A method and apparatus for optimizing the minimum line width and minimum space of a pattern in a metal layer

Abstract

The application discloses a pattern optimization method and device for minimum line width and minimum space in a metal layer, which is applied to the field of photoetching manufacturing and comprises the following steps: selecting a pattern including the minimum line width and the minimum space in the metal layer as a target pattern; the target pattern is arranged along the direction of the minimum line width and the minimum space, and the side of the minimum line width only has a pattern with one adjacent space; the area with the minimum line width and the minimum space in the target pattern is a continuous area; a first pattern area ending the minimum line width or the minimum space in the target pattern is selected; the line width or the space in the first pattern area is greater than the minimum line width and the minimum space; and the area edge of each line width and space area in the area with the minimum line width or the minimum space in the target pattern is moved to the first pattern area. By moving the area edge of the minimum line width and the minimum space area to the area ending the minimum line width or the minimum space, the application reduces the case that the pattern has bad points.

Description

Technical Field

[0001] This invention relates to the field of photolithography manufacturing, and in particular to a method and apparatus for optimizing the minimum linewidth and minimum spacing in a metal layer. Background Technology

[0002] In photolithography, the pattern on the mask is projected onto the photoresist through an exposure system. However, when the pattern in the photomask area approaches the exposure wavelength, imperfections in the optical system and diffraction effects can cause inconsistencies between the pattern on the photoresist and the pattern on the mask. In this case, optical proximity correction (OPC) is required. OPC techniques are generally divided into rule-based OPC and model-based OPC. In rule-based OPC, correction rules for patterns with different linewidths and spacings need to be determined based on the photolithography and etching processes. Then, each edge of the target pattern is moved according to the rules until all edges of the pattern have been moved.

[0003] However, in graphic design, there are often graphics with continuous minimum line width and minimum spacing. For such graphics, the existing correction rules cannot be effective because they correct the overall graphic. Moreover, such graphics are prone to causing line breaks and intersections, which greatly affects the product yield. How to optimize such graphics is a difficult problem to solve in the optical proximity correction process. Summary of the Invention

[0004] In view of this, the purpose of the present invention is to provide a method and apparatus for optimizing the minimum line width and minimum spacing in a metal layer, which solves the problem that the existing correction rules cannot be effective for some continuous minimum line width and minimum spacing patterns because they correct the overall pattern. Furthermore, such patterns are prone to causing line breaks and intersections, which greatly affects the product yield.

[0005] To address the aforementioned technical problems, this invention provides a method for optimizing the minimum linewidth and minimum spacing in a metal layer, comprising:

[0006] The pattern that includes the minimum line width and minimum spacing in the metal layer is selected as the target pattern; the target pattern is a pattern arranged along the direction of the minimum line width and minimum spacing, and one side of the minimum line width has only one adjacent spacing; the area of ​​the target pattern with the minimum line width and minimum spacing is a continuous area;

[0007] Select a first graphic region in the target graphic that ends with the minimum line width or minimum spacing, and use the region in the target graphic that has the minimum line width or minimum spacing as a second graphic region; the line width or spacing in the first graphic region is greater than the minimum line width and minimum spacing.

[0008] Move the edges of each line width and spacing region in the second graphic region toward the first graphic region.

[0009] Optionally, moving the region edges of each line width and spacing in the second graphic region toward the first graphic region includes:

[0010] Obtain the first quantity of line width and spacing in the second graphic region;

[0011] If the first quantity is odd, then the edge of the region adjacent to the second region in the first graphic region is moved by a preset movement value towards the adjacent first graphic region.

[0012] Using the line width or spacing in the middle of the second graphic region as the center, move the region edge on one side of the center toward the first graphic region on the same side, and move the region edge on the other side of the center toward the first graphic region on the same side.

[0013] If the first quantity is even, then the area edges of each line width and spacing in the second graphic area are moved sequentially to one side of the first graphic area.

[0014] Optionally, if the first quantity is even, moving the region edges of each line width and spacing in the second graphic region sequentially to one side of the first graphic region includes:

[0015] If the first quantity is even, select the first graphic region with the largest line width or spacing in the first graphic region as the target first graphic region;

[0016] The edges of each line width and spacing region in the second graphic region are moved sequentially toward the target first graphic region.

[0017] Optionally, moving the region edges of each line width and spacing in the second graphic region sequentially toward the target first graphic region includes:

[0018] The edges of each line width and spacing in the second graphic region are moved sequentially toward the target first graphic region to obtain a final second graphic region with each line width and spacing increased by a preset width.

[0019] Optionally, the step of sequentially moving the region edges of each line width and spacing in the second graphic region toward the target first graphic region to obtain a final second graphic region with each line width and spacing increased by a preset width includes:

[0020] If the line width or spacing in the target first graphic region is greater than the sum of the movement amount of the final region edge and the single line width or spacing in the second graphic region, then the region edge of each line width and spacing in the second graphic region is moved toward the target first graphic region to obtain the final second graphic region; the final region edge is the region edge in the second graphic region that is adjacent to the target first graphic region.

[0021] If the line width or minimum spacing in the target first graphic region is less than or equal to the movement amount of the first position region edge in the second graphic region, then the region edge in the second graphic region located on the side of the first position region edge that is close to the target first graphic region will be moved toward the target first graphic region.

[0022] Optionally, before moving the edge of the region adjacent to the second graphic region in the first graphic region towards the adjacent first graphic region by a preset movement value, the method further includes:

[0023] In the direction of movement along the edge of the region, if the sum of a single line width or spacing in the second graphic region and the preset movement value is greater than the line width or spacing in the first graphic region, then the line width or spacing in the first graphic region is taken as the target line width or spacing, and a second quantity of the target line width or spacing is obtained.

[0024] If the second quantity is zero, then the step of moving the edge of the region adjacent to the second graphic region in the first graphic region toward the direction of the first graphic region by a preset movement value is executed;

[0025] If the second quantity is not zero and is less than the quantity of the first graphic region, then the step where the first quantity is even is executed;

[0026] If the second quantity is equal to the quantity of the first graphic region, then the operation ends.

[0027] Optionally, the selection of the pattern with the minimum linewidth and minimum spacing in the metal layer as the target pattern includes:

[0028] The pattern that includes the minimum line width and minimum spacing of the continuous metal layer is selected as the target pattern.

