A textile pattern design method and system based on wallpaper groups
Through the textile pattern design system based on wallpaper group, the four-party continuous textile pattern is automatically generated, which solves the problem of inefficient manual segmentation layout of designers and realizes efficient textile pattern design.
Patent Information
- Application Number
- CN202211524427.2
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Filing Date
- 2022-11-30
- Publication Date
- 2025-08-01
- Estimated Expiration
- 2042-11-30
AI Technical Summary
When designing four-sided continuous patterns, existing textile designers need to manually use professional tools to segment and layout, resulting in inefficient design.
The textile pattern design system based on wallpaper group is adopted, including style processing module, sampling module, pattern presentation module, follow-up processing module and export module. By automatically extracting the position coordinates, texture coordinates and textures of the sampling area, the wallpaper group is adjusted to generate four-sided continuous textile patterns, and supports effect adjustment.
It realizes the automation and efficient generation of textile pattern design, simplifies the design process, improves design efficiency, and supports the automatic generation and effect adjustment of four-party continuous patterns.
Smart Images

Figure CN115859407B_ABST
Abstract
Description
Technical Field
[0001] The present invention relates to the technical field of data processing, and in particular, to a method and system for textile pattern design based on wallpaper groups. Background Art
[0002] Wallpaper groups, also known as plane crystallographic groups, are infinite symmetry groups and are essential knowledge for professionals in architecture, clothing, painting, materials, physics, etc.
[0003] Given a known two-dimensional point group and combining it with translational symmetry (sometimes in more than one way), two-dimensional space groups, also known as plane crystallographic groups, can be constructed. There are currently 17 different plane crystallographic groups, namely: point groups C1, C2, C3, C4, C6, corresponding to space groups p1, p2, p3, p4, p6 respectively; point group D1 corresponding to space groups pm, pg, cm; point group D2 corresponding to space groups pmm, pmg, pgg, cmm; point group D3 corresponding to space groups P31m, P3m1; point group D4 corresponding to space groups p4m, p4g; point group D6 corresponding to space group p6m. Among them, the letters respectively represent: C is the first letter of cyclic (circular, rotating), D is the first letter of dihedral (two-sided), p is the first letter of primitive (primary), c is the first letter of centered (centered), m represents mirror, and g represents glide (glide plane, after reflection through this plane, it also moves a certain distance). These symbols represent the symmetry characteristics of the crystal. For example, pmg is a primary lattice + mirror + glide plane, cmm is a face-centered lattice (the unit cell is a centered rectangle) + mirror in the vertical direction, and pmm is a primary lattice + mirror + mirror.
[0004] Textile design mainly studies the basic knowledge and skills in aspects such as woven pattern design, fabric design, computer graphics, and creativity, and conducts textile fabric design, home textile product design, decorative textile design, etc. in the field of textile design.
[0005] Currently, when textile designers design textile patterns, designers need to manually use professional tools such as Adobe Photoshop or Adobe Illustrator to divide, layout, and arrange the sampling area when designing four-way continuous patterns. There is a lot of repetitive work, which is time-consuming, laborious, and inefficient.
[0006] Patent document CN112487516A discloses a pattern design system. The system includes an element acquisition module, a pattern generation module, and a pattern display module. The design elements input by the target user are acquired through the element acquisition module and sent to the pattern generation module. Based on the pattern generation module, at least one design pattern corresponding to the design elements is determined according to the design elements and a pre-established element feature library, and at least one design pattern is sent to the pattern display module. The at least one design pattern is displayed through the pattern display module, realizing that the target user only needs to input the design elements, and the system can automatically determine and display the design pattern according to the design elements and the pre-established element feature library. Although this method can improve the pattern design efficiency, it does not adopt wallpaper groups and cannot obtain a four-way continuous pattern. Summary of the Invention
[0007] In view of the above, the object of the present invention is to provide a method and system for textile pattern design based on wallpaper groups, which can improve the efficiency of textile pattern design.
