Co-sputtering rare earth rotating target material, preparation method and application method thereof

Abstract

Embodiments of the present invention relate to a co-sputtering rare earth rotary target, a preparation method, and an application method. The co-sputtering rare earth rotary target comprises two end target tubes disposed at the axial ends of the target, and several rare earth target tubes and co-sputtering target tubes disposed in the axial middle region of the target between the two end target tubes. The rare earth target tubes and co-sputtering target tubes are spaced apart and welded together. The co-sputtering target tubes are selected from at least one of aluminum, copper, nickel, iron, and praseodymium target tubes, and the end target tubes are either non-rare earth target tubes or rare earth target tubes. The technical solution provided by the embodiments of the present invention combines a rare earth target tube with a co-sputtering element target tube, such as aluminum or copper, on the same rotating target, enabling the rare earth and co-sputtering elements to be simultaneously attached to the surface of the neodymium iron boron. This improves rare earth target utilization and sputtering efficiency while also achieving the beneficial technical effects of shortening grain boundary diffusion time and reducing diffusion temperature.

Description

Technical Field

[0001] The embodiments of the present invention relate to the technical field of magnetic materials, and in particular to a co-sputtering rare earth rotating target material, a preparation method and an application method thereof. Background Art

[0002] Rare earth targets are increasingly used in fields such as magnetic coating, grain boundary diffusion, storage, and electronic information. Magnetron sputtering is one of the primary methods for NdFeB grain boundary diffusion. Both step-by-step sputtering of single-element targets and simultaneous sputtering of independent targets are possible. However, step-by-step sputtering of single-element targets has low sputtering efficiency, while simultaneous sputtering of independent targets is difficult to control. Furthermore, the utilization rate of planar targets made of rare earth metals and alloys is generally 30-50%, resulting in low target utilization. Summary of the Invention

[0003] Based on the above situation of the prior art, the purpose of the embodiments of the present invention is to provide a co-sputtering rare earth rotary target material, a preparation method and an application method thereof. By simultaneously sputtering multiple sections of rotary target materials on a coating production line, rare earth elements and co-sputtering elements are simultaneously attached to the surface of neodymium iron boron, thereby achieving the purpose of improving grain boundary diffusion and optimizing magnet performance.

[0004] To achieve the above object, according to one aspect of the present invention, a co-sputtering rare earth rotating target is provided, wherein the rare earth rotating target comprises a back tube and a plurality of target tube sections welded to the outside of the back tube; the back tube and the plurality of target tube sections welded to the outside of the back tube are concentric columnar structures;

[0005] The target tubes welded to the outside of the backing tube include two target tubes at the axial ends of the target material, and a plurality of rare earth target tubes and a plurality of co-sputtering target tubes arranged in the middle area of ​​the target material along the axial direction between the two target tubes. The rare earth target tubes and the co-sputtering target tubes are arranged at intervals, and the target tubes are connected to each other by welding.

[0006] The co-sputtering target tube is selected from at least one of aluminum, copper, nickel, iron and praseodymium target tubes, and the end target tube is a non-rare earth target tube or a rare earth target tube.

[0007] Furthermore, the rare earth target tube includes a rotating target tube selected from terbium, dysprosium, holmium, and gadolinium;

[0008] Preferably, the rare earth target tube comprises a rotating target tube selected from terbium and dysprosium.

[0009] Furthermore, the length of the end target tube is 20-35 mm, the length of the rare earth target tube and the co-sputtering target tube are both less than or equal to 300 mm, and the length ratio of the rare earth target tube and the co-sputtering target tube arranged in the middle area is 1.3-20.

[0010] Furthermore, a gap d is left between the target tubes that are spliced ​​together, and the value of the gap d is 0.1 mm ≤ d ≤ 0.5 mm.