[0029] The present invention also provides a pattern optimization apparatus for minimum linewidth and minimum spacing in a metal layer, comprising:

[0030] The target graphic selection module is used to select a graphic including the minimum line width and minimum spacing in the metal layer as the target graphic; the target graphic is a graphic arranged along the direction of the minimum line width and minimum spacing, and one side of the minimum line width has only one adjacent spacing; the area of ​​the target graphic with the minimum line width and minimum spacing is a continuous area;

[0031] The first graphic region selection module is used to select a first graphic region in the target graphic that ends with the minimum line width or minimum spacing, and to use the region in the target graphic that has the minimum line width or minimum spacing as a second graphic region; the line width or spacing in the first graphic region is greater than the minimum line width and minimum spacing.

[0032] The region edge moving module is used to move the region edges of each line width and spacing in the second graphic region toward the first graphic region.

[0033] The present invention also provides a pattern optimization device for minimum linewidth and minimum spacing in a metal layer, comprising:

[0034] Memory, used to store computer programs;

[0035] A processor is configured to execute the computer program to implement the steps of the above-described method for optimizing the minimum linewidth and minimum spacing in a metal layer.

[0036] The present invention also provides a computer-readable storage medium for storing a computer program, wherein the computer program, when executed by a processor, implements the steps of the above-described graphic optimization method for minimum linewidth and minimum spacing in a metal layer.

[0037] As can be seen, the pattern optimization method for minimum linewidth and minimum spacing in a metal layer provided by this invention includes selecting a pattern comprising the minimum linewidth and minimum spacing in the metal layer as the target pattern. The target pattern is a pattern arranged along the direction of the minimum linewidth and minimum spacing, with only one adjacent spacing on one side of the minimum linewidth. The region in the target pattern with the minimum linewidth and minimum spacing is a continuous region. A first pattern region in the target pattern that ends with the minimum linewidth or minimum spacing is selected. The region in the target pattern with the minimum linewidth or minimum spacing is selected as the second pattern region. The linewidth or spacing in the first pattern region is greater than the minimum linewidth and minimum spacing. The region edges of each linewidth and spacing region in the second pattern region are moved towards the first pattern region. This invention, by selecting a pattern comprising the minimum linewidth and minimum spacing in the metal layer and moving the region edges of the minimum linewidth and minimum spacing region towards the region ending with the minimum linewidth or minimum spacing, can optimize patterns with continuous minimum linewidth and minimum spacing in the metal layer, effectively increasing the linewidth and spacing of the pattern, thereby reducing the occurrence of defective pixels in the pattern and improving the yield rate of the product.

[0038] In addition, the present invention also provides a pattern optimization device for minimum line width and minimum spacing in a metal layer, which also has the above-mentioned beneficial effects. Attached Figure Description

[0039] To more clearly illustrate the technical solutions in the embodiments of the present invention or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only embodiments of the present invention. For those skilled in the art, other drawings can be obtained based on the provided drawings without creative effort.

[0040] Figure 1 A flowchart illustrating a method for optimizing the minimum linewidth and minimum spacing in a metal layer, provided as an embodiment of the present invention;

[0041] Figure 2 An example diagram illustrating the selection of a target graphic provided in an embodiment of the present invention;

[0042] Figure 3 A flowchart of another method for optimizing the minimum linewidth and minimum spacing in a metal layer, provided as an embodiment of the present invention;

[0043] Figure 4 A flowchart illustrating another method for optimizing the minimum linewidth and minimum spacing in a metal layer, provided in an embodiment of the present invention;

[0044] Figure 5 An example diagram provided by an embodiment of the present invention shows that the number of minimum line widths and minimum spacings in the selected target graphic is odd.

[0045] Figure 6 An example diagram provided by an embodiment of the present invention shows that the number of minimum line widths and minimum spacings in the selected target graphics is even.

[0046] Figure 7 A schematic diagram of a pattern optimization device for minimum linewidth and minimum spacing in a metal layer provided in an embodiment of the present invention;

[0047] Figure 8 A schematic diagram of a pattern optimization device for minimum linewidth and minimum spacing in a metal layer, provided in an embodiment of the present invention;

[0048] Appendix Figure 2 Appendix Figure 5 and attached Figure 6 The reference numerals in the attached figures are explained as follows:

[0049] 10 - Line width or spacing of the first graphic area;

[0050] 20 - Line width of the second graphic area;

[0051] 30 - Spacing of the second graphic region; 31 - First target region; 32 - Second target region; 33 - Third target region. Detailed Implementation

[0052] To make the objectives, technical solutions, and advantages of the embodiments of the present invention clearer, the technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.

[0053] Please refer to Figure 1 , Figure 1 This is a flowchart illustrating a method for optimizing the minimum linewidth and minimum spacing in a metal layer, as provided in an embodiment of the present invention. The method may include:

[0054] S101: Select the pattern that includes the minimum line width and minimum spacing in the metal layer as the target pattern; the target pattern is the pattern arranged along the direction of the minimum line width and minimum spacing, and the side with the minimum line width has only one adjacent spacing; the area with the minimum line width and minimum spacing in the target pattern is a continuous area.

[0055] The execution entity in this embodiment is a processor. This embodiment selects a pattern including the minimum linewidth and minimum spacing in the metal layer. The target pattern is arranged along the direction of the minimum linewidth and minimum spacing, with only one adjacent spacing on one side of the minimum linewidth. This is to ensure that when the edge of the region with the minimum linewidth and minimum spacing in the target pattern moves along the direction of the minimum linewidth and minimum spacing, only the influence of one spacing on the amount of movement needs to be considered, thus avoiding the problem in the prior art where continuous minimum linewidths and minimum spacing cannot be moved.

[0056] It should be noted that in this embodiment, the direction along the minimum linewidth and minimum spacing is the direction formed by the arrangement of the minimum linewidth and minimum spacing. It should also be noted that in this embodiment, the minimum linewidth is the width of the mask pattern during wafer etching, and correspondingly, the spacing is the width between the mask patterns. Furthermore, it should be noted that the pattern optimization method for the minimum linewidth and minimum spacing in the metal layer in this embodiment can be performed after the conventional pattern optimization method for the minimum linewidth and minimum spacing in the metal layer, or it can be performed directly.

