Design layout based scanning electron microscope image profile extraction method and device

Abstract

This application provides a method, apparatus, electronic device, and computer-readable storage medium for extracting the contour of a scanning electron microscope (SEM) image based on a design layout. The method includes: extracting a first SEM image contour from a scanned electron microscope (SEM) image of a region to be detected; adjusting the first SEM image contour based on the SEM image to generate a second SEM image contour; aligning the second SEM image contour with a design layout to generate an alignment result; adjusting the second SEM image contour based on the alignment result to generate a third SEM image contour; and extracting the contour information of the third SEM image contour. This application can effectively improve the precision of the scanned electron microscope (SEM) image contour.

Description

Technical Field

[0001] This application relates to the field of image contour extraction, and in particular to a method, apparatus and electronic device for contour extraction of scanning electron microscope images based on a design layout. Background Technology

[0002] In the current chip manufacturing process, as chip manufacturing technology continues to advance, the defects generated during production are becoming smaller and smaller, making electron beam defect detection particularly important. Traditional electron beam defect detection mainly adopts a die-to-die inspection method. However, this method is ineffective against systematic defects and aperiodic regions, and the defect detection rate is overly dependent on the alignment between the inspection image and the reference image. To address these issues, design-layout-based electron beam defect detection methods are becoming increasingly important.

[0003] Existing scanning electron microscope image contour extraction schemes such as Figure 1 As shown: First, a scanning electron microscope (SEM) image of the area to be inspected is acquired using an electron beam defect detection device; second, the SEM image contour is extracted using a first algorithm (e.g., gradient algorithm), and the SEM image contour is adjusted based on the SEM image; finally, the SEM image contour is output.

[0004] Current technologies rely entirely on SEM image information for contour extraction, making the extraction process highly dependent on the SEM image quality. When the image quality is good, it is easy to extract a good contour, but when the image quality is poor (blurred edges, uneven brightness, etc.), the extracted contour is often incomplete, which limits its application.

[0005] Therefore, improving the precision of the outline in scanning electron microscope images is a technical problem that urgently needs to be solved by those skilled in the art. Summary of the Invention

[0006] The purpose of this application is to provide a method, apparatus, and electronic device for extracting the contours of scanning electron microscope images based on a design layout, which can effectively improve the precision of the contours in scanning electron microscope images.

[0007] According to a first aspect of this application, a method for contour extraction of scanning electron microscope images based on a design layout is provided, the method comprising:

[0008] In the case of acquiring a scanning electron microscope image of the area to be detected, the first scanning electron microscope image contour of the scanning electron microscope image is extracted;

[0009] The contour of the first scanning electron microscope image is adjusted based on the scanning electron microscope image to generate the contour of the second scanning electron microscope image.

[0010] Align the outline of the second scanning electron microscope image with the design layout to generate an alignment result;

[0011] The contour of the second scanning electron microscope image is adjusted based on the alignment results to generate the contour of the third scanning electron microscope image.

[0012] Extract contour information from the third scanning electron microscope image.

[0013] Optionally, the contour of the second scanning electron microscope image is adjusted based on the alignment result to generate the contour of the third scanning electron microscope image, including:

[0014] Based on the alignment results, the graphic line information in the outline of the second scanning electron microscope image is adjusted to generate the outline of the third scanning electron microscope image; wherein, the graphic line information includes at least one of the interval between the graphic line and the second scanning electron microscope image and the width of the graphic line.

[0015] Optionally, after aligning the outline of the second scanning electron microscope image with the design layout to generate the alignment result, the method further includes:

[0016] Electron beam defect detection is performed based on the alignment results to obtain the defect detection results.

[0017] Optionally, after aligning the outline of the second scanning electron microscope image with the design layout to generate the alignment result, the method further includes:

[0018] Automatic measurement is performed based on the alignment results to obtain the automatic measurement results.

[0019] Optionally, if a scanning electron microscope (SEM) image of the area to be detected has been acquired, a first SEM image contour is extracted from the SEM image, including:

[0020] Given a scanning electron microscope (SEM) image of the area to be detected, the first SEM image contour at the subpixel level is extracted from the SEM image.

[0021] Optionally, the outline of the second scanning electron microscope image is aligned with the design layout to generate an alignment result, including:

[0022] The second scanning electron microscope image outline is converted into a second scanning electron microscope image outline with the same format as the design layout;

[0023] The converted second scanning electron microscope image outline is aligned with the preset original design layout to obtain the alignment result.

