Glass etching system and glass etching method

Abstract

This application provides a glass etching system and a glass etching method. The glass etching system includes an etching apparatus, which includes an etching tank, a heat exchange tube, and a temperature control system. The heat exchange tube is disposed inside the etching tank. The temperature control system is used to supply a medium with a preset temperature into the heat exchange tube, which uses the medium inside to heat or cool the etching solution in the etching tank. The glass etching system provided in this application, by setting a heat exchange tube inside the etching tank and using a temperature control system to supply a medium with a preset temperature into the heat exchange tube, can use the medium inside the heat exchange tube to heat or cool the etching solution in the etching tank, thereby keeping the temperature of the etching solution in the etching tank constant. This allows different batches of glass to be etched by the etching solution at the same temperature, ensuring consistent etching results across different batches of glass.

Description

Technical Field

[0001] This application relates to the field of glass processing technology, and in particular to a glass etching system and a glass etching method. Background Technology

[0002] The surface of the glass cover of electronic devices such as mobile phones usually needs to have a uniform textured pattern to achieve an anti-glare effect. Currently, the industry generally uses etching technology to form the textured pattern on the glass surface.

[0003] However, existing glass etching processes generally use a spray etching solution to etch the glass. First, the etching solution is drawn from a storage tank and transported through pipelines to a spraying device, which then sprays it onto the glass surface for etching. Since the temperature of the etching solution in the storage tank can only be controlled, and the temperature of the etching solution flowing in the pipeline cannot be controlled, it is easy for the temperature of the etching solution sprayed on the surface of different batches of glass to be inconsistent, which in turn leads to different etching effects between different batches of glass. Summary of the Invention

[0004] This application provides a glass etching system and a glass etching method that enable different batches of glass to be etched by an etching solution at the same temperature, ensuring consistent etching results across different batches of glass.

[0005] In a first aspect, embodiments of this application provide a glass etching system, including an etching apparatus, the etching apparatus including an etching tank, a heat exchange tube, and a temperature control system; the heat exchange tube is disposed inside the etching tank.

[0006] The temperature control system is used to deliver a medium with a preset temperature into the heat exchange tube, and the heat exchange tube is used to heat or cool the etching solution in the etching tank using the medium inside it.

[0007] Secondly, embodiments of this application also provide a glass etching method, implemented using the glass etching system described above, the glass etching method comprising: immersing glass in an etching solution within the etching tank for etching treatment.

[0008] The glass etching system provided in this application embodiment, by setting a heat exchange tube inside the etching tank and using a temperature control system to deliver a medium with a preset temperature into the heat exchange tube, can use the medium in the heat exchange tube to heat or cool the etching solution in the etching tank, so as to keep the temperature of the etching solution in the etching tank constant, so that different batches of glass can be etched by etching solution at the same temperature, ensuring that the etching effect of different batches of glass is consistent. Attached Figure Description

[0009] To more clearly illustrate the technical solutions in the embodiments of this application, the accompanying drawings used in the description of the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0010] Figure 1 This is a schematic diagram of the glass etching system provided in an embodiment of this application.

[0011] Figure 2 This is a schematic diagram of the etching tank provided in an embodiment of this application.

[0012] Figure 3 This is a schematic diagram of the temperature control system provided in an embodiment of this application.

[0013] Figure 4 This is a schematic diagram of the fixture provided in an embodiment of this application. Detailed Implementation

[0014] The technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only a part of the embodiments of this application, and not all of them. All other embodiments obtained by those skilled in the art based on the embodiments of this application without creative effort are within the scope of protection of this application.

[0015] Please see Figure 1 , Figure 1 This is a schematic diagram of the structure of a glass etching system provided in an embodiment of this application. This application provides a glass etching system 100, including an etching apparatus 10. The etching apparatus 10 includes an etching tank 11, a heat exchange tube 12, and a temperature control system 20. The heat exchange tube 12 is disposed inside the etching tank 11. The temperature control system 20 is used to supply a medium with a preset temperature into the heat exchange tube 12, and the heat exchange tube 12 is used to heat or cool the etching solution in the etching tank 11 using the medium inside it.

[0016] The glass etching system 100 provided in this application embodiment, by setting a heat exchange tube 12 inside the etching tank 11 and using a temperature control system 20 to supply a medium with a preset temperature into the heat exchange tube 12, can use the medium in the heat exchange tube 12 to heat or cool the etching solution in the etching tank 11, so that the temperature of the etching solution in the etching tank 11 is kept constant (the temperature of the etching solution can be controlled within ±0.5℃), so that different batches of glass can be etched by the etching solution at the same temperature, ensuring that the etching effect of different batches of glass is consistent. That is to say, it solves the problem of unstable temperature of the etching solution in the existing spray etching process. In addition, in the existing spray etching process, once the etching solution crystallizes or impurities in the etching solution are adsorbed near the nozzle of the spray device, polyvinylpyrrolidone (PVP) and sodium dodecylbenzene sulfonate (SDS) in the etching solution will selectively adsorb around the foreign matter and continuously nucleate and grow, eventually clogging the nozzle of the spray device and causing flow interruption. The immersion etching process of this application does not have this problem.

