Film layer assembly and electronic device

Abstract

The present application discloses a film layer assembly and an electronic device, wherein the film layer assembly is used for a camera device and includes: a substrate; a functional film layer; an ultraviolet absorption layer, wherein the ultraviolet absorption layer is connected between the substrate and the functional film layer; a convex and concave portion is provided on the side of the substrate facing the ultraviolet absorption layer, and a portion of the ultraviolet absorption layer is filled in the convex and concave portion.

Description

Technical Field

[0001] The present application belongs to the technical field of electronic devices, and specifically relates to a film layer assembly and an electronic device. Background Art

[0002] In related technologies, lenses consist of a substrate and a layered functional film structure, where the substrate is a resin substrate. The functional film is often fabricated using ion-assisted vapor deposition. However, the ultraviolet radiation generated by the high-energy ions can break the carbon-containing backbone of the substrate, modifying and aging the substrate surface. This results in poor adhesion between the functional film and the substrate, and can easily cause the functional film to delaminate. Summary of the Invention

[0003] The present application aims to provide a film layer assembly, a camera device and an electronic device, which at least solve the technical problem in the related art that the functional film is peeled off due to the surface modification and aging of the substrate material.

[0004] In order to solve the above technical problems, this application is implemented as follows:

[0005] In the first aspect, an embodiment of the present application proposes a film layer assembly for a camera device, comprising: a substrate; a functional film layer; an ultraviolet absorption layer, wherein the ultraviolet absorption layer is connected between the substrate and the functional film layer; a convex and concave portion is provided on the side of the substrate facing the ultraviolet absorption layer, and a portion of the ultraviolet absorption layer is filled in the convex and concave portion.

[0006] In a second aspect, an embodiment of the present application provides an electronic device, comprising: a film layer assembly as in any embodiment of the first aspect.

[0007] In an embodiment of the present application, the film layer assembly includes a substrate, a functional film layer and an ultraviolet absorption layer.

[0008] By reasonably setting the matching structure of the substrate, the functional film layer and the ultraviolet absorption layer, the ultraviolet absorption layer is located between the substrate and the functional film layer, the ultraviolet absorption layer is connected to the substrate, and the ultraviolet absorption layer is connected to the functional film layer.

[0009] The ultraviolet absorption layer has the function of protecting the substrate. The ultraviolet absorption layer can reduce the chemical modification of the surface of the substrate by ultraviolet high-energy ions, delay the material aging of the substrate, and further improve the adhesion between the substrate and the functional film layer. As the use time of the film layer assembly increases, it will not cause damage to the substrate, thereby improving the structural stability of the film layer assembly and reducing the probability of functional film layer peeling, which is beneficial to extending the service life of the product and improving the product's performance.

[0010] It is understood that the functional film layer imparts specific functionality to the film layer assembly. In other words, the functional function of the functional film layer is determined based on the application scenario of the film layer assembly. For example, the functional film layer may have a light-transmitting function, a light-reflecting function, or a light-absorbing function, and so on. These functions are not listed here one by one.

[0011] Furthermore, by rationally setting the matching structure of the substrate and the ultraviolet absorbing layer, the substrate is provided with a convex-concave portion, the convex-concave portion is arranged toward the ultraviolet absorbing layer, and a portion of the ultraviolet absorbing layer is filled in the convex-concave portion. The structural setting of the convex-concave portion roughens the surface of the substrate, so that the surface of the substrate exposes more active sites, thereby increasing the chemical bonding between the substrate and the functional film layer and improving the adhesion between the substrate and the functional film layer. The phenomenon of the functional film layer being peeled off is less likely to occur. Additional aspects and advantages of the present application will be partially given in the following description, and some will become apparent from the following description, or will be understood through the practice of the present application. BRIEF DESCRIPTION OF THE DRAWINGS

[0012] The above and / or additional aspects and advantages of the present application will become apparent and easily understood from the description of the embodiments in conjunction with the following drawings, in which:

[0013] Figure 1 This is a schematic structural diagram of the membrane layer assembly of the first embodiment of the present application;

[0014] Figure 2 is a schematic structural diagram of a membrane layer assembly according to a second embodiment of the present application;

[0015] Figure 3 yes Figure 2 Schematic diagram of the absorption rate of the membrane layer component;

[0016] Figure 4 is a schematic structural diagram of a membrane layer assembly according to a third embodiment of the present application;

[0017] Figure 5 yes Figure 4 Schematic diagram of the reflectivity of the film layer components.