[0024] Optionally, the converted second scanning electron microscope image outline is aligned with a preset original design layout to obtain an alignment result, including:

[0025] The converted second scanning electron microscope image outline is aligned with the preset original design layout, and the alignment result is obtained based on the preset graphic similarity index; wherein, the graphic similarity index is used to characterize the degree of alignment between the second scanning electron microscope image outline and the design layout.

[0026] Optionally, the design layout can be in GDSII stream format.

[0027] Optionally, electron beam defect detection is performed based on the alignment results to obtain defect detection results, including:

[0028] Based on the alignment results, electron beam defects in different layers of the design layout are detected to obtain defect detection results; wherein, the different layers include at least one of the following: interlayer connection layer, metal layer and polysilicon layer.

[0029] Optionally, the contour of the first scanning electron microscope image is adjusted based on the scanning electron microscope image to generate the contour of the second scanning electron microscope image, including:

[0030] The outlines of the scanning electron microscope image and the first scanning electron microscope image are compared to generate a comparison result;

[0031] If the comparison result shows that there are redundant connections in the contour of the first scanning electron microscope image, the position of the point of the redundant connection is obtained.

[0032] The connections between points are removed based on their locations to generate a second scanning electron microscope image profile.

[0033] Optionally, after comparing the outline of the scanning electron microscope image with that of the first scanning electron microscope image to generate a comparison result, the method further includes:

[0034] If the comparison result shows that there are incomplete contours in the first scanning electron microscope image, the location of the points with incomplete contours is obtained.

[0035] The points are connected based on their positions to generate the outline of a second scanning electron microscope image.

[0036] Optionally, the contour of the second scanning electron microscope image is adjusted based on the alignment result to generate the contour of the third scanning electron microscope image, including:

[0037] Based on the alignment results, the contour of the second scanning electron microscope image is dilated and / or eroded to generate the contour of the third scanning electron microscope image.

[0038] According to a second aspect of this application, a scanning electron microscope image contour extraction device based on a design layout is provided, the device comprising:

[0039] The first extraction module is used to extract the first scanning electron microscope image outline of the scanning electron microscope image when the scanning electron microscope image of the area to be detected is acquired.

[0040] The first adjustment module is used to adjust the outline of the first scanning electron microscope image based on the scanning electron microscope image to generate the outline of the second scanning electron microscope image.

[0041] The alignment module is used to align the outline of the second scanning electron microscope image with the design layout and generate an alignment result.

[0042] The second adjustment module is used to adjust the outline of the second scanning electron microscope image based on the alignment result, and generate the outline of the third scanning electron microscope image.

[0043] The second extraction module is used to extract the contour information of the third scanning electron microscope image.

[0044] Optionally, the second adjustment module is used to adjust the graphic line information in the outline of the second scanning electron microscope image based on the alignment result to generate the outline of the third scanning electron microscope image; wherein, the graphic line information includes at least one of the interval between the graphic line and the second scanning electron microscope image and the width of the graphic line.

[0045] Optionally, the apparatus may further include a detection module for performing electron beam defect detection based on the alignment results to obtain defect detection results.

[0046] Optionally, the device may also include a measurement module for automatically measuring based on the alignment results to obtain automatic measurement results.

[0047] Optionally, the first extraction module is used to extract the first scanning electron microscope image contour at the subpixel level from the scanning electron microscope image when a scanning electron microscope image of the area to be detected is acquired.

[0048] Optionally, an alignment module is used to convert the second scanning electron microscope image outline into a second scanning electron microscope image outline with the same format as the design layout; and to align the converted second scanning electron microscope image outline with the preset original design layout to obtain an alignment result.

[0049] Optionally, an alignment module is used to align the converted second scanning electron microscope image outline with a preset original design layout, and obtain the alignment result based on a preset graphic similarity index; wherein, the graphic similarity index is used to characterize the degree of alignment between the second scanning electron microscope image outline and the design layout.

[0050] Optionally, the design layout can be in GDSII stream format.

[0051] Optionally, a detection module is used to detect electron beam defects in different layers of the design layout based on the alignment results, and obtain defect detection results; wherein, the different layers include at least one of the following: a layer-to-layer connection layer, a metal layer, and a polysilicon layer.

[0052] Optionally, the first adjustment module includes: a comparison unit for comparing the scanning electron microscope image with the contour of the first scanning electron microscope image to generate a comparison result; a first acquisition unit for acquiring the position of the point of the contour with redundant connection when the comparison result is that there is a contour with redundant connection in the contour of the first scanning electron microscope image; and a removal unit for removing the connection between the points based on the position of the points to generate the contour of the second scanning electron microscope image.