[0057] It should be noted that in this embodiment, the side with the minimum line width has only one adjacent spacing, where the adjacent spacing is a spacing of equal width. Please refer to [link / reference needed] for details. Figure 2 , Figure 2 This is an example diagram illustrating the selection of a target graphic according to an embodiment of the present invention. When multiple equally spaced intervals exist on the side with the minimum line width, the selection is based on... Figure 2 For example, there are a first target region 31, a second target region 32, and a third target region 33. As shown in the figure, the region is divided into the first target region 31, the second target region 32, and the third target region 33 along the direction of the minimum line width and the minimum spacing. This division is extended through the entire region of the minimum line width and the minimum spacing, and continues to extend through at least one region with a line width or spacing greater than the minimum line width and the minimum spacing, resulting in three divided graphics. One of the divided graphics is selected as the target graphic.

[0058] Furthermore, if the movement strategy of each corresponding minimum line width or minimum spacing region edge in the multiple adjacent target regions after segmentation is the same, that is, each corresponding minimum line width or minimum spacing region edge in the multiple adjacent target regions moves in the same direction by the same amount, then the multiple adjacent target regions can be integrated into one target region.

[0059] Furthermore, to reduce unnecessary operational steps and improve the efficiency of the pattern optimization method for solving patterns with continuous minimum linewidth and minimum spacing, the above-mentioned selection of patterns including the minimum linewidth and minimum spacing in the metal layer as target patterns may include:

[0060] Select the pattern that includes the continuous minimum line width and minimum spacing in the metal layer as the target pattern.

[0061] It should be noted that the target pattern selected in this embodiment includes at least two consecutive minimum line widths and minimum spacings. When this embodiment is performed after the pattern optimization method for minimum line widths and minimum spacings in a conventional metal layer, it can avoid the problem that the selected pattern for minimum line widths and minimum spacings in the metal layer only includes one minimum line width or one minimum spacing, thereby improving the efficiency of pattern optimization for minimum line widths and minimum spacings in the metal layer.

[0062] S102: Select the first graphic region in the target graphic that ends with the minimum line width or minimum spacing, and take the region in the target graphic that has the minimum line width or minimum spacing as the second graphic region; the line width or spacing in the first graphic region is greater than the minimum line width and minimum spacing.

[0063] It should be noted that in this embodiment, a single first graphic region includes only one line width or spacing. In this embodiment, the line width or spacing in the selected first graphic region is greater than the minimum line width and minimum spacing. That is, the region ending at the minimum line width or minimum spacing is not the region composed of the minimum line width or minimum spacing. And since the minimum line width or minimum spacing is already the minimum line width or spacing, the first graphic region should be greater than the minimum line width and minimum spacing.

[0064] S103: Move the area edges of each line width and spacing in the second graphic area toward the first graphic area.

[0065] It should be noted that, in this embodiment, after determining the first and second graphic regions, the region edges of each line width and spacing in the second graphic region can be moved towards the first graphic region, wherein adjacent line widths and spacings share a region edge. This embodiment does not limit the movement value of the region edges of each line width and spacing in the second graphic region towards the first graphic region, as long as it can complete the step of widening the line width and spacing in the second graphic region. For example, the movement value of the region edges of each line width and spacing in the second graphic region towards the first graphic region could be 5 nanometers, or it could be 10 nanometers.

[0066] Furthermore, to ensure the optimization of the minimum linewidth and minimum spacing in the second graphic region is completed, and to improve the efficiency of graphic optimization of the minimum linewidth and minimum spacing in the metal layer, the above-mentioned movement of the region edge of each linewidth and spacing in the second graphic region towards the first graphic region may include the following steps. Please refer to [link / reference needed] for details. Figure 3 , Figure 3 A flowchart illustrating another method for optimizing the minimum linewidth and minimum spacing in a metal layer, provided as an embodiment of the present invention.

[0067] S201: Obtain the first quantity of line width and spacing in the second graphic region.

[0068] S202: If the first quantity is odd, then the edge of the region adjacent to the second region in the first graphic region is moved by a preset movement value towards the adjacent first graphic region.

[0069] It should be noted that when the first quantity is odd, the edge of the region adjacent to the second region in the first graphic region is a shared edge between the first and second graphic regions. This shared edge is moved towards the adjacent first graphic region by a preset movement value. In this embodiment, the preset movement value can be set based on the first width to be widened value for each minimum line width or minimum spacing, where the first width to be widened value is the width that needs to be increased for the minimum line width or minimum spacing. The preset movement value set based on the width to be widened for the minimum line width or minimum spacing in this embodiment can be substituted into the formula:

[0070]

[0071] Where X1 is the preset movement value, n is the first quantity, and i is the first width to be widened value of the minimum line width or minimum spacing.

[0072] Furthermore, to ensure more precise optimization for different graphic scenarios when the first quantity is odd, the above-mentioned steps, before moving the edges of regions adjacent to the second graphic region in the first graphic region towards the adjacent first graphic region by a preset movement value, may include the following steps. Please refer to [link / reference needed] for details. Figure 4 , Figure 4 A flowchart illustrating another method for optimizing the minimum linewidth and minimum spacing in a metal layer, provided as an embodiment of the present invention.

[0073] S301: In the direction of movement along the edge of the region, if the sum of the line width or spacing of a single line in the second graphic region and the preset movement value is greater than the line width or spacing in the first graphic region, then the line width or spacing in the first graphic region is taken as the target line width or spacing, and the second quantity of the target line width or spacing is obtained.

[0074] It should be noted that, in this embodiment, determining whether the sum of the line width or spacing in the second graphic region and the preset movement value is greater than the line width or spacing in the first graphic region can be done by substituting into the formula. The judgment between Y k The relationship is defined as follows: n is the first quantity, i is the first width to be widened value (minimum line width or minimum spacing), a is the single line width or spacing in the second graphic region, and Y... k This represents the k-th line width or spacing in the first graphic region.

[0075] Furthermore, in this embodiment, the number of first graphic regions is generally two.

[0076] S302: If the second quantity is zero, then the step of moving the edge of the region adjacent to the second graphic region in the first graphic region toward the direction of the first graphic region by a preset movement value is executed.

[0077] If the number of target line widths or spacings in the first graphic region is zero, then continue with the step of moving the edge of the region adjacent to the second graphic region in the first graphic region toward the first graphic region by a preset movement value.

[0078] S303: If the second quantity is not zero and is less than the quantity of the first graphic area, then execute the step where the first quantity is even.

[0079] It should be noted that in this embodiment, when the second quantity is not zero and is less than the quantity of the first graphic region, the step of moving the region edge in the second graphic region is performed with the first quantity being an even number.

