A method and system for quickly setting exposure parameters and a digital exposure machine

Abstract

The present invention discloses a method, system, and digital exposure machine for rapid exposure parameter adjustment. The method includes: controlling the exposure head projection pattern of the digital exposure machine to be in a static full-projection state; performing exposure calibration on the exposure head projection pattern using a given initial exposure head light power and initial exposure static scanning speed; adjusting the exposure static scanning speed according to the exposure calibration result of the exposure scale to obtain an exposure head light power and exposure static scanning speed that meet the exposure scale calibration requirements; and calculating, based on the exposure head light power and exposure static scanning speed, the exposure duration and exposure static scanning speed corresponding to the exposure head light power under dynamic exposure, as well as calculating the exposure duration and exposure head light power corresponding to the exposure static scanning speed under dynamic exposure. By obtaining the exposure head light power and exposure static scanning speed that meet the exposure scale calibration requirements in the static full-projection state, this solution can quickly and accurately adjust the exposure head light power, exposure duration, and maximum scanning speed even when there is a deviation in the exposure energy of the photosensitive film or the laser power of the exposure machine.

Description

Technical Field

[0001] The present invention relates to the technical field of digital laser direct writing exposure, and in particular to a method and system for quickly setting exposure parameters and a digital exposure machine. Background Art

[0002] Direct-write exposure systems typically use the exposure energy density specified by the manufacturer of the exposure material, such as photoresist or photosensitive ink, combined with the system's own exposure head optical power, to initially determine the range of exposure parameters such as exposure duration and scanning speed. Exposure parameters are further determined using an exposure scale calibration. This approach often presents two problems in practice: first, there can be significant discrepancies between the exposure energy density recommended by the exposure material and the calibration of the exposure scale; second, the power measured by the exposure machine's laser can deviate to varying degrees after passing through the exposure system. Either or both of these discrepancies can distort the initially set exposure parameters. While the exposure results of photoresist or photosensitive ink are guaranteed by calibration with the exposure scale, these discrepancies require repeated calibration to find the appropriate exposure parameters. Furthermore, inexperienced personnel struggle to adjust such a multi-factor system, often requiring specialized personnel. This significantly increases the difficulty and time required for exposure parameter adjustment, increasing the cost of the exposure machine and reducing production efficiency. Summary of the Invention

[0003] The present invention aims to address at least one of the technical problems existing in the prior art. To this end, the present invention proposes a method for rapidly adjusting exposure parameters, which can address the problem of deviations in the recommended exposure energy density of the exposure material and the measured laser power of the exposure machine. The present invention also provides a system for rapidly adjusting exposure parameters and a digital exposure machine.

[0004] According to an embodiment of the first aspect of the present invention, a method for quickly adjusting exposure parameters includes: controlling the exposure head projection pattern of a digital exposure machine to be in a static full-projection state; the exposure head performs exposure scale calibration exposure on the exposure head projection pattern with a given initial exposure head light power P1 and an initial exposure static scanning speed V1; adjusting the exposure static scanning speed according to the calibrated exposure result of the exposure scale to obtain the exposure head light power P1 and the exposure static scanning speed V11 that meet the exposure scale calibration requirements; and calculating the exposure duration T2 and the maximum scanning speed V2 corresponding to the exposure head light power P2 under dynamic exposure according to the exposure head light power P1 and the exposure static scanning speed V11, as well as calculating the exposure duration T2 and the exposure head light power P2 corresponding to the maximum scanning speed V2 under dynamic exposure of the exposure head, thereby obtaining the adjusted dynamic exposure parameters.

[0005] A method for quickly adjusting exposure parameters according to the first embodiment of the present invention has at least the following beneficial effects: this solution obtains the exposure head light power and exposure static scanning speed that meet the exposure scale calibration requirements in the static full-projection state, and combines the exposure head light power, exposure duration, and the constant ratio of the exposure head light power, exposure duration, and the area of the pattern projected by the exposure head to the exposure energy density. In this way, the exposure head light power, exposure duration, and maximum scanning speed can be quickly and accurately adjusted even when there is a deviation in the exposure energy of the photosensitive film or the laser power of the exposure machine.