[0053] Optionally, the device further includes: a second acquisition unit, configured to acquire the positions of points with incomplete connections in the first scanning electron microscope image contour when the comparison result shows that there are incomplete connections in the first scanning electron microscope image contour; and a connection unit, configured to connect the points based on their positions to generate the second scanning electron microscope image contour.

[0054] Optionally, the second adjustment module is used to dilate and / or erode the second scanning electron microscope image profile based on the alignment result to generate a third scanning electron microscope image profile.

[0055] According to a third aspect of this application, an electronic device is provided, comprising a processor, a memory, and a program or instructions stored in the memory and executable on the processor, wherein when the program or instructions are executed by the processor, the steps of the design layout-based scanning electron microscope image contour extraction method as described in the first aspect are implemented.

[0056] This application generates a second scanning electron microscope (SEM) image contour by adjusting the extracted first SEM image contour based on the SEM image. Then, the second SEM image contour is aligned with a design layout to generate an alignment result. Finally, the second SEM image contour is adjusted based on the alignment result to generate a third SEM image contour. In other words, this application adjusts the extracted image contour twice. Specifically, the image contour is first adjusted based on the SEM image, and then adjusted again based on the design layout. This approach allows for more refined image contours without excessive concern for image quality. Attached Figure Description

[0057] To more clearly illustrate the technical solutions in the specific embodiments of this application or the prior art, the drawings used in the description of the specific embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are some embodiments of this application. For those skilled in the art, other drawings can be obtained from these drawings without creative effort.

[0058] Figure 1 A flowchart of a scanning electron microscope image contour extraction method provided by existing technology;

[0059] Figure 2 A flowchart of a scanning electron microscope image contour extraction method based on a design layout provided in this application embodiment;

[0060] Figures 3-8 A schematic diagram of a scanning electron microscope image contour extraction method based on a design layout provided in an embodiment of this application;

[0061] Figure 9 A flowchart of a scanning electron microscope image contour extraction method based on a design layout provided for embodiments of this application; and

[0062] Figure 10 A schematic diagram of a scanning electron microscope image contour extraction device based on a design layout provided in an embodiment of this application. Detailed Implementation

[0063] To make the above and other features and advantages of this application clearer, the application is further described below with reference to the accompanying drawings. It should be understood that the specific embodiments given herein are for the purpose of explanation to those skilled in the art and are exemplary only, not restrictive.

[0064] In the following description, numerous specific details are set forth to provide a thorough understanding of this application. However, it will be apparent to those skilled in the art that these specific details are not required to practice this application. In other instances, well-known steps or services have not been described in detail to avoid obscuring this application.

[0065] As can be seen from the background section, in the existing technology, contour extraction depends entirely on the quality of the scanning electron microscope image, resulting in inaccurate image contours.

[0066] To address the aforementioned technical problems, this application provides a method, apparatus, and electronic device for extracting contours from scanning electron microscope images based on a design layout. The method for extracting contours from scanning electron microscope images based on a design layout, as described below with reference to the accompanying drawings, will be explained in detail through specific embodiments and application scenarios.

[0067] like Figure 2 As shown, this application provides a method for contour extraction of scanning electron microscope images based on a design layout. This method may include:

[0068] Step S11: With the scanning electron microscope image of the area to be detected acquired, extract the first scanning electron microscope image contour of the scanning electron microscope image.

[0069] Step S13: Adjust the outline of the first scanning electron microscope image based on the scanning electron microscope image to generate the outline of the second scanning electron microscope image.

[0070] In an optional embodiment, adjusting the contour of the first scanning electron microscope image based on the scanning electron microscope image to generate the contour of the second scanning electron microscope image can be done in the following way:

[0071] The outlines of the scanning electron microscope image are compared with those of the first scanning electron microscope image to generate a comparison result.

[0072] If the comparison result shows that there are redundant connections in the contour of the first scanning electron microscope image, the position of the point of the redundant connection is obtained.

[0073] The connections between points are removed based on their locations to generate a second scanning electron microscope image profile.

[0074] If the comparison result shows that there are incomplete contours in the first scanning electron microscope image, the location of the points with incomplete contours is obtained.

[0075] The points are connected based on their positions to generate the outline of a second scanning electron microscope image.

