Raw material supply device and raw material supply method

Abstract

A raw material supply device according to one embodiment of the present invention is a raw material supply device that generates a reactive gas from a solution or a dispersion system, wherein the solution is a solution obtained by dissolving a solid raw material in a solvent, and the dispersion system is a dispersion system obtained by dispersing a solid raw material in a dispersion medium, and the raw material supply device comprises: a container that stores the solution or the dispersion system; an injection portion that injects the solution or the dispersion system into the container; an exhaust port that is used to exhaust gas in the container; and a filter that is disposed in the container, wherein the filter divides the container into a plurality of regions including a first region where the injection portion is disposed and a second region where the exhaust port is disposed.

Description

Technical Field

[0001] The present disclosure relates to a raw material supply device and a raw material supply method. Background Art

[0002] A known technique is to dissolve a solid raw material in a solvent and spray it into a processing chamber, then heat the processing chamber to remove the solvent so that the solid raw material remains, and then heat the processing chamber to sublime the solid raw material to generate a corresponding gas (for example, see Patent Document 1).

[0003] Prior art literature

[0004] Patent Literature

[0005] Patent Document 1: Japanese Patent Application Publication No. 2004-115831 Summary of the invention

[0006] Problem that the invention aims to solve

[0007] The present disclosure provides a technology capable of suppressing fluctuations in the amount of sublimation of a solid raw material.

[0008] Solutions for solving problems

[0009] A raw material supply device in one embodiment of the present invention is a raw material supply system that generates a reactive gas from a solution or a dispersion system, wherein the solution is a solution obtained by dissolving a solid raw material in a solvent, and the dispersion system is a dispersion system obtained by dispersing a solid raw material in a dispersion medium, and the raw material supply device comprises: a container that stores the solution or the dispersion system; an injection portion that injects the solution or the dispersion system into the container; an exhaust port that is used to exhaust gas in the container; and a filter that is disposed in the container, wherein the filter divides the container into a plurality of regions including a first region where the injection portion is disposed and a second region where the exhaust port is disposed.

[0010] Effects of the Invention

[0011] According to the present disclosure, it is possible to suppress the variation in the sublimation amount of the solid raw material. BRIEF DESCRIPTION OF THE DRAWINGS

[0012] Figure 1 It is a diagram showing an example of a raw material supply system according to an embodiment.

[0013] Figure 2 It is used to illustrate Figure 1 Figure (1) shows the operation of the raw material supply system.

[0014] Figure 3 It is used to illustrate Figure 1 Figure (2) shows the operation of the raw material supply system.

[0015] Figure 4 FIG. (1) is a diagram for explaining the filling process.

[0016] Figure 5 FIG. (2) is a diagram for explaining the filling process.

[0017] Figure 6 FIG. (1) is a diagram for explaining a drying process.

[0018] Figure 7 FIG. (2) is a diagram for explaining the drying process.

[0019] Figure 8 FIG. (1) is a diagram for explaining the gasification process.

[0020] Fig. 9 FIG. (2) is a diagram for explaining the gasification process. DETAILED DESCRIPTION

[0021] Hereinafter, non-limiting exemplary embodiments of the present disclosure will be described with reference to the accompanying drawings. In all the accompanying drawings, the same or corresponding components or parts are marked with the same or corresponding reference numerals, and repeated descriptions are omitted.

[0022] (Raw material supply system)

[0023] Reference Figure 1 A raw material supply system according to an embodiment will be described. Figure 1 It is a diagram showing an example of a raw material supply system according to an embodiment.

[0024] The raw material supply system 1 is a system that generates a reactive gas by sublimating a second solid raw material formed by removing a solvent from a solution (hereinafter, also simply referred to as a "solution") obtained by dissolving a first solid raw material in a solvent, and forms a film using the generated reactive gas through a processing device.

