Light-emitting device and insoluble film

Abstract

The light-emitting device includes a light-emitting element and an insoluble film (6) covering the light-emitting element. The insoluble film (6) has an inorganic insoluble layer (26) and an organic insoluble layer (27). The organic insoluble layer (27) contains a polymer material having an inorganic atom in the molecular chain and at least one of a nitrogen atom and an oxygen atom.

Description

Technical Field

[0001] The present invention relates to a light-emitting device including an insoluble film covering a light-emitting element and the insoluble film. Background Art

[0002] Light-emitting elements are generally susceptible to the influence of moisture or the like, and their characteristics deteriorate due to reaction with trace amounts of moisture or the like, impairing the driving life of the light-emitting device.

[0003] Therefore, in order to prevent foreign substances such as moisture from penetrating into the light-emitting element, for example, a technique of sealing the light-emitting element by forming an insoluble film on the light-emitting element is known (for example, refer to Patent Document 1).

[0004] Prior Art Documents

[0005] Patent Documents

[0006] Patent Document 1: Japanese Patent Laid-Open Gazette "JP-A-2017-224508" Summary of the Invention

[0007] Technical Problem to be Solved by the Invention

[0008] For example, as shown in Patent Document 1, the insoluble film generally has a structure in which a first inorganic insoluble layer and a second inorganic insoluble layer are laminated with an organic insoluble layer interposed therebetween. This will be described in more detail later. For this reason, the following reasons can be cited.

[0009] For example, as shown in Patent Document 1, the first inorganic insoluble layer and the second inorganic insoluble layer use inorganic insulating films such as silicon nitride films. In addition, for example, as shown in Patent Document 1, the organic insoluble layer uses a resin such as an acrylic resin.

[0010] Inorganic insulating films such as silicon nitride films used as the first inorganic insoluble layer and the second inorganic insoluble layer have a higher barrier property against foreign substances such as moisture than organic insulating films used for the organic insoluble layer, but have more defects (holes). Resins such as acrylic resins, which are currently commonly used as the organic insoluble layer, have low adhesiveness to the inorganic insoluble layer and cannot sufficiently fill the defects of the inorganic insoluble layer.

[0011] Therefore, if the inorganic insoluble layer is made into one layer, the barrier effect such as the moisture-proof effect is greatly reduced. Therefore, at present, it is necessary to form inorganic insoluble layers on the lower side and the upper side of the organic insoluble layer, respectively.

[0012] However, since the inorganic insoluble layer such as a silicon nitride film is formed by CVD (chemical vapor deposition), a high-vacuum device is required and the film-forming cost is high. In addition, the more the number of layers, the more time is required for manufacturing. Therefore, it is desired to reduce the number of laminated inorganic insoluble layers.

[0013] One aspect of the present disclosure is achieved in view of the above problems, and an object thereof is to provide a light-emitting device having a high blocking effect even when only one layer of an inorganic insoluble layer is provided and a long driving life, and an insoluble film having a high blocking effect even when only one layer of an inorganic insoluble layer is provided.

[0014] Technical solutions for solving technical problems

[0015] In order to solve the above problems, a light-emitting device according to an aspect of the present disclosure includes: a light-emitting element and an insoluble film covering the light-emitting element. The insoluble film has one layer of an inorganic insoluble layer and one layer of an organic insoluble layer. The organic insoluble layer contains a polymer material having an inorganic atom in a molecular chain and at least one of a nitrogen atom and an oxygen atom.

[0016] In order to solve the above problems, an insoluble film according to an aspect of the present disclosure has one layer of an inorganic insoluble layer and one layer of an organic insoluble layer. The organic insoluble layer contains a polymer material having an inorganic atom in a molecular chain and at least one of a nitrogen atom and an oxygen atom.

[0017] Advantageous effects

[0018] According to an aspect of the present disclosure, it is possible to provide a light-emitting device having a high blocking effect even when only one layer of an inorganic insoluble layer is provided and a long driving life, and an insoluble film having a high blocking effect even when only one layer of an inorganic insoluble layer is provided. Description of the drawings

[0019] Figure 1 It is a cross-sectional view schematically showing the configuration of a main part of the insoluble film according to Embodiment 1.

[0020] Figure 2 It is a flowchart showing an example of a manufacturing method of a display device according to Embodiment 1.

[0021] Figure 3 It is a cross-sectional view showing an example of a schematic configuration of a main part of the display device according to Embodiment 1.

[0022] Figure 4 It is a cross-sectional view showing an example of a schematic configuration of the display device according to Embodiment 1.

[0023] Figure 5 It is a cross-sectional view schematically showing problems of a conventional insoluble film. Detailed description of the invention

[0024] [Embodiment 1]

[0025] Hereinafter, an embodiment of the present invention will be described in detail. In addition, hereinafter, as an example of the light-emitting device related to the present disclosure, a display device including a plurality of light-emitting elements will be described as an example. However, the present disclosure is not limited thereto, and the above-described light-emitting device may also be a display device or a lighting device including one or more light-emitting elements, etc.

[0026] In addition, in the following description, "the same layer" means a layer formed in the same process (film formation process). "Lower layer" refers to a layer formed in an earlier process than the layer being compared. "Upper layer" refers to a layer formed in a later process than the layer being compared. In addition, regarding the description of "A B" for two numbers A and B, unless otherwise specified, it means "A or more and B or less".

[0027] (Manufacturing method and schematic configuration of the display device)

[0028] Figure 2 is a flowchart showing an example of the manufacturing method of the display device 2 according to the present embodiment. Figure 3 is a cross-sectional view showing an example of the schematic configuration of the main part of the display device 2 according to the present embodiment. Figure 4 is a cross-sectional view showing an example of the schematic configuration of the display device 2 according to the present embodiment.

[0029] As Figure 2 and Figure 3 shown, when manufacturing the flexible display device 2, first, a resin layer 12 is formed on a light-transmissive support substrate (for example, mother glass) (not shown) (step S1). Next, a barrier layer 3 is formed (step S2). Next, a thin-film transistor (TFT) layer 4 is formed (step S3). Next, a light-emitting element layer 5 is formed (step S4). Next, an insoluble film 6 (Encapsulation Layer) is formed as a sealing layer (step S5). Next, an upper surface film 7 is pasted on the insoluble film 6 (step S6).

[0030] Next, the support substrate is peeled off from the resin layer 12 by irradiation with a laser or the like (step S7). Next, the lower surface film 10 is pasted on the lower surface of the sealing layer 12 (step S8). Next, the laminate including the lower surface film 10, the resin layer 12, the barrier layer 3, the thin film transistor layer 4, the light emitting element layer 5, the insoluble film 6, and the upper surface film 7 is cut to obtain a plurality of single pieces (step S9), and at the same time, a part of the upper surface film 7 is also cut off. Next, on the obtained single piece, the upper surface film 7 on the terminal portion of the thin film transistor layer 4 is peeled off, and terminal protrusion is performed (step S10). The terminal portion is formed in a part of the thin film transistor layer 4 that is more outside (non-display region NDA, border region) than the display region DA where a plurality of sub-pixels are formed. Next, the functional film 8 is pasted on the upper surface film 7 in the display region DA (step S11). Next, the electronic circuit substrate 41 is mounted on the terminal portion using an ACF (anisotropic conductive film) (step S12). In addition, each of the above steps is performed by a manufacturing apparatus for a display device (including a film forming apparatus that performs each process of steps S1 to S5).