[0018] Reference numerals:

[0019] Figure 1 、 Figure 2 and Figure 4 The corresponding relationship between the reference numerals and component names is as follows:

[0020] 100 film layer assembly, 110 substrate, 112 convex-concave portion, 120 functional film layer, 122 first functional portion, 1222 first silicon dioxide layer, 1224 titanium-aluminum compound layer, 124 second functional portion, 1242 second silicon dioxide layer, 1244 titanium dioxide layer, 126 silicon dioxide functional portion, 130 ultraviolet absorption layer, 140 wear-resistant layer. DETAILED DESCRIPTION

[0021] The embodiments of the present application will be described in detail below. Examples of the embodiments are shown in the accompanying drawings, wherein the same or similar reference numerals throughout represent the same or similar elements or elements having the same or similar functions. The embodiments described below with reference to the accompanying drawings are exemplary and are only used to explain the present application and are not to be construed as limiting the present application. Based on the embodiments in the present application, all other embodiments obtained by ordinary technicians in this field without making creative efforts are within the scope of protection of this application.

[0022] The terms "first" and "second" in the specification and claims of this application may explicitly or implicitly refer to one or more of the features. Throughout the description of this application, unless otherwise specified, "plurality" means two or more. Furthermore, "and / or" in the specification and claims refers to at least one of the connected entities, and the character " / " generally indicates an "or" relationship between the connected entities.

[0023] In the description of this application, it should be noted that, unless otherwise expressly specified or limited, the terms "connected" and "connection" should be understood in a broad sense. For example, they can refer to fixed connection, detachable connection, or integral connection; they can refer to mechanical connection or connection; they can refer to direct connection, indirect connection through an intermediate medium, or internal communication between two components. Those skilled in the art will understand the specific meanings of the above terms in this application based on the specific circumstances.

[0024] The following combination Figures 1 to 5 The following describes a film layer assembly 100 and an electronic device according to an embodiment of the present application.

[0025] like Figure 1 、 Figure 2 and Figure 4 As shown, according to some embodiments of the present application, the film layer assembly 100 is used in a camera device and includes: a substrate 110 ; a functional film layer 120 ; and an ultraviolet absorption layer 130 , wherein the ultraviolet absorption layer 130 is connected between the substrate 110 and the functional film layer 120 .

[0026] In this embodiment, the film layer assembly 100 includes a substrate 110 , a functional film layer 120 and an ultraviolet absorption layer 130 .

[0027] By reasonably setting the matching structure of the substrate 110, the functional film layer 120 and the ultraviolet absorption layer 130, the ultraviolet absorption layer 130 is located between the substrate 110 and the functional film layer 120, the ultraviolet absorption layer 130 is connected to the substrate 110, and the ultraviolet absorption layer 130 is connected to the functional film layer 120.

[0028] The ultraviolet absorption layer 130 has the function of protecting the substrate 110. The ultraviolet absorption layer 130 can reduce the chemical modification of the surface of the substrate 110 by ultraviolet high-energy ions, delay the material aging of the substrate 110, and further improve the adhesion between the substrate 110 and the functional film layer 120. As the use time of the film layer assembly 100 increases, it will not cause damage to the substrate 110, thereby improving the structural stability of the film layer assembly 100 and reducing the probability of demolding of the functional film layer 120, which is beneficial to extending the service life of the product and improving the performance of the product.

[0029] It is understood that the functional film layer 120 provides the film assembly 100 with specific functions. In other words, the function of the functional film layer 120 can be set according to the usage scenario of the film assembly 100. For example, the functional film layer 120 can have a light-transmitting function, a light-reflecting function, or a light-absorbing function, etc., which are not listed here one by one.

[0030] In some embodiments, as Figure 1 、 Figure 2 and Figure 4 As shown, a convexo-concave portion 112 is provided on a side of the substrate 110 facing the ultraviolet absorbing layer 130 , and a portion of the ultraviolet absorbing layer 130 is filled in the convexo-concave portion 112 .

