Lithography information determination method and apparatus, and computer device

Abstract

This application provides a method, apparatus, and computer device for determining lithographic information, belonging to the field of computer technology. The method includes: establishing a two-dimensional coordinate system based on a lens to be lithographically analyzed, and determining the position information of multiple target points on the lens based on the two-dimensional coordinate system; determining multiple unit regions in the lens to be lithographically analyzed, and determining the parameter information of feature points in each unit region, each unit region including multiple target points; determining the grayscale value of each target point based on the position information of each target point and the parameter information of the feature points in each unit region; and determining lithographic information based on the grayscale value of each target point, wherein the lithographic information is used to perform lithographic processing on the lens to be lithographically analyzed. This application can achieve the effect of improving anti-counterfeiting performance.

Description

Technical Field

[0001] This application relates to the field of computer technology, and more specifically, to a method, apparatus, and computer device for determining lithographic information. Background Technology

[0002] With the development of laser technology, technicians have begun to use lasers to etch holographic patterns for anti-counterfeiting or product packaging. The anti-counterfeiting properties of holographic patterns are mainly achieved through micro- and nano-structures, and the complexity of these structures directly determines the effectiveness of the anti-counterfeiting measures.

[0003] In related technologies, to form corresponding holographic patterns, technicians typically coat the surface of materials such as glass with a layer of photoresist, and then photolithographically imprint a Fresnel lens structure and / or an angle-varying diffraction grating onto the glass. This allows for the creation of optical and / or dynamic effects similar to those of a lens.

[0004] However, the holographic patterns created using this technology are too regular, allowing others to easily measure the key parameters for producing identical patterns by observing the stripes under a microscope. Therefore, this method suffers from poor anti-counterfeiting performance. Summary of the Invention

[0005] The purpose of this application is to provide a method, apparatus, and computer device for determining photolithographic information, which can improve anti-counterfeiting performance.

[0006] The embodiments of this application are implemented as follows:

[0007] A first aspect of this application provides a method for determining photolithographic information, including:

[0008] A two-dimensional coordinate system is established based on the lens to be lithographically modeled, and the position information of multiple target points of the lens to be lithographically modeled is determined based on the two-dimensional coordinate system.

[0009] Multiple unit regions in the lens to be lithographically etched are determined, and parameter information of feature points in each unit region is determined. Each unit region includes multiple target points.

[0010] Based on the location information of each target point and the parameter information of feature points in each unit region, the gray value of each target point is determined.

[0011] Based on the grayscale value of each target point, lithography information is determined, and the lithography information is used to perform lithography processing on the lens to be lithographically etched.

[0012] Optionally, determining multiple unit regions in the lens to be photolithographically mapped, and determining parameter information for each unit region, includes:

[0013] The lens to be photolithographically lithographically divided into multiple unit regions according to a preset size;

[0014] Based on the position information of each vertex of the unit region, the first position of the unit region in the two-dimensional coordinate system is determined;

[0015] Based on the first position, determine the second position of the feature point in the unit region in the two-dimensional coordinate system;

[0016] The second position is used as the parameter information.

[0017] Optionally, determining the second position of the feature point in the unit region in the two-dimensional coordinate system based on the first position includes:

[0018] Based on the first position, a feature point is selected from the unit region. The feature point can be any one of the following: the point in the unit region that is farthest from the origin of the two-dimensional coordinate system, the point in the unit region that is closest to the origin of the two-dimensional coordinate system, the center point of the unit region, or a point on any side of the unit region that is a preset distance from the vertex of the unit region.

[0019] Determine the x-coordinate and y-coordinate of the feature point in the two-dimensional coordinate system, and use the x-coordinate and y-coordinate of the feature point as the second position.

[0020] Optionally, determining the grayscale value of each target point based on the location information of each target point and the parameter information of feature points in each unit region includes:

[0021] Based on the origin of the two-dimensional coordinate system and the parameter information of the feature points in the unit region where the target point is located, a first straight line is determined;

[0022] Based on the parameter information of the feature points and the first straight line, a second straight line is determined, wherein the second straight line is perpendicular to the first straight line;

[0023] The perpendicular distance between the target point and the second straight line is determined based on the location information of the target point;

[0024] The grayscale value of the target point is determined based on the vertical distance.

[0025] Optionally, determining the grayscale value of the target point based on the vertical distance includes:

[0026] Determine the focal length of the lens to be lithographically copied, the distance between the feature point and the origin, and the cutting parameters corresponding to the preset cutting method; calculate the stripe width corresponding to the unit region; the preset cutting method is any one of the following: equal height slicing method, equal angle slicing method, equal chord length slicing method.

[0027] The gray value of the target point is calculated based on the preset maximum gray value, the stripe width, and the vertical distance.

[0028] Optionally, determining the lithographic information based on the grayscale values ​​of each of the target points includes:

[0029] The laser power for etching each target point is determined based on the gray value of each target point.

[0030] The laser power is sent as lithography information to the lithography device to perform lithography on each of the target points on the lens to be lithographically ...

[0031] Optionally, the step of establishing a two-dimensional coordinate system based on the lens to be lithographically mapped, and determining the position information of multiple target points of the lens to be lithographically mapped based on the two-dimensional coordinate system, includes:

[0032] A two-dimensional coordinate system is established with the geometric center of the bottom surface of the lens to be photolithographically etched as the origin. The first axis and the second axis of the two-dimensional coordinate system are perpendicular to each other, and the first axis, the second axis and the bottom surface of the lens to be photolithographically etched are in the same plane. The lens to be photolithographically etched is a plano-convex mirror.

[0033] Scan the surface of the lens to be photolithographically etched, and take each pixel on the surface of the lens to be photolithographically etched as a target point;

[0034] The x-coordinate and y-coordinate of each target point in the two-dimensional coordinate system are determined, and the x-coordinate and y-coordinate of each target point are used as the position information of the target point.