[0011] Furthermore, the co-sputtering target tube is an aluminum target tube or a copper target tube; when the co-sputtering target tube is an aluminum target tube, the length ratio of the rare earth target tube arranged in the middle area to the co-sputtering target tube is 1.8-3.0; when the co-sputtering target tube is a copper target tube, the length ratio of the rare earth target tube arranged in the middle area to the co-sputtering target tube is 6.0-10.0.

[0012] Furthermore, the outer diameters of the two sections of rare earth target tubes adjacent to the end target tubes at both ends of the target material decrease from outer diameter OD2 to outer diameter OD3 from the two ends of the target material toward the middle area, and the outer diameter OD2 is equal to the outer diameter OD1 of the end target tubes.

[0013] According to a second aspect of the present invention, there is provided a method for preparing the rare earth rotary target material as described in the first aspect of the present invention, comprising the steps of:

[0014] Splicing two sections of end target tubes, several sections of rare earth target tubes, and several sections of co-sputtering target tubes, wherein the two sections of end target tubes are arranged at both ends of the target material in the axial direction, and the several sections of rare earth target tubes and several sections of co-sputtering target tubes are arranged at intervals in the middle area of ​​the target material in the axial direction, and the several sections of rare earth target tubes and several sections of co-sputtering target tubes are arranged at intervals;

[0015] The target tube sections are spliced ​​together by welding;

[0016] The spliced ​​target tube and back tube are welded.

[0017] According to a third aspect of the present invention, there is provided a method for co-sputtering using the rare earth rotary target material according to the first aspect of the present invention, comprising the steps of:

[0018] The rare earth rotating target and magnet are arranged on the coating production line;

[0019] After vacuuming and pre-sputtering, sputter coating is performed

[0020] The magnets are heat treated and tempered.

[0021] Furthermore, the heat treatment temperature is 600-950°C; preferably, the heat treatment temperature is 800-900°C;

[0022] The heat treatment time is 5 to 10 hours.

[0023] Furthermore, the tempering temperature is 400-600° C., and the tempering time is 2-6 hours.

[0024] In summary, an embodiment of the present invention provides a co-sputtering rare earth rotary target material, a preparation method and an application method thereof. The co-sputtering rare earth rotary target material includes two end target tubes arranged at the axial ends of the target material and several rare earth target tubes and several co-sputtering target tubes arranged in the axial middle area of ​​the target material between the two end target tubes. The several rare earth target tubes and the several co-sputtering target tubes are arranged at intervals, and the target tubes are spliced ​​to each other by welding; the co-sputtering target tube is selected from at least one of aluminum, copper, nickel, iron and praseodymium target tubes, and the end target tube is a non-rare earth target tube or a rare earth target tube. The technical solution provided by the embodiment of the present invention combines a rare earth target tube with a co-sputtering element target tube such as aluminum and copper on the same rotating target material. Multiple rotating targets are sputtered simultaneously on a coating production line, so that rare earths such as terbium and dysprosium and co-sputtering elements are simultaneously attached to the surface of the neodymium iron boron, which is conducive to subsequent grain boundary diffusion. While improving the utilization rate of the rare earth target material and the sputtering efficiency, it can achieve the beneficial technical effect of shortening the grain boundary diffusion time and reducing the diffusion temperature. BRIEF DESCRIPTION OF THE DRAWINGS

[0025] Figure 1 Schematic diagram of the overall structure of a co-sputtering rare earth rotary target provided by an embodiment of the present invention;

[0026] Figure 2 This is a flow chart of a method for preparing a co-sputtering rare earth rotary target provided by an embodiment of the present invention;

[0027] Figure 3 It is a flow chart of a method for co-sputtering rare earth rotating targets provided by an embodiment of the present invention.