[0031] In this embodiment, by rationally arranging the matching structure of substrate 110 and UV absorbing layer 130, substrate 110 is provided with a convex-concave portion 112. Concave-concave portion 112 is disposed toward UV absorbing layer 130, and a portion of UV absorbing layer 130 is filled in concave-concave portion 112. The structural arrangement of concave-concave portion 112 roughens the surface of substrate 110, exposing more active sites on the surface of substrate 110. This increases the chemical bonding between substrate 110 and functional film layer 120, improving the adhesion between the two layers and making it less likely for functional film layer 120 to delaminate.

[0032] In some embodiments, the UV absorbing layer 130 includes a lanthanum titanate layer.

[0033] In this embodiment, the composition of the ultraviolet absorption layer 130 is refined. Specifically, the ultraviolet absorption layer 130 includes a lanthanum titanate layer. The lanthanum titanate layer is more easily vaporized into a film using electron beam evaporation. Therefore, the lanthanum titanate layer can be inserted as a protective layer between the substrate 110 and the functional film layer 120 using electron beam evaporation technology, which generates less ultraviolet radiation.

[0034] In some embodiments, the refractive index of the ultraviolet absorption layer 130 is greater than or equal to 1.99 / 550 nm and less than or equal to 2.1 / 550 nm; the thickness of the ultraviolet absorption layer 130 is greater than or equal to 20 nm and less than or equal to 300 nm.

[0035] In this embodiment, the parameters of the ultraviolet absorbing layer 130 are further defined. Specifically, the refractive index of the ultraviolet absorbing layer 130 is greater than or equal to 1.99 / 550nm and less than or equal to 2.1 / 550nm. In other words, the refractive index measured at a wavelength of 550nm is greater than or equal to 1.99 and less than or equal to 2.1. For example, the refractive index includes 2.02, 2.04, 2.06, 2.08, etc., which are not listed here one by one.

[0036] The substrate 110 includes any one of the following or a combination thereof: a polyethylene terephthalate substrate 110 , a polycarbonate substrate 110 , and a polymethyl methacrylate substrate 110 .

[0037] This configuration makes the refractive index of the ultraviolet absorption layer 130 close to the refractive index of the substrate 110 , which is beneficial to the film system design based on the substrate 110 .

[0038] Furthermore, the thickness of the ultraviolet absorbing layer 130 is greater than or equal to 20 nm and less than or equal to 300 nm. For example, the thickness of the ultraviolet absorbing layer 130 includes 30 nm, 40 nm, 50 nm, 60 nm, 70 nm, 80 nm, 90 nm, 120 nm, 140 nm, 160 nm, 180 nm, 200 nm, 220 nm, 240 nm, 260 nm, and 280 nm, etc., which are not listed here one by one. The thickness of the ultraviolet absorbing layer 130 is within the above range, which has a protective effect on the substrate 110.

[0039] This arrangement can improve the adhesion between the substrate 110 and the functional film layer 120 while ensuring the specific optical properties of the functional film layer 120 .

[0040] In some embodiments, as Figure 1 、 Figure 2 and Figure 4 As shown, the film layer assembly 100 further includes: a wear-resistant layer 140 , which is disposed on a side of the functional film layer 120 away from the ultraviolet absorption layer 130 .

[0041] In this embodiment, by reasonably setting the structure of the membrane component 100, the membrane component 100 also includes a wear-resistant layer 140, and the functional membrane layer 120 is located between the ultraviolet absorption layer 130 and the wear-resistant layer 140. The wear-resistant layer 140 can reduce the friction coefficient, and its surface is smoother, which can improve the friction resistance of the functional membrane layer 120, and thus can improve the structural stability of the membrane component 100, which is beneficial to extending the service life of the membrane component 100 and improving the performance of the membrane component 100.

[0042] In some embodiments, the wear resistant layer 140 includes a silicone-modified perfluoropolyether polymer layer.