[0008] A textile pattern design system based on wallpaper groups, characterized in that it includes a style processing module, a sampling module, a pattern presentation module, a subsequent processing module, and an export module;
[0009] The style processing module is used to provide an adjustable sampling frame and a style processing scheme for the user to select;
[0010] The sampling module is used to extract a sampling area from the uploaded image based on the sampling frame and obtain the position coordinates, texture coordinates, and texture of the sampling area;
[0011] The pattern presentation module is used to generate a textile pattern by adjusting the wallpaper group according to the position coordinates, texture coordinates, and texture of the sampling area and the style processing scheme selected by the user;
[0012] The subsequent processing module is used to adjust the effect of the textile pattern;
[0013] The export module is used to export the textile pattern.
[0014] Preferably, the size of the sampling frame can be adjusted;
[0015] The style processing scheme includes the type of texture and sub-parameters related to the type of texture.
[0016] Preferably, the sub-parameters related to the type of texture include rotation, number of iterations, angle, position, edge fusion, and the values of the sub-parameters can be adjusted.
[0017] Preferably, generating a textile pattern includes generating a single rectangular tile, filling the entire sampling area with rectangular tiles of the same specification, and then rendering to obtain a textile pattern.
[0018] Preferably, the generating of a single rectangular tile includes:
[0019] First, divide the selected divided area into multiple triangle combinations according to the sampling method corresponding to the pattern type, determine the texture of the triangles according to the texture of the sampling area, determine the position coordinates of the triangles according to the position coordinates of the sampling area, and determine the texture coordinates of the triangles according to the texture coordinates of the sampling area. Among them, the shape of the triangle itself corresponds to the position coordinates, and the offset of the triangle relative to the upper left corner of the sampling area corresponds to the texture coordinates;
[0020] Then, first perform transformation operations on a single triangle combination in at least one of the ways of scaling, mirroring, and rotating according to the sub-parameters related to the pattern type and the texture coordinates, and then perform multiple adjustments using the adjustment method of the wallpaper group to obtain a single rectangular tile with a seamless repeat pattern.
[0021] Preferably, determine the position coordinates of the rectangular tile according to the position coordinates of the triangle, fill the entire sampling area with rectangular tiles of the same specification according to the position coordinates of the rectangular tile, and then render according to the selected pattern type on the basis of the original texture to obtain a textile pattern.
[0022] Preferably, the effects of adjusting the textile pattern include grayscale, shadow, gradient, duotone, distortion, color-related parameters, halftone, overexposure, pixelation, edge highlighting, dot matrix, color separation. Among them, the color-related parameters include brightness, contrast, and saturation.
[0023] Preferably, the textile pattern exported by the export module is the textile pattern generated by the pattern presentation module or the textile pattern after effect adjustment.
[0024] To achieve the above-mentioned invention purpose, the embodiment also provides a method for designing a textile pattern based on a wallpaper group. The method uses the above-mentioned design system. The design method includes:
[0025] The user uploads an image, uses a sampling frame to select a sampling area in the uploaded image, and selects a style processing scheme in the style processing module at the same time;
[0026] Use the sampling module to automatically extract the sampling area and obtain the position coordinates, texture coordinates, and texture of the sampling area;
[0027] Use the pattern presentation module to generate a textile pattern according to the position coordinates, texture coordinates, and texture of the sampling area and the style processing scheme selected by the user, and adopt the adjustment method of the wallpaper group;
[0028] Use a post - processing module to adjust the effect of the textile pattern;
[0029] Use an export module to export the textile pattern.