[0006] According to some embodiments of the first aspect of the present invention, the exposure duration T2 and the maximum scanning speed V2 corresponding to the exposure head light power P2 under dynamic exposure are calculated based on the exposure head light power P1 and the exposure static scanning speed V11, and the exposure duration T2 and the exposure head light power P2 corresponding to the maximum scanning speed V2 under dynamic exposure are calculated using the following formula:

[0007] T2=(P1*H) / (P2*V11*N);

[0008] V2=Ds / (T2+Tf);

[0009] Wherein, H is the height of the pattern projected by the exposure head, N is the number of repeated exposures per unit area of the exposure material in the dynamic scanning mode, Ds is the exposure interval distance, and Tf is the refresh dead time of the exposure pattern unit, where the exposure pattern unit is the micro-mirror of the digital micromirror array.

[0010] According to some embodiments of the first aspect of the present invention, the initial exposure head light power P1 is the maximum power in the continuous output mode of the laser, and the initial exposure static scanning speed V1 = P1 / (Qs*W), where Qs is the exposure energy density recommended for the exposure material.

[0011] According to some embodiments of the first aspect of the present invention, adjusting the exposure static scanning speed according to the calibrated exposure result of the exposure scale to obtain the exposure head optical power P1 and the exposure static scanning speed V11 that meet the calibration requirements of the exposure scale includes the following steps:

[0012] Comparing the calibrated exposure result of the exposure scale with the calibration requirement of the exposure scale;

[0013] When the calibrated exposure result is greater than the exposure scale calibration requirement, the exposure static scanning speed is increased;

[0014] When the calibrated exposure result is less than the exposure scale calibration requirement, the exposure static scanning speed is reduced;

[0015] Until the calibrated exposure result meets the exposure scale calibration requirement, the current exposure static scanning speed is used as the exposure static scanning speed V11 that meets the exposure scale calibration requirement.

[0016] According to some embodiments of the first aspect of the present invention, the method further includes using the set dynamic exposure parameters to verify exposure using an exposure scale, including the following steps:

[0017] Comparing the calibrated exposure result of the exposure scale with the calibration requirement of the exposure scale;

[0018] When the calibrated exposure result is greater than the exposure scale calibration requirement, the exposure head light power P2 is reduced, the exposure duration T2 is reduced, or the maximum scanning speed V2 is increased;

[0019] When the calibrated exposure result is less than the exposure scale calibration requirement, increase the exposure head light power P2, increase the exposure duration T2 or reduce the maximum scanning speed V2;

[0020] Until the calibrated exposure result meets the exposure scale calibration requirements, the current dynamic exposure parameters are used to complete the adjustment.

[0021] According to an embodiment of the second aspect of the present invention, a rapid exposure parameter adjustment system includes: an exposure head projection pattern motion platform, which is used to control the exposure head projection pattern of a digital exposure machine to be in a static full-projection state; an exposure head, which is used to perform exposure scale calibration exposure on the exposure head projection pattern with a given initial exposure head light power P1 and an initial exposure static scanning speed V1; an exposure static scanning speed adjustment unit, which is used to adjust the exposure static scanning speed according to the calibration exposure result of the exposure scale to obtain the exposure head light power P1 and exposure static scanning speed V11 that meet the exposure scale calibration requirements; an exposure parameter calculation unit, which is used to calculate the exposure duration T2 and maximum scanning speed V2 corresponding to the exposure head light power P2 under dynamic exposure, and calculate the exposure duration T2 and exposure head light power P2 corresponding to the maximum scanning speed V2 under dynamic exposure of the exposure head according to the exposure head light power P1 and the exposure static scanning speed V11, thereby obtaining the adjusted dynamic exposure parameters.

[0022] A rapid exposure parameter adjustment system according to the second embodiment of the present invention has at least the following beneficial effects: by obtaining the exposure head optical power and exposure static scanning speed that meet the exposure scale calibration requirements in the static full-projection state, combined with the constant ratio of the exposure head optical power, exposure duration, and the area of the pattern projected by the exposure head to the exposure energy density, this scheme can quickly and accurately adjust the exposure head optical power, exposure duration, and maximum scanning speed even when there is a deviation in the exposure energy of the photosensitive film or the laser power of the exposure machine.