[0025] The first solid raw material is not particularly limited, and may be, for example, an organic metal complex containing metal elements such as strontium (Sr), molybdenum (Mo), ruthenium (Ru), zirconium (Zr), hafnium (Hf), tungsten (W), aluminum (Al), or a chloride containing metal elements such as tungsten (W) and aluminum (Al). The solvent may be any solvent as long as it can dissolve the first solid raw material to form a solution, and may be, for example, hexane.

[0026] The raw material supply system 1 includes a raw material supply source 10 , raw material supply devices 30 and 40 , a processing device 50 , and a control device 90 .

[0027] The raw material supply source 10 supplies the solution M1 to the raw material supply devices 30 and 40. The raw material supply source 10 is disposed in a sub-fab, for example. In the present embodiment, the raw material supply source 10 includes a tank 11 and a float sensor 12. The tank 11 is filled with the solution M1. The float sensor 12 detects the amount of the solution M1 filled in the tank 11.

[0028] Insert one end of the piping L1 into the raw material supply source 10 from the top of the tank 11. The other end of the piping L1 is connected to the carrier gas supply source G1, and the carrier gas is supplied from the supply source G1 to the tank 11 via the piping L1. The carrier gas may be, for example, an inert gas such as nitrogen (N2) or argon (Ar). A valve V1 is provided in the piping L1. When the valve V1 is opened, the carrier gas is supplied from the supply source G1 to the raw material supply source 10, and when the valve V1 is closed, the supply of the carrier gas from the supply source G1 to the raw material supply source 10 is cut off. In addition, a flow controller (not shown) for controlling the flow rate of the carrier gas flowing in the piping L1, an additional valve, etc. may also be provided in the piping L1.

[0029] The raw material supply source 10 is connected to the raw material supply device 30 via the pipes L2 and L3, and the solution M1 is supplied to the raw material supply device 30 via the pipes L2 and L3. Valves V2 and V3 are provided in the pipes L2 and L3, respectively. When the valves V2 and V3 are opened, the solution M1 is supplied from the raw material supply source 10 to the raw material supply device 30, and when the valves V2 and V3 are closed, the supply of the solution M1 from the raw material supply source 10 to the raw material supply device 30 is cut off. In addition, a flow controller (not shown) for controlling the flow rate of the solution M1 flowing in the pipe L3, an additional valve, etc. may also be provided in the pipe L3.

[0030] In addition, the raw material supply source 10 is connected to the raw material supply device 40 via the pipes L2 and L4, and the solution M1 is supplied to the raw material supply device 40 via the pipes L2 and L4. A valve V4 is provided in the pipe L4. When the valves V2 and V4 are opened, the solution M1 is supplied from the raw material supply source 10 to the raw material supply device 40, and when the valves V2 and V4 are closed, the supply of the solution M1 from the raw material supply source 10 to the raw material supply device 40 is cut off. In addition, a flow controller (not shown) for controlling the flow rate of the solution M1 flowing in the pipe L4, an additional valve, etc. may also be provided in the pipe L4.

[0031] The raw material supply device 30 stores the solution M1 delivered from the raw material supply source 10. In the present embodiment, the raw material supply device 30 includes a container 31, a heating unit 32, a pressure gauge 33 and a filter 34. The container 31 stores the solution M1 delivered from the raw material supply source 10. The heating unit 32 heats the solid raw material (hereinafter referred to as "the second solid raw material M2") formed by removing the solvent from the solution M1, thereby sublimating the second solid raw material M2 to generate a reactive gas. The heating unit 32 can be, for example, a heater configured to cover the bottom and the periphery of the container 31. The heating unit 32 is configured to heat the inside of the container 31 to a temperature at which the second solid raw material M2 can be sublimated to generate a reactive gas. The pressure gauge 33 detects the internal pressure of the container 31. The detected internal pressure of the container 31 is sent to the control device 90, and the control device 90 controls the opening and closing of various valves based on the internal pressure. For example, when the internal pressure is higher than the prescribed pressure, the control device 90 closes the valve V3 so that an excessive amount of solution M1 is not supplied to the container 31. The filter 34 is arranged roughly horizontally in the container 31, and divides the container 31 into a first area 31a and a second area 31b. The front end of the pipe L3 is inserted into the first area 31a. Thus, the pipe L3 is connected to the first area 31a. The second area 31b is an area located above the first area 31a. The filter 34 can be formed of a material that allows the reactive gas to pass through and captures impurities such as the second solid raw material M2 and particles, for example, it is formed of a porous material. The porous material can be, for example, a porous metal material such as a sintered body of stainless steel, or a porous ceramic material.