[0035] A second aspect of this application provides a photolithography information determining apparatus, the apparatus comprising:

[0036] A module is established to create a two-dimensional coordinate system based on the lens to be lithographically modeled, and to determine the position information of multiple target points of the lens to be lithographically modeled based on the two-dimensional coordinate system.

[0037] The first determining module is used to determine multiple unit regions in the lens to be lithographically etched, and to determine the parameter information of feature points in each unit region, wherein each unit region includes multiple target points;

[0038] The second determining module is used to determine the grayscale value of each target point based on the location information of each target point and the parameter information of feature points in each unit region;

[0039] The third determining module is used to determine the lithography information based on the grayscale value of each target point, and the lithography information is used to perform lithography processing on the lens to be lithographically ...

[0040] A third aspect of this application provides a computer device, the computer device including a memory, a processor, and a computer program stored in the memory and executable on the processor, wherein the computer program, when executed by the processor, implements the lithography information determination method described in the first aspect above.

[0041] A fourth aspect of this application provides a computer-readable storage medium storing a computer program that, when executed by a processor, implements the photolithography information determination method described in the first aspect.

[0042] The beneficial effects of the embodiments of this application include:

[0043] The embodiment of this application provides a method for determining lithographic information. By establishing a two-dimensional coordinate system based on the lens to be lithographicated, and determining the position information of multiple target points of the lens to be lithographicated based on the two-dimensional coordinate system, the position of each target point can be accurately determined.

[0044] Multiple unit regions within the lens to be lithographically modeled are identified, and the parameter information of feature points within each unit region is determined. The parameter information of the feature points in each unit region, which characterizes the features or location of the unit region, will be different. This ensures the consistency between the feature points of each unit region and the parameter information of each feature point.

[0045] Based on the location information of each target point and the parameter information of feature points in each unit region, the grayscale value of each target point is determined. Since determining the grayscale value of a target point within a unit region uses the parameter information of the feature points within that unit region and the location information of each target point within that unit region, and the feature points in each unit region are different, this ensures that the parameters used to determine the grayscale value of the target points in each unit region are different. This improves the difference in grayscale values ​​between target points in each unit region, thereby ensuring that the stripe patterns formed by target points in different unit regions are different.

[0046] Based on the grayscale values ​​of each target point, lithographic information is determined. Since this lithographic information is based on the grayscale values ​​of each target point, and the parameter information of the feature points used to determine the grayscale values ​​of target points in different unit regions is different, the grayscale values ​​of target points in different unit regions exhibit different patterns. Therefore, after performing lithographic and development processes on the lens to be lithographicated using this information, corresponding stripe patterns can be displayed on the processed lens. Furthermore, the stripe patterns in different unit regions of the processed lens are all different and exhibit different patterns.

[0047] In other words, after photolithography is performed on the lens based on this lithographic information, the fringe pattern in each unit region of the processed lens is different. The algorithm for obtaining or determining this lithographic information cannot be derived or inferred through simple observation and measurement. Therefore, this method for determining lithographic information has strong specificity; that is, the micro / nano structures on the processed lens cannot be replicated.

[0048] In this way, the anti-counterfeiting effect can be achieved. Attached Figure Description

[0049] To more clearly illustrate the technical solutions of the embodiments of this application, the accompanying drawings used in the embodiments will be briefly introduced below. It should be understood that the following drawings only show some embodiments of this application and should not be regarded as a limitation of the scope. For those skilled in the art, other related drawings can be obtained based on these drawings without creative effort.

[0050] Figure 1 A flowchart illustrating the first method for determining lithographic information provided in this application embodiment;

[0051] Figure 2 A flowchart illustrating the second method for determining lithographic information provided in this application embodiment;

[0052] Figure 3 A flowchart illustrating the third method for determining lithographic information provided in this application embodiment;

[0053] Figure 4 A flowchart illustrating the fourth method for determining lithographic information provided in this application embodiment;

[0054] Figure 5 A schematic diagram of a two-dimensional coordinate system provided in an embodiment of this application;

[0055] Figure 6 A flowchart illustrating the fifth method for determining lithographic information provided in this application embodiment;

[0056] Figure 7A side view of the lens to be lithographically etched, provided in an embodiment of this application;

[0057] Figure 8 A flowchart illustrating the sixth method for determining lithographic information provided in this application embodiment;

[0058] Figure 9 A flowchart illustrating the seventh method for determining lithographic information provided in this application embodiment;

[0059] Figure 10 A schematic diagram of a stripe pattern formed by a photolithographic information determination method provided in an embodiment of this application;

[0060] Figure 11 This is a schematic diagram of a photolithography information determination device provided in an embodiment of this application;

[0061] Figure 12 This is a schematic diagram of the structure of a computer device provided in an embodiment of this application. Detailed Implementation

[0062] To make the objectives, technical solutions, and advantages of the embodiments of this application clearer, the technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this application, and not all embodiments. The components of the embodiments of this application described and shown in the accompanying drawings can generally be arranged and designed in various different configurations.

[0063] Therefore, the following detailed description of the embodiments of this application provided in the accompanying drawings is not intended to limit the scope of the claimed application, but merely to illustrate selected embodiments of the application. All other embodiments obtained by those skilled in the art based on the embodiments of this application without inventive effort are within the scope of protection of this application.

[0064] It should be noted that similar labels and letters in the following figures indicate similar items. Therefore, once an item is defined in one figure, it does not need to be further defined and explained in subsequent figures.

[0065] In the description of this application, it should be noted that the terms "center," "upper," "lower," "left," "right," "vertical," "horizontal," "inner," and "outer," etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings, or the orientation or positional relationship commonly used when the product of the invention is in use. They are used only for the convenience of describing this application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this application. In addition, the terms "first," "second," and "third," etc., are used only to distinguish descriptions and should not be construed as indicating or implying relative importance.

