Electronic atomization device and method for detecting consumption of substrate to be atomized

Abstract

The present application discloses an electronic atomization device and a method for detecting the consumption of a substrate to be atomized thereof, the method comprising: obtaining energy in time periods, wherein the energy is the energy applied to the atomizer, and the atomizer is used to atomize the substrate to be atomized; obtaining temperature in time periods, wherein the temperature is the temperature corresponding to the heating element of the atomizer under the energy; and obtaining the consumption of the substrate to be atomized at each stage according to the energy and the temperature. The above method achieves real-time control of the atomization amount of the electronic atomization device by obtaining the consumption of the substrate to be atomized during the atomization process, so that the user can use the electronic atomization device reasonably and restrainedly according to the real-time atomization amount, and prevent the atomizer from burning dry without the substrate to be atomized and producing a burnt smell, which affects health.

Description

Technical Field

[0001] The present application relates to the technical field of atomizers, and in particular to an electronic atomization device and a method for detecting the consumption of a substrate to be atomized. Background Art

[0002] As an advanced aerosol delivery technology, atomization inhalation technology has attracted more and more attention. During use, it is necessary to ensure sufficient inhalation volume and prevent excessive intake during use. Therefore, it is very important to accurately measure the content of the inhaled aerosol during each atomization process. Existing electronic atomizers have no or few prompts for the dosage used and the remaining substrate to be atomized in the atomization chamber; or the accuracy of the prompts is poor. The current relevant solutions for obtaining the dosage consumption of the substrate to be atomized mainly include the following:

[0003] 1. Based on the acquisition of suction time, this method has low accuracy;

[0004] 2. Add an air pressure sensor to obtain the dosage more accurately by detecting the suction air flow velocity. Although this method has higher accuracy, it requires an additional air pressure sensor, which increases the cost. At the same time, it has higher requirements on the battery structure and increases the volume of the battery. Summary of the invention

[0005] In view of this, the present application provides a method for detecting the consumption of a substrate to be atomized and an electronic atomization device using the same to solve the above-mentioned technical problems.

[0006] In order to solve the above technical problems, the first technical solution provided by the present application is: to provide a method for detecting the consumption of a substrate to be atomized, comprising:

[0007] Acquiring energy in time periods, wherein the energy is energy applied to an atomizer, and the atomizer is used to atomize a substrate to be atomized;

[0008] Acquire the temperature in time periods, wherein the temperature is the temperature of the heating element of the atomizer corresponding to the energy;

[0009] The consumption of the substrate to be atomized in each stage is obtained according to the energy and the temperature.

[0010] Wherein, the step of obtaining the consumption of the substrate to be atomized at each stage according to the energy and the temperature comprises:

[0011] Obtaining the atomization latent heat corresponding to the temperature, wherein the atomization latent heat is the energy required to atomize a unit of the substrate to be atomized at the temperature;

[0012] The consumption of the substrate to be atomized in the corresponding stage is obtained according to the energy and the atomization latent heat.

[0013] The step of obtaining the temperature in different time periods includes:

[0014] Obtaining a current resistance value corresponding to the heating element;

[0015] The temperature is acquired according to the current resistance value.

[0016] Wherein, the step of obtaining the temperature according to the current resistance value further includes:

[0017] Obtaining a corrected resistance value according to the current resistance value and a resistance temperature curve corresponding to a previous puff;

[0018] The temperature is obtained according to the corrected resistance value.

[0019] The atomization latent heat includes a first atomization latent heat and a second atomization latent heat. The first atomization latent heat is the energy required for atomization of a unit substrate to be atomized at different temperatures in the temperature rise atomization stage, and the second atomization latent heat is the energy required for atomization of a unit substrate to be atomized in the constant temperature atomization stage.

[0020] The step of obtaining the consumption of the substrate to be atomized in the corresponding stage according to the energy and the atomization latent heat comprises:

[0021] In the temperature-raising atomization stage, obtaining the first to-be-atomized substrate consumption according to the energy and the first atomization latent heat;

[0022] In the constant temperature atomization stage, the consumption of the second substrate to be atomized is obtained according to the energy and the second atomization latent heat.

[0023] The steps of acquiring energy and temperature in different time periods include:

[0024] In response to the temperature of the atomizer reaching an initial atomization temperature, acquiring the energy and the temperature once every predetermined time;

[0025] The step of obtaining the consumption of the substrate to be atomized in the corresponding stage according to the energy and the atomization latent heat comprises:

[0026] In the temperature-raising atomization stage, the consumption of the substrate to be atomized in the predetermined time period is obtained according to the energy in the predetermined time period and the first atomization latent heat;

[0027] In the constant temperature atomization stage, the consumption of the substrate to be atomized in the predetermined time period is obtained according to the energy in the predetermined time period and the second atomization latent heat.

[0028] Wherein, in the temperature-raising atomization stage, the temperature of the atomizer in the predetermined time period is the average atomization temperature obtained according to the highest atomization temperature and the lowest atomization temperature of the atomizer in the predetermined time.

[0029] The steps of acquiring energy and temperature in different time periods include:

[0030] Acquiring a first energy and a first temperature in the heating and atomization stage; and

[0031] Acquire a second energy and a second temperature in the constant temperature atomization stage;

[0032] The step of obtaining the consumption of the substrate to be atomized in the corresponding stage according to the energy and the atomization latent heat comprises:

[0033] Obtaining the first consumption of the substrate to be atomized during the entire heating and atomization stage according to the first energy and the first atomization latent heat, wherein the first atomization latent heat is the energy required for atomization of a unit substrate to be atomized at different temperatures during the heating and atomization stage; and

[0034] The second consumption of the substrate to be atomized in the entire constant temperature atomization stage is obtained according to the second energy and the second latent heat of atomization, wherein the second latent heat of atomization is the energy required for atomization of a unit substrate to be atomized in the constant temperature atomization stage.

[0035] Wherein, the second atomization latent heat is obtained by the following method:

[0036] Obtaining a first consumption of the substrate to be atomized when it reaches the constant temperature atomization stage at the first working time;

[0037] Weighing and measuring the second consumption of the substrate to be atomized at the second working time to reach the constant temperature atomization stage;

[0038] The second atomization latent heat is obtained by dividing the difference between the energy applied to the atomizer during the second working time and the first working time by the difference between the second consumption and the first consumption.