[0031] Examples of the material of the resin layer 12 include, for example, PI (polyimide). A part of the resin layer 12 can be replaced with two resin films (for example, polyimide films) and an inorganic insulating film sandwiched therebetween.

[0032] The barrier layer 3 is a layer that prevents foreign substances such as water and oxygen from entering the thin film transistor layer 4 and the light emitting element layer 5, and can be formed, for example, of a silicon oxide film (SiO x ) formed by CVD method, a silicon nitride film (SiN x ), a silicon oxynitride film (SiON), or a laminate film of these layers.

[0033] As Figure 3 shown, the thin film transistor layer 4 includes a semiconductor film 15, an inorganic insulating film 16 (gate insulating film) that is more upper than the semiconductor film 15, a gate GE and a gate wiring GH that are more upper than the inorganic insulating film 16, an inorganic insulating film 18 that is more upper than the gate GE and the gate wiring GH, a capacitor electrode CE that is more upper than the inorganic insulating film 18, an inorganic insulating film 20 that is more upper than the capacitor electrode CE, a source wiring SH that is more upper than the inorganic insulating film 20, and a planarization film 21 (interlayer insulating film) that is more upper than the source wiring SH.

[0034] The semiconductor film 15 is made of, for example, low temperature polycrystalline silicon (LTPS) or an oxide semiconductor (for example, In-Ga-Zn-O-based semiconductor), and the transistor (thin film transistor) is configured to include the semiconductor film 15 and the gate GE. In Figure 3 , the transistor is shown as a top gate structure, but it can also be a bottom gate structure.

[0035] The gate GE, gate wiring GH, capacitor electrode CE, and source wiring SH are formed of a single-layer film or a laminated film of a metal containing, for example, at least one of aluminum, tungsten, molybdenum, tantalum, chromium, titanium, and copper. Figure 3 The thin-film transistor layer 4 includes a semiconductor layer and three metal layers.

[0036] The inorganic insulating films 16, 18, and 20 can be formed of, for example, a silicon oxide (SiO x ) film, a silicon nitride (SiN x ) film, or a silicon oxynitride (SiON) film, or a laminated film thereof. The planarization film 21 can be formed of an organic material such as polyimide or an acrylic resin that can be coated.

[0037] The light-emitting element layer 5 includes an anode 22, an insulating edge mask 23, an EL (electroluminescent) layer, which is an active layer 24, located above the edge mask 23, and a cathode 25. Either the anode 22 or the cathode 25 is an island-shaped electrode (so-called "pixel electrode") provided for each light-emitting element ES (in other words, each sub-pixel), and the other is a common electrode shared by a plurality of light-emitting elements ES (in other words, a plurality of sub-pixels). In Figure 3 As an example, it is shown that the anode 22 is an island-shaped lower electrode provided on the planarization film 21, and the cathode 25 is a common upper electrode provided above the lower electrode with the active layer 24 and the edge mask 23 interposed therebetween.

[0038] The edge mask 23 covers the edge of the anode 22, which is an island-shaped lower electrode. The edge mask 23 is formed, for example, by patterning after coating an organic material such as polyimide or an acrylic resin using photolithography.

[0039] In each sub-pixel, a light-emitting element ES (electroluminescent element) including an island-shaped cathode 22, an active layer 24, and an anode 25 is formed in the light-emitting element layer 5, and a sub-pixel circuit for controlling the light-emitting element ES is formed in the thin-film transistor layer 4.

[0040] The display device 2 has, for example, red sub-pixels, green sub-pixels, and blue sub-pixels as sub-pixels. A red light-emitting element that emits red light is provided as the light-emitting element ES in the red sub-pixel. A green light-emitting element that emits green light is provided as the light-emitting element ES in the green sub-pixel. A blue light-emitting element that emits blue light is provided as the light-emitting element ES in the blue sub-pixel. However, the above-described emission colors are merely examples and are not limited to the above-described emission colors. In addition, the display device 2 may also be a display device that emits monochromatic light.

[0041] As the light-emitting element ES, for example, an OLED (organic light-emitting diode) element, a QLED (quantum dot light-emitting diode) element, etc. can be cited.

[0042] The active layer 24 is formed by laminating, for example, a hole injection layer (HIL), a hole transport layer (HTL), a light-emitting layer (EML), an electron transport layer (ETL), and an electron injection layer (EIL) in this order from the lower layer side.

[0043] The red light-emitting element has a red EML that emits red light as a quantum dot. The green light-emitting element has a green EML that emits green light as a quantum dot. The blue light-emitting element has a blue EML that emits blue light as a quantum dot. Therefore, the EML is formed in an island shape at the opening (each sub-pixel) of the edge mask 23 by a vapor deposition method, an inkjet method, or the like. The other layers are formed in an island shape or over the entire surface (common layer).

[0044] In addition, it can also be configured not to form one or more of the HIL, HTL, ETL, and EIL. Further, the active layer 24 may include a layer other than the HIL and HTL, such as an electron blocking layer (EBL), between the anode 22 and the EML. Additionally, the active layer 24 may include a layer other than the EIL and ETL, such as a hole blocking layer (HBL), between the cathode 25 and the EML.

[0045] When forming the EML of the OLED element by vapor deposition, an FMM (fine metal mask) is used. The FMM is a sheet having a large number of openings (for example, made of an invar steel material), and an island-shaped EML (corresponding to one sub-pixel) is formed by an organic substance passing through one opening.

[0046] By inkjet coating a solvent that diffuses quantum dots, the EML of the QLED can be formed as an island-shaped EML (corresponding to one sub-pixel).

[0047] At least one of the anode 22 and the cathode 25 is made of a light-transmissive material. In addition, either the anode 22 or the cathode 25 may be formed of a light-reflective material. In the case where the display device 2 is a top-emission type display device, the upper electrode located on the upper layer side is formed of a light-transmissive material, and the lower electrode located on the lower layer side is formed of a light-reflective material. In the case where the display device 1 is a bottom-emission type display device, the upper electrode is formed of a light-reflective material, and the lower electrode is formed of a light-transmissive material.

[0048] In Figure 3Among them, as an example, the case where the display device 2 is a top-emitting type display device is illustrated. In this case, the anode 22 uses a reflective electrode (light-reflective electrode) having light reflectivity, which is formed by laminating, for example, ITO (indium tin oxide) and Ag (silver) or an Ag-containing alloy. The cathode 25 uses a transparent electrode (light-transmissive electrode) made of a light-transmissive conductive material such as a thin film of silver (Ag), gold (Au), platinum (Pt), nickel (Ni), iridium (Ir), a thin film of MgAg alloy, ITO, or IZO (indium zinc oxide). In the case where the display device 2 is a bottom-emitting type display device, the lower surface film 10 and the resin layer 12 have light transmissivity, the anode 22 is a transparent electrode, and the cathode 25 is a reflective electrode.