[0076] Specifically, in this application, in conjunction with Figures 3-5 As shown, scanning electron microscope images of the area to be inspected can first be acquired using an electron beam defect detection device (please refer to...). Figure 3 Then, the scanning electron microscope image is extracted to obtain the outline of the first scanning electron microscope image (please refer to...). Figure 4 The first scanning electron microscope (SEM) image contour is compared with the SEM image to generate a comparison result. The comparison result may indicate that the first SEM image contour contains contours with redundant connections and / or contours with incomplete connections. That is, in the first SEM image contour obtained based on the quality of the SEM image, some contours have poor connections, and some contours are even connected where they shouldn't be. Therefore, the first SEM image contour needs initial adjustment based on the SEM image. Since a contour can be formed by connecting multiple points, if the comparison result indicates that the first SEM image contour contains contours with redundant connections, it is necessary to obtain the positions of the points in the contours with redundant connections. Then, based on the position of the points, the connections between the points are removed to generate the second SEM image contour (please refer to...). Figure 5 If the comparison result shows that the first scanning electron microscope image contour contains incomplete contours, the positions of the points with incomplete contours are obtained. Then, based on the positions of the points, the points are connected to generate the second scanning electron microscope image contour (please refer to...). Figure 5 At this point, the outline of the second scanning electron microscope image is basically complete.

[0077] It should be noted that when the comparison result shows that the first scanning electron microscope (SEM) image contour contains both incompletely connected contours and redundantly connected contours, it is necessary to obtain the positions of the points with incompletely connected contours. Then, the points are connected based on their positions, and the positions of the points with redundant connections are also required. Finally, the connections between the points are removed based on their positions to generate the second SEM image contour.

[0078] In an optional embodiment, a gradient algorithm can be used to extract the contour of the first scanning electron microscope image. The gradient algorithm can be either the Canny algorithm or the Sobel algorithm. It should be noted that the Canny algorithm can identify as many actual edges in the image as possible, minimizing both the probability of missing real edges and the probability of falsely detecting non-edges; the Sobel algorithm can effectively calculate the approximate gradient of the image's grayscale function. Therefore, this application can accurately obtain the contour of the first scanning electron microscope image using either the Canny algorithm or the Sobel algorithm.

[0079] In an optional embodiment, step S11 includes: extracting a first scanning electron microscope image profile at the subpixel level from the scanning electron microscope image after acquiring a scanning electron microscope image of the area to be detected.

[0080] Step S15: Align the outline of the second scanning electron microscope image with the design layout to generate the alignment result.

[0081] In this embodiment, combined with Figure 5 , Figure 6 and Figure 7 As shown. If the contour of the first scanning electron microscope (SEM) image is adjusted as described above based solely on the SEM image to generate the contour of the second SEM image, the fineness of the contour of the second SEM image becomes dependent on the quality of the SEM image. Specifically, when the image quality is good, a good contour can be easily extracted; however, when the image quality is poor (blurred edges, uneven brightness, etc.), the extracted contour is often incomplete, which limits the application of the contour. Therefore, in this embodiment, after adjusting the contour of the first SEM image based on the SEM image to generate the contour of the second SEM image, the contour of the second SEM image is compared with the design layout (please refer to...). Figure 6 Alignment is performed, and alignment results are generated (please refer to...). Figure 7 This allows image contour extraction to no longer rely solely on the quality of the scanning electron microscope image, and the extraction becomes more precise after incorporating design layout information.

[0082] In an optional embodiment, aligning the outline of the second scanning electron microscope image with the design layout to generate the alignment result can be achieved in the following manner:

[0083] The second scanning electron microscope image outline is converted into a second scanning electron microscope image outline with the same format as the design layout.

[0084] The converted second scanning electron microscope image outline is aligned with the preset original design layout to obtain the alignment result.

[0085] In this embodiment, when aligning the second scanning electron microscope (SEM) image outline with the design layout, the format of the second SEM image outline must first be converted to be the same as that of the design layout. Alignment can only be performed when the formats of the second SEM image outline and the design layout are identical.

[0086] In an optional embodiment, the design layout is a design layout in GDSII stream format.

[0087] In this embodiment, the design layout can be in GDSII stream format, i.e., a GDS format design layout, rather than an image.

[0088] In an optional embodiment, the converted second scanning electron microscope image outline is aligned with a preset original design layout to obtain an alignment result, including: aligning the converted second scanning electron microscope image outline with the preset original design layout, and obtaining the alignment result based on a preset graphic similarity index; wherein, the graphic similarity index is used to characterize the degree of alignment between the second scanning electron microscope image outline and the design layout.

[0089] Step S17: Adjust the outline of the second scanning electron microscope image based on the alignment results to generate the outline of the third scanning electron microscope image.

[0090] In an optional embodiment, adjusting the contour of the second scanning electron microscope image based on the alignment result to generate the contour of the third scanning electron microscope image can be done in the following manner:

[0091] Based on the alignment results, the contour of the second scanning electron microscope image is dilated and / or eroded to generate the contour of the third scanning electron microscope image.