[0028] Description of reference numerals:

[0029] 1-back tube; 2, 3-end target tubes; A1-A6-rare earth target tubes; B1-B4-co-sputtering target tubes; OD1-outer diameter of the target tubes at both ends of the rotating target; OD2, OD3-outer diameters of the dog-bone sections A1 and A6 close to the target tubes at both ends, OD2>OD3; OD4-outer diameter of the co-sputtering target tube; OD5-outer diameter of the rare earth target tube in the middle area; L1-length of the target tubes at both ends; LA-length of a single section of the rare earth target tube; LB-length of a single section of the co-sputtering target tube. DETAILED DESCRIPTION

[0030] To make the objectives, technical solutions, and advantages of the present invention more clearly understood, the present invention will be further described in detail below in conjunction with specific embodiments and with reference to the accompanying drawings. It should be understood that these descriptions are merely exemplary and are not intended to limit the scope of the present invention. In addition, in the following description, descriptions of well-known structures and technologies are omitted to avoid unnecessary confusion of the concepts of the present invention.

[0031] It should be noted that, unless otherwise defined, the technical terms or scientific terms used in one or more embodiments of the present invention should have the usual meanings understood by people with ordinary skills in the field to which this disclosure belongs. The "first", "second" and similar words used in one or more embodiments of the present invention do not indicate any order, quantity or importance, but are only used to distinguish different components. "Include" or "comprise" and similar words mean that the elements or objects appearing before the word include the elements or objects listed after the word and their equivalents, without excluding other elements or objects. "Connect" or "connected" and similar words are not limited to physical or mechanical connections, but may include electrical connections, whether direct or indirect. "Up", "down", "left", "right" and the like are only used to indicate relative positional relationships. When the absolute position of the object being described changes, the relative positional relationship may also change accordingly.

[0032] The technical solution of the present invention is described in detail below with reference to the accompanying drawings. An embodiment of the present invention provides a co-sputtering rare earth rotating target material, Figure 1 The overall structure diagram of the co-sputtering rare earth rotating target is shown in FIG. Figure 1 As shown, the rare earth rotating target comprises a back tube 1 and several target tubes welded to the outside of the back tube. The back tube 1 and the target tubes are concentric cylindrical structures. The target tubes include two end target tubes 2 and 3, located at the axial ends of the target, and several rare earth target tubes Ai (i=1, 2, 3, ...) and several co-sputtering target tubes Bi (i=1, 2, 3, ...) located in the axial middle region between the two end target tubes. The target tubes Ai (i=1, 2, 3, ...) and co-sputtering target tubes Bi (i=1, 2, 3, ...) are spaced apart and joined together by welding. This welding is low-temperature welding, and solders made of low-temperature alloys such as indium and tin can be used. A gap d should be left between the target tubes during welding. The minimum gap is related to the material's expansion coefficient and is set to 0.1 mm ≤ d ≤ 0.5 mm. The end target tube is a non-rare earth target tube or a rare earth target tube.

[0033] Figure 1 The co-sputtering rare earth rotating target material with 6 rare earth target tubes A1-A6 and 5 co-sputtering target tubes B1-B5 is used as an example for explanation. Those skilled in the art can also select the number of target tubes according to actual needs to meet the requirements for the spacing between the rare earth target tubes and the co-sputtering target tubes, which should not be regarded as a limitation to the technical solution of the present invention.

[0034] The co-sputtering target tube is selected from at least one of aluminum, copper, nickel, iron, and praseodymium target tubes. Preferably, the co-sputtering target tube is an aluminum target tube or a copper target tube. The end target tube is a stainless steel target tube or a titanium target tube. The rare earth target tube includes a rotating target tube selected from terbium, dysprosium, holmium, and gadolinium. Preferably, the rare earth target tube is a rotating target tube selected from terbium and dysprosium.

[0035] Assume the length of a single rare earth target tube is L Ai , the length of a single-section sputtering target tube is L Bi The length ratio of the rare earth target tube set in the middle area to the co-sputtering target tube is 1.3-20, that is, ∑L Ai / ∑L Bi The value range is 1.3-20. When the co-sputtering target tube is an aluminum target tube, the length ratio of the rare earth target tube set in the middle area to the co-sputtering target tube (i.e. ∑L Ai / ∑L Bi ) is 1.8-3.0; when the co-sputtering target tube is a copper target tube, the length ratio of the rare earth target tube set in the middle area to the co-sputtering target tube (i.e. ∑L Ai / ∑L Bi ) is 6.0-10.0.