[0017] For example, the heat exchange tube 12 can be a coil, which can be fitted into the inner wall of the etching tank 11. It is understood that a coil is a spiral-shaped pipe system. In this embodiment, by installing a coil inside the etching tank 11, the etching solution within the etching tank 11 can be uniformly heated or cooled, thereby maintaining a uniform temperature of the etching solution at different locations within the etching tank 11. This ensures consistent etching effects across different areas of the glass surface, improving product quality and production yield.

[0018] For example, the glass etching system 100 of this application embodiment can be used to produce anti-glare glass (AG). The anti-glare glass can be frosted AG, such as low-flash AG, ice-frosted AG, etc. Frosted refers to a frosted effect, in which a frosting solution is used to etch the glass to create a regular three-dimensional crystalline structure on the originally smooth glass surface, preventing glare and creating a sparkling appearance.

[0019] For example, the etching tank 11 can be made of acrylic, Teflon-coated steel plate, etc. Considering that Teflon-coated steel plate is heavier and not easy to handle, and that the material cost and processing cost are higher than those of acrylic, acrylic can be preferred.

[0020] Please see Figure 2 and Figure 3 , Figure 2 This is a schematic diagram of the etching tank provided in an embodiment of this application. Figure 3This is a schematic diagram of the structure of a temperature control system provided in an embodiment of this application. The temperature control system 20 may include a first branch 21 and a second branch 22. The first branch 21 includes a first container 211, a first inlet pipe 212, a first valve 213, and a first pump 214. The first container 211 is used to contain a medium with a first temperature. One end of the first inlet pipe 212 is connected to the first container 211, and the other end is connected to the heat exchange tube 12 to transport the medium in the first container 211 to the heat exchange tube 12. The first valve 213 and the first pump 214 are both disposed on the first inlet pipe 212.

[0021] The second branch 22 includes a second container 221, a second inlet pipe 222, a second valve 223, and a second pump 224. The second container 221 is used to contain a medium with a second temperature. One end of the second inlet pipe 222 is connected to the second container 221, and the other end is connected to the heat exchange tube 12 to transport the medium in the second container 221 to the heat exchange tube 12. The second valve 223 and the second pump 224 are both installed on the second inlet pipe 222.

[0022] The first temperature is higher than the second temperature.

[0023] For example, the medium in the first container 211 and the medium in the second container 221 can both be water.

[0024] For example, the first temperature can be 70℃~90℃ (e.g. 70℃, 75℃, 80℃, 85℃, 90℃, etc.), and the second temperature can be 0℃~10℃ (e.g. 0℃, 2℃, 4℃, 6℃, 8℃, 10℃, etc.).

[0025] For example, the first pump 214 and the second pump 224 can both be Southern centrifugal pumps CHM2-4LSWSC.

[0026] For example, both the first valve 213 and the second valve 223 can be solenoid valves.

[0027] Please combine Figure 2 and Figure 3The temperature control system 20 also includes a temperature sensor 23 and a control device 24. The temperature sensor 23 is located inside the etching tank 11 to monitor the temperature of the etching solution in the etching tank 11. The temperature sensor 23, the first valve 213, the first pump 214, the second valve 223, and the second pump 224 are all connected to the control device 24. After receiving the temperature data monitored by the temperature sensor 23, when the control device 24 determines that the etching solution in the etching tank 11 needs to be heated, the control device 24 controls the first valve 213 and the first pump 214 to open so that the medium with a first temperature can enter the heat exchange tube 12. When the control device 24 determines that the etching solution in the etching tank 11 needs to be cooled, the control device 24 controls the second valve 223 and the second pump 224 to open so that the medium with a second temperature can enter the heat exchange tube 12. It is understandable that by setting temperature sensor 23 and control device 24, the glass etching system can be automatically controlled, and the temperature of the etching solution in the etching tank 11 can be kept constant without human intervention, thereby ensuring that different batches of glass are etched under the same temperature conditions and that the etching effect of different batches of glass is consistent.

[0028] It is understood that the control device 24 can control the opening and closing of the first valve 213 and the first pump 214, as well as control the power of the first pump 214, thereby controlling whether the medium in the first container 211 flows into the heat exchange tube 12 and the flow rate. At the same time, the control device 24 can also control the opening and closing of the second valve 223 and the second pump 224, as well as control the power of the second pump 224, thereby controlling whether the medium in the second container 221 flows into the heat exchange tube 12 and the flow rate.

[0029] For example, temperature sensor 23 can be a contact-type corrosion-resistant ceramic temperature sensor.

[0030] For example, the temperature sensor 23 can be disposed on the inner wall of the etching tank 11. When the etching tank 11 is cuboid in shape, the temperature sensor 23 can be disposed at all four corners of the etching tank 11.