[0049] In addition, in the case where the lamination order from the anode 22 to the cathode 25 is reversed, by setting the anode 22 as the upper electrode to be a transparent electrode and the cathode 25 as the lower electrode to be a reflective electrode, the display device 2 can be made into a top-emitting type. Also, by setting the anode 22 as the upper electrode to be a reflective electrode and the cathode 25 as the lower electrode to be a transparent electrode, the display device 2 can become a bottom-emitting type.

[0050] In the case where the light-emitting element ES is an OLED element, holes and electrons are recombined in the EML by the driving current between the anode 22 and the cathode 25, and light is emitted during the process in which the generated excitons migrate to the ground state. Figure 3 In the shown display device 2, since the cathode 25 is a transparent electrode and the anode 22 is a reflective electrode, the light emitted from the active layer 24 is directed upward, becoming top emission.

[0051] In the case where the light-emitting element ES is a QLED element, holes and electrons are recombined in the EML by the driving current between the anode 22 and the cathode 25, and light (fluorescence) is emitted during the process in which the generated excitons transition from the conduction band energy level to the valence band energy level of the quantum dots.

[0052] In the light-emitting element layer 5, as the light-emitting element ES, light-emitting elements other than the above-mentioned OLED and QLED (such as inorganic light-emitting diodes) can be formed.

[0053] The insoluble film 6 covers the light-emitting element layer 5. More specifically, the insoluble film 6 covers the plurality of light-emitting elements ES in a manner of sealing the plurality of light-emitting elements ES. The insoluble film 6 is sometimes also referred to as TFE (Thin Film Encapsulation) or a sealing film. The insoluble film 6 prevents foreign substances such as moisture, oxygen, and dust generated in the manufacturing process and other unnecessary organic substances from invading the light-emitting element layer 5. The insoluble film 6 uses, for example, a light-transmissive insoluble film. In addition, the insoluble film 6 will be described in detail later.

[0054] The upper surface film 7 is adhered to the insoluble film 6 and functions as a support material when peeling the support substrate. As the material of the upper surface film 7, for example, PET (polyethylene terephthalate) can be cited.

[0055] The lower surface film 10 is, for example, a PET film for a display device that achieves excellent flexibility by being attached to the lower surface of the resin layer 12 after peeling the support substrate.

[0056] The functional film 8 has, for example, at least one of an optical compensation function, a touch sensor function, and a protection function. The electronic circuit substrate 41 mounted on the terminal portion is, for example, an IC (integrated circuit) chip or an FPC (flexible printed circuit).

[0057] In addition, in the above description, a flexible display device has been described. However, in the case of manufacturing a non-flexible display device, generally, formation of the resin layer 12, replacement of the substrate, etc. are not required. Therefore, in the case of manufacturing a non-flexible display device, for example, steps S2 to S5 of the lamination process are performed on a glass substrate, and then the process proceeds to step S9.

[0058] (Insoluble film 6)

[0059] Next, the insoluble film 6 will be described in more detail.

[0060] The insoluble film 6 includes an inorganic insoluble layer 26 (inorganic layer) covering the cathode 25 and an organic insoluble layer 27 (organic layer) that is further above the inorganic insoluble layer 26.

[0061] The inorganic insoluble layer 26 has a barrier function of preventing foreign substances such as moisture, oxygen, and excess organic substances from entering the light-emitting element layer 5, and functions as a barrier layer for preventing deterioration of the light-emitting element ES caused by these foreign substances.

[0062] The inorganic insoluble layer 26 is composed of, for example, an inorganic insulating film such as silicon nitride (SiN x ), silicon oxynitride (SiON), or silicon oxide (SiO x ). Among them, as the above-mentioned inorganic insoluble layer 26, SiN x (x = 1 or 2) as a nitride (insulating nitride) is more preferable. The SiN x film has a denser structure than the SiON film and the SiO x film, and it is more difficult for moisture and oxygen to permeate compared to the SiON film and the SiO x film.

[0063] The inorganic insoluble layer 26 is formed, for example, by a CVD method. On the other hand, in order to minimize the number of defects and to suppress a reduction in the transmittance of the display device 2, the thickness of the inorganic insoluble layer 26 is preferably greater than 0.05 μm and 5 μm or less, more preferably 0.1 μm or more and 3 μm or less.

[0064] The organic insoluble layer 27 is a light-transmitting organic insulating film that is thicker than the inorganic insoluble layer 26 and has a planarizing effect. The organic insoluble layer 27 functions as a buffer layer (stress relaxation layer) that fills the holes of the pinholes, fills the stepped portions, foreign substances, etc. on the surface of the light-emitting element layer 5 in the display region DA, and relieves the stress of the inorganic insoluble layer 26 having a large film stress. Therefore, the thickness of the organic insoluble layer 27 is preferably within the range of 0.5 to 10 μm.

[0065] As the material of the organic insoluble layer 27, for example, a photosensitive polymer material having light transmittance is used. The above-mentioned polymer material is preferably a mixed polymer material containing an inorganic component and an organic component. For example, as the inorganic main chain, it is preferable that the main chain contains inorganic atoms and includes a polymer material having an organic group as a side chain (side group). In addition, it is more preferable that the above-mentioned polymer material has a nitrogen atom in the main chain. In addition, the above-mentioned polymer material more preferably has at least one of an inorganic atom, a nitrogen atom, and an oxygen atom in the molecular chain (structural unit, repeating unit), and polyphosphazene is particularly preferable.

[0066] The above-mentioned organic insoluble layer 27 can be formed, for example, from a mixed material of polyphosphazene and a (meth)acrylic polymer, or can be formed only from polyphosphazene. In other words, the above-mentioned organic insoluble layer 27 can be a polymer mixed film containing polyphosphazene and a (meth)acrylic polymer, or can be a polyphosphazene film.

[0067] Polyphosphazene is a high molecular compound having a double bond between P and N and having a structure in which phosphorus (P) atoms and nitrogen (N) atoms are alternately bonded. In the present embodiment, as polyphosphazene, as described above, a mixed polyphosphazene containing inorganic atoms in the main chain and having an organic group as a side chain (side group) is used.

[0068] The above-mentioned polyphosphazene preferably has at least one of an inorganic atom, a nitrogen atom, and an oxygen atom in the molecular chain (structural unit, repeating unit) as described above.

[0069] As the polyphosphazene used in the present embodiment, for example, as shown in the following general formula (1), a mixed polyphosphazene having at least one of a nitrogen atom and an oxygen atom in the side chain in the molecular chain and containing an inorganic component and an organic component is preferably used.