[0023] According to some embodiments of the second aspect of the present invention, the exposure parameter calculation unit calculates the exposure duration T2 and the maximum scanning speed V2 corresponding to the exposure head light power P2 under dynamic exposure, and calculates the exposure duration T2 and the exposure head light power P2 corresponding to the maximum scanning speed V2 under dynamic exposure, using the following formula:

[0024] T2=(P1*H) / (P2*V11*N);

[0025] V2=Ds / (T2+Tf);

[0026] Wherein, H is the height of the pattern projected by the exposure head, N is the number of repeated exposures per unit area of the exposure material in the dynamic scanning mode, Ds is the exposure interval distance, and Tf is the refresh dead time of the exposure pattern unit, where the exposure pattern unit is the micro-mirror of the digital micromirror array.

[0027] According to some embodiments of the second aspect of the present invention, the initial exposure head light power P1 is the maximum power in the continuous output mode of the laser, and the initial exposure static scanning speed V1 = P1 / (Qs*W), where Qs is the exposure energy density recommended for the exposure material.

[0028] According to some embodiments of the second aspect of the present invention, adjusting the exposure static scanning speed according to the calibrated exposure result of the exposure scale to obtain the exposure head optical power P1 and the exposure static scanning speed V11 that meet the calibration requirements of the exposure scale includes the following steps:

[0029] Comparing the calibrated exposure result of the exposure scale with the calibration requirement of the exposure scale;

[0030] When the calibrated exposure result is greater than the exposure scale calibration requirement, the exposure static scanning speed is increased;

[0031] When the calibrated exposure result is less than the exposure scale calibration requirement, the exposure static scanning speed is reduced;

[0032] Until the calibrated exposure result meets the exposure scale calibration requirement, the current exposure static scanning speed is used as the exposure static scanning speed V11 that meets the exposure scale calibration requirement.

[0033] A digital exposure machine according to a third embodiment of the present invention includes an exposure machine body and an exposure parameter rapid setting system arranged on the exposure machine body.

[0034] Additional aspects and advantages of the present invention will be set forth in part in the description which follows and, in part, will be obvious from the description which follows, or may be learned by practice of the present invention. BRIEF DESCRIPTION OF THE DRAWINGS

[0035] The above and / or additional aspects and advantages of the present invention will become apparent and readily understood from the following description of the embodiments with reference to the accompanying drawings, in which:

[0036] Figure 1 Schematic diagram of a pattern projected by a graphic exposure head of a digital exposure machine according to an embodiment of the present invention;

[0037] Figure 2 This is a flow chart of a method for quickly adjusting exposure parameters according to an embodiment of the first aspect of the present invention;

[0038] Figure 3 This is a principle block diagram of the exposure parameter rapid adjustment system according to the second embodiment of the present invention. DETAILED DESCRIPTION

[0039] The following describes embodiments of the present invention in detail. Examples of the embodiments are shown in the accompanying drawings, wherein the same or similar reference numerals throughout represent the same or similar elements or elements having the same or similar functions. The embodiments described below with reference to the accompanying drawings are exemplary and are intended only to explain the present invention and are not to be construed as limiting the present invention.

[0040] In the description of the present invention, it should be understood that descriptions involving orientations, such as up, down, front, back, left, right, etc., indicating orientations or positional relationships, are based on the orientations or positional relationships shown in the accompanying drawings. They are only for the convenience of describing the present invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation. Therefore, they cannot be understood as limitations on the present invention.

[0041] In the description of the present invention, unless otherwise clearly defined, terms such as setting, installing, and connecting should be understood in a broad sense, and technicians in the relevant technical field can reasonably determine the specific meanings of the above terms in the present invention based on the specific content of the technical solution.

[0042] In view of the deviation problem in the exposure energy of the photosensitive film recommended by the existing exposure materials and the laser power measurement of the exposure machine, multiple exposure parameter calibrations are required to find the appropriate exposure parameters, which increases the difficulty and time of exposure parameter adjustment. The following technical solution is specially proposed.