[0030] Compared with the prior art, the beneficial effects of the present invention at least include:
[0031] The provided textile pattern design system, based on the selected style processing scheme and sampling area, can automatically generate a seamless repeating pattern through the pattern presentation module, and also supports the adjustment of the seamless repeating pattern. In this way, after the designer uploads a picture to the system, a beautiful textile pattern can be obtained only by adjusting parameters for subsequent production. It is simple and easy to use, greatly improving the design efficiency of textile patterns. BRIEF DESCRIPTION OF THE DRAWINGS
[0032] In order to more clearly illustrate the technical solutions in the embodiments of the present invention or the prior art, the following will briefly introduce the drawings required for use in the description of the embodiments or the prior art. Obviously, the following drawings are only some embodiments of the present invention. For those of ordinary skill in the art, other drawings can be obtained based on these drawings without creative efforts.
[0033] Figure 1 is a structural schematic diagram of a textile pattern design system based on wallpaper groups provided by an embodiment;
[0034] Figure 2 is a system interface diagram provided by an embodiment;
[0035] Figure 3 is a division schematic diagram of a triangle combination provided by an embodiment;
[0036] Figure 4 is a transformation operation schematic diagram of a triangle combination provided by an embodiment;
[0037] Figure 5 is another system interface diagram provided by an embodiment. DETAILED DESCRIPTION OF THE EMBODIMENTS
[0038] To make the purpose, technical solutions and advantages of the present invention more clear, the following will further describe the present invention in detail with reference to the drawings and embodiments. It should be understood that the specific embodiments described herein are only used to explain the present invention and do not limit the protection scope of the present invention.
[0039] In order to solve the problem of low design efficiency in the existing design of textile patterns, an embodiment provides a textile pattern design system and method based on wallpaper groups.
[0040] As Figure 1As shown in the figure, the textile pattern design system based on wallpaper groups provided by the embodiment includes a style processing module 1, a sampling module 2, a pattern presentation module 3, a post-processing module 4, and an export module 5. Through these five modules, the rapid design of textile patterns can be achieved.
[0041] The style processing module 1 is used to provide an adjustable sampling frame and style processing schemes for users to choose from. As Figure 2 shown, the style processing module 1 can provide at least one sampling frame, and the size of the sampling frame is adjustable. The style processing schemes include texture types and sub-parameters related to the texture types. The texture types include the four-way continuous type and the non-four-way continuous type. The sub-parameters related to the texture types include rotation, number of iterations, angle, position, edge fusion, etc., which are adjustable. Among them, rotation means rotating the textile pattern. The number of iterations means the number of times of sampling and dividing the area to generate the textile pattern. Each sampling is based on the previous textile pattern, that is, sampling and dividing the area of the previous textile pattern, then dividing the divided area into triangle combinations, and then constructing a single rectangular tile. Angle means adjusting the angle of the components of a single rectangular tile. Position means adjusting the shape, size, and position of the triangle combination in the divided area. Edge fusion means fusing the edges of a single rectangular tile, and the tiled sampling frame of the edge-fused rectangular tiles obtains the textile pattern.
[0042] After the user selects the texture type and configures the sub-parameters, a style processing scheme is formed.
[0043] The sampling module 2 extracts the sampling area from the uploaded image based on the sampling frame, and obtains the position coordinates, texture coordinates, and texture of the sampling area. The user selects the desired sampling area by dragging and adjusting on the uploaded image. When the sampling area is determined, the position coordinates, texture coordinates, and texture of the sampling area can be calculated. These position coordinates, texture coordinates, and texture are used for the subsequent generation of textile patterns. The sampling module 2 also converts the calculated position coordinates, texture coordinates, and texture into a format available for the graphics library. In the embodiment, the sampling module uses the HTML5 img tag and upload tag to upload and present the image.
[0044] The pattern presentation module 3 is used to generate a textile pattern by adjusting the wallpaper group according to the position coordinates, texture coordinates, and texture of the sampling area and the style processing scheme selected by the user. In the embodiment, generating a textile pattern includes (1) generating a single rectangular tile, and (2) filling the entire sampling area with rectangular tiles of the same specification and then rendering to obtain the textile pattern.