[0032] One end of the pipe L8 is inserted into the raw material supply device 30 from the top of the container 31. One end of the pipe L8 is inserted into the first area 31a, for example. Thus, the pipe L8 is connected to the first area 31a. However, one end of the pipe L8 can also be inserted into the second area 31b. The other end of the pipe L8 is connected to the supply source G7 of the carrier gas via the pipe L7, and the carrier gas is supplied from the supply source G7 to the container 31 via the pipes L7 and L8. The carrier gas can be, for example, an inert gas such as N2 or Ar. Valves V8a and V8b are sequentially arranged in the pipe L8 from the side close to the supply source G7. When the valves V8a and V8b are opened, the carrier gas is supplied from the supply source G7 to the raw material supply device 30, and when the valves V8a and V8b are closed, the supply of the carrier gas from the supply source G7 to the raw material supply device 30 is cut off. A flow controller F7 for controlling the flow rate of the carrier gas flowing in the pipe L7 is provided in the pipe L7. In the present embodiment, the flow controller F7 is a mass flow controller (MFC).

[0033] The raw material supply device 30 is connected to the processing device 50 via the pipes L10 and L12, and the reactive gas is supplied to the processing device 50 via the pipes L10 and L12. The front end of the pipe L10 is inserted into the second area 31b in the container 31. Thus, the inside of the pipe L10 is connected to the second area 31b. Valves V10a to V10c are sequentially provided in the pipe L10 from the side close to the raw material supply device 30. When the valves V10a to V10c are opened, the reactive gas is supplied from the raw material supply device 30 to the processing device 50, and when the valves V10a to V10c are closed, the supply of the reactive gas from the raw material supply device 30 to the processing device 50 is cut off.

[0034] One end of the pipe L13 is connected between the valve V10a and the valve V10b of the pipe L10. The other end of the pipe L13 is connected between the valve V8a and the valve V8b of the pipe L8. The pipe L13 functions as a bypass pipe that connects the pipe L8 and the pipe L10 without passing through the raw material supply device 30. The pipe L13 is provided with a valve V13. When the valve V13 is opened, the pipe L8 is connected to the pipe L10, and when the valve V13 is closed, the connection between the pipe L8 and the pipe L10 is cut off.

[0035] One end of the pipe L14 is connected between the valve V10b and the valve V10c of the pipe L10. The other end of the pipe L14 is connected to an exhaust device E1 such as a vacuum pump. The pipe L14 is provided with a valve V14. When the valve V14 is opened while the valves V10a and V10b are open, the inside of the container 31 can be exhausted and the solvent can be removed from the solution M1 stored in the container 31. When the valve V14 is closed, the removal of the solvent from the solution M1 stored in the container 31 can be stopped.