[0066] In related technologies, to create corresponding holographic patterns, technicians typically coat the surface of materials such as glass with a layer of photoresist, and then photolithographically imprint a Fresnel lens structure and / or an angle-varying diffraction grating onto the glass. This creates optical and / or dynamic effects similar to lenses. However, the holographic patterns created using these methods are too regular; others can easily measure the key parameters for producing identical stripes by observing the stripes under a microscope. Therefore, this method suffers from poor anti-counterfeiting performance.

[0067] To address this, this application provides a method for determining lithographic information. This method establishes a two-dimensional coordinate system based on the lens to be lithographicated, determines the position information of multiple target points on the lens based on this coordinate system, identifies multiple unit regions within the lens, and determines the parameter information of feature points in each unit region. Based on the position information of each target point and the parameter information of the feature points in each unit region, the grayscale value of each target point is determined. Based on the grayscale values ​​of each target point, lithographic information is determined, and this lithographic information is used to perform lithographic processing on the lens to be lithographicated. This can improve anti-counterfeiting performance.

[0068] This application uses a method for determining lithographic information in computer equipment as an example for illustration. However, it does not imply that this application's embodiments can only be applied to determining lithographic information in computer equipment.

[0069] The method for determining lithographic information provided in the embodiments of this application will be explained in detail below.

[0070] Figure 1 A flowchart illustrating a method for determining lithographic information provided in this application is shown. This method can be applied to computer equipment, which can be any terminal device or server. See also... Figure 1 This application provides a method for determining photolithographic information, including:

[0071] Step 1001: Establish a two-dimensional coordinate system based on the lens to be lithographically copied, and determine the position information of multiple target points of the lens to be lithographically copied based on the two-dimensional coordinate system.

[0072] Optionally, the lens to be lithographically etched can be a plano-convex lens. The lens to be lithographically etched can refer to a lens on a photoresist substrate that needs to be laser-etched, or it can refer to a virtual model of a lens; this application embodiment does not limit this.

[0073] Specifically, the two-dimensional coordinate system can be established based on a top view of the convex surface of the lens to be lithographically examined; however, this application does not limit this specific implementation.

[0074] Optionally, the two-dimensional coordinate system is a planar coordinate system, which is used to characterize the coordinate positions of various points on the lens to be photolithographically modeled. Generally, the origin of the two-dimensional coordinate system can be the geometric center of the plane of the lens to be photolithographically modeled, but this embodiment does not limit this.

[0075] Each target point can be all points on the surface of the lens to be lithographically etched, or all points on the convex surface of the lens to be lithographically etched, or a portion of points on the convex surface of the lens to be lithographically etched. This application does not limit this.

[0076] The location information of the target point can include the coordinates of the target point in the two-dimensional coordinate system.

[0077] It is worth noting that by establishing this two-dimensional coordinate system and determining the position information of each target point in the two-dimensional coordinate system, the position of each target point can be accurately determined, which facilitates the subsequent steps of determining the photolithography information of the lens to be photolithographically processed.

[0078] Step 1002: Determine multiple unit regions in the lens to be lithographically copied, and determine the parameter information of feature points in each unit region.

[0079] Optionally, the size, shape, and dimensions of each unit region can be equal, and each unit region corresponds to a portion of the photolithography lens to be lithographically examined.

[0080] The size, shape, and dimensions of each unit area can be set by relevant technical personnel according to actual needs. Generally, each unit area can be rectangular, but this embodiment does not limit this.

[0081] The number of each unit region can be any positive integer greater than 1. It is only necessary to ensure that each unit region can completely cover the lens to be lithographically etched. This application does not limit this.

[0082] Optionally, each unit region can be obtained by dividing the lens to be lithographically processed into multiple regions according to a corresponding region division algorithm.

[0083] Then, corresponding target points will fall into each unit area, that is, each unit area includes multiple target points.

[0084] Optionally, the feature point can be a point used to characterize the features and / or location of the unit region. If each target point is all points on the surface of the lens to be lithographicated, then the feature point can be a target point located within the unit region.

[0085] Furthermore, the feature points of each unit region are different from each other; that is, each feature point is used to uniquely identify the features and / or location of a unit region.

[0086] Furthermore, the method for determining the feature points of each unit region can be the same or different, and this application embodiment does not limit this.

[0087] The parameter information can be the location of the feature point, specifically the coordinate information of the feature point in the two-dimensional coordinate system. This application embodiment does not limit this.

[0088] It is worth noting that since the feature points in each unit region are different, and these feature points are used to characterize the features or location of the corresponding unit region, the parameter information of the feature points in each unit region that characterizes the features or location of the unit region will also be different. This ensures the diversity of feature points in each unit region and the parameter information of each feature point.

[0089] Step 1003: Determine the grayscale value of each target point based on the location information of each target point and the parameter information of the feature points in each unit region.

[0090] Optionally, the grayscale value of each target point can be in the range of [0, 255]. If the grayscale value of any target point is 0, then the color of that target point is black. If the grayscale value of any target point is 255, then the color of that target point is white.

[0091] Since each target point corresponds to a gray value, the target points within a unit area can form a stripe pattern.

[0092] It is worth noting that when determining the grayscale value of each target point, the grayscale value of each target point in a unit region can be determined separately based on the parameter information of the feature points in that unit region and the position information of each target point in that unit region. In other words, the feature points in any unit region can only be used to determine the grayscale value of the target points in that unit region, and cannot be used to determine the grayscale value of the target points in other unit regions.