[0092] Step S19: Extract the contour information of the third scanning electron microscope image.

[0093] Specifically, in this application, in conjunction with Figure 7 and Figure 8 As shown, aligning the outline of the second scanning electron microscope (SEM) image based on the design layout results in a discrepancy between the acquired second SEM image outline and the design layout. Therefore, it is necessary to readjust the second SEM image based on the alignment result to generate the outline of the third SEM image (please refer to...). Figure 8 It should be noted that the adjustment method can be as follows: when the outline of the second scanning electron microscope image is wider than the design pattern, an erosion method can be used to shrink the outline. This involves identifying multiple points on the outline that protrude from the design pattern and then adjusting these points according to their corresponding positions on the design pattern. Conversely, when the outline of the second scanning electron microscope image is narrower than the design pattern, a dilation method can be used to expand the outline. This involves identifying multiple points on the outline that are narrower than the design pattern and then adjusting these points according to their corresponding positions on the design pattern. Finally, the outline information of the third scanning electron microscope image is extracted.

[0094] In an optional embodiment, the second scanning electron microscope image contour is adjusted based on the alignment result to generate a third scanning electron microscope image contour, including:

[0095] Based on the alignment results, the graphic line information in the outline of the second scanning electron microscope image is adjusted to generate the outline of the third scanning electron microscope image; wherein, the graphic line information includes at least one of the width of the graphic line and the interval between the graphic line and the second scanning electron microscope image.

[0096] In an optional embodiment, after step S15, the method further includes: performing electron beam defect detection based on the alignment result to obtain a defect detection result.

[0097] In an optional embodiment, electron beam defect detection is performed based on the alignment results to obtain defect detection results, including:

[0098] Based on the alignment results, electron beam defects in different layers of the design layout are detected to obtain defect detection results; wherein, the different layers include at least one of the following: interlayer connection layer, metal layer and polysilicon layer.

[0099] In an optional embodiment, after step S15, the method further includes: performing automatic measurement based on the alignment result to obtain an automatic measurement result.

[0100] Combination Figure 9 As shown, in an optional embodiment, this application provides a method for contour extraction of scanning electron microscope images based on a design layout, the method including:

[0101] Acquire SEM images of the area to be detected.

[0102] The contour of the SEM image was initially extracted based on the gradient algorithm.

[0103] The contours extracted in the previous step are adjusted based on the SEM image.

[0104] Align the adjusted SEM image outline with the design layout.

[0105] The SEM image outline is finely corrected based on the design layout.

[0106] Output SEM image contour information.

[0107] In summary, this application, based on image contour extraction from scanning electron microscope images, further extracts image contours based on the design layout, so that the image contours no longer depend solely on the scanning electron microscope images. Moreover, the method of further extracting image contours based on the design layout can effectively improve the precision of the image contours.

[0108] Furthermore, due to the high-precision alignment between the image outline and the design layout, it can be applied not only to defect detection in scanning electron microscope images, but also to automatic measurement of scanning electron microscope images.

[0109] In addition, the contour information extracted in this application contains design layout information, so it can be applied not only to defect detection of the connection layer between layers, but also to other layers (such as metal layers and polysilicon layers).

[0110] Figure 10 This application illustrates a scanning electron microscope image contour extraction device based on a design layout, as provided in an embodiment of this application. For example... Figure 10 As shown, the device includes:

[0111] The first extraction module 101 is used to extract the first scanning electron microscope image outline of the scanning electron microscope image when the scanning electron microscope image of the area to be detected is acquired.

[0112] The first adjustment module 102 is used to adjust the outline of the first scanning electron microscope image based on the scanning electron microscope image to generate the outline of the second scanning electron microscope image.

[0113] Alignment module 103 is used to align the outline of the second scanning electron microscope image with the design layout and generate an alignment result;

[0114] The second adjustment module 104 is used to adjust the outline of the second scanning electron microscope image based on the alignment result to generate the outline of the third scanning electron microscope image.

[0115] The second extraction module 105 is used to extract the contour information of the third scanning electron microscope image.

[0116] Optionally, the second adjustment module 104 is used to adjust the graphic line information in the outline of the second scanning electron microscope image based on the alignment result to generate the outline of the third scanning electron microscope image; wherein, the graphic line information includes at least one of the width of the graphic line and the interval between the graphic line and the second scanning electron microscope image.

[0117] Optionally, the apparatus may further include a detection module for performing electron beam defect detection based on the alignment results to obtain defect detection results.