[0039] Wherein, the first atomization latent heat is obtained by the following method:

[0040] Obtain the average atomization latent heat during the heating atomization stage;

[0041] The first atomization latent heat is obtained according to the average atomization latent heat, the second atomization latent heat, and the resistance-time relationship in the temperature-increasing atomization stage.

[0042] Wherein, the average atomization latent heat is obtained by the following method:

[0043] Obtaining a third consumption of the substrate to be atomized in the heating and atomization stage;

[0044] The average atomization latent heat is obtained by dividing the energy applied to the atomizer in the temperature-increasing atomization stage by the third consumption.

[0045] Wherein, after the step of obtaining the consumption of the substrate to be atomized in each stage according to the energy and the temperature, it also includes: obtaining the total consumption of the substrate to be atomized in the atomization process according to the consumption of the substrate to be atomized in each stage; wherein the total consumption of the substrate to be atomized includes the first consumption of the substrate to be atomized and the second consumption of the substrate to be atomized.

[0046] In order to solve the above technical problems, the second technical solution provided by the present application is to provide an electronic atomization device, comprising:

[0047] The controller comprises an acquisition module for acquiring the consumption of the substrate to be atomized by the electronic atomization device; wherein the method by which the acquisition module acquires the consumption of the substrate to be atomized by the electronic atomization device is any one of the methods described above.

[0048] Wherein, the electronic atomization device also includes: a memory for storing characteristic information of the atomizer of the electronic atomization device; wherein, the characteristic information includes the initial mass of the substrate to be atomized of the atomizer; wherein, the controller is also used to obtain the remaining amount of the substrate to be atomized of the atomizer based on the initial mass of the substrate to be atomized of the atomizer and the consumption of the substrate to be atomized.

[0049] Beneficial effects of the present application: Different from the prior art, the present application discloses an electronic atomization device and a method for detecting the consumption of a substrate to be atomized thereof. The method for detecting the consumption of a substrate to be atomized comprises: obtaining the energy applied to the atomizer in time periods, obtaining the temperature corresponding to the heating element of the atomizer under the energy in time periods; obtaining the consumption of the substrate to be atomized at each stage according to the energy and the temperature. The above method achieves real-time control of the atomization amount of the electronic atomization device by obtaining the consumption of the substrate to be atomized during the atomization process, so that the user can use the electronic atomization device reasonably and restrainedly according to the real-time atomization amount, and prevent the atomizer from burning dry without the substrate to be atomized and producing a burnt smell, which affects health. BRIEF DESCRIPTION OF THE DRAWINGS

[0050] In order to more clearly illustrate the technical solutions in the embodiments of the present application, the drawings required for use in the description of the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present application. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying any creative work.

[0051] Figure 1 It is a schematic diagram of the structure of the electronic atomization device provided by the present application;

[0052] Figure 2 It is a schematic diagram of the internal structure of the controller of the electronic atomization device provided by the present application;

[0053] Figure 3 It is a schematic diagram of the process of the method for detecting the consumption of the substrate to be atomized provided in the present application;

[0054] Figure 4 yes Figure 3 A schematic flow chart of a specific embodiment of step S3 in the provided method for detecting the consumption of a substrate to be atomized;

[0055] Figure 5 yes Figure 4 A schematic flow chart of a specific embodiment of step S32 in the provided method for detecting the consumption of a substrate to be atomized;

[0056] Figure 6 yes Figure 3 A schematic flow chart of a specific embodiment of a method for detecting consumption of a substrate to be atomized is provided;

[0057] Figure 7 yes Figure 3 A schematic flow chart of a specific embodiment of step S2 in the provided method for detecting the consumption of a substrate to be atomized;

[0058] Figure 8 yes Figure 7 A schematic flow chart of a specific embodiment of step S21 in the provided method for detecting the consumption of a substrate to be atomized;

[0059] Fig. 9 yes Figure 3 A schematic flow chart of another specific embodiment of a method for detecting consumption of a substrate to be atomized is provided;

[0060] Fig.10 It is a schematic diagram of the process of obtaining the second atomization latent heat X2 in the constant temperature atomization stage of the present application;

[0061] Fig.11 It is a schematic diagram of the process of obtaining the first atomization latent heat X1 in the heating atomization stage of the present application;

[0062] Fig.12 It is a schematic diagram of the process of obtaining the average atomization latent heat X3 in the heating atomization stage of the present application;

[0063] Fig.13 It is a schematic diagram of a process for obtaining a third consumption M3 of a substrate to be atomized in a temperature-raising atomization stage to be tested in the present application;

[0064] Fig.14It is a resistance-time variation curve of the heating element of the atomizer. DETAILED DESCRIPTION

[0065] The present application is further described in detail below in conjunction with the accompanying drawings and examples. It is particularly noted that the following examples are only used to illustrate the present application, but are not intended to limit the scope of the present application. Similarly, the following examples are only some embodiments of the present application rather than all embodiments, and all other embodiments obtained by ordinary technicians in the field without making creative work are within the scope of protection of the present application.

[0066] The terms "first", "second", and "third" in this application are only used for descriptive purposes, and cannot be understood as indicating or implying relative importance or implicitly indicating the number of indicated technical features. Thus, the features defined as "first", "second", and "third" can explicitly or implicitly include at least one of the features. In the description of this application, the meaning of "multiple" is at least two, such as two, three, etc., unless otherwise clearly and specifically defined. All directional indications in the embodiments of this application (such as up, down, left, right, front, back...) are only used to explain the relative position relationship, movement, etc. between the components under a certain specific posture (as shown in the accompanying drawings). If the specific posture changes, the directional indication also changes accordingly. The terms "including" and "having" in the embodiments of this application and any of their variations are intended to cover non-exclusive inclusions. For example, a process, method, system, product, or device that includes a series of steps or units is not limited to the listed steps or units, but optionally also includes steps or units that are not listed, or optionally also includes other steps or components inherent to these processes, methods, products, or devices.

[0067] Reference to "embodiments" herein means that a particular feature, structure, or characteristic described in conjunction with the embodiments may be included in at least one embodiment of the present application. The appearance of the phrase in various locations in the specification does not necessarily refer to the same embodiment, nor is it an independent or alternative embodiment that is mutually exclusive with other embodiments. It is explicitly and implicitly understood by those skilled in the art that the embodiments described herein may be combined with other embodiments.

[0068] See also Figure 1-2 , Figure 1 is a schematic diagram of the structure of the electronic atomization device provided by the present application, Figure 2 It is a schematic diagram of the internal structure block of the controller in the electronic atomization device provided in this application.