[0043] In this embodiment, the structure of the wear-resistant layer 140 is further defined so that the wear-resistant layer 140 includes a silicone-modified perfluoropolyether layer, wherein the type of the modified perfluoropolyether can be arbitrarily selected from Y-type (a polymer formed by photo-oxidation of hexafluoropropylene under ultraviolet light), Z-type (a straight-chain compound formed by photo-oxidation of tetrafluoroethylene), K-type (a branched-chain compound polymerized by hexafluoropropylene oxide under the catalysis of cesium fluoride) and D-type (a polymer formed by direct fluorination of the polymerization product of tetrafluorooxetane).

[0044] In some embodiments, the surface tension of the wear-resistant layer 140 is greater than or equal to 6.7 mN / m and less than or equal to 25 mN / m.

[0045] In this embodiment, the parameters of the wear-resistant layer 140 are further defined. Specifically, the surface tension of the wear-resistant layer 140 is greater than or equal to 6.7 mN / m and less than or equal to 25 mN / m. The surface tension of the wear-resistant layer 140 is within this range, which ensures that the functional film layer 120 has the specific functions while improving the surface smoothness and wear resistance of the film structure.

[0046] Specifically, the surface tension of the wear-resistant layer 140 includes 18 mN / m, 19 mN / m, 20 mN / m, 21 mN / m, 22 mN / m, 23 mN / m, and 24 mN / m, etc., which are not listed here one by one.

[0047] In some embodiments, the convex-concave portion 112 is formed by ion etching, laser etching, corrosion, photolithography, or nanoimprinting.

[0048] In this embodiment, the convex-concave portion 112 can be formed by ion etching, laser etching, corrosion, photolithography or nano-imprinting.

[0049] In some embodiments, the protrusions of the convexo-concave portion 112 may have a cylindrical shape, a conical shape, a quadrangular prism, or a truncated cone shape.

[0050] In this embodiment, the structure of the convex-concave portion 112 is further defined, and the shape of the protrusions of the convex-concave portion 112 includes a column, a cone, a quadrangular prism or a truncated cone. This setting roughens the surface of the substrate 110, so that the surface of the substrate 110 exposes more active sites, thereby increasing the chemical bonding between the substrate 110 and the functional film layer 120.

[0051] In some embodiments, the root mean square of the surface roughness of the protrusions of the convexo-concave portion 112 is greater than or equal to 0.8 nm and less than or equal to 100 nm; the width of the protrusions in the direction perpendicular to the thickness of the membrane layer assembly 100 is greater than or equal to 10 nm and less than or equal to 400 nm.

[0052] In this embodiment, the structure of the convex-concave portion 112 is further defined. Specifically, the root mean square of the surface roughness of the protrusions of the convex-concave portion 112 is greater than or equal to 0.8 nm and less than or equal to 100 nm, and the width S of the protrusions in the first direction is greater than or equal to 10 nm and less than or equal to 400 nm.

[0053] It can be understood that when the shape of the protrusion is irregular, or the width of the protrusion in the first direction is uneven along the thickness direction of the membrane layer assembly 100, the width S of the protrusion refers to the average value of the width of the protrusion in the first direction along the thickness direction of the membrane layer assembly 100.

[0054] Specifically, the root mean square of the surface roughness of the protrusions includes 10 nm, 20 nm, 30 nm, 40 nm, 50 nm, 60 nm, 70 nm, 80 nm and 90 nm, etc., which are not listed here one by one.

[0055] In some embodiments, the substrate 110 includes any one or a combination of the following: a polyethylene terephthalate substrate 110 , a polycarbonate substrate 110 , and a polymethyl methacrylate substrate 110 .

[0056] In some embodiments, as Figure 2 As shown, the functional film layer 120 includes: multiple first functional parts 122, multiple first functional parts 122 are stacked, each first functional part 122 includes a first silicon dioxide layer 1222 and a titanium aluminum compound layer 1224, and the first silicon dioxide layer 1222 is stacked on the side of the titanium aluminum compound layer 1224 away from the ultraviolet absorption layer 130.