[0031] In actual production, the temperature of the etching solution is usually set to 10℃~14℃ (e.g., 10℃, 11℃, 12℃, 13℃, 14℃, etc.). When the temperature sensor 23 detects that the temperature of the etching solution is lower than the set value, the control device 24 determines that the etching solution in the etching tank 11 needs to be heated. At this time, the control device 24 will control the first valve 213 and the first pump 214 to open, so that the medium with the first temperature enters the heat exchange tube 12 to heat the etching solution in the etching tank 11. When the temperature sensor 23 detects that the temperature of the etching solution is higher than the set value, the control device 24 determines that the etching solution in the etching tank 11 needs to be cooled. At this time, the control device 24 will control the first valve 213 and the first pump 214 to open, so that the medium with the second temperature enters the heat exchange tube 12 to cool the etching solution in the etching tank 11.

[0032] Please combine Figure 2 and Figure 3 The first branch 21 also includes a first drain pipe 31, the two ends of which are connected to the heat exchange pipe 12 and the first container 211 respectively, so as to transport the medium in the heat exchange pipe 12 to the first container 211.

[0033] The second branch 22 also includes a second drain pipe 32, the two ends of which are connected to the heat exchange pipe 12 and the second container 221, respectively, so as to transport the medium in the heat exchange pipe 12 to the second container 221.

[0034] For example, valve devices may also be provided on both the first drain pipe 31 and the second drain pipe 32 to control the opening and closing of the first drain pipe 31 and the second drain pipe 32. The valve devices on the first drain pipe 31 and the second drain pipe 32 may both be connected to the control device 24. When the first valve 213 and the first pump 214 on the first branch 21 are open, the control device 24 can control the valve device on the first drain pipe 31 to open; when the second valve 223 and the second pump 224 on the second branch 22 are open, the control device 24 can control the valve device on the second drain pipe 32 to open.

[0035] Please combine Figure 1 The glass etching system 100 may also include a first cleaning device 41, an acid pickling device 50, and a second cleaning device 42. Before entering the etching tank 11, the glass to be etched will be sequentially cleaned by the first cleaning device 41, the acid pickling device 50, and the second cleaning device 42. The first cleaning device 41 is used to pre-clean the glass with water. The acid pickling device 50 is used to clean the glass with an acid solution. The second cleaning device 42 is used to clean the glass with water after acid pickling.

[0036] Understandably, the first cleaning device 41 uses water to pre-clean the glass, which can remove some of the dust, particles and other easily removable dirt from the glass surface. Then, the acid washing device 50 uses acid solution to clean the glass, which can remove dirt that is more difficult to remove from the glass surface. Finally, the second cleaning device 42 uses water to clean the glass, which can remove the acid solution remaining on the glass surface after acid washing.

[0037] Please combine Figure 1 The first cleaning device 41 includes a first cleaning tank 411, a heat exchange tube 12, and a temperature control system 20. The heat exchange tube 12 is disposed inside the first cleaning tank 411. The temperature control system 20 is used to supply a medium with a preset temperature into the heat exchange tube 12, and the heat exchange tube 12 is used to heat or cool the water in the first cleaning tank 411 using the medium inside it. For example, the heat exchange tube 12 can be a coil, and the coil can be disposed in close contact with the inner wall of the first cleaning tank 411.

[0038] For example, the material of the first cleaning tank 411 can be acrylic, steel plate, etc. Considering that steel plate is heavy and not easy to move, acrylic is preferred. The upper left corner and the lower right corner of the first cleaning tank 411 can be respectively installed with water inlet pipe and water outlet pipe. By designing the water inlet pipe and water outlet pipe diagonally opposite each other, with water entering at the upper end and water exiting at the lower end, it is beneficial to ensure that the water in the first cleaning tank 411 has a high degree of cleanliness.

[0039] Please combine Figures 1 to 3 The temperature control system 20 in the first cleaning device 41 can be configured to be the same as the temperature control system 20 in the etching device 10, both including a first branch 21 and a second branch 22. In addition, the temperature control system 20 in the first cleaning device 41 can also include a temperature sensor 23 and a control device 24. The temperature sensor 23 is located inside the first cleaning tank 411 to monitor the temperature of the water in the first cleaning tank 411. The temperature sensor 23, the first valve 213, the first pump 214, the second valve 223, and the second pump 224 are all connected to the control device 24. After receiving the temperature data monitored by the temperature sensor 23, when the control device 24 determines that the water in the first cleaning tank 411 needs to be heated, the control device 24 controls the first valve 213 and the first pump 214 to open. When the control device 24 determines that the water in the first cleaning tank 411 needs to be cooled, the control device 24 controls the second valve 223 and the second pump 224 to open. It is understandable that by setting temperature sensor 23 and control device 24, the temperature of the water in the first cleaning tank 411 can be kept constant, thereby ensuring that different batches of glass are cleaned under the same temperature conditions and ensuring that the cleaning effect of different batches of glass is consistent.