[0069] The electronic atomization device includes a controller 1, a memory 2, an atomizer 3 and a battery 4.

[0070] The atomizer 3 can be used for atomization of a liquid matrix. The atomizer 3 includes a housing, an atomizer seat, an atomizer core, etc. The atomizer core includes a porous liquid-conducting matrix and a heating element. Specifically, the heating element can use a heating element with a large TCR (temperature coefficient of resistance) value, and the controller 1 detects and controls the resistance of the heating element to achieve detection and control of the atomization temperature of the atomization chamber.

[0071] The controller 1 is used to control the operation of the atomizer 3 and obtain the consumption of the substrate to be atomized of the electronic atomization device, etc. The memory 2 is used to store the characteristic information of the atomizer 3 of the electronic atomization device; wherein the characteristic information includes the initial mass of the substrate to be atomized of the atomizer 3, and the memory 2 can also store information such as the characteristic ID code of the atomizer 3.

[0072] The controller 1 can also obtain characteristic information of the nebulizer 3, and obtain the remaining amount of the substrate to be atomized in the nebulizer 3 according to the initial mass of the substrate to be atomized and the consumption of the substrate to be atomized in the nebulizer 3, so as to remind and display information such as the consumed dose of the substrate to be atomized and the remaining mass of the substrate to be atomized in the nebulizer 3 at any time, so that the user can know the specific usage data at any time.

[0073] The controller 1 includes an acquisition module 10, a reminder module 11 and a cut-off module 12. The acquisition module 10 is used to obtain the consumption and remaining amount of the substrate to be atomized of the electronic atomization device. The reminder module 11 is used to remind when the remaining amount of the substrate to be atomized in the atomizer 3 is less than or equal to the first preset threshold. The cut-off module 12 is used to perform a cut-off operation when the remaining amount of the substrate to be atomized in the atomizer 3 is less than or equal to the second preset threshold to stop atomization, thereby preventing the atomizer 3 from being insufficiently dry-burned and producing a burnt smell, which affects health. The electronic atomization device may also include an indicator light, which is electrically connected to the reminder module 11, and the indicator light flashes to cooperate with the reminder module 11 to remind the remaining amount of the substrate to be atomized.

[0074] Among them, the first preset threshold is greater than the second preset threshold. The first preset threshold and the second preset threshold can be set according to actual use needs. Once the consumption of the substrate to be atomized is greater than the preset threshold, a reminder or cut-off operation is performed, which improves the safety of use and protects the health of the user to a greater extent. The first preset threshold and the second preset threshold can be specific values ​​or percentages.

[0075] The existing electronic atomizer 3 has no or little prompting of the dosage used and / or the remaining substrate to be atomized in the atomization chamber; or the prompting of the dosage of the substrate to be atomized is either less accurate or has a complex structure and high cost.

[0076] To this end, the present application provides a method for detecting the consumption of a substrate to be atomized, which obtains the consumption of the substrate to be atomized during the atomization process by adopting the principle of energy conservation during the heating atomization process, and applies the method for detecting the consumption of the substrate to be atomized to an electronic atomization device.

[0077] See also Fig.14 , Fig.14 It is a resistance-time variation curve of the heating element of the atomizer. Since the heating element of the atomizer 3 of the present application has a TCR (temperature coefficient of resistance) characteristic, Fig.14 What is actually reflected is the atomization temperature-time curve of the atomizer. Fig.14 , the horizontal axis is time, and the vertical axis is the resistance AD ​​value. The temperature of the heating element can be inferred from the resistance AD ​​value. Specifically, the higher the temperature of the metal conductor, the greater the resistance, and the lower the temperature, the smaller the resistance. It can be understood that in other embodiments, a special temperature sensor can also be provided to directly obtain the atomization temperature-time relationship diagram of the atomizer 3.

[0078] See also Fig.14 , the present application divides an atomization process into three stages: a non-atomization stage, a heating atomization stage, and a constant temperature atomization stage. In the early stage of the suction electronic atomization device, the temperature of the heating element is low, and all energy is used to heat and heat the substrate to be atomized. At this stage, the atomization process has not yet been carried out, so there is no consumption of the substrate to be atomized, which is a non-atomization stage. When the temperature of the substrate to be atomized reaches the atomization point temperature value, atomization begins to occur. At this time, part of the energy supplied by the battery 4 is used to continue heating the substrate to be atomized by the atomizer 3, and part is used to atomize the substrate to be atomized, that is, the heating atomization stage. Furthermore, when the supply energy of the battery 4 reaches a balance with the energy consumed by the atomization, the temperature will remain constant, and the atomization amount will also remain at a stable level, that is, the constant temperature atomization stage.

[0079] In view of the above characteristics and the law of conservation of energy, the electronic atomization device can obtain the consumption of the substrate to be atomized by obtaining the energy supply and measuring the energy value required for atomization of a unit substrate to be atomized at a specific temperature.

[0080] Since the consumption of the substrate to be atomized in the non-atomization stage is 0, to obtain the consumption of the substrate to be atomized during the user's puff of the electronic atomization device, it is only necessary to obtain the consumption of the substrate to be atomized in the heating atomization stage and the constant temperature atomization stage. Therefore, the present application specifically divides the consumption process of the substrate to be atomized by puffing the electronic atomization device into two stages: the heating atomization stage and the constant temperature atomization stage. Then the total consumption of the substrate to be atomized by puffing the electronic atomization device is the sum of the amounts of the substrate to be atomized consumed in the heating atomization stage and the constant temperature atomization stage.

[0081] It should be noted that not every time a user takes a puff of the electronic atomizer device, it needs to go through the three stages of no atomization, warming atomization, and stable atomization. The current atomization stage of the electronic atomizer device is related to the time interval after the user takes a puff of the electronic atomizer device and the ambient temperature of the user. Specifically, at normal temperature, if the user takes a second puff very quickly after taking a puff of the electronic atomizer device (usually a few seconds), the temperature of the electronic atomizer device may still be in the stable atomization stage. If the ambient temperature is very low, after taking a puff of the electronic atomizer device, the user takes a second puff a few seconds later, and the electronic atomizer device may need to be heated and atomized again from the warming atomization stage. If the user takes a puff of the electronic atomizer device for a second time after tens of minutes or hours, the electronic atomizer device will go through the three stages of no atomization, warming atomization, and stable atomization again.