[0057] In this embodiment, the functional film layer 120 includes a plurality of first functional portions 122, which are stacked along the thickness direction of the film layer assembly 100. Each first functional portion 122 includes a first silicon dioxide layer 1222 and a titanium-aluminum compound layer 1224. That is, the functional film layer 120 includes N first functional portions 122. Alternatively, the functional film layer 120 includes N first silicon dioxide layers 1222 and N titanium-aluminum compound layers 1224. A titanium-aluminum compound layer 1224 is sandwiched between any two adjacent first silicon dioxide layers 1222, and a first silicon dioxide layer 1222 is sandwiched between any two adjacent titanium-aluminum compound layers 1224.

[0058] Functional film layer 120 has a multi-layer structure, which provides high absorption and low reflectivity. When light enters functional film layer 120, it has low reflectivity and low transmittance, thus meeting the requirements of high absorption, low reflectivity, and low transmittance for film layer assembly 100.

[0059] like Figure 2 As shown, the functional film layer 120 includes three first functional sections 122, designated as Functional Section 1, Functional Section 2, and Functional Section 3. The thickness of the first silicon dioxide layer 1222 of Functional Section 1 is 63 nm, and the thickness of the titanium-aluminum compound layer 1224 is 23 nm. The thickness of the first silicon dioxide layer 1222 of Functional Section 2 is 17 nm, and the thickness of the titanium-aluminum compound layer 1224 is 240 nm. The thickness of the first silicon dioxide layer 1222 of Functional Section 3 is 41 nm, and the thickness of the titanium-aluminum compound layer 1224 is 15 nm. The thickness of the wear-resistant layer 140 is 15 nm. The thickness of the ultraviolet absorption layer 130 is 100 nm. The thickness of the base layer is 2 mm.

[0060] In some other embodiments, the functional film layer 120 is a single-layer structure.

[0061] In some embodiments, as Figure 4 As shown, the functional film layer 120 includes: a plurality of second functional parts 124, the plurality of second functional parts 124 are stacked, each second functional part 124 includes a second silicon dioxide layer 1242 and a titanium dioxide layer 1244, the second silicon dioxide layer 1242 is stacked on the side of the titanium dioxide layer 1244 away from the ultraviolet absorption layer 130; a second silicon dioxide functional part 126, the second silicon dioxide functional part 126 is located between the plurality of second functional parts 124 and the ultraviolet absorption layer 130.

[0062] In this embodiment, the functional film layer 120 includes a plurality of second functional portions 124 and a second silicon dioxide functional portion 126. The plurality of second functional portions 124 are stacked along the thickness direction of the film layer assembly 100. Each second functional portion 124 includes a second silicon dioxide layer 1242 and a titanium dioxide layer 1244. In other words, the functional film layer 120 includes N second functional portions 124. Alternatively, the functional film layer 120 includes N second silicon dioxide layers 1242 and N titanium dioxide layers 1244. A titanium dioxide layer 1244 is sandwiched between any two adjacent second silicon dioxide layers 1242, and a second silicon dioxide layer 1242 is sandwiched between any two adjacent titanium dioxide layers 1244.

[0063] The functional film layer 120 has a multi-layer structure, which enables the functional film layer 120 to have high transmittance and low reflectivity. When light enters the functional film layer 120, the reflectivity is low and the transmittance is high, thus meeting the low reflectivity and high transmittance requirements of the film layer assembly 100.

[0064] like Figure 4 As shown, the functional film layer 120 includes two second functional sections 124, designated as functional section four and functional section five. The second silicon dioxide layer 1242 of functional section four has a thickness of 92 nm, and the titanium dioxide layer 1244 has a thickness of 38 nm. The second silicon dioxide layer 1242 of functional section five has a thickness of 8 nm, and the titanium dioxide layer 1244 has a thickness of 66 nm. The wear-resistant layer 140 has a thickness of 18 nm. The ultraviolet absorption layer 130 has a thickness of 24 nm. The base layer has a thickness of 2 mm. The second silicon dioxide functional section 126 has a thickness of 26 nm.

[0065] Specifically, first, a roughened resin is used as the substrate 110 to expose more active sites (ie, the convex and concave portions 112 ) on the surface, thereby increasing the chemical bonding between the substrate 110 and the functional film layer 120 .