[0080] S304: If the second quantity is equal to the quantity of the first graphic area, then the operation ends.

[0081] It should be noted that in this embodiment, if the line width and spacing in the first graphic area are all the target line width or spacing, the operation ends.

[0082] S203: Using the line width or spacing in the middle of the second graphic region as the center, move the edge of the region on one side of the center to the first graphic region on the same side, and move the edge of the region on the other side of the center to the first graphic region on the same side.

[0083] It should be noted that in this embodiment, the regions on both sides of the center can be moved towards the first graphic region on the same side. In this embodiment, the two regions at the center can be set as A1, and the regions set as A1, along the direction pointing towards the first graphic region on the same side, can be sequentially set as A2, A3, etc. Then, the movement value of the regions on both sides of the center towards the first graphic region on the same side can be substituted into the formula:

[0084]

[0085] Where X2 is the movement value of the region edges on both sides of the center moving towards the first graphic region on the same side, n is the first quantity, and i is the first width value to be widened, which is the minimum line width or the minimum spacing.

[0086] S204: If the first quantity is even, then move the area edges of each line width and spacing in the second graphic area to the first graphic area on one side in turn.

[0087] It should be noted that if the first quantity is even, a first graphic region on one side is selected, and the edges of each line width and spacing region in the second graphic region are moved towards the selected first graphic region. This embodiment does not limit the specific method of selecting the first graphic region on one side. For example, the first graphic region with the largest line width or spacing can be selected, or the smallest first graphic region that meets the graphic optimization conditions can be selected. This embodiment does not limit the specific content of the graphic optimization conditions. For example, the specific content of the graphic optimization conditions can be that the sum of the minimum line width or minimum spacing and the first width to be widened is less than the line width or spacing of the first graphic region; or the specific content of the graphic optimization conditions can also be that the sum of the minimum line width or minimum spacing and the second width to be widened is less than the line width or spacing of the first graphic region, wherein the second width to be widened value is the total width to be widened value of the second graphic region. When the first quantity is even, the edges of regions adjacent to the second graphic region in the first graphic region are not moved.

[0088] Furthermore, to simplify the program's execution steps and further improve the efficiency of pattern optimization for minimum linewidth and minimum spacing in the metal layer, if the first quantity is even, moving the region edges of each linewidth and spacing in the second pattern region sequentially to one side of the first pattern region may include the following steps:

[0089] Step S11: If the first quantity is even, select the first graphic region with the largest line width or spacing in the first graphic region as the target first graphic region.

[0090] Step S12: Move the edges of each line width and spacing area in the second graphic area sequentially toward the target first graphic area.

[0091] Furthermore, to facilitate the early prediction of the pattern optimization results for the minimum linewidth and minimum spacing in the metal layer, the aforementioned process of moving the region edges of each linewidth and spacing in the second pattern region sequentially toward the target first pattern region may include:

[0092] Move the edges of each line width and spacing area in the second graphic area sequentially toward the target first graphic area to obtain the final second graphic area with each line width and spacing increased by a preset width.

[0093] It should be noted that in this embodiment, the width and spacing of each line in the second graphic area are widened by the same amount.

[0094] Furthermore, in order to ensure the maximum line width or spacing in the first graphic region and to adjust the optimization strategy in a timely manner when the graphic optimization conditions are not met, the above-mentioned method of moving the region edges of each line width and spacing in the second graphic region sequentially toward the target first graphic region to obtain a final second graphic region with each line width and spacing increased by a preset width may include the following steps:

[0095] Step S21: If the line width or spacing in the target first graphic region is greater than the sum of the movement amount of the final region edge and the single line width or spacing in the second graphic region, then move the region edge of each line width and spacing in the second graphic region toward the target first graphic region to obtain the final second graphic region, wherein the final region edge is the region edge in the second graphic region that is adjacent to the target first graphic region.

[0096] It should be noted that in this embodiment, when the line width or spacing in the target first graphic region is greater than the sum of the final region edge movement and the single line width or spacing in the second graphic region, the region edges with the minimum line width and minimum spacing in the second graphic region can be sequentially set to A0, A1, A2, A3, ... A along the direction from the second graphic region to the target first graphic region. nAt this point, by moving the edges of each line width and spacing region in the second graphic region towards the target first graphic region, the movement value of the corresponding region edge in the second graphic region can be calculated and substituted into the formula:

[0097] X3=n×i

[0098] Where X3 is the movement value of the corresponding area edge in the second graphic area, n is the first quantity, and i is the first width to be widened value of the minimum line width or minimum spacing.

[0099] Step S22: If the line width or spacing in the target first graphic region is less than or equal to the movement amount of the first position region edge in the second graphic region, then the region edge in the second graphic region located on the side of the first position region edge that is close to the target first graphic region will be moved towards the target first graphic region.

[0100] It should be noted that in this embodiment, the edges of each region in the second graphic region in step S21 are sequentially set to A0, A1, A2, A3, ... A n At this point, the edge of the first location region can be calculated using the formula:

[0101] (nR)×i+a≤Y 1≤ (n-R+1)×i+a

[0102] Where R is the first position, n is the first quantity, i is the first width to be widened value (minimum line width or minimum spacing), a is the single line width or spacing in the second graphic region, and Y1 is the line width or spacing in the target first graphic region. At this point, the movement value of the region edge in the first position region that is close to the target first graphic region can be substituted into the formula:

[0103] An=(nR)×i

[0104] Where n is the first quantity, R is the first position, and i is the first width to be widened, which is either the minimum line width or the minimum spacing.