[0082] The present application obtains the atomization latent heat of the electronic atomization device through experiments and stores it in the memory 2. When the electronic atomization device is working, the consumption of the substrate to be atomized can be obtained according to the energy output of the battery 4 and the temperature of the atomizer 3, as well as the atomization latent heat corresponding to the temperature of the atomizer 3.

[0083] Please refer to Figure 3 , Figure 3 It is a schematic flow chart of the method for detecting the consumption of the substrate to be atomized provided in the present application.

[0084] A method for detecting consumption of a substrate to be atomized, specifically comprising:

[0085] S1: Obtaining energy Q in time periods, wherein the energy Q is the energy Q applied to the atomizer 3, and the atomizer 3 is used to atomize the substrate to be atomized;

[0086] S2: Obtaining the temperature T in different time periods, wherein the temperature T is the temperature T corresponding to the heating element of the atomizer 3 under the energy Q;

[0087] S3: Obtain the consumption of the substrate to be atomized at each stage according to the energy Q and the temperature T.

[0088] In steps S1 and S2, energy Q is obtained in time periods, and temperature T is obtained in time periods. "Time periods" can be understood as the process of puffing on the electronic atomization device divided into different time intervals, and can also be understood as the process of atomization of the substrate to be atomized when taking a puff of the electronic atomization device divided into the process of heating the substrate without atomization, the process of heating up and atomizing, and the process of constant temperature atomization. "Obtaining energy Q in time periods" refers to obtaining the energy applied to the atomizer 3 by the battery 4 during the time period, which is also the energy Q output by the battery 4 to the atomizer 3. "Obtaining temperature T in time periods" refers to obtaining the temperature T corresponding to the heating element of the atomizer 3 under energy Q. The atomization temperature T can be the atomization temperature T of the heating atomization process or the atomization temperature T of the constant temperature atomization process. The temperature T includes the surface temperature, internal temperature and average temperature of the heating element of the atomizer 3. The specific selection can be based on the actual situation, as long as the temperatures obtained multiple times before and after are parameters of the same type. See. Fig.14 The atomization temperature T of the heating atomization process is a variable that changes with time, and the atomization temperature T of the constant temperature atomization process is basically a constant value.

[0089] In step S3, according to the time periods divided in the previous steps for obtaining the energy Q applied by the battery 4 to the atomizer 3 and the temperature T of the heating element of the atomizer 3, the consumption of the substrate to be atomized in each stage can be calculated.

[0090] Specifically, in order to obtain the consumption of the substrate to be atomized at each stage, the present application introduces the atomization latent heat X, wherein the atomization latent heat X can be obtained in advance through experiments and stored in the memory 2. The controller 1 searches or obtains the atomization latent heat X corresponding to the temperature T of the heating element of the atomizer 3, and then obtains the consumption of the substrate to be atomized during the atomization process according to the energy Q applied to the atomizer 3 by the battery 4 and the corresponding atomization latent heat X. This method is simple, fast and highly accurate.

[0091] In one embodiment, see Figure 4 , Figure 4 yes Figure 3 A flow chart of a specific embodiment of step S3 in the provided method for detecting the consumption of the substrate to be atomized. The step of obtaining the consumption of the substrate to be atomized at each stage according to the energy Q and the temperature T comprises:

[0092] S31: Obtaining atomization latent heat X corresponding to temperature T, wherein atomization latent heat X is energy Q required for atomization of a unit substrate to be atomized at temperature T;

[0093] S32: Obtain the consumption of the substrate to be atomized in the corresponding stage according to the energy Q and the atomization latent heat X.

[0094] In step S3, if an atomization process includes both a heating atomization process and a constant temperature atomization process, such as the first puff or the next puff after stopping puffing for a long time, it is necessary to obtain the consumption of the substrate to be atomized in the heating atomization process and the consumption of the substrate to be atomized in the constant temperature atomization process, respectively, because the atomization latent heat X of the heating atomization process and the constant temperature atomization process is different, wherein the atomization latent heat X of the heating atomization process changes with temperature, while the atomization latent heat X of the constant temperature atomization process is a constant value.

[0095] Specifically, the atomization latent heat X includes a first atomization latent heat X1 and a second atomization latent heat X2. The first atomization latent heat X1 is the energy required for atomization of a unit substrate to be atomized at different temperatures in the temperature rising atomization stage, and the second atomization latent heat X2 is the energy required for atomization of a unit substrate to be atomized in the constant temperature atomization stage.

[0096] See also Figure 5 , Figure 5 yes Figure 4 A flow chart of a specific embodiment of step S32 in the provided method for detecting the consumption of a substrate to be atomized is provided. The step of obtaining the consumption of the substrate to be atomized in the corresponding stage according to the energy Q and the atomization latent heat X is specifically provided:

[0097] S321: in the heating atomization stage, obtaining the first consumption of the substrate to be atomized according to the energy Q and the first atomization latent heat X1;

[0098] S322: In the constant temperature atomization stage, the consumption of the second substrate to be atomized is obtained according to the energy Q and the second atomization latent heat X2.

[0099] In step S321, since the first atomization latent heat X1 of the temperature-raising atomization process varies with temperature, the consumption of the substrate to be atomized in the temperature-raising atomization process can be obtained by integration or stage-by-stage accumulation.

[0100] In step S322, since the second atomization latent heat X2 of the constant temperature atomization process is a constant value, the consumption of the substrate to be atomized in the constant temperature atomization process can be directly obtained by dividing the energy Q of the constant temperature atomization process by the atomization latent heat X of the constant temperature atomization process.

[0101] If an atomization process only includes a constant temperature atomization process, such as continuous puffing for multiple puffs, and the temperature of the atomizer 3 has not dropped below the constant temperature atomization temperature during the next puff, the atomization temperature during the next puff is a constant value, and obtaining the consumption of the substrate to be atomized during the next puff only requires considering the consumption of the substrate to be atomized during the constant temperature atomization process.

[0102] According to the different time periods for obtaining the energy Q applied by the battery 4 to the atomizer 3 and the temperature T of the heating element of the atomizer 3, the consumption detection method of the substrate to be atomized of the present application may include the following specific embodiments.