[0036] The raw material supply device 40 stores the solution M1 delivered from the raw material supply source 10. The raw material supply device 40 is arranged in parallel with the raw material supply device 30. In the present embodiment, the raw material supply device 40 includes a container 41, a heating unit 42, a pressure gauge 43 and a filter 44. The container 41 stores the solution M1 delivered from the raw material supply source 10. The heating unit 42 heats the second solid raw material M2 formed by removing the solvent from the solution M1, thereby sublimating the second solid raw material M2 to generate a reactive gas. The heating unit 42 can be, for example, a heater configured to cover the bottom and the periphery of the container 41. The heating unit 42 is configured to heat the inside of the container 41 to a temperature at which the second solid raw material M2 can be sublimated to generate a reactive gas. The pressure gauge 43 detects the internal pressure of the container 41. The detected internal pressure of the container 41 is sent to the control device 90, and the control device 90 controls the opening and closing of various valves based on the internal pressure. For example, when the internal pressure is higher than the predetermined pressure, the control device 90 closes the valve V4, thereby preventing an excessive amount of solution M1 from being supplied to the container 41. The filter 44 is disposed substantially horizontally in the container 41, and divides the container 41 into a first region 41a and a second region 41b. The front end of the pipe L4 is inserted into the first region 41a. Thus, the pipe L4 is connected to the first region 41a. The second region 41b is an area located above the first region 41a. The filter 44 is formed of, for example, the same material as the filter 34.

[0037] One end of the pipe L9 is inserted into the raw material supply device 40 from the top of the container 41. One end of the pipe L9 is inserted into the first area 41a. Thus, the pipe L9 is connected to the first area 41a. However, one end of the pipe L9 can also be inserted into the second area 41b. The other end of the pipe L9 is connected to the carrier gas supply source G7 via the pipe L7, and the carrier gas is supplied from the supply source G7 to the container 41 via the pipes L7 and L9. The carrier gas can be, for example, an inert gas such as N2 and Ar. Valves V9a and V9b are sequentially arranged on the pipe L9 from the side close to the supply source G7. When the valves V9a and V9b are opened, the carrier gas is supplied from the supply source G7 to the raw material supply device 40, and when the valves V9a and V9b are closed, the supply of the carrier gas from the supply source G7 to the raw material supply device 40 is cut off.

[0038] The raw material supply device 40 is connected to the processing device 50 via the pipes L11 and L12, and the reactive gas is supplied to the processing device 50 via the pipes L11 and L12. The front end of the pipe L11 is inserted into the second area 41b in the container 41. Thus, the inside of the pipe L11 is connected to the second area 41b. Valves V11a to V11c are provided in the pipe L11. When the valves V11a to V11c are opened, the reactive gas is supplied from the raw material supply device 40 to the processing device 50, and when the valves V11a to V11c are closed, the supply of the reactive gas from the raw material supply device 40 to the processing device 50 is cut off.

[0039] One end of the pipe L15 is connected between the valve V11a and the valve V11b of the pipe L11. The other end of the pipe L15 is connected between the valve V9a and the valve V9b of the pipe L9. The pipe L15 functions as a bypass pipe that connects the pipe L9 and the pipe L11 without passing through the raw material supply device 40. The pipe L15 is provided with a valve V15. When the valve V15 is opened, the pipe L9 is connected to the pipe L11, and when the valve V15 is closed, the connection between the pipe L9 and the pipe L11 is cut off.

[0040] One end of the pipe L16 is connected between the valve V11b and the valve V11c of the pipe L11. The other end of the pipe L16 is connected to an exhaust device E2 such as a vacuum pump. The pipe L16 is provided with a valve V16. When the valve V16 is opened while the valves V11a and V11b are open, the inside of the container 41 can be exhausted and the solvent can be removed from the solution M1 stored in the container 41. When the valve V16 is closed, the removal of the solvent from the solution M1 stored in the container 41 can be stopped.

[0041] The processing device 50 is connected to the raw material supply device 30 via the pipes L10 and L12, and the reactive gas generated by heating and sublimating the second solid raw material M2 in the raw material supply device 30 is supplied to the processing device 50. In addition, the processing device 50 is connected to the raw material supply device 40 via the pipes L11 and L12, and the reactive gas generated by heating and sublimating the second solid raw material M2 in the raw material supply device 40 is supplied to the processing device 50.