[0040] For example, the temperature sensor 23 can be disposed on the inner wall of the first cleaning tank 411. When the first cleaning tank 411 is cuboid in shape, the temperature sensor 23 can be disposed at each of the four corners of the first cleaning tank 411.

[0041] Please combine Figure 1 The pickling apparatus 50 may include a pickling tank 51, a heat exchange tube 12, and a temperature control system 20. The heat exchange tube 12 is disposed inside the pickling tank 51. The temperature control system 20 is used to supply a medium with a preset temperature into the heat exchange tube 12, and the heat exchange tube 12 is used to heat or cool the acid solution in the pickling tank 51 using the medium inside it. For example, the heat exchange tube 12 may be a coil, and the coil may be disposed in close contact with the inner wall of the pickling tank 51.

[0042] It should be noted that when the temperature of the acid solution at different locations in the pickling tank 51 is uneven, the cleaning effect at different locations of the glass will also be different. Therefore, in order to avoid this problem, this embodiment of the application sets a heat exchange tube 12 inside the pickling tank 51 and uses a temperature control system 20 to deliver a medium with a preset temperature into the heat exchange tube 12. The heat exchange tube 12 can be used to uniformly heat or cool the acid solution in the pickling tank 51, thereby keeping the temperature of the acid solution at different locations in the pickling tank 51 uniform and consistent, thus ensuring that the cleaning effect of different areas of the glass surface is consistent and improving the production yield.

[0043] For example, the pickling tank 51 can be made of acrylic, Teflon-plated steel plate, etc. Considering that Teflon-plated steel plate is heavier and not easy to handle, and that the material cost and processing cost are higher than those of acrylic, acrylic can be preferred.

[0044] Please combine Figures 1 to 3The temperature control system 20 in the pickling apparatus 50 can be configured to be the same as the temperature control system 20 in the etching apparatus 10, both including a first branch 21 and a second branch 22. In addition, the temperature control system 20 in the pickling apparatus 50 can also include a temperature sensor 23 and a control device 24. The temperature sensor 23 is located inside the pickling tank 51 to monitor the temperature of the acid solution in the pickling tank 51. The temperature sensor 23, the first valve 213, the first pump 214, the second valve 223, and the second pump 224 are all connected to the control device 24. After receiving the temperature data monitored by the temperature sensor 23, when the control device 24 determines that the acid solution in the pickling tank 51 needs to be heated, the control device 24 controls the first valve 213 and the first pump 214 to open. When the control device 24 determines that the acid solution in the pickling tank 51 needs to be cooled, the control device 24 controls the second valve 223 and the second pump 224 to open. It is understandable that by setting temperature sensor 23 and control device 24, the temperature of acid solution in pickling tank 51 can be kept constant, thereby ensuring that different batches of glass are cleaned under the same temperature conditions and ensuring that the cleaning effect of different batches of glass is consistent.

[0045] For example, the temperature sensor 23 can be set on the inner wall of the pickling tank 51. When the pickling tank 51 is rectangular, the temperature sensor 23 can be set at all four corners of the pickling tank 51.

[0046] Please combine Figure 1 The second cleaning device 42 includes a second cleaning tank 421, a heat exchange tube 12, and a temperature control system 20. The heat exchange tube 12 is disposed inside the second cleaning tank 421. The temperature control system 20 is used to supply a medium with a preset temperature into the heat exchange tube 12, and the heat exchange tube 12 is used to heat or cool the water in the second cleaning tank 421 using the medium inside it. For example, the heat exchange tube 12 can be a coil, and the coil can be disposed in conjunction with the inner wall of the etching tank 11.

[0047] For example, the material of the second cleaning tank 421 can be acrylic, steel plate, etc. Considering that steel plate is heavy and not easy to move, acrylic is preferred. The upper left corner and the lower right corner of the second cleaning tank 421 can be respectively installed with water inlet pipe and water outlet pipe. By designing the water inlet pipe and water outlet pipe diagonally opposite each other, with water entering at the upper end and water exiting at the lower end, it is beneficial to ensure that the water in the second cleaning tank 421 has a high degree of cleanliness.

[0048] Please combine Figures 1 to 3The temperature control system 20 in the second cleaning device 42 can be configured to be the same as the temperature control system 20 in the etching device 10, both including a first branch 21 and a second branch 22. In addition, the temperature control system 20 in the second cleaning device 42 can also include a temperature sensor 23 and a control device 24. The temperature sensor 23 is located inside the second cleaning tank 421 to monitor the temperature of the water in the second cleaning tank 421. The temperature sensor 23, the first valve 213, the first pump 214, the second valve 223, and the second pump 224 are all connected to the control device 24. After receiving the temperature data monitored by the temperature sensor 23, when the control device 24 determines that the water in the second cleaning tank 421 needs to be heated, the control device 24 controls the first valve 213 and the first pump 214 to open. When the control device 24 determines that the water in the second cleaning tank 421 needs to be cooled, the control device 24 controls the second valve 223 and the second pump 224 to open. It is understandable that by setting temperature sensor 23 and control device 24, the temperature of the water in the second cleaning tank 421 can be kept constant, thereby ensuring that different batches of glass are cleaned under the same temperature conditions and ensuring that the cleaning effect of different batches of glass is consistent.