[0105] The method for optimizing patterns with minimum linewidth and minimum spacing in a metal layer, as provided in this invention, includes selecting a pattern with minimum linewidth and minimum spacing in the metal layer as a target pattern. The target pattern is a pattern arranged along the direction of minimum linewidth and minimum spacing, with only one adjacent spacing on one side of the minimum linewidth. The region with minimum linewidth and minimum spacing in the target pattern is a continuous region. A first pattern region in the target pattern that ends with minimum linewidth or minimum spacing is selected, and the region with minimum linewidth or minimum spacing in the target pattern is selected as a second pattern region. The linewidth or spacing in the first pattern region is greater than the minimum linewidth and minimum spacing. The region edges of each linewidth and spacing region in the second pattern region are moved towards the first pattern region. By selecting a pattern with minimum linewidth and minimum spacing in the metal layer and moving the region edges of the minimum linewidth and minimum spacing region towards the region ending with minimum linewidth or minimum spacing, this invention can optimize patterns with continuous minimum linewidth and minimum spacing in the metal layer, effectively increasing the linewidth and spacing of the pattern, thereby reducing the occurrence of defective pixels in the pattern and improving the yield rate of the product. Furthermore, by dividing the number of line widths and spacings in the second graphic region into even and odd values, and implementing different optimization strategies based on these values, the optimization of the minimum line width and minimum spacing in the second graphic region can be guaranteed, improving the efficiency of graphic optimization for the minimum line width and minimum spacing in the metal layer. When the first number is even, the region edges of each line width and spacing in the second graphic region are moved sequentially towards the first graphic region with the largest line width or spacing in the first graphic region, resulting in a final second graphic region with each line width and spacing increased by a preset width. This simplifies the program's steps, further improving the efficiency of graphic optimization for the minimum line width and minimum spacing in the metal layer, and facilitating the prediction of the optimization results for the minimum line width and minimum spacing in the metal layer. By comparing the line width or spacing in the target first graphic region with the sum of the movement of the final region edges and the single line width or spacing in the second graphic region, and implementing corresponding strategies based on the comparison results, the maximum line width or spacing in the first graphic region can be guaranteed. If the graphic optimization conditions are not met, the optimization strategy can be adjusted in a timely manner. This invention obtains a second quantity of target line width or spacing, and performs a corresponding optimization method when the first quantity is odd. This ensures that when the first quantity is odd, optimization can be performed more accurately for different graphic situations. By selecting graphics including the continuous minimum line width and minimum spacing in the metal layer as target graphics, unnecessary operation steps are reduced, and the efficiency of the graphic optimization method for solving graphics with continuous minimum line width and minimum spacing is improved.

[0106] For ease of understanding, the pattern optimization method for minimum linewidth and minimum spacing in the metal layer in this invention, when the first quantity is odd or even, may include the following steps. Please refer to [link / reference needed] for details. Figure 5 and Figure 6 , Figure 5 An example diagram provided by an embodiment of the present invention shows that the number of minimum line widths and minimum spacings in the selected target graphic is odd. Figure 6 This is an example diagram provided by an embodiment of the present invention, in which the number of minimum line widths and minimum spacings in a selected target graphic is even.

[0107] Step S31: Select the pattern that includes the minimum line width and minimum spacing in the metal layer as the target pattern; the target pattern is the pattern arranged along the direction of the minimum line width and minimum spacing, and the side with the minimum line width has only one adjacent spacing; the area with the minimum line width and minimum spacing in the target pattern is a continuous area.

[0108] Step S32: Select the first graphic region in the target graphic that ends with the minimum line width or minimum spacing, and take the region in the target graphic that has the minimum line width or minimum spacing as the second graphic region; the line width or spacing in the first graphic region is greater than the minimum line width and minimum spacing.

[0109] It should be noted that the line width or spacing in the first graphic area in this example is... Figure 5 or Figure 6 The line width or spacing of the first graphic area is 10.

[0110] Step S33: When the first quantity is odd, it includes:

[0111] It should be noted that when the first quantity is odd, it can be referred to... Figure 5 , Figure 5 This is an example diagram provided by an embodiment of the present invention, in which the number of minimum line widths and minimum spacings in a selected target graphic is odd.

[0112] Step S331: In the direction of movement along the edge of the region, if the sum of the line width or spacing of a single line in the second graphic region and the preset movement value is greater than the line width or spacing in the first graphic region, then the line width or spacing in the first graphic region is taken as the target line width or spacing, and the second quantity of the target line width or spacing is obtained.

[0113] In this example, the width of a single line in the second graphic area is... Figure 5 The line width of the second graphic area is 20, and the spacing between individual lines in the second graphic area is... Figure 5 The spacing of the second graphic region is 30. In this embodiment, it is determined whether the sum of the individual line width or spacing in the second graphic region and the preset movement value is greater than the line width or spacing in the first graphic region, and then substituted into the formula. The judgment between Y k The relationship is defined as follows: n is the first quantity, i is the first width to be widened value (minimum line width or minimum spacing), a is the single line width or spacing in the second graphic region, and Y... k This represents the k-th line width or spacing in the first graphic region.

[0114] Step S332: If the second quantity is zero, then execute the step of moving the edge of the region adjacent to the second graphic region in the first graphic region towards the first graphic region by a preset movement value. Taking the line width or spacing in the middle of the second graphic region as the center, move the edge of the region on one side of the center towards the first graphic region on the same side, and move the edge of the region on the other side of the center towards the first graphic region on the same side.

[0115] In this embodiment, the two edges of the center region are set as A1, and the edges of the region set as A1, along the direction pointing to the first graphic region on the same side, are successively set as A2, A3, ... Then, the movement values ​​of the edges of the regions on both sides of the center moving towards the first graphic region on the same side are substituted into the formula:

[0116]

[0117] Where X2 is the movement value of the region edges on both sides of the center moving towards the first graphic region on the same side, n is the first quantity, and i is the first width value to be widened, which is the minimum line width or the minimum spacing.

[0118] Step S333: If the second quantity is not zero and is less than the quantity of the first graphic area, then execute the step where the first quantity is even.

[0119] Step S334: If the second quantity is equal to the quantity of the first graphic area, then the operation ends.

[0120] Step S34: When the first quantity is even, it includes:

[0121] It should be noted that when the first quantity is even, it can be referred to... Figure 6 , Figure 6 This is an example diagram provided by an embodiment of the present invention, in which the number of minimum line widths and minimum spacings in a selected target graphic is even.

[0122] Step S341: Select the first graphic region with the largest line width or spacing in the first graphic region as the target first graphic region.

[0123] Step S342: If the line width or spacing in the target first graphic region is greater than the sum of the movement amount of the final region edge and the single line width or spacing in the second graphic region, then move the region edge of each line width and spacing in the second graphic region toward the target first graphic region to obtain a final second graphic region with each line width and spacing increased by a preset width, wherein the final region edge is the region edge in the second graphic region that is adjacent to the target first graphic region.

[0124] In this example, the width of a single line in the second graphic area is... Figure 6The line width of the second graphic area is 20, and the spacing between individual elements in the second graphic area is... Figure 6 The spacing of the second graphic area is 30.