[0043] refer to Figure 1 、 Figure 2 As shown, a method for quickly adjusting exposure parameters according to an embodiment of the first aspect of the present technical solution includes:

[0044] S100, controlling the exposure head projection pattern of the digital exposure machine to be in a static full projection state; Figure 1 In the figure, the rectangular frame is the pattern projected by the exposure head;

[0045] S200, the exposure head performs exposure scale calibration exposure on the exposure head projected pattern at a given initial exposure head light power P1 and initial exposure static scanning speed V1;

[0046] S300, adjusting the exposure static scanning speed based on the exposure result of the exposure scale to obtain an exposure head optical power P1 and an exposure static scanning speed V11 that meet the exposure scale calibration requirements; for example, the exposure scale calibration requirement may be that the exposure scale has 6 blurred blue grids and 7 completely clear blue grids;

[0047] S400: Based on the exposure head optical power P1 and the static exposure scanning speed V11, calculate the exposure duration T2 and the maximum scanning speed V2 corresponding to the exposure head optical power P2 under dynamic exposure, and calculate the exposure duration T2 and the exposure head optical power P2 corresponding to the maximum scanning speed V2 under dynamic exposure, thereby obtaining the set dynamic exposure parameters. Specifically, the following formula is used:

[0048] T2=(P1*H) / (P2*V11*N);

[0049] V2=Ds / (T2+Tf);

[0050] Wherein, H is the height of the pattern projected by the exposure head, N is the number of repeated exposures per unit area of the exposure material in the dynamic scanning mode, Ds is the exposure interval distance, and Tf is the refresh dead time of the exposure pattern unit, where the exposure pattern unit is the micro-mirror of the digital micromirror array.

[0051] The above formula is based on the premise that to achieve the same exposure effect on the photosensitive film, the static exposure energy density must be equal to the dynamic exposure energy density, and energy density = Q / S, where Q is energy and S is the exposure area.

[0052] Static exposure energy density = P1 / (W*V11), W is the width of the pattern projected by the exposure head;

[0053] Dynamic exposure energy density = (P1*T2 / (W*H))*N;

[0054] Therefore, P1 / (W*V11)=(P1*T2 / (W*H))*N, and T2=(H*P1) / (P2*V11*N). When P1=P2 by default, it can be simplified to T2=H / (V11*N).

[0055] The formula V2=Ds / (T2+Tf) is relatively easy to understand. The exposure static scanning speed is equal to the exposure interval distance divided by the total exposure interval time.

[0056] Based on the above two formulas, we can know that since H, P1, V11, and N are known quantities, by setting the exposure head light power P2 under dynamic exposure, we can obtain the exposure duration T2, and then the maximum scanning speed V2; similarly, by setting the maximum scanning speed V2, we can obtain the exposure duration T2, and then the exposure head light power P2.

[0057] As shown above, it can be seen that this solution obtains the exposure head light power and exposure static scanning speed that meet the exposure scale calibration requirements in the static full-projection state, and combines the exposure head light power, exposure duration, and the constant ratio of the exposure head projection pattern area to the exposure energy density. In the event of deviations in the exposure energy of the photosensitive film or the laser power of the exposure machine, the exposure head light power, exposure duration, and maximum scanning speed can be quickly and accurately adjusted.

[0058] In some embodiments of the first aspect of the present invention, the initial exposure head optical power P1 is the maximum power of the laser in continuous output mode, and the initial exposure static scanning speed V1 is calculated as P1 / (Qs*W), where Qs is the recommended exposure energy density for the exposed material. It will be appreciated that using the rated maximum power allows for full utilization of the laser and improves exposure efficiency.

[0059] Furthermore, in some embodiments of the first aspect of the present invention, adjusting the exposure static scanning speed according to the calibrated exposure result of the exposure scale to obtain the exposure head optical power P1 and the exposure static scanning speed V11 that meet the calibration requirements of the exposure scale includes the following steps:

[0060] Comparing the exposure result of the exposure scale with the exposure scale calibration requirements, there are three possible results: too large, too small, and completely in compliance. Ideally, when it is completely in compliance the first time, the exposure static scanning speed V11 = the initial exposure static scanning speed V1; in actual adjustment, it is often too large or too small.