[0049] For example, the temperature sensor 23 can be disposed on the inner wall of the second cleaning tank 421. When the second cleaning tank 421 is cuboid, the temperature sensor 23 can be disposed at each of the four corners of the second cleaning tank 421.

[0050] Please combine Figure 1 The glass etching system 100 also includes a third cleaning device 43 and a fourth cleaning device 44. After etching in the etching tank 11, the glass sequentially enters the third cleaning device 43 and the fourth cleaning device 44 for cleaning. Both the third cleaning device 43 and the fourth cleaning device 44 are used to clean the etched glass with water. It is understood that by continuously cleaning the glass etched in the etching tank 11 in the third cleaning device 43 and the fourth cleaning device 44 twice, the etching solution on the glass surface can be thoroughly removed.

[0051] Please combine Figure 1 The third cleaning device 43 includes a third cleaning tank 431, a heat exchange tube 12, and a temperature control system 20. The heat exchange tube 12 is disposed inside the third cleaning tank 431. The temperature control system 20 is used to supply a medium with a preset temperature into the heat exchange tube 12, and the heat exchange tube 12 is used to heat or cool the water in the third cleaning tank 431 using the medium inside it. For example, the heat exchange tube 12 can be a coil, and the coil can be disposed in close contact with the inner wall of the third cleaning tank 431.

[0052] For example, the material of the third cleaning tank 431 can be acrylic, steel plate, etc. Considering that steel plate is heavy and not easy to move, acrylic is preferred. The upper left corner and the lower right corner of the third cleaning tank 431 can be respectively installed with water inlet pipe and water outlet pipe. By designing the water inlet pipe and water outlet pipe diagonally opposite each other, with water entering at the upper end and water exiting at the lower end, it is beneficial to ensure that the water in the third cleaning tank 431 has a high degree of cleanliness.

[0053] Please combine Figures 1 to 3 The temperature control system 20 in the third cleaning device 43 can be configured to be the same as the temperature control system 20 in the etching device 10, both including a first branch 21 and a second branch 22. In addition, the temperature control system 20 in the third cleaning device 43 can also include a temperature sensor 23 and a control device 24. The temperature sensor 23 is located inside the third cleaning tank 431 to monitor the temperature of the water in the third cleaning tank 431. The temperature sensor 23, the first valve 213, the first pump 214, the second valve 223, and the second pump 224 are all connected to the control device 24. After receiving the temperature data monitored by the temperature sensor 23, when the control device 24 determines that the water in the third cleaning tank 431 needs to be heated, the control device 24 controls the first valve 213 and the first pump 214 to open. When the control device 24 determines that the water in the third cleaning tank 431 needs to be cooled, the control device 24 controls the second valve 223 and the second pump 224 to open. It is understandable that by setting temperature sensor 23 and control device 24, the temperature of the water in the third cleaning tank 431 can be kept constant, thereby ensuring that different batches of glass are cleaned under the same temperature conditions and ensuring that the cleaning effect of different batches of glass is consistent.

[0054] For example, the temperature sensor 23 can be disposed on the inner wall of the third cleaning tank 431. When the third cleaning tank 431 is cuboid in shape, the temperature sensor 23 can be disposed at each of the four corners of the third cleaning tank 431.

[0055] Please combine Figure 1 The fourth cleaning device 44 may include a fourth cleaning tank 441, a heat exchange tube 12, and a temperature control system 20. The heat exchange tube 12 is disposed inside the fourth cleaning tank 441. The temperature control system 20 is used to supply a medium with a preset temperature into the heat exchange tube 12, and the heat exchange tube 12 is used to heat or cool the water in the fourth cleaning tank 441 using the medium inside it. For example, the heat exchange tube 12 may be a coil, and the coil may be disposed in close contact with the inner wall of the fourth cleaning tank 441.

[0056] For example, the material of the fourth cleaning tank 441 can be acrylic, steel plate, etc. Considering that steel plate is heavy and not easy to move, acrylic is preferred. The upper left corner and the lower right corner of the fourth cleaning tank 441 can be respectively installed with water inlet pipe and water outlet pipe. By designing the water inlet pipe and water outlet pipe diagonally opposite each other, with water entering at the upper end and exiting at the lower end, it is beneficial to ensure that the water in the fourth cleaning tank 441 has a high degree of cleanliness.