[0093] It's worth noting that when determining the grayscale value of a target point within a unit region, the parameter information of the feature points within that unit region and the positional information of each target point within that unit region are used, and the feature points of each unit region are different. This ensures that the parameters used to determine the grayscale value of the target point in each unit region are different. This improves the difference in grayscale values ​​of target points within each unit region, thereby ensuring that the stripe patterns formed by target points in different unit regions are different.

[0094] Step 1004: Determine the lithography information based on the grayscale values ​​of each target point.

[0095] Optionally, this lithography information is used to perform lithography on the lens to be lithographically lithographically processed.

[0096] Specifically, the lithography information can be used to indicate the laser intensity when performing lithography on each target point on the lens to be lithographically processed, and can also be used to indicate the minimum linewidth during lithography processing.

[0097] For example, the minimum linewidth can be 150nm, but this application does not limit this.

[0098] For example, the photolithography process can be scanning photolithography, which can employ electron beam direct writing technology, using a low-power laser beam with high beam quality to focus into an extremely small spot, forming a very high light intensity density at the focal point, thereby causing the photosensitive material to change.

[0099] Furthermore, after photolithography on the lens to be lithographically processed, a suitable developing solution can be used to develop the photolithographically processed lens. For example, a 5‰ sodium hydroxide solution can be used as the developing solution to develop the photoresist for 10 seconds, thus obtaining a photoresist plate containing a holographic pattern. It is understood that any other possible method can be used to develop the lens after photolithography, and this application embodiment does not limit this.

[0100] It is worth noting that since this lithographic information is determined based on the grayscale values ​​of each target point, and the parameter information of the feature points used to determine the grayscale values ​​of target points in different unit regions is different, the grayscale values ​​of target points in different unit regions have different patterns. Therefore, after performing lithographic processing and development on the lens to be lithographicated using this lithographic information, corresponding stripe patterns can be displayed on the processed lens. Moreover, the stripe patterns in different unit regions on the processed lens are different from each other and have different patterns.

[0101] In this embodiment of the application, by establishing a two-dimensional coordinate system based on the lens to be lithographically engraved, and determining the position information of multiple target points of the lens to be lithographically engraved based on the two-dimensional coordinate system, the position of each target point can be accurately determined.

[0102] Multiple unit regions within the lens to be lithographically modeled are identified, and the parameter information of feature points within each unit region is determined. The parameter information of the feature points in each unit region, which characterizes the features or location of the unit region, will be different. This ensures the consistency between the feature points of each unit region and the parameter information of each feature point.

[0103] Based on the location information of each target point and the parameter information of feature points in each unit region, the grayscale value of each target point is determined. Since determining the grayscale value of a target point within a unit region uses the parameter information of the feature points within that unit region and the location information of each target point within that unit region, and the feature points in each unit region are different, this ensures that the parameters used to determine the grayscale value of the target points in each unit region are different. This improves the difference in grayscale values ​​between target points in each unit region, thereby ensuring that the stripe patterns formed by target points in different unit regions are different.

[0104] Based on the grayscale values ​​of each target point, lithographic information is determined. Since this lithographic information is based on the grayscale values ​​of each target point, and the parameter information of the feature points used to determine the grayscale values ​​of target points in different unit regions is different, the grayscale values ​​of target points in different unit regions exhibit different patterns. Therefore, after performing lithographic and development processes on the lens to be lithographicated using this information, corresponding stripe patterns can be displayed on the processed lens. Furthermore, the stripe patterns in different unit regions of the processed lens are all different and exhibit different patterns.

[0105] In other words, after photolithography is performed on the lens based on this lithographic information, the fringe pattern in each unit region of the processed lens is different. The algorithm for obtaining or determining this lithographic information cannot be derived or inferred through simple observation and measurement. Therefore, this method for determining lithographic information has strong specificity; that is, the micro / nano structures on the processed lens cannot be replicated.

[0106] In this way, the anti-counterfeiting effect can be achieved.

[0107] In one possible implementation, see [link to relevant documentation]. Figure 2 The process involves identifying multiple unit regions within the lens to be lithographically analyzed, and determining the parameter information for each unit region, including:

[0108] Step 1005: Divide the lens to be lithographically processed into multiple unit regions according to the preset dimensions.

[0109] Optionally, the preset dimensions can be set by relevant technical personnel. For example, the length of each unit region can be L = 25 μm, the width of each unit region can be W = 50 μm, or any other possible dimensions. This application embodiment does not limit this.

[0110] Generally, after dividing the lens to be lithographically modeled into multiple unit regions according to the preset size, these multiple unit regions can completely cover the lens to be lithographically modeled.

[0111] This ensures that each target point can be assigned to its respective cell region, preventing some target points from falling outside the cell regions, thus ensuring the reliability of determining the grayscale value of each target point.

[0112] Step 1006: Based on the position information of each vertex of the unit region, determine the first position of the unit region in the two-dimensional coordinate system.

[0113] Optionally, each vertex of the cell region can refer to the intersection of any two edges of the cell region.

[0114] If each target point is all points on the surface of the lens to be lithographically copied, then each vertex can be a target point located within the unit region.

[0115] For example, if each unit region is rectangular, then each vertex of each unit region is the four vertices of the rectangle. If each unit region is pentagonal, then each vertex of each unit region is the five vertices of the pentagon.

[0116] Optionally, the position information of each vertex can refer to the coordinate information of each vertex in the two-dimensional coordinate system.

[0117] Optionally, the first position can be used to indicate the range of the unit region in the two-dimensional coordinate system. Generally, the first position is the area enclosed by the coordinates of the vertices of the unit region.

[0118] For example, if the coordinates of any point within the unit region are (x, y), and the length of the unit region is L and the width is W, then the coordinates of each vertex can be determined as (L*[x / L], W*[y / W]), (L*[x / L], W*[y / W]+W), (L*[x / L]+L, W*[y / W]), (L*[x / L]+L, W*[y / W]+W), and thus the first position of the unit region can be determined as: X∈(L*[x / L], L*[x / L]+L), Y∈(W*[y / W], W*[y / W]+W).