[0118] Optionally, the device may also include a measurement module for automatically measuring based on the alignment results to obtain automatic measurement results.

[0119] Optionally, the first extraction module 101 is used to extract the first scanning electron microscope image contour at the subpixel level from the scanning electron microscope image when a scanning electron microscope image of the area to be detected is acquired.

[0120] Optionally, the alignment module 103 is used to convert the second scanning electron microscope image outline into a second scanning electron microscope image outline with the same format as the design layout; and to align the converted second scanning electron microscope image outline with the preset original design layout to obtain an alignment result.

[0121] Optionally, the alignment module 103 is used to align the converted second scanning electron microscope image outline with a preset original design layout, and obtain the alignment result based on a preset graphic similarity index; wherein, the graphic similarity index is used to characterize the degree of alignment between the second scanning electron microscope image outline and the design layout.

[0122] Optionally, the design layout can be in GDSII stream format.

[0123] Optionally, a detection module is used to detect electron beam defects in different layers of the design layout based on the alignment results, and obtain defect detection results; wherein, the different layers include at least one of the following: a layer-to-layer connection layer, a metal layer, and a polysilicon layer.

[0124] Optionally, the first adjustment module 102 includes: a comparison unit, used to compare the scanning electron microscope image with the contour of the first scanning electron microscope image and generate a comparison result; a first acquisition unit, used to acquire the position of the point of the contour with redundant connection when the comparison result is that there is a contour with redundant connection in the contour of the first scanning electron microscope image; and a removal unit, used to remove the connection between the points based on the position of the points and generate the contour of the second scanning electron microscope image.

[0125] Optionally, the device further includes: a second acquisition unit, configured to acquire the positions of points with incomplete connections in the first scanning electron microscope image contour when the comparison result shows that there are incomplete connections in the first scanning electron microscope image contour; and a connection unit, configured to connect the points based on their positions to generate the second scanning electron microscope image contour.

[0126] Optionally, the second adjustment module 104 is used to dilate and / or erode the second scanning electron microscope image profile based on the alignment result to generate a third scanning electron microscope image profile.

[0127] It should be understood that the various modules / units of the device of this application can be implemented wholly or partially through software, hardware, firmware, or a combination thereof. Each module / unit can be embedded in the processor of the electronic device in hardware or firmware form or independent of the processor, or it can be stored in the memory of the electronic device in software form for the processor to call to execute the services of each module / unit. Each module / unit can be implemented as an independent component or module, or two or more modules / units can be implemented as a single component or module.

[0128] In one embodiment, an electronic device is provided, including a memory and a processor. The memory stores computer instructions executable by the processor, which, when executed by the processor, instruct the processor to perform the steps of the method of this application. This electronic device can be broadly categorized as a server, terminal, or any other electronic device with the necessary computing and / or processing capabilities. In one embodiment, the electronic device may include a processor, memory, network interface, communication interface, etc., connected via a system bus. The processor of the electronic device can be used to provide the necessary computing, processing, and / or control capabilities. The memory of the electronic device may include a non-volatile storage medium and internal memory. The non-volatile storage medium may store service systems, computer programs, etc. The internal memory can provide an environment for the operation of the service systems and computer programs in the non-volatile storage medium. The network interface and communication interface of the electronic device can be used to connect and communicate with external devices via a network.

[0129] This application can be implemented as a computer-readable storage medium storing a computer program thereon, which, when executed by a processor, causes the steps of the method of this application to be performed. In one embodiment, the computer program is distributed across multiple network-coupled electronic devices or processors, such that the computer program is stored, accessed, and executed in a distributed manner by one or more electronic devices or processors. A single method step / service, or two or more method steps / services, may be executed by a single electronic device or processor or by two or more electronic devices or processors. One or more method steps / services may be executed by one or more electronic devices or processors, and one or more other method steps / services may be executed by one or more other electronic devices or processors. One or more electronic devices or processors may execute a single method step / service, or execute two or more method steps / services.

[0130] Those skilled in the art will understand that the steps of the method of this application can be performed by a computer program instructing related hardware, such as electronic devices or processors. The computer program can be stored in a non-transitory computer-readable storage medium, and when executed, it causes the steps of the method of this application to be performed. Depending on the context, any references herein to memory, storage, databases, or other media may include non-volatile and / or volatile memory. Examples of non-volatile memory include read-only memory (ROM), programmable ROM (PROM), electrically programmable ROM (EPROM), electrically erasable programmable ROM (EEPROM), flash memory, magnetic tape, floppy disk, magneto-optical data storage device, optical data storage device, hard disk, solid-state drive, etc. Examples of volatile memory include random access memory (RAM), external cache memory, etc.