[0066] Secondly, by adding an ultraviolet absorption layer 130 (such as a lanthanum titanate layer) with the function of protecting the substrate 110 between the substrate 110 and the functional film layer 120, the chemical modification of the surface of the substrate 110 by ultraviolet high-energy ions is reduced, the aging of the material is delayed, and the adhesion between the substrate 110 and the functional film layer 120 is further improved.

[0067] Finally, a wear-resistant layer 140 (wherein the wear-resistant layer 140 includes a fluorine-containing coating) is coated on the outermost layer to reduce surface energy, reduce the dynamic friction coefficient, make the surface smoother, improve friction resistance, and thereby improve the structural stability of the membrane assembly 100.

[0068] The film layer assembly 100 of the present application greatly increases the adhesion and wear resistance of the functional film layer 120 on the substrate 110, further improving the product performance of the camera device.

[0069] Specifically, the substrate 110 is roughened. The substrate 110 includes, but is not limited to, a polyethylene terephthalate (PET) substrate 110, a polycarbonate (PC) substrate 110, and a polymethyl methacrylate (PMMA) substrate 110. Methods for roughening the substrate 110 include, but are not limited to, ion etching, laser etching, wet etching, photolithography, and nanoimprinting. The shape of the roughened substrate 110 (i.e., forming the convex-concave portion 112) can be regular, including but not limited to a triangular array, a cylindrical array, and a rectangular array, or irregular. The surface roughness is measured using the root mean square (RMS) of the surface roughness and the width S in the direction perpendicular to the thickness of the membrane assembly 100. The RMS of the protrusions of the convex-concave portion 112 is greater than or equal to 0.8 nm and less than or equal to 100 nm, and S is greater than or equal to 10 nm and less than or equal to 400 nm.

[0070] Specifically, a UV absorbing layer 130 is inserted. The UV absorbing layer 130 comprises a lanthanum titanate layer, whose material has a refractive index greater than or equal to 1.99 / 550nm and less than or equal to 2.1 / 550nm. The functional film layer 120 comprises a titanium dioxide layer 1244. The refractive index of the UV absorbing layer 130 is closer to that of the substrate 110 than that of the titanium dioxide layer 1244, which facilitates the design of a film system based on the film layer.

[0071] The UV absorbing layer 130 is also easier to vaporize into a film using electron beam evaporation. Therefore, the UV absorbing layer 130 can be inserted as a protective layer between the substrate 110 and the functional film layer 120 using electron beam evaporation technology, which generates less UV radiation. This improves the adhesion between the substrate 110 and the functional film layer 120 while achieving specific optical properties. Specifically, the thickness of the UV absorbing layer 130 is greater than or equal to 20 nm and less than or equal to 300 nm.

[0072] Specifically, a wear-resistant layer 140 (e.g., the wear-resistant layer 140 includes a fluorine-containing coating) is disposed on the side of the functional film layer 120 facing away from the UV-absorbing layer 130. The wear-resistant layer 140 includes a silicone-modified perfluoropolyether layer. The type of the modified perfluoropolyether layer can be selected from Y-type (a polymer formed by photo-oxidation of hexafluoropropylene under ultraviolet light), Z-type (a linear compound formed by photo-oxidation of tetrafluoroethylene), K-type (a branched compound formed by polymerization of hexafluoropropylene oxide under the catalysis of cesium fluoride), and D-type (a polymer formed by direct fluorination of the polymerization product of tetrafluorooxetane).

[0073] The surface tension of the wear-resistant layer 140 is greater than or equal to 6.7 mN / m and less than or equal to 25 mN / m, thereby improving the smoothness of the surface of the structure and enhancing the wear resistance while achieving specific optical properties.

[0074] Example 1, as Figure 2 As shown, substrate 110 is a PET substrate 110. The root mean square (RMS) surface roughness of the protrusions of the convexo-concave portion 112 of substrate 110 is 2 nm, and the width of the protrusions in the direction perpendicular to the thickness of the film assembly 100 is 100 nm. The convexo-concave portion 112 on substrate 110 is produced by nanoimprinting. The film assembly 100 has high absorption in the visible light band (400 nm-700 nm). A 100 nm thick lanthanum titanate layer serves as a protective layer, a titanium aluminum compound (TiAlC) serves as an absorption film layer, a first silicon dioxide (SiO2) layer serves as a dielectric film layer, and the wear-resistant layer 140 includes a siloxane-modified perfluoropolyether layer.