[0103] In one embodiment, see Figure 6 , Figure 6 yes Figure 3 A flow chart of a specific embodiment of a method for detecting the consumption of a substrate to be atomized is provided. In step S1 and step S2, the steps of obtaining energy Q in time periods and obtaining temperature T in time periods include:

[0104] S1A, in response to the temperature T of the heating element of the atomizer 3 reaching the initial atomization temperature T0, the energy Q and the temperature T are acquired every predetermined time;

[0105] In step S32, the step of obtaining the consumption of the substrate to be atomized in the corresponding stage according to the energy Q and the atomization latent heat X includes:

[0106] S321A, in the heating atomization stage, obtaining the consumption of the substrate to be atomized in the predetermined time period according to the energy Q and the first atomization latent heat X1 in the predetermined time period;

[0107] S322A, in the constant temperature atomization stage, the consumption of the substrate to be atomized in the predetermined time period is obtained according to the energy Q and the second atomization latent heat X2 in the predetermined time period.

[0108] In step S1A, since the electronic atomization device is in the heating atomization stage, the atomization temperature T is a variable that changes with time. Therefore, in this embodiment, the temperature T of the atomizer 3 at the predetermined time is the average atomization temperature calculated based on the highest atomization temperature and the lowest atomization temperature of the atomizer 3 at the predetermined time.

[0109] Under the condition that the electronic atomization device is heated, data is collected once every predetermined time. Optionally, the predetermined time is 5-20 milliseconds, and the collection interval can be selected as needed. The number of collections is related to the collection interval and the duration of one puff of the user. The initial atomization temperature T0 of the atomizer 3 is the temperature at which at least part of the atomized substrate of the atomizer 3 is atomized. In one embodiment of the present application, the initial atomization temperature T0 of the atomizer 3 is 200°C. When the temperature of the heating element reaches 200°C, part of the substrate to be atomized begins to be atomized; the energy Q applied to the atomizer 3 by the battery 4 and the temperature T of the heating element of the atomizer 3 are obtained every 10 milliseconds. To ensure the accuracy of the collected temperature, the temperature T adopts the average atomization temperature obtained by the highest temperature atomization degree and the lowest atomization temperature in the current collection temperature range. In other possible embodiments, the initial atomization temperature T0 may also be other temperatures, which vary according to the different substrates to be atomized, and the collection interval can be selected according to actual needs. When the substrate component to be atomized by the atomizer 3 is determined, the initial atomization temperature T0 of the atomizer 3 is also determined. The controller 1 can obtain the initial atomization temperature T0 of the atomizer 3 from the memory 2 according to the ID information of the atomizer 3 .

[0110] The time it takes to take a puff of an electronic atomizer, that is, the time it takes for the electronic atomizer to atomize once, is generally 3-6 seconds.

[0111] In step S321A, since the corresponding table or functional relationship between the first atomization latent heat X1 and the temperature T is stored in advance in the memory 2, the first atomization latent heat X1 corresponding to the temperature T in the predetermined time stage can be obtained by the table lookup method or the formula acquisition method. By dividing the energy Q in the predetermined time stage by the first atomization latent heat X1 corresponding to the temperature T in the predetermined time stage, the consumption of the substrate to be atomized in the predetermined time stage can be obtained. Similarly, the consumption of the substrate to be atomized in each predetermined time stage during the heating atomization stage can be obtained.

[0112] In step S322A, the consumption of the substrate to be atomized in the predetermined time period can be obtained by dividing the energy Q in the predetermined time period by the second atomization latent heat X2. Similarly, the consumption of the substrate to be atomized in each predetermined time period in the constant temperature atomization stage can be obtained.

[0113] It should be noted that here, the consumption of the substrate to be atomized at each observation of the predetermined time in the temperature rise atomization stage or the constant temperature atomization stage can be added to obtain the total consumption of the substrate to be atomized in each temperature rise atomization stage or the constant temperature atomization stage. It is also possible to only obtain the consumption of the substrate to be atomized at each observation of the predetermined time in the temperature rise atomization stage or the constant temperature atomization stage, and add them together at the end to obtain the total consumption of the substrate to be atomized by taking a puff of the electronic atomization device.

[0114] In one embodiment, see Figure 7 , Figure 7 yes Figure 3 A flow chart of a specific embodiment of step S2 in the provided method for detecting the consumption of a substrate to be atomized. Specifically, the step of obtaining the temperature in different time periods includes:

[0115] S21: Obtain the current resistance value corresponding to the heating element;

[0116] S22: Obtain temperature T according to the current resistance value.

[0117] Specifically, in practical applications, the corresponding temperature value is obtained by collecting the resistance value of the atomizer 3, and the temperature value cannot be obtained directly. In this embodiment, before obtaining the temperature T, it is necessary to first obtain the current resistance value corresponding to the heating element, and infer the temperature T of the heating element under the current situation according to the size of the resistance value of the heating element during the operation of the battery 4, so as to judge the working state of the atomizer 3 at this moment (no atomization state, heating atomization state or stable atomization state). And the resistance curve also serves as the basis for judging the working state of the next atomization puff.

[0118] See also Figure 8 , Figure 8 yes Figure 7 A flow chart of a specific embodiment of step S21 in the provided method for detecting the consumption of the substrate to be atomized. The step of obtaining the temperature T according to the current resistance value also includes:

[0119] S211: Obtaining a corrected resistance value according to the current resistance value and the resistance-temperature curve corresponding to the previous puff;

[0120] S212: Obtain temperature T according to the corrected resistance value.

[0121] The resistance value will change during use, so it needs to be corrected. Specifically, since the resistance value of the atomizer 3 will be consumed over time, but the temperature point for stable atomization is basically fixed, the resistance-temperature relationship can be corrected accordingly. As the number of uses increases, the resistance value corresponding to thermal equilibrium will increase. Based on historical data, the resistance-temperature relationship is appropriately corrected, and the atomization latent heat X corresponding to temperature T is appropriately corrected.

[0122] For example, assuming that the resistance value sampled when thermal equilibrium is reached for the first time is 20 ohms, the corresponding thermal equilibrium temperature is 210 degrees Celsius, and the resistance value sampled when thermal equilibrium is reached for the fifth time is 22 ohms, that is, the corresponding thermal equilibrium temperature is 210 degrees Celsius, then when 20 ohms is sampled for the fifth time, the corresponding atomization latent heat X must be corrected, otherwise an error will occur.

[0123] In another embodiment, the energy Q and the temperature T are obtained during the entire temperature-increasing atomization stage and the entire temperature-constant atomization stage, respectively.