[0042] The processing device 50 uses the reactive gas supplied from the raw material supply device 30, 40 to perform various processes such as film forming processing on substrates such as semiconductor wafers. In the present embodiment, the processing device 50 includes a processing container 51, a flow meter 52, a storage tank 53, a pressure sensor 54 and a valve V12. The processing container 51 accommodates one or more substrates. In the present embodiment, the flow meter 52 is a mass flow meter (MFM). The flow meter 52 is arranged in the piping L12, and is used to measure the flow rate of the reactive gas flowing in the piping L12. The storage tank 53 temporarily stores the reactive gas. By setting the storage tank 53, a large flow of reactive gas can be supplied to the processing container 51 in a short time. The storage tank 53 is also called a buffer tank or a filling tank. The pressure sensor 54 detects the pressure in the storage tank 53. The pressure sensor 54 is, for example, a capacitance pressure gauge. The valve V12 is arranged in the piping L12. When the valve V12 is opened, the reactive gas is supplied from the raw material supply devices 30 and 40 to the processing container 51 , and when the valve V12 is closed, the supply of the reactive gas from the raw material supply devices 30 and 40 to the processing container 51 is cut off.

[0043] The control device 90 controls each part of the raw material supply system 1. For example, the control device 90 controls the operation of the raw material supply source 10, the raw material supply devices 30 and 40, the processing device 50, etc. In addition, the control device 90 controls the opening and closing of various valves. The control device 90 may be, for example, a computer.

[0044] (Operation of the raw material supply system)

[0045] Reference Figure 2 and Figure 3 An example of the operation (raw material supply method) of the raw material supply system 1 is described below. In the raw material supply system 1, the opening and closing of various valves are controlled by the control device 90, and the reactive gas is supplied to the processing device 50 by one of the two raw material supply devices 30 and 40 arranged in parallel, and the solid raw material is filled by the other. Hereinafter, an example of the operation of the raw material supply system 1 is specifically described.

[0046] First, refer to Figure 2 A case where the reactive gas is supplied to the processing device 50 by the raw material supply device 30 and the solid raw material is filled by the raw material supply device 40 will be described. Figure 2 It is used to illustrate Figure 1 FIG. 1 is a diagram showing the operation of the raw material supply system 1. Figure 2 In FIG. 1 , thick solid lines represent pipes through which carrier gas, solution M1, and reactive gas flow, and thin solid lines represent pipes through which carrier gas, solution M1, and reactive gas do not flow. Figure 2In the figure, a white background symbol indicates a valve open state, and a black background symbol indicates a valve closed state. Figure 1 As shown, all valves are closed, and the second solid raw material M2 is stored in the raw material supply device 30 .

[0047] The control device 90 controls the heating unit 32 of the raw material supply device 30 to heat the second solid raw material M2 in the container 31 to sublime it, thereby generating a reactive gas (sublimation process). In addition, the control device 90 opens valves V8a, V8b, V10a to V10c, and V12. Thus, a carrier gas is injected into the container 31 of the raw material supply device 30 from the supply source G7 via the pipes L7 and L8, and the reactive gas generated in the container 31 is supplied to the processing container 51 together with the carrier gas via the pipes L10 and L12.

[0048] In addition, the control device 90 is as follows Figure 2 As shown, valves V1, V2, and V4 are opened. Thus, carrier gas is supplied from the supply source G1 to the raw material supply source 10, and the solution M1 is transported from the raw material supply source 10 to the raw material supply device 40 via the pipes L2 and L4. Thus, the solution M1 is stored in the container 41 of the raw material supply device 40 (filling process).