[0061] Therefore, when the calibrated exposure result is greater than the exposure scale calibration requirement, the exposure static scanning speed is increased; when the calibrated exposure result is less than the exposure scale calibration requirement, the exposure static scanning speed is reduced; until the calibrated exposure result meets the exposure scale calibration requirement, the current exposure static scanning speed is used as the exposure static scanning speed V11 that meets the exposure scale calibration requirement.

[0062] It should be pointed out that adjusting the exposure static scanning speed to meet the exposure scale calibration requirements is only one adjustment method of this solution. It can also be achieved by adjusting the exposure head light power or adjusting the exposure duration.

[0063] Furthermore, in some embodiments of the present invention, the method further includes using the set dynamic exposure parameters to verify exposure using an exposure scale, including the following steps:

[0064] Comparing the calibrated exposure result of the exposure scale with the calibration requirement of the exposure scale;

[0065] When the calibrated exposure result is greater than the exposure scale calibration requirement, the exposure head light power P2 is reduced, the exposure duration T2 is reduced, or the maximum scanning speed V2 is increased;

[0066] When the calibrated exposure result is less than the exposure scale calibration requirement, increase the exposure head light power P2, increase the exposure duration T2 or reduce the maximum scanning speed V2;

[0067] Until the calibrated exposure result meets the exposure scale calibration requirements, the current dynamic exposure parameters are used to complete the adjustment.

[0068] like Figure 3 As shown, a rapid exposure parameter adjustment system of an embodiment of the second aspect of the present invention includes: an exposure head projection pattern motion platform, which is used to control the exposure head projection pattern of the digital exposure machine to be in a static full-projection state; an exposure head, which is used to perform exposure scale calibration exposure on the exposure head projection pattern with a given initial exposure head light power P1 and initial exposure static scanning speed V1; an exposure static scanning speed adjustment unit, which is used to adjust the exposure static scanning speed according to the calibration exposure result of the exposure scale to obtain the exposure head light power P1 and exposure static scanning speed V11 that meet the exposure scale calibration requirements; an exposure parameter calculation unit, which is used to calculate the exposure duration T2 and maximum scanning speed V2 corresponding to the exposure head light power P2 under dynamic exposure, and calculate the exposure duration T2 and exposure head light power P2 corresponding to the maximum scanning speed V2 under dynamic exposure, based on the exposure head light power P1 and exposure static scanning speed V11, thereby obtaining the adjusted dynamic exposure parameters.

[0069] The rapid exposure parameter adjustment system of this embodiment obtains the exposure head light power and exposure static scanning speed that meet the exposure scale calibration requirements in the static full-projection state, and combines the exposure head light power, exposure duration, and the constant ratio of the exposure head projection pattern area to the exposure energy density. In the event of deviations in the exposure energy of the photosensitive film or the laser power of the exposure machine, the exposure head light power, exposure duration, and maximum scanning speed can be quickly and accurately adjusted.

[0070] Specifically, in some embodiments of the second aspect of the present invention, the exposure parameter calculation unit calculates the exposure duration T2 and the maximum scanning speed V2 corresponding to the exposure head optical power P2 under dynamic exposure, and calculates the exposure duration T2 and the exposure head optical power P2 corresponding to the maximum scanning speed V2 under dynamic exposure, using the following formula:

[0071] T2=(P1*H) / (P2*V11*N);

[0072] V2=Ds / (T2+Tf);

[0073] Wherein, H is the height of the pattern projected by the exposure head, N is the number of repeated exposures per unit area of the exposure material in the dynamic scanning mode, Ds is the exposure interval distance, and Tf is the refresh dead time of the exposure pattern unit, where the exposure pattern unit is the micro-mirror of the digital micromirror array.

[0074] In some embodiments of the second aspect of the present invention, the initial exposure head optical power P1 is the maximum power of the laser in continuous output mode, and the initial exposure static scanning speed V1 = P1 / (Qs*W), where Qs is the recommended exposure energy density for the exposure material. It will be appreciated that using the rated maximum power allows for full utilization of the laser and improves exposure efficiency.