[0075] The membrane layer assembly 100 includes a PET substrate 110 with a thickness of 2 mm, a lanthanum titanate layer with a thickness of 100 nm, a titanium aluminum compound layer 1224 with a thickness of 15 nm, a first silicon dioxide layer 1222 with a thickness of 41 nm, a titanium aluminum compound layer 1224 with a thickness of 240 nm, a first silicon dioxide layer 1222 with a thickness of 17 nm, a titanium aluminum compound layer 1224 with a thickness of 23 nm, a first silicon dioxide layer 1222 with a thickness of 63 nm, and a siloxane-modified perfluoropolyether polymer layer with a thickness of 15 nm.

[0076] Specifically, Figure 3 Shown based on Figure 2 Schematic diagram of the absorption rate of the membrane assembly 100 in FIG. After heating the sample of the membrane assembly 100 in a constant temperature (80°C) water bath for 30 minutes, the surface water stains were wiped with a dust-free cloth and left to stand for 2 hours. An adhesion and peeling test was then conducted using tape to verify the stability of the overall structure. The results are shown in Table 1, showing that the functional membrane layer 120 did not fall off after the tape was peeled off. In the related art, the functional membrane layer 120 of the membrane assembly 100 would fall off after the adhesion test.

[0077] Example 2, as Figure 4 As shown, the substrate 110 is a PMMA substrate 110, and the surface roughness of the protrusions of the convexo-concave portion 112 of the substrate 110 is 1.2 nm. The width of the protrusions in the direction perpendicular to the thickness of the film layer assembly 100 is 80 nm. The convexo-concave portion 112 on the substrate 110 is produced by nanoimprinting. The film layer assembly 100 has antireflection properties in the visible light band (400 nm-700 nm). A 24 nm thick lanthanum titanate layer serves as a protective layer, a titanium dioxide layer 1244 serves as a high refractive index layer, and a second silicon dioxide (SiO2) layer serves as a low refractive index layer. The wear-resistant layer 140 includes a siloxane-modified perfluoropolyether layer.

[0078] The membrane layer assembly 100 includes a PMMA substrate 110 with a thickness of 2 mm, a lanthanum titanate layer with a thickness of 24 nm, a silicon dioxide functional portion 126 with a thickness of 26 nm, a titanium dioxide layer 1244 with a thickness of 66 nm, a second silicon dioxide layer 1242 with a thickness of 8 nm, a titanium dioxide layer 1244 with a thickness of 38 nm, a second silicon dioxide layer 1242 with a thickness of 92 nm, and a siloxane-modified perfluoropolyether layer with a thickness of 18 nm.

[0079] Specifically, Figure 5 Shown based on Figure 4 Schematic diagram of the reflectivity of the film layer assembly 100 in FIG. After heating the sample of the film layer assembly 100 in a constant temperature (100°C) water bath for 30 minutes, the surface water stains were wiped off with a dust-free cloth and left to stand for 2 hours. An adhesion and peeling test was performed using tape to verify the stability of the overall structure. The verification results are shown in Table 1. The results show that the functional film layer 120 did not fall off after the tape was peeled off, indicating good structural stability. In the related art, the functional film layer 120 of the film layer assembly 100 will fall off after the adhesion test.

[0080] The roughened resin is used as the substrate 110 to expose more active sites on the surface, thereby increasing the chemical bonding between the substrate 110 and the functional film layer 120 and improving the adhesion between the substrate 110 and the functional film layer 120 .

[0081] The lanthanum titanate layer reduces radiation aging of the substrate 110 and increases adhesion between the substrate 110 and the functional film layer 120 .

[0082] The outermost wear-resistant layer 140 reduces the dynamic friction coefficient of the structure and increases its wear resistance.

[0083] Table 1

[0084]

[0085] According to some embodiments of the present application, the camera device includes: the film layer assembly 100 of any of the above embodiments.

[0086] Since the camera device according to the embodiment of the present application includes the film layer assembly 100 of the above embodiment, it has all the beneficial effects of the above film layer assembly 100, which are not listed here one by one.