[0125] Along the direction from the second graphic region to the target first graphic region, the regions with the minimum line width and minimum spacing in the second graphic region are sequentially set to A0, A1, A2, A3, ... A n At this point, move the edges of each line width and spacing region in the second graphic region toward the target first graphic region, calculate the movement value of the corresponding region edge in the second graphic region, and substitute it into the formula:

[0126] X3=n×i

[0127] Where X3 is the movement value of the corresponding area edge in the second graphic region, n is the first quantity, and i is the first width to be widened value of the minimum line width or minimum spacing. Step S343: If the line width or spacing in the target first graphic region is less than or equal to the movement amount of the first position area edge in the second graphic region, then the area edge in the second graphic region located on the side of the first position area edge that is close to the target first graphic region is moved towards the target first graphic region.

[0128] In this embodiment, the edges of each region in the second graphic region are sequentially set to A0, A1, A2, A3, ... A in step S21. n At this point, the edge of the first location region is calculated using the formula:

[0129] (nR)×i+a≤Y 1≤ (n-R+1)×i+a

[0130] Where R is the first position, n is the first quantity, i is the first width to be widened value (minimum line width or minimum spacing), a is the single line width or spacing in the second graphic region, and Y1 is the line width or spacing in the target first graphic region. Then, the movement value of the region edge of the first position region that is close to the target first graphic region is substituted into the formula:

[0131] An=(nR)×i

[0132] Where n is the first quantity, R is the first position, and i is the first width to be widened, which is either the minimum line width or the minimum spacing.

[0133] The following describes the pattern optimization device for minimum line width and minimum spacing in a metal layer provided by the embodiments of the present invention. The pattern optimization device for minimum line width and minimum spacing in a metal layer described below can be referred to in correspondence with the pattern optimization method for minimum line width and minimum spacing in a metal layer described above.

[0134] Please refer to the details. Figure 7, Figure 7 A schematic diagram of the structure of the pattern optimization device for minimum linewidth and minimum spacing in a metal layer provided in the embodiments of the present invention may include:

[0135] The target graphic selection module 100 is used to select a graphic including the minimum line width and minimum spacing in the metal layer as the target graphic; the target graphic is a graphic arranged along the direction of the minimum line width and minimum spacing, and one side of the minimum line width has only one adjacent spacing; the area of ​​the target graphic with the minimum line width and minimum spacing is a continuous area;

[0136] The first graphic region selection module 200 is used to select a first graphic region in the target graphic that ends with the minimum line width or minimum spacing, and to use the region in the target graphic that has the minimum line width or minimum spacing as a second graphic region; the line width or spacing in the first graphic region is greater than the minimum line width and minimum spacing.

[0137] The region edge moving module 300 is used to move the region edges of each line width and spacing in the second graphic region toward the first graphic region.

[0138] Furthermore, based on the above embodiments, the region edge movement module 300 may include:

[0139] The first acquisition unit is used to acquire a first quantity of line width and spacing in the second graphic region;

[0140] The first execution unit is configured to, if the first quantity is odd, move the edge of the region adjacent to the second graphic region in the first graphic region toward the adjacent first graphic region by a preset movement value.

[0141] The second execution unit is used to move the edge of the region on one side of the center to the first graphic region on the same side, with the line width or spacing in the middle of the second graphic region as the center, and move the edge of the region on the other side of the center to the first graphic region on the same side.

[0142] The third execution unit is configured to, if the first quantity is even, move the region edges of each line width and spacing in the second graphic region sequentially to one side of the first graphic region.

[0143] Furthermore, based on the above embodiments, the third execution unit may include:

[0144] Select a sub-unit, which is used to select the first graphic region with the largest line width or spacing in the first graphic region as the target first graphic region if the first quantity is even;

[0145] An execution subunit is used to move the region edges of each line width and spacing in the second graphic region sequentially toward the target first graphic region.

[0146] Furthermore, based on the above embodiments, the first execution subunit may include:

[0147] The moving sub-unit is used to move the area edges of each line width and spacing in the second graphic area sequentially toward the target first graphic area to obtain a final second graphic area with each line width and spacing increased by a preset width.

[0148] Furthermore, based on the above embodiments, the second execution subunit may include:

[0149] The running subunit is configured to move the region edges of each line width and spacing in the second graphic region toward the target first graphic region if the line width or spacing in the target first graphic region is greater than the sum of the movement amount of the final region edge and the single line width or spacing in the second graphic region, thereby obtaining the final second graphic region; the final region edge is the region edge in the second graphic region that is adjacent to the target first graphic region.

[0150] The running subunit is configured to move the edge of the second graphic region located on the side of the first position area edge that is close to the target first graphic region towards the target first graphic region if the line width or spacing in the target first graphic region is less than or equal to the amount of movement of the edge of the first position area in the second graphic region.

[0151] Furthermore, based on the above embodiments, the region edge movement module 300 may further include:

[0152] The second acquisition unit is used to, in the direction of movement along the edge of the region, if the sum of a single line width or spacing in the second graphic region and the preset movement value is greater than the line width or spacing in the first graphic region, then take the line width or spacing in the first graphic region as the target line width or spacing and acquire the second quantity of the target line width or spacing.

[0153] The fourth execution unit is configured to, if the second quantity is zero, execute the step of moving the edge of the region adjacent to the second graphic region in the first graphic region toward the direction of the first graphic region by a preset movement value.

[0154] The fifth execution unit is configured to execute the step where the first quantity is even if the second quantity is not zero and is less than the quantity of the first graphic area.

[0155] The sixth execution unit is configured to terminate the operation if the second quantity is equal to the quantity of the first graphic region.

[0156] Furthermore, based on the above embodiments, the target graphic selection module 100 may include:

[0157] The target graphic selection unit is used to select a graphic that includes the minimum line width and minimum spacing of the continuous metal layer as the target graphic.