[0124] See also Fig. 9 and Fig.14 , Fig. 9 yes Figure 3 A schematic flow chart of another specific embodiment of a method for detecting the consumption of a substrate to be atomized is provided. The method for detecting the consumption of a substrate to be atomized specifically comprises:

[0125] S11B: obtaining the first energy Q1 and the first temperature T1 in the heating atomization stage;

[0126] S12B: obtaining the second energy Q2 and the second temperature T2 in the constant temperature atomization stage;

[0127] The step of obtaining the consumption of the substrate to be atomized in the corresponding stage according to the energy Q and the atomization latent heat X comprises:

[0128] S21B: Obtaining the first atomization substrate consumption in the entire heating atomization stage according to the first energy Q1 and the first atomization latent heat X1, wherein the first atomization latent heat X1 is the energy required for atomization of a unit of the atomization substrate at different temperatures in the heating atomization stage by the electronic atomization device;

[0129] S22B: Obtain the second consumption of the substrate to be atomized during the entire constant temperature atomization stage according to the second energy Q2 and the second atomization latent heat X2, wherein the second atomization latent heat X2 is the energy required for atomization of a unit substrate to be atomized by the electronic atomization device during the constant temperature atomization stage.

[0130] In steps S11B and S12B, the first temperature T1 is a variable of time t, and the second temperature T2 is a constant value. The first energy Q1 and the second energy Q2 can be obtained from the output power p and the output time t of the battery 4. For ease of understanding, it can be assumed that the conversion rate of electrical energy to thermal energy is 100%. If the control signal is a PWM signal, the energy supply here can be calculated according to Q=pt=U 2 / R×duty cycle×t, where R is the resistance of the heating element. In one embodiment of the present application, the battery 4 is directly driven to output a constant power p, and the constant power p multiplied by the output time t is the energy supplied by the battery 4 during that period of time. In another embodiment of the present application, the power p driven to output by the battery 4 is a time variable, and the energy output by the battery 4 during that period of time needs to be obtained by integration.

[0131] In step S21B, the instantaneous energy of the battery 4 can be expressed as pt, and the instantaneous atomization amount of the atomizer 3 is (p×d(t)) / X1. Since the atomization latent heat X1 in the temperature rise atomization stage is a variable of the temperature T1, and the temperature T1 is a variable of the time t, X1 is also a variable of the time t. That is, the instantaneous atomization amount of the atomizer 3 is (p×d(t)) / X1, which is only a variable of the time t. By integrating the instantaneous atomization amount of the atomizer 3 (p×d(t)) / X1 in the entire temperature rise atomization stage, the first consumption of the substrate to be atomized in the entire temperature rise atomization stage can be directly obtained.

[0132] In step S22B, the second energy Q2 can be obtained from the output power p and output time t of the battery 4. For example, p is multiplied by the duration t of the constant temperature atomization stage. The second energy Q2 is divided by the second atomization latent heat X2 to obtain the second atomization substrate consumption of the electronic atomization device during the entire constant temperature atomization stage.

[0133] The following describes the method for obtaining the first atomization latent heat X1 and the second atomization latent heat X2 of the electronic atomization device provided by the present application. The present application obtains the first atomization latent heat X1 and the second atomization latent heat X2 of the electronic atomization device by collecting the working parameters of the electronic atomization device to be tested and the weighing measurement method. See below for details:

[0134] In one embodiment of the present application, please refer to Fig.10 , Fig.10 It is a schematic diagram of the process of obtaining the second atomization latent heat X2 in the constant temperature atomization stage of the present application, which specifically includes:

[0135] M1: Make the electronic atomization device to be tested start working from room temperature and reach the constant temperature atomization stage for the first time, and weigh and measure the first consumption M1 of the substrate to be atomized;

[0136] M2: Make the electronic atomization device to be tested start working from room temperature for a second time to reach the constant temperature atomization stage, and weigh and measure the second consumption M2 of the substrate to be atomized;

[0137] M3: According to the formula X2=Q2' / (M2-M1), the second atomization latent heat X2 is equal to Q2' divided by the difference between the second consumption M2 and the first consumption M1 to obtain the second atomization latent heat X2, wherein Q2' is the difference in energy of the battery 4 when the electronic atomization device to be tested works for the second time and the first time respectively.

[0138] Specifically, the second atomization latent heat X2 is obtained according to the formula X2=Q2' / (M2-M1), that is, the second atomization latent heat X2 is equal to Q2' divided by the difference between the second consumption M2 and the first consumption M1, that is, the energy output difference between the two heating processes is divided by the difference in consumption of the substrate to be atomized in the two heating processes, and the energy required for atomizing the unit substrate to be atomized at temperature T of the electronic atomization device in the constant temperature atomization stage is obtained, that is, the second atomization latent heat X2.

[0139] In steps M1-M2, the electronic atomization device to be tested can also start working at a temperature other than room temperature, as long as the temperature at which the test is started is not higher than the initial atomization temperature. In addition, the electronic atomization device to be tested can be an electronic atomization device specifically used for testing, or it can be an electronic atomization device to be sold. If the electronic atomization device to be tested is an electronic atomization device to be sold, it is necessary to write the atomized matrix consumed during the test into the memory 2 or replenish the atomized matrix consumed during the test after the test is completed.

[0140] In step M2, the electronic atomization device to be tested in step M1 may be operated for a second time from room temperature, or another electronic atomization device to be tested that is completely identical to the electronic atomization device to be tested in step M1 may be used for testing.

[0141] See also Fig.11 , Fig.11 This is a schematic diagram of the process of obtaining the first atomization latent heat X1 in the heating atomization stage of the present application. On the basis of obtaining the second atomization latent heat X2, the first atomization latent heat X1 can be obtained specifically by the following method:

[0142] M4: Obtain the average atomization latent heat X3 of the electronic atomization device to be tested during the heating and atomization stage;

[0143] M5: Obtain the first atomization latent heat X1 according to the average atomization latent heat X3, the second atomization latent heat X2, and the resistance-time curve of the electronic atomization device to be tested in the heating atomization stage.

[0144] See also Fig.12 , Fig.12 : is a schematic diagram of the process of obtaining the average atomization latent heat X3 in the heating atomization stage of the present application. Specifically, the average atomization latent heat X3 in the heating atomization stage is obtained by the following method:

[0145] M51: Obtaining a third consumption amount M3 of the substrate to be atomized by the electronic atomization device to be tested during the heating and atomization stage;

[0146] M52: Obtain the average atomization latent heat X3 according to the formula X3=Q1' / M3, wherein Q1' is the energy of the battery 4 of the electronic atomization device to be tested during the heating and atomization stage.