[0131] The technical features described above can be combined arbitrarily. Although not all possible combinations of these technical features are described, any combination of these technical features should be considered to be covered by this specification, provided that such combination does not contain contradictions.

[0132] Although this application has been described in conjunction with embodiments, those skilled in the art will understand that the above description and drawings are exemplary and not restrictive, and this application is not limited to the disclosed embodiments. Various modifications and variations are possible without departing from the spirit of this application.

Claims

1. A method for contour extraction from scanning electron microscope images based on design layout, characterized in that, The method includes: In the case of acquiring a scanning electron microscope image of the area to be detected, the first scanning electron microscope image contour of the scanning electron microscope image is extracted; The outline of the first scanning electron microscope image is adjusted based on the scanning electron microscope image to generate the outline of the second scanning electron microscope image. Align the outline of the second scanning electron microscope image with the design layout to generate an alignment result; Based on the alignment result, the outline of the second scanning electron microscope image is adjusted to generate the outline of the third scanning electron microscope image. Extract the contour information of the third scanning electron microscope image; The step of adjusting the contour of the first scanning electron microscope image based on the scanning electron microscope image to generate the contour of the second scanning electron microscope image includes: The outline of the scanning electron microscope image is compared with that of the first scanning electron microscope image to generate a comparison result; If the comparison result shows that there are redundant connections in the contour of the first scanning electron microscope image, the position of the point of the redundant connection is obtained. Based on the location of the points, the connections between the points are removed to generate the second scanning electron microscope image contour.

2. The method for contour extraction of scanning electron microscope images based on design layout according to claim 1, characterized in that, The step of adjusting the contour of the second scanning electron microscope image based on the alignment result to generate the contour of the third scanning electron microscope image includes: Based on the alignment result, the graphic line information in the outline of the second scanning electron microscope image is adjusted to generate the outline of the third scanning electron microscope image; wherein, the graphic line information includes at least one of the interval between the graphic line and the second scanning electron microscope image and the width of the graphic line.

3. The method for contour extraction of scanning electron microscope images based on design layout according to claim 1, characterized in that, After aligning the outline of the second scanning electron microscope image with the design layout to generate an alignment result, the method further includes: Electron beam defect detection is performed based on the alignment results to obtain the defect detection results.

4. The method for contour extraction of scanning electron microscope images based on design layout according to claim 1, characterized in that, After aligning the outline of the second scanning electron microscope image with the design layout to generate an alignment result, the method further includes: Automatic measurement is performed based on the alignment results to obtain the automatic measurement results.

5. The method for contour extraction of scanning electron microscope images based on design layout according to claim 1, characterized in that, The step of extracting a first scanning electron microscope (SEM) image contour from the acquired scanning electron microscope (SEM) image of the region to be detected includes: When the scanning electron microscope image of the region to be detected is acquired, the first scanning electron microscope image contour at the subpixel level of the scanning electron microscope image is extracted.

6. The method for contour extraction of scanning electron microscope images based on design layout according to claim 1, characterized in that, The step of aligning the outline of the second scanning electron microscope image with the design layout to generate an alignment result includes: The second scanning electron microscope image outline is converted into the second scanning electron microscope image outline with the same format as the design layout; The converted outline of the second scanning electron microscope image is aligned with the preset original design layout to obtain the alignment result.

7. The method for contour extraction of scanning electron microscope images based on design layout according to claim 6, characterized in that, The step of aligning the converted contour of the second scanning electron microscope image with a preset original design layout to obtain an alignment result includes: The converted outline of the second scanning electron microscope image is aligned with the preset original design layout, and the alignment result is obtained based on the preset graphic similarity index; wherein, the graphic similarity index is used to characterize the degree of alignment between the outline of the second scanning electron microscope image and the design layout.

8. The method for contour extraction of scanning electron microscope images based on design layout according to claim 6, characterized in that, The design layout is in GDSII stream format.

9. The method for contour extraction of scanning electron microscope images based on design layout according to claim 3, characterized in that, The electron beam defect detection based on the alignment result, to obtain the defect detection result, includes: Based on the alignment results, electron beam defects in different layers of the design layout are detected to obtain the defect detection results; wherein, the different layers include at least one of the following: interlayer connection layer, metal layer and polysilicon layer.

10. The method for contour extraction of scanning electron microscope images based on design layout according to claim 1, characterized in that, After comparing the outline of the scanning electron microscope image with that of the first scanning electron microscope image to generate a comparison result, the method further includes: If the comparison result shows that the first scanning electron microscope image has an incompletely connected contour, the position of the point where the incompletely connected contour exists is obtained; The points are connected based on their positions to generate the outline of the second scanning electron microscope image.