[0075] Furthermore, in some embodiments of the first aspect of the present invention, adjusting the exposure static scanning speed according to the calibrated exposure result of the exposure scale to obtain the exposure head optical power P1 and the exposure static scanning speed V11 that meet the calibration requirements of the exposure scale includes the following steps:

[0076] Comparing the exposure result of the exposure scale with the exposure scale calibration requirements, there are three possible results: too large, too small, and completely in compliance. Ideally, when it is completely in compliance the first time, the exposure static scanning speed V11 = the initial exposure static scanning speed V1; in actual adjustment, it is often too large or too small.

[0077] Therefore, when the calibrated exposure result is greater than the exposure scale calibration requirement, the exposure static scanning speed is increased; when the calibrated exposure result is less than the exposure scale calibration requirement, the exposure static scanning speed is reduced; until the calibrated exposure result meets the exposure scale calibration requirement, the current exposure static scanning speed is used as the exposure static scanning speed V11 that meets the exposure scale calibration requirement.

[0078] It should be pointed out that adjusting the exposure static scanning speed to meet the exposure scale calibration requirements is only one adjustment method of this solution, and it can also be achieved by adjusting the exposure head light power.

[0079] The present invention also includes a third embodiment of a digital exposure machine, comprising an exposure machine body and a rapid exposure parameter setting system disposed on the exposure machine body. Therefore, the digital exposure machine is a whole that includes the rapid exposure parameter setting system, and the technical principles and effects are the same, so further description is omitted.

[0080] Throughout this specification, reference to terms such as "one embodiment," "some embodiments," "illustrative embodiments," "examples," "specific examples," or "some examples" means that a specific feature, structure, material, or characteristic described in conjunction with that embodiment or example is included in at least one embodiment or example of the present invention. In this specification, illustrative uses of the above terms do not necessarily refer to the same embodiment or example. Furthermore, the specific features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more embodiments or examples.

[0081] While embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that various changes, modifications, substitutions, and variations may be made to the embodiments without departing from the principles and spirit of the invention, and that the scope of the invention is defined by the claims and their equivalents.

Claims

1. A method for quickly adjusting exposure parameters, characterized in that: The following steps are involved: Controlling the exposure head of the digital exposure machine to project a pattern in a static full-projection state; The exposure head performs exposure scale calibration exposure on the exposure head projection pattern at a given initial exposure head light power P1 and initial exposure static scanning speed V1; Adjusting the exposure static scanning speed according to the exposure result of the exposure scale to obtain the exposure head light power P1 and exposure static scanning speed V11 that meet the exposure scale calibration requirements; According to the exposure head optical power P1 and the exposure static scanning speed V11, the dynamic scanning exposure duration T2 and the maximum scanning speed V2 corresponding to the exposure head optical power P2 under dynamic exposure are calculated, and the exposure duration T2 and the exposure head optical power P2 corresponding to the maximum scanning speed V2 under dynamic exposure are calculated, thereby obtaining the adjusted dynamic exposure parameters; The following formula is used to calculate the dynamic scanning exposure duration T2 and the maximum scanning speed V2 corresponding to the exposure head light power P2 under dynamic exposure, and the exposure duration T2 and the exposure head light power P2 corresponding to the maximum scanning speed V2 under dynamic exposure, based on the exposure head light power P1 and the exposure static scanning speed V11: T2=(P1×H) / (P2×V11×N); V2=Ds / (T2+Tf); Wherein, H is the height of the pattern projected by the exposure head, N is the number of repeated exposures per unit area of the exposure material in the dynamic scanning mode, Ds is the exposure interval distance, and Tf is the refresh dead time of the exposure pattern unit, where the exposure pattern unit is the micro-mirror of the digital micromirror array.

2. The method for rapid exposure parameter setting according to claim 1, wherein: The initial exposure head optical power P1 is the maximum power of the laser in continuous output mode, and the initial exposure static scanning speed V1 = P1 / (Qs×W), where Qs is the exposure energy density recommended for the exposure material, and W is the width of the pattern projected by the exposure head.