[0036] The outer diameters of the two sections of rare earth target tubes adjacent to the end target tubes 2 and 3 at both ends of the target material decrease from the outer diameter OD2 to the outer diameter OD3 from the two ends of the target material to the middle area, and the outer diameter OD2 is equal to the outer diameter OD1 of the end target tubes. Figure 1 As shown, the outer diameters of target tubes 2 and 3 at both ends of the target material are OD1. Adjacent rare earth target tubes A1 and A6 have outer diameters similar to dog bones. Due to the magnetic field structure characteristics of the target tubes, the magnetic field at the ends is slightly larger than in the middle, resulting in faster target material consumption. By configuring the target tubes with a special shape (e.g., dog bone-like shapes at both ends), target material utilization can be improved. The outer diameters of the remaining targets near the ends are OD2, and those near the middle are OD3, with OD2 > OD3. The outer diameters of the co-sputtering targets B1-B5 in the middle are OD4. The outer diameters of the remaining rare earth target tubes A2, A3, A4, and A5 are OD5, with OD3 = OD4 = OD5.

[0037] An embodiment of the present invention further provides a method for preparing a rare earth rotating target material, wherein the rare earth rotating target material is the rare earth rotating target material provided in the above embodiment of the present invention. Figure 2 The flow chart of the preparation method is shown in FIG. , and the preparation method comprises the following steps:

[0038] Splicing two sections of end target tubes, several sections of rare earth target tubes, and several sections of co-sputtering target tubes, wherein the two sections of end target tubes are arranged at both ends of the target material in the axial direction, and the several sections of rare earth target tubes and several sections of co-sputtering target tubes are arranged at intervals in the middle area of ​​the target material in the axial direction, and the several sections of rare earth target tubes and several sections of co-sputtering target tubes are arranged at intervals;

[0039] Splice the target tube sections together by welding;

[0040] The spliced ​​target tube and back tube are welded.

[0041] An embodiment of the present invention further provides a method for co-sputtering using a rare earth rotating target material, wherein the rare earth rotating target material is the rare earth rotating target material provided in the above embodiment of the present invention. Figure 3 , which shows a flow chart of the co-sputtering method, and comprises the following steps:

[0042] The rare earth rotating target and magnet are placed on the coating production line for sputtering. The magnet is, for example, a neodymium iron boron magnet. In this step, the rare earth rotating target can be one or more. In the case of multiple targets, the targets are arranged in parallel. The target power density is 0.5 to 6 W / cm 2 , preferably 3 to 5 W / cm 2 The weight gain of the magnet is controlled at 0.2-0.6%. The power density of the target is related to the sputtering efficiency. The lower the power, the longer the sputtering time, but the final effect is the same. The weight gain ratio is mainly to achieve the best magnet performance or to shorten the time or reduce the temperature while achieving the best performance.

[0043] The magnet is subjected to heat treatment and tempering treatment, wherein the heat treatment temperature is 600-950° C.; preferably, the heat treatment temperature is 800-900° C.; the heat treatment time is 5-10 hours; the tempering temperature is 400-600° C., and the tempering time is 2-6 hours.

[0044] When the rare earth rotating target provided by the embodiment of the present invention is used for co-sputtering, the heat treatment temperature can be shortened by 50 to 150° C. compared with the target without adding the co-sputtering element. At the same heat treatment temperature, the heat treatment time can be shortened by 0.5 to 2 hours, and the target utilization rate can reach more than 85%. This simplifies and reduces experimental conditions such as lowering the thermal diffusion temperature and shortening the diffusion time, and improves the utilization rate of the target.

[0045] Specific examples and experimental data are given below.