[0147] The same as the specific description in step M3 above, the average atomization latent heat X3 is obtained according to the formula X3=Q1' / M3, that is, X3 is equal to Q1' divided by the third consumption M3, that is, the total energy of the battery 4 in the heating atomization stage is divided by the total consumption of the substrate to be atomized in the heating atomization stage (that is, the third consumption M3), and the average atomization latent heat X3 at the temperature T in the heating atomization stage is obtained.

[0148] For further information, see Fig.13 , Fig.13 This is a flow chart of obtaining the third consumption M3 of the substrate to be atomized in the heating and atomization stage to be tested in the present application. The steps of obtaining the third consumption M3 of the substrate to be atomized in the heating and atomization stage of the electronic atomization device to be tested include:

[0149] M511: Obtain the consumption M4 of the substrate to be atomized per unit time of the electronic atomization device to be tested in the constant temperature atomization stage according to the first consumption M1, the second consumption M2, the first time and the second time in the constant temperature atomization stage.

[0150] Specifically, M4 is equal to the difference between the second consumption M2 and the first consumption M1, divided by the difference between the second time and the first time, that is, M4 = (M2-M1) / (second time-first time);

[0151] M512: Obtain the third consumption M3 of the substrate to be atomized according to the first consumption M1, the second consumption M2, the consumption M4 of the substrate to be atomized per unit time, and the duration C of the electronic atomization device to be tested in the constant temperature atomization stage.

[0152] Specifically, M3=M1-M4×C1, that is, the third consumption M3 is the difference between the first consumption M1 and the consumption of the substrate to be atomized during the duration C1 stage, and the consumption of the substrate to be atomized during the duration C1 stage is the consumption M4 of the substrate to be atomized per unit time multiplied by the duration C1, or M3=M2-M4×C2, that is, the third consumption M3 is the difference between the second consumption M2 and the consumption of the substrate to be atomized during the duration C2 stage, and the consumption of the substrate to be atomized during the duration C2 stage is the consumption M4 of the substrate to be atomized per unit time multiplied by the duration C2, wherein C1 is the duration of the first time of the work to be tested in the constant temperature atomization stage, and C2 is the duration of the second time of the work to be tested in the constant temperature atomization stage.

[0153] For example, see Fig.14 As shown, the first consumption M1 of the constant temperature atomization stage A' to B (the corresponding temperature T is 250°C) is obtained by observation and detection, and the atomization latent heat X of the time A' to B is 100J / g through X=Q / M1. The second consumption M2 of the constant temperature atomization stage B to C (the corresponding temperature T is 250°C) is obtained by observation and detection, and the atomization latent heat X of the time B to C is 100J / g through X=Q / M2, wherein B>A', A'>A, and A, A' and B are all time points. It can be determined that the atomization latent heat X2 of the constant temperature atomization stage is 100J / g.

[0154] On the basis of obtaining the second atomization latent heat X2, the first atomization latent heat X1 can be obtained specifically by the following method:

[0155] First, according to the average atomization latent heat X 3＝ Q1' / M3 obtains the average atomization latent heat X3 in the temperature rise atomization stage, wherein Q1' is the energy of the battery 4 in the temperature rise atomization stage to be tested, and M3 is the third consumption of the substrate to be atomized in the temperature rise atomization stage.

[0156] Specifically, through observation and detection, it is found that the temperature T of the heating atomization stage A is 200°C, and the temperature T of A' is 250°C. Assuming that the average atomization latent heat X3=Q1' / M3=150J / g from the heating atomization stage A to A', and according to the above content, the atomization latent heat X2 of A' is 100J / g, using the average value method, the atomization latent heat X=(150×2-100)J / g=200J / g at the temperature point A can be obtained, that is, the atomization latent heat at 200°C is 200J / g. Using the linear method, it can be obtained that: the first atomization latent heat X1=a×T+b. Wherein, T is the temperature value corresponding to the first atomization latent heat X1, and a and b are both constants. The specific values ​​of a and b can be obtained by substituting the atomization latent heat of 200 J / g when the temperature of A is 200°C and the atomization latent heat of 100 J / g when the temperature of A' is 250°C (such as a=-2, b=600 here), and the linear function of the first atomization latent heat X1 and the temperature T is obtained: the first atomization latent heat X1=(-2)×T+600, thereby obtaining the latent heat of other temperature points, such as the latent heat of 140 J / g at 230°C. In other embodiments of the present application, the average atomization latent heat X3 from A to A' in the heating atomization stage can also be other values ​​according to the specific circumstances. At the same time, in addition to using the above-mentioned linear function to express the relationship between the first atomization latent heat X1 and the temperature T, the first atomization latent heat X1 can also be obtained according to the fitting of the heating curve to make the result more in line with the actual situation, which is not limited here.

[0157] In the two embodiments of the present application, after the step of obtaining the consumption of the substrate to be atomized in each stage according to the energy Q and the temperature T, the following steps may also be included:

[0158] S4: According to the consumption of the substrate to be atomized in each stage, the total consumption of the substrate to be atomized in the atomization process is obtained, wherein the total consumption of the substrate to be atomized includes the first consumption of the substrate to be atomized and the second consumption of the substrate to be atomized.

[0159] That is to say, after the consumption of the substrate to be atomized in each stage is obtained, the results are added together to obtain the total consumption of the substrate to be atomized in this atomization process. The total amount is compared with the mass of the substrate to be atomized pre-stored in the memory 2 to obtain the remaining amount of the substrate to be atomized, providing reference data for the reminder module 11 and the cutting module 12.

[0160] It should be noted that the electronic atomization device to be tested described here only refers to the electronic atomization device currently being tested, and the object to which the consumption detection method of the atomized matrix of other electronic atomization devices disclosed in this application is applied can be the same type or the same type of electronic atomization device, or it can be a similar or improved model with the same function.

[0161] The present application discloses an electronic atomization device and a method for detecting the consumption of a substrate to be atomized, the method for detecting the consumption of a substrate to be atomized includes: obtaining energy Q in time periods, wherein energy Q is energy Q applied to atomizer 3, and atomizer 3 is used to atomize the substrate to be atomized; obtaining temperature T in time periods, wherein temperature T is the temperature T corresponding to the heating element of atomizer 3 under energy Q; obtaining the consumption of the substrate to be atomized at each stage according to energy Q and temperature T. The above method realizes real-time control of the atomization amount of the electronic atomization device by obtaining the consumption of the substrate to be atomized during the atomization process, so that the user can use the electronic atomization device reasonably and restrainedly according to the real-time atomization amount, and prevent the atomizer 3 from burning dry without the substrate to be atomized and producing a burnt smell, which affects health.