[0045] Among them, the steps of generating a single rectangular tile are relatively complex, specifically including: First, divide the selected divided area into multiple triangle combinations according to the sampling method corresponding to the texture type, determine the texture of the triangle according to the texture of the sampling area, determine the position coordinates of the triangle according to the position coordinates of the sampling area, and determine the texture coordinates of the triangle according to the texture coordinates of the sampling area. Among them, the shape of the triangle itself corresponds to the position coordinates, and the offset of the triangle relative to the upper left corner of the sampling area corresponds to the texture coordinates;
[0046] Then, after performing at least one of the transformation operations of stretching, mirroring, and rotation on a single triangle combination according to the sub-parameters related to the texture type and the texture coordinates, adjust it multiple times using the adjustment method of the wallpaper group to obtain a single rectangular tile with a four-way continuous pattern.
[0047] In the embodiment, the transformation operations corresponding to different texture types are different, but generally they are at least one of stretching, mirroring, and rotation. Sub-parameters such as the angle, scaling factor, and number of iterations in the style processing scheme affect the details of the transformation operation.
[0048] Taking the octagon texture as an example, first select a divided area in the sampling area, and divide the divided area into two triangle combinations as shown in Figure 3 according to the sampling method corresponding to the octagon texture, and take the upper left corner of the sampling area as the origin to obtain the texture coordinates of the two triangles.
[0049] Since the obtained tile is rectangular, transformation operations such as stretching, mirroring, and rotation need to be performed on the triangle combination. For the two triangle combinations corresponding to the octagon texture, perform four mirroring operations in the manner shown in Figure 4 to obtain a four-way continuous textile pattern, where notations such as A, B, C, and D correspond to different texture coordinates.
[0050] As shown in Figure 4 , the rectangular tile obtained by performing two mirroring operations from (a)-(e) is a rectangular tile, but it is impossible to achieve four-way continuity when tiling the entire sampling plane with such a rectangular tile because the texture coordinates "D" at the upper right corner of the rectangular tile in (e) are not the same as the texture coordinates "C" at its upper left corner, and the obtained pattern is discontinuous. To achieve the four-way continuous effect, two more mirroring operations need to be continued. In the embodiment, use the transformation method of the PMM group in the wallpaper group to perform two more operations on the basis of (e) in Figure 4 to obtain the four-way continuous single rectangular tile shown in (i) in Figure 4 .
[0051] The rotational symmetry degree of an ordinary PMM group is 4, that is, the image obtained by rotating a rotation center by 90° is equivalent to the original image. Before adopting the PMM group in the embodiments of the present invention, two mirror image processes are performed. These two mirror image processes are used as a preprocessing process. On the basis of this preprocessing, an extended enhancement is performed by adopting the adjustment method of the wallpaper group, and a textile pattern with a symmetry degree of 8 such as an octagonal pattern can be obtained.
[0052] Of course, the pattern presentation module 3 can also generate non-tessellated rectangular tiles, and transformation operations can be performed through a combination of triangles.
[0053] In the embodiment, after filling the entire sampling area with rectangular tiles of the same specification and then performing rendering, it includes: determining the position coordinates of the rectangular tiles according to the position coordinates of the triangles, filling the entire sampling area with rectangular tiles of the same specification according to the position coordinates of the rectangular tiles, and then performing rendering on the basis of the original texture according to the selected pattern type to obtain a textile pattern. Specifically, when rendering, HTML5 canvas is used for rendering. When filling with tessellated rectangular tiles, a tessellated textile pattern can be obtained. When filling with non-tessellated rectangular tiles, a non-tessellated textile pattern can be obtained.
[0054] The image presentation module 3 also provides an interactive operation function, and based on this interactive operation function, zooming and moving operations of the textile pattern can be realized.