[0119] In addition, if the coordinates of each vertex are determined in this way or the first position is not an integer, the horizontal and vertical coordinates of each vertex can be rounded down or up. This ensures that each unit area can cover the lens to be lithographically processed and reduces the processing pressure on the computer equipment.

[0120] Step 1007: Determine the second position of the feature point in the unit region in the two-dimensional coordinate system based on the first position.

[0121] Optionally, the second position may refer to the coordinate information of the feature point in the two-dimensional coordinate system.

[0122] The second position can be determined based on the first position and the origin of the two-dimensional coordinate system, or it can be determined based on the first position and any point in the two-dimensional coordinate system. This application embodiment does not limit this.

[0123] In this way, the position of the feature point in the two-dimensional coordinate system can be accurately determined.

[0124] Step 1008: Use the second position as the parameter information.

[0125] In this way, the parameter information of the feature point in the two-dimensional coordinate system can be accurately determined.

[0126] In one possible implementation, see [link to relevant documentation]. Figure 3 Determining the second position of the feature point in the unit region in the two-dimensional coordinate system based on the first position includes:

[0127] Step 1009: Select a feature point from the cell region based on the first position.

[0128] Optionally, the feature point can be any of the following: the point in the unit region that is farthest from the origin of the two-dimensional coordinate system, the point in the unit region that is closest to the origin of the two-dimensional coordinate system, the center point of the unit region, or a point on any side of the unit region that is a predetermined distance from the vertex of the unit region. The feature point can also be other points in the unit region that can characterize the features and / or position of the unit region. This application embodiment does not limit this.

[0129] Optionally, the preset distance can be a positive real number that is no greater than the length or width of the unit area, set according to actual needs. This application embodiment does not limit this.

[0130] Step 1010: Determine the x-coordinate and y-coordinate of the feature point in the two-dimensional coordinate system, and use the x-coordinate and y-coordinate of the feature point as the second position.

[0131] In this way, the second position can be accurately determined, and the parameter information of the feature point can be accurately determined to ensure the accuracy of the gray value determination of each target point in the subsequent process.

[0132] In one possible implementation, see [link to relevant documentation]. Figure 4 Based on the location information of each target point and the parameter information of feature points in each unit region, the grayscale value of each target point is determined, including:

[0133] Step 1011: Determine the first straight line based on the origin of the two-dimensional coordinate system and the parameter information of the feature point in the unit region where the target point is located.

[0134] Optionally, the origin of the two-dimensional coordinate system is the origin of the coordinate system.

[0135] Specifically, the first straight line can refer to a straight line that passes through the origin of the two-dimensional coordinate system and the feature point.

[0136] It is worth noting that, since each target point may be divided into different unit regions, the grayscale value of any target point needs to be determined based on the feature point within the unit region where that target point is located. Furthermore, the first straight line can be used to characterize the tilt angle of the stripe pattern formed within the unit region where the target point is located. This ensures that the rules for determining target points within different unit regions are different, and also ensures that the rules for determining target points within the same unit region are the same.

[0137] In this way, the specificity of the gray values ​​of each target point in different unit areas can be ensured, as well as the regularity of the gray values ​​of each target point in the same unit area.

[0138] Step 1012: Determine the second line based on the parameter information of the feature point and the first line.

[0139] Optionally, the second line is perpendicular to the first line.

[0140] It is worth noting that the second straight line can also be used to characterize the tilt angle of the stripe pattern formed in the unit area where the target point is located. In this way, the tilt angle of the stripes formed based on the gray values ​​of each target point in each unit area can be accurately determined.

[0141] Step 1013: Determine the perpendicular distance between the target point and the second straight line based on the location information of the target point.

[0142] Optionally, the perpendicular distance between the target point and the second straight line can refer to the shortest distance between the target point and the second straight line.

[0143] Step 1014: Determine the grayscale value of the target point based on the vertical distance.

[0144] In this way, the grayscale value of each target point can be accurately determined.

[0145] To better illustrate the method for determining the grayscale value of each target point, embodiments of this application also provide... Figure 5 , Figure 5 This is a schematic diagram of a two-dimensional coordinate system provided in an embodiment of this application.

[0146] See Figure 5 , Figure 5 The figure shows curve Q, target point A, unit region D, feature point P, first straight line l, second straight line m, perpendicular foot C, and the first axis X, second axis Y and origin O of the two-dimensional coordinate system.

[0147] visible, Figure 5 In the diagram, curve Q represents the outer contour of the lens to be lithographically traced, target point A is any point on the convex surface of the lens to be lithographically traced, unit region D is the unit region where target point A is located, and feature point P is a feature point in unit region D.

[0148] Furthermore, feature point P is the point in unit region D that is farthest from the origin O.

[0149] For example, a first straight line l can be drawn through the feature point P and the origin O, a second straight line m can be determined by drawing a perpendicular line from the feature point P to the first straight line l, and a perpendicular line AC and the foot of the perpendicular C can be determined by drawing a perpendicular line from the target point A to the second straight line m.

[0150] So, the first line l is a line determined based on the origin O and the feature point P. The second line m is a line perpendicular to the first line l, and the foot of the perpendicular C is the intersection of a line passing through the target point A and perpendicular to the second line m with the second line m.

[0151] Then the perpendicular distance between the target point A and the foot of the perpendicular C is L. AC .

[0152] One possible way to calculate L is as follows: AC :

[0153] The equation of the first straight line l is determined as y p *xx p Since y = 0, the equation of the second line m is x. p *xy p *y+x p ^ 2 -y p ^ 2 =0.

[0154] Then, we can obtain L AC =|x p *xyp *y+x p ^2-y p ^2| / √(x p ^2+y p ^2).