[0057] Please combine Figures 1 to 3 The temperature control system 20 in the fourth cleaning device 44 can be configured to be the same as the temperature control system 20 in the etching device 10, both including a first branch 21 and a second branch 22. In addition, the temperature control system 20 in the fourth cleaning device 44 can also include a temperature sensor 23 and a control device 24. The temperature sensor 23 is located inside the fourth cleaning tank 441 to monitor the temperature of the water in the fourth cleaning tank 441. The temperature sensor 23, the first valve 213, the first pump 214, the second valve 223, and the second pump 224 are all connected to the control device 24. After receiving the temperature data monitored by the temperature sensor 23, when the control device 24 determines that the water in the fourth cleaning tank 441 needs to be heated, the control device 24 controls the first valve 213 and the first pump 214 to open. When the control device 24 determines that the water in the fourth cleaning tank 441 needs to be cooled, the control device 24 controls the second valve 223 and the second pump 224 to open. It is understandable that by setting temperature sensor 23 and control device 24, the temperature of the water in the fourth cleaning tank 441 can be kept constant, thereby ensuring that different batches of glass are cleaned under the same temperature conditions and ensuring that the cleaning effect of different batches of glass is consistent.

[0058] For example, the temperature sensor 23 can be disposed on the inner wall of the fourth cleaning tank 441. When the fourth cleaning tank 441 is cuboid in shape, the temperature sensor 23 can be disposed at each of the four corners of the fourth cleaning tank 441.

[0059] Please combine Figure 1 The glass etching system 100 also includes a robotic arm 60, which controls the movement of the glass between the first cleaning tank 411, the pickling tank 51, the second cleaning tank 421, the etching tank 11, the third cleaning tank 431, and the fourth cleaning tank 441, and controls the movement of the glass inside the first cleaning tank 411, the pickling tank 51, the second cleaning tank 421, the etching tank 11, the third cleaning tank 431, and the fourth cleaning tank 441.

[0060] For example, the robotic arm 60 can be programmed using the C++ language to achieve movements such as vertical movement, horizontal movement, pendulum movement, and wave-like movement. In this embodiment, when the glass enters the first cleaning tank 411, pickling tank 51, second cleaning tank 421, etching tank 11, third cleaning tank 431, or fourth cleaning tank 441, it can be operated by oblique entry into the water and reciprocating back and forth after entering the water.

[0061] It is understandable that the "water" in "oblique entry into water" can be any liquid, such as water, etching solution or acid solution. Oblique entry into water refers to the fact that when the glass is immersed in water, there is an angle (acute angle) between the plane on which the glass is located and the horizontal plane. After immersion in water, by making the glass swing back and forth, a uniform tangential force can be generated between the glass and the liquid, which is beneficial to improving the etching effect or cleaning effect of the glass. For the etching process in etching tank 11, this operation method can effectively solve the problem of etching sand leakage.

[0062] For example, the robotic arm 60 can be a six-axis robotic arm to ensure that the robotic arm has sufficient degrees of freedom to ensure that the robotic arm 60 can drive the glass to perform complex movements.

[0063] In this embodiment of the application, the reachable radius of the robotic arm 60 is 2000-2500mm. This is because the robotic arm 60 needs to move the glass from the first cleaning tank 411 to the fourth cleaning tank 441, and the reachable radius of the robotic arm 60 needs to be able to cover about 2500mm.

[0064] In this embodiment, the robotic arm 60 can be installed on the ground, and the ground needs to be sprayed with corrosion-resistant paint to prevent the penetration of chemicals.

[0065] For example, the range of motion of the robotic arm 60 includes: 420° / 5-6 rad for the J1 axis, 420° / 5-6 rad for the J2 axis, 420° / 7-8 rad for the J3 axis, 380° / 6-7 rad for the J4 axis, 380° / 4-5 rad for the J5 axis, and 720° / 12-13 rad for the J6 axis.

[0066] For example, the wrist of the robotic arm 60 can handle a mass of 15-20 kg, which can improve the load capacity and production capacity of the robotic arm 60 while ensuring that the glass does not shake significantly when it is submerged in water, thus avoiding product defects caused by the shaking of the glass when it is submerged in water.

[0067] For example, the wrist of the robotic arm 60 can be subjected to a load torque of 20-25 Nm for the J4 axis, 20-25 Nm for the J5 axis, and 20-25 Nm for the J6 axis.

[0068] For example, the wrist of the robotic arm 60 allows for a load rotational inertia of 0.6-0.8 kgm along the J4 axis. 2 The J5 shaft can achieve a torque of 0.6-0.8 kgm. 2 The J6 shaft can achieve a torque of 0.6-0.8 kgm. 2 .

[0069] For example, the repeatability of the robotic arm 60 is ±0.02 mm.

[0070] Please combine Figure 1 The etching apparatus 10 may also include a clamp 70 disposed in the etching tank 11, which is used to fix the glass during the etching reaction.

[0071] Please see Figure 4 , Figure 4 This is a schematic diagram of the fixture provided in the embodiment of this application. The fixture 70 may include a support frame 71 and a plurality of fixing frames 72 mounted on the support frame 71. The fixing frames 72 are used to fix the glass. The support frame 71 includes a bottom support 711, a top support 712 and a side support 713. The bottom support 711 and the top support 712 are arranged opposite to each other. The side support 713 is disposed between the bottom support 711 and the top support 712 and connects the bottom support 711 and the top support 712 respectively. The plurality of fixing frames 72 are all mounted on the bottom support 711.