3. The method for rapid exposure parameter setting according to claim 1 or 2, characterized in that: The method of adjusting the exposure static scanning speed according to the calibrated exposure result of the exposure ruler to obtain the exposure head optical power P1 and the exposure static scanning speed V11 that meet the calibration requirements of the exposure ruler comprises the following steps: Comparing the calibrated exposure result of the exposure scale with the calibration requirement of the exposure scale; When the calibrated exposure result is greater than the exposure scale calibration requirement, the exposure static scanning speed is increased; When the calibrated exposure result is less than the exposure scale calibration requirement, the exposure static scanning speed is reduced; Until the calibrated exposure result meets the exposure scale calibration requirement, the current exposure static scanning speed is used as the exposure static scanning speed V11 that meets the exposure scale calibration requirement.

4. The method for rapid exposure parameter setting according to claim 1 or 2, wherein: The method further includes using the set dynamic exposure parameters to verify exposure using an exposure scale, including the following steps: Comparing the calibrated exposure result of the exposure scale with the calibration requirement of the exposure scale; When the calibrated exposure result is greater than the exposure scale calibration requirement, the exposure head light power P2 is reduced, the exposure duration T2 is reduced, or the maximum scanning speed V2 is increased; When the calibrated exposure result is less than the exposure scale calibration requirement, increase the exposure head light power P2, increase the exposure duration T2 or reduce the maximum scanning speed V2; Until the calibrated exposure result meets the exposure scale calibration requirements, the current dynamic exposure parameters are used to complete the adjustment.

5. A system for rapid exposure parameter adjustment, characterized by: include Exposure head projection pattern motion platform, used to control the exposure head projection pattern of the digital exposure machine to be in a static full projection state; An exposure head, used for performing exposure scale calibration exposure on the pattern projected by the exposure head at a given initial exposure head light power P1 and an initial exposure static scanning speed V1; An exposure static scanning speed adjustment unit, configured to adjust the exposure static scanning speed according to the exposure result of the exposure scale to obtain an exposure head optical power P1 and an exposure static scanning speed V11 that meet the exposure scale calibration requirements; an exposure parameter calculation unit for calculating, based on the exposure head optical power P1 and the exposure static scanning speed V11, the exposure duration T2 and the maximum scanning speed V2 corresponding to the exposure head optical power P2 under dynamic exposure, and calculating the exposure duration T2 and the exposure head optical power P2 corresponding to the maximum scanning speed V2 under dynamic exposure, thereby obtaining the set dynamic exposure parameters; The exposure parameter calculation unit calculates the exposure duration T2 and the maximum scanning speed V2 corresponding to the exposure head light power P2 under dynamic exposure, and calculates the exposure duration T2 and the exposure head light power P2 corresponding to the maximum scanning speed V2 under dynamic exposure, using the following formula: T2=(P1×H) / (P2×V11×N); V2=Ds / (T2+Tf); Wherein, H is the height of the pattern projected by the exposure head, N is the number of repeated exposures per unit area of the exposure material in the dynamic scanning mode, Ds is the exposure interval distance, and Tf is the refresh dead time of the exposure pattern unit, where the exposure pattern unit is the micro-mirror of the digital micromirror array.

6. The exposure parameter rapid setting system according to claim 5, characterized in that: The initial exposure head optical power P1 is the maximum power of the laser in continuous output mode, and the initial exposure static scanning speed V1 = P1 / (Qs×W), where Qs is the exposure energy density recommended for the exposure material, and W is the width of the pattern projected by the exposure head.

7. The exposure parameter rapid setting system according to claim 5 or 6, characterized in that: The method of adjusting the exposure static scanning speed according to the calibrated exposure result of the exposure ruler to obtain the exposure head optical power P1 and the exposure static scanning speed V11 that meet the calibration requirements of the exposure ruler comprises the following steps: Comparing the calibrated exposure result of the exposure scale with the calibration requirement of the exposure scale; When the calibrated exposure result is greater than the exposure scale calibration requirement, the exposure static scanning speed is increased; When the calibrated exposure result is less than the exposure scale calibration requirement, the exposure static scanning speed is reduced; Until the calibrated exposure result meets the exposure scale calibration requirement, the current exposure static scanning speed is used as the exposure static scanning speed V11 that meets the exposure scale calibration requirement.

8. A digital exposure machine, characterized in that: The invention comprises an exposure machine body and an exposure parameter rapid setting system as claimed in any one of claims 5 to 7, which is arranged on the exposure machine body.

Images