[0155] Among them, y p x p y and x are the ordinates and abscissas of feature point P, respectively, and the ordinates and abscissas of target point A, respectively.

[0156] In one possible implementation, see [link to relevant documentation]. Figure 6 The grayscale value of the target point is determined based on the vertical distance, including:

[0157] Step 1015: Determine the focal length of the lens to be lithographically copied, the distance between the feature point and the origin, and the cutting parameters corresponding to the preset cutting method, and calculate the stripe width corresponding to the unit region.

[0158] Optionally, the preset cutting method is any of the following: equal height slicing method, equal angle slicing method, or equal chord length slicing method.

[0159] Generally, if the lens to be lithographically etched is hemispherical, then the focal length of the lens to be lithographically etched is equal to the radius of the lens to be lithographically etched.

[0160] Optionally, the cutting parameters may include the height of equal-height cutting, the angle of equal-angle cutting, and the chord length of equal-chord cutting.

[0161] Optionally, the stripe width can refer to the width of the stripes within a certain unit area on the lens to be photolithographically processed. Alternatively, it can refer to the width of the stripes in the stripe pattern formed by the gray values ​​of each target point in a certain unit area on the lens to be photolithographically processed. This embodiment of the application does not limit this.

[0162] For example, see above. Figure 5 The distance between the feature point and the origin can be referred to as the distance L between the feature point P and the origin O. OP Specifically, it can be calculated based on the coordinate position of the feature point in the two-dimensional coordinate system and the coordinate position of the origin in the two-dimensional coordinate system.

[0163] It is worth noting that if the preset cutting method is the equal-height slicing method, then the cutting parameter is the height of the equal-height cut. If the preset cutting method is the equal-angle slicing method, then the cutting parameter is the angle of the equal-angle cut. If the preset cutting method is the equal-chord length slicing method, then the cutting parameter is the chord length of the equal-chord length cut.

[0164] Step 1016: Calculate the gray value of the target point based on the preset maximum gray value, the stripe width, and the vertical distance.

[0165] Optionally, the preset maximum grayscale value can be set according to actual needs, and can generally be set to 255.

[0166] For example, the grayscale value ColorA of target point A can be calculated as follows:

[0167] ColorA = 255 - 255 * Mod(L) AC ,d) / d

[0168] Where 255 is the preset maximum grayscale value, d is the width of the stripe, and L is the maximum grayscale value. AC Let L be the vertical distance, and Mod(L) AC ,d) is L AC The remainder obtained by dividing by d.

[0169] Figure 7 A side view of the lens to be photolithographically etched is shown. See [link / reference]. Figure 7 Assume f is the focal length of the lens to be lithographically copied, and that the lens will be cut using the contour slicing method. It can be seen that R is the radius of the lens to be lithographically copied; since the lens is hemispherical, f = R.

[0170] r is the distance from feature point P to the origin O, specifically r = √(x p ^2+y p ^2).

[0171] h is the preset parameter. Since the equal-height slicing method is used, d is the height of the equal-height cutting, and h is also the depth of the Fresnel lens stripes. It can be set by relevant technicians according to the photoresist thickness during subsequent photolithography.

[0172] d is the stripe width corresponding to feature point P, that is, the stripe width corresponding to the unit region where feature point P is located. Since the contour slicing method is used, the stripe width d can be calculated by the following formula: d=r-√(R^2-(√(R^2-r^2)+h)^2).

[0173] In this way, the grayscale value of each target point can be accurately calculated, which facilitates the accurate determination of the lithography information in the subsequent process.

[0174] In one possible implementation, see [link to relevant documentation]. Figure 8 Based on the grayscale values ​​of each target point, the lithographic information is determined, including:

[0175] Step 1017: Determine the laser power for etching each target point based on its grayscale value.

[0176] Alternatively, the laser power may refer to the power of the laser emitted by the lithography apparatus that etches the lens to be lithographically etched.

[0177] The lithography apparatus can be a lithography machine, but this application does not limit it to this embodiment.

[0178] For example, assuming the maximum optical power of the photolithography apparatus is K, and the grayscale value range of each target point is [0, 255], then when the grayscale value of any target point is 0, the laser power for etching that target point can be determined to be K. When the grayscale value of any target point is 255, the laser power for etching that target point can be determined to be 0. When the grayscale value of any target point is N, the laser power for etching that target point can be determined to be K / 256*(256-N), where N is an integer greater than or equal to 0 and less than or equal to 255.

[0179] In this way, the laser power can be accurately determined when etching each target point.

[0180] Step 1018: Send the laser power as lithography information to the lithography device to perform lithography on each target point on the lens to be lithographically ...

[0181] It is worth noting that this ensures that when the photolithography apparatus performs photolithography on each target point on the lens to be lithographicated according to the photolithography information, the same unit area on the lens to be lithographicated can form stripes with the same pattern, while different unit areas on the lens to be lithographicated can form stripes with different patterns. This ensures that the stripe pattern in each unit area of ​​the processed lens is different, thus ensuring that the micro / nano structure on the processed lens cannot be replicated.

[0182] In this way, the anti-counterfeiting effect can be achieved.

[0183] In one possible implementation, see [link to relevant documentation]. Figure 9 A two-dimensional coordinate system is established based on the lens to be lithographically modeled, and the position information of multiple target points of the lens to be lithographically modeled is determined based on this two-dimensional coordinate system, including:

[0184] Step 1019: Establish the two-dimensional coordinate system with the geometric center of the bottom surface of the lens to be photolithographically etched as the origin.

[0185] Optionally, if the lens to be lithographically etched is a plano-convex mirror, then the bottom surface of the lens to be lithographically etched is the plane of the lens to be lithographically etched.

[0186] Optionally, the first axis and the second axis of the two-dimensional coordinate system are perpendicular to each other, and the first axis, the second axis and the bottom surface of the lens to be photolithographically etched are in the same plane.