[0070] [Chemical formula 1]

[0071]

[0072] In addition, in the above formula (1), R1 and R2 independently represent -O(CH 2 ) m CH 3 group, -NH(CH 2 ) m CH 3 group, -O(C 6 H 4 )CH 3 group, -NH(C 6 H 4 )CH 3 group, -O(CH 2 ) m CF 3 group, -NH(CH 2 ) m CF 3 group, -O(C 6 H 4 )C 2 H 5 group, -NH(C 6 H 4 )C 2 H 5 group, -O(CH 2 ) m F group, -NH(CH 2 ) m F group, -N{(CH 2 ) m CH 3} 2 group, -N{(C 6 H 4 )CH 3} 2 group, -N{(CH 2 ) m CF 3} 2 group, -N{(C 6 H 4 )C 2 H 5} 2 group, or -N{(CH 2 ) m F} 2 groups, and m independently represents an integer from 1 to 10.

[0073] In addition, in the above formula (1), the number of repeating units represented by n represents an integer from 1 to 3000.

[0074] In addition, in the above description, "independent of each other" or "independently and separately" means that they can be the same or different from each other. These polyphosphazenes can be used alone or two or more of them can be appropriately mixed and used.

[0075] Among these polyphosphazenes represented by the formula (1), in order to further increase the proportion of the inorganic component, polymers in which m is an integer of 1 to 3 are more preferably used. In addition, in this case, the above m can be the same as or different from each other.

[0076] Moreover, among these polyphosphazenes, polymers in which R1 and R2 are each -O(CH 2 ) 2 CH 3 group are particularly preferred; polymers in which R1 is -O(C 6 H 4 )CH 3 group and R2 is -NH(C 6 H 4 )CH 3 group; polymers in which R1 is -N(C 2 H 5 ) 2 group (that is, R1 is -N{(CH 2 )mCH 3} 2 group, m = 1), and R2 is -N{(C 6 H 4 ) 2 CH 5} 2 group. Among the polyphosphazenes represented by the above formula (1), by using these polyphosphazenes, only one layer of the inorganic insoluble layer 26 can be formed. Or, by using the above polyphosphazenes, the thickness of the organic insoluble layer 27 can be made thinner.

[0077] In addition, as the above (meth)acrylic polymer, a polymer ((co)polymer) of a (meth)acrylic monomer represented by the following general formula (2) is easy to form a film and has good compatibility with polyphosphazene, so it is preferably used.

[0078] [Chemical formula 2]

[0079]

[0080] In addition, in the above formula (2), R3 represents a hydrogen atom or a methyl group (-CH 3)。In addition, in the above formula (2), p represents an integer from 1 to 10. These (meth)acrylic monomers can be used alone or two or more of them can be appropriately mixed and used. That is, the above polymer can be a homopolymer of the (meth)acrylic monomer represented by the above formula (2), or a copolymer of the (meth)acrylic monomers represented by the above formula (2) with each other. In addition, the (meth)acrylic polymer formed by polymerizing (co-polymerizing) the above (meth)acrylic monomers can be used alone or two or more of them can be appropriately mixed and used.

[0081] When a mixed material of polyphosphazene and a (meth)acrylic polymer is used as the material of the above-mentioned organic insoluble layer 27, the mixing ratio (polyphosphazene: (meth)acrylic polymer) is preferably in the range of 1:8 to 2:1 by weight.

[0082] By making the above mixing ratio within the above range, polyphosphazene can be dissolved in the (meth)acrylic polymer, and the above-mentioned organic insoluble layer 27 can be formed by an inkjet method. Therefore, the above-mentioned organic insoluble layer 27 can be formed more simply. In addition, by making the above mixing ratio within the above range, the defects of the following inorganic insoluble layer 26 can be reliably filled, and a light-emitting device with high moisture resistance and long driving life can be provided.

[0083] As described above, the organic insoluble layer 27 can be formed by a coating method such as an inkjet method. For example, when the organic insoluble layer 27 is formed by an inkjet method, for example, after inkjet coating the ink containing the above-mentioned polymer material on the inorganic insoluble layer 26, it is cured by UV irradiation, thereby the organic insoluble layer 27 can be formed. In addition, a dam for suppressing droplets of the polymer material for forming the organic insoluble layer 27 can be provided in the non-display area NDA.

[0084] (Effect)

[0085] As described above, the insoluble film 6 of the present embodiment includes an inorganic layer and an organic layer respectively. As described above, the inorganic layer and the organic layer are laminated on the light-emitting element layer 5 in this order.

[0086] Figure 5 is a cross-sectional view schematically showing the problems of the conventional insoluble film 60. In addition, hereinafter, components having the same functions as the Figure 3 shown components are labeled with the same reference numerals, and their descriptions are omitted.

[0087] As Figure 5 shown, the existing insoluble film 60 generally has a structure in which an organic insoluble layer 62 is provided between a first inorganic insoluble layer 61 and a second inorganic insoluble layer 63 for the purpose of improving moisture resistance and improving the process.

[0088] The above-mentioned first inorganic insoluble layer 61 and second inorganic insoluble layer 63 use, for example, a silicon oxide film (SiO x ), a silicon nitride film (SiN x ), or a silicon oxynitride film (SiON). The above-mentioned organic insoluble layer 62 uses, for example, an acrylic polymer such as an acrylic resin.

[0089] In the conventional insoluble film 60, by laminating the first inorganic insoluble layer 61 and the second inorganic insoluble layer 63 with the organic insoluble layer 62 therebetween, the intrusion of foreign substances such as moisture, oxygen, and excess organic substances into the light-emitting element layer 5 is suppressed.

[0090] The first inorganic insoluble layer 61 and the second inorganic insoluble layer 63 have a higher barrier property against foreign substances such as moisture, oxygen, and organic substances than the organic insoluble layer 62, but have more defects (holes). In addition, in Figure 5 , as an example, the defect 161 (hole) in the first inorganic insoluble layer 61 is illustrated, but the second inorganic insoluble layer 63 also has many defects (holes) similarly to the first inorganic insoluble layer 61.

[0091] Therefore, the above-mentioned foreign substances invade the first inorganic insoluble layer 61 from the defect 161. Similarly, they also invade the second inorganic insoluble layer 63 from the defects of the second inorganic insoluble layer 63.

[0092] On the other hand, there are no such defects (holes) in the organic insoluble layer 62. The acrylic resin commonly used as the organic insoluble layer 62 can suppress the penetration (intrusion) of moisture, and can also suppress the intrusion of organic substances to some extent. However, the acrylic resin itself has a lower barrier property than inorganic insoluble layers such as the SiN x film. Moreover, the adhesion of the acrylic resin to inorganic insoluble layers such as the SiN x film is low. Therefore, a large number of gaps 162 are generated between the organic insoluble layer 62 and the first inorganic insoluble layer 61. Similarly, a large number of gaps similar to the gaps 162 are also generated between the organic insoluble layer 62 and the second inorganic insoluble layer 63. Therefore, the organic insoluble layer 62 may cause the penetration of moisture.

[0093] In addition, the organic insoluble layer 62 is usually formed by irradiating ultraviolet rays to cure it after film formation by coating. However, the current acrylic resin cannot sufficiently fill the defect 161 of the inorganic insoluble layer 61 by this method.