[0087] Specifically, the camera device includes a lens, and the lens is made of a film layer assembly 100 .

[0088] Specifically, the camera device includes a lens barrel, which is made of a film layer assembly 100 .

[0089] According to other embodiments of the present application, electronic devices include: the film layer assembly 100 or the camera device according to any of the above embodiments.

[0090] The electronic device according to the embodiment of the present application includes the film layer assembly 100 or the camera device of the above embodiment, and therefore has all the beneficial effects of the above film layer assembly 100 or the camera device, which are not listed here one by one.

[0091] Specifically, the electronic device can be a mobile terminal such as a mobile phone, a wearable device, a tablet computer, a laptop computer, a mobile computer, an augmented reality device (also known as an AR device), a virtual reality device (also known as a VR device) and a handheld game console, etc.

[0092] Throughout this specification, reference to terms such as "one embodiment," "some embodiments," "illustrative embodiments," "examples," "specific examples," or "some examples" means that the specific features, structures, materials, or characteristics described in conjunction with the embodiment or example are included in at least one embodiment or example of the present application. In this specification, the illustrative expressions of the above terms do not necessarily refer to the same embodiment or example. Moreover, the specific features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more embodiments or examples.

[0093] Although the embodiments of the present application have been shown and described, those skilled in the art will appreciate that various changes, modifications, substitutions, and variations may be made to the embodiments without departing from the principles and intent of the present application, and that the scope of the present application is defined by the claims and their equivalents.

Claims

1. A film layer assembly for a camera device, characterized in that: include: substrate; Functional film layer; an ultraviolet absorbing layer connected between the substrate and the functional film layer; A convexo-concave portion is provided on a side of the substrate facing the ultraviolet absorbing layer, and a portion of the ultraviolet absorbing layer is filled in the convexo-concave portion; Chemical bonding between the substrate and the functional film layer; The ultraviolet absorption layer is inserted between the substrate and the functional film layer as a protective layer by using electron beam evaporation technology.

2. The membrane layer assembly according to claim 1, characterized in that The ultraviolet absorption layer includes a lanthanum titanate layer.

3. The membrane layer assembly according to claim 1 or 2, characterized in that: The refractive index of the ultraviolet absorption layer is greater than or equal to 1.99 / 550nm and less than or equal to 2.1 / 550nm; The thickness of the ultraviolet absorption layer is greater than or equal to 20 nm and less than or equal to 300 nm.

4. The membrane layer assembly according to claim 1 or 2, characterized in that: Also includes: The wear-resistant layer is arranged on a side of the functional film layer away from the ultraviolet absorption layer.

5. The membrane layer assembly according to claim 4, characterized in that The wear-resistant layer includes a silicone-modified perfluoropolyether polymer layer.

6. The membrane layer assembly according to claim 5, characterized in that The surface tension of the wear-resistant layer is greater than or equal to 17 mN / m and less than or equal to 25 mN / m.

7. The membrane layer assembly according to claim 1, characterized in that The root mean square of the surface roughness of the protrusions of the convex-concave portion is greater than or equal to 0.8 nm and less than or equal to 100 nm; The width of the protrusion in a direction perpendicular to the thickness of the membrane layer assembly is greater than or equal to 10 nm and less than or equal to 400 nm.

8. The membrane layer assembly according to claim 1 or 2, characterized in that: The functional film layer comprises: A plurality of first functional parts are stacked, each of the first functional parts comprises a first silicon dioxide layer and a titanium aluminum compound layer, and the first silicon dioxide layer is stacked on a side of the titanium aluminum compound layer away from the ultraviolet absorption layer.

9. The membrane layer assembly according to claim 1 or 2, characterized in that: The functional film layer comprises: a plurality of second functional parts, wherein the plurality of second functional parts are stacked, each of the second functional parts comprises a silicon dioxide layer and a second titanium dioxide layer, and the second silicon dioxide layer is stacked on a side of the titanium dioxide layer away from the ultraviolet absorption layer; A silicon dioxide functional portion is located between the plurality of second functional portions and the ultraviolet absorption layer.

10. An electronic device, characterized in that: include: The membrane assembly according to any one of claims 1 to 9.

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