[0055] The subsequent processing module 4 is used for adjusting the effect of the textile pattern. As Figure 5 shown, the effects of adjusting the textile pattern include grayscale, shadow, gradient, duotone, distortion, color-related parameters, halftone, overexposure, pixelation, edge highlighting, dot matrix, color separation, where the color-related parameters include brightness, contrast, and saturation. The subsequent processing module 4 can adopt HTML5 canvas and WebGL technologies, and realize the subsequent processing effect from image to image through a shader program.
[0056] The export module 5 is used to export the textile pattern into a common image format for subsequent use by designers. The specifically exported textile pattern can be the textile pattern generated by the pattern presentation module 3, or it can also be the textile pattern after effect adjustment. Specifically, when implementing, the capabilities of HTML5 canvas are used.
[0057] The above-mentioned textile pattern design system based on the wallpaper group provided by the embodiment is integrated in the client and presented through a web program. The web program only needs a browser installed in the user device to be used, and can be used on personal computers and mobile devices without installation and without installing an update package, which is convenient to use.
[0058] Integrating image processing functions in web programs mainly involves HTML5 Canvas and WebGL. Given that WebGL is relatively low-level and requires writing a lot of code to use, the three.js library, which is a wrapper of WebGL, is used.
[0059] The textile pattern design system based on wallpaper groups provided by the embodiment aims to output an image file in a standard format for subsequent use by designers. Through this system, designers can generate design patterns in a simple and easy-to-use manner, that is, by uploading pictures - adjusting the position of the sampling frame - selecting a style processing scheme - selecting subsequent processing parameters, and can also make fine-tuning. The texture rules in the style processing in the system are based on wallpaper groups, supporting the generation of periodically repeating textile patterns and non-periodically repeating textile patterns. The integrated wallpaper groups can also inspire new designers in terms of design knowledge. The system is simple and easy to use, and can solve the pain points of designers spending a lot of time and effort in designing patterns.
[0060] The embodiment also provides a textile pattern design method based on wallpaper groups. This design method uses the above design system and specifically includes the following steps:
[0061] Step 1, the user uploads an image, uses a sampling frame to select a sampling area in the uploaded image, and at the same time selects a style processing scheme in the style processing module;
[0062] Step 2, the sampling module automatically extracts the sampling area and obtains the position coordinates, texture coordinates, and texture of the sampling area;
[0063] Step 3, the pattern rendering module generates a textile pattern using the adjustment method of wallpaper groups according to the position coordinates, texture coordinates, and texture of the sampling area and the style processing scheme selected by the user;
[0064] Step 4, the subsequent processing module adjusts the effect of the textile pattern;
[0065] Step 5, the export module exports the textile pattern.
[0066] Each time the effect parameters are adjusted, it will be re-rendered, with strong interactivity and feedback.
[0067] The above specific implementation manners have detailed the technical solutions and beneficial effects of the present invention. It should be understood that the above is only the most preferred embodiment of the present invention and is not used to limit the present invention. Any modifications, supplements, equivalent replacements, etc. made within the scope of the principles of the present invention should be included within the protection scope of the present invention.