[0046] Example 1:

[0047] The total length of the rotating target is 1600mm, the gap between the two target tubes is 0.25mm, and it is made of 9 terbium target tubes and 8 aluminum tubes. OD1 is 165mm, OD2 is 165mm, OD3=OD4=OD5=158mm, L1=L2=30mm, and the material of the end target tube is stainless steel; A1 and A6 are dog bone, ∑L Ai / ∑L Bi The ratio is 2.7. The NdFeB with a thickness of 6mm is placed in the coating production line, and the target power density is 4W / cm 2 , the magnet weight gain ratio is 0.4%, the heat treatment temperature is 900℃, the heat treatment time is 10h, and the tempering temperature and time are 500℃ and 2h respectively.

[0048] Comparative Example 1:

[0049] The co-sputtering target tube is a terbium target tube with a weight gain ratio of 0.35%. Other conditions are the same as those in Example 1.

[0050] Example 2: The heat treatment temperature is 850°C, and the other conditions are the same as those in Example 1.

[0051] Example 3: The heat treatment time is 8 h, and the other conditions are the same as in Example 1.

[0052] Example 4: 10 terbium target tubes and 9 aluminum tubes are spliced ​​together, ∑L Ai / ∑L Bi The ratio is 1.8, the heat treatment temperature is 850°C, the time is 10 h, the weight gain ratio is 0.41%, and the other conditions are the same as those in Example 1.

[0053] Comparative Example 2: 11 terbium target tubes and 9 aluminum tubes are spliced ​​together, ∑L Ai / ∑L Bi The ratio is 1, the heat treatment temperature is 850°C, the time is 10 h, the weight gain ratio is 0.47%, and the other conditions are the same as those in Example 1.

[0054] Comparative Example 3: 11 terbium target tubes and 10 aluminum tubes are spliced ​​together, ∑L Ai / ∑L Bi The ratio is 4, the heat treatment temperature is 850°C, the time is 10 h, the weight gain ratio is 0.38%, and the other conditions are the same as those in Example 1.

[0055] Example 5: The co-sputtering target tube is a copper target tube, which is composed of 11 sections of terbium target tubes and 10 sections of copper tubes. Ai / ∑L Bi The ratio is 10, and the other conditions are the same as in Example 2.

[0056] Example 6: The co-sputtering target tube is a copper target tube, which is composed of 12 sections of terbium target tubes and 10 sections of copper tubes.Ai / ∑L Bi The ratio is 6, the weight gain ratio is 0.41%, and the other conditions are the same as those in Example 2.

[0057] Comparative Example 4: The co-sputtering target tube is a copper target tube, which is composed of 11 sections of terbium target tubes and 10 sections of copper tubes. Ai / ∑L Bi The ratio is 5, the weight gain ratio is 0.43%, and the other conditions are the same as those in Example 2.

[0058] Comparative Example 5: The co-sputtering target tube is a copper target tube, which is composed of 12 sections of terbium target tubes and 10 sections of copper tubes. Ai / ∑L Bi The ratio is 26, the weight gain ratio is 0.36%, and the other conditions are the same as those in Example 2.

[0059] Example 7: Co-sputtering target tube is terbium tube + aluminum tube + copper tube, ∑L Ai / ∑L Bi The ratio of terbium to aluminum is 4.5, the length ratio of terbium to aluminum to copper is 1:0.38:0.115, and the other conditions are the same as those in Example 2.

[0060] Example 8: The co-sputtering target tube is a dysprosium tube + aluminum tube, the total length of the rotating target is 1200 mm, the gap between the two target tubes is 0.25 mm, and it is composed of 5 terbium target tubes and 4 aluminum tubes. OD1 is 110 mm, OD2 is 110 mm, OD3 = OD4 = OD5 = 105 mm, L1 = L2 = 30 mm, and the target tube at the end of the non-rare earth target tube is made of stainless steel; A1 and A6 are both dog-bone, ∑L Ai / ∑L Bi The ratio is 1.8, the weight gain ratio is 0.41%, and the other conditions are the same as those in Example 2.