[0187] Step 1020: Scan the surface of the lens to be photolithographically copied, and treat each pixel on the surface of the lens as a target point.

[0188] Optionally, scanning the surface of the lens to be lithographically etched can specifically involve scanning the convex surface of the lens to be lithographically etched, and taking each pixel on the surface of the convex surface of the lens to be lithographically etched as a target point.

[0189] That is, each target point corresponds to a pixel, so the coordinates of each target point can be in units of one pixel value. This application does not limit this.

[0190] It is worth noting that if it is determined that certain points on the lens to be lithographically processed do not need to be etched, then these points can be excluded from the target points. This reduces the number of target points identified and decreases the computational burden on the computer equipment in subsequent processing.

[0191] Step 1021: Determine the x-coordinate and y-coordinate of each target point in the two-dimensional coordinate system, and use the x-coordinate and y-coordinate of each target point as the position information of the target point.

[0192] In this way, the location information of each target point is accurately determined, which facilitates the subsequent calculation of the gray value of each target point and the determination of the lithography information.

[0193] Figure 10 This is a schematic diagram of a stripe pattern formed by the gray values ​​of each target point calculated based on the photolithographic information determination method provided in this application embodiment. Figure 10 Each small square in the diagram represents a unit region, from... Figure 10 visible, Figure 10 The pattern of stripes within each unit region is the same, while the pattern of stripes within any two different unit regions is different. This demonstrates that the photolithographic information determination method provided in this application has strong specificity and can improve anti-counterfeiting performance.

[0194] Furthermore, the lithography information determination method provided in this application divides the lens to be lithographically processed into multiple unit regions, calculates the grayscale value of each target point within each unit region by determining feature points, and then determines the lithography information based on the grayscale value of each target point. Therefore, after performing lithography and development processing on the lens using this lithography information, it can be ensured that the stripes on the processed lens display a stripe pattern that, as a whole, resembles a Fresnel lens, while each unit region resembles a dynamic grating. This allows the processed lens to exhibit both lens and dynamic effects, possessing both the cat's-eye imaging function of a regular lens and the rich colors and wide viewing angles of a dynamic effect.

[0195] The apparatus, equipment, and computer-readable storage medium used to implement the photolithographic information determination method provided in this application will be described below. The specific implementation process and technical effects are described above and will not be repeated below.

[0196] Figure 11 This is a schematic diagram of a photolithography information determination device provided in an embodiment of this application. See also... Figure 11 The device includes:

[0197] The module 201 is used to establish a two-dimensional coordinate system based on the lens to be photolithographically modeled, and to determine the position information of multiple target points of the lens to be photolithographically modeled based on the two-dimensional coordinate system.

[0198] The first determining module 202 is used to determine multiple unit regions in the lens to be lithographically copied, and to determine the parameter information of feature points in each unit region, wherein each unit region includes multiple target points.

[0199] The second determining module 203 is used to determine the gray value of each target point based on the location information of each target point and the parameter information of the feature points in each unit region;

[0200] The third determining module 204 is used to determine the lithography information based on the grayscale value of each target point. This lithography information is used to perform lithography processing on the lens to be lithographically ...

[0201] The above-described device is used to execute the method provided in the foregoing embodiments, and its implementation principle and technical effect are similar, so they will not be described again here.

[0202] These modules can be one or more integrated circuits configured to implement the above methods, such as one or more Application Specific Integrated Circuits (ASICs), one or more microprocessors, or one or more Field Programmable Gate Arrays (FPGAs). Alternatively, when a module is implemented using processing element scheduler code, the processing element can be a general-purpose processor, such as a Central Processing Unit (CPU) or other processor capable of calling program code. Furthermore, these modules can be integrated together as a system-on-a-chip (SOC).

[0203] Figure 12 This is a schematic diagram of the structure of a computer device provided in an embodiment of this application. See also... Figure 10The computer device includes a memory 301 and a processor 302. The memory 301 stores a computer program that can run on the processor 302. When the processor 302 executes the computer program, it implements the steps in any of the above method embodiments.

[0204] This application also provides a computer-readable storage medium storing a computer program that, when executed by a processor, can implement the steps in the various method embodiments described above.

[0205] Optionally, this application also provides a program product, such as a computer-readable storage medium, including a program that, when executed by a processor, is used to perform any of the above-described embodiments of the photolithography information determination method.

[0206] In the several embodiments provided by this invention, it should be understood that the disclosed apparatus and methods can be implemented in other ways. For example, the apparatus embodiments described above are merely illustrative; for instance, the division of units is only a logical functional division, and in actual implementation, there may be other division methods. For example, multiple units or components may be combined or integrated into another system, or some features may be ignored or not executed. Furthermore, the coupling or direct coupling or communication connection shown or discussed may be through some interfaces; the indirect coupling or communication connection between apparatuses or units may be electrical, mechanical, or other forms.

[0207] The units described as separate components may or may not be physically separate. The components shown as units may or may not be physical units; that is, they may be located in one place or distributed across multiple network units. Some or all of the units can be selected to achieve the purpose of this embodiment according to actual needs.

[0208] Furthermore, the functional units in the various embodiments of the present invention can be integrated into one processing unit, or each unit can exist physically separately, or two or more units can be integrated into one unit. The integrated unit can be implemented in hardware or in the form of hardware plus software functional units.

[0209] The integrated units implemented as software functional units described above can be stored in a computer-readable storage medium. These software functional units, stored in a storage medium, include several instructions to cause a computer device (which may be a personal computer, server, or network device, etc.) or processor to execute partial steps of the methods of the various embodiments of the present invention. The aforementioned storage medium includes various media capable of storing program code, such as USB flash drives, portable hard drives, read-only memory (ROM), random access memory (RAM), magnetic disks, or optical disks.