Claims
1. A textile pattern design system based on wallpaper groups, characterized in that, It includes a style processing module, a sampling module, a pattern rendering module, a post-processing module, and an export module; The style processing module is used to provide an adjustable sampling frame and a style processing scheme for the user to select; The sampling module is used to extract a sampling area from the uploaded image based on the sampling frame, and obtain the position coordinates, texture coordinates, and texture of the sampling area; The pattern rendering module is used to generate a textile pattern by adjusting the wallpaper group according to the position coordinates, texture coordinates, and texture of the sampling area and the style processing scheme selected by the user. Generating a textile pattern includes generating a single rectangular tile, filling the entire sampling area with rectangular tiles of the same specification, and then rendering to obtain the textile pattern; Generating a single rectangular tile includes: First, dividing the selected divided area into multiple triangle combinations according to the sampling method corresponding to the pattern type, determining the texture of the triangle according to the texture of the sampling area, determining the position coordinates of the triangle according to the position coordinates of the sampling area, and determining the texture coordinates of the triangle according to the texture coordinates of the sampling area. Among them, the position coordinates correspond to the shape of the triangle itself, and the offset of the triangle relative to the upper left corner of the sampling area corresponds to the texture coordinates; Then, after performing at least one of the stretching, mirroring, and rotation transformation operations on the single triangle combination according to the sub-parameters related to the pattern type and the texture coordinates, and then performing multiple adjustments in the way of adjusting the wallpaper group, a single rectangular tile with a four-way continuous pattern is obtained; Determine the position coordinates of the rectangular tile according to the position coordinates of the triangle, fill the entire sampling area with rectangular tiles of the same specification according to the position coordinates of the rectangular tile, and then render according to the selected pattern type on the basis of the original texture to obtain the textile pattern; The post-processing module is used to adjust the effect of the textile pattern; The export module is used to export the textile pattern.
2. The textile pattern design system based on wallpaper groups according to claim 1, characterized in that, The size of the sampling frame can be adjusted; The style processing scheme includes the pattern type and sub-parameters related to the pattern type.
3. The textile pattern design system based on wallpaper groups according to claim 2, characterized in that, The sub-parameters related to the pattern type include rotation, number of iterations, angle, position, edge fusion, and the sub-parameter values can be adjusted.
4. The textile pattern design system based on wallpaper groups according to claim 1, characterized in that The effects of adjusting the textile pattern include grayscale, shadow, gradient, duotone, distortion, color-related parameters, halftone, overexposure, pixelation, edge highlighting, dot matrix, and color separation.
5. The textile pattern design system based on wallpaper groups according to claim 1, characterized in that, The textile pattern exported by the export module is the textile pattern generated by the pattern rendering module or the textile pattern after effect adjustment.
6. A method for designing textile patterns based on wallpaper groups, characterized in that, The method uses the design system described in any one of claims 1-⑤, and the design method includes: The user uploads an image, uses the sampling frame to select a sampling area in the uploaded image, and selects a style processing scheme in the style processing module at the same time; Automatically extract the sampling area by using the sampling module and obtain the position coordinates, texture coordinates, and texture of the sampling area; The pattern presentation module generates a textile pattern by processing the position coordinates, texture coordinates, texture, and the selected style processing solution of the sampling area, and adopting the adjustment method of wallpaper group; wherein, generating the textile pattern includes generating a single rectangular tile, filling the entire sampling area with rectangular tiles of the same specification and then rendering to obtain the textile pattern; Generating a single rectangular tile includes: First, dividing the selected divided area into multiple triangle combinations according to the sampling method corresponding to the pattern type, determining the texture of the triangles according to the texture of the sampling area, determining the position coordinates of the triangles according to the position coordinates of the sampling area, and determining the texture coordinates of the triangles according to the texture coordinates of the sampling area. Among them, the position coordinates correspond to the shape of the triangle itself, and the offset of the triangle relative to the upper left corner of the sampling area corresponds to the texture coordinates; Then, after performing at least one of the transformation operations of stretching, mirroring, and rotation on the single triangle combination according to the sub-parameters related to the pattern type and the texture coordinates, and then performing multiple adjustments by adopting the adjustment method of wallpaper group, a single rectangular tile with four-way continuity is obtained; Determine the position coordinates of the rectangular tile according to the position coordinates of the triangle, fill the entire sampling area with rectangular tiles of the same specification according to the position coordinates of the rectangular tile, and then render according to the selected pattern type on the basis of the original texture to obtain the textile pattern; Use the subsequent processing module to adjust the effect of the textile pattern; Use the export module to export the textile pattern.
Citation Information
Patent Citations
Pattern design system
CN112487516A
Efficient composition and rendering of graphical elements
CN105393282A
Textile flaw detection method based on lattice patterns and lattice pattern area characteristics
CN107248152A