[0072] For example, the fixture 72 can be a Teflon-plated iron frame. The Teflon can ensure that the fixture 72 will not be corroded by hydrofluoric acid, and the iron frame can ensure that the fixture 70 can sink quickly to the bottom after entering the etching solution and will not float on the surface of the etching solution.

[0073] Understandably, the support frame 71 is used to support and mount the mounting bracket 72. For example, the support frame 71 may be made of polyvinyl chloride (PVC) because PVC is resistant to strong acid corrosion and is lightweight, thus reducing the load on the robotic arm 60.

[0074] For example, the mounting bracket 72 can be provided with multiple engaging portions, and the glass can be inserted into the engaging portions. It is understood that by providing multiple engaging portions on the mounting bracket 72, the number of glasses that the mounting bracket 72 can bear can be increased, thereby increasing the glass placement density on the mounting bracket 72, and thus significantly increasing the production line capacity. Compared with the existing spray etching system, the glass etching system 100 provided in this application embodiment can increase the capacity by 300%. Furthermore, the shape of the engaging portion can be set to match the shape of the glass, that is, to achieve a contour-following design, so that the glass can be firmly fixed on the mounting bracket 72.

[0075] The clamp 70 can be used as follows: First, fix multiple pieces of glass on the fixing frame 72. Then, the robotic arm 60 clamps the support frame 71 and enters the etching solution by cutting into the water at an angle. After that, the robotic arm 60 clamps the support frame 71 and moves back and forth in the etching solution.

[0076] Please combine Figures 1 to 4 This application also provides a glass etching method, which is implemented using the glass etching system 100 in any of the above embodiments. The glass etching method may include: immersing the glass in the etching solution in the etching tank 11 for etching treatment.

[0077] For example, "immersing the glass in the etching solution within the etching tank 11 for etching treatment" may specifically include: allowing the glass to enter the etching solution at an angle, and then reciprocating within the etching solution after the glass enters. It should be noted that "angled" means that when the glass enters the etching solution, the angle between the glass and the surface of the etching solution is acute.

[0078] In existing spray etching processes, a spray device is used to spray the etching solution into a mist onto the glass surface. However, during the nucleation process of the snowflake crystal chemical reaction, fluorosilicates lack sufficient tangential force for adsorption and nucleation, preventing the uniform growth of PVP chains or SDS molecules and resulting in a high rate of crystal leakage. This application employs an immersion etching process combined with oblique water entry and reciprocating motion, which enables uniform tangential force between the glass and the etching solution. This achieves uniform adsorption and growth of snowflake crystal nuclei on the glass surface, avoiding phenomena such as crystal leakage (unetched areas on the glass surface).

[0079] For example, when the glass etching system 100 further includes a first cleaning device 41, an acid pickling device 50, and a second cleaning device 42, the glass etching method may further include: before the glass enters the etching tank 11 for etching, the glass is sequentially cleaned by entering the first cleaning device 41, the acid pickling device 50, and the second cleaning device 42.

[0080] For example, when the glass etching system 100 further includes a third cleaning device 43 and a fourth cleaning device 44, the glass etching method may further include: after the glass is etched in the etching tank 11, the glass is sequentially sent into the third cleaning device 43 and the fourth cleaning device 44 for cleaning.

[0081] The glass etching system and glass etching method provided in the embodiments of this application have been described in detail above. Specific examples have been used to illustrate the principles and implementation methods of this application. The descriptions of the embodiments above are only for the purpose of helping to understand this application. Furthermore, those skilled in the art will recognize that, based on the ideas of this application, there will be changes in the specific implementation methods and application scope. Therefore, the content of this specification should not be construed as a limitation of this application.

Claims

1. A glass etching system, characterized in that, The system includes a first cleaning device, an acid pickling device, a second cleaning device, and an etching device. The first cleaning device includes a first cleaning tank, heat exchange tubes, and a temperature control system. The second cleaning device includes a second cleaning tank, heat exchange tubes, and a temperature control system. The acid pickling device includes an acid pickling tank, heat exchange tubes, and a temperature control system. The etching device includes an etching tank, heat exchange tubes, and a temperature control system. The glass to be etched enters the first cleaning device, the acid pickling device, and the second cleaning device sequentially for cleaning before entering the etching tank. The heat exchange tubes of the etching device are located inside the etching tank. The temperature control system of the etching apparatus is used to deliver a medium with a preset temperature into the heat exchange tube of the etching apparatus, and the heat exchange tube of the etching apparatus is used to heat or cool the etching solution in the etching tank using the medium inside it. The glass etching system further includes a robotic arm and a clamp disposed in the etching tank. The clamp includes a support frame and multiple fixing frames mounted on the support frame. The fixing frames are used to fix the glass. The robotic arm is used to grip the support frame and enter the etching solution at an angle, and to reciprocate in the etching solution, so that the angle between the glass and the surface of the etching solution is an acute angle.