[0094] Therefore, if the inorganic insoluble layer is made into one layer, the barrier effects such as the moisture-proof effect are greatly reduced. Therefore, at present, it is necessary to form inorganic insoluble layers on the lower side and the upper side of the organic insoluble layer 62 respectively.

[0095] However, an inorganic insoluble layer such as an SiNx film is formed by CVD method, so a high-vacuum apparatus is required and the film-forming cost is high. In addition, the more the number of stacked layers, the more time is required for manufacturing. Therefore, it is desired to reduce the number of stacked inorganic insoluble layers.

[0096] On the other hand, in the present embodiment, as described above, as the organic insoluble layer 27, a film made of a polymer material containing an inorganic component and an organic component is formed as described above.

[0097] Figure 1 It is a cross-sectional view schematically showing the configuration of the main part of the insoluble film 6 according to the present embodiment. It should be noted that in Figure 1 As an example, the case where the organic insoluble layer 27 contains the aggregate 127 of polyphosphazene is illustrated.

[0098] SiN x Inorganic insoluble layers 26 such as etc. have high barrier properties against foreign substances such as moisture, oxygen, and organic substances, but as Figure 1 shown, it has a large number of defects 126 (holes). However, the aggregate 127 of polyphosphazene can fill the above-mentioned defects 126. In addition, as described above, polyphosphazene has an inorganic main chain and has N atoms on the main chain, so it has an affinity with nitrides such as SiN x and has good adhesiveness to these nitrides.

[0099] In addition, as shown by R1 and R2, by introducing an organic group into the aforementioned general formula (1) as a side chain of polyphosphazene, the affinity with a (meth)acrylic polymer can also be ensured. Therefore, even when the above-mentioned organic insoluble layer 27 contains a (meth)acrylic polymer as described above, the affinity between the inorganic insoluble layer 26 and the organic insoluble layer 27 is improved. In addition, in this case, the aggregate 127 of polyphosphazene also functions to fill the above-mentioned defects 126. Therefore, according to the present embodiment, in the case where the organic insoluble layer 27 is a mixed film of polyphosphazene and a (meth)acrylic polymer, or in the case of a polyphosphazene film, in either case, a structure having only one inorganic insoluble layer can be formed. According to the present embodiment, even when the insoluble film 6 has only one inorganic insoluble layer as an inorganic layer as described above, the invasiveness of foreign substances such as moisture permeability can be suppressed to a low level.

[0100] In addition, according to the present embodiment, by using the above-mentioned polyphosphazene in the organic insoluble layer 27, the organic insoluble layer 27 can be formed by a solution coating method, and moreover, only one inorganic insoluble layer that requires film formation by CVD method can be formed. Therefore, the productivity of the display device 2 can be improved.

[0101] Hereinafter, the effects of the insoluble film 6 according to the present embodiment will be described in more detail using examples and comparative examples. However, the present embodiment is not limited to the following examples.

[0102] [Example 1]

[0103] As the anode 22, on a substrate on which a reflective electrode formed by laminating silver and ITO is formed, under specified vapor deposition conditions, an HIL, an HTL, an EBL, a blue EML, an HBL, and an ETL with specified film thicknesses are sequentially vapor-deposited and laminated. Next, LiF is vapor-deposited as the EIL on the ETL, and then Mg and Ag are vapor-deposited on the EIL to form a cathode 25 composed of a thin film of an MgAg alloy. Thus, a top-emission type blue OLED element is fabricated.

[0104] Next, a 0.5 mm thick SiN film is formed as the inorganic insoluble layer 26 on the cathode 25 by sputtering.

[0105] Then, a mixed solution obtained by mixing polyphosphazene and an acrylic polymer in a weight ratio of 1:2 is coated on the inorganic insoluble layer 26, and UV light (ultraviolet light) with an intensity of 2 J / cm 2 is irradiated, thereby forming an organic insoluble layer 27 with a thickness of 3 mm. The above polyphosphazene uses polyphosphazene in which R1 and R2 in the above general formula (1) are -O(CH 2 ) 2 CH 3 groups and the weight average molecular weight is in the range of 5,000 to 100,000. The above acrylic polymer uses a polymer (i.e., a homopolymer) of an acrylic monomer in which R3 in the above general formula (2) is a hydrogen atom and p = 2. Thus, an insoluble film 6 in which the inorganic insoluble layer 26 composed of an SiN film and the organic insoluble layer 27 composed of a mixed film of the above polyphosphazene and the above acrylic polymer are sequentially laminated is formed on the blue OLED element.

[0106] The external quantum efficiency (EQE), chromaticity, and driving lifetime of the blue OLED element with the insoluble film 6 were evaluated. The EQE was calculated based on the evaluation results of the current-voltage-luminance characteristics. The chromaticity was measured using a luminance meter ("SR-400" manufactured by Topcom Corporation). In addition, in a high-humidity environment of 45°C and 90%, the change over time in the luminance when a driving current of 50 mA / cm 2 was applied to the blue OLED element was measured, and the time (h) when the luminance reached 90% of the initial luminance was used as the driving lifetime. The driving lifetime was measured using a lifetime measurement system manufactured by System Giken Co., Ltd.

[0107] [Comparative Example 1]

[0108] For comparison, the same operations as in Example 1 were carried out except that polyphosphazene was not used. Specifically, first, the same operations as in Example 1 were carried out to fabricate a top-emitting blue OLED device similar to that in Example 1. Next, the same operations as in Example 1 were carried out to form a 0.5-μm-thick SiN film as an inorganic insoluble layer on the above blue OLED device by sputtering method.

[0109] Thereafter, a homopolymer of the acrylic monomer in the general formula (2) where R3 is a hydrogen atom and p = 2 was coated on the above inorganic insoluble layer, and UV light (ultraviolet light) with an intensity of 2 J / cm 2 was irradiated to form an organic insoluble layer with a thickness of 3 mm. Thus, a contrast insoluble film was formed on the blue OLED device by sequentially laminating an inorganic insoluble layer composed of a SiN film and an organic insoluble layer composed of the above acrylic polymer.

[0110] After that, the EQE, chromaticity, and driving life of the blue OLED device with the contrast insoluble film were evaluated by the same method as in Example 1.

[0111] [Comparative Example 2]

[0112] First, the same operations as in Example 1 and Comparative Example 1 were carried out to fabricate a top-emitting blue OLED device similar to those in Example 1 and Comparative Example 1. Next, the same operations as in Comparative Example 1 were carried out to sequentially laminate an inorganic insoluble layer composed of a 0.5-μm-thick SiN film and an organic insoluble layer with a thickness of 3 μm composed of a homopolymer of the same acrylic monomer as in Comparative Example 1 on the above blue OLED device.

[0113] Next, a 0.5-μm SiN film was formed again as an inorganic insoluble layer on the above organic insoluble layer by sputtering method. Thus, on the blue OLED device, a first inorganic insoluble layer composed of a SiN film, an organic insoluble layer composed of the same acrylic polymer as in Comparative Example 1, and a second inorganic insoluble layer composed of a SiN film were sequentially laminated to form a contrast insoluble film.

[0114] After that, the EQE, chromaticity, and driving life of the blue OLED device with the contrast insoluble film were evaluated by the same method as in Example 1.