[0049] Next, the control device 90 opens valves V11a, V11b, and V16. As a result, the inside of the container 41 of the raw material supply device 40 is exhausted through the exhaust device E2, thereby removing the solvent from the solution M1 in the container 41, and forming the second solid raw material M2 in the container 41 (drying process). For example, the control device 90 determines whether a specified amount of solution M1 is stored in the container 41 based on the detection value of the floating sensor 12, and when it is determined that a specified amount of solution M1 is stored in the container 41, the valves V11a, V11b, and V16 are opened. The specified amount is, for example, set to the amount that can be stored in the container 41 of the raw material supply device 40. In addition, when removing the solvent from the solution M1 in the container 41, it is preferred that the control device 90 controls the heating unit 42 to heat the solution M1 in the container 41 to a specified temperature. Thereby, the removal of the solvent is promoted. The specified temperature is, for example, set to a temperature lower than the temperature at which the second solid raw material M2 is sublimated to generate a reactive gas. In addition, in Figure 2 2 shows a state before the solvent is removed from the solution M1 in the container 41 .

[0050] Next, refer to Figure 3 Next, a case where the reactive gas is supplied to the processing device 50 by the raw material supply device 40 and the solid raw material is filled by the raw material supply device 30 will be described. Figure 3 It is used to illustrate Figure 1 FIG. 1 is a diagram showing the operation of the raw material supply system 1. Figure 3In FIG. 1 , thick solid lines represent pipes through which carrier gas, solution M1, and reactive gas flow, and thin solid lines represent pipes through which carrier gas, solution M1, and reactive gas do not flow. Figure 3 In the figure, a symbol with a white background indicates a valve open state, and a symbol with a black background indicates a valve closed state. Figure 1 As shown in FIG. 1 , all valves are set to be closed. Figure 3 As shown in FIG. 1 , the description will be given assuming that the second solid raw material M2 is stored in the raw material supply device 40 .

[0051] The control device 90 controls the heating unit 42 of the raw material supply device 40 to heat the second solid raw material M2 in the container 41 to sublime it, thereby generating a reactive gas (sublimation process). In addition, the control device 90 opens valves V9a, V9b, V11a to V11c, and V12. Thus, a carrier gas is injected into the container 41 of the raw material supply device 40 from the supply source G7 via the pipes L7 and L9, and the reactive gas generated in the container 41 is supplied to the processing container 51 together with the carrier gas via the pipes L11 and L12.

[0052] In addition, the control device 90 is as follows Figure 3 As shown in FIG. 1 , valves V1, V2, and V3 are opened. Thus, carrier gas is supplied from the supply source G1 to the raw material supply source 10, and the solution M1 is transported from the raw material supply source 10 to the raw material supply device 30 via the pipes L2 and L3. Thus, the solution M1 is stored in the container 31 of the raw material supply device 30 (filling process).

[0053] Next, the control device 90 opens valves V10a, V10b, and V14. As a result, the inside of the container 31 of the raw material supply device 30 is exhausted through the exhaust device E1, thereby removing the solvent from the solution M1 in the container 31, and forming the second solid raw material M2 in the container 31 (drying process). For example, the control device 90 determines whether a specified amount of solution M1 is stored in the container 31 based on the detection value of the floating sensor 12, and when it is determined that a specified amount of solution M1 is stored in the container 31, the valves V10a, V10b, and V14 are opened. The specified amount is, for example, set to the amount that can be stored in the container 31 of the raw material supply device 30. In addition, when removing the solvent from the solution M1 in the container 31, it is preferred that the control device 90 controls the heating unit 32 to heat the solution M1 in the container 31 to a specified temperature. Thereby, the removal of the solvent is promoted. The specified temperature is, for example, set to a temperature lower than the temperature at which the second solid raw material M2 is sublimated to generate a reactive gas. In addition, in Figure 3 2 shows a state before the solvent is removed from the solution M1 in the container 31 .

[0054] As described above, according to the raw material supply system 1, the control device 90 controls the opening and closing of the valve, and one of the two raw material supply devices 30 and 40 is used to supply the reactive gas to the processing device 50, and the other is used to fill the solid raw material. As a result, the raw material supply devices 30 and 40 can be automatically replenished with raw materials, so that the continuous operation capacity of the processing device 50 is improved, and the operating rate of the processing device 50 can be improved.