[0061] Example 9: Co-sputtering target tube is dysprosium tube + copper tube, ∑L Ai / ∑L Bi The ratio is 10, the weight gain ratio is 0.4%, and the other conditions are the same as in Example 2.

[0062] Comparative Example 6: The sputtering target is a pure dysprosium target with a weight gain ratio of 0.35%. The other conditions are the same as those in Example 2.

[0063] Comparative Example 7: LA1 and LA6 are not dog-bone shaped, OD2=OD3=165 mm, heat treatment temperature is 850° C., and other conditions are the same as in Example 1.

[0064] Comparative Example 8: The material of the non-rare earth target tubes 2 and 3 is terbium, the heat treatment temperature is 850° C., and the other conditions are the same as those in Example 1.

[0065] Table 1 shows the performance parameters of the above-mentioned embodiments and comparative examples.

[0066] Table 1 Performance parameters of various embodiments and comparative examples

[0067]

[0068]

[0069] As can be seen from the data in Table 1 above, the co-sputtering rare earth rotary target provided by the embodiment of the present invention can achieve co-sputtering of rare earth and co-sputtering elements on a single target by controlling the length ratio of the rare earth target tube and the co-sputtering target tube and controlling the target structure, thereby improving sputtering efficiency, shortening or lowering the diffusion temperature, improving grain boundary diffusion, and optimizing magnet performance:

[0070] (1) Under the condition of increasing the terbium content of the magnet by the same amount, adding a certain amount of aluminum and copper is beneficial to optimizing the performance of the magnet. For example, when the terbium length / aluminum length = 2.7, the coercive force of the magnet increased by 0.8KOe after the addition of aluminum compared with that of pure terbium. When the terbium length / copper length = 10, the coercive force of the magnet increased by 0.3KOe after the addition of copper compared with that of pure terbium. When the terbium length / aluminum length / copper length = 1:0.38:0.115, the coercive force of the magnet increased by 0.7KOe after the addition of aluminum and copper compared with that of pure terbium. When the dysprosium length / aluminum length = 1.8, the coercive force of the magnet increased by 0.5KOe after the addition of aluminum compared with that of pure terbium.

[0071] (2) Compared with adding pure terbium, adding an appropriate amount of co-sputtering elements can reduce the diffusion temperature or shorten the diffusion time while achieving the same coercive force. For example, under the conditions of heat treatment temperature of 850℃-heat treatment time of 10h, heat treatment temperature of 900℃-heat treatment time of 8h for adding co-sputtering elements and heat treatment temperature of 900℃-heat treatment time of 10h for adding pure terbium, the coercive force of the magnet reaches above 41KOe.

[0072] (3) Replacing both ends of the target with end target tubes, or processing the target tubes A1 and A6 near both ends of the target into dog bones, is conducive to improving the utilization rate of the target. When both are used at the same time, the target utilization rate can reach 88%.

[0073] In summary, the embodiments of the present invention relate to a co-sputtering rare earth rotating target material, a preparation method, and an application method thereof. The co-sputtering rare earth rotating target material comprises two end target tubes disposed at the axial ends of the target material, and a plurality of rare earth target tubes and a plurality of co-sputtering target tubes disposed in the axial middle region of the target material between the two end target tubes. The plurality of rare earth target tubes and the plurality of co-sputtering target tubes are spaced apart and connected to each other by welding. The co-sputtering target tube is selected from at least one of aluminum, copper, nickel, iron, and praseodymium target tubes, and the end target tube is a non-rare earth target tube or a rare earth target tube. The co-sputtering rare earth rotating target material provided by the embodiments of the present invention is suitable for the field of grain boundary diffusion in magnetic material coating. It can achieve the simultaneous sputtering of rare earth target material and co-sputtering element targets such as aluminum and copper onto the surface of the magnet, thereby improving sputtering efficiency, eliminating the need for alloy target preparation, and facilitating the recovery of residual targets. By combining a rare earth target tube with a co-sputtering element target tube such as aluminum or copper on the same rotating target, and controlling the length ratio of the rare earth target and beneficial target materials such as aluminum or copper, and combining the sputtering process, precise control of the rare earth and co-sputtering elements can be achieved, which is helpful for subsequent grain boundary diffusion. While improving the utilization rate of the rare earth target and the sputtering efficiency, the beneficial technical effects of shortening the grain boundary diffusion time and lowering the diffusion temperature can be achieved.