2. The glass etching system according to claim 1, characterized in that, The temperature control system of the etching apparatus includes a first branch and a second branch. The first branch includes a first container, a first water inlet pipe, a first valve, and a first pump. The first container is used to contain a medium with a first temperature. One end of the first water inlet pipe is connected to the first container, and the other end is connected to the heat exchange tube of the etching apparatus to transport the medium in the first container to the heat exchange tube of the etching apparatus. The first valve and the first pump are both installed on the first water inlet pipe. The second branch includes a second container, a second inlet pipe, a second valve, and a second pump. The second container is used to contain a medium with a second temperature. One end of the second inlet pipe is connected to the second container, and the other end is connected to the heat exchange tube of the etching device to transport the medium in the second container to the heat exchange tube of the etching device. The second valve and the second pump are both installed on the second inlet pipe. The first temperature is higher than the second temperature.

3. The glass etching system according to claim 2, characterized in that, The temperature control system of the etching apparatus also includes a temperature sensor and a control device. The temperature sensor is located inside the etching tank to monitor the temperature of the etching solution in the etching tank. The temperature sensor, the first valve, the first pump, the second valve, and the second pump are all connected to the control device. After receiving the temperature data monitored by the temperature sensor, when the control device determines that the etching solution in the etching tank needs to be heated, the control device controls the first valve and the first pump to open; when the control device determines that the etching solution in the etching tank needs to be cooled, the control device controls the second valve and the second pump to open.

4. The glass etching system according to claim 2, characterized in that, The first branch also includes a first drain pipe, the two ends of which are respectively connected to the heat exchange tube of the etching device and the first container, so as to transport the medium in the heat exchange tube of the etching device to the first container. The second branch also includes a second drain pipe, the two ends of which are connected to the heat exchange tube of the etching device and the second container, respectively, so as to transport the medium in the heat exchange tube of the etching device to the second container.

5. The glass etching system according to claim 1, characterized in that, The first cleaning device is used to pre-clean the glass with water; The pickling device is used to clean glass with an acid solution; The second cleaning device is used to clean the glass with water after pickling.

6. The glass etching system according to claim 5, characterized in that, The heat exchange tube of the first cleaning device is disposed inside the first cleaning tank; the temperature control system of the first cleaning device is used to deliver a medium with a preset temperature into the heat exchange tube of the first cleaning device, and the heat exchange tube of the first cleaning device is used to heat or cool the water in the first cleaning tank using the medium inside it. The heat exchange tube of the pickling device is disposed inside the pickling tank; the temperature control system of the pickling device is used to deliver a medium with a preset temperature into the heat exchange tube of the pickling device, and the heat exchange tube of the pickling device is used to heat or cool the acid solution in the pickling tank using the medium inside it. The heat exchange tube of the second cleaning device is disposed inside the second cleaning tank; the temperature control system of the second cleaning device is used to deliver a medium with a preset temperature into the heat exchange tube of the second cleaning device, and the heat exchange tube of the second cleaning device is used to heat or cool the water in the second cleaning tank using the medium inside it.

7. The glass etching system according to claim 1, characterized in that, The glass etching system also includes a third cleaning device and a fourth cleaning device; after the glass is etched in the etching tank, it will sequentially enter the third cleaning device and the fourth cleaning device for cleaning. Both the third and fourth cleaning devices are used to clean the etched glass with water.

8. The glass etching system according to claim 7, characterized in that, The third cleaning device includes a third cleaning tank, a heat exchange tube, and a temperature control system; the heat exchange tube of the third cleaning device is disposed inside the third cleaning tank; the temperature control system of the third cleaning device is used to deliver a medium with a preset temperature into the heat exchange tube of the third cleaning device, and the heat exchange tube of the third cleaning device is used to heat or cool the water in the third cleaning tank using the medium inside it. The fourth cleaning device includes a fourth cleaning tank, a heat exchange tube, and a temperature control system; the heat exchange tube of the fourth cleaning device is disposed inside the fourth cleaning tank; the temperature control system of the fourth cleaning device is used to deliver a medium with a preset temperature into the heat exchange tube of the fourth cleaning device, and the heat exchange tube of the fourth cleaning device is used to heat or cool the water in the fourth cleaning tank using the medium inside it.

9. The glass etching system according to claim 8, characterized in that, The robotic arm is used to control the movement of glass between the first cleaning tank, the pickling tank, the second cleaning tank, the etching tank, the third cleaning tank, and the fourth cleaning tank, and to control the movement of glass inside the first cleaning tank, the pickling tank, the second cleaning tank, the etching tank, the third cleaning tank, and the fourth cleaning tank.

10. A glass etching method, characterized in that, The glass etching method is implemented using the glass etching system as described in any one of claims 1-9, and includes immersing the glass in the etching solution within the etching tank for etching treatment.

11. The glass etching method according to claim 10, characterized in that, The etching process of immersing the glass in the etching solution in the etching tank includes: allowing the glass to enter the etching solution at an oblique angle, and after the glass enters the etching solution, allowing the glass to reciprocate in the etching solution.

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