and a low refractive layer on the upper surface of the PET film, reflectivity: 0.2%, DNP, LLC) with a scraper coater, and then dried in a 90° C. oven for 4 minutes to form a 20 μm thick antireflection film.

[0308] Example 2

[0309] An antireflection film was formed according to the same method as in Example 1, except that the compound of Synthesis Example 2 (represented by Chemical Formula 1-1-2) was used instead of the compound of Synthesis Example 1 (represented by Chemical Formula 1-1-1).

[0310] Example 3

[0311] An antireflection film was formed according to the same method as in Example 1, except that the compound of Synthesis Example 3 (represented by Chemical Formula 1-1-3) was used instead of the compound of Synthesis Example 1 (represented by Chemical Formula 1-1-1).

[0312] Comparative Example 1

[0313] An antireflection film was formed according to the same method as in Example 1, except that the compound of Comparative Synthesis Example 1 (represented by Chemical Formula C-1) was used instead of the compound of Synthesis Example 1 (represented by Chemical Formula 1-1-1).

[0314] (Evaluation 2: Lightfastness reliability)

[0315] To evaluate whether the light resistance reliability of a film for a panel formed by applying quantum dots is improved, an optical member (made by stacking an antireflection film on one surface of a glass having a quantum dot-containing layer on the other surface) was manufactured, and then, the light resistance reliability was evaluated by heating the glass in a xenon test chamber (Q-SUN) under [light source lamp: xenon lamp, irradiation intensity: 0.35 W / cm 2 The transmittance at a wavelength of 550 nm was measured before and after irradiation under the conditions of [irradiation temperature: 63° C., irradiation time: 500 hours, and irradiation direction: irradiation from the antireflection film], and the light resistance reliability was evaluated using the change in transmittance, and the results are shown in Table 2. The transmittance change (ΔT%) is the absolute value of the difference between the transmittance change before irradiation and the transmittance change after irradiation.

[0316] [Table 2]

[0317] Lightfastness reliability Example 1 ○ Example 2 ○ Example 3 ○ Comparative Example 1 X

[0318] (Evaluation criteria for light resistance reliability)

[0319] ○: Transmittance change (ΔT%) is 5% or less

[0320] X: Transmittance change (ΔT%) exceeds 5%

[0321] Referring to Table 1 and Table 2, Examples 1 to 3 show improved lightfastness reliability compared to Comparative Examples 1 to 3. Specifically, the spectral consistency of the compound according to Comparative Synthesis Example 1 used as is in Comparative Example 1 can be easily controlled, but when applied to an anti-reflection film, the lightfastness reliability is greatly deteriorated compared to when the compound according to the embodiment (represented by Chemical Formula 1) is also applied to the anti-reflection film. In other words, the anti-reflection film and the display device containing quantum dots using the dye compound according to the embodiment effectively absorb light in the blue long wavelength region and the green short wavelength region, and thus improve the color reproducibility of the quantum dot application panel. Specifically, for conventional LCD panels, in the lightfastness test, the lightfastness is evaluated by measuring the pigment retention rate at the maximum absorption wavelength after a specific time period under specific conditions, but because the maximum absorption wavelength itself changes after a specific time period under specific conditions, and in addition, the pigment retention rate is controversial as an indicator for evaluating lightfastness. Therefore, in the present application, the lightfastness reliability is evaluated by using the change in transmittance at a specific wavelength before and after irradiation.

[0322] Although the present invention has been described in conjunction with what are currently considered to be practical exemplary embodiments, it should be understood that the present invention is not limited to the disclosed embodiments, but on the contrary, is intended to cover various modifications and equivalent arrangements included within the spirit and scope of the appended claims. Therefore, it should be understood that the above embodiments are exemplary and do not limit the present invention in any way.