[0074] It should be understood that the above-described specific embodiments of the present invention are merely illustrative or illustrative of the principles of the present invention and do not constitute limitations of the present invention. Therefore, any modifications, equivalent substitutions, improvements, etc. made without departing from the spirit and scope of the present invention should be included within the scope of protection of the present invention. In addition, the appended claims are intended to cover all variations and modifications that fall within the scope and metes and bounds of the appended claims, or equivalents thereof.

Claims

1. A co-sputtering rare earth rotating target, characterized in that: The rare earth rotary target material includes a back tube and a plurality of target tubes welded to the outside of the back tube; the back tube and the plurality of target tubes welded to the outside of the back tube are concentric columnar structures; The plurality of target tubes welded to the outside of the backing tube include two end target tubes arranged at the axial ends of the target material, and a plurality of rare earth target tubes and a plurality of co-sputtering target tubes arranged in the middle area of ​​the target material along the axial direction between the two end target tubes. The plurality of rare earth target tubes and the plurality of co-sputtering target tubes are arranged at intervals, and the target tubes are spliced ​​together by welding. A gap is left between the spliced ​​target tubes, and the minimum value of the gap is related to the expansion coefficient of the target tube material. The end target tube is a stainless steel target tube; The co-sputtering target tube is an aluminum target tube or a copper target tube; the rare earth target tube includes a rotating target tube selected from terbium and dysprosium; when the co-sputtering target tube is an aluminum target tube, the length ratio of the rare earth target tube arranged in the middle area to the co-sputtering target tube is 1.8-3.0; when the co-sputtering target tube is a copper target tube, the length ratio of the rare earth target tube arranged in the middle area to the co-sputtering target tube is 6.0-10.

0.

2. The rare earth rotary target according to claim 1, characterized in that The length of the end target tube is 20-35 mm, and the length of the rare earth target tube and the co-sputtering target tube are both less than or equal to 300 mm.

3. The rare earth rotary target according to claim 1, characterized in that The gap is taken as , Indicates a gap.

4. The rare earth rotary target according to claim 1, characterized in that The outer diameters of the two rare earth target tubes adjacent to the end target tubes at both ends of the target material decrease from outer diameter OD2 to outer diameter OD3 from the two ends of the target material toward the middle area, and the outer diameter OD2 is equal to the outer diameter OD1 of the end target tubes.

5. A method for preparing a rare earth rotary target according to any one of claims 1 to 4, characterized in that: Including steps: Splicing two sections of end target tubes, several sections of rare earth target tubes, and several sections of co-sputtering target tubes, wherein the two sections of end target tubes are arranged at both ends of the target material in the axial direction, and the several sections of rare earth target tubes and several sections of co-sputtering target tubes are arranged at intervals in the middle area of ​​the target material in the axial direction, and the several sections of rare earth target tubes and several sections of co-sputtering target tubes are arranged at intervals; The target tube sections are joined together by welding; The spliced ​​target tube and back tube are welded.

6. A method for co-sputtering using the rare earth rotating target according to any one of claims 1 to 4, characterized in that: Including steps: The rare earth rotating target and magnet are arranged on the coating production line; After vacuuming and pre-sputtering, sputter coating is performed The magnets are heat treated and tempered.

7. The method according to claim 6, characterized in that The heat treatment temperature is 600~950℃; the heat treatment time is 5~10 hours.

8. The method according to claim 6, characterized in that The tempering temperature is 400~600℃, and the tempering time is 2~6 hours.

9. The method according to claim 7, characterized in that The heat treatment temperature is 800~900℃.

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