[0115] The EQE, chromaticity, and driving life of the blue OLED devices with insoluble films fabricated in Example 1 and Comparative Examples 1 and 2 are shown together in Table 1.

[0116] [Table 1]

[0117] EQE (%) Chromaticity (x, y) Drive life (h) Example 1 13.1 (0.14,0.05) 122 Comparative Example 1 13.2 (0.14,0.05) 65 Comparative Example 2 13.1 (0.14,0.05) 124

[0118] As shown in Table 1, there were hardly any differences in EQE and chromaticity under each condition of Example 1 and Comparative Examples 1 and 2. On the other hand, in the case of the insoluble film 6 having the organic insoluble layer 27 containing the polyphosphazene of Example 1, even when only one layer of SiN film was provided, a driving life equivalent to that of Comparative Example 2 provided with two layers of SiN film could be obtained. In addition, when only one layer of SiN film was provided and the organic insoluble layer was composed only of an acrylic polymer and did not contain polyphosphazene, the driving life was shorter compared to Example 1 containing polyphosphazene. From this result, it was confirmed that by introducing polyphosphazene into the organic insoluble layer composed of an acrylic polymer, the humidity resistance was improved and the life was prolonged.

[0119] 〔Example 2〕

[0120] First, the same operations as in Example 1 were performed to fabricate a plurality of top-emission type blue OLED elements similar to those of Example 1. Next, the same operations as in Example 1 were performed, and a 0.5-μm-thick SiN film was formed on each blue LED element by sputtering as an inorganic insoluble layer.

[0121] On the other hand, a mixed solution prepared by mixing the same polyphosphazene as in Example 1 and the same acrylic polymer as in Example 1 at weight ratios of 1:8, 1:4, 1:1, 2:1, and 4:1 was prepared. Then, the above mixed solution was coated on the inorganic insoluble layer 26 of each blue OLED element, and UV light of 2 J / cm 2 was irradiated to form a 3-μm-thick organic insoluble layer 27. Thus, a plurality of blue OLED elements with an insoluble film were fabricated on the blue OLED elements, and the insoluble film 6 was sequentially laminated with an inorganic insoluble layer 26 made of an SiN film and organic insoluble layers 27 with different mixing ratios of polyphosphazene and acrylic polymer.

[0122] However, in the mixed solution with a mixing ratio of 4:1, the above polyphosphazene was insoluble in the liquid acrylic polymer, and it was difficult to form the organic insoluble layer 27 by inkjet method. On the other hand, when using the mixed solution with a mixing ratio of 1:8 to 2:1, the formation of the organic insoluble layer 27 by inkjet method and curing by UV light were possible.

[0123] Therefore, for the same method as in Example 1, the EQE, chromaticity, and driving lifetime of each blue OLED element with an insoluble film other than the blue OLED element with an insoluble film using the above-mentioned mixed liquid with a mixing ratio of 4:1 were evaluated. The EQE, chromaticity, and driving lifetime of the blue OLED element with an insoluble film in Example 1 using the above-mentioned mixed liquid with a mixing ratio of the above-mentioned polyphosphazene and the above-mentioned acrylic polymer of 1:2 by weight were also shown in Table 2 for the results.

[0124] [Table 2]

[0125]

[0126] From the results shown in Table 1 and Table 2, it can be seen that within the range of the above-mentioned mixing ratio of 1:8 to 2:1, the driving lifetime is long enough compared to Comparative Example 1, and a blue OLED element with an insoluble film having an organic insoluble layer 27 can be fabricated. The organic insoluble layer 27 can compensate for the defects of the inorganic insoluble layer 26 composed of the SiN film.

[0127] [Example 3]

[0128] Except that a green EML was formed by evaporation deposition method instead of the blue EML, the same operations as in Example 1 were performed to fabricate an OLED element. Thus, except for having a green EML as the EML, a top-emitting type green OLED element similar to Example 1 was fabricated. Then, the same operations as in Example 1 were performed, and a 0.5 μm thick SiN film was formed on the above-mentioned green OLED element by sputtering method as the inorganic insoluble layer 26.

[0129] Then, a mixed liquid obtained by mixing polyphosphazene and an acrylic polymer in a weight ratio of 1:2 was coated on the above-mentioned inorganic insoluble layer 26, and UV light (ultraviolet light) of 2 J / cm 2 was irradiated, thereby forming a 3 μm thick organic insoluble layer 27. The above-mentioned polyphosphazene uses the polyphosphazene in which R1 in the above-mentioned general formula (1) is -O(C 6 H 4 )CH 3 group, R2 is -NH(C 6 H 4 )CH 3 , and the weight average molecular weight is in the range of 5,000 to 100,000. The above-mentioned acrylic polymer uses a homopolymer of an acrylic monomer in which R3 in the above-mentioned general formula (2) is a hydrogen atom and p = 2. Thus, an insoluble film 6 in which the inorganic insoluble layer 26 composed of the SiN film and the organic insoluble layer 27 composed of the mixed film of the above-mentioned polyphosphazene and the above-mentioned acrylic polymer are sequentially laminated was formed on the green OLED element.

[0130] The EQE, chromaticity, and driving lifetime of the green OLED device with the insoluble film provided with the above insoluble film 6 were evaluated using the same method as in Example 1.

[0131] 〔Comparative Example 3〕

[0132] For comparison, the same operations as in Example 3 were performed except that polyphosphazene was not used. Specifically, first, the same operations as in Example 3 were performed to fabricate a top-emitting green OLED device similar to that in Example 3. Then, the same operations as in Example 3 were performed, and a 0.5-μm-thick SiN film was formed on the above green OLED device by sputtering as an inorganic insoluble layer.

[0133] Thereafter, a homopolymer of the acrylic monomer in the above general formula (2) where R3 is a hydrogen atom and p = 3 was coated on the above inorganic insoluble layer, and UV light (ultraviolet light) with an intensity of 2 J / cm 2 was irradiated to form a 3-μm-thick organic insoluble layer. Thus, a comparative insoluble film was formed on the green OLED device by sequentially laminating an inorganic insoluble layer composed of a SiN film and an organic insoluble layer composed of the above acrylic polymer.

[0134] After that, the EQE, chromaticity, and driving lifetime of the green OLED device with the comparative insoluble film provided with the above insoluble film were evaluated using the same method as in Example 1.

[0135] 〔Comparative Example 4〕

[0136] First, the same operations as in Example 3 and Comparative Example 3 were performed to fabricate a top-emitting green OLED device similar to those in Example 3 and Comparative Example 3. Then, the same operations as in Comparative Example 3 were performed, and an inorganic insoluble layer composed of a 0.5-μm-thick SiN film and a 3-μm-thick organic insoluble layer composed of a homopolymer of the same acrylic monomer as in Comparative Example 3 were sequentially laminated on the above green OLED device.