[0055] (Effect)

[0056] Reference Figures 4 to 9 , the effects of the raw material supply devices 30 and 40 of the embodiment will be listed and described by taking the raw material supply device 30 as an example. In addition, the raw material supply device 40 is also the same as the raw material supply device 30.

[0057] Figure 4 and Figure 5 is a diagram for explaining the filling process. Figure 4 As shown in FIG. 1 , in the filling process, when the solution M1 is filled into the container 31 from the front end of the pipe L3, droplets P1 may be generated. For example, when the pressure in the container 31 is high, droplets P1 are easily generated. Figure 5 As shown, the raw material supply device 30 of the embodiment has a filter 34 that divides the container 31 into a first area 31a and a second area 31b. Thus, when the solution M1 is filled into the container 31 from the tip of the pipe L3 inserted into the first area 31a, the filter 34 can suppress the generation of droplets.

[0058] Figure 6 and Figure 7 is a diagram for explaining the drying process. Figure 6 As shown, in the drying process, when the solvent is removed from the solution M1, the solvent sometimes boils. When the solvent boils, the second solid raw material M2 is scattered over a large area. Therefore, the second solid raw material M2 sometimes enters the valve V10a and causes internal leakage. In addition, the second solid raw material M2 is widely attached to the inner wall of the container 31, so that when the second solid raw material M2 is sublimated in the sublimation process, the sublimation amount of the second solid raw material M2 sometimes becomes unstable. In contrast, as Figure 7 As shown, the raw material supply device 30 of the embodiment has a filter 34 that divides the container 31 into a first area 31a and a second area 31b. Thus, even when the solvent boils, the second solid raw material M2 can be prevented from scattering to the valve V10a. Therefore, internal leakage in the valve V10a can be prevented.

[0059] Figure 8 and Fig. 9 is a diagram for explaining the sublimation process. Figure 8As shown, in the initial stage of the sublimation process, the second solid raw material M2 adhered to the inner wall of the container 31 on a large scale and the second solid raw material M2 deposited on the bottom of the container 31 sublime. Therefore, the sublimation amount increases. Then, in the middle stage of the sublimation process, the second solid raw material M2 adhered to the inner wall of the container 31 disappears, and only the second solid raw material M2 deposited on the bottom of the container 31 sublimates. Therefore, the sublimation amount decreases compared to the initial stage. In this way, when the second solid raw material M2 adheres to the inner wall of the container 31 on a large scale, the variation of the sublimation amount in the sublimation process becomes larger. Therefore, in the sublimation process, the supply flow rate of the reactive gas becomes unstable. In contrast, as Fig. 9 As shown, the raw material supply device 30 of the embodiment has a filter 34 that divides the container 31 into a first area 31a and a second area 31b. As a result, the adhesion range of the second solid raw material M2 in the drying process is narrowed, so the difference in the sublimation amount in the initial stage and the middle stage of the sublimation process is reduced. That is, the change of the sublimation amount in the sublimation process can be suppressed. Therefore, the reactive gas can be stably supplied in the sublimation process.

[0060] In addition, in the above-mentioned embodiment, the pipes L3 and L4 are examples of injection parts, the pipes L10 and L11 are examples of exhaust ports, and the control device 90 is an example of a control unit.

[0061] The embodiments disclosed herein are illustrative in all aspects and should not be construed as restrictive. The embodiments described above may be omitted, replaced, or modified in various ways without departing from the appended claims and the gist thereof.

[0062] In the above-mentioned embodiment, the case where the raw material supply system 1 has two raw material supply devices 30 and 40 arranged in parallel is described, but the present disclosure is not limited to this. For example, the raw material supply device may be one, or three or more raw material supply devices may be arranged in parallel. However, from the perspective of eliminating the downtime caused by the filling of the solution M1, it is preferred that there are two or more raw material supply devices.