11. The method for contour extraction of scanning electron microscope images based on design layout according to claim 1, characterized in that, Based on the alignment result, the contour of the second scanning electron microscope image is adjusted to generate the contour of the third scanning electron microscope image, including: Based on the alignment result, the second scanning electron microscope image contour is dilated and / or eroded to generate the third scanning electron microscope image contour.

12. A scanning electron microscope image contour extraction device based on a design layout, the device comprising: The first extraction module is used to extract the first scanning electron microscope image outline of the scanning electron microscope image when a scanning electron microscope image of the area to be detected is acquired. The first adjustment module is used to adjust the outline of the first scanning electron microscope image based on the scanning electron microscope image to generate the outline of the second scanning electron microscope image. The alignment module is used to align the outline of the second scanning electron microscope image with the design layout to generate an alignment result; The second adjustment module is used to adjust the outline of the second scanning electron microscope image based on the alignment result to generate the outline of the third scanning electron microscope image. The second extraction module is used to extract the contour information of the contour of the third scanning electron microscope image; The first adjustment module includes: a comparison unit, used to compare the scanning electron microscope image with the contour of the first scanning electron microscope image, and generate a comparison result; a first acquisition unit, used to acquire the position of the point of the contour with redundant connection when the comparison result is that there is a contour with redundant connection in the contour of the first scanning electron microscope image; and a removal unit, used to remove the connection between the point based on the position of the point, and generate the contour of the second scanning electron microscope image.

13. The scanning electron microscope image contour extraction device based on design layout according to claim 12, characterized in that, The second adjustment module is used to adjust the graphic line information in the outline of the second scanning electron microscope image based on the alignment result, and generate a third scanning electron microscope image outline; wherein, the graphic line information includes at least one of the interval between the graphic line and the second scanning electron microscope image and the width of the graphic line.

14. The scanning electron microscope image contour extraction device based on design layout according to claim 12, characterized in that, The device further includes: The detection module is used to perform electron beam defect detection based on the alignment results to obtain defect detection results.

15. The scanning electron microscope image contour extraction device based on design layout according to claim 12, characterized in that, The device further includes: The measurement module is used to perform automatic measurement based on the alignment result to obtain the automatic measurement result.

16. The scanning electron microscope image contour extraction device based on design layout according to claim 12, characterized in that, The first extraction module is used to extract the first scanning electron microscope image contour at the subpixel level from the scanning electron microscope image when a scanning electron microscope image of the area to be detected is acquired.

17. The scanning electron microscope image contour extraction device based on design layout according to claim 12, characterized in that, The alignment module is used to convert the second scanning electron microscope image outline into the second scanning electron microscope image outline with the same design layout format. The converted outline of the second scanning electron microscope image is aligned with the preset original design layout to obtain the alignment result.

18. The scanning electron microscope image contour extraction device based on design layout according to claim 17, characterized in that, The alignment module is used to align the converted outline of the second scanning electron microscope image with the preset original design layout, and obtain the alignment result based on the preset graphic similarity index; wherein, the graphic similarity index is used to characterize the degree of alignment between the outline of the second scanning electron microscope image and the design layout.

19. The scanning electron microscope image contour extraction device based on design layout according to claim 17, characterized in that, The design layout is a design layout in GDSII stream format.

20. The scanning electron microscope image contour extraction device based on design layout according to claim 14, characterized in that, The detection module is used to detect electron beam defects in different layers of the design layout based on the alignment result, and obtain the defect detection result; wherein, the different layers include at least one of the following: a layer-to-layer connection layer, a metal layer, and a polysilicon layer.

21. The scanning electron microscope image contour extraction device based on design layout according to claim 12, characterized in that, The device further includes: The second acquisition unit is used to acquire the position of the point where the incompletely connected contour exists in the first scanning electron microscope image contour when the comparison result is that there is an incompletely connected contour. A connection unit is used to connect the points based on their positions to generate the second scanning electron microscope image profile.

22. The scanning electron microscope image contour extraction device based on design layout according to claim 12, characterized in that, The second adjustment module is used to dilate and / or erode the second scanning electron microscope image contour based on the alignment result to generate the third scanning electron microscope image contour.

23. An electronic device, characterized in that, The electronic device includes: a processor and a memory storing computer program instructions; When the processor executes the computer program instructions, it implements the scanning electron microscope image contour extraction method based on the design layout as described in any one of claims 1-11.

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