[0137] Next, a 0.5-μm SiN film was again formed as an inorganic insoluble layer on the above organic insoluble layer by sputtering. Thus, on the green OLED device, a first inorganic insoluble layer composed of a SiN film, an organic insoluble layer composed of the same acrylic polymer as in Comparative Example 3, and a second inorganic insoluble layer composed of a SiN film were sequentially laminated to form a comparative insoluble film.

[0138] After that, the EQE, chromaticity, and driving lifetime of the green OLED device with the comparative insoluble film provided with the above insoluble film were evaluated using the same method as in Example 1.

[0139] The EQE, chromaticity, and driving lifetime of the green OLED elements with insoluble films fabricated in Example 3 and Comparative Examples 3 and 4 are shown together in Table 3.

[0140] [Table 3]

[0141] EQE (%) Chromaticity (x, y) Drive life (h) Example 3 30.3 (0.24,0.70) 132 Comparative Example 3 30.5 (0.24,0.70) 83 Comparative Example 4 30.3 (0.24,0.70) 136

[0142] As shown in Table 3, regarding the EQE and chromaticity, there are hardly any differences under each condition of Example 3 and Comparative Examples 3 and 4. On the other hand, for the driving lifetime in a high-humidity environment, in the case of having the insoluble film 6 with the organic insoluble layer 27 containing the polyphosphazene of Example 3, even when only one layer of SiN film is provided, a driving lifetime equivalent to that of Comparative Example 4 with two layers of SiN film can be obtained. In addition, when only one layer of SiN film is provided and the organic insoluble layer is composed only of an acrylic polymer and does not contain polyphosphazene, the driving lifetime is shorter compared to Example 3 containing polyphosphazene. From this result, it is confirmed that by introducing polyphosphazene into the organic insoluble layer composed of an acrylic polymer, the humidity resistance is improved and the lifetime is prolonged.

[0143] 〔Example 4〕

[0144] Except for forming the red EML by evaporation deposition instead of the blue EML, the same operations as in Example 1 were carried out to fabricate an OLED element. Thus, except for having a red EML as the EML, a top-emitting red OLED element similar to Example 1 was fabricated. Then, the same operations as in Example 1 were carried out, and a 0.5-μm-thick SiN film was formed as the inorganic insoluble layer 26 on the red OLED element by sputtering.

[0145] Then, a mixed solution obtained by mixing polyphosphazene and a methacrylic polymer in a weight ratio of 1:2 was coated on the above inorganic insoluble layer 26, and UV light (ultraviolet light) with an intensity of 2 J / cm 2 was irradiated, thereby forming a 3-μm-thick organic insoluble layer 27. The above polyphosphazene uses the one in which R1 in the above general formula (1) is -N(C 2 H 5 ) 2 group, and R2 is -N{(C 6 H 4 )C 2 H 5} 2, a polyphosphazene having a weight-average molecular weight in the range of 5,000 to 100,000. The above methacrylic polymer is a homopolymer of a methacrylic monomer in which R3 in the above general formula (2) is methyl and p = 2. Thus, an insoluble film 6 in which an inorganic insoluble layer 26 made of a SiN film and an organic insoluble layer 27 made of a mixed film of the above polyphosphazene and the above methacrylic polymer are sequentially laminated is formed on the red OLED element.

[0146] Using the same method as in Example 1, the EQE, chromaticity, and driving lifetime of the red OLED element with the insoluble film 6 were evaluated.

[0147] 〔Comparative Example 5〕

[0148] For comparison, the same operations as in Example 4 were performed except that polyphosphazene was not used. Specifically, first, the same operations as in Example 4 were performed to fabricate a top-emitting red OLED element similar to that in Example 4. Then, the same operations as in Example 4 were performed, and a 0.5-μm-thick SiN film was formed on the above red OLED element by sputtering as an inorganic insoluble layer.

[0149] Thereafter, a homopolymer of a methacrylic monomer in which R3 in the above general formula (2) is methyl and p = 2 was coated on the above inorganic insoluble layer, and UV light (ultraviolet light) of 2 J / cm 2 was irradiated, whereby a 3-μm-thick organic insoluble layer was formed. Thus, a comparative insoluble film in which an inorganic insoluble layer made of a SiN film and an organic insoluble layer made of the above methacrylic polymer were sequentially laminated was formed on the red OLED element.

[0150] After that, using the same method as in Example 1, the EQE, chromaticity, and driving lifetime of the red OLED element with the above comparative insoluble film were evaluated.

[0151] 〔Comparative Example 6〕

[0152] First, the same operations as in Example 4 and Comparative Example 5 were performed to fabricate a top-emitting red OLED element similar to those in Example 4 and Comparative Example 5. Then, the same operations as in Comparative Example 5 were performed, and an inorganic insoluble layer made of a 0.5-μm-thick SiN film and a 3-μm-thick organic insoluble layer made of a homopolymer of the same methacrylic monomer as in Comparative Example 5 were sequentially laminated on the above red OLED element.

[0153] Next, on the above-mentioned organic-insoluble layer, a 0.5-μm SiN film was formed again by sputtering as an inorganic-insoluble layer. Thus, on the red OLED element, a first inorganic-insoluble layer composed of a SiN film, an organic-insoluble layer composed of the same methacrylic polymer as in Comparative Example 1, and a second inorganic-insoluble layer composed of a SiN film were sequentially laminated to form an insoluble film for comparison.

[0154] After that, the EQE, chromaticity, and driving lifetime of the red OLED element with the above-mentioned insoluble film for comparison were evaluated by the same method as in Example 1.

[0155] The EQE, chromaticity, and driving lifetime of the red OLED elements with insoluble films fabricated in Example 4 and Comparative Examples 5 and 6 are shown together in Table 4.

[0156] [Table 4]

[0157] EQE (%) Chromaticity (x, y) Drive life (h) Example 4 36.5 (0.71,0.30) 315 Comparative Example 5 36.9 (0.71,0.31) 285 Comparative Example 6 36.6 (0.71,0.31) 322

[0158] As shown in Table 4, there were hardly any differences in terms of EQE and chromaticity under each condition of Example 1 and Comparative Examples 1 and 6. On the other hand, in the case of the insoluble film 6 having the organic-insoluble layer 27 containing the polyphosphazene of Example 4, even when only one layer of SiN film was provided, a driving lifetime equivalent to that of Comparative Example 5 with two layers of SiN film could be obtained. In addition, when only one layer of SiN film was provided and the organic-insoluble layer was composed only of a methacrylic polymer and did not contain polyphosphazene, the driving lifetime was shorter than that of Example 4 containing polyphosphazene. From this result, it was confirmed that by introducing polyphosphazene into the organic-insoluble layer composed of a methacrylic polymer, the humidity resistance was improved and the lifetime was prolonged.

[0159] As described above, according to the present embodiment, even when only one layer of inorganic-insoluble layer is provided, a light-emitting device with a long driving lifetime can be achieved.