[0063] In the above-mentioned embodiment, a system for sublimating the second solid raw material M2 formed by removing the solvent from the solution M1 to generate a reactive gas, and using the generated reactive gas to form a film through the processing device 50 is described, but the present disclosure is not limited to this. For example, a dispersion system (dispersion) such as a slurry (slurry) obtained by dispersing the first solid raw material in a dispersion medium and a colloidal solution (colloidal solution) obtained by dispersing the first solid raw material in a dispersion medium can also be used to replace the solution M1. For example, by using a colloidal solution, a high concentration of precursor can be filled compared to using a solution M1 and a slurry. A dispersion system (dispersion) includes a slurry (slurry) and a colloid (colloid). A slurry is also called a suspension (suspension). A colloid (colloid) includes a colloidal solution (colloidal solution) as a subordinate concept. A colloidal solution is also called a sol (sol).

[0064] This international application claims the priority of Japanese Patent Application No. 2020-154854 filed on September 15, 2020, the entire contents of which are incorporated herein by reference.

[0065] Description of Reference Numerals

[0066] 30, 40: raw material supply device; 31, 41: container; 31a, 41a: first area; 31b, 41b: second area; 32, 42: heating part; 34, 44: filter; 50: processing device; E1, E2: exhaust device; L3, L4: piping; L10, L11: piping.

Claims

1. A raw material supply device that generates a reactive gas from a solution or a dispersion system, wherein the solution is a solution obtained by dissolving a first solid raw material in a solvent, and the dispersion system is a dispersion system obtained by dispersing the first solid raw material in a dispersion medium, wherein the raw material supply device comprises: a container for storing the solution or the dispersed system; An injection unit, which injects the solution or the dispersed system into the container; An exhaust port, which is used to exhaust gas in the container; as well as a filter disposed in the container, the filter dividing the container into a plurality of regions including a first region where the injection portion is disposed and a second region where the exhaust port is disposed, Wherein, the filter is arranged substantially horizontally in the container, The second region is located above the first region. The injection portion passes through the filter so that the front end of the injection portion is inserted into the first region, The raw material supply device further includes a control unit, which controls to perform the following steps: Injecting the solution or the dispersed system into the first region through the injection portion; forming a second solid raw material by removing the solvent or the dispersion medium from the solution or the dispersion injected into the first region; and The second solid raw material is heated to be sublimated to generate a reactive gas, and the reactive gas is supplied from the second region to a processing device.

2. The raw material supply device according to claim 1, characterized in that: The filter is formed of a porous material.

3. The raw material supply device according to claim 1 or 2, characterized in that: The exhaust port is connected to a processing device.

4. The raw material supply device according to claim 1 or 2, characterized in that: The exhaust port is connected to an exhaust device for exhausting the inside of the container.

5. The raw material supply device according to claim 1 or 2, characterized in that: The dispersed system is a slurry or a colloidal solution.

6. The raw material supply device according to claim 1 or 2, characterized in that: A heating unit is further provided, and the heating unit heats the container.

7. A raw material supply method, comprising the following steps; Injecting a solution or a dispersion system into a first region partitioned by a filter in a container through an injection portion, wherein the solution is a solution obtained by dissolving a first solid raw material in a solvent, and the dispersion system is a dispersion system obtained by dispersing the first solid raw material in a dispersion medium; forming a second solid feedstock by removing the solvent or the dispersion medium from the solution or the dispersion injected into the first region; as well as The second solid raw material is heated to sublime to generate a reactive gas, and the reactive gas is supplied to a processing device from a second area partitioned by the filter in the container, Wherein, the filter is arranged substantially horizontally in the container, The second region is located above the first region. The injection portion passes through the filter so that a front end of the injection portion is inserted into the first region.

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