[0158] The graphic optimization device for minimum linewidth and minimum spacing in a metal layer provided in this embodiment of the invention includes a target graphic selection module 100 for selecting a graphic including the minimum linewidth and minimum spacing in the metal layer as a target graphic. The target graphic is a graphic arranged along the direction of the minimum linewidth and minimum spacing, with only one adjacent spacing on one side of the minimum linewidth. The area with the minimum linewidth and minimum spacing in the target graphic is a continuous area. A first graphic area selection module 200 is used to select a first graphic area in the target graphic that ends with the minimum linewidth or minimum spacing, and to use the area with the minimum linewidth or minimum spacing in the target graphic as a second graphic area. The linewidth or spacing in the first graphic area is greater than the minimum linewidth and minimum spacing. An area edge moving module 300 is used to move the area edge of each linewidth and spacing in the second graphic area toward the first graphic area. This invention optimizes patterns with continuous minimum linewidth and minimum spacing in a metal layer by selecting patterns that include the minimum linewidth and minimum spacing in the metal layer and moving the region edges of the minimum linewidth and minimum spacing area towards the region where the minimum linewidth or minimum spacing ends. This effectively increases the linewidth and spacing of the patterns, thereby reducing the occurrence of defective pixels and improving the yield rate of products. Furthermore, by dividing the number of line widths and spacings in the second graphic region into even and odd values, and implementing different optimization strategies based on these values, the optimization of the minimum line width and minimum spacing in the second graphic region can be guaranteed, improving the efficiency of graphic optimization for the minimum line width and minimum spacing in the metal layer. When the first number is even, the region edges of each line width and spacing in the second graphic region are moved sequentially towards the first graphic region with the largest line width or spacing in the first graphic region, resulting in a final second graphic region with each line width and spacing increased by a preset width. This simplifies the program's steps, further improving the efficiency of graphic optimization for the minimum line width and minimum spacing in the metal layer, and facilitating the prediction of the optimization results for the minimum line width and minimum spacing in the metal layer. By comparing the line width or spacing in the target first graphic region with the sum of the movement of the final region edges and the single line width or spacing in the second graphic region, and implementing corresponding strategies based on the comparison results, the maximum line width or spacing in the first graphic region can be guaranteed. If the graphic optimization conditions are not met, the optimization strategy can be adjusted in a timely manner. This invention obtains a second quantity of target line width or spacing, and performs a corresponding optimization method when the first quantity is odd. This ensures that when the first quantity is odd, optimization can be performed more accurately for different graphic situations. By selecting graphics including the continuous minimum line width and minimum spacing in the metal layer as target graphics, unnecessary operation steps are reduced, and the efficiency of the graphic optimization method for solving graphics with continuous minimum line width and minimum spacing is improved.

[0159] The following describes the pattern optimization device for minimum line width and minimum spacing in a metal layer provided by the embodiments of the present invention. The pattern optimization device for minimum line width and minimum spacing in a metal layer described below can be referred to in correspondence with the pattern optimization method for minimum line width and minimum spacing in a metal layer described above.

[0160] Please refer to Figure 8 , Figure 8 A schematic diagram of the structure of the pattern optimization device for minimum linewidth and minimum spacing in a metal layer provided in the embodiments of the present invention may include:

[0161] Memory 10 is used to store computer programs;

[0162] Processor 20 is used to execute computer programs to implement the above-described pattern optimization method for minimum linewidth and minimum spacing in the metal layer.

[0163] The memory 10, processor 20, and communication interface 31 all communicate with each other through the communication bus 32.

[0164] In this embodiment of the invention, the memory 10 is used to store one or more programs. The programs may include program code, which includes computer operation instructions. In this embodiment, the memory 10 may store programs for implementing the following functions:

[0165] The pattern containing the minimum line width and minimum spacing in the metal layer is selected as the target pattern; the target pattern is the pattern arranged along the direction of the minimum line width and minimum spacing, with only one adjacent spacing on the side of the minimum line width; the area in the target pattern that has the minimum line width and minimum spacing is a continuous area;

[0166] Select the first graphic region in the target graphic that ends with the minimum line width or minimum spacing, and use the region in the target graphic that has the minimum line width or minimum spacing as the second graphic region; the line width or spacing in the first graphic region is greater than the minimum line width and minimum spacing.

[0167] Move the edges of each line width and spacing area in the second graphic area toward the first graphic area.

[0168] In one possible implementation, the memory 10 may include a program storage area and a data storage area, wherein the program storage area may store the operating system and applications required for at least one function; and the data storage area may store data created during use.

[0169] Furthermore, memory 10 may include read-only memory and random access memory, providing instructions and data to the processor. A portion of the memory may also include NVRAM. The memory stores operating systems and operating instructions, executable modules, or data structures, or subsets thereof, or extended sets thereof, wherein the operating instructions may include various operating instructions for implementing various operations. The operating system may include various system programs for implementing various basic tasks and handling hardware-based tasks.

[0170] Processor 20 can be a central processing unit (CPU), an application-specific integrated circuit, a digital signal processor, a field-programmable gate array, or other programmable logic device. Processor 20 can be a microprocessor or any conventional processor. Processor 20 can call programs stored in memory 10.

[0171] Communication interface 31 can be an interface for the communication module, used to connect with other devices or systems.

[0172] Of course, it should be noted that, Figure 8 The structure shown does not constitute a limitation on the pattern optimization device for the minimum linewidth and minimum spacing in the metal layer in the embodiments of this application. In practical applications, the pattern optimization device for the minimum linewidth and minimum spacing in the metal layer may include devices with lower linewidth and minimum spacing than those shown in the embodiments of this application. Figure 8 More or fewer components as shown, or combinations of certain components.

[0173] The following describes the computer-readable storage medium provided in the embodiments of the present invention. The computer-readable storage medium described below can be referred to in correspondence with the pattern optimization method for minimum linewidth and minimum spacing in the metal layer described above.

[0174] The present invention also provides a computer-readable storage medium storing a computer program that, when executed by a processor, implements the steps of the above-described pattern optimization method for minimum linewidth and minimum spacing in a metal layer.

[0175] The computer-readable storage medium may include various media capable of storing program code, such as USB flash drives, portable hard drives, read-only memory (ROM), random access memory (RAM), magnetic disks, or optical disks.

[0176] The various embodiments in this specification are described in a progressive manner, with each embodiment focusing on its differences from other embodiments. Similar or identical parts between embodiments can be referred to interchangeably. For the apparatus disclosed in the embodiments, since it corresponds to the method disclosed in the embodiments, the description is relatively simple; relevant parts can be referred to in the method section.

[0177] Those skilled in the art will further recognize that the units and algorithm steps of the various examples described in conjunction with the embodiments disclosed herein can be implemented in electronic hardware, computer software, or a combination of both. To clearly illustrate the interchangeability of hardware and software, the components and steps of the various examples have been generally described in terms of functionality in the foregoing description. Whether these functions are implemented in hardware or software depends on the specific application and design constraints of the technical solution. Those skilled in the art can use different methods to implement the described functions for each specific application, but such implementations should not be considered beyond the scope of this invention.