[0160] (Modification example)

[0161] In addition, in the present embodiment, as an example of the insoluble film 6, the case where the inorganic-insoluble layer 26 and the organic-insoluble layer 27 are sequentially laminated from the light-emitting element ES side was described. By sequentially laminating the inorganic-insoluble layer 26 and the organic-insoluble layer 27, as described above, the defects 126 of the inorganic-insoluble layer 26 can be filled with, for example, the aggregate 127 of the phosphazene polymer in the organic-insoluble layer 27. Therefore, it is preferable that the inorganic-insoluble layer 26 and the organic-insoluble layer 27 are sequentially laminated. However, the present embodiment is not limited thereto.

[0162] The organic insoluble layer 27 and the inorganic insoluble layer 26 can also be laminated in this order from the light-emitting element ES side. In this case, at least the organic insoluble layer 27 can block the defect 126 of the inorganic insoluble layer 26 at the boundary between the organic insoluble layer 27 and the inorganic insoluble layer 26. Therefore, in the case where only one inorganic insoluble layer is provided, the moisture resistance can be improved as compared with the case where the organic insoluble layer does not contain a phosphazene polymer. Therefore, a light-emitting device can be provided which has a long driving life as compared with the case where the organic insoluble layer does not contain a phosphazene polymer when only one inorganic insoluble layer is provided.

[0163] The present disclosure is not limited to the above-described embodiments, and various modifications can be made within the scope shown in the claims. Embodiments obtained by appropriately combining the technical solutions disclosed for different embodiments are also included in the technical scope of the present disclosure. Moreover, new technical features can be formed by combining the technical methods disclosed for the respective embodiments.

[0164] Description of Reference Numerals

[0165] 2 Display device (light-emitting device)

[0166] 5 Light-emitting element layer

[0167] 6 Insoluble film

[0168] 26 Inorganic insoluble layer

[0169] 27 Organic insoluble layer

[0170] 126 Defect

[0171] 127 Aggregate of polyphosphazene

[0172] ES Light-emitting element

Claims

1. A light-emitting device, characterized in that, comprising: a light-emitting element and an insoluble film covering the light-emitting element, the insoluble film having an inorganic insoluble layer and an organic insoluble layer, the organic insoluble layer containing a polymer material having inorganic atoms in the molecular chain and at least one of a nitrogen atom and an oxygen atom, the polymer material being polyphosphazene, the polyphosphazene being at least one polymer represented by the following general formula (1), [Chemical formula 1] In the formula, R1 and R2 independently represent -O(CH 2 ) m CH 3 group, -NH(CH 2 ) m CH 3 group, -O(C 6 H 4 )CH 3 group, -NH(C 6 H 4 )CH 3 group, -O(CH 2 ) m CF 3 group, -NH(CH 2 ) m CF 3 group, -O(C 6 H 4 )C 2 H 5 group, -NH(C 6 H 4 )C 2 H 5 group, -O(CH 2 ) m F group, -NH(CH 2 ) m F group, -N{(CH 2 ) m CH 3} 2 group, -N{(C 6 H 4 )CH 3} 2 group, -N{(CH 2 ) m CF 3} 2 group, -N{(C 6 H 4 )C 2 H 5} 2 group, or -N{(CH 2 ) m F} 2 group, m independently represents an integer from 1 to 10, and n represents an integer from 1 to 3000.

2. The light-emitting device according to claim 1, characterized in that, The polyphosphazene is selected from the group consisting of: polymers in which R1 and R2 are respectively -O(CH 2 ) 2 CH 3 groups; polymers in which R1 is -O(C 6 H 4 )CH 3 groups and R2 is -NH(C 6 H 4 )CH 3 groups; polymers in which R1 is -N(C 2 H 5 ) 2 groups and R2 is -N{(C 6 H 4 )C 2 H 5} 2 groups, and at least one polymer selected from the group consisting of polymers having such groups.

3. The light-emitting device according to claim 1, characterized in that, the organic insoluble layer further contains a (meth)acrylic polymer.

4. The light-emitting device according to claim 3, characterized in that, the (meth)acrylic polymer is a polymer composed of at least one monomer represented by the following general formula (2), [Chemical formula 2] wherein, R3 represents a hydrogen atom or a methyl group, and p represents an integer from 1 to 10.

5. The light-emitting device according to claim 3, characterized in that, the mixing ratio of the polyphosphazene to the (meth)acrylic polymer is in the range of 1:8 to 2:1 by weight.

6. The light-emitting device according to claim 1, characterized in that, The inorganic insoluble layer is SiN x film, where x = 1 or 2.

7. The light-emitting device according to claim 1, characterized in that, the insoluble film is laminated in the order of the inorganic insoluble layer and the organic insoluble layer from the light-emitting element side.

8. The light-emitting device according to claim 1, characterized in that, the light-emitting element is an organic light-emitting diode element.

9. The light-emitting device according to any one of claims 1 to 8, characterized in that, the light-emitting device is a display device.

10. An insoluble film, characterized in that, having an inorganic insoluble layer and an organic insoluble layer, the organic insoluble layer containing a polymer material having inorganic atoms in the molecular chain and at least one of a nitrogen atom and an oxygen atom, the polymer material being polyphosphazene, the polyphosphazene being at least one polymer represented by the following general formula (1), [Chemical formula 3] In the formula, R1 and R2 independently represent -O(CH 2 ) m CH 3 group, -NH(CH 2 ) m CH 3 group, -O(C 6 H 4 )CH 3 group, -NH(C 6 H 4 )CH 3 group, -O(CH 2 ) m CF 3 group, -NH(CH 2 ) m CF 3 group, -O(C 6 H 4 )C 2 H 5 group, -NH(C 6 H 4 )C 2 H 5 group, -O(CH 2 ) m F group, -NH(CH 2 ) m F group, -N{(CH 2 ) m CH 3} 2 group, -N{(C 6 H 4 )CH 3} 2 group, -N{(CH 2 ) m CF 3} 2 group, -N{(C 6 H 4 )C 2 H 5} 2 group, or -N{(CH 2 ) m F} 2 group, m independently represents an integer from 1 to 10, and n represents an integer from 1 to 3000.

11. The insoluble film according to claim 10, characterized in that, The polyphosphazene is selected from the group consisting of: polymers in which R1 and R2 are -O(CH 2 ) 2 CH 3 groups; polymers in which R1 is -O(C 6 H 4 )CH 3 groups and R2 is -NH(C 6 H 4 )CH 3 groups; polymers in which R1 is -N(C 2 H 5 ) 2 groups and R2 is -N{(C 6 H 4 )C 2 H 5} 2 groups, and at least one polymer selected from the group consisting of polymers having such groups.

12. The insoluble film according to claim 10, characterized in that, the organic insoluble layer further contains a (meth)acrylic polymer.

13. The insoluble film according to claim 12, characterized in that, the (meth)acrylic polymer is a polymer composed of at least one monomer represented by the following general formula (2), [Chemical formula 4] wherein, R3 represents a hydrogen atom or a methyl group, and p represents an integer from 1 to 10.

14. The insoluble film according to claim 12, characterized in that, the mixing ratio of the polyphosphazene to the (meth)acrylic polymer is in the range of 1:8 to 2:1 by weight.

15. The insoluble film according to any one of claims 10 to 14, characterized in that, The inorganic insoluble layer is SiN x film, where x = 1 or 2.

Images