[0210] The above are merely specific embodiments of this application, but the scope of protection of this application is not limited thereto. Any variations or substitutions that can be easily conceived by those skilled in the art within the scope of the technology disclosed in this application should be included within the scope of protection of this application. Therefore, the scope of protection of this application should be determined by the scope of the claims.

[0211] The above description is merely a preferred embodiment of this application and is not intended to limit this application. Various modifications and variations can be made to this application by those skilled in the art. Any modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of this application should be included within the protection scope of this application.

Claims

1. A lithography information determination method characterized by, The method comprises the following steps: establishing a two-dimensional coordinate system based on a lens to be photoetched, and determining position information of a plurality of target points of the lens to be photoetched based on the two-dimensional coordinate system; determining a plurality of unit regions in the lens to be photoetched, and determining parameter information of feature points in each of the unit regions, each of the unit regions comprising a plurality of the target points; determining a gray value of each of the target points based on the position information of each of the target points and the parameter information of the feature points in each of the unit regions; determining photoetching information based on the gray value of each of the target points, the photoetching information being used for photoetching processing of the lens to be photoetched; the step of determining the gray value of each of the target points based on the position information of each of the target points and the parameter information of the feature points in each of the unit regions comprises the following steps: determining a first straight line based on an origin of the two-dimensional coordinate system and the parameter information of the feature points in the unit region where the target point is located; determining a second straight line based on the parameter information of the feature points and the first straight line, the second straight line being perpendicular to the first straight line; determining a vertical distance between the target point and the second straight line based on the position information of the target point; determining the gray value of the target point based on the vertical distance.

2. The lithography information determination method of claim 1, wherein, the step of determining a plurality of unit regions in the lens to be photoetched, and determining parameter information of feature points in each of the unit regions comprises the following steps: dividing the lens to be photoetched into a plurality of the unit regions according to a preset size; determining a first position of the unit region in the two-dimensional coordinate system based on position information of each vertex of the unit region; determining a second position of the feature point in the two-dimensional coordinate system based on the first position; taking the second position as the parameter information.

3. The lithography information determination method of claim 2, wherein, the step of determining the second position of the feature point in the two-dimensional coordinate system based on the first position comprises the following steps: selecting a feature point from the unit region based on the first position, the feature point being any one of the following: a point in the unit region farthest from the origin of the two-dimensional coordinate system, a point in the unit region closest to the origin of the two-dimensional coordinate system, a center point of the unit region, and a point on any side of the unit region having a preset distance from the vertex of the unit region; determining the horizontal coordinate and the vertical coordinate of the feature point in the two-dimensional coordinate system, and taking the horizontal coordinate and the vertical coordinate of the feature point as the second position.

4. The lithography information determination method of claim 1, wherein, the step of determining the gray value of the target point based on the vertical distance comprises the following steps: determining a focal length of the lens to be photoetched, a distance between the feature point and the origin, and a cutting parameter corresponding to a preset cutting method, calculating a fringe width corresponding to the unit region, the preset cutting method being any one of the following: an equal-height slicing method, an equal-angle slicing method, and an equal-chord-length slicing method; calculating the gray value of the target point according to a preset maximum gray value, the fringe width, and the vertical distance.

5. The lithography information determination method of claim 1, wherein, the step of determining photoetching information based on the gray value of each of the target points comprises the following steps: determining a laser power for etching each of the target points according to the gray value of each of the target points. The laser power is sent to a photoetching device as photoetching information to perform photoetching on each target point on the lens to be photoetched.

6. The lithographic information determination method according to any one of claims 1 to 5, wherein, The method comprises the following steps: The two-dimensional coordinate system is established based on the lens to be photoetched, and position information of a plurality of target points of the lens to be photoetched is determined based on the two-dimensional coordinate system, which comprises the following steps: The two-dimensional coordinate system is established with the geometric center of the bottom surface of the lens to be photoetched as the coordinate origin, the first axis and the second axis of the two-dimensional coordinate system are perpendicular to each other, and the first axis and the second axis are in the same plane as the bottom surface of the lens to be photoetched, and the lens to be photoetched is a plano-convex lens; The surface of the lens to be photoetched is scanned, and each pixel point on the surface of the lens to be photoetched is taken as a target point; 7. A lithography information determining apparatus, characterized by comprising: The abscissa and ordinate of each target point in the two-dimensional coordinate system are determined, and the abscissa and ordinate of each target point are taken as the position information of the target point. The device comprises: The establishment module is configured to establish a two-dimensional coordinate system based on a lens to be photoetched, and determine position information of a plurality of target points of the lens to be photoetched based on the two-dimensional coordinate system; The first determination module is configured to determine a plurality of unit regions in the lens to be photoetched, and determine parameter information of feature points in each unit region, each unit region comprising a plurality of target points; The second determination module is configured to determine the gray value of each target point based on the position information of each target point and the parameter information of the feature points in each unit region; The third determination module is configured to determine photoetching information according to the gray value of each target point, the photoetching information being used for photoetching the lens to be photoetched; 8. A computer device, comprising: The second determination module is specifically configured to determine a first straight line based on the origin of the two-dimensional coordinate system and the parameter information of the feature points in the unit region where the target point is located, determine a second straight line according to the parameter information of the feature points and the first straight line, the second straight line being perpendicular to the first straight line, determine the perpendicular distance between the target point and the second straight line based on the position information of the target point, and determine the gray value of the target point based on the perpendicular distance. The device comprises:

9. A computer-readable storage medium, characterized in that, The memory stores a computer program executable on the processor, and the processor executes the computer program to implement the steps of the method of any one of claims 1 to 6. The computer program is stored on the computer readable storage medium and is executed by the processor to implement the steps of the method of any one of claims 1 to 6.

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