[0178] Finally, it should be noted that in this document, relationships such as "first" and "second" are used merely to distinguish one entity or operation from another, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Furthermore, the terms "comprising," "including," or any other variations are intended to cover non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements includes not only those elements but also other elements not expressly listed, or elements inherent to such process, method, article, or apparatus.

[0179] The above provides a detailed description of the pattern optimization method and apparatus for minimum linewidth and minimum spacing in a metal layer provided by the present invention. Specific examples have been used to illustrate the principle and implementation of the present invention. The description of the above embodiments is only for the purpose of helping to understand the method and core idea of ​​the present invention. At the same time, for those skilled in the art, there will be changes in the specific implementation and application scope based on the idea of ​​the present invention. Therefore, the content of this specification should not be construed as a limitation of the present invention.

Claims

1. A method for optimizing the minimum linewidth and minimum spacing in a metal layer, characterized in that, include: Select the pattern that includes the minimum line width and minimum spacing in the metal layer as the target pattern; The target graphic is arranged along the direction of the minimum line width and minimum spacing, and one side of the minimum line width has only one adjacent spacing; the area of ​​the target graphic with the minimum line width and minimum spacing is a continuous area; Select a first graphic region in the target graphic that ends with the minimum line width or minimum spacing, and use the region in the target graphic that has the minimum line width or minimum spacing as a second graphic region; the line width or spacing in the first graphic region is greater than the minimum line width and minimum spacing. Move the edges of each line width and spacing region in the second graphic region toward the first graphic region.

2. The method for optimizing the minimum linewidth and minimum spacing in a metal layer according to claim 1, characterized in that, The step of moving the region edges of each line width and spacing in the second graphic region toward the first graphic region includes: Obtain the first quantity of line width and spacing in the second graphic region; If the first quantity is odd, then the edge of the region adjacent to the second region in the first graphic region is moved by a preset movement value towards the adjacent first graphic region. Using the line width or spacing in the middle of the second graphic region as the center, move the region edge on one side of the center toward the first graphic region on the same side, and move the region edge on the other side of the center toward the first graphic region on the same side. If the first quantity is even, then the area edges of each line width and spacing in the second graphic area are moved sequentially to one side of the first graphic area.

3. The method for optimizing the minimum linewidth and minimum spacing in a metal layer according to claim 2, characterized in that, If the first quantity is even, the step of moving the region edge of each line width and spacing in the second graphic region sequentially to one side of the first graphic region includes: If the first quantity is even, select the first graphic region with the largest line width or spacing in the first graphic region as the target first graphic region; The edges of each line width and spacing region in the second graphic region are moved sequentially toward the target first graphic region.

4. The method for optimizing the minimum linewidth and minimum spacing in a metal layer according to claim 3, characterized in that, The step of moving the region edges of each line width and spacing in the second graphic region sequentially toward the target first graphic region includes: The edges of each line width and spacing in the second graphic region are moved sequentially toward the target first graphic region to obtain a final second graphic region with each line width and spacing increased by a preset width.

5. The method for optimizing the minimum linewidth and minimum spacing in a metal layer according to claim 4, characterized in that, The step of moving the region edges of each line width and spacing in the second graphic region sequentially toward the target first graphic region to obtain a final second graphic region with each line width and spacing increased by a preset width includes: If the line width or spacing in the target first graphic region is greater than the sum of the movement amount of the final region edge and the single line width or spacing in the second graphic region, then the region edge of each line width and spacing in the second graphic region is moved toward the target first graphic region to obtain the final second graphic region; the final region edge is the region edge in the second graphic region that is adjacent to the target first graphic region. If the line width or spacing in the target first graphic region is less than or equal to the movement amount of the first position region edge in the second graphic region, then the region edge in the second graphic region located on the side of the first position region edge that is close to the target first graphic region will be moved toward the target first graphic region.

6. The method for optimizing the minimum linewidth and minimum spacing in a metal layer according to claim 2, characterized in that, Before moving the edge of the region adjacent to the second graphic region in the first graphic region towards the adjacent first graphic region by a preset movement value, the method further includes: In the direction of movement along the edge of the region, if the sum of a single line width or spacing in the second graphic region and the preset movement value is greater than the line width or spacing in the first graphic region, then the line width or spacing in the first graphic region is taken as the target line width or spacing, and a second quantity of the target line width or spacing is obtained. If the second quantity is zero, then the step of moving the edge of the region adjacent to the second graphic region in the first graphic region toward the direction of the first graphic region by a preset movement value is executed; If the second quantity is not zero and is less than the quantity of the first graphic region, then the step where the first quantity is even is executed; If the second quantity is equal to the quantity of the first graphic region, then the operation ends.

7. The method for optimizing the minimum linewidth and minimum spacing in a metal layer according to claim 1, characterized in that, The selection of the target pattern, which includes the minimum linewidth and minimum spacing in the metal layer, includes: The pattern that includes the minimum line width and minimum spacing of the continuous metal layer is selected as the target pattern.

8. A pattern optimization device for minimum linewidth and minimum spacing in a metal layer, characterized in that, include: The target graphic selection module is used to select graphics, including those with the minimum line width and minimum spacing in the metal layer, as target graphics. The target graphic is arranged along the direction of the minimum line width and minimum spacing, and one side of the minimum line width has only one adjacent spacing; the area of ​​the target graphic with the minimum line width and minimum spacing is a continuous area; The first graphic region selection module is used to select a first graphic region in the target graphic that ends with the minimum line width or minimum spacing, and to use the region in the target graphic that has the minimum line width or minimum spacing as a second graphic region; the line width or spacing in the first graphic region is greater than the minimum line width and minimum spacing. The region edge moving module is used to move the region edges of each line width and spacing in the second graphic region toward the first graphic region.

9. A pattern optimization device for minimum linewidth and minimum spacing in a metal layer, characterized in that, include: Memory, used to store computer programs; A processor, configured to implement the steps of the graphic optimization method for minimum linewidth and minimum spacing in a metal layer as described in any one of claims 1 to 7 when executing the computer program.

10. A computer-readable storage medium, characterized in that, The computer-readable storage medium stores a computer program that, when executed by a processor, implements the steps of the pattern optimization method for minimum linewidth and minimum spacing in a metal layer as described in any one of claims 1 to 7.

Images