[0162] The above descriptions are only some embodiments of the present application, and are not intended to limit the protection scope of the present application. Any equivalent device or equivalent process transformation made using the contents of the present application specification and drawings, or directly or indirectly used in other related technical fields, are also included in the patent protection scope of the present application.

Claims

1. A method for detecting the consumption of a substrate to be atomized, characterized in that: include: Acquiring energy in time periods, wherein the energy is energy applied by a battery to an atomizer, and the atomizer is used to atomize a substrate to be atomized; Acquire the temperature in time periods, wherein the temperature is the temperature of the heating element of the atomizer corresponding to the energy; The consumption of the substrate to be atomized at each stage is obtained according to the energy and the temperature; wherein the step of obtaining the consumption of the substrate to be atomized at each stage according to the energy and the temperature comprises: Obtaining the atomization latent heat corresponding to the temperature, wherein the atomization latent heat is the energy required for atomization of a unit substrate to be atomized at the temperature; the atomization latent heat includes a first atomization latent heat and a second atomization latent heat, wherein the first atomization latent heat is the energy required for atomization of a unit substrate to be atomized at different temperatures in the temperature increase atomization stage, and the second atomization latent heat is the energy required for atomization of a unit substrate to be atomized in the constant temperature atomization stage; Obtaining the consumption of the substrate to be atomized in the corresponding stage according to the energy and the atomization latent heat; Wherein, the step of obtaining the consumption of the substrate to be atomized in the corresponding stage according to the energy and the atomization latent heat includes: In the heating atomization stage, obtaining the first consumption of the substrate to be atomized according to the energy and the first atomization latent heat; In the constant temperature atomization stage, the consumption of the second substrate to be atomized is obtained according to the energy and the second atomization latent heat.

2. The method for detecting the consumption of the substrate to be atomized according to claim 1, characterized in that: The step of obtaining the temperature in different time periods comprises: Obtaining a current resistance value corresponding to the heating element; The temperature is acquired according to the current resistance value.

3. The method for detecting the consumption of the substrate to be atomized according to claim 2, characterized in that: The step of obtaining the temperature according to the current resistance value comprises: Obtaining a corrected resistance value according to the current resistance value and a resistance temperature curve corresponding to a previous puff; The temperature is obtained according to the corrected resistance value.

4. The method for detecting the consumption of the substrate to be atomized according to claim 1, characterized in that: The steps of acquiring energy and temperature in different time periods include: In response to the temperature of the atomizer reaching an initial atomization temperature, acquiring the energy and the temperature once every predetermined time; The step of obtaining the consumption of the substrate to be atomized in the corresponding stage according to the energy and the atomization latent heat comprises: In the temperature-raising atomization stage, the consumption of the substrate to be atomized in the predetermined time is obtained according to the energy in the predetermined time and the first atomization latent heat; In the constant temperature atomization stage, the consumption of the substrate to be atomized in the predetermined time is obtained according to the energy in the predetermined time and the second atomization latent heat.

5. The method for detecting the consumption of the substrate to be atomized according to claim 4, characterized in that: In the temperature-raising atomization stage, the temperature of the atomizer at a predetermined time is an average atomization temperature obtained according to the highest atomization temperature and the lowest atomization temperature of the atomizer at the predetermined time.

6. The method for detecting the consumption of the substrate to be atomized according to claim 1, characterized in that: The steps of acquiring energy and temperature in different time periods include: Acquiring a first energy and a first temperature in the heating and atomization stage; and Acquire a second energy and a second temperature in the constant temperature atomization stage; The step of obtaining the consumption of the substrate to be atomized in the corresponding stage according to the energy and the atomization latent heat comprises: Obtaining the first consumption of the substrate to be atomized during the entire heating and atomization stage according to the first energy and the first atomization latent heat, wherein the first atomization latent heat is the energy required for atomization of a unit substrate to be atomized at different temperatures during the heating and atomization stage; and The second consumption of the substrate to be atomized in the entire constant temperature atomization stage is obtained according to the second energy and the second latent heat of atomization, wherein the second latent heat of atomization is the energy required for atomization of a unit substrate to be atomized in the constant temperature atomization stage.

7. The method for detecting the consumption of the substrate to be atomized according to claim 1, characterized in that: The second atomization latent heat is obtained by the following method: Obtaining a first consumption of the substrate to be atomized when it reaches the constant temperature atomization stage at the first working time; Weighing and measuring the second consumption of the substrate to be atomized at the second working time to reach the constant temperature atomization stage; The second atomization latent heat is obtained by dividing the difference between the energy applied to the atomizer during the second working time and the first working time by the difference between the second consumption and the first consumption.

8. The method for detecting the consumption of the substrate to be atomized according to claim 7, characterized in that: The first atomization latent heat is obtained by the following method: Obtain the average atomization latent heat during the heating atomization stage; The first atomization latent heat is obtained according to the average atomization latent heat, the second atomization latent heat, and the resistance-time relationship in the temperature-increasing atomization stage.

9. The method for detecting the consumption of the substrate to be atomized according to claim 8, characterized in that: The average atomization latent heat is obtained by the following method: Obtaining a third consumption of the substrate to be atomized in the heating and atomization stage; The average atomization latent heat is obtained by dividing the energy applied to the atomizer in the temperature-increasing atomization stage by the third consumption.

10. The method for detecting the consumption of the substrate to be atomized according to claim 6, characterized in that: After the step of obtaining the consumption of the substrate to be atomized in each stage according to the energy and the temperature, the method further includes: According to the consumption of the substrate to be atomized in each stage, the total consumption of the substrate to be atomized during the atomization process is obtained; wherein the total consumption of the substrate to be atomized includes the first consumption of the substrate to be atomized and the second consumption of the substrate to be atomized.

11. An electronic atomization device, characterized in that: include: The controller comprises an acquisition module for acquiring the consumption of the substrate to be atomized by the electronic atomization device; wherein the method by which the acquisition module acquires the consumption of the substrate to be atomized by the electronic atomization device is the method according to any one of claims 1 to 10.

12. The electronic atomization device according to claim 11, characterized in that: Also includes: A memory, used to store characteristic information of the atomizer of the electronic atomization device; wherein the characteristic information includes the initial mass of the substrate to be atomized by the atomizer; The controller is further used to obtain the remaining amount of the substrate to be atomized of the atomizer according to the initial mass of the substrate to be atomized of the atomizer and the consumption of the substrate to be atomized.

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