Claims

1. A compound represented by chemical formula 1: [Chemical formula 1] in, In Chemical Formula 1, R 1 and R 2 are each independently a halogen-substituted C1 to C20 alkyl group, R 3 To R 6 are each independently a hydrogen atom, a halogen or *-C(=O)NR"R"', wherein R" and R"' are each independently a hydrogen atom or a substituted or unsubstituted C1 to C15 alkyl group, R 7 To R 14 each independently represents hydroxy, substituted or unsubstituted C1 to C20 alkyl, substituted or unsubstituted C3 to C20 cycloalkyl, substituted or unsubstituted C1 to C20 alkoxy, substituted or unsubstituted C6 to C20 aryl, or substituted or unsubstituted C2 to C20 heterocycloalkyl, M is Co or Pd, and n1 and n2 are each independently an integer of 2, Wherein, "substituted" means that at least one hydrogen is replaced by a halogen atom, a hydroxyl group, a C1-C20 alkoxy group, a nitro group, a cyano group, an amino group, an azido group, a hydrazine group, a hydrazone group, a carbamoyl group, a thiol group, an ester group, an ether group, a carboxyl group or a salt thereof, a sulfonic acid group or a salt thereof, a phosphoric acid group or a salt thereof, a C1-C20 alkyl group, a C2-C20 alkenyl group, a C2-C20 alkynyl group, a C6-C20 aryl group, a C3-C20 cycloalkyl group, a C3-C20 cycloalkenyl group, a C3-C20 cycloalkynyl group, a C2-C20 heterocycloalkyl group, a C2-C20 heterocycloalkenyl group, a C2-C20 heterocycloalkynyl group, or a C3-C20 heteroaryl group.

2. The compound according to claim 1, wherein Chemical formula 1 is represented by chemical formula 1-1: [Chemical formula 1-1] in, In Chemical Formula 1-1, R 1 and R 2 are each independently a halogen-substituted C1 to C20 alkyl group, R 3 To R 6 are each independently a hydrogen atom, a halogen or *-C(=O)NR"R"', wherein R" and R"' are each independently a hydrogen atom or a substituted or unsubstituted C1 to C15 alkyl group, R 7 To R 14 are each independently hydroxy, substituted or unsubstituted C1 to C20 alkyl, substituted or unsubstituted C3 to C20 cycloalkyl, substituted or unsubstituted C1 to C20 alkoxy, substituted or unsubstituted C6 to C20 aryl, or substituted or unsubstituted C2 to C20 heterocycloalkyl, and M is Co or Pd.

3. The compound according to claim 1, wherein R 3 To R 6 Each is independently halogen or *-C(=O)NR"R"', wherein R" and R"' are each independently a hydrogen atom or a substituted or unsubstituted C1 to C15 alkyl group.

4. The compound according to claim 3, wherein R 3 To R 6 are each independently halogen.

5. The compound according to claim 1, wherein R 7 To R 14 Each is independently a substituted or unsubstituted C1 to C20 alkyl group.

6. The compound according to claim 1, wherein The compound is represented by any one selected from Chemical Formula 1-1-1 to Chemical Formula 1-1-3: [Chemical formula 1-1-1] [Chemical formula 1-1-2] [Chemical formula 1-1-3] 7. A composition comprising a compound according to any one of claims 1 to 6. 8 . An antireflection film comprising the compound according to claim 1 .

9. The antireflection film according to claim 8, wherein The anti-reflection film includes an adhesive layer and an anti-reflection layer on the adhesive layer, and the compound is contained in the adhesive layer.

10. The antireflection film according to claim 8, wherein The anti-reflection film includes an adhesive layer, a dye-containing layer, and an anti-reflection layer on the dye-containing layer, and the compound is contained in the dye-containing layer.

11. A display device comprising the anti-reflection film according to claim 8. 12 . The display device according to claim 11 , wherein the display device further comprises a quantum dot-containing layer. 13 . The display device according to claim 12 , wherein the display device further comprises a light source, a color filter, and a substrate.

14. The display device according to claim 13, wherein The quantum dot-containing layer is arranged on the light source, The color filter is arranged on the quantum dot-containing layer, The substrate is disposed on the color filter, and The anti-reflection film is disposed on the substrate.

15. The display device according to claim 13, wherein The light source is a white light source or a blue light source.

16. The display device according to claim 13, wherein The substrate includes a glass substrate.

Images